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TWI365112B - Apparatus for treating a substrate - Google Patents

Apparatus for treating a substrate

Info

Publication number
TWI365112B
TWI365112B TW098130893A TW98130893A TWI365112B TW I365112 B TWI365112 B TW I365112B TW 098130893 A TW098130893 A TW 098130893A TW 98130893 A TW98130893 A TW 98130893A TW I365112 B TWI365112 B TW I365112B
Authority
TW
Taiwan
Prior art keywords
treating
substrate
Prior art date
Application number
TW098130893A
Other languages
Chinese (zh)
Other versions
TW201026405A (en
Inventor
Yukio Tomifuji
Norio Yoshikawa
Kazuto Ozaki
Kazuo Jodai
Takuto Kawakami
Original Assignee
Dainippon Screen Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Mfg filed Critical Dainippon Screen Mfg
Publication of TW201026405A publication Critical patent/TW201026405A/en
Application granted granted Critical
Publication of TWI365112B publication Critical patent/TWI365112B/en

Links

TW098130893A 2008-10-15 2009-09-14 Apparatus for treating a substrate TWI365112B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008265847 2008-10-15
JP2009178644A JP5290081B2 (en) 2008-10-15 2009-07-31 Substrate processing equipment

Publications (2)

Publication Number Publication Date
TW201026405A TW201026405A (en) 2010-07-16
TWI365112B true TWI365112B (en) 2012-06-01

Family

ID=42306083

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098130893A TWI365112B (en) 2008-10-15 2009-09-14 Apparatus for treating a substrate

Country Status (2)

Country Link
JP (1) JP5290081B2 (en)
TW (1) TWI365112B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6133120B2 (en) 2012-05-17 2017-05-24 株式会社荏原製作所 Substrate cleaning device
KR101341937B1 (en) * 2012-05-30 2013-12-17 엑스탈테크놀로지 주식회사 Apparatus to clean GaAs polycrystalline by chemical etching
CN102825108A (en) * 2012-09-04 2012-12-19 无锡金龙川村精管有限公司 On-line cleaning and finishing device
JP6317941B2 (en) * 2014-02-07 2018-04-25 株式会社ディスコ Cutting equipment
JP6367763B2 (en) 2015-06-22 2018-08-01 株式会社荏原製作所 Wafer drying apparatus and wafer drying method
TWI629116B (en) 2016-06-28 2018-07-11 荏原製作所股份有限公司 Cleaning apparatus, plating apparatus using the same, and cleaning method
JP6088099B1 (en) * 2016-07-06 2017-03-01 株式会社荏原製作所 Cleaning apparatus, plating apparatus including the same, and cleaning method
JP2018065109A (en) * 2016-10-20 2018-04-26 東京応化工業株式会社 Cleaning device and cleaning method
KR102176209B1 (en) * 2018-12-13 2020-11-09 주식회사 제우스 Substrate processing device for foreign matter removal
CN112696908B (en) * 2020-12-25 2023-06-23 苏州市康普来新材料有限公司 Metal work washs stoving integration equipment
CN114985349B (en) * 2022-05-26 2023-06-02 梁锋 Flushing device for mining drill bit

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0982678A (en) * 1995-09-13 1997-03-28 Dainippon Screen Mfg Co Ltd Substrate treating system
JP2004095926A (en) * 2002-09-02 2004-03-25 Dainippon Screen Mfg Co Ltd Substrate treatment equipment
JP2004273984A (en) * 2003-03-12 2004-09-30 Dainippon Screen Mfg Co Ltd Method and device for substrate processing
JP4997080B2 (en) * 2007-11-28 2012-08-08 大日本スクリーン製造株式会社 Substrate processing equipment

Also Published As

Publication number Publication date
JP2010118644A (en) 2010-05-27
JP5290081B2 (en) 2013-09-18
TW201026405A (en) 2010-07-16

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