1286666 五 、發明說明（1 相闕f請案的相互參照 本申請案係以1999 i e t，, ⑻咖料利申請案二月:二提出的韓國第1。-19-· 入本文。 ^為基礎’該申請案兹以提及方式併 發明背景 U)發明範圍 注 寒 %人t發一種能被鹼含水溶液予以顯影的光敏樹脂 適用於遽色器和在液晶顯示器製程中可 Τ進订溥膜電晶體電路純化作㈣光敏樹聽合物。 (b)相關技藝說明 ^於使用放射先，例如紫外線等’來形成影像的所謂 的發展’近來在許多需要微影像形成的領域，對 能被驗性含水溶液予以顯影之光敏樹脂的需求正日益增 加。 鹼性顯影式光敏樹脂已被用於製造印刷電路板時的乾 膜抗银劑和製造半導體電路時的光阻㈣，而它們的應 用’例如濾色器及各種電路鈍化，近來正擴展到半導體和 包括液晶顯示器在内的平板顯示器範圍。 能被鹼性含水溶液予以顯影的光敏樹脂混合物，大致 包括a) —種會被鹼性溶液予以溶解或膨脹的黏結劑用樹 脂；b) —種具有至少二個烯鍵式不飽和 c卜種光聚合引發劑…)一種能使前述：:：；：的 溶劑，其中如有必要時，可包含染料、色料或各種據以改 良對基板之生膜性質或黏合性質的添加劑。 前述a)項，即作為一種會被鹼性溶液予以溶解或膨脹 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 5 經濟部智慧財產局員工消費合作社印製 1286666 A7 B7 五、發明說明（2) 的黏結劑用樹脂，大致包括一種含有羧酸或一種欵酸奸或 羥基’一種氨基，一種在聚合物鏈中的醯胺基，和一種可 溶可熔酚醛（novolak)基酚樹脂，一種丙烯酸基樹脂均聚 物，或一種丙烯酸酸基樹脂共聚物的結構，現已被廣泛採 用。 尤其，在光敏樹脂混合物被用來當作濾色器和用於平 板顯示器範圍的薄膜電晶體電路鈍化作用時，即廣泛採用 一種對可見光線具有優越透明性的丙烯酸基黏結劑用樹 脂。 採用從丙婦酸、甲基丙烯酸、烷基酯、取代或未取代 芳基酯所構成之群組中選用一種以上化合物的共聚物，主 要是用來當作可溶於鹼性溶液中的丙烯酸基黏結劑用樹 美國第4,629,680號和第4，139,391號專利曾揭示採用 丙烯酸苄酯/甲基丙烯酸共聚物，日本昭和第54-34327號 專利公告案曾揭示曱基丙烯酸甲酯/2-甲基丙烯酸乙己酯/ 甲基丙烯酸三元共聚物，而日本昭和第55-6210專利公告 案則曾揭示甲基丙烯酸甲酯/丙烯酸乙酯/丙烯酸三元共聚 物。此外，曰本平成第9-23059號專利公開案還揭示一種 使用丙烯酸烯丙醇酯，羥烷基丙烯酸，和甲基丙烯酸等的 共聚物。 前述b)項的化合物，即作為一種具有至少二個烯鍵式 不飽和鍵的交聯化合物，包括聚乙二醇二（甲基）丙烯酸 酯’丙二醇二（甲基）丙烯酸酯，1,3-丁二醇二（甲基）丙烯 酸醋，新戊二醇二（甲基）丙烯酸酯，1，6-己二醇二（甲基） 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 6 -------------1^裝--------訂---------線 (請先閱讀背面之注意事項再填寫本頁) A7 1286666 五、發明說明（3 丙烯酸酯，三羥甲基丙烷三（甲基）丙烯酸酯，季戊四醇四（甲 基）丙烯酸酯，二季戊四醇五（甲基）丙烯酸酯，季戊四醇六 (甲基）丙烯酸酯等。 在現行技術的光敏樹脂混合物中，這種交聯化合物僅 被分配在混合物的黏結劑用樹脂中，當它曝露到一種像紫 外線等的放射光，就會發生交聯反應而形成一種網狀結 構’以防止鹼性可溶樹脂在顯影製程中被顯影劑溶解，因 而扮演一種把影像留在基板上的角色。 然而，現有光敏樹脂混合物的曝光區及未曝光區之間 的溶解性差異卻不夠大，而在顯影製程期間實際應保留的 黏結劑用樹脂卻有部份會被顯影溶液溶解，因而在大部份 的情泥下難以獲得意欲的微圖型形狀。 另一方面，為防止這現象而過量使用交聯化合物時， 不但會因曝光後之表面硬度變差而減損製程性質，而且產 里也會隨著促使充分交聯反應之曝光量的增加而減少。 此外’在這情況下還有未曝光區之溶解性亦會變差而 減低解像力的缺點。 發明摘要說明 本發明之目的在於提供一種光敏樹脂，其係於曝光製 程期間在曝光區的黏結劑用樹脂與交聯化合物之間具有一 化學鍵，和在各黏結劑用樹脂鏈之間具有一化學鍵，使曝 光區與未曝光區之間在顯影製程期間的溶解性差異增至最 大^因而具有優越的解像力，且其可減低交聯化合物的耗 ^量，使必要的紫外線照射量減至最低而解決前述各問 題，以致具有各種製程利益和優越的薄膜特性。 297公釐） ------------- --------訂---------線 一 * (請先閱讀背面之注音？事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 1286666 A7 五、發明説明（4 :發明提供一種光敏樹脂混合物，其包括一種自固化 二、、-劑用樹脂，-種光聚合引發劑，一種具有至少 烯鍵式不勢和鍵的交聯化合物，和一種溶劑，其中自固化 式黏結劑用樹脂是種以下列化學式表示的化合物： [化學式1] - A 〜B - C - 其中A是一種以下列化學式^ a表示的化合物； [化學式1-A]1286666 V. INSTRUCTIONS INSTRUCTIONS (1) Cross-references to the case of this application This application is based on 1999 iet, (8) The application for the application of the coffee material in February: 2, the first Korean article. -19-· is included in this article. 'This application is by way of reference and invented. U) Scope of the invention: A photosensitive resin which can be developed by an aqueous alkali solution is suitable for use in a color former and can be inserted into a film during the liquid crystal display process. The transistor circuit is purified as (4) photosensitive tree audiophile. (b) Related technical descriptions [The so-called development of the use of radiation, such as ultraviolet light, etc. to form images] Recently, in many fields requiring microimage formation, there is an increasing demand for photosensitive resins that can be developed for aqueous solutions. increase. Alkaline-developable photosensitive resins have been used for dry film anti-silver agents in the manufacture of printed circuit boards and photoresists in the manufacture of semiconductor circuits (4), and their applications, such as color filters and various circuit passivation, have recently been extended to semiconductors. And range of flat panel displays including LCD monitors. A photosensitive resin mixture which can be developed by an aqueous alkaline solution, which generally comprises a) a resin for a binder which is dissolved or expanded by an alkaline solution; b) a species having at least two ethylenically unsaturated c species Photopolymerization Initiator ...) A solvent capable of enabling the foregoing:::;, if necessary, a dye, a colorant or various additives to improve the film-forming property or adhesion property to a substrate. The above item a), as a type of paper that will be dissolved or swelled by an alkaline solution, is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). 