TW200932405A - Method for producing copper powder, and copper powder - Google Patents
Method for producing copper powder, and copper powder Download PDFInfo
- Publication number
- TW200932405A TW200932405A TW097136051A TW97136051A TW200932405A TW 200932405 A TW200932405 A TW 200932405A TW 097136051 A TW097136051 A TW 097136051A TW 97136051 A TW97136051 A TW 97136051A TW 200932405 A TW200932405 A TW 200932405A
- Authority
- TW
- Taiwan
- Prior art keywords
- copper
- copper powder
- slurry
- hydrazine
- reducing agent
- Prior art date
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 194
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 41
- 239000002245 particle Substances 0.000 claims abstract description 96
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims abstract description 85
- 239000010949 copper Substances 0.000 claims abstract description 70
- 229910052802 copper Inorganic materials 0.000 claims abstract description 67
- 239000002002 slurry Substances 0.000 claims abstract description 53
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 51
- 238000006722 reduction reaction Methods 0.000 claims abstract description 50
- -1 copper salt compound Chemical class 0.000 claims abstract description 48
- 238000009826 distribution Methods 0.000 claims abstract description 44
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 34
- 239000000243 solution Substances 0.000 claims abstract description 25
- 229910000831 Steel Inorganic materials 0.000 claims description 30
- 239000010959 steel Substances 0.000 claims description 30
- 239000000843 powder Substances 0.000 claims description 25
- 239000002253 acid Substances 0.000 claims description 21
- 239000005752 Copper oxychloride Substances 0.000 claims description 17
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 17
- 150000001875 compounds Chemical class 0.000 claims description 17
- 238000006243 chemical reaction Methods 0.000 claims description 16
- HKMOPYJWSFRURD-UHFFFAOYSA-N chloro hypochlorite;copper Chemical compound [Cu].ClOCl HKMOPYJWSFRURD-UHFFFAOYSA-N 0.000 claims description 16
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 12
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 11
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 11
- 239000012085 test solution Substances 0.000 claims description 6
- 238000000691 measurement method Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000009825 accumulation Methods 0.000 claims 2
- 238000000034 method Methods 0.000 abstract description 44
- 229910052698 phosphorus Inorganic materials 0.000 abstract description 30
- 239000011574 phosphorus Substances 0.000 abstract description 30
- 238000005406 washing Methods 0.000 abstract description 17
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract description 16
- 150000001879 copper Chemical class 0.000 abstract description 15
- 239000012535 impurity Substances 0.000 abstract description 15
- 230000008569 process Effects 0.000 abstract description 14
- 239000003513 alkali Substances 0.000 abstract description 7
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 abstract description 6
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 abstract description 6
- 229940112669 cuprous oxide Drugs 0.000 abstract description 6
- 239000012066 reaction slurry Substances 0.000 abstract description 5
- 239000012266 salt solution Substances 0.000 abstract description 4
- 230000009467 reduction Effects 0.000 description 30
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 26
- 239000005751 Copper oxide Substances 0.000 description 26
- 229910000431 copper oxide Inorganic materials 0.000 description 26
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 25
- 239000007788 liquid Substances 0.000 description 25
- 229910052799 carbon Inorganic materials 0.000 description 24
- 230000000052 comparative effect Effects 0.000 description 22
- 239000007864 aqueous solution Substances 0.000 description 14
- 239000004020 conductor Substances 0.000 description 13
- 238000005245 sintering Methods 0.000 description 9
- 229910000365 copper sulfate Inorganic materials 0.000 description 8
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 8
- 230000001186 cumulative effect Effects 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- 238000001556 precipitation Methods 0.000 description 7
- 230000002776 aggregation Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 238000004220 aggregation Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 229910021529 ammonia Inorganic materials 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000012756 surface treatment agent Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000004520 agglutination Effects 0.000 description 3
- GJYJYFHBOBUTBY-UHFFFAOYSA-N alpha-camphorene Chemical compound CC(C)=CCCC(=C)C1CCC(CCC=C(C)C)=CC1 GJYJYFHBOBUTBY-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 235000011089 carbon dioxide Nutrition 0.000 description 3
- QKSIFUGZHOUETI-UHFFFAOYSA-N copper;azane Chemical compound N.N.N.N.[Cu+2] QKSIFUGZHOUETI-UHFFFAOYSA-N 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000008187 granular material Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 238000012856 packing Methods 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 description 2
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 239000012267 brine Substances 0.000 description 2
- 239000011362 coarse particle Substances 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 239000011231 conductive filler Substances 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000003002 pH adjusting agent Substances 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000001488 sodium phosphate Substances 0.000 description 2
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 2
- 235000019801 trisodium phosphate Nutrition 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- FUSNOPLQVRUIIM-UHFFFAOYSA-N 4-amino-2-(4,4-dimethyl-2-oxoimidazolidin-1-yl)-n-[3-(trifluoromethyl)phenyl]pyrimidine-5-carboxamide Chemical compound O=C1NC(C)(C)CN1C(N=C1N)=NC=C1C(=O)NC1=CC=CC(C(F)(F)F)=C1 FUSNOPLQVRUIIM-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- 102100028168 BET1 homolog Human genes 0.000 description 1
- 239000005944 Chlorpyrifos Substances 0.000 description 1
- 241000252185 Cobitidae Species 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- 241000219112 Cucumis Species 0.000 description 1
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 description 1
- 101000697381 Homo sapiens BET1 homolog Proteins 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- JDRJCBXXDRYVJC-UHFFFAOYSA-N OP(O)O.N.N.N Chemical compound OP(O)O.N.N.N JDRJCBXXDRYVJC-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 241000283973 Oryctolagus cuniculus Species 0.000 description 1
- 206010036790 Productive cough Diseases 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- FJJCIZWZNKZHII-UHFFFAOYSA-N [4,6-bis(cyanoamino)-1,3,5-triazin-2-yl]cyanamide Chemical compound N#CNC1=NC(NC#N)=NC(NC#N)=N1 FJJCIZWZNKZHII-UHFFFAOYSA-N 0.000 description 1
- RIRXDDRGHVUXNJ-UHFFFAOYSA-N [Cu].[P] Chemical compound [Cu].[P] RIRXDDRGHVUXNJ-UHFFFAOYSA-N 0.000 description 1
- SQGFXLOLZKPOIC-UHFFFAOYSA-N [Ru]=O.[Na] Chemical compound [Ru]=O.[Na] SQGFXLOLZKPOIC-UHFFFAOYSA-N 0.000 description 1
- DUDJJJCZFBPZKW-UHFFFAOYSA-N [Ru]=S Chemical compound [Ru]=S DUDJJJCZFBPZKW-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- KWYKSRAECRPMIS-UHFFFAOYSA-N azane;hydrazine Chemical compound N.NN KWYKSRAECRPMIS-UHFFFAOYSA-N 0.000 description 1
- 235000021167 banquet Nutrition 0.000 description 1
- 229910000072 bismuth hydride Inorganic materials 0.000 description 1
- BPBOBPIKWGUSQG-UHFFFAOYSA-N bismuthane Chemical compound [BiH3] BPBOBPIKWGUSQG-UHFFFAOYSA-N 0.000 description 1
- 230000009172 bursting Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 235000013339 cereals Nutrition 0.000 description 1
- SBPBAQFWLVIOKP-UHFFFAOYSA-N chlorpyrifos Chemical compound CCOP(=S)(OCC)OC1=NC(Cl)=C(Cl)C=C1Cl SBPBAQFWLVIOKP-UHFFFAOYSA-N 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000571 coke Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- BWFPGXWASODCHM-UHFFFAOYSA-N copper monosulfide Chemical compound [Cu]=S BWFPGXWASODCHM-UHFFFAOYSA-N 0.000 description 1
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000006071 cream Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000001493 electron microscopy Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 210000004709 eyebrow Anatomy 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 235000011389 fruit/vegetable juice Nutrition 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 239000012493 hydrazine sulfate Substances 0.000 description 1
- 229910000377 hydrazine sulfate Inorganic materials 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000010079 rubber tapping Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 1
- 229940048086 sodium pyrophosphate Drugs 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- 230000035922 thirst Effects 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 235000020985 whole grains Nutrition 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
- B22F9/24—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/052—Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Powder Metallurgy (AREA)
- Non-Insulated Conductors (AREA)
Abstract
Description
200932405 九、發明說明: 【發明所屬之技術領域】 本發明是關於利用濕式法的銅粉製造方法 於以銅鹽水溶液為起始液並藉由二 、j是關 造方法,以及藉由此製造方… 件到銅粉的製 久稽田此裂&方法所得的銅粉。 【先前技術】 銅粉廣泛的被使用作為銅膏或銅200932405 IX. Description of the Invention: [Technical Field] The present invention relates to a method for producing copper powder by a wet method, using a copper salt aqueous solution as a starting liquid and by using a second and a j, and thereby The manufacturer... The copper powder obtained by the cracking & method of the copper powder. [Prior Art] Copper powder is widely used as copper paste or copper
係在由粒徑數微米(A m)微小粒 1 瓜卞所構成的鋼粉中, :入:脂成分而成的結構,並為可以應用於使用網版” 之Ρ刷電路板電路形成、各種電接點部等,燒結成型途 固化作為導體膜,以發揮導電性的結構。 义到印刷電路板等小型化的影響,當藉由前述銅膏形 f電,的導電性、可靠性等觀點下,銅粉的進一步改良已 是市場所需求者。例如,在細微電路中,關於電特性微小 ,動即會影響產品的情形下,導電性填充物也會有對電穩 疋性要求高精度水準。還有’由於細微電路的細線化,故 會對微粒導電性填充物有要求。但是銅粉因構成微粒之表 =能量變高’❿易凝集,致使粒度分佈寬度較廣,而難以 仔到微粒均一的銅粉。為此,有微粒均一銅粉的要求。 還有,導體形成之際,因銅粉粒子中含有碳成分,故 於高溫燒結成型時會產生碳酸氣體,而致導體不均一並妨 礙穩定的導體形成的問題。具體而言,銅膏材料中使用銅 粉粒子内部含有大量碳的銅粉時,會於高溫燒結成型時,It is a steel powder composed of a micron particle (A m) fine particle 1 melon, and has a structure of a fat component, and is formed by a circuit board circuit which can be applied to a screen. Various types of electrical contact parts, etc., are cured as a conductor film during the sintering process, and exhibit a conductive structure. The influence of miniaturization such as a printed circuit board, conductivity, reliability, etc. by the copper paste-shaped electric power From the point of view, further improvement of copper powder is already in demand in the market. For example, in a microcircuit, when the electrical characteristics are small and the motion affects the product, the conductive filler also has high requirements for electrical stability. Accuracy level. Also, 'because of the fine line of the fine circuit, there is a requirement for the conductive filler of the particle. However, the copper powder is easily aggregated due to the surface of the formed particles = the energy becomes high, which makes the particle size distribution wider and more difficult. In this case, there is a requirement for a uniform particle of copper powder. In addition, when the conductor is formed, since the copper powder particles contain a carbon component, carbonic acid gas is generated during high-temperature sintering, and the conductor is formed. Do not Uniformity hinders the problem of stable conductor formation. Specifically, when a copper powder containing copper powder containing a large amount of carbon is used in a copper paste material, it is formed at a high temperature sintering.
