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WO2025070075A1 - Copper powder and conductive paste - Google Patents

Copper powder and conductive paste Download PDF

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Publication number
WO2025070075A1
WO2025070075A1 PCT/JP2024/032598 JP2024032598W WO2025070075A1 WO 2025070075 A1 WO2025070075 A1 WO 2025070075A1 JP 2024032598 W JP2024032598 W JP 2024032598W WO 2025070075 A1 WO2025070075 A1 WO 2025070075A1
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WO
WIPO (PCT)
Prior art keywords
copper powder
less
particle size
size distribution
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/JP2024/032598
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French (fr)
Japanese (ja)
Inventor
聡志 滝口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Chemicals Co Ltd
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Furukawa Chemicals Co Ltd
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Publication of WO2025070075A1 publication Critical patent/WO2025070075A1/en
Pending legal-status Critical Current
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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/05Metallic powder characterised by the size or surface area of the particles
    • B22F1/052Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/10Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
    • B22F1/102Metallic powder coated with organic material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/10Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
    • B22F1/107Metallic powder containing lubricating or binding agents; Metallic powder containing organic material containing organic material comprising solvents, e.g. for slip casting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • B22F9/16Making metallic powder or suspensions thereof using chemical processes
    • B22F9/18Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
    • B22F9/24Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys

Definitions

  • the present invention relates to copper powder and conductive paste.
  • copper powder has been used as a raw material for conductive pastes used to form wiring on printed wiring boards.
  • the wiring has become thinner, and there is a demand for copper powder for conductive pastes that can accommodate thinner wiring.
  • Patent Document 1 discloses a copper powder consisting of copper particles coated with a collagen peptide, in which the average particle diameter D SEM , which is the circle-equivalent diameter of primary particles determined from an SEM image, is 0.1 to 1.0 ⁇ m, and the carbon content in the powder is 0.10 to 0.50 mass %. Furthermore, Patent Document 1 describes that the invention described in Patent Document 1 makes it possible to provide copper powder of relatively fine size, with an average primary particle diameter of 1 ⁇ m or less, at which sintering occurs at a high temperature.
  • D SEM the average particle diameter of primary particles determined from an SEM image
  • the present invention provides copper powder with improved packing properties.
  • D BET /D 50 calculated from a particle diameter D 50 at a cumulative frequency of 50% in a volume-based cumulative frequency distribution curve measured using a laser diffraction scattering type particle size distribution measurement device and a particle diameter D BET calculated from a specific surface area s by a nitrogen adsorption method is 0.70 or more and 1.20 or less;
  • SD/MV coefficient of variation
  • the present invention makes it possible to provide copper powder with improved packing properties.
  • the copper powder of this embodiment has a D BET /D 50 ratio of 0.70 or more and 1.20 or less, calculated from a particle diameter D 50 at a cumulative frequency of 50% in a volume-based cumulative frequency distribution curve measured using a laser diffraction scattering type particle size distribution measurement device and a particle diameter D BET calculated from a specific surface area s by a nitrogen adsorption method, and has a coefficient of variation ( SD /MV) of 0.50 or less, calculated from a volume average diameter MV and a standard deviation SD of the particle size distribution measured by a laser diffraction scattering type particle size distribution measurement method.
  • SD /MV coefficient of variation
  • the D BET /D 50 and the coefficient of variation (SD/MV) are each in a certain numerical range, thereby improving the dispersibility of the primary particles of the copper powder and narrowing the particle size distribution of the copper powder, which is believed to improve the particle packing.
  • the D BET /D 50 of the copper powder of this embodiment is preferably 0.70 or more, more preferably 0.75 or more, even more preferably 0.78 or more, even more preferably 0.80 or more, and is preferably 1.20 or less, more preferably 1.10 or less, even more preferably 1.00 or less.
  • the D BET /D 50 of the copper powder of this embodiment is preferably 0.70 or more and 1.20 or less, more preferably 0.75 or more and 1.20 or less, even more preferably 0.78 or more and 1.10 or less, and still more preferably 0.80 or more and 1.00 or less.
  • the particle diameter D BET of the copper powder of this embodiment can be calculated by the following formula (1).
  • D BET 6/( ⁇ s) (1)
  • is the density of the copper powder (8.96 g/cm 3 )
  • s is the specific surface area of the copper powder measured by the nitrogen adsorption method.
  • the coefficient of variation (SD/MV) of the copper powder of this embodiment is, for example, 0.01 or more, and preferably 0.50 or less, more preferably 0.45 or less, even more preferably 0.40 or less, and even more preferably 0.35 or less.
  • the above-mentioned coefficient of variation (SD/MV) of the copper powder of this embodiment is preferably 0.01 or more and 0.50 or less, more preferably 0.01 or more and 0.45 or less, even more preferably 0.01 or more and 0.40 or less, and even more preferably 0.01 or more and 0.35 or less.
  • the D50 of the copper powder of this embodiment is preferably 0.1 ⁇ m or more, more preferably 0.5 ⁇ m or more, even more preferably 1.0 ⁇ m or more, and even more preferably 1.4 ⁇ m or more, and is preferably 5.0 ⁇ m or less, more preferably 4.7 ⁇ m or less, even more preferably 4.5 ⁇ m or less, and even more preferably 4.3 ⁇ m or less.
  • the D50 of the copper powder of this embodiment is preferably 0.1 ⁇ m or more and 5.0 ⁇ m or less, more preferably 0.5 ⁇ m or more and 4.7 ⁇ m or less, even more preferably 1.0 ⁇ m or more and 4.5 ⁇ m or less, and even more preferably 1.4 ⁇ m or more and 4.3 ⁇ m or less.
  • the D BET of the copper powder of this embodiment is preferably 0.1 ⁇ m or more, more preferably 0.5 ⁇ m or more, even more preferably 1.0 ⁇ m or more, and is preferably 5.0 ⁇ m or less, more preferably 4.5 ⁇ m or less. From the viewpoint of improving handleability and dispersibility, the D BET of the copper powder of this embodiment is preferably 0.1 ⁇ m or more and 5.0 ⁇ m or less, more preferably 0.5 ⁇ m or more and 5.0 ⁇ m or less, and even more preferably 1.0 ⁇ m or more and 4.5 ⁇ m or less.
  • the amount of residual chlorine quantified by the chemical analysis method of the copper powder of this embodiment is preferably 50 ppm or less, more preferably 10 ppm or less, even more preferably 1 ppm or less, even more preferably 0.1 ppm or less, and even more preferably 0.01 ppm or less. This prevents problems caused by residual chlorine, such as corrosion.
  • the uses of the copper powder of this embodiment are not particularly limited, but because the copper powder of this embodiment has improved dispersibility and a narrow particle size distribution, it is suitable for use as a raw material for conductive pastes.
  • the method for producing copper powder in this embodiment is not particularly limited, but from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder, it is preferable that the method includes step A of obtaining copper powder from a copper(I) compound and step B of treating the surface of the copper powder with a fatty acid salt.
  • Step A is a step of obtaining copper powder from a copper(I) compound.
  • the specific method of step A is not particularly limited, but from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder, it is preferable to obtain the copper powder from a slurry A containing a copper(I) compound and polyvinyl alcohol.
  • the dispersion medium used in slurry A is not particularly limited, and any dispersion medium commonly used in slurry preparation, such as water or a hydrophilic dispersion medium, can be used. In addition, a mixture of multiple types of dispersion medium can be used.
  • Hydrophilic dispersion media include, for example, polyhydric alcohols such as alkanediols such as ethylene glycol and propylene glycol, and glycerin; lower alcohols such as sugar alcohols, ethanol, methanol, butanol, propanol, and isopropanol; ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, ethylene glycol monomethyl ether acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, ethylene glycol mono-iso-propyl ether, diethylene glycol mono-iso-propyl ether, ethylene glycol mono-n-butyl ether, ethylene glycol mono-t-butyl ether, diethylene glycol Examples of the glycol ethers include ethylene glycol mono-t-butyl ether, triethylene glycol monoethyl
  • the content of the copper (I) compound in the slurry A is not particularly limited, and is, for example, 1% by mass or more and 25% by mass or less.
  • the copper (I) compound is not particularly limited as long as it is a compound containing monovalent copper, and may, for example, contain one or more compounds selected from the group consisting of cuprous oxide, copper chloride, copper bromide, and copper iodide, and preferably contains cuprous oxide.
  • the content of the polyvinyl alcohol in slurry A is not particularly limited, but from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder, the content is preferably 0.01 parts by mass or more, more preferably 0.05 parts by mass or more, and even more preferably 0.1 parts by mass or more, relative to 100 parts by mass of the copper(I) compound, and may be, for example, 5 parts by mass or less, 2 parts by mass or less, or 1 part by mass or less.
  • the content of the polyvinyl alcohol in slurry A is preferably from 0.01 to 5 parts by mass, more preferably from 0.05 to 2 parts by mass, and even more preferably from 0.1 to 1 part by mass, relative to 100 parts by mass of the copper (I) compound, from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder.
  • the degree of saponification of polyvinyl alcohol is not particularly limited, but from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder, it is preferably 70 mol% or more, more preferably 75 mol% or more, even more preferably 80 mol% or more, and even more preferably 85 mol% or more, and may be, for example, 100 mol% or less, for example, 95 mol% or less, or for example, 90 mol% or less.
  • the degree of saponification of the polyvinyl alcohol is preferably 70 mol% or more and 100 mol% or less, more preferably 75 mol% or more and 100 mol% or less, even more preferably 80 mol% or more and 95 mol% or less, and even more preferably 85 mol% or more and 90 mol% or less.
  • the viscosity of the polyvinyl alcohol is not particularly limited, but from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder, the viscosity of a 4% aqueous solution measured at 20°C using a Brookfield rotational viscometer in accordance with JIS K6726:1994 is, for example, 0.1 mPa ⁇ s or more, preferably 1 mPa ⁇ s or more, more preferably 4 mPa ⁇ s or more, and may be, for example, 100 mPa ⁇ s or less, for example, 50 mPa ⁇ s or less, or for example, 10 mPa ⁇ s or less.
  • the viscosity of a 4% aqueous solution of the polyvinyl alcohol of this embodiment is, from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and from the viewpoint of further narrowing the particle size distribution of the copper powder, for example, from 0.1 mPa ⁇ s to 100 mPa ⁇ s, preferably from 1 mPa ⁇ s to 50 mPa ⁇ s, and more preferably from 4 mPa ⁇ s to 10 mPa ⁇ s.
  • the type of reaction that produces the copper powder in step A is not particularly limited, but for example, the copper powder can be produced by disproportionating the copper(I) compound.
  • the copper powder of this embodiment is preferably obtained by a disproportionation reaction.
