TW201418333A - Heat resistance material and heat resistance component - Google Patents
Heat resistance material and heat resistance component Download PDFInfo
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- TW201418333A TW201418333A TW102137000A TW102137000A TW201418333A TW 201418333 A TW201418333 A TW 201418333A TW 102137000 A TW102137000 A TW 102137000A TW 102137000 A TW102137000 A TW 102137000A TW 201418333 A TW201418333 A TW 201418333A
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- fragment
- parts
- composite resin
- resistant material
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- 239000000463 material Substances 0.000 title abstract description 8
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/10—Block- or graft-copolymers containing polysiloxane sequences
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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Abstract
Description
本發明是有關於一種耐光性與耐熱性優異、並且為低線膨脹率的耐熱材料、及使用該耐熱材料的耐熱構件。 The present invention relates to a heat resistant material which is excellent in light resistance and heat resistance and which has a low coefficient of linear expansion, and a heat resistant member using the heat resistant material.
不會因太陽光或螢光燈、發光二極體(Light Emitting Diode,LED)光或紫外線(ultraviolet,UV)燈等的光而劣化的耐光性樹脂,用於建築材料或光學構件、電氣電子構件等各種用途。 A light-resistant resin that does not deteriorate due to sunlight, fluorescent light, light-emitting diode (LED) light, or ultraviolet (UV) light, used in building materials or optical components, electrical and electronic Various uses such as components.
另一方面,隨著近來的電子設備的小型化、積體化,而要求不會因所產生的熱而劣化、並且尺寸穩定性、即低線膨脹率的樹脂。 On the other hand, with the recent miniaturization and integration of electronic devices, there is a demand for a resin that does not deteriorate due to heat generated and has dimensional stability, that is, a low linear expansion ratio.
作為耐光性優異的樹脂,例如在專利文獻1中揭示有具有聚矽氧烷結構的複合樹脂。該複合樹脂可形成暴露時的光澤保持性及斥水性保持性等耐久性優異的硬化塗膜,但並未揭示對於熱的穩定性。另外,作為耐熱性優異的樹脂膜,例如在專利文獻2中揭示降冰片烯化合物聚合物膜。該樹脂膜雖然線膨脹率小且膜 穩定性優異,但對於因太陽光或螢光燈、LED光或UV燈等的光引起的劣化並未揭示。 As a resin excellent in light resistance, for example, Patent Document 1 discloses a composite resin having a polysiloxane structure. The composite resin can form a cured coating film having excellent durability such as gloss retention and water repellency retention upon exposure, but does not reveal heat stability. In addition, as a resin film excellent in heat resistance, for example, Patent Document 2 discloses a norbornene compound polymer film. The resin film has a small coefficient of linear expansion and a film The stability is excellent, but deterioration due to light such as sunlight or fluorescent lamps, LED light, or UV lamps is not disclosed.
另一方面,為了賦予其有機聚合物所具有的加工性、柔 軟性等特性、以及無機材料所具有的耐熱性、耐磨性等表面硬度等特性,而廣泛地進行了將無機微粒子調配至有機聚合物中的研究。 On the other hand, in order to impart the processability and flexibility to the organic polymer The properties such as softness and surface hardness such as heat resistance and abrasion resistance of inorganic materials have been extensively studied for the formulation of inorganic fine particles into organic polymers.
例如,在如有效利用無機材料固有的特性的設計中,藉由以高的濃度調配粒徑極小的無機微粒子,而可期待更高的複合化效果。原因是,粒徑越小,則無機微粒子的單位重量的表面積變得越大,有機聚合物與無機材料的界面區域變得越寬。而且若無機微粒子的濃度變高,則會更強地發揮出無機材料的特性。 For example, in a design in which the characteristics inherent to the inorganic material are effectively utilized, a higher composite effect can be expected by blending inorganic fine particles having a very small particle diameter at a high concentration. The reason is that the smaller the particle diameter, the larger the surface area per unit weight of the inorganic fine particles becomes, and the wider the interface region between the organic polymer and the inorganic material becomes. Further, when the concentration of the inorganic fine particles is increased, the characteristics of the inorganic material are more strongly exhibited.
就塗敷或操作的觀點而言,此種有機聚合物與無機微粒 子的調配體系大體上是使用液狀有機聚合物、成為有機聚合物的原料的單體、或有機溶劑等,以塗料或油墨等液狀物供給。但亦已知:在分散介質中以高的濃度調配此種無機微粒子時,難以獲得穩定的分散液,且在製造作業上及所得的製品的價值上引起各種問題。即存在產生以下問題的情況:粒徑極小的無機微粒子由於表面活性高而發生二次凝聚,因該二次凝聚體而引起的分散穩定性的降低,或所得的塗膜物性因塗膜部位而不同等物性的均勻性欠缺等。 Such organic polymers and inorganic particles from the viewpoint of coating or handling The compounding system is generally a liquid material such as a coating material or an ink, which is a liquid organic polymer, a monomer which is a raw material of the organic polymer, or an organic solvent. However, it is also known that when such inorganic fine particles are blended at a high concentration in a dispersion medium, it is difficult to obtain a stable dispersion liquid, and various problems are caused in the production work and the value of the obtained product. That is, there is a case in which the inorganic fine particles having extremely small particle diameter are secondaryly aggregated due to high surface activity, the dispersion stability due to the secondary aggregates is lowered, or the obtained coating film properties are due to the coating film portion. The uniformity of different physical properties is lacking.
作為使二氧化矽等無機微粒子分散於有機聚合物中的 技術,例如已知:使藉由偶合劑進行表面處理的無機微粒子分散 於樹脂中的方法(參照專利文獻1)、或使用界面活性劑使無機微粒子分散的方法(參照專利文獻2)、或使用含有內酯改質羧基的(甲基)丙烯酸酯與(甲基)丙烯酸的己內酯的混合物使無機微粒子分散的方法(參照專利文獻3)等。 Dispersing inorganic fine particles such as cerium oxide in an organic polymer Techniques, for example, are known: dispersing inorganic microparticles by surface treatment with a coupling agent A method of using a resin (refer to Patent Document 1), a method of dispersing inorganic fine particles by using a surfactant (see Patent Document 2), or a (meth) acrylate having a lactone-modified carboxyl group and (meth) A method of dispersing inorganic fine particles in a mixture of caprolactone of acrylic acid (see Patent Document 3).
[現有技術文獻] [Prior Art Literature]
[專利文獻] [Patent Literature]
[專利文獻1]國際公開第96/035755號 [Patent Document 1] International Publication No. 96/035755
[專利文獻2]國際公開第07/135887號公報 [Patent Document 2] International Publication No. 07/135887
[專利文獻3]日本專利特公平7-98657號公報 [Patent Document 3] Japanese Patent Special Publication No. 7-98657
[專利文獻4]日本專利特公平8-13938號公報 [Patent Document 4] Japanese Patent Special Publication No. 8-13938
[專利文獻5]日本專利特開2000-281934號公報 [Patent Document 5] Japanese Patent Laid-Open Publication No. 2000-281934
[專利文獻6]國際公開第96/035755號說明書 [Patent Document 6] International Publication No. 96/035755
[專利文獻7]日本專利特開2006-328354號公報 [Patent Document 7] Japanese Patent Laid-Open Publication No. 2006-328354
本發明的課題在於提供一種不僅耐光性優異、而且耐熱性優異、為低線膨脹率、且對於熱歷程而尺寸穩定性亦優異的耐熱材料。 An object of the present invention is to provide a heat resistant material which is excellent not only in light resistance but also in heat resistance, has a low coefficient of linear expansion, and is excellent in dimensional stability with respect to heat history.
本發明者等人努力研究的結果發現,具有特定聚矽氧烷片段(a1)與乙烯系聚合物片段的複合樹脂(A),不僅耐光性優異,而且耐熱性亦優異,並且為低線膨脹比率,從而解決了上述課題。 As a result of intensive studies by the inventors of the present invention, it has been found that the composite resin (A) having the specific polyoxyalkylene fragment (a1) and the ethylene-based polymer segment is excellent not only in light resistance but also in heat resistance and low in linear expansion. The ratio solves the above problems.
即本發明藉由提供一種耐熱材料而解決上述課題,
上述耐熱材料的特徵在於含有複合樹脂(A),上述複合樹脂(A)為聚矽氧烷片段(a1)與乙烯系聚合物片段(a2)藉由通式(3)所示的鍵所鍵結而成,上述聚矽氧烷片段(a1)具有通式(1)及/或通式(2)所示的結構單元及矽烷醇基及/或水解性矽烷基:
(通式(1)及通式(2)中,R1、R2及R3分別獨立地表示:具有選自由-R4-CH=CH2、-R4-C(CH3)=CH2、-R4-O-CO-C(CH3)=CH2、及-R4-O-CO-CH=CH2所組成的群組的1種聚合性雙鍵的基團(其中,R4表示單鍵或碳原子數為1~6的伸烷基)、碳原子數為1~6的烷基、碳原子數為3~8的環烷基、芳基、或碳原子數為7~12的芳烷基)
(通式(3)中,碳原子構成上述乙烯系聚合物片段(a2)的一部分,僅與氧原子鍵結的矽原子構成上述聚矽氧烷片段(a1)的一部分)。 (In the formula (3), a carbon atom constitutes a part of the above-mentioned ethylene-based polymer fragment (a2), and only a ruthenium atom bonded to an oxygen atom constitutes a part of the above-mentioned polyoxyalkylene fragment (a1).
而且提供耐熱材料,其中在上述複合樹脂(A)中,上述聚矽氧烷片段(a1)為將具有矽烷醇基及/或水解性矽烷基的矽烷化合物縮合而得的片段,且上述具有矽烷醇基及/或水解性矽烷基的矽烷化合物中,含有環氧基的矽烷化合物為25重量%以上、90重量%。 Further, a heat resistant material is provided, wherein in the above composite resin (A), the polyoxyalkylene fragment (a1) is a fragment obtained by condensing a decane compound having a decyl alcohol group and/or a hydrolyzable decyl group, and the above has decane. In the decane compound of the alcohol group and/or the hydrolyzable alkylene group, the epoxy group-containing decane compound is 25% by weight or more and 90% by weight.
而且提供耐熱材料,其特徵在於:含有上述複合樹脂(A)、與無機微粒子。 Further, a heat resistant material is provided, which comprises the above composite resin (A) and inorganic fine particles.
而且提供耐熱材料,其中在上述複合樹脂(A)中,相對於複合樹脂(A)的總固體成分量,聚矽氧烷片段(a1)的含有率為45重量%~95重量%。 Further, a heat resistant material is provided, wherein the content of the polyoxymethane fragment (a1) in the composite resin (A) is from 45% by weight to 95% by weight based on the total solid content of the composite resin (A).
而且提供耐熱材料,其中在上述複合樹脂(A)中,上述聚矽氧烷片段(a1)為將具有矽烷醇基及/或水解性矽烷基的矽烷化合物縮合而得的片段,且上述具有矽烷醇基及/或水解性矽烷 基的矽烷化合物中,三烷氧基矽烷為40莫耳%以上。 Further, a heat resistant material is provided, wherein in the above composite resin (A), the polyoxyalkylene fragment (a1) is a fragment obtained by condensing a decane compound having a decyl alcohol group and/or a hydrolyzable decyl group, and the above has decane. Alcohol and/or hydrolyzable decane Among the decane compounds of the group, the trialkoxy decane is 40 mol% or more.
而且提供耐熱材料,其特徵在於:在上述複合樹脂(A)中,三烷氧基矽烷是碳原子數為1~4的單烷基三烷氧基矽烷。 Further, a heat resistant material is provided, characterized in that, in the above composite resin (A), the trialkoxysilane is a monoalkyltrialkoxydecane having 1 to 4 carbon atoms.
而且提供一種耐熱構件,其將上述耐熱材料成型而成。 Further, a heat resistant member is provided which is formed by molding the above heat resistant material.
本發明的耐熱材料不僅耐光性優異,而且耐熱性亦優異,因此可較佳地用於室外的用途或容易產生高溫的光學構件或電氣.電子構件。另外,將本耐熱材料成型而得的耐熱構件由於線膨脹率低而尺寸穩定性優異,因此可特佳地用作高精度的電氣.電子構件。 The heat-resistant material of the present invention is excellent not only in light resistance but also in heat resistance, and therefore can be preferably used for outdoor use or an optical member or electric which is prone to high temperature. Electronic components. In addition, the heat-resistant member obtained by molding the heat-resistant material has excellent linear expansion coefficient and excellent dimensional stability, and thus can be particularly preferably used as a high-precision electric. Electronic components.
[複合樹脂(A)] [Composite Resin (A)]
本發明所使用的複合樹脂(A)的特徵在於:其是具有上述通式(1)及/或上述通式(2)所示的結構單元及矽烷醇基及/或水解性矽烷基的聚矽氧烷片段(a1)(以下簡稱為聚矽氧烷片段(a1))、與乙烯系聚合物片段(a2)藉由上述通式(3)所示的鍵所鍵結而成的複合樹脂(A)。 The composite resin (A) used in the present invention is characterized in that it is a polymer having the structural unit represented by the above formula (1) and/or the above formula (2) and a stanol group and/or a hydrolyzable alkyl group. a siloxane derivative (a1) (hereinafter abbreviated as a polyoxyalkylene fragment (a1)), and a composite resin obtained by bonding a vinyl polymer fragment (a2) with a bond represented by the above formula (3) (A).
後述的聚矽氧烷片段(a1)所具有的矽烷醇基及/或水解性矽烷基、與後述的乙烯系聚合物片段(a2)所具有的矽烷醇基及/或水解性矽烷基進行脫水縮合反應,而生成上述通式(3)所示 的鍵。因此,在上述通式(3)中,碳原子構成上述乙烯系聚合物片段(a2)的一部分,僅與氧原子鍵結的矽原子構成上述聚矽氧烷片段(a1)的一部分。 Dehydration of a decyl alcohol group and/or a hydrolyzable decyl group which the polyaluminoxane fragment (a1) which is described later has, and a decyl alcohol group and/or a hydrolyzable decyl group which the ethylene-based polymer fragment (a2) mentioned later has. a condensation reaction to form the above formula (3) Key. Therefore, in the above formula (3), a carbon atom constitutes a part of the above-mentioned ethylene-based polymer fragment (a2), and only a ruthenium atom bonded to an oxygen atom constitutes a part of the above-mentioned polyoxyalkylene fragment (a1).
複合樹脂(A)的形態例如可列舉:具有使上述聚矽氧烷片段(a1)作為上述聚合物片段(a2)的側鏈而化學鍵結的接枝結構的複合樹脂、或具有使上述聚合物片段(a2)與上述聚矽氧烷片段(a1)進行化學鍵結的嵌段結構的複合樹脂等。 The form of the composite resin (A) is, for example, a composite resin having a graft structure in which the polyaluminoxane fragment (a1) is chemically bonded to the side chain of the polymer fragment (a2), or has a polymer The segment (a2) is a composite resin having a block structure chemically bonded to the above polyoxyalkylene fragment (a1).
(複合樹脂(A)聚矽氧烷片段(a1)) (Composite resin (A) polyoxane fragment (a1))
本發明的聚矽氧烷片段(a1)為將具有矽烷醇基及/或水解性矽烷基的矽烷化合物縮合而得的片段,且具有通式(1)及/或通式(2)所示的結構單元、與矽烷醇基及/或水解性矽烷基。 The polyoxyalkylene fragment (a1) of the present invention is a fragment obtained by condensing a decane compound having a decyl alcohol group and/or a hydrolyzable decyl group, and has a formula represented by the formula (1) and/or the formula (2) The structural unit, and a stanol group and/or a hydrolyzable alkyl group.
相對於複合樹脂(A)的總固體成分量,該聚矽氧烷片段(a1)的含有率為45重量%~95重量%,藉此複合樹脂(A)的耐熱性進一步提高。 The content of the polyaluminoxane fragment (a1) is from 45% by weight to 95% by weight based on the total solid content of the composite resin (A), whereby the heat resistance of the composite resin (A) is further improved.
(通式(1)及/或通式(2)所示的結構單元) (structural unit represented by the general formula (1) and/or the general formula (2))
具體而言,上述通式(1)及通式(2)中的R1、R2及R3分別獨立地表示:具有選自由-R4-CH=CH2、-R4-C(CH3)=CH2、-R4-O-CO-C(CH3)=CH2、及-R4-O-CO-CH=CH2所組成的群組的1種聚合性雙鍵的基團(其中,R4表示單鍵或碳原子數為1~6的伸烷基),碳原子數為1~6的烷基,碳原子數為3~8的環烷基、芳基,或碳原子數為7~12的芳烷基。 Specifically, R 1 , R 2 and R 3 in the above formula (1) and formula (2) are each independently represented by having a group selected from -R 4 -CH=CH 2 and -R 4 -C(CH). a group of one polymerizable double bond of the group consisting of 3 )=CH 2 , -R 4 —O—CO—C(CH 3 )=CH 2 , and —R 4 —O—CO—CH=CH 2 a group (wherein R 4 represents a single bond or an alkylene group having 1 to 6 carbon atoms), an alkyl group having 1 to 6 carbon atoms, a cycloalkyl group having 3 to 8 carbon atoms, or an aryl group, or An aralkyl group having 7 to 12 carbon atoms.