2213-10013-PF 5 200932405 於所形成之燒膜内部產生碳酸氣體。因此碳酸氣體,而 於燒結膜表面產生爆裂,進而產生導體内部缺陷。上述中, 匕3碳纟他不純物的鋼粉,會於電阻值等電特性中產生 。口質變動纟此’要求有不純物極少且純度高的銅粉。 作為銅粉製造方法例子的專利文獻1(曰本專利申請 特開襲_314755號公報)中,係揭示有使用濕式還原法 控制良好粒徑的薄片鋼粉。還有在專利文獻2巾,則是揭 Ο 不使用具有磷含量為〇 . 0l質量百分比至〇 · ι〇質量百分比 及具氧s量為G.3G質量百分比以下的銅粉末作為外部電 極用銅膏組成物。在此專利文獻2 (曰本專利申請特 2005-222737號公報)巾,外部電極用銅膏組成物所使用 :球狀銅粉末平均粒徑為i微米i 4微米’為了於外部電 極用銅膏組成物中得$丨 賦形藥。還有,此專利及塗佈性,故需使用有機 J文獻2中所揭示的銅粉末製造方 未特別限定濕式還原法、乾 法而得者。 丨法等’並記載較佳是以水霧 但是’對朝微粒均一且低不純物銅粉的需要, 所製造的微粒銅粉之情报 粉,會有包含粗粒、= = :散性佳的鋼 向。還有,為了…! 不純物的傾 迓有為了 &除粗粒,而強化分級, 化或產率降低、製造成本變高等問題。 製造長期 A地:彳面’為了使以習知濕式還原法所得的銅粉有 :::子本身微粒成均-的傾向,故從反應性觀=r 大多·是使用有機系還原劑(例如是專利文獻3;:::利2213-10013-PF 5 200932405 Carbonic acid gas is generated inside the formed film. Therefore, carbonic acid gas is generated, and a crack occurs on the surface of the sintered film, thereby generating internal defects of the conductor. In the above, the steel powder of 匕3 carbon and other impurities is generated in the electric resistance characteristics of the electric resistance value. The change in sputum is required to have copper powder with few impurities and high purity. Patent Document 1 (Japanese Patent Application Laid-Open No. Hei No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No Further, in Patent Document 2, it is disclosed that copper powder having an external phosphorus content of not more than 0.1% by mass to 〇· ι〇 mass percentage and aerobic s amount of G.3G mass percent or less is not used. Cream composition. In the patent document 2 (Japanese Patent Application Laid-Open No. Hei No. 2005-222737), the outer electrode is used for the copper paste composition: the average particle diameter of the spherical copper powder is i micrometer i 4 micrometers 'for the external electrode copper paste The composition is given a $ 丨 shaped drug. Further, in this patent and coating property, the copper powder produced by the organic J document 2 is not particularly limited in terms of the wet reduction method or the dry method.丨 method, etc., and it is better to use water mist but the need for uniform and low-impact copper powder. The information powder of the micro-copper powder produced will contain coarse particles, = = : good dispersion steel to. Also, for...! The impureness of the impurities is such that, in addition to the coarse particles, the classification is enhanced, the yield or the yield is lowered, and the manufacturing cost becomes high. In the case of the copper powder obtained by the conventional wet reduction method, there is a tendency for the particles to be homogenized in the conventional wet reduction method. Therefore, from the viewpoint of reactivity = r, most of them are organic reducing agents ( For example, Patent Document 3;::: Lee
2213-10013-PF 200932405 申請特開2GG5-314755號公報)。此結果,因銅粉中有機 劑吸附量變多,而有碳含量變多的傾向。 還有,在使用無機還原劑之濕式還原法情形(例如是 專利文獻4 ;日本專利申請第357〇591號公報)下,雖2 解決了上述碳含量的問題,但會產生凝集而致所得銅㈣ 度分佈廣泛且寬的情形。 本發明受到上述問題,目提供一種粒度分佈寬度 極狹且不純物含量較少、導電率高、均質的高品質銅粉二 ® 以及用以穩定且效率佳地得到前述銅粉的銅粉製造方法。 【發明内容】 在此,本發明者等進行深入研究的結果,得到採用使 用濕式還原法之下述㈣製造方法以解決上述問題的銅 粉。 銅粉製造方法:本發明銅粉製造方法係在銅鹽水溶液 φ 添加驗溶液而得的銅鹽化合物泥漿中’添加聯氨系還原劑 而成亞氧化銅泥漿,水洗此亞氧化銅泥漿,於再泥漿化洗 淨亞氧化銅泥漿中,再次添加聯氨系還原劑的銅粉製造方 法m中’到最後還原反應結東為止,為使磷與銅莫 爾比為P/CU=0.0001至0.003,而於反應泥聚中添加鱗化 合物。 更甚之,本發明銅粉製造方法中,前述銅鹽化合物泥 蒙的銅濃度較佳是1莫爾/升(moi/L)至3莫爾/升。 本發明銅粉製造方法中,前述鹼溶液以氨水溶液為佳。2213-10013-PF 200932405 Application No. 2GG5-314755). As a result, the amount of adsorption of the organic agent in the copper powder tends to increase, and the carbon content tends to increase. Further, in the case of the wet reduction method using an inorganic reducing agent (for example, Patent Document 4; Japanese Patent Application Laid-Open No. 357-591), although the above problem of carbon content is solved, aggregation occurs and the result is obtained. Copper (four) degrees are widely distributed and wide. SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and an object of the invention is to provide a high-quality copper powder II® having a narrow particle size distribution width, a low impurity content, a high electrical conductivity, and a uniform quality, and a copper powder production method for stably and efficiently obtaining the copper powder. As a result of intensive studies, the present inventors have obtained a copper powder which solves the above problems by the following (four) manufacturing method using the wet reduction method. Copper powder manufacturing method: The copper powder manufacturing method of the present invention is to add a hydrazine-based reducing agent to a copper oxychloride slurry in a copper salt compound slurry obtained by adding a test solution to a copper salt aqueous solution φ, and wash the copper oxychloride slurry by water. In the slurry-washed copper oxide slurry, the copper powder production method m in which the hydrazine-based reducing agent is added again is added to the final reduction reaction, so that the phosphorus-copper molar ratio is P/CU=0.0001 to 0.003. And adding a scaly compound to the reaction mud. Furthermore, in the copper powder producing method of the present invention, the copper concentration of the copper salt compound is preferably from 1 mol/L to 3 m/l. In the method for producing a copper powder of the present invention, the alkali solution is preferably an aqueous ammonia solution.
2213-10013-PF 200932405 本發明銅粉製造方法中, 聯氨系還原劑且進行還原反應 整為3.5至6.0。 前述銅鹽化合物泥漿中添加 時的酸鹼值(PH)較佳是調2213-10013-PF 200932405 In the method for producing copper powder of the present invention, the hydrazine-based reducing agent is subjected to a reduction reaction of from 3.5 to 6.0. The pH value of the copper salt compound slurry added is preferably adjusted.
本發明銅粉製造方法中,前 聯备么、審広 J 4 里化合物泥漿中添加 聯風系還原劑時,較佳是以氨 虱水/合液進仃還原反應時的酸 驗值調整。 本發明銅粉製造方法中,前述洗淨亞氧化鋼泥漿中再 次添加聯氨㈣原劑前泥漿的酸驗值較佳是調整為至 6.0。 · 本發明銅粉:本發明銅粉為由上述鋼粉製造方法所得 的銅粉。藉由雷射衍射散射式粒度分佈測 累積平均粒徑d5。為〇 1姆本s c Λ ^ 為ϋ. 1微未至5. 0微米,使用藉由雷射衍 射散射式粒度分佈測量法所得的粒度分佈標準偏差汕及 則述體積累積平均粒徑D5。所示之SD/D5。為0 2至0.卜 還有’本發明銅粉在大氣氣氛氣中,攝氏400度30分 鐘熱處理I的碳含量較佳是不(0.01質量百分比。 [發明效果] 本發月銅粕裏造方法不僅可以極力排除不純物的含 還可製這出粒度分佈寬度極狹的銅粉。而且本發明銅 粉為以前述製造方法所得者。 【實施方式】 以下係對本發明銅粉製造方法及銅粉較佳實施例進行 說明。In the method for producing copper powder of the present invention, it is preferred to adjust the acid value during the reduction reaction of the ammonia hydrazine/liquid mixture into the hydrazine reducing agent in the compound slurry of the former J4. In the method for producing copper powder of the present invention, the acid value of the slurry before the addition of the hydrazine (tetra) original agent in the washed sub-oxidized steel slurry is preferably adjusted to 6.0. The copper powder of the present invention: The copper powder of the present invention is a copper powder obtained by the above method for producing steel powder. The cumulative average particle diameter d5 was measured by a laser diffraction scattering type particle size distribution. 〇 1 姆 s c Λ ^ is ϋ. 1 micro to 5. 0 μm, the standard deviation of the particle size distribution obtained by the laser diffraction scattering particle size distribution measurement and the volume cumulative average particle diameter D5. SD/D5 as shown. It is 0 2 to 0. In addition, the carbon content of the copper powder of the present invention in the air atmosphere at 400 ° C for 30 minutes is preferably not 0.018% by mass. [Effect of the invention] The method can not only eliminate the inclusion of impurities, but also can produce the copper powder having a very narrow particle size distribution width. Moreover, the copper powder of the present invention is obtained by the above-mentioned manufacturing method. [Embodiment] The following is a method for producing copper powder of the present invention and copper powder. The preferred embodiment is described.
2213-10013-PF 200932405 鋼粉的製造方法··首先,對作為本發明銅粉製造方法 前提的製程進行概略說明。最初,銅鹽水溶液中添加驗溶 液形成銅鹽化合物泥漿。此銅鹽化合物泥漿中添加聯氨系 還原劑成為亞氧化鋼泥漿(第!還原處理)。接著,水洗 亞氧化銅泥漿得到再泥漿化洗淨亞氧化銅泥漿,再於此洗 淨亞氧化銅泥漿中再次添加聯氨系還原劑的製程(第2還 原處理)。經由前述第2還原處理所還原析出之銅粉,即 得到欲製備的銅粉。 ❺ ❹ :還有,本發明銅粉製造方法中,在上述製程中,直到 最後還原反應結束時,係添加可使莫爾比為磷/銅(pWu ) 0.0001至0.003量的磷化物至反應泥漿中。亦即,在上 述方法中,藉由添加對銅極微量的磷成分以抑制析出粒子 成:過程中的凝集,進而製造出粒度分佈極狹且低不純物 的N品質銅粉。 汁孤硐粉製 、首先,藉由在銅鹽水溶液中添加驗溶液,與鋼 生成銅鹽化合物,並以此做成銅鹽化合物泥漿。例*: 銅鹽水洛液中於30分鐘内慢慢鹼溶 ; yv Λ* ^ ^傻靜置 3 0 仃…、成,讓鹼溶液與銅鹽反應,得到二價鋼化合物。 在此’銅鹽水溶液係將水溶性銅鹽加入水 Q 。 分溶解的物暂 成為部 ]物質。水溶性銅鹽例如是硫酸銅、硝 銅、惫介柄哲 敗鋼、醋酸 s等’其中較佳是硫酸銅、硝酸鋼。 液例如是氨太、、办十 纪匕 疋胥’鹼溶 乱&,备液、虱氧化鉀、氳氧化鈉等。 氨水溶液時,、以疋使用 碍因可以排除不純物得到純度高的铜 】粉而為較2213-10013-PF 200932405 Method for producing steel powder·· First, a process which is a premise of the method for producing a copper powder of the present invention will be briefly described. Initially, a solution of the test solution is added to the copper salt aqueous solution to form a copper salt compound slurry. A hydrazine-based reducing agent is added to the copper salt compound slurry to form a sub-oxidized steel slurry (first reduction treatment). Next, the copper oxychloride slurry is washed with water to obtain a slurry of the copper oxychloride slurry, and the hydrazine-based reducing agent is further added to the copper oxychloride slurry (second reduction treatment). The copper powder to be produced is obtained by the copper powder which has been precipitated by the second reduction treatment. ❺ ❹ : In addition, in the method for producing a copper powder of the present invention, in the above process, until the end of the final reduction reaction, a phosphide having a molar ratio of phosphorus/copper (pWu) of 0.0001 to 0.003 is added to the reaction slurry. in. That is, in the above method, N-quality copper powder having an extremely narrow particle size distribution and low impurity is produced by adding a phosphorus component which is extremely small in copper to suppress precipitation of particles in the process. The juice is made of glutinous powder. First, a copper salt compound is formed with steel by adding a test solution to an aqueous solution of copper salt, thereby preparing a copper salt compound slurry. Example*: Slowly alkali-dissolving in a copper salt solution in 30 minutes; yv Λ* ^ ^ silly standing 3 0 仃..., into, let the alkali solution react with the copper salt to obtain a divalent steel compound. Here, the aqueous copper salt solution is a water-soluble copper salt added to water Q. Sub-dissolved matter temporarily becomes a part of the substance. The water-soluble copper salt is, for example, copper sulfate, cuprous copper, ruthenium sulphide, acetic acid s, etc. Among them, copper sulfate or nitric acid is preferred. The liquid is, for example, ammonia, chlorpyrifos, alkali solution, liquid preparation, potassium oxyhydroxide, sodium ruthenium oxide, and the like. In the case of an aqueous ammonia solution, the use of bismuth can eliminate the impurities and obtain a high purity copper powder.