  • the components contained in slurry A are not particularly limited, but from the viewpoint of promoting the reaction in the reaction vessel, it preferably contains an acid, more preferably contains one or more selected from the group consisting of hydrochloric acid, nitric acid, and sulfuric acid, and even more preferably contains sulfuric acid.
  • the acid in slurry A may be in the form of a copper salt (copper hydrochloride, copper nitrate, copper sulfate, etc.) during the disproportionation reaction of the copper (I) compound.
  • the particle size of the copper powder can be adjusted by adjusting the rate at which the acid is supplied to the reaction vessel. For example, the particle size of the copper powder tends to increase when the acid supply rate is reduced.
  • the pH in the reaction tank in step A is not particularly limited, but is, for example, 0.1 or more, may be 0.5 or more, or may be 1 or more, and from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder, it is preferably 7 or less, more preferably 6 or less, even more preferably 5 or less, and even more preferably 2.5 or less.
  • the pH in the reaction tank in step A of this embodiment is preferably 0.1 or more and 7 or less, more preferably 0.1 or more and 6 or less, even more preferably 0.5 or more and 5 or less, and even more preferably 1 or more and 2.5 or less, from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder.
  • the pH in the reaction tank in step A is the pH of the slurry in the reaction tank when step A is completed.
  • the temperature in the reaction tank in step A is not particularly limited, but may be, for example, 5°C or higher, or may be, for example, 10°C or higher, and from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder, it is preferably 90°C or lower, more preferably 80°C or lower, and even more preferably 70°C or lower, and may be 60°C or lower, 50°C or lower, 40°C or lower, 30°C or lower, 20°C or lower, or 15°C or lower.
  • the temperature in the reaction tank in step A of this embodiment is preferably 5° C. or higher and 90° C. or lower, more preferably 5° C. or higher and 80° C.
  • the temperature in the reaction tank in step A is the temperature of the slurry in the reaction tank.
  • the particle size of the copper powder can be adjusted by adjusting the temperature in the reaction tank. For example, when the temperature in the reaction tank is increased, the particle size of the copper powder tends to increase.
  • Step B the surface of the copper powder is treated with a fatty acid salt.
  • Step B includes, for example, a dispersing step of attaching a fatty acid salt to the surface of the copper powder and dispersing the copper powder, and a coating step of forming a coating of a fatty acid on the surface of the copper powder.
  • the copper powder of this embodiment preferably includes a fatty acid coating on the surface.
  • fatty acid salts include alkali metal salts of fatty acids having 8 to 20 carbon atoms. More specifically, examples of fatty acid salts include linear or branched fatty acids having 8 to 20 carbon atoms, such as linear fatty acids such as octanoic acid having 8 carbon atoms, nonanoic acid having 9 carbon atoms, decanoic acid having 10 carbon atoms, dodecanoic acid having 12 carbon atoms, tetradecanoic acid having 14 carbon atoms, pentadecanoic acid having 15 carbon atoms, hexadecanoic acid (palmitic acid) having 16 carbon atoms, heptadecanoic acid having 17 carbon atoms, octadecanoic acid (stearic acid) having 18 carbon atoms, and eicosanoic acid having 20 carbon atoms, as well as alkali metal salts of branched fatty acids such as oleic acid, linoleic acid, and
  • the amount of fatty acid salt added is preferably 0.05% by mass or more and 5% by mass or less based on the total amount of copper powder (dry state).
  • the pH in the reaction tank in the dispersion step is not particularly limited, but from the viewpoint of facilitating dissolution of the fatty acid salt, it is preferably 9 or more, more preferably 10 or more, and is, for example, 11 or less.
  • the pH in the reaction tank in the dispersion step of this embodiment is preferably 9 or more and 11 or less, more preferably 10 or more and 11 or less, from the viewpoint of facilitating dissolution of the fatty acid salt.
  • the fatty acid salt it is preferable to add the fatty acid salt to the reaction tank and then allow it to age.
  • the aging time is preferably 5 minutes or more and 60 minutes or less.
  • the inside of the reaction vessel is neutralized with an acid, and a fatty acid coating is formed on the surface of the copper powder using the fatty acid.
  • the type of acid is not particularly limited, and may be a strong acid such as hydrochloric acid, sulfuric acid, or nitric acid, or may be a weak acid. From the following viewpoint, it is preferable to use a weak acid as the acid for neutralizing the inside of the reaction vessel in the coating formation step. By using a weak acid, a fatty acid coating can be formed more uniformly, and aggregation of the obtained copper microparticles can be suppressed.
  • the fatty acid coating can increase the hydrophobicity of the obtained copper microparticles, and the settling rate of the copper microparticles can be increased in the washing step described below, thereby improving productivity.
  • a fatty acid coating can be formed uniformly on the copper powder, making it difficult for the copper microparticles to aggregate with each other, and copper microparticles with fewer aggregated particles can be obtained.
  • the type of weak acid used for neutralization is not particularly limited, and examples thereof include one or more acids selected from citric acid, ascorbic acid, and acetic acid.
  • the ageing time is preferably 5 minutes or more and 60 minutes or less.
  • the method for producing copper powder according to the present embodiment may include steps other than steps A and B described above.
  • the method for producing copper powder according to this embodiment may further include a step of washing the copper powder.
  • the washing method is not particularly limited, and can be performed, for example, by adding water and stirring.
  • the method for producing copper powder according to this embodiment may further include a step of selecting the copper powder or intermediate.
  • the selection of the copper powder or intermediate may be performed, for example, using a sieve, and by using a sieve of a specific size, it is possible to select those with particle sizes in a specific range. This step may be performed at the slurry stage, or after drying to produce a powder state.
  • the method for producing copper powder according to this embodiment may further include step C of drying the copper powder.
  • the method for drying the copper powder is not particularly limited, and the copper powder can be dried, for example, by dehydrating the powder by centrifugation, followed by heating and drying in a dryer or the like.
  • the method for producing copper powder according to this embodiment may further include a step of crushing the copper powder or the intermediate.
  • the copper powder or the intermediate can be crushed by a known crusher. There are no particular limitations on the type of crusher, and any type can be used, such as a high-speed rotary mill, a hammer mill, or an atomizer.
  • the conductive paste of this embodiment contains the above-mentioned copper powder, a resin, and a solvent.
  • the copper powder of this embodiment has improved dispersibility and a narrow particle size distribution, making it easy to design a paste that is highly reproducible and stable.
  • the resin used in the conductive paste of this embodiment is not particularly limited, and any known raw material for conductive pastes can be used as appropriate.
  • cellulose-based resins such as ethyl cellulose can be used, which are added as an organic vehicle dissolved in an organic solvent such as terpineol.
  • the amount of resin added must be kept to a level that does not inhibit sintering. For this reason, the amount of resin added is preferably 5% by mass or less of the entire conductive paste, and more preferably 2% by mass or less.
  • the solvent used in the conductive paste of this embodiment is not particularly limited, and any known raw material for conductive pastes can be used as appropriate.
  • ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, glycerin, terpineol, triethanol, and amines are preferably used.
  • amines are preferred because they have reducing ability and have the effect of locally creating a reducing atmosphere on the paste surface during firing.
  • water is used as the solvent, the amount of organic solvents that are harmful to the human body can be reduced, thereby increasing the utility value of the copper paste.
  • the amount of solvent is not particularly limited, but may be appropriately adjusted in consideration of the dispersibility and particle size distribution of the copper powder so as to obtain a viscosity suitable for a conductive film formation method such as screen printing or inkjet printing.
  • a laser diffraction scattering type particle size distribution analyzer (Microtrac Bell, model name: MT3300EX II) was used to obtain the particle diameter D50 of the copper powder when the cumulative frequency was 50% in the volume-based cumulative frequency distribution curve, the standard deviation SD of the particle size distribution, and the volume average diameter MV.
  • the measurement sample was a dispersion in which dry copper powder obtained by the method described below was dispersed in water or an alcohol solvent such as ethanol. The results are shown in Table 1.
  • the tap density of the copper powder was measured in accordance with the metal powder tap density measurement method specified in JIS Z2512:2012. The results are shown in Table 1.
  • Example 1 A reaction tank was charged with 5,600 g of ion-exchanged water, 1.6 g of polyvinyl alcohol (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., product name: GOHSENOL GL-05, degree of saponification: 86.5 to 89.0 mol%, viscosity (4% aqueous solution, 20° C.) 4.8 to 5.8 mPa ⁇ s), and 800 g of cuprous oxide (manufactured by Furukawa Chemicals Corporation, product name: cuprous oxide), and the mixture was stirred.
  • polyvinyl alcohol manufactured by Nippon Synthetic Chemical Industry Co., Ltd., product name: GOHSENOL GL-05, degree of saponification: 86.5 to 89.0 mol%, viscosity (4% aqueous solution, 20° C.) 4.8 to 5.8 mPa ⁇ s
  • cuprous oxide manufactured by Furukawa Chemicals Corporation, product name: cuprous oxide
  • Step B> The resulting slurry containing copper powder was adjusted to a copper concentration of 100 g/L and stirred. Then, sodium carbonate was added to the reaction vessel so that the pH value in the reaction vessel was 10.0 to 10.5. Next, sodium stearate was added to the reaction vessel in an amount of 0.2% by mass based on the copper powder, the reaction vessel was heated to 60° C., and the mixture was stirred for 15 minutes. Next, a neutralizing agent (ascorbic acid) was added to the reaction vessel so that the pH in the reaction vessel was adjusted to 7.5, and the mixture was stirred for 15 minutes.
  • a neutralizing agent ascorbic acid
  • Example 2 Dry copper powder was obtained under the same conditions as in Example 1, except that in step A, the temperature in the reaction vessel was increased and the average addition time per gram of the 20% aqueous sulfuric acid solution was shortened.
  • step A dry copper powder was obtained under the same conditions as in Example 2, except that the temperature inside the reaction vessel was increased.
  • Example 1 Dry copper powder was obtained under the same conditions as in Example 1, except that in step A, 8.0 g of polyvinylpyrrolidone was used instead of polyvinyl alcohol, and the average addition time per gram of the 20% aqueous sulfuric acid solution was shortened.
  • Example 2 Dry copper powder was obtained under the same conditions as in Example 1, except that in step A, 8.0 g of a polycarboxylic acid resin (manufactured by Nippon Shokubai Co., Ltd., product name: PM-103) was used instead of polyvinyl alcohol, and the average addition time per gram of the 20% aqueous sulfuric acid solution was shortened.
  • a polycarboxylic acid resin manufactured by Nippon Shokubai Co., Ltd., product name: PM-103
  • the copper powder of the example had a higher tap density than the copper powder of the comparative example, which shows that the copper powder of the present embodiment has improved packing properties.
  • the copper powder of this embodiment has improved packing properties and is therefore considered suitable for use in conductive pastes.

