US2684327A - Bright nickel plating - Google Patents
Bright nickel plating Download PDFInfo
- Publication number
- US2684327A US2684327A US254629A US25462951A US2684327A US 2684327 A US2684327 A US 2684327A US 254629 A US254629 A US 254629A US 25462951 A US25462951 A US 25462951A US 2684327 A US2684327 A US 2684327A
- Authority
- US
- United States
- Prior art keywords
- indazole
- nickel
- radical
- linked
- membered ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 64
- 238000007747 plating Methods 0.000 title claims description 16
- 229910052759 nickel Inorganic materials 0.000 title description 29
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical class C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- 229910052717 sulfur Inorganic materials 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 230000002378 acidificating effect Effects 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 150000001491 aromatic compounds Chemical class 0.000 claims description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 239000011593 sulfur Substances 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 150000003254 radicals Chemical class 0.000 description 22
- 239000000243 solution Substances 0.000 description 17
- -1 amino, nitro, sulfanilamido Chemical group 0.000 description 10
- 125000001424 substituent group Chemical group 0.000 description 10
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 7
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 6
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 238000009713 electroplating Methods 0.000 description 6
- 150000002473 indoazoles Chemical class 0.000 description 6
- 229910052708 sodium Inorganic materials 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- 125000004434 sulfur atom Chemical group 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- 125000003453 indazolyl group Chemical group N1N=C(C2=C1C=CC=C2)* 0.000 description 5
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 4
- 239000004327 boric acid Substances 0.000 description 4
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 4
- 150000003460 sulfonic acids Chemical class 0.000 description 4
- 239000000080 wetting agent Substances 0.000 description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 239000004141 Sodium laurylsulphate Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- ZPBSAMLXSQCSOX-UHFFFAOYSA-N naphthalene-1,3,6-trisulfonic acid Chemical compound OS(=O)(=O)C1=CC(S(O)(=O)=O)=CC2=CC(S(=O)(=O)O)=CC=C21 ZPBSAMLXSQCSOX-UHFFFAOYSA-N 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 3
- 229940081974 saccharin Drugs 0.000 description 3
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 3
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 3
- RLNLIVBLEZDLMZ-UHFFFAOYSA-N 4-amino-n-(1h-indazol-6-yl)benzenesulfonamide Chemical compound C1=CC(N)=CC=C1S(=O)(=O)NC1=CC=C(C=NN2)C2=C1 RLNLIVBLEZDLMZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- MDFFNEOEWAXZRQ-UHFFFAOYSA-N aminyl Chemical compound [NH2] MDFFNEOEWAXZRQ-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 235000019204 saccharin Nutrition 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- XBTOSRUBOXQWBO-UHFFFAOYSA-N 1h-indazol-5-amine Chemical compound NC1=CC=C2NN=CC2=C1 XBTOSRUBOXQWBO-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- JGLMVXWAHNTPRF-CMDGGOBGSA-N CCN1N=C(C)C=C1C(=O)NC1=NC2=CC(=CC(OC)=C2N1C\C=C\CN1C(NC(=O)C2=CC(C)=NN2CC)=NC2=CC(=CC(OCCCN3CCOCC3)=C12)C(N)=O)C(N)=O Chemical compound CCN1N=C(C)C=C1C(=O)NC1=NC2=CC(=CC(OC)=C2N1C\C=C\CN1C(NC(=O)C2=CC(C)=NN2CC)=NC2=CC(=CC(OCCCN3CCOCC3)=C12)C(N)=O)C(N)=O JGLMVXWAHNTPRF-CMDGGOBGSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- BRMDATNYMUMZLN-UHFFFAOYSA-N Piloty's Acid Chemical compound ONS(=O)(=O)C1=CC=CC=C1 BRMDATNYMUMZLN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 150000008107 benzenesulfonic acids Chemical class 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 239000006172 buffering agent Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229940000425 combination drug Drugs 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- XTEGVFVZDVNBPF-UHFFFAOYSA-L naphthalene-1,5-disulfonate(2-) Chemical compound C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1S([O-])(=O)=O XTEGVFVZDVNBPF-UHFFFAOYSA-L 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- ABOYDMHGKWRPFD-UHFFFAOYSA-N phenylmethanesulfonamide Chemical class NS(=O)(=O)CC1=CC=CC=C1 ABOYDMHGKWRPFD-UHFFFAOYSA-N 0.000 description 1
- NIXKBAZVOQAHGC-UHFFFAOYSA-N phenylmethanesulfonic acid Chemical class OS(=O)(=O)CC1=CC=CC=C1 NIXKBAZVOQAHGC-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 238000003419 tautomerization reaction Methods 0.000 description 1
- YXFVVABEGXRONW-UHFFFAOYSA-N toluene Substances CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 1
- LMYRWZFENFIFIT-UHFFFAOYSA-N toluene-4-sulfonamide Chemical compound CC1=CC=C(S(N)(=O)=O)C=C1 LMYRWZFENFIFIT-UHFFFAOYSA-N 0.000 description 1
- 125000005425 toluyl group Chemical group 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- NJPKYOIXTSGVAN-UHFFFAOYSA-K trisodium;naphthalene-1,3,6-trisulfonate Chemical compound [Na+].[Na+].[Na+].[O-]S(=O)(=O)C1=CC(S([O-])(=O)=O)=CC2=CC(S(=O)(=O)[O-])=CC=C21 NJPKYOIXTSGVAN-UHFFFAOYSA-K 0.000 description 1
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/18—Heterocyclic compounds
Definitions
- This invention relates to the electroplating of bright nickel, and more praticularly to brighteners for bright nickel plating baths.