5 Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed 1286666 A7 B7 5. The resin for a binder of the invention (2), which substantially comprises a carboxylic acid or a citric acid or a hydroxyl group, an amino group, a guanamine group in a polymer chain, and a novolak (novolak) The structure of a phenol resin, an acrylic-based resin homopolymer, or an acryl-based resin copolymer has been widely used. In particular, when a photosensitive resin mixture is used as a color filter and a thin film transistor circuit passivation for a flat panel display range, a resin for an acrylic-based adhesive having superior transparency to visible light is widely used. A copolymer comprising more than one compound selected from the group consisting of propylene glycol, methacrylic acid, alkyl esters, substituted or unsubstituted aryl esters, mainly used as acrylic acid soluble in an alkaline solution The use of benzyl acrylate/methacrylic acid copolymers has been disclosed in U.S. Patent Nos. 4,629,680 and 4,139,391, the disclosure of which is incorporated herein by reference. Ethyl hexyl acrylate/methacrylic acid terpolymer, and methyl methacrylate/ethyl acrylate/acrylic acid terpolymer has been disclosed in Japanese Patent Publication No. 55-6210. Further, a patent of Japanese Patent Laid-Open Publication No. 9-23059 discloses a copolymer using allyl acrylate, hydroxyalkylacrylic acid, methacrylic acid or the like. The compound of the above item b), that is, as a crosslinking compound having at least two ethylenically unsaturated bonds, including polyethylene glycol di(meth)acrylate 'propylene glycol di(meth)acrylate, 1,3 - Butanediol di(meth)acrylate vinegar, neopentyl glycol di(meth)acrylate, 1,6-hexanediol di(methyl) This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 6 -------------1^装--------Book---------Line (please read the notes on the back first) Fill in this page) A7 1286666 V. Description of the invention (3 acrylate, trimethylolpropane tri(meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, pentaerythritol VI ( Methyl) acrylate, etc. In the photosensitive resin mixture of the prior art, the crosslinking compound is only distributed in the resin for the binder of the mixture, and when it is exposed to a kind of ultraviolet light such as ultraviolet rays, cross-linking occurs. Reacting to form a network structure' to prevent the alkaline soluble resin from being dissolved by the developer during the development process, However, it plays a role of leaving the image on the substrate. However, the difference in solubility between the exposed and unexposed areas of the existing photosensitive resin mixture is not large enough, and the resin which is actually retained during the development process has a resin. Some of them are dissolved by the developing solution, so that it is difficult to obtain an intended micro-pattern shape under most of the mud. On the other hand, in order to prevent this phenomenon, when the cross-linking compound is excessively used, not only the surface hardness after exposure is caused. It is degraded to detract from the nature of the process, and the yield is also reduced with the increase in the amount of exposure that promotes a sufficient cross-linking reaction. In addition, in this case, the solubility of the unexposed area is also deteriorated to reduce the disadvantage of resolution. SUMMARY OF THE INVENTION An object of the present invention is to provide a photosensitive resin having a chemical bond between a binder resin and a crosslinking compound in an exposed region during an exposure process, and a resin chain between the binders. The chemical bond maximizes the difference in solubility between the exposed and unexposed areas during the development process, thus providing superior resolution. Moreover, it can reduce the consumption of the cross-linking compound, minimize the necessary ultraviolet radiation, and solve the aforementioned problems, so as to have various process benefits and superior film properties. 297 mm) -------- ----- --------Set---------Line one* (Please read the phonetic transcription on the back? Please fill out this page again) Printed by the Consumer Intellectual Property Office of the Ministry of Economic Affairs 1286666 A7 V. INSTRUCTION DESCRIPTION (4: The invention provides a photosensitive resin mixture comprising a self-curing two-,-resin resin, a photopolymerization initiator, a cross-linking compound having at least an ethylenic non-potential and a bond, And a solvent in which the resin for self-curing adhesive is a compound represented by the following chemical formula: [Chemical Formula 1] - A to B - C - wherein A is a compound represented by the following chemical formula: [Chemical Formula 1-A ]
B是一種以下列化學式1-B表示的化合物； [化學式1-B] --------11®^-- (請先閲讀背面之注意事項再填寫本頁} 、11B is a compound represented by the following chemical formula 1-B; [Chemical Formula 1-B] --------11®^-- (Please read the notes on the back side and then fill out this page}, 11
