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TWI468103B - A protected film having an anti electromagnetic layer and its manufacturing method thereof - Google Patents

A protected film having an anti electromagnetic layer and its manufacturing method thereof Download PDF

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TWI468103B
TWI468103B TW100123336A TW100123336A TWI468103B TW I468103 B TWI468103 B TW I468103B TW 100123336 A TW100123336 A TW 100123336A TW 100123336 A TW100123336 A TW 100123336A TW I468103 B TWI468103 B TW I468103B
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layer
electromagnetic wave
electromagnetic
setting step
disposed
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TW100123336A
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TW201304675A (en
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Ching Hung Lin
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Sen Tien Printing Factory Co Ltd
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具抗電磁波層之防護薄膜及其製作方法Protective film with anti-electromagnetic wave layer and manufacturing method thereof

本發明係關於一種保護薄膜及其製作方法,特別是關於一種具抗電磁波層之保護薄膜及其製作方法。The invention relates to a protective film and a manufacturing method thereof, in particular to a protective film with an electromagnetic wave resistant layer and a manufacturing method thereof.

一般而言,電子設備,例如筆記型電腦,為現代人生活中所不可或缺的工具之一,其已廣泛應用於日常生活中。該電子設備之製作通常必須要考量到該電子設備之電磁相容性(Electromagnetic Compatibility,EMC),電磁相容性包含了電磁干擾(Electromagnetic Interference,EMI)性質及電磁耐受(Electromagnetic Susceptibility,EMS)性質。電磁干擾主要是電子設備由內部到外部之雜訊干擾;電磁耐受主要是電子設備承受由外部進入內部之雜訊的耐受性。如此,方可避免電子設備受到外部電磁干擾或干擾到其他外部之電子設備。In general, electronic devices, such as notebook computers, are one of the indispensable tools in modern life and have been widely used in everyday life. The manufacture of the electronic device usually requires consideration of the electromagnetic compatibility (EMC) of the electronic device. The electromagnetic compatibility includes Electromagnetic Interference (EMI) properties and Electromagnetic Susceptibility (EMS). nature. Electromagnetic interference is mainly caused by noise interference from the inside to the outside of the electronic equipment; electromagnetic resistance is mainly the tolerance of the electronic equipment to withstand the noise from the outside into the interior. In this way, the electronic device is protected from external electromagnetic interference or interference with other external electronic devices.

以筆記型電腦而言,目前主要係以塑膠機殼為主。如第1圖所示,目前通常係先於一塑膠機殼91射出成形後,再於該塑膠機殼91內設置一鋁箔92,以於該塑膠機殼91組裝於筆記型電腦後,透過該鋁箔92提供該筆記型電腦防護電磁波干擾之功能。In the case of notebook computers, the main focus is on plastic cases. As shown in FIG. 1 , an aluminum foil 92 is usually disposed in the plastic casing 91 before being molded and formed in the plastic casing 91, so that the plastic casing 91 is assembled into the notebook computer. The aluminum foil 92 provides the function of the notebook computer to protect against electromagnetic interference.

然而,如第1圖所示,由於該塑膠機殼91仍須預留部分空間93,以供容設其他電子元件或進行組裝,例如供容置無線接頭、3G網卡、藍芽或天線等電子元件。為避免該鋁箔92影響到該些電子元件訊號之傳輸,因此該鋁箔92通常係需要對應該筆記型電腦該些空間93的形狀進行局部裁切後,方可使該鋁箔92準確設置於該塑膠機殼91內,如此將造成製程上之複雜性,而裁切過程精準度不佳亦可能造成抗磁波效果不佳之缺點;再且,由於該鋁箔92係於該塑膠機殼91成形後再另以人工或機械方式進行設置,因此亦有可能因該鋁箔92設置位置之偏差而造成防護電磁波干擾之效果不佳。However, as shown in Fig. 1, since the plastic casing 91 still has to reserve a portion of space 93 for housing other electronic components or for assembly, for example, for accommodating wireless connectors, 3G network cards, Bluetooth or antennas, etc. element. In order to prevent the aluminum foil 92 from affecting the transmission of the electronic component signals, the aluminum foil 92 usually needs to be partially cut according to the shape of the space 93 of the notebook computer, so that the aluminum foil 92 can be accurately set on the plastic. In the casing 91, this will cause complexity in the process, and the poor precision of the cutting process may also cause disadvantages of poor anti-magnetic wave effect; further, since the aluminum foil 92 is formed after the plastic casing 91 is formed, The setting is performed manually or mechanically, so that it is also possible that the effect of shielding electromagnetic waves is not good due to the deviation of the position of the aluminum foil 92.

