TWI480695B - A photosensitive material, a photosensitive material precursor, and a photosensitive material - Google Patents

A photosensitive material, a photosensitive material precursor, and a photosensitive material Download PDF

Info

Publication number: TWI480695B
Authority: TW; Taiwan
Prior art keywords: photosensitive material; derivative; addition polymerization; group; polymer substrate
Prior art date: 2009-03-31

Application number

TW099109654A

Other languages

English (en)

Chinese (zh)

Other versions

TW201106104A (en

Inventor

Takehiro Shimizu

Yuichi Taniguchi

Kazuyoshi Masaki

Toshio Ando

Yasuji Shichijo

Original Assignee

Nippon Steel & Sumikin Chem Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2009-03-31

Filing date

2010-03-30

Publication date

2015-04-11

2010-03-30 Application filed by Nippon Steel & Sumikin Chem Co filed Critical Nippon Steel & Sumikin Chem Co

2011-02-16 Publication of TW201106104A publication Critical patent/TW201106104A/zh

2015-04-11 Application granted granted Critical

2015-04-11 Publication of TWI480695B publication Critical patent/TWI480695B/zh

Links

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125000002791 glucosyl group Chemical class C1([C@H](O)[C@@H](O)[C@H](O)[C@H](O1)CO)* 0.000 description 1
125000005843 halogen group Chemical group 0.000 description 1
125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
238000001093 holography Methods 0.000 description 1
125000005113 hydroxyalkoxy group Chemical group 0.000 description 1
230000001771 impaired effect Effects 0.000 description 1
230000006872 improvement Effects 0.000 description 1
239000004615 ingredient Substances 0.000 description 1
239000003999 initiator Substances 0.000 description 1
IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
230000035800 maturation Effects 0.000 description 1
229940017219 methyl propionate Drugs 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
239000012299 nitrogen atmosphere Substances 0.000 description 1
NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 1
TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
150000002902 organometallic compounds Chemical class 0.000 description 1
230000001151 other effect Effects 0.000 description 1
239000000825 pharmaceutical preparation Substances 0.000 description 1
229940127557 pharmaceutical product Drugs 0.000 description 1
RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
238000012708 photoinduced radical polymerization Methods 0.000 description 1
239000004014 plasticizer Substances 0.000 description 1
229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
239000004417 polycarbonate Substances 0.000 description 1
229920000515 polycarbonate Polymers 0.000 description 1
229920000728 polyester Polymers 0.000 description 1
229920000139 polyethylene terephthalate Polymers 0.000 description 1
239000005020 polyethylene terephthalate Substances 0.000 description 1
239000004926 polymethyl methacrylate Substances 0.000 description 1
229920000098 polyolefin Polymers 0.000 description 1
229920001451 polypropylene glycol Polymers 0.000 description 1
229920002451 polyvinyl alcohol Polymers 0.000 description 1
229920000915 polyvinyl chloride Polymers 0.000 description 1
239000004800 polyvinyl chloride Substances 0.000 description 1
239000005033 polyvinylidene chloride Substances 0.000 description 1
238000002360 preparation method Methods 0.000 description 1
UFUASNAHBMBJIX-UHFFFAOYSA-N propan-1-one Chemical compound CC[C]=O UFUASNAHBMBJIX-UHFFFAOYSA-N 0.000 description 1
RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
239000002994 raw material Substances 0.000 description 1
230000009467 reduction Effects 0.000 description 1
230000001172 regenerating effect Effects 0.000 description 1
238000011160 research Methods 0.000 description 1
229920005989 resin Polymers 0.000 description 1
239000011347 resin Substances 0.000 description 1
230000004044 response Effects 0.000 description 1
238000007151 ring opening polymerisation reaction Methods 0.000 description 1
230000035945 sensitivity Effects 0.000 description 1
229920006268 silicone film Polymers 0.000 description 1
239000007787 solid Substances 0.000 description 1
125000006850 spacer group Chemical group 0.000 description 1
230000006641 stabilisation Effects 0.000 description 1
238000011105 stabilization Methods 0.000 description 1
239000003381 stabilizer Substances 0.000 description 1
239000011593 sulfur Substances 0.000 description 1
239000004094 surface-active agent Substances 0.000 description 1
150000003505 terpenes Chemical class 0.000 description 1
235000007586 terpenes Nutrition 0.000 description 1
229920001187 thermosetting polymer Polymers 0.000 description 1
150000003606 tin compounds Chemical class 0.000 description 1
238000012546 transfer Methods 0.000 description 1
238000002834 transmittance Methods 0.000 description 1
IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
239000013638 trimer Substances 0.000 description 1
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
229920002554 vinyl polymer Polymers 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/2403—Layers; Shape, structure or physical properties thereof
- G11B7/24035—Recording layers
- G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Chemical & Material Sciences (AREA)
Spectroscopy & Molecular Physics (AREA)
Chemical Kinetics & Catalysis (AREA)
Health & Medical Sciences (AREA)
Optics & Photonics (AREA)
Medicinal Chemistry (AREA)
Polymers & Plastics (AREA)
Organic Chemistry (AREA)
Holo Graphy (AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Optical Record Carriers And Manufacture Thereof (AREA)

