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TW200804250A - Benzoylurea compound and use thereof - Google Patents

Benzoylurea compound and use thereof Download PDF

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Publication number
TW200804250A
TW200804250A TW95142022A TW95142022A TW200804250A TW 200804250 A TW200804250 A TW 200804250A TW 95142022 A TW95142022 A TW 95142022A TW 95142022 A TW95142022 A TW 95142022A TW 200804250 A TW200804250 A TW 200804250A
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TW95142022A
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Chinese (zh)
Inventor
Masato Konobe
Shigeyuki Itoh
Norihisa Sakamoto
Tomohiro Araki
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Sumitomo Chemical Co
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Publication of TW200804250A publication Critical patent/TW200804250A/en

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
    • C07D295/125—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/13—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N47/00—Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom not being member of a ring and having no bond to a carbon or hydrogen atom, e.g. derivatives of carbonic acid
    • A01N47/08—Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom not being member of a ring and having no bond to a carbon or hydrogen atom, e.g. derivatives of carbonic acid the carbon atom having one or more single bonds to nitrogen atoms
    • A01N47/28—Ureas or thioureas containing the groups >N—CO—N< or >N—CS—N<
    • A01N47/34—Ureas or thioureas containing the groups >N—CO—N< or >N—CS—N< containing the groups, e.g. biuret; Thio analogues thereof; Urea-aldehyde condensation products
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C275/00—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups
    • C07C275/46—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups containing any of the groups, X being a hetero atom, Y being any atom, e.g. acylureas
    • C07C275/48—Y being a hydrogen or a carbon atom
    • C07C275/54—Y being a carbon atom of a six-membered aromatic ring, e.g. benzoylureas
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/72—Nitrogen atoms
    • C07D213/75—Amino or imino radicals, acylated by carboxylic or carbonic acids, or by sulfur or nitrogen analogues thereof, e.g. carbamates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/78—Carbon atoms having three bonds to hetero atoms, with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C07D213/81—Amides; Imides
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D309/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings
    • C07D309/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
    • C07D309/08—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D309/10—Oxygen atoms
    • C07D309/12—Oxygen atoms only hydrogen atoms and one oxygen atom directly attached to ring carbon atoms, e.g. tetrahydropyranyl ethers

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  • Organic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Dentistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Zoology (AREA)
  • Plant Pathology (AREA)
  • Pest Control & Pesticides (AREA)
  • Agronomy & Crop Science (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)

Abstract

The present invention relates to a benzoylurea compound represented by the formula (1): wherein R2 represents a lower alkylene group etc., and A represents a group represented by OR3, S(O)nR4 or NR5R6, or a salt thereof, and use of the same for controlling pests.

Description

200804250 九、發明說明： 【發明所屬之技術領域】 用於蟲害防治 本發明係關於一種苯甲醯脲化合物及其 之用途。 【先前技術】 JP 61-15879 A 化合物。 【發明内容】 然而，有時此等化合物不一定對蟲害顯 功效。本發明之目的係提供一有 &quot;防治 之化合物。 轴…有絶佳防治功效 入研究，結果發 具有絕佳防治 為了達成前述目的，本發明人進行深 現由下式（I)表示之苯甲醯脲化合物對蟲害 功效。如此，完成本發明。 換言之 不兔明係關於如下[1]項至[15]項： 合：二式(I細200804250 IX. Description of the invention: [Technical field to which the invention pertains] For pest control The present invention relates to a benzamidine compound and use thereof. [Prior Art] JP 61-15879 A compound. SUMMARY OF THE INVENTION However, sometimes such compounds are not necessarily effective against pests. It is an object of the present invention to provide a compound which has &quot; In the present invention, the inventors of the present invention have achieved an effect on the insect pests of the benzamidine compound represented by the following formula (I). Thus, the present invention has been completed. In other words, the rabbits are not related to the following items [1] to [15]:

式中， 立地表示氧原子_子 曱醯基， 318750 5 200804250 氰基， 視需要經一個或多個取代基取代之低碳烷基磺醯基， 視需要經一個或多個取代基取代之芳基磺醯基， 視需要經一個或多個取代基取代之低碳烷基羰基硫基， 視需要經一個或多個取代基取代之低碳烷氧基羰基硫基， 視需要經一個或多個取代基取代之芳氧基羰基硫基， 視需要經一個或多個取代基取代之一-或二-(低碳烷基）胺 基石黃酿基， 視需要經一個或多個取代基取代之一-或二-(芳基）胺基磺 醯基， 視需要經一個或多個取代基取代之低碳烷基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之低碳環烷基， 視需要經一個或多個取代基取代之芳基低碳烷基， 視需要經一個或多個取代基取代之芳基， 視需要經一個或多個取代基取代之低碳烷氧基低碳烷基， 視需要經一個或多個取代基取代之芳氧基低碳烧基’ 視需要經一個或多個取代基取代之低碳烷硫基低碳烷基， 視需要經一個或多個取代基取代之低碳烷基亞磺醯基低碳 烧基， 視需要經一個或多個取代基取代之低碳烷基磺醯基低碳烷 基， 視需要經一個或多個取代基取代之一-或二-(低碳烷基）胺 6 318750 200804250 基低碳炫基， 視需要經一個或多個取代基取代之低碳烧酿基， 視需要經一個或多個取代基取代之低碳烷氧羰基， 視需要經一個或多個取代基取代之芳氧羰基， 視需要經一個或多個取代基取代之芳基低碳烷氧羰基， 視需要經一個或多個取代基取代之胺基甲醯基， 視需要經一個或多個取代基取代之胺硫曱醯基， 視需要經一個或多個取代基取代之低碳烷氧基草醯基， 視需要經一個或多個取代基取代之芳基低碳烷氧基草醯 基， 視需要經一個或多個取代基取代之芳氧基草酸基， 視需要經一個或多個取代基取代之胺基草酿基， 視需要經一個或多個取代基取代之低碳烧氧基， 視需要經一個或多個取代基取代之芳氧基， 視需要經一個或夕個取代基取代之芳基低；5炭烧氧基， 視需要經一個或多個取代基取代之胺基，或 視需要經一個或多個取代基取代之雜環基， R2表示視需要經-個或多個自原子取代之低碳伸烧 基， A 表 7F · (1) OR3表示之基團 (其中R3表示視需要經一個或多個取代基取代之^ C3浐 基， ^ 視需要經一個或多個取代基取代之低碳歸A， 318750 7 2〇〇8〇425〇 、要經一個或多個取代基取代之低碳炔基， 要經一個或多個取代基取代之低碳烷醯基， 要經〜個或多個取代基取代之芳基，或 =而要經—個或多個取代基取代之芳基低碳烷 (2)s(〇W表示之基團 中R表不視需要經一個或多個取代基取代之烷 視=要經一個或多個取代基取代之低碳烯基， ^ =要經一個或多個取代基取代之低碳炔基， 見:要經一個或多個取代基取代之芳基，或 硯而要經一個或多個取代基取代之芳基低碳烷基，及 n表示0、1或2之整數），或 (3) NR5R6表示之基團 (其中R5及R6各自獨立地表示 視:要、、里一個或多個取代基取代之C1-C3烷基， 現而要經—個或多個取代基取代之低碳烯基， 视不碳—個或多個取代基取代之低碳炔基， ’而要經—俩或多個取代基取代之芳基， 5遲—個或多個取代基取代之芳基低碳烷基， 二R i4R可於其末端共同結合來與氮原子共同形成視兩 要具有另一個氮原子、氧原子或硫原子作為環組成原子二 3員至7員含氮雜環）， 之 R7表不1¾原子， 石肖基 3 ^750 8 200804250 篆基， •視需要經一個或多個鹵原子取代之芳基低碳烷氧基， 視需要經一個或多個鹵原子取代之低碳烷醯基， 視需要經一個或多個鹵原子取代之低碳烧氧幾基， 視需要經一個或多個鹵原子取代之芳基， 視需要經一個或多個鹵原子取代之芳基低碳烷氧羰基， 視需要經一個或多個鹵原子取代之芳基胺基甲醯基， 視需要經一個或多個低碳烷基取代之胺基甲醯基， 視需要經一個或多個低碳烷基取代之胺硫甲醯基， 視需要經一個或多個低碳烷基取代之胺基， 現需要經一個或多個鹵原子取代之低碳烷基， 視需要經一個或多個鹵原子取代之低碳烷氧基， 硯需要經一個或多個_原子取代之低碳烷氧基低碳烷氧 基， 硯需要經一個或多個_原子取代之低碳烯氧基， 硯=要經一個或多個!|原子取代之低碳炔氧基， 硯=要經一個或多個商原子取代之低碳烷醯基胺基， 硯，要經一個或多個鹵原子取代之低碳烷硫基， 硯=要經一個或多個鹵原子取代之低碳烯硫基， 硯，要經一個或多個由原子取代之低碳炔硫基， 現2要經一個或多個鹵原子取代之低碳烷基亞磺醯基， 彳見=要經一個或多個_原子取代之低碳烯基亞磺醯基， t =要經一個或多個齒原子取代之低碳炔基亞磺醯基， 而要經一個或多個_原子取代之低碳烷基磺醯基， 9 318750 200804250 .視需要經-個或多個_原子取代之低碳稀基石黃酿基， •視需要經-個或多個齒原子取代之低碳块基石黃酿基， 視需要經-個或多個齒原子取代之低碳烧氧基低碳院硫 基，或 -G-E表示之基團 (其中G表示氧原子、硫原子、s〇或s〇2，以及 、E表示芳基或雜環基，且該芳基或該雜環基可經一個 或多個選自於下列基團所組成之組群之取代基取代：⑴ 鹵原子’ (2)視需要經一個或多個鹵原子取代之低碳烷基， (3)視需要經-個或多個子取代之低碳烧氧基，⑷視需 要經一個或多個_原子取代之低碳烷硫基，（5)視需要經一 個或多個齒原子取代之低碳烷基亞磺醯基，（6)視需要經— 個或多個鹵原子取代之低碳烷基磺醯基，（7)氰基，及（8) 硝基）， Q表示視需要經一個或多個取代基取代之芳基，或視 需要經一個或多個取代基取代之雜環基，以及 m表示1至5之整數（限制條件為當❿為2至5之整 數日守’各個R7可相同或相異）。 [2]如第[1]項之苯曱醯脲化合物，其中R7為鹵原子， 視需要經一個或多個鹵原子取代之低碳烷氧羰基， 視需要經一個或多個鹵原子取代之低碳烷基， 視需要經一個或多個_原子取代之低碳烷氧基， 視需要經一個或多個鹵原子取代之低碳烷氧基低碳烷氧 基， 10 318750 200804250 視需要經-個或多㈣原子取代之低碳烧氧基低碳烧硫 基， 視需要經一個或多個鹵原子取代之低碳烯氧基， 視需要經一個或多個崮原子取代之低碳炔氧基， 視需要經一個或多個_原子取代之低碳烷硫基， 視需要經一個或多個齒原子取代之低碳烯硫基， 視需要經一個或多個鹵原子取代之低碳炔硫基， 視需要經一個或多個鹵原子取代之低碳烷基亞磺醯基， 視需要經一個或多個卣原子取代之低碳烯基亞磺醯基， 視需要經一個或多個齒原子取代之低碳炔基亞磺醯基， 視需要經一個或多個鹵原子取代之低碳烷基磺醯基， 視需要經一個或多個齒原子取代之低碳烯基磺醯基， 視需要經一個或多個鹵原子取代之低碳炔基磺醯基，或 _G-E表示之基團 (其中G為氧原子、硫原子、s〇或s〇2，以及 E為芳基或雜環基，該芳基或該雜環基可經一個或多 個選自於下列基團所組成之組群之取代基取代··（1)鹵原 子，（2)視需要經一個或多個鹵原子取代之低碳烷基，（3) 視需要經一個或多個鹵原子取代之低碳烷氧基，（4)視需要 經一個或多個_原子取代之低碳烷硫基，（5)視需要經一個 或多個鹵原子取代之低碳烷基亞磺醯基，（6)梘需要經一個 或多個鹵原子取代之低碳烷基磺醯基，（7)氰基，及（8)硝 基）。 [3]如弟[1]或[2]項之苯甲酿脈化合物， 11 318750 200804250 其中R1為氫原子， ’視需要經一個或多個取代基取代之低碳烷基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之芳基低碳烷基， 視需要經一個或多個取代基取代之低碳烷氧基低碳烷基， 視需要經一個或多個取代基取代之芳氧基低碳烷基， 視需要經一個或多個取代基取代之低碳烷醯基， 視需要經一個或多個取代基取代之低碳烷硫基低竣烷基， 視需要經一個或多個取代基取代之低碳烷基亞磺醯基低碳 烷基， 視需要經一個或多個取代基取代之低碳烷基磺醯基低碳烷 基，或 視需要經一個或多個取代基取代之一_或二_(低碳烷基）胺 基低峡院基。 [4] 如第[1]至[3]項中任一項之苯曱醯脲化合物，其中 R為視需要經一個或多個鹵原子取代之C1 _C4伸烷基。 [5] 如第[1]至[4]項中任一項之苯甲醯脲化合物，其中χ 及Y為氧原子，及 A為OR3表示之基團 (其中R3為視需要經一個或多個取代基取代之C〗_c3烧基， 視需要經一個或多個取代基取代之低碳稀基， 視需要經一個或多個取代基取代之低碳块基， 視需要經一個或多個取代基取代之低碳烷醯基，或 318750 12 200804250 視需要經-個或多個取代基取代之芳基低碳烧基）。 [6] 如第[1]至[5]項中任一項之苯甲醯脲化合物，其中a 為OR3表示之基團 (其中R為視需要經一個或多個取代基取代之。^。烷基， 視需要經-個或多個取代基取代之低碳烧酿基，或 視需要經:個或多個取代基取代之芳基低碳烧基）。 [7] 如第[1]至[4]項中任一項之苯曱醯脲化合物，其中X 及Y為氧原子，及 A為S(0)nR4表示之基團 (其中R4為視需要經一個或多個取代基取代之^_匸3烷基， 視需要經-個或多個取代基取代之低碳烯基， 視需要經-個或多個取代基取代之低碳块基，或 視需要經一個或多個取代基取代之芳基，及 η為〇至2之整數 [8] 如第[1]至[4]項中任_項之苯曱酿脲化合物，其中χ 及Υ為氧原子，及 Α為NR5R6表示之基團 (其中R5及R6各自獨立地為 視需要經—個或多個取代基取代之C1-C3烧基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經-個或多個取代基取代之低碳快基， 視需要經一個或多個取代基取代之芳基， 與R6^其末端共同結合來與氮原子共同形成視需要 ’、有另個氮原子、氧原子或硫原子作為環組成原子之3 318750 13 200804250 員至7員含氮雜環）。 [9] 如第[1]至[8]項中任一項之苯曱醯脲化合物，其中q 為視，要經-個或多個選自下列所組成之組群之取代基取 代之苯基：（l)i原子，（2)視需要經一個或多個鹵原子取代 之低碳烷基，及（3)視需要經一個或多個鹵原子取代之低碳 烧氧基，或 視需要經一個或多個選自下列所組成之組群之取代基取代 之方香族單壤雜環基：（1)鹵原子，（2)視需要經一個或多個 鹵原子取代之低碳烷基，及視需要經一個或多個鹵原子 取代之低碳烷氧基。 [10] 如第[1]至[8]項中任一項之苯曱醯脲化合物，其中 Q為經一個或多個鹵原子取代之苯基，或經一個或多個處 原子取代之芳香族單環雜環基。 [11] 如第[1]項之苯甲醯脲化合物，其中X及γ為氧原 子， R為鼠原子， 視需要經一個或多個取代基取代之低碳烷基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之芳基低碳烷基， 視需要經一個或多個取代基取代之低碳烷氧基低碳烷基， 視需要經一個或多個取代基取代之芳氧基低碳烷基， 視需要經一個或多個取代基取代之低碳烷硫基低碳烷基， 視需要經一個或多個取代基取代之低碳烷基亞磺醯基低碳 14 318750 200804250 烷基， 視需要經一個或多個取代基取代之低碳烷基磺醯基低碳烷 基， 視需要經一個或多個取代基取代之一-或二-(低碳烷基）胺 基低碳烧基，或 視需要經一個或多個取代基取代之低碳烷醯基， R2為亞甲基、伸乙基或三亞曱基， A為： (1) 〇R3表示之基團 (其中R3為視需要經一個或多個取代基取代之Ci_c3烧基， 視需要經一個或多個取代基取代之低碳焼醯基，或 視需要經一個或多個取代基取代之芳基低碳烷基）， (2) S(0)nR4表示之基團 (其中R4為視需要經一個或多個取代基取代之烷 基，及 η為0至2之整數），或 (3) NR5R6表示之基團 (其中R5及R6各自獨立地為視需要經 代之C1-C3烷基，或 一個或多個取代基取Wherein the standing position represents an oxygen atom, a sulfhydryl group, 318750 5 200804250 a cyano group, a lower alkyl sulfonyl group substituted with one or more substituents, optionally substituted with one or more substituents. A sulfonyl group, a lower alkylcarbonylthio group substituted by one or more substituents, optionally a lower alkoxycarbonylthio group substituted with one or more substituents, optionally one or more a substituent-substituted aryloxycarbonylthio group, optionally substituted with one or more substituents for one- or di-(lower alkyl)amine phthalocyanine, optionally substituted with one or more substituents a mono- or di-(aryl)aminosulfonyl, a lower alkyl substituted by one or more substituents, optionally substituted with one or more substituents, as needed, a lower alkynyl group substituted with one or more substituents, optionally substituted with one or more substituents, a lower cycloalkyl group, optionally substituted with one or more substituents, an aryl lower alkyl group, An aryl group substituted with one or more substituents, optionally a lower alkoxy alkoxy lower alkyl substituted with a plurality of substituents, optionally substituted with one or more substituents, an aryloxy lower alkyl group, optionally substituted with one or more substituents Lower alkylene, lower alkyl sulfinyl lower alkyl substituted by one or more substituents, optionally substituted with one or more substituents, lower alkyl sulfonyl lower carbon An alkyl group, optionally substituted with one or more substituents, one or a di-(lower alkyl)amine 6 318750 200804250 based on a lower carbonyl group, optionally substituted with one or more substituents a aryl arylcarbonyl group optionally substituted with one or more substituents, optionally an aryloxycarbonyl group substituted with one or more substituents, optionally substituted with one or more substituents, an aryl lower alkane An oxycarbonyl group, optionally substituted with one or more substituents, an amine thiol group substituted with one or more substituents, optionally substituted with one or more substituents Alkoxyoxalyl, optionally substituted with one or more substituents a lower alkoxyalkanyl, an aryloxyoxalate substituted with one or more substituents, optionally substituted with one or more substituents, optionally one or more a substituent substituted by a lower alkoxy alkoxy group, optionally substituted with one or more substituents, an aryl group optionally substituted by one or a substituent; 5 carbon alkoxy, optionally One or more substituent-substituted amine groups, or a heterocyclic group substituted with one or more substituents as needed, and R2 represents a low-carbon stretching group substituted with one or more self-atoms, as shown in Table 7A. · (1) A group represented by OR3 (wherein R3 represents a C 3 thiol group which is optionally substituted by one or more substituents, ^ a low carbon which is substituted by one or more substituents as required, A, 318750 7 2〇 〇8〇425〇, a lower alkynyl group to be substituted by one or more substituents, a lower alkyl alkano group substituted by one or more substituents, an aryl group substituted with one or more substituents , or = aryl lower alkane (2)s substituted with one or more substituents (〇W represents the group R The table disregards the need for an alkyl group substituted with one or more substituents = a lower alkenyl group to be substituted with one or more substituents, ^ = a lower alkynyl group to be substituted with one or more substituents, see: An aryl lower alkyl group to be substituted with one or more substituents, or an aryl lower alkyl group substituted with one or more substituents, and n represents an integer of 0, 1 or 2), or (3) NR5R6 a group represented by wherein R5 and R6 each independently represent a C1-C3 alkyl group substituted with one or more substituents, and a lower alkenyl group which is substituted by one or more substituents , a non-carbon-substituted one or more substituents substituted with a lower alkynyl group, and an aryl group substituted with two or more substituents, an aryl lower alkane substituted with one or more substituents The two R i4R may be bonded together at their ends to form a nitrogen atom together with two nitrogen atoms, an oxygen atom or a sulfur atom as a ring constituent atom, and a R 7 table. Not 13⁄4 atoms, Shi Xiaoji 3 ^750 8 200804250 Sulfhydryl, • An aryl lower alkoxy group optionally substituted with one or more halogen atoms a lower alkoxyalkyl group substituted by one or more halogen atoms, optionally substituted with one or more halogen atoms, or an aryl group substituted by one or more halogen atoms, if desired An aryl lower alkoxycarbonyl group substituted with one or more halogen atoms, optionally substituted with one or more halogen atoms, an arylaminocarbenyl group, optionally substituted with one or more lower alkyl groups Aminomethylmercapto, optionally substituted with one or more lower alkylaminothiocarbazides, optionally substituted with one or more lower alkyl groups, now requires one or more halogen atoms a substituted lower alkyl group, preferably a lower alkoxy group substituted by one or more halogen atoms, a lower alkoxy a lower alkoxy group substituted by one or more _ atoms, Or a lower carbamoyloxy group substituted by a plurality of _ atoms, 砚 = a lower alkynyloxy group substituted by one or more !| atoms, 砚 = a lower alkyl alkanoylamine substituted with one or more quotient atoms a group of lower alkyl alkane groups substituted by one or more halogen atoms, 砚 = one a lower arylthio group substituted by a plurality of halogen atoms, hydrazine, a lower alkynylthio group substituted by one or more atoms, and a lower alkyl sulfinyl group substituted by one or more halogen atoms , 彳 = = low-carbon alkenyl sulfinyl group substituted by one or more _ atoms, t = low carbynyl sulfinyl group to be substituted by one or more tooth atoms, and one or more _Atom substituted lower alkyl sulfonyl group, 9 318750 200804250 . A low carbon rare earth basal substituted with one or more _ atoms, optionally substituted with one or more tooth atoms A low carbon agglomerate base, a low carbon alkoxy low carbon thio group substituted with one or more tooth atoms, or a group represented by -GE (wherein G represents an oxygen atom, a sulfur atom, or a s Or s〇2, and E represents an aryl or heterocyclic group, and the aryl group or the heterocyclic group may be substituted with one or more substituents selected from the group consisting of: (1) a halogen atom ' (2) a lower alkyl group substituted by one or more halogen atoms, (3) a low-carbon alkoxy group substituted by one or more sub-substitutes as needed, (4) as needed a lower alkylthio group substituted by one or more _ atoms, (5) a lower alkyl sulfinyl group substituted by one or more tooth atoms, (6) optionally one or more halogens An atom-substituted lower alkylsulfonyl group, (7) a cyano group, and (8) a nitro group, Q represents an aryl group optionally substituted with one or more substituents, or optionally substituted by one or more A heterocyclic group substituted with a group, and m represents an integer of 1 to 5 (with the proviso that when ❿ is an integer of 2 to 5, each R7 may be the same or different). [2] The benzoquinone compound according to [1], wherein R7 is a halogen atom, optionally substituted with one or more halogen atoms, a lower alkoxycarbonyl group, optionally substituted by one or more halogen atoms a lower alkyl group, a lower alkoxy group substituted by one or more _ atoms, optionally substituted with one or more halogen atoms, a lower alkoxy a lower alkoxy group, 10 318750 200804250 a low-carbon alkoxy-low-carbosulfide group substituted with one or more (iv) atoms, a lower aryloxy group substituted by one or more halogen atoms, if desired, a lower alkyne substituted by one or more halogen atoms An oxy group, a lower alkylthio group substituted by one or more _ atoms, optionally a lower olefin thio group substituted with one or more dentate atoms, optionally substituted with one or more halogen atoms Alkynylthio, a lower alkyl sulfinyl group substituted with one or more halogen atoms, optionally substituted with one or more halogen atoms, a lower alkylene sulfinyl group, optionally one or more a lower alkynyl sulfinyl group substituted by a tooth atom, optionally subjected to one or more halogens a sub-substituted lower alkylsulfonyl group, a lower alkenylsulfonyl group substituted with one or more tooth atoms, optionally a lower alkynylsulfonyl group substituted with one or more halogen atoms, or a group represented by _GE (wherein G is an oxygen atom, a sulfur atom, s〇 or s〇2, and E is an aryl group or a heterocyclic group, and the aryl group or the heterocyclic group may be selected from one or more selected from Substituents of the group consisting of: (1) a halogen atom, (2) a lower alkyl group substituted by one or more halogen atoms, and (3) one or more halogens as needed An atom-substituted lower alkoxy group, (4) a lower alkylthio group substituted by one or more _ atoms, and (5) a lower alkyl sulfinium substituted by one or more halogen atoms as needed. a group, (6) a lower alkyl sulfonyl group substituted with one or more halogen atoms, (7) a cyano group, and (8) a nitro group. [3] Benzo [1] or [2] benzoic vein compound, 11 318750 200804250 wherein R1 is a hydrogen atom, 'as needed, substituted with one or more substituents, lower alkyl, as needed a lower alkenyl group substituted with a plurality of substituents, optionally a lower alkynyl group substituted with one or more substituents, optionally an aryl lower alkyl group substituted with one or more substituents, optionally a lower alkoxy alkoxy lower alkyl substituted by a plurality of substituents, optionally substituted with one or more substituents, an aryloxy lower alkyl group, optionally substituted with one or more substituents A fluorenyl group, a lower alkylalkylthiononylalkyl group substituted with one or more substituents, optionally substituted with one or more substituents, a lower alkyl sulfinyl lower alkyl group, if desired a lower alkylsulfonyl lower alkyl substituted by one or more substituents, or optionally substituted with one or more substituents, one or more bis(lower alkyl)amine groups . [4] The benzoquinone compound according to any one of [1] to [3] wherein R is a C1 - C4 alkyl group which is optionally substituted with one or more halogen atoms. [5] The benzamidine compound according to any one of [1] to [4], wherein χ and Y are oxygen atoms, and A is a group represented by OR3 (wherein R3 is one or more as needed) Substituted by a C _c3 alkyl group, a low carbon dilute group substituted with one or more substituents, optionally substituted with one or more substituents, or one or more Substituted lower alkanealkyl, or 318750 12 200804250 aryl low carbon alkyl substituted with one or more substituents as desired). [6] The benzamidine compound according to any one of [1] to [5] wherein a is a group represented by OR3 (wherein R is optionally substituted by one or more substituents. An alkyl group, preferably a low carbon alkyl group substituted with one or more substituents, or an aryl lower carbon group substituted with one or more substituents as needed. [7] The benzoquinone compound according to any one of [1] to [4] wherein X and Y are oxygen atoms, and A is a group represented by S(0)nR4 (wherein R4 is as needed) a lower alkyl group substituted with one or more substituents, optionally substituted with one or more substituents, or a lower carbon block substituted with one or more substituents, Or an aryl group substituted with one or more substituents as necessary, and η is an integer of 〇 to 2 [8] such as the benzoquinone-forming urea compound of any one of items [1] to [4], wherein Υ is an oxygen atom, and hydrazine is a group represented by NR5R6 (wherein R 5 and R 6 are each independently a C 1 -C 3 alkyl group substituted by one or more substituents, optionally substituted with one or more substituents a lower alkenyl group, a lower carbon group optionally substituted with one or more substituents, an aryl group substituted with one or more substituents as needed, and a combination of R6 and its terminal to form a nitrogen atom Depending on the need, there is another nitrogen atom, oxygen atom or sulfur atom as the ring constituent atom. 3 318750 13 200804250 member to 7 member nitrogen-containing heterocyclic ring. [9] As in any of items [1] to [8] item a benzoquinone compound, wherein q is a phenyl group substituted with one or more substituents selected from the group consisting of: (1) an atom, (2) one or more as needed a lower alkyl group substituted with a halogen atom, and (3) a lower alkoxy alkoxy group optionally substituted with one or more halogen atoms, or a substituent selected from the group consisting of one or more selected from the group consisting of Substituted aromatic singular monocyclic heterocyclic group: (1) a halogen atom, (2) a lower alkyl group optionally substituted with one or more halogen atoms, and a low carbon substituted with one or more halogen atoms as needed [10] The benzoquinone compound according to any one of [1] to [8] wherein Q is a phenyl group substituted by one or more halogen atoms, or one or more An atom-substituted aromatic monocyclic heterocyclic group. [11] The benzamidine compound according to [1], wherein X and γ are oxygen atoms, and R is a mouse atom, optionally substituted by one or more substituents. a lower alkyl group, a lower alkenyl group substituted by one or more substituents, optionally substituted with one or more substituents, a lower alkynyl group, An aryl lower alkyl group substituted with one or more substituents, optionally substituted with one or more substituents, a lower alkoxy a lower alkyl group, optionally substituted with one or more substituents Olelow lower alkyl, lower alkyl alkoxy lower alkyl substituted by one or more substituents, optionally substituted with one or more substituents, lower alkyl sulfinyl lower carbon 14 318750 200804250 Alkyl, lower alkyl sulfonyl lower alkyl optionally substituted with one or more substituents, optionally substituted by one or more substituents - or di-(lower alkyl) An amine-based lower alkyl group, or a lower alkyl alkano group substituted by one or more substituents, R2 is a methylene group, an ethylidene group or a trianthylene group, and A is: (1) a group represented by 〇R3 a group (wherein R3 is a Ci_c3 alkyl group optionally substituted by one or more substituents, optionally substituted with one or more substituents, or substituted with one or more substituents as needed a lower alkylene group, (2) a group represented by S(0)nR4 (wherein R4 is one or more substituents as needed) Or an alkyl group, and η is an integer of 0 to 2), or (3) a group represented by NR5R6 (wherein R 5 and R 6 are each independently an optionally substituted C 1 -C 3 alkyl group, or one or more substitutions) Base