- the invention provides a bath for electroplat ing bright nickel having new and advantageous organic addition agents, functioning as brighteners, and to a process making use of such a bath.
- Such types of baths include the well-known Watts type of bath and the high chloride type of bath.
- Other baths may contain, as the source of the nickel, a combination of nickel fiuoborate with nickel sulfate and nickel chloride or a com bination of nickel fiuoborate with nickel chloride.
- Addition agents as brighteners in bright nickel plating baths may be generally divided into two separate classes on the basis of their-function in making possible the obtaining of truly bright deposits.
- One class which is herein designated secondary brighteners, (1) increases the brightness of an ordinarily dull or matte deposit but not to a full or mirror bright stage and (2) imparts a ductilizing effect when used in conjunction with the other class of addition agents which are herein designated primary brighteners.
- the primary brighteners permit the obtaining oi mirror bright deposits when used in conjunction with secondary brighteners.
- novel and improved primary brighteners comprise indazole derivatives consisting of indazole having at least one substituent in its sixmembered ring. These derivatives have the structural formula:
- radicals may be such radicals as the following: a radical which is linked to the six-membered ring through a nitrogen atom, that is, groups such as amino or substituted amino, nitro, sulfanilamido, p-tolu ene sulfanilamido, acylamido in which the acyl moiety preferably has a small number of carbon atoms, say up to six to ten, for example: acetamido, propionamido, butyramido, benzamido, etc; a radical which is connected to the said sixring through an oxygen atom, such as hydroxy and oxy-hydrocarbon groups, the latter being representable as OY (wherein O is an oxygen atom which is linked to the six ring and Y is a hydroearbon moiety) and including such groups as alkoxy, acyloxy, and acyl, in each of which the number of carbon atoms is small, preferably up to six to ten, and also including groups where
- c. a cycloaliphatic or aromatic, moiety as well as an aliphatic moiety.
- the following examples are illustrative: methoxy, ethoxy, propoxy, butoxy, amoxy, phenoxy, benzyloxy, toloxy, acetoxy, propionoxy, butyroxy, capryloxy, benzoxy, acetyl, propionyl, butyryl, valeryl, caproyl, benzoyl, toluyl, furoyl, etc.
- substituent radicals for said six ring inc'lude halides like chloro and bromo; a radical linked to the six ring through sulfur, such as sulfonic acid and sulfonic acid salts of metals like sodium, potassium, nickel, etc.; and radicals linked to the six ring through carbon, such as alkyl, aryl, aralkyl, and heterocyclic groups, and including methyl, ethyl, propyl, butyl, amyl, hexyl, phenyl, tolyl, benzyl, phenethyl, iuryl.
- these groups should have a. small number of carbon. atoms, say up to six to ten.
- Other groups are carboxy and carbalkoxy.
- any one of the four substituents W, X, Y, or Z may be one of the foregoing groups while the remaining three substituents are hydrogen (H); or any two of the substituents may be chosen from the foregoing groups while the remaining two are hydrogen; or any three of these substituents may be chosen from said groups while the fourth is hydrogen; or all four substituents may be chosen from said groups.