2213-10013-PF 200932405 佳的。 銅鹽化合物泥漿的銅濃度較佳是丨莫爾/升至3莫爾/ 升。銅鹽化合物泥漿的銅濃度不足丨莫爾/升時,得不到比 f知更有生產效率化的效果。另一方面,銅鹽化合物泥聚 的銅濃度超過3莫爾/升時,會產生凝集,而使粒度分佈控 制困難而難以有製造穩定性。還有,銅鹽化合物泥衆的銅 濃度更佳是1. 5莫爾/升至2· 5莫爾/升。 鹼溶液只要係可得作為中和生成物的銅鹽化合物的量 β 料’且需考慮後續製程中酸鹼值間的關係。例如使用氨 水溶液作為鹼溶液時,氨水溶液的添加量係為相對於銅ι 莫爾,使氨成分為1.0莫爾至3, 8莫爾。氨成分在此範圍 之外時,於後續還原t程中會有朝適當酸驗值範圍的控制 變困難的問題。 本發明銅粉製造方法較佳是調整使銅鹽化合物泥漿銅 濃度成為較高濃度的液量。習知濕式還原法中,還原前銅 〇 鹽化合物泥漿銅濃度若高,會產生析出粒子的凝集,進而 難以有效率製造出粒度分佈寬度狹窄的銅粉。但是,本發 明銅粉製造方法中,藉由酸鹼值變動範圍的調整、使用物 質扣合條件等種種調整,使還原反應前銅鹽化合物泥漿銅 濃度在上述範圍中,而可得到粒度分佈寬度極狹的銅粉。 接著’於前述銅鹽化合物泥漿中添加聯氨系還原劑, 以作為亞氧化銅泥漿(第1還原)。本發明銅粉製造方法 中,在使銅鹽化合物還原成亞氧化銅程度下,調整聯氨系 還原齊!添加量,以作成亞氧化銅泥槳。亦即,藉由第1 ^ 2213-10013-pp 200932405 原處理’調製亞氧化鋼泥漿,並使之後第2還原處理時的 反應穩定化,進而使還原析出粒子均一化。 此第1還原處理時,使用聯氨系還原劑,可以使對亞 氧化銅粒子表面殘留還原劑成分的可能性降低’而無污染 物質。 聯風系還原劑例如是含水聯氨、硫酸聯氨、無水聯氨 等種種物質,其中含水聯氣較佳。此種聯氨系還原劑,可 u單獨使用也可以混合使用。還有,聯氨系還原劑因可在 ^ 反應系溶液中迅速擁·%、c & 丁、迷彍散、均一反應,故可以用以在溶液狀 態下反應。 ❿ _糸還:原劑的添加量係為相對於銅鹽化合物泥漿中 銅1莫爾’使用聯氨系還原劑0· 3莫爾至〇. 5莫爾。聯氨 系還原劑添加量相對於前述銅1莫爾不足0.3莫爾時,未 反應的銅鹽化合物會過多殘留而不佳。另一方面,聯氨系 還原劑添加量添加相對於前述銅1莫爾超過0.5莫爾時, 會無法到亞氧化銅階段時停止還原反應。 、、 還有在鋼鹽化合物泥漿添加聯氨系… 反應時的酸鹼值係調整至3 仃’、 'f ^ m ^ λ π* .至6. 〇。此溶液酸鹼值在上 二Γ所得之亞氧化銅粒子粒徑變化變大,並使 最後產时中出現銅粉粒子粒度分佈寬度變廣。 從此銅鹽化合物泥漿 理中’除添加聯氨系還原劑,較佳是使 “ 劑的氨水溶液控制酸鹼值 為酸鹼值調整 述,中,使用作為酸驗值調=:形下進行還原處理。前 I驗值調整劑的氨水溶液,還可以在銅鹽2213-10013-PF 200932405 Excellent. The copper concentration of the copper salt compound slurry is preferably 丨 尔 / liter to 3 摩尔 / liter. When the copper concentration of the copper salt compound slurry is less than 丨 尔 / liter, the effect of productivity improvement is not obtained. On the other hand, when the copper concentration of the copper salt compound is more than 3 m/l, aggregation occurs, and the control of the particle size distribution is difficult and manufacturing stability is difficult. Further, the copper concentration of the copper salt compound mud is preferably 1.5 mil / liter to 2.5 hr / liter. The alkali solution is only required to be the amount of the copper salt compound which is a neutralized product, and the relationship between the pH values in the subsequent processes needs to be considered. For example, when an aqueous ammonia solution is used as the alkali solution, the amount of the aqueous ammonia solution added is 1.0 mol to 3,8 mol with respect to the copper imol. When the ammonia component is out of this range, there is a problem that control of an appropriate acid detection range becomes difficult in the subsequent reduction t-pass. The copper powder producing method of the present invention preferably adjusts the liquid concentration of the copper salt compound mud copper to a higher concentration. In the conventional wet reduction method, if the copper concentration of the copper cerium salt compound before reduction is high, aggregation of precipitated particles occurs, and it is difficult to efficiently produce copper powder having a narrow particle size distribution width. However, in the method for producing a copper powder of the present invention, the copper salt concentration of the copper salt compound before the reduction reaction is in the above range by various adjustments such as the adjustment range of the pH value and the conditions for the use of the substance, and the particle size distribution width can be obtained. Very narrow copper powder. Next, a hydrazine-based reducing agent was added to the copper salt compound slurry as a copper oxychloride slurry (first reduction). In the method for producing a copper powder of the present invention, the hydrazine-based reduction is adjusted while reducing the copper salt compound to copper oxychloride! The amount is added to make a copper oxide slurry. In other words, the oxidized steel slurry is prepared by the first treatment of the first ^ 2213-10013-pp 200932405, and the reaction at the time of the second reduction treatment is stabilized, whereby the reduced precipitated particles are further uniformized. In the first reduction treatment, the hydrazine-based reducing agent can be used to reduce the possibility of remaining a reducing agent component on the surface of the cuprous oxide particles, and there is no pollutant. The syngas reducing agent is, for example, various substances such as aqueous hydrazine, hydrazine sulfate, and anhydrous hydrazine. Among them, water-containing gas is preferred. Such a hydrazine-based reducing agent may be used singly or in combination. Further, the hydrazine-based reducing agent can be used to react in a solution state because it can rapidly react with %, c & butyl, fused, and homogeneous reactions in the reaction solution. ❿ _ 糸 : : : : : : : : : : : : 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原 原When the amount of the hydrazine-based reducing agent added is less than 0.3 mol with respect to the above-mentioned copper 1 mol, the unreacted copper salt compound may be excessively insufficient. On the other hand, when the addition amount of the hydrazine-based reducing agent is more than 0.5 moles with respect to the above-mentioned copper 1 mole, the reduction reaction may not be stopped in the copper oxide phase. And, in the addition of hydrazine to the steel salt compound slurry, the pH value of the reaction is adjusted to 3 仃', 'f ^ m ^ λ π* . to 6. 〇. The change in the particle size of the cuprous oxide particles obtained by the pH value of the solution in the upper bismuth increases, and the particle size distribution width of the copper powder particles in the final production time becomes wider. From the copper salt compound slurry, in addition to the addition of the hydrazine-based reducing agent, it is preferred to adjust the acid-base value of the aqueous ammonia solution of the agent to adjust the pH value, and use it as the acid value adjustment = Treatment. The ammonia solution of the former I value adjustment agent can also be used in copper salt.