視需要經一個或炙 一個或多個鹵原子取代之 之低碳烷氧羰基， 318750 15 200804250 視需要經-個或多個齒原子取代之低碳烧基， 視需要經-個或多個齒原子取代之低碳院氧基， =需要經-個或多㈣原子取代之低碳絲基低碳院氧 暴， 視f要經—個或多個歯原子取代之低碳烧硫基， 、見而要、、二個或多個齒原子取代之低碳烯硫基， 視需要經—個或多個南原子取代之低碳炔硫基， =要經—個或多㈣原子取代之低碳縣亞_基， ^要經—個或多㈣原子取代之低碳烯基亞磺酿基， ^要經—個或多㈣原子取代之低碳絲續醯基， ^要經—個以㈣料取狀低㈣基續感基， ㈣多㈣原子取代之低碳烧氧基低碳烧硫 I ’或 -G_E表示之基團 (其中G為氧原子或硫原子，以及 2視需要經-個或多個選自下列基團所組成之組群之取 戈之方基或雜環基：（1)i原子，及（2)視需要經一個 戍夕個自原子取代之低碳院基）， 卜Q為2,6-二氟苯基、2'氣_6_氟苯基、2,6_二氯苯基、 心比咬-2-基、或3,5_二氣咐咬_4_基，及 m為1至4之整數（限制條件為當m為2至4 日守，各個R7可相同或相異）。 I數 子，Π2]如第[1]項之苯甲醯脲化合物，其中又及γ為氧原 318750 16 200804250 R1為氫原子， 視需要經一個或多個取代基取代之低碳烷基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之低碳烷氧基低碳烷基， 視需要經一個或多個取代基取代之芳氧基低碳烧基， 視需要經一個或多個取代基取代之低碳烷硫基低碳烷基， 視需要經一個或多個取代基取代之低碳烷基磺醯基低碳烷 基，或 視需要經一個或多個取代基取代之低碳烷醯基， R2為亞曱基、伸乙基或三亞曱基， A為· (1) OR3表示之基團 (其中R3為視需要經一個或多個取代基取代之Ci_c3烧基， 視需要經一個或多個取代基取代之低碳烧醯基，或 視需要經一個或多個取代基取代之芳基低竣烧基）， (2) S(〇)nR4表示之基團 (其中R4為視需要經一個或多個取代基取代之C1_C3院 基，及 ^ η為0至2之整數），或 (3) NR5R6表示之基團 (〃中R及R各自獨立地為視需要經一個或多個取代義取 代之C1-C3烷基，或 土 R5及R6於其末端共同結合來與氮原子共同形成視需 318750 17 200804250 要具有另-個氮原子、氧原子或硫原子作為環組成原子之 3員至7員含氮雜環）， R7為ή原子， 視而要經一個或多個鹵原子取代之低碳烷氧羰基， 視需要經-個或多㈣原子取代之低碳烧基， 視需要經-個或多個_原子取代之低碳烧氧基， 視需要經-個或多個幽原子取代之低碳職基低碳烧氧 基， 視需要經-個或多個^原子取代之低碳烧硫基， 視需要經-個或多個由原子取代之低碳烯硫基， 視需要經—個或多個#原子取代之低碳炔硫基， 視需要經—個或多個齒原子取代之低碳烧基亞續醯基， 視需要經—個或多個自原子取代之低石炭烯基亞石黃醯基， 視需要經—個或多個自原子取代之低碳㈣磺酸基， =需要經-個或多㈣原子取代之低碳烧氧基低礙烧硫 基’或 -G-E表示之基團 (其中G為氧原子或硫原子，以及 Ε為芳基^ 基，且該芳基或雜環基可經 =自下列基團所組成之組群之取代基取代：⑽原y (2)視需要經-個或多個鹵原子取代之低碳烧基）， Q為2,6-二氟苯基、2'氯_6_氟苯基、2,6_二氯苯基、 m2-基、或3,5-二氯。比啶_4_基，及 m為！至4之整數(限制條件為當瓜為2至4之整數 318750 18 200804250 時’各個R7可相同或相異）。 —' [3]種蟲告控制劑，包含如第[1]至[12]項中任一項 疋義之苯甲醯脲化合物或其鹽作為活性成分。 人[]種如第⑴至[12]項中任一項定義之苯甲醯脲化 口或其鹽之用途，係用於蟲害防治。 [15]一種蟲害或植物寄生蟲害之防治方法，包含施用 =量之如第⑴至[12]項中任—項定義之苯甲_化合物 或其鹽至害蟲或害蟲棲息地。 【實施方式】 後文將說明此處使用之涵蓋於本發明之範圍之各種定 義之較佳實例及特定實例之細節。 *「低碳」一詞除非另行陳述，否則係指含6個或更少 個石反，子之基團，且較佳為含4個或更少個礙原子之基團。 「一個或多個」之較佳實例係指1至ό個，且較佳為 1至4個。 _ 低反烧基基團」丨「低石炭烧基」之較佳實例包括直 鏈或分支C1-C6烷基，例如甲基、乙基、正丙基、異丙基、 正丁基、、異丁基、第二丁基、第三丁基、正戊基、第二土戊 基、異戊基、新戊基、正己基、異己基等。 「C1-C3烷基基團」及「C1_C3烷基」之較佳實例包 括直鏈或分支C1-C3烷基，具體言之為曱基、乙基、正丙 基及異丙基。 「低碳烯基」之較佳實例包括直鏈或分支C 2 _ c 6烯 基，例如乙烯基、烯丙基、異丙烯基、異丁烯基、I·曱基 318750 19 200804250 烯丙基、2_戊烯基、2-己烯基等。 ’例如乙诀 戊炔基、 「低碳炔基」之較佳實例包括C2-C6炔基 基、2_丙炔基、丨_丙炔基、2_丁炔基、弘丁炔基、 3-己炔基等。 方基基團」及「芳基」之較佳實例包括c6_c 香族烴基，諸如視需要經低錢絲狀苯基（例如苯其、 三甲苯基、二甲苯基、甲苯基等）、蔡基、惠土 苯基及萘基，且此等「芳基基團」及「芳基」可具 取代基，諸如低碳烷基、齒原子、芳基等。 I田 「=」及「處原子」之實例包括氟、 「低碳絲隸目」及、 新丁/Λ、異丁氧基、第三丁氧基、戊氧基、 :戊=新=、己氧基、異己氧基等;更 α基基、丙氧基、丁氧基、戊氧基、己氧基、及異 低心基」之較佳實例包括 酉遊基，例如乙酿基、2_甲基乙酿基、〜甲灵支燒 丙酿基、丁酸基、異丁酸基、戊醯基、22 一二基、 己醯基等。 ’―甲基丙醯基、 「^石 炭環烧基」之較佳實例包括 如裱丙基、環丁其、庐Λ、# 匕〇況基，諸 衣丁基、％戊基、環己基等。 柄^基」之實例包括除了作為組成環之原 子外’含有-種或兩種選自於氮原子、氧二 318750 20 200804250 1至4個且較佳1至3個雜原子之5 „ 至10員單環至三環雜環基 \至14員，較佳5員 體言之為： 仏為早每或雙環雜環基，具 5員雜環基，諸如2-咦A茸 3- 蝴、2,洛基、比：二3_嗔吩基…夫喃基、 2·坐基、，唑基、5,唑：、3:二：J、3_°比咯啶基、 異嗜唾基、2+坐基、线、51唾基、4_詞唾基、 4- 異噻唑基、5_異噻唑美、1基5·°泰唑基、3-異噻唑基、 2-吡唑啶基、3_吡唑啶：：比唑基、“比唑基、5_吡唑基、 1— 基、 唑_5_基等， —上_5_基、1H-四唑-5_基、2H四 6員雜環基，祛‘ 〇 I氧化〜U定基、队氧化=基、3,基、“匕。定基、 2- t定基、4_料基卜^基、N•氧化定基、 化_4+定基、队氧：；5 :定其基定基、Ν-氧 2- 嗎啉基、3_，啉 …基、2_硫嗎啉基、3_硫嗎啉基、 硫旅喃基基、3·㈣基、4㈣基、2_ 3- 购，4侧基、2二、4_^喃基、LB，井基、 ^Π^，3-1,2 4--n#^1，4&quot;〇in^ ' ^ 2- 2_1，_基、：！：其5_1，2,4_三哄基、6，^^ L井基、井基、4·°荅·、2“比哄基、N-氧化 土 乳化-4-塔啡基等，以及 D木基、6-吲哚基、7·吲哚基、2_苯并呋喃基、 318750 21 200804250 3- 苯并，喃基、4-苯并咬喃基、夫喃基、6_苯并咬鳴 基、7-本开㈣基、塞絲、4·苯并㈣基、苯并 逢唾基、6_苯并㈣基、7_苯并㈣基、2_苯并^坐基、 4- 本并％唑基、5_苯并噚唑基、6_苯并噚唑基、苯并噚唑 基、2·苯并味唾基、4·苯并咪唾基、5_苯并咪峻基、卜苯并 口米峻基、7_苯并㈣基、2_料基、3_口㈣基、4_㈣基、 5- 喹啉基、6-喹啉基、7_喹啉基、8_喹啉基、異喹啉基、 3-異喹啉基、4-異喹啉基、5_異喹啉基、6_異喹啉基、7_ 異喹啉基、8-異喹啉基、丨_呔哄基、4_呔畊基、5_呔畊基、 6·呔哄基、7-呔哄基、2-喹唑啉基、4_喹唑啉基、喹唑啉 基、6-喹唑啉基、7_喹唑啉基、8_喹唑啉基、2_喹喏啉基、 3- 喹％啉基、5_喹喏啉基、6_喹喏啉基、7-喹喏啉基、8_ 喹喏啉基、：U吲啡基、2_吲哄基、弘吲哄基、5_吲哄基、6_ 吲哄基、7-吲哄基、8_吲哄基、^喹啡基、喹啡基、3_ 喹哄基、4-喹哄基、6-喹哄基、7_喹畊基、喹哄基、9_ 口圭哄基、2-1，8-嘹啶基、3-1，8-嘹啶基、4_1，8_嘹啶基、“ 一本并吱喃基、2-二苯并吱喃基、3-二苯并π夫喃基、二 苯并呋喃基、1-咔唑基、2-咔唑基、3-咔唑基、4-咔唑基、 1- 吖啶基、2_吖啶基、弘吖啶基、4-吖啶基、9-吖啶基、 非σ疋基、2-啡啶基、3-啡啶基、4-啡啶基、5-啡啶基、6-非。疋基、7-啡啶基、8-啡啶基、9-啡啶基、ι_咬;基、3-喷基、 4- 喷基、5-喷基、6·喷基、7_喷基、8_喷基、啡噻哄基、 2- 啡噻哄基、3-啡噻哄基、4_啡噻啡基、啡噻哄基、7_ 啡噻哄基、8-啡噻哄基、9-啡噻哄基、^啡噚畊基、2_啡_ 22 318750 200804250 哄基、3-啡嗜畊基、4啡 ㈣_基、9•调畊基/。基6為縣、7·㈣啡基、 至於「雜環基」，其令以除 氧原子、硫原人京子外，含有選自於由 之5員、二二=所組成之組群之丨至3個雜原子 「‘:或7 (知佳為5員或6員)雜環基為佳。 子、氧原子及硫原子所…Γ 了反原子外含有由氮原 g , ^ _ 所成之組群之1至3個雜原子之5 美\ ^雜每基’具體言之為諸如各唆基、24略唆 基、3-吡咯啶基、土 2比各疋 3- 吡唑啡其4 土、仁咪唑啉基、2-吡唑畊基、 4- 二;4哄基、…基、2-°底絲、—、 辰疋基、2-哌啶基、3_哌啶基、4啶 娘畊基、嗎琳基、2_嗟 ▲卜辰哄基、2- 基、4+定基、Μ喃基二Si ^定基、H定 3,咯基、嗒啡A 土 ·&quot;、哌畊基、2·嘧啶基、 幵土 兴噻唑基、及異嗜唑美，胪社 為6員含氮雜環基（例如口比咬基等）等。 ' 如，它較佳實例包括「芳香族雜環基」，例 選自於Cr原子之碳原子外，含有-種或兩種 :自於乳原子、氧原子及硫原子之i至4個且較 個雜原子之5員至14員，更佳5員至 :衰基’更佳為單環或雙環雜環基，具體言之為：二;： 基、1-吡咯基、2-吡咯其^ L , ^ 南 5^d /各基、弘吡咯基、2-噚唑基、4_噚唑基、 義' :唑基、4_異噚唑基、5-異噚唑基、2_噻唑 基…塞唾基…塞哇基、3_異㈣基、4_異嗟唾基、％ 318750 23 200804250 異°塞°坐基、3-吼。坐基、4-°比峻基、5-吼嗤基、2-味嗤基、4-咪唑基、5-咪唑基、1H-1，2,3-三唑-4-基、1H-1，2,3-三唑-5-基、1，2,4 -三 ϋ坐-3-基、1，2,4 -三 ϋ坐-5 -基、5·1Η -四 ϋ坐-5-基、 5-2Η-四唑-5-基等， 6員芳香族雜環基，諸如2 -吼σ定基、3 -啦σ定基、4 -。比 ϋ定基、Ν -氧化-2 -吼σ定基、Ν -氧化-3 -ϋ比σ定基、Ν -乳化-4 -ϋ比 σ定基、2-嘴σ定基、4-嘴σ定基、密咬基、Ν-氧化-2-嘴σ定基、 Ν-氧化-4-嘧啶基、Ν-氧化-5-嘧啶基、3-1，2,4-三畊基、 5-1,2,4-三畊基、6-1，2,4-三畊基、2-1,3,5-三畊基、3-嗒哄 基、4_ °备啡基、2- 口比哄基、N-乳化-3 -备啡基、N-乳化-4_ 嗒畊基等，以及 雙環或三環稠合芳香族雜環基，諸如2 -苯并吱喃基、 3 -苯弁咬喃基、4 -苯弁咬喃基、5 -苯弁咬σ南基、6 -苯弁咬喃 基、7-苯并呋喃基、2-苯并噻唑基、4-苯并噻唑基、5-苯并 噻唑基、6-苯并噻唑基、7-苯并噻唑基、2-苯并噚唑基、 4- 苯并噚唑基、5-苯并噚唑基、6-苯并噚唑基、7-苯并噚唑 基、1-苯并味σ坐基、2 -苯并味ϋ坐基、4 -苯并1:7米嗤基、5 -苯并 咪唑基、6-苯并咪唑基、7-苯并咪唑基、2-喹啉基、3-喹啉 基、4-啥|基、5-啥琳基、6-啥嘛基、7-嘻淋基、8-嗟琳基、 1-異喹啉基、3-異喹啉基、4-異喹啉基、5-異喹啉基、6-異啥琳基、7 -異啥琳基、8 -異ρ奎琳基、1 -吹D井基、4 -吹哄基、 5- 吹哄基、6-吹哄基、7-吹D井基、2-啥峻琳基、4-喧嗤淋基、 5 - 口奎嗤淋基、6 -啥嗤琳基、7 -啥嗤琳基、8 -啥嗤淋基、2 -喧σ若琳基、3-啥。若琳基、5-啥。若琳基、6-嗟嗔琳基、7-喧嗜 24 318750 200804250 嚇基、8 ·啥嗓咐、其 ，井基、“引啡基、':井:、、2:吲畊基、3_吲啡基、5_ 3-1,8-嘹啶基、418 土、8_°引11井基、2-1,8-瞭啶基、 吱鳴基〜笨并:二定基、i·二苯并咬喃基、二苯并 冲坐基、3十坐基、南4基卡、丄4其二苯并咬喃基、〜坐基、 十定基、“丫。定基、9个定:了咬基、2十定基、3_ 定基、2+定基、3- 啡咬基、！·啡售-基、二二美,、定基、9_ 基、6-啡噻D井其? t _ 4啡基、3-啡噻畊基、4-啡噻畊 啡噚畊基、7_啡嗜 -非^哄基、4-啡噚哄基、6_ 「芳香族雜環基^8/#啊基、9_啡，井基等。 選自由氮原子、氧佳實例包括除了碳原子外含有 雜原子之5員或原子所組成之組群之…個 3♦分基、基、3：；具諸如 &gt;塞吩基、 + ^ ^ ^ 暴 4比啶基、2-呋喃基、3_ 呋喃基、哌啡基、2-嘧啶基、3 ., 唾基、及3-異嗜唾基，m /各基、3_。合哄基、3_異嗟 t定基等）等。1 貞含氮芳香族雜環基（例如 「雜環基」之更佳實例包括「芳香族單環雜環基」，例 如5員芳香族單環雜環基，諸如2-吱喃基、3“夫喃基、2_ 噻吩基、3-噻吩基、2_吡咯基、3_吡咯基、2_噚唑基、4_ 嗜唾基、5♦錄、3_異啊基、4_詞啥基、5_謂唾基、 2_噻唑基、4_噻唑基、5_噻唑基、3_異噻唑基、‘異噻唑^、 5-異嗔峻基、2-味唾基、4-口米。坐基、5-咪唾基、二二唾‘、' 318750 25 200804250 4-吡唑基、5-吡唑基、1，2,3-曙二唑-4-基、1，2,3-噚二唑-5-基 1 ’ 2 ’ 4 - 二。坐-5 -基、1，2，4 - Π等二。坐-3 _ 基、1，3，4 - tl 等二唾 -2-基、呋咕基、噻二唑_4_基、噻二唑_5_基、 1，2,4-σ塞一唾-3-基、1，2,4-嗟二嗤-5-基、1，3,4-嗟二 π坐-2-基、1H_1，2,3-三唑-4_基、1Η_1，2,3-三唑-5-基、ih-1，254- 三嗤-3-基、1H_四唑_5-基等，以及 6員方香族單環雜環基，諸如2 -吼唆基、3 -。比咬基、 4-吼啶基、2-嘧啶基、4-嘧啶基、5-嘧啶基、3-嗒哄基、4-塔哄基、2-吡啡基、丨又仁三哄-3-基、1，2,4-三啡-5-基、1，2,4-三啡-6-基、i，3,5-三哄_2_基等。 於由R1表示之「視需要經一個或多個取代基取代之低 碳烷基磺醯基」中之「低碳烷基磺醯基」之較佳實例包括 曱基％ S&amp;基、乙基石黃醯基、正丙基石黃醯基、異丙基石黃酸基、 正丁基磺醯基、異丁基磺醯基、第二丁基磺醯基、第三丁 基磺醯基、正戊基磺醯基、第二戊基磺醯基、異戊基磺醯 基、新戊基磺醯基、正己基磺醯基、異己基磺醯基等。 於「視需要經一個或多個取代基取代之低碳烷基磺醯 基」中之「一個或多個取代基」之「取代基」之較佳實例 ，括自原子（氟原子、氯原子、溴原子、碘原子）、硝基、 氰基、經基、視需要經鹵原子取代之低碳環烷基（例如環丙 基、環y基、環戊基、環己基等）、低魏氧基（例如甲氧 基、乙氧基、丙氧基、異丙氧基、丁氧基、異τ氧基、戊 乳基、己氧基等）、胺基、或二_(低碳院基）胺基（例如甲 基胺基、乙基胺基、：甲基絲、二乙基胺基#)、叛基、 318750 26 200804250 低碳烷醯基（例如乙醯基、丙醯基等）、低碳烷氧羰基（例如 曱氧羰基、乙氧羰基、丙氧羰基、丁氧羰基等）、胺基甲醯 基、胺硫曱醯基、一-或二_(低碳烷基）胺基甲醯基（例如甲 基月女基甲fe基、乙基胺基甲酿基、二甲基胺基甲酿基、二 乙基胺基曱醯基等）、芳基胺基甲醯基（例如苯基胺基甲醯 基、萘基胺基甲酿基等）、芳氧基（例如苯氧基、萘氧基等）、 視需要經鹵原子取代之低碳烷基羰基胺基（例如乙醯基胺 基、二氟乙醯基胺基等）、低碳烷硫基（例如甲硫基等）、低 碳烷基亞磺醯基(例如曱基亞磺醯基等）、低碳烷基磺醯基 (j列如曱基磺醯基等）、芳基亞磺醯基（例如苯基亞磺醯基、 奈基亞磺醯基等）、芳基磺醯基（例如苯基磺醯基、萘基石备 醯基等）等。 〃 個或多個取代基取代之芳 之較佳實例包括苯基磺醯 於由R1表示之「視需要經一 基磺醯基」中之「芳基磺醯基」 基、萘基磺醯基等。 視需要經-個或多個取代基取代之芳基瑞醯基」中 :二？固或多個取代基」之「取代基」之較佳實例包括函 原子（貺原子、氯原子、溴原子、碘原子）、硝基、氰美 經基、經齒原子取代之低碳烧基（例如氣f基、1氟;;、、 二二:：=基、2_漠乙基、2,2,2_三氟乙基、五氟乙 ^/其: ^ T I' 5’5’5_三氟戊基、6,6,6- 專)、視需要經齒原子取代之低碟環貌基(例如環 氧m、壤戊基、環己基等)、低碟烷氧基(例如甲 乳基、丙氧基、異丙氧基、丁氧基、異丁氧基、 318750 27 200804250 戊氧基、己氧基等）、胺基、一-或二-(低碳烷基）胺基（例如 曱基胺基、乙基胺基、二甲基胺基、二乙基胺基等）、羧基、 低碳烷醯基（例如乙醯基、丙醯基等）、低碳烷氧羰基（例如 曱氧羰基、乙氧羰基、丙氧羰基、丁氧羰基等）、胺基曱醯 基、胺硫曱醯基、一-或二-(低碳烷基）胺基曱醯基（例如曱 基胺基甲醯基、乙基胺基曱醯基、二甲基胺基甲醯基、二 乙基胺基曱醯基等）、芳基胺基甲醯基（例如苯基胺基甲醯 基、萘基胺基曱醯基等）、芳氧基（例如苯氧基、萘氧基等）、 視需要經一個鹵原子取代之低碳烷基羰基胺基（例如乙醯 基胺基、三氟乙醯基胺基等）、低碳烷硫基（例如曱硫基 等）、低碳烷基亞磺醯基（例如曱基亞磺醯基等）、低碳烷基 磺醯基（例如曱基磺醯基等）、芳基亞磺醯基（例如苯基亞磺 酿基、奈基亞續s篮基等）、芳基橫驢基（例如苯基續酿基、 萘基磺醯基等）等。 於由R1表示之「視需要經一個或多個取代基取代之低 碳烧基叛基硫基」中之「低碳烧基幾基硫基」之較佳實例 包括甲基羰基硫基、乙基羰基硫基、正丙基羰基硫基、異 丙基羰基硫基、正丁基羰基硫基、異丁基羰基硫基、第二 丁基羰基硫基、第三丁基羰基硫基、正戊基羰基硫基、第 二戊基羰基硫基、異戊基羰基硫基、新戊基羰基硫基、正 己基叛基硫基、異己基裁基硫基等。 於「視需要經一個或多個取代基取代之低碳烷基羰基 硫基」中之「一個或多個取代基」之「取代基」較佳實例 包括與對「視需要經一個或多個取代基取代之低碳烷基磺 28 318750 200804250 醯基」舉例說明之「取代基」相同的取代基。 於由R1表示之「視需要經一個或多個取代基取代之低 碳烷氧羰基硫基」中之「低碳烷氧羰基硫基」之較佳實例 包括曱氧羰基硫基、乙氧羰基硫基、丙氧羰基硫基、異丙 氧羰基硫基、丁氧羰基硫基、異丁氧羰基硫基、第三丁氧 羰基硫基、戊氧羰基硫基、第三戊氧羰基硫基、新戊氧羰 基硫基、己氧羰基硫基、異己氧羰基硫基等，以及 於「視需要經一個或多個取代基取代之低碳烷氧羰基 硫基」中之「一個或多個取代基」之「取代基」較佳實例 包括與對「視需要經一個或多個取代基取代之低碳烷基磺 醯基」舉例說明之「取代基」相同的取代基。 於由R1表示之「視需要經一個或多個取代基取代之芳 氧羰基硫基」中之「芳氧羰基硫基」之較佳實例包括苯氧 羰基硫基、萘氧羰基硫基，以及 於「視需要經一個或多個取代基取代之芳氧羰基硫基」 中之「一個或多個取代基」之「取代基」較佳實例包括與 對「視需要經一個或多個取代基取代之芳基磺醯基」舉例 說明之「取代基」相同的取代基。 於由R1表示之「視需要經一個或多個取代基取代之一 &quot;或二-(低碳烧基）胺基續S篮基」中之「一-或二-(低碳烧基） 胺基磺醯基」之較佳實例包括曱基胺基磺醯基、二甲基胺 基磺醯基、乙基甲基胺基磺醯基、二乙基胺基磺醯基等， 以及 於「視需要經一個或多個取代基取代之一-或二-(低碳 29 318750 200804250 烷基）胺基磺醯基」中之「一個或多個取代基」之「取代基」 車乂“貝例包括與對「視需要經一個或多個取代基取代之低 石厌烧基石?、基」舉例說明之「取代基」相同的取代基。 於由R1表示之「視需要經一個或多個取代基取代之一 -或二-(芳基）胺基磺醯基」中之「一 _或二_(芳基）胺基磺醯 基」之較仫μ例包括苯基胺基磺醯基、二苯基胺基續酸基、 萘基胺基磺醯基等，以及 於「視需要經一個或多個取代基取代之一 _或二_(芳基) 胺基磺醯基」中之r一個或多個取代基」之「取代基」較 k貝例包括與對「視需要經一個或多個取代基取代之芳基 磺醯基」舉例說明之「取代基」相同的取代基。 於由R表示之「視需要經一個或多個取代基取代之低 石厌込基」中之「低碳烷基」之較佳實例包括甲基、乙基、 正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、 正戊基、第二戊基、異戊基、新戊基、正己基、異己基等， 以及 、 、 於視需要經一個或多個取代基取代 之「一個或多個取代基」之「取代基」之較佳實例包括齒 原子（氣原子、氯原子、漠原子、埃原子）、確基、氛基、 低例如乙„、㈣㈣）、低碳絲縣&amp;如 :乳羰基、乙氧羰基、丙氧羰基、丁氧羰基等)、視需要妹 ^原子取代之低碳環烷基（例如環丙基、環丁基、環戊基、 環己基等）、雜環基等，以及 此處，「雜環基」之較佳實例包括「芳香族單環雜環 318750 30 200804250 土」而芳“矢單壤雜壤基之實例包括5員芳香族單環雜产 基，4如2·咬喃基、3_吱喃基、2•嗟吩基、3_嗟吩基、= 吡嘻基、3·°比嘻基、2♦坐基、4♦坐基、5聲线、/ 異噚唑基、4_異噚唑基、5_異噚唑基、2_噻唑基、心噻唑基、 5-。基唾基、3_異料基、4_異㈣基、5異㈣基、^米唾 基4米唑基、5_咪唑基、3_吡唑基、4_吡唑基、5_吡唑基、 1，2,3-嗜二唑_4_基、m噚二唑士基、噚二唑^ 基、ι，2,4-曙二峻_3_基、Um24、咬咕基、m 噻二唾_4·基、up塞二唑_5_基、U4-嗟二唾_3_基、^心 噻二唑 _5_基、U，4·噻二唑·2_基、1H-1,2,3-三唑 _4_ 基’、 1H-1，2,3-三唑_5_基、三唑_3_基、ih_四唑巧_美 專’以及 6員芳香族單環雜環基，諸如2_吡啶基、弘吡啶基、 匕定基2-噹σ定基、4-喷唆基、5-嘧咬基、3-塔d并基、4_ 嗒啡基、2-哎畊基、U，4_三畊I基、u，4_三啡_5_基、u，4_ 三啡-6_基、1,3,5_三啡-2-基等。 於由R1表不之「視需要經一個或多個取代基取代之低 碳埽基」甲之「低碳稀基」之較佳實例包括乙稀基、稀丙 基、異丙烯基、異丁烯基、丨_甲基烯丙基、2_戊烯基、2_ 己烯基等，以及 於「視需要經一個或多個取代基取代之低碳烯基」中 之「:個或多個取代基」之「取代基」之較佳實例包括齒 原子（氟原子、氯原子、溴原子、碘原子）、硝基、氰基、 美工基視品要經一個齒原子取代之低碳環烧基（例如環丙 318750 31 200804250 基、環丁基、環戊基、環己基等）、低碳烷氧基（例如甲氧 基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、戊 氧基、己氧基等）、胺基、一-或二-(低碳烷基）胺基（例如曱 基胺基、乙基胺基、二曱基胺基、二乙基胺基等）、羧基、 低碳烷醯基（例如乙醯基、丙醯基等）、低碳烷氧羰基（例如 甲氧羰基、乙氧羰基、丙氧羰基、丁氧羰基等）、胺基甲醯 基、胺硫曱醯基、一-或二-(低碳烷基）胺基甲醯基（例如曱 基胺基甲醯基、乙基胺基曱醯基、二曱基胺基甲醯基、二 乙基胺基甲醯基等）、芳基胺基曱醯基（例如苯基胺基曱醯 基、萘基胺基曱醯基等）、芳基（例如苯基、萘基等）、芳氧 基（例如苯氧基、萘氧基等）、視需要經鹵原子取代之低碳 烷基羰基胺基（例如乙醯基胺基、三氟乙醯基胺基等）、低 碳烷硫基（例如曱硫基等）、低碳烷基亞磺醯基（例如甲基亞 石黃酿基等）、低碳烧基績酿基（例如甲基續酿基等）、芳硫基 (例如苯硫基、萘硫基等）、芳基亞磺醯基（例如苯基亞磺醯 基、萘基亞續醯基等）、芳基讀醯基（例如苯基續醢基、萘 基石黃蕴基等）等。 於由R1表示之「視需要經一個或多個取代基取代之低 碳炔基」中之「低碳炔基」之較佳實例包括乙炔基、2-丙 快基、1-丙快基、2 -丁快基、3 -丁快基、3-戍快基、3-己快 基等，以及 於「視需要經一個或多個取代基取代之低碳炔基」中 之「一個或多個取代基」之「取代基」之較佳實例包括鹵 原子（氟原子、氯原子、溴原子、碘原子）、硝基、氰基、 32 318750 200804250 羥基、視需要經一個鹵原子取代之低碳環烷基（例如環丙 基、環丁基、環戊基、環己基等）、低碳烷氧基（例如甲氧 基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、戊 氧基、己氧基等）、胺基、一-或二-(低碳烷基）胺基（例如甲 基胺基、乙基胺基、二曱基胺基、二乙基胺基等）、羧基、 低碳烷醯基（例如乙醯基、丙醯基等）、低碳烷氧羰基（例如 曱氧羰基、乙氧羰基、丙氧羰基、丁氧羰基等）、胺基甲醯 基、胺硫甲醯基、一-或二-(低碳烷基）胺基曱醯基（例如甲 基胺基甲醯基、乙基胺基曱醯基、二甲基胺基甲醯基、二 乙基胺基甲醯基等）、芳基胺基曱醯基（例如苯基胺基曱醯 基、萘基胺基甲醯基等）、芳基（例如苯基、萘基等）、芳氧 基（例如苯氧基、萘氧基等）、視需要經一個鹵原子取代之 低碳烷基羰基胺基（例如乙醯基胺基、三氟乙醯基胺基 等）、低礙烧硫基（例如甲硫基等）、低碳烧基亞續醯基（例如 曱基亞磺醯基等）、低碳烷基磺醯基（例如曱基磺醯基等）、 芳硫基（例如苯硫基、萘硫基等）、芳基亞績酸基（例如苯基 亞磺醯基、萘基亞磺醯基等）、芳基磺醯基（例如苯基磺醯 基、萘基磺酸基等）等。 於由R1表示之「視需要經一個或多個取代基取代之低 碳環烷基」中之「低碳環烷基」之較佳實例包括環丙基、 環丁基、環戊基、環己基等，以及 於「視需要經一個或多個取代基取代之低碳環烷基」 中之「一個或多個取代基」之「取代基」之較佳實例包括 鹵原子（氟原子、氯原子、漠原子、峨原子）、硝基、氰基、 33 318750 200804250 羥基、視需要經鹵原子取代之低碳烷基（例如曱基、氯曱 基、二氟甲基、三氣甲基、三氟甲基、乙基、2-溴乙基、 2,2,2-三氟乙基、五氟乙基、丙基、3,3,3-三氟丙基、異丙 基、丁基、異丁基、第二丁基、第三丁基、4,4,4-三氟丁基、 戊基、異戊基、新戊基、5,5,5-三氟戊基、己基、6,6,6-三 氟己基等）、低碳烷氧基（例如甲氧基、乙氧基、丙氧基、 異丙氧基、丁氧基、異丁氧基、戊氧基、己氧基等）、胺基、 一- 或二-(低碳烧基）胺基（例如曱基胺基、乙基胺基、二曱 基胺基、二乙基胺基等）、羧基、低碳烷醯基（例如乙醯基、 丙醯基等）、低碳烷氧羰基（例如曱氧羰基、乙氧羰基、丙 氧羰基、丁氧羰基等）、胺基甲醯基、胺硫曱醯基、一-或 二- (低碳烷基）胺基甲醯基（例如甲基胺基曱醯基、乙基胺基 曱醯基、二曱基胺基甲醯基、二乙基胺基甲醯基等）、芳基 胺基曱醯基（例如苯基胺基曱醯基、萘基胺基曱酸基等）、 芳基（例如苯基、萘基等）、芳氧基（例如苯氧基、萘氧基等）、 視需要經鹵原子取代之低碳烷基羰基胺基（例如乙醯基胺 基、三氟乙醯基胺基等）、低碳烷硫基（例如曱硫基等）、低 碳烧基亞績酿基（例如曱基亞續驢基等）、低碳烧基續酿基 (例如甲基磺醯基等）、芳硫基（例如苯硫基、萘硫基等）、芳 基亞磺醯基（例如苯基亞磺醯基、萘基亞磺醯基等）、芳基 磺醯基（例如苯基磺醯基、萘基磺醯基等）等。 於由R1表示之「視需要經一個或多個取代基取代之芳 基低碳烷基」中之「芳基低碳烷基」之較佳實例包括苄基、 萘曱基、蒽甲基等，以及 34 318750 200804250 於「視需要經一個或多個取代基取代之芳基低碳烷基」 中之「一個或多個取代基」之「取代基」之較佳實例包括 鹵原子（氟原子、氣原子、溴原子、蛾原子）、硝基、氰基、 輕基、經鹵原子取代之低碳烧基（例如氯甲基、二氟曱基、 一氣甲基、二氟甲基、2-溴乙基、2,2,2-三氟乙基、五氟乙 基、3，、3-二氟丙基、4,4,‘三氟丁基、5,5,5_三氟戊基、6,6,6_ 二氟己基等）、視需要經鹵原子取代之低碳環烷基（例如環 丙基、環丁基、環戊基、環己基等）、低碳烷氧基（例如曱 氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、 戊氧基、己氧基等）、胺基、一 _或二气低碳烷基）胺基（例如 甲基胺基、乙基胺基、二甲基胺基、二乙基胺基等）、羧基、 低碳烷醯基（例如乙醯基、丙醯基等）、低碳烷氧羰基（例如 甲氧羰基、乙氧羰基、丙氧羰基、丁氧羰基等）、胺基甲醯 基、胺硫甲醯基、一-或二气低碳烷基）胺基甲醯基（例如甲 基胺基甲醯基、乙基胺基甲醯基、二甲基胺基甲醯基、二 乙基胺基甲醯基等）、芳基胺基甲醯基（例如苯基胺基甲醯 基、萘基胺基甲醯基等）、芳氧基（例如苯氧基、萘氧基等）、 視需要經自原子取代之低碳烷基羰基胺基（例如乙醯基胺 基、二氟乙醯基胺基等）、低碳烷硫基（例如甲硫基等）、低 石反烷基亞％醯基（例如甲基亞磺醯基等）、低碳烷基磺醯基 (例如甲基磺醯基等）、芳硫基（例如苯硫基、萘硫基等）、芳 基亞磺醯基（例如苯基亞磺醯基、萘基亞磺醯基等）、芳基 基（例如苯基磺醯基、萘基磺醯基等）等。 於由R1表示之「視需要經一個或多個取代基取代之芳 318750 35 200804250 基」中之「芳基」之較佳實例包括苯基、三甲苯基、二曱 苯基、甲苯基、秦基、恩基、二氮缔基、聯苯基等，以及 於「視需要經一個或多個取代基取代之芳基」中之「一 個或多個取代基」之「取代基」之較佳實例包括鹵原子（氟 原子、氯原子、溴原子、埃原子）、确基、氰基、羥基、經 鹵原子取代之低碳烷基（例如氯曱基、二氟曱基、三氯甲 基、二氟曱基、2 -&gt;臭乙基、2，2,2 -三氟^乙基、五氣乙基、3,3,3_ 三氟丙基、4,4,4-三氟丁基、5,5,5-三氟戊基、6,6,6-三氟己 基等）、視需要經鹵原子取代之低碳環烷基（例如環丙基、 環丁基、環戊基、環己基等）、低碳烷氧基（例如曱氧基、 乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、戊氧基、 己氧基等）、胺基、一-或二-(低碳烷基）胺基（例如曱基胺 基、乙基胺基、二曱基胺基、二乙基胺基等）、叛基、低碳 烷醯基（例如乙醯基、丙醯基等）、低碳烷氧羰基（例如曱氧 羰基、乙氧羰基、丙氧羰基、丁氧羰基等）、胺基曱醯基、 胺硫曱醯基、一-或二-(低碳烷基）胺基曱醯基（例如曱基胺 基甲醯基、乙基胺基曱醯基、二甲基胺基曱醯基、二乙基 胺基曱醯基等）、芳基胺基曱醯基（例如苯基胺基甲醯基、 萘基胺基曱醯基等）、芳氧基（例如苯氧基、萘氧基等）、視 需要經鹵原子取代之低碳烷基羰基胺基（例如乙醯基胺 基、三氟乙醯基胺基等）、低碳烷硫基（例如甲硫基等）、低 碳烧基亞續驗基（例如曱基亞續酸基等）、低碳烧基續酸基 (例如曱基磺醯基等）、芳硫基（例如苯硫基、萘硫基等）、芳 基亞磺醯基（例如苯基亞磺醯基、萘基亞磺醯基等）、芳基 36 318750 200804250 磺醯基（例如苯基磺醯基、萘基磺醯基等）等。 於由Rl表示之「視需要經-個或多個取代基取代之低 碳烧氧基低㈣基」巾之「低魏氧絲碳㈣ 實例包括甲氧基甲基、乙氧基甲基、2_甲氧基乙基、2_乙 氧基，基、3_甲氧基丙基、3_乙氧基丙基、&quot;氧基丁基、 ^乙乳基丁基、5·甲氧基戊基、5_乙氧基戊基、6•甲氧基己 基、6-乙氧基己基等，以及 於視需要經-個或多個取代基取代之低碳烧氧基低 石反燒基」令之「-個或多個取代基」之「取代基」之較佳 貫例包括μ子（氟原子、氯原子、演原子、麟原子）、确 基、減、視需要㈣料取代之低魏财（例如環丙 基％丁基、％戊基、環己基等）、低碳烧氧基⑽如甲氧 基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、戊 虱基、己氧基等)、胺基、〜或二(低碳烷基)胺基(例如甲 基胺基、乙基胺基、二甲基胺基、二乙基胺基等）、幾基、 «㈣基（例如乙㈣、㈣基等）、低碳烧氧㈣（例如 甲乳碳基、乙氧㈣、丙氧絲、丁氧羰基等）、胺基甲醒 基胺石瓜甲基、一-或二低碳燒基）胺基π酿基（例如甲 基胺基甲酿基、乙基胺基甲酿基、二甲基胺基甲醯基、二 乙基胺基甲縣等）、芳基胺基基（例如苯基胺基甲醯 基、萘基胺基甲ϋ基等）、芳基（例如苯基、萘基等）、芳氧 基（例如苯氧基、#氧基#)、視冑要㈣取代之低碳 烧基幾基胺基（例如乙醯基胺基、三氟乙醯基胺基等）、低 碳焼硫基（例如甲硫基等）、低碳烧基亞石黃酸基（例如甲基亞 318750 37 200804250 基等）、低碳絲磺醯基（例如甲基磺酸基等）、芳硫基 列如—本硫基、萘硫基等）、芳基亞石黃醒基（例如苯基亞石黃酿 土、萘基亞磺醯基等）、芳基磺醯基（例如苯基磺醯基、萘 基石黃酿基等）等。 τ ^於由R表示之「視需要經一個或多個取代基取代之芳 氧基低石厌烧基」中之「芳氧基低碳烧基」 苯氧基甲基々苯氧基乙基、3_苯氧基丙基等，以貝及^括 於「視需要經一個或多個取代基取代之芳氧基低碳院 基」十之「一個或多個取代基」之「取代基」之較佳實例 包括鹵原子(氟原子、氯原子、溴原子、碘原子)、硝基、 鼠基、羥基、視需要經鹵原子取代之低碳環烷基（例如環丙 基、環丁基、環戊基、環己基等）、視需要經鹵原子取代之 低碳烷基（例如氯甲基、二氟甲基、三氯甲基、三氟甲基、 2-&gt;臭乙基、2,2,2-三氟乙基、五氟乙基、3,3,3_三氣丙基、 4,4,4-三氟丁基、5,5,5_三氟戊基、M，6_三氟己基等）、低 碳烷氧基（例如曱氧基、乙氧基、丙氧基、異丙氧基、丁氧 基、兴丁氧基、戊氧基、己氧基等）、胺基、一 _或二气低碳 烷基）胺基（例如甲基胺基、乙基胺基、二甲基胺基、二乙 基胺基等）、羧基、低碳烷醯基（例如乙醯基、丙醯基等）、 低碳烷氧羰基（例如甲氧羰基、乙氧羰基、丙氧羰基、丁氧 羰基等）、胺基曱醯基、胺硫曱醯基、一-或二_(低碳烷基） 胺基甲醯基（例如甲基胺基曱醯基、乙基胺基甲醯基、二曱 基胺基甲醯基、二乙基胺基甲醯基等）、芳基胺基甲醯基（例 如笨基胺基曱醯基、萘基胺基甲醯基等）、芳氧基（例如苯 318750 38 200804250 氧基、萘氧基等）、視需要經鹵原子取代之低碳烷基羰基胺 基（例如乙醯基胺基、三氟乙醯基胺基等）、低碳烷硫基（例 如曱硫基等）、低碳烷基亞磺醯基（例如甲基亞磺醯基等）、 低碳烷基磺醯基（例如曱基磺醯基等）、芳硫基（例如苯硫 基、萘硫基等）、芳基亞磺醯基（例如苯基亞磺醯基、萘基 亞磺醯基等）、芳基磺醯基（例如苯基磺醯基、萘基磺醯基 等）等。 於由R1表示之「視需要經一個或多個取代基取代之低 碳烷硫基低碳烷基」中之「低碳烷硫基低碳烷基」之較佳 實例包括甲硫基甲基、乙硫基曱基、2-甲硫基乙基、2-乙 硫基乙基、3 -甲硫基丙基、3 -乙硫基丙基、4 -曱硫基丁基、 4-乙硫基丁基、5-甲硫基戊基、5-乙硫基戊基、6-甲硫基己 基、6-乙硫基己基等，以及 於「視需要經一個或多個取代基取代之低碳烷硫基低 碳烧基」中之「一個或多個取代基」之「取代基」之較佳 實例包括鹵原子（就原子、氯原子、溴原子、蛾原子）、墙 基、氰基、羥基、視需要經鹵原子取代之低碳環烧基（例如 環丙基、環丁基、環戊基、環己基等）、低碳烷氧基（例如 曱氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、 戊氧基、己氧基等）、胺基、一-或二-(低碳烧基）胺基（例如 曱基胺基、乙基胺基、二甲基胺基、二乙基胺基等）、叛基、 低碳烷醯基（例如乙醯基、丙醯基等）、低碳烷氧羰基（例如 曱氧羰基、乙氧羰基、丙氧羰基、丁氧羰基等）、胺基曱醯 基、胺硫曱醯基、一-或二-(低碳烷基）胺基曱醯基（例如曱 39 318750 200804250 基胺基甲醯基、乙基胺基甲醯基、二甲基胺基甲醯基、二 乙基胺基曱醯基等）、芳基胺基甲醯基（例如苯基胺基曱醯 基、萘基胺基甲醯基等）、芳基（例如苯基、萘基等）、芳氧 基（例如苯氧基、萘氧基等）、視需要經iS原子取代之低碳 烧基幾基胺基（例如乙酸基胺基、三氟乙酿基胺基等）、低 碳烷硫基（例如曱硫基等）、低碳烷基亞磺醯基（例如曱基亞 磺醯基等）、低碳烷基磺醯基（例如曱基磺醯基等）、芳硫基 (例如苯硫基、萘硫基等）、芳基亞續醯基（例如苯基亞續醯 基、奈基亞礦酸基等）、芳基續酸基（例如苯基績酿基、奈 基磺驢基等）等。 於由R1表示之「視需要經一個或多個取代基取代之低 碳烧基亞績酿基低碳烧基」中之「低碳烧基亞續酸基低碳 烷基」之較佳實例包括曱基亞磺醯基曱基、乙基亞磺醯基 曱基、2 -曱基亞石黃酿基乙基、2 -乙基亞石黃酿基乙基^ 3 -曱 基亞磺醯基丙基、3-乙基亞磺醯基丙基、4-甲基亞磺醯基 丁基、4-乙基亞磺醯基丁基、5-甲基亞磺醯基戊基、5-乙 基亞續酿基戊基、6 -曱基亞石黃酿基己基、6 -乙基亞石黃酸基 己基等，以及 於「視需要經一個或多個取代基取代之低碳烷基亞磺 醯基低碳烷基」中之「一個或多個取代基」之「取代基」 之較佳實例包括對「視需要經一個或多個取代基取代之低 碳烷硫基低碳烷基」舉例說明之「取代基」之相同取代基。 於由R1表示之「視需要經一個或多個取代基取代之低 碳烧基績酸基低碳烧基」中之「低碳烧基續酿基低碳烧基」 40 318750 200804250 之較佳實例包括曱基磺醯基曱基、乙基磺醯基甲基、2_曱 基磺醯基乙基、2-乙基磺醯基乙基、3-曱基磺醯基丙基、 3·乙基石黃醯基丙基、4-曱基石黃醯基丁基、4-乙基石黃醯基丁 基、5-曱基石黃醯基戊基、5-乙基石黃醯基戊基、6•甲基石黃醯 基己基、6-乙基磺醯基己基等，以及 於「視需要經一個或多個取代基取代之低碳烷基磺醯 基低碳烷基」中之「一個或多個取代基」之「取代基」之 較佳實例包括對「視需要經一個或多個取代基取代之低碳 烷硫基低碳烷基」舉例說明之「取代基」之相同取代基。 於由R1表示之「視需要經一個或多個取代基取代之一 -或二-低碳烷基胺基低碳烷基」中之「低碳烷基胺基低碳 烷基」之較佳實例包括曱基胺基甲基、二甲基胺基甲基、 甲基乙基胺基甲基、2-(甲基胺基）乙基、2_(二甲基胺基）乙 基、3-(甲基胺基）丙基、3_(二甲基胺基）丙基、3_(乙基胺基） 丙基、4-(甲基胺基）丁基、‘（二甲基胺基）丁基、5_(曱基胺 基）戊基、5-(二甲基胺基）戊基、6兴甲基胺基）己基、&amp; 甲基胺基）己基等，以及 於「視需要經-個或多個取代基取代〜或二_低碳烧 基胺基低碳炫基」中之「一個或多個取代基」之「取代基_ 之較佳貫例包括齒原子（氟原子、氯原子、漠原子、埃原 子）、破基mt基、視需要經鹵原子取代之低碳環炫 基（例如環^基、環了基、環絲、環己基等）、低碳院氧 基(例如甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、里 丁氧基、戊氧基、己氧基等）、胺基…或二(低碳炫基)、 318750 41 200804250 胺基（例如曱基胺基、乙基胺基、二曱基胺基、二乙基胺基 等）、羧基、低碳烷醯基（例如乙醯基、丙醯基等）、低碳烷 氧羰基（例如曱氧羰基、乙氧羰基、丙氧羰基、丁氧羰基 等）、胺基曱醯基、胺硫甲醯基、一-或二-(低碳烷基）胺基 曱醯基（例如曱基胺基曱醯基、乙基胺基甲醯基、二甲基胺 基甲醯基、二乙基胺基曱醯基等）、芳基胺基甲醯基（例如 苯基胺基曱醯基、萘基胺基曱醯基等）、芳基（例如苯基、 萘基等）、芳氧基（例如苯氧基、萘氧基等）、視需要經鹵原 子取代之低碳烧基獄基胺基（例如乙酸基胺基、三氣乙酿基 胺基等）、低碳烷硫基（例如曱硫基等）、低碳烷基亞磺醯基 (例如曱基亞磺醯基等）、低碳烷基磺醯基（例如曱基磺醯基 等）、芳硫基（例如苯硫基、萘硫基等）、芳基亞磺醯基（例如 苯基亞磺醯基、萘基亞磺醯基等）、芳基磺醯基（例如苯基 磺醯基、萘基磺醯基等）等。 於由R1表示之「視需要經一個或多個取代基取代之低 碳烷醯基」中之「低碳烷醯基」之較佳實例包括乙醯基、 丙醯基、丁醯基、異丁醯基、戊醯基、異戊醯基、特戊醯 基、戊醯基、己醯基等，以及 於「視需要經或多個取代基取代之低碳烷醯基」中之 「一個或多個取代基」之「取代基」之較佳實例包括鹵原 子（氟原子、氯原子、溴原子、碘原子）、硝基、氰基、羥 基、視需要可經鹵原子取代之低碳環烷基（例如環丙基、環 丁基、環戊基、環己基等）、低碳烷氧基（例如甲氧基、乙 氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、戊氧基、 42 318750 200804250 己氧基等）、胺基、一-或二-(低碳烧基）胺基（例如甲基胺 基、乙基胺基、二曱基胺基、二乙基胺基等）、叛基、低碳 烷醯基（例如乙醯基、丙醯基等）、低碳烷氧羰基（例如甲氧 羰基、乙氧羰基、丙氧羰基、丁氧羰基等）、胺基曱醯基、 胺硫曱醯基、一-或二-(低碳烷基）胺基曱醯基（例如曱基胺 基曱醯基、乙基胺基甲醯基、二甲基胺基曱醯基、二乙基 胺基甲醯基等）、芳基胺基曱醯基（例如苯基胺基曱醯基、 萘基胺基曱酸基等）、芳基（例如苯基、萘基等）、芳氧基（例 如苯氧基、萘氧基等）、視需要經鹵原子取代之低碳烷基羰 基胺基（例如乙醯基胺基、三氟乙醯基胺基等）、低碳烷硫 基（例如曱硫基等）、低碳烷基亞磺醯基（例如曱基亞磺醯基 等）、低碳烷基磺醯基（例如甲基磺醯基等）、芳硫基（例如苯 硫基、萘硫基等）、芳基亞續酸基（例如苯基亞續醯基、萘 基亞磺酸基等）、芳基磺蕴基（例如苯基磺醯基、萘基磺醯 基等）等。「視需要經一個或多個取代基取代之低碳烷醯基」 之實例具體言之包括三氟乙醯基、溴乙醯基、甲硫基乙醯 基、曱基亞磺醯基乙醯基、及曱基磺醯基乙醯基。 於由R1表示之「視需要經一個或多個取代基取代之低 碳烷氧羰基」中之「低碳烷氧羰基」之較佳實例包括甲氧 羰基、乙氧羰基、丙氧羰基、異丙氧羰基、丁氧羰基、第 三丁氧羰基、戊氧羰基及己氧羰基，以及 於「視需要經一個或多個取代基取代之低碳烷氧羰基」 中之「一個或多個取代基」之「取代基」之較佳實例包括 鹵原子（氟原子、氯原子、溴原子、碘原子）、硝基、氰基、 43 318750 200804250 羥基、視需要經鹵原子取代之低碳環烷基（例如環丙基、環 丁基、環戊基、環己基等）、低碳烷氧基（例如甲氧基、乙 氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、戊氧基、 己氧基等）、胺基、一-或二-(低碳烷基）胺基（例如曱基胺 基、乙基胺基、二曱基胺基、二乙基胺基等）、叛基、低碳 烷醯基（例如乙醯基、丙醯基等）、低碳烷氧羰基（例如甲氧 羰基、乙氧羰基、丙氧羰基、丁氧羰基等）、胺基曱醯基、 胺硫甲醯基、一-或二-(低碳烷基）胺基曱醯基（例如曱基胺 基甲醯基、乙基胺基甲醯基、二甲基胺基曱醯基、二乙基 胺基甲醯基等）、芳基胺基曱醯基（例如苯基胺基曱醯基、 萘基胺基曱醯基等）、芳氧基（例如苯氧基、萘氧基等）、視 需要經鹵原子取代之低碳烷基羰基胺基（例如乙醯基胺 基、三氟乙醯基胺基等）、低碳烷硫基（例如曱硫基等）、低 碳烷基亞磺醯基（例如曱基亞磺醯基等）、低碳烷基磺醯基 (例如曱基續酸基等）、芳硫基（例如苯硫基、萘硫基等）、芳 基亞磺醯基（例如苯基亞磺醯基、萘基亞磺醯基等）、芳基 磺醯基（例如苯基磺醯基、萘基磺醯基等）等。 於由R1表示之「視需要經一個或多個取代基取代之芳 氧羰基」中之「芳氧羰基」之較佳實例包括苯氧羰基、及 萘氧羰基，以及 於「視需要經一個或多個取代基取代之芳氧羰基」中 之「一個或多個取代基」之「取代基」之較佳實例包括鹵 原子（氟原子、氯原子、溴原子、碘原子）、硝基、氰基、 羥基、經鹵原子取代之低碳烷基（例如氯甲基、二氟甲基、 44 318750 200804250 二氣甲基、二亂曱基、2 -&gt;臭乙基、2,2,2 -二氣乙基、五氟^乙 基、3，3,3-三氟丙基、異丙基、丁基、異丁基、第二丁基、 第三丁基、4,4,4-三氟丁基、5,5,5-三氟戊基、6,6,6-三氟己 基等）、視需要經鹵原子取代之低碳環烷基（例如環丙基、 環丁基、環戊基、環己基等）、低碳烷氧基（例如曱氧基、 乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、戊氧基、 己氧基等）、胺基、一-或二-(低碳烷基）胺基（例如曱基胺 基、乙基胺基、二曱基胺基、二乙基胺基等）、羧基、低碳 烷醯基（例如乙醯基、丙醯基等）、低碳烷氧羰基（例如曱氧 羰基、乙氧羰基、丙氧羰基、丁氧羰基等）、胺基曱醯基、 胺硫甲醯基、一-或二-(低碳烷基）胺基甲醯基（例如甲基胺 基曱醯基、乙基胺基甲醯基、二甲基胺基甲醯基、二乙基 胺基甲醯基等）、芳基胺基甲醯基（例如苯基胺基曱醯基、 萘基胺基甲醯基等）、芳氧基（例如苯氧基、萘氧基等）、視 需要經鹵原子取代之低碳烷基羰基胺基（例如乙醯基胺 基、三氟乙醯基胺基等）、低碳烷硫基（例如曱硫基等）、低 碳烧基亞續酸基（例如甲基亞續酸基等）、低碳烧基續酿基 (例如甲基磺醯基等）、芳硫基（例如苯硫基、萘硫基等）、芳 基亞磺醯基（例如苯基亞磺醯基、萘基亞磺醯基等）、芳基 磺醯基（例如苯基磺醯基、萘基磺醯基等）等。 於由R1表示之「視需要經一個或多個取代基取代之芳 基低碳烧氧幾基」中之「芳基低碳烧氧幾基」之較佳實例 包括氧基羰基、苯基乙氧羰基、蒽基曱氧羰基等，以及 於「視需要經一個或多個取代基取代之芳基低碳烷氧 45 318750 200804250 羰基」卡之「一個或多個取代基」之「取代基」之較佳實 例包括鹵原子（氟原子、氯原子、溴原子、碘原子）、硝基、 氰基、羥基、經鹵原子取代之低碳烷基（例如氯甲基、二氟 f基、三氯甲基、三氟甲基、2_漠乙基、2,2,2_三氟乙基、 五氟乙基、3,3,3-三氟丙基、4,4,4-三氟丁基、5,5,5-三氟戊 基、6,6,6-二氟己基等）、視需要經鹵原子取代之低碳環烷 基（例如環丙基、環丁基、環戊基、環己基等）、低碳烷氧 基（例如曱氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異 丁氧基、戊氧基、己氧基等）、胺基、一-或二_(低碳烷基） 胺基（例如甲基胺基、乙基胺基、二甲基胺基、二乙基胺基 等）、羧基、低碳烷醯基（例如乙醯基、丙醯基等）、低碳烷 氧羰基（例如甲氧羰基、乙氧羰基、丙氧羰基、丁氧羰基 等）、胺基甲醯基、胺硫甲醯基、一-或二_(低碳烷基）胺基 甲醯基（例如甲基胺基曱醯基、乙基胺基甲醯基、二甲基胺 基曱醯基、二乙基胺基甲醯基等）、芳基胺基曱醯基（例如 苯基胺基甲醯基、萘基胺基曱醯基等）、芳氧基（例如苯氧 基、萘氧基等）、視需要經鹵原子取代之低碳烷基羰基胺基 (例如乙醯基胺基、三氟乙醯基胺基等）、低碳烷硫基（例如 曱硫基等）、低碳烷基亞磺醯基（例如甲基亞磺醯基等）、低 碳烷基磺醯基（例如曱基磺醯基等）、芳硫基（例如苯硫基、 萘硫基等）、芳基亞磺醯基（例如苯基亞磺醯基、萘基亞磺 醯基等）、芳基磺醯基（例如苯基磺醯基、萘基磺醯基等）等。 於由R1表示之「視需要經一個或多個取代基取代之胺 基甲醯基」中之「一個或多個取代基」之「取代基」之較 318750 46 200804250 佳實例包括視需要經鹵原子取代之低碳烷基（例如曱基、乙 基、2-&gt;臭乙基、2,2,2-二氟乙基、丙基、3,3,3-三氟丙基、 異丙基、丁基、異丁基、第二丁基、第三丁基、4,4,4_三氟 丁基、戊基、異戊基、新戊基、5,5,5-三氟戊基、己基、6,6,6_ 三氟己基等）、視需要經i原子取代之低碳環烷基（例如環 丙基、環丁基、環戊基、環己基等）、低碳烷醯基（例如乙 醯基、丙醯基等）、低碳烷氧羰基（例如甲氧羰基、乙氧羰 基、丙氧羰基、丁氧羰基等）、芳基（例如苯基、萘基等）等， 以及 「視需要經一個或多個取代基取代之胺基曱醯基」之 較佳實例包括二甲基胺基曱醯基。 於由R1表示之「視需要經一個或多個取代基取代之胺 硫甲醯基」中之「一個或多個取代基」之「取代基」之較 佳實例包括視需要經鹵原子取代之低碳烷基（例如甲基、乙 基、2_溴乙基、2,2,2_三氟乙基、丙基、3,3,3_三氟丙基、 異丙基、丁基、異丁基、第二丁基、第三丁基、4,4,4_三氟 丁基、戊基、異戊基、新戊基、5,5,5-三氟戊基、己基、6,6,6-二氟己基等）、視需要經鹵原子取代之低碳環烷基（例如環 丙基、環丁基、環戊基、環己基等）、低碳烷醯基（例如乙 I基、丙酸基等）、低碳烧氧幾基（例如〒氧幾基、乙氧幾 基、丙氧羰基、丁氧羰基等）、芳基（例如苯基、萘基等）等。 於由R1表示之「視需要經一個或多個取代基取代之低 碳烷氧基草醯基」中之「低碳烷氧基草醯基」之較佳實例 包括甲氧基草醯基、乙氧基草醯基、丙氧基草醯基、異丙 318750 47 200804250 氧基草醯基、丁氧基草醯基、異丁氧基草醯基、第三丁氧 基草醯基、戊氧基草醯基、第三戊氧基草醯基、新戊氧基 草醯基、己氧基草醯基、異己氧基草醯基等，以及 於「視需要經一個或多個取代基取代之低碳烷氧基草 醯基」中之「一個或多個取代基」之「取代基」之較佳實 例包括鹵原子（氟原子、氯原子、溴原子、碘原子）、硝基、 氰基、羥基、視需要經ii原子取代之低碳環烷基（例如環丙 基、環丁基、環戊基、環己基等）、低碳烷氧基（例如曱氧 基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、戊 氧基、己氧基等）、胺基、一-或二-(低碳烧基）胺基（例如曱 基胺基、乙基胺基、二曱基胺基、二乙基胺基等）、羧基、 低碳烷醯基（例如乙醯基、丙醯基等）、低碳烷氧羰基（例如 甲氧羰基、乙氧羰基、丙氧羰基、丁氧羰基等）、胺基曱醯 基、胺硫曱醯基、一-或二-(低碳烷基）胺基甲醯基（例如曱 基胺基甲醯基、乙基胺基曱醯基、二曱基胺基甲醯基、二 乙基胺基曱醯基等）、芳基胺基甲醯基（例如苯基胺基甲醯 基、萘基胺基甲酸基等）、芳氧基（例如苯氧基、萘氧基等）、 視需要經鹵原子取代之低碳炫基幾基胺基（例如乙酿基胺 基、三氟乙醯基胺基等）、低碳烷硫基（例如曱硫基等）、低 碳烷基亞磺醯基（例如曱基亞磺醯基尊）、低碳烷基磺醯基 (例如曱基磺醯基等）、芳硫基（例如苯硫基、萘硫基等）、芳 基亞續醯基（例如苯基亞績酸基、萘基亞績si基等）、芳基 石黃醯基（例如苯基礦驢基、萘基續醯基等）等。 於由R1表示之「視需要經一個或多個取代基取代之芳 48 318750 200804250 基㈣烧氧基草酿基」中之「芳基低碳烧氧基草酿基」之 較佳貫例包括氧基草醯基等，以及 於「視需要經一個或多個取代基取代之芳基低碳院氧 基草醯基」中之「一個或多個取代基」之「取代基」之較 佳實例㈣齒原子（氟原子、氯原子、溴原子、蛾原子）、 蹲基氯基、經基、赵齒原子取代之低碳焼基（例如氯甲基、 一氣甲基 '二氯甲基、三氣甲基、2-溴乙基、2,2,2.三氟乙 五氟乙基3,3,3-二氟丙基、4,4,4_三氣丁基、5,5,5_ 一氟戊基、6,6,6-二氟己基等卜視需要經鹵原子取代之低 碳環烧基（例如環丙基、環丁基、環戊基、it己基等）、低 碳烧氧基(例如甲氧基、乙氧基、丙氧基、異丙氧基、丁氧 基兴丁氧基、戊氧基、己氧基等）、胺基、一 _或二_(低碳 烧基）胺基（例如甲基胺基、乙基胺基、三甲基胺基、二乙 基胺基等）、缓基、低碳燒酿基（例如乙酸基、丙酸基等）、 低礙烧氧幾基（例如曱氧幾基、乙氧幾基、丙氧幾基、丁氧 羰基等）、胺基甲醯基、胺硫甲醯基、一 _或二_(低碳烷基） 胺基甲醯基（例如曱基胺基甲酿基、乙基胺基甲酸基、二曱 基^基曱醯基、二乙基胺基曱醯基等）、芳基胺基甲醯基（例 如苯基胺基曱醯基、萘基胺基曱醯基等）、芳氧基（例如苯 氧基、奈氧基等）、視需要經鹵原子取代之低碳烷基羰基胺 基（例如乙醯基胺基、三氟乙醯基胺基等）、低碳烷硫基（例 如曱硫基等）、低碳烷基亞磺醯基（例如甲基亞磺醯基等）、 低碳烷基磺醯基（例如曱基磺醯基等）、芳硫基（例如苯硫 基、萘硫基等）、芳基亞磺醯基（例如苯基亞磺醯基、萘基 49 318750 200804250 =酿基等)、芳基續醯基(例如苯基碍酿基、萘基確醢基 於由R1表示之「視需要經-個或多個取代基取代 虱基草醯基」中之「芳氧基草醯基 基草酿基等，以及 」之以土貫例包括苯氧 於「視需要經-個或多個取代基取代之芳氧基草酿基」 中二-，或多個取代基」之「取代基」之較佳實例包括 鹵原子（氣原子、氯原子、溴原子、蛾原子）、確基、氛基、 羥基、經齒原子取代之低碳烷基（例如氯甲基、二氟、 三氯甲基、三貌甲基、2·溴乙基、2,2,2_三氟乙基、五‘乙 基:3,3,3-三氟丙基、4,4,4_三氣丁基、5,5,5_三氣戊基、6,6,6_ 二氣己，等）、視需要經齒原子取代之低碳環烧基（例如環 丙基、環丁基、環戊基、環己基等）、低碳烧氧基（例如甲 氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、 戊氧基、己氧基等）、胺基、一 _或二(低碳烧基）胺基（例如 甲基胺基、乙基胺基、二甲基胺基、二乙基胺基等）、幾基、 低碳烧酸基（例如乙酿基、丙醯基等）、低碳烧氧幾基（例如 甲氧幾基、乙氧幾基、丙氧幾基、丁氧幾基等）、胺基甲酿 土月女瓜甲酉耻基、一-或二-(低碳烧基）胺基甲醯基（例如甲 基胺基甲酿基、乙基胺基甲醯基、二甲基胺基甲酿基、二 乙基月女基甲酉皿基等）、芳基胺基甲酿基（例如苯基胺基甲酿 基祭基胺基甲醯基等）、芳氧基（例如苯氧基、萘氧基等）、 視萬要、’二鹵原子取代之低碟烧基幾基胺基（例如乙醯基胺 基一氟乙基版基等）、低碳烧硫基（例如甲硫基等）、低 318750 50 200804250 碳烷基亞磺醯基（例如曱基亞磺醯基等）、低碳烷基磺醯基 (例如曱基磺酿基等）、芳硫基（例如苯硫基、萘硫基等）、芳 基亞橫醯基（例如苯基亞確醯基、萘基亞磺醯基等）、芳基 磺醯基（例如苯基磺醯基、萘基磺醯基等）等。 於由R1表示之「視需要經一個或多個取代基取代之胺 基草醯基」中之「一個或多個取代基」之「取代基」之較 佳貫例包括視需要經鹵原子取代之低碳院基（例如甲基、氣 甲基、二氟甲基、三氣曱基、三氟曱基、乙基、2-溴乙基、 2,2,2-三氟乙基、五氟乙基、丙基、3,3,3_三氟丙基、異丙 基、丁基、異丁基、第二丁基、第三丁基、4,4,4_三氟丁基、 戊基、異戊基、新戊基、5,5,5-三氟戊基、己基、6,6,6_三 氟己基等）、視需要經鹵原子取代之低碳環烷基（例如環丙 基、環丁基、環戊基、環己基等）、低碳烷醯基（例如乙醯 基、丙醯基等）、低碳烷氧羰基（例如甲氧羰基、乙氧羰基、 丙氧羰基、丁氧羰基等）、芳基（例如苯基、萘基等）等。 於由R1表示之「視需要經一個或多個取代基取代之低 竣貌氧基」中之「低碳烧氧基」之較佳實例包括甲氧基、 乙氧基、丙氣基、異丙氧基、丁氧基、異丁氧基、第三丁 氧基、戊氧基、第三戊氧基、新戊氧基、己氧基、異己氧 基等；較佳為甲氧基、乙氧基、丙氧基、丁氧基、戊氧基、 己氧基及異己氧基，以及 於「視需要經一個或多個取代基取代之低碳烷氧基」 中之「-個或多個取代基」之「取代基」之較佳實例包括 _原子（氟原子、氯原子、溴原子、麵子）、硝基、氛基、 318750 51 200804250 羥基、視需要經鹵原子取代之低碳環烷基（例如環丙基、環 丁基、環戊基、環己基等）、低碳烷氧基（例如甲氧基、乙 氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、戊氧基、 己氧基等）、胺基、一-或二-(低碳烷基）胺基（例如曱基胺 基、乙基胺基、二曱基胺基、二乙基胺基等）、羧基、低碳 烷醯基（例如乙醯基、丙醯基等）、低碳烷氧羰基（例如甲氧 羰基、乙氧羰基、丙氧羰基、丁氧羰基等）、胺基曱醯基、 胺硫曱醯基、一-或二_(低碳烷基）胺基曱醯基（例如曱基胺 基甲醯基、乙基胺基甲醯基、二甲基胺基甲醯基、二乙基 胺基曱醯基等）、芳基胺基曱醯基（例如苯基胺基甲醯基、 萘基胺基曱醯基等）、芳氧基（例如苯氧基、萘氧基等）、視 需要經鹵原子取代之低碳烷基羰基胺基（例如乙醯基胺 基、三氟乙醯基胺基等）、低碳烷硫基（例如曱硫基等）、低 碳烧基亞橫基（例如曱基亞續隨基等）、低複烧基續酿基 (例如曱基磺醯基等）、芳硫基（例如苯硫基、萘硫基等）、芳 基亞磺醯基（例如苯基亞磺醯基、萘基亞磺醯基等）、芳基 石黃醯基（例如苯基續驢基、萘基績醯基等）等。 於由R1表示之「視需要經一個或多個取代基取代之芳 氧基」中之「芳氧基」之較佳實例包括苯氧基、萘氧基、 蒽氧基等，以及 於「視需要經一個或多個取代基取代之芳氧基」中之 「一個或多個取代基」之「取代基」之較佳實例包括鹵原 子（氟原子、氯原子、溴原子、碘原子）、硝基、氰基、羥 基、視需要經鹵原子取代之低碳環烷基（例如環丙基、環丁 52 318750 200804250 基、環戊基、環己基等）、經鹵原子取代之低碳烷基（例如 氯曱基、二氟曱基、三氯甲基、三氟甲基、2-溴乙基、2,2,2_ 三氟乙基、五氟乙基、3,3,3_三氟丙基、4,4,4-三氟丁基、 5,5,5-三氟戊基、己基、6,6,6-三氟己基等）、低碳烷氧基（例 如曱氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧 基、戊氧基、己氧基等）、胺基、一-或二-(低碳烧基）胺基（例 如曱基胺基、乙基胺基、二曱基胺基、二乙基胺基等）、叛 基、低碳烷醯基（例如乙醯基、丙醯基等）、低碳烷氧羰基（例 如曱氧羰基、乙氧羰基、丙氧羰基、丁氧羰基等）、胺基曱 醯基、胺硫曱醯基、一-或二-(低碳烷基）胺基甲醯基（例如 曱基胺基甲醯基、乙基胺基曱醯基、二曱基胺基曱醯基、 二乙基胺基曱醯基等）、芳基胺基曱醯基（例如苯基胺基曱 醯基、萘基胺基甲醯基等）、芳氧基（例如苯氧基、萘氧基 等）、視需要經鹵原子取代之低碳烷基羰基胺基（例如乙醯 基胺基、三氟乙醯基胺基等）、低碳烷硫基（例如甲硫基 等）、低碳烷基亞磺醯基（例如曱基亞磺醯基等）、低碳烷基 磺醯基（例如曱基磺醯基等）、芳硫基（例如苯硫基、萘硫基 等）、芳基亞續醯基（例如苯基亞橫酸基、萘基亞續酸基 等）、芳基磺醯基（例如苯基磺醯基、萘基磺醯基等）等。 於由R1表示之「視需要經一個或多個取代基取代之芳 基低碳烷氧基」中之「芳基低碳烷氧基」之較佳實例包括 苄氧基、萘曱氧基、蒽曱氧基等，以及 於「視需要經一個或多個取代基取代之芳基低碳烷氧 基」中之「一個或多個取代基」之「取代基」之較佳實例 53 318750 200804250 包括鹵原子（氣原子、氣原子、溴原子、織原子）、麟基、 氰基、羥基、經鹵原子取代之低碳烷基（例如氯甲基、二氟 曱基、三氯甲基、三氟甲基、2-溴乙基、2,2,2-三氟乙基、 五氟乙基、3，3,3-三氟丙基、4,4,4-三氣丁基、5,5,5-三氣戊 基、6,6,6-二氟己基等）、視需要經鹵原子取代之低破環烧 基（例如環丙基、環丁基、環戊基、環己基等）、低碳烧氧 基（例如曱氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異 丁乳基、戊氧基、己氧基等）、胺基、一-或二-(低碳烧基） 胺基（例如曱基胺基、乙基胺基、二曱基胺基、二乙基胺基 等）、羧基、低碳烷醯基（例如乙醯基、丙醯基等）、低碳烷 氧羰基（例如曱氧羰基、乙氧羰基、丙氧羰基、丁氧羰基 等）、胺基曱醯基、胺硫曱醯基、一-或二-(低碳烷基）胺基 曱醯基（例如甲基胺基曱醯基、乙基胺基曱醯基、二曱基胺 基甲醯基、二乙基胺基曱醯基等）、芳基胺基曱醯基（例如 苯基胺基曱醯基、萘基胺基曱醯基等）、芳氧基（例如苯氧 基、萘氧基等）、視需要經鹵原子取代之低碳烷基羰基胺基 (例如乙醯基胺基、三氟乙醯基胺基等）、低碳烷硫基（例如 曱硫基等）、低碳烷基亞磺醯基（例如曱基亞磺醯基等）、低 碳烧基續醯基（例如曱基磺醯基等）、芳硫基（例如苯硫基、 奈硫基等）、芳基亞續S篮基（例如苯基亞績酿基、奈基亞石黃 醯基等）、芳基磺醯基（例如苯基磺酿基、萘基磺酿基等）等。 於由R1表示之「視需要經一個或多個取代基取代之胺 基」中之「一個或多個取代基」之「取代基」之較佳實例 包括視需要經鹵原子取代之低碳烷基（例如曱基、乙基、2- 54 318750 200804250 溴曱基、2,2,2-三氟乙基、丙基、3,3,3-三氟丙基、異丙基、 丁基、異丁基、第二丁基、第三丁基、4,4,4-三氟丁基、戊 基、異戊基、新戊基、5,5,5_三氟戊基、己基、6,6,6-三氟 己基等）、視需要經鹵原子取代之低碳環烷基（例如環丙 基、環丁基、環戊基、環己基等）、低碳烷醯基（例如乙醯 基、丙酿基等）、低碳烷氧羰基（例如曱氧羰基、乙氧羰基、 丙氧幾基、丁氧羰基等）、胺基甲醯基、胺硫曱醯基、一 _ 或二-(低碳烷基）胺基曱醯基（例如曱基胺基曱醯基、乙基胺 基曱基、二曱基胺基曱醯基、二乙基胺基曱醯基等）、芳 基胺基甲醯基（例如苯基胺基甲醯基、萘基胺基甲醯基 等）、芳基（例如苯基、萘基等）等。 s於由Rl表示之「視需要經一個或多個取代基取代之雜 ¥基」中之「雜環基」之較佳實例包括「芳香族單環雜产 I 9 =香族單環雜環基之實例包括5貢芳 t各rr夫喃基、一2· ' 4&quot;〇f ' 5'〇f ' 3-基、5-異㈣基侧^ 基Si ;塞Γ基、 二Γ基、4·㈣基、5.対基、 其 土 一唑-5-基、1，2,44等二唑 5 基、1綱二唾_3_基、u，4歌Τ 噻二唑-4-基、！ ？ 1^ 大占基、1,2,3- 嗟二…，’3广 基丨，3,4·噻二唑-2-基、ΙΗ-1,2,3-三唑_4_基、 318750 55 200804250 111-1，2,3-三唑_5_基、111_1，2,4_三 等，以及 3基、1H-四唑基 6員芳香族單環雜環基，諸如2_対基、 4-t定基、2_対基、4令定基、定基 土 塔畊基4謂基、u,4.三啡_3_基、以三哄^基井=-二畊-6-基、1,3,5_三哄_2_基等，以及 土 ，， 於「視需要經一個或多個取代基取代之 (鼠原子/虱原子、漠原子、碘原子）、視需要經卣原子 取代之低碳烷基(例如甲基、氯甲基、二氯 、美 氣甲基:丙基、異丙基、丁基、= 兩美％弟：丁基、戊基、己基等)、低碳環烷基(例如環 =、衣丁基二環戊基、環己基等）、芳基低碳烧細如 卞土、^甲基卡基、苯乙基等）、芳基（例如苯基、蔡基等）、 低碳烧氧基（例如Ψ氧基、乙氧基、丙氧基、異丙氧基、丁 = 氧基、第二丁氧基、第三丁氧基等)、芳氧基(例 本氧土等）、甲醯基、低碳烷醯基（例如乙醯基、丙醯基、 丁 Μ基、異丁酿基等）、芳基幾基（例如苯^醯基、蔡甲酿 基等）fSa基氧基、低碳烧醯基氧基（例士口乙酸基氧基、 丙醯基氧基、丁醯基氧基、異丁酿基氧基等）、芳基幾基氧 基（例如苯甲醮基氧基、萘甲酿基氧基等）、羧基、低碳烷 氧，f (例如Τ氧羰基、乙氧羰基、丙氧羰基、異丙氧羰基、 I氧幾基、異丁氧縣、第三丁氧幾基等）、芳基低碳貌氧 叛基（例如苄氧羰基等）、胺基甲醯基、胺基、一-或二_(低 318750 56 200804250 碳烧基）胺基[例如一（低碳烧基）胺基諸如曱基胺基、乙基胺 基、丙基胺基、異丙基胺基及丁基胺基，以及二（低碳燒基） 胺基諸如二曱基胺基、二乙基胺基、二丙基胺基、二異丙 基胺基、二丁基胺基及曱基乙基胺基]、3員至6員環狀胺 基（例如吖ϋ元基、吖Π旦基、Π比口各咬基、ϋ比洛嘛基、Π比嘻基、 味嗤基、σ比嗤基、味嗤σ定基、°底σ定基、嗎淋基、二氫啦咬 基、Ν-曱基哌畊基、Ν-乙基哌畊基等）、硝基、氰基、一-或二-(低碳烧基）胺基績酿基[例如一（低碳烧基）胺基續酿 基諸如Ν -曱基胺基續酸基、Ν -乙基胺基績酿基、Ν -丙基胺 基磺醯基、Ν-異丙基胺基磺醯基、及Ν-丁基胺基磺醯基， 以及二（低碳烧基）胺基石黃酿基諸如Ν，Ν -二曱基胺基績酿 基、ISi，Ν -二乙基胺基續酿基、Ν，Ν -二丙基胺基石黃酿基及 Ν，Ν-二丁基胺基續醯基]、低碳烧硫基（例如曱硫基、乙硫 基、丙硫基、異丙硫基、丁硫基、第二丁硫基及第三丁硫 基）、芳硫基（例如苯硫基、萘硫基）、低碳烷基亞磺醯基（例 如曱基亞磺醯基、乙基亞磺醯基、丙基亞磺醯基、丁基亞 石黃醯基等）、芳基亞績醯基（例如苯基亞續醯基、萘基亞石黃 酿基等）、低碳烧基石黃酿基（例如甲基石黃蕴基、乙基石黃酿基、 丙基磺醯基、丁基磺醯基等）、芳基磺醯基（例如苯基磺醯 基、萘基磺酿基等）。 於由R2表示之「視需要經一個或多個鹵原子取代之低 碳伸烷基」中之「低碳伸烷基」之實例包括亞曱基、伸乙 基、三亞曱基、四亞曱基、五亞曱基、及六亞曱基；較佳 為「C1-C6伸烷基」諸如亞曱基、伸乙基、三亞曱基及六 57 318750 200804250 亞曱基，以及 於「視需要經-個或多個㈣子取代之低礙伸燒基」 中之：-個或多個齒原子」之「函原子」之實例包純原 子、氣原子、漠原子、及破原子。 山於由R3表示之「視需要經一個或多個取代基取代之低 反k L基」中之低石反烧醯基」之較佳實例包括乙醯基、 丙醯基、丁醯基、異丁醯基、戊醯基、異戊醯基、特戊醯 基、戊醒基、己酿基等，以及 於「視需要經一個或多個取代基取代之低碳烷醯基」 中之「一個或多個取代基」之「取代基」之較佳實例包括 鹵原子（氟原子、氯原子、溴原子、碘原子）、硝基、氰基、 羥基、低碳烷氧基（例如甲氧基、乙氧基、丙氧基、異丙氧 基、丁氧基、異丁氧基、戊氧基、己氧基等）、胺基、一 _ 或一 _(低碳烷基）胺基（例如甲基胺基、乙基胺基、二甲基胺 基、二乙基胺基等）、羧基、低碳烷醯基（例如乙醯基、丙 醯基等）、低碳烷氧羰基（例如甲氧羰基、乙氧羰基、丙氧 幾基、丁氧羰基等）、胺基曱醯基、胺硫甲醯基、一 _或二 _(低碳烷基）胺基甲醯基（例如曱基胺基甲醯基、乙基胺基曱 酿基、二甲基胺基甲醯基、二乙基胺基甲醯基等）、芳基胺 基甲酿基（例如苯基胺基甲醯基、萘基胺基甲醯基等）、芳 基（例如苯基、萘基等）、芳氧基（例如苯氧基、萘氧基等）、 視需要經鹵原子取代之低碳烷基羰基胺基（例如乙醯基胺 基、三氟乙醯基胺基等）、低碳烷硫基（例如甲硫基等）、低 石厌烧基亞石黃醯基（例如甲基亞磺酸基等）、低碳烧基續醯基 58 318750 200804250 (例如曱基磺醯基等）、芳硫基（例如苯硫基、萘硫基等）、芳 基亞續驢基（例如苯基亞績醯基、萘基亞績蕴基等）、芳基 石黃酸基（例如苯基績酿基、奈基績酿基等）等。 於由R3、R4、R5及R6表示之「視需要經一個或多個 取代基取代之C1-C3烷基」中之「C1-C3烷基」之實例包 括甲基、乙基、正丙基、及異丙基，以及 於「視需要經一個或多個取代基取代之C1-C3烷基」 中之「一個或多個取代基」之「取代基」之較佳實例包括 鹵原子（氟原子、氯原子、溴原子、碘原子）、硝基、氰基、 羥基、低碳烷氧基（例如甲氧基、乙氧基、丙氧基、異丙氧 基、丁氧基、異丁氧基、戊氧基、己氧基等）、胺基、一-或二-(低碳烷基）胺基（例如曱基胺基、乙基胺基、二曱基胺 基、二乙基胺基等）、羧基、低碳烷醯基（例如乙醯基、丙 醯基等）、低碳烷氧羰基（例如曱氧羰基、乙氧羰基、丙氧 羰基、丁氧羰基等）、胺基曱醯基、胺硫曱醯基、一-或二 -(低碳烷基）胺基曱醯基（例如曱基胺基曱醯基、乙基胺基曱 醯基、二曱基胺基曱醯基、二乙基胺基曱醯基等）、芳基胺 基曱醯基（例如苯基胺基甲醯基、萘基胺基甲醯基等）、芳 氧基（例如苯氧基、萘氧基等）、視需要經鹵原子取代之低 碳烧基魏基胺基（例如乙酿基胺基、三氟乙蕴基胺基等）、 低碳烷硫基（例如曱硫基等）、低碳烷基亞磺醯基（例如曱基 亞石黃酿基等）、低碳烧基續酿基（例如曱基績酿基等）、芳硫 基（例如苯硫基、萘硫基等）、芳基亞磺醯基（例如苯基亞磺 龜基、秦基亞續酿基等）、芳基續酿基（例如苯基石黃酿基、 59 318750 200804250 萘基磺醯基等）等。 於由R3、R4、R5及R6表示之「視需要經一個或多個 取代基取代之低碳烯基」中之「低碳烯基」之較佳實例包 括乙烯基、烯丙基、異丙烯基、異丁烯基、1-曱基烯丙基、 2-戊烯基、2-己烯基等，以及 於「視需要經一個或多個取代基取代之低碳烯基」中 之「一個或多個取代基」之「取代基」之較佳實例包括鹵 原子（氟原子、氯原子、溴原子、碘原子）、硝基、氰基、 羥基、低碳烷氧基（例如曱氧基、乙氧基、丙氧基、異丙氧 基、丁氧基、異丁氧基、戊氧基、己氧基等）、胺基、一-或二-(低碳烧基）胺基（例如曱基胺基、乙基胺基、二曱基胺 基、二乙基胺基等）、羧基、低碳烷醯基（例如乙醯基、丙 醯基等）、低碳烷氧羰基（例如曱氧羰基、乙氧羰基、丙氧 羰基、丁氧羰基等）、胺基曱醯基、胺硫甲醯基、一-或二 -(低碳烷基）胺基曱醯基（例如曱基胺基甲醯基、乙基胺基曱 醯基、二甲基胺基甲醯基、二乙基胺基曱醯基等）、芳基胺 基曱醯基(例如苯基胺基甲醯基、萘基胺基甲醯基等）、芳 基（例如苯基、萘基等）、芳氧基（例如苯氧基、萘氧基等）、 視需要經鹵原子取代之低碳烷基羰基胺基（例如乙醯基胺 基、三氟乙醯基胺基等）、低碳烷硫基（例如甲硫基等）、低 碳烷基亞磺醯基（例如甲基亞磺醯基等）、低碳烷基磺醯基 (例如曱基磺醯基等）、芳硫基（例如苯硫基、萘硫基等）、芳 基亞續酸基（例如苯基亞續酷基、萘基亞續醯基等）、芳基 磺醯基（例如苯基磺醯基、萘基磺醯基等）等。 60 318750 200804250 於由R3、R4、R5及R6表示之「視雲 优而要經一個或多個 取代基取代之低碳炔基」中之「低碳炔其 m反厌基」之較佳實例包 括乙炔基、2-丙炔基、1-丙炔基、2-丁炔基、3_丁炔美、3 戊炔基、3-己炔基等，以及 於「視需要經一個或多個取代基取代之低碳块基」中 之「:個或多個取代基」之「取代基」之較佳實例包括南 原子（氟原子、氯原子、溴原子、碘原子）、硝基、氰基、 經基、低碳烷氧基（例如甲氧基、乙氧基、丙氧基、異丙氧 基、丁氧基、異丁氧基、戊氧基、己氧基等）、胺基二一 _ 或二-(低碳烷基）胺基（例如甲基胺基、乙基胺基、二甲基胺 基、二乙基胺基等）、羧基、低碳烷醯基（例如乙醯基、丙 醯基等）、低碳烷氧羰基（例如甲氧羰基、乙氧羰基、丙氧 羰基、丁氧羰基等）、胺基甲醯基、胺硫甲醯基、一-或二 _(低碳烷基）胺基甲醯基（例如f基胺基曱醯基、乙基胺基甲 酉&amp;基、二曱基胺基曱醯基、二乙基胺基甲醯基等）、芳基胺 基曱醯基（例如苯基胺基曱醯基、萘基胺基甲醯基等）、芳 基（例如苯基、萘基等）、芳氧基（例如苯氧基、萘氧基等）、 視需要經鹵原子取代之低碳烷基羰基胺基（例如乙醯基胺 基、二氟乙醯基胺基等）、低碳烷硫基（例如曱硫基等）、低 石反烷基亞磺醯基（例如甲基亞磺醯基等）、低碳烷基磺醯基 (例如甲基磺醯基等）、芳硫基（例如苯硫基、萘硫基等）、芳 基亞磺醯基（例如苯基亞磺醯基、萘基亞磺醯基等）、芳基 磺醯基（例如苯基磺醯基、萘基磺醯基等）等。 於由R3、R4、R5及R6表示之r視需要經一個或多個 61 318750 200804250 取代基取代之芳基」中之「芳基」之較佳實例包括苯基、 三甲苯基、二曱苯基、曱苯基、萘基、蒽基等，以及 於「視需要經一個或多個取代基取代之芳基」中之「一 個或多個取代基」之「取代基」之較佳實例包括鹵原子（氟 原子、氯原子、溴原子、碘原子）、硝基、氰基、羥基、經 鹵原子取代之低碳烷基（例如氯曱基、二氟曱基、三氯曱 基、三氟i曱基、2 -&gt;臭乙基、2，2,2_三氟乙基、五氟乙基、3,3,3-二氣丙基、4,4,4-二氣丁基、5,5,5-二氣戍基、6,6,6-二氣己 基等）、低碳烷氧基（例如曱氧基、乙氧基、丙氧基、異丙 氧基、丁氧基、異丁氧基、戊氧基、己氧基等）、胺基、一 -或二-(低碳烷基）胺基（例如曱基胺基、乙基胺基、二曱基 胺基、二乙基胺基等）、缓基、低碳烧酸基（例如乙醯基、 丙醯基等）、低碳烷氧羰基（例如甲氧羰基、乙氧羰基、丙 氧羰基、丁氧羰基等）、胺基曱醯基、胺硫曱醯基、一-或 二-(低碳烷基）胺基甲醯基（例如曱基胺基曱醯基、乙基胺基 甲醯基、二甲基胺基甲醯基、二乙基胺基甲醯基等）、芳基 胺基曱醯基（例如苯基胺基甲醯基、萘基胺基曱醯基等）、 芳氧基（例如苯氧基、萘氧基等）、視需要經鹵原子取代之 低碳烷基羰基胺基（例如乙醯基胺基、三氟乙醯基胺基 等）、低碳烧硫基（例如曱硫基等）、低碳烧基亞橫酸基（例如 曱基亞石黃酸基等）、低碳烧基石黃酿基（例如曱基石黃醯基等）、 芳硫基（例如苯硫基、萘硫基等）、芳基亞磺醯基（例如苯基 亞磺醯基、萘基亞磺醯基等）、芳基磺醯基（例如苯基磺醯 基、萘基磺醯基等）等。 62 318750 200804250 於由R3、R4、R5及R6表示之「視需要經一個或多個 取代基取代之芳基低碳烧基」中之「芳基低碳烧基」之較 佳實例包括苄基、苯乙基等，以及 於「視需要經一個或多個取代基取代之芳基低碳烷基」 中之「一個或多個取代基」之「取代基」之較佳實例包括 鹵原子（氟原子、氯原子、溴原子、碘原子）、硝基、氰基、 羥基、經鹵原子取代之低碳烷基（例如氯曱基、二氟甲基、 二氣甲基、二氣甲基、2 -&gt;臭乙基、2，2,2 -二氣乙基、五氣乙 基、3,3,3-三氟丙基、4,4,4-三氟丁基、5,5,5-三氟戊基、6,6,6-三氟己基等）、低碳烷氧基（例如甲氧基、乙氧基、丙氧基、 異丙氧基、丁氧基、異丁氧基、戊氧基、己氧基等）、胺基、 一- 或二-(低碳烧基）胺基（例如曱基胺基、乙基胺基、二曱 基胺基、二乙基胺基等）、叛基、低碳烧酿基（例如乙酿基、 丙醯基等）、低碳烷氧羰基（例如甲氧羰基、乙氧羰基、丙 氧羰基、丁氧羰基等）、胺基曱醯基、胺硫曱醯基、一-或 二- (低碳烷基）胺基甲醯基（例如曱基胺基曱醯基、乙基胺基 甲醯基、二曱基胺基曱醯基、二乙基胺基甲醯基等）、芳基 胺基曱醯基（例如苯基胺基曱醯基、萘基胺基曱醯基等）、 芳氧基（例如苯氧基、萘氧基等）、視需要經鹵原子取代之 低碳烧基叛基胺基（例如乙酿基胺基、三氟乙酿基胺基 等）、低碳烷硫基（例如曱硫基等）、低碳烷基亞磺醯基（例如 甲基亞磺醯基等）、低碳烷基磺醯基（例如曱基磺醯基等）、 芳硫基（例如苯硫基、萘硫基等）、芳基亞續酸基（例如苯基 亞磺醯基、萘基亞磺醯基等）、芳基磺醯基（例如苯基磺醯 63 318750 200804250 基、萘基續醯基等）等。 要且有HR6料末料同結合錢料料形成視需 要具有其它氮原子、氧原子哎护 风祝而 …員含氮雜環」之實例:括=為環組成原子之3 N-嗎琳基、及硫基义嗎似定基W定基、 原子㈣子」之實例包域原子、氯原子1 於由R7表示之「視需要經―個或多_料取代之芳 料基」中之「芳基低錢氧基」之較佳實例包括 、 孔土不τ虱基、奈乙乳基、蒽甲氧基等， 以及 至於「鹵原子」，可列舉前述之「鹵原子」。 山於由R7表示之「視需要經一個或多個鹵原子取代之低 石反:k 基」中之「低石反烷醯基」之較佳實例包括乙醯基、 丙基、丁醯基、異丁醯基、戊醯基、2,2_二曱基丙醯基、 己醯基等，以及 至於「鹵原子」，可列舉前述之「鹵原子」。 於由R7表示之「視需要經一個或多個鹵原子取代之低 石厌烧氧幾基」中之「低碳烧氧幾基」之較佳實例包括曱氧 罗厌基、乙氧幾基、丙氧幾基、異丙氧叛基、丁氧幾基、第 二丁氧裁基、戊氧幾基、己氧裁基等，以及 至於「i原子」，可列舉前述之「鹵原子」。 於由R7表示之「視需要經一個或多個鹵原子取代之芳 基」中之「芳基」之較佳實例包括苯基、1-萘基、2_萘基、 64 318750 200804250 聯苯基、2-蒽基等，以及 至於「鹵原子」，可列舉前述之「齒原子」。 於「視需要經一個或多個鹵原子取代之芳基低碳烷氧 叛基」t之「芳基低碳烷氧羰基」之較佳實例包括苄氧羰 基、苯乙氧羰基、蒽曱氧羰基等，以及 至於「鹵原子」，可列舉前述之「鹵原子」。 於由R7表示之「視需要經一個或多個鹵原子取代之芳 基胺基甲醯基」中之「芳基胺基甲醯基」之較佳實例包括 苯基胺基甲醯基、1-萘基胺基曱醯基、萘基胺基甲醯基、 聯苯基胺基甲醯基、2-蒽基胺基甲醯基等，以及 至於「鹵原子」，可列舉前述之「鹵原子」。 於由R7表示之「視需要經一個或多個低碳烷基取代之 胺基甲醯基」中之「低碳烷基」之較佳實例包括曱基、乙 基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三 丁基、正戊基、第二戊基、異戊基、新戊基、正己基、異 己基等。 於由R7表示之「視需要經一個或多個低碳烷基取代之 月女石;IL甲酸基」中之「低碳烧基」之較佳實例包括甲基、乙 基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三 丁基、正戊基、第二戊基、異戊基、新戊基、正己基、異 己基等。 於由R7表示之「視需要經一個或多個低碳烷基取代之 胺基」中之「低碳烷基」之較佳實例包括甲基、乙基、正 丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、 65 318750 200804250 正戊基、第二戊基、異戊基、新戊基、正己基、異己基等。 山於由R7表不之「視需要經一個或多個鹵原子取代之低 厌k基」中之「低奴烧基」之較佳實例包括甲基、乙基、 正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、 正戊基、第一戊基、異戊基、新戊基、正己基、異己基等， 以及 ' 至於「鹵原子」，可列舉前述之「齒原子」。 山於由R7表示之「視需要經一個或多個齒原子取代之低 人，氧基」中之低石厌烷氧基」之較佳實例包括甲氧基、 乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、第三丁 氧，、戊氧基、第三絲基、新絲基、己氧基、異己氧 基等；較佳為甲氧基、乙氧基、丙氧基、丁氧基、戊氧基、 己氧基、及異己氧基，以及 至於「鹵原子」，可列舉前述之「鹵原子」。 山於由R表不之「視需要經一個或多個鹵原子取代之低 石炭燒氧基低碳院氧基」中之「低碳烧氧基低碳燒氧基」之 ，佳實例包括甲氧基甲氧基、乙氧基甲氧基、2甲氧基甲 =基、2_乙氧基乙氧基、3_ψ氧基丙氧基、3_乙氧基丙氧 土、&quot;氧基丁氧基、4_乙氧基丁氧基、5•甲氧基戊氧基、 _乙虱基戊氧基、6_曱氧基己氧基、6_乙氧基 以及 亏 至於「鹵原子」，可列舉前述之「鹵原子」。 R7表示之「視需要經一個或多㈣原子取代之低 Μ氧基」中之「低碳稀氧基」之較佳實例包括乙稀氧基： 318750 66 200804250 烯丙氧基、異丙烯氧基、異丁烯氧基、丨_甲基稀丙氧基、 2-戊烯氧基、2-己烯氧基等，以及 至於「鹵原子」，可列舉前述之「鹵原子」。 於由R7表示之「視需要經一個或多個鹵原子取代之低 碳炔氧基」中之「低碳炔氧基」之較佳實例包括乙炔氧基、 2-丙炔氧基、1_丙炔氧基、2_丁炔氧基、3_丁炔氧基、弘 戊炔氧基、3-己炔氧基等，以及 至於「鹵原子」，可列舉前述之「鹵原子」。 於由R7表示之「視需要經一個或多個鹵原子取代之低 石反烧fe基胺基」中之「低碳烧酿基胺基」之較佳實例包括 乙醯基胺基、2-甲基丙醯基胺基、丙醯基胺基、丁醯基胺 基、異丁醯基胺基、戊醯基胺基、2,2_二甲基丙醯基胺基、 己醯基胺基等，以及 至於「鹵原子」，可列舉前述之「鹵原子」。 於由R7表示之「視需要經一個或多個鹵原子取代之低 碳烷硫基」中之「低碳烷硫基」之較佳實例包括甲硫基、 乙硫基、正丙硫基、異丙硫基、正丁硫基、異丁硫基、第 二丁硫基、第三丁硫基、正戊硫基、第二戊硫基、異戊硫 基、新戊硫基、正己硫基、異己硫基等，以及 至於「鹵原子」，可列舉前述之「鹵原子」。 於由R7表示之「視需要經一個或多個鹵原子取代之低 碳烯硫基」中之「低碳烯硫基」之較佳實例包括燁丙硫基、 異丙烯硫基、異丁烯硫基、1-甲基烯丙硫基、2_戊稀硫基、 2 -己細硫基等，以及 318750 67 200804250 至於「_原子」，可列舉前述之「齒原子」。 於由R7表示之「視需要經-個或多㈣原子取代之低 碳快硫基」中之「低碳炔硫基」之較佳實例包括2_丙快硫 基、1-丙炔硫基、2-丁炔硫基、3-丁炔硫基、3_戊炔硫基、 3-己炔硫基等，以及 至於「鹵原子」，可列舉前述之「鹵原子」。 於由R7表示之「視需要經一個或多個齒原」子取代之低 碳烧基亞續醯基」中之「低碳烧基亞石黃醯基」之較佳實例 包括甲基亞石黃酸基、乙基亞石黃醯基、正丙基亞石黃酿基、、異 丙基亞磺醯基、正丁基亞磺醯基、異丁基亞磺醯基、第二 γ基亞雜基、第三丁基亞績醒基、正戊基亞續醯基、第 二戊基亞磺醯基、異戊基亞磺醯基、新戊基亞磺醯基、正 己基亞磺醯基、異己基亞磺醢基等，以及 至於「鹵原子」，可列舉前述之「鹵原子」。 於由R7表示之「視需要經一個或多個鹵原子取代之低 石反烯基亞磺醯基」中之「低碳烯基亞磺醯基」之較佳實例 包括烯丙基亞磺醯基、異丙烯基亞磺醯基、異丁烯基亞磺 酉&amp;基、1_甲基烯丙基亞磺醯基、2_戊烯基亞磺醯基、〕_己 細基亞石黃酿基等，以及 至於「鹵原子」，可列舉前述之「鹵原子」。 於由R7表示之「視需要經一個或多個鹵原子取代之低 厌块基亞石只基」中之「低碳快基亞石黃酿基」之較佳實例 包括2_丙炔基亞磺醯基、丨_丙炔基亞磺醯基、2_丁炔基亞 磺醯基、3_丁炔基亞磺醯基、3-戊炔基亞磺醯基、3_己炔 318750 68 200804250 基亞礦醯基等，以及 至於「鹵原子」，可列舉前述之「_ 於由R7表示之「視需要經—门 ' 」 個或多個南原子取代之低 碳烷基磺醯基」中之「低碳燒基 一 皿基」之較佳實例包括 曱基石戸、life基、乙基石黃酿基、正丙美 π基基、異丙基磺醯基、 正丁基石歸基、異丁基伽基、第：丁基伽基、第三丁 基石黃醯基、正絲_基、第二絲賴基、I戊基錯酿 基、新戊基石黃酿基、正己基石黃酿基、異己基石黃酿基等，以 及 至於「鹵原子」，可列舉前述之「鹵原子」。 於由R7表不之「視需要經一個或多個鹵原子取代之低 碳烯基磺醯基」中之「低碳烯基磺醯基」之較佳實例包括 烯丙基石黃醯基、異丙烯基石黃酿基、異丁烯基石黃醯基、丨_曱 基烯丙基石頁醯基、2-戊浠基石黃酿基、2-己稀基石黃·基等， 以及 至於「鹵原子」，可列舉前述之「鹵原子」。 於由R7表示之「視需要經一個或多個鹵原子取代之低 石厌快基&amp; iak基」中之「低碳快基石黃酿基」之較佳實例包括 2-丙炔基確gf基、1 -丙炔基磺醮基、2-丁炔基石黃醯基、3-丁炔基磺醯基、3-戊炔基磺醯基、3-己炔基磺醯基等，以 及 至於「鹵原子」，可列舉前述之「鹵原子」。 於由R7表示之「視需要經一個或多個鹵原子取代之低 碳烷氧基低碳烷硫基」中之「低碳烷氧基低碳烷硫基」之 69 318750 200804250 較佳實例包括甲氧基甲硫基、乙氧基甲硫基、2_甲氧基乙 硫基、2-乙氧基乙硫基、3_甲氧基丙硫基、3_乙氧基丙硫 基、^氧基丁硫基、4-乙氧基丁硫基、5_甲氧基戍硫基、 5乙氧基戊硫基、6-甲氧基己硫基、6_乙氧基己硫基等， 以及 至於「鹵原子」，可列舉前述之「鹵原子」。 作為E之取代基之厂鹵原子」之實例包括氣原子、氯 原子、溴原子、及碘原子。 ^為E之取代基之「視需要經一個或多個齒原子取代 低反烧基」中之「低石厌烧基」之較佳實例包括甲基、乙 基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三 丁基、正戊基、第二戊基、異戊基、新戊基、正己基、I 己基等，以及 至於「鹵原子」，可列舉前述之「鹵原子」。 作為E之取代基之「視需要經一個或多個鹵原子取代 之低反烷氧基」中之r低碳烷氧基」之較佳實例包括曱氧 基乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、第 一丁氧基、戊氧基、第三戊氧基、新戊氧基、己氧基、異 :氧基等；較佳為曱氧基、乙氧基、丙氧基、丁氧基、戊 氧基、己氧基、及異己氧基，以及 至於「鹵原子」，可列舉前述之「鹵原子」。 作為E之取代基之「視需要經一個或多個鹵原子取代 之低碳烧硫基」中之r低碳烧硫基」之較佳實例包括曱硫 基乙^基、正丙硫基、異丙硫基、正丁硫基、異丁硫基、 70 318750 200804250 第二丁硫基、第三丁硫基、正戊硫基、第二戊硫基、異戊 硫基、新戊硫基、正己硫基、異己硫基等，以及 至於「鹵原子」，可列舉前述之「鹵原子」。 作為E之取代基之「視需要經一個或多個鹵原子取代 之低碳烷基亞磺醯基」中之「低碳烷基亞磺醯基」之較佳 實例包括曱基亞磺醯基、乙基亞磺醯基、正丙基亞磺醯基、 異丙基亞磺醯基、正丁基亞磺醯基、異丁基亞磺醯基、第 二丁基亞磺醯基、第三丁基亞磺醯基、正戊基亞磺醯基、 第二戊基亞磺醯基、異戊基亞磺醯基、新戊基亞磺醯基、 正己基亞磺酸基、異己基亞石黃酿基等，以及 至於「鹵原子」，可列舉前述之「鹵原子」。 作為E之取代基之「視需要經一個或多個鹵原子取代 之低碳烷基磺醯基」中之「低碳烷基磺醯基」之較佳實例 包括甲基磺醯基、乙基磺醯基、正丙基磺醯基、異丙基磺 ，基、正丁基磺醯基、異丁基磺醯基、第二丁基磺醯基、 第^丁基磺醯基、正戊基韻基、第二戊基伽基、異戊 基石黃酸基、新戊基俩基、正己基賴基、異己基瑞醇美 等，以及 ’、服土 至於「鹵原子」，可列舉前述之「鹵原子」。 由E表示之「芳基」之較佳實例包括苯基、m 2-萘基、聯苯基、2-蒽基等。 v'土 ⑨由E表7F之「雜環基」之較佳實例包括「料族 雜環基」’而芳香族單環雜環基之 义 雜瑗其0 ^ 貝1J匕栝5貝方香族早環 耗基，如2·吱喃基、3“夫喃基、2_㈣基、3_嘍吩基、 318750 71 200804250 各基、3-吡咯基、2-噚唑基、4-噚唑基、5-噚唑基、3_ 異噚哇基、4-異噚唑基、5_異噚唑基、噻唑基、4-噻唑基、 塞0坐基、3_異噻唑基、4-異噻唑基、5-異噻唑基、2-咪唑 基、4 -17米唾基、5 -咪唾基、3 _ σ比唾基、4 -吼嗤基、5 -σ比嗤基、 I2,3-卩琴二唾 基、1,2,3-噚二唑-5-基、1，2,4-曙二唑-5- 基、丨，2,4&quot;·噚二唑_3_基、1，3,4-Π署二唑-2-基、呋咕基、1，2,3-嗟二嗤 I基、H3-噻二唑 _5_基、1，2,4-噻二唑-3-基、1，2,4-嗟二嗤-5-基、l53,4_噻二唑基、三唑_4基、 1H_1，2,3-二唑 _5-基、m-1，2,4-三唑 _3_ 基、m_ 四唑 _5_基 等，以及 員务香無單環雜環基，諸如2-π比咬基、3-u比。定基、 4_°比σ疋基、2-喷咬基、4-,唆基、5-喊咬基、3-塔哄基、4-嗒畊基、2-吡畊基、三畊基、丨二仁三畊_5_基、^，肛 三畊-6-基、1，3,5_三畊-2-基等。 於由Q表示之「視需要經一個或多個取代基取代之芳 基」中之务基」之較佳實例包括苯基、三甲苯基、二 苯基、甲苯基、萘基、蒽基等，以及 於視需要經一個或多個取代基取代之芳基」中之「一 個或夕個取代基」之「取代基」之較佳實例包括齒原子（氣 原子、氯原子、㈣子、破原子）、德、氰基、經由原子 取代之低碳烷基（例如氯甲基、二氟甲基、三氯甲基、三氟 甲基2 /臭乙基、2,2,2-二氟乙基、五氟乙基、3,3,3_三氣 丙基、4,4,4-三氟丁基、5,5,5_三氟戊基、M，6_三氟己基 等）、低碳烧氧基（例如甲氧基、乙氧基、丙氧基、異丙氧 318750 72 200804250 基、丁氧基、異丁氧基、戊氧基、己氧基等）等。 於由Q表示之「視需要經一個或多個取代基取代之雜 環基」中之「雜環基」之較佳實例包括「芳香族單環雜環 基」’而方香族單環雜環基之實例包括5員芳香族單環雜環 基，諸如2-呋喃基、3_呋喃基、2_噻吩基、孓噻吩基、2 比咯基3_吡咯基、2-卩f唑基、4-卩f唑基、5-嗜唑基、3 異噚唑基、4-異噚唑基、5_異噚唑基、2_噻唑基、4_噻唑基、 5-嗟唾基、3_異㈣基、4_異㈣基、5•異❹基、^唾 基、4-味唾基、5_咪唾基、3_π比唾基、4“比唾基、％ um4·基、u，3K5·基、…，二唾土5、 噻-唑·4-基、U，3,二唑士基…，噻二唑 ’ =:基严嗟一基， 1H-1，2,3-二唑 _5-基、m 等，以及 ，4 一上3·基、1H_四唑_5基 6員芳香族單環雜環基，諸如2_ 4-吡啶基、2_衊，令| ^ 土 ）比疋基、 从吐苴 * 土、4-嘴啶基、5_嘧啶基、3-忒啡美、4 哙畊基、2-吡啡基q 24_二 。并基4· lit a 直 —幵 3_基 d，2,4·三畊-5-基、1 2 4- 二哄i基、U，5_三啡么基等，以及 U，4 於「視需要經一個或多個取代美敌# + &amp; 「-個或多個取代基」之 ^取代之雜環基」中之 子（氟原子、氣原子、、、#眉I 土」之較佳實例包括齒原 需要經函原子取^之^原子、蛾原子）、硝基、氛基、視 u眾于取代之低碳烷基（例如 基、…基、三氣，基、乙基、2_淳：：、二Μ /貝乙基、2,2,2_三氟乙 318750 73 200804250 基、五氟乙基、丙基、3,3,3-三氟丙基、異丙基、丁基、異 丁基、第二丁基、第三丁基、4,4，‘三氟丁基、戊基、異戊 基、新戊基、5,5,5-三氟戊基、己基、6,6,6_三氟己基等）、 低碳烷氧基（例如甲氧基、乙氧基、丙氧基、異丙氧基、丁 氧基、異丁氧基、戊氧基、己氧基等）等。 化合物（I)之各個態樣之實例包括： 「態樣1」 一種化合物，其中於式（I)中， X及Y為氧原子， R1為氫原子， 視需要經一個或多個取代基取代之低碳烷基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基5 視需要經一個或多個取代基取代之芳基低碳烷基， 視需要經一個或多個取代基取代之低碳烷氧基低碳烷基， 視需要經一個或多個取代基取代之芳氧基低碳烷基， 視需要經一個或多個取代基取代之低碳烷硫基低碳烷基， 視需要經一個或多個取代基取代之低碳烷基亞磺醯基低碳 烷基， 視需要經一個或多個取代基取代之低碳烷基磺醯基低碳烷 基， 視需要經一個或多個取代基取代之一-或二_(低碳烷基）胺 基低碳烷基，或 視需要經一個或多個取代基取代之低礙烧驢基， 74 318750 200804250 R2為亞曱基、伸乙基、或三亞甲基， A為OR3表示之基團 (其中R3為視需要經一個或多個取代基取代之C1-C3烷基， 視需要經一個或多個取代基取代之低;5炭烷醯基，或 視需要經一個或多個取代基取代之芳基低碳烷基）， S(0)nR4表示之基團 (其中R4為視需要經一個或多個取代基取代之Ci_c3烧 基，及 η為0至2之整數），或 NR5R6表示之基團 (其中R5及R6各自獨立地為視需要經一個或多個取代基取 代之C1-C3烷基，或 土 R與R6於其末端共同結合來與氮原子共同形成視需 要f有另-個氮原子、氧原子及硫原子作為環組成原子之 3員至7員含氮雜環）， R7為鹵原子， 視需要經—個或多個自原子取代之低碳烷氧羰基， 視需要經-個或多㈣原子取代之低碳烧基， 視而要、㉟-個或多個齒原子取代之低碳烧氧基， ^需要經-似多個自原子取代之低魏氧基低碳烧氧 視需要經一個或多個鹵 視需要經一個或多個鹵 視需要經一個或多個鹵 原子取代之低碳烷硫基， 原子取代之低碳烯硫基， 原子取代之低碳炔硫基， 318750 75 200804250a lower alkoxycarbonyl group substituted with one or more halogen atoms as appropriate, 318750 15 200804250 a low carbon alkyl group substituted with one or more tooth atoms, optionally with one or more teeth Atom-substituted low-carbon alkoxy, = low-carbon silk-based low-carbon courtyard oxygen storm requiring one or more (four) atoms, depending on the low-carbon sulfur-burning group substituted by one or more helium atoms, See also, a low-carbenethio group substituted by two or more tooth atoms, a lower alkynylthio group substituted by one or more south atoms as required, = a low substitution by one or more (four) atoms Carbon county sub-base, ^ low-carbon alkenyl sulfinyl group substituted by one or more (four) atoms, ^ low carbon filaments substituted by one or more (four) atoms, ^ by (4) a low (four) radical group, (4) a poly (a) atom-substituted low-carbon alkoxy-low-carbon sulfur-sulfur I' or -G_E group (where G is an oxygen atom or a sulfur atom, and 2 a square or heterocyclic group of one or more selected from the group consisting of: (1) an atom, and (2) as needed Substituted low carbon hospital base), Bu Q is 2,6-difluorophenyl, 2' gas _6_fluorophenyl, 2,6-dichlorophenyl, cardiamine-2-yl, or 3, 5_Two gas bites _4_ base, and m is an integer from 1 to 4 (the restriction is that when m is 2 to 4 days, each R7 may be the same or different). I, the benzoic acid compound of the item [1], wherein γ is oxygen 318750 16 200804250 R1 is a hydrogen atom, optionally substituted with one or more substituents, a lower alkyl group, a lower alkenyl group substituted with one or more substituents, optionally a lower alkynyl group substituted with one or more substituents, optionally a lower alkoxy alkoxy group substituted with one or more substituents An alkyl group, optionally an aryloxy lower alkyl group substituted with one or more substituents, optionally substituted with one or more substituents, a lower alkylalkylthio lower alkyl group, optionally one or more a lower alkyl sulfonyl lower alkyl group substituted by a substituent, or a lower alkyl alkano group substituted by one or more substituents, if desired, R 2 is a fluorenylene group, an ethylidene group or a triadenylene group, and A is · (1) a group represented by OR3 (wherein R3 is a Ci_c3 alkyl group which is optionally substituted by one or more substituents, a low-carbon thiol group substituted by one or more substituents as necessary, or a Or a plurality of substituent-substituted aryl oxime groups, (2) a group represented by S(〇)nR4 (wherein R4 is a view) a group of C1_C3 substituted by one or more substituents, and ^η is an integer from 0 to 2, or (3) a group represented by NR5R6 (wherein R and R are each independently one or more as needed) Substituted substituted C1-C3 alkyl groups, or soils R5 and R6 are bonded together at their ends to form together with a nitrogen atom. 318750 17 200804250 To have another nitrogen atom, oxygen atom or sulfur atom as a ring constituent atom 3 to 7 members of the nitrogen-containing heterocyclic ring), R7 is a halogen atom, a lower alkoxycarbonyl group which is optionally substituted by one or more halogen atoms, and a low-carbon alkyl group substituted by one or more (four) atoms, if necessary, a low-carbon alkoxy group substituted by one or more _ atoms, optionally a low-carbon alkoxy group substituted with one or more quiescent atoms, optionally having one or more ^ atoms Substituted low carbon thiol group, optionally substituted with one or more lower alkyl thio groups substituted by an atom, optionally substituted with one or more # atoms, a lower alkynylthio group, optionally a low-carbon alkyl group substituted by a plurality of tooth atoms, optionally substituted with one or more self-atoms Astragalus, a low-carbon (tetra)sulfonic acid group substituted by one or more atoms, or a low-carbon alkoxy group which requires substitution with one or more (four) atoms, or a group represented by -GE (wherein G is an oxygen atom or a sulfur atom, and hydrazine is an aryl group, and the aryl or heterocyclic group may be substituted with a substituent of a group consisting of: (10) original y (2) A low carbon alkyl group substituted with one or more halogen atoms), Q is 2,6-difluorophenyl, 2'chloro-6-fluorophenyl, 2,6-dichlorophenyl, m2-based Or 3,5-dichloro. Bisidine _4_ base, and m is! An integer up to 4 (with the exception that when the melon is an integer from 2 to 4 318750 18 200804250, each R7 may be the same or different). The '[3] insect control agent comprising the benzamidine compound or a salt thereof according to any one of the items [1] to [12] as an active ingredient. The use of the benzamidine or its salt as defined in any one of the items (1) to [12] for the control of pests. [15] A method for controlling pests or plant parasites, comprising administering an amount of a benzoyl compound or a salt thereof as defined in any one of items (1) to [12] to a pest or pest habitat. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The details of the preferred embodiments and specific examples of the various embodiments of the invention are intended to be * "Low-carbon" means a group containing 6 or fewer stones, and preferably a group containing 4 or fewer hindering atoms, unless otherwise stated. Preferred examples of "one or more" refer to 1 to ,, and preferably 1 to 4. Preferred examples of the "low-calcining group" 丨 "low-carbon-burning group" include a linear or branched C1-C6 alkyl group such as methyl, ethyl, n-propyl, isopropyl, n-butyl, Isobutyl, t-butyl, tert-butyl, n-pentyl, second pentyl, isopentyl, neopentyl, n-hexyl, isohexyl and the like. Preferred examples of the "C1-C3 alkyl group" and the "C1_C3 alkyl group" include a linear or branched C1-C3 alkyl group, specifically, an anthracenyl group, an ethyl group, a n-propyl group and an isopropyl group. Preferable examples of the "lower alkenyl group" include a linear or branched C 2 - c 6 alkenyl group such as a vinyl group, an allyl group, an isopropenyl group, an isobutenyl group, an I. fluorenyl 318750 19 200804250 allyl group, 2 _pentenyl, 2-hexenyl and the like. Preferred examples of 'e. ethynyl group and 'lower alkynyl group' include C2-C6 alkynyl group, 2-propynyl group, fluorenyl-propynyl group, 2-butynyl group, phenylbutynyl group, 3 - hexynyl and the like. Preferred examples of the "square group" and "aryl" include a c6_c aromatic hydrocarbon group, such as a low-phenolic phenyl group (e.g., benzoquinone, trimethylphenyl, xylyl, tolyl, etc.), as desired. And phenylene and naphthyl, and the "aryl group" and "aryl" may have a substituent such as a lower alkyl group, a tooth atom, an aryl group or the like. Examples of "I" and "Atoms" in I Field include fluorine, "low carbon wire" and neon / oxime, isobutoxy, tert-butoxy, pentyloxy, : pent = new =, Preferred examples of hexyloxy, isohexyloxy and the like; more α-based, propoxy, butoxy, pentyloxy, hexyloxy, and iso-low-center groups include migratory groups such as ethyl, 2_Methyl ethyl ketone, ～ 甲 支 丙 丙 、, butyl acid, isobutyric acid, pentamidine, 22-diyl, hexyl, and the like. Preferred examples of '-methylpropyl fluorenyl group and "^ carbocarbonate group" include, for example, fluorenyl propyl, cyclobutane, hydrazine, #匕〇, benzyl, pentyl, cyclohexyl, etc. . Examples of the stalk base include, except for the atoms constituting the ring, 'containing one kind or two kinds selected from nitrogen atoms, oxygen two 318750 20 200804250 1 to 4 and preferably 1 to 3 hetero atoms 5 „ 10 to 10 Member monocyclic to tricyclic heterocyclic group \ to 14 members, preferably 5 members in the body: 仏 is an early per- or bicyclic heterocyclic group, with a 5-membered heterocyclic group, such as 2-咦A 3-3- butterfly, 2, Loki, ratio: 2 3 嗔 基 ... 夫 夫 夫 夫 夫 夫 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2+ siting, ray, 51 stil, 4 gram sino, 4-isothiazolyl, 5-isothiazolamide, 1 yl 5·° tazozolyl, 3-isothiazolyl, 2-pyrazolyl , 3_pyrazolidine:: biszolyl, "Bizozolyl, 5-pyrazolyl, 1-yl, oxazol-5-yl, etc., - _5-yl, 1H-tetrazol-5-yl, 2H four 6-membered heterocyclic group, 祛' 〇I oxidized ~U-based group, oxidized group = group, 3, group, "匕. 定定, 2-t-定基基, 4_料基基基, N• oxidation base, _4+定基,队氧:;5: its base group, Ν-oxy-2-morpholinyl, 3_, porphyrinyl, 2-thiomorpholinyl, 3-thiomorpholinyl, thio-branyl, 3·(4) , 4 (four) base, 2_ 3- purchase, 4 side base, 2 2, 4_^ base, LB, well base, ^Π^, 3-1, 2 4--n#^1,4&quot;〇in^ ' ^ 2- 2_1, _ base, :!: its 5_1, 2, 4_ triterpene, 6, ^ ^ L well base, well base, 4 · ° 荅 ·, 2 " than thiol, N - oxidized soil emulsification - 4-thanoyl, etc., and D-based, 6-fluorenyl, 7-indenyl, 2-benzofuranyl, 318750 21 200804250 3-benzo, decyl, 4-benzopyranyl, Fumonyl, 6-benzoglyptyl, 7-open (tetra), sieving, 4 benzo(tetra)yl, benzoxyl, 6-benzo(tetra)yl, 7-benzo(tetra)yl, 2 _Benzene^, 4-benzolocarbazyl, 5-benzoxazolyl, 6-benzoxazolyl, benzoxazolyl, 2·benzo-saltyl, 4·benzimid Salivyl, 5-benzodiazepine, benzophenamimidyl, 7-benzo(tetra)yl, 2-propenyl, 3-(tetra)yl, 4-(tetra)yl, 5-quinolinyl, 6-quinolyl , 7_quinolinyl, 8-quinolinyl, isoquinolyl, 3-isoquinolinyl, 4-isoquinolinyl, 5-isoquinolyl, 6-isoquinolyl, 7-isoquinoline ,8-isoquinolyl, 丨_呔哄, 4_ 呔 基, 5 呔 呔, 呔哄 、, 7- fluorenyl 2-quinazolinyl, 4-quinazolinyl, quinazolinyl, 6-quinazolinyl, 7-quinazolinyl, 8-quinazolinyl, 2-quinoxalinyl, 3-quinoxa % phenyl, 5-quinoxalinyl, 6-quinoxalinyl, 7-quinoxalinyl, 8-quinoxalinyl, U morphine, 2 fluorenyl, hydrazine, 5 _ Indenyl, 6-mercapto, 7-fluorenyl, 8-mercapto, quinolinyl, quinolyl, 3_quinolinyl, 4-quinolyl, 6-quinacridyl, 7-quina Tillage, quinolyl, 9-hydroxyl, 2-1,8-acridinyl, 3-1,8-acridinyl, 4_1,8-acridinyl, "one mercapto, 2 -dibenzofuranyl, 3-dibenzohexanyl, dibenzofuranyl, 1-oxazolyl, 2-oxazolyl, 3-oxazolyl, 4-oxazolyl, 1- Acridinyl, 2_acridinyl, hydrazinyl, 4-acridinyl, 9-acridinyl, non-σ疋 group, 2-cyridinyl, 3-cyridinyl, 4-cyridinyl, 5-cylindinyl, 6-non. Indenyl, 7-cyridinyl, 8-cyridinyl, 9-cyridinyl, ι_bit; base, 3-spray, 4-spray, 5-spray, 6·spray, 7_spray Base, 8_propenyl, morphinyl, 2-phenylthienyl, 3-morphothinyl, 4-morphothinyl, phenothiaphthyl, 7-phenothiaphthyl, 8-morphothione , 9-morphothione, ^ 噚 噚 、, 2 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The base 6 is a county, a 7-(tetra)-cyano group, and a "heterocyclic group", which contains a group selected from the group consisting of 5 members and 2nd members, except for the oxygen-removing atom and the sulfur-derived Kyoko. To three heteroatoms "': or 7 (known as 5 or 6 members) heterocyclic group is preferred. Sub, oxygen and sulfur atoms... 反 The anti-atomic contains the nitrogen source g, ^ _ 5 to 1 of the heteroatoms of the group \ ^ hetero every base 'specifically, such as each thiol group, 24 fluorenyl group, 3-pyrrolidinyl group, soil 2 than each 疋3-pyrazolone 4 Earth, imidazolinyl, 2-pyrazole oleyl, 4-diyl, 4-indenyl, ..., 2-[beta], -, thiol, 2-piperidinyl, 3-piperidinyl, 4啶娘耕基, 琳琳基, 2_嗟▲卜辰哄基, 2-基,4+定基,ΜΜ基二Si^定基,H定3, 咯基,嗒啡 A土·&quot;, Piper The cultivating base, the 2·pyrimidinyl group, the terpene thiazolyl group, and the isozozolyl is a 6-membered nitrogen-containing heterocyclic group (for example, a mouth-biting base or the like), etc. 'For example, a preferred example thereof includes aroma. a heterocyclic group, which is selected from a carbon atom of a Cr atom, and contains one or two types: from a milk atom, an oxygen atom, and From i to 4 of the sulfur atom and from 5 to 14 members of the hetero atom, more preferably 5 members to: the fatty group is more preferably a monocyclic or bicyclic heterocyclic group, specifically: two; -pyrrolyl, 2-pyrrole^ L , ^ South 5^d /yl, pyrrole, 2-oxazolyl, 4-oxazolyl, sense ': oxazolyl, 4-isoxazolyl, 5 - Isoxazolyl, 2 - thiazolyl ... sialyl ... Sevaki, 3 -iso (tetra), 4 -isoindolyl, % 318750 23 200804250 ° ° ° sit, 3-吼. Sit, 4-° 峻 基, 5-mercapto, 2-mistyl, 4-imidazolyl, 5-imidazolyl, 1H-1,2,3-triazol-4-yl, 1H-1 , 2,3-triazol-5-yl, 1,2,4-tris-yttrium-3-yl, 1,2,4-trisole-5-yl, 5·1Η-four-sit-5- A 5-membered aromatic heterocyclic group such as a 2-membered aryl group, a 3-anzolidine group, or a 4-membered ring. Specific group, Ν-oxidation-2 -吼σ定基, Ν-oxidation-3 -ϋ ratio σ base, Ν-emulsified-4 -ϋ ratio σ base, 2-mouth σ base, 4-mouth σ base, dense bite Base, oxime-oxidized-2-nozzle sigma, oxime-oxidized-4-pyrimidinyl, oxime-oxidized-5-pyrimidinyl, 3-1,2,4-tri- ting, 5-1,2,4- Three tillage, 6-1, 2, 4-three tillage, 2-1, 3,5-three tillage, 3-mercapto, 4_ ° broth, 2-mer thiol, N-emulsified -3 - a thiol group, an N-emulsified-4_ hydrazine group, etc., and a bicyclic or tricyclic fused aromatic heterocyclic group, such as 2-benzopyranyl, 3-benzoquinone, 4-benzene弁, 5 、, 5-benzoquinone σ 南 、, 6-benzoquinone, 7-benzofuranyl, 2-benzothiazolyl, 4-benzothiazolyl, 5-benzothiazolyl, 6-benzothiazolyl, 7-benzothiazolyl, 2-benzoxazolyl, 4-benzoxazolyl, 5-benzoxazolyl, 6-benzoxazolyl, 7-benzo Carbazolyl, 1-benzo yttrium, 2-benzoxanthene, 4-benzoic 1:7 m decyl, 5-benzimidazolyl, 6-benzimidazolyl, 7-benzene And imidazolyl, 2-quinolyl, 3-quinolinyl, 4-indolyl, 5-indolyl, 6-fluorenyl, 7- Lysyl, 8-mercapto, 1-isoquinolinyl, 3-isoquinolinyl, 4-isoquinolinyl, 5-isoquinolinyl, 6-isoindolyl, 7-isoindolinyl , 8 -iso-ρ-Quinline, 1-Blow D well base, 4-Blowing base, 5-Blowing base, 6-Blowing base, 7-Blow D well base, 2-啥峻琳基,4-喧嗤 基 、, 5- 嗤 嗤 嗤 、, 6 - 啥嗤 基 、, 7 - 啥嗤 基 、, 8 - 啥嗤 基 、, 2 - 喧 若 若 琳 基, 3-啥. If Lin Kei, 5-啥. Jolinski, 6-嗟嗔琳基, 7-喧嗜24 318750 200804250 Scary, 8 · 啥嗓咐, its, well-based, "Bentyl, ': Well:, 2: 吲耕基, 3 _ morphine, 5_ 3-1,8-acridinyl, 418 soil, 8_° cited 11 well base, 2-1,8-pyridine group, oxime group ~ stupid: dibasic, i. diphenyl And biting the base, diphenyl and stimulating the base, 3 sitting base, south 4 base card, 丄 4 its diphenyl and biting the base, ~ sitting base, ten fixed base, "丫. Base, 9 fixed: bite base, 20 base, 3_ base, 2+ base, 3-brown bite,! ·Silver-based, Di Ermei, Dingji, 9-based, 6-morphothin D well t t 4 mentyl, 3- phenoxy lignin, 4-morphothiopene cultivating, 7 morphine嗜-非哄, 4-morphinyl, 6_"aromatic heterocyclic group ^8/# 基 base, 9 morphine, well base, etc. Selecting a free nitrogen atom, examples of oxygen include inclusion in addition to carbon atoms A group consisting of 5 members of a hetero atom or a group of atoms, a 3♦ group, a group, 3:; such as &gt; thiophene, + ^ ^ ^ 4, a pyridyl, 2-furyl, 3_furan Base, piperidinyl, 2-pyrimidinyl, 3 . ,  Spit, And 3-iso-salophilic, m / each base, 3_. 哄基基, 3_isotery t base, etc.). Further preferred examples of the fluorene-containing aromatic heterocyclic group (for example, "heterocyclic group" include "aromatic monocyclic heterocyclic group", For example, a 5-membered aromatic monocyclic heterocyclic group, Such as 2-mercapto, 3 "Famaki, 2_ thienyl, 3-thienyl, 2_pyrrolyl, 3_pyrrolyl, 2_carbazolyl, 4_ sputum, 5♦ recorded, 3_ 异基基, 4_ word 啥 base, 5_ is spit,  2_thiazolyl, 4_thiazolyl, 5_thiazolyl, 3_isothiazolyl, ‘isothiazole^,  5-isotery, 2-flavored, 4-mouth meter. Sitting on the ground, 5-imyl, Two two saliva ‘, ' 318750 25 200804250 4-pyrazolyl, 5-pyrazolyl, 1, 2, 3-oxadiazol-4-yl, 1, 2, 3-oxadiazol-5-yl 1 ' 2 ' 4 - di. Sitting on a 5-base, 1, 2, 4 - Π and so on. Sitting -3 _ base, 1, 3, 4 - tl and other di-sial-2-yl, Furfuryl, Thiadiazole _4_ group, Thiadiazole _5_ group,  1, 2, 4-σ-sodium-3-yl, 1, 2, 4-嗟二嗤-5-yl, 1, 3, 4-嗟2 π sitting-2-yl, 1H_1, 2, 3-triazole-4_yl, 1Η_1, 2, 3-triazole-5-yl, Ih-1, 254- triterpene-3-yl, 1H_tetrazole_5-yl, etc. And 6 members of the aromatic monocyclic heterocyclic group, Such as 2 - thiol, 3 -. Than the base,  4-acridinyl, 2-pyrimidinyl, 4-pyrimidinyl, 5-pyrimidinyl, 3-mercapto, 4-tower base, 2-pyridyl, 丨又仁三哄-3-基, 1, 2, 4-triphthyl-5-yl, 1, 2, 4-triphthyl-6-yl, i, 3, 5-San哄_2_ base and the like.  Preferred examples of the "lower alkyl sulfonyl group" in the "lower alkyl sulfonyl group" which is optionally substituted by one or more substituents represented by R1 include fluorenyl % S&amp; base, Ethyl sulphate, N-propyl sulphate Isopropyl tartaric acid,  N-butylsulfonyl, Isobutylsulfonyl, Second butyl sulfonyl group, Third butyl sulfonyl group, N-pentylsulfonyl, Second amylsulfonyl group, Isopentylsulfonyl group, Neopentylsulfonyl, N-hexylsulfonyl, Isopylsulfonyl and the like.  Preferred examples of "substituents" of "one or more substituents" in "lower alkyl sulfonyl group substituted by one or more substituents," Included from atoms (fluorine atoms, Chlorine atom, Bromine atom, Iodine atom), Nitro,  Cyano group, Base, a lower alkylcycloalkyl group substituted with a halogen atom as desired (e.g., cyclopropyl, Ring y base, Cyclopentyl, Cyclohexyl, etc.) Low Wei oxygen (eg methoxy, Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Iso-oxyl, Lacto-based, Hexyloxy, etc.) Amine, Or a bis (low carbon base) amine group (eg, a methylamino group, Ethylamino group, : Methyl silk, Diethylamino group #), Rebel  318750 26 200804250 Lower alkane fluorenyl (eg ethyl acetyl, Propionyl group, etc.) Lower alkoxycarbonyl (eg, oxime carbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Aminomethyl thiol, Amidoxime, Mono- or di-(lower alkyl)aminomercapto (for example, methyl ketone, fe-based, Ethylaminoglycol, Dimethylaminoglycol, Diethylamino fluorenyl, etc.) Arylaminocarboxamyl (e.g., phenylaminocarbamyl, Naphthylamine-based, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.),  a lower alkylcarbonylamino group substituted with a halogen atom as desired (for example, an acetamino group, Difluoroacetamido, etc.) a lower alkylthio group (eg, methylthio, etc.), a lower alkyl sulfinyl group (e.g., a fluorenyl sulfinyl group, etc.), a lower alkyl sulfonyl group (j column such as fluorenyl sulfonyl group, etc.), An arylsulfinyl group (eg, phenylsulfinyl,  Nikesulfinyl, etc.) Arylsulfonyl (eg phenylsulfonyl, Naphthyl stone, sulfhydryl, etc.).  Preferred examples of the aryl substituted with one or more substituents include phenylsulfonyl sulfonate, which is represented by R1 as an "arylsulfonyl" group, Naphthylsulfonyl and the like.  In the aryl ruthenyl group substituted by one or more substituents as needed: two? Preferred examples of the "substituent" of a solid or a plurality of substituents include a functional atom (a halogen atom, Chlorine atom, Bromine atom, Iodine atom), Nitro, Cyanamide a low-carbon alkyl group substituted by a tooth atom (eg, a gas-based group, 1 fluorine; ; , ,  two two: : = base, 2_ desert ethyl, 2, 2, 2_trifluoroethyl, Pentafluoroethane ^/:  ^ T I' 5'5'5-trifluoropentyl, 6, 6, 6- special), a low-disc ring-like base that is replaced by a tooth atom (eg, an oxygen m, Pentylene, Cyclohexyl, etc.) Low-disk alkoxy groups (eg, methyl-based, Propoxy, Isopropyloxy, Butoxy, Isobutoxy,  318750 27 200804250 pentyloxy, Hexyloxy, etc.) Amine, a mono- or di-(lower alkyl)amine group (eg, a mercaptoamine group, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) carboxyl,  Lower alkane fluorenyl (eg ethyl acetyl, Propionyl group, etc.) Lower alkoxycarbonyl (eg, oxime carbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Amine thiol, Amidoxime, Mono- or di-(lower alkyl)amino fluorenyl (eg, decylaminomethyl fluorenyl, Ethylamino fluorenyl, Dimethylaminocarbamyl, Diethylamino fluorenyl, etc.) Arylaminocarboxamyl (e.g., phenylaminocarbamyl, Naphthylamino group, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.),  a lower alkylcarbonylamino group substituted with a halogen atom as desired (e.g., an ethylamino group, Trifluoroethenylamine, etc.) a lower alkylthio group (eg, a thiol group, etc.), a lower alkyl sulfinyl group (eg, a fluorenyl sulfinyl group, etc.), a lower alkyl sulfonyl group (e.g., a mercaptosulfonyl group, etc.), Arylsulfinyl (for example, phenylsulfinyl, Nikia continued to s basket base, etc.) Aryl yttrium group (eg phenyl ruthenium,  Naphthylsulfonyl group, etc.).  Preferred examples of the "low-carboalkylthio group" in the "low-carboalkylthio group which is optionally substituted by one or more substituents" represented by R1 include a methylcarbonylthio group, Ethylcarbonylthio, N-propylcarbonylthio, Isopropylcarbonylthio, n-Butylcarbonylthio, Isobutylcarbonylthio, Second butylcarbonylthio group, Tert-butylcarbonylthio, N-pentylcarbonylthio group, Dipentylcarbonylthio group, Isopenylcarbonylthio, Neopentylcarbonylthio, Is a thiolthio group, Isopyl thiol and the like.  Preferred examples of "substituents" of "one or more substituents" in "lower alkylcarbonylthio group substituted by one or more substituents as needed" include and Substituent substituted lower alkyl sulfonate 28 318750 200804250 fluorenyl" exemplifies the same substituents as the "substituent".  Preferred examples of the "lower alkoxycarbonylthio group" in the "lower alkoxycarbonylthio group which is optionally substituted with one or more substituents" represented by R1 include a fluorenylcarbonylthio group, Ethoxycarbonylthio group, Propoxycarbonylthio, Isopropyloxycarbonylthio, Butoxycarbonylthio group, Isobutoxycarbonylthio, Third butoxycarbonylthio group, Pentyloxycarbonylthio, Third pentyloxycarbonylthio group, Neopentyloxycarbonylthio group, Hexyloxythio group, Isoprene oxycarbonylthio group, etc. And preferred examples of "substituents" of "one or more substituents" in "lower alkoxycarbonylthio group substituted by one or more substituents as needed" include and The substituents substituted with a lower alkyl sulfonyl group are exemplified by the same substituents as the "substituent".  Preferable examples of the "aryloxycarbonylthio group" in the "aryloxycarbonylthio group which is optionally substituted with one or more substituents" represented by R1 include a phenoxycarbonylthio group, Naphthyloxycarbonylthio, And preferred examples of "substituents" of "one or more substituents" in the "aryloxycarbonylthio group substituted with one or more substituents as necessary" include and the "optionally substituted by one or more The substituted arylsulfonyl group "exemplifies the same substituent as the "substituent".  Represented by R1 as "one of the substitutions of one or more substituents as needed" &quot; Preferred examples of the "mono- or di-(low-carboalkyl)aminosulfonyl group" in the di-(lower alkyl)amino group-based S basket include a mercaptoaminosulfonyl group, Dimethylaminosulfonyl, Ethylmethylaminosulfonyl, Diethylaminosulfonyl, etc.  And a "substituent" vehicle of "one or more substituents" in the "one or more - (lower carbon 29 318750 200804250 alkyl) aminosulfonyl group as required by one or more substituents"乂 “Bei cases include and the low-stone anger-burning stone that is replaced by one or more substituents as needed? , The substituents which are the same as the "substituent" are exemplified.  "A- or di-(aryl)aminosulfonyl) as defined by R1, "optionally substituted with one or more substituents - or a di-(aryl)aminosulfonyl group" More than 仫μ examples include phenylaminosulfonyl, Diphenylamino acid group,  Naphthylaminosulfonyl group, etc. And the "substituent" of "one or more substituents in one of the _ or bis(aryl)aminosulfonyl groups substituted by one or more substituents as required" The same substituents as the "substituent" exemplified as the "arylsulfonyl group substituted with one or more substituents as necessary".  Preferred examples of the "lower alkyl group" in the "low-carbon anomeric group which is optionally substituted by one or more substituents" represented by R include a methyl group, Ethyl,  N-propyl, Isopropyl, n-Butyl, Isobutyl, Second butyl, Third butyl,  N-pentyl, Second amyl group, Isoamyl, Neopentyl, Orthodox Alien group, etc.  as well as ,  ,  Preferred examples of the "substituent" of "one or more substituents" which are optionally substituted with one or more substituents include a tooth atom (a gas atom, Chlorine atom, Desert atom, Atom atom), Confirmation Atmospheric base,  Low, for example, (4) (4)), Low Carbon Wire County &amp; Such as : Milk carbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) If necessary, a lower alkyl cycloalkyl group (eg, cyclopropyl, Cyclobutyl, Cyclopentyl,  Cyclohexyl, etc.) Heterocyclic group, etc. And here, Preferred examples of the "heterocyclic group" include "aromatic monocyclic heterocyclic ring 318750 30 200804250 soil" and the example of "aromatic monovalent heterobasic base" includes a 5-membered aromatic monocyclic heterogeneous group. 4 such as 2 · biting the base, 3_吱吱基, 2• 嗟,, 3_嗟,, = pyridyl, 3·° than 嘻 base, 2♦ seated, 4♦ seated, 5 sound lines, /isoxazolyl, 4_isoxazolyl, 5_isoxazolyl, 2_thiazolyl, Heart thiazolyl,  5-. Salivation 3_heterogenous base, 4_iso (four) base, 5 different (four) base, ^ rice sulphate 4 azozolyl, 5_imidazolyl, 3_pyrazolyl, 4_pyrazolyl, 5_pyrazolyl,  1, 2, 3-oxadiazole _4_ group, M噚 diazide, Oxadiazole ^ base, ι, 2, 4-曙二峻_3_基, Um24, Bite the base, m thiadipine _4·yl, Up stopper diazole _5_ base, U4-嗟二唾_3_基, ^心 thiadiazole _5_ base, U, 4·thiadiazole·2_ base, 1H-1, 2, 3-triazole _4_ base',  1H-1, 2, 3-triazole _5_ group, Triazole _3_ base, Ih_tetrazole _ _ special and a 6-membered aromatic monocyclic heterocyclic group, Such as 2_pyridyl, Rhodium pyridyl,  匕定基2- When σ base, 4-spray base, 5-pyrimidine base, 3-tower d-based, 4_ morphine, 2-哎耕基, U, 4_Three tillage I base, u, 4_trimorphine _5_ base, u, 4_ trimorphine-6-based, 1, 3, 5_ trimorph-2-yl and the like.  Preferred examples of the "low carbon dilute group" which is represented by R1 as "substituted as a low carbon sulfhydryl group substituted by one or more substituents" include an ethylene group, Dilute propyl, Isopropenyl, Isobutenyl, 丨_methylallyl, 2_pentenyl, 2_ hexenyl, etc. And in "low-carbon alkenyl substituted by one or more substituents as needed": Preferred examples of the "substituent" of one or more substituents include a tooth atom (a fluorine atom, Chlorine atom, Bromine atom, Iodine atom), Nitro, Cyano group,  A low-carbon cyclic alkyl group substituted by a tooth atom (for example, cyclopropyl 318750 31 200804250, Cyclobutyl, Cyclopentyl, Cyclohexyl, etc.) Lower alkoxy (e.g., methoxy, Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy, Hexyloxy, etc.) Amine, Mono- or di-(lower alkyl)amine groups (eg, decylamino groups, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) carboxyl,  Lower alkane fluorenyl (eg ethyl acetyl, Propionyl group, etc.) Lower alkoxycarbonyl (e.g., methoxycarbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Aminomethyl thiol, Amidoxime, Mono- or di-(lower alkyl)aminocarbinyl (e.g., decylaminomethyl fluorenyl, Ethylamino fluorenyl, Dimethylaminomethyl decyl, Diethylaminocarbamyl, etc.) Arylamino fluorenyl (eg phenylamino fluorenyl, Naphthylamino group, etc.) Aryl (eg phenyl, Naphthyl, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.), a lower alkylcarbonylamino group substituted with a halogen atom as desired (for example, an acetamino group, Trifluoroethenylamine, etc.) a lower alkylthio group (e.g., a thiol group, etc.), a lower alkyl sulfinyl group (e.g., a methyl sulphate, etc.), Low-carbon base, such as methyl continuation base, Arylthio (eg phenylthio, Naphthylthio group, etc.) An arylsulfinyl group (eg, phenylsulfinyl, Naphthyl hydrazine, etc.) Aryl read thiol group (eg phenyl thiol group, Naphthyl huangyunji, etc.).  Preferred examples of the "lower alkynyl group" in the "lower alkynyl group substituted by one or more substituents as required" represented by R1 include an ethynyl group, 2-propyl fast radical, 1-propyl fast radical, 2 - Ding fast base, 3 - Ding fast base, 3-戍 fast base, 3-fast base, etc. And preferred examples of the "substituent" of "one or more substituents" in the "lower alkynyl group substituted by one or more substituents as necessary" include a halogen atom (a fluorine atom, Chlorine atom, Bromine atom, Iodine atom), Nitro, Cyano group,  32 318750 200804250 Hydroxy, a lower alkylcycloalkyl group substituted with a halogen atom as desired (e.g., cyclopropyl, Cyclobutyl, Cyclopentyl, Cyclohexyl, etc.) Lower alkoxy (e.g., methoxy, Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy, Hexyloxy, etc.) Amine, Mono- or di-(lower alkyl)amine groups (e.g., methylamino, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) carboxyl,  Lower alkane fluorenyl (eg ethyl acetyl, Propionyl group, etc.) Lower alkoxycarbonyl (eg, oxime carbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Aminomethyl thiol, Amine thiomethyl thiol, Mono- or di-(lower alkyl)amino fluorenyl (e.g., methylaminomethyl fluorenyl, Ethylamino fluorenyl, Dimethylaminocarbamyl, Diethylaminocarbamyl, etc.) Arylamino fluorenyl (eg phenylamino fluorenyl, Naphthylaminocarbenyl, etc.) Aryl (eg phenyl, Naphthyl, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.), a lower alkylcarbonylamino group substituted with a halogen atom as desired (for example, an ethylamino group, Trifluoroethylamino group, etc.) Low resistance to burning sulfur (such as methylthio, etc.), a low-carbon alkyl group, such as a sulfhydryl group, a lower alkyl sulfonyl group (eg, a mercaptosulfonyl group, etc.),  Arylthio (eg phenylthio, Naphthylthio group, etc.) Aryl-based acid group (eg phenyl sulfinyl, Naphthylsulfinyl group, etc.) Arylsulfonyl (for example, phenylsulfonyl, Naphthylsulfonic acid group, etc.).  Preferred examples of the "lower cycloalkyl group" in the "lower cycloalkyl group which is optionally substituted by one or more substituents" represented by R1 include a cyclopropyl group,  Cyclobutyl, Cyclopentyl, Cyclohexyl, etc. And preferred examples of the "substituent" of "one or more substituents" in the "lower cycloalkyl group substituted with one or more substituents as necessary" include a halogen atom (a fluorine atom, Chlorine atom, Desert atom, Helium atom), Nitro, Cyano group,  33 318750 200804250 Hydroxy, a lower alkyl group substituted with a halogen atom as needed (eg, fluorenyl, Chloroguanidyl, Difluoromethyl, Tri-gas methyl, Trifluoromethyl, Ethyl, 2-bromoethyl,  2, 2, 2-trifluoroethyl, Pentafluoroethyl, Propyl, 3, 3, 3-trifluoropropyl, Isopropyl, Butyl, Isobutyl, Second butyl, Third butyl, 4, 4, 4-trifluorobutyl,  Amyl, Isoamyl, Neopentyl, 5, 5, 5-trifluoropentyl, Hexie, 6, 6, 6-trifluorohexyl, etc.), Lower alkoxy (eg methoxy, Ethoxylate, Propoxy,  Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy, Hexyloxy, etc.) Amine,  a mono- or di-(low-carbon alkyl) amine group (eg, a mercaptoamine group, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) carboxyl, Lower alkane fluorenyl (eg ethyl acetyl,  Propionyl group, etc.) a lower alkoxycarbonyl group (e.g., a methoxycarbonyl group, Ethoxycarbonyl, Propyloxycarbonyl, Butoxycarbonyl, etc.) Aminomethyl thiol, Amidoxime, Mono- or di-(lower alkyl)aminocarbenyl (eg methylamino thiol, Ethylamino thiol, Dimethylaminomethyl decyl, Diethylaminocarbamyl, etc.) Arylamino fluorenyl (eg phenylamino fluorenyl, Naphthylamino decanoic acid group, etc.)  Aryl (eg phenyl, Naphthyl, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.),  a lower alkylcarbonylamino group substituted with a halogen atom as desired (for example, an acetamino group, Trifluoroethenylamine, etc.) a lower alkylthio group (such as a thiol group, etc.), Low-carbon bases, such as thiophene, etc. Low-carbon bases (eg, methylsulfonyl, etc.), Arylthio (eg phenylthio, Naphthylthio group, etc.) Arylsulfinyl group (e.g., phenylsulfinyl, Naphthylsulfinyl group, etc.) Arylsulfonyl (eg phenylsulfonyl, Naphthylsulfonyl group, etc.).  Preferred examples of the "aryl lower alkyl group" in the "aryl lower alkyl group" which is optionally substituted by one or more substituents represented by R1 include a benzyl group,  Naphthoquinone, 蒽Methyl, etc. And 34 318750 200804250 Preferred examples of the "substituent" of "one or more substituents" in the "aryl lower alkyl group substituted with one or more substituents as necessary" include a halogen atom (a fluorine atom, Gas atom, Bromine atom, Moth atom), Nitro, Cyano group,  Light base, a low-carbon alkyl group substituted with a halogen atom (for example, a chloromethyl group, Difluorodecyl,  Monomethyl, Difluoromethyl, 2-bromoethyl, 2, 2, 2-trifluoroethyl, Pentafluoroethyl, 3, , 3-difluoropropyl, 4, 4, ‘trifluorobutyl, 5, 5, 5_trifluoropentyl, 6, 6, 6_ difluorohexyl, etc.), a lower alkylcycloalkyl group substituted with a halogen atom as desired (for example, a cyclopropyl group, Cyclobutyl, Cyclopentyl, Cyclohexyl, etc.) Lower alkoxy group (e.g., decyloxy, Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy,  Pentyloxy, Hexyloxy, etc.) Amine, a _ or a di-lower alkylamino group (eg, a methylamino group, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) carboxyl,  Lower alkane fluorenyl (eg ethyl acetyl, Propionyl group, etc.) Lower alkoxycarbonyl (e.g., methoxycarbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Aminomethyl thiol, Amine thiomethyl thiol, Mono- or di-lower alkyl)aminomercapto (for example, methylaminocarbamyl, Ethylaminomethylmercapto, Dimethylaminocarbamyl, Diethylaminocarbamyl, etc.) Arylaminocarboxamyl (e.g., phenylaminocarbamyl, Naphthylaminocarbenyl, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.),  a lower alkylcarbonylamino group substituted with an atom, such as an acetamino group, Difluoroacetamido, etc.) a lower alkylthio group (eg, methylthio, etc.), Low-stone anti-alkyl hydrazinyl (eg, methylsulfinyl, etc.), a lower alkylsulfonyl group (e.g., methylsulfonyl, etc.), Arylthio (eg phenylthio, Naphthylthio group, etc.) Arylsulfinyl group (e.g., phenylsulfinyl, Naphthylsulfinyl group, etc.) Aryl group (eg phenylsulfonyl, Naphthylsulfonyl group, etc.).  