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Powder Metallurgy (AREA)
  • Conductive Materials (AREA)

Abstract

In the copper powder according to the present invention: the ratio DBET/D50 obtained from the particle diameter D50 when the cumulative frequency in a cumulative frequency distribution curve based on volume measured using a laser diffraction/scattering type particle size distribution measurement device is 50%, and the particle diameter DBET calculated from a specific surface area s by a nitrogen adsorption method, is 0.70-1.20; and the coefficient of variation (SD/MV) obtained from the volume average diameter MV and a standard deviation SD of a particle size distribution measured by a laser diffraction/scattering type particle size distribution measurement method is 0.50 or less.

Description

銅粉および導電性ペーストCopper Powder and Conductive Paste

 本発明は、銅粉および導電性ペーストに関する。 The present invention relates to copper powder and conductive paste.

 従来、銅粉はプリント配線板への配線形成に用いられる導電性ペーストの原料などに利用されてきた。そして、近年のプリント配線板の小型化に伴う配線の細線化を受けて、細線化に対応可能な導電性ペースト向けの銅粉が求められている。  Conventionally, copper powder has been used as a raw material for conductive pastes used to form wiring on printed wiring boards. However, in recent years, as printed wiring boards have become smaller, the wiring has become thinner, and there is a demand for copper powder for conductive pastes that can accommodate thinner wiring.

 特許文献1には、コラーゲンペプチドで被覆された銅粒子からなる銅粉であって、SEM画像から求まる一次粒子の円相当径による平均粒子径DSEMが0.1~1.0μmであり、粉体中に占める炭素の含有量が0.10~0.50質量%である銅粉が開示されている。
 また、特許文献1には、特許文献1に記載された発明によれば、一次粒子の平均粒子径が1μm以下の比較的微細サイズの銅粉において、焼結が生じる温度の高いものが提供可能であると記載されている。
Patent Document 1 discloses a copper powder consisting of copper particles coated with a collagen peptide, in which the average particle diameter D SEM , which is the circle-equivalent diameter of primary particles determined from an SEM image, is 0.1 to 1.0 μm, and the carbon content in the powder is 0.10 to 0.50 mass %.
Furthermore, Patent Document 1 describes that the invention described in Patent Document 1 makes it possible to provide copper powder of relatively fine size, with an average primary particle diameter of 1 μm or less, at which sintering occurs at a high temperature.

特開2016-191112号公報JP 2016-191112 A

 本発明は、充填性が向上した銅粉を提供するものである。 The present invention provides copper powder with improved packing properties.

 すなわち、本発明によれば、以下に示す銅粉および導電性ペーストが提供される。
1. レーザー回折散乱式粒度分布測定装置を用いて測定された体積基準の累積度数分布曲線において累積度数が50%であるときの粒子径D50と、窒素吸着法による比表面積sから算出した粒子径DBETと、から得られるDBET/D50が0.70以上1.20以下であり、
 レーザー回折散乱式粒度分布測定法により測定した粒度分布の体積平均径MVと標準偏差SDとから得られる変動係数(SD/MV)が0.50以下である、銅粉。
2. 前記D50が5.0μm以下である、1.に記載された銅粉。
3. 前記DBETが0.1μm以上5.0μm以下である、1.または2.に記載された銅粉。
4. 化学分析法で定量した残留塩素の量が50ppm以下である、1.~3.のいずれかに記載された銅粉。
5. 不均化反応により得られる、1.~4.のいずれかに記載された銅粉。
6. 表面に脂肪酸被膜を含む、1.~5.のいずれかに記載された銅粉。
7. 1.~6.のいずれかに記載の銅粉と、樹脂と、溶媒と、を含む導電性ペースト。
That is, according to the present invention, there are provided the copper powder and conductive paste described below.
1. D BET /D 50 calculated from a particle diameter D 50 at a cumulative frequency of 50% in a volume-based cumulative frequency distribution curve measured using a laser diffraction scattering type particle size distribution measurement device and a particle diameter D BET calculated from a specific surface area s by a nitrogen adsorption method is 0.70 or more and 1.20 or less;
A copper powder having a coefficient of variation (SD/MV) obtained from the volume average diameter MV and the standard deviation SD of a particle size distribution measured by a laser diffraction/scattering particle size distribution measurement method of 0.50 or less.
2. The copper powder according to 1., wherein the D50 is 5.0 μm or less.
3. The copper powder according to 1. or 2., wherein the D BET is 0.1 μm or more and 5.0 μm or less.
4. The copper powder according to any one of 1. to 3., wherein the amount of residual chlorine determined by chemical analysis is 50 ppm or less.
5. The copper powder according to any one of 1. to 4., which is obtained by a disproportionation reaction.
6. The copper powder according to any one of 1. to 5., which comprises a fatty acid coating on the surface.
7. A conductive paste comprising the copper powder according to any one of 1. to 6., a resin, and a solvent.

 本発明によれば、充填性が向上した銅粉を提供することができる。 The present invention makes it possible to provide copper powder with improved packing properties.

 以下、本発明を実施形態に基づいて説明する。
 なお、数値範囲が段階的に記載されている場合、各数値範囲の上限及び下限は任意に組み合わせることができる。
Hereinafter, the present invention will be described based on an embodiment.
In addition, when a numerical range is described in stages, the upper and lower limits of each numerical range can be combined in any manner.

(1)銅粉
 以下、本実施形態の銅粉について説明する。
(1) Copper Powder Hereinafter, the copper powder of the present embodiment will be described.

 本実施形態の銅粉は、レーザー回折散乱式粒度分布測定装置を用いて測定された体積基準の累積度数分布曲線において累積度数が50%であるときの粒子径D50と、窒素吸着法による比表面積sから算出した粒子径DBETと、から得られるDBET/D50が0.70以上1.20以下であり、レーザー回折散乱式粒度分布測定法により測定した粒度分布の体積平均径MVと標準偏差SDとから得られる変動係数(SD/MV)が0.50以下である。 The copper powder of this embodiment has a D BET /D 50 ratio of 0.70 or more and 1.20 or less, calculated from a particle diameter D 50 at a cumulative frequency of 50% in a volume-based cumulative frequency distribution curve measured using a laser diffraction scattering type particle size distribution measurement device and a particle diameter D BET calculated from a specific surface area s by a nitrogen adsorption method, and has a coefficient of variation ( SD /MV) of 0.50 or less, calculated from a volume average diameter MV and a standard deviation SD of the particle size distribution measured by a laser diffraction scattering type particle size distribution measurement method.

 本実施形態の銅粉により上述の課題が解決されるメカニズムは明らかではないが、DBET/D50および変動係数(SD/MV)がそれぞれ一定の数値範囲であることにより、銅粉の一次粒子の分散性が向上し、さらに銅粉の粒度分布が狭くなると考えられる。これにより、粒子の充填性が向上すると考えられる。 Although the mechanism by which the copper powder of this embodiment solves the above problems is unclear, it is believed that the D BET /D 50 and the coefficient of variation (SD/MV) are each in a certain numerical range, thereby improving the dispersibility of the primary particles of the copper powder and narrowing the particle size distribution of the copper powder, which is believed to improve the particle packing.