ΦΙ. 經滴部中央標準局員工消費合作社印製 C是一種以下列化學式i-c和/或化學式1-C，表示 合物； [化學式1-C] Ri 的化 0 /r2 本紙張尺度適用中國國家標準（CNS ) A4規格（21 OX 297公釐） 8 —---- 經濟部智慧財產局員工消費合作社印製 1286666 A7 ______B7____ 五、發明說明（7 ) 中的叛酸起反應，並形成一種酯，再據以形成一種自固化 式黏結劑用樹脂，其中有個反應性（甲基）丙烯基係當作一 種支鏈而被用於線性黏結劑用樹脂中。 所獲得的自固化式黏結劑用樹脂，即作為一種會被鹼 性含水溶液予以溶解或至少膨脹的樹脂，可利用一種像紫 外線等的放射光而引成固化反應。 另外，本發明提供一種將一共聚物混合而配製出的光 敏樹脂混合物，其中係由化學式2的化合物與化學式3的 化合物及化學式4的化合物其中之一或二者，一種光聚合 引發劑，和一溶劑共聚。 雖然習用的光敏樹脂混合物係在照射紫外線製程中僅 於父聯化合物彼此之間發生化學反應而形成一種網狀結 構’但本發明的光敏樹脂混合物則不但與交聯化合物，而 且也與黏結劑用樹脂鏈形成一網狀結構^因此，本發明的 光敏樹脂混合物在曝光區與未曝光區之間提供最大的溶解 性差異，從而可利用減低交聯化合物之耗用量，甚或不使 用的方式，據以獲得優越的薄膜特性以及極佳的靈敏性與 解析性。 丙烯酸，和甲基丙烯酸等可用來當作化學式2的化合 物，且以共聚物中總單體的分子量為基礎，該化合物的耗 用量為10到90克分子百分比。 化學式3的化合物宜為一種從（甲基）丙烯酸苄酯，（甲 基）丙烯酸苯酯，（甲基）丙烯酸環己酯，（甲基）丙烯酸曱函旨， (甲基）丙烯酸乙酯，或2-(甲基）丙烯酸乙己酯所構成之群 組中選用的一種化合物，但若為（甲基）丙烯酸节酯或（甲基） -----------裝------------1T--------_線^^· (請先閱讀背面之注意事項再填寫本頁)ΦΙ. Printed by the Consumer Standards Cooperative of the Central Bureau of Standards, Drip Department, is a compound represented by the following chemical formula ic and / or chemical formula 1-C; [Chemical Formula 1-C] Ri 0 / r2 This paper scale applies to China Standard (CNS) A4 Specification (21 OX 297 mm) 8 —---- Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed 1286666 A7 ______B7____ V. Responsibility in the invention description (7) reacts and forms an ester Then, a resin for a self-curing adhesive is formed, in which a reactive (meth) propylene group is used as a branch and is used in a resin for a linear binder. The resin for self-curing adhesive obtained, that is, a resin which is dissolved or at least expanded by an alkali aqueous solution, can be subjected to a curing reaction by using a kind of radiation such as ultraviolet rays. Further, the present invention provides a photosensitive resin mixture prepared by mixing a copolymer, wherein one or both of the compound of Chemical Formula 2 and the compound of Chemical Formula 3 and the compound of Chemical Formula 4, a photopolymerization initiator, and A solvent copolymerization. Although the conventional photosensitive resin mixture forms a network structure only when the parent compound is chemically reacted with each other in the ultraviolet irradiation process, the photosensitive resin mixture of the present invention is used not only with the crosslinking compound but also with the binder. The resin chain forms a network structure. Therefore, the photosensitive resin mixture of the present invention provides the greatest difference in solubility between the exposed area and the unexposed area, so that the consumption of the crosslinking compound can be reduced, or even not used. It is based on superior film properties and excellent sensitivity and resolution. Acrylic acid, methacrylic acid or the like can be used as the compound of Chemical Formula 2, and the compound is used in an amount of 10 to 90 mol% based on the molecular weight of the total monomer in the copolymer. The compound of Chemical Formula 3 is preferably a benzyl (meth) acrylate, phenyl (meth) acrylate, cyclohexyl (meth) acrylate, (meth) acrylate, ethyl (meth) acrylate, Or a compound selected from the group consisting of ethyl 2-hexyl (meth) acrylate, but if it is (meth) acrylate or (methyl) ----------- ----------1T--------_Line^^· (Please read the notes on the back and fill out this page)
1286666 經濟部智慧財產局員工消費合作社印製 A7 五、發明說明（s ) 丙烯酸苯酯更佳。 化2式4的化合物宜為一種從苯乙烯，4_羥基苯乙烯， 甲土本乙婦或醋酸乙婦所構成之群組中選用的一種化 合物。 另外，化學式5的化合物宜為縮水甘油丙烯酸酯或縮 水甘油甲基丙烯酸酯^這化合物使用〇丨到克分子百 分比之化學式2中含有羧酸的單體。 必要時可用於本發明的一種具有至少二不飽和基的交 聯化合物，其包括一種從聚乙二醇二（甲基）丙烯酸酯，丙 二醇二（甲基）丙烯酸醋，153_丁二醇二（甲基）丙烯酸酯， 新戊二醇二（甲基）丙烯酸酯，-己二醇二（甲基）丙烯酸 酉曰一經甲基丙烧二（甲基）丙稀酸S旨，季戊四醇二（甲基） 丙烯酸酯，季戊四醇三（甲基）丙烯酸酯，季戊四醇四（甲基） 丙烯酸酯，季戊四醇六（甲基）丙烯酸酯，二李戊四醇五（甲 基）丙烯酸酯’二季戊四醇六（甲基）丙烯酸酯，三羥甲基丙 燒二丙烯酸酯’及其混合物所構成之群組中選用的一種化 合物’但以二李戊四酵五（甲基）丙稀酸酯和二季戊四醇六 (甲基）丙烯酸醋為宜。 以自固化式黏結劑用樹脂的總重量為基礎，該交聯化 合物的含量為0到200重量百分比，但以〇到15〇重量百 分比為宜。 光聚合引發劑的範例是一種從二苯甲酮類，例如二苯 甲酮和苯乙酮；取代二苯甲酮類，例如雙-4,4、二曱氣A 二苯甲酮和雙-4,4’-二乙氨基二苯甲酮；三嗦基光弓丨發劑， 例如2,4,6-三（三氣甲基三嗪；酮基光引發劑，例如 ‘紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 12 --------^--------- (請先閱讀背面之注意事項再填寫本頁) 1286666 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（9 ) I基_2·苯甲醯亞f基·卜奈酴_和2,2<甲氧m 本乙烯醇’及其混合物所構成之群組中選用的化合物。 以可光聚合混合物的總重量為基礎，光聚合引發劑的 含量宜為0.1到10重量百分比。 主要用於丙歸聚合物之聚合H容劑，是_丁 嗣己酮’四氫呋喃’甲基溶纖劑，甲基溶纖醋酸酯， 二甲替甲醯胺，丙二醇甲醚醋酸§旨，2_甲氧基乙醚，及其 混合物所構成之群組中選用的化合物。 另一方面，除了前基本組分外，必要時亦可在本發明 的光敏樹脂混合物中使用少量的顏料，染料，增進塗膜性 質的防泡劑，界面活性劑，熱聚合防止劑，和黏性促進劑 等。 最後獲得的光敏樹脂混合物溶液，再用一種具有〇1 到5 μηι孔隙的膜濾器加以過濾。對於過濾後的這種樹脂 混合物，另用一種習知的方法，例如旋轉塗佈法，輥塗法， 和喷塗法等。可用一片玻璃板或矽晶圓作為塗膜基板，其 中薄膜表面厚度係由塗膜條件來決定，例如成分黏性、固 體含量濃度，和塗膜率等條件，而使用本發明的混合物可 獲得0.1到500 μηι厚度的薄膜。 以溫度保持在50到150的加熱板或烤箱，對所獲 得的薄膜預處理10到500秒鐘。 透過一正型（positive type)測試光罩（由 Toppail printing Co.