Preferred examples of the "aryl group" in the "aryl group 318750 35 200804250 group substituted by one or more substituents as indicated by R1" include a phenyl group, Trimethylbenzene, Diphenyl, Tolyl, Qin Ji, Enki, Nitrodiazepine, Biphenyl, etc. And preferred examples of the "substituent" of "one or more substituents" in the "aryl group substituted with one or more substituents as necessary" include a halogen atom (fluorine atom, Chlorine atom, Bromine atom, Atom atom), Confirmation Cyano group, Hydroxy, a lower alkyl group substituted with a halogen atom (for example, a chloroantimonyl group, Difluorodecyl, Trichloromethyl, Difluorodecyl, 2 -&gt; Stinky ethyl 2, 2, 2-trifluoroethyl, Five gas ethyl, 3, 3, 3_trifluoropropyl, 4, 4, 4-trifluorobutyl, 5, 5, 5-trifluoropentyl, 6, 6, 6-trifluorohexyl, etc.), a lower cycloalkyl group substituted with a halogen atom as desired (eg, cyclopropyl,  Cyclobutyl, Cyclopentyl, Cyclohexyl, etc.) Lower alkoxy (eg, decyloxy,  Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy,  Hexyloxy, etc.) Amine, a mono- or di-(lower alkyl)amine group (eg, a mercaptoamine group, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) Rebel a lower alkyl alkane group (e.g., an ethylene group, Propionyl group, etc.) Lower alkoxycarbonyl (e.g., oxime carbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Amino thiol,  Amidoxime, Mono- or di-(lower alkyl)amino fluorenyl (e.g., decylaminomethyl fluorenyl, Ethylamino fluorenyl, Dimethylamino fluorenyl, Diethylamino fluorenyl, etc.) Arylamino fluorenyl (eg phenylaminomethyl fluorenyl,  Naphthylamino group, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.), a lower alkylcarbonylamino group substituted with a halogen atom as desired (e.g., an acetamino group, Trifluoroethenylamine, etc.) a lower alkylthio group (eg, methylthio, etc.), a low-carbon alkyl group (for example, a mercapto acid group, etc.), a low-carbon alkyl group (for example, a mercaptosulfonyl group, etc.), Arylthio (eg phenylthio, Naphthylthio group, etc.) Arylsulfinyl group (e.g., phenylsulfinyl, Naphthylsulfinyl group, etc.) Aryl 36 318750 200804250 Sulfonyl (eg phenylsulfonyl, Naphthylsulfonyl group, etc.).  The "low-wet oxygen carbon (IV) example of "low-carbon alkoxy low (tetra)-based", which is represented by R1, which is substituted with one or more substituents as desired, includes a methoxymethyl group, Ethoxymethyl, 2_methoxyethyl, 2_ethoxy, base, 3_methoxypropyl, 3_ethoxypropyl, &quot; Oxybutyl group,  ^Ethyl butyl, 5. Methoxypentyl, 5_ethoxypentyl, 6•methoxyl, 6-ethoxyhexyl, etc. And a preferred example of a "substituent" of "low or alkoxyoxyl low-calcium anti-burning group" which is substituted with one or more substituents as required, including "- or more substituents", includes muons ( Fluorine atom, Chlorine atom, Performing atomic, Lin atom), Confirmation Less, If necessary (4), replace the low Wei Cai (such as cyclopropyl butyl, % pentyl, Cyclohexyl, etc.) Low carbon alkoxy (10) such as methoxy, Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, 戊 虱, Hexyloxy, etc.) Amine, ~ or di(lower alkyl)amine groups (eg, methylamino groups, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) Several bases,  «(4) base (eg B (four), (4) Base, etc.) Low carbon burning oxygen (4) (eg, methyl milk based, Ethoxy (four), Propoxygen, Butoxycarbonyl, etc.) Aminomethyl ketone Mono- or di-low-carbon alkyl)amino styrene (eg, methylaminomethyl, Ethylaminoglycol, Dimethylaminocarbamyl, Diethylamine-based Jia County, etc.) An arylamine group (e.g., phenylaminocarbamyl, Naphthylaminocarbenyl, etc.) Aryl (eg phenyl, Naphthyl, etc.) Aryloxy (eg phenoxy, #氧#), Substituting (iv) for the substituting of a lower alkoxyalkyl group (eg, an ethenylamino group, Trifluoroethenylamine, etc.) Low carbon thiol group (such as methylthio group, etc.), a low-carbon pyridene group (eg, methyl 318750 37 200804250, etc.), Low carbon sulfonyl group (eg, methyl sulfonate, etc.), Arylthio group, such as -thio group, Naphthylthio group, etc.) Aryl sulphate yellow base (for example, phenyl slate yellow stuffed earth, Naphthylsulfinyl group, etc.) Arylsulfonyl (eg phenylsulfonyl, Naphthyl yellow wine base, etc.).  τ ^ in the "aryloxylow carbon anion group" represented by R "optionally substituted by one or more substituents" in the aryloxy oligocarbonate" phenoxymethyl phenoxyethyl , 3_phenoxypropyl group, etc. Preferred examples of the "substituent" of "one or more substituents" of "one or more substituents" which are substituted with "one or more substituents substituted by one or more substituents" include halogen atoms (fluorine). atom, Chlorine atom, Bromine atom, Iodine atom), Nitro,  Murine base, Hydroxy, a lower alkylcycloalkyl group substituted with a halogen atom as desired (e.g., cyclopropyl, Cyclobutyl, Cyclopentyl, Cyclohexyl, etc.) a lower alkyl group substituted with a halogen atom as desired (eg, chloromethyl, Difluoromethyl, Trichloromethyl, Trifluoromethyl,  2-&gt; Stinky ethyl 2, 2, 2-trifluoroethyl, Pentafluoroethyl, 3, 3, 3_trimethyl propyl,  4, 4, 4-trifluorobutyl, 5, 5, 5_trifluoropentyl, M, 6_Trifluorohexyl, etc.), Lower alkoxy (eg, decyloxy, Ethoxylate, Propoxy, Isopropyloxy, Butoxy group, Xing butyloxy, Pentyloxy, Hexyloxy, etc.) Amine, a _ or a di-lower alkylalkylamine group (eg, a methylamino group, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) carboxyl, Lower alkane fluorenyl (eg ethyl acetyl, Propionyl group, etc.)  Lower alkoxycarbonyl (eg methoxycarbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Amino thiol, Amidoxime, Mono- or di-(lower alkyl)aminocarbenyl (eg methylamino thiol, Ethylaminomethylmercapto, Dimethylaminocarbamyl, Diethylaminocarbamyl, etc.) An arylaminocarbenyl group (e.g., a styrylamino group, Naphthylaminocarbenyl, etc.) Aryloxy (eg benzene 318750 38 200804250 oxy, Naphthyloxy, etc.), a lower alkylcarbonylamino group substituted with a halogen atom as desired (e.g., an ethenylamino group, Trifluoroethenylamine, etc.) a lower alkylthio group (e.g., a thiol group, etc.), a lower alkyl sulfinyl group (eg, methylsulfinyl, etc.),  a lower alkyl sulfonyl group (eg, a mercaptosulfonyl group, etc.), Arylthio (e.g., phenylthio, Naphthylthio group, etc.) An arylsulfinyl group (eg, phenylsulfinyl, Naphthyl sulfinyl group, etc.) Arylsulfonyl (eg phenylsulfonyl, Naphthylsulfonyl, etc.).  Preferred examples of the "lower alkylthio-lower alkyl group" in the "low-carboalkylthio-lower alkyl group" which is represented by R1 and which are optionally substituted by one or more substituents include methylthiomethyl group. , Ethylthio group, 2-methylthioethyl, 2-ethylthioethyl, 3-methylthiopropyl, 3-ethylthiopropyl, 4-nonylthiobutyl,  4-ethylthiobutyl, 5-methylthiopentyl, 5-ethylthiopentyl, 6-Methylthiohexyl, 6-ethylthiohexyl, etc. And preferred examples of the "substituent" of "one or more substituents" in the "low-carbon alkylthio-based low-carbon alkyl group substituted by one or more substituents as necessary" include a halogen atom (in terms of an atom, Chlorine atom, Bromine atom, Moth atom), Wall foundation, Cyano group, Hydroxy, a lower carbocyclic group substituted with a halogen atom as desired (eg, cyclopropyl, Cyclobutyl, Cyclopentyl, Cyclohexyl, etc.) Lower alkoxy (eg, decyloxy, Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy,  Pentyloxy, Hexyloxy, etc.) Amine, a mono- or di-(low carbon alkyl) amine group (eg, a mercaptoamine group, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) Rebel  Lower alkane fluorenyl (eg ethyl acetyl, Propionyl group, etc.) Lower alkoxycarbonyl (eg, oxime carbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Amine thiol, Amidoxime, Mono- or di-(lower alkyl)amino fluorenyl (eg 曱 39 318750 200804250 arylaminomethyl, Ethylaminomethylmercapto, Dimethylaminocarbamyl, Diethylamino fluorenyl, etc.) Arylaminocarboxamyl (e.g., phenylamino fluorenyl, Naphthylaminocarbenyl, etc.) Aryl (eg phenyl, Naphthyl, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.), a low-carbon alkylamino group substituted with an iS atom as desired (eg, an acetoxy group, Trifluoroethylamino group, etc.) a lower alkylthio group (e.g., a thiol group, etc.), a lower alkyl sulfinyl group (e.g., a fluorenyl sulfinyl group, etc.), a lower alkyl sulfonyl group (eg, a mercaptosulfonyl group, etc.), Arylthio (eg phenylthio, Naphthylthio group, etc.) Aryl sulfhydryl (for example, phenyl sulfhydryl, Nikeya mineral acid base, etc.) An aryl acid group (for example, a phenyl group, Neptylsulfonyl, etc.).  A preferred example of "low-carbon alkyl-based acid-lower alkyl group" in "low-carbon alkyl-based low-carbon alkyl group substituted by one or more substituents as indicated by R1" Including sulfhydryl sulfhydryl sulfhydryl groups, Ethyl sulfinyl fluorenyl group, 2 - fluorenyl sylvestreyl ethyl, 2-ethyl sulphate yellow ethyl ^ 3 - fluorenyl sulfinyl propyl, 3-ethylsulfinylpropyl, 4-methylsulfinyl butyl, 4-ethylsulfinyl butyl, 5-methylsulfinylpentyl, 5-ethyl phenyl recalcyl pentyl, 6-曱基亚石黄毛基基, 6-ethyl sulphite, hexyl, etc. And preferred examples of the "substituent" of "one or more substituents" in the "lower alkyl sulfinyl lower alkyl group substituted by one or more substituents as needed" include The same substituents as the "substituent" exemplified by the lower alkylalkylthio lower alkyl substituted by one or more substituents are required.  "Low-carbon calcined base-based low-carbon alkyl group" in "low-carbon alkyl-based acid-based low-carbon alkyl group" which is represented by R1 as "required to be substituted by one or more substituents" 40 318750 200804250 Examples include mercaptosulfonyl fluorenyl groups, Ethylsulfonylmethyl, 2_曱 sulfonyl ethyl, 2-ethylsulfonylethyl, 3-mercaptosulfonylpropyl,  3. Ethyltriterpenylpropyl, 4-mercapto-stone xanthyl butyl, 4-ethyl sulphate, 5-mercapto-stone xanthyl pentyl, 5-ethyl feldsyl pentyl, 6•methyl stone xanthine, hexyl group, 6-ethylsulfonylhexyl, etc. And preferred examples of "substituents" of "one or more substituents" in "lower alkyl sulfonyl lower alkyl substituted by one or more substituents as needed" include The lower substituents of the "substituent" exemplified by the lower alkylalkylthio lower alkyl substituted by one or more substituents.  Preferably, the "lower alkylamino-based lower alkyl group" in the "one or one-di-lower alkylamino-based lower alkyl group substituted by one or more substituents" as defined by R1 Examples include decylaminomethyl, Dimethylaminomethyl,  Methyl ethylaminomethyl, 2-(methylamino)ethyl, 2_(dimethylamino)ethyl, 3-(methylamino)propyl, 3_(dimethylamino)propyl, 3_(ethylamino)propyl, 4-(methylamino)butyl, ‘(Dimethylamino)butyl, 5_(decylamino)pentyl, 5-(dimethylamino)pentyl, 6 methylamino) hexyl, &amp;  Methylamino)hexyl, etc. And preferred examples of the "substituent" of "one or more substituents" in the "replacement of one or more substituents or one or more of the lower alkyl group-based lower carbonyl groups" as required Tooth atom (fluorine atom, Chlorine atom, Desert atom, Aegis), Breaking base mt base, a lower carbocyclic thio group substituted with a halogen atom as desired (eg, a ring group, Ring base, Ring wire, Cyclohexyl, etc.) Low carbon courtyard oxygen (eg methoxy, Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Ributoxy, Pentyloxy, Hexyloxy, etc.) Amine... or two (low carbon ray),  318750 41 200804250 Amino (eg decylamino, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) carboxyl, Lower alkane fluorenyl (eg ethyl acetyl, Propionyl group, etc.) Lower oxycarbonyl (for example, oxime carbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Amino thiol, Amine thiomethyl thiol, a mono- or di-(lower alkyl)amino group (for example, a mercaptoamino group, Ethylaminomethylmercapto, Dimethylaminocarbamyl, Diethylamino fluorenyl, etc.) Arylaminocarbamyl (e.g., phenylamino fluorenyl, Naphthylamino group, etc.) Aryl (eg phenyl,  Naphthyl, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.), a low-carbon burnt-based amine group substituted with a halogen atom (eg, an acetoxy group, Tri-ethoxyethylamine, etc.) a lower alkylthio group (such as a thiol group, etc.), a lower alkyl sulfinyl group (e.g., a fluorenyl sulfinyl group, etc.), a lower alkylsulfonyl group (e.g., a mercaptosulfonyl group, etc.), Arylthio (eg phenylthio, Naphthylthio group, etc.) Arylsulfinyl (for example, phenylsulfinyl, Naphthylsulfinyl group, etc.) Arylsulfonyl (for example, phenylsulfonyl, Naphthylsulfonyl group, etc.).  Preferred examples of the "lower alkyl fluorenyl group" in the "lower alkyl fluorenyl group which is optionally substituted by one or more substituents" represented by R1 include an ethyl hydrazine group,  Propionyl group, Ding Yiji, Isobutyl sulfhydryl, Pentamidine, Isoamyl Pentylene, Pentamidine, 醯基基, etc. And preferred examples of the "substituent" of "one or more substituents" in the "lower alkyl alkane group substituted with a plurality of substituents" include a halogen atom (a fluorine atom, Chlorine atom, Bromine atom, Iodine atom), Nitro, Cyano group, Hydroxy group, a lower acyclic cycloalkyl group which may be substituted with a halogen atom as required (for example, a cyclopropyl group, Cyclobutyl, Cyclopentyl, Cyclohexyl, etc.) Lower alkoxy (eg methoxy, Ethoxy, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy,  42 318750 200804250 hexyloxy, etc.), Amine, Mono- or di-(low carbon alkyl) amine groups (eg methylamino groups, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) Rebel a lower alkyl alkane group (e.g., an ethylene group, Propionyl group, etc.) Lower alkoxycarbonyl (e.g., methoxycarbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Amino thiol,  Amidoxime, Mono- or di-(lower alkyl)amino fluorenyl (eg, fluorenyl fluorenyl, Ethylaminomethylmercapto, Dimethylamino fluorenyl, Diethylaminocarbamyl, etc.) Arylamino fluorenyl (eg phenylamino fluorenyl,  Naphthylamino decanoic acid group, etc.) Aryl (eg phenyl, Naphthyl, etc.) Aryloxy (e.g., phenoxy, Naphthyloxy, etc.), a lower alkylcarbonylamino group substituted with a halogen atom as desired (e.g., an ethylamino group, Trifluoroethenylamine, etc.) a lower alkylthio group (e.g., sulfonylthio group, etc.), a lower alkyl sulfinyl group (eg, a fluorenyl sulfinyl group, etc.), a lower alkylsulfonyl group (eg, methylsulfonyl, etc.), Arylthio (e.g., phenylthio, Naphthylthio group, etc.) Aryl sulfonate (eg, phenyl sulfhydryl, Naphthyl sulfinate, etc.) Arylsulfonyl (eg phenylsulfonyl, Naphthylsulfonyl group, etc.). Examples of the "lower alkyl alkane group substituted by one or more substituents as needed" specifically include a trifluoroethyl fluorenyl group, Ethyl bromide, Methylthioethyl group, Mercaptosulfonylamino group, And sulfhydryl sulfhydryl group.  Preferred examples of the "lower alkoxycarbonyl group" in the "lower alkoxycarbonyl group substituted by one or more substituents as required" represented by R1 include a methoxycarbonyl group, Ethoxycarbonyl, Propoxycarbonyl, Isopropyloxycarbonyl, Butoxycarbonyl, Third butyloxycarbonyl, Pentyloxycarbonyl and hexyloxycarbonyl, And preferred examples of the "substituent" of "one or more substituents" in the "lower alkoxycarbonyl group substituted by one or more substituents as necessary" include a halogen atom (a fluorine atom, Chlorine atom, Bromine atom, Iodine atom), Nitro, Cyano group,  43 318750 200804250 Hydroxy, a lower cycloalkyl group substituted with a halogen atom as desired (eg, cyclopropyl, Cyclobutyl, Cyclopentyl, Cyclohexyl, etc.) Lower alkoxy (eg methoxy, Ethoxy, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy,  Hexyloxy, etc.) Amine, a mono- or di-(lower alkyl)amine group (eg, a mercaptoamine group, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) Rebel a lower alkyl alkane group (e.g., an ethylene group, Propionyl group, etc.) Lower alkoxycarbonyl (e.g., methoxycarbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Amino thiol,  Amine thiomethyl thiol, Mono- or di-(lower alkyl)amino fluorenyl (e.g., decylaminomethyl fluorenyl, Ethylaminomethylmercapto, Dimethylamino fluorenyl, Diethylaminocarbamyl, etc.) Arylamino fluorenyl (eg phenylamino fluorenyl,  Naphthylamino group, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.), a lower alkylcarbonylamino group substituted with a halogen atom as desired (e.g., an acetamino group, Trifluoroethenylamine, etc.) a lower alkylthio group (such as a thiol group, etc.), a lower alkyl sulfinyl group (e.g., a fluorenyl sulfinyl group, etc.), a lower alkylsulfonyl group (e.g., a fluorenyl acid group, etc.), Arylthio (eg phenylthio, Naphthylthio group, etc.) Arylsulfinyl group (e.g., phenylsulfinyl, Naphthylsulfinyl group, etc.) Arylsulfonyl (eg phenylsulfonyl, Naphthylsulfonyl group, etc.).  Preferable examples of the "aryloxycarbonyl group" in the "aryloxycarbonyl group optionally substituted by one or more substituents" represented by R1 include a phenoxycarbonyl group, And naphthyloxycarbonyl, And preferred examples of the "substituent" of "one or more substituents" in the "aryloxycarbonyl group substituted by one or more substituents as necessary" include a halogen atom (a fluorine atom, Chlorine atom, Bromine atom, Iodine atom), Nitro, Cyano group,  Hydroxy, a lower alkyl group substituted with a halogen atom (eg, chloromethyl, Difluoromethyl,  44 318750 200804250 Dimethyl, Two chaotic bases, 2 -&gt; Stinky ethyl 2, 2, 2 - digas ethyl, Pentafluoroethyl group, 3, 3, 3-trifluoropropyl, Isopropyl, Butyl, Isobutyl, Second butyl,  Third butyl, 4, 4, 4-trifluorobutyl, 5, 5, 5-trifluoropentyl, 6, 6, 6-trifluorohexyl, etc.), a lower cycloalkyl group substituted with a halogen atom as desired (eg, cyclopropyl,  Cyclobutyl, Cyclopentyl, Cyclohexyl, etc.) Lower alkoxy (eg, decyloxy,  Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy,  Hexyloxy, etc.) Amine, a mono- or di-(lower alkyl)amine group (eg, a mercaptoamine group, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) carboxyl, a lower alkyl alkane group (e.g., an ethylene group, Propionyl group, etc.) Lower alkoxycarbonyl (e.g., oxime carbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Amino thiol,  Amine thiomethyl thiol, Mono- or di-(lower alkyl)aminocarbenyl (eg methylamino thiol, Ethylaminomethylmercapto, Dimethylaminocarbamyl, Diethylaminocarbamyl, etc.) Arylaminocarboxamyl (eg phenylamino fluorenyl,  Naphthylaminocarbenyl, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.), a lower alkylcarbonylamino group substituted with a halogen atom as desired (e.g., an acetamino group, Trifluoroethenylamine, etc.) a lower alkylthio group (such as a thiol group, etc.), a low-carbon alkyl group (for example, methyl sulfonate, etc.), Low-carbon bases (eg, methylsulfonyl, etc.), Arylthio (eg phenylthio, Naphthylthio group, etc.) Arylsulfinyl group (e.g., phenylsulfinyl, Naphthylsulfinyl group, etc.) Arylsulfonyl (eg phenylsulfonyl, Naphthylsulfonyl group, etc.).  Preferred examples of the "aryl low carbon agglomerated oxygen group" in the "aryl low carbon agglomerated oxygen group" which is represented by R1 and which are optionally substituted by one or more substituents include an oxycarbonyl group, Phenylethoxycarbonyl, Mercapto-based oxycarbonyl, etc. And preferred examples of the "substituent" of "one or more substituents" of the "aryl lower alkane oxygen 45 318750 200804250 carbonyl group" which is optionally substituted with one or more substituents include a halogen atom (fluorine atom). , Chlorine atom, Bromine atom, Iodine atom), Nitro,  Cyano group, Hydroxy, a lower alkyl group substituted with a halogen atom (eg, chloromethyl, Difluoro f-based, Trichloromethyl, Trifluoromethyl, 2_ desert ethyl, 2, 2, 2_trifluoroethyl,  Pentafluoroethyl, 3, 3, 3-trifluoropropyl, 4, 4, 4-trifluorobutyl, 5, 5, 5-trifluoropentyl, 6, 6, 6-difluorohexyl, etc.), a lower carboalkyl group substituted with a halogen atom as desired (for example, a cyclopropyl group, Cyclobutyl, Cyclopentyl, Cyclohexyl, etc.) Lower alkoxy group (e.g., decyloxy, Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy, Hexyloxy, etc.) Amine, Mono- or di-(lower alkyl)amine (eg methylamino, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) carboxyl, Lower alkane fluorenyl (eg ethyl acetyl, Propionyl group, etc.) Lower alkoxycarbonyl (eg methoxycarbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Aminomethyl thiol, Amine thiomethyl thiol, Mono- or di-(lower alkyl)aminocarbenyl (eg methylamino thiol, Ethylaminomethylmercapto, Dimethylamino thiol, Diethylaminocarbamyl, etc.) An arylamino fluorenyl group (e.g., phenylaminocarbamyl, Naphthylamino group, etc.) Aryloxy (e.g., phenoxy, Naphthyloxy, etc.), a lower alkylcarbonylamino group substituted with a halogen atom as required (for example, an ethylamino group, Trifluoroethenylamine, etc.) a lower alkylthio group (e.g., sulfonylthio group, etc.), a lower alkyl sulfinyl group (eg, methylsulfinyl, etc.), a lower alkylsulfonyl group (e.g., a mercaptosulfonyl group, etc.), Arylthio (eg phenylthio,  Naphthylthio group, etc.) An arylsulfinyl group (eg, phenylsulfinyl, Naphthylsulfinyl fluorenyl, etc.) Arylsulfonyl (eg phenylsulfonyl, Naphthylsulfonyl group, etc.).  The "substituent" of "one or more substituents" in R1, which is represented by the substituent "substituted with one or more substituents, as required", 318750 46 200804250 preferred examples include halogenation as needed Atom-substituted lower alkyl (eg, fluorenyl, B, 2-&gt; Stinky ethyl 2, 2, 2-difluoroethyl, Propyl, 3, 3, 3-trifluoropropyl,  Isopropyl, Butyl, Isobutyl, Second butyl, Third butyl, 4, 4, 4_trifluorobutyl, Amyl, Isoamyl, Neopentyl, 5, 5, 5-trifluoropentyl, Hexie, 6, 6, 6_ trifluorohexyl, etc.), a lower alkylcycloalkyl group substituted with an i atom as desired (eg, cyclopropyl, Cyclobutyl, Cyclopentyl, Cyclohexyl, etc.) Lower alkyl alkane (eg ethyl ketone, Propionyl group, etc.) Lower alkoxycarbonyl (eg methoxycarbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Aryl (eg phenyl, Naphthyl, etc.)  And preferred examples of the "amino group which is optionally substituted with one or more substituents" include a dimethylamino fluorenyl group.  Preferred examples of the "substituent" of "one or more substituents" in the "aminothiomethyl group substituted with one or more substituents as required" represented by R1 include substitution with a halogen atom as needed. Lower alkyl (eg methyl, B, 2_bromoethyl, 2, 2, 2_trifluoroethyl, Propyl, 3, 3, 3_trifluoropropyl,  Isopropyl, Butyl, Isobutyl, Second butyl, Third butyl, 4, 4, 4_trifluorobutyl, Amyl, Isoamyl, Neopentyl, 5, 5, 5-trifluoropentyl, Hexie, 6, 6, 6-difluorohexyl, etc.), a lower alkylcycloalkyl group substituted with a halogen atom as desired (for example, a cyclopropyl group, Cyclobutyl, Cyclopentyl, Cyclohexyl, etc.) Lower alkyl alkane (eg, ethyl group I, Propionate, etc.) a low-carbon aerobic group (eg, an anthracene group, Ethoxymethyl group, Propoxycarbonyl, Butoxycarbonyl, etc.) Aryl (eg phenyl, Naphthyl, etc.).  Preferred examples of the "lower alkoxyoxalyl" in the "lower alkoxyoxalyl group which is optionally substituted by one or more substituents" represented by R1 include methoxyoxalyl, Ethoxylated sulfhydryl, Propoxyoxalyl, Isopropyl 318750 47 200804250 oxyoxalyl, Butoxybutyryl, Isobutoxycapine, Third butanyl sulfhydryl group, Pentyloxyindolyl, Third pentoxyoxalyl, Neopentyloxyoxalyl, Hexyloxyxanthene, Isohexyloxyglycine, etc. And preferred examples of the "substituent" of "one or more substituents" in the "lower alkoxylated fluorenyl group substituted by one or more substituents as necessary" include a halogen atom (a fluorine atom, Chlorine atom, Bromine atom, Iodine atom), Nitro,  Cyano group, Hydroxy, a lower carboalkyl group substituted with a ii atom as desired (eg, cyclopropyl, Cyclobutyl, Cyclopentyl, Cyclohexyl, etc.) Lower alkoxy group (e.g., fluorenyl group, Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy, Hexyloxy, etc.) Amine, a mono- or di-(low carbon alkyl) amine group (eg, a mercaptoamine group, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) carboxyl,  Lower alkane fluorenyl (eg ethyl acetyl, Propionyl group, etc.) Lower alkoxycarbonyl (e.g., methoxycarbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Amine thiol, Amidoxime, Mono- or di-(lower alkyl)aminocarbinyl (e.g., decylaminomethyl fluorenyl, Ethylamino fluorenyl, Dimethylaminomethyl decyl, Diethylamino fluorenyl, etc.) Arylaminocarboxamyl (e.g., phenylaminocarbamyl, Naphthylaminocarboxylic acid group, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.),  a lower-carbon arylamino group substituted with a halogen atom as desired (for example, an ethylamine group, Trifluoroethenylamine, etc.) a lower alkylthio group (such as a thiol group, etc.), a lower alkyl sulfinyl group (eg, fluorenyl sulfoximine), a lower alkylsulfonyl group (e.g., a mercaptosulfonyl group, etc.), Arylthio (eg phenylthio, Naphthylthio group, etc.) Aryl sulfhydryl group (e.g., phenyl acyl acid group, Naphthyl sub-performance, etc.) Aryl sulphate (eg phenyl sulfonium, Naphthyl continued fluorenyl, etc.).  Preferred examples of "aryl low carbon alkoxy grass brewing base" in "Aromatic 48 750750 200804250 (4) alkoxy grass brewing base" which is substituted by one or more substituents as indicated by R1 include Oxymatoxyl group, etc. And preferred examples of the "substituent" of "one or more substituents" in the "aryl low carbon oxalyl group substituted by one or more substituents" (iv) a tooth atom (a fluorine atom) , Chlorine atom, Bromine atom, Moth atom),  Thiolyl chloride, Base, a low-carbon thiol group substituted by a dentate atom (eg, chloromethyl,  Monomethyl 'dichloromethyl, Tri-gas methyl, 2-bromoethyl, 2, 2, 2. Trifluoroethylene pentafluoroethyl 3,3,3-difluoropropyl, 4,4,4-tris-butyl, 5,5,5-fluoropentyl, 6,6,6-difluorohexyl, etc. a lower carbocyclic group substituted with a halogen atom (e.g., cyclopropyl, cyclobutyl, cyclopentyl, ithexyl, etc.), a lower alkoxy group (e.g., methoxy, ethoxy, propoxy, etc.) Isopropoxy, butoxyoxybutoxy, pentyloxy, hexyloxy, etc.), amine, mono- or di-(lower alkyl) amine groups (eg methylamino, ethylamino) , trimethylamino, diethylamino, etc.), slow-base, low-carbon calcined base (such as acetate, propionate, etc.), low-oxygen group (such as oxime, ethoxy) Base, propoxyl group, butoxycarbonyl, etc.), aminomethyl decyl, amine thiomethyl thiol, mono- or di-(lower alkyl) aminocarbamyl (eg, mercaptoamine-based , ethylaminocarbamic acid group, dimethyl fluorenyl group, diethylamino fluorenyl group, etc.), arylaminomethyl fluorenyl group (for example, phenylamino fluorenyl group, naphthylamino fluorenyl group) Anthracene or the like, an aryloxy group (e.g., phenoxy group, a naphthyl group, etc.), a halogen atom substituted by a halogen atom as needed a carbonylamino group (e.g., an ethenylamino group, a trifluoroethylamino group, etc.), a lower alkylalkylthio group (e.g., a thiolthio group, etc.), a lower alkyl sulfinyl group (e.g., methyl sulfinamide) Base, etc.), lower alkylsulfonyl (for example, mercaptosulfonyl), arylthio (eg, phenylthio, naphthylthio, etc.), arylsulfinyl (eg, phenylsulfinyl) , naphthyl 49 318750 200804250 = brewing base, etc., aryl sulfhydryl group (for example, phenyl sulfonyl, naphthyl, based on R1, "replacement of thiol grass by one or more substituents as needed" The "aryloxyoxalyl-based grass-based base, etc." in the "basic" includes phenoxyl in the "aryloxy grass-branched group substituted with one or more substituents as needed" Preferred examples of the "substituent" of - or a plurality of substituents include a halogen atom (a gas atom, a chlorine atom, a bromine atom, a moth atom), an acyl group, an aryl group, a hydroxyl group, a hypoalkane substituted by a tooth atom. Base (eg chloromethyl, difluoro, trichloromethyl, trimorphic methyl, 2·bromoethyl, 2,2,2-trifluoroethyl, penta-ethyl:3,3,3-trifluoro Propyl, 4, 4, 4_ three gas a low-carbon cyclic alkyl group substituted with a tooth atom (for example, cyclopropyl, cyclobutyl, cyclopentyl), 5,5,5-trimethylpentyl, 6,6,6-dioxane, etc.) , cyclohexyl, etc.), low carbon alkoxy (eg methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, pentyloxy, hexyloxy, etc.), amine a base, a _ or a di (lower alkyl) amine group (such as methylamino, ethylamino, dimethylamino, diethylamino, etc.), a few groups, a low carbon acid group (for example) Ethyl alcohol, propyl sulfhydryl, etc., low-carbon aerobic groups (such as methoxy, ethoxy, propoxy, butoxy, etc.), amine-based Amusement, mono- or di-(lower alkyl)aminomercapto (eg methylaminomethyl, ethylaminomethyl, dimethylaminomethyl, diethyl) Female aryl group, etc., arylamine-based (for example, phenylamino-based arylaminomethyl thiol), aryloxy (eg phenoxy, naphthyloxy, etc.), a low-alkyl group based on a dihalogen atom, such as ethionylamine a fluoroethyl group, etc.), a low carbon sulphur group (eg, methylthio group, etc.), a low 318750 50 200804250 alkyl sulfinyl group (eg, fluorenyl sulfinyl), a lower alkyl sulfonate a mercapto group (e.g., a mercaptosulfonic acid group, etc.), an arylthio group (e.g., a phenylthio group, a naphthylthio group, etc.), an aryl arylene group (e.g., a phenyl sulfenyl group, a naphthyl sulfinyl group, etc.) An arylsulfonyl group (e.g., phenylsulfonyl, naphthylsulfonyl, etc.), and the like. Preferred examples of the "substituent" of "one or more substituents" in the "amino-based sulfhydryl group optionally substituted with one or more substituents" represented by R1 include substitution with a halogen atom as needed Low carbon home base (eg methyl, gas methyl, difluoromethyl, trimethyl sulfhydryl, trifluoromethyl, ethyl, 2-bromoethyl, 2,2,2-trifluoroethyl, five Fluoroethyl, propyl, 3,3,3-trifluoropropyl, isopropyl, butyl, isobutyl, second butyl, tert-butyl, 4,4,4-trifluorobutyl, a pentyl group, an isopentyl group, a neopentyl group, a 5,5,5-trifluoropentyl group, a hexyl group, a 6,6,6-trifluorohexyl group, etc., a lower acyclic cycloalkyl group substituted with a halogen atom as needed (for example) a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, etc.), a lower alkane group (e.g., an ethyl group, a propyl group, etc.), a lower alkoxycarbonyl group (e.g., a methoxycarbonyl group, an ethoxycarbonyl group, a propyl group) An oxycarbonyl group, a butoxycarbonyl group or the like), an aryl group (for example, a phenyl group, a naphthyl group, etc.). Preferred examples of the "low carbon alkoxy group" in the "low-carbon alkoxy group which is optionally substituted by one or more substituents" represented by R1 include a methoxy group, an ethoxy group, an propylene group, and a different one. Propyloxy, butoxy, isobutoxy, tert-butoxy, pentyloxy, third pentyloxy, neopentyloxy, hexyloxy, isohexyloxy, etc.; preferably methoxy, Ethoxy, propoxy, butoxy, pentyloxy, hexyloxy and isohexyloxy, and "- or "in the lower alkoxy group substituted by one or more substituents as needed" Preferred examples of the "substituent" of the plurality of substituents include an atom (a fluorine atom, a chlorine atom, a bromine atom, a face), a nitro group, an aryl group, a hydroxy group of 318750 51 200804250, and a low carbon which is optionally substituted by a halogen atom. a cycloalkyl group (e.g., cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, etc.), a lower alkoxy group (e.g., methoxy, ethoxy, propoxy, isopropoxy, butoxy, Isobutoxy, pentyloxy, hexyloxy, etc.), amine, mono- or di-(lower alkyl)amine (eg, mercaptoamine, ethylamino, dimethylamino) , diethylamino, etc.), a carboxyl group, a lower alkyl alkano group (e.g., an ethyl fluorenyl group, a propyl fluorenyl group, etc.), a lower alkoxycarbonyl group (e.g., a methoxycarbonyl group, an ethoxycarbonyl group, a propyloxycarbonyl group, a butoxycarbonyl group) And the like, an amine sulfhydryl group, an amine sulfhydryl group, a mono- or di-(lower alkyl)amino fluorenyl group (for example, a mercaptoaminocarbamyl group, an ethylaminocarbamyl group, two Methylaminomethyl hydrazino, diethylamino fluorenyl, etc.), arylamino fluorenyl (eg phenylaminomethyl fluorenyl, naphthylamino fluorenyl, etc.), aryloxy ( For example, phenoxy, naphthyloxy, etc.), a lower alkylcarbonylamino group substituted by a halogen atom (for example, an ethylamino group, a trifluoroethylamino group, etc.), a lower alkylthio group (for example) a thiol group or the like, a low-carbon alkyl group (for example, a fluorenyl group, etc.), a low reburning group (for example, a mercaptosulfonyl group, etc.), an arylthio group (for example, a phenylthio group, A naphthylthio group or the like, an arylsulfinyl group (for example, a phenylsulfinyl group, a naphthylsulfinyl group, etc.), an arylstone xanthyl group (for example, a phenyl fluorenyl group, a naphthyl fluorenyl group, etc.). Preferred examples of the "aryloxy group" in the "aryloxy group substituted by one or more substituents as necessary" represented by R1 include a phenoxy group, a naphthyloxy group, a decyloxy group, etc., and Preferred examples of the "substituent" of "one or more substituents" in the aryloxy group which is substituted by one or more substituents include a halogen atom (a fluorine atom, a chlorine atom, a bromine atom, an iodine atom), a nitro group, a cyano group, a hydroxyl group, a lower alkylcycloalkyl group optionally substituted by a halogen atom (for example, a cyclopropyl group, a cyclobutyl group 52 318750 200804250 group, a cyclopentyl group, a cyclohexyl group, etc.), a halogen atom-substituted lower alkane Base (eg, chloromethyl, difluorodecyl, trichloromethyl, trifluoromethyl, 2-bromoethyl, 2,2,2-trifluoroethyl, pentafluoroethyl, 3,3,3_three Fluoropropyl, 4,4,4-trifluorobutyl, 5,5,5-trifluoropentyl, hexyl, 6,6,6-trifluorohexyl, etc.), lower alkoxy (eg, decyloxy) , ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, pentyloxy, hexyloxy, etc.), amine, mono- or di-(lower alkyl) amine groups ( For example, mercaptoamine, ethylamine, dioxime Amino group, diethylamino group, etc.), thiol, lower alkane fluorenyl (e.g., ethyl fluorenyl, propyl fluorenyl, etc.), lower alkoxycarbonyl (e.g., oxime carbonyl, ethoxycarbonyl, propyloxycarbonyl) , butoxycarbonyl, etc.), an amino fluorenyl group, an amine sulfhydryl group, a mono- or di-(lower alkyl) aminocarbamyl group (for example, a mercaptoaminocarbamyl group, an ethylamino fluorenyl group) An alkyl group, a dimethylamino fluorenyl group, a diethylamino fluorenyl group, etc., an arylamino fluorenyl group (eg, a phenylamino fluorenyl group, a naphthylaminomethyl fluorenyl group, etc.), An aryloxy group (e.g., a phenoxy group, a naphthyloxy group, etc.), a lower alkyl carbonylamino group substituted by a halogen atom (e.g., an ethylamino group, a trifluoroethylamino group, etc.), a lower alkane a thio group (e.g., a methylthio group, etc.), a lower alkyl sulfinyl group (e.g., a fluorenyl sulfinyl group), a lower alkyl sulfonyl group (e.g., a decylsulfonyl group, etc.), an arylthio group ( For example, phenylthio, naphthylthio, etc.), aryl sulfhydryl (eg, phenylarsolic acid, naphthyl phthalic acid, etc.), arylsulfonyl (eg, phenylsulfonyl, naphthyl) Sulfhydryl groups, etc.). Preferred examples of the "aryl lower alkoxy group" in the "aryl lower alkoxy group" which is optionally substituted by one or more substituents represented by R1 include a benzyloxy group, a naphthyloxy group, Preferred examples of "substituents" of "one or more substituents" in the oxo group, etc., and in the "aryl lower alkoxy group substituted by one or more substituents as needed" 318750 200804250 The invention includes a halogen atom (a gas atom, a gas atom, a bromine atom, a woven atom), an aryl group, a cyano group, a hydroxyl group, a lower alkyl group substituted with a halogen atom (for example, a chloromethyl group, a difluoromethyl group, a trichloromethyl group, Trifluoromethyl, 2-bromoethyl, 2,2,2-trifluoroethyl, pentafluoroethyl, 3,3,3-trifluoropropyl, 4,4,4-tris-butyl, 5 , 5,5-trimethylpentyl, 6,6,6-difluorohexyl, etc.), if necessary, a halogen atom substituted by a halogen atom (eg, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl) Equivalent), a low-carbon alkoxy group (e.g., decyloxy, ethoxy, propoxy, isopropoxy, butoxy, isobutyl lactyl, pentyloxy, hexyloxy, etc.), an amine group, -or di-(low carbon alkyl) amine group (eg Alkylamino group, ethylamino group, dinonylamino group, diethylamino group, etc.), a carboxyl group, a lower alkylalkane group (e.g., an ethylidene group, a propyl group, etc.), a lower alkoxycarbonyl group (e.g., anthracene) Oxycarbonyl, ethoxycarbonyl, propoxycarbonyl, butoxycarbonyl, etc.), amine sulfhydryl, amine sulfhydryl, mono- or di-(lower alkyl)amino fluorenyl (eg methylamine) An arylamino fluorenyl group (for example, a phenylamino fluorenyl group, a fluorenyl group, an ethylamino fluorenyl group, a dimethylaminomethyl fluorenyl group, a diethylamino fluorenyl group, etc.) a naphthylamino fluorenyl group, an aryloxy group (e.g., a phenoxy group, a naphthyloxy group, etc.), a lower alkoxycarbonylamino group substituted by a halogen atom, if necessary (e.g., an ethylamino group, a trifluoroethyl group) a mercaptoamine group or the like, a lower alkylalkylthio group (e.g., a sulfonylthio group, etc.), a lower alkylsulfinyl group (e.g., a fluorenylsulfinyl group, etc.), a low carbon alkyl group (e.g., a fluorenyl group) Sulfonyl, etc., arylthio (e.g., phenylthio, naphthyl, etc.), aryl sulphide S basket (e.g., phenyl sulfonyl, sulfathionyl, etc.), arylsulfonyl (eg phenyl sulfonate, Naphthylsulfonic acid, etc.). Preferred examples of the "substituent" of "one or more substituents" in the "amino group substituted with one or more substituents as required" represented by R1 include a lower alkyl halide which is optionally substituted by a halogen atom. Base (eg, fluorenyl, ethyl, 2-54 318750 200804250 bromofluorenyl, 2,2,2-trifluoroethyl, propyl, 3,3,3-trifluoropropyl, isopropyl, butyl, Isobutyl, tert-butyl, tert-butyl, 4,4,4-trifluorobutyl, pentyl, isopentyl, neopentyl, 5,5,5-trifluoropentyl, hexyl, 6 , 6,6-trifluorohexyl, etc.), a lower alkylcycloalkyl group substituted by a halogen atom (for example, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, etc.) or a lower alkyl alkane group (for example, B) Sulfhydryl, propyl, etc.), lower alkoxycarbonyl (eg, oxime carbonyl, ethoxycarbonyl, propoxy, butyloxycarbonyl, etc.), aminomethyl thiol, amine thiol, _ or a bis-(lower alkyl)amino group (eg, a fluorenylamino group, an ethylamino group, a dimethylamino group, a diethylamino fluorenyl group, etc.), Arylaminocarboxamyl (eg phenylaminomethylguanidino, naphthylamine) Alkyl group, etc., an aryl group (e.g., phenyl, naphthyl, etc.). Preferred examples of the "heterocyclic group" in "the heterocyclic group substituted by one or more substituents as required" by R1 include "aromatic monocyclic heterogeneous I 9 = aromatic monocyclic heterocyclic ring" Examples of the base include 5 tributary aryl, each of 2·' 4&quot;〇f '5'〇f '3-yl, 5-iso(tetra)yl-based Si; thiol, fluorenyl, 4·(4) Base, 5. Sulfhydryl, its terazo-5-yl, 1,2,44 and other diazole-5-base, 1-class di-salt_3_yl, u,4 Τ thiadiazole-4-yl,! ? 1^大占基,1,2,3-嗟2..., '3 广基丨, 3,4·thiadiazol-2-yl, ΙΗ-1,2,3-triazole _4_yl, 318750 55 200804250 111-1, 2,3-triazole _5_yl, 111_1,2,4_tri-, and 3-based, 1H-tetrazolyl 6-membered aromatic monocyclic heterocyclic group, such as 2-hydrazino , 4-t fixed base, 2_ fluorenyl group, 4 ring base, fixed base soil tower cultivating base 4 base, u, 4. Trimorphine _3_ base, Take three 哄 ^ base well = - two tillage-6-based, 1, 3, 5_三哄_2_基, etc. And earth, ,  In the case of "replacement of one or more substituents as needed (rat atom/purine atom, Desert atom, Iodine atom), a lower alkyl group substituted with a ruthenium atom (eg, methyl, Chloromethyl, Dichloro, US gas methyl: Propyl, Isopropyl, Butyl, = two beautiful brothers: Butyl, Amyl, 己基等), Lower cycloalkyl (eg ring =, Benzyl dicyclopentyl, Cyclohexyl, etc.) Aryl low carbon burnt as bauxite, ^Methyl Kaki, Phenylethyl, etc.) Aryl (eg phenyl, Cai Ji et al),  Low carbon alkoxy (eg, decyloxy, Ethoxylate, Propoxy, Isopropyloxy, D = oxy, Second butoxy group, Third butoxy group, etc.) Aryloxy (eg, oxidized earth, etc.), Hypermethyl Lower alkane fluorenyl (eg ethyl acetyl, Propionyl group,  Ding Yuji, Isobutyl base, etc.) Aryl groups (eg, phenyl groups, Caijia, etc.) fSa-based oxy group, Low-carbon thioloxy group  Propyloxy, Butyryloxy, Isobutyloxy, etc.) Aryl aryloxy (e.g., benzhydryloxy, Naphthyl methoxy, etc.) carboxyl, Lower alkane, oxygen, f (eg Τ oxycarbonyl, Ethoxycarbonyl, Propoxycarbonyl, Isopropyloxycarbonyl,  I oxygen group, Isobutoxide County, Third butoxy group, etc.) Aryl low-carbon oxygenation, such as benzyloxycarbonyl, etc. Aminomethyl thiol, Amine, One- or two- (low 318750 56 200804250 carbon alkyl) amine groups [eg a (low carbon alkyl) amine group such as a mercapto amine group, Ethylamine, Propylamine, Isopropylamino and butylamino, And a di(low carbon alkyl) amine group such as a dimercaptoamine group, Diethylamino group, Dipropylamino group, Diisopropylamino group, Dibutylamino and decylethylamino], 3 to 6 cyclic amine groups (eg, alum, 吖Π丹基, Π 口 各 各 各 各 各 Debbie, Π比嘻基,  Miso base, σ 嗤 base, Miso sigma, σ σ base, 淋 基 基, Dihydrogen bite base, Ν-曱基培耕基, Ν-ethyl piperage, etc.) Nitro, Cyano group, a mono- or di-(low-carbon alkyl) amine base (for example, a (low carbon alkyl) amine based aryl group such as an anthracene-fluorenylamino acid group, Ν-ethylamine base, Ν-propylaminosulfonyl, Ν-isopropylaminosulfonyl, And Ν-butylaminosulfonyl,  And a di (low carbon alkyl) amine rock yellow base such as hydrazine, Ν-dimercaptoamine base, ISi, Ν-diethylamine continuation base, Oh, Ν-dipropylamine stone yellow wine base and hydrazine, Ν-dibutylamino group thiol], Low carbon sulfur-based (eg, thiol, Ethylthio group, Propylthio, Isopropylthio group, Butylthio, Second butylthio group and third butylthio group), Arylthio (eg phenylthio, Naphthylthio), a lower alkyl sulfinyl group (e.g., a sulfhydryl sulfhydryl group, Ethyl sulfinyl, Propylsulfinyl, Butyl sulfite, etc.) Aryl-based sulfhydryl groups (eg, phenyl sulfhydryl, Naphthyl sulphate, etc.) Low-carbon base stone yellow base (such as methyl feldspar, Ethyl yellow wine base,  Propylsulfonyl, Butyl sulfonyl group, etc.) Arylsulfonyl (for example, phenylsulfonyl, Naphthylsulfonic acid, etc.).  Examples of the "low carbon alkylene group" in the "low carbon alkylene group substituted by one or more halogen atoms as required" represented by R2 include an anthracenylene group, Stretching Sanya 曱基, Sianya 曱基, Wuya 曱基, And Liu Yaji; Preferably, it is a "C1-C6 alkylene group" such as an anthranylene group, Ethyl, Sanya Yanji and Liu 57 318750 200804250 Aachen, And in the "low-resistance base that is replaced by one or more (four) sub-substances as needed": An instance of a "function atom" of one or more tooth atoms, including a pure atom, Gas atom, Desert atom, And broken atoms.  Preferred examples of the low-stone anti-burning thiol group in the "low anti-k L group which is optionally substituted by one or more substituents" represented by R3 include an acetamidine group,  Propionyl group, Ding Yiji, Isobutyl sulfhydryl, Pentamidine, Isoamyl Pentylene, Wu Qiji, Has been brewed, etc. And preferred examples of the "substituent" of "one or more substituents" in the "lower alkyl hydrazide group substituted with one or more substituents as necessary" include a halogen atom (a fluorine atom, Chlorine atom, Bromine atom, Iodine atom), Nitro, Cyano group,  Hydroxy, Lower alkoxy (eg methoxy, Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy, Hexyloxy, etc.) Amine, a _ or a _(lower alkyl)amine group (eg methylamino group, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) carboxyl, Lower alkane fluorenyl (eg ethyl acetyl, 醯 醯, etc.) Lower alkoxycarbonyl (eg methoxycarbonyl, Ethoxycarbonyl, Propoxyl group, Butoxycarbonyl, etc.) Amino thiol, Amine thiomethyl thiol, a _ or a bis(lower alkyl)aminocarbinyl group (eg, a mercaptoaminocarbamyl group, Ethylamino hydrazine Dimethylaminocarbamyl, Diethylaminocarbamyl, etc.) An arylaminoglycol (for example, phenylaminocarbamyl, Naphthylaminocarbenyl, etc.) Aryl (eg phenyl, Naphthyl, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.),  a lower alkylcarbonylamino group substituted with a halogen atom as desired (for example, an acetamino group, Trifluoroethenylamine, etc.) a lower alkylthio group (eg, methylthio, etc.), Low-stone anthracite-based sulfhydryl (for example, methylsulfinic acid, etc.), Low carbon alkyl group continued sulfhydryl group 58 318750 200804250 (eg, sulfhydryl sulfhydryl, etc.), Arylthio (eg phenylthio, Naphthylthio group, etc.) Aryl sulfonyl (for example, phenyl sulfhydryl, Naphthyl, etc.) Aryl-lithic acid group (for example, phenyl styrene, Nike based on the basis of the foundation, etc.).  By R3, R4, Examples of the "C1-C3 alkyl group" in the "C1-C3 alkyl group substituted by one or more substituents as necessary" represented by R5 and R6 include a methyl group, Ethyl, N-propyl, And isopropyl, And preferred examples of the "substituent" of "one or more substituents" in the "C1-C3 alkyl group substituted by one or more substituents as necessary" include a halogen atom (a fluorine atom, Chlorine atom, Bromine atom, Iodine atom), Nitro, Cyano group,  Hydroxy, Lower alkoxy (eg methoxy, Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy, Hexyloxy, etc.) Amine, Mono- or di-(lower alkyl)amine groups (eg, mercaptoamine groups, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) carboxyl, Lower alkane fluorenyl (eg ethyl acetyl, 醯 醯, etc.) a lower alkoxycarbonyl group (e.g., a methoxycarbonyl group, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Amino thiol, Amidoxime, Mono- or di-(lower alkyl)amino fluorenyl (eg, mercaptoamino fluorenyl, Ethylamino hydrazide Dimethylamino fluorenyl group, Diethylamino fluorenyl, etc.) Arylamino fluorenyl (eg phenylaminomethyl fluorenyl, Naphthylaminocarbenyl, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.), a low-carbon alkyl-based thio-amino group substituted with a halogen atom as desired (for example, an ethylamino group, Trifluoroethylamino group, etc.)  a lower alkylthio group (such as a thiol group, etc.), a lower alkyl sulfinyl group (for example, a fluorenyl sulfonate, etc.), Low-carbon bases (for example, bases, etc.), Arylthio (eg phenylthio, Naphthylthio group, etc.) An arylsulfinyl group (eg, a phenylsulfinyl group, Qin Jiya continued to brew base, etc.) Aryl continuation base (eg phenyl fluorescene,  59 318750 200804250 Naphthylsulfonyl, etc.).  By R3, R4, Preferred examples of "lower alkenyl group" in "lower alkenyl group substituted by one or more substituents as required" in R5 and R6 include a vinyl group, Allyl, Isopropenyl, Isobutenyl, 1-decylallyl,  2-pentenyl, 2-hexenyl, etc. And preferred examples of the "substituent" of "one or more substituents" in the "lower alkenyl group substituted by one or more substituents as necessary" include a halogen atom (a fluorine atom, Chlorine atom, Bromine atom, Iodine atom), Nitro, Cyano group,  Hydroxy, Lower alkoxy (eg, decyloxy, Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy, Hexyloxy, etc.) Amine, a mono- or di-(low carbon alkyl) amine group (eg, a mercaptoamine group, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) carboxyl, Lower alkane fluorenyl (eg ethyl acetyl, 醯 醯, etc.) a lower alkoxycarbonyl group (e.g., a methoxycarbonyl group, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Amino thiol, Amine thiomethyl thiol, Mono- or di-(lower alkyl)amino fluorenyl (eg, decylaminomethyl fluorenyl, Ethylamino hydrazide Dimethylaminocarbamyl, Diethylamino fluorenyl, etc.) Arylamino fluorenyl (eg phenylaminomethyl fluorenyl, Naphthylaminocarbenyl, etc.) Aryl (eg phenyl, Naphthyl, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.),  a lower alkylcarbonylamino group substituted with a halogen atom as desired (for example, an acetamino group, Trifluoroethenylamine, etc.) a lower alkylthio group (eg, methylthio, etc.), a lower alkyl sulfinyl group (e.g., methylsulfinyl, etc.), a lower alkylsulfonyl group (e.g., a mercaptosulfonyl group, etc.), Arylthio (eg phenylthio, Naphthylthio group, etc.) Aryl sulfonate (eg phenyl sulfonyl, Naphthyl hydrazine, etc.) Arylsulfonyl (eg phenylsulfonyl, Naphthylsulfonyl group, etc.).  60 318750 200804250 by R3, R4, Preferred examples of "lower alkyne, m anti-anodyl group" in "lower alkynyl group substituted by one or more substituents" represented by R5 and R6 include ethynyl group, 2-propynyl, 1-propynyl, 2-butynyl, 3_butyne, 3 pentynyl, 3-hexynyl group, etc. And "in the low carbon block base replaced by one or more substituents as needed": Preferred examples of the "substituent" of one or more substituents include a south atom (a fluorine atom, Chlorine atom, Bromine atom, Iodine atom), Nitro, Cyano group,  Base, Lower alkoxy (eg methoxy, Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy, Hexyloxy, etc.) Aminodi- or di-(lower alkyl)amine (eg methylamino, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) carboxyl, Lower alkane fluorenyl (eg ethyl acetyl, 醯 醯, etc.) Lower alkoxycarbonyl (eg methoxycarbonyl, Ethoxycarbonyl, Propoxycarbonyl, Butoxycarbonyl, etc.) Aminomethyl thiol, Amine thiomethyl thiol, Mono- or di-(lower alkyl)aminocarbenyl (eg, f-amino fluorenyl, Ethylaminomethyl hydrazine &amp; base, Dimethylamino fluorenyl group, Diethylaminocarbamyl, etc.) Arylamino fluorenyl (eg phenylamino fluorenyl, Naphthylaminocarbenyl, etc.) Aryl (eg phenyl, Naphthyl, etc.) Aryloxy (eg phenoxy, Naphthyloxy, etc.),  a lower alkylcarbonylamino group substituted with a halogen atom as desired (for example, an acetamino group, Difluoroacetamido, etc.) a lower alkylthio group (such as a thiol group, etc.), Low-stone anti-alkyl sulfinylene (eg, methylsulfinyl, etc.), a lower alkylsulfonyl group (e.g., methylsulfonyl, etc.), Arylthio (eg phenylthio, Naphthylthio group, etc.) Arylsulfinyl group (e.g., phenylsulfinyl, Naphthylsulfinyl group, etc.) Arylsulfonyl (eg phenylsulfonyl, Naphthylsulfonyl group, etc.).  By R3, R4, Preferred examples of "aryl" in R.sup.5 and R.sup.6 and R.sub.6, and R.sub.6, and R.sub.6,  Trimethylbenzene, Diphenyl group, Phenyl phenyl, Naphthyl, 蒽基等, And preferred examples of the "substituent" of "one or more substituents" in the "aryl group substituted with one or more substituents as necessary" include a halogen atom (fluorine atom, Chlorine atom, Bromine atom, Iodine atom), Nitro, Cyano group, Hydroxy, a lower alkyl group substituted with a halogen atom (for example, a chloroantimonyl group, Difluorodecyl, Trichloropyridinyl, Trifluoromethane group, 2 -&gt; Stinky ethyl 2, 2, 2_trifluoroethyl, Pentafluoroethyl, 3, 3, 3-dimethylpropyl, 4, 4, 4-di-butyl, 5, 5, 5-dione thiol, 6, 6, 6-dioxyl group, etc.) Lower alkoxy (eg, decyloxy, Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy, Hexyloxy, etc.) Amine, a mono- or di-(lower alkyl)amine group (eg, a mercaptoamine group, Ethylamino group, Dimercaptoamine, Diethylamino group, etc.) Slow base, a low carbon burnt acid group (eg, an ethylene group,  Propionyl group, etc.) Lower alkoxycarbonyl (eg methoxycarbonyl, Ethoxycarbonyl, Propyloxycarbonyl, Butoxycarbonyl, etc.) Amino thiol, Amidoxime, Mono- or di-(lower alkyl)aminocarbinyl (eg, mercaptoamino fluorenyl, Ethylaminomethylmercapto, Dimethylaminocarbamyl, Diethylaminocarbamyl, etc.) Arylamino fluorenyl (eg phenylaminomethyl fluorenyl, Naphthylamino group, etc.)  Aryloxy (eg phenoxy, Naphthyloxy, etc.), a lower alkylcarbonylamino group substituted with a halogen atom as desired (for example, an ethenylamino group, Trifluoroethylamino group, etc.) Low-carbon sulfur-based (eg, thiol-based, etc.), a low-carboyl sulfite group (for example, a fluorenyl fluorite group, etc.), a low-carbon base stone yellow base (for example, a ruthenium base, etc.),  Arylthio (eg phenylthio, Naphthylthio group, etc.) Arylsulfinyl (eg phenyl sulfinyl, Naphthylsulfinyl group, etc.) Arylsulfonyl (for example, phenylsulfonyl, Naphthylsulfonyl group, etc.).  62 318750 200804250 by R3, R4, Preferred examples of the "aryl low carbon alkyl group" in the "aryl low carbon alkyl group" which is optionally substituted by one or more substituents, as defined by R5 and R6, include a benzyl group. Phenylethyl, etc. And preferred examples of the "substituent" of "one or more substituents" in the "aryl lower alkyl group substituted with one or more substituents as necessary" include a halogen atom (a fluorine atom, Chlorine atom, Bromine atom, Iodine atom), Nitro, Cyano group,  Hydroxy, a lower alkyl group substituted with a halogen atom (for example, a chloroantimonyl group, Difluoromethyl,  Dimethylmethyl, Dimethylmethyl, 2 -&gt; Stinky ethyl 2, 2, 2 - digas ethyl, Five gas ethyl group, 3, 3, 3-trifluoropropyl, 4, 4, 4-trifluorobutyl, 5, 5, 5-trifluoropentyl, 6, 6, 6-trifluorohexyl, etc.), Lower alkoxy (eg methoxy, Ethoxylate, Propoxy,  Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy, Hexyloxy, etc.) Amine,  a mono- or di-(low-carbon alkyl) amine group (eg, a mercaptoamine group, Ethylamino group, Dimethylamino group, Diethylamino group, etc.) Rebel Low-carbon brewing base (eg, brewing base,  Propionyl group, etc.) Lower alkoxycarbonyl (eg methoxycarbonyl, Ethoxycarbonyl, Propyloxycarbonyl, Butoxycarbonyl, etc.) Amino thiol, Amidoxime, Mono- or di-(lower alkyl)aminocarbenyl (eg, mercaptoamino group, Ethylaminomethylmercapto, Dimethylamino fluorenyl group, Diethylaminocarbamyl, etc.) Arylamino fluorenyl (eg phenylamino fluorenyl, Naphthylamino group, etc.)  Aryloxy (eg phenoxy, Naphthyloxy, etc.), a low-carbon alkyl ruthenyl group substituted by a halogen atom as desired (for example, an ethylene-based amine group, Trifluoroethylamino group, etc.) a lower alkylthio group (such as a thiol group, etc.), a lower alkyl sulfinyl group (e.g., methylsulfinyl, etc.), a lower alkyl sulfonyl group (eg, a mercaptosulfonyl group, etc.),  Arylthio (eg phenylthio, Naphthylthio group, etc.) Aryl sulfonate (eg phenyl sulfinyl, Naphthylsulfinyl group, etc.) Arylsulfonyl (for example, phenylsulfonyl 63 318750 200804250, Naphthyl continued fluorenyl, etc.).  If there is a HR6 material at the end and the combination of the money material, it needs to have other nitrogen atoms, An example of an oxygen atom and a nitrogen-containing heterocyclic ring Included = 3 N-Merlinyl, which is the atom of the ring And thiol meaning like a fixed base,  An instance of an atom (four) child, a domain atom, Preferred examples of the "aryl low-oxyl group" in the chlorine atom 1 in the "aromatic group substituted by one or more materials as needed" represented by R7 include  Confucian soil Nai-ethyl milk base, 蒽methoxy, etc.  And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  The mountain is represented by R7 as "low-stone reversed by one or more halogen atoms as needed: Preferred examples of the "low-stone anti-alkyl fluorenyl group" in the k-group include an acetamidine group,  Propyl, Ding Yiji, Isobutyl sulfhydryl, Pentamidine, 2, 2_dimercaptopropyl group,  醯基基, etc. And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "low carbon agglomerated oxygen group" in "low-carbon aerobic groups" as indicated by R7, which are optionally substituted by one or more halogen atoms, include an anthracene Ethoxymethyl group, Propoxymethyl group, Isopropyloxy, Butoxyxyl group, Second butadiene base, Valentyl, Epoxy cutting, etc. And as for the "i atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "aryl group" in the "aryl group optionally substituted by one or more halogen atoms" represented by R7 include a phenyl group, 1-naphthyl, 2_naphthyl,  64 318750 200804250 Biphenyl, 2-蒽, etc. And as for the "halogen atom", The aforementioned "tooth atom" can be cited.  Preferred examples of the "aryl lower alkoxycarbonyl group" of the "aryl lower alkoxycarbonyl group" which is "optionally substituted with one or more halogen atoms" t include a benzyloxycarbonyl group, Phenylethoxycarbonyl, Oxylene carbonyl, etc. And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferable examples of the "arylaminocarbamyl group" in the "arylaminocarbamyl group which is optionally substituted with one or more halogen atoms" represented by R7 include a phenylaminocarbamyl group, 1-naphthylamino fluorenyl group, Naphthylaminocarbenyl,  Biphenylaminocarbamyl, 2-nonylaminomethyl hydrazino, etc. And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "lower alkyl group" in the "aminoalkyl group substituted by one or more lower alkyl groups as required" represented by R7 include mercapto groups, B, N-propyl, Isopropyl, n-Butyl, Isobutyl, Second butyl, Third butyl, N-pentyl, Second amyl group, Isoamyl, Neopentyl, Orthodox Isoprene and the like.  In the month of R7, "the moonstone is replaced by one or more lower alkyl groups as needed; Preferred examples of the "low carbon alkyl group" in the ILcarboxylic acid group include a methyl group, B, N-propyl, Isopropyl, n-Butyl, Isobutyl, Second butyl, Third butyl, N-pentyl, Second amyl group, Isoamyl, Neopentyl, Orthodox Isoprene and the like.  Preferred examples of the "lower alkyl group" in the "amino group substituted by one or more lower alkyl groups as required" represented by R7 include a methyl group, Ethyl, N-propyl, Isopropyl, n-Butyl, Isobutyl, Second butyl, Third butyl,  65 318750 200804250 Orthopentyl, Second amyl group, Isoamyl, Neopentyl, Orthodox Alien group and the like.  Preferred examples of the "low sulphonyl group" in the "low skeptic group" which is represented by R7 as "required to be replaced by one or more halogen atoms" include methyl groups, Ethyl,  N-propyl, Isopropyl, n-Butyl, Isobutyl, Second butyl, Third butyl,  N-pentyl, First amyl group, Isoamyl, Neopentyl, Orthodox Alien group, etc.  And 'as for the halogen atom,' The aforementioned "tooth atom" can be cited.  The mountain is represented by R7, "the low person who is replaced by one or more tooth atoms, Preferred examples of the oligocalcium alkoxy group in the oxy group include a methoxy group,  Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, Third butan, , Pentyloxy, Third wire base, New silk base, Hexyloxy, Isohexyloxy group; Preferred is methoxy, Ethoxylate, Propoxy, Butoxy, Pentyloxy,  Hexyloxy, And isohexyloxy, And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  "Low-carbon alkoxy-low-carbon alkoxy" in the "low-carbon alkoxy-low-carbon alkoxy group" which is represented by R as "required to be substituted by one or more halogen atoms" Good examples include methoxymethoxy, Ethoxymethoxy, 2 methoxymethyl group, 2_ethoxyethoxy, 3_decyloxypropoxy, 3_ethoxypropoxylate, &quot; Oxybutoxy group, 4_ethoxybutoxy, 5 • methoxy pentyloxy,  _Ethyl pentyloxy, 6_decyloxyhexyloxy, 6_ethoxy and loss as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "low carbon diloxy group" in "low methoxy group substituted by one or more (tetra) atoms as required by R7 include ethyloxy:  318750 66 200804250 allyloxy, Isopropenyloxy, Isobutenyloxy, 丨_methyl dipropoxy,  2-pentenyloxy, 2-hexenyloxy, etc. And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "lower alkynyloxy group" in the "lower alkynyloxy group which is optionally substituted by one or more halogen atoms" represented by R7 include ethynyloxy group,  2-propynyloxy, 1_propynyloxy, 2_butynyloxy, 3_butynyloxy, Hong pentynyloxy, 3-hexynyloxy, etc. And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "low carbon calcined amine group" in the "low-carbon calcined amine group" which is represented by R7, which is optionally substituted by one or more halogen atoms, include an acetamino group, 2-methylpropenylamine, Propylamine, Butylated amino group, Isobutylguanidino group, Pentamidine, 2, 2_dimethylpropanylamino group,  Hexylamino group, etc. And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "lower alkylthio group" in the "lower alkylthio group which is optionally substituted by one or more halogen atoms" represented by R7 include methylthio group,  Ethylthio group, N-propylthio group, Isopropylthio group, N-butylthio group, Isobutylthio, Dibutylthio group, Third butylthio group, N-pentylthio group, Second pentylthio group, Isopenionyl, Neopentylthio, N-hexylthio, Alihexylthio, etc. And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "lower olefinic thio group" in the "lower olefinic thio group which is optionally substituted by one or more halogen atoms" represented by R7 include fluorenylthio group,  Isopropenylthio, Isobutylene, 1-methylallylthio group, 2_pentathio group,  2 -hexylthio, etc. And 318750 67 200804250 As for "_ atom", The aforementioned "tooth atom" can be cited.  Preferred examples of the "lower alkynylthio group" in the "low carbon alkylthio group" which is optionally substituted by one or more (four) atoms as represented by R7 include a 2-propylthio group, 1-propynylthio group, 2-butynylthio group, 3-butynylthio group, 3_pentynylthio,  3-hexynylthio group, etc. And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "low-carbocalcene-based sulfhydryl group" in the "low-carbon alkyl sulfhydryl group" which is substituted by R7 as "required by one or more dentates" include methyl linoleic acid. base, Ethyl sulphate N-propyl sulphate , Isopropylsulfinyl, N-butylsulfinyl, Isobutylsulfinyl, Second γ-based heteroalkyl, Third butyl Orthodecyl Dipentylsulfinyl, Isoamylsulfinyl, Neopentylsulfinyl, N-hexylsulfinyl, Isohexylsulfinyl group, etc. And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "lower alkenyl sulfinyl group" in the "low-carbenyl sulfinyl group" which is represented by R7, which is optionally substituted with one or more halogen atoms, include allylsulfinium sulfonate. base, Isopropenylsulfinyl, Isobutenyl sulfinium hydrazine &amp; base, 1_methallylsulfinyl, 2_pentenyl sulfinyl, 〕_ _ fine base stone yellow wine base, etc. And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "low-carbon fast-base stellite base" in the "low-carbohydrate-based sulfite-based base" which is represented by R7 and which are optionally substituted by one or more halogen atoms include 2-propynyl Sulfonyl, 丨_propynyl sulfinyl, 2_butynyl sulfinyl, 3_butynyl sulfinyl, 3-pentynyl sulfinyl, 3_hexyne 318750 68 200804250 Keiya mine base, etc. And as for the "halogen atom", A preferred example of the "low-carbon base-base" in the "low-carbon alkyl sulfonyl group" of the "optional via-gate" or "small atom-substituted lower alkyl sulfonyl group" represented by R7 may be mentioned. Including sulphur Life base, Ethyl yellow wine base, N-propyl π-based, Isopropyl sulfonyl,  N-butyl stone base, Isobutyl gamma, No.: Butyl gamma, Third butyl stone 丝丝_基, Second silk, I am amyl, Neopentyl yellow wine base, N-hexyl yellow wine base, Alien basestone yellow base, etc. And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "lower alkenylsulfonyl group" in the "lower alkenylsulfonyl group" which is represented by R7 and which is optionally substituted by one or more halogen atoms include allyl sulfonium, Isopropylenyl yellow wine base, Isobutyl ketone 丨_曱 allyl stone sulfhydryl, 2-pentyl sulfite yellow wine base, 2-hexyl sapphire yellow base, etc.  And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  a low-stone anti-fast base &amp; "replaced by one or more halogen atoms as required by R7"  Preferred examples of the "low carbon fast rock yellow base" in iak based include 2-propynyl-based gf-based, 1-propynylsulfonyl, 2-butynyl sulphate, 3-butynylsulfonyl, 3-pentynylsulfonyl, 3-hexynylsulfonyl group, etc. And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of "lower alkoxy lower alkylthio" in "lower alkoxy lower alkylthio" substituted by one or more halogen atoms as indicated by R7 69 318750 200804250 Preferred examples include Methoxymethylthio group, Ethoxymethylthio group, 2_methoxyethylthio, 2-ethoxyethylthio group, 3_methoxypropylthio group, 3_ethoxypropylthio group, ^oxybutylthio, 4-ethoxybutylthio group, 5_methoxy thiol group,  5 ethoxypentylthio, 6-methoxyhexylthio, 6_ethoxyhexylthio group, etc.  And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Examples of the plant halogen atom as a substituent of E include a gas atom, Chlorine atom, Bromine atom, And iodine atoms.  ^Best examples of the "low-stone angery group" in the "low-burning group" which is substituted by one or more tooth atoms as the substituent of E include a methyl group, B, N-propyl, Isopropyl, n-Butyl, Isobutyl, Second butyl, Third butyl, N-pentyl, Second amyl group, Isoamyl, Neopentyl, Orthodox I hexyl, etc. And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferable examples of the "lower alkoxy group" in the "low transalkoxy group substituted by one or more halogen atoms" as the substituent of E include a decyloxyethoxy group, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, First butoxy group, Pentyloxy, Third pentyloxy, Neopentyloxy, Hexyloxy, different : Oxyl group; Preferred is decyloxy, Ethoxylate, Propoxy, Butoxy, Pentyloxy, Hexyloxy, And isohexyloxy, And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "low carbon sulphur group" in the "low carbon sulphur group which is optionally substituted by one or more halogen atoms" as the substituent of E include sulfonylthio group, N-propylthio group, Isopropylthio group, N-butylthio group, Isobutylthio,  70 318750 200804250 Second butylthio, Third butylthio group, N-pentylthio group, Second pentylthio group, Isoamylthio, Neopentylthio, N-hexylthio, Alihexylthio, etc. And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "lower alkyl sulfinyl group" in the "lower alkyl sulfinyl group" which is substituted with one or more halogen atoms as the substituent of E include a mercaptosulfinyl group. , Ethyl sulfinyl, N-propyl sulfinamide,  Isopropyl sulfinyl, N-butylsulfinyl, Isobutylsulfinyl, Dibutyl sulfinyl, Tertiary butyl sulfinyl, N-pentylsulfinyl,  Second amyl sulfinyl group, Isoamylsulfinyl, Neopentylsulfinyl,  N-hexyl sulfinate, Isohexyl sulphate, etc. And as for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "lower alkyl sulfonyl group" in the "lower alkyl sulfonyl group which is optionally substituted by one or more halogen atoms" as the substituent of E include methylsulfonyl group, Ethyl sulfonyl group, N-propyl sulfonyl, Isopropyl sulfone base, N-butylsulfonyl, Isobutylsulfonyl, Second butyl sulfonyl group,  Tert-butylsulfonyl, N-pentyl rhyme, Second pentyl gamma, Isoamyl sulphate, New amyl base, Orthodox Isohexyl alcohol, etc. as well as ', As for the "halogen atom", The above-mentioned "halogen atom" can be mentioned.  Preferred examples of the "aryl group" represented by E include a phenyl group, m 2-naphthyl, Biphenyl, 2-蒽 base and so on.  Preferred examples of the "heterocyclic group" of v's soil 9 from E Table 7F include "raw heterocyclic group" and the aromatic monocyclic heterocyclic group is a heterocyclic ring of 0 ^ shell 1J匕栝5 shellfish. Family early ring consumption base, Such as 2 · 吱 基, 3 "Famaki, 2_(four) base, 3_喽,,  318750 71 200804250 3-pyrrolyl, 2-oxazolyl, 4-carbazolyl, 5-oxazolyl, 3_ 异噚哇基, 4-isoxazolyl, 5_isoxazolyl, Thiazolyl, 4-thiazolyl,  Plug 0 seated, 3_isothiazolyl, 4-isothiazolyl, 5-isothiazolyl, 2-imidazolyl, 4-17 m saliva, 5 -imiline, 3 _ σ is more than spit, 4 - thiol, 5 -σ is more basic,  I2, 3-卩琴二唾基, 1, 2, 3-oxadiazol-5-yl, 1, 2, 4-oxadiazol-5-yl, Oh, 2, 4&quot; ·Oxadiazole _3_ base, 1, 3, 4-dead diazol-2-yl, Furfuryl, 1, 2, 3-嗟二嗤 I base, H3-thiadiazole _5_ group, 1, 2, 4-thiadiazol-3-yl, 1, 2, 4-嗟二嗤-5-yl, L53, 4_thiadiazolyl, Triazole _4 base,  1H_1, 2, 3-diazole _5-yl, M-1, 2, 4-triazole _3_ base, M_ tetrazole _5_ group, etc. And a member of the scent of a single ring heterocyclic group, Such as 2-π than bite, 3-u ratio. Base,  4_° ratio σ 疋 base, 2-jet bite, 4-, 唆基, 5- shouting base, 3-tower base, 4-嗒耕基, 2-pyridyl, Three tillage, 丨二仁三耕_5_基, ^, Anal three tillage-6-based, 1, 3, 5_three tillage-2-base and so on.  Preferred examples of the "group in the aryl group substituted by one or more substituents as required" represented by Q include a phenyl group, Trimethylbenzene, Diphenyl, Tolyl, Naphthyl, 蒽基等, And preferred examples of the "substituent" of "one or one substituent" in the aryl group substituted with one or more substituents as necessary include a tooth atom (a gas atom, Chlorine atom, (4) Son, Broken atom), Germany, Cyano group, a lower alkyl group substituted with an atom (eg, chloromethyl, Difluoromethyl, Trichloromethyl, Trifluoromethyl 2 / odorous ethyl, 2, 2, 2-difluoroethyl, Pentafluoroethyl, 3, 3, 3_three gas propyl, 4, 4, 4-trifluorobutyl, 5, 5, 5_trifluoropentyl, M, 6_Trifluorohexyl, etc.), Low carbon alkoxy (eg methoxy, Ethoxylate, Propoxy, Isopropyloxy 318750 72 200804250 base, Butoxy, Isobutoxy, Pentyloxy, Hexyloxy, etc.).  Preferred examples of the "heterocyclic group" in the "heterocyclic group substituted with one or more substituents as necessary" represented by Q include "aromatic monocyclic heterocyclic group" and the scented monocyclic heterocyclic group Examples of the ring group include a 5-membered aromatic monocyclic heterocyclic group. Such as 2-furanyl, 3_furanyl, 2_Thienyl, Thiophene group, 2 pyrrolyl 3_pyrrolyl, 2-卩fazolyl, 4-卩fazolyl, 5-oxazolyl, 3 isoxazolyl, 4-isoxazolyl, 5_isoxazolyl, 2_thiazolyl, 4_thiazolyl,  5-嗟Salcy, 3_iso (four) base, 4_iso (four) base, 5•isoterpene, ^Saliva, 4-flavor base, 5_Mimi, 3_π is more than salivary, 4" than spit, % um4· base, u, 3K5·base, ..., Two saliva 5,  Thiazole-4-base, U, 3, Dizozoyl..., Thiadiazole ’ =: Base Yan Yiji,  1H-1, 2, 3-diazole _5-yl, m, etc. as well as , 4 one on the base, 1H_tetrazole_5 base 6-membered aromatic monocyclic heterocyclic group, Such as 2_ 4-pyridyl, 2_蔑, Order | ^ soil) than 疋基,  From spitting * soil, 4-mouth pyridine, 5_pyrimidinyl, 3-忒啡美, 4 哙耕基, 2-pyridyl q 24_ two. Subunit 4· lit a straight —幵 3_ base d, 2, 4. Three tillage-5-based, 1 2 4- 2哄i base, U, 5_trimorphine, etc. And U, 4 "Replace the US enemy as one or more as needed # + &amp;  a child of a "substituted heterocyclic group" of "- or more substituents" (fluorine atom, Gas atom, , , A preferred example of #眉 I土 includes a tooth that needs to be atomized by a functional atom. Moth atom), Nitro, Atmospheric base, a sub-substituted lower alkyl group (eg, …base, Three gas, base, Ethyl, 2_淳: : , Diterpenoid / bet ethyl, 2, 2, 2_Trifluoroethane 318750 73 200804250 Base, Pentafluoroethyl, Propyl, 3, 3, 3-trifluoropropyl, Isopropyl, Butyl, Isobutyl, Second butyl, Third butyl, 4, 4, ‘trifluorobutyl, Amyl, Isoamyl, Neopentyl, 5, 5, 5-trifluoropentyl, Hexie, 6, 6, 6_Trifluorohexyl, etc.),  Lower alkoxy (eg methoxy, Ethoxylate, Propoxy, Isopropyloxy, Butoxy, Isobutoxy, Pentyloxy, Hexyloxy, etc.).  Examples of various aspects of the compound (I) include:  "Stage 1" a compound, Wherein in formula (I),  X and Y are oxygen atoms,  R1 is a hydrogen atom,  a lower alkyl group substituted with one or more substituents as needed,  a lower aryl group substituted with one or more substituents as appropriate,  a lower alkynyl group substituted with one or more substituents as desired, optionally an aryl lower alkyl group substituted with one or more substituents,  a lower alkoxy a lower alkyl group substituted with one or more substituents as appropriate,  An aryloxy lower alkyl group substituted with one or more substituents as appropriate,  a lower alkylalkylthio lower alkyl group substituted with one or more substituents as appropriate,  a lower alkyl sulfinyl lower alkyl group substituted with one or more substituents, if desired,  a lower alkylsulfonyl lower alkyl group substituted by one or more substituents,  Substituting one or more substituents with one or more substituents, or a di-(lower alkyl)amino-based lower alkyl group, Or a low-resistance sputum-based group substituted by one or more substituents,  74 318750 200804250 R2 is an Aachen, Ethyl, Or trimethylene,  A is a group represented by OR3 (wherein R3 is a C1-C3 alkyl group optionally substituted with one or more substituents,  Substituting one or more substituents as needed; 5 carboalkyl fluorenyl, Or an aryl lower alkyl group substituted with one or more substituents as needed,  a group represented by S(0)nR4 (wherein R4 is a Ci_c3 alkyl group which is optionally substituted with one or more substituents, And η is an integer from 0 to 2), Or a group represented by NR5R6 (wherein R5 and R6 are each independently a C1-C3 alkyl group substituted by one or more substituents as needed, Or soil R and R6 are combined at their ends to form together with the nitrogen atom, if necessary, another nitrogen atom, An oxygen atom and a sulfur atom are used as a ring-constituting atom from 3 to 7 nitrogen-containing heterocycles,  R7 is a halogen atom,  a lower alkoxycarbonyl group substituted by one or more atoms, if desired,  a low-carbon alkyl group substituted with one or more (four) atoms as needed,  Depending on the situation, a low carbon alkoxy group substituted with 35 or more tooth atoms,  ^Lower-oxyllow-carbon alkoxylate requiring a plurality of self-atomic substitutions, as desired, via one or more halogens, which are required to be substituted by one or more halogen atoms with one or more halogen atoms. base,  Atom substituted by a lower olefinic thio group,  Atom substituted by a lower alkynylthio group,  318750 75 200804250