- those containing a nitrogen, oxygen, or sulfur atom linked to th six ring of the indazole moiety are preferred, such as nitro, amino, sulfanilamido, acylamido, hydroxy, sulfonic acid, and sulfonic acid salts.
- novel primary brighteners are the following: 5-nitro-indazole, E-amino-indazole, 5sulfanilamido-indazole, 6- sul-fanilamido-indazole, 'I-sulfanilamido indazole,
- the secondary brigh eners which can be used in conjunction with the above primary brighteners are substituted aromatic compounds in which the substituent comprises an SO2 containing moiety with the S atom linked to the aromatic moiety.
- These compounds have been designated aromatic sulfon-compounds, and they include naphthalene mono-, di-, or tri-sulfonates, a preferred class, either alone or in various mixtures.
- Salts of the foregoing compounds such as the sodium or other alkali metal salts, are also preferred, although the compounds are useful in their acid form.
- Derivatives of the foregoing compounds, such as the chlorand alkoxy-substituted types may serve.
- Benzene sulfonic acids and toluene sulfonic acids, their salts and their halogenated derivatives, and benzene sulionamides and toluene sulfonamides are other secondary brighteners. Still others are benzene sulfohydroxamio acid, o-benzoyl sulfimide (saccharin), and o-chloro-saccharin. Concentrations of the secondary brighteners are usually in the range or" 0.5 g./l.
- naphthalene-1,5-disulfonate of sodium is useful at 5-10 g./i; naphthalene-1,3,6-trisulfonate of sodium, a preferred brightener, is used at 10-25 g./1.; saccharin at about l2 g./l.; p-toluene sulfonamide at 1-2 g./1.; benzene sulfohydroxamic acid at 0.2-5 g./l.
- mixtures of the foregoing compounds may be used, as well as the individual D Nickel sulfate g./l 300 Nickel chloride g./l Boric acid g./l 38 Naphthalene-1,3,6-trisulfonate sodium g./l 20 5-nitro-indazcle g./l 0.015
- wetting agent sodium lauryl sulphate type (Duponol PC) g./1 0.5 pH (electrometric) 3.5
- the primary brighteners of this invention are organic bases and are appreciably soluble in acid electrolytes. They can, therefore, be added directly to the nickel plating bath or, preferably in the form of a stock solution prepared by dissolving the solid compound in water acidulateol with mineral acids such as sulfuric or hydrochloric acid.
- the concentration of the primary brighteners in the nickel plating electrolyte may vary from about 0.005 to 0.05 gram per liter.
- a preferred concentration range is from 0.005 to 0.02 gram per liter, within which range excellent brightness and ductility of deposits can be obtained over a variety of basis metal surfaces such as steel, iron, copper and copper alloys, brass, bronze, and other suitable metals.
- the concentration of the other constituents of the bath may be varied to meet special requirements, as is conventional.
- composition and concentration of one widely used bath may be illustrated, and that is one containing nickel sulfate, 200 to 300 g./l.; nickel chloride, 45 to g./l.; and boric acid, 37 to 45 g./l.
- concentration of the secondary brightener (or ductilizing agent) and the wetting agent may vary over limits determined by the degree of ductility desired and by solubility considerations.
- the primary brighteners of the invention are resistant to chemical change and breakdown, such as may occur by virtue of oxidation or reduction reactions under bright nickel plating conditions.
- an aqueous acidic bath solution for bright nickel plating containing at least one nickel salt as the source of the nickel and a substituted aromatic compound as a secondary brightener in which said substituent comprises an SO2 containing radical with the S atom linked to the aromatic ring of said compound, the combination therewith as a primary brightener of about 0.005 to 0.05 g.,/l. of an indazole derivative comprising indazole having a radical substituted in the six-membered ring thereof, said radical containing a non-metallic atom which is linked to said six-membered ring, and said non-metallic atom being selected from the group consisting of nitrogen, oxygen, sulfur, carbon, and halogen.
- an aqueous acidic bath solution for bright nickel plating containing at least one nickel salt as the source of the nickel and a sulfonated aryl compound as a secondary brightener, the combination therewith as a primary brightener of about 0.005 to 0.05 g./1. of an indazole derivative comprising indazole having a radical substituted in the six-membered ring thereof, said radical being one selected from the class consisting of amino and substituted amino groups and which is linked to said six-membered ring through a nitrogen atom.