TW099109654A 2009-03-31 2010-03-30 A photosensitive material, a photosensitive material precursor, and a photosensitive material TWI480695B (zh)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2009084709A JP2012111787A (ja)	2009-03-31	2009-03-31	感光性材料、感光性材料前駆体及び感光性材料の製造方法

Publications (2)

Publication Number	Publication Date
TW201106104A TW201106104A (en)	2011-02-16
TWI480695B true TWI480695B (zh)	2015-04-11

Family

ID=42828069

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW099109654A TWI480695B (zh)	2009-03-31	2010-03-30	A photosensitive material, a photosensitive material precursor, and a photosensitive material

Country Status (3)

Country	Link
JP (1)	JP2012111787A (fr)
TW (1)	TWI480695B (fr)
WO (1)	WO2010113777A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US20210155585A1 (en) *	2019-11-27	2021-05-27	Facebook Technologies, Llc	Anthraquinone derivatized monomers and polymers for volume bragg gratings
US11718580B2 (en)	2019-05-08	2023-08-08	Meta Platforms Technologies, Llc	Fluorene derivatized monomers and polymers for volume Bragg gratings
US11780819B2 (en)	2019-11-27	2023-10-10	Meta Platforms Technologies, Llc	Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings
US11879024B1 (en)	2020-07-14	2024-01-23	Meta Platforms Technologies, Llc	Soft mold formulations for surface relief grating fabrication with imprinting lithography

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2014535072A (ja) *	2011-10-12	2014-12-25	バイエル・インテレクチュアル・プロパティ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングＢａｙｅｒＩｎｔｅｌｌｅｃｔｕａｌＰｒｏｐｅｒｔｙＧｍｂＨ	ポリウレタン系フォトポリマー処方物における連鎖移動剤
JP5859280B2 (ja) *	2011-11-14	2016-02-10	新日鉄住金化学株式会社	感光性材料、ホログラフィック記録媒体、及びホログラフィック記録方法
WO2015068839A1 (fr) *	2013-11-11	2015-05-14	新日鉄住金化学株式会社	Composé polymérisable, composition de résine l'utilisant, résine durcie et matériau optique
JP6240547B2 (ja) *	2014-03-31	2017-11-29	新日鉄住金化学株式会社	多官能性共重合体及び硬化性樹脂組成物とその硬化物
US9921473B2 (en) *	2014-04-25	2018-03-20	Covestro Deutschland Ag	Aromatic glycol ethers as writing monomers in holographic photopolymer formulations
JP6388119B2 (ja) *	2014-09-19	2018-09-12	東洋インキＳｃホールディングス株式会社	活性エネルギー線重合性樹脂組成物、及びそれを用いてなる積層体
CN118546310B (zh) *	2024-05-30	2025-12-12	江汉大学	一种高介电性能的电子纸电泳液封装组合物及其封装方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TW200622500A (en) *	2004-11-01	2006-07-01	Nissan Chemical Ind Ltd	Underlayer coating forming composition for lithography containing cyclodextrin compound

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2006003388A (ja) *	2004-06-15	2006-01-05	Daiso Co Ltd	体積位相型ホログラム記録用感光性組成物、ホログラム記録媒体とその製法、およびホログラム記録法
JP2007238665A (ja) *	2006-03-06	2007-09-20	Jsr Corp	シクロデキストリン誘導体およびその製造方法ならびに光硬化性組成物
CN101606106B (zh) *	2007-02-05	2012-10-17	新日铁化学株式会社	体积相位全息记录材料及光信息记录介质
JP2010020260A (ja) *	2008-07-14	2010-01-28	Pioneer Electronic Corp	光記録媒体及び情報記録方法