2213-I0013-PF 11 200932405 化合物泥漿生成時使用作為驗溶液的氨進行中和,因使用 物質同-,故可以儘可能地排除異種成分之使用,而極力 排除殘留不純物。此結果是可以容易進行所得銅粉純度控 制。 ❾ ❹ 在上述第1還原處理中,相對於銅鹽化合物u中銅 莫爾&添加_束時之過程中,較佳是以聯氨系還原劑 =為U莫爾至0.5莫爾,氨水溶液(作為幻成為〇2 、爾至0.4莫爾的比例連續添加。經前述添加的反應泥裝 酸鹼值只要調整至還原劑與酸鹼值調整劑添加開始時的起 始酸驗值與添減束時㈣束酸録⑽差 即可。 r 在此,亞氧化銅泥漿意指含有亞氧化銅的泥裝,也可 以為含有亞氧化銅以外之構成成分的情形。後述洗淨亞氣 化銅泥漿亦是相同情形。 還有,所得亞氧化銅泥漿的酸鹼值若為3 5至6.0的 範圍内’則在以後的製程中,反應泥漿的酸驗值變動 ^制於較佳範圍内。此結果顯示’可以使所得銅粉粒徑均 一化。當亞氧化銅泥製酸驗值為比U還驗性侧時,亞 :銅泥:中銅成分不會停止於亞氧化銅而會凝集形成金 另方面’亞氧^化銅泥^漿為比3. 5還酸性侧時 化銅的還原會不完全,而降低製造效率。 還有,第1還原處理時反應泥漿溫度,較佳是採 氏40度至攝氏6Q度的範圍。當反應泥製溫度不足攝氏 度時,還原反應速度較緩而無法滿足工業的生產性。·另一 2213-10013-pp 12 200932405 方面虽反應泥漿溫度超過攝氏60度時,還原速度過快, 會引起不均一的還原反應,導致所得的銅粉粉體特性劣化。 接著,水洗亞氧化銅泥漿,再次泥漿化成為洗淨亞氧 、銅/b襞首先,靜置亞氧化銅泥漿,沈殿得到亞氧化銅 粒子。亞氧化銅粒子的沈澱後,去除上澄液,藉由添加水 以洗淨亞氧化銅粒子’再次泥漿化成為洗淨亞氧化銅泥 漿。洗淨亞氧化銅泥漿酸鹼值為41至6 〇,且在以後製 程中,將酸鹼值變動抑制於適當範圍内,即可將所得銅粉 W 粒徑變得精度更佳。 還有,關於亞氧化銅粒子洗淨方法,並未特別限定, 可以採用公知的洗淨方法。但是,採用以下所述之排斥洗 淨,可較佳地管理洗淨中亞氧化銅泥漿酸鹼值至洗淨水 準。排斥洗淨是廢氣沈澱亞氧化銅後之上澄液,再注入洗 淨水,並來回進行數次前述操作。還有,排斥洗淨較佳是 注足洗淨水並使洗淨亞氧化銅泥漿酸鹼值成為41至6 〇 ❹ 範圍内任一個定值的酸鹼值,而反覆洗淨。當洗淨亞氧化 銅泥漿酸鹼值為比4. 1還酸性侧時,還原效率會變差。另 一方面,洗淨亞氧化銅泥漿酸鹼值為比6, 〇還鹼性侧時, 之後添加用以得到銅粉之還原劑時,會導致反應變化增 大、分散性變差等粉體特性變差的情況。 還有,更佳是使洗淨亞氧化銅泥漿酸鹼值成為4.3至 4.7範圍内任一個定值的酸鹼值下進行洗淨。藉由洗淨亞 氧化銅泥漿酸鹼值在上述範圍内,製成穩定性最佳。 在前述哳調製得到的洗淨亞氧化銅泥漿中,添加聯氨 2213-10013-PF 13 200932405 系還原劑’還原析出銅粉(第2還原 洗淨、乾燥析出粒子,即得到銅粉 還有,過滤、 的量,在添知姑Α + +加聯氨系還原劑 町篁在添加結束時,相對於洗淨 較佳是添加0.3莫礙$ 7 ζ h 鋼所含銅1莫爾, 鹽化人物呢喷㈣ 比率°還有’添加至銅 的聯氨系還原劑總和相對於銅i ^匕銅泥漿 爾的比率。 旲爾為0.6莫爾至2.0莫 藉由聯氨系還历滅丨& 愚 還原劑的添加,即將進行 ®酸驗值較佳是調整至4 >還原反應的泥漿 •至6.〇的範圍。還片反應味的赫 鹼值比4. 1還酸性铜# H 疋席反應時的酸 一方面叆眉;5A性、,會3加粗粒而使分散性變差。另 方面還原反應時的酸鹼值比6 · 0 多而導致微粒析出粒子數過剩而太多。,k ’還原劑過 i 理與Γ銅鹽化合物泥襞中添加聯氨系還原劑(第 二原處)相同’添加聯敦系還原劑(第2還原處理) 月ij的洗淨亞氧化銅泥聚銅濃产 “ /升至Wii/4、Γ 是依液量調整成1莫爾 G _ 、 ,以侍到粒度分佈寬度狹窄的銅粉。還有, 前述銅激度更佳是u莫爾/升至25莫爾/升。還有 添,聯氨系還原劑溫度較佳是保持於攝氏40度至攝 氏60範圍的一定溫度程度。 聯氰糸還原劑溫度比攝氏40 度還低時’還原反應會純彳卜,^ > 而無法滿足工業上所期望之 生產性。另一方面,聯扇备、署=> 乳系還原劑溫度比攝氏60度還高 時’還原反應會提早而致粒徑不—致。 第1還原處理與第2還原處理所使用之還原劑’因使 用同種聯氨系還原劑,作為请Ε + 作為還原劑的聯氨類的還原能力是2213-I0013-PF 11 200932405 When the compound slurry is formed, it is neutralized with ammonia as the test solution. Since the substance is the same, the use of the different components can be excluded as much as possible, and the residual impurities are eliminated as much as possible. As a result, the purity control of the obtained copper powder can be easily performed. ❾ ❹ In the above first reduction treatment, in the process of adding copper to the copper salt compound u, it is preferred to use a hydrazine-based reducing agent=U Moir to 0.5 Mohr, ammonia. The aqueous solution (as a ratio of illusion to 〇2, to 0.4 mil is continuously added. The pH value of the reaction sludge added as described above is adjusted to the initial acid value at the start of the addition of the reducing agent and the pH adjuster. When the beam is reduced (4), the acidity of the acid is (10). r Here, the copper oxide slurry means a clay containing copper oxychloride, or may be a component other than copper oxychloride. The same is true for the copper mud. Also, if the pH value of the obtained copper oxychloride slurry is in the range of 35 to 6.0, then in the subsequent process, the acid value of the reaction slurry is changed within the preferred range. This result shows that the particle size of the obtained copper powder can be made uniform. When the acidity of the copper oxide mud is more than the U side, the copper: the copper component does not stop at the copper oxide. Agglomerated to form gold in another aspect, 'oxygenated copper mud slurry is more than 3.5. The reduction may be incomplete, and the manufacturing efficiency is lowered. Further, the temperature of the reaction mud in the first reduction treatment is preferably in the range of 40 degrees Celsius to 6 degrees Celsius. When the reaction mud temperature is less than Celsius, the reduction reaction speed is higher. Slowly can not meet the industrial productivity. · Another 2231-10013-pp 12 200932405 Although the reaction mud temperature exceeds 60 degrees Celsius, the reduction rate is too fast, causing a heterogeneous reduction reaction, resulting in the obtained copper powder powder Next, the copper oxychloride slurry is washed with water, and then mudted to clean the oxynitride and copper/b 襞. First, the copper oxychloride slurry is allowed to stand, and the copper sulphide particles are obtained in the slab. After the precipitation of the copper oxychloride particles, the upper portion is removed. The liquid is cleaned by adding water to clean the copper oxide particles to become a washed copper oxide slurry. The acid phase of the copper oxide slurry is 41 to 6 〇, and in the subsequent process, the acid and alkali are added. When the value fluctuation is suppressed within an appropriate range, the particle diameter of the obtained copper powder W can be made more precise. Further, the method for washing the cuprous copper particles is not particularly limited, and a known washing can be employed. However, the use of the exclusion washing described below can better manage the pH value of the copper oxide slurry in the washing to the washing level. The repelling washing is the precipitation of the copper oxide on the exhaust gas, and then injecting Wash the water and carry out the above operations several times. Further, it is preferable to wash the washing water and make the pH value of the washed copper oxide mud to be any value within the range of 41 to 6 〇❹. Acidity and alkalinity, and repeated washing. When the acidity and alkalinity of the washed copper oxide mud is more than the acidic side of 4.1, the reduction efficiency will be worse. On the other hand, the acidity and alkalinity ratio of the washed copper oxide slurry is higher than that. 6. When the ruthenium is still on the alkaline side, when the reducing agent for obtaining the copper powder is added, the powder characteristics such as an increase in the reaction change and a decrease in the dispersion property may be deteriorated. Further, it is preferable to wash the powder. The pH of the cuprous oxide mud is washed at a pH of any of the range of 4.3 to 4.7. The stability is best achieved by washing the copper oxide mud to a pH within the above range. In the washed copper oxychloride slurry obtained by the enthalpy preparation, hydrazine 2231-10013-PF 13 200932405-based reducing agent 'reduction-precipitated copper powder is added (the second reduction washing and drying of the precipitated particles, that is, obtaining copper powder, The amount of filtration, in addition to the addition of aunt + + plus hydrazine-based reducing agent 篁 添加 at the end of the addition, compared to the cleaning is preferably added 0.3 碍 $ 7 ζ h steel containing copper 1 Mohr, salinization The character spray (4) ratio ° also has the ratio of the sum of the hydrazine-based reducing agent added to copper relative to the copper i ^ 匕 copper mud. The 为 is 0.6 摩尔 to 2.0 莫 藉 联 amp amp & The addition of the stupid reducing agent, the imminent acid value is preferably adjusted to 4 > the mud of the reduction reaction to the range of 6. 还. The ratio of the base of the reaction is also 4. 1 also acid copper # H The acid in the reaction of the banquet is on the one hand, the eyebrow is on the one hand, and the 5A is the same, and the coarseness is increased by 3, and the dispersibility is deteriorated. On the other hand, the acidity and alkalinity of the reduction reaction is more than 6 · 0, and the number of particles of the precipitated particles is excessive. More than, k 'reducing agent is the same as adding hydrazine-based reducing agent (second place) to the bismuth copper salt compound loach 'Addition of the Dunton-based reducing agent (the second reduction treatment) ij of the washed copper oxide mud copper concentrate " / rose to Wii / 4, Γ is adjusted according to the amount of liquid into 1 Moer G _,, to wait To the copper powder with a narrow particle size distribution. Further, the copper excitation is preferably u Mohr / rise to 25 m / liter. Also, the temperature of the hydrazine reductant is preferably maintained at 40 degrees Celsius. A certain temperature range of 60 ° C. When the temperature of the bismuth hydride reducing agent is lower than 40 degrees Celsius, the reduction reaction will be pure, and it will not meet the industrially desirable productivity. , Department => When the temperature of the milk-based reducing agent is higher than 60 degrees Celsius, the reduction reaction will be earlier and the particle size will not be obtained. The reducing agent used in the first reduction treatment and the second reduction treatment will be treated with the same kind of hydrazine. Reductant, as a reducing agent, the reducing ability of hydrazine as a reducing agent is
2213-10013-PF 200932405 適口得到叙體特性良好的銅粉。甚至使用於銅粉還原的異 種成'刀可以被限制至报少,以抑制朝銅粉粒子表面不純物 質的混入。 還有亦可在第2還原處理結束階段的反應泥漿狀態 下’使用流體磨粉機法(細滾壓磨粉機等)、層流混合法 (T.K.FUmics等),在高速下離心流動泥漿内,粒子彼 此碰撞而粕碎,接近一次粒子,同時施加進行粒子表面平 ❿㉟化的碎粒處理,即可更進—步提升粒子分散性。 磷化合物的添加:本發明銅粉製造方法是在上述製造 法中至最後還原反應、结束為纟為使鱗與銅的莫爾比 P/Cu 0.0001 i 〇〇〇3,而將磷化合物添加至反應泥漿中。 藉由添加磷化合物,讓鱗化合物發揮立體障礙的作用,以 防止析出粒子的凝集成長,並達單分散化。此結果,所得 銅粉粒度分佈可以被大幅狹窄化。 磷化合物係以反應泥漿中磷與銅莫爾比p/Cu=o. 0001 ❹:。二003的方式’極微量地添加。為了抑制不純物含量而 得到高純度銅粉,故在製造過程中必須極力抑制添加物質 的量與種類。 但為了微粒化且不凝集,以得到微粒且粒度分佈寬度 極狹的鋼粉,磷化合物的添加是有效的。本發明者對鱗化 合物添加量最小限度全面研究的結果,係想到添加上述比 例磷化合物,為最有效果的。 在此,第1圖係繪示磷化合物添加比例與粒度分佈寬 度的相關圖。在第i圖的圖形中,横轴係為顯示碟化合物2213-10013-PF 200932405 Get a good copper powder with good character. Even the heterogeneous 'knife used for copper powder reduction can be limited to a small amount to suppress the incorporation of impurities into the surface of the copper powder particles. In the state of the reaction slurry at the end of the second reduction treatment, the fluid mill method (such as a fine-rolling mill) or a laminar flow mixing method (TKFUmics) may be used to centrifuge the fluid slurry at a high speed. The particles collide with each other and smash, close to the primary particles, and at the same time apply the granule treatment for smoothing the surface of the particles, thereby further improving the particle dispersibility. Addition of phosphorus compound: The method for producing a copper powder of the present invention is to add a phosphorus compound to the molar reduction of the scale and copper by the molar ratio P/Cu 0.0001 i 〇〇〇3 in the above-mentioned production method to the final reduction reaction. In the reaction mud. By adding a phosphorus compound, the scale compound acts as a steric hindrance to prevent the precipitation of the precipitated particles from being long and monodisperse. As a result, the obtained copper powder particle size distribution can be greatly narrowed. The phosphorus compound is obtained by reacting phosphorus and copper Mohr ratio p/Cu=o. 0001 ❹: in the reaction slurry. The method of 2,003 is added in a very small amount. In order to suppress the content of impurities, high-purity copper powder is obtained, so that the amount and type of the added substances must be suppressed as much as possible in the manufacturing process. However, the addition of a phosphorus compound is effective for the purpose of micronizing and not agglomerating to obtain fine particles of fine particles having a narrow particle size distribution. As a result of intensive investigation of the amount of scaly compound added by the inventors, it has been considered that the addition of the above-mentioned specific phosphorus compound is most effective. Here, Fig. 1 is a graph showing the correlation between the phosphorus compound addition ratio and the particle size distribution width. In the graph of the i-th graph, the horizontal axis is the display disc compound.