一 a丁取代之低碳烷基磺醯基， 個或多個齒原子取代之低碳烯基磺醯基， 個或多個i原子取代之低碳烷氧基低碳烷硫 視需要經一 視需要經一 視需要經一 視需要經一 視需要經一 基，或 -G-E表示之基團 (^、中G為氧原子或硫原子，以及 、為視需要經選自於由（1)鹵原子，及（2)視需要經一個 或多個鹵原子取代之低碳烷基所組成之組群中之一個或多 個取代基取代之芳基或雜環基）， Q為2,6-二氟苯基、2-氯-6-氟苯基、2,6-二氯苯基、 3-氯吡啶-2_基、或3,5-二氯吡啶-4-基，以及 m為1至4之整數（限制條件為當m為2至4之整數 時’ R7為相同或相異）。 「態樣2」 一種化合物，其中於式（I)中， X及Y為氧原子， R1為氫原子， 視需要經一個或多個取代基取代之低碳烧基， 視需要經一個或多個取代基取代之低碳稀基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一傭或多個取代基取代之低碳烧氧基低碳烧基， 視需要經一個或多個取代基取代之芳氧基低碳烧基， 76 318750 200804250 視需要經一個或多個取代基取代之低碳烷硫基低碳烷基， 視需要經一個或多個取代基取代之低碳烷基磺醯基低碳烷 基，或 視需要經一個或多個取代基取代之低碳烷醯基， R2為亞曱基、伸乙基、或三亞曱基， A為OR3表示之基團 (其中R3為視需要經一個或多個取代基取代之Ci_c3烷基， 視需要經一個或多個取代基取代之低碳烷醯基， 視需要經一個或多個取代基取代之芳基低碳烷基）， s(〇)nR4表示之基團 (其中R為視需要經一個或多個取代基取代之浐 基，及兀 β為0至2之整數），或 nr5r6表示之基團 (其中R5及R6各自獨立地為視 代之C1-C3烷基，或 需要經一個或多個取代基取 要具純”㈣形成視需 3員至7員含氮雜環）’+ '、^原子作為環組成原子之 R為南原子， 視需要經_ 視需要經一 視需要經_ 視需要經一 齒原子取代之低碳燒氧幾基， 们或夕個齒原子取代之低碳烷基， 個自原子取代之低錢氧基， 们或夕個“子取代之低魏氧基低碳燒氧 318750 77 200804250 基， 視需要經一個或多個南盾 国原子取代之低碳烷硫基， 視需要經-個或多個齒原子取代之低碳稀硫基， 視f要經一個或多個齒原子取代之低碳块硫基， 視:要、、、工個或多個s原子取代之低碳烧基亞續酿基， 視=要經-個或多個齒原子取代之低碳浠基亞石黃醯基， 視而要、:#或夕個4原子取代之低碳烧基石黃酸基， 視需要經一個或多個南历工 u函原子取代之低碳烷氧基低碳烷硫 基，或 •G-E表示之基團 (其中G為氧原子或硫原子，以及 E為視需要經選自^上 、目於由（1)鹵原子，及（2)視需要經一個 或多個鹵原子取代之低碳燒基所組成之組群中之-個或多 個取代基取代之芳基或雜環基）， Q為2’6_一氟苯基、2'氯_6_氟苯基、2,6_二氯苯基、 3^2·基、或3,5_二氣心定冰基，以及 為至4之整數（限制條件為當m為2至4之整數 時，各個R7可相同或相異）。 「悲樣3」 一種化合物，其中於式（I)中， X及Y為氧原子， 為氫原子、甲基、2—丙稀基、丙炔基、苄基、甲 氧基曱基、乙氧基曱基、2_笨氧基乙基、曱硫基甲基、2_ 曱硫基乙基、甲基亞磺酸基乙基、&gt;甲基磺醢基乙基、 78 318750 200804250 2 - —曱基胺基乙基、或乙基， R2為亞甲基、伸乙基、或三亞甲基， A為〇R3表示之基團 (其中R3為甲基、乙基、2_氯乙基、乙醯基、 S(〇)nR4表示之基團 (其中R4為甲基，及 η為0至2之整數），或 nr5r6表示之基團 (其中R5及R6為甲基，或 R5及R6於其末端共同結 琳基）， 合來與氮原子共同 形成 N-嗎 R7為氟原子、氯原子、第三 t Λ « ^ 一产 —貺甲基、 ，二四既乙乳基、二氟甲氧基、 基乙氧基、三氟甲硫基、二氟 一齓f虱 U，2,2-四氟乙硫基、2”喻基、甲“、乙硫基、 硫基、！，1 2 2 3 3 3七二Y二亂乙硫基、U，2,2,2-五氣乙 炉其7 ，，七氣+汚硫基、1，1，2,3,3,3-六氟小丙 爪基、2-丙炔硫基、3 3 -备q 一 ，-—虱丙烯硫基、2-丙炔硫基、 亞伽基、u，2,2•四氟乙基亞相基、2_丙婦基 三氟甲基伽基、u,2,2_四氟乙基俩 ^基㈣基、山·三氟I三氣甲氧基乙硫基、3_氯_5_ 2比义基硫基、3'氯_心三氣甲基苯氧基，或弘 “-二氟甲基_2_吡啶基氧基， Q 為 2,6-二氟 |其、9 ^ ,. 氟本基2_氣氟苯基、2,6_二氯苯基、 爾_2_基、或3,5-二氯…基，以及 318750 79 200804250 m為2至4之整數 m為1至4之整數（限制條件為當 時，各個R7可相同或相異）。 「態樣4」 一種化合物，其中於式⑴中， X及Y為氧原子， R為氫原子、甲基、2-丙婦基、2_丙炔基、节美、甲 氧基甲基、乙氧基甲基、2-苯氧基乙基、〒硫基甲二2_ 甲硫基乙基、2-甲基磺醯基乙基、或乙醯基， R2為亞甲基、伸乙基、或三亞甲基， A為OR3表示之基團 (其中R3為甲基、乙基、2_氯乙基、乙醯基、或节基）， S(〇)nR4表示之基團 (其中R4為甲基，及 η為0至2之整數），或 NR5R6表示之基團 (其中R5及R6為甲基，或 啉基) 及R於其末jr而共同結合來與氮原子共同形成嗎 R7為氟原子、氣原子、第三丁氧幾基、三氣甲基、 四氟乙氧基、三氟甲氧基、u，2_三氟·2_三貌曱氧 土乙氧基、二氟甲硫基、二氟甲硫基、曱硫基、乙硫基、 ι:ι，2,2-四就乙硫基、2,2,2三I乙硫基、u，2,2,2_五氣乙 石爪基、mm%七氣小丙硫基、】 硫基、2_丙块硫基、3,3_二氯_2_丙稀硫基、2_丙快：基、 318750 80 200804250 三氟曱基亞磺醯基、1，1，2,2-四氟乙基亞磺醯基、2-丙烯基 亞石黃醯基、三氟甲基績酿基、1，1，2,2-四氟乙基石黃醯基、 1，1，2-三氟-2-三氟甲氧基乙硫基、3 -氯-5-三氟曱基_2_吼咬 基硫基、3-氯-4 _三氟曱基苯氧基，或3 -氣-5-三氟曱基-2-°比咬基氧基， Q為2,6-二氟苯基、2-氯-6-氟苯基、2,6_二氯苯基、 3_氯吡啶-2-基、或3,5-二氯吡啶_4_基，以及 瓜為1至4之整數（限制條件為5為2至4之整數 時，各個R7可相同或相異）。 「態樣5」 下列化合物： 1-(2,6-二氟苯甲醯基）_3 基]-1，3-貳（曱氧基甲基）脲， 1-(2,6-二氟苯曱醯基）_、 _4-(二氟甲硫基）苯基]脲， 1 -(2-氯-6-氟苯曱醯基） 基]-1，3-貳（甲氧基甲基）脲， 1-(2,6-二氯苯甲醯基）_3 基]-1，3-貳（甲氧基曱基）脲， ι(2,6-二氟苯甲醯基）_3 基]-1，3_武（甲硫基甲基）脲， 1-(4-氯 _2-氟苯基 &gt;3_(2,6_ 基曱基）脲， ’ 1-(4_ 氯苯基）-3-(2,6-二氟 _ [2-氟三氟曱硫基）苯 _武（乙氧基甲基）-3-[2-氟 [2_鼠-4-(三氟甲硫基）苯 U-氟_4_(三氟曱硫基）苯 [2-氟_4气三氟曱硫基）苯 二氟苯甲醯基）-1，3-貳（曱氧 L甲酿基）-1，3_貳（甲氧基曱 318750 81 200804250 基）脲， l-(3,5-二氯_2,4-二氟苯基）·3_(2,6_二氟苯甲醯基1 貳（甲氧基甲基）脲， ’ 1-[4-(2_氯-4_三氟甲基苯氧基）_2_氟苯基&gt;3-(2,6_二 苯甲醯基）-1，3_貳（甲氧基甲基）脲， 1 (2,6_—氟苯甲醯基）-3_[&gt;敦-4-(1，1，2,2-四氟乙硫基） 苯基]-1，3_貳（甲氧基甲基）脲， 土 Η2,6-二氟苯甲醯基&gt;3_(2_氟_4_甲硫基苯基 (曱氧基曱基）脲， ^ 1 (2氯-6-氟苯甲醯基）_3-(2-氟_4_甲硫基苯基）_1夂 (曱氧基甲基）脲， 5 ^ 1 (2,6-—氟苯甲醯基）-3-(2-氟-4-乙硫基苯基）-1，3_貧 (甲氧基曱基）脲， 、 —1-(2,6-二氟苯甲醯基）_3_[2_氣_4_(1，1，2,2,2_五氟乙硫 基）苯基]-1，3-貳（甲氧基曱基）脲， 1_(2,6_二氟苯曱醯基）_3_[2-氟-4-(1，1，2,2,3,3,3-七氟 -1-丙硫基^苯基PU·貳（曱氧基甲基）脲， H2-氯-6·氟苯曱酿基）_3_(2_氟_4_乙硫基苯基η (曱氧基曱基）脲， ’、' —1⑷，6·二氣苯甲酿基)-H2|4-(U，2,2_四氟乙氧基） 本基；Μ，3-貳（甲氧基甲基）脲， 寸^(2,6_二氟苯曱隨基）_3-(2-氣_4-三氟曱基苯基Η，3_ 紙（甲氧基甲基）脲， H2|6i苯曱酿基）_3必氟邻丄以四氟乙硫基） 318750 82 200804250 苯基]-1，3-貳（甲氧基曱基）脲， 1 (2’6-一 1苯甲醯基）」，3_家（甲氧基甲基）冬(心三氟 曱氧基苯基）脲， 1 (2,6_ —氟苯曱醯基）_3_[2_氟_4_(三氟曱硫基）苯 基]-3-(曱氧基曱基）甲基脲， 3 (2’6 —I苯甲酉藍基）小（乙氧基甲基）小[2_敗冬(三 氟曱硫基）苯基]脲， M2-氣-4_(三氟曱硫基）苯 3-(2,6-二氟苯甲g 基&gt;1-(曱硫基甲基）脲， 基）脲 H4-氯_2_氟苯基)_3_(2,6_二氟苯曱酸基(曱氧基甲 发3-(2,6-一氟苯曱酸基Η_[2ϋ(2_氯_4_三氟曱基苯 氧基）苯基]-1-(曱氧基曱基）脲， 脲 1 (4氯苯基)-3-(2,6-二氟笨甲醯基)小（甲氧基甲基） M2,6-二氟苯f醯基）小[2_氟_4_(1，1，2,2,2_五氟乙硫 基）苯基；1-1-(甲氧基甲基）脲， H4-氯苯基)_3_(2,6_二氯笨甲醯基)小（乙氧基甲基） 脲， 3-(2,6-二氟苯曱酿基)小[2_氟_4_(三氟甲硫基）苯基] -1-(甲氧基甲基）脲， 3-(2,6_二氯苯曱醯基)小[2_氟_4_(三氟曱硫基）苯基] -l_(甲氧基甲基）脲， 3.(2'氯-6-敦苯甲醯基）小[2_氟_4_(三氟甲硫基）苯基] 318750 83 200804250 _i-(曱氧基曱基）脲， &quot;3 (2,6-:氟苯甲酿基）+ [2备4-(1，1二2-四氟乙硫基） 笨基]-1-(曱氧基甲基）脲， 3-(2,6-二氟苯甲酿基xn心甲硫基苯基 基甲基）脲， 虱 3 (2•氯_6_氣笨甲醯基）巧必氟冰甲硫基苯基 氧基甲基）脲， 3-(2’6-一氟苯曱酿基）-H2备4-乙硫基苯基）]-(曱氣 基甲基）脲， 3_(2·氯-6-氟苯甲醯基）_1-(2_氟_4_乙硫基苯基）_丨 氧基甲基）脲， 3-(2,6-一鼠苯甲醯基）+ [2_氣_4七，U，2,氟乙氧基） 苯基]·1·(曱氧基曱基）脲， 3·(2,6_二氟苯曱醯基三氟甲基苯基(曱 氧基甲基）脲， 3_(2_氯冬氟苯甲醯基Η_[2_氣_4_(u，2,2,氣乙硫基) 苯基]-1-(曱氧基曱基）脲， 1(2,6&gt;&quot;二氟苯甲醯基氟-4_(1，1，2,2,3,3,3-七氟 -1-丙硫基）苯基&gt;1_(曱氧基曱基）脲， 3-(2-氯-6-氟苯甲醯基）心七氟 -1'丙硫基）苯基]-1-(甲氧基甲基）脲， 3-(2,6-二氟苯甲醯基三氟曱基亞磺醯基） 苯基]-1-(曱氧基甲基）脲， 3-(2,6-二氟苯甲醯基四氟乙基磺 318750 84 200804250 醯基）苯基]-ι-(甲氧基甲基）脲， 1-(2,6·二氟苯甲醯基）-3_[2_氟_4_(三氟甲基亞磺醯基) 苯基]_1，3_貳（甲氧基甲基）脲， 1-(2,6_二氟苯甲醯基）_3_[2-氟-‘（mi四氟乙基亞 磺醯基）苯基]-1，3-貳（曱氧基甲基）脲， 3-(2,6-二氟苯曱醯基）441氟-4_(三氟甲基磺醯基）苯 基]-1-(甲氧基曱基）脲， 3-(2,6_二氟苯曱醯基H_[2遠|(1，1，2,2-四氟乙基磺 醯基）苯基]-1-(甲氧基曱基）脲， 1-(2,6-二氟苯曱醯基）_3-[2•氟兴三氟曱基磺醯基）苯 基]-1，3_貳（曱氧基曱基）脲， 1-(2,6-二氟苯曱醯基）-3_[2_氟-4_(1，1，2,2_四氟乙基磺 醯基）苯基]-1,3-貳（甲氧基曱基）脲， 1-(2,6-二氟苯甲醯基}-1，3_貳（甲氧基曱基）_3_(4_三氟 曱硫基苯基）脲， 1-(2-氯-4-三氟曱硫基苯基）_3_(2,6_二氟苯甲醯基H，3_ 貳（甲氧基曱基）脲， 氣-5-三氟曱基_2-。比啶基硫基）_2•氟苯基]_3_ (2,6-一氟苯甲醯基分匕^貳（曱氧基甲基）脲， 1 [4-(3-氯-5-二氟甲基_2_0比啶基氧基）_3,5_二氯苯基] -3-(2,6_二氟苯甲醯基H，3j(甲氧基甲基娜， 1_(2,6-二氣苯甲酿基(甲氧基甲基)-3-[2-甲基 -4-(三氟T硫基）苯基]脲， 二氟苯甲酿基）_3_[2,3_二甲基(三氣甲硫基） 318750 85 200804250 苯基]-1，3-貳（曱氧基曱基 &gt;脲， 丨气2,6·二氟苯曱醯基）-3-[2-氟-4-(第三丁氧羰基）苯基] -13-家（甲氧基曱基）脲， 1-(3-氯°比啶_2·基羰基）-3-[2-氟-4-(三氟曱硫基）苯基] -1，3-貳（甲氧基曱基）脲， 1_(3,5-二氯π比啶_4_基羰基）-；Η2-氟冰（三敦甲硫基）苯 基Η，3_貳（甲氧基曱基）脲， 1-(2,6_二氟苯甲醯基)_3_(4_二氟曱硫基_2_氟苯基 篆（曱氧基曱基）脲， 、1兴2_氯氟苯甲醯基)-3-(4-二氟甲硫基-2-氟苯基)-1，3-武（曱氧基甲基）腺， 1-(2,6-二氟苯曱醯基）_3_[2_氟六氣小 丙硫基）苯基]_1,3_貳（甲氧基甲基）脲， 1_(2,6_二氟苯甲醯基）-3_[2-氟-4-(1，1,2,2,3,3,3·七氟 丙硫基）苯基]]，3_貳（甲氧基甲基）脲， H2,6-二氟苯甲酸基)_3_[2_氣_4_(2,2,2_三氣乙硫基） 本基&gt;1，3-貳（甲氧基甲基）脲， 1-[2_氯-4-(二氟甲硫基）苯基]_3_(2,6·二氣苯甲酿基 H武（曱氧基甲基）脲， 3:(2,6_二氟苯τ醯基wmc氟甲硫 甲氧基甲基脲， _(2,2,2-二氟乙硫基） 3-(2,6-二氟苯甲醯基）_1_[2_氟_4 苯基]_1-甲氧基甲基脲， 3-(2,6-二氟苯甲酿 基氟-4-(U，2,3,3,3·六氟-1- 318750 86 200804250 丙硫基）苯基]-1-甲氧基甲基脲， 三氟甲硫基）苯基]-1- 3-(2,6-一氟苯甲醒基）_ι_[2-氟 (2-甲氧基乙基）脲， L乙醯基_3似醯氧基乙基）]佩：說苯甲酿 基）-3-[2·虱_4-(三氟甲硫基）苯基]脲， 1-节氧基甲基-H2,6-二氟苯甲醯基 甲硫基）苯基]-3-甲基脲， 〖軋（一氟 1-(2_氯乙氧基甲基&amp; —与# } ( ’6-一鼠本甲醯基）-lJ2-氟-4· (三氟甲硫基）苯基]-3_甲基脲， 1-(2-乙醯氧基乙基）_3_(2,6_二氟笨 (二氟甲硫基）苯基]-3 -甲基脲， -3-[2-氟-4-(三氟甲硫 1-烯丙基-l-(2,6-二氟苯甲醯基) 基）苯基]-3-甲氧基甲基脲， 1/2’6-—敦苯甲酿基)_3_[2_氟_4_(三氟甲硫基）苯基] -3-甲氧基甲基炔丙基脲， 1 (2’6 一氟苯▼酿基)|[2_氟|(三氣甲硫基）苯基] •3-甲氧基甲基_1_(2_苯氧基乙基）脲， 1:(2,6-一氟苯甲醯基）_3_[2_氟_4_(三氟甲硫基）苯基] -3·甲氧基甲基-1-(2-曱硫基乙基）脲， 1-(2,6-一氟苯甲醯基）_3_[2_氟_4_(三氟曱硫基）苯基] -3-甲氧基甲基-丨气^甲基磺醯基乙基）脲， 1 (2,6-一氟苯甲醯基&gt;3-[2_氟_4_(三氟甲硫基）苯基] -3-甲氧基曱基-1_丙基脲， 1-卞基-1-(2,6-二氟苯甲醯基）_3_[2-氟·‘（三氟甲硫基） 318750 87 200804250 苯基&gt;3-甲氧基甲基脲， (2’6 —氟苯甲醯基）_3-[2,5_二氟_4_(三氟曱硫基）苯 基]-U_武（曱氧基甲基)脲， 1 (2,6_—氟笨曱醯基）_3_[2,6_二氟_4彳三氟甲硫基）苯 基Η，3-武（甲氧基曱基）脲， 1-(2,6-二氣苯甲酿基)_3_[2_敗_4_(2_丙烯硫基）苯基]— π 武（曱氧基甲基）脲， ^ 1 (2,6-一氟苯曱醯基）-3-[2-氟_4_(2-丙烯基亞磺醯基） 苯基]―1，3 —貳（甲氧基甲基）脲， 1-(2,6-一氟苯甲醯基）_3_[2_氟_4_(2_丙炔硫基）苯基] -1，3-貳（甲氧基甲基）脲， 1-[4_(3,3_二氯_2_丙烯硫基）_2_氟苯基卜&gt;(2,6_二氟苯 曱醯基）-1，3_貳（曱氧基甲基）脲， 1_[2_氯-4-(五氟乙硫基）苯基]_3_(2,6_二氟苯曱醯基） -1，3-貳（曱氧基曱基）脲， 卜1_(2,6&gt;&quot;一氟苯曱醯基）_3-[2-氟-4-(1，1，2_三氟-2-三氟曱 氧基乙硫基）苯基]-1，3-貳（甲氧基甲基）脲， 1 [3氯-4_(1，1，2-二氟_2_三氟甲氧基乙氧基）苯基卜3-(2,6-一氟苯曱醯基）_1，3_貳（曱氧基甲基）脲， 1-乙基-1-(2,6·二氟苯甲醯基&gt;3_[2-氟_4_(三氟甲硫 基）苯基]-3-曱氧基曱基脲， 1_(2,6_二氟苯曱醯基)_3-[2_氟_4_(三氟甲硫基）苯基]小 甲基-3-[3-(曱基亞磺醯基）丙基]脲， 1-(2,6-二氟苯曱酸基)_3_[2_氣_4_(三敦甲硫基）苯基]小 318750 88 200804250 曱基-3-[3·(曱基磺醯基）丙基]脲， 1-(2,6·二氟苯甲酿基）^[2-氟_4_(三氟曱硫基）苯 基]-1-曱基-3-(3-N-嗎啉基丙基）脲，及 1-(2,6-二氟苯曱醯基）_3_(3_二甲基胺基丙基）-3-[2_氟 -4-(三氟曱硫基）苯基]-i-曱基脲。 「態樣6」 一種由式（1-100)所表示之苯曱醯脲化合物：a lower alkyl substituted sulfonyl sulfonyl group, a lower aryl sulfonyl group substituted with one or more tooth atoms, and a lower alkoxy alkoxy thiol group substituted by one or more i atoms A group represented by a group, or -GE, as needed, as needed, (wherein, G is an oxygen atom or a sulfur atom, and, if necessary, selected from (1) a halogen atom, and (2) an aryl or heterocyclic group substituted with one or more substituents in a group consisting of a lower alkyl group substituted with one or more halogen atoms, Q is 2,6 -difluorophenyl, 2-chloro-6-fluorophenyl, 2,6-dichlorophenyl, 3-chloropyridin-2-yl, or 3,5-dichloropyridin-4-yl, and m is An integer from 1 to 4 (with the proviso that when m is an integer from 2 to 4, 'R7 is the same or different). "Stage 2" A compound wherein, in the formula (I), X and Y are oxygen atoms, R1 is a hydrogen atom, and a low-carbon alkyl group substituted with one or more substituents, if necessary, one or more a low-carbon alkoxy group substituted by one substituent, a lower alkynyl group substituted by one or more substituents, a low-carbon alkoxy-low-carbon alkyl group substituted by one or more substituents, if necessary An aryloxy lower carbon group substituted by one or more substituents, 76 318750 200804250 A lower alkylalkylthio lower alkyl group optionally substituted with one or more substituents, optionally having one or more substituents a substituted lower alkylsulfonyl lower alkyl group, or a lower alkyl alkano group substituted with one or more substituents as desired, R 2 is a fluorenylene group, an extended ethyl group, or a triadenylene group, and A is OR3 a group represented by (wherein R3 is a Ci_c3 alkyl group optionally substituted by one or more substituents, optionally a lower alkyl alkano group substituted with one or more substituents, optionally substituted with one or more substituents An aryl lower alkyl group, a group represented by s(〇)nR4 (wherein R is an optional one) Or a substituent substituted with a plurality of substituents, and 兀β is an integer of 0 to 2), or a group represented by nr5r6 (wherein R 5 and R 6 are each independently a C 1 -C 3 alkyl group, or may require one or A plurality of substituents should be pure "(4) to form a 3-member to 7-member nitrogen-containing heterocyclic ring) '+ ', ^ atom as a ring-constituting atom, R is a south atom, as needed, depending on the need _ a low-carbon aerobic group substituted by a tooth atom, a lower alkyl group substituted by a tooth atom, or a low-oxyl group substituted by an atom, or a sub-substituted low-Wei oxygen Low-carbon aerobic oxygen 318750 77 200804250 base, a low-carbon alkylthio group substituted by one or more South Shield countries as needed, and a low-carbon dilute sulfur group substituted by one or more tooth atoms, if necessary a low-carbon thiol group substituted by one or more tooth atoms, depending on the low-carbon alkyl group to be replaced by one or more s atoms, depending on the number of atoms or atoms Substituted low carbon sulfhydryl fluorenyl, depending on: # or 夕 4 atoms substituted by low carbon fluorinated lithospernic acid, as needed by one or more A sub-alkali-substituted lower alkoxy-lower alkylthio group, or a group represented by GE (wherein G is an oxygen atom or a sulfur atom, and E is optionally selected from the group consisting of (1) a halogen atom, and (2) an aryl or heterocyclic group substituted with one or more substituents in a group consisting of a low carbon alkyl group substituted with one or more halogen atoms, Q) Is 2'6-monofluorophenyl, 2'-chloro-6-fluorophenyl, 2,6-dichlorophenyl, 3^2.yl, or 3,5-dioxin, and is An integer of 4 (with the proviso that when m is an integer from 2 to 4, each R7 may be the same or different). "Sorry 3" A compound in which X and Y are oxygen atoms in the formula (I), which are a hydrogen atom, a methyl group, a 2-propyl group, a propynyl group, a benzyl group, a methoxy group, and a Oxyfluorenyl, 2-phenyloxyethyl, decylthiomethyl, 2-decylthioethyl, methylsulfinylethyl, &gt;methylsulfonylethyl, 78 318750 200804250 2 - - mercaptoaminoethyl, or ethyl, R2 is methylene, ethyl or trimethylene, and A is a group represented by 〇R3 (wherein R3 is methyl, ethyl, 2-chloroethyl) a group represented by an acetamyl group, S(〇)nR4 (wherein R4 is a methyl group, and η is an integer of 0 to 2), or a group represented by nr5r6 (wherein R5 and R6 are a methyl group, or R5 and R6) At the end, it is combined with a nitrogen atom to form N-? R7 is a fluorine atom, a chlorine atom, a third t Λ « ^ a production - 贶 methyl, , a tetra-four-ethyl emulsion, a difluoride Methoxy, ethoxyethoxy, trifluoromethylthio, difluoro-indenylfluorene, 2,2-tetrafluoroethylthio, 2", a", ethylthio, thio, ??? 1 2 2 3 3 3 7 2 Y two chaotic ethylthio, U, 2, 2, 2- five gas furnace 7 , Seven gas + sulphur-based, 1,1,2,3,3,3-hexafluoro-propyl propanyl, 2-propynylthio, 3 3 -q q,--pyridyl sulphide, 2-propene Alkynylthio, sub-glycol, u, 2, 2 • tetrafluoroethyl subphase, 2 propyl propyl trifluoromethyl gamma, u, 2, 2 _ tetrafluoroethyl yl (tetra) Mountain · trifluoro I trimethoxy ethoxyethylthio, 3 _ _ _ 2 _ 2 thiol thio, 3 chloro _ heart trimethyl phenoxy, or Hong "- difluoromethyl _2 Pyridyloxy, Q is 2,6-difluoro | it, 9 ^ ,. Fluorine 2 - fluorophenyl, 2,6-dichlorophenyl, ar-2-yl, or 3,5- Dichloro..., and 318750 79 200804250 m is an integer from 2 to 4, m is an integer from 1 to 4 (with the proviso that at the time, each R7 may be the same or different). "Stage 4" A compound in which (1) Wherein X and Y are oxygen atoms, R is a hydrogen atom, methyl group, 2-propanyl group, 2-propynyl group, cyclamate, methoxymethyl group, ethoxymethyl group, 2-phenoxy group B a thiol-methyldi-2-methylsulfanylethyl group, a 2-methylsulfonylethyl group, or an ethyl fluorenyl group, R2 is a methylene group, an ethylidene group, or a trimethylene group, and A is a group represented by OR3. Group (where R3 is methyl, ethyl, 2 a group represented by S(〇)nR4 (wherein R4 is a methyl group, and η is an integer of 0 to 2), or a group represented by NR5R6 (wherein R5 and R6 is a methyl group, or a phenyl group) and R is bonded together with a nitrogen atom at the end of it, and R7 is a fluorine atom, a gas atom, a third butoxy group, a trimethyl group, a tetrafluoroethoxy group. ,trifluoromethoxy,u,2_trifluoro.2_trimorphic ethoxylate ethoxy, difluoromethylthio, difluoromethylthio, sulfonylthio, ethylthio, ι:ι, 2 , 2-four on ethylthio group, 2,2,2 tri-I-ethylthio group, u, 2, 2, 2_ five gas ethyl sulphate, mm% seven gas small propylthio group, thio group, 2_ Propyl thiol, 3,3-dichloro-2-propanylthio, 2-propanyl: aryl, 318750 80 200804250 trifluoromethylsulfinyl, 1,1,2,2-tetrafluoroethyl Sulfosyl, 2-propenyl sulphate, trifluoromethyl, 1,1,2,2-tetrafluoroethyl sulphate, 1,1,2-trifluoro-2-trifluoromethoxy Ethylthio, 3-chloro-5-trifluoromethyl 2-1-carbylthio, 3-chloro-4-trifluorodecylphenoxy, or 3-nitro-5-trifluorodecyl- 2-° ratio to methoxy group, Q is 2,6-difluorophenyl , 2-chloro-6-fluorophenyl, 2,6-dichlorophenyl, 3-chloropyridin-2-yl, or 3,5-dichloropyridine-4-yl, and melon is an integer from 1 to 4. (When the limit is 5 to an integer of 2 to 4, each R7 may be the same or different). "5" The following compounds: 1-(2,6-difluorobenzhydryl)_3yl]-1,3-indole (decyloxymethyl)urea, 1-(2,6-difluorobenzene曱醯, _ 4-(difluoromethylthio)phenyl]urea, 1-(2-chloro-6-fluorophenylhydrazinyl)]]1,3-1,3-(methoxymethyl) Urea, 1-(2,6-dichlorobenzhydryl)_3yl]-1,3-indole (methoxyindenyl)urea, ι(2,6-difluorobenzhydryl)_3 base] -1,3_Wu(methylthiomethyl)urea, 1-(4-chloro-2-fluorophenyl)3-(2,6-ylmercapto)urea, '1-(4-chlorophenyl)- 3-(2,6-Difluoro-[2-fluorotrifluorosulfanyl)benzene- wu (ethoxymethyl)-3-[2-fluoro[2_murine-4-(trifluoromethylthio) Benzene U-fluoro_4_(trifluorosulfonyl)benzene [2-fluoro-4 tetrafluoroanthrylthio)phenyldifluorobenzhydryl)-1,3-anthracene -1,3_贰(methoxy 曱318750 81 200804250 base) urea, l-(3,5-dichloro-2,4-difluorophenyl)·3_(2,6-difluorobenzhydryl 1 贰(methoxymethyl)urea, '1-[4-(2_chloro-4_trifluoromethylphenoxy)_2_fluorophenyl&gt;3-(2,6-diphenylformamidine) -1,3_贰(methoxymethyl)urea, 1 (2,6--fluorobenzhydryl) -3_[&gt; Dun-4-(1,1,2,2-tetrafluoroethylthio)phenyl]-1,3_贰(methoxymethyl)urea, Η2,6-difluorobenzene Formamyl>3_(2_fluoro_4_methylthiophenyl(nonyloxyindenyl)urea, ^ 1 (2chloro-6-fluorobenzhydryl)_3-(2-fluoro_4_ Methylthiophenyl)_1夂(decyloxymethyl)urea, 5 ^ 1 (2,6-fluorobenzhydryl)-3-(2-fluoro-4-ethylthiophenyl)-1 , 3_ lean (methoxy fluorenyl) urea, 1, 1-(2,6-difluorobenzhydryl)_3_[2_gas_4_(1,1,2,2,2_pentafluoro Thio)phenyl]-1,3-indole (methoxyindenyl)urea, 1_(2,6-difluorophenylindenyl)_3_[2-fluoro-4-(1,1,2,2 ,3,3,3-heptafluoro-1-propenylthiophenephenyl PU·indole (decyloxymethyl)urea, H2-chloro-6·fluorobenzoquinone)_3_(2_fluoro_4_ Ethylthiophenyl η (decyloxy fluorenyl) urea, ', '-1 (4), 6 · two gas benzoyl) -H 2 | 4- (U, 2, 2 - tetrafluoroethoxy) base ;Μ,3-贰(methoxymethyl)urea, ^^(2,6-difluorophenylhydrazinyl)_3-(2-gas_4-trifluorodecylphenylhydrazine, 3_ paper (A Oxymethyl)urea, H2|6i benzoate)_3F-fluorine ortho-fluorene as tetrafluoroethylthio) 318750 82 200804250 Phenyl ]-1,3-贰(methoxyindenyl)urea, 1 (2'6--1 benzylidene), 3-home (methoxymethyl) winter (heart trifluoromethoxybenzene) Urea, 1 (2,6-fluorobenzino)_3_[2_fluoro_4_(trifluorosulfonyl)phenyl]-3-(decyloxyindenyl)methylurea, 3 (2 '6-I benzindyl blue base) small (ethoxymethyl) small [2_ Asarum (trifluorosulfonyl) phenyl] urea, M2-gas-4_(trifluorosulfonylthio)benzene 3 -(2,6-difluorobenzoyl g-group; 1-(decylthiomethyl)urea, ureido)H4-chloro-2-fluorophenyl)_3_(2,6-difluorobenzoate (曱methoxymethyl 3-(2,6-monofluorobenzoic acid hydrazine _[2ϋ(2_chloro-4-trifluorodecylphenoxy)phenyl]-1-(decyloxyfluorenyl)) Urea, urea 1 (4 chlorophenyl)-3-(2,6-difluoro carbamoyl) small (methoxymethyl) M2,6-difluorobenzene f yl) small [2_fluoro_ 4_(1,1,2,2,2_pentafluoroethylthio)phenyl; 1-1-1-(methoxymethyl)urea, H4-chlorophenyl)_3_(2,6-dichlorophenyl Sulfhydryl) small (ethoxymethyl) urea, 3-(2,6-difluorobenzoquinone) small [2_fluoro_4_(trifluoromethylthio)phenyl]-1-(methoxy Methyl)urea, 3-(2,6-dichlorophenylhydrazino) small [2_fluoro_4_(trifluoroanthracene) Phenyl]-l-(methoxymethyl)urea, 3. (2' chloro-6- benzoyl fluorenyl) small [2_fluoro_4_(trifluoromethylthio)phenyl] 318750 83 200804250 _i-(曱 曱 ))urea, &quot;3 (2,6-: fluorobenzamide)+ [2 preparation 4-(1,1 bis 2-tetrafluoroethylthio) phenyl]- 1-(decyloxymethyl)urea, 3-(2,6-difluorobenzyl xn-cardamosylphenylmethyl)urea, 虱3 (2•chloro-6_qi 甲甲甲醯Base) chlorhexidine thiomethylthiomethyloxy)urea, 3-(2'6-monofluorophenyl fluorene)-H2 4-ethylthiophenyl)]-(helium base) Urea, 3_(2·chloro-6-fluorobenzhydryl)_1-(2-fluoro-4-indolylphenyl)-nonyloxymethyl)urea, 3-(2,6-one Rat benzylidene)+[2_gas_4,7,U,2,fluoroethoxy)phenyl]·1·(曱oxyindenyl)urea, 3·(2,6-difluorophenylhydrazine) Mercaptotrifluoromethylphenyl (decyloxymethyl)urea, 3_(2_chlorotolfene fluorenyl hydrazine_[2_gas_4_(u,2,2, ethaneethylthio)phenyl] -1-(nonyloxyindenyl)urea, 1(2,6&gt;&quot;difluorobenzhydrylfluoro-4_(1,1,2,2,3,3,3-heptafluoro-1-propane Thio)phenyl&gt;1_(decyloxyindenyl)urea, 3-(2-chloro-6-fluorobenzamide Sulfhydryl) heart heptafluoro-1 'propylthio)phenyl]-1-(methoxymethyl)urea, 3-(2,6-difluorobenzimidyltrifluoromethylsulfinyl) Phenyl]-1-(decyloxymethyl)urea, 3-(2,6-difluorobenzhydryltetrafluoroethylsulfon 318750 84 200804250 fluorenyl)phenyl]-ι-(methoxymethyl) Urea, 1-(2,6·difluorobenzylidene)-3_[2_fluoro_4_(trifluoromethylsulfinyl)phenyl]_1,3_贰(methoxymethyl) Urea, 1-(2,6-difluorobenzhydryl)_3_[2-fluoro-'(mitetrafluoroethylsulfinyl)phenyl]-1,3-indole (decyloxymethyl) Urea, 3-(2,6-difluorophenylindenyl) 441 fluoro-4-(trifluoromethylsulfonyl)phenyl]-1-(methoxyindenyl)urea, 3-(2, 6_Difluorobenzoinyl H_[2 far|(1,1,2,2-tetrafluoroethylsulfonyl)phenyl]-1-(methoxyindenyl)urea, 1-(2, 6-difluorophenylindenyl)_3-[2•fluorotrifluoroindolylsulfonyl)phenyl]-1,3_indoleoxycarbonyl, 1-(2,6-di Fluorobenzoyl)-3_[2_fluoro-4_(1,1,2,2-tetrafluoroethylsulfonyl)phenyl]-1,3-indole (methoxyindenyl)urea, 1 -(2,6-difluorobenzhydryl}-1,3_贰(methoxyindolyl)_3_(4_ Trifluorosulfonylphenyl)urea, 1-(2-chloro-4-trifluorosulfonylphenyl)_3_(2,6-difluorobenzhydryl H,3_ fluorene (methoxymethoxy) Urea, gas-5-trifluoromethyl 2-. (1,6-fluorobenzhydryl) Methyl-2_0-pyridyloxy)_3,5-dichlorophenyl]-3-(2,6-difluorobenzhydryl H,3j(methoxymethylna, 1_(2,6- Dioxobenzoyl (methoxymethyl)-3-[2-methyl-4-(trifluoro-t-thio)phenyl]urea, difluorobenzyl)_3_[2,3_2 Methyl (trimethylmethylthio) 318750 85 200804250 Phenyl]-1,3-indole (fluorenyloxy)&gt;urea, helium 2,6·difluorobenzoinyl)-3-[2- Fluoro-4-(t-butoxycarbonyl)phenyl]-1,3-(methoxyindolyl)urea, 1-(3-chloropyridin-2-ylcarbonyl)-3-[2-fluoro- 4-(trifluorosulfonyl)phenyl]-1,3-indole (methoxyindenyl)urea, 1-(3,5-dichloroπ-pyridyl-4-ylcarbonyl)-; fluorene 2-fluoride (Santun methylthio)phenylhydrazine, 3_贰(methoxyindenyl)urea, 1-(2,6-difluorobenzhydryl)_3_(4-difluorosulfonylthio-2-fluoro Phenyl hydrazine (decyloxy fluorenyl) urea, 1 dimethyl 2 chlorofluorobenzhydryl)-3-(4-difluoromethylthio-2-fluorophenyl)-1,3- wu (曱Oxymethyl) gland, 1-(2,6-difluorobenzoinyl)_3_[2_fluorohexa Small propylthio)phenyl]_1,3_贰(methoxymethyl)urea, 1_(2,6-difluorobenzhydryl)-3_[2-fluoro-4-(1,1,2 , 2,3,3,3·heptafluoropropylthio)phenyl]],3_贰(methoxymethyl)urea, H2,6-difluorobenzoic acid)_3_[2_气_4_( 2,2,2_trisethoxyethyl) Benzo[1,3-1,3-(methoxymethyl)urea, 1-[2-chloro-4-(difluoromethylthio)phenyl]_3_ (2,6·2-gas benzoyl alcohol H (nonyloxymethyl) urea, 3: (2,6-difluorobenzene oxime wmc fluoromethylthiomethoxymethylurea, _ (2, 2,2-difluoroethylthio) 3-(2,6-difluorobenzhydryl)_1_[2_fluoro-4-phenyl]-1-methoxymethylurea, 3-(2,6- Difluorobenzylfluoro-4-(U,2,3,3,3·hexafluoro-1- 318750 86 200804250 propylthio)phenyl]-1-methoxymethylurea, trifluoromethane Phenyl]-1- 3-(2,6-fluorobenzamide)_ι_[2-fluoro(2-methoxyethyl)urea, L-ethyl hydrazino-3 )] Pei: said benzoyl) 3-[2·虱_4-(trifluoromethylthio)phenyl]urea, 1-ethoxymethyl-H2,6-difluorobenzhydryl Methylthio)phenyl]-3-methylurea, 〖 rolling (monofluoro 1-(2-chloroethoxymethyl)-and-# } ( '6-one murine mercapto)-lJ2-fluoro-4·(trifluoromethylthio)phenyl]-3-methylurea, 1-(2-acetoxyethyl)_3_(2, 6_Difluoro phenyl(difluoromethylthio)phenyl]-3-methylurea, -3-[2-fluoro-4-(trifluoromethylsulfanyl 1-allyl-l-(2,6-) Difluorobenzhydryl)yl)phenyl]-3-methoxymethylurea, 1/2'6--benzobenzyl)_3_[2_fluoro_4_(trifluoromethylthio)benzene -3-methoxymethylpropargyl urea, 1 (2'6-fluorophenyl), [2_fluoro | (trimethylthio)phenyl] • 3-methoxy Base_1_(2-phenoxyethyl)urea, 1:(2,6-fluorobenzhydryl)_3_[2_fluoro_4_(trifluoromethylthio)phenyl]-3.methoxy Methyl-1-(2-sulfonylethyl)urea, 1-(2,6-fluorobenzhydryl)_3_[2_fluoro_4_(trifluorosulfonyl)phenyl] -3 -Methoxymethyl-oxime^methylsulfonylethyl)urea, 1 (2,6-fluorobenzhydryl)&gt;3-[2_fluoro_4_(trifluoromethylthio)benzene -3-methoxyindolyl-1_propylurea, 1-mercapto-1-(2,6-difluorobenzhydryl)_3_[2-fluoro·'(trifluoromethylthio) 318750 87 200804250 Phenyl&gt;3-methoxymethylurea, (2'6-fluorobenzhydryl)_3-[2,5_difluoro_4_ (trifluorosulfonyl)phenyl]-U_wu (decyloxymethyl)urea, 1 (2,6--fluoroindolyl)_3_[2,6-difluoro_4彳trifluoromethane Phenyl hydrazine, 3- methoxy(methoxyindenyl)urea, 1-(2,6-di-gas benzoyl)_3_[2_败_4_(2- propylthio)phenyl]- π 武(曱oxymethyl)urea, ^ 1 (2,6-fluorobenzoyl)-3-[2-fluoro_4_(2-propenylsulfinyl)phenyl]-1, 3-贰(methoxymethyl)urea, 1-(2,6-fluorobenzhydryl)_3_[2_fluoro_4_(2-propynylthio)phenyl]-1,3-anthracene (methoxymethyl)urea, 1-[4_(3,3-dichloro-2-propenyl)_2-fluorophenyl b>(2,6-difluorobenzoinyl)-1, 3_贰(曱oxymethyl)urea, 1_[2_chloro-4-(pentafluoroethylthio)phenyl]_3_(2,6-difluorophenylindenyl)-1,3-anthracene曱 曱 )) urea, Bu 1_(2,6&gt;&quot;monofluorophenylindenyl)_3-[2-fluoro-4-(1,1,2-trifluoro-2-trifluorodecyloxy) Ethylthio)phenyl]-1,3-indole (methoxymethyl)urea, 1 [3chloro-4_(1,1,2-difluoro-2-trifluoromethoxyethoxy)benzene Keb 3-(2,6-fluorobenzino)_1,3_贰(decyloxymethyl)urea, 1-B -1-(2,6·difluorobenzhydryl)&gt;3_[2-fluoro_4_(trifluoromethylthio)phenyl]-3-decyloxyguanidinourea, 1_(2,6_2 Fluorobenzoyl)_3-[2_fluoro_4_(trifluoromethylsulfanyl)phenyl]sodiummethyl-3-[3-(indolylsulfinyl)propyl]urea, 1-(2 ,6-difluorobenzoyl acid)_3_[2_gas_4_(San Dunmethylthio)phenyl] small 318750 88 200804250 fluorenyl-3-[3·(indolylsulfonyl)propyl]urea , 1-(2,6·difluorobenzoyl)^[2-fluoro_4_(trifluorosulfonylthio)phenyl]-1-indolyl-3-(3-N-morpholinylpropyl Urea, and 1-(2,6-difluorophenylindenyl)_3_(3-dimethylaminopropyl)-3-[2-fluoro-4-(trifluorosulfonylthio)phenyl] -i-decyl urea. "Stage 6" A benzoquinone compound represented by the formula (1-100):

