[go: up one dir, main page]

TWI788180B - Device and method for detecting changes in reflected light - Google Patents

Device and method for detecting changes in reflected light Download PDF

Info

Publication number
TWI788180B
TWI788180B TW111100536A TW111100536A TWI788180B TW I788180 B TWI788180 B TW I788180B TW 111100536 A TW111100536 A TW 111100536A TW 111100536 A TW111100536 A TW 111100536A TW I788180 B TWI788180 B TW I788180B
Authority
TW
Taiwan
Prior art keywords
field intensity
light
intensity distribution
reflected
pupil
Prior art date
Application number
TW111100536A
Other languages
Chinese (zh)
Other versions
TW202235813A (en
Inventor
王奇
李仲禹
王政
Original Assignee
大陸商上海精測半導體技術有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 大陸商上海精測半導體技術有限公司 filed Critical 大陸商上海精測半導體技術有限公司
Publication of TW202235813A publication Critical patent/TW202235813A/en
Application granted granted Critical
Publication of TWI788180B publication Critical patent/TWI788180B/en

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/1702Systems in which incident light is modified in accordance with the properties of the material investigated with opto-acoustic detection, e.g. for gases or analysing solids
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Mathematical Physics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Geophysics And Detection Of Objects (AREA)

Abstract

本發明提出了一種探測反射光變化的裝置及方法,利用第一光瞳分割 器將入射光束進行場強分割使得入射光束在第一光瞳分割器的第一表面形成第一場強分佈;準直匯聚具有第一場強分佈的入射光束斜入射至物體表面以形成具有第二場強分佈的反射光束;接收具有第二場強分佈的反射光束並準直以形成具有第三場強分佈的反射光束;利用第二光瞳分割器的位置和形狀對具有第三場強分佈的反射光束進行場強分割,使得具有第三場強分佈的反射光束在第二光瞳分割器的第一表面形成第四場強分佈,第一光瞳分割器和第二光瞳分割器具有相同的孔徑函數分佈;獲取具有第四場強分佈的反射光束,解析時間間隔內具有第四場強分佈的反射光束變化資訊,從而使得解析之後光強變化和成像位置偏差所形成的信號變化增強,提高探測器信噪比。 The present invention proposes a device and method for detecting changes in reflected light, using the first pupil division The incident light beam is divided into field intensity by the device so that the incident light beam forms a first field intensity distribution on the first surface of the first pupil divider; the collimation and convergence of the incident light beam with the first field intensity distribution is obliquely incident on the surface of the object to form a first pupil divider with the first field intensity distribution A reflected beam having a second field strength distribution; receiving a reflected beam having a second field strength distribution and collimating to form a reflected beam having a third field strength distribution; using a position and shape of a second pupil divider to have a third field strength The distributed reflected light beam is subjected to field strength division, so that the reflected light beam with the third field strength distribution forms a fourth field strength distribution on the first surface of the second pupil divider, the first pupil divider and the second pupil divider Have the same aperture function distribution; obtain the reflected beam with the fourth field intensity distribution, and analyze the change information of the reflected beam with the fourth field intensity distribution within the time interval, so as to make the signal change formed by the light intensity change and the imaging position deviation after analysis Enhanced to improve the detector signal-to-noise ratio.

Description

探測反射光變化的裝置及方法 Device and method for detecting changes in reflected light

本發明屬於聲光量測系統,主要用於檢測金屬膜、介質膜的測量,具體來說,涉及一種探測反射光變化的裝置及方法。 The invention belongs to an acousto-optic measuring system and is mainly used for measuring metal films and dielectric films. Specifically, it relates to a device and method for detecting changes in reflected light.

目前現有技術中的聲光量測原理如下:短脈衝鐳射1A照射在膜樣品2A表面,膜樣品2A吸收光子產生熱彈性變形,表面形成形變區;熱彈性變形產生聲波在固體表面及內部傳播;縱向聲波傳播到介面(基底3A或多層薄膜6A的膜與膜的交界)處產生第一次回聲信號4A;第一次回聲信號4A到達上表面,使形變形貌進一步發生變化;回聲信號碰到上表面後又回彈,回彈碰到介面後產生第二次回聲信號5A;第二次回聲信5A號到達上表面,使鼓包形貌再次發生變化,如圖1所示,當然回聲信號也可能包括三次以上。通過光探測器獲取由形貌變化導致的入射光束的反射率變化,從而可獲取兩次反射率變化時間間隔,由此可計算得到膜樣品厚度值。 The current principle of acousto-optic measurement in the prior art is as follows: the short-pulse laser 1A is irradiated on the surface of the film sample 2A, the film sample 2A absorbs photons to generate thermoelastic deformation, and the surface forms a deformation zone; the thermoelastic deformation generates sound waves that propagate on the solid surface and inside; The longitudinal sound wave propagates to the interface (the junction between the film and the film of the substrate 3A or the multilayer thin film 6A) to generate the first echo signal 4A; the first echo signal 4A reaches the upper surface, causing further changes in the deformation; the echo signal hits After the upper surface rebounds, the second echo signal 5A is generated after the rebound hits the interface; the second echo signal 5A reaches the upper surface, causing the shape of the bulge to change again, as shown in Figure 1. Of course, the echo signal also May include more than three times. The reflectance change of the incident light beam caused by the shape change is obtained by the photodetector, so that the time interval between two reflectance changes can be obtained, and the thickness value of the film sample can be calculated.

而在具體的測量裝置設置上,如圖2所示,泵浦鐳射1入射到樣品2的表面產生形變區4,將入射探測光5a打在形變區4上,由於回聲回傳時膜層表面的形變區形貌會發生變化,由於會導致形變區在回聲信號的到達之時所產生的進一步形變會對反射探測光5b產生影響,這種影響配合接收端的光學元件的使用,可能是幅度或者相位等各種影響,一般來說,探測模組6獲取形貌變化導致的光反射幅度的變化,從而可獲取的光信號幅度變化的時間間隔,通過膜厚 計算公式得到膜厚值,如圖2和圖3的示意圖中所示,由此,探測反射探測光5b的變化對提高光聲探測裝置精度的影響尤其重要。 In terms of specific measurement device settings, as shown in Figure 2, the pump laser 1 is incident on the surface of the sample 2 to generate a deformation zone 4, and the incident probe light 5a is hit on the deformation zone 4, because the surface of the film layer when the echo returns The shape of the deformation zone will change, because the further deformation of the deformation zone when the echo signal arrives will have an impact on the reflected detection light 5b. This impact may be the amplitude or Various influences such as phase, generally speaking, the detection module 6 obtains the change of the light reflection amplitude caused by the shape change, so that the time interval of the change of the optical signal amplitude can be obtained, through the film thickness The calculation formula obtains the film thickness value, as shown in the schematic diagrams of FIG. 2 and FIG. 3 . Therefore, the impact of detecting the change of the reflected detection light 5b on improving the precision of the photoacoustic detection device is particularly important.

如圖4中所示,為現有技術中的一種分析反射探測光的技術,經過形變區4區域反射的探測光5b會被第一反射鏡6c反射一半尺寸的圓形光斑(反射鏡6c的位置設置尤其重要,其對反射光的反射光斑視場有篩選作用),這部分會繼續被第二反射鏡6d反射至第二探測器6a中,而未被第一反射鏡6c反射的另一半尺寸的圓形光斑會直接進入到第一探測器6b中。其中第一反射鏡6c是被電機調整到目標位置,在無激發形變時探測器6a與6b接收到的光具有確定的光強比例,如1:1,但是,當形變4區域發生激發形變產生回聲震盪,反射探測光5b會發生時間相關性的微小角度變化,此時由於第一反射鏡6c對光斑視場的分割作用不再是一半一半的關係,由於這種微小的角度變化會導致此時探測器6a和6b的光強讀數會發生變化,通過多次實驗可模擬計算反射探測光5b角度的變化與兩者光強讀數變化的影響,進而可以計算反射探測光5b角度的變化和光強的變化之間的關係,通過測得多次回聲信號時間差便可計算出膜厚值。 As shown in Fig. 4, it is a technology for analyzing reflected probe light in the prior art, the probe light 5b reflected by the deformation zone 4 area will be reflected by the first mirror 6c to reflect a half-size circular spot (the position of the mirror 6c The setting is especially important, it has a screening effect on the reflected light spot field of view of the reflected light), this part will continue to be reflected by the second reflector 6d into the second detector 6a, and the other half size that is not reflected by the first reflector 6c The circular light spot will directly enter the first detector 6b. The first reflector 6c is adjusted to the target position by the motor, and the light received by the detector 6a and 6b has a certain light intensity ratio when there is no excitation deformation, such as 1:1. However, when the deformation 4 area is excited and deformed Echo oscillates, and the reflected probe light 5b will undergo a time-dependent slight angle change. At this time, the division effect of the first reflector 6c on the field of view of the spot is no longer half and half. This slight angle change will cause this The readings of the light intensity of the detectors 6a and 6b will change at the same time. Through multiple experiments, the influence of the change of the angle of the reflected detection light 5b and the change of the light intensity readings of the two can be simulated, and then the change of the angle of the reflected detection light 5b and the light intensity can be calculated. The relationship between the changes, the film thickness value can be calculated by measuring the time difference of multiple echo signals.