，Ltd·公司產製），對略乾燥的薄膜照射紫外線，其中係 使用一種含有g ’ h和i線的1 k W高壓水銀燈，以l〇〇mJ/cm2 的照度來照射紫外線，此外未使用特殊的光纖。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 13 -----------"^農--------訂--------線 (請先閱讀背面之注咅？事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 1286666 A7 ^ ----------B7 五、發明說明（1〇） 、’主象外線照射過的區域，其溶解性變得遠低於未經紫 外線照射過的區域，因而使彼此間的溶㈣差異增至最 大。 、屋糸外線照射過的薄膜，係在2〇到如。C的溫度條 件下以喷射法或况潰法使其顯影，其中酸驗⑽)值為9到 12的氫氧化鉀含水溶液，或重量百分比為〇ι到5的四甲 銨含水溶液可用來當作顯影劑。 發明詳細說明 在下列的詳細說明中，僅以發明人擬實現本發明之最 佳模式的例證來顯示及說明本發明的若干較佳實施例。如 同所知，本發明可在不違其精神的眾多方面予以修改。因 此此處之说明在性質上係視為例舉說明，而非用以限制 本發明。 兹將若干合成範例及範例說明如後，以期協助瞭解本 發明。然而，下列的各合成範例及範例僅供協助瞭解本發 明而已，不得據以限制本發明的範圍。 [合成範例1 ] 將甲基丙烯酸苄酯：甲基丙烯酸之克分子比為6〇: 4〇， 和數均分子量為10,000的10克共聚物置入一個附有一授 拌Is及一氣氣注入孔的燒杯内’再用IQQgm的丁酮溶解。 等燒杯溫度增加到120 °C後，以一小時的時間慢慢添加〇 3 克的縮水甘油甲基丙烯酸酯，使這溶液起反應，直到環氣 基完全去除為止。使用正己烧與甲醇比為1 : 1的混合物， 從這反應物形成沉澱物，再於真空條件下乾燥，即取得一 種黏結劑用樹脂。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 14 — — — — — — — — — — — — — — — — — I— ^ — — — — — — — I— (請先閱讀背面之注音？事項再填寫本頁) 1286666 A7 五、發明說明（11 [合成範例2] (請先閱讀背面之注意事項再填寫本頁) 二使用甲基㊉烯酸节自旨：甲基丙烯酸之克分子比為 〇 ’和數均分子I為15,000的1〇克共聚物，以及0.3 3縮水甘油丙烯酸醋外，其餘均按照合成範例i所述之 方式取得一種黏結劑用樹脂。 [合成範例3 ] •除使用甲基@烯酸节8旨：甲基丙烯酸之克分子比為 70: 30’和數均分子蚤 卞1為15,000的1〇克共聚物，以及〇·〇5 克的縮水甘油丙歸酸酿外，其餘均按照合成範例1所述之 方式取得一種黏結劑用樹脂。 [合成範例4] .除使用甲基丙㈣m甲基丙職之克分子比為 70 30辛〇數均刀子量為1〇 〇〇〇❸克共聚物，以及〇 〇4 克的縮水甘油丙稀酸醋外，其餘均按照合成範例i所述之 方式取得一種黏結劑用樹脂。 [合成範例5] 經 濟 部 智 慧 財 產 局 員 工 消 費 合 作 社 印 製 除使用甲基丙烯酸节醋：甲基丙婦酸：苯乙稀之克分 子比為5〇:40:10,和數均分子量為145〇〇的1〇克三元 共聚物，以及〇·3克的縮水甘油丙缚酸醋外，其餘均按照 合成範例1所述之方式取得一種黏結劑用樹脂。 [合成範例6] 除使用甲基丙稀酸节酯：甲基丙婦酸：苯乙稀之克分 子比為60·· 30: H)，和數均分子量為145〇〇的1〇克三元 共聚物，以及0.05克的縮水甘油”酸料，其餘均按 照合成範例1所述之方式取得一種黏結劑用樹脂 本紙張尺度帽國家鮮（CNS)A挪公爱__ 15 12866661286666 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed A7 V. Invention Description (s) Phenyl acrylate is better. The compound of the formula 2 is preferably a compound selected from the group consisting of styrene, 4-hydroxystyrene, acesulfame or ethyl acetate. Further, the compound of Chemical Formula 5 is preferably a glycidyl acrylate or a glycidyl methacrylate. This compound uses a monomer having a carboxylic acid in Chemical Formula 2 in a molar ratio of gram. A cross-linking compound having at least a di-unsaturated group, which may be used in the present invention, if necessary, comprises a polyethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate vinegar, 153-butanediol II (meth) acrylate, neopentyl glycol di(meth) acrylate, hexane hexane di(meth) acrylate 酉曰 甲基 甲基 甲基 甲基 甲基 , , , , , , , Methyl) acrylate, pentaerythritol tri(meth) acrylate, pentaerythritol tetra(meth) acrylate, pentaerythritol hexa(meth) acrylate, dipentaerythritol penta (meth) acrylate 'dipentaerythritol hexa a compound selected from the group consisting of methyl acrylate, trimethylolpropane diacrylate, and mixtures thereof, but di-pentaerythritol penta(methyl) acrylate and dipentaerythritol (Meth)acrylic acid vinegar is preferred. The content of the cross-linking compound is from 0 to 200% by weight based on the total weight of the resin for the self-curing adhesive, but it is preferably from 〇 to 15% by weight. An example of a photopolymerization initiator is a benzophenone such as benzophenone and acetophenone; a substituted benzophenone such as bis-4,4, dioxane A benzophenone and bis- 4,4'-diethylaminobenzophenone; triterpene light bow hair styling agent, such as 2,4,6-tris(tris gas methyltriazine; ketone photoinitiator, for example, 'paper scale for China National Standard (CNS) A4 Specification (210 X 297 mm) 12 --------^--------- (Please read the notes on the back and fill out this page) 1286666 Ministry of Economics Property Bureau Staff Consumer Cooperatives Printed A7 B7 V. Description of Invention (9) I-based _2·benzamide ff-·········2,2, methoxy m, vinyl alcohol, and mixtures thereof The compound selected from the group is preferably 0.1 to 10% by weight based on the total weight of the photopolymerizable mixture. The polymerization H-agent which is mainly used for the acrylic polymer is _butanone. Selected from the group consisting of tetrahydrofuran 'methyl cellosolve, methyl cellosolve acetate, dimethylformamide, propylene glycol methyl ether acetate §, 2-methoxyethyl ether, and mixtures thereof On the other hand, in addition to the former essential component, a small amount of pigment, dye, antifoaming agent for promoting film properties, surfactant, thermal polymerization prevention may be used in the photosensitive resin mixture of the present invention as necessary. a reagent, a viscosity promoter, etc. The finally obtained photosensitive resin mixture solution is filtered by a membrane filter having a pore