2009
- 2009-03-31 JP JP2009084709A patent/JP2012111787A/ja not_active Withdrawn
2010
- 2010-03-26 WO PCT/JP2010/055319 patent/WO2010113777A1/fr not_active Ceased
- 2010-03-30 TW TW099109654A patent/TWI480695B/zh not_active IP Right Cessation

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TW200622500A (en) *	2004-11-01	2006-07-01	Nissan Chemical Ind Ltd	Underlayer coating forming composition for lithography containing cyclodextrin compound

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Y.Isobe,A.Sudo,and T.Endo,et. Thermally Dissociable Pseudo-Polyrotaxane as a Supramolecular Shrinkage Suppressor for Epoxy-Amine Curing System,Journal of Polymer Science：Part A：Polymer Chemistry,vol.46,pp.2305-2308(2008). *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US11718580B2 (en)	2019-05-08	2023-08-08	Meta Platforms Technologies, Llc	Fluorene derivatized monomers and polymers for volume Bragg gratings
US20210155585A1 (en) *	2019-11-27	2021-05-27	Facebook Technologies, Llc	Anthraquinone derivatized monomers and polymers for volume bragg gratings
US11780819B2 (en)	2019-11-27	2023-10-10	Meta Platforms Technologies, Llc	Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings
US11879024B1 (en)	2020-07-14	2024-01-23	Meta Platforms Technologies, Llc	Soft mold formulations for surface relief grating fabrication with imprinting lithography

Also Published As

Publication number	Publication date
JP2012111787A (ja)	2012-06-14
TW201106104A (en)	2011-02-16
WO2010113777A1 (fr)	2010-10-07

Publication	Publication Date	Title
TWI480695B (zh)	2015-04-11	A photosensitive material, a photosensitive material precursor, and a photosensitive material
JP5130230B2 (ja)	2013-01-30	体積位相型ホログラム記録材料及び光情報記録媒体
JP5923041B2 (ja)	2016-05-24	ホログラフィックフィルムの製造方法
JP5859280B2 (ja)	2016-02-10	感光性材料、ホログラフィック記録媒体、及びホログラフィック記録方法
RU2515977C2 (ru)	2014-05-20	Полиуретановая композиция для изготовления голографических сред, ее применение, способ записи голограмм и ненасыщенные уретаны
JP7134545B2 (ja)	2022-09-12	フォトポリマー組成物
KR102244648B1 (ko)	2021-04-26	포토폴리머 조성물
JP2005527867A (ja)	2005-09-15	アルミニウム塩化合物と不斉アクリレート化合物を含むホログラフィックデータ記録媒体
JP2004537620A (ja)	2004-12-16	ホログラフィック記録製品の迅速大量生産のための製造方法及び組成物
KR102157366B1 (ko)	2021-03-29	염료 화합물 및 포토폴리머 조성물
KR20130006421A (ko)	2013-01-16	상이한 기록 공단량체를 갖는 광중합체 제제
KR20100037557A (ko)	2010-04-09	낮은 가교 밀도를 갖는 광중합체 배합물
TW201920440A (zh)	2019-06-01	光聚合物組成物
EP2077471B1 (fr)	2012-07-25	Support d'enregistrement optique d'hologramme volumique, composition pour une formation de couche d'enregistrement d'hologramme volumique et matériau d'enregistrement d'hologramme volumique
JP6588719B2 (ja)	2019-10-09	感光性材料、ホログラフィック記録媒体およびホログラフィック記録方法
JP2008134623A (ja)	2008-06-12	体積ホログラム光記録媒体、体積ホログラム記録層形成用組成物及び体積ホログラム記録材料
Kuo et al.	2012	A facile sol–gel synthesis of crack-free photopolymerizable silica for holographic recording
JPWO2008123094A1 (ja)	2010-07-15	体積位相型ホログラム記録材料及びそれを用いた光情報記録媒体
CN101523305A (zh)	2009-09-02	体积全息光记录介质、体积全息记录层形成用组合物和体积全息记录材料

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Date	Code	Title	Description
2019-01-11	MM4A	Annulment or lapse of patent due to non-payment of fees

TWI480695B - A photosensitive material, a photosensitive material precursor, and a photosensitive material - Google Patents

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Applications Claiming Priority (1)

Publications (2)

Family

ID=42828069

Family Applications (1)

Country Status (3)

Cited By (4)

Families Citing this family (7)

Citations (1)

Family Cites Families (4)

Patent Citations (1)

Non-Patent Citations (1)

Cited By (4)

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