但是,在上述的技術方案中,存在如下的問題:第一方面的問題是所應用光學系統的第一反射鏡6c位置調整精度要求極高,並且對其穩定性也要求極高,該光學元件承擔了光束分光作用,對光路準直性和穩定性的要求較高,光路組裝較為困難;第二方面是體現在光路的複雜性上,分別需要組裝第一反射鏡6c和第二反射鏡6d,並且為滿足一定角度內入射的光線都能夠被有效反射折射,兩者之間的平行準直和視場交錯也需要被精確調整個設計,同時在檢測出射光端還需要2個探測器,光學元件的使用增多也會導致成本增加;協力廠商面體現在探測精度上,由於對光路採用了分光,使得透射反射光進一步損 耗,在反射探測光由於形變區造成的入射角度偏差所造成的光斑能量分解的變化率更難被檢測,由此探測信噪比低,約為百萬分之一,並且對探測光束腰發散角要求極高。 However, in the above-mentioned technical solution, there are the following problems: the first problem is that the position adjustment accuracy of the first reflector 6c of the applied optical system is extremely high, and its stability is also extremely high. Undertake the role of beam splitting, the requirements for the alignment and stability of the optical path are high, and the assembly of the optical path is relatively difficult; the second aspect is reflected in the complexity of the optical path, which requires the assembly of the first reflector 6c and the second reflector 6d respectively , and in order to meet the requirement that the incident light within a certain angle can be effectively reflected and refracted, the parallel collimation and field of view interlacing between the two also need to be precisely adjusted for a design, and at the same time, two detectors are required to detect the outgoing light. The increase in the use of optical components will also lead to an increase in cost; the third party is reflected in the detection accuracy, due to the use of light splitting in the optical path, the transmitted and reflected light will further damage It is more difficult to detect the change rate of the spot energy decomposition caused by the incident angle deviation caused by the deformation region of the reflected probe light, so the detection signal-to-noise ratio is low, about one part per million, and the detection beam waist The divergence angle is extremely demanding.

為解決現有技術中存在的上述問題,本發明提出了一種探測反射光峰值變化的裝置及方法,在探測光的入射光路和反射光路上設置具有相同孔徑函數的光瞳分割器,對入射光束和反射光束進行擾動分割,從而使得解析之後光強變化和成像位置偏差所形成的信號變化增強,提高探測器信噪比,結構簡單,易於工程實現,減少探測器數量,降低成本。 In order to solve the above-mentioned problems in the prior art, the present invention proposes a device and method for detecting the change of the reflected light peak value. A pupil divider with the same aperture function is set on the incident light path and the reflected light path of the detection light, and the incident light beam and the reflected light path are provided with a pupil divider. The reflected light beam is disturbed and divided, so that the signal change formed by the light intensity change and the imaging position deviation after analysis is enhanced, and the signal-to-noise ratio of the detector is improved. The structure is simple, easy to implement, and the number of detectors is reduced and the cost is reduced.

為解決上述技術問題,本發明首先提出了一種探測反射光變化的裝置,裝置包括:至少一個用於產生入射光束的探測光源;設置於探測光源光路後的至少一個第一光瞳分割器,用於將入射光束進行場強分割使得入射光束在第一光瞳分割器的第一表面形成第一場強分佈;設置於第一光瞳分割器光路後的第一準直光學元件,用於準直匯聚具有第一場強分佈的入射光束斜入射至待測體表面以形成具有第二場強分佈的反射光束;設置於反射光路上的第二準直光學元件,用於接收視場範圍內具有第二場強分佈的反射光束並準直以形成具有第三場強分佈的反射光束;設置於第二準直光學元件光路後的第二光瞳分割器,用於接收具有第三場強分佈的反射光束進行場強分割,使得具有第三場強分佈的反射光束在第 二光瞳分割器的第一表面形成第四場強分佈,第一光瞳分割器和第二光瞳分割器具有相同的孔徑函數;探測器,用於獲取具有第四場強分佈的反射光束,解析時間間隔內具有第四場強分佈的反射光束變化資訊。 In order to solve the above-mentioned technical problems, the present invention first proposes a device for detecting changes in reflected light, which includes: at least one detection light source for generating an incident light beam; at least one first pupil divider arranged behind the light path of the detection light source. The field intensity division of the incident beam is performed so that the incident beam forms a first field intensity distribution on the first surface of the first pupil divider; the first collimating optical element arranged behind the optical path of the first pupil divider is used for collimating Directly converge the incident beam with the first field intensity distribution obliquely incident on the surface of the object to be measured to form a reflected beam with the second field intensity distribution; the second collimating optical element arranged on the reflected light path is used to receive within the field of view The reflected light beam with the second field strength distribution is collimated to form the reflected light beam with the third field strength distribution; the second pupil divider arranged behind the light path of the second collimating optical element is used to receive the light beam with the third field strength Distributed reflected beams are subjected to field intensity splitting such that the reflected beams with the third field intensity distribution in the first The first surface of the two pupil dividers forms a fourth field intensity distribution, the first pupil divider and the second pupil divider have the same aperture function; the detector is used to obtain the reflected light beam with the fourth field intensity distribution , analyzing the change information of the reflected light beam with the fourth field intensity distribution in the time interval.

作為本發明的進一步改進,第一準直光學元件與第二準直光學元件組成光路準直系統,第一光瞳分割器設置於光路準直系統的入瞳位置,第二準直光學元件設置於光路準直系統的出瞳位置。 As a further improvement of the present invention, the first collimating optical element and the second collimating optical element form an optical path collimation system, the first pupil divider is arranged at the entrance pupil position of the optical path collimating system, and the second collimating optical element is arranged The exit pupil position of the optical path collimation system.

作為本發明的進一步改進,第一光瞳分割器設置有多個第一類型通光結構和多個第二類型通光結構,第一類型通光結構和第二類型通光結構具有光通量的差別,以使得入射光束被第一類型通光結構和第二類型通光結構擾動分割,成為具有第一場強分佈的入射光束。 As a further improvement of the present invention, the first pupil divider is provided with a plurality of first-type light-passing structures and a plurality of second-type light-passing structures, and the first-type light-passing structures and the second-type light-passing structures have differences in luminous flux , so that the incident beam is split by the disturbance of the first-type light-passing structure and the second-type light-passing structure, and becomes the incident beam with the first field intensity distribution.

作為本發明的進一步改進,第二光瞳分割器設置有多個第三類型通光結構和多個第四類型通光結構,第三類型通光結構和第四類型通光結構具有光通量的差別,以使得具有第三場強分佈的反射光束被進一步擾動分割為所述具有第四場強分佈的反射光束。 As a further improvement of the present invention, the second pupil divider is provided with a plurality of third-type light-passing structures and a plurality of fourth-type light-passing structures, and the third-type light-passing structures and the fourth-type light-passing structures have differences in luminous flux , so that the reflected beam with the third field intensity distribution is further disturbed and divided into the reflected beam with the fourth field intensity distribution.

作為本發明的進一步改進,第一類型通光結構與第三類型通光結構一一對應,互相對應的第一類型通光結構和第三類型通光結構的形狀相同。 As a further improvement of the present invention, the first-type light-transmitting structures correspond to the third-type light-transmitting structures one-to-one, and the shapes of the first-type light-transmitting structures and the third-type light-transmitting structures corresponding to each other are the same.

作為本發明的進一步改進,通過設置第一準直光學元件的組成結構實現第一準直光學元件的視場調節,使得第一光瞳分割器的像清晰照射於待測體;通過設置第二準直光學元件的組成結構實現第二準直光學元件的視場調節,使得用具有第二場強分佈的反射光束準直後射入第二光瞳分割器。 As a further improvement of the present invention, the field of view adjustment of the first collimating optical element is realized by setting the composition structure of the first collimating optical element, so that the image of the first pupil divider is clearly irradiated on the object to be measured; by setting the second The composition structure of the collimating optical element realizes the adjustment of the field of view of the second collimating optical element, so that the reflected light beam with the second field intensity distribution is collimated and enters the second pupil divider.

作為本發明的進一步改進,第一光瞳分割器(7)和所述第二光瞳分割器(8)相對於入射光路和反射光路呈軸對稱。 As a further improvement of the present invention, the first pupil divider (7) and the second pupil divider (8) are axisymmetric with respect to the incident light path and the reflected light path.

作為本發明的進一步改進,多個第一類型通光結構對應的通光圖案不同。 As a further improvement of the present invention, the light transmission patterns corresponding to the plurality of first type light transmission structures are different.

為解決上述技術問題,本發明還提出了一種探測反射光變化的方法,該方法包括:利用第一光瞳分割器將入射光束進行場強分割使得入射光束在第一光瞳分割器的第一表面形成第一場強分佈;準直匯聚具有第一場強分佈的入射光束斜入射至待測體表面以形成具有第二場強分佈的反射光束;接收具有第二場強分佈的反射光束並準直以形成具有第三場強分佈的反射光束;利用第二光瞳分割器接收具有第三場強分佈的反射光束進行場強分割,使得具有第三場強分佈的反射光束在第二光瞳分割器的第一表面形成第四場強分佈,第一光瞳分割器和第二光瞳分割器具有相同的孔徑函數;獲取具有第四場強分佈的反射光束,解析時間間隔內具有第四場強分佈的反射光束變化資訊。 In order to solve the above technical problems, the present invention also proposes a method for detecting the change of reflected light, the method includes: using the first pupil divider to divide the incident light beam into field strength so that the incident light beam is at the first pupil divider of the first pupil divider. The surface forms a first field intensity distribution; collimating and converging the incident beam with the first field intensity distribution obliquely incident on the surface of the object to be measured to form a reflected beam with a second field intensity distribution; receiving the reflected beam with the second field intensity distribution and Collimating to form a reflected beam with a third field intensity distribution; using the second pupil divider to receive the reflected beam with a third field intensity distribution for field intensity division, so that the reflected beam with the third field intensity distribution is in the second light The first surface of the pupil divider forms a fourth field intensity distribution, the first pupil divider and the second pupil divider have the same aperture function; a reflected beam with the fourth field intensity distribution is obtained, and the analytical time interval has the fourth Four field strength distributions of reflected beam variation information.