本發明目的乃改良上述缺點,以提供一種具抗電磁波層之保護薄膜,透過於該保護薄膜內設置一抗電磁波層,使該保護薄膜可於塑料物件射出成形同時結合於該塑料物件表面,以提供抗電磁波效果。The object of the present invention is to improve the above-mentioned disadvantages, and to provide a protective film having an anti-electromagnetic wave layer, and an anti-electromagnetic wave layer is disposed in the protective film, so that the protective film can be formed on the surface of the plastic object while being molded and formed on the plastic object. Provides anti-electromagnetic effects.

本發明之另一目的係提供一種具抗電磁波層之保護薄膜製作方法,以透過印刷方式於該保護薄膜內設置該抗電磁波層,以簡化抗電磁波層設置之製程複雜度,並提升抗電磁波層之設置精準度。Another object of the present invention is to provide a method for fabricating a protective film having an anti-electromagnetic wave layer, wherein the anti-electromagnetic wave layer is disposed in the protective film by printing to simplify the process complexity of the anti-electromagnetic wave layer and improve the anti-electromagnetic wave layer. The setting accuracy.

根據本發明的具抗電磁波層之保護薄膜,係包含一承載層,該承載層之表面層疊有一離型層、一強化層、一呈色層及一結合層,其特徵在於:該離型層及結合層之間另設置一抗電磁波層;及一架橋層,該架橋層係設置於該呈色層及結合層之間。The protective film with an anti-electromagnetic wave layer according to the present invention comprises a carrier layer having a release layer, a reinforcement layer, a color layer and a bonding layer laminated on the surface of the carrier layer, characterized in that the release layer And an anti-electromagnetic wave layer is further disposed between the bonding layer; and a bridge layer is disposed between the coloring layer and the bonding layer.

根據本發明的具抗電磁波層之保護薄膜的製造方法,係包含:一離型層設置步驟,係於一承載層之表面設置一離型層;一強化層設置步驟,係於該離型層之表面設 置一強化層;一呈色層設置步驟,係於該強化層之表面設置一呈色層;一結合層設置步驟,係於該呈色層之表面設置一結合層;及一抗電磁波層設置步驟,於該離型層設置步驟與該結合層設置步驟之間進行此步驟,係以印刷方式於該離型層及結合層之間設置一抗電磁波層。The method for manufacturing a protective film with an electromagnetic wave resistant layer according to the present invention comprises: a release layer setting step of disposing a release layer on a surface of a carrier layer; and a reinforcement layer setting step of the release layer Surface design a reinforcing layer is disposed; a color layer setting step is performed on the surface of the strengthening layer to provide a coloring layer; a bonding layer setting step is to set a bonding layer on the surface of the coloring layer; and an anti-electromagnetic layer is disposed In the step, the step is performed between the release layer setting step and the bonding layer setting step, and an anti-electromagnetic wave layer is disposed between the release layer and the bonding layer by printing.

為讓本發明之上述及其他自的、特徵及優點能更明顯易懂,下文特舉本發明之較佳實施例,並配合所附圖式,作詳細說明如下:The above and other features, advantages and advantages of the present invention will become more apparent and understood.

