TWI416260B - 正型感光性樹脂組成物 - Google Patents

正型感光性樹脂組成物 Download PDF

Info

Publication number: TWI416260B
Authority: TW; Taiwan
Prior art keywords: compound; resin composition; photosensitive resin; group; positive photosensitive
Prior art date: 2007-03-30

Application number

TW97109977A

Other languages

English (en)

Chinese (zh)

Other versions

TW200903163A (en

Inventor

Kazuto Miyoshi

Daichi Miyazaki

Masao Tomikawa

Original Assignee

Toray Industries

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2007-03-30

Filing date

2008-03-21

Publication date

2013-11-21

2008-03-21 Application filed by Toray Industries filed Critical Toray Industries

2009-01-16 Publication of TW200903163A publication Critical patent/TW200903163A/zh

2013-11-21 Application granted granted Critical

2013-11-21 Publication of TWI416260B publication Critical patent/TWI416260B/zh

Links

239000011342 resin composition Substances 0.000 title claims abstract description 57
-1 quinonediazide compound Chemical class 0.000 claims abstract description 68
238000010438 heat treatment Methods 0.000 claims abstract description 35
125000004432 carbon atom Chemical group C* 0.000 claims abstract description 22
125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 17
125000000962 organic group Chemical group 0.000 claims abstract description 15
125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 3
150000001875 compounds Chemical class 0.000 claims description 73
239000000758 substrate Substances 0.000 claims description 57
NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 26
229920006015 heat resistant resin Polymers 0.000 claims description 21
229920005989 resin Polymers 0.000 claims description 12
239000011347 resin Substances 0.000 claims description 12
125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 10
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 10
229920000656 polylysine Polymers 0.000 claims description 8
108010039918 Polylysine Proteins 0.000 claims description 7
230000005525 hole transport Effects 0.000 claims description 5
238000004519 manufacturing process Methods 0.000 claims description 5
238000000059 patterning Methods 0.000 claims description 4
239000010409 thin film Substances 0.000 claims description 3
238000005401 electroluminescence Methods 0.000 claims 1
239000000126 substance Substances 0.000 abstract description 46
239000002253 acid Substances 0.000 abstract description 10
150000002148 esters Chemical class 0.000 abstract description 7
239000004952 Polyamide Substances 0.000 abstract 2
229920002647 polyamide Polymers 0.000 abstract 2
239000010410 layer Substances 0.000 description 94
239000010408 film Substances 0.000 description 84
238000006243 chemical reaction Methods 0.000 description 25
238000000034 method Methods 0.000 description 25
239000000243 solution Substances 0.000 description 23
SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 20
GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 20
230000015572 biosynthetic process Effects 0.000 description 17
238000009413 insulation Methods 0.000 description 17
230000035945 sensitivity Effects 0.000 description 16
239000003513 alkali Substances 0.000 description 15
239000002981 blocking agent Substances 0.000 description 14
238000003786 synthesis reaction Methods 0.000 description 14
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 13
238000000576 coating method Methods 0.000 description 13
239000000203 mixture Substances 0.000 description 13
YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 12
150000002430 hydrocarbons Chemical group 0.000 description 12
125000002887 hydroxy group Chemical group [H]O* 0.000 description 12
229920002120 photoresistant polymer Polymers 0.000 description 12
229920000642 polymer Polymers 0.000 description 12
238000011161 development Methods 0.000 description 11
239000011521 glass Substances 0.000 description 11
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 10
239000011248 coating agent Substances 0.000 description 10
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
230000001681 protective effect Effects 0.000 description 9
239000002966 varnish Substances 0.000 description 9
WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 8
LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 8
238000006116 polymerization reaction Methods 0.000 description 8
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 7
150000008065 acid anhydrides Chemical class 0.000 description 7
230000000052 comparative effect Effects 0.000 description 7
238000011156 evaluation Methods 0.000 description 7