式中， r1g()表示鹵原子， R2GG表示_原子， R1-100表示氫原子、C1-C4烷基或基C1-C4烷氧基C1-C4 烧基， R2-1GG表示C1-C4烷氧基， r7]()()表示氫原子或鹵原子，以及 T) 7&quot; 2 0 0 士 一 JL. R 表不鹵原子、視需要經一個或多個鹵原子取代之Wherein r1g() represents a halogen atom, R2GG represents a _ atom, R1-100 represents a hydrogen atom, a C1-C4 alkyl group or a C1-C4 alkoxy group C1-C4 alkyl group, and R2-1GG represents a C1-C4 alkoxy group. a group, r7]()() represents a hydrogen atom or a halogen atom, and T) 7&quot; 2 0 0 a JL. R represents a halogen atom, optionally substituted by one or more halogen atoms

Cl-C4烧氧基、視需要經一個或多個鹵原子取代之C1_C4 烧硫基、視需要經一個或多個鹵原子取代之Cl-C4烷基亞 石黃醯基、或視需要經一個或多個鹵原子取代之C1-C4烷基 石黃醢基。 「態樣7」 89 318750 200804250 一種化合物，其中於式（1_100)中， R 為氟原子或氯原子， R 為鼠原子或氯原子， R1]00為氫原子、C1-C4烷基或C1-C4烷氧基C1-C4烷基， R2 1GG為C1-C4烷氧基， R 為氫原子、貌原子或氯原子，以及 R7_2()()為鹵原子、視需要經一個或多個鹵原子取代之C1-C4 烧氧基、視需要經一個或多個鹵原子取代之C1-C4烷硫 基、視需要經一個或多個鹵原子取代之C1-C4烷基亞磺醯 基、或視需要經一個或多個鹵原子取代之C1-C4烷基磺醯 基。 「態樣8」 一種化合物，其中於式（1-100)中， r1G()為自原子， R2()()為鹵原子， 為甲氧基曱基， r2_1(K)為甲氧基， R 為氣原子、氟*原子或氯原子，以及 K 為鹵原子、視需要經一個或多個鹵原子取代之C1-C4 烧氧基、視需要經一個或多個鹵原子取代之C1-C4烷硫 基、視需要經一個或多個鹵原子取代之C1-C4烷基亞石黃醯 基、或視需要經一個或多個鹵原子取代之C1_C4烷基磺醯 基。 「態樣9」 90 318750 200804250 一種化合物，其中於式（1-100)中’ R1()C)為鹵原子， R2()()為鹵原子， 為甲氧基曱基， R2_1CK)為甲氧基， r7_1G()為氟原子，以及 R7-200為鹵原子、視需要經一個或多個鹵原子取代之C1-C4 烷氧基、視需要經一個或多個鹵原子取代之C1-C4烷硫 基、視需要經一個或多個鹵原子取代之C1 - C 4火完基亞石黃酿 基、或視需要經一個或多個鹵原子取代之C1-C4烷基磺醯 基。 「態樣10」 一種化合物，其中於式（1-100)中， R 為氟^原子或氯原子， R 為氟原子或氯原子， R1刚為氫原子、C1-C4烷基或C1_C4烷氧基烷基， R 為C1-C4烧氧基， R 為氫原子、氟原子或氣原子，以及 R7-20G為視需要經一個或多個取代基取代之〇&lt;4烷硫基。 「態樣11」 種化合物，其中於式（1-1 00)中， R1G()為氟原子或氯原子， R2⑼為氟原子或氯原子， •pl-100 达知 為虱原子、C1-C4烧基或C1_C4烷氧基C1_C4烧基， 318750 91 200804250 為C1-C4烷氧基， •^7-100 •^7-200 為氫原子、氟原子戋 丁 A乳原子，以及 為三氟曱硫基。 態樣12」 一種化合物’其中於式（1_100)中， R為氟原子或氯原子， r2G()為氟原子或氯原子， 眇⑽為氫原子、C1_C4烷基或C1-C4烷氧基C1_C4烷基， R2·⑽為C1-C4烷氧基， r7_1G()為氟原子，以及 R7-200為三氟曱硫基。 本發明化合物之特定實例如後。 式（I_A)表示之化合物··Cl-C4 alkoxy, optionally substituted by one or more halogen atoms, C1_C4 thiol group, optionally substituted by one or more halogen atoms, Cl-C4 alkyl sulphate, or optionally one or more a C1-C4 alkyl sulphate substituted by a halogen atom. "Stage 7" 89 318750 200804250 A compound wherein, in the formula (1_100), R is a fluorine atom or a chlorine atom, R is a mouse atom or a chlorine atom, R1]00 is a hydrogen atom, a C1-C4 alkyl group or a C1- C4 alkoxy C1-C4 alkyl, R2 1GG is C1-C4 alkoxy, R is a hydrogen atom, a polar or chlorine atom, and R7_2()() is a halogen atom, optionally having one or more halogen atoms a C1-C4 alkylsulfinyl group substituted by a C1-C4 alkoxy group, optionally substituted with one or more halogen atoms, optionally substituted with one or more halogen atoms, or A C1-C4 alkylsulfonyl group substituted with one or more halogen atoms is required. "Stage 8" A compound wherein, in the formula (1-100), r1G() is a self atom, R2()() is a halogen atom, a methoxy fluorenyl group, and r2_1(K) is a methoxy group. R is a gas atom, a fluorine atom or a chlorine atom, and a C1-C4 alkoxy group wherein K is a halogen atom, optionally substituted by one or more halogen atoms, and optionally substituted by one or more halogen atoms. An alkylthio group, optionally a C1-C4 alkyl sulphate substituted with one or more halogen atoms, or a C1_C4 alkylsulfonyl group substituted with one or more halogen atoms, if desired. "State 9" 90 318750 200804250 A compound in which 'R1()C) is a halogen atom in the formula (1-100), R2()() is a halogen atom, a methoxy fluorenyl group, R2_1CK) is a An oxy group, r7_1G() is a fluorine atom, and a C1-C4 alkoxy group wherein R7-200 is a halogen atom, optionally substituted with one or more halogen atoms, and optionally substituted by one or more halogen atoms. An alkylthio group, optionally substituted by one or more halogen atoms, is substituted with a C1-C4 group, or a C1-C4 alkylsulfonyl group, optionally substituted with one or more halogen atoms. "Stage 10" A compound wherein, in the formula (1-100), R is a fluorine atom or a chlorine atom, R is a fluorine atom or a chlorine atom, and R1 is a hydrogen atom, a C1-C4 alkyl group or a C1_C4 alkoxy group. An alkyl group, R is a C1-C4 alkoxy group, R is a hydrogen atom, a fluorine atom or a gas atom, and R7-20G is a fluorene &lt;4 alkylthio group which is optionally substituted with one or more substituents. "Form 11", wherein in the formula (1-1 00), R1G() is a fluorine atom or a chlorine atom, R2(9) is a fluorine atom or a chlorine atom, and ? pl-100 is a germanium atom, C1-C4 An alkyl group or a C1_C4 alkoxy C1_C4 alkyl group, 318750 91 200804250 is a C1-C4 alkoxy group, •^7-100 •^7-200 is a hydrogen atom, a fluorine atom, a milk atom, and a trifluorosulfonium sulfur. base. Aspect 12" A compound 'In the formula (1_100), R is a fluorine atom or a chlorine atom, r2G() is a fluorine atom or a chlorine atom, and ruthenium (10) is a hydrogen atom, a C1_C4 alkyl group or a C1-C4 alkoxy group C1_C4 The alkyl group, R2·(10) is a C1-C4 alkoxy group, r7_1G() is a fluorine atom, and R7-200 is a trifluorosulfonyl group. Specific examples of the compounds of the invention are as follows. a compound represented by the formula (I_A)··