- an aqueous acidic bath solution for bright nickel plating containing at least one nickel salt as the source of the nickel and a sulfonated aryl compound as a secondary brightener, the combination therewith as a primary brightener of about 0.005- to 0.05 g./l. of an indazole derivative comprising indazole having a hydroxy radical substituted in the six-membered ring thereof.
- an aqueous acidic bath solution for bright nickel plating containing at least one nickel salt as the source of the nickel and a sulfonated aryl compound as a secondary brightener, the combination therewith as a primary brightener of about 0.005 to 0.05 g./l. of an indazole derivative comprising indazole having a radical selected from the class consisting of sulfonic acid and sulfonic acid salts substituted in the six-membered ring thereof.
- an aqueous acidic bath solution for bright nickel plating containing at least one nickel salt as the source of the nickel and a substituted aromatic compound as a secondary brightener in which said substituent comprises an SO2 containing radical with the S atom linked to the aromatic ring of said compound, the combination therewith as a primary brightener of about 0.005 to 0.05 g./l. of an indazole derivative comprising indazole having a sulfanilamido radical substituted in the six-membered ring thereof.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
Patented July 20, 1954 2,684,327 BRIGHT NICKEL PLATING Frank Passal, Detroit, Mich., assignor to United Chromium, Incorporated, New York, N. Y., a
corporation of Delaware No Drawing. Application November 2, 1951, Serial No. 254,629
14 Claims.
This invention relates to the electroplating of bright nickel, and more praticularly to brighteners for bright nickel plating baths.
The invention provides a bath for electroplat ing bright nickel having new and advantageous organic addition agents, functioning as brighteners, and to a process making use of such a bath.
Conventional baths and processes for electroplating bright nickel are described in Principles of Electroplating and Electroforming, Blum and Hogaboom, pages 362 to 381, revised third edition, 1949, McGraw-Hill Book 00., Inc New York; and in Modern Electroplating, The Electrochemical Society, 1942, pages 235 to 274. The character, control, and operating conditions, including the concentration of the bath ingredients, pH, temperature, cathode current density, etc., of these conventional baths are generally applicable to the present invention, It may be stated, in this connection, that practically all baths for electroplating bright nickel contain nickel sulphate, a chloride, usually nickel chloride, and a buffering agent, usually boric acid. Such types of baths include the well-known Watts type of bath and the high chloride type of bath. Other baths may contain, as the source of the nickel, a combination of nickel fiuoborate with nickel sulfate and nickel chloride or a com bination of nickel fiuoborate with nickel chloride.
Addition agents as brighteners in bright nickel plating baths may be generally divided into two separate classes on the basis of their-function in making possible the obtaining of truly bright deposits. One class, which is herein designated secondary brighteners, (1) increases the brightness of an ordinarily dull or matte deposit but not to a full or mirror bright stage and (2) imparts a ductilizing effect when used in conjunction with the other class of addition agents which are herein designated primary brighteners. The primary brighteners permit the obtaining oi mirror bright deposits when used in conjunction with secondary brighteners.
According to the present invention, novel and improved primary brighteners are provided and comprise indazole derivatives consisting of indazole having at least one substituent in its sixmembered ring. These derivatives have the structural formula:
7 24K x-os o-- c-n YO6 2NH \7/ \1/ c N in which the substituents W, X, Y, '01 Z on 'the number 4, 5, 6, or 7 carbon :atoms, respectively,
may be such radicals as the following: a radical which is linked to the six-membered ring through a nitrogen atom, that is, groups such as amino or substituted amino, nitro, sulfanilamido, p-tolu ene sulfanilamido, acylamido in which the acyl moiety preferably has a small number of carbon atoms, say up to six to ten, for example: acetamido, propionamido, butyramido, benzamido, etc; a radical which is connected to the said sixring through an oxygen atom, such as hydroxy and oxy-hydrocarbon groups, the latter being representable as OY (wherein O is an oxygen atom which is linked to the six ring and Y is a hydroearbon moiety) and including such groups as alkoxy, acyloxy, and acyl, in each of which the number of carbon atoms is small, preferably up to six to ten, and also including groups wherein Y is a cyclic, i. c. a cycloaliphatic or aromatic, moiety as well as an aliphatic moiety. The following examples are illustrative: methoxy, ethoxy, propoxy, butoxy, amoxy, phenoxy, benzyloxy, toloxy, acetoxy, propionoxy, butyroxy, capryloxy, benzoxy, acetyl, propionyl, butyryl, valeryl, caproyl, benzoyl, toluyl, furoyl, etc. Other substituent radicals for said six ring inc'lude halides like chloro and bromo; a radical linked to the six ring through sulfur, such as sulfonic acid and sulfonic acid salts of metals like sodium, potassium, nickel, etc.; and radicals linked to the six ring through carbon, such as alkyl, aryl, aralkyl, and heterocyclic groups, and including methyl, ethyl, propyl, butyl, amyl, hexyl, phenyl, tolyl, benzyl, phenethyl, iuryl. Preferably these groups should have a. small number of carbon. atoms, say up to six to ten. Other groups are carboxy and carbalkoxy.