作為上述R4中的上述碳原子數為1~6的伸烷基,例如 可列舉:亞甲基、伸乙基、伸丙基、伸異丙基、伸丁基、伸異丁基、伸第二丁基、伸第三丁基、伸戊基、伸異戊基、伸新戊基、伸第三戊基、1-甲基伸丁基、2-甲基伸丁基、1,2-二甲基伸丙基、1-乙基伸丙基、伸己基、伸異己基、1-甲基伸戊基、2-甲基伸戊基、3-甲基伸戊基、1,1-二甲基伸丁基、1,2-二甲基伸丁基、2,2-二甲基伸丁基、1-乙基伸丁基、1,1,2-三甲基伸丙基、1,2,2-三甲基伸丙基、1-乙基-2-甲基伸丙基、1-乙基-1-甲基伸丙基等。其中,就原料的獲得的容易性而言,R4較佳為單鍵或碳原子數為2~4的伸烷基。 Examples of the above-mentioned alkylene group having 1 to 6 carbon atoms in the above R 4 include a methylene group, an ethylidene group, a propyl group, an extended isopropyl group, a butyl group, an isobutyl group, and a stretching group. Second butyl, tert-butyl, pentyl, isoamyl, neopentyl, tert-amyl, 1-methylbutyl, 2-methylbutyl, 1,2 - dimethyl-propyl, 1-ethyl-propyl, hexyl, isohexyl, 1-methyl-amyl, 2-methyl-amyl, 3-methyl-amyl, 1,1- Dimethylbutylene, 1,2-dimethylbutylene, 2,2-dimethylbutylene, 1-ethylbutylene, 1,1,2-trimethylpropyl, 1 , 2,2-trimethyl-propyl, 1-ethyl-2-methyl-propyl, 1-ethyl-1-methyl-propyl, and the like. Among them, R 4 is preferably a single bond or an alkylene group having 2 to 4 carbon atoms in terms of ease of obtaining a raw material.
另外,作為上述碳原子數為1~6的烷基,例如可列舉: 甲基、乙基、丙基、異丙基、丁基、異丁基、第二丁基、第三丁基、戊基、異戊基、新戊基、第三戊基、1-甲基丁基、2-甲基丁基、1,2-二甲基丙基、1-乙基丙基、己基、異己基、1-甲基戊基、2-甲基戊基、3-甲基戊基、1,1-二甲基丁基、1,2-二甲基丁基、2,2-二甲基丁基、1-乙基丁基、1,1,2-三甲基丙基、1,2,2-三甲基丙基、1-乙基-2-甲基丙基、1-乙基-1-甲基丙基等。 Further, examples of the alkyl group having 1 to 6 carbon atoms include, for example, Methyl, ethyl, propyl, isopropyl, butyl, isobutyl, t-butyl, tert-butyl, pentyl, isopentyl, neopentyl, third amyl, 1-methyl Butyl, 2-methylbutyl, 1,2-dimethylpropyl, 1-ethylpropyl, hexyl, isohexyl, 1-methylpentyl, 2-methylpentyl, 3-methyl Butyl, 1,1-dimethylbutyl, 1,2-dimethylbutyl, 2,2-dimethylbutyl, 1-ethylbutyl, 1,1,2-trimethylpropane Base, 1,2,2-trimethylpropyl, 1-ethyl-2-methylpropyl, 1-ethyl-1-methylpropyl, and the like.
另外,作為上述碳原子數為3~8的環烷基,例如可列舉:環丙基、環丁基、環戊基、環己基等。 In addition, examples of the cycloalkyl group having 3 to 8 carbon atoms include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group.
另外,作為上述芳基,例如可列舉:苯基、萘基、2-甲基苯基、3-甲基苯基、4-甲基苯基、4-乙烯基苯基、3-異丙基苯基等。 Further, examples of the aryl group include a phenyl group, a naphthyl group, a 2-methylphenyl group, a 3-methylphenyl group, a 4-methylphenyl group, a 4-vinylphenyl group, and a 3-isopropyl group. Phenyl and the like.
另外,作為上述碳原子數為7~12的芳烷基,例如可列舉:苄基、二苯基甲基、萘基甲基等。 In addition, examples of the aralkyl group having 7 to 12 carbon atoms include a benzyl group, a diphenylmethyl group, and a naphthylmethyl group.
在本發明中的耐熱材料中,較佳為將硬化性樹脂組成物 的交聯結構的濃度提高至成型物的殘留應力不過大的程度,因此更佳為除了水解性矽烷基以外,還在複合樹脂中適度含有形成交聯結構的官能基。 Among the heat resistant materials in the present invention, a curable resin composition is preferred. The concentration of the crosslinked structure is increased to such an extent that the residual stress of the molded product is not large, and therefore it is more preferable to contain a functional group forming a crosslinked structure in the composite resin in addition to the hydrolyzable alkylene group.
作為上述形成交聯結構的官能基,可使用公知慣用的官 能基,若例示,則可列舉:環氧基、羧基、胺基、異氰酸酯、酸酐、酚性羥基、醇性羥基、硫醇基等。 As the functional group forming the crosslinked structure described above, a publicly known official can be used. Examples of the energy group include an epoxy group, a carboxyl group, an amine group, an isocyanate, an acid anhydride, a phenolic hydroxyl group, an alcoholic hydroxyl group, and a thiol group.
其中,若考慮到應用於電子設備的用途的方面,則更佳為適度含有利用環氧基的交聯結構。 Among them, in consideration of the application to the electronic device, it is more preferable to appropriately contain a crosslinked structure using an epoxy group.
另外,作為形成交聯結構的官能基,亦可列舉具有聚合 性雙鍵的基團。若上述R1、R2及R3的至少1個為具有上述聚合性雙鍵的基團,則可藉由活性能量線、熱自由基產生劑等而簡便地硬化。而且,藉由活性能量線、以及矽烷醇基及/或水解性矽烷基的縮合反應的2種硬化機制,所得的硬化物的交聯密度變高,而可形成具有更優異的耐熱性、低線膨脹率的成型物。 Further, examples of the functional group forming the crosslinked structure include a group having a polymerizable double bond. When at least one of R 1 , R 2 and R 3 is a group having the above polymerizable double bond, it can be easily cured by an active energy ray, a thermal radical generator or the like. Further, by the two curing mechanisms of the active energy ray and the condensation reaction of the stanol group and/or the hydrolyzable decyl group, the obtained cured product has a high crosslinking density, and can be formed to have more excellent heat resistance and low. A molded product having a linear expansion ratio.
具有上述聚合性雙鍵的基團較佳為在聚矽氧烷片段(a1)中存在2個以上,更佳為存在3個~200個,尤佳為存在3個~50個,而可獲得線膨脹率更低的成型物。具體而言,若上述聚矽氧烷片段(a1)中的聚合性雙鍵的含有率為3重量%~35重量%,則可獲得所期望的線膨脹率。另外,此處所謂的聚合性雙鍵,是乙烯基、亞乙烯基或伸乙烯基中可藉由自由基進行生長反應的基團的總稱。另外,所謂聚合性雙鍵的含有率,表示該乙烯基、亞乙烯基或伸乙烯基在聚矽氧烷片段中的重量%。 The group having the above polymerizable double bond preferably has 2 or more, more preferably 3 to 200, more preferably 3 to 50, in the polyoxyalkylene fragment (a1), and is preferably available. A molded product having a lower coefficient of linear expansion. Specifically, when the content of the polymerizable double bond in the polyaluminoxane fragment (a1) is from 3% by weight to 35% by weight, a desired linear expansion ratio can be obtained. Further, the polymerizable double bond herein is a general term for a group which can be grown by a radical in a vinyl group, a vinylidene group or a vinyl group. Further, the content ratio of the polymerizable double bond means the weight % of the vinyl group, the vinylidene group or the vinyl group in the polyoxyalkylene fragment.
作為具有聚合性雙鍵的基團,可使用含有該乙烯基、亞乙烯基、伸乙烯基而成的公知的全部的官能基,其中,-R4-C(CH3)=CH2或-R4-O-CO-C(CH3)=CH2所示的(甲基)丙烯醯基,在紫外線硬化時富有反應性,或與後述乙烯系聚合物片段(a2)的相容性良好。 As the group having a polymerizable double bond, all of the known functional groups including the vinyl group, the vinylidene group, and the vinyl group may be used, wherein -R 4 -C(CH 3 )=CH 2 or - The (meth) acrylonitrile group represented by R 4 -O-CO-C(CH 3 )=CH 2 is reactive at the time of ultraviolet curing, or has good compatibility with the ethylene-based polymer fragment (a2) described later. .
上述通式(1)及/或上述通式(2)所示的結構單元是矽 的結合鍵中的2個或3個參與交聯的立體網狀聚矽氧烷結構單元。雖然形成立體網結構但未形成緻密的網結構,因此亦不會產生凝膠化等,而保存穩定性亦良好。 The structural unit represented by the above formula (1) and/or the above formula (2) is 矽 Two or three of the binding bonds participate in the cross-linked three-dimensional network polyoxyalkylene structural unit. Although a three-dimensional network structure is formed but a dense network structure is not formed, gelation or the like does not occur, and storage stability is also good.
(矽烷醇基及/或水解性矽烷基) (stanol-based and/or hydrolyzable decyl)
本發明中所謂矽烷醇基是具有與矽原子直接鍵結的羥基的含有矽的基團。該矽烷醇基具體而言較佳為:上述通式(1)及/或上述通式(2)所示的結構單元的具有結合鍵的氧原子與氫原子鍵結而生成的矽烷醇基。 The stanol group in the present invention is a ruthenium-containing group having a hydroxyl group directly bonded to a ruthenium atom. Specifically, the stanol group is preferably a stanol group formed by bonding an oxygen atom having a bond to a hydrogen atom in the structural unit represented by the above formula (1) and/or the formula (2).
另外,本發明中所謂水解性矽烷基是具有與矽原子直接 鍵結的水解性基的含有矽的基團,具體而言,例如可列舉通式(4)所示的基團。 Further, the hydrolyzable alkylene group in the present invention has a direct Specific examples of the hydrazine-containing group of the hydrolyzable group to be bonded are, for example, a group represented by the formula (4).
(通式(4)中,R5為烷基、芳基或芳烷基等一價有機 基,R6為選自由鹵素原子、烷氧基、醯氧基、苯氧基、芳氧基、巰基、胺基、醯胺基、胺基氧基、亞胺基氧基及烯氧基所組成的群組的水解性基。另外,b為0~2的整數。)在上述R5中,作為烷基,例如可列舉:甲基、乙基、丙基、異丙基、丁基、異丁基、第二丁基、第三丁基、戊基、異戊基、新戊基、第三戊基、1-甲基丁基、2-甲基丁基、1,2-二甲基丙基、1-乙基丙基、己基、異己基、1-甲基戊基、2-甲基戊基、3-甲基戊基、1,1-二甲基丁基、1,2-二甲基丁基、2,2-二甲基丁基、1-乙基丁基、1,1,2-三甲基丙基、1,2,2-三甲基丙基、1-乙基-2-甲基丙基、1-乙基-1-甲基丙基等。 (In the formula (4), R 5 is a monovalent organic group such as an alkyl group, an aryl group or an aralkyl group, and R 6 is selected from a halogen atom, an alkoxy group, a decyloxy group, a phenoxy group, an aryloxy group, a hydrolyzable group of a group consisting of a mercapto group, an amine group, a decylamino group, an aminooxy group, an imidooxy group, and an alkenyloxy group. Further, b is an integer of 0 to 2.) In the above R 5 , Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a second butyl group, a third butyl group, a pentyl group, an isopentyl group, a neopentyl group, and the like. Tripentyl, 1-methylbutyl, 2-methylbutyl, 1,2-dimethylpropyl, 1-ethylpropyl, hexyl, isohexyl, 1-methylpentyl, 2-methyl Pentyl, 3-methylpentyl, 1,1-dimethylbutyl, 1,2-dimethylbutyl, 2,2-dimethylbutyl, 1-ethylbutyl, 1, 1,2-Trimethylpropyl, 1,2,2-trimethylpropyl, 1-ethyl-2-methylpropyl, 1-ethyl-1-methylpropyl, and the like.
另外,作為芳基,例如可列舉:苯基、萘基、2-甲基苯基、3-甲基苯基、4-甲基苯基、4-乙烯基苯基、3-異丙基苯基等。 Further, examples of the aryl group include a phenyl group, a naphthyl group, a 2-methylphenyl group, a 3-methylphenyl group, a 4-methylphenyl group, a 4-vinylphenyl group, and a 3-isopropylbenzene group. Base.
另外,作為芳烷基,例如可列舉:苄基、二苯基甲基、萘基甲基等。 Further, examples of the aralkyl group include a benzyl group, a diphenylmethyl group, and a naphthylmethyl group.
在上述R6中,作為鹵素原子,例如可列舉:氟原子、 氯原子、溴原子、碘原子等。 In the above R 6 , examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
作為烷氧基,例如可列舉:甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、第二丁氧基、第三丁氧基等。 Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, a second butoxy group, and a third butoxy group.
另外,作為醯氧基,例如可列舉:甲醯氧基、乙醯氧基、丙醯氧基、丁醯氧基、特戊醯氧基、戊醯氧基、苯基乙醯氧基(phenylacetoxy)、乙醯乙醯氧基、苯甲醯氧基、萘甲醯氧基等。 Further, examples of the decyloxy group include a methyl methoxy group, an ethyl methoxy group, a propyl methoxy group, a butoxy group, a p-pentyloxy group, a pentyloxy group, and a phenylacetoxy group. ), ethyl hydrazine, benzyl methoxy, naphthyl methoxy, and the like.
另外,作為芳氧基,例如可列舉:苯氧基、萘氧基等。 Further, examples of the aryloxy group include a phenoxy group and a naphthyloxy group.
作為烯氧基,例如可列舉:乙烯氧基、烯丙氧基、1-丙烯氧基、異丙烯氧基、2-丁烯氧基、3-丁烯氧基、2-基、3-甲基-3-丁烯氧基、2-己烯氧基等。 Examples of the alkenyloxy group include a vinyloxy group, an allyloxy group, a 1-propenyloxy group, an isopropenyloxy group, a 2-butenyloxy group, a 3-butenyloxy group, and a 2- A group, a 3-methyl-3-butenyloxy group, a 2-hexenyloxy group, or the like.
藉由上述R6所示的水解性基發生水解,而通式(4)所 示的水解性矽烷基成為矽烷醇基。就水解性優異的方面而言,其中較佳為甲氧基及乙氧基。 The hydrolyzable group represented by the above R 6 is hydrolyzed, and the hydrolyzable decyl group represented by the formula (4) is a stanol group. Among the aspects excellent in hydrolyzability, among them, a methoxy group and an ethoxy group are preferable.
另外,上述水解性矽烷基具體而言較佳為:上述通式(1)及/或上述通式(2)所示的結構單元的具有結合鍵的氧原子與上述水解性基進行鍵結或取代而成的水解性矽烷基。 Further, in particular, the hydrolyzable alkylene group is preferably an oxygen atom having a bonding bond of a structural unit represented by the above formula (1) and/or the above formula (2) bonded to the hydrolyzable group or A hydrolyzable alkylene group substituted.
上述矽烷醇基或上述水解性矽烷基在矽烷醇基中的羥 基或水解性矽烷基中的上述水解性基之間進行水解縮合反應,因此聚矽氧烷結構的交聯密度提高,並可形成線膨脹率低的成型物。 The hydroxy group of the above stanol group or the above hydrolyzable decyl group in the stanol group Since the hydrolysis-condensation reaction is carried out between the above-mentioned hydrolyzable groups in the hydrolyzable alkylene group, the crosslinking density of the polyoxymethane structure is improved, and a molded article having a low linear expansion ratio can be formed.
另外,在經由上述通式(3)所示的鍵進行鍵結時,使用包含上述矽烷醇基或上述水解性矽烷基的聚矽氧烷片段(a1)與後述的乙烯系聚合物片段(a2)。 In addition, when bonding is carried out via a bond represented by the above formula (3), a polyoxyalkylene fragment (a1) containing the above decyl alcohol group or the above hydrolyzable alkylene group and a vinyl polymer fragment (a2 described later) are used. ).
聚矽氧烷片段(a1)具有上述通式(1)及/或上述通式(2)所示的結構單元、與矽烷醇基及/或水解性矽烷基,除此以外,並無特別限定,可含有其他的基團。例如 The polyoxyalkylene fragment (a1) has a structural unit represented by the above formula (1) and/or the above formula (2), and a stanol group and/or a hydrolyzable alkylene group, and is not particularly limited. It may contain other groups. E.g
可為:上述通式(1)中的R1為具有上述聚合性雙鍵的基團的結構單元、與上述通式(1)中的R1為甲基等烷基的結構單元共存的聚矽氧烷片段(a1); 亦可為:上述通式(1)中的R1為具有上述聚合性雙鍵的基團的結構單元、與上述通式(1)中的R1為甲基等烷基的結構單元、以及上述通式(2)中的R2及R3為甲基等烷基的結構單元共存的聚矽氧烷片段(a1);還可為:上述通式(1)中的R1為具有上述聚合性雙鍵的基團的結構單元、與上述通式(2)中的R2及R3為甲基等烷基的結構單元共存的聚矽氧烷片段(a1),並無特別限定。 In the above formula (1), R 1 is a structural unit having a group having the above polymerizable double bond, and a polymer having coexistence with a structural unit in which R 1 in the above formula (1) is an alkyl group such as a methyl group. silicon siloxane segment (A1); may also be: the above general formula (1) R 1 in the structural unit having a group having the polymerizable double bond, with the general formula R (1) is a methyl group a structural unit of an alkyl group, and a polyoxyalkylene fragment (a1) in which R 2 and R 3 in the above formula (2) are a structural unit of an alkyl group such as a methyl group; or the above formula (1) In the above, R 1 is a structural unit having a group having the above polymerizable double bond, and a polyoxyxane fragment having a structural unit in which R 2 and R 3 in the above formula (2) are an alkyl group such as a methyl group ( A1) is not particularly limited.