2213-10013-PF 15 200932405 添加比率的磷/銅,縱軸所示之銅粉粒度分佈寬度幅度的數 值,係為使用體積累積平均粒徑Ds(i及藉由雷射衍射散射式 粒度分佈測量法所測量得到的粒度分佈標準偏差S1)所得 的SD/D5。數值。2213-10013-PF 15 200932405 Adding ratio of phosphorus/copper, the value of the width of the particle size distribution of the copper powder shown on the vertical axis is the volume cumulative average particle diameter Ds (i and the measurement by the laser diffraction scattering particle size distribution) The SD/D5 obtained from the standard deviation of the particle size distribution measured by the method S1). Value.
❹ 在此,標準偏差SD是表示使用雷射衍射散射式粒度分 佈測量法所得全粒捏資料變化的指標β此數值越大,表示 變化越大。還有,標準偏差SD與體積累計平均粒徑Ds。間 的比SD/D5。係表示粒度分佈寬度的程度。此數值越大,即 表示粒度分佈寬度越廣。 由第1圖可知,從未添加磷之情形(磷/銅二。到比 磷/銅= 0.0001還少的磷添加量之情形下,SD/L值是大於 0. 55時,藉由磷而致的單分散化效果會不完全。對於此, 磷添加比例為磷/銅=0.0001以上時’ SD/Ds。值可明顯降 低。還有添加超過本發明上限磷/銅=〇〇〇3的磷量時,則 會見不到SD/D5。值變化。起因是本發明係以抑制不純物含 量得到高純度銅粉為目的,故抑制磷添加量於最小限度。 所以’填添加量上限為罐/銅=〇. 。 碟化合物添加時期可在添加聯氨系還原劑至洗淨亞氧 化銅泥漿中直到此還原反應結束為止的任一階段中添加上 述比例的碟化合物。特別是在調製洗淨亞氧化銅泥聚後添 加,因在洗淨後,磷化合物添加量即可抑制於少量之情形 下,進而抑制不純物含量。 麟化合物較佳是用以效率佳地分散鱗成分於反應泥 中的水溶性磷化合物。水溶性磷化合物較佳是使用读❹ Here, the standard deviation SD is an index β indicating the change in the whole-grain pinch data obtained by the laser diffraction scattering type particle size distribution measurement method, and the larger the value, the larger the change. Also, the standard deviation SD and the volume cumulative average particle diameter Ds. The ratio between SD/D5. It is the degree of the width of the particle size distribution. The larger the value, the wider the width of the particle size distribution. It can be seen from Fig. 1 that in the case where phosphorus is not added (phosphorus/copper two to a phosphorus addition amount less than phosphorus/copper = 0.0001, the SD/L value is greater than 0.55, by phosphorus The effect of monodispersion may be incomplete. For this reason, the ratio of phosphorus addition to phosphorus/copper = 0.0001 or more 'SD/Ds. The value can be significantly reduced. There is also added more than the upper limit of the invention phosphorus / copper = 〇〇〇 3 When the amount of phosphorus is small, the value of SD/D5 is not observed. The reason is that the present invention is aimed at suppressing the content of impurities to obtain high-purity copper powder, so that the amount of phosphorus added is suppressed to a minimum. Copper = 〇. During the addition period of the dish compound, the dish compound of the above ratio may be added in any stage until the end of the reduction reaction by adding the hydrazine-based reducing agent to the washed copper oxide slurry, especially in the preparation of the washing. The copper oxide mud is added after the polymerization, because the amount of the phosphorus compound can be suppressed in a small amount after the washing, thereby suppressing the impurity content. The lining compound is preferably used to efficiently disperse the scale component in the water in the reaction mud. Phosphorus compound. Water-soluble phosphating Was read using a preferred
2213-10013-PF 16 200932405 鈉、磷酸、次亞磷酸銨等任一種。特別是 時,較適於微粒且均一粒徑粒子的析出。-人亞磷酸銨 上述所得之銅粉,經過過遽、洗淨、乾燥等 以產品化成銅粉。還有,此銅粉, 程, 祛34^ : ~升耐氧化性,較 佳疋施加有機表面處理。表面處理劑較佳是包括 乂 的脂肪酸或胺類任一種,具體而言, .‘、、所需 议住疋油酸、麻日匕 等脂肪酸或十八烧基胺、油胺等胺類。酸^酸、 ❹ ❹ 用對應所需之分級裝置、混合機、‘ 分類機等可進行粒子彼此衝突處 機增壓 理,以提高粒子分散性。 的裝置,進行碎粒處 1本發明鋼粉:本發明銅粉係為藉由上述鋼粉製 所得的銅粉。還有,胃法 所撂夕栌接, 散射式粒度分佈測量法 所传之體積累積平均粒徑D5e為。.i微米 去 2分佈寬度幅度的魏數值係為….5二表: 使用上述銅粉製造方法可以將D“=〇 y之’ 寸的銅粉,製造成前述SD/Ds。數值為〇.U .微米尺 佈寬度較狭窄的狀態。 _ . ·的粒度分 本發明鋼粉之不足01 產生凝集。此肖m 1會伴隨者微粒化而 量m 、為抑制凝集勢必要增加碌化合物添加 電路導電的之不引起, 細微線路形成 兔路導電不良程度的低不純物战 粒徑^。是0.5微米至3.5微米。成。還有,較佳之平均 還有,在—般情況下,微粒.粉會凝集’然本發明銅粉2213-10013-PF 16 200932405 Any of sodium, phosphoric acid, ammonium hypophosphite, and the like. In particular, it is more suitable for the precipitation of particles and uniform particle size. - Human ammonium phosphite The copper powder obtained above is subjected to hydrazine, washing, drying, etc. to be converted into copper powder. Also, the copper powder, Cheng, 祛34^: ~ liter oxidation resistance, better than the application of organic surface treatment. The surface treatment agent preferably includes any of a fatty acid or an amine of hydrazine, and specifically, a fatty acid such as oleic acid or sulphate or an amine such as octadecylamine or oleylamine is required. Acid acid, ❹ ❹ With the corresponding classification device, mixer, ‘classifier, etc., the particles can be collided with each other to improve particle dispersibility. The apparatus for carrying out the granules 1 The steel powder of the present invention: The copper powder of the present invention is a copper powder obtained by the above steel powder. Further, the volumetric cumulative average particle diameter D5e transmitted by the scattering type particle size distribution measurement method is the same as that of the stomach method. The Wei value of the width of the width of the i micrometer to 2 distribution is ....5 Table 2: Using the above copper powder manufacturing method, the copper powder of D"=〇y' inch can be made into the aforementioned SD/Ds. The value is 〇. U. The narrower width of the micron rule cloth. The particle size of the steel powder of the present invention is less than 01, and the agglomeration is generated. This xiao m 1 is accompanied by micronization and the amount m is necessary to increase the compounding circuit for suppressing the agglutination potential. The conductivity does not cause, the fine circuit forms a low impurity level of the poor conductivity of the rabbit road. It is 0.5 micrometer to 3.5 micrometers. Also, preferably, on average, in the general case, the particles. Agglutination
22J3-J0013-PF 17 200932405 因有 D 5。為 〇 i 2--. — .i微未至5〇微米微粒範圍的粒徑,而為SD/D5() 粒度刀佈寬度極狹銳利的銅粉。通過上述方 式SD/Ds°疋表不銅粉粒度分佈寬度的程度。還有,SD/D50 值為〇.2至〇.5的範圍時,凝集變少。當SD/D5fl值超過〇. 5 夺粒子變化較多而不適於細微線路的形成。 還有,本發明鋼粉在大氣氣氛氣中,攝氏4〇〇度3〇分 鐘熱處理後的碳含量不足〇〇1質量百分比,碳含量極低。 本發明銅粉係施加有用以防止氧化的有機表面處 理,此表面處理劑會於攝氏200度至攝氏300度左右從銅 粉表面消失。所以攝氏400度30分鐘燒結成形後的銅粉是 處於已去除表面處理劑的狀態,在此狀態下所測量得到的 銅粉碳含量可以推定為藉由燒結成形以形成導體膜溫度下 的銅柘碳含量。還有,本說明書中所指的銅粉碳含量是使 用碳分析裝置(堀場製造公司製EMIA_32〇v)測量所得者。 本發明銅粉使用於銅膏等情形時,銅膏燒結成形時, 表面處理劑會於導體表面燒結開始溫度以前消失,故之後 在銅體表面形成燒結成形膜後,不會於導體内部發生碳酸 氣體,進而可防止導體表面爆裂的發生,以形成高品質的 導體。 、 以下’以實施例及比較力對本發明進行具體說明。本 發明並不以下述實施例為限。還有,為了比對以下實施例 及比較例2中銅粉製造條件,係將製造條件的概略揭露記 載於表1中。 2213-10013-pp 18 200932405 表1 實施例1 實施例2 比較例2 銅鹽 水溶液 純水 升 6.5 6.5 6.5 硫酸銅 克 6000 6000 6000 銅化合物 泥漿調製 氨水溶液.25 重量百分率 濃度 毫升 2537 2537 2537 液溫 攝氏度 50 50 50 添加時間 分鐘 30 30 30 第1還原 銅濃度 莫爾/升 2 2 2 還原劑 克 450 450 450 酸驗值 調整劑 毫升 591 591 590 添加時間 分鐘 30 30 30 液溫 攝氏度 45 50 50 洗淨亞氧 化銅泥漿 調製 銅濃度 莫爾/升 2 2 2 液溫 攝氏度 45 45 45 洗淨後 酸驗值 4.7 4.7 4.7 第2還原 銅濃度 莫爾/升 2 2 2 還原劑 克 1200 1200 1200 添加時間 分鐘 30 30 30 液溫 攝氏度 45 45 45 璘化合物 添加 填化合物 次亞磷酸銨 磷酸三鈉 12水和物 無 添加量 克 3. 02 11.06 添加時期 添加於洗淨 亞氧化銅泥 漿中 添加於硫酸 銅水溶液 註:還原劑:聯氨1水和物 酸鹼值調整劑:25重量百分率之氨水溶液 [實施例1] 首先,在純水6.5升中投入硫酸銅6000克並攪拌之。 之後將液溫保持於攝氏5 0度,再進一步添加水使硫酸銅水 溶液·(銅鹽水溶液)液量成為9升,並調整濃度。在前述 2213-10013-PF 19 200932405 硫酸銅水溶液中3 〇分接!i > 鐘内添加氨水溶液(濃度25重量百 分率)2537毫升谁耔由& , 升進仃中和,以得到銅鹽化合物泥漿。還有, 靜置銅鹽化合物泥难训八μ^ 7 刀鐘以使之熟成。至此將銅鹽化合 物泥聚液溫保持於摄;$ ς η & 45产 、攝氏50度,熟成後將液溫調整為攝氏 ❹ 接著,添加水使銅鹽化合物泥漿銅濃度成為2 〇莫爾/ 升’並調整液量。將此銅鹽化合物泥漿保持於酸鹼值為 6. 3、液溫為攝氏5〇度的條件下’於此時在%分鐘内連續 添加聯氨1水和物(聯氛系還原劑)似克與作為酸驗值 調整劑之氨水溶液(濃度25重量百分率)591毫升,以成 為亞氧化銅泥裝(第1還原處理)。還有,為完全進行還 原反應,係進一步繼續攪拌3〇分鐘。 之後,為了排斥洗淨,於亞氧化銅泥漿中添加純水, 將液量調整成18升後,靜置使盈氧化銅粒子沈緞,再進行 取出靜置後上澄液14升的操作’反覆進行前述動作至酸驗 值為4. 7為止。還有’添加已温之純水8升使全液量為μ 升,維持液溫於攝氏45度,調整銅濃度為2 〇莫爾/升, 以此作為洗淨亞氧化銅泥漿。 在銅濃度調整後之洗淨亞氧化銅泥衆中,添加次亞構 酸銨3. 02克,攪拌5分鐘(磷化合物添加製程)。 再添加水使洗淨亞氧化銅泥漿銅濃度成為2 〇莫爾/ 升,並調整液量。於此洗淨亞氧化銅泥漿中,分鐘内添 加聯藏1水和物(聯氨系還原劑)丨2〇〇竞。 。 