 粒子の充填性が向上することによる利点はいくつかあるが、例えば、充填性が向上した銅粉を導電性ペーストに配合すると、導電性ペーストから得られる配線の断線が生じづらくなるという利点を挙げることができる。充填性が向上したということは、粒子間の空隙が少ないということであるため、導電性ペーストを焼成しても収縮が小さく、断線が生じづらいのである。 There are several advantages to improving the particle packing, one of which is that when copper powder with improved packing is mixed into a conductive paste, the wiring obtained from the conductive paste is less likely to break. Improved packing means that there are fewer voids between the particles, so even when the conductive paste is fired, there is less shrinkage and breaks are less likely to occur.

 充填性をより一層高くする観点から、本実施形態の銅粉の上記DBET/D50は、好ましくは0.70以上、より好ましくは0.75以上、さらに好ましくは0.78以上、さらに好ましくは0.80以上であり、そして、好ましくは1.20以下、より好ましくは1.10以下、さらに好ましくは1.00以下である。
 また、充填性をより一層高くする観点から、本実施形態の銅粉の上記DBET/D50は、好ましくは0.70以上1.20以下、より好ましくは0.75以上1.20以下、さらに好ましくは0.78以上1.10以下、さらに好ましくは0.80以上1.00以下である。
From the viewpoint of further improving the filling property, the D BET /D 50 of the copper powder of this embodiment is preferably 0.70 or more, more preferably 0.75 or more, even more preferably 0.78 or more, even more preferably 0.80 or more, and is preferably 1.20 or less, more preferably 1.10 or less, even more preferably 1.00 or less.
From the viewpoint of further improving the filling property, the D BET /D 50 of the copper powder of this embodiment is preferably 0.70 or more and 1.20 or less, more preferably 0.75 or more and 1.20 or less, even more preferably 0.78 or more and 1.10 or less, and still more preferably 0.80 or more and 1.00 or less.

 本実施形態の銅粉の粒子径DBETは、下記式(1)により算出することができる。
   DBET=6/(ρ・s)   (1)
 式(1)において、ρは銅粉の密度(8.96g/cm)であり、sは銅粉の窒素吸着法による比表面積である。
The particle diameter D BET of the copper powder of this embodiment can be calculated by the following formula (1).
D BET =6/(ρ・s) (1)
In formula (1), ρ is the density of the copper powder (8.96 g/cm 3 ), and s is the specific surface area of the copper powder measured by the nitrogen adsorption method.

 充填性をより一層高くする観点から、本実施形態の銅粉の変動係数(SD/MV)は、例えば0.01以上であり、そして、好ましくは0.50以下、より好ましくは0.45以下、さらに好ましくは0.40以下、さらに好ましくは0.35以下である。
 また、充填性をより一層高くする観点から、本実施形態の銅粉の上記変動係数(SD/MV)は、好ましくは0.01以上0.50以下、より好ましくは0.01以上0.45以下、さらに好ましくは0.01以上0.40以下、さらに好ましくは0.01以上0.35以下である。
From the viewpoint of further improving the filling property, the coefficient of variation (SD/MV) of the copper powder of this embodiment is, for example, 0.01 or more, and preferably 0.50 or less, more preferably 0.45 or less, even more preferably 0.40 or less, and even more preferably 0.35 or less.
From the viewpoint of further improving the filling property, the above-mentioned coefficient of variation (SD/MV) of the copper powder of this embodiment is preferably 0.01 or more and 0.50 or less, more preferably 0.01 or more and 0.45 or less, even more preferably 0.01 or more and 0.40 or less, and even more preferably 0.01 or more and 0.35 or less.

 ハンドリング性向上および分散性向上等の観点から、本実施形態の銅粉のD50は、好ましくは0.1μm以上、より好ましくは0.5μm以上、さらに好ましくは1.0μm以上、さらに好ましくは1.4μm以上であり、そして、好ましくは5.0μm以下、より好ましくは4.7μm以下、さらに好ましくは4.5μm以下、さらに好ましくは4.3μm以下である。
 また、ハンドリング性向上および分散性向上等の観点から、本実施形態の銅粉のD50は、好ましくは0.1μm以上5.0μm以下、より好ましくは0.5μm以上4.7μm以下、さらに好ましくは1.0μm以上4.5μm以下、さらに好ましくは1.4μm以上4.3μm以下である。
From the viewpoint of improving handleability and dispersibility, the D50 of the copper powder of this embodiment is preferably 0.1 μm or more, more preferably 0.5 μm or more, even more preferably 1.0 μm or more, and even more preferably 1.4 μm or more, and is preferably 5.0 μm or less, more preferably 4.7 μm or less, even more preferably 4.5 μm or less, and even more preferably 4.3 μm or less.
From the viewpoint of improving handleability and dispersibility, the D50 of the copper powder of this embodiment is preferably 0.1 μm or more and 5.0 μm or less, more preferably 0.5 μm or more and 4.7 μm or less, even more preferably 1.0 μm or more and 4.5 μm or less, and even more preferably 1.4 μm or more and 4.3 μm or less.

 ハンドリング性向上および分散性向上等の観点から、本実施形態の銅粉のDBETは、好ましくは0.1μm以上、より好ましくは0.5μm以上、さらに好ましくは1.0μm以上であり、そして、好ましくは5.0μm以下、より好ましくは4.5μm以下である。
 また、ハンドリング性向上および分散性向上等の観点から、本実施形態の銅粉のDBETは、好ましくは0.1μm以上5.0μm以下、より好ましくは0.5μm以上5.0μm以下、さらに好ましくは1.0μm以上4.5μm以下である。
From the viewpoint of improving handleability and dispersibility, the D BET of the copper powder of this embodiment is preferably 0.1 μm or more, more preferably 0.5 μm or more, even more preferably 1.0 μm or more, and is preferably 5.0 μm or less, more preferably 4.5 μm or less.
From the viewpoint of improving handleability and dispersibility, the D BET of the copper powder of this embodiment is preferably 0.1 μm or more and 5.0 μm or less, more preferably 0.5 μm or more and 5.0 μm or less, and even more preferably 1.0 μm or more and 4.5 μm or less.

 本実施形態の銅粉の化学分析法で定量した残留塩素の量は、好ましくは50ppm以下、より好ましくは10ppm以下、さらに好ましくは1ppm以下、さらに好ましくは0.1ppm以下、さらに好ましくは0.01ppm以下である。これにより、腐食など残留塩素由来の不具合が防止される。 The amount of residual chlorine quantified by the chemical analysis method of the copper powder of this embodiment is preferably 50 ppm or less, more preferably 10 ppm or less, even more preferably 1 ppm or less, even more preferably 0.1 ppm or less, and even more preferably 0.01 ppm or less. This prevents problems caused by residual chlorine, such as corrosion.

 本実施形態の銅粉の用途は特に限定されないが、本実施形態の銅粉は、分散性が向上しており、さらに粒度分布が狭いため、導電性ペーストの原料として好適に用いられる。 The uses of the copper powder of this embodiment are not particularly limited, but because the copper powder of this embodiment has improved dispersibility and a narrow particle size distribution, it is suitable for use as a raw material for conductive pastes.

[銅粉の製造方法]
 以下、本実施形態の銅粉の製造方法について説明する。
[Method of manufacturing copper powder]
The method for producing copper powder according to this embodiment will be described below.

 本実施形態の銅粉の製造方法は特に限定されないが、銅粉の一次粒子の分散性をより一層向上させる観点および銅粉の粒度分布をより一層狭くする観点から、銅(I)化合物から銅粉を得る工程Aと、前記銅粉の表面を脂肪酸塩で処理する工程Bと、を含むことが好ましい。 The method for producing copper powder in this embodiment is not particularly limited, but from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder, it is preferable that the method includes step A of obtaining copper powder from a copper(I) compound and step B of treating the surface of the copper powder with a fatty acid salt.

<工程A>
 以下、本実施形態の銅粉の製造方法の工程Aについて説明する。
 工程Aは銅(I)化合物から銅粉を得る工程である。工程Aの具体的な方法は特に限定されないが、銅粉の一次粒子の分散性をより一層向上させる観点および銅粉の粒度分布をより一層狭くする観点から、銅(I)化合物とポリビニルアルコールを含むスラリーAから銅粉を得ることが好ましい。
<Step A>
Step A of the method for producing copper powder according to this embodiment will be described below.
Step A is a step of obtaining copper powder from a copper(I) compound. The specific method of step A is not particularly limited, but from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder, it is preferable to obtain the copper powder from a slurry A containing a copper(I) compound and polyvinyl alcohol.

 スラリーAに用いる分散媒は特に限定されず、水や親水性分散媒などスラリー調製に汎用される分散媒を用いることができる。また、複数種類の分散媒を混合して用いてもよい。 The dispersion medium used in slurry A is not particularly limited, and any dispersion medium commonly used in slurry preparation, such as water or a hydrophilic dispersion medium, can be used. In addition, a mixture of multiple types of dispersion medium can be used.