為解決上述技術問題,本發明還提出了一種膜厚測量裝置,包括:猝發單元,在一個時間點從待測膜樣品的上表面向下底面猝發多個激勵源,以使待測膜樣品上表面產生至少一形變區域;提供如上所述的探測反射光束變化的裝置,獲取形變區域對應偏振反射光束信號強度峰值變化資訊; 計算單元,根據峰值對應的時間間隔計算出待測膜樣品的厚度。 In order to solve the above-mentioned technical problems, the present invention also proposes a film thickness measurement device, including: a burst unit, which bursts a plurality of excitation sources from the upper surface of the film sample to be tested to the bottom surface at one time point, so that At least one deformed area is generated on the surface; the above-mentioned device for detecting the change of the reflected beam is provided, and information on the peak signal intensity change of the polarized reflected beam corresponding to the deformed area is obtained; The calculation unit calculates the thickness of the film sample to be tested according to the time interval corresponding to the peak value.

相對於背景技術而言,本發明所涉及的技術方案,在技術效果上採用了光瞳分割方案,該方案通過光學系統的分析獲得提高信號變化率檢測的重要方面,入射場強、光瞳分割、光學準直聚焦元件的視場等相關參數,從而設計優化本檢測方案,能夠顯著提高反射光的變化檢測率。 Compared with the background technology, the technical solution involved in the present invention adopts the pupil division scheme in terms of technical effects, and the scheme obtains the important aspects of improving the detection of the signal change rate through the analysis of the optical system, the incident field strength, the pupil division , field of view of optical collimation and focusing elements and other related parameters, so as to design and optimize this detection scheme, which can significantly improve the detection rate of reflected light changes.

1:泵浦光源 1: Pump light source

1a:入射泵浦光 1a: Incident pump light

1b:反射泵浦光 1b: Reflected pump light

2:薄膜樣品 2: Film sample

3:薄膜樣品表面 3: Film sample surface

3a:上表面 3a: Upper surface

3b:下表面 3b: Lower surface

4:形變區 4: Deformation zone

5a:入射光束 5a: Incident beam

5b:反射光 5b: Reflected light

6:探測模組 6: Detection module

7:第一光瞳分割器 7: The first pupil divider

8:第二光瞳分割器 8: Second pupil divider

9:第一準直光學元件 9: The first collimating optical element

10:第二準直光學元件 10: The second collimating optical element

11:探測器 11: Detector

12:探測器 12: Detector

[圖1]為現有技術中的聲光測量系統的整體工作原理圖。 [FIG. 1] is the overall working principle diagram of the acousto-optic measuring system in the prior art.

[圖2]為按照現有技術中進行聲光測量技術的回聲測量的探測光路結構示意圖。 [ Fig. 2 ] is a schematic diagram of the structure of the detection optical path for the echo measurement of the acousto-optic measurement technology in the prior art.

[圖3]為按照現有技術中的回聲測量的兩次回聲測量時間差的示意圖;[圖4]為按照現有技術中的聲光測量系統的光學光路結構示意圖。 [ Fig. 3 ] is a schematic diagram of the time difference between two echo measurements according to the echo measurement in the prior art; [ Fig. 4 ] is a schematic diagram of the optical light path structure of the acousto-optic measurement system in the prior art.

[圖5]為按照本發明實現的聲光測量裝置的光路結構示意圖;[圖6]為按照本發明實現的其中一種光瞳分割器具體實施方案的示意圖;[圖7]為按照本發明實現的一種光瞳分割器成像資訊示意圖;[圖8]為不產生光瞳分割的光斑與反射角度變化之間對應的示意圖; [Fig. 5] is a schematic diagram of the optical path structure of the acousto-optic measuring device realized according to the present invention; [Fig. 6] is a schematic diagram of a specific embodiment of a pupil divider realized according to the present invention; [Fig. 7] is realized according to the present invention A schematic diagram of the imaging information of the pupil splitter; [Figure 8] is a schematic diagram of the correspondence between the light spot without pupil division and the change of the reflection angle;

應理解,以下為本實施例的不同特徵的許多不同的實施例或例子。以下描述的構件與安排的特定例子,以簡化說明實施例。當然,這些僅僅是例子而不是用以限制具體的實施方式。 It should be understood that the following are many different embodiments or examples of different features of this embodiment. Specific examples of components and arrangements are described below for simplicity of describing the embodiments. Of course, these are just examples and not intended to limit specific implementations.

按照本發明的其中一種實施方式,本發明首先提出了一種聲光探測中獲得反射光探測變化的裝置,能夠顯著提高探測光角度變化的測量精度,顯著提高測量信噪比。 According to one of the embodiments of the present invention, the present invention first proposes a device for obtaining the detection change of reflected light in acousto-optic detection, which can significantly improve the measurement accuracy of the detection light angle change and significantly improve the measurement signal-to-noise ratio.

按照本發明實現的探測反射光角度變化的裝置,如圖5中所示,入射光束5a以一定夾角入射一光瞳分割器7,該夾角為入射光束5a的入射方向與薄膜樣品2表面3垂直方向的夾角,之後被一透鏡組9匯聚準直後斜入射樣品,由於泵浦鐳射1所造成的樣品2表面3中所形成的形變區4上,發生反射後的反射光5b通過另一透鏡組10後經過另一光瞳分割器8之後達到探測器11,從而展開探測光的相關分析獲得樣品2的測量結果。 According to the device for detecting the angle change of reflected light realized by the present invention, as shown in Figure 5, the incident beam 5a is incident on a pupil divider 7 with a certain angle, and the angle is that the incident direction of the incident beam 5a is perpendicular to the surface 3 of the film sample 2 The included angle of the direction is collected and collimated by a lens group 9 and obliquely incident on the sample. On the deformation zone 4 formed in the surface 3 of the sample 2 caused by the pumping laser 1, the reflected light 5b after reflection passes through another lens group. After 10, it passes through another pupil divider 8 and then reaches the detector 11, so that the correlation analysis of the probe light is carried out to obtain the measurement result of the sample 2.

其中,光瞳分割器7將入射光束5a進行場強分割使得入射光束5a在光瞳分割器7的第一表面形成第一場強分佈,設置於光瞳分割器7光路後的透鏡組9再將具有第一場強分佈的入射光束準直匯聚後,斜入射至物體表面以形成具有第二場強分佈的反射光束5b;另一透鏡組10接收自身視場範圍內所能接收的準直反射光束5b於另一光瞳分割器8表面,並形成為第三場強分佈,得到第三場強分佈特徵接近第一場強分佈特徵,由於光瞳分割器7和另一光瞳分割器8具有相同的孔徑函數分割,另一光瞳分割器8接受具有第三場強分佈的反射光束後,另一光瞳分割器8的第一表面形成為第四場強分佈並反射至探測器12,探測器12用於探測經過光瞳分割器8後的反射光束,以獲取反射光束的光強。由於泵浦光源(又稱猝發單元)1在樣品2形成回聲,該回聲傳播至形變區4,對具有第二場強分佈的入射光束5a形成幹擾形成反射光束5b,由此經過光瞳分割器7後的反射光束5b也會受回聲

Figure 111100536-A0305-02-0009-25
擾,故探測器10可探測到回聲引起的時間相關性光強變化;解析裝置,再對解析時間間隔內具有第四場強分佈的反射光束變化資訊進行解析,獲得反射光束信號變化。 Wherein, the pupil divider 7 divides the field intensity of the incident light beam 5a so that the incident light beam 5a forms a first field intensity distribution on the first surface of the pupil divider 7, and the lens group 9 arranged behind the pupil divider 7 optical paths further After the incident beam with the first field intensity distribution is collimated and converged, it is obliquely incident on the surface of the object to form a reflected beam 5b with the second field intensity distribution; another lens group 10 receives the collimated beam that can be received within its field of view. The reflected light beam 5b is on the surface of another pupil divider 8, and is formed into a third field intensity distribution, so that the third field intensity distribution characteristic is close to the first field intensity distribution characteristic, because the pupil divider 7 and another pupil divider 8 have the same aperture function division, after another pupil divider 8 receives the reflected beam with the third field intensity distribution, the first surface of another pupil divider 8 is formed into the fourth field intensity distribution and reflected to the detector 12. The detector 12 is used to detect the reflected light beam passing through the pupil divider 8, so as to obtain the light intensity of the reflected light beam. Since the pumping light source (also known as the burst unit) 1 forms an echo in the sample 2, the echo propagates to the deformation region 4 and interferes with the incident beam 5a having the second field intensity distribution to form a reflected beam 5b, which passes through the pupil divider The reflected beam 5b after 7 is also affected by the echo
Figure 111100536-A0305-02-0009-25
Interference , so the detector 10 can detect the time-dependent light intensity change caused by the echo; the analysis device analyzes the change information of the reflected beam with the fourth field intensity distribution within the analysis time interval, and obtains the signal change of the reflected beam.