19」所述之任一種組合。 後文中，於某些情況下曱基標示為Me。 318750 92 200804250 表1Any combination of the above. In the following text, in some cases the thiol group is labeled Me. 318750 92 200804250 Table 1

No. X1 Y1 R1 R2-l R7&quot;1 R7-2 1-1 F F H CH2OMe H scf3 1-2 Cl F H CH2OMe H scf3 1-3 Cl Cl H CH2OMe H scf3 1-4 F F H CH2OMe 2-C1 scf3 1-5 Cl F H CH2OMe 2-C1 scf3 1-6 Cl Cl H CH2OMe 2-C1 scf3 1-7 F F H CH2OMe 2-Me scf3 1-8 Cl F H CH2〇Me 2-Me scf3 1-9 Cl Cl H CH2OMe 2-Me scf3 1-10 F F H CH2OMe 2,3-Me2 scf3 Ml Cl F H CH2OMe 2,3-Me2 scf3 1-12 Cl Cl H CH2OMe 2,3-Me2 scf3 I -13 Cl F CH2〇Me CH2〇Me H scf3 1-14 Cl Cl CH2OMe CH2OMe H scf3 1-15 Cl F CH2OMe CH2OMe 2-C1 scf3 1-16 Cl Cl CH2〇Me CH2OMe 2-C1 scf3 1-17 Cl F CH2OMe CH2OMe 2-Me scf3 1-18 Cl Cl CH2〇Me CH2OMe 2-Me scf3 Ι·19 Cl F CH2〇Me CH2OMe 2,3-Me2 scf3 1-20 Cl Cl CH2OMe CH2OMe 2,3-Me2 scf3 1-21 F F H CH2OMe H socf3 1-22 Cl F H CH2OMe H SOCF3 1-23 Cl Cl H CH2OMe H SOCF3 1-24 Cl F H CH2OMe 2-F SOCF3 1-25 Cl Cl H CH2OMe 2-F SOCF3 1-26 F F H CH2OMe 2-C1 SOCF3 1-27 Cl F H 丨 CH2OMe 2-C1 SOCF3 1-28 、 Cl Cl ： H 丨 CH2OMe 2-C1 SOCF3 1-29 ： F ： F H 、 CH2OMe 2-Me SOCF3 1-30 丨 Cl ： F H 丨 CH2OMe 2-Me SOCF3 93 318750 200804250 表2No. X1 Y1 R1 R2-l R7&quot;1 R7-2 1-1 FFH CH2OMe H scf3 1-2 Cl FH CH2OMe H scf3 1-3 Cl Cl H CH2OMe H scf3 1-4 FFH CH2OMe 2-C1 scf3 1-5 Cl FH CH2OMe 2-C1 scf3 1-6 Cl Cl H CH2OMe 2-C1 scf3 1-7 FFH CH2OMe 2-Me scf3 1-8 Cl FH CH2〇Me 2-Me scf3 1-9 Cl Cl H CH2OMe 2-Me scf3 1-10 FFH CH2OMe 2,3-Me2 scf3 Ml Cl FH CH2OMe 2,3-Me2 scf3 1-12 Cl Cl H CH2OMe 2,3-Me2 scf3 I -13 Cl F CH2〇Me CH2〇Me H scf3 1-14 Cl Cl CH2OMe CH2OMe H scf3 1-15 Cl F CH2OMe CH2OMe 2-C1 scf3 1-16 Cl Cl CH2〇Me CH2OMe 2-C1 scf3 1-17 Cl F CH2OMe CH2OMe 2-Me scf3 1-18 Cl Cl CH2〇Me CH2OMe 2-Me scf3 Ι·19 Cl F CH2〇Me CH2OMe 2,3-Me2 scf3 1-20 Cl Cl CH2OMe CH2OMe 2,3-Me2 scf3 1-21 FFH CH2OMe H socf3 1-22 Cl FH CH2OMe H SOCF3 1-23 Cl Cl H CH2OMe H SOCF3 1-24 Cl FH CH2OMe 2-F SOCF3 1-25 Cl Cl H CH2OMe 2-F SOCF3 1-26 FFH CH2OMe 2-C1 SOCF3 1-27 Cl FH 丨CH2OMe 2-C1 SOCF3 1-28 , Cl Cl : H 丨CH2OMe 2-C1 SOCF3 1-29 : F : FH , CH2OMe 2-Me SOCF3 1-30 丨Cl : FH CH2OMe 2-Me SOCF3 93 318750 200804250 TABLE 2

No. X1 Y1 R1 R2-1 R7'1 R7-2 1-31 Cl Cl H CH2OMe 2-Me SOCF3 1-32 F F H CH2OMe 2,3-Me2 SOCF3 1-33 Cl F H CH2OMe 2,3-Me2 SOCF3 1-34 Cl Cl H CH2OMe 2,3-Me2 SOCF3 1-35 F F CH2OMe CH2OMe H SOCF3 1-36 Cl F CH2OMe CH2OMe H SOCF3 1-37 Cl Cl CH2〇Me CH2OMe H SOCF3 1-38 Cl F CH2OMe CH2OMe 2-F SOCF3 1-39 Cl Cl CH2〇Me CH2OMe 2-F SOCF3 1-40 F F CH2OMe CH2OMe 2-C1 SOCF3 1-41 Cl F CH2OMe CH2〇Me 2-C1 SOCF3 1-42 Cl Cl CH2OMe CH2OMe 2-C1 SOCF3 1-43 F F CH2OMe CH2OMe 2-Me SOCF3 1-44 Cl F CH2OMe CH2OMe 2-Me SOCF3 1-45 Cl Cl CH2OMe CH2OMe 2-Me SOCF3 1-46 F F CH2OMe CH2OMe 2,3-Me2 SOCF3 1-47 Cl F CH2OMe CH2OMe 2,3-Me2 SOCF3 1-48 Cl Cl CH2OMe CH2OMe 2,3-Me2 SOCF3 1-49 F F H CH2OMe H so2cf3 1-50 Cl F H CH2〇Me H so2cf3 1-51 Cl Cl H CH2〇Me H so2cf3 1-52 Cl F H CH2〇Me 2-F so2cf3 1-53 Cl Cl H CH2〇Me 2-F so2cf3 1-54 F F H CH2OMe 2-C1 so2cf3 1-55 Cl F H CH2OMe 2-C1 so2cf3 1-56 Cl Cl H CH2〇Me 2-C1 so2cf3 1-57 F F H CH2OMe 2-Me so2cf3 1-58 Cl F H CH2OMe 2-Me so2cf3 1-59 Cl Cl ： H CH2〇Me 2-Me so2cf3 1-60 ： F ： F H CH2OMe 2,3-Me2 so2cf3 94 318750 200804250 表3No. X1 Y1 R1 R2-1 R7'1 R7-2 1-31 Cl Cl H CH2OMe 2-Me SOCF3 1-32 FFH CH2OMe 2,3-Me2 SOCF3 1-33 Cl FH CH2OMe 2,3-Me2 SOCF3 1- 34 Cl Cl H CH2OMe 2,3-Me2 SOCF3 1-35 FF CH2OMe CH2OMe H SOCF3 1-36 Cl F CH2OMe CH2OMe H SOCF3 1-37 Cl Cl CH2〇Me CH2OMe H SOCF3 1-38 Cl F CH2OMe CH2OMe 2-F SOCF3 1-39 Cl Cl CH2〇Me CH2OMe 2-F SOCF3 1-40 FF CH2OMe CH2OMe 2-C1 SOCF3 1-41 Cl F CH2OMe CH2〇Me 2-C1 SOCF3 1-42 Cl Cl CH2OMe CH2OMe 2-C1 SOCF3 1-43 FF CH2OMe CH2OMe 2-Me SOCF3 1-44 Cl F CH2OMe CH2OMe 2-Me SOCF3 1-45 Cl Cl CH2OMe CH2OMe 2-Me SOCF3 1-46 FF CH2OMe CH2OMe 2,3-Me2 SOCF3 1-47 Cl F CH2OMe CH2OMe 2, 3-Me2 SOCF3 1-48 Cl Cl CH2OMe CH2OMe 2,3-Me2 SOCF3 1-49 FFH CH2OMe H so2cf3 1-50 Cl FH CH2〇Me H so2cf3 1-51 Cl Cl H CH2〇Me H so2cf3 1-52 Cl FH CH2〇Me 2-F so2cf3 1-53 Cl Cl H CH2〇Me 2-F so2cf3 1-54 FFH CH2OMe 2-C1 so2cf3 1-55 Cl FH CH2OMe 2-C1 so2cf3 1-56 Cl Cl H CH2〇Me 2- C1 so2cf3 1-57 FFH CH2OMe 2-Me so2cf3 1-58 Cl FH CH2OMe 2-Me so2cf3 1-59 Cl C l : H CH2〇Me 2-Me so2cf3 1-60 : F : F H CH2OMe 2,3-Me2 so2cf3 94 318750 200804250 Table 3

No. X1 Y1 R1 R2·1 R7-1 R7-2 1-61 Cl F H CH2OMe 2,3-Me2 so2cf3 1-62 Cl Cl H CH2OMe 2,3-Me2 so2cf3 1-63 F F CH2OMe CH2OMe H so2cf3 1-64 Cl F CH2OMe CH2OMe H so2cf3 1-65 Cl Cl CH2OMe CH2OMe H so2cf3 1-66 Cl F CH2OMe CH2OMe 2-F so2cf3 1-67 Cl Cl CH2OMe CH2OMe 2-F so2cf3 1-68 F F CH2OMe CH2OMe 2-C1 so2cf3 1-69 Cl F CH2〇Me CH2OMe 2-C1 so2cf3 1-70 Cl Cl CH2OMe CH2OMe 2-C1 so2cf3 1-71 F F CH2OMe CH2OMe 2-Me so2cf3 1-72 Cl F CH2OMe CH2OMe 2-Me S02CF3 1-73 Cl Cl CH2OMe CH2OMe 2-Me so2cf3 1-74 F F CH2OMe CH2〇Me 2,3-Me2 so2cf3 1-75 Cl F CH2OMe CH2〇Me 2,3-Me2 so2cf3 1-76 Cl Cl CH2OMe CH2OMe 2,3-Me2 so2cf3 1-77 F F H CH2OMe H SCF2CF2H 1-78 Cl F H CH2OMe H scf2cf2h 1-79 Cl Cl H CH2OMe H scf2cf2h 1-80 Cl Cl H CH2OMe 2-F scf2cf2h 1-81 F F H CH2OMe 2-C1 scf2cf2h 1-82 Cl F H CH2OMe 2-C1 scf2cf2h 1-83 Cl Cl H CH2OMe 2-C1 scf2cf2h I_84 F F H CH2〇Me 2-Me scf2cf2h 1-85 Cl F H CH2OMe 2-Me scf2cf2h 1-86 Cl Cl ： H CH2OMe 2-Me scf2cf2h 1-87 ： F _ F H 丨 CH2OMe 2,3-Me2 scf2cf2h 1-88 丨 Cl ： F H 丨 CH2OMe ： 2,3-Me2 scf2cf2h 1-89 丨 Cl 、 Cl : H 丨 CH2OMe ： 2,3-Me2 scf2cf2h 1-90 ： F ； F i CH2OMe i CH2OMe ： H ; scf2cf2h 95 318750 200804250 表4No. X1 Y1 R1 R2·1 R7-1 R7-2 1-61 Cl FH CH2OMe 2,3-Me2 so2cf3 1-62 Cl Cl H CH2OMe 2,3-Me2 so2cf3 1-63 FF CH2OMe CH2OMe H so2cf3 1-64 Cl F CH2OMe CH2OMe H so2cf3 1-65 Cl Cl CH2OMe CH2OMe H so2cf3 1-66 Cl F CH2OMe CH2OMe 2-F so2cf3 1-67 Cl Cl CH2OMe CH2OMe 2-F so2cf3 1-68 FF CH2OMe CH2OMe 2-C1 so2cf3 1-69 Cl F CH2〇Me CH2OMe 2-C1 so2cf3 1-70 Cl Cl CH2OMe CH2OMe 2-C1 so2cf3 1-71 FF CH2OMe CH2OMe 2-Me so2cf3 1-72 Cl F CH2OMe CH2OMe 2-Me S02CF3 1-73 Cl Cl CH2OMe CH2OMe 2 -Me so2cf3 1-74 FF CH2OMe CH2〇Me 2,3-Me2 so2cf3 1-75 Cl F CH2OMe CH2〇Me 2,3-Me2 so2cf3 1-76 Cl Cl CH2OMe CH2OMe 2,3-Me2 so2cf3 1-77 FFH CH2OMe H SCF2CF2H 1-78 Cl FH CH2OMe H scf2cf2h 1-79 Cl Cl H CH2OMe H scf2cf2h 1-80 Cl Cl H CH2OMe 2-F scf2cf2h 1-81 FFH CH2OMe 2-C1 scf2cf2h 1-82 Cl FH CH2OMe 2-C1 scf2cf2h 1 -83 Cl Cl H CH2OMe 2-C1 scf2cf2h I_84 FFH CH2〇Me 2-Me scf2cf2h 1-85 Cl FH CH2OMe 2-Me scf2cf2h 1-86 Cl Cl : H CH2OMe 2-Me scf2cf2h 1-87 : F _ FH 丨CH2OMe 2,3-Me2 scf 2cf2h 1-88 丨Cl : FH 丨CH2OMe : 2,3-Me2 scf2cf2h 1-89 丨Cl , Cl : H 丨CH2OMe : 2,3-Me2 scf2cf2h 1-90 : F ; F i CH2OMe i CH2OMe : H ; scf2cf2h 95 318750 200804250 Table 4

No. X1 Y1 R1 R2-l R7-1 R7-2 1-91 Cl F CH2〇Me CH2OMe H scf2cf2h 1-92 Cl Cl CH2OMe CH2OMe H scf2cf2h 1-93 Cl Cl CH2OMe CH2OMe 2-F scf2cf2h 1-94 F F CH2〇Me CH2OMe 2-C1 scf2cf2h 1-95 Cl F CH2〇Me CH2OMe 2-C1 scf2cf2h 1-96 Cl Cl CH2OMe CH2OMe 2-C1 scf2cf2h 1-97 F F CH2OMe CH2〇Me 2-Me scf2cf2h 1-98 Cl F CH2OMe CH2OMe 2-Me scf2cf2h 1-99 Cl Cl CH2OMe CH2〇Me 2-Me scf2cf2h 1-100 F F CH2〇Me CH2OMe 2,3-Me2 scf2cf2h 1-101 Cl F CH2OMe CH2〇Me 293-Me2 scf2cf2h 1-102 Cl Cl CH2OMe CH2〇Me 2,3-Me2 scf2cf2h 1-103 F F H CH2OMe H socf2cf2h 1-104 Cl F H CH2OMe H socf2cf2h M05 Cl Cl H CH2OMe H socf2cf2h 1-106 Cl F H CH2OMe 2-F socf2cf2h 1-107 Cl Cl H CH2OMe 2-F socf2cf2h 1-108 F F H CH2〇Me 2-C1 socf2cf2h 1-109 Cl F H CH2OMe 2-C1 socf2cf2h 1-110 Cl Cl H CH2OMe 2-C1 socf2cf2h 1-111 F F H CH2〇Me 2 - Me socf2cf2h 1-112 Cl F H CH2OMe 2-Me socf2cf2h 1-113 Cl Cl H CH2〇Me 2-Me socf2cf2h 1-114 F F H CH2〇Me 2?3-Me2 socf2cf2h 1-115 Cl F H CH2OMe 2,3-Me2 socf2cf2h 1-116 Cl Cl H CH2OMe 2,3-Me2 socf2cf2h 1-117 ： F ： CH2OMe CH2OMe H socf2cf2h 1-118 Cl ： CH2OMe CH2OMe H socf2cf2h 1-119、 Cl 、 Cl CH2OMe 丨 CH2OMe ： H socf2cf2h 1-120 丨 Cl ： F « CH2〇Me « CH2OMe ： 2-F socf2cf2h 96 318750 200804250 表5No. X1 Y1 R1 R2-l R7-1 R7-2 1-91 Cl F CH2〇Me CH2OMe H scf2cf2h 1-92 Cl Cl CH2OMe CH2OMe H scf2cf2h 1-93 Cl Cl CH2OMe CH2OMe 2-F scf2cf2h 1-94 FF CH2 〇Me CH2OMe 2-C1 scf2cf2h 1-95 Cl F CH2〇Me CH2OMe 2-C1 scf2cf2h 1-96 Cl Cl CH2OMe CH2OMe 2-C1 scf2cf2h 1-97 FF CH2OMe CH2〇Me 2-Me scf2cf2h 1-98 Cl F CH2OMe CH2OMe 2-Me scf2cf2h 1-99 Cl Cl CH2OMe CH2〇Me 2-Me scf2cf2h 1-100 FF CH2〇Me CH2OMe 2,3-Me2 scf2cf2h 1-101 Cl F CH2OMe CH2〇Me 293-Me2 scf2cf2h 1-102 Cl Cl CH2OMe CH2〇Me 2,3-Me2 scf2cf2h 1-103 FFH CH2OMe H socf2cf2h 1-104 Cl FH CH2OMe H socf2cf2h M05 Cl Cl H CH2OMe H socf2cf2h 1-106 Cl FH CH2OMe 2-F socf2cf2h 1-107 Cl Cl H CH2OMe 2- F socf2cf2h 1-108 FFH CH2〇Me 2-C1 socf2cf2h 1-109 Cl FH CH2OMe 2-C1 socf2cf2h 1-110 Cl Cl H CH2OMe 2-C1 socf2cf2h 1-111 FFH CH2〇Me 2 - Me socf2cf2h 1-112 Cl FH CH2OMe 2-Me socf2cf2h 1-113 Cl Cl H CH2〇Me 2-Me socf2cf2h 1-114 FFH CH2〇Me 2?3-Me2 socf2cf2h 1-115 Cl FH CH2OMe 2,3-Me2 socf2cf2h 1-116 Cl Cl H CH2OMe 2,3-Me2 socf2cf2h 1-117 : F : CH2OMe CH2OMe H socf2cf2h 1-118 Cl : CH2OMe CH2OMe H socf2cf2h 1-119, Cl, Cl CH2OMe 丨CH2OMe : H socf2cf2h 1-120 丨Cl : F « CH2 〇Me « CH2OMe : 2-F socf2cf2h 96 318750 200804250 Table 5

No. X1 Y1 R1 R2·1 R7·1 R7·2 1-121 Cl Cl CH2OMe CH2OMe 2-F SOCF2CF2H M22 F F CH2OMe CH2OMe 2-C1 socf2cf2h 1-123 Cl F CH2OMe CH2〇Me 2-C1 socf2cf2h 1-124 Cl Cl CH2OMe CH2〇Me 2-C1 socf2cf2h 1-125 F F CH2OMe CH2〇Me 2-Me socf2cf2h 1-126 Cl F CH2OMe CH2OMe 2-Me socf2cf2h 1-127 Cl Cl CH2〇Me CH2〇Me 2-Me socf2cf2h 1-128 F F CH2OMe CH2OMe 2,3-Me2 socf2cf2h 1-129 Cl F CH2OMe CH2OMe 2,3-Me2 s〇cf2cf2h M30 Cl Cl CH2OMe CH2OMe 2,3-Me2 socf2cf2h 1-131 F F H CH2〇Me H so2cf2cf2h 1-132 Cl F H CH2OMe H so2cf2cf2h 1-133 Cl Cl H CH2OMe H so2cf2cf2h 1-134 Cl F H CH2OMe 2-F so2cf2cf2h 1-135 Cl Cl H CH2OMe 2-F so2cf2cf2h 1-136 F F H CH2〇Me 2-C1 so2cf2cf2h 1-137 Cl F H CH2OMe 2-C1 so2cf2cf2h I -138 Cl Cl H CH2OMe 2-C1 so2cf2cf2h M39 F F H CH2〇Me 2-Me so2cf2cf2h 1-140 Cl F H CH2〇Me 2-Me so2cf2cf2h 1-141 Cl Cl H CH2OMe 2-Me s〇2cf2cf2h 1-142 F F H CH2OMe 2,3-Me2 so2cf2cf2h 1-143 Cl F H CH2OMe 2,3-Me2 so2cf2cf2h 1-144 Cl Cl H CH2OMe 2,3-Me2 so2cf2cf2h M45 F F CH2OMe CH2〇Me H so2cf2cf2h 1-146 Cl F CH2OMe CH2〇Me H so2cf2cf2h 1-147 Cl Cl CH2OMe CH2〇Me H s〇2cf2cf2h 1-148 Cl ： F丨 CH2OMe CH2OMe 2-F so2cf2cf2h 1-149 Cl ' Cl丨 CH2OMe 丨 CH2OMe 2-F so2cf2cf2h 1-150 ； F ； F丨 CH2OMe « CH2〇Me ： 2-C1 so2cf2cf2h 97 318750 200804250 表6No. X1 Y1 R1 R2·1 R7·1 R7·2 1-121 Cl Cl CH2OMe CH2OMe 2-F SOCF2CF2H M22 FF CH2OMe CH2OMe 2-C1 socf2cf2h 1-123 Cl F CH2OMe CH2〇Me 2-C1 socf2cf2h 1-124 Cl Cl CH2OMe CH2〇Me 2-C1 socf2cf2h 1-125 FF CH2OMe CH2〇Me 2-Me socf2cf2h 1-126 Cl F CH2OMe CH2OMe 2-Me socf2cf2h 1-127 Cl Cl CH2〇Me CH2〇Me 2-Me socf2cf2h 1-128 FF CH2OMe CH2OMe 2,3-Me2 socf2cf2h 1-129 Cl F CH2OMe CH2OMe 2,3-Me2 s〇cf2cf2h M30 Cl Cl CH2OMe CH2OMe 2,3-Me2 socf2cf2h 1-131 FFH CH2〇Me H so2cf2cf2h 1-132 Cl FH CH2OMe H so2cf2cf2h 1-133 Cl Cl H CH2OMe H so2cf2cf2h 1-134 Cl FH CH2OMe 2-F so2cf2cf2h 1-135 Cl Cl H CH2OMe 2-F so2cf2cf2h 1-136 FFH CH2〇Me 2-C1 so2cf2cf2h 1-137 Cl FH CH2OMe 2 -C1 so2cf2cf2h I -138 Cl Cl H CH2OMe 2-C1 so2cf2cf2h M39 FFH CH2〇Me 2-Me so2cf2cf2h 1-140 Cl FH CH2〇Me 2-Me so2cf2cf2h 1-141 Cl Cl H CH2OMe 2-Me s〇2cf2cf2h 1- 142 FFH CH2OMe 2,3-Me2 so2cf2cf2h 1-143 Cl FH CH2OMe 2,3-Me2 so2cf2cf2h 1-144 Cl Cl H CH2OMe 2,3-Me2 so2cf2cf2h M45 FF CH2OMe CH2〇Me H so2cf2cf2h 1-146 Cl F CH2OMe CH2〇Me H so2cf2cf2h 1-147 Cl Cl CH2OMe CH2〇Me H s〇2cf2cf2h 1-148 Cl : F丨CH2OMe CH2OMe 2-F so2cf2cf2h 1-149 Cl ' Cl丨CH2OMe丨CH2OMe 2-F so2cf2cf2h 1-150 ; F ; F丨CH2OMe « CH2〇Me : 2-C1 so2cf2cf2h 97 318750 200804250 Table 6