任者,進一步 授拌15分鐘’完全進行還原反應以還原析出鋼粉(第2還22J3-J0013-PF 17 200932405 Because there is D 5. It is 2- i 2--. — .i micro-particle size not in the range of 5 〇 micron particles, but the SD/D5() particle size is very narrow and sharp. The degree of the particle size distribution width of the copper powder is not shown by the above method SD/Ds°. Further, when the SD/D50 value is in the range of 〇.2 to 〇.5, the aggregation is less. When the SD/D5fl value exceeds 〇. 5, the particles change more and are not suitable for the formation of fine lines. Further, the steel powder of the present invention has a carbon content of less than 质量1 mass% after heat treatment at 4 ° C for 3 Torr in an atmospheric atmosphere, and the carbon content is extremely low. The copper powder of the present invention is treated with an organic surface which is useful for preventing oxidation, and the surface treatment agent disappears from the surface of the copper powder at a temperature of from 200 ° C to about 300 ° C. Therefore, the copper powder after sintering at 400 ° C for 30 minutes is in a state where the surface treatment agent has been removed, and the carbon content of the copper powder measured in this state can be presumed to be formed by sintering to form a copper crucible at a temperature of the conductor film. Carbon content. In addition, the carbon powder content of the copper powder referred to in the present specification is measured by using a carbon analyzer (EMIA_32〇v manufactured by Horiba Manufacturing Co., Ltd.). When the copper powder of the present invention is used in a copper paste or the like, when the copper paste is sintered, the surface treatment agent disappears before the sintering start temperature of the conductor surface, so that after the sintered formed film is formed on the surface of the copper body, carbonation does not occur inside the conductor. The gas, in turn, prevents the surface of the conductor from bursting to form a high quality conductor. Hereinafter, the present invention will be specifically described by way of examples and comparative abilities. The present invention is not limited to the following embodiments. Further, in order to compare the copper powder production conditions in the following Examples and Comparative Example 2, a summary of the production conditions is shown in Table 1. 2213-10013-pp 18 200932405 Table 1 Example 1 Example 2 Comparative Example 2 Copper salt aqueous solution pure water 6.5 6.5 6.5 Copper sulfate gram 6000 6000 6000 Copper compound mud to prepare ammonia aqueous solution. 25 weight percent concentration ml 2537 2537 2537 liquid temperature Celsius 50 50 50 Add time minute 30 30 30 1st reduced copper concentration Mohr / liter 2 2 2 Reducing agent gram 450 450 450 Acid test adjuster ml 591 591 590 Add time minute 30 30 30 Liquid temperature Celsius 45 50 50 Wash Net copper oxide mud modulating copper concentration Mohr / liter 2 2 2 Liquid temperature Celsius 45 45 45 Acid value after washing 4.7 4.7 4.7 2nd reduction copper concentration Mohr / liter 2 2 2 Reducing agent 1200 1200 1200 Add time Minute 30 30 30 Liquid temperature Celsius 45 45 45 璘 Compound added compound ammonium hypophosphite trisodium phosphate 12 water and no added amount of grams 3. 02 11.06 Addition period added to the washed copper oxide slurry added to the copper sulfate aqueous solution Note: Reducing agent: hydrazine 1 water and pH adjuster: 25 weight percent aqueous ammonia solution [Example 1] First, in pure water 6000 g of copper sulfate was added in 6.5 liters and stirred. Thereafter, the liquid temperature was maintained at 50 ° C, and further water was added to adjust the concentration of the copper sulfate aqueous solution (copper brine solution) to 9 liters. 3 〇 tapping in the aforementioned 2213-10013-PF 19 200932405 copper sulfate aqueous solution! i > Add ammonia solution (concentration 25 parts by weight) to 2537 ml of the bell, and simmer it into <> Also, it is difficult to hold the copper salt compound mud for eight μ^7 knives to make it ripe. At this point, the copper salt compound mud liquid temperature is maintained at a temperature; $ ς η & 45 production, 50 degrees Celsius, after the ripening, the liquid temperature is adjusted to Celsius ❹ Next, water is added to make the copper salt compound mud copper concentration 2 〇 Moore /L' and adjust the amount of liquid. The copper salt compound slurry is maintained at a pH of 6.3, and the liquid temperature is 5 degrees Celsius. At this time, the continuous addition of hydrazine 1 water and the compound (the reducing agent) in the % minute is similar. 591 ml of an aqueous ammonia solution (concentration: 25 weight percent) as an acid tester was added to be a copper oxide mud (first reduction treatment). Further, in order to completely carry out the reduction reaction, the stirring was further continued for 3 minutes. After that, in order to repel the washing, pure water was added to the copper oxychloride slurry, and the amount of the liquid was adjusted to 18 liters, and then the copper oxide particles were allowed to stand still after being placed, and then the operation was carried out after standing and standing for 14 liters of liquid. The above-mentioned action was repeated until the acid value was 4.7. Also, add 8 liters of warm water to make the total liquid volume μ μL, maintain the liquid temperature at 45 ° C, and adjust the copper concentration to 2 〇 Mohr / liter as the washed copper oxide mud. In the washed copper oxide mud after the adjustment of the copper concentration, 3.02 g of sub-hypo-alloy was added, and the mixture was stirred for 5 minutes (phosphor compound addition process). Add water to make the copper concentration of the washed copper oxide mud 2 〇 Mohr / liter, and adjust the liquid volume. In this case, the copper oxychloride slurry is washed, and a combined water and a substance (a hydrazine-based reducing agent) 丨 2 〇〇 are added in a minute. . Anyone, further mixing for 15 minutes' complete reduction reaction to reduce precipitation of steel powder (2nd also
2213-10013-PF 20 200932405 原處理)。 ^;慮並採取已析出的銅粒子。還有’洗淨後,將此銅 各加入冷解有十八院基胺15克之甲醇溶液5升中施加有 機表面處理’過濾分離後,進行攝氏70度、5小時的加熱 乾燥,進一步施加粉碎處理,得到銅粉。 對實施例1所得之銅粉進行‘、Ds。、“、βΕτ比表面 積、塞子填充密度、碳含量等測量。還有,以所得銅粉的 BET比表面積為基準算出比表面積I”還有測量實施例ι 所得之有機表面處理後銅粉在大氣氣氛氣中、攝氏4〇〇度 30分鐘燒結成形後的碳含量。此結果如表2所示。還有, 粒度體積基準分佈圖如第2圖所示,掃晦型電子顯微鏡 (SEM)影像如第3圖所示。以下所示為個別的測量方法。2213-10013-PF 20 200932405 Original processing). ^; Consider and take out the precipitated copper particles. In addition, after the washing, the copper was added to a cold solution of 15 g of a methanol solution of 15 g of a solution of 15 g of an organic surface treatment. After filtration, the mixture was heated and dried at 70 ° C for 5 hours, and further pulverized. Processing to obtain copper powder. The copper powder obtained in Example 1 was subjected to ', Ds. , "ββτ specific surface area, plug packing density, carbon content, etc.. Further, the specific surface area I is calculated based on the BET specific surface area of the obtained copper powder, and the organic surface-treated copper powder obtained by measuring Example ι is in the atmosphere. The carbon content after sintering in the atmosphere at 4 degrees Celsius for 30 minutes. The results are shown in Table 2. Further, the particle size volume reference map is shown in Fig. 2, and the bronzing electron microscope (SEM) image is shown in Fig. 3. The individual measurement methods are shown below.