請參照第2圖所示,本發明具抗電磁波層之保護薄膜係包含一承載層1、一離型層2、一強化層3(Hard Coating)、一呈色層4、一抗電磁波層5及一結合層6。Referring to FIG. 2, the protective film with anti-electromagnetic wave layer of the present invention comprises a carrier layer 1, a release layer 2, a reinforcement layer 3, a color layer 4, and an anti-electromagnetic wave layer 5. And a bonding layer 6.

請參照第2圖所示,本發明之承載層1係可選擇以聚合物、樹脂或塑膠等材質製成,例如可選擇由聚亞醯胺(Polyimide,PI)或聚對苯二甲酸乙二醇酯(Polyethylene terephthalate,PET)等塑膠材質製成,使該承載層1具有足夠強度供承載其他結構層。本實施例係選擇以聚對苯二甲酸乙二醇酯材質製成之承載層1。Referring to FIG. 2, the carrier layer 1 of the present invention may be selected from materials such as polymer, resin or plastic, for example, polyimide (PI) or polyethylene terephthalate. Made of a plastic material such as a polyvinyl terephthalate (PET), the carrier layer 1 has sufficient strength to carry other structural layers. In this embodiment, the carrier layer 1 made of polyethylene terephthalate is selected.

請參照第2圖所示,本實施例之離型層2係設置於該承載層1之表面,以使該離型層2可易於由該承載層1脫離。該離型層2係可選擇以矽系樹脂或氟系樹脂等材料製成,例如本實施例之離型層2係選擇以壓克力樹脂製成。Referring to FIG. 2, the release layer 2 of the present embodiment is disposed on the surface of the carrier layer 1 so that the release layer 2 can be easily detached from the carrier layer 1. The release layer 2 may be made of a material such as a lanthanide resin or a fluorine-based resin. For example, the release layer 2 of the present embodiment is selected to be made of an acrylic resin.

請參照第2圖所示,本實施例之強化層3係設置於該離型層2之表面,以透過該強化層3提供保護,避免後續 其他結構層受外力刮傷破損。該強化層3係可選擇以壓克力樹脂等材質製成。Referring to FIG. 2, the reinforcing layer 3 of the embodiment is disposed on the surface of the release layer 2 to provide protection through the strengthening layer 3 to avoid subsequent Other structural layers were scratched and damaged by external force. The reinforcing layer 3 can be made of a material such as acrylic resin.

請參照第2圖所示,本實施例之呈色層4係設置於該強化層3之表面,該呈色層4係以油墨製成,以透過該呈色層4提供欲呈現之顏色或圖樣。Referring to FIG. 2 , the color layer 4 of the embodiment is disposed on the surface of the reinforcing layer 3 , and the color layer 4 is made of ink to provide the color to be presented through the color layer 4 or pattern.

請參照第2圖所示,本發明之抗電磁波層5主要係以可吸收電磁波且同時導電之材質所製成,係可阻隔電磁波,用以提供該防護薄膜防護電磁波干擾之功能。因此,該抗電磁波層5僅需設置於該離型層2與該結合層6之間即可產生抗電磁波之功效,並不受限於本實施例所揭示之設置位置。其中,該抗電磁波層5較佳係設置於該呈色層4與該結合層6之間,以避免該抗電磁波層5影響到該呈色層4之呈色效果。舉例而言,本實施例之抗電磁波層5係設置於該呈色層4之表面,使得該呈色層4係介於該強化層3與抗電磁波層5之間。Referring to FIG. 2, the anti-electromagnetic wave layer 5 of the present invention is mainly made of a material that can absorb electromagnetic waves and is electrically conductive at the same time, and can block electromagnetic waves to provide the function of the protective film to protect electromagnetic waves. Therefore, the anti-electromagnetic wave layer 5 only needs to be disposed between the release layer 2 and the bonding layer 6 to generate an anti-electromagnetic wave effect, and is not limited to the set position disclosed in the embodiment. The anti-electromagnetic wave layer 5 is preferably disposed between the color-developing layer 4 and the bonding layer 6 to prevent the anti-electromagnetic wave layer 5 from affecting the coloring effect of the color-developing layer 4. For example, the anti-electromagnetic wave layer 5 of the present embodiment is disposed on the surface of the color-developing layer 4 such that the color-developing layer 4 is interposed between the reinforcing layer 3 and the anti-electromagnetic wave layer 5.