Any one of the four substituents W, X, Y, or Z may be one of the foregoing groups while the remaining three substituents are hydrogen (H); or any two of the substituents may be chosen from the foregoing groups while the remaining two are hydrogen; or any three of these substituents may be chosen from said groups while the fourth is hydrogen; or all four substituents may be chosen from said groups.
Of these groups, those containing a nitrogen, oxygen, or sulfur atom linked to th six ring of the indazole moiety are preferred, such as nitro, amino, sulfanilamido, acylamido, hydroxy, sulfonic acid, and sulfonic acid salts.
The above structural formula, which represents the indazole moiety in the ortho-quinoid form, may also be written with the indazole moiety in the iso-indazole form, since in solution both forms may be present in a state of dynamic tautomerism. Some typical examples of the novel primary brighteners according to this invention are the following: 5-nitro-indazole, E-amino-indazole, 5sulfanilamido-indazole, 6- sul-fanilamido-indazole, 'I-sulfanilamido indazole,
S-indazole sulfonic acid, G-indazole sulfonic acid, 'Y-amino-indazole, 'Z-nitro-indazole, 7-amino-4 indazole sulfonic acid, 7-amino-4,5inolazole disulfonic acid, 4-chloro-5-nitro-indazole, 5-nitro 4-indazole sulfonic acid, 5-aminol-indazole sulfonic acid, 4-indazo1e sulfonic acid, '7-indazole sulfonic acid, 7 hydroxy in-dazole, 6 amino indazole, 6 amino 7 indazole sulfonic acid, 6-amino-5,7-indazole disulfonic acid, 6-chlorofi-phenoxy-indazolc, 5,6-dinitro-indazole, S-hydroXy-indazole, 'l-nitro-dndazole sulionic acid, 4 hydroxy indazole, 5 hydroxy indazole, 5- chloro-S-nitro-indazole, 6-aminol-indazole sulfonic acid, 6-nitro-7-chloro-indazole, 5-nitro-6- indazole sulfonic acid, 5-amino-6-indaaole sulfonic acid, 7-acetamido-indazole, l-nitro-T-acetamido-indazole, -l-amino-'7-acetan1ido indazole, 'l-amino 5 indazole sulfonic acid, initro-5- chloro 7 amino-indazole, 4-nitro-7-amino-5- indazole sulfonic acid.
The secondary brigh eners which can be used in conjunction with the above primary brighteners are substituted aromatic compounds in which the substituent comprises an SO2 containing moiety with the S atom linked to the aromatic moiety. These compounds have been designated aromatic sulfon-compounds, and they include naphthalene mono-, di-, or tri-sulfonates, a preferred class, either alone or in various mixtures. Salts of the foregoing compounds, such as the sodium or other alkali metal salts, are also preferred, although the compounds are useful in their acid form. Derivatives of the foregoing compounds, such as the chlorand alkoxy-substituted types, may serve. Benzene sulfonic acids and toluene sulfonic acids, their salts and their halogenated derivatives, and benzene sulionamides and toluene sulfonamides are other secondary brighteners. Still others are benzene sulfohydroxamio acid, o-benzoyl sulfimide (saccharin), and o-chloro-saccharin. Concentrations of the secondary brighteners are usually in the range or" 0.5 g./l. For example, naphthalene-1,5-disulfonate of sodium is useful at 5-10 g./i; naphthalene-1,3,6-trisulfonate of sodium, a preferred brightener, is used at 10-25 g./1.; saccharin at about l2 g./l.; p-toluene sulfonamide at 1-2 g./1.; benzene sulfohydroxamic acid at 0.2-5 g./l. In general, mixtures of the foregoing compounds may be used, as well as the individual D Nickel sulfate g./l 300 Nickel chloride g./l Boric acid g./l 38 Naphthalene-1,3,6-trisulfonate sodium g./l 20 5-nitro-indazcle g./l 0.015
Wetting agent, sodium lauryl sulphate type (Duponol PC) g./1 0.5 pH (electrometric) 3.5
4 Temperature F 130 Cathode current density amps. per sq. ft 30 Nickel sulfate g./l 300 Nickel chloride g-./l 45 Boric acid g./1 38 Naphthalene-1,3,6-trisulfonate of sodium g./l 20 5-amino-indazole g./1 0.015 Wetting agent, sodium lauryl sulphate type (Duponol PC) g./l 0.5 pH (electrometric) 3.5 Temperature F 130 Cathode current density amps. per sq. ft 30 III Nickel fiuoborate g./l 210 Nickel chloride g./l 45 Naphthalene-1,3,6-trisulfonate of sodium g./l 20 6sulfanilamido-indazole g./l 0.015
Wetting agent, sodium lauryl sulphate type (Duponol PC) g./l 0.5 pl-I (electrometric) 3.5 Temperature F 130 Cathode current densityarnps. per sq. ft- 30 Cathode agitation may be practised, the degree thereof to be determined by the type of work being nickel plated and the operating current density range desired. Excellent results have been obtained without any solution or cathode agitation by suitably regulating the current density range and temperature as per usual practice.