優選的,第一準直光學元件與第二準直光學元件組成光路準直系統,第一光瞳分割器設置於光路準直系統的入瞳位置,第二準直光學元件設置於光 路準直系統的出瞳位置,由於光瞳分割器7和另一光瞳分割器8具有相同的孔徑函數,得到第三場強分佈特徵接近第一場強分佈特徵,從而可以使得光瞳分割器7的像疊加在光瞳分割器8上或有些微遮擋錯位,而在光聲擾動產生信號的變化之後,這種重合或者輕微的錯位信號會發生變化,通過捕捉時間間隔內的信號變化資訊,可以獲得更加精確的檢測結果。 Preferably, the first collimating optical element and the second collimating optical element form an optical path collimation system, the first pupil divider is arranged at the entrance pupil position of the optical path collimating system, and the second collimating optical element is arranged at the optical path collimation system. Because the pupil divider 7 and another pupil divider 8 have the same aperture function, the third field intensity distribution feature is close to the first field intensity distribution feature, so that the pupil division The image of the pupil divider 7 is superimposed on the pupil divider 8 or slightly occluded and misaligned, and after the photoacoustic disturbance produces a signal change, this coincidence or slight misalignment signal will change, by capturing the signal change information within the time interval , more accurate detection results can be obtained.

對於上述的整體實現反射光角度變化測量的光學系統,其中所涉及的光學元器件中泵浦光源1也稱激發光源,除Nd:YAG雷射器之外的光源可用於光學激發薄膜,在具體的實施方式中,雷射器也可以包括Nd:YLF,離子(例如氬和氪),Ti:藍寶石,二極體,C02,鈥,準分子,染料和金屬蒸氣雷射器等,上述泵浦光源1的作用是在樣品表面產生形變區4,其波長、所產生雷射脈衝能源、週期以及光束腰部的參數,可以根據樣品2的薄膜的特性,以及其特性來進行設計。在其它的一些研究中,通常通過在泵浦光源1之後設置衍射元件,將泵浦光源1進行轉化為帶有衍射圖案的光源入射樣品2的表面,在這種基礎之上,與聚焦的光斑所產生的鼓包不同,會產生有與衍射圖案對應的形變,所形成的聲光效應的變化會更複雜,也會更容易受到幹擾而產生變化。 For the above-mentioned optical system that realizes the measurement of the angle change of reflected light as a whole, the pump light source 1 in the optical components involved is also called the excitation light source, and light sources other than Nd:YAG lasers can be used to optically excite thin films. In an embodiment, the laser may also include Nd:YLF, ion (such as argon and krypton), Ti:sapphire, diode, CO 2 , ', excimer, dye and metal vapor laser, etc., the above-mentioned pump The function of the pump light source 1 is to generate a deformation zone 4 on the surface of the sample. The parameters of its wavelength, laser pulse energy, period and beam waist can be designed according to the characteristics of the thin film of the sample 2 and its characteristics. In some other studies, the pump light source 1 is converted into a light source with a diffraction pattern incident on the surface of the sample 2 by setting a diffraction element behind the pump light source 1. On this basis, the focused spot The resulting bulge is different, and will have a deformation corresponding to the diffraction pattern, and the change of the formed acousto-optic effect will be more complicated, and it will be more susceptible to interference and change.

另外,對於本發明所涉及方案的具體實施方式中,泵浦光源1的類型,和是否與探測入射光的入射角度一致,並不做嚴格的限定,在整個光學檢測系統中,通常也通過同時採集泵浦光的脈衝來作為泵浦光與探測入射光5a泵浦與檢測觸發的參考信號源。 In addition, in the specific implementation of the solution involved in the present invention, the type of the pump light source 1 and whether it is consistent with the incident angle of the detected incident light are not strictly limited. In the entire optical detection system, usually through simultaneous The pulse of the pumping light is collected as a reference signal source for the pumping and detecting incident light 5a for triggering the pumping and detection.

類似地,以上與泵浦光源類似的除了二極體雷射器之外的光源可以選作探測雷射器,可用於產生入射光束的脈衝光源包括Q開關Nd:YAG,Nd:YLF,Ti:藍寶石,二極體,C02,鈥,準分子,染料和金屬蒸氣雷射器等。而 本發明的設計方案中所涉及的入射探測光5a對波長範圍也具有較強的適應性,並不做嚴格的限定,但是對入射探測光5a的準直性建議要求較高,使之與光學系統中的其它光學元件的視場權衡配合設計。 Similarly, the above light sources similar to the pump light source except the diode laser can be selected as the probe laser, and the pulsed light sources that can be used to generate the incident beam include Q-switched Nd:YAG, Nd:YLF, Ti: Sapphire, Diode, C0 2 ,', Excimer, Dye and Metal Vapor Lasers etc. The incident detection light 5a involved in the design of the present invention also has strong adaptability to the wavelength range, and is not strictly limited, but the collimation requirements for the incident detection light 5a are relatively high, so that it is compatible with The field of view trade-offs of other optical elements in the optical system are coordinated with the design.

作為本發明的重要改進之一,為在探測光路中使用了光瞳分割器7和光瞳分割器8,其中,上述光瞳分割方案中,首先需要採用光瞳分割器7為相對於入射光5a具有至少兩個通光部、限制光束通量的光學元件,其通光部可以為一維結構(x橫向分割或y縱向分割或斜向分割入射光5a),或二維結構(任何形狀的網格式分割或任何圖案式分割入射光5a形成),又可為均勻分割或非均勻分割,都具有同原理提高信噪比作用。其中光瞳分割器7優選為在相對於入射光5a光斑方向上具有盡可能多的光束分割結構為佳。進一步地,光瞳分割器8為相對於反射光5b具有至少兩個通光部、限制光束通量的光學元件,其通光部可以為一維結構(x橫向分割或y縱向分割或斜向分割反射光5b),或二維結構(任何形狀的網格式分割或任何圖案式分割反射光5b),又可為均勻分割或非均勻分割,都具有同原理提高信噪比作用,其中光瞳分割器8優選為在相對於反射光5b光斑方向上具有盡可能多的分割結構為佳。 As one of the important improvements of the present invention, the pupil divider 7 and the pupil divider 8 are used in the detection optical path, wherein, in the above-mentioned pupil division scheme, it is first necessary to adopt the pupil divider 7 to An optical element with at least two light-passing parts that limits the beam flux, and its light-passing part can be a one-dimensional structure (x horizontal division or y longitudinal division or oblique division of the incident light 5a), or a two-dimensional structure (any shape The grid-like division or any pattern-like division of the incident light 5a) can also be uniform or non-uniform, both of which have the effect of improving the signal-to-noise ratio on the same principle. Among them, the pupil divider 7 preferably has as many beam division structures as possible in the spot direction relative to the incident light 5a. Further, the pupil divider 8 is an optical element that has at least two light-passing parts for the reflected light 5b to limit the beam flux, and its light-passing part can be a one-dimensional structure (x horizontal division or y longitudinal division or oblique Segmented reflected light 5b), or a two-dimensional structure (grid-like segmentation of any shape or any patterned segmented reflected light 5b), can also be uniformly segmented or non-uniformly segmented, all of which have the same principle of improving the signal-to-noise ratio, wherein the pupil The divider 8 preferably has as many division structures as possible in the spot direction of the reflected light 5b.

如圖6中所示,為按照本發明的其中一種光瞳分割器的實施方式,為具有通光部和遮蔽光束部為條狀的結構,整體的光瞳分割器7為直徑為D的圓盤狀結構,其中通光部為條狀通孔,遮蔽光束部為不透光的材料,本實施例中通光部和遮蔽光束部交替的週期條狀結構為通光寬度為a,遮蔽光束部的寬度為b,整個週期結構為寬度為d(d=a+b),入射探測光5a經過該光瞳分割器7之後,經過透鏡組9之後光瞳分割器7成像匯聚於形變區4上,被薄膜結構光反射後最終被探測器接收,反射光5b會受到形變區4的聲擾動而發生變化,這種變化第 一方面會體現在光瞳分割器7的像會發生一定程度的形變,第二方面會體現在光瞳分割器7的像受到擾動後在探測器成像部位的位置偏差,光瞳分割器7的條狀像會在探測器的成像位置上發生微小的位置偏差,而這些資訊被反映在探測器的成像端,被解析之後相較於圖8中所示的圓形光斑的偏差,會攜帶關於擾動的更加多維的資訊,從而獲得更加精確的檢測結果。 As shown in Figure 6, it is one of the implementations of the pupil divider according to the present invention, which has a strip-shaped structure with a light-passing part and a beam-shielding part, and the overall pupil divider 7 is a circle with a diameter of D Disc-shaped structure, wherein the light-transmitting part is a strip-shaped through hole, and the shielding beam part is an opaque material. In this embodiment, the periodic strip structure of the light-passing part and the shielding beam part alternately has a light-passing width of a, and the shielding beam The width of the part is b, and the width of the entire periodic structure is d (d=a+b). After the incident probe light 5a passes through the pupil divider 7, after passing through the lens group 9, the image of the pupil divider 7 converges in the deformation zone 4 Above, after being reflected by the film structured light, it is finally received by the detector, and the reflected light 5b will be changed by the acoustic disturbance of the deformation zone 4. This change is the first On the one hand, it will be reflected in that the image of the pupil divider 7 will be deformed to a certain extent. On the other hand, it will be reflected in the position deviation of the image of the pupil divider 7 in the detector imaging part after being disturbed. The strip image will have a slight position deviation on the imaging position of the detector, and this information is reflected on the imaging end of the detector. After being analyzed, compared with the deviation of the circular spot shown in Figure 8, it will carry information about The more multi-dimensional information of the disturbance, so as to obtain more accurate detection results.