請參照第2圖所示,本發明之結合層6係設置於如第2圖所示防護薄膜之最上層,使該防護薄膜可透過該結合層6結合於一塑料物件。延續前述實施例,本實施例係設置於該抗電磁波層5之表面,使得該抗電磁波層5係介於該呈色層4與該結合層6之間。該結合層6係可選擇以接著劑或膠水等材質製成。Referring to FIG. 2, the bonding layer 6 of the present invention is disposed on the uppermost layer of the protective film as shown in FIG. 2, so that the protective film can be bonded to a plastic article through the bonding layer 6. Continuing the foregoing embodiment, the present embodiment is disposed on the surface of the anti-electromagnetic wave layer 5 such that the anti-electromagnetic wave layer 5 is interposed between the color-developing layer 4 and the bonding layer 6. The bonding layer 6 can be made of a material such as an adhesive or glue.

其中,請參照第3圖所示,該抗電磁波層5與該結合層6之間亦可另設置一架橋層7。該架橋層7係可選擇以壓克力系樹脂、變性壓克力樹脂、聚氨酯(polyurethane,PU)系樹脂之材質製成。For example, as shown in FIG. 3, a bridge layer 7 may be further disposed between the anti-electromagnetic wave layer 5 and the bonding layer 6. The bridging layer 7 can be made of a material of an acrylic resin, a denatured acrylic resin, or a polyurethane (PU) resin.

如此,該些離型層2、強化層3、呈色層4、抗電磁波層5及結合層6便可承載於該承載層1上。請參照第4圖所示,進一步透過模內裝飾技術(In-Mold Decoration,IMD),可使本發明之防護薄膜可於一塑料物件8射出成形同時,透過該結合層6結合附著於該塑料物件8之表面,並透過該離型層2之設置使得該承載層1可易於剝離,進而透過該抗電磁波層5提供該塑料物件8防護電磁波干擾之功效。因此,可避免如習用抗電磁波方法於塑料物件成形之後,必須對鋁箔裁切,再額外進行對位設置於該塑料物件上所造成之製程繁複及定位精準度不佳之缺點。Thus, the release layer 2, the reinforcement layer 3, the color layer 4, the anti-electromagnetic wave layer 5 and the bonding layer 6 can be carried on the carrier layer 1. Referring to FIG. 4, the protective film of the present invention can be formed by injection molding of a plastic article 8 while being bonded to the plastic through the bonding layer 6 through In-Mold Decoration (IMD). The surface of the object 8 is disposed through the release layer 2 so that the carrier layer 1 can be easily peeled off, and the electromagnetic object layer 8 is provided through the anti-electromagnetic wave layer 5 to provide electromagnetic wave interference protection. Therefore, it is possible to avoid the disadvantages of complicated process and poor positioning accuracy caused by the conventional method of anti-electromagnetic wave processing after the plastic object is formed, and the aluminum foil must be cut and additionally disposed on the plastic object.

前述之具抗電磁波層之防護薄膜是透過下述之方法所製得的。The aforementioned protective film having an electromagnetic wave resistant layer is obtained by the following method.