Due to the indazole moiety, the primary brighteners of this invention are organic bases and are appreciably soluble in acid electrolytes. They can, therefore, be added directly to the nickel plating bath or, preferably in the form of a stock solution prepared by dissolving the solid compound in water acidulateol with mineral acids such as sulfuric or hydrochloric acid.
The concentration of the primary brighteners in the nickel plating electrolyte may vary from about 0.005 to 0.05 gram per liter. A preferred concentration range is from 0.005 to 0.02 gram per liter, within which range excellent brightness and ductility of deposits can be obtained over a variety of basis metal surfaces such as steel, iron, copper and copper alloys, brass, bronze, and other suitable metals. The concentration of the other constituents of the bath may be varied to meet special requirements, as is conventional.
It is to be understood in this connection that the conventional baths and operating conditions disclosed in the publications cited above are incorporated here by reference, so that additional descriptions of these baths and operating conditions are unnecessary. However, the composition and concentration of one widely used bath may be illustrated, and that is one containing nickel sulfate, 200 to 300 g./l.; nickel chloride, 45 to g./l.; and boric acid, 37 to 45 g./l. The concentration of the secondary brightener (or ductilizing agent) and the wetting agent may vary over limits determined by the degree of ductility desired and by solubility considerations.
The primary brighteners of the invention, and particularly the indazole moiety, are resistant to chemical change and breakdown, such as may occur by virtue of oxidation or reduction reactions under bright nickel plating conditions.
Even when chemical changes occur, the resultant conversion or decomposition products have not been found to be harmful. The brighteners are compatible with other classes of addition agents of the kind usually employed in bright nickel plating baths. Further, they have been found to render the bath electrolyte less sensitive in certain respects, that is to say, these brighteners have the efiect of rendering the bath solution resistant to many organic and metallic contaminants, such as copper and zinc, that are apt to be encountered.
In regard to the operation of plating baths containing the foregoing primary brighteners, good levelling and smoothening action is possible, the degree of which is favorably influenced by the use of the present brighteners. The cathode current density and the temperature may be varied widely while yet obtaining highly lustrous, mirror bright deposits of nickel plate. The rate of brightening, or the increase of luster of the deposits with increase of thickness, is also favorably influenced, being superior to many presently used primary brighteners.
Advantages in the plated product are also apparent following the use of the present brighteners. Substantially pure nickel coatings are obtained that are ductile and have low internal stress and that are not appreciably embrittled by being subjected to the usual plating conditions.
Although the invention has been illustrated by certain selected embodiments, it will be appreciated that these are illustrative and that the invention is capable of obvious variations.
In the light of the foregoing description, the following is claimed.
I claim:
1. In an aqueous acidic bath solution for bright nickel plating containing at least one nickel salt as the source of the nickel and a substituted aromatic compound as a secondary brightener in which said substituent comprises an SO2 containing radical with the S atom linked to the aromatic ring of said compound, the combination therewith as a primary brightener of about 0.005 to 0.05 g.,/l. of an indazole derivative comprising indazole having a radical substituted in the six-membered ring thereof, said radical containing a non-metallic atom which is linked to said six-membered ring, and said non-metallic atom being selected from the group consisting of nitrogen, oxygen, sulfur, carbon, and halogen.
