TWI340295B - Photosensitive composition and color filter formed from the same - Google Patents

Photosensitive composition and color filter formed from the same

Info

Publication number: TWI340295B
Authority: TW; Taiwan
Prior art keywords: same; color filter; photosensitive composition; filter formed; photosensitive
Prior art date: 2005-05-24

Application number

TW095115076A

Other languages

Chinese (zh)

Other versions

TW200710577A (en

Inventor

Mitsuru Kondo

Masaru Shida

Hiroyuki Ohnishi

Kiyoshi Uchikawa

Original Assignee

Tokyo Ohka Kogyo Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2005-05-24

Filing date

2006-04-27

Publication date

2011-04-11

2006-04-27 Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd

2007-03-16 Publication of TW200710577A publication Critical patent/TW200710577A/en

2011-04-11 Application granted granted Critical

2011-04-11 Publication of TWI340295B publication Critical patent/TWI340295B/en

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Materials For Photolithography (AREA)
Optical Filters (AREA)

TW095115076A 2005-05-24 2006-04-27 Photosensitive composition and color filter formed from the same TWI340295B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2005151663A JP4657808B2 (en)	2005-05-24	2005-05-24	Photosensitive composition and color filter formed from the photosensitive composition

Publications (2)

Publication Number	Publication Date
TW200710577A TW200710577A (en)	2007-03-16
TWI340295B true TWI340295B (en)	2011-04-11

Family

ID=37443510

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW095115076A TWI340295B (en)	2005-05-24	2006-04-27	Photosensitive composition and color filter formed from the same

Country Status (4)

Country	Link
JP (1)	JP4657808B2 (en)
KR (2)	KR20060121694A (en)
CN (1)	CN1869816B (en)
TW (1)	TWI340295B (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP5030638B2 (en) *	2007-03-29	2012-09-19	富士フイルム株式会社	Color filter and manufacturing method thereof
KR100904068B1 (en)	2007-09-04	2009-06-23	제일모직주식회사	Photosensitive resin composition for color filters and color filter using same
KR101282516B1 (en) *	2009-11-18	2013-07-04	코오롱인더스트리 주식회사	Photopolymerizable resin composition
KR101258453B1 (en) *	2010-12-09	2013-04-26	에스에스씨피 주식회사	UV curable resin composition for BLU light guide plate and light guide plate
WO2013038671A1 (en) *	2011-09-15	2013-03-21	パナソニック株式会社	Common mode noise filter and production method therefor
KR102025099B1 (en) *	2011-12-13	2019-09-25	주식회사 동진쎄미켐	Photoresist composition
WO2013089403A1 (en) *	2011-12-13	2013-06-20	주식회사 동진쎄미켐	Photoresist composition
CN102827526B (en) *	2012-08-23	2015-04-15	京东方科技集团股份有限公司	High-impedance material, and display substrate black matrix and liquid crystal display apparatus containing same
KR102084218B1 (en) *	2013-07-11	2020-03-04	동우 화인켐 주식회사	composition for forming patterns of non-display part
TWI489213B (en) *	2013-10-22	2015-06-21	Chi Mei Corp	Photosensitive resin composition, color filter and liquid crystal display device having the same
TWI484296B (en) *	2013-12-03	2015-05-11	Chi Mei Corp	Photosensitive resin composition, color filter and method for manufacturing the same, liquid crystal display apparatus
JP6401529B2 (en) *	2014-07-15	2018-10-10	東京応化工業株式会社	Photosensitive composition
JP6423215B2 (en) *	2014-09-18	2018-11-14	株式会社Adeka	Photocurable composition
JP6424052B2 (en) *	2014-09-25	2018-11-14	東京応化工業株式会社	Photosensitive resin composition
JP7440224B2 (en) *	2019-08-21	2024-02-28	太陽ホールディングス株式会社	Positive photosensitive resin composition
KR20220136155A (en)	2021-03-31	2022-10-07	닛테츠 케미컬 앤드 머티리얼 가부시키가이샤	Photosensitive resin composition for black resist, light-shielding layer cured thereof, and manufacturing method of color filter with them