具體而言,作為聚矽氧烷片段(a1),例如可列舉:具有以下結構者等。 Specifically, examples of the polyoxyalkylene fragment (a1) include those having the following structures.
[化13]
本發明中,在上述聚矽氧烷片段(a1)的含有率相對於複合樹脂(A)的總固體成分量為45重量%~95重量%時,耐熱性、耐光性、低線膨脹率優異。 In the present invention, when the content of the polyaluminoxane fragment (a1) is 45% by weight to 95% by weight based on the total solid content of the composite resin (A), the heat resistance, the light resistance, and the low linear expansion ratio are excellent. .
(複合樹脂(A)乙烯系聚合物片段(a2)) (Composite resin (A) ethylene-based polymer fragment (a2))
本發明中的乙烯系聚合物片段(a2)為丙烯酸系聚合物、氟烯烴系聚合物、乙烯酯系聚合物、芳香族系乙烯系聚合物、聚烯烴系聚合物等乙烯聚合物片段。這些較佳為根據用途而適當選擇。 The ethylene-based polymer fragment (a2) in the present invention is an ethylene polymer segment such as an acrylic polymer, a fluoroolefin polymer, a vinyl ester polymer, an aromatic vinyl polymer or a polyolefin polymer. These are preferably appropriately selected depending on the use.
例如,丙烯酸系聚合性片段是使通用的(甲基)丙烯酸系單體聚合或共聚合而得。作為(甲基)丙烯酸系單體,並無特別限定,另外,乙烯系單體亦可共聚合。例如可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸月桂酯等具有碳原子數為1~22的烷基的(甲基)丙烯酸烷基酯類;(甲基)丙烯酸苄酯、(甲基)丙烯酸2-苯 基乙酯等(甲基)丙烯酸芳烷基酯類;(甲基)丙烯酸環己酯、(甲基)丙烯酸異冰片酯等(甲基)丙烯酸環烷基酯類;(甲基)丙烯酸2-甲氧基乙酯、(甲基)丙烯酸4-甲氧基丁酯等(甲基)丙烯酸ω-烷氧基烷基酯類;乙酸乙烯酯、丙酸乙烯酯、特戊酸乙烯酯、苯甲酸乙烯酯等羧酸乙烯酯類;丁烯酸甲酯、丁烯酸乙酯等丁烯酸的烷基酯類;蘋果酸二甲酯(dimethylmalate)、蘋果酸二正丁酯、反丁烯二酸二甲酯、衣康酸二甲酯等不飽和二元酸的二烷基酯類;乙烯、丙烯等α-烯烴類;偏二氟乙烯、四氟乙烯、六氟丙烯、氯三氟乙烯等氟烯烴類;乙基乙烯醚、正丁基乙烯醚等烷基乙烯醚類;環戊基乙烯醚、環己基乙烯醚等環烷基乙烯醚類;N,N-二甲基(甲基)丙烯醯胺、N-(甲基)丙烯醯基嗎啉、N-(甲基)丙烯醯基吡咯啶、N-乙烯基吡咯烷酮等含有三級醯胺基的單體類等。 For example, the acrylic polymerizable segment is obtained by polymerizing or copolymerizing a general-purpose (meth)acrylic monomer. The (meth)acrylic monomer is not particularly limited, and the vinyl monomer may be copolymerized. For example, methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, (methyl) a (meth)acrylic acid alkyl ester having an alkyl group having 1 to 22 carbon atoms such as tert-butyl acrylate, 2-ethylhexyl (meth)acrylate or lauryl (meth)acrylate; Benzyl (meth) acrylate, 2- benzene (meth) acrylate (A) arylalkyl (meth)acrylates; cyclohexyl (meth)acrylates such as cyclohexyl (meth)acrylate and isobornyl (meth)acrylate; (meth)acrylic acid 2 -Omega-alkoxyalkyl (meth)acrylates such as methoxyethyl ester and 4-methoxybutyl (meth)acrylate; vinyl acetate, vinyl propionate, vinyl pivalate, Vinyl carboxylic acid esters such as vinyl benzoate; alkyl esters of crotonic acid such as methyl crotonate and ethyl crotonate; dimethylmalate, di-n-butyl malate, and anti-butyl a dialkyl ester of an unsaturated dibasic acid such as dimethyl enedionate or dimethyl itaconate; an α-olefin such as ethylene or propylene; vinylidene fluoride, tetrafluoroethylene, hexafluoropropylene or chlorotrimide; Fluoroolefins such as vinyl fluoride; alkyl vinyl ethers such as ethyl vinyl ether and n-butyl vinyl ether; cycloalkyl vinyl ethers such as cyclopentyl vinyl ether and cyclohexyl vinyl ether; N,N-dimethyl ( Methyl) acrylamide, N-(methyl) propylene decylmorpholine, N-(methyl) propylene decyl pyrrolidine, N-vinyl pyrrolidone, and the like, which contain a tertiary amide group.
使上述單體共聚合時的聚合方法、溶劑、或聚合起始 劑,亦無特別限定,可藉由公知的方法而獲得乙烯系聚合物片段(a2)。例如可藉由塊狀自由基聚合法、溶液自由基聚合法、非水分散自由基聚合法等各種聚合法,使用2,2'-偶氮雙(異丁腈)、2,2'-偶氮雙(2,4-二甲基戊腈)、2,2'-偶氮雙(2-甲基丁腈)、過氧化特戊酸第三丁酯、過氧化苯甲酸第三丁酯、過氧化2-乙基己酸第三丁酯、過氧化二-第三丁基、過氧化氫枯烯、過氧化碳酸二異丙酯等聚合起始劑,獲得乙烯系聚合物片段(a2)。 a polymerization method, a solvent, or a polymerization initiation when the above monomers are copolymerized The agent is not particularly limited, and the ethylene-based polymer fragment (a2) can be obtained by a known method. For example, 2,2'-azobis(isobutyronitrile) and 2,2'-even can be used by various polymerization methods such as bulk radical polymerization, solution radical polymerization, and non-aqueous dispersion radical polymerization. Nitrogen bis(2,4-dimethylvaleronitrile), 2,2'-azobis(2-methylbutyronitrile), tert-butyl peroxypivalate, tert-butyl peroxybenzoate, a polymerization initiator such as tert-butyl peroxy 2-ethylhexanoate, di-tert-butyl peroxide, cumene hydroperoxide or diisopropyl peroxycarbonate to obtain a vinyl polymer fragment (a2) .
作為上述乙烯系聚合物片段(a2)的數量平均分子量,較佳為換算為數量平均分子量(以下簡稱為Mn)而為500~ 200,000的範圍,而可防止製造上述複合樹脂(A)時的增黏或凝膠化,且耐久性優異。其中Mn更佳為700~100,000的範圍,為了獲得不產生龜裂等的良好的成型體,Mn尤佳為1,000~50,000的範圍。 The number average molecular weight of the ethylene-based polymer fragment (a2) is preferably 500 to 500 in terms of a number average molecular weight (hereinafter abbreviated as Mn). In the range of 200,000, it is possible to prevent sticking or gelation when the above composite resin (A) is produced, and it is excellent in durability. In particular, Mn is preferably in the range of 700 to 100,000, and Mn is preferably in the range of 1,000 to 50,000 in order to obtain a good molded body which does not cause cracks or the like.
另外,上述乙烯系聚合物片段(a2)為了形成與上述聚 矽氧烷片段(a1)藉由通式(3)所示的鍵所鍵結而成的複合樹脂(A),而具有與乙烯系聚合物片段(a2)中的碳原子直接鍵結的矽烷醇基及/或水解性矽烷基。這些矽烷醇基及/或水解性矽烷基為了在後述的複合樹脂(A)的製造中成為通式(3)所示的鍵,而幾乎不存在於作為最終產物的複合樹脂(A)中的乙烯系聚合物片段(a2)中。然而即便於乙烯系聚合物片段(a2)中殘存矽烷醇基及/或水解性矽烷基,亦無任何問題,在使含有複合樹脂(A)的耐熱材料硬化時,由於在矽烷醇基中的羥基或水解性矽烷基中的上述水解性基之間進行水解縮合反應,因此所得的硬化物的聚矽氧烷結構的交聯密度提高,並可形成耐熱性優異的成型物。 Further, the above vinyl polymer segment (a2) is formed in order to form the above The oxirane fragment (a1) has a composite resin (A) bonded by a bond represented by the formula (3), and has a decane directly bonded to a carbon atom in the ethylene-based polymer fragment (a2). Alcohol group and/or hydrolyzable decyl group. These stanol groups and/or hydrolyzable decyl groups are a bond represented by the formula (3) in the production of the composite resin (A) to be described later, and are hardly present in the composite resin (A) as a final product. In the vinyl polymer fragment (a2). However, there is no problem even if the stanol group and/or the hydrolyzable decyl group remain in the ethylene-based polymer fragment (a2), and when the heat-resistant material containing the composite resin (A) is hardened, it is in the stanol group. Since the hydrolysis-condensation reaction is carried out between the hydrolyzable groups in the hydroxy group or the hydrolyzable decyl group, the cross-linking density of the polysiloxane structure of the obtained cured product is improved, and a molded article excellent in heat resistance can be formed.
具有與碳原子直接鍵結的矽烷醇基及/或水解性矽烷基 的乙烯系聚合物片段(a2),具體而言可使上述通用單體、及含有與碳鍵直接鍵結的矽烷醇基及/或水解性矽烷基的乙烯系單體共聚合而得。 a stanol group and/or a hydrolyzable decyl group directly bonded to a carbon atom Specifically, the ethylene-based polymer fragment (a2) can be obtained by copolymerizing the above-mentioned general-purpose monomer and a vinyl-based monomer containing a stanol group and/or a hydrolyzable decyl group directly bonded to a carbon bond.
作為含有與碳原子直接鍵結的矽烷醇基及/或水解性矽烷基的乙烯系單體,例如可列舉:乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基甲基二甲氧基矽烷、乙烯基三(2-甲氧基乙氧基) 矽烷、乙烯基三乙醯氧基矽烷、乙烯基三氯矽烷、2-三甲氧基矽烷基乙基乙烯醚、3-(甲基)丙烯醯氧基丙基三甲氧基矽烷、3-(甲基)丙烯醯氧基丙基三乙氧基矽烷、3-(甲基)丙烯醯氧基丙基甲基二甲氧基矽烷、3-(甲基)丙烯醯氧基丙基三氯矽烷等。其中,就可容易地進行水解反應、且可容易地除去反應後的副產物的方面而言,較佳為乙烯基三甲氧基矽烷、3-(甲基)丙烯醯氧基丙基三甲氧基矽烷。 Examples of the vinyl monomer containing a stanol group and/or a hydrolyzable decyl group directly bonded to a carbon atom include vinyl trimethoxy decane, vinyl triethoxy decane, and vinyl methyl dimethyl hydride. Oxydecane, vinyl tris(2-methoxyethoxy) Decane, vinyltriethoxydecane, vinyltrichlorodecane, 2-trimethoxydecylethylvinylether, 3-(methyl)propenyloxypropyltrimethoxydecane, 3-(A Base) propylene methoxy propyl triethoxy decane, 3-(methyl) propylene methoxy propyl methyl dimethoxy decane, 3- (meth) propylene methoxy propyl trichloro decane, etc. . Among them, vinyl trimethoxydecane and 3-(meth)acryloxypropyltrimethoxy group are preferred in that the hydrolysis reaction can be easily carried out and the by-product after the reaction can be easily removed. Decane.
本發明的乙烯系聚合物片段(a2)可具有各種官能基。 例如為具有聚合性不飽和雙鍵的基團、環氧基、醇性羥基等,在導入時只要在聚合時調配具有相當的官能基的乙烯系單體即可。 The vinyl polymer segment (a2) of the present invention may have various functional groups. For example, a group having a polymerizable unsaturated double bond, an epoxy group, an alcoholic hydroxyl group, or the like may be added at the time of introduction as long as a vinyl monomer having a corresponding functional group is prepared during the polymerization.
作為具有環氧基的乙烯系單體,例如可列舉:(甲基)丙 烯酸縮水甘油酯、(甲基)丙烯酸甲基縮水甘油酯、(甲基)丙烯酸3,4-環氧環己基甲酯、乙烯基環氧環己烷、縮水甘油基乙烯醚、甲基縮水甘油基乙烯醚或烯丙基縮水甘油醚等。 Examples of the vinyl monomer having an epoxy group include (meth) propyl group. Glycidyl acrylate, methyl glycidyl (meth) acrylate, 3,4-epoxycyclohexyl methyl (meth) acrylate, vinyl epoxidized cyclohexane, glycidyl vinyl ether, methyl shrinkage Glyceryl vinyl ether or allyl glycidyl ether and the like.
作為具有醇羥基的乙烯系單體,例如可列舉:(甲基)丙 烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸3-羥基丙酯、(甲基)丙烯酸2-羥基丁酯、(甲基)丙烯酸3-羥基丁酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸3-氯-2-羥基丙酯、反丁烯二酸二-2-羥基乙酯、反丁烯二酸單-2-羥基乙基單丁酯、聚乙二醇單(甲基)丙烯酸酯、聚丙二醇單(甲基)丙烯酸酯、「PLACCEL FM或PLACCEL FA」[大賽璐化學(Daicel Chemical)(股)製造的己內酯加成單體]等各種α-乙烯性不飽和羧酸、β-乙烯性不飽和羧酸的 羥基烷基酯類、或這些與ε-己內酯的加成物等。 Examples of the vinyl monomer having an alcoholic hydroxyl group include (meth) propyl group. 2-hydroxyethyl enoate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 3-hydroxy butyl (meth) acrylate Ester, 4-hydroxybutyl (meth)acrylate, 3-chloro-2-hydroxypropyl (meth)acrylate, di-2-hydroxyethyl fumarate, fumaric acid mono-2- Hydroxyethyl monobutyl ester, polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, "PLACCEL FM or PLACCEL FA" [Daicel Chemical (shares) a lactone addition monomer] and various α-ethylenically unsaturated carboxylic acids, β-ethylenically unsaturated carboxylic acids a hydroxyalkyl ester or an adduct of these with ε-caprolactone.
(複合樹脂(A)的製造方法) (Manufacturing method of composite resin (A))
本發明所用的複合樹脂(A)具體藉由下述(方法1)~(方法3)所示的方法而製造。 The composite resin (A) used in the present invention is specifically produced by the methods shown in the following (Method 1) to (Method 3).
(方法1)使上述通用的(甲基)丙烯酸系單體等、及上 述含有與碳鍵直接鍵結的矽烷醇基及/或水解性矽烷基的乙烯系單體共聚合,而獲得含有與碳鍵直接鍵結的矽烷醇基及/或水解性矽烷基的乙烯系聚合物片段(a2)。將其與含有矽烷醇基及/或水解性矽烷基的矽烷化合物混合,進行水解縮合反應。此時,為了在所生成的聚矽氧烷中導入環氧基,而只要同時使用一併具有矽烷醇基及/或水解性矽烷基的含有環氧基的矽烷化合物即可。另外,於存在其他欲導入的基團時,併用具有欲導入的基團的矽烷化合物。例如在導入芳基時,只要適當併用一併具有芳基與矽烷醇基及/或水解性矽烷基的矽烷化合物即可。另外,在導入具有聚合性雙鍵的基團時,只要併用一併具有含有聚合性雙鍵的基團與矽烷醇基及/或水解性矽烷基的矽烷化合物即可。 (Method 1) The above-mentioned general (meth)acrylic monomer, etc. The vinyl monomer containing a stanol group and/or a hydrolyzable decyl group directly bonded to a carbon bond is copolymerized to obtain a vinyl group containing a stanol group and/or a hydrolyzable decyl group directly bonded to a carbon bond. Polymer fragment (a2). This is mixed with a decane compound containing a stanol group and/or a hydrolyzable decyl group to carry out a hydrolysis condensation reaction. In this case, in order to introduce an epoxy group into the produced polyoxyalkylene, an epoxy group-containing decane compound having a stanol group and/or a hydrolyzable decyl group may be used at the same time. Further, in the presence of other groups to be introduced, a decane compound having a group to be introduced is used in combination. For example, when an aryl group is introduced, a decane compound having an aryl group and a stanol group and/or a hydrolyzable decyl group may be used in combination. In addition, when a group having a polymerizable double bond is introduced, a decane compound having a group containing a polymerizable double bond and a stanol group and/or a hydrolyzable decyl group may be used in combination.