2. An aqueous bath solution according to claim 1 in which said radical contains a nitrogen atom linked to said six-membered ring.
3. An aqueous bath solution according to claim 1 in which said radical contains an oxygen atom, linked to said six-membered ring.
4. An aqueous bath solution according to claim 1 in which said radical contains a sulfur atom linked to said six-membered ring.
5. An aqueous bath solution according to claim 1 in which said radical contains a halogen atom linked to said six-membered ring.
6. An aqueous bath solution according to claim 1 in which said radical contains a carbon atom linked to said six-membered ring.
'7. An aqueous bath solution according to claim 1 in which said radical is an oxy-hydrocarbon radical having the oxygen atom thereof linked to said six-membered ring.
8. An aqueous bath solution according to claim 1 in which said radical is one selected from the class consisting of sulfonic acid and sulfonic acid salts and is linked to said six-membered ring through a sulfur atom.
9. In an aqueous acidic bath solution for bright nickel plating containing at least one nickel salt as the source of the nickel and a sulfonated aryl compound as a secondary brightener, the combination therewith as a primary brightener of about 0.005 to 0.05 g./1. of an indazole derivative comprising indazole having a radical substituted in the six-membered ring thereof, said radical being one selected from the class consisting of amino and substituted amino groups and which is linked to said six-membered ring through a nitrogen atom.
10. An aqueous bath solution according to claim 9 in which said radical is an amino radical.
11. An aqueous bath solution according to claim 9 in which said radical is a substituted amino radical.
12. In an aqueous acidic bath solution for bright nickel plating containing at least one nickel salt as the source of the nickel and a sulfonated aryl compound as a secondary brightener, the combination therewith as a primary brightener of about 0.005- to 0.05 g./l. of an indazole derivative comprising indazole having a hydroxy radical substituted in the six-membered ring thereof.
13. In an aqueous acidic bath solution for bright nickel plating containing at least one nickel salt as the source of the nickel and a sulfonated aryl compound as a secondary brightener, the combination therewith as a primary brightener of about 0.005 to 0.05 g./l. of an indazole derivative comprising indazole having a radical selected from the class consisting of sulfonic acid and sulfonic acid salts substituted in the six-membered ring thereof.
14. In an aqueous acidic bath solution for bright nickel plating containing at least one nickel salt as the source of the nickel and a substituted aromatic compound as a secondary brightener in which said substituent comprises an SO2 containing radical with the S atom linked to the aromatic ring of said compound, the combination therewith as a primary brightener of about 0.005 to 0.05 g./l. of an indazole derivative comprising indazole having a sulfanilamido radical substituted in the six-membered ring thereof.
References Cited in the file of this patent UNITED STATES PATENTS Number Name Date 2,315,802 Lind et a1. Apr. 6, 1943 2,513,280 Brown July 4, 1950
Claims (1)
1. IN AN AQUEOUS ACIDIC BATH SOLUTION FOR BRIGHT NICKEL PLATING CONTAINING AT LEAST ONE NICKEL SALT AS THE SOURCE OF THE NICKEL AND A SUBSTITUTED AROMATIC COMPOUND AS A SECONDARY BRIGHTENER IN WHICH SAID SUBSTITUENT COMPRISES AN -SO2 CONTAINING RADICAL WITH THE S ATOM LINKED TO THE AROMATIC RING OF SAID COMPOUND, THE COMBINATION THEREWITH AS A PRIMARY BRIGHTENER OF ABOUT 0.005 TO 0.05 G./1. OF AN INDAZOLE DERIVATIVE COMPRISING INDAZOLE HAVING A RADICAL SUBSTITUTED IN THE SIX-MEMBERED RING THEREOF, SAID RADICAL CONTAINING A NON-METALLIC ATOM WHICH IS LINKED TO SAID SIX-MEMBERED RING, AND SAID NON-METALLIC ATOM BEING SELECTED FROM THE GROUP CONSISTING OF NITROGEN, OXYGEN, SULFUR, CARBON, AND HALOGEN.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US254629A US2684327A (en) | 1951-11-02 | 1951-11-02 | Bright nickel plating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US254629A US2684327A (en) | 1951-11-02 | 1951-11-02 | Bright nickel plating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US2684327A true US2684327A (en) | 1954-07-20 |
Family