 親水性分散媒としては、例えば、エチレングリコール、プロピレングリコール等のアルカンジオールやグリセリンなどの多価アルコール類;糖アルコール類、エタノール、メタノール、ブタノール、プロパノール、イソプロパノールなどの低級アルコール類;エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノブチルエーテル、エチレングリコールモノメチルエーテルアセテート、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノ-n-プロピルエーテル、エチレングリコールモノ-iso-プロピルエーテル、ジエチレングリコールモノ-iso-プロピルエーテル、エチレングリコールモノ-n-ブチルエーテル、エチレングリコールモノ-t-ブチルエーテル、ジエチレングリコールモノ-t-ブチルエーテル、トリエチレングリコールモノエチルエーテル、1-メチル-1-メトキシブタノール、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノ-t-ブチルエーテル、プロピレングリコールモノ-n-プロピルエーテル、プロピレングリコールモノ-iso-プロピルエーテル、ジプロピレングリコール、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノ-n-プロピルエーテル、ジプロピレングリコールモノ-iso-プロピルエーテル、トリプロピレングリコールモノメチルエーテルなどのグリコールエーテル類;エタノールアミン、ジエタノールアミン、トリエタノールアミンなどのアルカノールアミン類等が挙げられる。 Hydrophilic dispersion media include, for example, polyhydric alcohols such as alkanediols such as ethylene glycol and propylene glycol, and glycerin; lower alcohols such as sugar alcohols, ethanol, methanol, butanol, propanol, and isopropanol; ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, ethylene glycol monomethyl ether acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, ethylene glycol mono-iso-propyl ether, diethylene glycol mono-iso-propyl ether, ethylene glycol mono-n-butyl ether, ethylene glycol mono-t-butyl ether, diethylene glycol Examples of the glycol ethers include ethylene glycol mono-t-butyl ether, triethylene glycol monoethyl ether, 1-methyl-1-methoxybutanol, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-t-butyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-iso-propyl ether, dipropylene glycol, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-iso-propyl ether, and tripropylene glycol monomethyl ether; and alkanolamines such as ethanolamine, diethanolamine, and triethanolamine.

 スラリーA中の銅(I)化合物の含有量も特に限定されず、例えば1質量%以上25質量%以下である。 The content of the copper (I) compound in the slurry A is not particularly limited, and is, for example, 1% by mass or more and 25% by mass or less.

 銅(I)化合物は、一価の銅を含む化合物であれば特に限定されず、例えば、亜酸化銅、塩化銅、臭化銅およびヨウ化銅からなる群から選択される一種または二種以上を含み、好ましくは亜酸化銅を含む。 The copper (I) compound is not particularly limited as long as it is a compound containing monovalent copper, and may, for example, contain one or more compounds selected from the group consisting of cuprous oxide, copper chloride, copper bromide, and copper iodide, and preferably contains cuprous oxide.

 スラリーA中の前記ポリビニルアルコールの含有量は特に限定されないが、銅粉の一次粒子の分散性をより一層向上させる観点および銅粉の粒度分布をより一層狭くする観点から、銅(I)化合物100質量部に対して、好ましくは0.01質量部以上、より好ましくは0.05質量部以上、さらに好ましくは0.1質量部以上であり、そして、例えば5質量部以下であってもよく、2質量部以下であってもよく、1質量部以下であってもよい。
 また、スラリーA中の前記ポリビニルアルコールの含有量は、銅粉の一次粒子の分散性をより一層向上させる観点および銅粉の粒度分布をより一層狭くする観点から、銅(I)化合物100質量部に対して、好ましくは0.01質量部以上5質量部以下、より好ましくは0.05質量部以上2質量部以下、さらに好ましくは0.1質量部以上1質量部以下である。
The content of the polyvinyl alcohol in slurry A is not particularly limited, but from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder, the content is preferably 0.01 parts by mass or more, more preferably 0.05 parts by mass or more, and even more preferably 0.1 parts by mass or more, relative to 100 parts by mass of the copper(I) compound, and may be, for example, 5 parts by mass or less, 2 parts by mass or less, or 1 part by mass or less.
The content of the polyvinyl alcohol in slurry A is preferably from 0.01 to 5 parts by mass, more preferably from 0.05 to 2 parts by mass, and even more preferably from 0.1 to 1 part by mass, relative to 100 parts by mass of the copper (I) compound, from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder.

 ポリビニルアルコールのけん化度は特に限定されないが、銅粉の一次粒子の分散性をより一層向上させる観点および銅粉の粒度分布をより一層狭くする観点から、好ましくは70mol%以上、より好ましくは75mol%以上、さらに好ましくは80mol%以上、さらに好ましくは85mol%以上であり、そして、例えば100mol%以下であってもよく、例えば95mol%以下であってもよく、例えば90mol%以下であってもよい。
 また、ポリビニルアルコールのけん化度は、銅粉の一次粒子の分散性をより一層向上させる観点および銅粉の粒度分布をより一層狭くする観点から、好ましくは70mol%以上100mol%以下、より好ましくは75mol%以上100mol%以下、さらに好ましくは80mol%以上95mol%以下、さらに好ましくは85mol%以上90mol%以下である。
The degree of saponification of polyvinyl alcohol is not particularly limited, but from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder, it is preferably 70 mol% or more, more preferably 75 mol% or more, even more preferably 80 mol% or more, and even more preferably 85 mol% or more, and may be, for example, 100 mol% or less, for example, 95 mol% or less, or for example, 90 mol% or less.
Furthermore, from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder, the degree of saponification of the polyvinyl alcohol is preferably 70 mol% or more and 100 mol% or less, more preferably 75 mol% or more and 100 mol% or less, even more preferably 80 mol% or more and 95 mol% or less, and even more preferably 85 mol% or more and 90 mol% or less.

 ポリビニルアルコールの粘度は特に限定されないが、銅粉の一次粒子の分散性をより一層向上させる観点および銅粉の粒度分布をより一層狭くする観点から、JIS K6726:1994に準拠し、ブルックフィールド形回転粘度計を用いて20℃において測定された4%水溶液の粘度は、例えば0.1mPa・s以上、好ましくは1mPa・s以上、より好ましくは4mPa・s以上であり、そして、例えば100mPa・s以下であってもよく、例えば50mPa・s以下であってもよく、例えば10mPa・s以下であってもよい。
 また、本実施形態のポリビニルアルコールの、JIS K6726:1994に準拠し、ブルックフィールド形回転粘度計を用いて20℃において測定された4%水溶液の粘度は、銅粉の一次粒子の分散性をより一層向上させる観点および銅粉の粒度分布をより一層狭くする観点から、例えば0.1mPa・s以上100mPa・s以下、好ましくは1mPa・s以上50mPa・s以下、より好ましくは4mPa・s以上10mPa・s以下である。
The viscosity of the polyvinyl alcohol is not particularly limited, but from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder, the viscosity of a 4% aqueous solution measured at 20°C using a Brookfield rotational viscometer in accordance with JIS K6726:1994 is, for example, 0.1 mPa·s or more, preferably 1 mPa·s or more, more preferably 4 mPa·s or more, and may be, for example, 100 mPa·s or less, for example, 50 mPa·s or less, or for example, 10 mPa·s or less.
The viscosity of a 4% aqueous solution of the polyvinyl alcohol of this embodiment, measured at 20° C. using a Brookfield rotational viscometer in accordance with JIS K6726:1994, is, from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and from the viewpoint of further narrowing the particle size distribution of the copper powder, for example, from 0.1 mPa·s to 100 mPa·s, preferably from 1 mPa·s to 50 mPa·s, and more preferably from 4 mPa·s to 10 mPa·s.

 工程Aにおいて前記銅粉を生成させる反応の種類は特に限定されないが、例えば、前記銅(I)化合物を不均化反応させることにより前記銅粉を生成させることができる。 The type of reaction that produces the copper powder in step A is not particularly limited, but for example, the copper powder can be produced by disproportionating the copper(I) compound.

 本実施形態の銅粉は、好ましくは不均化反応により得られる。 The copper powder of this embodiment is preferably obtained by a disproportionation reaction.

 スラリーAが含む成分は特に限定されないが、反応槽内にて反応を促進させる観点から、好ましくは酸を含み、より好ましくは塩酸、硝酸および硫酸からなる群から選択される一種または二種以上を含み、さらに好ましくは硫酸を含む。ここで、銅(I)化合物の不均化反応の途中ではスラリーA中の酸は銅塩(塩酸銅、硝酸銅、硫酸銅など)になっていてもよい。なお、反応槽内に酸を供給する速度を調整することにより、銅粉の粒子径を調整することができる。例えば、酸の供給速度を下げると、銅粉の粒子径は増大する傾向にある。 The components contained in slurry A are not particularly limited, but from the viewpoint of promoting the reaction in the reaction vessel, it preferably contains an acid, more preferably contains one or more selected from the group consisting of hydrochloric acid, nitric acid, and sulfuric acid, and even more preferably contains sulfuric acid. Here, the acid in slurry A may be in the form of a copper salt (copper hydrochloride, copper nitrate, copper sulfate, etc.) during the disproportionation reaction of the copper (I) compound. The particle size of the copper powder can be adjusted by adjusting the rate at which the acid is supplied to the reaction vessel. For example, the particle size of the copper powder tends to increase when the acid supply rate is reduced.