239000007787 solid Substances 0.000 description 7
239000004094 surface-active agent Substances 0.000 description 7
MSTZGVRUOMBULC-UHFFFAOYSA-N 2-amino-4-[2-(3-amino-4-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phenol Chemical compound C1=C(O)C(N)=CC(C(C=2C=C(N)C(O)=CC=2)(C(F)(F)F)C(F)(F)F)=C1 MSTZGVRUOMBULC-UHFFFAOYSA-N 0.000 description 6
NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical group C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 6
UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 6
108091034057 RNA (poly(A)) Proteins 0.000 description 6
YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
239000003795 chemical substances by application Substances 0.000 description 6
KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
229910052731 fluorine Inorganic materials 0.000 description 6
239000007788 liquid Substances 0.000 description 6
ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
229920000768 polyamine Polymers 0.000 description 6
239000002243 precursor Substances 0.000 description 6
125000006158 tetracarboxylic acid group Chemical group 0.000 description 6
238000007740 vapor deposition Methods 0.000 description 6
125000001931 aliphatic group Chemical group 0.000 description 5
239000007864 aqueous solution Substances 0.000 description 5
125000003118 aryl group Chemical group 0.000 description 5
DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 5
150000004985 diamines Chemical class 0.000 description 5
238000001914 filtration Methods 0.000 description 5
239000003112 inhibitor Substances 0.000 description 5
239000011159 matrix material Substances 0.000 description 5
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
229910052753 mercury Inorganic materials 0.000 description 5
229910052757 nitrogen Inorganic materials 0.000 description 5
229920005575 poly(amic acid) Polymers 0.000 description 5
229920001721 polyimide Polymers 0.000 description 5
239000002244 precipitate Substances 0.000 description 5
150000003254 radicals Chemical class 0.000 description 5
MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 4
239000004593 Epoxy Substances 0.000 description 4
QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
230000018044 dehydration Effects 0.000 description 4
238000006297 dehydration reaction Methods 0.000 description 4
238000004090 dissolution Methods 0.000 description 4
229940116333 ethyl lactate Drugs 0.000 description 4
125000001153 fluoro group Chemical group F* 0.000 description 4
FBSFWRHWHYMIOG-UHFFFAOYSA-N methyl 3,4,5-trihydroxybenzoate Chemical compound COC(=O)C1=CC(O)=C(O)C(O)=C1 FBSFWRHWHYMIOG-UHFFFAOYSA-N 0.000 description 4
239000003607 modifier Substances 0.000 description 4
150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 4
229920003986 novolac Polymers 0.000 description 4
108010026466 polyproline Proteins 0.000 description 4
LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 4
238000007789 sealing Methods 0.000 description 4
239000002904 solvent Substances 0.000 description 4
238000012719 thermal polymerization Methods 0.000 description 4
KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 3
ILTGLWXJMQLBBI-UHFFFAOYSA-N 2,6-bis(ethoxymethyl)-4-methylphenol Chemical compound CCOCC1=CC(C)=CC(COCC)=C1O ILTGLWXJMQLBBI-UHFFFAOYSA-N 0.000 description 3
KUMMBDBTERQYCG-UHFFFAOYSA-N 2,6-bis(hydroxymethyl)-4-methylphenol Chemical compound CC1=CC(CO)=C(O)C(CO)=C1 KUMMBDBTERQYCG-UHFFFAOYSA-N 0.000 description 3
VRMKFAFIVOVETG-UHFFFAOYSA-N 2,6-bis(methoxymethyl)-4-methylphenol Chemical compound COCC1=CC(C)=CC(COC)=C1O VRMKFAFIVOVETG-UHFFFAOYSA-N 0.000 description 3
ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
SHDBJOYDLRRTRA-UHFFFAOYSA-N 4-tert-butyl-2,6-bis(methoxymethyl)phenol Chemical compound COCC1=CC(C(C)(C)C)=CC(COC)=C1O SHDBJOYDLRRTRA-UHFFFAOYSA-N 0.000 description 3
101001074560 Arabidopsis thaliana Aquaporin PIP1-2 Proteins 0.000 description 3
VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 3
FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
239000004642 Polyimide Substances 0.000 description 3
KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 3
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
150000001335 aliphatic alkanes Chemical class 0.000 description 3
229910052782 aluminium Inorganic materials 0.000 description 3
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
230000015556 catabolic process Effects 0.000 description 3
239000012295 chemical reaction liquid Substances 0.000 description 3
150000005690 diesters Chemical class 0.000 description 3