請參照第5圖所示,本發明第一實施例之具抗電磁波層之防護薄膜製造方法係包含一離型層設置步驟A;一強化層設置步驟B;一呈色層設置步驟C;一抗電磁波層設置步驟D;及一結合層設置步驟E。其中,如前所述,該抗電磁波層5僅需設置於該離型層2與該結合層6之間即可產生抗電磁波之功效。因此,相同地,該抗電磁波層設置步驟D僅需於該離型層設置步驟A與該結合層設置步驟E之間進行即可於該防護薄膜中形成如前所述之抗電磁波層5,並不以本實施例之執行順序為限。Referring to FIG. 5, the manufacturing method of the anti-electromagnetic layer protective film according to the first embodiment of the present invention comprises a release layer setting step A; a strengthening layer setting step B; and a color layer setting step C; Anti-electromagnetic layer setting step D; and a bonding layer setting step E. As described above, the anti-electromagnetic wave layer 5 only needs to be disposed between the release layer 2 and the bonding layer 6 to generate an anti-electromagnetic wave effect. Therefore, in the same manner, the anti-electromagnetic wave layer setting step D only needs to be performed between the release layer setting step A and the bonding layer setting step E to form the anti-electromagnetic wave layer 5 as described above in the protective film. It is not limited to the order of execution of this embodiment.

請參照第2及5圖所示,本發明之離型層設置步驟A於一承載層1之表面設置一離型層2。舉例而言,本實施例係選擇於前述厚度為50μm之承載層1的表面以塗佈方式形成厚度為1~2μm之離型層2,以使該離型層2可易 於與該承載層1剝離。舉例而言,本實施例之離型層2厚度係選擇為1μm。Referring to Figures 2 and 5, the release layer setting step A of the present invention provides a release layer 2 on the surface of a carrier layer 1. For example, in this embodiment, the surface of the carrier layer 1 having a thickness of 50 μm is selected to form a release layer 2 having a thickness of 1 to 2 μm in a coating manner, so that the release layer 2 can be easily It is peeled off from the carrier layer 1. For example, the thickness of the release layer 2 of the present embodiment is selected to be 1 μm.

請參照第2及5圖所示,本發明之強化層設置步驟B係於該離型層2之表面設置一強化層3。舉例而言,本實施例係選擇於前述之離型層2的表面以塗佈方式形成厚度為6~7μm之前述強化層3。舉例而言,本實施例係選擇塗佈厚度為6μm之強化層3。Referring to FIGS. 2 and 5, the reinforcing layer setting step B of the present invention is provided with a reinforcing layer 3 on the surface of the release layer 2. For example, in the present embodiment, the reinforcing layer 3 having a thickness of 6 to 7 μm is formed by coating on the surface of the release layer 2 described above. For example, in the present embodiment, the reinforcing layer 3 having a coating thickness of 6 μm is selected.

請參照第2及5圖所示,本發明之呈色層設置步驟C係於該強化層3之表面設置一呈色層4。舉例而言,本實施例係選擇於前述強化層3的表面以印刷方式形成厚度為2~3μm之前述呈色層4。舉例而言,本實施例係選擇塗佈厚度為2μm之呈色層4。Referring to FIGS. 2 and 5, the coloring layer setting step C of the present invention is provided with a coloring layer 4 on the surface of the reinforcing layer 3. For example, in the present embodiment, the coloring layer 4 having a thickness of 2 to 3 μm is formed by printing on the surface of the reinforcing layer 3 in a printed manner. For example, in the present embodiment, the coloring layer 4 having a thickness of 2 μm is selected.