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH06287456A (en) *	1993-04-05	1994-10-11	Dainippon Ink & Chem Inc	Active energy ray curable composition and method of using the same
JPH10142794A (en) *	1996-11-14	1998-05-29	Hitachi Chem Co Ltd	Photosensitive solution for forming colored image and manufacture of color filter by using the same and color filter
JPH11160526A (en) *	1997-11-26	1999-06-18	Jsr Corp	Radiation-sensitive composition for color filter
JP2000035670A (en) *	1998-07-21	2000-02-02	Sumitomo Chem Co Ltd	Colored photosensitive resin composition
JP2001033955A (en) *	1999-07-26	2001-02-09	Nippon Synthetic Chem Ind Co Ltd:The	Pattern formation method
JP2003064293A (en) *	2001-08-29	2003-03-05	Dainippon Ink & Chem Inc	Pigment dispersion composition for color filter, pigment dispersion resist, and color filter
JP2004069754A (en) *	2002-08-01	2004-03-04	Tokyo Ohka Kogyo Co Ltd	Photopolymerizable black composition and black pattern forming method
JP4276923B2 (en) *	2003-02-27	2009-06-10	富士フイルム株式会社	Photocurable colored resin composition and color filter using the same
TWI342983B (en) *	2003-07-16	2011-06-01	Sumitomo Chemical Co	Coloring photosensitive resin composition

2005
- 2005-05-24 JP JP2005151663A patent/JP4657808B2/en not_active Expired - Fee Related
2006
- 2006-04-27 TW TW095115076A patent/TWI340295B/en active
- 2006-05-22 CN CN2006100809187A patent/CN1869816B/en active Active
- 2006-05-22 KR KR1020060045676A patent/KR20060121694A/en not_active Ceased
2007
- 2007-12-28 KR KR1020070140708A patent/KR100932186B1/en active Active

Also Published As

Publication number	Publication date
JP2006330209A (en)	2006-12-07
KR20080007209A (en)	2008-01-17
TW200710577A (en)	2007-03-16
KR20060121694A (en)	2006-11-29
CN1869816B (en)	2011-10-19
KR100932186B1 (en)	2009-12-16
JP4657808B2 (en)	2011-03-23
CN1869816A (en)	2006-11-29

Publication	Publication Date	Title
EP1739483B8 (en)	2021-04-21	Positive photosensitive composition and pattern forming method using the same
TWI340295B (en)	2011-04-11	Photosensitive composition and color filter formed from the same
IL185223A0 (en)	2008-06-05	Compounds and uses thereof
GB0500035D0 (en)	2005-02-09	Filter
ZA200603891B (en)	2007-08-29	Filters
TWI370914B (en)	2012-08-21	Color filter substrate
TWI365210B (en)	2012-06-01	Ink composition and color filter including the same
GB2441918B (en)	2010-06-16	Chemical compounds and liquid-crystal compositions comprising the compounds
TWI349677B (en)	2011-10-01	Photosensitive resin composition and color filter using the same
GB2414599B (en)	2008-01-09	Filter
GB2411668B (en)	2008-07-30	Filter
GB0402063D0 (en)	2004-03-03	Filter element arrangement
GB0521910D0 (en)	2005-12-07	Improved filter element
GB0507114D0 (en)	2005-05-11	No 1 timemachine
GB0804626D0 (en)	2008-04-23	Filter assembly
IL165618A0 (en)	2006-01-15	Complementary masks
GB0512470D0 (en)	2005-07-27	Filter assembly
GB0809587D0 (en)	2008-07-09	Filter element
GB0512648D0 (en)	2005-07-27	Filter can
GB0515441D0 (en)	2005-08-31	Universal colour filter
GB0904514D0 (en)	2009-04-29	Colour-converting filter
GB0417463D0 (en)	2004-09-08	Filter assembly
TWI349116B (en)	2011-09-21	Filter
ZAF200501720S (en)	2006-07-19	Filter elements
GB0420808D0 (en)	2004-10-20	Attatchable ciggarette but or (filter)