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TW200905785A - Precision positioning apparatus - Google Patents

Precision positioning apparatus Download PDF

Info

Publication number
TW200905785A
TW200905785A TW97107493A TW97107493A TW200905785A TW 200905785 A TW200905785 A TW 200905785A TW 97107493 A TW97107493 A TW 97107493A TW 97107493 A TW97107493 A TW 97107493A TW 200905785 A TW200905785 A TW 200905785A
Authority
TW
Taiwan
Prior art keywords
mobile station
actuators
precision positioning
positioning device
actuator
Prior art date
Application number
TW97107493A
Other languages
English (en)
Chinese (zh)
Inventor
Youichi Motomura
Yoshiaki Kubota
Original Assignee
Yaskawa Denki Seisakusho Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yaskawa Denki Seisakusho Kk filed Critical Yaskawa Denki Seisakusho Kk
Publication of TW200905785A publication Critical patent/TW200905785A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Machine Tool Units (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW97107493A 2007-03-06 2008-03-04 Precision positioning apparatus TW200905785A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007055505 2007-03-06

Publications (1)

Publication Number Publication Date
TW200905785A true TW200905785A (en) 2009-02-01

Family

ID=39738045

Family Applications (1)

Application Number Title Priority Date Filing Date
TW97107493A TW200905785A (en) 2007-03-06 2008-03-04 Precision positioning apparatus

Country Status (3)

Country Link
JP (1) JP5170077B2 (fr)
TW (1) TW200905785A (fr)
WO (1) WO2008108148A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110554575A (zh) * 2018-05-30 2019-12-10 佳能株式会社 基板保持装置、曝光装置以及物品的制造方法
TWI699608B (zh) * 2019-03-15 2020-07-21 日月光半導體製造股份有限公司 用於組裝光學裝置之設備
CN113917797A (zh) * 2021-09-22 2022-01-11 哈尔滨工业大学 一种基于六自由度控制的运动台及其控制方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101060865B1 (ko) 2009-09-21 2011-08-31 주식회사 포스코 하이드로 포밍 장치
JP5714480B2 (ja) * 2011-12-27 2015-05-07 住友重機械工業株式会社 位置決め装置
CN103376667B (zh) * 2012-04-20 2015-08-26 上海微电子装备有限公司 一种用于曝光装置的掩模台
NL2010679A (en) * 2012-05-23 2013-11-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
CN110962064B (zh) * 2019-12-09 2024-08-27 格力电器（郑州）有限公司 一种阻挡定位装置
CN113752707A (zh) * 2020-06-01 2021-12-07 追极智能(北京)科技有限公司 一种打印装置及贩卖机

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0413533A (ja) * 1990-05-02 1992-01-17 Toshiba Corp テーブル装置
JPH05149968A (ja) * 1991-11-27 1993-06-15 Mitsubishi Electric Corp 半導体センサ
JP3679509B2 (ja) * 1996-06-18 2005-08-03 キヤノン株式会社 移動ステージ装置およびこれを用いた露光装置
JP2002203766A (ja) * 2000-12-27 2002-07-19 Nikon Corp 照明光学装置及びそれを備える露光装置
JP2004342987A (ja) * 2003-05-19 2004-12-02 Canon Inc ステージ装置
JP2005101136A (ja) * 2003-09-24 2005-04-14 Nikon Corp ステージ装置及び露光装置
JP4948763B2 (ja) * 2003-12-24 2012-06-06 株式会社サイレンス ダンピングコイルばね及び振動減衰装置
JP4868113B2 (ja) * 2005-06-27 2012-02-01 株式会社ニコン 支持装置、ステージ装置及び露光装置
JP2007010529A (ja) * 2005-06-30 2007-01-18 Nikon Corp 計測方法、計測装置、干渉計システム及び露光装置
JP2007019225A (ja) * 2005-07-07 2007-01-25 Nikon Corp 位置計測装置の反射部材構造及びステージ装置並びに露光装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110554575A (zh) * 2018-05-30 2019-12-10 佳能株式会社 基板保持装置、曝光装置以及物品的制造方法
CN110554575B (zh) * 2018-05-30 2022-09-20 佳能株式会社 基板保持装置、曝光装置以及物品的制造方法
TWI699608B (zh) * 2019-03-15 2020-07-21 日月光半導體製造股份有限公司 用於組裝光學裝置之設備
CN113917797A (zh) * 2021-09-22 2022-01-11 哈尔滨工业大学 一种基于六自由度控制的运动台及其控制方法

Also Published As

Publication number Publication date
WO2008108148A1 (fr) 2008-09-12
JP5170077B2 (ja) 2013-03-27
JPWO2008108148A1 (ja) 2010-06-10

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