請參照第2及5圖所示,本發明之抗電磁波層設置步驟D於該離型層設置步驟A與該結合層設置步驟E之間進行此步驟,以印刷方式於該離型層2與結合層6之間設置一抗電磁波層5。更詳言之,本實施例係選擇於該呈色層4之表面以印刷方式形成厚度為1~3μm之抗電磁波層5。由於以印刷方式進行該抗電磁波層5之設置具有較高之精準度,可直接於欲設置該抗電磁波層5之特定位置進行印刷形成該抗電磁波層5,使得該抗電磁波層5可避開其他電子元件之位置。因此本案可大幅簡化設置抗電磁波層之製程,而無須如習用方法需再對該鋁箔進行裁切後方可設置於該塑料物件內,而具有製程複雜及定位精準度不佳之缺點。Referring to FIGS. 2 and 5, the anti-electromagnetic layer setting step D of the present invention performs this step between the release layer setting step A and the bonding layer setting step E, and is printed on the release layer 2 and An anti-electromagnetic wave layer 5 is disposed between the bonding layers 6. More specifically, in the present embodiment, the anti-electromagnetic wave layer 5 having a thickness of 1 to 3 μm is formed by printing on the surface of the coloring layer 4. Since the anti-electromagnetic wave layer 5 is disposed in a printing manner with high precision, the anti-electromagnetic wave layer 5 can be directly formed by printing at a specific position where the anti-electromagnetic wave layer 5 is to be disposed, so that the anti-electromagnetic wave layer 5 can be avoided. The location of other electronic components. Therefore, the present invention can greatly simplify the process of setting the anti-electromagnetic wave layer, and the aluminum foil can be disposed in the plastic object without the conventional method, and has the disadvantages of complicated process and poor positioning accuracy.

請參照第2及5圖所示,本發明之結合層設置步驟E 係設置一結合層6以作為該防護薄膜結構之最上層。延續上述例子,本實施例係於該抗電磁波層5之表面設置該結合層6。更詳言之,本實施例係選擇於該抗電磁波層5之表面以印刷方式設置厚度為2~3μm之結合層6。例如以膠水作為該結合層6,以提供膠合能力。Please refer to the second and fifth figures, the bonding layer setting step E of the present invention. A bonding layer 6 is provided as the uppermost layer of the pellicle structure. Continuing the above example, the bonding layer 6 is provided on the surface of the anti-electromagnetic wave layer 5 in this embodiment. More specifically, in this embodiment, the bonding layer 6 having a thickness of 2 to 3 μm is printed on the surface of the anti-electromagnetic wave layer 5 in a printed manner. For example, glue is used as the bonding layer 6 to provide a bonding ability.

此外,請參照第6圖所示,本發明第二實施例之具抗電磁波層之防護薄膜之製作方法較佳係另包含一架橋層設置步驟F,此步驟係於該呈色層設置步驟C與該結合層設置步驟E之間進行。舉例而言,本第二實施例之架橋層設置步驟F係選擇於該抗電磁波層設置步驟D完成後,先進行本步驟,最後再進行該結合層設置步驟E。更詳言之,本實施例係選擇於該抗電磁波層5之表面以印刷方式設置0.5~1.5μm,較佳係為1μm之架橋層7後,再將該結合層6設置於該架橋層7之表面。In addition, referring to FIG. 6, the manufacturing method of the anti-electromagnetic layer protective film according to the second embodiment of the present invention preferably further includes a bridge layer setting step F, and the step is performed in the color layer setting step C. This is performed between the bonding layer setting step E. For example, the bridging layer setting step F of the second embodiment is selected after the anti-electromagnetic layer setting step D is completed, the step is performed first, and finally the bonding layer setting step E is performed. More specifically, in this embodiment, the surface of the anti-electromagnetic wave layer 5 is selected to be 0.5 to 1.5 μm in a printed manner, preferably a bridge layer 7 of 1 μm, and then the bonding layer 6 is disposed on the bridging layer 7 The surface.

本發明透過將該抗電磁波層5設置於該防護薄膜內,使得本發明之防護薄膜可提供抗電磁波效果,且本發明之防護薄膜透過模內裝飾技術於塑料物件成形同時結合於塑料物件之表面,可提供較佳之抗電磁波效果並簡化製程。The present invention provides the anti-electromagnetic wave layer 5 in the protective film, so that the protective film of the present invention can provide an anti-electromagnetic wave effect, and the protective film of the present invention is formed on the surface of the plastic object by the in-mold decoration technology while forming the plastic object. Provides better electromagnetic wave resistance and simplifies the process.