進一步優選地,該反射光5b會經過另一光瞳分割器8,另一光瞳分割器8為具有通光部和遮蔽光束部為條狀的結構,整體的光瞳分割器8為直徑為D的圓盤狀結構,其中通光部為條狀通孔,遮蔽光束部為不透光的材料,其中通光部和遮蔽光束部交替的週期條狀結構為通光寬度為a,遮蔽光束部的寬度為b,整個週期結構為寬度為d(d=a+b),反射光5b經過透鏡組10之後準直照射於光瞳分割器8,優選的,光瞳分割器7和8的結構類似,其對應的通光部形狀相同,大小成比例關係,且由於透鏡組9和10在光路系統中也優選為相同的相互對稱的光學元件,光瞳分割器7的像疊加在光瞳分割器8上或有些微遮擋錯位,而在光聲擾動產生信號的變化之後,這種重合或者輕微的錯位信號會發生變化,分析探測器成像資訊可獲得更多資訊。 Further preferably, the reflected light 5b will pass through another pupil divider 8, and the other pupil divider 8 is a strip-shaped structure with a light-passing part and a light beam shielding part, and the overall pupil divider 8 has a diameter of The disk-shaped structure of D, wherein the light-passing part is a strip-shaped through hole, and the shielding beam part is an opaque material, wherein the alternating periodic strip structure of the light-passing part and the shielding beam part has a light-passing width of a, and the shielding beam The width of the portion is b, and the width of the entire periodic structure is d (d=a+b). The reflected light 5b is collimated and irradiated on the pupil divider 8 after passing through the lens group 10. Preferably, the pupil dividers 7 and 8 The structure is similar, the shape of the corresponding light-transmitting parts is the same, and the size is proportional, and because the lens groups 9 and 10 are also preferably the same mutually symmetrical optical elements in the optical path system, the image of the pupil divider 7 is superimposed on the pupil There may be some slight occlusion and dislocation on the divider 8, and after the photoacoustic disturbance produces a signal change, this coincidence or slight dislocation signal will change, and more information can be obtained by analyzing the detector imaging information.

當然,在以上的情況中,光瞳分割器7和8優選為對稱的結構,上述兩個光學元件也可為不對稱的結構,此時,光瞳分割器7的像恰好與出射光的的光瞳分割器8的通光部與限制光部交叉,形成具有二維資訊的圖案成像,這種不對稱的結構可能會在器件製備的時候增加工藝困難。 Of course, in the above cases, the pupil dividers 7 and 8 are preferably symmetrical structures, and the above two optical elements can also be asymmetrical structures. The light-passing part of the pupil divider 8 intersects with the light-limiting part to form a pattern image with two-dimensional information. This asymmetric structure may increase process difficulties during device fabrication.

進一步地,其中光瞳分割器7與透鏡組9的位置選擇,以被分割後入射探測光5a在樣品表面光斑最小化為優選,不在焦點的模糊成像會顯著增加成像圖案分析的難度。同樣的,光瞳分割器8與透鏡組10的位置選擇,以樣品表面 衍射條紋傅裡葉變換回光瞳分割器7的樣貌清晰成像於光瞳分割器8第二表面為優先,模糊成像會顯著增加成像圖案分析的難度。 Further, the positions of the pupil divider 7 and the lens group 9 are chosen to minimize the spot of the incident probe light 5a on the sample surface after being divided, and blurred imaging that is not in focus will significantly increase the difficulty of imaging pattern analysis. Similarly, the positions of the pupil divider 8 and the lens group 10 are selected according to the sample surface The Fourier transform of the diffraction fringes back to the appearance of the pupil divider 7 is clearly imaged on the second surface of the pupil divider 8. Fuzzy imaging will significantly increase the difficulty of imaging pattern analysis.

進一步地,為提高信噪比,通過理論推導調整入射探測光光束的場強分佈或鏡組視野範圍,同樣可以調製目標出射探測光光斑的場強分佈,提高探測器信噪比。入射光束5a經過光瞳分割器7後會在樣品表面產生衍射相干光,其過程為傅裡葉轉換,即光瞳分割器7第二表面入射光束5a的場強分佈為U(x 0,y 0),光瞳分割器7第一表面(後表面)入射光束5a的場強分佈為第一場強分佈

Figure 111100536-A0305-02-0013-1
,隨後入射光束5a經光瞳分割器7分割後,經過透鏡組9匯聚後在形變區4表面的場強分佈為第二場強分佈U(x 1,y 1),即:
Figure 111100536-A0305-02-0013-2
Furthermore, in order to improve the signal-to-noise ratio, adjusting the field intensity distribution of the incident probe light beam or the field of view range of the mirror group through theoretical derivation can also modulate the field intensity distribution of the target outgoing probe light spot to improve the signal-to-noise ratio of the detector. The incident light beam 5a will generate diffracted coherent light on the sample surface after passing through the pupil divider 7, and the process is Fourier transform, that is, the field intensity distribution of the incident light beam 5a on the second surface of the pupil divider 7 is U ( x 0 , y 0 ), the field intensity distribution of the incident beam 5a on the first surface (rear surface) of the pupil divider 7 is the first field intensity distribution
Figure 111100536-A0305-02-0013-1
, then the incident light beam 5a is divided by the pupil divider 7, and the field intensity distribution on the surface of the deformation zone 4 after being converged by the lens group 9 is the second field intensity distribution U ( x 1 , y 1 ), namely:
Figure 111100536-A0305-02-0013-2

調製光瞳分割器7的孔徑函數A(x 0,y 0),可以得到入射光束5a在形變區4表面的場強分佈為U(x 1,y 1),透鏡組10將視野範圍內的部分場強分佈U(x 1,y 1)的反射光束5b接收,由於對稱光路系統,反射至另一光瞳分割器8第二表面形成的反射光束5b的場強分佈為第三場強分佈

Figure 111100536-A0305-02-0013-3
,其場強分佈會近似為入射光束5a經過光瞳分割器7第一表面的第一場強分佈
Figure 111100536-A0305-02-0013-4
,由於光瞳分割器7和8具有相同的孔徑函數A(x 0,y 0),通過調製光瞳分割器8的孔徑函數A(x 0,y 0)可以實現得到光瞳分割器8第一表面(後表面)的第四場強分佈U(x 2,y 2)。而第二場強分佈U(x 1,y 1)會受物品表面回聲影響幹擾,形成隨回聲返回時間相關性變化的第三場強分佈,第三場強分佈和光瞳分割器8的孔徑函數A(x 0,y 0)再發生疊加錯位可得到隨回聲時間相關性變化的高信噪比信號第四場強分佈U(x 2,y 2),該信號會被探測器11接收。 By modulating the aperture function A ( x 0 , y 0 ) of the pupil divider 7, the field intensity distribution of the incident light beam 5a on the surface of the deformation zone 4 can be obtained as U ( x 1 , y 1 ), and the lens group 10 will Part of the field intensity distribution U ( x 1 , y 1 ) of the reflected light beam 5b is received, and due to the symmetrical optical path system, the field intensity distribution of the reflected light beam 5b formed on the second surface of another pupil divider 8 is the third field intensity distribution
Figure 111100536-A0305-02-0013-3
, its field intensity distribution will be approximately the first field intensity distribution of the incident beam 5a passing through the first surface of the pupil divider 7
Figure 111100536-A0305-02-0013-4
, since the pupil divider 7 and 8 have the same aperture function A ( x 0 , y 0 ), by modulating the aperture function A ( x 0 , y 0 ) of the pupil divider 8, the pupil divider 8 can be obtained The fourth field intensity distribution U ( x 2 , y 2 ) of a surface (rear surface). The second field intensity distribution U ( x 1 , y 1 ) will be interfered by the surface echo of the object, forming a third field intensity distribution that changes with the echo return time correlation, the third field intensity distribution and the aperture function of the pupil divider 8 A ( x 0 , y 0 ) is superimposed and misplaced to obtain a fourth field intensity distribution U ( x 2 , y 2 ) of a signal with a high signal-to-noise ratio that varies with the time correlation of the echo, and the signal will be received by the detector 11 .