No. X1 Y1 R1 R2-l R7·1 R7-2 1-151 Cl F CH2OMe CH2OMe 2-C1 so2cf2cf2h 1-152 Cl Cl CH2OMe CH2OMe 2-C1 so2cf2cf2h 1-153 F F CH2〇Me CH2OMe 2-Me so2cf2cf2h 1-154 Cl F CH2OMe CH2OMe 2-Me so2cf2cf2h 1-155 Cl Cl CH2OMe CH2OMe 2-Me so2cf2cf2h 1-156 F F CH2OMe CH2OMe 2,3-Me2 so2cf2cf2h 1-157 Cl F CH2OMe CH2OMe 2,3-Me2 so2cf2cf2h M58 Cl Cl CH2OMe CH2OMe 2,3-Me2 so2cf2cf2h 1-159 F F H CH2OMe H scf2cf3 1-160 Cl F H CH2OMe H scf2cf3 1-161 Cl Cl H CH2OMe H scf2cf3 1-162 Cl F H CH2OMe 2-F scf2cf3 1-163 Cl Cl H CH2OMe 2-F scf2cf3 1-164 F F H CH2OMe 2-C1 scf2cf3 1-165 Cl F H CH2OMe 2-C1 scf2cf3 1-166 Cl Cl H CH2OMe 2-C1 scf2cf3 1-167 F F H CH2OMe 2-Me scf2cf3 1-168 Cl F H CH2OMe 2-Me scf2cf3 1-169 Cl Cl H CH2〇Me 2-Me SCF2CF3 1-170 F F H CH2OMe 2,3-Me2 scf2cf3 1-171 Cl F H CH2〇Me 2,3-Me2 scf2cf3 1-172 Cl Cl H CH2OMe 2,3-Me2 scf2cf3 1-173 F F CH2OMe CH2OMe H scf2cf3 I -174 Cl F CH2OMe CH2OMe H scf2cf3 1-175 Cl Cl CH2OMe CH2〇Me H scf2cf3 1-176 Cl F CH2〇Me CH2〇Me 2-F SCF2CF3 1-177 Cl Cl CH2OMe CH2OMe 2-F scf2cf3 1-178 Cl ： F CH2OMe CH2OMe 2-C1 scf2cf3 1-179 丨 Cl Cl | CH2OMe CH2OMe ： 2-C1 scf2cf3 1-180 ： F ： F 、 CH2OMe 丨 CH2OMe ： 2-Me scf2cf3 98 318750 200804250 表7No. X1 Y1 R1 R2-l R7·1 R7-2 1-151 Cl F CH2OMe CH2OMe 2-C1 so2cf2cf2h 1-152 Cl Cl CH2OMe CH2OMe 2-C1 so2cf2cf2h 1-153 FF CH2〇Me CH2OMe 2-Me so2cf2cf2h 1- 154 Cl F CH2OMe CH2OMe 2-Me so2cf2cf2h 1-155 Cl Cl CH2OMe CH2OMe 2-Me so2cf2cf2h 1-156 FF CH2OMe CH2OMe 2,3-Me2 so2cf2cf2h 1-157 Cl F CH2OMe CH2OMe 2,3-Me2 so2cf2cf2h M58 Cl Cl CH2OMe CH2OMe 2,3-Me2 so2cf2cf2h 1-159 FFH CH2OMe H scf2cf3 1-160 Cl FH CH2OMe H scf2cf3 1-161 Cl Cl H CH2OMe H scf2cf3 1-162 Cl FH CH2OMe 2-F scf2cf3 1-163 Cl Cl H CH2OMe 2-F Scf2cf3 1-164 FFH CH2OMe 2-C1 scf2cf3 1-165 Cl FH CH2OMe 2-C1 scf2cf3 1-166 Cl Cl H CH2OMe 2-C1 scf2cf3 1-167 FFH CH2OMe 2-Me scf2cf3 1-168 Cl FH CH2OMe 2-Me scf2cf3 1-169 Cl Cl H CH2〇Me 2-Me SCF2CF3 1-170 FFH CH2OMe 2,3-Me2 scf2cf3 1-171 Cl FH CH2〇Me 2,3-Me2 scf2cf3 1-172 Cl Cl H CH2OMe 2,3-Me2 Scf2cf3 1-173 FF CH2OMe CH2OMe H scf2cf3 I -174 Cl F CH2OMe CH2OMe H scf2cf3 1-175 Cl Cl CH2OMe CH2〇Me H scf2cf3 1-176 Cl F CH2〇Me CH2〇Me 2-FS CF2CF3 1-177 Cl Cl CH2OMe CH2OMe 2-F scf2cf3 1-178 Cl : F CH2OMe CH2OMe 2-C1 scf2cf3 1-179 丨Cl Cl | CH2OMe CH2OMe : 2-C1 scf2cf3 1-180 : F : F , CH2OMe 丨CH2OMe : 2-Me scf2cf3 98 318750 200804250 Table 7

No· X1 Y1 R1 R2-l R7·1 R7-2 1-181 Cl F CH2OMe CH2OMe 2-Me SCF2CF3 1-182 Cl Cl CH2OMe CH2〇Me 2-Me SCF2CF3 1-183 F F CH2OMe CH2〇Me 2,3-Me2 scf2cf3 I_184 Cl F CH2OMe CH2〇Me 2,3-Me2 scf2cf3 1-185 Cl Cl CH2OMe CH2〇Me 2,3-Me2 scf2cf3 1-186 F F H CH2〇Me H socf2cf3 1-187 Cl F H CH2OMe H socf2cf3 1-188 Cl Cl H CH2〇Me H s〇cf2cf3 1-189 F F H CH2〇Me 2-F socf2cf3 1-190 Cl F H CH2OMe 2-F socf2cf3 1-191 Cl Cl H CH2OMe 2-F socf2cf3 1-192 F F H CH2OMe 2-C1 socf2cf3 1-193 Cl F H CH2OMe 2-C1 socf2cf3 1-194 Cl Cl H CH2OMe 2-C1 socf2cf3 1-195 F F H CH2〇Me 2 - Me socf2cf3 1-196 Cl F H CH2OMe 2-Me socf2cf3 1-197 Cl Cl H CH2OMe 2-Me socf2cf3 I_198 F F H CH2OMe 2,3-Me2 socf2cf3 1-199 Cl F H CH2OMe 2,3-Me2 socf2cf3 1-200 Cl Cl H CH2OMe 2,3-Me2 socf2cf3 1-201 F F CH2OMe CH2OMe H socf2cf3 1-202 Cl F CH2OMe CH2OMe H socf2cf3 1-203 Cl Cl CH2OMe CH2OMe H SOCF2CF3 1-204 F F CH2OMe CH2OMe 2-F SOCF2CF3 1-205 Cl F CH2OMe CH2OMe 2-F SOCF2CF3 1-206 Cl Cl CH2〇Me CH2OMe 2-F SOCF2CF3 1-207 F F CH2OMe CH2OMe 2-C1 s〇cf2cf3 1-208 Cl ： F CH2〇Me CH2OMe 2-C1 socf2cf3 1-209 Cl Cl CH2〇Me CH2OMe 2-C1 socf2cf3 1-210 ： F ： F丨 CH2〇Me CH2〇Me 2-Me socf2cf3 99 318750 200804250 表8No· X1 Y1 R1 R2-l R7·1 R7-2 1-181 Cl F CH2OMe CH2OMe 2-Me SCF2CF3 1-182 Cl Cl CH2OMe CH2〇Me 2-Me SCF2CF3 1-183 FF CH2OMe CH2〇Me 2,3- Me2 scf2cf3 I_184 Cl F CH2OMe CH2〇Me 2,3-Me2 scf2cf3 1-185 Cl Cl CH2OMe CH2〇Me 2,3-Me2 scf2cf3 1-186 FFH CH2〇Me H socf2cf3 1-187 Cl FH CH2OMe H socf2cf3 1-188 Cl Cl H CH2〇Me H s〇cf2cf3 1-189 FFH CH2〇Me 2-F socf2cf3 1-190 Cl FH CH2OMe 2-F socf2cf3 1-191 Cl Cl H CH2OMe 2-F socf2cf3 1-192 FFH CH2OMe 2-C1 Socf2cf3 1-193 Cl FH CH2OMe 2-C1 socf2cf3 1-194 Cl Cl H CH2OMe 2-C1 socf2cf3 1-195 FFH CH2〇Me 2 - Me socf2cf3 1-196 Cl FH CH2OMe 2-Me socf2cf3 1-197 Cl Cl H CH2OMe 2-Me socf2cf3 I_198 FFH CH2OMe 2,3-Me2 socf2cf3 1-199 Cl FH CH2OMe 2,3-Me2 socf2cf3 1-200 Cl Cl H CH2OMe 2,3-Me2 socf2cf3 1-201 FF CH2OMe CH2OMe H socf2cf3 1-202 Cl F CH2OMe CH2OMe H socf2cf3 1-203 Cl Cl CH2OMe CH2OMe H SOCF2CF3 1-204 FF CH2OMe CH2OMe 2-F SOCF2CF3 1-205 Cl F CH2OMe CH2OMe 2-F SOCF2CF3 1-206 Cl Cl CH2〇Me CH2OMe 2-F SO CF2CF3 1-207 FF CH2OMe CH2OMe 2-C1 s〇cf2cf3 1-208 Cl : F CH2〇Me CH2OMe 2-C1 socf2cf3 1-209 Cl Cl CH2〇Me CH2OMe 2-C1 socf2cf3 1-210 : F : F丨CH2〇 Me CH2〇Me 2-Me socf2cf3 99 318750 200804250 Table 8

No. X1 Y1 R1 R2·1 R7-1 R7·2 1-211 C1 F CH2OMe CH2OMe 2-Me SOCF2CF3 1-212 C1 C1 CH2OMe CH2OMe 2-Me socf2cf3 1-213 F F CH2〇Me CH2〇Me 2,3-Me2 socf2cf3 1-214 C1 F CH2〇Me CH2OMe 2,3-Me2 socf2cf3 1-215 C1 C1 CH2OMe CH2OMe 2,3-Me2 socf2cf3 1-216 F F H CH2OMe H s〇2cf2cf3 1-217 C1 F H CH2OMe H so2cf2cf3 1-218 C1 C1 H CH2OMe H so2cf2cf3 1-219 F F H CH2OMe 2-F so2cf2cf3 1-220 C1 F H CH2〇Me 2-F so2cf2cf3 1-221 C1 C1 H CH2OMe 2-F so2cf2cf3 1-222 F F H CH2OMe 2-C1 so2cf2cf3 1-223 C1 F H CH2OMe 2-C1 so2cf2cf3 1-224 C1 C1 H CH2OMe 2-C1 so2cf2cf3 1-225 F F H CH2〇Me 2-Me so2cf2cf3 1-226 C1 F H CH2OMe 2-Me so2cf2cf3 1-227 C1 C1 H CH2OMe 2-Me so2cf2cf3 1-228 F F H CH2OMe 293-Me2 so2cf2cf3 1-229 C1 F H CH2OMe 2,3-Me2 so2cf2cf3 1-230 C1 C1 H CH2OMe 2,3-Me2 so2cf2cf3 1-231 F F CH2OMe CH2〇Me H so2cf2cf3 1-232 C1 F CH2OMe CH2〇Me H so2cf2cf3 1-233 C1 C1 CH2OMe CH2OMe H so2cf2cf3 1-234 F F CH2OMe CH2OMe 2-F so2cf2cf3 1-235 C1 · F CH2OMe CH2OMe 2-F so2cf2cf3 1-236 i C1 C1丨 CH2OMe CH2OMe 2-F so2cf2cf3 1-237 ： F ： F丨 CH2OMe 丨 CH2〇Me ： 2-C1 so2cf2cf3 1-238 丨 C1 : F丨 CH2OMe ' CH2〇Me ： 2-C1 so2cf2cf3 1-239 丨 C1丨 C1丨 CH2OMe 丨 CH2OMe ： 2-C1 ； so2cf2cf3 1-240 : F : F I CH2OMe 丨 CH2OMe ： 2-Me ; so2cf2cf3 100 318750 200804250 表9No. X1 Y1 R1 R2·1 R7-1 R7·2 1-211 C1 F CH2OMe CH2OMe 2-Me SOCF2CF3 1-212 C1 C1 CH2OMe CH2OMe 2-Me socf2cf3 1-213 FF CH2〇Me CH2〇Me 2,3- Me2 socf2cf3 1-214 C1 F CH2〇Me CH2OMe 2,3-Me2 socf2cf3 1-215 C1 C1 CH2OMe CH2OMe 2,3-Me2 socf2cf3 1-216 FFH CH2OMe H s〇2cf2cf3 1-217 C1 FH CH2OMe H so2cf2cf3 1-218 C1 C1 H CH2OMe H so2cf2cf3 1-219 FFH CH2OMe 2-F so2cf2cf3 1-220 C1 FH CH2〇Me 2-F so2cf2cf3 1-221 C1 C1 H CH2OMe 2-F so2cf2cf3 1-222 FFH CH2OMe 2-C1 so2cf2cf3 1-223 C1 FH CH2OMe 2-C1 so2cf2cf3 1-224 C1 C1 H CH2OMe 2-C1 so2cf2cf3 1-225 FFH CH2〇Me 2-Me so2cf2cf3 1-226 C1 FH CH2OMe 2-Me so2cf2cf3 1-227 C1 C1 H CH2OMe 2-Me so2cf2cf3 1-228 FFH CH2OMe 293-Me2 so2cf2cf3 1-229 C1 FH CH2OMe 2,3-Me2 so2cf2cf3 1-230 C1 C1 H CH2OMe 2,3-Me2 so2cf2cf3 1-231 FF CH2OMe CH2〇Me H so2cf2cf3 1-232 C1 F CH2OMe CH2〇Me H so2cf2cf3 1-233 C1 C1 CH2OMe CH2OMe H so2cf2cf3 1-234 FF CH2OMe CH2OMe 2-F so2cf2cf3 1-235 C1 · F CH2OMe CH2OMe 2-F so2cf2cf3 1-236 i C1 C1丨CH2OMe CH2OMe 2-F so2cf2cf3 1-237 : F : F丨CH2OMe 丨CH2〇Me : 2-C1 so2cf2cf3 1-238 丨C1 : F丨CH2OMe ' CH2〇Me : 2-C1 so2cf2cf3 1-239 丨C1丨C1丨CH2OMe 丨CH2OMe : 2-C1 ; so2cf2cf3 1-240 : F : FI CH2OMe 丨CH2OMe : 2-Me ; so2cf2cf3 100 318750 200804250 Table 9

No. X1 Y1 R1 R2·1 R7-1 R7-2 1-241 Cl F CH2OMe CH2OMe 2-Me s〇2cf2cf3 1-242 Cl Cl CH2OMe CH2〇Me 2-Me so2cf2cf3 1-243 F F CH2〇Me CH2OMe 2,3-Me2 so2cf2cf3 1-244 Cl F CH2OMe CH2OMe 2?3-Me2 so2cf2cf3 1-245 Cl Cl CH2OMe CH2OMe 2,3-Me2 so2cf2cf3 1-246 F F H CH2OMe H scf2cf2cf3 1-247 Cl F H CH2OMe H scf2cf2cf3 1-248 Cl Cl H CH2OMe H scf2cf2cf3 1-249 Cl Cl H CH2OMe 2-F scf2cf2cf3 1-250 F F H CH2OMe 2-C1 scf2cf2cf3 1-251 Cl F H CH2OMe 2-C1 scf2cf2cf3 1-252 Cl Cl H CH2OMe 2-C1 scf2cf2cf3 1-253 F F H CH2OMe 2-Me scf2cf2cf3 1-254 Cl F H CH2OMe 2-Me scf2cf2cf3 1-255 Cl Cl H CH2〇Me 2-Me scf2cf2cf3 1-256 F F H CH2OMe 2,3-Me2 scf2cf2cf3 1-257 Cl F H CH2OMe 2,3-Me2 scf2cf2cf3 1-258 Cl Cl H CH2〇Me 2,3-Me2 scf2cf2cf3 1-259 F F CH2OMe CH2OMe H scf2cf2cf3 1-260 Cl F CH2OMe CH2OMe H scf2cf2cf3 1-261 Cl Cl CH2OMe CH2〇Me H scf2cf2cf3 1-262 Cl Cl CH2OMe CH2OMe 2-F scf2cf2cf3 1-263 F F CH2OMe CH2〇Me 2-C1 scf2cf2cf3 1-264 Cl F CH2OMe CH2OMe 2-C1 scf2cf2cf3 1-265 Cl Cl CH2OMe CH2〇Me 2-C1 scf2cf2cf3 1-266 F F CH2OMe CH2〇Me 2-Me scf2cf2cf3 1-267 Cl F CH2OMe CH2〇Me 2-Me scf2cf2cf3 1-268 Cl Cl CH2OMe CH2OMe 2-Me scf2cf2cf3 1-269 ： F F丨 CH2OMe CH2OMe 2,3-Me2 scf2cf2cf3 1-270、 Cl ： F &lt; CH2OMe 丨 CH2OMe ： 2,3-Me2 scf2cf2cf3 101 318750 200804250 表ίοNo. X1 Y1 R1 R2·1 R7-1 R7-2 1-241 Cl F CH2OMe CH2OMe 2-Me s〇2cf2cf3 1-242 Cl Cl CH2OMe CH2〇Me 2-Me so2cf2cf3 1-243 FF CH2〇Me CH2OMe 2, 3-Me2 so2cf2cf3 1-244 Cl F CH2OMe CH2OMe 2?3-Me2 so2cf2cf3 1-245 Cl Cl CH2OMe CH2OMe 2,3-Me2 so2cf2cf3 1-246 FFH CH2OMe H scf2cf2cf3 1-247 Cl FH CH2OMe H scf2cf2cf3 1-248 Cl Cl H CH2OMe H scf2cf2cf3 1-249 Cl Cl H CH2OMe 2-F scf2cf2cf3 1-250 FFH CH2OMe 2-C1 scf2cf2cf3 1-251 Cl FH CH2OMe 2-C1 scf2cf2cf3 1-252 Cl Cl H CH2OMe 2-C1 scf2cf2cf3 1-253 FFH CH2OMe 2-Me scf2cf2cf3 1-254 Cl FH CH2OMe 2-Me scf2cf2cf3 1-255 Cl Cl H CH2〇Me 2-Me scf2cf2cf3 1-256 FFH CH2OMe 2,3-Me2 scf2cf2cf3 1-257 Cl FH CH2OMe 2,3-Me2 scf2cf2cf3 1-258 Cl Cl H CH2〇Me 2,3-Me2 scf2cf2cf3 1-259 FF CH2OMe CH2OMe H scf2cf2cf3 1-260 Cl F CH2OMe CH2OMe H scf2cf2cf3 1-261 Cl Cl CH2OMe CH2〇Me H scf2cf2cf3 1-262 Cl Cl CH2OMe CH2OMe 2-F scf2cf2cf3 1-263 FF CH2OMe CH2〇Me 2-C1 scf2cf2cf3 1-264 Cl F CH2OMe CH2OMe 2-C1 scf2cf2cf3 1-265 Cl Cl CH2OMe CH2〇Me 2-C1 scf2cf2cf3 1-266 FF CH2OMe CH2〇Me 2-Me scf2cf2cf3 1-267 Cl F CH2OMe CH2〇Me 2-Me scf2cf2cf3 1-268 Cl Cl CH2OMe CH2OMe 2-Me scf2cf2cf3 1-269 : FF丨CH2OMe CH2OMe 2,3-Me2 scf2cf2cf3 1-270, Cl : F &lt; CH2OMe 丨CH2OMe : 2,3-Me2 scf2cf2cf3 101 318750 200804250 Table ίο

No. X1 Y1 R1 R2-l R7-1 R7·2 1-271 Cl Cl CH2OMe CH2〇Me 2,3-Me2 scf2cf2cf3 1-272 F F H CH2OMe H socf2cf2cf3 1-273 Cl F H CH2OMe H socf2cf2cf3 1-274 Cl Cl H CH2〇Me H socf2cf2cf3 1-275 F F H CH2〇Me 2-F socf2cf2cf3 1-276 Cl F H CH2OMe 2-F socf2cf2cf3 1-277 Cl Cl H CH2OMe 2-F socf2cf2cf3 1-278 F F H CH2OMe 2-C1 socf2cf2cf3 1-279 Cl F H CH2OMe 2-C1 socf2cf2cf3 1-280 Cl Cl H CH2OMe 2-C1 socf2cf2cf3 1-281 F F H CH2〇Me 2-Me socf2cf2cf3 1-282 Cl F H CH2OMe 2-Me s〇cf2cf2cf3 1-283 Cl Cl H CH2OMe 2-Me s〇cf2cf2cf3 1-284 F F H CH2〇Me 2,3-Me2 socf2cf2cf3 1-285 Cl F H CH2OMe 2,3-Me2 socf2cf2cf3 1-286 Cl Cl H CH2OMe 2,3-Me2 socf2cf2cf3 1-287 F F CH2OMe CH2OMe H socf2cf2cf3 1-288 Cl F CH2OMe CH2OMe H socf2cf2cf3 1-289 Cl Cl CH2OMe CH2〇Me H socf2cf2cf3 1-290 F F CH2〇Me CH2OMe 2-F socf2cf2cf3 1-291 Cl F CH2OMe CH2〇Me 2-F socf2cf2cf3 1-292 Cl Cl CH2〇Me CH2OMe 2-F socf2cf2cf3 1-293 F F CH2OMe CH2OMe 2-C1 socf2cf2cf3 1-294 Cl F CH2OMe CH2OMe 2-C1 socf2cf2cf3 1-295 Cl Cl CH2OMe CH2OMe 2-C1 socf2cf2cf3 1-296 F F CH2〇Me CH2OMe 2-Me socf2cf2cf3 1-297 Cl F CH2〇Me CH2OMe 2-Me socf2cf2cf3 1-298、 Cl Cl丨 CH2OMe CH2OMe 2-Me socf2cf2cf3 1-299 ： F ； F丨 CH2〇Me CH2〇Me 2,3-Me2 socf2cf2cf3 1-300 « Cl ； F丨 CH2〇Me 丨 CH2OMe 2,3-Me2 socf2cf2cf3 102 318750 200804250 表11No. X1 Y1 R1 R2-l R7-1 R7·2 1-271 Cl Cl CH2OMe CH2〇Me 2,3-Me2 scf2cf2cf3 1-272 FFH CH2OMe H socf2cf2cf3 1-273 Cl FH CH2OMe H socf2cf2cf3 1-274 Cl Cl H CH2〇Me H socf2cf2cf3 1-275 FFH CH2〇Me 2-F socf2cf2cf3 1-276 Cl FH CH2OMe 2-F socf2cf2cf3 1-277 Cl Cl H CH2OMe 2-F socf2cf2cf3 1-278 FFH CH2OMe 2-C1 socf2cf2cf3 1-279 Cl FH CH2OMe 2-C1 socf2cf2cf3 1-280 Cl Cl H CH2OMe 2-C1 socf2cf2cf3 1-281 FFH CH2〇Me 2-Me socf2cf2cf3 1-282 Cl FH CH2OMe 2-Me s〇cf2cf2cf3 1-283 Cl Cl H CH2OMe 2-Me S〇cf2cf2cf3 1-284 FFH CH2〇Me 2,3-Me2 socf2cf2cf3 1-285 Cl FH CH2OMe 2,3-Me2 socf2cf2cf3 1-286 Cl Cl H CH2OMe 2,3-Me2 socf2cf2cf3 1-287 FF CH2OMe CH2OMe H socf2cf2cf3 1 -288 Cl F CH2OMe CH2OMe H socf2cf2cf3 1-289 Cl Cl CH2OMe CH2〇Me H socf2cf2cf3 1-290 FF CH2〇Me CH2OMe 2-F socf2cf2cf3 1-291 Cl F CH2OMe CH2〇Me 2-F socf2cf2cf3 1-292 Cl Cl CH2 〇Me CH2OMe 2-F socf2cf2cf3 1-293 FF CH2OMe CH2OMe 2-C1 socf2cf2cf3 1-294 Cl F CH2OMe CH2OMe 2-C1 socf2cf2cf3 1-29 5 Cl Cl CH2OMe CH2OMe 2-C1 socf2cf2cf3 1-296 FF CH2〇Me CH2OMe 2-Me socf2cf2cf3 1-297 Cl F CH2〇Me CH2OMe 2-Me socf2cf2cf3 1-298, Cl Cl丨CH2OMe CH2OMe 2-Me socf2cf2cf3 1-299 : F ; F丨CH2〇Me CH2〇Me 2,3-Me2 socf2cf2cf3 1-300 « Cl ; F丨CH2〇Me 丨CH2OMe 2,3-Me2 socf2cf2cf3 102 318750 200804250 Table 11

No. X1 Y1 R1 R2-l R7·1 R7-2 1-301 Cl Cl CH2OMe CH2OMe 2,3-Me2 s〇cf2cf2cf3 1-302 F F H CH2〇Me H so2cf2cf2cf3 1-303 Cl F H CH2OMe H so2cf2cf2cf3 1-304 Cl Cl H CH2OMe H so2cf2cf2cf3 1-305 F F H CH2OMe 2-F s〇2cf2cf2cf3 1-306 Cl F H CH2OMe 2-F so2cf2cf2cf3 1-307 Cl Cl H CH2OMe 2-F so2cf2cf2cf3 1-308 F F H CH2OMe 2-C1 so2cf2cf2cf3 1-309 Cl F H CH2〇Me 2-C1 so2cf2cf2cf3 1-310 Cl Cl H CH2OMe 2-C1 so2cf2cf2cf3 1-311 F F H CH2OMe 2-Me so2cf2cf2cf3 1-312 Cl F H CH2〇Me 2-Me so2cf2cf2cf3 1-313 Cl Cl H CH2OMe 2 - Me so2cf2cf2cf3 1-314 F F H CH2OMe 2,3-Me2 so2cf2cf2cf3 1-315 Cl F H CH2OMe 2,3-Me2 s〇2cf2cf2cf3 1-316 Cl Cl H CH2OMe 2,3-Me2 so2cf2cf2cf3 1-317 F F CH2OMe CH2OMe H so2cf2cf2cf3 1-318 Cl F CH2OMe CH2OMe H so2cf2cf2cf3 1-319 Cl Cl CH2OMe CH2OMe H so2cf2cf2cf3 1-320 F F CH2OMe CH2OMe 2-F so2cf2cf2cf3 1-321 Cl F CH2OMe CH2OMe 2-F so2cf2cf2cf3 1-322 Cl Cl CH2OMe CH2OMe 2-F so2cf2cf2cf3 1-323 F F CH2OMe CH2OMe 2-C1 so2cf2cf2cf3 1-324 Cl F CH2OMe CH2OMe 2-C1 so2cf2cf2cf3 1-325 Cl Cl CH2〇Me CH2OMe 2-C1 so2cf2cf2cf3 1-326 ： F ： F CH2〇Me CH2OMe 2-Me so2cf2cf2cf3 1-327 ' Cl ： F丨 CH2〇Me 丨 CH2OMe ： 2-Me so2cf2cf2cf3 1-328 &lt; Cl丨 Cl ' CH2OMe 丨 CH2OMe ： 2-Me i so2cf2cf2cf3 1-329 ； F : F丨 CH2OMe 丨 CH2OMe ： 2,3-Me2 ; so2cf2cf2cf3 1-330 i Cl ] F i CH2OMe CH2OMe ： 2，3 ·Μ^2 i so2cf2cf2cf3 103 318750 200804250 表12No. X1 Y1 R1 R2-l R7·1 R7-2 1-301 Cl Cl CH2OMe CH2OMe 2,3-Me2 s〇cf2cf2cf3 1-302 FFH CH2〇Me H so2cf2cf2cf3 1-303 Cl FH CH2OMe H so2cf2cf2cf3 1-304 Cl Cl H CH2OMe H so2cf2cf2cf3 1-305 FFH CH2OMe 2-F s〇2cf2cf2cf3 1-306 Cl FH CH2OMe 2-F so2cf2cf2cf3 1-307 Cl Cl H CH2OMe 2-F so2cf2cf2cf3 1-308 FFH CH2OMe 2-C1 so2cf2cf2cf3 1-309 Cl FH CH2〇Me 2-C1 so2cf2cf2cf3 1-310 Cl Cl H CH2OMe 2-C1 so2cf2cf2cf3 1-311 FFH CH2OMe 2-Me so2cf2cf2cf3 1-312 Cl FH CH2〇Me 2-Me so2cf2cf2cf3 1-313 Cl Cl H CH2OMe 2 - Me So2cf2cf2cf3 1-314 FFH CH2OMe 2,3-Me2 so2cf2cf2cf3 1-315 Cl FH CH2OMe 2,3-Me2 s〇2cf2cf2cf3 1-316 Cl Cl H CH2OMe 2,3-Me2 so2cf2cf2cf3 1-317 FF CH2OMe CH2OMe H so2cf2cf2cf3 1-318 Cl F CH2OMe CH2OMe H so2cf2cf2cf3 1-319 Cl Cl CH2OMe CH2OMe H so2cf2cf2cf3 1-320 FF CH2OMe CH2OMe 2-F so2cf2cf2cf3 1-321 Cl F CH2OMe CH2OMe 2-F so2cf2cf2cf3 1-322 Cl Cl CH2OMe CH2OMe 2-F so2cf2cf2cf3 1-323 FF CH2OMe CH2OMe 2-C1 so2cf2cf2cf3 1-324 Cl F CH2OMe CH2OMe 2-C1 so 2cf2cf2cf3 1-325 Cl Cl CH2〇Me CH2OMe 2-C1 so2cf2cf2cf3 1-326 : F : F CH2〇Me CH2OMe 2-Me so2cf2cf2cf3 1-327 ' Cl : F丨CH2〇Me 丨CH2OMe : 2-Me so2cf2cf2cf3 1-328 &lt; Cl丨Cl ' CH2OMe 丨CH2OMe : 2-Me i so2cf2cf2cf3 1-329 ; F : F丨CH2OMe 丨CH2OMe : 2,3-Me2 ; so2cf2cf2cf3 1-330 i Cl ] F i CH2OMe CH2OMe : 2,3 ·Μ ^2 i so2cf2cf2cf3 103 318750 200804250 Table 12

No. X1 Y1 R1 R2·1 R7-l R7-2 1-331 Cl Cl CH2OMe CH2〇Me 2?3-Me2 so2cf2cf2cf3 1-332 F F H CH2OMe H 〇cf3 1-333 Cl F H CH2OMe H ocf3 1-334 Cl Cl H CH2OMe H ocf3 1-335 F F H CH2OMe 2-F ocf3 1-336 Cl F H CH2OMe 2-F ocf3 1-337 Cl Cl H CH2OMe 2-F ocf3 1-338 F F H CH2OMe 2-C1 〇cf3 1-339 Cl F H CH2OMe 2-C1 ocf3 1-340 Cl Cl H CH2OMe 2-C1 ocf3 1-341 F F H CH2〇Me 2-Me ocf3 1-342 Cl F H CH2OMe 2-Me 〇cf3 1-343 Cl Cl H CH2〇Me 2-Me 〇cf3 1-344 F F H CH2〇Me 253-Me2 ocf3 1-345 Cl F H CH2OMe 2,3-Me2 〇cf3 1-346 Cl Cl H CH2OMe 2,3-Me2 ocf3 1-347 Cl F CH2〇Me CH2〇Me H ocf3 1-348 Cl Cl CH2OMe CH2〇Me H ocf3 1-349 F F CH2OMe CH2OMe 2-F ocf3 1-350 Cl F CH2OMe CH2OMe 2-F 〇cf3 1-3 51 Cl Cl CH2OMe CH2OMe 2-F ocf3 1-352 F F CH2OMe CH2〇Me 2-C1 ocf3 1-353 Cl F CH2OMe CH2〇Me 2-C1 ocf3 1-354 Cl Cl CH2OMe CH2〇Me 2 - Cl ocf3 1-355 F F CH2OMe CH2OMe 2-Me ocf3 1-356 Cl ： F CH2OMe CH2〇Me 2-Me ocf3 1-357 i Cl Cl CH2〇Me CH2OMe ： 2-Me 〇cf3 1-358 ： F F CH2OMe CH2OMe ： 2,3-Me2 | 〇cf3 1-359 丨 Cl ： F丨 CH2OMe | CH2OMe ： 2,3-Me2 丨 ocf3 1-360 丨 Cl丨 Cl丨 CH2OMe 丨 CH2〇Me ： 2,3 - JVle〕丨 〇cf3 104 318750 200804250 表13No. X1 Y1 R1 R2·1 R7-l R7-2 1-331 Cl Cl CH2OMe CH2〇Me 2?3-Me2 so2cf2cf2cf3 1-332 FFH CH2OMe H 〇cf3 1-333 Cl FH CH2OMe H ocf3 1-334 Cl Cl H CH2OMe H ocf3 1-335 FFH CH2OMe 2-F ocf3 1-336 Cl FH CH2OMe 2-F ocf3 1-337 Cl Cl H CH2OMe 2-F ocf3 1-338 FFH CH2OMe 2-C1 〇cf3 1-339 Cl FH CH2OMe 2-C1 ocf3 1-340 Cl Cl H CH2OMe 2-C1 ocf3 1-341 FFH CH2〇Me 2-Me ocf3 1-342 Cl FH CH2OMe 2-Me 〇cf3 1-343 Cl Cl H CH2〇Me 2-Me 〇 Cf3 1-344 FFH CH2〇Me 253-Me2 ocf3 1-345 Cl FH CH2OMe 2,3-Me2 〇cf3 1-346 Cl Cl H CH2OMe 2,3-Me2 ocf3 1-347 Cl F CH2〇Me CH2〇Me H Ocf3 1-348 Cl Cl CH2OMe CH2〇Me H ocf3 1-349 FF CH2OMe CH2OMe 2-F ocf3 1-350 Cl F CH2OMe CH2OMe 2-F 〇cf3 1-3 51 Cl Cl CH2OMe CH2OMe 2-F ocf3 1-352 FF CH2OMe CH2〇Me 2-C1 ocf3 1-353 Cl F CH2OMe CH2〇Me 2-C1 ocf3 1-354 Cl Cl CH2OMe CH2〇Me 2 - Cl ocf3 1-355 FF CH2OMe CH2OMe 2-Me ocf3 1-356 Cl : F CH2OMe CH2〇Me 2-Me ocf3 1-357 i Cl Cl CH2〇Me CH2OMe : 2-Me 〇cf3 1-358 : FF CH2OMe CH2OMe : 2,3-Me2 | 〇cf3 1-359 丨Cl : F丨CH2OMe | CH2OMe : 2,3-Me2 丨ocf3 1-360 丨Cl丨Cl丨CH2OMe 丨CH2〇Me : 2,3 - JVle〕丨〇cf3 104 318750 200804250 Table 13

No. X1 Y1 R1 R2-l R7'1 R7·2 1-361 F F Η CH2〇Me H ocf2cf2h 1-362 C1 F Η CH2OMe H ocf2cf2h 1-363 C1 C1 Η CH2OMe H ocf2cf2h 1-364 C1 F Η CH2〇Me 2-F ocf2cf2h 1-365 C1 C1 Η CH2OMe 2-F ocf2cf2h 1-366 F F Η CH2OMe 2-C1 ocf2cf2h 1-367 C1 F Η CH2OMe 2-C1 ocf2cf2h 1-368 C1 C1 Η CH2OMe 2-C1 ocf2cf2h 1-369 F F Η CH2OMe 2-Me ocf2cf2h 1-370 C1 F Η CH2〇Me 2-Me ocf2cf2h 1-371 C1 C1 Η CH2OMe 2-Me 〇cf2cf2h 1-372 F F Η CH2OMe 2,3-Me2 〇cf2cf2h 1-373 C1 F Η CH2〇Me 2,3-Me2 ocf2cf2h 1-374 C1 C1 Η CH2〇Me 2,3-Me2 ocf2cf2h 1-375 F F CH2OMe CH2OMe H ocf2cf2h 1-376 C1 F CH2OMe CH2OMe H ocf2cf2h 1-377 C1 C1 CH2〇Me CH2OMe H ocf2cf2h 1-378 C1 F CH2OMe CH2〇Me 2-F ocf2cf2h 1-379 C1 C1 CH2OMe CH2OMe 2-F ocf2cf2h 1-380 F F CH2OMe CH2OMe 2 - Cl ocf2cf2h 1-381 C1 F CH2OMe CH2OMe 2-C1 ocf2cf2h 1-382 C1 C1 CH2OMe CH2OMe 2-C1 ocf2cf2h 1-383 F F CH2OMe CH2OMe 2-Me ocf2cf2h 1-384 C1 F CH2OMe CH2OMe 2-Me ocf2cf2h 1-385 C1 C1 CH2〇Me CH2OMe 2-Me ocf2cf2h 1-386 ： F F CH2〇Me CH2〇Me 2,3-Me2 ocf2cf2h 1-387 丨 C1 F CH2OMe CH2OMe 2,3-Me2 ocf2cf2h 1-388 丨 C1 C1 CH2OMe CH2〇Me 2,3-Me2 ocf2cf2h 1-389 ： F ： F H 丨 CH2OMe ： H cf3 1-390 丨 C1 ： F H 、 CH2OMe ： H cf3 105 318750 200804250 表14No. X1 Y1 R1 R2-l R7'1 R7·2 1-361 FF Η CH2〇Me H ocf2cf2h 1-362 C1 F Η CH2OMe H ocf2cf2h 1-363 C1 C1 Η CH2OMe H ocf2cf2h 1-364 C1 F Η CH2〇 Me 2-F ocf2cf2h 1-365 C1 C1 Η CH2OMe 2-F ocf2cf2h 1-366 FF Η CH2OMe 2-C1 ocf2cf2h 1-367 C1 F Η CH2OMe 2-C1 ocf2cf2h 1-368 C1 C1 Η CH2OMe 2-C1 ocf2cf2h 1- 369 FF Η CH2OMe 2-Me ocf2cf2h 1-370 C1 F Η CH2〇Me 2-Me ocf2cf2h 1-371 C1 C1 Η CH2OMe 2-Me 〇cf2cf2h 1-372 FF Η CH2OMe 2,3-Me2 〇cf2cf2h 1-373 C1 F Η CH2〇Me 2,3-Me2 ocf2cf2h 1-374 C1 C1 Η CH2〇Me 2,3-Me2 ocf2cf2h 1-375 FF CH2OMe CH2OMe H ocf2cf2h 1-376 C1 F CH2OMe CH2OMe H ocf2cf2h 1-377 C1 C1 CH2〇 Me CH2OMe H ocf2cf2h 1-378 C1 F CH2OMe CH2〇Me 2-F ocf2cf2h 1-379 C1 C1 CH2OMe CH2OMe 2-F ocf2cf2h 1-380 FF CH2OMe CH2OMe 2 - Cl ocf2cf2h 1-381 C1 F CH2OMe CH2OMe 2-C1 ocf2cf2h 1 -382 C1 C1 CH2OMe CH2OMe 2-C1 ocf2cf2h 1-383 FF CH2OMe CH2OMe 2-Me ocf2cf2h 1-384 C1 F CH2OMe CH2OMe 2-Me ocf2cf2h 1-385 C1 C1 CH2〇Me CH2OMe 2-Me ocf2cf2h 1-386 : FFC H2〇Me CH2〇Me 2,3-Me2 ocf2cf2h 1-387 丨C1 F CH2OMe CH2OMe 2,3-Me2 ocf2cf2h 1-388 丨C1 C1 CH2OMe CH2〇Me 2,3-Me2 ocf2cf2h 1-389 : F : FH 丨CH2OMe : H cf3 1-390 丨C1 : FH , CH2OMe : H cf3 105 318750 200804250 Table 14

No. X1 Y1 R1 R2·1 R7-l R7-2 1-391 Cl Cl H CH2OMe H cf3 1-392 Cl F H CH2OMe 2-F cf3 1-393 Cl Cl H CH2OMe 2-F cf3 1-394 F F H CH2OMe 2-C1 cf3 1-395 Cl F H CH2OMe 2-C1 cf3 1-396 Cl Cl H CH2OMe 2-C1 cf3 1-397 F F H CH2OMe 2-Me cf3 1-398 Cl F H CH2OMe 2-Me cf3 1-399 Cl Cl H CH2OMe 2-Me cf3 1-400 F F H CH2OMe 2,3-Me2 cf3 1-401 Cl F H CH2OMe 2,3-Me2 cf3 1-402 Cl Cl H CH2OMe 2,3-Me2 cf3 1-403 F F CH2OMe CH2OMe H cf3 1-404 Cl F CH2OMe CH2OMe H cf3 1-405 Cl Cl CH2〇Me CH2OMe H cf3 1-406 Cl F CH2OMe CH2OMe 2-F cf3 1-407 Cl Cl CH2〇Me CH2OMe 2-F cf3 1-408 F F CH2〇Me CH2OMe 2-C1 cf3 1-409 Cl F CH2〇Me CH2OMe 2-C1 cf3 1-410 Cl Cl CH2〇Me CH2OMe 2-C1 cf3 1-411 F F CH2OMe CH2OMe 2-Me cf3 1-412 Cl F CH2OMe CH2OMe 2-Me cf3 1-413 Cl Cl CH2〇Me CH2OMe 2-Me cf3 1-414 F F CH2OMe CH2OMe 2?3-Me2 cf3 1-415 Cl F CH2OMe CH2〇Me 2,3-Me2 cf3 1-416 Cl Cl CH2OMe CH2OMe 2,3-Me2 cf3 1-417 Cl ： F H CH2OMe H Cl 1-418 1 Cl ' Cl ： H 丨 CH2OMe H Cl 1-419 丨 Cl ： F H CH2OMe ： 2-F i Cl 1-420 丨 Cl丨 Cl : H 丨 CH2〇Me ： 2-F i Cl 106 318750 200804250 表15No. X1 Y1 R1 R2·1 R7-l R7-2 1-391 Cl Cl H CH2OMe H cf3 1-392 Cl FH CH2OMe 2-F cf3 1-393 Cl Cl H CH2OMe 2-F cf3 1-394 FFH CH2OMe 2 -C1 cf3 1-395 Cl FH CH2OMe 2-C1 cf3 1-396 Cl Cl H CH2OMe 2-C1 cf3 1-397 FFH CH2OMe 2-Me cf3 1-398 Cl FH CH2OMe 2-Me cf3 1-399 Cl Cl H CH2OMe 2-Me cf3 1-400 FFH CH2OMe 2,3-Me2 cf3 1-401 Cl FH CH2OMe 2,3-Me2 cf3 1-402 Cl Cl H CH2OMe 2,3-Me2 cf3 1-403 FF CH2OMe CH2OMe H cf3 1- 404 Cl F CH2OMe CH2OMe H cf3 1-405 Cl Cl CH2〇Me CH2OMe H cf3 1-406 Cl F CH2OMe CH2OMe 2-F cf3 1-407 Cl Cl CH2〇Me CH2OMe 2-F cf3 1-408 FF CH2〇Me CH2OMe 2-C1 cf3 1-409 Cl F CH2〇Me CH2OMe 2-C1 cf3 1-410 Cl Cl CH2〇Me CH2OMe 2-C1 cf3 1-411 FF CH2OMe CH2OMe 2-Me cf3 1-412 Cl F CH2OMe CH2OMe 2-Me Cf3 1-413 Cl Cl CH2〇Me CH2OMe 2-Me cf3 1-414 FF CH2OMe CH2OMe 2?3-Me2 cf3 1-415 Cl F CH2OMe CH2〇Me 2,3-Me2 cf3 1-416 Cl Cl CH2OMe CH2OMe 2, 3-Me2 cf3 1-417 Cl : FH CH2OMe H Cl 1-418 1 Cl ' Cl : H 丨CH2OMe H Cl 1-419 丨Cl : FH CH2OMe : 2-F i Cl 1-420 丨 Cl丨 Cl : H 丨 CH2〇Me : 2-F i Cl 106 318750 200804250 Table 15

No. X1 Y1 Ri R2-l R7-1 R7-2 1-421 F F H CH2OMe 2-C1 Cl 1-422 Cl F H CH2OMe 2-C1 Cl 1-423 Cl Cl H CH2OMe 2-C1 Cl 1-424 F F H CH2OMe 2-Me Cl 1-425 Cl F H CH2OMe 2-Me Cl 1-426 Cl Cl H CH2OMe 2-Me Cl 1-427 F F H CH2OMe 2,3-Me2 Cl 1-428 Cl F H CH2OMe 2,3-Me2 Cl 1-429 Cl Cl H CH2OMe 2,3-Me2 Cl 1-430 Cl F CH2〇Me CH2OMe H Cl 1-431 Cl Cl CH2〇Me CH2OMe H Cl 1-432 Cl F CH2OMe CH2OMe 2-F Cl 1-433 Cl Cl CH2OMe CH2〇Me 2-F Cl 1-434 F F CH2OMe CH2OMe 2-C1 Cl 1-435 Cl F CH2OMe CH2OMe 2-C1 Cl 1-436 Cl Cl CH2OMe CH2〇Me 2-C1 Cl 1-437 F F CH2OMe CH2OMe 2-Me Cl 1-438 Cl F CH2OMe CH2OMe 2_Me Cl 1-439 Cl Cl CH2OMe CH2OMe 2-Me Cl 1-440 F F CH2OMe CH2〇Me 2,3-Me2 Cl 1-441 Cl F CH2OMe CH2OMe 2,3-Me2 Cl 1-442 Cl Cl CH2OMe CH2OMe 2,3-Me2 Cl 1-443 F F H CH2OMe H SCF2CFHOCF3 1-444 Cl F H CH2〇Me H SCF2CFHOCF3 1-445 Cl Cl H CH2OMe H SCF2CFHOCF3 1-446 ： F · F H CH2OMe : 2-F scf2cfhocf3 1-447 Cl ： F H CH2〇Me ： 2-F scf2cfhocf3 1-448 Cl丨 Cl ： H i CH2〇Me ： 2-F scf2cfhocf3 1-449 ： F ： F H &lt; CH2OMe ： 2 - Cl scf2cfhocf3 1-450 丨 Cl : F ； H 丨 CH2OMe ： 2-C1 ； scf2cfhocf3 107 318750 200804250 表16No. X1 Y1 Ri R2-l R7-1 R7-2 1-421 FFH CH2OMe 2-C1 Cl 1-422 Cl FH CH2OMe 2-C1 Cl 1-423 Cl Cl H CH2OMe 2-C1 Cl 1-424 FFH CH2OMe 2 -Me Cl 1-425 Cl FH CH2OMe 2-Me Cl 1-426 Cl Cl H CH2OMe 2-Me Cl 1-427 FFH CH2OMe 2,3-Me2 Cl 1-428 Cl FH CH2OMe 2,3-Me2 Cl 1-429 Cl Cl H CH2OMe 2,3-Me2 Cl 1-430 Cl F CH2〇Me CH2OMe H Cl 1-431 Cl Cl CH2〇Me CH2OMe H Cl 1-432 Cl F CH2OMe CH2OMe 2-F Cl 1-433 Cl Cl CH2OMe CH2 〇Me 2-F Cl 1-434 FF CH2OMe CH2OMe 2-C1 Cl 1-435 Cl F CH2OMe CH2OMe 2-C1 Cl 1-436 Cl Cl CH2OMe CH2〇Me 2-C1 Cl 1-437 FF CH2OMe CH2OMe 2-Me Cl 1-438 Cl F CH2OMe CH2OMe 2_Me Cl 1-439 Cl Cl CH2OMe CH2OMe 2-Me Cl 1-440 FF CH2OMe CH2〇Me 2,3-Me2 Cl 1-441 Cl F CH2OMe CH2OMe 2,3-Me2 Cl 1-442 Cl Cl CH2OMe CH2OMe 2,3-Me2 Cl 1-443 FFH CH2OMe H SCF2CFHOCF3 1-444 Cl FH CH2〇Me H SCF2CFHOCF3 1-445 Cl Cl H CH2OMe H SCF2CFHOCF3 1-446 : F · FH CH2OMe : 2-F scf2cfhocf3 1 -447 Cl : FH CH2〇Me : 2-F scf2cfhocf3 1-448 Cl丨Cl : H i CH2〇Me : 2-F scf2cfh Ocf3 1-449 : F : F H &lt; CH2OMe : 2 - Cl scf2cfhocf3 1-450 丨 Cl : F ; H 丨 CH2OMe : 2-C1 ; scf2cfhocf3 107 318750 200804250 Table 16

No. X1 Y1 R1 R2-l R7-1 r7-2 1-451 Cl Cl H CH2OMe 2-C1 scf2cfhocf3 1-452 F F H CH2OMe 2-Me SCF2CFHOCF3 1-453 Cl F H CH2OMe 2-Me SCF2CFHOCF3 1-454 Cl Cl H CH2〇Me 2-Me SCF2CFHOCF3 1-455 F F H CH2OMe 2,3-Me2 scf2cfhocf3 1-456 Cl F H CH2OMe 2,3-Me2 scf2cfhocf3 1-457 Cl Cl H CH2OMe 2,3-Me2 scf2cfhocf3 1-458 F F CH2OMe CH2OMe H scf2cfhocf3 1-459 Cl F CH2OMe CH2OMe H scf2cfhocf3 1-460 Cl Cl CH2OMe CH2OMe H scf2cfhocf3 1-461 Cl F CH2OMe CH2OMe 2-F scf2cfhocf3 1-462 Cl Cl CH2OMe CH2OMe 2-F SCF2CFHOCF3 1-463 F F CH2OMe CH2OMe 2-C1 SCF2CFHOCF3 1-464 Cl F CH2OMe CH2OMe 2-C1 scf2cfhocf3 1-465 Cl Cl CH2OMe CH2OMe 2-C1 scf2cfhocf3 1-466 F F CH2OMe CH2OMe 2-Me scf2cfhocf3 1-467 Cl F CH2OMe CH2OMe 2-Me scf2cfhocf3 1-468 Cl Cl CH2OMe CH2OMe 2-Me scf2cfhocf3 1-469 F F CH2〇Me CH2OMe 2,3-Me2 scf2cfhocf3 1-470 Cl F CH2OMe CH2〇Me 2,3-Me2 scf2cfhocf3 1-471 Cl Cl CH2〇Me CH2OMe 2,3-Me2 scf2cfhocf3 1-472 F F H CH2〇Me H socf2cfhocf3 1-473 Cl F H CH2OMe H socf2cfhocf3 1-474 Cl Cl H CH2〇Me H socf2cfhocf3 1-475 F F H CH2OMe 2-F socf2cfhocf3 1-476 Cl F H CH2〇Me 2-F SOCF2CFHOCF3 1-477 Cl Cl : H CH2〇Me 2-F SOCF2CFHOCF3 1-478 ： F F H CH2OMe 2-C1 socf2cfhocf3 1-479 Cl · F H CH2〇Me ： 2-C1 socf2cfhocf3 1-480 丨 Cl ' Cl ： H 丨 CH2OMe ： 2-C1 socf2cfhocf3 108 318750 200804250 表17No. X1 Y1 R1 R2-l R7-1 r7-2 1-451 Cl Cl H CH2OMe 2-C1 scf2cfhocf3 1-452 FFH CH2OMe 2-Me SCF2CFHOCF3 1-453 Cl FH CH2OMe 2-Me SCF2CFHOCF3 1-454 Cl Cl H CH2〇Me 2-Me SCF2CFHOCF3 1-455 FFH CH2OMe 2,3-Me2 scf2cfhocf3 1-456 Cl FH CH2OMe 2,3-Me2 scf2cfhocf3 1-457 Cl Cl H CH2OMe 2,3-Me2 scf2cfhocf3 1-458 FF CH2OMe CH2OMe H Scf2cfhocf3 1-459 Cl F CH2OMe CH2OMe H scf2cfhocf3 1-460 Cl Cl CH2OMe CH2OMe H scf2cfhocf3 1-461 Cl F CH2OMe CH2OMe 2-F scf2cfhocf3 1-462 Cl Cl CH2OMe CH2OMe 2-F SCF2CFHOCF3 1-463 FF CH2OMe CH2OMe 2-C1 SCF2CFHOCF3 1-464 Cl F CH2OMe CH2OMe 2-C1 scf2cfhocf3 1-465 Cl Cl CH2OMe CH2OMe 2-C1 scf2cfhocf3 1-466 FF CH2OMe CH2OMe 2-Me scf2cfhocf3 1-467 Cl F CH2OMe CH2OMe 2-Me scf2cfhocf3 1-468 Cl Cl CH2OMe CH2OMe 2-Me scf2cfhocf3 1-469 FF CH2〇Me CH2OMe 2,3-Me2 scf2cfhocf3 1-470 Cl F CH2OMe CH2〇Me 2,3-Me2 scf2cfhocf3 1-471 Cl Cl CH2〇Me CH2OMe 2,3-Me2 scf2cfhocf3 1 -472 FFH CH2〇Me H socf2cfhocf3 1-473 Cl FH CH2OMe H socf2cfhocf3 1-474 Cl Cl H CH2〇Me H socf2cfhocf3 1-475 FFH CH2OMe 2-F socf2cfhocf3 1-476 Cl FH CH2〇Me 2-F SOCF2CFHOCF3 1-477 Cl Cl : H CH2〇Me 2-F SOCF2CFHOCF3 1-478 : FFH CH2OMe 2-C1 socf2cfhocf3 1-479 Cl · FH CH2〇Me : 2-C1 socf2cfhocf3 1-480 丨Cl ' Cl : H 丨CH2OMe : 2-C1 socf2cfhocf3 108 318750 200804250 Table 17

No. X1 Y1 Ri R2-l R7-1 R7-2 1-481 F F H CH2〇Me 2-Me socf2cfhocf3 1-482 Cl F H CH2〇Me 2-Me socf2cfhocf3 1-483 Cl Cl H CH2〇Me 2-Me socf2cfhocf3 1-484 F F H CH2〇Me 2,3-Me2 SOCF2CFHOCF3 1-485 Cl F H CH2OMe 2,3-Me2 SOCF2CFHOCF3 1-486 Cl Cl H CH2OMe 2,3-Me2 socf2cfhocf3 1-487 F F CH2OMe CH2OMe H socf2cfhocf3 1-488 Cl F CH2OMe CH2OMe H socf2cfhocf3 1-489 Cl Cl CH2OMe CH2OMe H socf2cfhocf3 1-490 F F CH2OMe CH2OMe 2-F socf2cfhocf3 1-491 Cl F CH2OMe CH2OMe 2-F SOCF2CFHOCF3 1-492 Cl Cl CH2OMe CH2OMe 2-F SOCF2CFHOCF3 1-493 F F CH2OMe CH2OMe 2-C1 SOCF2CFHOCF3 1-494 Cl F CH2OMe CH2OMe 2-C1 SOCF2CFHOCF3 1-495 Cl Cl CH2OMe CH2OMe 2-C1 SOCF2CFHOCF3 1-496 F F CH2OMe CH2OMe 2-Me SOCF2CFHOCF3 1-497 Cl F CH2OMe CH2OMe 2-Me SOCF2CFHOCF3 1-498 Cl Cl CH2OMe CH2〇Me 2-Me socf2cfhocf3 1-499 F F CH2〇Me CH2OMe 2?3-Me2 socf2cfhocf3 1-500 Cl F CH2〇Me CH2OMe 2,3-Me2 socf2cfhocf3 1-501 Cl Cl CH2OMe CH2OMe 2,3-Me2 socf2cfhocf3 1-502 F F H CH2OMe H so2cf2cfhocf3 1-503 Cl F H CH2OMe H so2cf2cfhocf3 1-504 Cl Cl H CH2OMe H so2cf2cfhocf3 1-505 F F H CH2OMe 2-F so2cf2cfhocf3 1-506 Cl F H CH2OMe 2-F so2cf2cfhocf3 1-507 Cl Cl : H CH2OMe 2-F so2cf2cfhocf3 1-508 F F H CH2OMe 2-C1 so2cf2cfhocf3 1-509 Cl F H CH2OMe 2-C1 so2cf2cfhocf3 1-510 Cl Cl ： H CH2〇Me 2-C1 so2cf2cfhocf3 109 318750 200804250 表18No. X1 Y1 Ri R2-l R7-1 R7-2 1-481 FFH CH2〇Me 2-Me socf2cfhocf3 1-482 Cl FH CH2〇Me 2-Me socf2cfhocf3 1-483 Cl Cl H CH2〇Me 2-Me socf2cfhocf3 1-484 FFH CH2〇Me 2,3-Me2 SOCF2CFHOCF3 1-485 Cl FH CH2OMe 2,3-Me2 SOCF2CFHOCF3 1-486 Cl Cl H CH2OMe 2,3-Me2 socf2cfhocf3 1-487 FF CH2OMe CH2OMe H socf2cfhocf3 1-488 Cl F CH2OMe CH2OMe H socf2cfhocf3 1-489 Cl Cl CH2OMe CH2OMe H socf2cfhocf3 1-490 FF CH2OMe CH2OMe 2-F socf2cfhocf3 1-491 Cl F CH2OMe CH2OMe 2-F SOCF2CFHOCF3 1-492 Cl Cl CH2OMe CH2OMe 2-F SOCF2CFHOCF3 1-493 FF CH2OMe CH2OMe 2-C1 SOCF2CFHOCF3 1-494 Cl F CH2OMe CH2OMe 2-C1 SOCF2CFHOCF3 1-495 Cl Cl CH2OMe CH2OMe 2-C1 SOCF2CFHOCF3 1-496 FF CH2OMe CH2OMe 2-Me SOCF2CFHOCF3 1-497 Cl F CH2OMe CH2OMe 2-Me SOCF2CFHOCF3 1 -498 Cl Cl CH2OMe CH2〇Me 2-Me socf2cfhocf3 1-499 FF CH2〇Me CH2OMe 2?3-Me2 socf2cfhocf3 1-500 Cl F CH2〇Me CH2OMe 2,3-Me2 socf2cfhocf3 1-501 Cl Cl CH2OMe CH2OMe 2, 3-Me2 socf2cfhocf3 1-502 FFH CH2OMe H so2cf2cfhocf3 1-503 Cl FH CH2OMe H So2cf2cfhocf3 1-504 Cl Cl H CH2OMe H so2cf2cfhocf3 1-505 FFH CH2OMe 2-F so2cf2cfhocf3 1-506 Cl FH CH2OMe 2-F so2cf2cfhocf3 1-507 Cl Cl : H CH2OMe 2-F so2cf2cfhocf3 1-508 FFH CH2OMe 2-C1 so2cf2cfhocf3 1-509 Cl FH CH2OMe 2-C1 so2cf2cfhocf3 1-510 Cl Cl : H CH2〇Me 2-C1 so2cf2cfhocf3 109 318750 200804250 Table 18