239000011737 fluorine Substances 0.000 description 3
238000004817 gas chromatography Methods 0.000 description 3
229930195733 hydrocarbon Natural products 0.000 description 3
238000003384 imaging method Methods 0.000 description 3
239000011229 interlayer Substances 0.000 description 3
VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
238000012545 processing Methods 0.000 description 3
238000006722 reduction reaction Methods 0.000 description 3
238000004528 spin coating Methods 0.000 description 3
DIIIISSCIXVANO-UHFFFAOYSA-N 1,2-Dimethylhydrazine Chemical compound CNNC DIIIISSCIXVANO-UHFFFAOYSA-N 0.000 description 2
VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 2
WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 2
AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 2
ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 2
BXVXPASMKWYBFD-UHFFFAOYSA-N 2-[[2-hydroxy-3-(hydroxymethyl)-5-methylphenyl]methyl]-6-(hydroxymethyl)-4-methylphenol Chemical compound CC1=CC(CO)=C(O)C(CC=2C(=C(CO)C=C(C)C=2)O)=C1 BXVXPASMKWYBFD-UHFFFAOYSA-N 0.000 description 2
CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 2
229940018563 3-aminophenol Drugs 0.000 description 2
IJFXRHURBJZNAO-UHFFFAOYSA-N 3-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=CC(O)=C1 IJFXRHURBJZNAO-UHFFFAOYSA-N 0.000 description 2
ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 2
FYYYKXFEKMGYLZ-UHFFFAOYSA-N 4-(1,3-dioxo-2-benzofuran-5-yl)-2-benzofuran-1,3-dione Chemical compound C=1C=C2C(=O)OC(=O)C2=CC=1C1=CC=CC2=C1C(=O)OC2=O FYYYKXFEKMGYLZ-UHFFFAOYSA-N 0.000 description 2
HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
IWXCYYWDGDDPAC-UHFFFAOYSA-N 4-[(3,4-dicarboxyphenyl)methyl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1CC1=CC=C(C(O)=O)C(C(O)=O)=C1 IWXCYYWDGDDPAC-UHFFFAOYSA-N 0.000 description 2
JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 2
KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 2
PRCXWQQHCAVEEL-UHFFFAOYSA-N 4-[dicarboxy-(3,4-dicarboxyphenyl)methyl]phthalic acid Chemical compound C1=CC(=C(C=C1C(C2=CC(=C(C=C2)C(=O)O)C(=O)O)(C(=O)O)C(=O)O)C(=O)O)C(=O)O PRCXWQQHCAVEEL-UHFFFAOYSA-N 0.000 description 2
PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
JXYITCJMBRETQX-UHFFFAOYSA-N 4-ethynylaniline Chemical compound NC1=CC=C(C#C)C=C1 JXYITCJMBRETQX-UHFFFAOYSA-N 0.000 description 2
OLIGPHACAFRDEN-UHFFFAOYSA-N 4-naphthoquinonediazidesulfonyl group Chemical group [N-]=[N+]=C1C=C(C2=C(C=CC=C2)C1=O)S(=O)=O OLIGPHACAFRDEN-UHFFFAOYSA-N 0.000 description 2
VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 2
QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 2
KHLBYJOGKPIERQ-UHFFFAOYSA-N 5-naphthoquinonediazidesulfonyl group Chemical group [N-]=[N+]=C1C=CC2=C(C=CC=C2S(=O)=O)C1=O KHLBYJOGKPIERQ-UHFFFAOYSA-N 0.000 description 2
DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
GIUOFXNELDXLDW-UHFFFAOYSA-N C1=CC(=C(C(=C1)C(C2=CC=CC(=C2C(=O)O)C(=O)O)(C(=O)O)C(=O)O)C(=O)O)C(=O)O Chemical compound C1=CC(=C(C(=C1)C(C2=CC=CC(=C2C(=O)O)C(=O)O)(C(=O)O)C(=O)O)C(=O)O)C(=O)O GIUOFXNELDXLDW-UHFFFAOYSA-N 0.000 description 2
239000004215 Carbon black (E152) Substances 0.000 description 2
RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
ZSXGLVDWWRXATF-UHFFFAOYSA-N N,N-dimethylformamide dimethyl acetal Chemical compound COC(OC)N(C)C ZSXGLVDWWRXATF-UHFFFAOYSA-N 0.000 description 2
JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
238000010521 absorption reaction Methods 0.000 description 2
150000001252 acrylic acid derivatives Chemical class 0.000 description 2
125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
150000001412 amines Chemical class 0.000 description 2
RWZYAGGXGHYGMB-UHFFFAOYSA-N anthranilic acid Chemical compound NC1=CC=CC=C1C(O)=O RWZYAGGXGHYGMB-UHFFFAOYSA-N 0.000 description 2
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
239000002738 chelating agent Substances 0.000 description 2
229930003836 cresol Natural products 0.000 description 2
238000004132 cross linking Methods 0.000 description 2
JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
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VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical class OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
238000001771 vacuum deposition Methods 0.000 description 1
NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
238000012800 visualization Methods 0.000 description 1
238000001039 wet etching Methods 0.000 description 1
230000037303 wrinkles Effects 0.000 description 1
239000008096 xylene Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