更進一步地,入射光束於光瞳分割器7第二表面的原始場強分佈為U(x 0,y 0),經過孔徑函數為A(x 0,y 0)的光瞳分割器7後,在光瞳分割器7第一表面後的第一場強分佈

Figure 111100536-A0305-02-0014-5
Figure 111100536-A0305-02-0014-6
入射光束5a到達形變區4表面第二場強分佈為:
Figure 111100536-A0305-02-0014-7
Furthermore, the original field intensity distribution of the incident light beam on the second surface of the pupil divider 7 is U ( x 0 , y 0 ), and after passing through the pupil divider 7 with an aperture function of A ( x 0 , y 0 ), First field intensity distribution after the first surface of the pupil divider 7
Figure 111100536-A0305-02-0014-5
for
Figure 111100536-A0305-02-0014-6
The second field intensity distribution of the incident light beam 5a reaching the surface of the deformation zone 4 is:
Figure 111100536-A0305-02-0014-7

入射光束5a到達形變區4表面第二場強分佈為U(x 1,y 1),位於透鏡組10視野範圍內反射光5b準直至光瞳分割器8第二表面形成第三場強分佈為

Figure 111100536-A0305-02-0014-8
Figure 111100536-A0305-02-0014-9
The second field intensity distribution of the incident light beam 5a reaching the surface of the deformation zone 4 is U ( x 1 , y 1 ), and the reflected light 5b within the field of view of the lens group 10 is collimated to the second surface of the pupil divider 8 to form a third field intensity distribution of
Figure 111100536-A0305-02-0014-8
which is
Figure 111100536-A0305-02-0014-9

反射光束5b經過光瞳分割器8,基於孔徑函數A(x 0,y 0)形成為第四場強分佈U(x 2,y 2),即

Figure 111100536-A0305-02-0014-10
The reflected light beam 5b passes through the pupil divider 8 and forms a fourth field intensity distribution U ( x 2 , y 2 ) based on the aperture function A ( x 0 , y 0 ), namely
Figure 111100536-A0305-02-0014-10

反射光束5b在光瞳分割器8第四表面場強分佈為U(x 2,y 2),公式推導結論:最終信號U(x 2,y 2)與U(x 0,y 0)、A(x 0,y 0)、透鏡組9視場、透鏡組10視場有明確物理關係,目標為使

Figure 111100536-A0305-02-0014-11
最大化。其中,θ為回聲信號產生的反射探測光5b角度變化,s為探測器接收面積,由於
Figure 111100536-A0305-02-0014-12
U(x 0,y 0)、A(x 0,y 0)、透鏡組9視場、透鏡組10視場有關係,利用光瞳分割器7的孔徑函數A(x 0,y 0)更易於調製。 The field intensity distribution of the reflected light beam 5b on the fourth surface of the pupil divider 8 is U ( x 2 , y 2 ), and the formula derivation conclusion: the final signal U ( x 2 , y 2 ) is related to U ( x 0 , y 0 ), A ( x 0 , y 0 ), the field of view of lens group 9, and the field of view of lens group 10 have a clear physical relationship, and the goal is to make
Figure 111100536-A0305-02-0014-11
maximize. Among them, θ is the angle change of the reflected detection light 5b generated by the echo signal, and s is the receiving area of the detector, because
Figure 111100536-A0305-02-0014-12
It is related to U ( x 0 , y 0 ), A ( x 0 , y 0 ), the field of view of lens group 9, and the field of view of lens group 10, using the aperture function A ( x 0 , y 0 ) of pupil divider 7 Easier to modulate.

如圖7所示,對於本發明的光瞳分割方案來說,在使用圖6所示的光瞳分割器7和光瞳分割器8之後,探測器11獲取的最終信號為明暗交替的條紋圖像,光瞳分割後的信號變化率為η=各明條紋變化寬度/無擾動時各明條紋寬度=

Figure 111100536-A0305-02-0015-14
;如圖8所示,對於現有技術中不進行光瞳分割的方案來說,信號變化率η 0=圓形光斑錯位面積/圓形光斑面積=
Figure 111100536-A0305-02-0015-15
, 其中:η或者
Figure 111100536-A0305-02-0015-16
;由於通常光場強分佈為高斯分佈,結果將會更明顯地看到η≫η0;因此,使用本發明的光瞳分割方案探測器所探測的信號跳動會較為明顯,而不做分割情況下探測器所探測的信號跳動幅度很小,不易於識別。 As shown in Figure 7, for the pupil division scheme of the present invention, after using the pupil divider 7 and the pupil divider 8 shown in Figure 6, the final signal acquired by the detector 11 is a fringe image with alternating light and dark , the signal change rate after pupil division is η = the change width of each bright fringe/the width of each bright fringe when there is no disturbance =
Figure 111100536-A0305-02-0015-14
; As shown in Figure 8, for the scheme that does not carry out pupil division in the prior art, signal rate of change η 0 =circular spot dislocation area/circular spot area=
Figure 111100536-A0305-02-0015-15
, where: η or
Figure 111100536-A0305-02-0015-16
; Since the light field intensity distribution is usually a Gaussian distribution, the result will be more clearly seen η≫η 0 ; therefore, the signal jitter detected by the detector using the pupil division scheme of the present invention will be more obvious, without segmentation The signal jitter detected by the lower detector is very small, which is not easy to identify.

另外,上述光瞳分割器7和8的主要核心在於光瞳大於等於2以上分割處理,光瞳分割器7和8的具體光學參數和工藝一致性問題,可依據實際應用情況優化設計解決,其製作材料可依據光學工藝條件來製備,並且考慮到光學系統中的反射效應等因素,進一步優選在光瞳分割器7和8表面或者是背面進行塗膜減小光闌反射對探測光5c的影響等,或者考慮到在光闌邊緣處可能產生的衍射圖樣設計濾除元件,保持1級條紋的設計等都可依據上述核心來進行進一步設計。同時光闌本身可進行可調節瞳孔大小方式的設計,以方便進行多次測量減小光學系統硬體本身引起的對測量結果的擾動和誤差,另外考慮到光學系統穩定性的影響,上述光闌的固定、調整設備可依據情況進行設計。 In addition, the main core of the above-mentioned pupil dividers 7 and 8 lies in the division processing of pupils greater than or equal to 2. The specific optical parameters and process consistency of the pupil dividers 7 and 8 can be optimized and designed according to actual application conditions. The production material can be prepared according to the optical process conditions, and considering factors such as the reflection effect in the optical system, it is further preferable to coat the surface or the back of the pupil divider 7 and 8 to reduce the influence of the diaphragm reflection on the probe light 5c etc., or consider the possible diffraction patterns at the edge of the aperture to design filter elements, and keep the design of the first-order fringes, etc., can be further designed according to the above core. At the same time, the aperture itself can be designed to adjust the pupil size, so as to facilitate multiple measurements and reduce the disturbance and error of the measurement results caused by the hardware of the optical system itself. In addition, considering the influence of the stability of the optical system, the above aperture The fixed and adjusted equipment can be designed according to the situation.

透鏡組9和10為光學元件組合系統,完成對光路的準直,其能達到相應的光學功能即可,對其具體設置並不做嚴格限定。另外在光路上設置對光強的增益元件以彌補光闌帶來的能量損耗也可依據具體情況展開設計。 The lens groups 9 and 10 are optical element combination systems to complete the collimation of the optical path, as long as they can achieve the corresponding optical functions, and the specific settings are not strictly limited. In addition, setting a gain element to adjust the light intensity on the optical path to compensate for the energy loss caused by the diaphragm can also be designed according to specific conditions.

可以用本發明所涉及的方法和裝置監測的樣品可以是塊狀的(例如,諸如金屬或半導體的固體),薄膜(例如,聚合物,半導體或金屬膜),流體,表面或表現出聲光時間擾動的效應。典型的樣品包括半導體工業中使用的金屬膜,例如鋁,鎢,鈦,鈦:鎢,鈦或氧化物薄膜等。可以在這些樣品中確定的材料特性包括機械,物理(例如,厚度),彈性,(深度依賴和/或各向異性)擴散,基於粘附,熱(例如,熱擴散)和與之相關的粘性特性。如圖7中所示,當光闌分割所造成的圖像分割越豐富,所能提取的資訊維度越豐富(a'可以反映反射光角度變化資訊,b'可以反映形變區4的資訊和/或光學元件的像畸變資訊),例如在光闌像的位置變化的移動可檢出反射光角度的變化,而其中的像的畸變或者形狀的改變,可能意味著形變區4的光學特性造成的影響,當分割的圖案越多,所能提取的共性特徵和特定特徵也越多,使得按照本發明使用的方案在後續的成像光的電腦分析中獲得更高的分析精度。 Samples that can be monitored with the methods and devices of the present invention can be bulk (e.g., solids such as metals or semiconductors), thin films (e.g., polymers, semiconductors, or metal films), fluids, surfaces, or exhibit acousto-optic The effect of time perturbations. Typical samples include metal films used in the semiconductor industry, such as aluminum, tungsten, titanium, titanium: tungsten, titanium or oxide films, etc. Material properties that can be determined in these samples include mechanical, physical (e.g., thickness), elastic, (depth-dependent and/or anisotropic) diffusion, based on adhesion, thermal (e.g., thermal diffusion) and viscosities associated with characteristic. As shown in Figure 7, when the image segmentation caused by aperture segmentation is richer, the information dimensions that can be extracted are richer (a' can reflect the angle change information of reflected light, b' can reflect the information of deformation zone 4 and/or or image distortion information of optical components), for example, the movement of the position change of the diaphragm image can detect the change of the reflected light angle, and the distortion or shape change of the image may mean that the optical characteristics of the deformation zone 4 are caused by As a result, the more patterns are divided, the more common features and specific features can be extracted, so that the scheme used in the present invention can obtain higher analysis accuracy in the subsequent computer analysis of imaging light.