ID=22965004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US254629A Expired - Lifetime US2684327A (en) | 1951-11-02 | 1951-11-02 | Bright nickel plating |
Country Status (1)
| Country | Link |
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| US (1) | US2684327A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2737484A (en) * | 1952-10-31 | 1956-03-06 | United Chromium Inc | Bright nickel plating |
| US3130135A (en) * | 1961-11-21 | 1964-04-21 | Sture Granberger Fa | Nickel plating |
| US20100015093A1 (en) * | 2007-09-18 | 2010-01-21 | Shirit Einav | Methods and compositions of treating a flaviviridae family viral infection |
| US20100028299A1 (en) * | 2007-09-18 | 2010-02-04 | Shirit Einav | Methods and compositions of treating a flaviviridae family viral infection |
| US20100260717A1 (en) * | 2007-09-18 | 2010-10-14 | Quake Stephen R | Methods of treating a flaviviridae family viral infection, compositions for treating a flaviviridae family viral infection, and screening assays for identifying compositions for treating a flaviviridae family viral infection |
| US8940730B2 (en) | 2007-09-18 | 2015-01-27 | The Board Of Trustees Of The Leland Stanford Junior University | Methods and compositions of treating a Flaviviridae family viral infection |
| US8975247B2 (en) | 2009-03-18 | 2015-03-10 | The Board Of Trustees Of The Leland Stanford Junion University | Methods and compositions of treating a flaviviridae family viral infection |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2315802A (en) * | 1940-04-20 | 1943-04-06 | Harshaw Chem Corp | Nickel plating |
| US2513280A (en) * | 1945-10-31 | 1950-07-04 | Udylite Corp | Electrodeposition of nickel from an acid bath |
-
1951
- 1951-11-02 US US254629A patent/US2684327A/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2315802A (en) * | 1940-04-20 | 1943-04-06 | Harshaw Chem Corp | Nickel plating |
| US2513280A (en) * | 1945-10-31 | 1950-07-04 | Udylite Corp | Electrodeposition of nickel from an acid bath |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2737484A (en) * | 1952-10-31 | 1956-03-06 | United Chromium Inc | Bright nickel plating |
| US3130135A (en) * | 1961-11-21 | 1964-04-21 | Sture Granberger Fa | Nickel plating |
| US20100015093A1 (en) * | 2007-09-18 | 2010-01-21 | Shirit Einav | Methods and compositions of treating a flaviviridae family viral infection |
| US20100028299A1 (en) * | 2007-09-18 | 2010-02-04 | Shirit Einav | Methods and compositions of treating a flaviviridae family viral infection |
| US20100260717A1 (en) * | 2007-09-18 | 2010-10-14 | Quake Stephen R | Methods of treating a flaviviridae family viral infection, compositions for treating a flaviviridae family viral infection, and screening assays for identifying compositions for treating a flaviviridae family viral infection |
| US20110052536A1 (en) * | 2007-09-18 | 2011-03-03 | Shirit Einav | Methods of treating a flaviviridae family viral infection and compositions for treating a flaviviridae family viral infection |
| US8895598B2 (en) | 2007-09-18 | 2014-11-25 | The Board Of Trustees Of The Leland Stanford Junior University | Methods of treating a flaviviridae family viral infection, compositions for treating a flaviviridae family viral infection, and screening assays for identifying compositions for treating a flaviviridae family viral infection |
| US8940730B2 (en) | 2007-09-18 | 2015-01-27 | The Board Of Trustees Of The Leland Stanford Junior University | Methods and compositions of treating a Flaviviridae family viral infection |
| US9061010B2 (en) | 2007-09-18 | 2015-06-23 | The Board Of Trustees Of The Leland Stanford Junior University | Methods of treating a Flaviviridae family viral infection and compositions for treating a Flaviviridae family viral infection |
| US9101628B2 (en) | 2007-09-18 | 2015-08-11 | The Board Of Trustees Of The Leland Stanford Junior University | Methods and composition of treating a flaviviridae family viral infection |
| US9149463B2 (en) * | 2007-09-18 | 2015-10-06 | The Board Of Trustees Of The Leland Standford Junior University | Methods and compositions of treating a Flaviviridae family viral infection |
| US8975247B2 (en) | 2009-03-18 | 2015-03-10 | The Board Of Trustees Of The Leland Stanford Junion University | Methods and compositions of treating a flaviviridae family viral infection |
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