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TWI365112B - Apparatus for treating a substrate - Google Patents

Apparatus for treating a substrate

Info

Publication number
TWI365112B
TWI365112B TW098130893A TW98130893A TWI365112B TW I365112 B TWI365112 B TW I365112B TW 098130893 A TW098130893 A TW 098130893A TW 98130893 A TW98130893 A TW 98130893A TW I365112 B TWI365112 B TW I365112B
Authority
TW
Taiwan
Prior art keywords
treating
substrate
Prior art date
Application number
TW098130893A
Other languages
English (en)
Other versions
TW201026405A (en
Inventor
Yukio Tomifuji
Norio Yoshikawa
Kazuto Ozaki
Kazuo Jodai
Takuto Kawakami
Original Assignee
Dainippon Screen Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Mfg filed Critical Dainippon Screen Mfg
Publication of TW201026405A publication Critical patent/TW201026405A/zh
Application granted granted Critical
Publication of TWI365112B publication Critical patent/TWI365112B/zh

Links

TW098130893A 2008-10-15 2009-09-14 Apparatus for treating a substrate TWI365112B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008265847 2008-10-15
JP2009178644A JP5290081B2 (ja) 2008-10-15 2009-07-31 基板処理装置

Publications (2)

Publication Number Publication Date
TW201026405A TW201026405A (en) 2010-07-16
TWI365112B true TWI365112B (en) 2012-06-01

Family

ID=42306083

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098130893A TWI365112B (en) 2008-10-15 2009-09-14 Apparatus for treating a substrate

Country Status (2)

Country Link
JP (1) JP5290081B2 (zh)
TW (1) TWI365112B (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6133120B2 (ja) 2012-05-17 2017-05-24 株式会社荏原製作所 基板洗浄装置
KR101341937B1 (ko) * 2012-05-30 2013-12-17 엑스탈테크놀로지 주식회사 갈륨비소 다결정 잉곳 화학 에칭 세정장치
CN102825108A (zh) * 2012-09-04 2012-12-19 无锡金龙川村精管有限公司 在线清洗精整装置
JP6317941B2 (ja) * 2014-02-07 2018-04-25 株式会社ディスコ 切削装置
JP6367763B2 (ja) 2015-06-22 2018-08-01 株式会社荏原製作所 ウェーハ乾燥装置およびウェーハ乾燥方法
JP6088099B1 (ja) * 2016-07-06 2017-03-01 株式会社荏原製作所 洗浄装置、これを備えためっき装置、及び洗浄方法
TWI629116B (zh) 2016-06-28 2018-07-11 荏原製作所股份有限公司 清洗裝置、具備該清洗裝置之鍍覆裝置、以及清洗方法
JP2018065109A (ja) * 2016-10-20 2018-04-26 東京応化工業株式会社 洗浄装置および洗浄方法
KR102176209B1 (ko) * 2018-12-13 2020-11-09 주식회사 제우스 이물질 제거용 기판처리장치
CN112696908B (zh) * 2020-12-25 2023-06-23 苏州市康普来新材料有限公司 一种金属工件清洗烘干一体化设备
CN114985349B (zh) * 2022-05-26 2023-06-02 梁锋 一种采掘钻头冲洗装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0982678A (ja) * 1995-09-13 1997-03-28 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2004095926A (ja) * 2002-09-02 2004-03-25 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2004273984A (ja) * 2003-03-12 2004-09-30 Dainippon Screen Mfg Co Ltd 基板処理方法および基板処理装置
JP4997080B2 (ja) * 2007-11-28 2012-08-08 大日本スクリーン製造株式会社 基板処理装置

Also Published As

Publication number Publication date
JP2010118644A (ja) 2010-05-27
TW201026405A (en) 2010-07-16
JP5290081B2 (ja) 2013-09-18

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