 工程Aにおける反応槽内のpHは特に限定されないが、例えば0.1以上であり、0.5以上であってもよく、1以上であってもよく、そして、銅粉の一次粒子の分散性をより一層向上させる観点および銅粉の粒度分布をより一層狭くする観点から、好ましくは7以下、より好ましくは6以下、さらに好ましくは5以下、さらに好ましくは2.5以下である。
 また、本実施形態の工程Aにおける反応槽内のpHは銅粉の一次粒子の分散性をより一層向上させる観点および銅粉の粒度分布をより一層狭くする観点から、好ましくは0.1以上7以下、より好ましくは0.1以上6以下、さらに好ましくは0.5以上5以下、さらに好ましくは1以上2.5以下である。
 ここで、工程Aにおける反応槽内のpHは、工程Aが終了したときの、反応槽内のスラリーのpHである。
The pH in the reaction tank in step A is not particularly limited, but is, for example, 0.1 or more, may be 0.5 or more, or may be 1 or more, and from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder, it is preferably 7 or less, more preferably 6 or less, even more preferably 5 or less, and even more preferably 2.5 or less.
In addition, the pH in the reaction tank in step A of this embodiment is preferably 0.1 or more and 7 or less, more preferably 0.1 or more and 6 or less, even more preferably 0.5 or more and 5 or less, and even more preferably 1 or more and 2.5 or less, from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder.
Here, the pH in the reaction tank in step A is the pH of the slurry in the reaction tank when step A is completed.

 工程Aにおける反応槽内の温度は特に限定されないが、例えば5℃以上であってもよく、例えば10℃以上であってもよく、そして、銅粉の一次粒子の分散性をより一層向上させる観点および銅粉の粒度分布をより一層狭くする観点から、好ましくは90℃以下、より好ましくは80℃以下、さらに好ましくは70℃以下であり、60℃以下であってもよく、50℃以下であってもよく、40℃以下であってもよく、30℃以下であってもよく、20℃以下であってもよく、15℃以下であってもよい。
 また、本実施形態の工程Aにおける反応槽内の温度は、銅粉の一次粒子の分散性をより一層向上させる観点および銅粉の粒度分布をより一層狭くする観点から、好ましくは5℃以上90℃以下、より好ましくは5℃以上80℃以下である。
 ここで、工程Aにおける反応槽内の温度は、反応槽内のスラリーの温度である。なお、反応槽内の温度を調整することにより、銅粉の粒子径を調整することができる。例えば、反応槽内の温度を上げると、銅粉の粒子径は増大する傾向にある。
The temperature in the reaction tank in step A is not particularly limited, but may be, for example, 5°C or higher, or may be, for example, 10°C or higher, and from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder, it is preferably 90°C or lower, more preferably 80°C or lower, and even more preferably 70°C or lower, and may be 60°C or lower, 50°C or lower, 40°C or lower, 30°C or lower, 20°C or lower, or 15°C or lower.
The temperature in the reaction tank in step A of this embodiment is preferably 5° C. or higher and 90° C. or lower, more preferably 5° C. or higher and 80° C. or lower, from the viewpoint of further improving the dispersibility of the primary particles of the copper powder and further narrowing the particle size distribution of the copper powder.
Here, the temperature in the reaction tank in step A is the temperature of the slurry in the reaction tank. The particle size of the copper powder can be adjusted by adjusting the temperature in the reaction tank. For example, when the temperature in the reaction tank is increased, the particle size of the copper powder tends to increase.

<工程B>
 以下、本実施形態の銅粉の製造方法の工程Bについて説明する。
 工程Bでは銅粉の表面を脂肪酸塩で処理する。工程Bは、例えば、銅粉の表面に脂肪酸塩を付着させ、銅粉を分散させる分散工程と、銅粉の表面に脂肪酸の被膜を形成させる被膜形成工程と、を含む。
<Step B>
Step B of the method for producing copper powder according to this embodiment will now be described.
In step B, the surface of the copper powder is treated with a fatty acid salt. Step B includes, for example, a dispersing step of attaching a fatty acid salt to the surface of the copper powder and dispersing the copper powder, and a coating step of forming a coating of a fatty acid on the surface of the copper powder.

 本実施形態の銅粉は、好ましくは表面に脂肪酸被膜を含む。 The copper powder of this embodiment preferably includes a fatty acid coating on the surface.

 脂肪酸塩としては、例えば、炭素数8~20の脂肪酸のアルカリ金属塩が挙げられる。より詳細には、脂肪酸塩としては、炭素数8~20の直鎖または分岐脂肪酸が挙げられ、炭素数8のオクタン酸、炭素数9のノナン酸、炭素数10のデカン酸、炭素数12のドデカン酸、炭素数14のテトラデカン酸、炭素数15のペンタデカン酸、炭素数16のヘキサデカン酸(パルミチン酸)、炭素数17のヘプタデカン酸、炭素数18のオクタデカン酸(ステアリン酸)、及び炭素数20のエイコサン酸といった直鎖脂肪酸、並びに、炭素数18のオレイン酸、リノール酸、及びリノレン酸といった分岐脂肪酸のアルカリ金属塩が挙げられる。 Examples of fatty acid salts include alkali metal salts of fatty acids having 8 to 20 carbon atoms. More specifically, examples of fatty acid salts include linear or branched fatty acids having 8 to 20 carbon atoms, such as linear fatty acids such as octanoic acid having 8 carbon atoms, nonanoic acid having 9 carbon atoms, decanoic acid having 10 carbon atoms, dodecanoic acid having 12 carbon atoms, tetradecanoic acid having 14 carbon atoms, pentadecanoic acid having 15 carbon atoms, hexadecanoic acid (palmitic acid) having 16 carbon atoms, heptadecanoic acid having 17 carbon atoms, octadecanoic acid (stearic acid) having 18 carbon atoms, and eicosanoic acid having 20 carbon atoms, as well as alkali metal salts of branched fatty acids such as oleic acid, linoleic acid, and linolenic acid having 18 carbon atoms.

 脂肪酸塩の添加量は、銅粉(乾燥状態)の全量に対して、0.05質量%以上5質量%以下が好ましい。 The amount of fatty acid salt added is preferably 0.05% by mass or more and 5% by mass or less based on the total amount of copper powder (dry state).

 分散工程における反応槽内のpHは特に限定されないが、脂肪酸塩を溶解させやすくする観点から、好ましくは9以上、より好ましくは10以上であり、そして、例えば11以下である。
 また、本実施形態の分散工程における反応槽内のpHは、脂肪酸塩を溶解させやすくする観点から、好ましくは9以上11以下、より好ましくは10以上11以下である。
The pH in the reaction tank in the dispersion step is not particularly limited, but from the viewpoint of facilitating dissolution of the fatty acid salt, it is preferably 9 or more, more preferably 10 or more, and is, for example, 11 or less.
The pH in the reaction tank in the dispersion step of this embodiment is preferably 9 or more and 11 or less, more preferably 10 or more and 11 or less, from the viewpoint of facilitating dissolution of the fatty acid salt.

 分散工程においては、反応槽に脂肪酸塩を加えた後、熟成させるのが好ましい。熟成時間としては、5分以上60分以下が好ましい。 In the dispersion process, it is preferable to add the fatty acid salt to the reaction tank and then allow it to age. The aging time is preferably 5 minutes or more and 60 minutes or less.

 被膜形成工程においては、反応槽内を酸により中和し、銅粉の表面に脂肪酸による脂肪酸被膜を形成させる。酸の種類は特に限定されず、塩酸、硫酸および硝酸などの強酸でもよいし、弱酸でもよい。
 なお、以下の観点から、被膜形成工程において反応槽内を中和する酸としては弱酸を用いることが好ましい。
 弱酸を用いることで、脂肪酸被膜をより均一に形成でき、得られる銅微粒子の凝集を抑制できる。また、弱酸を用いることで、脂肪酸被膜により、得られる銅微粒子の疎水性を高め、後述の洗浄工程で銅微粒子の沈降速度を速めることができ、生産性を向上できる。また、弱酸を用いることで、銅粉に対し均一に脂肪酸被膜を形成することができるため、銅微粒子同士が凝集しにくくなり、凝集粒子の少ない銅微粒子が得られる。
 中和に用いる弱酸の種類は特に限定されず、例えば、クエン酸、アスコルビン酸、および酢酸の中から選ばれる1種または2種以上が挙げられる。
In the coating process, the inside of the reaction vessel is neutralized with an acid, and a fatty acid coating is formed on the surface of the copper powder using the fatty acid. The type of acid is not particularly limited, and may be a strong acid such as hydrochloric acid, sulfuric acid, or nitric acid, or may be a weak acid.
From the following viewpoint, it is preferable to use a weak acid as the acid for neutralizing the inside of the reaction vessel in the coating formation step.
By using a weak acid, a fatty acid coating can be formed more uniformly, and aggregation of the obtained copper microparticles can be suppressed. In addition, by using a weak acid, the fatty acid coating can increase the hydrophobicity of the obtained copper microparticles, and the settling rate of the copper microparticles can be increased in the washing step described below, thereby improving productivity. In addition, by using a weak acid, a fatty acid coating can be formed uniformly on the copper powder, making it difficult for the copper microparticles to aggregate with each other, and copper microparticles with fewer aggregated particles can be obtained.
The type of weak acid used for neutralization is not particularly limited, and examples thereof include one or more acids selected from citric acid, ascorbic acid, and acetic acid.

 被膜形成工程においては、反応槽に酸を加えた後、熟成させるのが好ましい。熟成時間としては、5分以上60分以下が好ましい。 In the coating formation process, it is preferable to add acid to the reaction tank and then age the mixture. The ageing time is preferably 5 minutes or more and 60 minutes or less.