本發明透過以印刷方式製作形成該抗電磁波層5,無須對該抗電磁波層5進行裁切,如此可提升該抗電磁波層5之設置精準度,進而避免該抗電磁波層5因裁切不佳造成抗電磁波效果不佳之缺點。In the present invention, the anti-electromagnetic wave layer 5 is formed by printing, and the anti-electromagnetic wave layer 5 is not required to be cut, so that the setting precision of the anti-electromagnetic wave layer 5 can be improved, thereby preventing the anti-electromagnetic wave layer 5 from being poorly cut. The disadvantage of causing poor anti-electromagnetic effects.

雖然本發明已利用上述較佳實施例揭示,然其並非用以限定本發明,任何熟習此技藝者在不脫離本發明之精神和範圍之內,相對上述實施例進行各種更動與修改仍屬本 發明所保護之技術範疇,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。While the invention has been described in connection with the preferred embodiments described above, it is not intended to limit the scope of the invention. The technical scope of the invention is protected, and therefore the scope of the invention is defined by the scope of the appended claims.

〔本發明〕〔this invention〕

1‧‧‧承載層1‧‧‧bearing layer

2‧‧‧離型層2‧‧‧ release layer

3‧‧‧強化層3‧‧‧ Strengthening layer

4‧‧‧呈色層4‧‧‧Color layer

5‧‧‧抗電磁波層5‧‧‧Anti-electromagnetic layer

6‧‧‧結合層6‧‧‧Combination layer

7‧‧‧架橋層7‧‧‧ Pontoon

8‧‧‧塑料物件8‧‧‧Plastic objects

〔習知技術〕[technical technology]

91‧‧‧塑膠機殼91‧‧‧ plastic case

92‧‧‧鋁箔92‧‧‧Aluminum foil

93‧‧‧空間93‧‧‧ Space

第1圖:習用於塑料物件設置鋁箔作為抗電磁波層之示意圖。Fig. 1: Schematic diagram of the use of aluminum foil as an anti-electromagnetic wave layer for plastic objects.

第2圖:本發明具抗電磁波層之防護薄膜之剖面圖。Fig. 2 is a cross-sectional view showing a protective film having an electromagnetic wave resistant layer of the present invention.

第3圖:本發明另一實施例具抗電磁波層之防護薄膜之剖面圖。Fig. 3 is a cross-sectional view showing a protective film having an electromagnetic wave resistant layer according to another embodiment of the present invention.

第4圖:本發明具抗電磁波層之防護薄膜應用於模內裝飾技術之示意圖。Fig. 4 is a schematic view showing the application of the anti-electromagnetic layer protective film of the present invention to the in-mold decoration technology.

第5圖:本發明第一實施例具抗電磁波層之防護薄膜之製作方法的流程圖。Fig. 5 is a flow chart showing a method of fabricating a protective film having an electromagnetic wave resistant layer according to a first embodiment of the present invention.

第6圖:本發明第二實施例具抗電磁波層之防護薄膜之製作方法的流程圖。Figure 6 is a flow chart showing a method of fabricating a protective film having an electromagnetic wave resistant layer according to a second embodiment of the present invention.

1...承載層1. . . Carrying layer

2...離型層2. . . Release layer

3...強化層3. . . Strengthening layer

4...呈色層4. . . Color layer

5...抗電磁波層5. . . Anti-electromagnetic layer

6...結合層6. . . Bonding layer

Claims (6)