該方法中,矽烷化合物的矽烷醇基或水解性矽烷基、與含有與碳鍵直接鍵結的矽烷醇基及/或水解性矽烷基的乙烯系聚合物片段(a2)所具有的矽烷醇基及/或水解性矽烷基進行水解縮合反應,而形成上述聚矽氧烷片段(a1),並且上述片段(a1)、與乙烯系聚合物片段(a2)藉由上述通式(3)所示的鍵而獲得經複合化的複合樹脂(A)。 In the method, a stanol group or a hydrolyzable alkylene group of a decane compound, and a stanol group having a vinyl polymer segment (a2) containing a stanol group directly bonded to a carbon bond and/or a hydrolyzable decyl group And/or a hydrolyzable decyl group undergoes a hydrolysis condensation reaction to form the above polyoxane fragment (a1), and The fragment (a1) and the ethylene-based polymer fragment (a2) are obtained by the bond represented by the above formula (3) to obtain a composite composite resin (A).
(方法2)以與方法1相同的方式,獲得含有與碳鍵直接鍵結的矽烷醇基及/或水解性矽烷基的乙烯系聚合物片段(a2)。 (Method 2) In the same manner as in Process 1, a vinyl polymer segment (a2) containing a stanol group and/or a hydrolyzable decyl group directly bonded to a carbon bond is obtained.
另一方面,使含有矽烷醇基及/或水解性矽烷基的矽烷化合物(為了導入環氧基,而使用一併具有矽烷醇基及/或水解性矽烷基的含有環氧基的矽烷化合物。在存在其他欲導入的基團時,併用具有欲導入的基團的矽烷化合物。)進行水解縮合反應,而獲得聚矽氧烷片段(a1)。接著,使乙烯系聚合物片段(a2)所具有的矽烷醇基及/或水解性矽烷基、與含有環氧基的聚矽氧烷片段(a1)所具有的矽烷醇基及/或水解性矽烷基進行水解縮合反應。 On the other hand, a decane compound containing a decyl alcohol group and/or a hydrolyzable decyl group (for the introduction of an epoxy group, an epoxy group-containing decane compound having a stanol group and/or a hydrolyzable decyl group) is used. In the presence of other groups to be introduced, a hydrolytic condensation reaction is carried out using a decane compound having a group to be introduced, to obtain a polyoxyalkylene fragment (a1). Next, the stanol group and/or the hydrolyzable alkylene group of the ethylene-based polymer fragment (a2) and the decyl alcohol group and/or hydrolyzability of the epoxy group-containing polyoxyalkylene fragment (a1) The decyl group undergoes a hydrolysis condensation reaction.
(方法3)以與方法1相同的方式,獲得含有與碳鍵直接鍵結的矽烷醇基及/或水解性矽烷基的乙烯系聚合物片段(a2)。另一方面,以與方法2相同的方式,獲得聚矽氧烷片段(a1)。而且,若在上述聚矽氧烷片段(a1)中導入環氧基,則將一併具有矽烷醇基及/或水解性矽烷基的含有環氧基的矽烷化合物、與存在其他欲導入的基團時具有所欲導入的基團的矽烷化合物等混合,進行水解縮合反應。 (Method 3) In the same manner as in Process 1, a vinyl polymer fragment (a2) containing a stanol group and/or a hydrolyzable decyl group directly bonded to a carbon bond is obtained. On the other hand, in the same manner as in Process 2, a polyoxyalkylene fragment (a1) was obtained. Further, when an epoxy group is introduced into the polyoxyalkylene fragment (a1), an epoxy group-containing decane compound having a decyl alcohol group and/or a hydrolyzable decyl group and other groups to be introduced are present. The group is mixed with a decane compound or the like having a group to be introduced, and a hydrolysis condensation reaction is carried out.
另外,作為一併具有導入含聚合性雙鍵的基團時所使用的含聚合性雙鍵的基團與矽烷醇基及/或水解性矽烷基的矽烷化合物,例如併用:乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基甲基二甲氧基矽烷、乙烯基三(2-甲氧基乙氧基)矽烷、乙烯基三乙醯氧基矽烷、乙烯基三氯矽烷、2-三甲氧基矽烷基乙基乙烯醚、3-(甲基)丙烯醯氧基丙基三甲氧基矽烷、3-(甲基)丙烯醯氧基 丙基三乙氧基矽烷、3-(甲基)丙烯醯氧基丙基甲基二甲氧基矽烷、3-(甲基)丙烯醯氧基丙基三氯矽烷等。其中,就可容易地進行水解反應、且可容易地除去反應後的副產物的方面而言,較佳為乙烯基三甲氧基矽烷、3-(甲基)丙烯醯氧基丙基三甲氧基矽烷。 In addition, as a decane compound having a polymerizable double bond group and a decyl alcohol group and/or a hydrolyzable decyl group, which are used together with a group having a polymerizable double bond, for example, a vinyl trimethoxy group is used in combination. Decane, vinyltriethoxydecane, vinylmethyldimethoxydecane, vinyltris(2-methoxyethoxy)decane, vinyltriethoxydecane, vinyltrichloromethane, 2-trimethoxydecylethylethyl vinyl ether, 3-(methyl)propenyloxypropyltrimethoxydecane, 3-(methyl)propenyloxy Propyltriethoxydecane, 3-(meth)acryloxypropylmethyldimethoxydecane, 3-(meth)acryloxypropyltrichlorodecane, and the like. Among them, vinyl trimethoxydecane and 3-(meth)acryloxypropyltrimethoxy group are preferred in that the hydrolysis reaction can be easily carried out and the by-product after the reaction can be easily removed. Decane.
另外,此外作為上述(方法1)~(方法3)中所使用 的通用的矽烷化合物,例如可列舉:甲基三甲氧基矽烷、甲基三乙氧基矽烷、甲基三正丁氧基矽烷、乙基三甲氧基矽烷、正丙基三甲氧基矽烷、異丁基三甲氧基矽烷、環己基三甲氧基矽烷、3-縮水甘油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷等各種有機三烷氧基矽烷類;二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二甲基二正丁氧基矽烷、二乙基二甲氧基矽烷、甲基環己基二甲氧基矽烷、3-縮水甘油氧基丙基甲基二甲氧基矽烷、3-縮水甘油氧基丙基甲基二乙氧基矽烷等各種二有機二烷氧基矽烷類;甲基三氯矽烷、乙基三氯矽烷、乙烯基三氯矽烷、二甲基二氯矽烷、二乙基二氯矽烷等氯矽烷類。 In addition, as used in the above (Method 1) to (Method 3) Examples of the general decane compound include methyltrimethoxydecane, methyltriethoxydecane, methyltri-n-butoxydecane, ethyltrimethoxydecane, n-propyltrimethoxydecane, and the like. Various organic trialkoxy decanes such as butyltrimethoxydecane, cyclohexyltrimethoxydecane, 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropyltriethoxydecane; Dimethyldimethoxydecane, dimethyldiethoxydecane, dimethyldi-n-butoxydecane, diethyldimethoxydecane, methylcyclohexyldimethoxydecane, 3-shrinkage Various diorganodialkoxydecanes such as glyceryloxypropylmethyldimethoxydecane and 3-glycidoxypropylmethyldiethoxydecane; methyltrichlorodecane, ethyltrichloromethane , chlorodecane such as vinyltrichloromethane, dimethyldichlorodecane or diethyldichlorodecane.
另外,亦可在不損害本發明的效果的範圍內併用四甲氧 基矽烷、四乙氧基矽烷或四正丙氧基矽烷等四官能烷氧基矽烷化合物或該四官能烷氧基矽烷化合物的部分水解縮合物。在併用上述四官能烷氧基矽烷化合物或其部分水解縮合物時,相對於構成上述聚矽氧烷片段(a1)的全部矽原子,較佳為以該四官能烷氧基矽烷化合物所具有的矽原子不超過20莫耳%的範圍的方式併用。 In addition, tetramethoxy can also be used in combination within a range that does not impair the effects of the present invention. A tetrafunctional alkoxydecane compound such as a decane, tetraethoxydecane or tetra-n-propoxydecane or a partially hydrolyzed condensate of the tetrafunctional alkoxydecane compound. When the above-mentioned tetrafunctional alkoxydecane compound or a partially hydrolyzed condensate thereof is used in combination, it is preferred that all of the ruthenium atoms constituting the polyazepine fragment (a1) have a tetrafunctional alkoxydecane compound. The method in which the cesium atom does not exceed the range of 20 mol% is used in combination.
另外,在上述矽烷化合物中,亦可在不損害本發明的效 果的範圍內,併用硼、鈦、鋯或鋁等矽原子以外的金屬烷氧化物化合物。例如相對於構成聚矽氧烷片段(a1)的全部矽原子,較佳為在上述金屬烷氧化物化合物所具有的金屬原子不超過25莫耳%的範圍內併用。 In addition, in the above decane compound, the effect of the present invention may not be impaired. Within the range of the fruit, a metal alkoxide compound other than a ruthenium atom such as boron, titanium, zirconium or aluminum is used in combination. For example, it is preferable to use all of the ruthenium atoms constituting the polyaluminoxane fragment (a1) in a range in which the metal atom of the metal alkoxide compound does not exceed 25 mol%.
在本發明中,在形成聚矽氧烷片段(a1)時,在所使用 的含有矽烷醇基及/或水解性矽烷基的矽烷化合物中,較佳為三烷氧基矽烷為40莫耳%以上。若三烷氧基矽烷為40莫耳%以上,則在1分子中存在3個聚矽氧烷片段(a1)的水解縮合的反應性基,因此交聯密度提高且鍵結變得更牢固,因此所得的耐熱材料及耐熱構件的線膨脹率變低。 In the present invention, when the polyaoxane fragment (a1) is formed, it is used Among the decane compounds containing a stanol group and/or a hydrolyzable decyl group, the trialkoxy decane is preferably 40 mol% or more. When the trialkoxy decane is 40 mol% or more, the reactive group of the hydrolytic condensation of the three polyoxoxane fragments (a1) exists in one molecule, so that the crosslinking density is increased and the bonding becomes stronger. Therefore, the linear expansion ratio of the obtained heat resistant material and heat resistant member becomes low.
而且,上述三烷氧基矽烷較佳為單烷基三烷氧基矽烷。 原因是,為單烷基三烷氧基矽烷時,聚矽氧烷片段(a1)的水解縮合更容易進行,且硬化物的交聯密度進一步提高。在單烷基三烷氧基矽烷中,較佳為烷氧基的碳原子數為1~4,更佳為烷基的碳原子數為1~2。 Further, the above trialkoxydecane is preferably a monoalkyltrialkoxydecane. The reason is that, in the case of monoalkyltrialkoxydecane, the hydrolysis condensation of the polyoxyalkylene fragment (a1) is more easily carried out, and the crosslinking density of the cured product is further improved. In the monoalkyltrialkoxydecane, the alkoxy group preferably has 1 to 4 carbon atoms, more preferably the alkyl group has 1 to 2 carbon atoms.
作為具有碳原子數為1~4的烷基的單烷基三烷氧基矽 烷,具體可列舉:甲基三甲氧基矽烷、甲基三乙氧基矽烷、甲基三正丁氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙基三正丁氧基矽烷、正丙基三甲氧基矽烷、正丙基三乙氧基矽烷、正丁基三甲氧基矽烷或丁基三乙氧基矽烷等,較佳為甲基三甲氧基矽烷。 As a monoalkyltrialkoxyquinone having an alkyl group having 1 to 4 carbon atoms Specific examples of the alkane include methyltrimethoxydecane, methyltriethoxydecane, methyltri-n-butoxydecane, ethyltrimethoxydecane, ethyltriethoxydecane, and ethyltri-n-butylene. Oxydecane, n-propyltrimethoxydecane, n-propyltriethoxydecane, n-butyltrimethoxydecane or butyltriethoxydecane, etc., preferably methyltrimethoxydecane.
另外,若在複合樹脂(A)中併入以環氧基為起點的交 聯結構,則耐熱性會進一步提高,因此較佳為在電子設備的用途中應用。在複合樹脂(A)中導入環氧基時,合成上述聚矽氧烷片段(a1)時,只要含有具有矽烷醇基及/或水解性矽烷基的矽烷化合物即可,較佳為在矽烷化合物中,含有環氧基的矽烷化合物為25重量%以上、90重量%以下。 In addition, if the epoxy resin is used as the starting point in the composite resin (A) In the joint structure, the heat resistance is further improved, and therefore it is preferably used in the use of an electronic device. When the epoxy group is introduced into the composite resin (A), the polyoxonane fragment (a1) is preferably a decane compound as long as it contains a decane compound having a stanol group and/or a hydrolyzable decyl group. The epoxy group-containing decane compound is 25 wt% or more and 90 wt% or less.
作為上述含有環氧基的矽烷化合物,可列舉:3-縮水甘 油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷、多官能環氧矽烷(例如信越矽利光(Shin-Etsu Silicone)製造的X-12-981、X-12-984)、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-縮水甘油氧基丙基甲基二甲氧基矽烷、3-縮水甘油氧基丙基甲基二乙氧基矽烷等。 Examples of the epoxy group-containing decane compound include 3-condensed sugar. Oloxypropyltrimethoxydecane, 3-glycidoxypropyltriethoxydecane, polyfunctional epoxydecane (for example, X-12-981, X- manufactured by Shin-Etsu Silicone) 12-984), 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-glycidoxypropylmethyldimethoxydecane, 3-glycidoxypropylmethyl Diethoxydecane, etc.
(無機微粒子) (inorganic particles)
本發明的耐熱材料為含有上述複合樹脂(A)者,藉由含有無機微粒子而耐熱性進一步提高。 The heat resistant material of the present invention contains the above composite resin (A), and the heat resistance is further improved by containing inorganic fine particles.
本發明所使用的無機微粒子只要不損害本發明的效果,則並無特別限定。 The inorganic fine particles used in the present invention are not particularly limited as long as the effects of the present invention are not impaired.
本發明所使用的複合樹脂(A)具有聚矽氧烷片段(a1),因此與無機成分的溶合佳,即便是超過50重量%的添加量,亦可無問題地分散。另外,分散後,無機微粒子亦不沈澱或固化,而具有長時間的保存穩定性。另一方面,乙烯系聚合性片段與反應性化合物的相性佳,因此含有上述複合樹脂(A)與無機微粒子的耐 熱材料會與反應性化合物良好地分散,因此可獲得分散穩定性佳的含有無機微粒子的耐熱材料。 Since the composite resin (A) used in the present invention has a polyoxyalkylene fragment (a1), it is excellent in fusion with an inorganic component, and even if it is added in an amount exceeding 50% by weight, it can be dispersed without any problem. Further, after the dispersion, the inorganic fine particles are not precipitated or solidified, and have long-term storage stability. On the other hand, since the ethylene-based polymerizable segment and the reactive compound have good phase properties, they contain the above-mentioned composite resin (A) and inorganic fine particles. Since the thermal material is well dispersed with the reactive compound, a heat-resistant material containing inorganic fine particles having excellent dispersion stability can be obtained.
作為無機微粒子,並無特別限定,只要根據用途適時選擇即可。 The inorganic fine particles are not particularly limited, and may be appropriately selected depending on the application.
例如作為耐熱性優異者,為氧化鋁、氧化鎂、二氧化鈦、氧化鋯、二氧化矽(石英、燻矽、沈澱二氧化矽、無水矽酸、熔融二氧化矽、晶質二氧化矽(crystalline silica)、超微粉無定型二氧化矽等)等。 For example, as an excellent heat resistance, it is alumina, magnesia, titania, zirconia, cerium oxide (quartz, smoked sputum, precipitated cerium oxide, anhydrous ceric acid, molten cerium oxide, crystalline cerium oxide (crystalline silica) ), ultrafine powder, amorphous cerium oxide, etc.).
這些無機微粒子只要根據用途適時選擇即可,可單獨使用,亦可組合多種而使用。另外,上述無機微粒子除了例子中所列舉的特性以外,亦具有各種特性,因此根據用途進行適時選擇即可。 These inorganic fine particles may be used as appropriate depending on the application, and may be used singly or in combination of two or more. Further, the inorganic fine particles have various characteristics in addition to the properties exemplified in the examples, and therefore may be appropriately selected depending on the application.
例如在使用二氧化矽作為無機微粒子時,並無特別限定,可使用粉末狀二氧化矽或膠體二氧化矽等公知的二氧化矽微粒子。作為市售的粉末狀二氧化矽微粒子,例如可列舉:日本艾羅技(Aerosil)(股)製造的Aerosil 50、Aerosil 200,旭硝子(股)製造的SILDEX H31、SILDEX H32、SILDEX H51、SILDEX H52、SILDEX H121、SILDEX H122,日本二氧化矽工業(Nippon Silica Kogyo)(股)製造的E220A、E220,富士矽(Fuji Silysia)(股)製造的SYLYSIA470,日本板硝子(股)製造的SG Flake等。 For example, when cerium oxide is used as the inorganic fine particles, it is not particularly limited, and known cerium oxide fine particles such as powdered cerium oxide or colloidal cerium oxide can be used. Examples of commercially available powdered cerium oxide microparticles include, for example, Aerosil 50 manufactured by Aerosil Co., Ltd., Aerosil 200, and SILDEX H31, SILDEX H32, SILDEX H51, and SILDEX H52 manufactured by Asahi Glass Co., Ltd. SILDEX H121, SILDEX H122, E220A and E220 manufactured by Nippon Silica Kogyo Co., Ltd., SYLYSIA 470 manufactured by Fuji Silysia Co., Ltd., SG Flake manufactured by Nippon Sheet Glass Co., Ltd., and the like.