<その他の工程>
 本実施形態の銅粉の製造方法は、上記工程AおよびB以外の工程を含んでもよい。
<Other processes>
The method for producing copper powder according to the present embodiment may include steps other than steps A and B described above.

 本実施形態の銅粉の製造方法は、銅粉を洗浄する工程をさらに含んでもよい。洗浄の方法は特に限定されず、例えば、水を添加して攪拌することによりおこなうことができる。 The method for producing copper powder according to this embodiment may further include a step of washing the copper powder. The washing method is not particularly limited, and can be performed, for example, by adding water and stirring.

 本実施形態の銅粉の製造方法は、銅粉や中間体を選別する工程をさらに含んでもよい。銅粉や中間体の選別は、例えば篩を用いておこなうことができ、特定のサイズの篩を用いることで、特定の範囲の粒径のものを選別することができる。当該工程はスラリーの段階でおこなってもよいし、乾燥により粉末状態にしてからおこなってもよい。 The method for producing copper powder according to this embodiment may further include a step of selecting the copper powder or intermediate. The selection of the copper powder or intermediate may be performed, for example, using a sieve, and by using a sieve of a specific size, it is possible to select those with particle sizes in a specific range. This step may be performed at the slurry stage, or after drying to produce a powder state.

 本実施形態の銅粉の製造方法は、銅粉を乾燥する工程Cをさらに含んでもよい。銅粉を乾燥する方法は特に限定されず、例えば、遠心分離により脱水をおこなった後、乾燥機などで加熱乾燥することによって乾燥をおこなうことができる。 The method for producing copper powder according to this embodiment may further include step C of drying the copper powder. The method for drying the copper powder is not particularly limited, and the copper powder can be dried, for example, by dehydrating the powder by centrifugation, followed by heating and drying in a dryer or the like.

 本実施形態の銅粉の製造方法は、銅粉や中間体を解砕する工程をさらに含んでもよい。銅粉や中間体の粉砕は、公知の粉砕機によっておこなうことができる。粉砕機の種類は特に限定されず、高速回転ミル、ハンマーミルまたはアトマイザーなど任意のものを用いることができる。 The method for producing copper powder according to this embodiment may further include a step of crushing the copper powder or the intermediate. The copper powder or the intermediate can be crushed by a known crusher. There are no particular limitations on the type of crusher, and any type can be used, such as a high-speed rotary mill, a hammer mill, or an atomizer.

(2)導電性ペースト
 以下、本実施形態の導電性ペーストについて説明する。
(2) Conductive Paste The conductive paste of this embodiment will now be described.

 本実施形態の導電性ペーストは、上記の銅粉と、樹脂と、溶媒と、を含む。 The conductive paste of this embodiment contains the above-mentioned copper powder, a resin, and a solvent.

 本実施形態の銅粉は、分散性が向上しており、さらに粒度分布が狭いため、再現性、安定性の高いペーストを容易に設計することができる。 The copper powder of this embodiment has improved dispersibility and a narrow particle size distribution, making it easy to design a paste that is highly reproducible and stable.

 本実施形態の導電性ペーストに用いられる樹脂は特に限定されず、導電性ペーストの原料として公知のものを適宜用いることができる。例えば、エチルセルロースに代表されるセルロース系樹脂などが挙げられ、ターピネオールなどの有機溶剤に溶解した有機ビヒクルとして添加される。樹脂の添加量は、焼結性を阻害しない程度に抑える必要がある。このため、樹脂の添加量は、好ましくは導電性ペースト全体の5質量%以下であり、さらに好ましくは2質量%以下である。 The resin used in the conductive paste of this embodiment is not particularly limited, and any known raw material for conductive pastes can be used as appropriate. For example, cellulose-based resins such as ethyl cellulose can be used, which are added as an organic vehicle dissolved in an organic solvent such as terpineol. The amount of resin added must be kept to a level that does not inhibit sintering. For this reason, the amount of resin added is preferably 5% by mass or less of the entire conductive paste, and more preferably 2% by mass or less.

 本実施形態の導電性ペーストに用いられる溶媒は特に限定されず、導電性ペーストの原料として公知のものを適宜用いることができる。例えば、エチレングリコール、ジエチレングリコール、トリエチレングリコール、ポリエチレングリコール、グリセリン、ターピネオール、トリエタノール、アミンを用いることが好ましい。これらの有機溶剤の中でも、アミンは、還元能を持っているため、焼成時にペースト表面を局所的に還元性雰囲気にする効果があるため好ましい。また、溶媒として水を使用した場合、人体に有害性を持つ有機溶媒の使用量を減らすことができるため、銅ペーストとしての利用価値を高めることができる。なお、溶媒の量は、特に限定されるものではないが、スクリーン印刷やインクジェット印刷などの導電膜形成方法に適した粘度となるように、銅粉の分散性や粒度分布などを考慮して適宜調整すればよい。 The solvent used in the conductive paste of this embodiment is not particularly limited, and any known raw material for conductive pastes can be used as appropriate. For example, ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, glycerin, terpineol, triethanol, and amines are preferably used. Among these organic solvents, amines are preferred because they have reducing ability and have the effect of locally creating a reducing atmosphere on the paste surface during firing. In addition, when water is used as the solvent, the amount of organic solvents that are harmful to the human body can be reduced, thereby increasing the utility value of the copper paste. The amount of solvent is not particularly limited, but may be appropriately adjusted in consideration of the dispersibility and particle size distribution of the copper powder so as to obtain a viscosity suitable for a conductive film formation method such as screen printing or inkjet printing.

 以上、本発明の実施形態について述べたが、これらは本発明の例示であり、上記以外の様々な構成を採用することもできる。
 また、本発明は前述の実施形態に限定されるものではなく、本発明の目的を達成できる範囲での変形、改良等は本発明に含まれるものである。
Although the embodiments of the present invention have been described above, these are merely examples of the present invention, and various configurations other than those described above can also be adopted.
Furthermore, the present invention is not limited to the above-described embodiment, and modifications and improvements within the scope of the present invention that can achieve the object of the present invention are included in the present invention.

 以下、本発明を実施例によりさらに具体的に説明するが、本発明はその主旨を越えない限り、以下の実施例に限定されるものではない。 The present invention will be explained in more detail below with reference to examples, but the present invention is not limited to the following examples as long as it does not deviate from the gist of the invention.

[レーザー回折散乱式粒度分布測定装置による測定]
 レーザー回折散乱式粒度分布測定装置(マイクロトラック・ベル社製、機種名:MT3300EX II)を用いて、体積基準の累積度数分布曲線において累積度数が50%であるときの銅粉の粒子径D50と、粒度分布の標準偏差SDと、体積平均径MVを得た。なお、測定用サンプルとしては、下記の方法により得られた乾燥状態の銅粉を、水またはエタノールなどのアルコール溶媒に分散させた分散液を用いた。結果を表1に示す。
[Measurement using a laser diffraction/scattering particle size distribution analyzer]
A laser diffraction scattering type particle size distribution analyzer (Microtrac Bell, model name: MT3300EX II) was used to obtain the particle diameter D50 of the copper powder when the cumulative frequency was 50% in the volume-based cumulative frequency distribution curve, the standard deviation SD of the particle size distribution, and the volume average diameter MV. The measurement sample was a dispersion in which dry copper powder obtained by the method described below was dispersed in water or an alcohol solvent such as ethanol. The results are shown in Table 1.

[窒素吸着法による測定]
 比表面積測定装置(島津製作所社製、機種名:FlowSorb III)を用いて、窒素吸着法による銅粉の比表面積sを求めた。また、銅粉の比表面積sから、下記式(1)により銅粉の粒子径DBETを算出した。結果を表1に示す。
   DBET=6/(ρ・s)   (1)
 式(1)において、ρは銅粉の密度(8.96g/cm)であり、sは銅粉の窒素吸着法による比表面積である。
[Measurement by nitrogen adsorption method]
The specific surface area s of the copper powder was measured by nitrogen adsorption using a specific surface area measuring device (Shimadzu Corporation, model name: FlowSorb III). The particle diameter D BET of the copper powder was calculated from the specific surface area s of the copper powder by the following formula (1). The results are shown in Table 1.
D BET =6/(ρ・s) (1)
In formula (1), ρ is the density of the copper powder (8.96 g/cm 3 ), and s is the specific surface area of the copper powder measured by the nitrogen adsorption method.

 充填性の指標として、JIS Z2512:2012に規定される金属粉-タップ密度測定方法に準拠して銅粉のタップ密度を測定した。結果を表1に示す。 As an index of filling ability, the tap density of the copper powder was measured in accordance with the metal powder tap density measurement method specified in JIS Z2512:2012. The results are shown in Table 1.