size of 1 to 5 μm. For the filtered resin mixture, a conventional method is additionally used. For example, spin coating method, roll coating method, spray coating method, etc. A glass plate or a silicon wafer can be used as a coating substrate, wherein the thickness of the film surface is determined by coating conditions, such as compositional viscosity, solid content concentration, And a film coating rate and the like, and a film having a thickness of 0.1 to 500 μm can be obtained by using the mixture of the present invention. The obtained film is pretreated for 10 to 500 seconds in a hot plate or oven maintained at a temperature of 50 to 150. A positive type test reticle (manufactured by Toppail Printing Co., Ltd.), which irradiates a slightly dry film with ultraviolet rays, wherein a The 1 k W high-pressure mercury lamp of g ' h and i line is irradiated with ultraviolet light with an illumination of l〇〇mJ/cm 2 , and no special optical fiber is used. This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 PCT) 13 -----------"^农--------Book--------Line (please read the note on the back? ) Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed 1286666 A7 ^ ---------- B7 V. Invention description (1〇), 'The main image of the area illuminated by the external image, its solubility becomes much lower In areas that have not been exposed to ultraviolet light, the difference in solubility between the two is maximized. The film that has been irradiated on the outside of the eaves is in the range of 2〇. Developing under the temperature condition of C by spraying or conditional precipitation, wherein the acid test (10)) is a potassium hydroxide aqueous solution having a value of 9 to 12, or the tetramethylammonium aqueous solution having a weight percentage of 〇ι to 5 can be used as a Used as a developer. DETAILED DESCRIPTION OF THE INVENTION In the following detailed description, the preferred embodiments of the invention are shown and described As is known, the invention can be modified in many ways that do not depart from its spirit. Accordingly, the description herein is to be considered as illustrative rather than limiting. A number of synthetic examples and examples are set forth below to assist in understanding the invention. However, the following synthetic examples and examples are only intended to assist the understanding of the invention and are not intended to limit the scope of the invention. [Synthesis Example 1] A molar ratio of benzyl methacrylate:methacrylic acid was 6 〇: 4 Å, and 10 gram of a copolymer having a number average molecular weight of 10,000 was placed in a mixing injection of Is and a gas injection hole. In the beaker, dissolve with butanone of IQQgm. After the temperature of the beaker was increased to 120 ° C, 3 g of glycidyl methacrylate was slowly added over one hour to allow the solution to react until the ring gas group was completely removed. A resin for a binder was obtained by using a mixture of n-hexane and methanol in a ratio of 1:1, forming a precipitate from the reactant, and drying under vacuum. This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 14 — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — — Please read the phonetic transcription on the back? Please fill out this page again. 1286666 A7 V. Description of the invention (11 [Synthesis example 2] (Please read the notes on the back and then fill out this page) 2. Use the methyldecenoic acid section for the purpose: A resin for a binder was obtained in the manner described in Synthesis Example i except that the molar ratio of methacrylic acid was 1 gram of copolymer of 〇' and number average molecular I of 15,000, and 0.3 3 of glycidol acrylate vinegar. [Synthesis Example 3] • In addition to the use of methyl@enoic acid section 8, the molar ratio of methacrylic acid is 70:30' and the number average molecular weight 为1 is 15,000 of 1 gram copolymer, and 〇·〇5 A gram of glycidol was added to the acid, and the rest was obtained as a resin for the binder according to the method described in Synthesis Example 1. [Synthesis Example 4]. The molar ratio of methyl propyl (tetra) m methyl propyl was 70 30 The number of symplectic knives is 1 gram of copolymer to Except for 4 g of glycidol acrylate vinegar, the other resin was obtained as described in Synthetic Example i. [Synthesis Example 5] Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed in addition to using methacrylic acid Kraft vinegar: methyl acetoacetate: styrene has a molar ratio of 5 〇: 40:10, and a 1 gram ternary copolymer with a number average molecular weight of 145 Å, and a 3 gram of glycidol In addition to the acid vinegar, the other resin was obtained in the manner described in Synthesis Example 1. [Synthesis Example 6] Except for the use of methyl acrylate acid ester: methyl propyl benzoic acid: styrene molar ratio It is 60·· 30: H), and a 1 gram terpolymer having a number average molecular weight of 145 Å, and 0.05 g of glycidol acid, and the others are obtained as described in Synthesis Example 1. Resin paper size cap national fresh (CNS) A novo love __ 15 1286666