另外,作為市售的膠體二氧化矽,例如可列舉:日產化學工業(股)製造的甲醇矽溶膠、IPA-ST、MEK-ST、NBA-ST、XBA-ST、DMAC-ST、ST-UP、ST-OUP、ST-20、ST-40、ST-C、ST-N、ST-O、 ST-50、ST-OL等。 Further, examples of commercially available colloidal cerium oxide include methanol oxime sol, IPA-ST, MEK-ST, NBA-ST, XBA-ST, DMAC-ST, and ST-UP manufactured by Nissan Chemical Industries Co., Ltd. , ST-OUP, ST-20, ST-40, ST-C, ST-N, ST-O, ST-50, ST-OL, etc.
另外,可使用藉由公知的方法而改良分散性的二氧化矽微粒子。作為此種改良了分散性的二氧化矽微粒子,例如可列舉:將上述二氧化矽微粒子藉由具有疏水性基的反應性矽烷偶合劑進行表面處理者、或藉由具有(甲基)丙烯醯基的化合物進行修飾者。作為藉由具有(甲基)丙烯醯基的化合物進行修飾的市售的粉末狀二氧化矽,可列舉:日本艾羅技(股)製造的Aerosil RM50、Aerosil R711等,作為藉由具有(甲基)丙烯醯基的化合物進行修飾的市售的膠體二氧化矽,可列舉:日產化學工業(股)製造的MIBK-SD等。 Further, cerium oxide microparticles having improved dispersibility by a known method can be used. Examples of such a dispersible cerium oxide fine particle include a surface treatment of the cerium oxide fine particles by a reactive decane coupling agent having a hydrophobic group, or a (meth) acrylonitrile hydride. The compound of the base is modified. As a commercially available powdered cerium oxide modified by a compound having a (meth) acryl fluorenyl group, Aerosil RM50, Aerosil R711, etc., manufactured by Ai Luo Technology Co., Ltd., Japan, as The commercially available colloidal cerium oxide in which the acryl oxime compound is modified includes MIBK-SD manufactured by Nissan Chemical Industries Co., Ltd., and the like.
上述二氧化矽微粒子的形狀並無特別限定,可使用球狀、中空狀、多孔質狀、棒狀、板狀、纖維狀、或不定形狀者。例如,作為市售的中空狀二氧化矽微粒子,可使用日鐵礦業(股)製造的SiliNax等。 The shape of the above-mentioned ceria microparticles is not particularly limited, and a spherical shape, a hollow shape, a porous shape, a rod shape, a plate shape, a fiber shape, or an irregular shape can be used. For example, as commercially available hollow cerium oxide fine particles, SiliNax manufactured by Nippon Steel Mining Co., Ltd. or the like can be used.
另外,一次粒徑較佳為5nm~200nm的範圍。若一次粒徑小於5nm,則有分散體中的無機微粒子的分散不充分的擔憂,在粒徑超過200nm時,有無法保持硬化物的充分的強度的擔憂。 Further, the primary particle diameter is preferably in the range of 5 nm to 200 nm. When the primary particle diameter is less than 5 nm, the dispersion of the inorganic fine particles in the dispersion may be insufficient. When the particle diameter exceeds 200 nm, the sufficient strength of the cured product may not be maintained.
(組成物) (composition)
作為本發明的耐熱材料,對用以製作為了使用無機微粒子與複合樹脂(A)作為構成成分的分散體的方法進行說明。 As a heat resistant material of the present invention, a method for producing a dispersion in which inorganic fine particles and a composite resin (A) are used as constituent components will be described.
作為在上述組成物中分散無機微粒子的方法,並無特別限定,可使用公知的分散方法。作為機械裝置,例如可列舉:分 散機(disper)、具有渦輪翼等攪拌翼的分散機、塗料振動機(paint shaker)、輥磨機、球磨機、磨碎機(attritor)、砂磨機、珠磨機等。 在製造無機微粒子分散體時,在將所得的分散體用於塗佈劑等時,就塗敷性、塗料穩定性及硬化物的透明性等的方面而言,較佳為藉由使用玻璃珠、氧化鋯珠等分散介質(media)的珠磨機的分散。 The method of dispersing the inorganic fine particles in the above composition is not particularly limited, and a known dispersion method can be used. As a mechanical device, for example, A disperser, a disperser having a stirring blade such as a turbine wing, a paint shaker, a roll mill, a ball mill, an attritor, a sand mill, a bead mill, and the like. In the production of the inorganic fine particle dispersion, when the obtained dispersion is used for a coating agent or the like, it is preferred to use glass beads in terms of coatability, paint stability, transparency of the cured product, and the like. Dispersion of a bead mill of a dispersion medium such as zirconia beads.
作為上述珠磨機,例如可列舉:蘆澤精美技術(Ashizawa Finetech)(股)製造的STARMILL;三井礦山(股)製造的MSC-MILL、SC-MILL、磨碎機MA01SC;淺田鐵工(股)的Nano Grain Mill、Pico Grain Mill、Pure Grain Mill、Mechagaper Grain Mill、Cerapower Grain Mill、Dual Grain Mill、AD Mill、Twin AD MILL、Basket Mill、Twin Basket Mill;壽工業(股)製造的Apex Mill、Ultra Apex Mill、Super Apex Mill等。其中較佳為Ultra Apex Mill。 As the bead mill described above, for example, Luze Fine Technology (Ashizawa) STARMILL manufactured by Finetech); MSC-MILL, SC-MILL, grinder MA01SC manufactured by Mitsui Mining Co., Ltd.; Nano Grain Mill, Pico Grain Mill, Pure Grain Mill, Mechagper Grain of Asada Iron Works Mill, Cerapower Grain Mill, Dual Grain Mill, AD Mill, Twin AD MILL, Basket Mill, Twin Basket Mill; Apex Mill, Ultra Apex Mill, Super Apex Mill, etc. manufactured by Shou Industrial Co., Ltd. Among them, Ultra Apex Mill is preferred.
[含有無機微粒子的耐熱材料] [Heat-resistant material containing inorganic microparticles]
在混合本發明所使用的複合樹脂(A)與無機微粒子時,只要藉由珠磨機或輥磨機等進行分散即可。在與其他調配物混合時,預先藉由珠磨機或輥磨機等的方法分散其他調配物、並預先製作以高的濃度調配無機微粒子而成的組成物,藉由調配該組成物與其他調配物,而可製成含有無機微粒子的耐熱材料。 When the composite resin (A) and the inorganic fine particles used in the present invention are mixed, they may be dispersed by a bead mill, a roll mill or the like. When mixing with other preparations, the other preparations are previously dispersed by a method such as a bead mill or a roll mill, and a composition obtained by mixing inorganic fine particles at a high concentration is prepared in advance, by blending the composition with others. The formulation can be made into a heat resistant material containing inorganic fine particles.
特別是藉由製成分散於反應性化合物、例如聚異氰酸酯或活性能量線硬化性單體等反應性稀釋劑中的耐熱材料,而可在效率 佳、且不用擔心凝膠化等的情況下硬化。若此時的無機微粒子的分散濃度相對於耐熱材料固體成分總量為5重量%~90重量%的範圍,則可在不用擔心無機微粒子的沈澱或固化等的情況下獲得保存穩定性優異的分散液。 In particular, by making a heat-resistant material dispersed in a reactive diluent such as a reactive compound such as a polyisocyanate or an active energy ray-curable monomer, efficiency can be achieved. It is good, and it does not have to be hardened when it is gelled. When the dispersion concentration of the inorganic fine particles at this time is in the range of 5% by weight to 90% by weight based on the total amount of the solid content of the heat-resistant material, it is possible to obtain a dispersion excellent in storage stability without fear of precipitation or solidification of the inorganic fine particles. liquid.
[耐熱材料] [heat resistant material]
本發明的耐熱材料是含有上述複合樹脂(A)者,藉由將該耐熱材料成型而獲得耐熱構件。成型方法可為公知慣用的方法,亦可進行硬化而成型,還可藉由調配熱塑性樹脂進行成型而成型,但就提高耐熱性的方面而言,若藉由熱硬化進行成型,則該複合樹脂(A)由於聚矽氧烷片段(a1)的水解縮合所產生的鍵結更牢固,因此所得的耐熱材料及耐熱構件的線膨脹率變低。 The heat resistant material of the present invention is one containing the above composite resin (A), and a heat resistant member is obtained by molding the heat resistant material. The molding method may be a conventionally known method, or may be formed by hardening, and may be molded by blending a thermoplastic resin, but in terms of heat resistance, if it is molded by heat hardening, the composite resin is used. (A) Since the bond by hydrolysis and condensation of the polyoxyalkylene fragment (a1) is stronger, the linear expansion ratio of the obtained heat resistant material and heat resistant member becomes low.
本發明的耐熱材料可含有複合樹脂(A)或無機微粒子 以外的調配物。例如為:各種樹脂、反應性化合物、觸媒、聚合起始劑、有機填料、無機填料、有機溶劑、無機顏料、有機顏料、體質顏料、黏土礦物、蠟、界面活性劑、穩定劑、流動調整劑、染料、均化劑、流變控制劑、紫外線吸收劑、抗氧化劑、塑化劑等。 The heat resistant material of the present invention may contain a composite resin (A) or inorganic fine particles Formulations other than those. For example: various resins, reactive compounds, catalysts, polymerization initiators, organic fillers, inorganic fillers, organic solvents, inorganic pigments, organic pigments, extender pigments, clay minerals, waxes, surfactants, stabilizers, flow adjustment Agents, dyes, leveling agents, rheology control agents, ultraviolet absorbers, antioxidants, plasticizers, and the like.
在本發明的複合樹脂(A)具有官能基時,藉由在耐熱 材料中調配具有與複合樹脂(A)所具有的官能基反應的官能基的反應性化合物,而硬化密度進一步變高,因此所得的耐熱構件的耐熱性提高,因此較佳。 When the composite resin (A) of the present invention has a functional group, by heat resistance In the material, a reactive compound having a functional group reactive with a functional group of the composite resin (A) is blended, and the hardening density is further increased, so that the heat resistance of the obtained heat-resistant member is improved, which is preferable.
例如在複合樹脂(A)具有醇性羥基時,可列舉:含有異氰酸 基的化合物;在具有環氧基時,可列舉:酚系硬化物、酸酐系化合物、醯胺系化合物、胺系化合物等各種硬化劑。 For example, when the composite resin (A) has an alcoholic hydroxyl group, it may be mentioned that it contains isocyanic acid. In the case of having an epoxy group, various curing agents such as a phenol-based cured product, an acid anhydride-based compound, a guanamine-based compound, and an amine-based compound may be mentioned.
作為含有異氰酸基的化合物,例如可列舉:以甲苯二異 氰酸酯、二苯基甲烷-4,4'-二異氰酸酯等芳香族二異氰酸酯類,或間-二甲苯二異氰酸酯、α,α,α',α'-四甲基-間-二甲苯二異氰酸酯等芳烷基二異氰酸酯類為主原料的聚異氰酸酯;四亞甲基二異氰酸酯、1,5-五亞甲基二異氰酸酯、1,6-六亞甲基二異氰酸酯、2,2,4-(或2,4,4-)三甲基-1,6-六亞甲基二異氰酸酯、離胺酸異氰酸酯、異佛爾酮二異氰酸酯、氫化二甲苯二異氰酸酯、氫化二苯基甲烷二異氰酸酯、1,4-二異氰酸基環己烷、1,3-雙(二異氰酸基甲基)環己烷、4,4'-二環己基甲烷二異氰酸酯、脲基甲酸酯型聚異氰酸酯、縮二脲型聚異氰酸酯、加合物型聚異氰酸酯及異三聚氰酸酯型聚異氰酸酯。 As the compound containing an isocyanate group, for example, it is exemplified by toluene An aromatic diisocyanate such as cyanate or diphenylmethane-4,4'-diisocyanate, or m-xylene diisocyanate, α,α,α',α'-tetramethyl-m-xylene Polyisocyanate such as aralkyl diisocyanate such as isocyanate as main raw material; tetramethylene diisocyanate, 1,5-pentamethylene diisocyanate, 1,6-hexamethylene diisocyanate, 2,2,4- (or 2,4,4-) trimethyl-1,6-hexamethylene diisocyanate, isocyanate isocyanate, isophorone diisocyanate, hydrogenated xylene diisocyanate, hydrogenated diphenylmethane diisocyanate, 1,4-Diisocyanatocyclohexane, 1,3-bis(diisocyanatomethyl)cyclohexane, 4,4'-dicyclohexylmethane diisocyanate, allophanate type polymerization Isocyanate, biuret type polyisocyanate, adduct type polyisocyanate and isomeric cyanate type polyisocyanate.
作為環氧基的硬化劑,例如可列舉:苯酚酚醛清漆樹 脂、甲酚酚醛清漆樹脂、芳香族烴甲醛樹脂改質酚樹脂、二環戊二烯苯酚加成型樹脂、苯酚芳烷基樹脂(ZYLOCK樹脂)、萘酚芳烷基樹脂、三羥甲基甲烷樹脂、四苯酚基(phenylol)乙烷樹脂、萘酚酚醛清漆樹脂、萘酚-苯酚共縮酚醛清漆樹脂、萘酚-甲酚共縮酚醛清漆樹脂、聯苯改質酚樹脂(藉由雙亞甲基連結苯酚核而成的多元酚化合物)、聯苯改質萘酚樹脂(藉由雙亞甲基連結苯酚核而成的多元萘酚化合物)、胺基三嗪改質酚樹脂(藉由三聚氰胺、苯并三聚氰二胺(benzoguanamine)等連結苯酚核而成的多元酚化 合物)或含有烷氧基的芳香環改質酚醛清漆樹脂(藉由甲醛連結苯酚核及含有烷氧基的芳香環而成的多元酚化合物)等酚系化合物;鄰苯二甲酸酐、偏苯三甲酸酐、均苯四甲酸酐、順丁烯二酸酐、四氫鄰苯二甲酸酐、甲基四氫鄰苯二甲酸酐、甲基納迪克酸酐、六氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐等酸酐系化合物;二氰二胺(dicyandiamide)、由次亞麻油酸的二聚物與乙二胺合成的聚醯胺樹脂等醯胺系化合物;二胺基二苯基甲烷、二乙烯三胺(diethylenetriamine)、三乙四胺、二胺基二苯基碸、異佛爾酮二胺、咪唑、BF3-胺錯合物、胍衍生物等胺系化合物等。 As the hardener of the epoxy group, for example, a phenol novolac tree can be cited. Grease, cresol novolac resin, aromatic hydrocarbon formaldehyde resin modified phenol resin, dicyclopentadiene phenol addition molding resin, phenol aralkyl resin (ZYLOCK resin), naphthol aralkyl resin, trimethylol methane Resin, phenylol ethane resin, naphthol novolac resin, naphthol-phenol copolyphenolic varnish resin, naphthol-cresol copolyphenolic varnish resin, biphenyl modified phenol resin (by double sub a polyphenol compound in which a methyl group is bonded to a phenol nucleus), a biphenyl-modified naphthol resin (a poly-naphthol compound obtained by bonding a phenol nucleus with a bismethylene group), and an aminotriazine-modified phenol resin (by Polyphenolization of phenolic nucleus such as melamine or benzoguanamine a compound or a phenolic compound such as an alkoxy-containing aromatic ring-modified novolac resin (a polyphenol compound obtained by linking a phenol nucleus and an alkoxy-containing aromatic ring with formaldehyde); phthalic anhydride; Benzoic anhydride, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methyl nadic anhydride, hexahydrophthalic anhydride, methyl An acid anhydride compound such as hexahydrophthalic anhydride; dicyandiamide; a guanamine compound such as a polyamine resin synthesized from a dimer of linoleic acid and ethylenediamine; diaminobiphenyl An amine compound such as a methane, a diethylenetriamine, a triethylenetetramine, a diaminodiphenylphosphonium, an isophorone diamine, an imidazole, a BF3-amine complex, or an anthracene derivative.
另外,根據需要,除了上述硬化劑外,亦可適當併用硬化促進劑。作為硬化促進劑,可使用各種者,例如可列舉:磷系化合物、三級胺、咪唑、有機酸金屬鹽、路易斯酸、胺錯鹽等。特別是就硬化性、耐熱性、電氣特性、耐濕可靠性等優異的方面而言,在咪唑化合物中較佳為2-乙基-4-甲基咪唑,在磷系化合物中較佳為三苯基膦,在三級胺中較佳為1,8-二氮雜雙環-[5.4.0]-十一碳烯-7(DBU)。 Further, if necessary, in addition to the above-mentioned curing agent, a curing accelerator may be used in combination. Various types of hardening accelerators can be used, and examples thereof include a phosphorus compound, a tertiary amine, an imidazole, an organic acid metal salt, a Lewis acid, and an amine salt. In particular, in terms of excellent properties such as hardenability, heat resistance, electrical properties, moisture resistance reliability, etc., 2-ethyl-4-methylimidazole is preferred among the imidazole compounds, and preferably three in the phosphorus compound. Phenylphosphine, preferably 1,8-diazabicyclo-[5.4.0]-undecene-7 (DBU) in the tertiary amine.