[実施例1]
<工程A>
 反応槽にイオン交換水5600g、ポリビニルアルコール1.6g(日本合成化学工業株式会社製、製品名:ゴーセノールGL-05、けん化度:86.5~89.0mol%、粘度(4%水溶液、20℃)4.8~5.8mPa・s)および亜酸化銅(古河ケミカルズ社製、製品名:亜酸化銅)800gを加え、攪拌した。
 次いで、反応槽内を30~50℃にし、反応槽内を撹拌しながら20%硫酸水溶液(合計3015g)を反応槽内に連続的に添加し、次いで、15分間撹拌することにより、銅粉を含むスラリーを得た。反応槽内のスラリーのpHは1.8であった。
<洗浄工程(1)>
 次いで、イオン交換水を用いて、得られた銅粉を含むスラリーを抵抗値が1000Ω・cmになるまで洗浄した。
<選別工程>
 次いで、洗浄したスラリーを目開き25μmの篩により選別した。
<工程B>
 得られた銅粉を含むスラリーを銅濃度100g/Lとなるように調整し、攪拌した。
 次いで、炭酸ナトリウムを反応槽内のpHが10.0~10.5になるように添加した。
 次いで、反応槽内にステアリン酸ナトリウムを銅粉に対して0.2質量%添加し、反応槽内を60℃にし、15分間攪拌した。
 次いで、反応槽内に中和剤(アスコルビン酸)を反応槽内のpHが7.5になるように添加し、15分間攪拌した。
 次いで、反応槽内に20%硫酸水溶液を反応槽内のpHが7.0になるように添加し、15分間攪拌した。
<洗浄工程(2)>
 次いで、イオン交換水を用いて、抵抗値が10000Ω・cmになるまで反応槽内のスラリーを洗浄した。
<乾燥および解砕工程>
 次いで、洗浄したスラリーから沈殿物を濾別し、濾別した沈殿物を乾燥し、さらに粉砕機で解砕し、乾燥状態の銅粉を得た。
[Example 1]
<Step A>
A reaction tank was charged with 5,600 g of ion-exchanged water, 1.6 g of polyvinyl alcohol (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., product name: GOHSENOL GL-05, degree of saponification: 86.5 to 89.0 mol%, viscosity (4% aqueous solution, 20° C.) 4.8 to 5.8 mPa·s), and 800 g of cuprous oxide (manufactured by Furukawa Chemicals Corporation, product name: cuprous oxide), and the mixture was stirred.
Next, the temperature inside the reaction vessel was brought to 30 to 50°C, and a 20% aqueous sulfuric acid solution (total of 3015 g) was continuously added to the reaction vessel while stirring the inside of the reaction vessel, followed by stirring for 15 minutes to obtain a slurry containing copper powder. The pH of the slurry in the reaction vessel was 1.8.
<Cleaning step (1)>
Next, the obtained slurry containing copper powder was washed with ion-exchanged water until the resistance value reached 1000 Ω·cm.
<Sorting process>
The washed slurry was then screened using a sieve with 25 μm openings.
<Step B>
The resulting slurry containing copper powder was adjusted to a copper concentration of 100 g/L and stirred.
Then, sodium carbonate was added to the reaction vessel so that the pH value in the reaction vessel was 10.0 to 10.5.
Next, sodium stearate was added to the reaction vessel in an amount of 0.2% by mass based on the copper powder, the reaction vessel was heated to 60° C., and the mixture was stirred for 15 minutes.
Next, a neutralizing agent (ascorbic acid) was added to the reaction vessel so that the pH in the reaction vessel was adjusted to 7.5, and the mixture was stirred for 15 minutes.
Next, a 20% aqueous sulfuric acid solution was added to the reaction vessel so that the pH in the reaction vessel became 7.0, and the mixture was stirred for 15 minutes.
<Cleaning step (2)>
Next, the slurry in the reaction vessel was washed with ion-exchanged water until the resistance value reached 10,000 Ω·cm.
<Drying and crushing process>
Next, the precipitate was filtered off from the washed slurry, and the filtered off precipitate was dried and further crushed in a crusher to obtain a dry copper powder.

[実施例2]
 工程Aにおいて、反応槽内の温度を上げ、さらに、20%硫酸水溶液の1gあたりの平均添加時間を短くしたこと以外は実施例1と同一の条件で、乾燥状態の銅粉を得た。
[Example 2]
Dry copper powder was obtained under the same conditions as in Example 1, except that in step A, the temperature in the reaction vessel was increased and the average addition time per gram of the 20% aqueous sulfuric acid solution was shortened.

[実施例3]
 工程Aにおいて、反応槽内の温度を上げたこと以外は実施例2と同一の条件で、乾燥状態の銅粉を得た。
[Example 3]
In step A, dry copper powder was obtained under the same conditions as in Example 2, except that the temperature inside the reaction vessel was increased.

[比較例1]
 工程Aにおいてポリビニルアルコールの代わりにポリビニルピロリドン8.0gを用い、さらに、20%硫酸水溶液の1gあたりの平均添加時間を短くしたこと以外は実施例1と同一の条件で、乾燥状態の銅粉を得た。
[Comparative Example 1]
Dry copper powder was obtained under the same conditions as in Example 1, except that in step A, 8.0 g of polyvinylpyrrolidone was used instead of polyvinyl alcohol, and the average addition time per gram of the 20% aqueous sulfuric acid solution was shortened.

[比較例2]
 工程Aにおいてポリビニルアルコールの代わりにポリカルボン酸系樹脂(日本触媒社製、製品名:PM-103)8.0gを用い、さらに、20%硫酸水溶液の1gあたりの平均添加時間を短くしたこと以外は実施例1と同一の条件で、乾燥状態の銅粉を得た。
[Comparative Example 2]
Dry copper powder was obtained under the same conditions as in Example 1, except that in step A, 8.0 g of a polycarboxylic acid resin (manufactured by Nippon Shokubai Co., Ltd., product name: PM-103) was used instead of polyvinyl alcohol, and the average addition time per gram of the 20% aqueous sulfuric acid solution was shortened.

Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001

 実施例の銅粉は比較例の銅粉と比較してタップ密度が高かった。このことから、本実施形態の銅粉は充填性が向上しているとわかる。
 本実施形態の銅粉は充填性が向上しているため、導電性ペーストへの使用に適していると考えられる。
The copper powder of the example had a higher tap density than the copper powder of the comparative example, which shows that the copper powder of the present embodiment has improved packing properties.
The copper powder of this embodiment has improved packing properties and is therefore considered suitable for use in conductive pastes.

 この出願は、2023年9月28日に出願された日本出願特願2023-168783号を基礎とする優先権を主張し、その開示の全てをここに取り込む。 This application claims priority based on Japanese Patent Application No. 2023-168783, filed on September 28, 2023, the entire disclosure of which is incorporated herein by reference.

Claims (7)

 レーザー回折散乱式粒度分布測定装置を用いて測定された体積基準の累積度数分布曲線において累積度数が50%であるときの粒子径D50と、窒素吸着法による比表面積sから算出した粒子径DBETと、から得られるDBET/D50が0.70以上1.20以下であり、
 レーザー回折散乱式粒度分布測定法により測定した粒度分布の体積平均径MVと標準偏差SDとから得られる変動係数(SD/MV)が0.50以下である、銅粉。
D BET /D 50 calculated from a particle diameter D 50 at which the cumulative frequency is 50% in a volume-based cumulative frequency distribution curve measured using a laser diffraction /scattering type particle size distribution measurement device and a particle diameter D BET calculated from a specific surface area s by a nitrogen adsorption method is 0.70 or more and 1.20 or less,
A copper powder having a coefficient of variation (SD/MV) obtained from the volume average diameter MV and the standard deviation SD of a particle size distribution measured by a laser diffraction/scattering particle size distribution measurement method of 0.50 or less.
 前記D50が5.0μm以下である、請求項1に記載された銅粉。 The copper powder according to claim 1 , wherein the D 50 is 5.0 μm or less.  前記DBETが0.1μm以上5.0μm以下である、請求項1または2に記載された銅粉。 The copper powder according to claim 1 or 2, wherein the D BET is 0.1 μm or more and 5.0 μm or less.  化学分析法で定量した残留塩素の量が50ppm以下である、請求項1~3のいずれかに記載された銅粉。 Copper powder according to any one of claims 1 to 3, in which the amount of residual chlorine determined by chemical analysis is 50 ppm or less.  不均化反応により得られる、請求項1~4のいずれかに記載された銅粉。  Copper powder according to any one of claims 1 to 4, obtained by a disproportionation reaction.  表面に脂肪酸被膜を含む、請求項1~5のいずれかに記載された銅粉。 The copper powder according to any one of claims 1 to 5, which has a fatty acid coating on its surface.  請求項1~6のいずれかに記載の銅粉と、樹脂と、溶媒と、を含む導電性ペースト。 A conductive paste comprising the copper powder according to any one of claims 1 to 6, a resin, and a solvent.
PCT/JP2024/032598 2023-09-28 2024-09-11 Copper powder and conductive paste Pending WO2025070075A1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006052442A (en) * 2004-08-11 2006-02-23 S Science:Kk Method and apparatus for producing fine spherical copper powder in rotating disc process
JP2007254846A (en) * 2006-03-24 2007-10-04 Mitsui Mining & Smelting Co Ltd Copper powder manufacturing method and copper powder obtained by the manufacturing method
JP2009074152A (en) * 2007-09-21 2009-04-09 Mitsui Mining & Smelting Co Ltd Copper powder manufacturing method and copper powder
JP2018012641A (en) * 2011-09-30 2018-01-25 Dowaエレクトロニクス株式会社 Cuprous oxide powder and method for producing the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006052442A (en) * 2004-08-11 2006-02-23 S Science:Kk Method and apparatus for producing fine spherical copper powder in rotating disc process
JP2007254846A (en) * 2006-03-24 2007-10-04 Mitsui Mining & Smelting Co Ltd Copper powder manufacturing method and copper powder obtained by the manufacturing method
JP2009074152A (en) * 2007-09-21 2009-04-09 Mitsui Mining & Smelting Co Ltd Copper powder manufacturing method and copper powder
JP2018012641A (en) * 2011-09-30 2018-01-25 Dowaエレクトロニクス株式会社 Cuprous oxide powder and method for producing the same

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