五、發明說明（12 ) 使用在前述合成範例1至6所配製的一種黏結劑用樹 脂，據以配製本發明的一種光敏樹脂混合物。 [範例1] 以下列表1中所載列的混合物來配製一種光敏樹脂混 合物 [表1] 依合成範例1所製備的黏結劑用樹脂 雙·4,4’·二乙氨基二苯甲酮 丙二醇甲醚醋酸酯 克 2克 20克 經濟部智慧財產局員工消費合作社印製 使用一種具有0.2 μηι孔隙的鐵氟龍（Teflon)膜濾器， 對如上配製的混合物溶液加以過遽。用一種旋轉（S p丨n )法 把一光敏樹脂混合物塗佈到一玻璃板上，再置放到一加熱 板上，並在80。(：溫度條件下保持3分鐘。接著，將一正 型（positive type)測試光罩（由 Toppail printing Co·，Ltd j 司產製）當作一種接觸方法置於一薄膜上之後，便對其上 照射紫外線’其中係使用一種含有g，h和丨線的1 kW高 壓水銀燈，以100 mj/cm2的照度來照射紫外線，此外未使 用特殊的光纖。經紫外線照射的薄膜，在一種酸鹼（pH)值 為1〇·5的含水溶液顯影劑中浸兩分鐘，使其顯影。以蒸 顧水清洗塗佈薄膜的玻璃板後，用氮氣將它吹乾，再送入 烤箱中以250 °c的溫度加熱一小時。結果所獲得的膜厚 為3·5 μηι，並可獲得具有8 μηι線寬及間隙的清晰圖型 (clear pattern) 〇 [範例2] 以下列表2中所載列的混合物來配製一種光敏樹脂混 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 16 (請先閱讀背面之注咅？事項再填寫本頁) ▼裝--------訂---------線泰 1286666 A7 _______ R7 五、發明說明（13 ) 合物。 [表2] 依合成範例2所製備的黏結劑用樹脂 5克 雙二乙氨基二笨甲酮 2克 _ 丙二醇甲醚醋酴醢 -------- 20克 以前述範例1所載方法而製備的光敏樹脂混合物來形 成一薄膜’於100 mJ/cm2的照度下使其曝光，並予顯影。 (請先閱讀背面之注意事項再填寫本頁) 結果所獲得的膜厚為3.5 μηι，並可獲得具有7 μηι線寬 及間隙的清晰圖型。 [範例3] 以下列表3中所載列的混合物來配製一種光敏樹脂混 合物。 [表 2]___ I二依合成範例3 劑用榭脂 __雙_4,4、二乙赛苯甲酮_ 2克 —_ _丙二醇甲鍵醋酸醋_ 20克 以前述範例1所載方法而製備的光敏樹脂混合物來形 成一薄膜’於150 mJ/cm2的照度下使其曝光，並予顯影。 經濟部智慧財產局員工消費合作社印製 結果所獲得的膜厚為4·0 μιη，並可獲得具有9 μιη線 寬及間隙的清晰圖型。 [範例4] 以下列表4中所載列的混合物來配製一種光敏樹脂混 合物。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 17 1286666 A7 五、發明說明（14 [表4] 依合成範例4所H的黏結劑用樹脂 繁-4,4’-二乙氨基二笨甲酮 丙二醇甲醚醋酸酯 季戊四醇四曱基丙烯酸酯 4克 30克 以前述範例1所載方法而製備的光敏樹脂混合物來形 成一薄膜’於150 mj/cm2的照度下使其曝光，並予顯影。 結果所獲得的膜厚為4.5 μηι，並可獲得具有8 fim線 寬及間隙的清晰圖型。 [範例5 ] 以下列表5中所載列的混合物來配製一種光敏樹脂混 合物。 [表5] -^例5所製備的點结劑用樹脂 5克 ----一乙氨基二苯甲酮 2克 甲醚醋酸酯 _ 20克 以雨述範例1所載方法而製備的光敏樹脂混合物來形 &一薄膜’於150 mj/cm2的照度下使其曝光，並予顯影。 ^裝--------有---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 結果所獲得的膜厚為3.8 μΓη，並可獲得具有9 ^爪線 £及間隙的清晰圖型。 [範例6] 以下列表6中所載列的混合物來配製一種光敏樹脂混 卜物0 紙 本 认度週用_家標^ _Α4規格（21G χ 297公爱） 18 1286666 A7 B7 經濟部中央標準局員工消費合作社印製 i、發明説明（15 ) [表6] -- - - ---—__ 備的黏結劑用樹脂 5克 一._雙-4,4上三基二苯甲酮 3克 — \ 丙二醇甲醚醋酸酯 40克 一 季戊四醇四丙烯酸酯 2克 以前述範例1所載方法而製備的光敏樹脂混合物來形 成一薄膜，於100 mJ/cm2的照度下使其曝光，並予顯影。 結果所獲得的膜厚為3.丨μιη，並可獲得具有7 μηι線 寬及間隙的清晰圖型。 [範例7] 以下列表7中所載列的混合物來配製一種光敏樹脂混 合物。不同於前述各範例，光敏樹脂混合物的配製方法並 非先合成黏結劑用樹脂，而是把原料（starting material)與 包括本範例7之光敏樹脂混合物的成分放在一起。 [表7] 甲基丙烯酸苄酯/甲基丙烯酸共聚物 一（克分子比二6〇/4〇，數均分子量=i〇〇〇〇) 5克 縮水甘油曱基丙烯酸酯 0.15 克 雙-4,4’-二乙氨基二苯曱酮 2克 丙二醇甲醚醋酸酯 2〇克 以前述範例1所載方法而製備的光敏樹脂混合物來形 成一薄膜’於100 mJ/cm2的照度下使其曝;光，並予顯影。 結果所獲得的膜厚為3 _ 6 μ m，並可獲得具有8 μ m線 寬及間隙的清晰圖型。 [比較範例1至3] 以下列表8中所載列的混合物來配製一種光敏樹脂混 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 19 n Ii i- - ....... Ill - ----- II —-I- I I m -1— 1 \""¥ (請先閱讀背面之注意事項再填寫本頁) 1286666 __Β7 五、發明説明（16) 合物。 [表8] 曱基丙烯酸苄酯/甲基丙烯酸共聚物 (克分子比二70/30，數均分子量二10000) 5克 季戊四醇四（曱基）丙烯酸酯 5克 雙-4,4’-二乙氨基二苯甲酮 2克 丙二醇甲醚醋酸酯 40克 --------r—φ! (請先閱讀背面之注意事項再填寫本頁} 在使用以前述範例1所載方法而取得的光敏樹脂混合 物來形成一薄膜後，利用變更曝光量而形成圖型的方式， 即獲得如後表9所載的結果。 [表9] 類別 比較範例1 比較範例2 比較範例3 曝光量 100 mJ/cm2 100 mJ/cm2 100 Mj/cm2 膜厚 - 3.0 μιη 3.8 μηι 分辨能力 圖型遺失 20 μηι 10 μιη 經濟部中央標準局負工消費合作社印繁 依據範例1至7所獲得的結果，如為使用依本發明所 配製的一種採用自固化式黏結劑用樹脂的光敏樹脂混合物 來形成一涛膜者，則在照射的曝光量為1 〇〇到1 5〇 mJ/cm2 的照度時，所獲得的膜厚為3到5 μηι，另可獲得具有7 到9 μηι線寬及間隙的清晰圖型。 反之，若為比較範例1至3的那些未採用自固化式黏 結劑用樹脂的光敏樹脂混合物，則在曝光;量為1 〇〇 mJ/cm2 時，圖型本身即遺失，而在曝光量增加到150至200 mJ/’cm2 時，膜厚是3.0到3.8 μηι ’線寬及間隙則從20 μηι減至10 μηι。因此可知，若為未使用自固化式黏結劑用樹脂的光 敏樹脂混合物，增加曝光量即可獲得清晰圖型，但曝光量 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X297公釐） 20 1286666 A7 p---____ B 7 五、發明説明（17 ) 〜〜" 的增加也表示製程時間增長。另外可知，因為在曝光量為 200 mJ/crn2時，薄膜圖型的厚度相當於3 8只⑺，而線寬及 間隙則相當於10 μηι ,所以和按照本發明各範例求出的結 果相比’無法獲得更清楚和更細緻的圖型。 因此，本發明雖然所施用的曝光量較少，但用自固化 式黏合劑用樹脂所構成的光敏樹脂混合物卻可獲得比現有 各種混合物更清楚及細緻的圖型，從而縮短紫外線照射過 程的時間，所以可提供一種具有各種加工利益，優良解像 力和薄膜性質的光敏樹脂混合物。 以上所舉實施例僅用以說明本發明而已，非用以限制 本發明之範圍。舉凡不違本發明精神所從事的種種修改或 變化，倶屬本發明申請專利範圍。 ——, 卜_ 訂ί 嬅L (請先閱讀背面之注意事項再填寫本頁) 經濟部中央標準局員工消費合作社印製 適 度 尺 張 紙 國V. INSTRUCTION DESCRIPTION OF THE INVENTION (12) A photosensitive resin mixture of the present invention was prepared by using a resin for a binder formulated in the aforementioned Synthesis Examples 1 to 6. [Example 1] The mixture shown in the following Table 1 was used to prepare a photosensitive resin mixture [Table 1] The resin for the binder prepared according to Synthesis Example 1 bis 4,4'-diethylaminobenzophenone propylene glycol A Ether Acetate 2 g 20 g Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed The mixture solution prepared above was over-twisted using a Teflon membrane filter with 0.2 μηι pores. A photosensitive resin mixture was applied to a glass plate by a spin (Sp丨n) method, and placed on a heating plate at 80 Å. (: Hold for 3 minutes under temperature conditions. Then, after a positive type test reticle (manufactured by Toppail Printing Co., Ltd.) was placed on a film as a contact method, it was The upper ultraviolet ray is a 1 kW high-pressure mercury lamp containing g, h and krypton lines, and is irradiated with ultraviolet light at an illumination of 100 mj/cm2, and no special optical fiber is used. The ultraviolet-irradiated film is in an acid-base ( The aqueous solution containing the pH value of 1 〇·5 was immersed for two minutes to develop it. After washing the glass plate of the coated film with steam, it was blown dry with nitrogen and then sent to the oven at 250 ° C. The temperature was heated for one hour. As a result, the obtained film thickness was 3·5 μηι, and a clear pattern having a line width and a gap of 8 μηι was obtained. [Example 2] The mixture listed in the following Table 2 To prepare a photosensitive resin mixed paper size for the Chinese National Standard (CNS) A4 specifications (210 X 297 mm) 16 (please read the back of the note? Please fill out this page) ▼装------- -Order---------Line Thai 1286666 A7 ____ R7 Five Invention (13) Compound [Table 2] Resin for the binder prepared according to Synthesis Example 2 5 g of bisdiethylaminodibenzophenone 2 g_propylene glycol methyl ether vinegar ------- - 20 g of the photosensitive resin mixture prepared by the method described in the above Example 1 to form a film 'exposure at 100 mJ/cm 2 and developed. (Please read the back note and fill out this page) As a result, the film thickness obtained was 3.5 μm, and a clear pattern having a line width of 7 μηι and a gap was obtained. [Example 3] A mixture of the photosensitive resin was prepared by the mixture shown in the following Table 3. [Table 2]___ I, according to the synthesis example 3, the use of rouge __ double _4,4, diacetyl benzophenone _ 2 gram - _ propylene glycol methyl acetate vinegar _ 20 grams of photosensitive resin prepared by the method described in the above Example 1 The mixture is formed into a film which is exposed to light at 150 mJ/cm2 and developed. The film thickness obtained by the Ministry of Economic Affairs Intellectual Property Office employee consumption cooperative is 4·0 μηη, and can be obtained with 9 μm Clear pattern of line width and gap. [Example 4] Listed in the following list 4 To prepare a photosensitive resin mixture. This paper scale is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 17 1286666 A7 V. Invention description (14 [Table 4] According to the synthesis example 4 H adhesive Resin-4,4'-diethylaminodibenzophenone propylene glycol methyl ether acetate pentaerythritol tetradecyl acrylate 4 g 30 g of a photosensitive resin mixture prepared by the method described in the above Example 1 to form a film It was exposed to light at 150 mj/cm2 and developed. As a result, the film thickness obtained was 4.5 μm, and a clear pattern having a line width of 8 μm and a gap was obtained. [Example 5] The mixture shown in the following Table 5 was used to prepare a photosensitive resin mixture. [Table 5] - 5 parts of the resin for the preparation of the preparation agent of Example 5, which was prepared by the method of the method of the first example, which was prepared by the method of the method of the first embodiment. The resin mixture was shaped and exposed to light at 150 mj/cm 2 and developed. ^装--------There is --------- line (please read the note on the back and then fill out this page) The film thickness obtained by the Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing results It is 3.8 μΓη and a clear pattern with 9^ claw line and gap is obtained. [Example 6] The mixture listed in the following Table 6 is used to prepare a photosensitive resin mixed material. 0 Paper is used for weekly use _ _ _ _ Α 4 specifications (21G χ 297 public) 18 1286666 A7 B7 Central Bureau of Standards of the Ministry of Economic Affairs Employee consumption cooperative printing i, invention instructions (15) [Table 6] --- - ----__ Preparation of adhesive resin 5 grams a. _ double-4,4 upper trisyl benzophenone 3 grams — propylene glycol methyl ether acetate 40 g of pentaerythritol tetraacrylate 2 g of a photosensitive resin mixture prepared by the method described in the above Example 1 to form a film, which was exposed to light at 100 mJ/cm 2 and developed. As a result, the film thickness obtained was 3. 