[熱硬化] [thermosetting]
在經由本發明的複合樹脂(A)所具有的聚矽氧烷片段(a1)所具有的矽烷醇基及/或水解性矽烷基進行硬化時,只要進行熱硬化即可。在熱硬化中,可單獨進行加熱使其硬化,亦可併用如以下的公知的硬化觸媒。例如可列舉:鹽酸、硫酸、磷酸等無機酸類;對甲苯磺酸、磷酸單異丙酯、乙酸等有機酸類;氫氧化鈉或 氫氧化鉀等無機鹼類;四異丙基鈦酸酯、四丁基鈦酸酯等鈦酸酯類;1,8-二氮雜雙環[5.4.0]十一碳烯-7(DBU)、1,5-二氮雜雙環[4.3.0]壬烯-5(DBN)、1,4-二氮雜雙環[2.2.2]辛烷(DABCO)、三正丁基胺、二甲基苄基胺、單乙醇胺、咪唑、1-甲基咪唑等各種含有鹼性氮原子的化合物類;為四甲基銨鹽、四丁基銨鹽、二月桂基二甲基銨鹽等各種四級銨鹽類,且具有氯化物、溴化物、羧酸鹽或氫氧化物等作為對陰離子的四級銨鹽類;二丁基二乙酸錫、二丁基二辛酸錫、二丁基二月桂酸錫、二丁基二乙醯丙酮酸錫、辛酸錫或硬脂酸錫等錫羧酸鹽等。觸媒可單獨使用,亦可併用2種以上。 When the decyl alcohol group and/or the hydrolyzable alkylene group which the polyaluminoxane fragment (a1) which the composite resin (A) of the present invention has is hardened, it is good to heat-harden. In the thermal curing, it may be separately heated and hardened, and a known curing catalyst such as the following may be used in combination. For example, inorganic acids such as hydrochloric acid, sulfuric acid, and phosphoric acid; organic acids such as p-toluenesulfonic acid, monoisopropyl phosphate, and acetic acid; sodium hydroxide or Inorganic bases such as potassium hydroxide; titanates such as tetraisopropyl titanate and tetrabutyl titanate; 1,8-diazabicyclo[5.4.0]undecene-7 (DBU) 1,5-diazabicyclo[4.3.0]nonene-5 (DBN), 1,4-diazabicyclo[2.2.2]octane (DABCO), tri-n-butylamine, dimethyl Various compounds containing a basic nitrogen atom such as benzylamine, monoethanolamine, imidazole or 1-methylimidazole; and various four grades such as tetramethylammonium salt, tetrabutylammonium salt and dilauryldimethylammonium salt a quaternary ammonium salt having an ammonium salt and having a chloride, a bromide, a carboxylate or a hydroxide as a counter anion; tin dibutyl diacetate, tin dibutyl dioctoate, dibutyl dilaurate A tin carboxylate such as tin, dibutyldiethylpyruvium pyruvate, tin octylate or tin stearate. The catalyst may be used singly or in combination of two or more.
另外,在乙烯系聚合物片段(a2)含有醇性羥基,而且耐熱材料包含含有異氰酸基的化合物時,可藉由添加觸媒而引起胺基甲酸酯化反應。 Further, when the ethylene-based polymer fragment (a2) contains an alcoholic hydroxyl group and the heat-resistant material contains a compound containing an isocyanate group, the urethanization reaction can be caused by the addition of a catalyst.
另外,在乙烯系聚合物片段(a2)或聚矽氧烷片段(a1)具有聚合性不飽和基時,可藉由使用熱聚合起始劑而使其反應。 Further, when the vinyl polymer fragment (a2) or the polyoxyalkylene fragment (a1) has a polymerizable unsaturated group, it can be reacted by using a thermal polymerization initiator.
另外,在乙烯系聚合物片段(a2)或聚矽氧烷片段(a1)具有環氧基時,可藉由調配具有環氧基、羥基、羧基或酸酐、或醯胺基的化合物而使其反應,並可使用通用的環氧樹脂用硬化劑。 Further, when the vinyl polymer fragment (a2) or the polyoxyalkylene fragment (a1) has an epoxy group, it can be prepared by formulating a compound having an epoxy group, a hydroxyl group, a carboxyl group or an acid anhydride, or a guanamine group. The reaction can be carried out using a general hardener for epoxy resins.
另外,亦可併用熱硬化性樹脂。作為熱硬化性樹脂,可 列舉:乙烯系樹脂、不飽和聚酯樹脂、聚胺基甲酸酯樹脂、環氧樹脂、環氧酯樹脂、丙烯酸系樹脂、酚樹脂、石油樹脂、酮樹脂、矽樹脂或這些的改質樹脂等。 Further, a thermosetting resin may also be used in combination. As a thermosetting resin, Listed: vinyl resin, unsaturated polyester resin, polyurethane resin, epoxy resin, epoxy ester resin, acrylic resin, phenol resin, petroleum resin, ketone resin, oxime resin or modified resin of these Wait.
[光硬化] [Photohardening]
在乙烯系聚合物片段(a2)或聚矽氧烷片段(a1)包含具有聚合性雙鍵的基團時,可藉由在耐熱材料中調配光聚合起始劑而進行光硬化。作為光硬化,較佳為紫外線硬化。 When the vinyl polymer fragment (a2) or the polyoxyalkylene fragment (a1) contains a group having a polymerizable double bond, photohardening can be carried out by blending a photopolymerization initiator in a heat resistant material. As photocuring, ultraviolet curing is preferred.
作為光聚合起始劑,只要使用公知者即可,例如可較佳地使用選自由苯乙酮類、苯偶醯縮酮(benzil ketal)類、二苯甲酮類所組成的群組的一種以上。作為上述苯乙酮類,可列舉:二乙氧基苯乙酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮、4-(2-羥基乙氧基)苯基-(2-羥基-2-丙基)酮等。作為上述苯偶醯縮酮類,例如可列舉:1-羥基環己基-苯基酮、苯偶醯二甲基縮酮等。作為上述二苯甲酮類,例如可列舉:二苯甲酮、鄰苯甲醯基苯甲酸甲酯等。作為上述安息香類等,例如可列舉:安息香、安息香甲醚、安息香異丙醚等。光聚合起始劑(B)可單獨使用,亦可併用2種以上。 As the photopolymerization initiator, a known one may be used. For example, a group selected from the group consisting of acetophenones, benzil ketals, and benzophenones can be preferably used. the above. Examples of the acetophenones include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, and 1-(4-isopropylphenyl)-2. - hydroxy-2-methylpropan-1-one, 4-(2-hydroxyethoxy)phenyl-(2-hydroxy-2-propyl) ketone, and the like. Examples of the benzoin ketal include 1-hydroxycyclohexyl-phenyl ketone and benzoin dimethyl ketal. Examples of the benzophenones include benzophenone and methyl benzylidenebenzoate. Examples of the benzoin or the like include benzoin, benzoin methyl ether, and benzoin isopropyl ether. The photopolymerization initiator (B) may be used singly or in combination of two or more.
在進行紫外線硬化時,可根據需要調配多官能(甲基)丙烯酸酯,由於硬化密度提高,因此耐熱性提高。另外,亦可使用單官能(甲基)丙烯酸酯。 When ultraviolet curing is performed, a polyfunctional (meth)acrylate can be blended as needed, and since the hardening density is improved, heat resistance is improved. Further, a monofunctional (meth) acrylate can also be used.
進行紫外線硬化時所使用的光例如可使用:低壓水銀燈、高壓水銀燈、金屬鹵化物燈、氙燈、氬氣雷射、氦氣-鎘雷射、紫外線發光二極體等。 For the light used for ultraviolet curing, for example, a low pressure mercury lamp, a high pressure mercury lamp, a metal halide lamp, a xenon lamp, an argon laser, a helium-cadmium laser, an ultraviolet light emitting diode, or the like can be used.
[耐熱構件] [heat-resistant member]
藉由將本發明的耐熱材料成型,而可獲得本發明的耐熱構 件。作為耐熱構件的形狀,並無特別限制,例如可為片狀、板狀、球狀、膜狀或大型的構築物或複雜的形狀的組裝物或成型物,根據用途進行選擇即可。 The heat resistant structure of the present invention can be obtained by molding the heat resistant material of the present invention. Pieces. The shape of the heat-resistant member is not particularly limited, and may be, for example, a sheet shape, a plate shape, a spherical shape, a film shape, a large-sized structure, or an assembly or a molded product having a complicated shape, and may be selected according to the use.
作為耐熱構件的製造方法,並無特別限制,例如可為使 用模具的成型方法,亦可調整黏度進行塗液化後製成塗膜。或者如黏接劑或密封材料般,以對另外的構件間進行填充或被覆的狀態硬化,藉此可製成耐熱構件。 The method for producing the heat-resistant member is not particularly limited, and for example, it may be The molding method of the mold can also be adjusted to adjust the viscosity to form a coating film. Alternatively, as in the case of an adhesive or a sealing material, it is hardened in a state in which another member is filled or covered, whereby a heat-resistant member can be produced.
[用途] [use]
本發明的耐熱材料及耐熱構件由於耐光性、耐熱性優異且為低線膨脹率,因此可用於各種用途。例如可用於功率半導體用密封材料、高亮度LED用密封材料、耐熱塗佈材料、銅箔積層板(copper clad laminate)等。特別是藉由用作光半導體的密封材料,而可抑制因光引起的劣化、以及因熱引起的尺寸變化,並能以高的水準維持半導體的性能。 Since the heat resistant material and the heat resistant member of the present invention are excellent in light resistance and heat resistance and have a low coefficient of linear expansion, they can be used in various applications. For example, it can be used for a sealing material for power semiconductors, a sealing material for high-brightness LEDs, a heat-resistant coating material, a copper clad laminate, and the like. In particular, by using as a sealing material for an optical semiconductor, deterioration due to light and dimensional change due to heat can be suppressed, and the performance of the semiconductor can be maintained at a high level.
[實施例] [Examples]
接著,藉由實施例及比較例對本發明進行具體地說明。例中只要無特別說明,「份」、「%」為重量基準。 Next, the present invention will be specifically described by way of examples and comparative examples. In the examples, "parts" and "%" are based on weight unless otherwise specified.
(聚矽氧烷(a1-1)的製備例) (Preparation example of polyoxyalkylene (a1-1))
在具備攪拌機、溫度計、滴液漏斗、冷卻管及氮氣導入口的反應容器中,投入甲基三甲氧基矽烷(MTMS)415份、3-甲基丙烯醯氧基丙基三甲氧基矽烷(MPTS)756份,在氮氣的通氣下,一邊攪拌,一邊升溫至60℃。接著,歷時5分鐘滴加包含「Phoslex A-4」[堺化學(股)製造的正丁基酸性磷酸酯](A-4)0.1份與去離子水121份的混合物。滴加結束後、將反應容器中升溫至80℃,並攪拌4小時,藉此進行水解縮合反應,而獲得反應產物。 In a reaction vessel equipped with a stirrer, a thermometer, a dropping funnel, a cooling tube, and a nitrogen inlet, 415 parts of methyltrimethoxydecane (MTMS) and 3-methylpropenyloxypropyltrimethoxydecane (MPTS) were charged. 756 parts were heated to 60 ° C while stirring under a nitrogen atmosphere. Then, it took 5 minutes to add "Phoslex." A-4" [N-butyl acid phosphate produced by 堺Chemical Co., Ltd.] (A-4) A mixture of 0.1 parts with 121 parts of deionized water. After completion of the dropwise addition, the reaction vessel was heated to 80 ° C and stirred for 4 hours to carry out a hydrolysis condensation reaction to obtain a reaction product.
在1千帕~30千帕(kPa)的減壓下、在40℃~60℃的條件下除去所得的反應產物中所含的甲醇及水,藉此獲得數量平均分子量為1000、有效成分為75.0%的聚矽氧烷(a1-1)1000份。 The methanol and water contained in the obtained reaction product are removed under reduced pressure of 1 kPa to 30 kPa (kPa) at 40 ° C to 60 ° C to obtain a number average molecular weight of 1,000 and an active ingredient of 75.0% of polyoxyalkylene (a1-1) 1000 parts.
另外,所謂「有效成分」,是將所使用的矽烷單體的甲氧基全部進行水解縮合反應時的理論產量(重量份)除以水解縮合反應後的實際產量(重量份)而得的值、即根據[矽烷單體的甲氧基全部進行水解縮合反應時的理論產量(重量份)/水解縮合反應後的實際產量(重量份)]的式子而算出者。 In addition, the "active ingredient" is a value obtained by dividing the theoretical yield (parts by weight) of the methoxy group of the decane monomer used by the hydrolysis and condensation reaction by the actual yield (parts by weight) after the hydrolysis condensation reaction. That is, it is calculated based on the equation [the theoretical yield (parts by weight) when the methoxy group of the decane monomer is subjected to the hydrolysis condensation reaction/the actual yield (parts by weight after the hydrolysis condensation reaction).
(聚矽氧烷(a1-2)的製備例) (Preparation example of polyoxyalkylene (a1-2))
在具備攪拌機、溫度計、滴液漏斗、冷卻管及氮氣導入口的反應容器中,投入甲基三甲氧基矽烷(MTMS)642份、3-縮水甘油氧基丙基三甲氧基矽烷(GPTS)62份,在氮氣的通氣下,一邊攪拌,一邊升溫至60℃。接著,歷時5分鐘滴加包含「Phoslex A-4」[堺化學(股)製造的正丁基酸性磷酸酯](A-4)0.1份與去離子水98.6份的混合物。滴加結束後,將反應容器中升溫至80℃,並攪拌4小時,藉此進行水解縮合反應,而獲得反應產物。 In a reaction vessel equipped with a stirrer, a thermometer, a dropping funnel, a cooling tube, and a nitrogen inlet, 642 parts of methyltrimethoxydecane (MTMS) and 3-glycidoxypropyltrimethoxydecane (GPTS) 62 were charged. The mixture was heated to 60 ° C while stirring under a nitrogen atmosphere. Next, a mixture containing 0.1 parts of "Phoslex A-4" [n-butyl acid phosphate (A-4) manufactured by Sigma Chemical Co., Ltd.] and 98.6 parts of deionized water was added dropwise over 5 minutes. After completion of the dropwise addition, the reaction vessel was heated to 80 ° C and stirred for 4 hours, whereby a hydrolysis condensation reaction was carried out to obtain a reaction product.
(聚矽氧烷(a1-9)的製備例) (Preparation example of polyoxyalkylene (a1-9))
在與上述合成例相同的反應容器中,投入苯基三甲氧基矽烷(PTMS)231.9份、二甲基二甲氧基矽烷(DMDMS)26.6份、 MTMS 114.5份,在氮氣的通氣下,一邊攪拌,一邊升溫至60℃。接著,歷時5分鐘滴加包含「A-4」0.1份與去離子水44.2份的混合物。滴加結束後,將反應容器中升溫至80℃,並攪拌4小時,藉此進行水解縮合反應,而獲得反應產物。 In the same reaction vessel as in the above synthesis example, 231.9 parts of phenyltrimethoxydecane (PTMS) and 26.6 parts of dimethyldimethoxydecane (DMDMS) were charged. 114.5 parts of MTMS was heated to 60 ° C while stirring under a nitrogen atmosphere. Next, a mixture containing 0.1 part of "A-4" and 44.2 parts of deionized water was added dropwise over 5 minutes. After completion of the dropwise addition, the reaction vessel was heated to 80 ° C and stirred for 4 hours, whereby a hydrolysis condensation reaction was carried out to obtain a reaction product.
在1千帕~30千帕(kPa)的減壓下、在40℃~60℃的條件下除去所得的反應產物中所含的甲醇及水,藉此獲得數量平均分子量為1000、有效成分為75.0%的聚矽氧烷(a1-9)298.5份。 The methanol and water contained in the obtained reaction product are removed under reduced pressure of 1 kPa to 30 kPa (kPa) at 40 ° C to 60 ° C to obtain a number average molecular weight of 1,000 and an active ingredient of 75.0% of polyoxane (a1-9) 298.5 parts.
(聚矽氧烷(a1-10)的製備例) (Preparation example of polyoxyalkylene (a1-10))
在與上述合成例相同的反應容器中,投入PTMS 151.7份、DMDMS 27.2份、MTMS 117.9份、MPTS 35.0份、3-縮水甘油氧基丙基三甲氧基矽烷(GPTS)35.2份,在氮氣的通氣下,一邊攪拌,一邊升溫至60℃。接著,歷時5分鐘滴加包含「A-4」0.1份與去離子水42.6份的混合物。滴加結束後,將反應容器中升溫至80℃,並攪拌4小時,藉此進行水解縮合反應,而獲得反應產物。 In the same reaction vessel as in the above synthesis example, 151.7 parts of PTMS, 27.2 parts of DMDMS, 117.9 parts of MTMS, 35.0 parts of MPTS, and 35.2 parts of 3-glycidoxypropyltrimethoxydecane (GPTS) were placed in a nitrogen atmosphere. The temperature was raised to 60 ° C while stirring. Next, a mixture containing 0.1 part of "A-4" and 42.6 parts of deionized water was added dropwise over 5 minutes. After completion of the dropwise addition, the reaction vessel was heated to 80 ° C and stirred for 4 hours, whereby a hydrolysis condensation reaction was carried out to obtain a reaction product.