藉由雷射衍射散射式粒度分佈測量法所得之體積累計 平均粒徑I :將銅粉〇·〗克混合於SN分散劑5468之H 水溶液(sannopco股份有限公司製)中,在超音波均質(日 ❹本精機製造公司t US-300T)下分散5分鐘後,使用雷射 衍射散射式粒度分佈測量裝置Micr〇 Trac HRA 932()_χι⑽ 型(Leeds + Northrup公司製),於流量速度5〇立方公分/ 分鐘下進行測量。測量體積累計测的粒徑為Ds。,並以同 樣方式測量體積累計10%及9〇%的粒徑為Dh、L。。 塞子填充密度(TD ) ·使用粉末體_ρτ_Ε ( H〇s〇kawaVolume cumulative average particle diameter I obtained by laser diffraction scattering particle size distribution measurement method: Copper powder was mixed with H aqueous solution (manufactured by Sannopco Co., Ltd.) of SN dispersant 5468, and homogenized in ultrasonic wave ( After 5 minutes of dispersion under the Nippon Seiki Co., Ltd. t US-300T), a laser diffraction scattering particle size distribution measuring device Micr〇Trac HRA 932()_χι(10) (Leeds + Northrup) was used at a flow rate of 5 〇 cubic meters. Measurements are taken in centimeters per minute. The measured volume cumulative measured particle size is Ds. And measuring the volume cumulative 10% and 9〇% of the particle size in the same way as Dh, L. . Plug packing density (TD) · Use powder body _ρτ_Ε ( H〇s〇kawa
Micron股份有限公司製)進行測量。 比表面積:於攝氏75度下對試樣2· 00克進行1〇分鐘 脫氣處理後,使用m_sor (Quantachr〇ine工崎赚心Measurements were made by Micron Co., Ltd.). Specific surface area: 1 00 gram for 1 〇 at 75 ° C. After degassing, use m_sor (Quantachr〇ine Gongsaki earns)
2213-10013-PF 21 200932405 股份有限公司製)以BET1點法進行測量。還有比表面積 DBET是將所得銅粉假設為真球狀,使用BEn點法所測量得 到之比表面積SSA與銅真比重8. 92,並使用DBET== 6/( 8 92 xSSA)所算出。 碳含量:攝氏400度下保持3〇分鐘後的碳含量是使用 碳分析裝置(堀場製造公司製emu_32〇v)進行測量。 [實施例2 ]2213-10013-PF 21 200932405 Co., Ltd.) The measurement was performed by the BET1 point method. Further, the specific surface area DBET is assuming that the obtained copper powder is a true spherical shape, and the specific surface area SSA and the copper true specific gravity measured by the BEn point method are 8.92, and are calculated using DBET == 6/( 8 92 xSSA). Carbon content: The carbon content after holding for 3 minutes at 400 ° C was measured using a carbon analyzer (emu_32〇v manufactured by Horiba Manufacturing Co., Ltd.). [Example 2]
實施例2與實施例1相比,係為磷化合物添加時期有 差異的例子。 亦即,代替添加次亞磷酸銨至洗淨亞氧化銅泥漿,將 硫酸鋼水溶液液溫保持於攝氏5G度,除了改添加作為填化 合物之磷酸三納12水和物U肩克外,其餘以與實施例i 相同的方法得到銅粉。 關於實施例2所得之鋼粉,係測量1出與實施例i =資料。結果如表2所示。還有,粒度體積基準分佈 所示。 電子顯微鏡(SEM)影像如第5圖 L比較例1 ] 比較例1是藉由渴式還; 用右換么 ’ 原法進行銅粉的製造之際,使 用有機糸還原劑的例子。 首先’在攝氏60度純水q在 ^ Q Q ± 、 幵中添加硫酸銅5水和物 保的銅鹽水溶液。還有,在 度變為2莫.爾Λ升。又、鹽水溶液中,添加純水’使銅濃 2213-10013-pf 22 200932405 接著,將銅鹽水溶液液溫保持於 25%氫氧化納水溶液46〇 &度’依序添加 , U传鋼鹽化合物泥漿。 接者將銅鹽化合物泥难、杰 別分錢内添加聯^水和;^=持於攝氏50度,於 八鏟,★入、隹克。進一步繼續攪拌60 刀鐘凡王進仃還原反應以還原析出鋼粉。 過滤並採取前述所得的銅粉。還有,將 解有十八烷基胺1.5克tfg!# n 办 理,…5升中施加有機表面處 ©理攪拌30 7刀鐘,並進行攝氏80择 又、5小時的加教齡择 以得到粉體。關於所得銅粉k …钇屎 q仲娜扮叔體特性係測量 1相同的資料。此結果是 付』興貫施例 疋粒度刀佈為銳利的,但攝氏400 度30分燒結成形後碳含量為〇〇7重量百分率。 [比較例2 ] 比較例2於藉由渴放诱拓 、 ‘,'、A還原法進行鋼粉的製造時,並夫 添加鱗化合物。亦即,哈—a 除几全不添加磷化合物外之外, 舆實施例1相同的方法猎$丨丨無|上、 ^ 曰、 击侍到銅粉。關於所得鋼粉粉體特 性,係測量、算出得到與實施例1相η μ I w ^ 1J丄相间的資料。此結果如 表2所示。還有’比較例?餅埋 一 例2所得銅粉體積基準粒度分佈圖 如第6圖所示。 闻 [比較例3 ]。 比較例3使用專利文齡A _ 』文獻4所揭不的方法,為含銅溶液 濃度與實施例1含鋼鹽泥喈柏π .曲由 现死水相同濃度的例子。首先,混人 硫酸銅五水和物395克與钟火n fβ σ 凡”砘水0.05升,更進一步添加焦碟 酸鈉40克’以製作含銅溶液。桩 谷收接著,在此含銅溶液中,加 入》辰氣水(派度28%) 古、日人凑丨1 0」500克,混合製作得到銅氨錯離子Example 2 is an example in which the phosphorus compound addition period differs as compared with Example 1. That is, instead of adding ammonium hypophosphite to the washed copper oxide slurry, the liquid temperature of the aqueous solution of the sulfuric acid steel is maintained at 5 G Celsius, except that the addition of trisodium phosphate 12 water and U shoulder as a filling compound is added. Copper powder was obtained in the same manner as in Example i. Regarding the steel powder obtained in Example 2, it was measured 1 and the example i = data. The results are shown in Table 2. Also, the particle size volume reference distribution is shown. Electron microscopy (SEM) image as shown in Fig. 5 L Comparative Example 1] Comparative Example 1 is an example in which an organic hydrazine reducing agent was used in the production of copper powder by the method of thirst. First, add copper sulfate 5 water and a copper salt solution of the material in ^ Q Q ± , 幵 at 60 ° C pure water q. Also, the degree becomes 2 Mo. In addition, pure water is added to the brine solution to make the copper concentrate 2213-10013-pf 22 200932405. Next, the liquid temperature of the copper salt aqueous solution is maintained in a 25% aqueous solution of sodium hydroxide, 46 〇 & degree, sequentially added, U-transferred steel salt Compound mud. The receiver will add the copper salt compound to the mud, and add the water to the water. ^^ Hold at 50 degrees Celsius, in the eight shovel, ★ into, gram. Further continue to stir the 60-knife clock to reduce the precipitation of steel powder. The copper powder obtained as described above was filtered and taken. Also, the solution has octadecylamine 1.5 g tfg! # n handle, ... 5 liters of the application of the organic surface at the point of stirring 30 7 knives, and 80 degrees Celsius, 5 hours of teaching age to get Powder. Regarding the obtained copper powder k ... 钇屎 q Zhong Na's uncharacteristics are measured by the same data. The result is that the granule knives are sharp, but the carbon content after sintering at 400 ° 30 minutes is 〇〇 7 weight percent. [Comparative Example 2] In Comparative Example 2, a scaly compound was added to the production of steel powder by the thirst-trapping, ‘,', and A reduction methods. That is, the ha-a is not the same as the addition of the phosphorus compound, and the same method as in the first embodiment is used to hunt the 丨丨, ^, 击, and bake to the copper powder. Regarding the characteristics of the obtained steel powder powder, the data of the phase η μ I w ^ 1J 与 of the first embodiment was measured and calculated. The results are shown in Table 2. And 'Comparative example? The volume reference particle size distribution of the copper powder obtained in Example 2 was as shown in Fig. 6. [Comparative Example 3]. Comparative Example 3 uses the method disclosed in Patent Document A _ 』Document 4, which is an example in which the concentration of the copper-containing solution is the same as that of the steel salt of the first embodiment. First, mixed human copper sulfate pentahydrate and 395 grams and bell fire n fβ σ "when water is 0.05 liters, and further add sodium coke sodium 40 grams" to make a copper-containing solution. In the solution, add "Chenqi water (dispatch 28%). Ancient and Japanese people make 1 0" 500 grams, and mix and produce copper ammonia wrong ions.
22]3^]〇〇i3-PF 23 200932405 溶液。於此銅氨錯離子溶液中加入純水至全液量為〇, 升,以與實施例1同一銅濃度。此銅氨錯離子溶液中,於 攝氏30度的溫度下添加並混合作為還原劑的飽和水聯氨 200克後,將液溫上升至攝氏8〇度,並維持2小時,以待 反應完全進行。之後,從溶液中回收、洗淨作為金屬鋼而 得的銅粉末。 ❹ 還有,通過上述製程,於比較例3中,具磷化合物之 焦磷酸鈉在含銅溶液製作時添加,之後,進行還原反應。 關於所得銅粉粉體特性’係測量、算出得到與實施例】相 同的資料。此結果如表2所示。還有,比較例3所得銅粉 體積基準粒度分佈圖如第7圖所示,掃晦型電子顯微鏡 (SEM )影像如第8圖所示。22] 3^] 〇〇i3-PF 23 200932405 solution. Pure water was added to the copper ammonia mision solution until the total liquid amount was 〇, liter, to the same copper concentration as in Example 1. In the copper ammonia counterion solution, after adding and mixing 200 g of saturated water hydrazine as a reducing agent at a temperature of 30 ° C, the liquid temperature is raised to 8 ° C and maintained for 2 hours until the reaction is completed completely. . Thereafter, the copper powder obtained as a metal steel was recovered and washed from the solution. Further, in the above-described process, in Comparative Example 3, sodium pyrophosphate having a phosphorus compound was added during the preparation of the copper-containing solution, and then a reduction reaction was carried out. The obtained copper powder powder characteristics were measured and the same data as in the examples were obtained. The results are shown in Table 2. Further, the volume-based particle size distribution map of the copper powder obtained in Comparative Example 3 is shown in Fig. 7, and the bronzing electron microscope (SEM) image is shown in Fig. 8.
衣ZClothing Z
^---—~~~ L 99 98 * 碳含 對。以下就實施例所得之銅粉與比較例所得之鋼粉進行比^----~~~ L 99 98 * Carbon with a pair. The copper powder obtained in the examples is compared with the steel powder obtained in the comparative example.