按照本發明的另一種實施方式,提出了一種聲光探測中獲得反射光探測變化的方法,該方法包括:利用第一光瞳分割器將入射光束進行場強分割使得入射光束在第一光瞳分割器的第一表面形成第一場強分佈;匯聚具有第一場強分佈的入射光束斜入射至物體表面以形成具有第二場強分佈的反射光束; 接收具有第二場強分佈的反射光束並準直以形成具有第三場強分佈的反射光束;利用第二光瞳分割器接收具有第三場強分佈的反射光束進行場強分割,使得具有第三場強分佈的反射光束在第二光瞳分割器的第一表面形成第四場強分佈,第一光瞳分割器和第二光瞳分割器具有相同的孔徑函數分割;獲取具有第四場強分佈的反射光束,解析時間間隔內具有第四場強分佈的反射光束變化資訊。該方法的實現原理、技術效果與上述裝置類似,此處不再贅述。 According to another embodiment of the present invention, a method for obtaining reflected light detection changes in acousto-optic detection is proposed, the method includes: using a first pupil divider to perform field intensity division of the incident beam so that the incident beam is in the first pupil The first surface of the splitter forms a first field intensity distribution; converging the incident beam with the first field intensity distribution obliquely incident on the surface of the object to form a reflected beam with the second field intensity distribution; receiving the reflected beam with the second field intensity distribution and collimating to form the reflected beam with the third field intensity distribution; using the second pupil divider to receive the reflected beam with the third field intensity distribution for field intensity division, so that the reflected beam with the third field intensity distribution is used The reflected light beams of the three field intensity distributions form a fourth field intensity distribution on the first surface of the second pupil divider, and the first pupil divider and the second pupil divider have the same aperture function division; Reflected beams with strong distribution, analyzing change information of reflected beams with a fourth field intensity distribution within a time interval. The implementation principle and technical effect of this method are similar to those of the above-mentioned device, and will not be repeated here.

按照本發明的另一種實施方式,提出了一種膜厚測量裝置,包括:猝發單元,在一個時間點從待測膜樣品的上表面向下底面猝發多個激勵源,以使待測膜樣品上表面產生至少一形變區域;提供如上所述的探測反射光束變化的裝置,獲取形變區域對應偏振反射光束5b’信號強度峰值變化資訊;計算單元,根據峰值對應的時間間隔計算出待測膜樣品的厚度。該裝置的實現原理、技術效果與上述探測反射光束變化的裝置類似,此處不再贅述。 According to another embodiment of the present invention, a film thickness measurement device is proposed, including: a burst unit, which bursts a plurality of excitation sources from the upper surface of the film sample to be tested to the bottom surface at one time point, so that the film thickness on the film sample to be tested At least one deformation area is generated on the surface; the above-mentioned device for detecting the change of the reflected beam is provided to obtain information on the peak signal intensity change of the polarized reflected beam 5b' corresponding to the deformation area; the calculation unit calculates the time interval of the film sample to be tested according to the time interval corresponding to the peak value. thickness. The implementation principle and technical effect of this device are similar to those of the above-mentioned device for detecting changes in reflected light beams, and will not be repeated here.

本領域的技術人員容易理解,以上所述僅為本發明的較佳實施例而已,並不用以限制本發明,凡在本發明的精神和原則之內所作的任何修改、等同替換和改進等,均應包含在本發明的保護範圍之內。 It is easy for those skilled in the art to understand that the above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. Any modifications, equivalent replacements and improvements made within the spirit and principles of the present invention, All should be included within the protection scope of the present invention.

1a:入射泵浦光 1a: Incident pump light

1b:反射泵浦光 1b: Reflected pump light

2:薄膜樣品 2: Film sample

3a:上表面 3a: Upper surface

3b:下表面 3b: Lower surface

4:形變區 4: Deformation zone

5a:入射光束 5a: Incident beam

5b:反射光 5b: Reflected light

7:第一光瞳分割器 7: The first pupil divider

8:第二光瞳分割器 8: Second pupil divider

9:第一準直光學元件 9: The first collimating optical element

10:第二準直光學元件 10: The second collimating optical element

11:探測器 11: Detector

12:探測器 12: Detector

Claims (10)

一種探測反射光變化的裝置,其中,所述裝置包括:至少一個用於產生入射光束(5a)的探測光源;設置於探測光源光路後的至少一個第一光瞳分割器(7),用於將所述入射光束(5a)進行場強分割使得所述入射光束(5a)在所述第一光瞳分割器(7)的第一表面形成第一場強分佈;設置於第一光瞳分割器(7)光路後的第一準直光學元件(9),用於準直匯聚具有第一場強分佈的入射光束斜入射至待測體表面以形成具有第二場強分佈的反射光束(5b);設置於反射光路上的第二準直光學元件(10),用於接收視場範圍內具有第二場強分佈的反射光束並準直以形成具有第三場強分佈的反射光束;設置於第二準直光學元件(10)光路後的第二光瞳分割器(8),用於接收具有第三場強分佈的反射光束進行場強分割,使得所述具有第三場強分佈的反射光束在所述第二光瞳分割器(8)的第一表面形成第四場強分佈,所述第一光瞳分割器(7)和第二光瞳分割器(8)具有相同的孔徑函數;探測器(11),用於獲取具有第四場強分佈的反射光束,解析時間間隔內具有第四場強分佈的反射光束變化資訊。 A device for detecting changes in reflected light, wherein the device includes: at least one detection light source for generating an incident light beam (5a); at least one first pupil divider (7) arranged behind the light path of the detection light source for The incident light beam (5a) is subjected to field intensity division such that the incident light beam (5a) forms a first field intensity distribution on the first surface of the first pupil divider (7); The first collimating optical element (9) after the optical path of the device (7) is used for collimating and converging the incident beam with the first field intensity distribution obliquely incident on the surface of the object to be measured to form a reflected beam with the second field intensity distribution ( 5b); the second collimating optical element (10) arranged on the reflected optical path is used to receive the reflected light beam with the second field intensity distribution within the field of view and collimate to form a reflected light beam with the third field intensity distribution; The second pupil divider (8) arranged behind the light path of the second collimating optical element (10) is used to receive the reflected light beam with the third field intensity distribution for field intensity division, so that the said light beam with the third field intensity distribution The reflected beam of the second pupil divider (8) forms a fourth field intensity distribution on the first surface of the second pupil divider (8), and the first pupil divider (7) and the second pupil divider (8) have the same Aperture function; a detector (11), used for acquiring reflected light beams with a fourth field intensity distribution, and analyzing change information of reflected light beams with a fourth field intensity distribution within a time interval. 如請求項1所述的探測反射光變化的裝置,其中,所述第一準直光學元件(9)與所述第二準直光學元件(10)組成光路準直系統,所述第一光瞳分割器(7)設置於所述光路準直系統的入瞳位置,所述第二準直光學元件(10)設置於所述光路準直系統的出瞳位置。 The device for detecting changes in reflected light according to claim 1, wherein the first collimating optical element (9) and the second collimating optical element (10) form an optical path collimation system, and the first light The pupil divider (7) is arranged at the entrance pupil position of the optical path collimation system, and the second collimating optical element (10) is arranged at the exit pupil position of the optical path collimation system. 如請求項1或2所述的探測反射光變化的裝置,其中,所述第一光瞳分割器(7)設置有多個第一類型通光結構和多個第二類型通光結構,所述第 一類型通光結構和所述第二類型通光結構具有光通量的差別,以使得入射光束(5a)被所述第一類型通光結構和所述第二類型通光結構擾動分割,成為所述具有第一場強分佈的入射光束。 The device for detecting changes in reflected light according to claim 1 or 2, wherein the first pupil divider (7) is provided with a plurality of first-type light-passing structures and a plurality of second-type light-passing structures, so Said the first The first-type light-passing structure and the second-type light-passing structure have a difference in luminous flux, so that the incident beam (5a) is disturbed and divided by the first-type light-passing structure and the second-type light-passing structure, and becomes the An incident beam with a first field intensity distribution. 如請求項3所述的探測反射光變化的裝置,其中,所述第二光瞳分割器(8)設置有多個第三類型通光結構和多個第四類型通光結構,所述第三類型通光結構和所述第四類型通光結構具有光通量的差別,以使得所述具有第三場強分佈的反射光束被進一步擾動分割為所述具有第四場強分佈的反射光束。 The device for detecting changes in reflected light according to claim 3, wherein the second pupil divider (8) is provided with a plurality of third-type light-passing structures and a plurality of fourth-type light-passing structures, and the first The three-type light-passing structure and the fourth-type light-passing structure have differences in luminous flux, so that the reflected light beam with the third field intensity distribution is further disturbed and divided into the reflected light beam with the fourth field intensity distribution. 如請求項4所述的探測反射光變化的裝置,其中,所述第一類型通光結構與所述第三類型通光結構一一對應,互相對應的第一類型通光結構和第三類型通光結構的形狀相同。 The device for detecting changes in reflected light according to claim 4, wherein the first type of light-transmitting structure corresponds to the third type of light-transmitting structure, and the first type of light-transmitting structure and the third type of light-transmitting structure correspond to each other The shapes of the light-passing structures are the same. 如請求項4所述的探測反射光變化的裝置,其中,通過設置所述第一準直光學元件(9)的組成結構實現所述第一準直光學元件(9)的視場調節,使得所述第一光瞳分割器(7)的像清晰照射於所述待測體;通過設置所述第二準直光學元件(10)的組成結構實現所述第二準直光學元件(10)的視場調節,使得用具有第二場強分佈的反射光束(5b)準直後射入所述第二光瞳分割器(8)。 The device for detecting changes in reflected light as claimed in claim 4, wherein the adjustment of the field of view of the first collimating optical element (9) is realized by setting the composition structure of the first collimating optical element (9), so that The image of the first pupil divider (7) is clearly irradiated on the object to be measured; the second collimating optical element (10) is realized by setting the composition structure of the second collimating optical element (10) The field of view is adjusted so that the reflected light beam (5b) with the second field intensity distribution is collimated and enters the second pupil divider (8). 如請求項4所述的探測反射光變化的裝置,其中,所述第一光瞳分割器(7)和所述第二光瞳分割器(8)相對於入射光路和反射光路呈軸對稱。 The device for detecting changes in reflected light according to claim 4, wherein the first pupil divider (7) and the second pupil divider (8) are axially symmetrical with respect to the incident light path and the reflected light path. 如請求項3所述的探測反射光變化的裝置,其中,多個第一類型通光結構對應的通光圖案不同。 The device for detecting changes in reflected light as claimed in Claim 3, wherein the light transmission patterns corresponding to the plurality of first type light transmission structures are different. 一種探測反射光變化的方法,其中,所述方法包括: 利用第一光瞳分割器(7)將入射光束(5a)進行場強分割使得所述入射光束(5a)在所述第一光瞳分割器(7)的第一表面形成第一場強分佈;準直匯聚具有第一場強分佈的入射光束斜入射至待測體表面以形成具有第二場強分佈的反射光束(5b);接收具有第二場強分佈的反射光束並準直以形成具有第三場強分佈的反射光束;利用第二光瞳分割器(8)接收具有第三場強分佈的反射光束進行場強分割,使得所述具有第三場強分佈的反射光束在所述第二光瞳分割器(8)的第一表面形成第四場強分佈,所述第一光瞳分割器(7)和第二光瞳分割器(8)具有相同的孔徑函數;獲取具有第四場強分佈的反射光束,解析時間間隔內具有第四場強分佈的反射光束變化資訊。 A method of detecting changes in reflected light, wherein the method comprises: Utilize the first pupil divider (7) to carry out the field strength division of the incident light beam (5a) so that the said incident light beam (5a) forms a first field intensity distribution on the first surface of the first pupil divider (7) ; collimating and converging the incident beam with the first field intensity distribution obliquely incident on the surface of the object to be measured to form a reflected beam (5b) with the second field intensity distribution; receiving the reflected beam with the second field intensity distribution and collimating to form Have the reflected light beam of the 3rd field intensity distribution; Utilize the second pupil divider (8) to receive the reflected light beam with the 3rd field intensity distribution and carry out field intensity division, make the described reflected light beam with the 3rd field intensity distribution in the described The fourth field intensity distribution is formed by the first surface of the second pupil divider (8), said first pupil divider (7) and the second pupil divider (8) having the same aperture function; Reflected beams with four field intensity distributions, analyzing change information of reflected beams with a fourth field intensity distribution within a time interval. 一種膜厚測量裝置,其中,包括:猝發單元(1),在一個時間點從待測膜樣品(2)的上表面(3a)向下底面(3b)猝發多個激勵源,以使所述待測膜樣品(2)上表面產生至少一形變區域;提供如1-8中任一項所述的探測反射光束變化的裝置,獲取所述形變區域對應偏振反射光束信號強度峰值變化資訊;計算單元,根據峰值對應的時間間隔計算出待測膜樣品(2)的厚度。 A film thickness measuring device, which includes: a burst unit (1), which bursts a plurality of excitation sources from the upper surface (3a) to the lower surface (3b) of a film sample (2) to be measured at a time point, so that the At least one deformation region is produced on the upper surface of the film sample (2) to be tested; the device for detecting the change of the reflected beam as described in any one of 1-8 is provided, and the information on the peak value change of the polarized reflected beam signal intensity corresponding to the deformation region is obtained; calculation The unit calculates the thickness of the film sample (2) to be tested according to the time interval corresponding to the peak value.
TW111100536A 2021-03-04 2022-01-06 Device and method for detecting changes in reflected light TWI788180B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202110240243.2 2021-03-04
CN202110240243.2A CN113048894B (en) 2021-03-04 2021-03-04 Device and method for detecting change of reflected light and film thickness measuring device