丨μιη, and a clear pattern having a line width of 7 μηι and a gap was obtained. [Example 7] The mixture shown in the following Table 7 was used to prepare a photosensitive resin mixture. Unlike the foregoing examples, the photosensitive resin mixture is formulated by not synthesizing the resin for the binder, but by putting together the starting material and the composition including the photosensitive resin mixture of this Example 7. [Table 7] Benzyl methacrylate/methacrylic acid copolymer 1 (molar ratio: 6 〇/4 〇, number average molecular weight = i 〇〇〇〇) 5 g of glycidyl methacrylate 0.15 g double-4 4'-diethylaminodibenzophenone 2 g of propylene glycol methyl ether acetate 2 g of the photosensitive resin mixture prepared by the method described in the above Example 1 to form a film 'exposure at 100 mJ/cm 2 illuminance Light, and develop. As a result, the film thickness obtained was 3 -6 μm, and a clear pattern having a line width of 8 μm and a gap was obtained. [Comparative Examples 1 to 3] The following list of the mixtures listed in Table 8 is used to prepare a photosensitive resin mixed paper. The scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 19 n Ii i- - ..... .. Ill - ----- II —-I- II m -1— 1 \""¥ (Please read the note on the back and fill out this page) 1286666 __Β7 V. Description of invention (16) . [Table 8] Benzyl methacrylate/methacrylic acid copolymer (molar ratio two 70/30, number average molecular weight two 10000) 5 g pentaerythritol tetrakis(fluorenyl) acrylate 5 g double-4, 4'-two Ethylaminobenzophenone 2 g propylene glycol methyl ether acetate 40 g --------r-φ! (Please read the note on the back and then fill out this page) In the use of the method described in Example 1 above After the obtained photosensitive resin mixture was formed into a film, the pattern was changed by changing the exposure amount, that is, the results as shown in the following Table 9 were obtained. [Table 9] Category Comparison Example 1 Comparative Example 2 Comparative Example 3 Exposure amount 100 mJ/cm2 100 mJ/cm2 100 Mj/cm2 Film thickness - 3.0 μιη 3.8 μηι Resolving power pattern missing 20 μηι 10 μιη The Central Bureau of Standards of the Ministry of Economic Affairs, the Consumers’ Cooperative, based on the results obtained in Examples 1 to 7, Using a photosensitive resin mixture prepared by using the resin for self-curing adhesive according to the present invention to form a film, when the exposure amount of the irradiation is 1 〇〇 to 15 〇 mJ/cm 2 , the obtained illuminance is obtained. The film thickness is 3 to 5 μηι, and the other is available with 7 a clear pattern of line width and gap of 9 μηι. Conversely, if it is a photosensitive resin mixture of Comparative Examples 1 to 3 which does not use a resin for self-curing adhesive, it is exposed; when the amount is 1 〇〇mJ/cm 2 , The pattern itself is lost, and when the exposure is increased to 150 to 200 mJ/'cm2, the film thickness is 3.0 to 3.8 μηι 'the line width and the gap is reduced from 20 μηι to 10 μηι. Therefore, it is known that if it is not used The photosensitive resin mixture of the resin for curing adhesive can obtain a clear pattern by increasing the exposure amount, but the exposure amount is applicable to the Chinese National Standard (CNS) Α4 specification (210×297 mm). 20 1286666 A7 p---____ B 7 V. Invention Description (17) The increase of ~~" also indicates that the process time has increased. It is also known that the thickness of the film pattern is equivalent to 38 (7) when the exposure amount is 200 mJ/crn2, and the line width and The gap is equivalent to 10 μm, so that a clearer and more detailed pattern cannot be obtained compared to the results obtained in accordance with the examples of the present invention. Therefore, although the present invention applies less exposure, it uses self-curing. Adhesive tree The photosensitive resin mixture formed can obtain a clearer and more detailed pattern than the existing various mixtures, thereby shortening the time of the ultraviolet irradiation process, thereby providing a photosensitive resin mixture having various processing benefits, excellent resolution and film properties. The present invention is intended to be illustrative only and not to limit the scope of the present invention. ——, 卜 _ ί 嬅 (L (Please read the note on the back and fill out this page) Printed by the Central Bureau of Standards and Staff of the Ministry of Economic Affairs