在1千帕~30千帕(kPa)的減壓下、在40℃~60℃的條件下除去所得的反應產物中所含的甲醇及水,藉此獲得數量平均分子量為1000、有效成分為74.8%的聚矽氧烷(a1-10)302份。 The methanol and water contained in the obtained reaction product are removed under reduced pressure of 1 kPa to 30 kPa (kPa) at 40 ° C to 60 ° C to obtain a number average molecular weight of 1,000 and an active ingredient of 74.8% of the polyoxyalkylene (a1-10) was 302 parts.
(聚矽氧烷(a11-1)的製備例) (Preparation example of polyoxyalkylene (a11-1))
在與上述合成例相同的反應容器中,投入MTMS 143.06份,在氮氣的通氣下,一邊攪拌,一邊升溫至60℃。接著,歷時5分鐘滴加包含「A-4」0.1份與去離子水45份的混合物。滴加結束 後,將反應容器中升溫至80℃,並攪拌4小時,藉此進行水解縮合反應,而獲得反應產物。 In the same reaction vessel as in the above-mentioned synthesis example, 143.06 parts of MTMS was charged, and the temperature was raised to 60 ° C while stirring under a nitrogen atmosphere. Next, a mixture containing 0.1 part of "A-4" and 45 parts of deionized water was added dropwise over 5 minutes. End of drop Thereafter, the temperature of the reaction vessel was raised to 80 ° C and stirred for 4 hours, whereby a hydrolysis condensation reaction was carried out to obtain a reaction product.
在1千帕~30千帕(kPa)的減壓下、在40℃~60℃的條件下除去所得的反應產物中所含的甲醇及水,藉此獲得數量平均分子量為1000、有效成分為75.0%的聚矽氧烷(a11-1)120份。 The methanol and water contained in the obtained reaction product are removed under reduced pressure of 1 kPa to 30 kPa (kPa) at 40 ° C to 60 ° C to obtain a number average molecular weight of 1,000 and an active ingredient of 120 parts of 75.0% polyoxyalkylene (a11-1).
(聚矽氧烷(a11-2~a11-4、a11-6~a11-10)的製備例) (Preparation of polyoxyalkylene (a11-2~a11-4, a11-6~a11-10))
使用與上述合成例相同的裝置,以表1所示的調配比投入矽氧烷單體,在氮氣的通氣下,一邊攪拌,一邊升溫至60℃。接著,歷時5分鐘滴加包含「A-4」0.1份與去離子水45份的混合物。滴加結束後,將反應容器中升溫至80℃,並攪拌4小時,藉此進行水解縮合反應,而獲得反應產物。 Using the same apparatus as in the above-mentioned synthesis example, the oxirane monomer was charged at the mixing ratio shown in Table 1, and the temperature was raised to 60 ° C while stirring under a nitrogen atmosphere. Next, a mixture containing 0.1 part of "A-4" and 45 parts of deionized water was added dropwise over 5 minutes. After completion of the dropwise addition, the reaction vessel was heated to 80 ° C and stirred for 4 hours, whereby a hydrolysis condensation reaction was carried out to obtain a reaction product.
在1千帕~30千帕(kPa)的減壓下、在40℃~60℃的條件下除去所得的反應產物中所含的甲醇及水,藉此獲得聚矽氧烷(a11-2~a11-4、a11-6、a11-7、a11-8)各試樣。 The methanol and water contained in the obtained reaction product are removed under reduced pressure of 1 kPa to 30 kPa (kPa) at 40 ° C to 60 ° C to obtain a polyoxane (a11-2~). Each sample of a11-4, a11-6, a11-7, a11-8).
將上述聚矽氧烷合成例(a11-1~a11-10)中的矽氧烷單體調配量(單位為重量份)表示於表1。 The amount of the oxoxane monomer (unit: parts by weight) in the above polyoxane synthesis examples (a11-1 to a11-10) is shown in Table 1.
(乙烯系聚合物(a2-3)的製備例) (Preparation example of vinyl polymer (a2-3))
在與上述合成例相同的反應容器中,投入PTMS 120份、乙酸正丁酯322.5份,在氮氣的通氣下,一邊攪拌,一邊升溫至95℃。 接著,在該溫度下、在氮氣的通氣下,一邊攪拌,一邊歷時4小時在上述反應容器中,滴加含有甲基丙烯酸甲酯(MMA)263.3份、甲基丙烯酸縮水甘油酯(GMA)189.0份、苯乙烯(St)3.2份、丙烯酸丁酯(BA)6.3份、MPTS 37.8份、甲基丙烯酸2-羥基乙酯(HEMA)157.5份、乙酸正丁酯45份、過氧化2-乙基己酸第三丁酯(TBPEH)25.2份的混合物。接著,在該溫度下攪拌10小時,藉此獲得TBPEH的殘存量為0.1%以下的反應產物即乙烯系聚合物(a2-3)。 In the same reaction vessel as in the above-mentioned synthesis example, 120 parts of PTMS and 322.5 parts of n-butyl acetate were charged, and the temperature was raised to 95 ° C while stirring under a nitrogen atmosphere. Next, at this temperature, while stirring under a nitrogen atmosphere, 263.3 parts of methyl methacrylate (MMA) and glycidyl methacrylate (GMA) 189.0 were added dropwise to the reaction container over 4 hours while stirring. Parts, 3.2 parts of styrene (St), 6.3 parts of butyl acrylate (BA), 37.8 parts of MPTS, 157.5 parts of 2-hydroxyethyl methacrylate (HEMA), 45 parts of n-butyl acetate, 2-ethyl peroxide A mixture of 25.2 parts of tert-butyl hexanoate (TBPEH). Then, the mixture was stirred at this temperature for 10 hours to obtain a vinyl polymer (a2-3) which is a reaction product in which the residual amount of TBPEH was 0.1% or less.
(乙烯系聚合物(a21-1)的製備例) (Preparation Example of Vinyl Polymer (a21-1))
在與上述合成例相同的反應容器中,投入3-縮水甘油氧基丙基三甲氧基矽烷(GPTS)27.58份、乙酸正丁酯107.7份,在氮氣的通氣下,一邊攪拌,一邊升溫至95℃。接著,在該溫度下、在氮氣的通氣下,一邊攪拌,一邊歷時4小時在上述反應容器中,滴加含有甲基丙烯酸甲酯(MMA)26.9份、甲基丙烯酸正丁酯(BMA)3.2份、甲基丙烯酸環己酯(CHMA)75份、丙烯酸(AA)2.0份、丙烯酸丁酯(BA)2.0份、MPTS 3.0份、甲基丙烯酸2-羥基乙酯(HEMA)37.5份、乙酸正丁酯15份、過氧化2-乙基己酸第三丁酯(TBPEH)6份的混合物。接著,在該溫度下攪拌2小時後,在上述反應容器中,歷時5分鐘滴加「A-4」 0.07份與去離子水17.1份的混合物,並在該溫度下攪拌5小時,藉此進行PTMS、DMDMS、MPTS的水解縮合反應。藉由1H-NMR分析反應產物,結果上述反應容器中的矽烷單體所具有的三甲氧基矽烷基的幾乎100%水解。接著,藉由在該溫度下攪拌10小時,而獲得TBPEH的殘存量為0.1%以下的反應產物即乙烯系聚合物(a21-1)。 In the same reaction vessel as in the above-mentioned synthesis example, 27.58 parts of 3-glycidoxypropyltrimethoxydecane (GPTS) and 107.7 parts of n-butyl acetate were charged, and the temperature was raised to 95 while stirring under a nitrogen atmosphere. °C. Next, 26.9 parts of methyl methacrylate (MMA) and n-butyl methacrylate (BMA) 3.2 were added dropwise to the reaction container at this temperature under aeration of nitrogen gas under aeration for 4 hours. Parts, 75 parts of cyclohexyl methacrylate (CHMA), 2.0 parts of acrylic acid (AA), 2.0 parts of butyl acrylate (BA), 3.0 parts of MPTS, 37.5 parts of 2-hydroxyethyl methacrylate (HEMA), acetic acid A mixture of 15 parts of butyl ester and 6 parts of perbutyl 2-ethylhexanoate (TBPEH). Then, after stirring at this temperature for 2 hours, "A-4" was added dropwise over 5 minutes in the above reaction vessel. A mixture of 0.07 parts and 17.1 parts of deionized water was stirred at this temperature for 5 hours to carry out a hydrolysis condensation reaction of PTMS, DMDMS, and MPTS. The reaction product was analyzed by 1 H-NMR, and as a result, almost 100% of the trimethoxydecyl group of the decane monomer in the above reaction vessel was hydrolyzed. Then, the mixture was stirred at this temperature for 10 hours to obtain a vinyl polymer (a21-1) which is a reaction product having a residual amount of TBPEH of 0.1% or less.
(乙烯系聚合物(a21-2~a21-4、a21-6~a21-12)的製備例) (Preparation Example of Vinyl Polymer (a21-2~a21-4, a21-6~a21-12))
在與上述合成例相同的反應容器中,藉由表2-1及表2-2所示的組成投入矽氧烷單體(GPTS、PTMS、DMDMS),接著投入乙酸正丁酯107.7份,在氮氣的通氣下,一邊攪拌,一邊升溫至95℃。接著,在該溫度下、在氮氣的通氣下,一邊攪拌,一邊歷時4小時在上述反應容器中,滴加包含根據表2-1及表2-2而混合的矽氧烷單體以外的聚合性單體的混合物。接著,在該溫度下攪拌2小時後,在上述反應容器中,歷時5分鐘滴加「A-4」0.07份與去離子水17.1份的混合物,在該溫度下攪拌5小時,接著在該溫度下攪拌10小時,藉此獲得TBPEH的殘存量為0.1%以下的反應產物即各乙烯系聚合物(a21-2~a21-4、a21-6~a21-12)。 In the same reaction vessel as in the above synthesis example, a oxoxane monomer (GPTS, PTMS, DMDMS) was charged by the composition shown in Table 2-1 and Table 2-2, followed by 107.7 parts of n-butyl acetate. The temperature was raised to 95 ° C while stirring under a nitrogen atmosphere. Next, at this temperature, under stirring at a temperature of nitrogen gas, polymerization was carried out in the reaction vessel over 4 hours in a manner other than the mixture of the oxoxane monomers mixed according to Table 2-1 and Table 2-2. a mixture of sexual monomers. Then, after stirring at this temperature for 2 hours, a mixture of 0.07 parts of "A-4" and 17.1 parts of deionized water was added dropwise to the reaction vessel over 5 minutes, and stirred at the temperature for 5 hours, followed by the temperature. The mixture was stirred for 10 hours to obtain a reaction product of a residual amount of TBPEH of 0.1% or less, that is, each of the ethylene-based polymers (a21-2 to a21-4, a21-6 to a21-12).
將合成上述乙烯系聚合物(a21-1~a21-12)時的聚合性單體調配量(單位為重量份)表示於表2-1及表2-2。 The blending amount (unit: parts by weight) of the polymerizable monomer in the synthesis of the above vinyl polymer (a21-1 to a21-12) is shown in Table 2-1 and Table 2-2.
(複合樹脂(A-1)的製備例) (Preparation Example of Composite Resin (A-1))
在與上述合成例相同的反應容器中,投入PTMS 20.1份、DMDMS 24.4份、乙酸正丁酯107.7份,在氮氣的通氣下,一邊攪拌,一邊升溫至95℃。接著,在該溫度下、在氮氣的通氣下,一邊攪拌,一邊歷時4小時在上述反應容器中,滴加含有MMA 15份、BMA 45份、甲基丙烯酸2-乙基己酯(EHMA)39份、AA 1.5 份、BA 1.5份、MPTS 4.5份、HEMA 45份、乙酸正丁酯15份、TBPEH 6份的混合物。接著,在該溫度下攪拌2小時後,在上述反應容器中,歷時5分鐘滴加「A-4」0.07份與去離子水12.8份的混合物,在該溫度下攪拌5小時,藉此進行PTMS、DMDMS、MPTS的水解縮合反應。藉由1H-NMR分析反應產物,結果上述反應容器中的矽烷單體所具有的三甲氧基矽烷基的幾乎100%水解。接著,藉由在該溫度下攪拌10小時,而獲得TBPEH的殘存量為0.1%以下的反應產物。另外,TBPEH的殘存量藉由碘滴定法而測定。 In a reaction vessel similar to the above-mentioned synthesis example, 20.1 parts of PTMS, 24.4 parts of DMDMS, and 107.7 parts of n-butyl acetate were charged, and the temperature was raised to 95 ° C while stirring under a nitrogen atmosphere. Next, 15 parts of MMA, 45 parts of BMA, and 2-ethylhexyl methacrylate (EHMA) 39 were added dropwise to the reaction vessel at this temperature under aeration of nitrogen gas under aeration for 4 hours. Share, AA 1.5 A mixture of 1.5 parts of BA, 4.5 parts of MPTS, 45 parts of HEMA, 15 parts of n-butyl acetate, and 6 parts of TBPEH. Then, after stirring at this temperature for 2 hours, a mixture of 0.07 parts of "A-4" and 12.8 parts of deionized water was added dropwise to the reaction vessel over 5 minutes, and the mixture was stirred at the same temperature for 5 hours to carry out PTMS. , hydrolysis reaction of DMDMS, MPTS. The reaction product was analyzed by 1 H-NMR, and as a result, almost 100% of the trimethoxydecyl group of the decane monomer in the above reaction vessel was hydrolyzed. Then, by stirring at this temperature for 10 hours, a reaction product in which the residual amount of TBPEH was 0.1% or less was obtained. In addition, the residual amount of TBPEH was measured by iodine titration.
接著,在前期反應產物中添加合成例1中所得的聚矽氧 烷(a1-1)82.4份,攪拌5分鐘後,添加去離子水7.2份,在80℃下進行4小時攪拌,而進行前期反應產物與聚矽氧烷的水解縮合反應。將所得的反應產物在10kPa~300kPa的減壓下、在40℃~60℃的條件下蒸餾2小時,藉此將所生成的甲醇及水除去,接著添加甲基乙基酮(MEK)150份、乙酸正丁酯28.6份,而獲得包含聚矽氧烷片段與乙烯聚合物片段、且聚矽氧烷片段(a1-1)的含量為50重量%的複合樹脂(A-1)溶液428份(固體成分為50.1%)。 Next, the polyfluorene obtained in Synthesis Example 1 was added to the preliminary reaction product. After 82.4 parts of the alkane (a1-1), after stirring for 5 minutes, 7.2 parts of deionized water was added, and the mixture was stirred at 80 ° C for 4 hours to carry out a hydrolysis condensation reaction of the preliminary reaction product with the polyoxyalkylene. The obtained reaction product was distilled under reduced pressure of 10 kPa to 300 kPa at 40 ° C to 60 ° C for 2 hours to remove the produced methanol and water, followed by addition of methyl ethyl ketone (MEK) 150 parts. 28.6 parts of n-butyl acetate, and 428 parts of a composite resin (A-1) solution containing a polyoxyalkylene fragment and an ethylene polymer fragment and having a polyoxyalkylene fragment (a1-1) content of 50% by weight was obtained. (solid content was 50.1%).
(複合樹脂(A-3)的製備例) (Preparation example of composite resin (A-3))
在與上述合成例相同的反應容器中,投入PTMS 46.7份、DMDMS 18.9份、乙酸正丁酯107.7份,在氮氣的通氣下,一邊攪拌,一邊升溫至95℃。接著,在該溫度下、在氮氣的通氣下, 一邊攪拌,一邊歷時4小時在上述反應容器中,滴加含有甲基丙烯酸縮水甘油酯(GMA)45份、苯乙烯(St)0.8份、MMA 60.8份、BA 1.5份、MPTS 4.5份、HEMA 37.5份、乙酸正丁酯15份、TBPEH 7.5份的混合物。接著,在該溫度下攪拌2小時後,在上述反應容器中,歷時5分鐘滴加「A-4」0.07份與去離子水13.8份的混合物,在該溫度下攪拌5小時,藉此進行PTMS、DMDMS、MPTS的水解縮合反應。藉由1H-NMR分析反應產物,結果上述反應容器中的矽烷單體所具有的三甲氧基矽烷基幾乎100%水解。接著,藉由在該溫度下攪拌10小時,而獲得TBPEH的殘存量為0.1%以下的反應產物。另外,TBPEH的殘存量藉由碘滴定法而測定。 In a reaction vessel similar to the above-mentioned synthesis example, 46.7 parts of PTMS, 18.9 parts of DMDMS, and 107.7 parts of n-butyl acetate were charged, and the temperature was raised to 95 ° C while stirring under a nitrogen atmosphere. Then, at this temperature, under aeration of nitrogen, While stirring, 45 parts of glycidyl methacrylate (GMA), 0.8 parts of styrene (St), 60.8 parts of MMA, 1.5 parts of BA, 4.5 parts of MPTS, and HEMA 37.5 were added dropwise to the above reaction vessel over 4 hours. A mixture of 15 parts of n-butyl acetate and 7.5 parts of TBPEH. Then, after stirring at this temperature for 2 hours, a mixture of 0.07 parts of "A-4" and 13.8 parts of deionized water was added dropwise to the reaction vessel over 5 minutes, and the mixture was stirred at this temperature for 5 hours to carry out PTMS. , hydrolysis reaction of DMDMS, MPTS. The reaction product was analyzed by 1 H-NMR, and as a result, the trimethoxydecyl group of the decane monomer in the above reaction vessel was almost 100% hydrolyzed. Then, by stirring at this temperature for 10 hours, a reaction product in which the residual amount of TBPEH was 0.1% or less was obtained. In addition, the residual amount of TBPEH was measured by iodine titration.