Publications (2)

Publication Number Publication Date
TW202235813A TW202235813A (en) 2022-09-16
TWI788180B true TWI788180B (en) 2022-12-21

Family

ID=76509941

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111100536A TWI788180B (en) 2021-03-04 2022-01-06 Device and method for detecting changes in reflected light

Country Status (3)

Country Link
KR (1) KR102660911B1 (en)
CN (1) CN113048894B (en)
TW (1) TWI788180B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113959353B (en) * 2021-10-20 2024-05-14 武汉奥绿新生物科技股份有限公司 Optical titanium nail detection platform
CN114295064B (en) * 2021-12-18 2024-04-19 上海精测半导体技术有限公司 Optical measurement device, optical measurement method, and photoacoustic film thickness measurement system
CN120488973B (en) * 2025-07-15 2025-09-12 翌颖科技(上海)有限公司 High-precision reflective film thickness measuring method and system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101358835A (en) * 2008-08-13 2009-02-04 哈尔滨工业大学 Super-resolution polychromatic differential confocal measurement device and method
TW201129775A (en) * 2009-08-31 2011-09-01 Zygo Corp Fiber-based interferometer system for monitoring an imaging interferometer
US20140285881A1 (en) * 2013-03-19 2014-09-25 Olympus Corporation Super-resolution microscope
CN111279248A (en) * 2017-10-27 2020-06-12 3M创新有限公司 Optical system

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05141924A (en) * 1991-06-17 1993-06-08 Nikon Corp Film thickness measuring device
US5486701A (en) * 1992-06-16 1996-01-23 Prometrix Corporation Method and apparatus for measuring reflectance in two wavelength bands to enable determination of thin film thickness
GB0419772D0 (en) * 2004-09-07 2004-10-06 Scalar Technologies Ltd Method and apparatus for thin film metrology
CN101490538B (en) * 2006-08-02 2013-03-27 株式会社尼康 Defect detecting apparatus and defect detecting method
JP2012018003A (en) * 2010-07-06 2012-01-26 Nikon Corp Surface inspection method and surface inspection device
EP3624174B1 (en) * 2013-09-16 2024-08-21 Kla-Tencor Corporation Multiple angles of incidence semiconductor metrology systems and methods
CN110907468B (en) * 2019-12-09 2021-07-30 上海精测半导体技术有限公司 Surface detection device and method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101358835A (en) * 2008-08-13 2009-02-04 哈尔滨工业大学 Super-resolution polychromatic differential confocal measurement device and method
TW201129775A (en) * 2009-08-31 2011-09-01 Zygo Corp Fiber-based interferometer system for monitoring an imaging interferometer
US20140285881A1 (en) * 2013-03-19 2014-09-25 Olympus Corporation Super-resolution microscope
CN111279248A (en) * 2017-10-27 2020-06-12 3M创新有限公司 Optical system

Also Published As

Publication number Publication date
TW202235813A (en) 2022-09-16
KR102660911B1 (en) 2024-04-25
CN113048894A (en) 2021-06-29
CN113048894B (en) 2022-10-18
KR20220125159A (en) 2022-09-14

Similar Documents

Publication Publication Date Title
TWI788180B (en) Device and method for detecting changes in reflected light
CN113155040B (en) Device and method for detecting angle change of reflected light beam and film thickness measuring device
US6188478B1 (en) Method and apparatus for film-thickness measurements
KR102069904B1 (en) Apparatus for detecting a 3d structure of an object
CN113091624B (en) Device and method for detecting change of reflected light
US6320665B1 (en) Acousto optic scanning laser vibrometer for determining the dynamic properties of an object
CN114127539B (en) Nondestructive testing and manufacturing metrology systems and methods
US5338924A (en) Apparatus and method for automatic focusing of light using a fringe plate
CN114279346B (en) Optical measurement device, optical measurement method, and photoacoustic film thickness measurement system
TW202235814A (en) Apparatus, method and film thickness measuring apparatus for detecting changes in reflected light
CN113634877A (en) Laser processing device and method
CN112729135B (en) Area array frequency sweep distance measuring/thickness measuring device and method with active optical anti-shake function
CN108747029A (en) A kind of teaching type laser engraving cutter and control method, application
CN112684460A (en) Area array sweep frequency measuring device and method
CN112731345A (en) Vibration-proof type area array frequency sweep distance measuring/thickness measuring device and method with active optical anti-shake function
US5815272A (en) Filter for laser gaging system
CN115200471B (en) A speckle device for wire bonding machine and control method thereof
US20240009761A1 (en) Device and Method for Determining a Focal Point
CN118706273A (en) A frequency-resolving optical switch device and method based on reflective Fresnel biprism
CN119952316A (en) Optical distance measuring sensors and laser processing equipment
CN201561804U (en) Single-shot ultrashort laser pulse contrast measurement device
CN120426905A (en) A device for detecting microscopic three-dimensional morphology
TW201443480A (en) Scanning lens and interferometric measuring device using same