Physics & Mathematics (AREA)
Chemical & Material Sciences (AREA)
Spectroscopy & Molecular Physics (AREA)
Medicinal Chemistry (AREA)
Polymers & Plastics (AREA)
Organic Chemistry (AREA)
Health & Medical Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
General Physics & Mathematics (AREA)
Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Electroluminescent Light Sources (AREA)
Macromonomer-Based Addition Polymer (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Materials For Photolithography (AREA)

TW97109977A 2007-03-30 2008-03-21 正型感光性樹脂組成物 TWI416260B (zh)

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JP4957467B2 (ja) *	2007-09-04	2012-06-20	東レ株式会社	ジアミン化合物、それを用いた耐熱性樹脂前駆体およびポジ型感光性樹脂組成物
CN102047178B (zh) *	2008-05-29	2014-05-28	旭化成电子材料株式会社	感光性树脂组合物
JP5540483B2 (ja) *	2008-08-29	2014-07-02	Ｊｎｃ株式会社	熱硬化性組成物、該組成物の製造方法および該組成物の用途
JP5477527B2 (ja) *	2008-09-30	2014-04-23	日産化学工業株式会社	末端官能基含有ポリイミドを含むポジ型感光性樹脂組成物
JP4544370B2 (ja) *	2008-10-28	2010-09-15	Ｊｓｒ株式会社	感放射線性樹脂組成物、層間絶縁膜及びマイクロレンズ、並びにそれらの製造方法
JP5593676B2 (ja) *	2009-10-22	2014-09-24	ソニー株式会社	表示装置および表示装置の製造方法
JP5610794B2 (ja) *	2010-03-03	2014-10-22	東京応化工業株式会社	ポジ型感光性樹脂組成物及びその硬化物
JP5644476B2 (ja) *	2010-12-22	2014-12-24	東レ株式会社	感光性樹脂組成物、それを用いた硬化膜、半導体装置の製造方法および半導体装置
KR101400186B1 (ko)	2010-12-31	2014-05-27	제일모직 주식회사	포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
JP6332022B2 (ja) *	2012-12-20	2018-05-30	東レ株式会社	感光性樹脂組成物、耐熱性樹脂膜の製造方法および表示装置
CN105829967B (zh) *	2013-10-21	2020-02-07	日产化学工业株式会社	正型感光性树脂组合物
JPWO2015118836A1 (ja) *	2014-02-10	2017-03-23	日立化成デュポンマイクロシステムズ株式会社	ポリイミド前駆体を含む樹脂組成物、硬化膜の製造方法及び電子部品
JP6459191B2 (ja) *	2014-03-19	2019-01-30	東レ株式会社	感光性樹脂組成物
GB2572608A (en)	2018-04-03	2019-10-09	Ilika Tech Ltd	Laser processing method for thin film structures
WO2020183617A1 (ja) *	2019-03-12	2020-09-17	日立化成株式会社	感光性樹脂組成物、パターン硬化膜及びその製造方法、半導体素子並びに電子デバイス
CN115685681B (zh) *	2021-07-27	2025-05-20	吉林奥来德光电材料股份有限公司	树脂组合物、树脂膜及显示器件
CN114316263B (zh) *	2022-01-17	2023-02-03	深圳职业技术学院	交联型聚酰胺酸酯、其制备方法、包含其的聚酰亚胺组合物及聚酰亚胺树脂膜的制备方法
CN118240212B (zh) *	2023-12-25	2025-10-31	比亚迪股份有限公司	用于电泳形成聚酰亚胺的材料、绝缘材料及电泳涂装方法

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WO2008123053A1 (ja)	2008-10-16
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JPWO2008123053A1 (ja)	2010-07-15

Publication	Publication Date	Title
TWI416260B (zh)	2013-11-21	正型感光性樹脂組成物
CN101993537B (zh)	2014-03-26	碱溶性聚合物、包含其的感光性树脂组合物及其用途
TWI725250B (zh)	2021-04-21	樹脂組成物、樹脂薄片、硬化膜、有機ｅｌ顯示裝置、半導體電子零件、半導體裝置及有機ｅｌ顯示裝置之製造方法
TWI693468B (zh)	2020-05-11	感光性樹脂組成物及電子零件
TWI752987B (zh)	2022-01-21	樹脂組成物
JP4082041B2 (ja)	2008-04-30	ポジ型感光性樹脂前駆体組成物及びそれを用いた電子部品ならびに表示装置
JP7720679B2 (ja)	2025-08-08	樹脂組成物、樹脂シート、硬化膜
JP4333219B2 (ja)	2009-09-16	感光性樹脂組成物および耐熱性樹脂膜の製造方法
CN100480855C (zh)	2009-04-22	感光性树脂组合物和耐热性树脂膜的制造方法
TW201800851A (zh)	2018-01-01	硬化膜及正型感光性樹脂組成物
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KR102599867B1 (ko)	2023-11-09	감광성 수지 조성물
JP2010229210A (ja)	2010-10-14	樹脂組成物
JP2021148891A (ja)	2021-09-27	感光性樹脂組成物、硬化膜、表示装置及び硬化膜の製造方法
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WO2025225491A1 (ja)	2025-10-30	感光性樹脂組成物、硬化物、有機ｅｌ表示装置
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