接著,在前期反應產物中,添加聚矽氧烷(a1-2)143.9 份,攪拌5分鐘後,添加去離子水71.5份,在80℃下進行4小時攪拌,而進行前期反應產物與聚矽氧烷的水解縮合反應。將所得的反應產物在10kPa~300kPa的減壓下、在40℃~60℃的條件下蒸餾2小時,藉此將所生成的甲醇及水除去,接著添加甲基乙基酮(MEK)150份、乙酸正丁酯29.3份,而獲得包含聚矽氧烷片段與乙烯聚合物片段、且聚矽氧烷片段(a1-2)的含量為50重量%的複合樹脂(A-3)溶液600份(固體成分為50.3%)。 Next, in the pre-reaction product, polypyroxyline (a1-2) 143.9 was added. After stirring for 5 minutes, 71.5 parts of deionized water was added, and the mixture was stirred at 80 ° C for 4 hours to carry out a hydrolysis condensation reaction of the preliminary reaction product with polyoxyalkylene. The obtained reaction product was distilled under reduced pressure of 10 kPa to 300 kPa at 40 ° C to 60 ° C for 2 hours to remove the produced methanol and water, followed by addition of methyl ethyl ketone (MEK) 150 parts. And 29.3 parts of n-butyl acetate, and 600 parts of a composite resin (A-3) solution containing a polyoxyalkylene fragment and an ethylene polymer fragment and having a polyoxyalkylene fragment (a1-2) content of 50% by weight was obtained. (solid content was 50.3%).
(複合樹脂(A-9)的製備例) (Preparation example of composite resin (A-9))
在上述合成例中所得的乙烯系聚合物(a2-3)421.5份中,添加聚矽氧烷(a1-9)107.5份,攪拌5分鐘後,添加去離子水 30.0份,在80℃下進行4小時攪拌,而進行上述反應產物與聚矽氧烷的水解縮合反應。將所得的反應產物在10kPa~300kPa的減壓下、在40℃~60℃的條件下蒸餾2小時,藉此將所生成的甲醇及水除去,接著添加乙酸正丁酯122.5份,而獲得非揮發性成分為55.0%的複合樹脂(A-9)545.3份。 In 421.5 parts of the ethylene-based polymer (a2-3) obtained in the above Synthesis Example, 107.5 parts of polyoxyalkylene oxide (a1-9) was added, and after stirring for 5 minutes, deionized water was added thereto. 30.0 parts of the mixture was stirred at 80 ° C for 4 hours to carry out a hydrolysis condensation reaction of the above reaction product with polysiloxane. The obtained reaction product was distilled under reduced pressure of 10 kPa to 300 kPa at 40 ° C to 60 ° C for 2 hours to remove the produced methanol and water, followed by addition of 122.5 parts of n-butyl acetate to obtain a non- 545.3 parts of a composite resin (A-9) having a volatile component of 55.0%.
(複合樹脂(A-10)的製備例) (Preparation example of composite resin (A-10))
在上述合成例中所得的乙烯系聚合物(a2-3)422.3份中,添加聚矽氧烷(a1-10)107.6份,攪拌5分鐘後,添加去離子水28.9份,在80℃下進行4小時攪拌,而進行上述反應產物與聚矽氧烷的水解縮合反應。將所得的反應產物在10kPa~300kPa的減壓下、在40℃~60℃的條件下蒸餾2小時,藉此將所生成的甲醇及水除去,接著添加乙酸正丁酯141.5份,而獲得非揮發性成分為55.0%的複合樹脂(A-10)548.2份。 In 422.3 parts of the ethylene-based polymer (a2-3) obtained in the above Synthesis Example, 107.6 parts of polyoxyalkylene (a1-10) was added, and after stirring for 5 minutes, 28.9 parts of deionized water was added thereto, and the mixture was carried out at 80 ° C. The mixture was stirred for 4 hours to carry out a hydrolysis condensation reaction of the above reaction product with polyoxyalkylene. The obtained reaction product was distilled under reduced pressure of 10 kPa to 300 kPa at 40 ° C to 60 ° C for 2 hours to remove the produced methanol and water, followed by addition of 141.5 parts of n-butyl acetate to obtain a non- The composite resin (A-10) having a volatile component of 55.0% was 548.2 parts.
(複合樹脂(A-21)的製備例) (Preparation example of composite resin (A-21))
在上述合成例中所得的乙烯系聚合物(a21-1)20份中,添加聚矽氧烷(a11-1)120份,攪拌5分鐘後,添加去離子水62.3份,在80℃下進行4小時攪拌,而進行上述反應產物與聚矽氧烷的水解縮合反應。將所得的反應產物在10kPa~300kPa的減壓下、在40℃~60℃的條件下蒸餾2小時,藉此將所生成的甲醇及水除去,接著添加甲基乙基酮81.8份,而獲得非揮發性成分為55%的包含聚矽氧烷片段與乙烯聚合物片段的複合樹脂(A-21)181.8份。 120 parts of polyoxyalkylene (a11-1) was added to 20 parts of the ethylene-based polymer (a21-1) obtained in the above synthesis example, and after stirring for 5 minutes, 62.3 parts of deionized water was added, and it was carried out at 80 °C. The mixture was stirred for 4 hours to carry out a hydrolysis condensation reaction of the above reaction product with polyoxyalkylene. The obtained reaction product was distilled under reduced pressure of 10 kPa to 300 kPa at 40 ° C to 60 ° C for 2 hours to remove the produced methanol and water, followed by addition of 81.8 parts of methyl ethyl ketone. The nonvolatile component was 55% of a composite resin (A-21) comprising a polyoxyalkylene fragment and an ethylene polymer fragment (181.8 parts).
(複合樹脂(A-22~A-24、A-26~A-30)的製備例) 在上述合成例中所得的乙烯系聚合物(a21-2~a21-4、a21-6~a21-10)中,根據表3的量比添加聚矽氧烷(a11-2~a11-4、a11-6~a11-10),攪拌5分鐘後,添加去離子水62.3份,在80℃下進行4小時攪拌,而進行上述反應產物與聚矽氧烷的水解縮合反應。將所得的反應產物在10kPa~300kPa的減壓下、在40℃~60℃的條件下蒸餾2小時,藉此將所生成的甲醇及水除去,接著添加甲基乙基酮81.8份,而獲得非揮發性成分為55%的包含聚矽氧烷片段與乙烯聚合物片段的複合樹脂(A-22~A-24、A-26~A-30)各181.8份。 (Preparation of composite resin (A-22~A-24, A-26~A-30)) In the ethylene-based polymer (a21-2~a21-4, a21-6~a21-10) obtained in the above synthesis example, polypyroxane (a11-2~a11-4, according to the amount ratio of Table 3) was added. A11-6~a11-10), after stirring for 5 minutes, 62.3 parts of deionized water was added, and the mixture was stirred at 80 ° C for 4 hours to carry out a hydrolysis condensation reaction of the above reaction product with polysiloxane. The obtained reaction product was distilled under reduced pressure of 10 kPa to 300 kPa at 40 ° C to 60 ° C for 2 hours to remove the produced methanol and water, followed by addition of 81.8 parts of methyl ethyl ketone. The non-volatile component was 55% of each of 181.8 parts of a composite resin (A-22~A-24, A-26~A-30) containing a polyoxyalkylene fragment and an ethylene polymer fragment.
將合成上述複合樹脂(A-22~A-24、A-26~A-30)時的聚合性單體調配量(單位為重量份)表示於表3。 Table 3 shows the blending amount (unit: parts by weight) of the polymerizable monomer when the above composite resin (A-22 to A-24, A-26 to A-30) was synthesized.
<實施例1>耐熱材料1 <Example 1> Heat resistant material 1
調配固體成分量為50%的複合樹脂(A-1)溶液50份、二氧化矽微粒子(日本艾羅技(股)製造的Aerosil 50)25份及甲基異丁基酮(MIBK)250份。 50 parts of a composite resin (A-1) solution having a solid content of 50%, 25 parts of cerium oxide microparticles (Aerosil 50 manufactured by Aerotech Co., Ltd.), and 250 parts of methyl isobutyl ketone (MIBK) were blended.
使用壽工業(股)製造的Ultra Apex Mill UAM015,進行該調 配物中的二氧化矽微粒子的分散。在製備組成物時,在研磨機內相對於研磨機的容積而填充50%的作為介質的30μm系的氧化鋯珠,以每分鐘1.5升的流量進行調配物的循環粉碎。進行30分鐘的循環粉碎,而獲得使二氧化矽微粒子分散於複合樹脂(A-1)及分散介質的混合物中的組成物。將所得的組成物自Ultra Apex Mill UAM015的取出口取出,使用蒸發器調整分散介質濃度,而獲得固體成分濃度為50%的含有二氧化矽微粒子的組成物。 This adjustment was made using Ultra Apex Mill UAM015 manufactured by Shou Industrial Co., Ltd. Dispersion of cerium oxide microparticles in the formulation. In the preparation of the composition, 50% of 30 μm-type zirconia beads as a medium was filled in the grinder with respect to the volume of the grinder, and the formulation was subjected to cyclic pulverization at a flow rate of 1.5 liter per minute. The cycle pulverization was carried out for 30 minutes to obtain a composition in which cerium oxide fine particles were dispersed in a mixture of the composite resin (A-1) and a dispersion medium. The obtained composition was taken out from the outlet of Ultra Apex Mill UAM015, and the concentration of the dispersion medium was adjusted using an evaporator to obtain a composition containing cerium oxide microparticles having a solid concentration of 50%.
在所得的組成物中調配光聚合起始劑(Irgacure184(Ir184):巴斯夫(BASF)公司製造)0.5份,並作為耐熱材料1。 To the obtained composition, 0.5 parts of a photopolymerization initiator (Irgacure 184 (Ir 184): manufactured by BASF Corporation) was prepared and used as a heat resistant material 1.
<實施例2~實施例14> <Example 2 to Example 14>
以與實施例1相同的方式,藉由下述表4-1、表4-2所記載的調配量進行調配,藉此獲得各耐熱材料。其中在使二氧化矽微粒子分散時,藉由與前階段相同的方法進行分散,而獲得耐熱材料。 In the same manner as in Example 1, the respective heat resistant materials were obtained by blending the amounts described in the following Tables 4-1 and 4-2. When the cerium oxide microparticles are dispersed, dispersion is carried out in the same manner as in the previous stage to obtain a heat resistant material.
<比較例1、比較例2> <Comparative Example 1 and Comparative Example 2>
藉由下述表4-3所記載的調配量,在各乙烯系聚合物a21-11、a21-12中分別調配MIBK、2-甲基-4-咪唑,而獲得比較用耐熱材料。 MIBK and 2-methyl-4-imidazole were prepared for each of the ethylene-based polymers a21-11 and a21-12 by the blending amounts described in the following Table 4-3 to obtain a heat-resistant material for comparison.
[評價] [Evaluation]
將所得的耐熱材料成型,並進行耐光性及耐熱性的評價。 The obtained heat resistant material was molded, and evaluation of light resistance and heat resistance was performed.
(藉由紫外線硬化的評價用硬化物的製作) (Production of cured product for evaluation by ultraviolet light curing)
在單面鏡面鋁板的鏡面層(100mm×250mm×0.3mm)上,將耐熱材料1、耐熱材料10、耐熱材料14、耐熱材料18棒塗成厚度 為10μm,在大和科學(Yamato Scientific)股份有限公司製造的精密恆溫器DH610S中,在80度下預烘焙4分鐘後,在80W/cm2的高壓水銀燈下、以約1000mJ的照射量進行紫外線照射,而獲得評價用硬化物。 On the mirror layer of a single-sided mirror aluminum plate (100 mm × 250 mm × 0.3 mm), the heat-resistant material 1, the heat-resistant material 10, the heat-resistant material 14, and the heat-resistant material 18 were bar-coated to a thickness of 10 μm, and the shares in Yamato Scientific were limited. In the precision thermostat DH610S manufactured by the company, after prebaking at 80 degrees for 4 minutes, ultraviolet irradiation was performed under an 80 W/cm 2 high-pressure mercury lamp at an irradiation dose of about 1000 mJ to obtain a cured product for evaluation.
(藉由熱硬化的評價用硬化物的製作) (Production of cured product for evaluation by thermal hardening)
在單面鏡面鋁板的鏡面層(100mm×250mm×0.3mm)上,將耐熱材料1、耐熱材料10、耐熱材料14、耐熱材料18以外的耐熱材料棒塗成厚度為100μm,在大和科學股份有限公司製造的精密恆溫器DH610S中,在150度下進行3小時加熱處理,將所得的硬化塗膜自鋁板上剝離,藉此獲得膜厚為100μm的評價用硬化物。 On the mirror layer of a single-sided mirror aluminum plate (100 mm × 250 mm × 0.3 mm), a heat-resistant material other than the heat-resistant material 1, the heat-resistant material 10, the heat-resistant material 14, and the heat-resistant material 18 is coated to a thickness of 100 μm, and is limited in Daiwa Scientific Co., Ltd. In the precision thermostat DH610S manufactured by the company, heat treatment was performed at 150 degrees for 3 hours, and the obtained cured coating film was peeled off from the aluminum plate, thereby obtaining a cured product for evaluation having a film thickness of 100 μm.
對所得的評價用硬化物進行如以下的評價,將結果表示於第1表。 The obtained cured product for evaluation was evaluated as follows, and the results are shown in the first table.
[耐光性測定] [Light resistance measurement]
使用岩崎電氣股份有限公司製造的超級紫外線試驗機(EYE SUPER UV TESTER),實施藉由SUV試驗(100mW/cm2、60度、50%)的耐光性試驗(耐UV性試驗),藉由目視觀察來比較評價未曝露的試驗體與經過360小時後的試驗體。將表面狀態等無變化者評價為(○)。另外,將藉由目視確認到帶黃色調者評價為△,將進一步確認到產生龜裂者評價為×。 Light resistance test (UV resistance test) by SUV test (100 mW/cm 2 , 60 degrees, 50%) was carried out using a super ultraviolet tester (EYE SUPER UV TESTER) manufactured by Iwasaki Electric Co., Ltd., by visual inspection Observations were made to compare and evaluate the unexposed test body with the test body after 360 hours. The person who has no change in the surface state or the like is evaluated as (○). In addition, it was confirmed by visual observation that the yellowish tone was evaluated as Δ, and it was confirmed that the crack occurrence was evaluated as ×.
[耐熱性試驗線膨脹係數] [Heat resistance test line expansion coefficient]
使用島津製作所製造的TMA-50,測定評價用硬化物在50度時的線膨脹係數(CTE)。 The linear expansion coefficient (CTE) of the cured product for evaluation at 50 degrees was measured using TMA-50 manufactured by Shimadzu Corporation.
關於縮寫符號 About abbreviations
Ir184:光聚合起始劑(巴斯夫公司製造) Ir184: Photopolymerization initiator (manufactured by BASF Corporation)
2E4MZ:2-甲基-4-咪唑(熱聚合觸媒) 2E4MZ: 2-methyl-4-imidazole (thermal polymerization catalyst)
SP-170:光酸產生劑(艾迪科(ADEKA)製造) SP-170: Photoacid generator (made by ADEKA)
[產業上之可利用性] [Industrial availability]
本發明的耐熱材料由於耐光性、耐熱性優異,且線膨脹率小,因此可較佳地用於耐熱性黏接劑、功率半導體用密封材料、高亮度LED用密封材料、耐熱塗佈材料、銅箔積層板等。另外,使該耐熱材料硬化而成的耐熱構件,由於不產生因太陽光或螢光燈、LED光或UV燈等的光引起的劣化、而且一併具有因熱引起的尺寸變化小的優異的耐熱性,因此可長期穩定地利用。 Since the heat resistant material of the present invention is excellent in light resistance and heat resistance and has a small coefficient of linear expansion, it can be preferably used for a heat resistant adhesive, a sealing material for power semiconductors, a sealing material for high-brightness LEDs, a heat-resistant coating material, Copper foil laminates, etc. In addition, the heat-resistant member obtained by curing the heat-resistant material does not cause deterioration due to light such as sunlight, fluorescent lamps, LED light, or UV lamps, and also has excellent dimensional change due to heat. Heat resistance, so it can be used stably for a long time.
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| Publication number | Publication date |
|---|---|
| WO2014061630A1 (en) | 2014-04-24 |
| JPWO2014061630A1 (en) | 2016-09-05 |
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