一種具抗電磁波層之保護薄膜,係包含一承載層,該承載層之表面層疊有一離型層、一強化層、一呈色層及一結合層,其特徵在於:該離型層及結合層之間另設置一抗電磁波層;及一架橋層,該架橋層係設置於該呈色層及結合層之間。 A protective film with an anti-electromagnetic wave layer comprises a carrier layer, and a surface of the carrier layer is laminated with a release layer, a reinforcement layer, a color layer and a bonding layer, wherein the release layer and the bonding layer are An anti-electromagnetic wave layer is additionally disposed; and a bridge layer is disposed between the coloring layer and the bonding layer. 依申請專利範圍第1項所述之具抗電磁波層之保護薄膜,其中該抗電磁波層係設置於該呈色層及結合層之間。 The anti-electromagnetic layer protective film according to claim 1, wherein the anti-electromagnetic layer is disposed between the color layer and the bonding layer. 依申請專利範圍第1項所述之具抗電磁波層之保護薄膜,其中該抗電磁波層係以可吸收電磁波且同時導電之材質製成。 The anti-electromagnetic layer protective film according to the first aspect of the patent application, wherein the anti-electromagnetic wave layer is made of a material that can absorb electromagnetic waves and is electrically conductive at the same time. 一種具抗電磁波層之保護薄膜的製作方法,係包含:一離型層設置步驟,係於一承載層之表面設置一離型層;一強化層設置步驟,係於該離型層之表面設置一強化層;一呈色層設置步驟,係於該強化層之表面設置一呈色層;一結合層設置步驟,係於該呈色層之表面設置一結合層;及一抗電磁波層設置步驟,於該離型層設置步驟與該結合層設置步驟之間進行此步驟,係以印刷方式於該離型層及結合層之間設置一抗電磁波層。 A method for manufacturing a protective film with an anti-electromagnetic wave layer, comprising: a release layer setting step, wherein a release layer is disposed on a surface of a carrier layer; and a reinforcement layer setting step is disposed on a surface of the release layer a reinforcing layer; a color layer setting step, wherein a color layer is disposed on the surface of the strengthening layer; a bonding layer setting step is disposed on the surface of the color layer to provide a bonding layer; and an anti-electromagnetic layer setting step This step is performed between the release layer setting step and the bonding layer setting step, and an anti-electromagnetic wave layer is disposed between the release layer and the bonding layer by printing. 依申請專利範圍第4項所述之具抗電磁波層之保護薄膜的製作方法,其中該抗電磁波層設置步驟係於該呈色層設置步驟與結合層設置步驟之間進行。 The method for fabricating a protective film having an anti-electromagnetic wave layer according to claim 4, wherein the anti-electromagnetic layer setting step is performed between the coloring layer setting step and the bonding layer setting step. 依申請專利範圍第4項所述之具抗電磁波層之保護薄膜的製作方法,其中另包含一架橋層設置步驟,係於該呈色層設置步驟及結合層設置步驟間進行,以於該呈色層表面設置一架橋層。The method for manufacturing a protective film with an anti-electromagnetic wave layer according to the fourth aspect of the patent application, further comprising a step of disposing a bridge layer, wherein the step of setting the color layer and the step of setting the bonding layer are performed to A bridge layer is provided on the surface of the color layer.
TW100123336A 2011-07-01 2011-07-01 A protected film having an anti electromagnetic layer and its manufacturing method thereof TWI468103B (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050244608A1 (en) * 2002-08-08 2005-11-03 Dai Nippon Printing Co., Ltd. Electromagnetic wave shielding sheet
TWI253321B (en) * 2002-08-08 2006-04-11 Dainippon Printing Co Ltd Thin plate for blocking electromagnetic wave
TWI301798B (en) * 2000-05-19 2008-10-11 Tdk Corp Functional film having functional layer and article provided with the functinal layer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI301798B (en) * 2000-05-19 2008-10-11 Tdk Corp Functional film having functional layer and article provided with the functinal layer
US20050244608A1 (en) * 2002-08-08 2005-11-03 Dai Nippon Printing Co., Ltd. Electromagnetic wave shielding sheet
TWI253321B (en) * 2002-08-08 2006-04-11 Dainippon Printing Co Ltd Thin plate for blocking electromagnetic wave

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