2213-10013-PF 24 200932405 首先’於實施例中’詳見第2圖的粒度體積基準分佈 圖’粒徑1微米為頻率峰值,表示粒度分佈寬度係呈狹窄 銳利地分佈。此實施例之SD/D^、D9fl/I)l()的值均為明顯的 低。塞子填充密度(TD)所示亦為低的數值。進一步發現 產率為96%的高值。大氣氣氛氣下、攝氏4〇〇度30分鐘 燒結成形後的含碳量已然低於測量裝置可能檢測出來之下 限值0.01重量百分率的量,而為不足〇〇1重量百分率的 情形。 接者,實施例1與實施例2和比較例1相比對可發現 實施例1及實施例2的碳含量不足〇. 0i重量百分率的量, 相對於此,比較例1係為〇· 07重量百分率,碳含量較多。 使用有機還原劑的比較例1銅粉亦較本發明上述銅粉碳含 量還大。此種碳含量程度的銅粉是難以得到作為本發明目 的之微粒、導體穩定形成以提高導電性的效果。 接著,實施例2與比較例2進行對比,平均粒徑乃至 碳含量係具有同等。然而,實施例明顯的 低,到SD/D5。’可以發現有大約3成左右的顯著差異,進 而明白實施例粒度分佈寬度係狹窄的。 比較例3所得銅粉,詳見第7圖所示為銅粉的掃瞄型 電子顯微鏡(SEM)影像。大多會產生凝集。還有,對藉由 第7圖所示之掃瞄型電子顯微鏡(SEM)影像的畫面解析所 得的一次粒子的平均粒徑為2微米左右,但過度凝集,此 結果是Dsf 34.68微米左右。還有,SD/Dse較低,但如上 述說明’冑集粒子尺寸是比實施例還大得多,且難以稱為2213-10013-PF 24 200932405 First, in the embodiment, see the particle size volume reference distribution of Fig. 2 for details. The particle size of 1 μm is a frequency peak, indicating that the particle size distribution width is narrowly and sharply distributed. The values of SD/D^, D9fl/I)l() of this embodiment are all significantly lower. The plug packing density (TD) is also a low value. It was further found that the yield was a high value of 96%. Under atmospheric atmosphere, at 40 ° C for 30 minutes, the carbon content after sintering is already below the amount of 0.01 weight percent that the measuring device may detect, and is less than 重量 1 weight percent. Further, in Example 1, compared with Example 2 and Comparative Example 1, it was found that the carbon contents of Examples 1 and 2 were less than i. 0i by weight, whereas Comparative Example 1 was 〇· 07. Weight percentage, more carbon content. The copper powder of Comparative Example 1 using an organic reducing agent was also larger than the above-mentioned copper powder carbon content of the present invention. Such a copper powder having a carbon content is difficult to obtain as a particle of the present invention, and the conductor is stably formed to improve conductivity. Next, in Example 2, in comparison with Comparative Example 2, the average particle diameter and even the carbon content were equivalent. However, the embodiment is significantly lower, to SD/D5. It can be found that there is a significant difference of about 30%, and it is understood that the width distribution of the embodiment is narrow. The copper powder obtained in Comparative Example 3 is shown in Fig. 7 as a scanning electron microscope (SEM) image of copper powder. Most will produce agglutination. Further, the average particle diameter of the primary particles obtained by the analysis of the scanning electron microscope (SEM) image shown in Fig. 7 was about 2 μm, but excessive aggregation was observed, and as a result, Dsf was about 34.68 μm. Also, SD/Dse is low, but as explained above, the size of the collected particles is much larger than that of the embodiment, and it is difficult to call
2213-10013-PF 25 200932405 乍為微粒銅粉的粒度分佈。所以含有报多粗粒而不適 於細微線路的你士 . 元成。還有產率也明顯地比實施例還差。亦 即,在比較例3的方法中,此粒度分佈難以高產率製造粒 度分佈銳利的微粒銅粉。 [產業上利用可能性] 本發明銅粉製造方法可以使粒子均一化,以製造出不 純物遠比習知產品還少的銅粉。而且所得的銅粉係使用作 為以網版印刷法的導體形成用材料,且可以防止細微線路 的形成不良,且可能作為電穩定性佳的導體形成。所以本 發明銅粉適於作為細微線路的形成材料。 【圖式簡單説明】 第1圖係繪示本發明銅粉製造方法中磷化合物添加量 與粒度分佈寬度的關係圖。 第2圖係緣示實施例1所得的銅粉粒度體積基準分佈 圖。 〇 第3圖係緣示實施例1所得銅粉的SEM圖。 第4圖係繪示實施例2所得的銅粉粒度體積基準分佈 圖。 第5圖係繪不實施例2所得銅粉的sem圖。 第6圖係繪示比較例2所得的銅粉粒度體積基準分佈 圖。 第7圖係繪示比較例3所得的鋼粉粒度體積基準分佈 圖〇 * 22m〇〇i3:PF 26 200932405 第8圖係繪示比較例3所得銅粉的SEM 【主要元件符號說明】 無2213-10013-PF 25 200932405 乍 is the particle size distribution of the particulate copper powder. Therefore, you are included in the report that you have a lot of coarse grains and are not suitable for the fine lines. Yuan Cheng. Also, the yield was significantly worse than the examples. That is, in the method of Comparative Example 3, it was difficult to produce a fine particle copper powder having a sharp particle size distribution in a high yield in this particle size distribution. [Industrial Applicability] The copper powder producing method of the present invention can homogenize particles to produce copper powder having less impurities than conventional products. Further, the obtained copper powder is used as a material for forming a conductor by a screen printing method, and it is possible to prevent formation of fine lines and to form a conductor having excellent electrical stability. Therefore, the copper powder of the present invention is suitable as a material for forming fine lines. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a graph showing the relationship between the amount of phosphorus compound added and the particle size distribution width in the method for producing copper powder of the present invention. Fig. 2 is a graph showing the particle size distribution of the copper powder obtained in Example 1. 〇 Fig. 3 is an SEM image showing the copper powder obtained in Example 1. Fig. 4 is a graph showing the particle size distribution of the copper powder obtained in Example 2. Fig. 5 is a sem diagram showing the copper powder obtained in the second embodiment. Fig. 6 is a graph showing the particle size volume reference distribution of the copper powder obtained in Comparative Example 2. Fig. 7 is a graph showing the particle size distribution of the steel powder obtained in Comparative Example 3. Fig. 〇 * 22m〇〇i3: PF 26 200932405 Fig. 8 shows the SEM of the copper powder obtained in Comparative Example 3 [Explanation of main component symbols]
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| KR (1) | KR101510369B1 (en) |
| CN (1) | CN101801568B (en) |
| TW (1) | TWI455777B (en) |
| WO (1) | WO2009038207A1 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| TWI659114B (en) * | 2014-10-03 | 2019-05-11 | Mitsui Mining & Smelting Company, Ltd. | Copper powder |
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| JP5759688B2 (en) * | 2010-08-17 | 2015-08-05 | 三井金属鉱業株式会社 | Flat copper particles |
| JP5820202B2 (en) * | 2010-09-30 | 2015-11-24 | Dowaエレクトロニクス株式会社 | Copper powder for conductive paste and method for producing the same |
| TWI487581B (en) * | 2010-11-12 | 2015-06-11 | Mitsui Mining & Smelting Co | Low carbon copper particles and methods for producing the same |
| KR101239391B1 (en) * | 2011-01-05 | 2013-03-05 | 한국지질자원연구원 | Method of manufacturing fine cupper powders for electronic materials with easily size control |
| JP5120477B2 (en) * | 2011-04-07 | 2013-01-16 | 日立化成工業株式会社 | Electrode paste composition and solar cell |
| JP5785433B2 (en) * | 2011-04-28 | 2015-09-30 | 三井金属鉱業株式会社 | Low carbon copper particles |
| US9221979B2 (en) | 2011-05-18 | 2015-12-29 | Toda Kogyo Corporation | Copper particles, copper paste, process for producing conductive coating film, and conductive coating film |
| JP6199430B2 (en) * | 2011-09-30 | 2017-09-20 | Dowaエレクトロニクス株式会社 | Cuprous oxide powder and method for producing the same |
| JP5872063B2 (en) * | 2012-11-26 | 2016-03-01 | 三井金属鉱業株式会社 | Copper powder |
| JP5700864B2 (en) * | 2013-05-15 | 2015-04-15 | 石原ケミカル株式会社 | Copper fine particle dispersion, conductive film forming method, and circuit board |
| JP6698367B2 (en) * | 2015-03-31 | 2020-05-27 | 山陽特殊製鋼株式会社 | Metal powder consisting of spherical particles |
| JP6256616B2 (en) * | 2015-04-22 | 2018-01-10 | 日立金属株式会社 | Metal particles and production method thereof, coated metal particles, metal powder |
| CN107921532B (en) * | 2015-09-03 | 2020-05-08 | 同和电子科技有限公司 | Phosphorus-containing copper powder and method for producing the same |
| JP2017179428A (en) * | 2016-03-29 | 2017-10-05 | Dowaエレクトロニクス株式会社 | Conductive material, method for forming conductive film, circuit board, semiconductor device, and method for manufacturing semiconductor device |
| US9975110B1 (en) | 2016-11-23 | 2018-05-22 | Honda Motor Co., Ltd. | Method for producing metal catalyst nanoparticles |
| CN108526490B (en) * | 2018-05-14 | 2021-05-25 | 六盘水中联工贸实业有限公司 | Method for producing copper metal powder by using copper chloride or cuprous chloride |
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| CN110773177B (en) * | 2019-09-10 | 2022-05-20 | 安徽德诠新材料科技有限公司 | Preparation method of ternary copper catalyst with high specific surface area |
| JP6704083B1 (en) * | 2019-11-22 | 2020-06-03 | 東邦チタニウム株式会社 | Copper powder and its manufacturing method |
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| EP4410744A4 (en) * | 2021-09-27 | 2025-09-03 | Ube Mat Ind Ltd | Magnesium oxide powder, vulcanizing composition for rubber, rubber composition, process for producing magnesium oxide powder |
| CN116809921A (en) * | 2023-07-11 | 2023-09-29 | 嘉兴饶稷科技有限公司 | A highly photosensitive active slurry for pure copper photo-curing 3D printing and its preparation method |
| WO2025070075A1 (en) * | 2023-09-28 | 2025-04-03 | 古河ケミカルズ株式会社 | Copper powder and conductive paste |
| WO2025070074A1 (en) * | 2023-09-28 | 2025-04-03 | 古河ケミカルズ株式会社 | Method for producing copper powder and method for producing conductive paste |
| CN117259780A (en) * | 2023-10-26 | 2023-12-22 | 有研纳微新材料(北京)有限公司 | Preparation method of polyhedral submicron copper powder |
| CN118513560B (en) * | 2024-05-22 | 2025-02-18 | 厦门紫金新能源新材料科技有限公司 | Preparation method of superfine narrow-granularity high-density copper powder |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6299406A (en) * | 1985-10-28 | 1987-05-08 | Mitsui Mining & Smelting Co Ltd | Production of copper powder |
| JP3570591B2 (en) * | 1996-03-22 | 2004-09-29 | 株式会社村田製作所 | Production method of copper powder |
| CN1060108C (en) * | 1997-01-21 | 2001-01-03 | 北京化工大学 | Method for preparing superfine copper powder |
| JP2911429B2 (en) * | 1997-06-04 | 1999-06-23 | 三井金属鉱業株式会社 | Production method of copper fine powder |
| JP3635451B2 (en) * | 1998-09-11 | 2005-04-06 | 株式会社村田製作所 | Metal powder, method for producing the same, and conductive paste |
| KR100743844B1 (en) * | 1999-12-01 | 2007-08-02 | 도와 마이닝 가부시끼가이샤 | Copper powder and process for producing copper powder |
| JP2002363618A (en) * | 2001-06-11 | 2002-12-18 | Sumitomo Electric Ind Ltd | Copper ultrafine particles and method for producing the same |
| JP4868716B2 (en) * | 2004-04-28 | 2012-02-01 | 三井金属鉱業株式会社 | Flake copper powder and conductive paste |
| JP4879473B2 (en) * | 2004-10-25 | 2012-02-22 | 三井金属鉱業株式会社 | Flake copper powder, method for producing flake copper powder, and conductive slurry containing flake copper powder |
| JP4662760B2 (en) * | 2004-12-22 | 2011-03-30 | 三井金属鉱業株式会社 | Ultrafine copper powder, ultrafine copper powder slurry, and method for producing ultrafine copper powder slurry |
| JP4651533B2 (en) * | 2005-12-26 | 2011-03-16 | 三井金属鉱業株式会社 | Method for producing copper particles |
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2007
- 2007-09-21 JP JP2007246083A patent/JP5392884B2/en active Active
-
2008
- 2008-09-19 TW TW097136051A patent/TWI455777B/en active
- 2008-09-22 CN CN2008801074240A patent/CN101801568B/en not_active Expired - Fee Related
- 2008-09-22 WO PCT/JP2008/067078 patent/WO2009038207A1/en not_active Ceased
- 2008-09-22 KR KR20107004861A patent/KR101510369B1/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI659114B (en) * | 2014-10-03 | 2019-05-11 | Mitsui Mining & Smelting Company, Ltd. | Copper powder |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2009038207A1 (en) | 2009-03-26 |
| CN101801568B (en) | 2012-10-03 |
| KR20100071970A (en) | 2010-06-29 |
| TWI455777B (en) | 2014-10-11 |
| CN101801568A (en) | 2010-08-11 |
| JP5392884B2 (en) | 2014-01-22 |
| JP2009074152A (en) | 2009-04-09 |
| KR101510369B1 (en) | 2015-04-06 |
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