No. X1 Y1 R1 R2·1 R7-1 R7-2 1-511 F F H CH2OMe 2-Me so2cf2cfhocf3 1-512 Cl F H CH2OMe 2-Me so2cf2cfhocf3 1-513 Cl Cl H CH2OMe 2-Me so2cf2cfhocf3 1-514 F F H CH2OMe 2,3-Me2 so2cf2cfhocf3 1-515 Cl F H CH2OMe 2,3-Me2 so2cf2cfhocf3 1-516 Cl Cl H CH2OMe 2,3-Me2 so2cf2cfhocf3 1-517 F F CH2OMe CH2OMe H so2cf2cfhocf3 1-518 Cl F CH2OMe CH2OMe H so2cf2cfhocf3 1-519 Cl Cl CH2OMe CH2OMe H so2cf2cfhocf3 1-520 F F CH2OMe CH2OMe 2-F so2cf2cfhocf3 1-521 Cl F CH2OMe CH2OMe 2-F so2cf2cfhocf3 1-522 Cl Cl CH2〇Me CH2OMe 2-F so2cf2cfhocf3 1-523 F F CH2〇Me CH2OMe 2-C1 so2cf2cfhocf3 1-524 Cl F CH2OMe CH2OMe 2-C1 so2cf2cfh〇cf3 1-525 Cl Cl CH2OMe CH2OMe 2-C1 so2cf2cfhocf3 1-526 F F CH2OMe CH2OMe 2-Me so2cf2cfhocf3 1-527 Cl F CH2OMe CH2〇Me 2-Me so2cf2cfhocf3 1-528 Cl Cl CH2OMe CH2OMe 2-Me so2cf2cfhocf3 1-529 F F CH2〇Me CH2OMe 2,3-Me2 so2cf2cfhocf3 1-530 Cl F CH2OMe CH2OMe 2,3-Me2 so2cf2cfhocf3 1-531 Cl Cl CH2OMe CH2OMe 2,3-Me2 so2cf2cfhocf3 1-532 F F H CH2〇Me H OCF2CFHOCF3 1-533 Cl F H CH2OMe H OCF2CFHOCF3 1-534 Cl Cl H CH2OMe H ocf2cfhocf3 1-535 F F H CH2OMe 2-F ocf2cfhocf3 1-536 Cl F H CH2OMe 2-F ocf2cfhocf3 1-537 ' Cl Cl ： H CH2OMe 2-F ocf2cfhocf3 1-538 ： F ； F H 丨 CH2OMe 2-C1 ocf2cfhocf3 1-539、 Cl ： F H 丨 CH2OMe 2-C1 〇cf2cfhocf3 1-540 « Cl丨 Cl : H 丨 CH2〇Me ： 2-C1 i ocf2cfh〇cf3 110 318750 200804250 表19No. X1 Y1 R1 R2·1 R7-1 R7-2 1-511 FFH CH2OMe 2-Me so2cf2cfhocf3 1-512 Cl FH CH2OMe 2-Me so2cf2cfhocf3 1-513 Cl Cl H CH2OMe 2-Me so2cf2cfhocf3 1-514 FFH CH2OMe 2 , 3-Me2 so2cf2cfhocf3 1-515 Cl FH CH2OMe 2,3-Me2 so2cf2cfhocf3 1-516 Cl Cl H CH2OMe 2,3-Me2 so2cf2cfhocf3 1-517 FF CH2OMe CH2OMe H so2cf2cfhocf3 1-518 Cl F CH2OMe CH2OMe H so2cf2cfhocf3 1-519 Cl Cl CH2OMe CH2OMe H so2cf2cfhocf3 1-520 FF CH2OMe CH2OMe 2-F so2cf2cfhocf3 1-521 Cl F CH2OMe CH2OMe 2-F so2cf2cfhocf3 1-522 Cl Cl CH2〇Me CH2OMe 2-F so2cf2cfhocf3 1-523 FF CH2〇Me CH2OMe 2- C1 so2cf2cfhocf3 1-524 Cl F CH2OMe CH2OMe 2-C1 so2cf2cfh〇cf3 1-525 Cl Cl CH2OMe CH2OMe 2-C1 so2cf2cfhocf3 1-526 FF CH2OMe CH2OMe 2-Me so2cf2cfhocf3 1-527 Cl F CH2OMe CH2〇Me 2-Me so2cf2cfhocf3 1 -528 Cl Cl CH2OMe CH2OMe 2-Me so2cf2cfhocf3 1-529 FF CH2〇Me CH2OMe 2,3-Me2 so2cf2cfhocf3 1-530 Cl F CH2OMe CH2OMe 2,3-Me2 so2cf2cfhocf3 1-531 Cl Cl CH2OMe CH2OMe 2,3-Me2 so2cf2cfhocf3 1-532 FFH CH2〇Me H OCF2CFHOCF3 1-5 33 Cl FH CH2OMe H OCF2CFHOCF3 1-534 Cl Cl H CH2OMe H ocf2cfhocf3 1-535 FFH CH2OMe 2-F ocf2cfhocf3 1-536 Cl FH CH2OMe 2-F ocf2cfhocf3 1-537 ' Cl Cl : H CH2OMe 2-F ocf2cfhocf3 1-538 : F ; FH 丨CH2OMe 2-C1 ocf2cfhocf3 1-539, Cl : FH 丨CH2OMe 2-C1 〇cf2cfhocf3 1-540 « Cl丨Cl : H 丨CH2〇Me : 2-C1 i ocf2cfh〇cf3 110 318750 200804250 Table 19

No. X1 Y1 R1 R2·1 R7·1 R7-2 1-541 F F H CH2OMe 2-Me OCF2CFHOCF3 1-542 Cl F H CH2OMe 2-Me OCF2CFHOCF3 1-543 Cl Cl H CH2OMe 2-Me 〇cf2cfh〇cf3 1-544 F F H CH2OMe 2,3-Me2 〇cf2cfhocf3 1-545 Cl F H CH2OMe 2,3-Me2 ocf2cfhocf3 1-546 Cl Cl H CH2OMe 2,3-Me2 OCF2CFHOCF3 1-547 F F CH2OMe CH2OMe H 〇CF2CFHOCF3 1-548 Cl F CH2〇Me CH2OMe H ocf2cfhocf3 1-549 Cl Cl CH2OMe CH2〇Me H OCF2CFHOCF3 1-550 F F CH2OMe CH2OMe 2-F OCF2CFHOCF3 1-551 Cl F CH2OMe CH2OMe 2-F OCF2CFHOCF3 1-552 Cl Cl CH2〇Me CH2OMe 2-F OCF2CFHOCF3 1-553 F F CH2OMe CH2OMe 2-C1 OCF2CFHOCF3 1-554 Cl F CH2OMe CH2〇Me 2-C1 OCF2CFHOCF3 1-555 Cl Cl CH2OMe CH2OMe 2-C1 ocf2cfhocf3 1-556 F F CH2OMe CH2OMe 2-Me ocf2cfhocf3 1-557 Cl F CH2OMe CH2OMe 2-Me ocf2cfhocf3 1-558 Cl Cl CH2OMe CH2〇Me 2-Me ocf2cfhocf3 1-559 F F CH2OMe CH2OMe 2,3-Me2 ocf2cfhocf3 1-560 Cl F CH2OMe CH2OMe 2,3-Me2 ' OCF2CFHOCF3 1-561 Cl Cl CH2OMe CH2〇Me 2,3-Me2 OCF2CFHOCF3 其次，將說明化合物⑴之製法。 化合物（I)例如可經由下述方法1至方法10製造。 方法1 於化合物（I)中，式（1-1)表示之化合物：No. X1 Y1 R1 R2·1 R7·1 R7-2 1-541 FFH CH2OMe 2-Me OCF2CFHOCF3 1-542 Cl FH CH2OMe 2-Me OCF2CFHOCF3 1-543 Cl Cl H CH2OMe 2-Me 〇cf2cfh〇cf3 1-544 FFH CH2OMe 2,3-Me2 〇cf2cfhocf3 1-545 Cl FH CH2OMe 2,3-Me2 ocf2cfhocf3 1-546 Cl Cl H CH2OMe 2,3-Me2 OCF2CFHOCF3 1-547 FF CH2OMe CH2OMe H 〇CF2CFHOCF3 1-548 Cl F CH2〇 Me CH2OMe H ocf2cfhocf3 1-549 Cl Cl CH2OMe CH2〇Me H OCF2CFHOCF3 1-550 FF CH2OMe CH2OMe 2-F OCF2CFHOCF3 1-551 Cl F CH2OMe CH2OMe 2-F OCF2CFHOCF3 1-552 Cl Cl CH2〇Me CH2OMe 2-F OCF2CFHOCF3 1 -553 FF CH2OMe CH2OMe 2-C1 OCF2CFHOCF3 1-554 Cl F CH2OMe CH2〇Me 2-C1 OCF2CFHOCF3 1-555 Cl Cl CH2OMe CH2OMe 2-C1 ocf2cfhocf3 1-556 FF CH2OMe CH2OMe 2-Me ocf2cfhocf3 1-557 Cl F CH2OMe CH2OMe 2-Me ocf2cfhocf3 1-558 Cl Cl CH2OMe CH2〇Me 2-Me ocf2cfhocf3 1-559 FF CH2OMe CH2OMe 2,3-Me2 ocf2cfhocf3 1-560 Cl F CH2OMe CH2OMe 2,3-Me2 ' OCF2CFHOCF3 1-561 Cl Cl CH2OMe CH2 〇Me 2,3-Me2 OCF2CFHOCF3 Next, the preparation method of the compound (1) will be explained. The compound (I) can be produced, for example, by the following methods 1 to 10. Process 1 In the compound (I), the compound represented by the formula (1-1):

其中R7、Q及m係如前文定義， 111 318750 200804250 X為氧原子，Y為氧原子，以及 R11為視需要經一個或多個取代基取代之低碳烧氧基 低碳烧基、視需要經一個或多個取代基取代之低碳焼硫基 低碳烷基、視需要經一個或多個取代基取代之低碳烷基亞 磺醯基低碳烧基、視需要經一個或多個取代基取代之低碳 烷基磺醯基低碳烷基、或視需要經一個或多個取代基取代 之一-或二-(低碳烷基）胺基低碳烷基， 可經由使式（II)表示之化合物：Wherein R7, Q and m are as defined above, 111 318750 200804250 X is an oxygen atom, Y is an oxygen atom, and R11 is a low carbon alkoxy low carbon alkyl group which is optionally substituted by one or more substituents, optionally a lower alkyl sulfenyl lower alkyl group substituted with one or more substituents, optionally substituted with one or more substituents, a lower alkyl sulfinyl lower carbon group, optionally one or more Substituted lower alkyl sulfonyl lower alkyl, or optionally substituted with one or more substituents, one or a di-(lower alkyl)amino lower alkyl, via (II) Compounds indicated:

(Π) 其中R7、Q及m係如前文定義，以及 X為氧原子，及γ為氧原子， 與式（III)表示之化合物反應而製造： R11—L1 (III) 其中R係如前文定義，以及 其氯原子、漠原子，原子)、曱續酿氧 基、本只醚虱基、或甲苯磺醯氧基。 反應通常係於鹼存在下於溶劑中進行。 反應使用之溶劑之實例包括 網等；芳香族烴類諸如苯、甲苯 二基乙基 ^ , ^ ^ ^ T笨等’脂肪族烴類 諸如％、庚烷等；醚類諸如乙 、 ^ 1 ^ ^ 四風吱喃、1，4_二噚 烷、，一虱基乙烷、ι，2-二乙氧基乙^ 如氯仿、氯苯、二氯苯等.浐㈣广4，*化烴類諸 性溶劑諸如N，N-二甲基甲醯胺…::子性極 —T基乙酸胺、1 -甲 318750 112 200804250 基-2-吡咯啶酮、曱基咪唑啉酮、二曱亞砜等；水； 及其混合物。 反應中使用的鹼之實例包括鹼金屬或鹼土金屬氫氧化 ^者如氫氧化納、氫氧化鉀、氫氧化㈣；驗金屬或驗土 金屬氫化物諸如氫化納、氫化钟、氫化舞等；驗金屬或驗 土金屬碳酸鹽諸如碳酸鈉、碳酸鉀等；鹼金屬醇化物諸如 乙醇納、甲醇納等；有機鐘諸如正丁基鐘、二異丙基酿胺 鋰等；及有機鹼類諸如三乙基胺、吡啶、丨，8_二吖雙環[5.4 〇] 十一碳-7-烯等。 §反應劑於反應條件下為液態時，各反應劑可過量用 於反應。但通常，以丨莫耳式（11)表示之化合物為基準，式 (ΠΙ)表示之化合物之用量比例為2至4莫耳，及鹼之用量 比例為2至4莫耳。 反應溫度通常於-78°C至150。〇之範圍，反應時間通常 係於0· 1小時至1 〇〇小時之範圍。 於反應完成後，式（1-1)表示之化合物可經由執行後處 理程序而分離，諸如經由將反應混合物倒入水中，以有機 溶劑萃取，及脫水及濃縮有機層而分離。分離的式（1_1}表 示之化合物可藉再結晶、管柱層析術等進一步純化。 式（II)表示之化合物可經由J, Agr. Food chem.，Vq1. 21，No· 3，ρ· 348-354 (1973)中所述之方法或其修改方法 製造。 方法2 式（I)化合物中，式（1-2)所表示之化合物： 318750 113 200804250 (I.2) A】·1蜂2 其中R2、A、R7、Q及m係如前文定義，以及 X為氧原子，Y為氧原子， RW為曱醯基、氰基， 視需要經一個或多個取代基取代之低碳烷基磺醯基， 視需要經一個或多個取代基取代之芳基磺醯基， 視需要經一個或多個取代基取代之低碳烷基羰基硫基， 視需要經一個或多個取代基取代之低碳烷氧羰基硫基， 視需要經一個或多個取代基取代之芳氧羰基硫基， 視需要經一個或多個取代基取代之一-或二-(低碳烷基）胺 基磺酿基， 視需要經一個或多個取代基取代之一-或二-(芳基）胺基磺 醯基， 視需要經一個或多個取代基取代之低碳烷基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之低碳環烷基， 視需要經一個或多個取代基取代之芳基低碳烷基， 視需要經一個或多個取代基取代之低碳烷氧基低碳烷基， 視需要經一個或多個取代基取代之芳氧基低碳烷基， 視需要經一個或多個取代基取代之低碳烷硫基低碳烷基， 視需要經一個或多個取代基取代之低碳烷基亞磺醯基低碳 烧基， 114 318750 200804250 視需要經一個或多個取代基取代之低碳烷基磺醯基低碳烷 基， 視需要經一個或多個取代基取代之一-或二_(低碳烷基）胺 基低碳烷基， 視需要經一個或多個取代基取代之低碳烷醯基， 視需要經一個或多個取代基取代之低碳烷氧羰基， 視需要經一個或多個取代基取代之芳氧羰基， 視需要經一個或多個取代基取代之芳基（低碳）烷氧羰基， 視需要經一個或多個取代基取代之胺基曱酿基， 視需要經一個或多個取代基取代之硫胺基曱醯基， 視需要經一個或多個取代基取代之低碳烷氧基草醯基， 視需要經一個或多個取代基取代之芳基低碳烷氧基草醯 視需要經一個或多個取代基取代之芳氧基草醯基，或 視需要經一個或多個取代基取代之胺基草醯基， 可經由使式（iv)表示之化合物：(Π) wherein R7, Q and m are as defined above, and X is an oxygen atom, and γ is an oxygen atom, which is produced by reacting with a compound represented by formula (III): R11—L1 (III) wherein R is as defined above And its chlorine atom, adipose atom, atom), continuation of the oxy group, the present ether sulfhydryl group, or toluene sulfonyloxy group. The reaction is usually carried out in a solvent in the presence of a base. Examples of the solvent used in the reaction include a network or the like; aromatic hydrocarbons such as benzene, toluenediylethyl^, ^^^T, etc. 'aliphatic hydrocarbons such as %, heptane, etc.; ethers such as B, ^ 1 ^ ^ 四风吱,1,4_dioxane, 1-mercaptoethane, ι,2-diethoxyethane such as chloroform, chlorobenzene, dichlorobenzene, etc. 浐(四)广四,*化烃Solvents such as N,N-dimethylformamide...:: sub-polar - T-acetic acid amine, 1-methyl 318750 112 200804250 base-2-pyrrolidone, mercapto imidazolidinone, diterpenoid Sulfone, etc.; water; and mixtures thereof. Examples of the base used in the reaction include alkali metal or alkaline earth metal hydroxide such as sodium hydroxide, potassium hydroxide, hydrogen hydroxide (tetra); metal or soil metal hydride such as sodium hydride, hydrogenation clock, hydrogenation dance, etc.; Metal or soil metal carbonate such as sodium carbonate, potassium carbonate, etc.; alkali metal alkoxides such as sodium ethoxide, sodium methoxide, etc.; organic clocks such as n-butyl quinone, lithium diisopropyl amide, etc.; and organic bases such as three Ethylamine, pyridine, hydrazine, 8_diindole bicyclo [5.4 〇] undec-7-ene, and the like. § When the reactants are in a liquid state under the reaction conditions, each of the reactants may be used in excess for the reaction. However, in general, the compound represented by the formula (11) is used in an amount of 2 to 4 moles, and the amount of the base is 2 to 4 moles, based on the compound represented by the formula (11). The reaction temperature is usually from -78 ° C to 150 ° C. The range of enthalpy, the reaction time is usually in the range of 0.1 hour to 1 hour. After completion of the reaction, the compound represented by the formula (1-1) can be isolated by performing a post-treatment procedure, such as by pouring the reaction mixture into water, extracting with an organic solvent, and dehydrating and concentrating the organic layer. The isolated compound represented by the formula (1_1} can be further purified by recrystallization, column chromatography, etc. The compound represented by the formula (II) can be passed through J, Agr. Food chem., Vq1. 21, No. 3, ρ· Manufactured in the method described in 348-354 (1973) or a modification thereof. Method 2 In the compound of the formula (I), the compound represented by the formula (1-2): 318750 113 200804250 (I.2) A]·1 bee 2 wherein R 2 , A, R 7 , Q and m are as defined above, and X is an oxygen atom, Y is an oxygen atom, RW is a fluorenyl group, a cyano group, and a lower alkane substituted by one or more substituents as needed. A sulfonyl group, an arylsulfonyl group optionally substituted with one or more substituents, optionally a lower alkylcarbonylthio group substituted with one or more substituents, optionally having one or more substituents a substituted lower alkoxycarbonylthio group, optionally substituted with an aryloxycarbonylthio group substituted with one or more substituents, optionally substituted with one or more substituents, one or a di-(lower alkyl)amine a sulfonyl group, optionally substituted with one or more substituents, one or a di-(aryl)aminosulfonyl group, optionally via one or a lower alkyl group substituted with a lower alkyl group, optionally substituted with one or more substituents, a lower alkynyl group substituted with one or more substituents, optionally substituted by one or more a substituted lower carbene alkyl group, optionally an aryl lower alkyl group substituted with one or more substituents, optionally substituted with one or more substituents, a lower alkoxy a lower alkyl group, if desired An aryloxy lower alkyl group substituted with one or more substituents, optionally substituted with one or more substituents, a lower alkylalkylthio lower alkyl group, optionally substituted with one or more substituents Carboxyalkylsulfinylcarbocarbonate, 114 318750 200804250 A lower alkyl sulfonyl lower alkyl substituted by one or more substituents, optionally substituted with one or more substituents Or a bis(lower alkyl)amino lower alkyl group, a lower alkyl alkanoyl group substituted with one or more substituents, if desired, a lower alkoxycarbonyl group substituted with one or more substituents An aryloxycarbonyl group substituted with one or more substituents as needed, as needed An aryl (lower) alkoxycarbonyl group substituted with one or more substituents, optionally substituted with one or more substituents, optionally substituted with one or more substituents An aryl group, a lower alkoxylated fluorenyl group substituted with one or more substituents, optionally substituted with one or more substituents, and optionally substituted with one or more substituents, one or more a substituent-substituted aryloxyoxalyl group or, if desired, an amine oxalidyl group substituted with one or more substituents, via a compound represented by the formula (iv):

其中R1·1、R7、Q及m係如前文定義，以及 X為氧原子，及Y為氧原子， 與式（V)表示之化合物反應而製造： A-R2-L2 (V) 其中A及R2係如前文定義，以及 及碘原子）、甲磺醯氧 為鹵原子（氯原子、溴原子、 318750 115 200804250 基、苯磺酿氧基、或甲苯磺酿氧基。 反應通常係於驗存在下於^中進Γ 反應使用之溶劑之實例包括 ：。 酉同等；芳香族_諸如苯、 “如丙酮、甲基乙基 諸如己烷、庚烷等；醚類諸如-甲：等；脂肪族烴類 院、a二甲氧基乙烧、12_二乙；其四虱咬喃、二嗜 如氯仿、氯苯、二氣苯等二二基乙烧等；齒化烴類諸 性、、六卞丨丨法3颂啫如乙腈等；非質子性極 生合片丨诸如N，N-二甲基曱醯胺、 基挪㈣、以二甲基，她卜甲基乙醯胺、μ 及其混合物。 ^翻、二μ料；水； 反應中使用的驗之實侧^ Μη, 驗金屬或驗土金屬氫氧化 物诸如虱氧化納、氫氧化物 人汗 4虱化鉀虱虱化鈣等；鹼金屬或鹼土 肢物諸如氫化鈉、氫化鉀、氫化解；豸金屬或驗 金屬碳酸鹽諸如魏納、碳酸料；驗金⑽化物諸如 乙醇鈉、甲醇鈉等；有機鋰唑‘ χ _ &amp; 有钺鋰诸如正丁基鋰、二異丙基醯胺 鐘等；及有機驗類諸如：r乙其脸 〜 一 G I月女吡啶、1，8-二吖雙環[5.4.0] 十一碳-7-烯等。 當反應劑於反應條件下為液態時，各反應劑可過量用 於反應。但通常，以！莫耳式（IV)表示之化合物為基準， 式（v)表示之化合物之用量比例為】至3莫耳，及鹼之用量 比例為1至3莫耳。 反應溫度通常於-78°C至150°C之範圍，反應時間通常 係於0· 1小時至1 〇〇小時之範圍。 於反應完成後’式（1-2)表示之化合物可經由執行後處 116 318750 200804250 理程序而分離，諸如經由將反應混合物倒入水中，以有機 溶劑萃取’及脫水及濃縮有機層而分離。分離的式幻表 示之化合物可藉再結晶、管柱層析術等進一步純化。义 式（IV)表示之化合物可經由J. Agr. F〇C)d Chem&gt;，Vc)h 21，No. 3，p. 348-354 (1973)中所述之方法或其修改方法 製造。 方法3 化合物（I)中，式（1-3)所表示之化合物：Wherein R1·1, R7, Q and m are as defined above, and X is an oxygen atom, and Y is an oxygen atom, which is produced by reacting with a compound represented by the formula (V): A-R2-L2 (V) wherein A and R2 is as defined above, and iodine atom), methanesulfonyloxy is a halogen atom (chlorine atom, bromine atom, 318750 115 200804250 base, benzenesulfonyloxy, or tolueneoxyl. The reaction is usually detected Examples of the solvent used in the reaction include: 酉 equivalent; aromatic _ such as benzene, "such as acetone, methyl ethyl such as hexane, heptane, etc.; ethers such as - A: etc.; aliphatic Hydrocarbon hospital, a dimethoxyethane, 12-diethyl; its tetramine, two bismuth, such as chloroform, chlorobenzene, di-benzene, etc.; Six methods such as acetonitrile; aprotic polar sheets such as N,N-dimethyldecylamine, ketore (tetra), dimethyl, sheethylamine, μ and mixtures thereof. ^Flip, two μ material; water; the actual side of the test used in the reaction ^ Μ η, metal or soil test metal hydroxide such as antimony oxide, hydroxide people Khan 4 potassium potassium telluride or the like; alkali metal or alkaline earth limbs such as sodium hydride, potassium hydride, hydrogenation; base metals or metal carbonates such as Weiner, carbonic acid; gold (10) compounds such as sodium ethoxide, methanol Sodium, etc.; organic lithium azole ' χ _ &amp; 钺 lithium such as n-butyl lithium, diisopropyl guanamine clock; and organic tests such as: r 乙 脸 face ~ a GI month female pyridine, 1,8- Dioxetane [5.4.0] undec-7-ene, etc. When the reactant is in a liquid state under the reaction conditions, each reactant can be used in excess for the reaction, but usually, it is represented by the formula (IV). The compound is based on the formula, and the ratio of the compound represented by the formula (v) is from 3 to 3 mol, and the ratio of the base is from 1 to 3 mol. The reaction temperature is usually in the range of from -78 ° C to 150 ° C, and the reaction time is Usually in the range of from 0.1 hour to 1 hour. After completion of the reaction, the compound represented by formula (1-2) can be isolated by performing the process at 116 318750 200804250, such as by pouring the reaction mixture into water. Separated by organic solvent extraction and separation of dehydrated and concentrated organic layers. The compound shown can be further purified by recrystallization, column chromatography, etc. The compound represented by the formula (IV) can be passed through J. Agr. F〇C)d Chem&gt;, Vc)h 21, No. 3, p. Processed by the method described in 348-354 (1973) or a modification thereof. Method 3 In the compound (I), the compound represented by the formula (1-3):

其中R2、R7、A、Q及m係如前文定義，以及 X為氧原子，及Y為氧原子， 可經由使式（VI)化合物：Wherein R 2 , R 7 , A, Q and m are as defined above, and X is an oxygen atom, and Y is an oxygen atom, via a compound of formula (VI):

(VI) 其中R2、R7、A、Q及m係如前文定義，以及 X為氧原子，及γ為氧原子，以及 一 J為保護基，諸如2-(三甲基矽烷基）乙氧基甲基等，接 受脫保護反應而製造。例如，當了為2_(三曱基矽烷基）乙 氧基甲基時，係經由使式（VI)表示之化合物與說化鹽反應 而進行製造。 反應通常係於溶劑中進行。 117 318750 200804250 一反應使用之溶劑之實例包括㈣諸如㈣ 酮寺；芳香族烴類諸如苯、甲苯、二 土 土 —一類諸一 1:氣;氧基 虱仿虱本一虱本專；腈類諸如 =劑諸如N，N-二甲基甲醯胺，二甲基乙二^ :=叫二甲基一、二…等;水; 反應中使用之氟化鹽之實例包括録鹽諸如四正丁 氟化物等；及無機鹽類諸如氟化鉋等。 土 4 反應使用之氟化鹽之用量，基於1莫耳式（Μ)表示之 化合物，通常為1至1〇莫耳用量比例。 r反應溫f通常於_78°C^^之範圍，反應時間通常 係於〇· 1小時至1 〇〇小時之範圍。 於反應完成後，式㈣表示之化合物可經由執行 理程序而分離，諸如經由將反應混合物倒入水中， 溶劑萃取，及脫水及濃縮有機層而分離。分離的式㈣表女 示之化合物可藉再結晶、管柱層析術等進一步純化。&amp; 化合物（VI)可經由方法2所述之方法製造。 方法4 此外，化合物（I)中，式（卜3)表示之化合物可經由 (VII)表示之化合物·· 式(VI) wherein R 2 , R 7 , A, Q and m are as defined above, and X is an oxygen atom, and γ is an oxygen atom, and a J is a protecting group such as 2-(trimethyldecyl)ethoxy. A methyl group or the like is produced by receiving a deprotection reaction. For example, when it is a 2-(trimethylsulfanyl)ethoxymethyl group, it is produced by reacting a compound represented by the formula (VI) with a salt. The reaction is usually carried out in a solvent. 117 318750 200804250 Examples of solvents used in a reaction include (iv) such as (iv) ketone temple; aromatic hydrocarbons such as benzene, toluene, two soils - one type of 1: gas; oxy oxime 虱 虱 本 本 本; Such as = agent such as N, N-dimethylformamide, dimethylethylenedioxide: = dimethyl ketone, bis, etc.; water; examples of fluoride salts used in the reaction include salt recording such as four positive Butane fluoride, etc.; and inorganic salts such as fluorinated planers. The amount of the fluoride salt used in the reaction of the soil 4 is based on a compound expressed by 1 mol (Μ), usually in a ratio of 1 to 1 mol. The reaction temperature f is usually in the range of _78 ° C ^ ^ , and the reaction time is usually in the range of 〇 1 hour to 1 hour. After completion of the reaction, the compound represented by the formula (IV) can be isolated by an operation procedure such as separation of the reaction mixture into water, solvent extraction, and dehydration and concentration of the organic layer. The isolated compound of the formula (4) can be further purified by recrystallization, column chromatography or the like. &amp; Compound (VI) can be produced by the method described in Method 2. Process 4 Further, in the compound (I), the compound represented by the formula (Bu 3) may be a compound represented by (VII).

=C=Y 318750 118 (VII) 200804250 其中χ、γ及Q係如前文定義，=C=Y 318750 118 (VII) 200804250 where χ, γ and Q are as defined above,

與式（VIII)表不之化合物反應而製造Manufactured by reacting with a compound of the formula (VIII)

(VHI) 其中A、R2、R7及m係如前文定義。 反應通常係於溶劑中進行。 反C使用之各劑之貫例包括酉同類諸如丙酬、甲基乙基 嗣等；芳香族烴類諸如苯、甲笨、二甲苯等·，脂肪族烴類 诸如己烷、庚烷等；鍵類諸如乙醚、四氫呋喃、丄，二噚 烷、1，2-二曱氧基乙烷、u_二乙氧基乙烷等；鹵化烴類諸 如氯仿、氣苯、二氯苯等；腈類諸如乙腈等質子性極 性溶劑諸如N，N-二曱基曱醯胺、N，N_二甲基乙醯胺、卜曱 基-2-吡咯啶酮、1，3_二曱基咪唑啉酮、二甲亞砜等丨水； 及其混合物。 式（VIII)表示之化合物通常係以基於i莫耳式（VII)表 示之化合物，為0·5至2莫耳之比例用於反應。 反應溫度通常於-78°C至150°C之範圍，反應時間通常 係於0· 1小時至100小時之範圍。 於反應完成後，式（1-3)表示之化合物可經由執行諸如 濃縮或過濾反應混合物之後處理程序而分離。分離的式 (1-3)表示之化合物可藉再結晶、管柱層析術等進一步純化。 式（VII)表示之化合物可經由j. Agr. Food Chen]L，V()h 21，No· 3，Ρ· 348-354 (1973)中所述之方法或其修改方法 318750 119 200804250 製造。此外，式（VIII)表示之化合物可經由化學會柏金議事 錄期子丨J 1 (Journal of the Chemical Society Perkin Transactions 1)(1988年）1631-1636頁所述方法或其修改方 法製造。 方法5 化合物（I)中，式（1-4)所表示之化合物：(VHI) wherein A, R2, R7 and m are as defined above. The reaction is usually carried out in a solvent. Examples of the respective agents used in the anti-C include hydrazines such as propane, methyl ethyl hydrazine, etc.; aromatic hydrocarbons such as benzene, methyl bromide, xylene, etc., aliphatic hydrocarbons such as hexane, heptane, etc.; Such as diethyl ether, tetrahydrofuran, hydrazine, dioxane, 1,2-dimethoxy ethane, u-diethoxyethane, etc.; halogenated hydrocarbons such as chloroform, benzene, dichlorobenzene, etc.; nitriles such as A protic polar solvent such as acetonitrile such as N,N-didecylguanamine, N,N-dimethylacetamide, dimercapto-2-pyrrolidone, 1,3-didecyl imidazolidinone, dimethyl Sulfoxide such as sulfoxide; and mixtures thereof. The compound represented by the formula (VIII) is usually used in the reaction at a ratio of from 0.5 to 2 moles based on the compound represented by the i mole formula (VII). The reaction temperature is usually in the range of -78 ° C to 150 ° C, and the reaction time is usually in the range of from 0.1 hour to 100 hours. After completion of the reaction, the compound represented by the formula (1-3) can be isolated by performing a treatment procedure such as concentration or filtration of the reaction mixture. The isolated compound represented by the formula (1-3) can be further purified by recrystallization, column chromatography or the like. The compound represented by the formula (VII) can be produced by the method described in J. Agr. Food Chen] L, V () h 21, No. 3, Ρ 348-354 (1973) or its modification method 318750 119 200804250. Further, the compound represented by the formula (VIII) can be produced by the method described in the Journal of the Chemical Society Perkin Transactions 1 (1988) 1631-1636 or its modification method. Process 5 In the compound (I), the compound represented by the formula (1-4):

其中Y、R2、R7、A、Q及m係如前文定義，以及 R1—2為視需要經一個或多個取代基取代之低碳烷基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之低碳環烷基， 視需要經一個或多個取代基取代之芳基低碳烷基， 視需要經一個或多個取代基取代之芳基， 視需要經一個或多個取代基取代之低碳烷氧基低碳烷基， 視需要經一個或多個取代基取代之芳氧基低碳烷基， 視需要經一個或多個取代基取代之低碳烷硫基低碳烷基， 視需要經一個或多個取代基取代之低碳烷基亞磺醯基低碳 烧基’ 視需要經一個或多個取代基取代之低碳烷基磺醯基低碳烷 基， 視需要經一個或多個取代基取代之一-或二-(低碳烷基）胺 120 318750 200804250 基低碳烷基， 視需要經一個或多個取代基取代之低碳烧氧基， 視需要經一個或多個取代基取代之芳氧基， 視需要經一個或多個取代基取代之芳基低碳烷氧基， 視需要經一個或多個取代基取代之胺基，或 視需要經一個或多個取代基取代之雜環基， 可經由使式（IX)表示之化合物··Wherein Y, R2, R7, A, Q and m are as defined above, and R1-2 is a lower alkyl group optionally substituted by one or more substituents, optionally substituted by one or more substituents as desired a carboxyalkenyl group, a lower alkynyl group substituted by one or more substituents, optionally a lower alkylcycloalkyl group substituted with one or more substituents, optionally substituted with one or more substituents. a lower alkyl group, optionally substituted with one or more substituents, optionally substituted with one or more substituents, a lower alkoxy lower alkyl group, optionally substituted with one or more substituents An aryloxy lower alkyl group, optionally substituted with one or more substituents, a lower alkylalkylthioalkylene group, optionally substituted with one or more substituents, a lower alkyl sulfinyl group Carboalkyl group - a lower alkyl sulfonyl lower alkyl group optionally substituted with one or more substituents, optionally substituted with one or more substituents - one or two - (lower alkyl) amines 120 318750 200804250 based lower alkyl, low carbon burning oxygen substituted by one or more substituents An aryloxy group optionally substituted with one or more substituents, optionally an aryl lower alkoxy group substituted with one or more substituents, optionally substituted with one or more substituents, or A heterocyclic group substituted with one or more substituents as needed may be a compound represented by the formula (IX).

XI Q^^ci (K) i1·2 其中Y、Q及R1·2係如前文定義， 與式（VIII)表示之化合物反應而製造。 反應通常係於鹼存在下於溶劑中進行。 反應使用之溶劑之實例包括嗣類諸如丙嗣、甲其乙美 $等；芳香族烴類諸如苯、甲苯、二甲苯等；脂肪族_ 二如己院、庚料；賴諸如㈣、四氫d夫喃、m 、、1，2_二甲氧基乙烷、12-二乙 ^ 虱丞乙烷寺，齒化烴類諸 “、虱本、二氯苯等；腈類諸如 ^劑諸如N，N_二甲基甲醯胺，二甲基^胺= 酮、U·二甲一 反應中使用的鹼之實例包括邊人 物諸如氫氧化納、气氧;：=屬或驗土金屬氫氧化 全眉風魏舞等；驗金屬或驗土 虱物堵如氫化鈉、氫化鉀、氫化钙耸 土金屬碳酸_咭‘# μ Α 飞匕鈣專，fe金屬或鹼 4如奴酸鈉、碳酸鉀等；鹼金屬醇化物諸如 318750 121 200804250 乙醇納、甲醇㈣；有機料如正丁絲、二異丙基酿胺 裡等，及錢鹼類諸如三乙基胺、㈣、u•二 十一碳_7_烯等。 h j 各反應劑可過量用 之化合物為基準， 至4莫耳’及驗之用 當反應劑於反應條件下為液態時， 於反應。但通常，以^莫耳式（Ιχ)表示 式（VIII)表示之化合物之用量比例為1 量比例為1至4莫耳。 /反應溫度通常於-78tmc之範圍，反應時間通常 係於0· 1小時至2〇〇小時之範圍。 於反應完成後，式（1-4)表示之化合物可經由執行後處 理程士而分離，諸如經由將反應混合物倒人水中，以有機 溶劑萃取’及脫水及濃縮有機層而分離。分離的式（1_4)表 不之化口物可藉再結晶、管柱層析術等進一步純化。 方法6 化合物（I)中，由式（1_5)所表示之化合物：XI Q^^ci (K) i1·2 wherein Y, Q and R1·2 are produced by reacting with a compound represented by the formula (VIII) as defined above. The reaction is usually carried out in a solvent in the presence of a base. Examples of the solvent used in the reaction include anthraquinones such as propylene, methyl methacrylate, etc.; aromatic hydrocarbons such as benzene, toluene, xylene, etc.; aliphatic _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ D-fu, m, 1,2-dimethoxyethane, 12-diethyl oxime, toxinized hydrocarbons, sputum, dichlorobenzene, etc.; nitriles such as agents such as Examples of the base used in the reaction of N,N-dimethylformamide, dimethylamine, ketone, U·dimethylation include side characters such as sodium hydroxide, gas oxygen; := genus or soil test metal hydrogen Oxidation of full eyebrows, Wei dance, etc.; metal or soil inspection, such as sodium hydride, potassium hydride, calcium hydride, metal carbonate _ 咭 '# μ Α 匕 匕 calcium, fe metal or alkali 4 such as sodium sulphate, Potassium carbonate, etc.; alkali metal alkoxides such as 318750 121 200804250 ethanol sodium, methanol (four); organic materials such as n-butyl silk, diisopropyl-branol, etc., and money bases such as triethylamine, (four), u• twenty One carbon_7_ene, etc. hj Each reagent can be used as an excess of the compound, up to 4 moles and used when the reactant is liquid under the reaction conditions, However, in general, the ratio of the compound represented by the formula (VIII) expressed by the formula (VIII) is 1 to 4 mol. The reaction temperature is usually in the range of -78 tmc, and the reaction time is usually 0. · a range of from 1 hour to 2 hours. After completion of the reaction, the compound represented by formula (1-4) can be isolated by performing a post-treatment process, such as by extracting the reaction mixture into human water and extracting it with an organic solvent. Dehydration and concentration of the organic layer to separate. The separated formula (1_4) can be further purified by recrystallization, column chromatography, etc. Method 6 In compound (I), represented by formula (1_5) Compound:

II

A 其中R2、R7、A、Q及m係如前文定義， X為氧原子，Y為氧原子，以及 R 為甲酿基， 氰基， 視需要經-個或乡個取代絲代之低碳⑦基彻基 視需要經一個或多個取代基取代之芳基磺醯基， 318750 122 200804250 視需要經一個或多個取代基取代之低碳烷基羰基硫基， 視需要經一個或多個取代基取代之低碳烷氧羰基硫基， 視需要經一個或多個取代基取代之芳氧羰基硫基， 視需要經一個或多個取代基取代之一-或二-(低碳烷基）胺 基磺醯基， 視需要經一個或多個取代基取代之一-或二-(芳基）胺基磺 醯基， 視需要經一個或多個取代基取代之低碳烷基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之低碳環烷基， 視需要經一個或多個取代基取代之芳基低碳烷基， 視需要經一個或多個取代基取代之低碳烷氧基低碳烷基， 視需要經一個或多個取代基取代之芳氧基低碳烷基， 視需要經一個或多個取代基取代之低碳烷硫基低碳烷基， 視需要經一個或多個取代基取代之低碳烷基亞磺醯基低碳 烧基’ 視需要經一個或多個取代基取代之低碳烷基磺醯基低碳烷 基， 視需要經一個或多個取代基取代之一-或二-(低碳烷基）胺 基低碳烧基’ 視需要經一個或多個取代基取代之低碳烷醯基， 視需要經一個或多個取代基取代之低碳烷氧羰基， 視需要經一個或多個取代基取代之芳氧羰基， 123 318750 200804250 視需要經一個或多個取代基取代之芳基低碳烷氧羰基， 視需要經一個或多個取代基取代之胺基甲醯基， 視需要經一個或多個取代基取代之胺硫甲醯基， 視需要經一個或多個取代基取代之低碳烷氧基草醯基， 視需要經一個或多個取代基取代之芳基低碳烷氧基草醯 基， 視需要經一個或多個取代基取代之芳氧基草醯基，或 視需要經一個或多個取代基取代之胺基草醯基， 可經由使式（1-3)表示之化合物與式（χ)表示之化合物反應 而製造： R'L3 (X) 其中R1-3係如前文定義，以及 L為鹵原子（氯原子、溴原子、及碘原子）、曱磺醯氧 基、苯石頁醯氧基、甲苯磺醯氧基、曱氧基磺醯氧基、或乙 氧基磺醯氧基。 反應通常係於驗存在下於溶劑中進行。 反應使用之溶劑之實例包括酮類諸如丙酮、甲基乙基 明等；芳香族烴類諸如苯、曱苯、二甲苯等；脂肪族煙二 者汝己烧庚^0專，醚類諸如乙醚、四氫吱喃、1，4-二口琴 烷=甲氧基乙垸、12-二乙氧基乙烧等；鹵化烴類諸 ^氯笨—氯本等；腈類諸如乙腈等；非質子性極 性溶劑諸如N，N-二甲基曱酿胺、N，N二甲基乙酿胺、卜甲 比咯疋酮、1，3_二曱基咪唑啉酮、二曱亞砜等丨水； 318750 124 200804250 反應中使用的鹼之實例包括鹼金屬或鹼土金屬氫氧化 物諸如氫氧化鈉、氫氧化鉀、氫氧化鈣等；鹼金屬或鹼土 金屬氫化物諸如氫化鈉、氫化鉀、氫化鈣等；鹼金屬或鹼 土金屬峡酸鹽诸如碳酸納、碳酸鉀等；驗金屬醇化物諸如 乙醇鈉、f醇鈉等；有機鋰諸如正丁基鋰、二異丙基醯胺 鐘專，及有機驗類諸如三乙基胺、呢σ定、〗，$ _二吖雙環[n 〇] 十一碳婦等。 當反應劑於反應條件下為液態時，各反應劑可過量用 於反應。但通常’ Μ !莫耳式（1_3)表示之化合物為基準， 式(X)表不之化合物之用量比例為i至4莫耳，及鹼之用量 比例為1至4莫耳。 反應溫度通常於·抑至150。〇之範圍，反應時間通常 係於0· 1小時至100小時之範圍。 :反應完成後，式㈣表示之化合物可經由執行後處 、/序而分離’諸如經由將反應混合物倒入水中 溶劑萃取，及脫水及濃縮有機層而分離。分離的 不之化合物可藉再結晶、f柱層析 、 方法7 〆、、、％化。 化合物（I)中，由式㈣所表示之化合物··A wherein R2, R7, A, Q and m are as defined above, X is an oxygen atom, Y is an oxygen atom, and R is a aryl group, a cyano group, and a low carbon which is replaced by a 7 Benzyl as arylsulfonyl substituted with one or more substituents, 318750 122 200804250 A lower alkyl carbonylthio group substituted with one or more substituents, optionally one or more a substituted lower alkoxycarbonylthio group, optionally an aryloxycarbonylthio group substituted with one or more substituents, optionally substituted with one or more substituents, one or a di-(lower alkyl group) An alkoxysulfonyl group, optionally substituted with one or more substituents, one or a di-(aryl)aminosulfonyl group, optionally substituted with one or more substituents, a lower alkyl group, a lower alkenyl group substituted with one or more substituents, a lower alkynyl group substituted with one or more substituents, optionally a lower alkylcycloalkyl group substituted with one or more substituents, if desired An aryl lower alkyl group substituted with one or more substituents, optionally substituted by one or more Substituted lower alkoxy alkoxy lower alkyl, aryloxy lower alkyl substituted by one or more substituents, optionally substituted with one or more substituents, lower alkyl alkane lower alkane a lower alkyl sulfinyl carbaryl lower alkyl group optionally substituted by one or more substituents, optionally substituted with one or more substituents, a lower alkyl sulfonyl lower alkyl group, Substituting one or more substituents for one or a di-(lower alkyl)amine-based lower alkyl group', if desired, a lower alkyl alkane group substituted with one or more substituents, optionally via one or a lower alkoxycarbonyl group substituted with a plurality of substituents, optionally substituted with one or more substituents, aryloxycarbonyl, 123 318750 200804250 optionally substituted aryl lower alkoxycarbonyl, substituted with one or more substituents, An aminocarbamoyl group substituted with one or more substituents, an amine thiomethicone substituted with one or more substituents, if desired, a lower alkoxylated grass substituted with one or more substituents Sulfhydryl, an aryl lower alkane substituted with one or more substituents as needed Alkyl sulfhydryl, optionally substituted with one or more substituents, or optionally substituted with one or more substituents, may be substituted by formula (1-3) The compound represented by the reaction with a compound represented by the formula (χ) is produced: R'L3 (X) wherein R1-3 is as defined above, and L is a halogen atom (chlorine atom, bromine atom, and iodine atom), sulfonium sulfonate An oxy group, a phenanthrenyloxy group, a toluenesulfonyloxy group, a decyloxysulfonyloxy group, or an ethoxysulfonyloxy group. The reaction is usually carried out in a solvent in the presence of a test. Examples of the solvent used in the reaction include ketones such as acetone, methylethylamine, etc.; aromatic hydrocarbons such as benzene, toluene, xylene, etc.; aliphatic cigarettes, both of which have been burned, and ethers such as diethyl ether. , tetrahydrofuran, 1,4-dicyclopentane = methoxyacetamidine, 12-diethoxyethyl bromide, etc.; halogenated hydrocarbons such as chlorobenzene - chlorobenyl; nitriles such as acetonitrile; aprotic Sexual polar solvents such as N,N-dimethylamine, N,N dimethyl ethanoamine, buckyrone, 1,3 -didecyl imidazolidinone, disulfoxide, etc. 318750 124 200804250 Examples of the base used in the reaction include alkali metal or alkaline earth metal hydroxides such as sodium hydroxide, potassium hydroxide, calcium hydroxide and the like; alkali metal or alkaline earth metal hydrides such as sodium hydride, potassium hydride, calcium hydride Etc.; alkali metal or alkaline earth metal oxalates such as sodium carbonate, potassium carbonate, etc.; metal alkoxides such as sodium ethoxide, sodium alkoxide, etc.; organic lithium such as n-butyl lithium, diisopropyl guanamine, and organic Tests such as triethylamine, sigma, 〗 〖, $ _ bis bicyclo [n 〇] eleven carbon women. When the reactants are in a liquid state under the reaction conditions, each of the reactants may be used in excess in the reaction. However, in general, the compound represented by the formula (1_3) is based on the compound represented by the formula (X), and the ratio of the compound represented by the formula (X) is from i to 4 mol, and the amount of the base is from 1 to 4 mol. The reaction temperature is usually from 150 to 150. The range of hydrazine, the reaction time is usually in the range of from 0.1 hour to 100 hours. After the completion of the reaction, the compound represented by the formula (IV) can be separated by performing the post-stage, /, such as by solvent extraction by pouring the reaction mixture into water, and dehydrating and concentrating the organic layer. The isolated compound can be recrystallized, f-column chromatography, method 7 〆, ,, %. In the compound (I), the compound represented by the formula (IV)··

(1-6) 其中R2、R7及Q係如前文定義， R1 4為氫原子， 318750 125 200804250 曱驢基， 氰基， 視需要經一個或多個取代基取代之低碳烧基’ 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之低碳環烷基， 視需要經一個或多個取代基取代之芳基低碳烷基， 視需要經一個或多個取代基取代之芳基， 視需要經一個或多個取代基取代之低碳烷氧基低碳烷基， 視需要經一個或多個取代基取代之芳氧基低碳烷基， 視需要經一個或多個取代基取代之一-或二-(低碳烷基）胺 基低碳烧基’ 視需要經一個或多個取代基取代之低碳烷醯基， 視需要經一個或多個取代基取代之低碳烷氧羰基， 視需要經一個或多個取代基取代之芳氧羰基， 視需要經一個或多個取代基取代之芳基低碳烷氧羰基， 視需要經一個或多個取代基取代之胺基曱醯基， 視需要經一個或多個取代基取代之胺硫曱醯基， 視需要經一個或多個取代基取代之低碳烷氧基草醯基， 視需要經一個或多個取代基取代之芳基低碳烷氧基草醯 基， 視需要經一個或多個取代基取代之芳氧基草醯基， 視需要經一個或多個取代基取代之胺基草醯基， 視需要經一個或多個取代基取代之低碳烷氧基， 126 318750 200804250 視需要經一個或多個取代基取代之芳氧基， 視需要經-個或多個取代基取代之芳基低碳烧氧基，或 視需要經一個或多個取代基取代之胺基， A1為由OR3(其中R3係如前文定義）或nrSr6(其中R5 及R6係如前文定義）所表示之基團， R7中之-者為由-SOW所表示之基團（其巾zl為視需 要經-個或多個i原子取代之低魏基、視f要經一個或 多個鹵原子取代之低碳烯基、視需要經_個或多個函原子 取代之低碳炔基、苯基、或芳香族雜環基），以及 p為0至3之整數， 可經由使化合物（XI):(1-6) wherein R2, R7 and Q are as defined above, R1 4 is a hydrogen atom, 318750 125 200804250 fluorenyl, cyano, a low-carbon alkyl group substituted by one or more substituents as needed a lower alkenyl group substituted with one or more substituents, optionally a lower alkynyl group substituted with one or more substituents, optionally substituted with one or more substituents, if desired, An aryl lower alkyl group substituted with one or more substituents, optionally an aryl group substituted with one or more substituents, optionally a lower alkoxy alkoxy lower alkyl group substituted with one or more substituents, If desired, an aryloxy lower alkyl group substituted with one or more substituents, optionally substituted with one or more substituents, one or a di-(lower alkyl)amine based low carbon alkyl group, as needed a lower alkyl alkane group substituted with one or more substituents, optionally a lower alkoxycarbonyl group substituted with one or more substituents, optionally an aryloxycarbonyl group substituted with one or more substituents, optionally An aryl lower alkoxycarbonyl group substituted with one or more substituents, optionally An amine sulfhydryl group substituted with a plurality of substituents, an amine thioindenyl group substituted with one or more substituents, if desired, a lower alkoxy alkoxy fluorenyl group substituted with one or more substituents, An aryl lower alkoxyoxalinyl group optionally substituted with one or more substituents, optionally substituted with one or more substituents, substituted with one or more substituents, optionally substituted with one or more substituents Aminoglycine, a lower alkoxy group substituted with one or more substituents as desired, 126 318750 200804250 An aryloxy group optionally substituted with one or more substituents, optionally one or more a substituent substituted aryl lower alkoxy group, or an amine group optionally substituted with one or more substituents, A1 being defined by OR3 (wherein R3 is as defined above) or nrSr6 (wherein R5 and R6 are as defined above) The group represented by R7 is a group represented by -SOW (the towel zl is a low-wei group substituted by one or more i atoms as needed, and one or more a lower alkenyl group substituted with a halogen atom, a lower alkynyl group substituted by _ or more functional atoms, Group, or an aromatic heterocyclic group), and p is an integer of 0 to 3, via the compound (XI):

z1及P係如前文定義 其中 R1-4、R2、R7、Q、A1 接受氧化反應而製造。 反應通常係於氧化劑存在下於溶劑中進行。 反應使用之溶劑之實例包括如 酮等；芳香族烴類諸如苯、甲苯、二 土 土 ^^ ^ ^ —甲本等，脂肪族烴類 ^如二、庚垸等；醚類諸如四氫 二r:乙烧、二乙氧基乙烧等；“烴類諸 ^本、二氯料；腈類諸如乙腈等；有機酸諸如 乙酸等，非質子性極性溶劑諸如 - -田盆r. ，以—甲基甲醯胺、N N- —甲基乙酏胺、曱基_2_吡咯啶酮 ，一甲基咪唾琳酮 318750 127 200804250 等，水，及其混合物。 反應中使用的氧化劑之實例包括間_氯過苯甲酸、及過 氧化物類諸如過氧化氫等。 以1莫耳式（XI)表示之化合物為基準，氧化劑之用量 比例通常為1至1 · 5莫耳。 /反應溫度通常於_78。0至150t:之範圍，反應時間通常 係於0· 1小時至1 〇〇小時之範圍。 於反應元成後，式（1_6)表示之化合物可經由執行後處 理程序而分離，諸如經由將反應混合物倒入水中，以有機 /合;=1丨十取，及脫水及濃縮有機層而分離。分離的式（1_6)表 示之化合物可藉再結晶、管柱層析術等進—步純化。 方法8 化合物（I)中，式（1_7)表示之化合物：Z1 and P are as defined above, wherein R1-4, R2, R7, Q, and A1 are produced by an oxidation reaction. The reaction is usually carried out in a solvent in the presence of an oxidizing agent. Examples of the solvent used for the reaction include, for example, a ketone or the like; aromatic hydrocarbons such as benzene, toluene, di-methane, and the like, aliphatic hydrocarbons such as di-, g-, and the like; and ethers such as tetrahydrogen. r: Ethylene, diethoxyethane, etc.; "hydrocarbons, dichlorobenzenes; nitriles such as acetonitrile; organic acids such as acetic acid, etc., aprotic polar solvents such as - the basin r. - methyl carbamide, N N - methyl acetamide, decyl -2-pyrrolidone, monomethyl methalin 318750 127 200804250, etc., water, and mixtures thereof. Examples include m-chloroperbenzoic acid, and peroxides such as hydrogen peroxide, etc. The oxidizing agent is usually used in an amount of from 1 to 1.5 mTorr based on the compound represented by the formula (XI). The temperature is usually in the range of _78. 0 to 150 t: and the reaction time is usually in the range of from 0.1 hour to 1 hour. After the reaction element is formed, the compound represented by the formula (1-6) can be subjected to a post-treatment procedure. Separation, such as by pouring the reaction mixture into water, organic/combination; = 1 丨 10, and dehydrated and concentrated The organic layer is separated and separated. The isolated compound represented by the formula (1-6) can be further purified by recrystallization, column chromatography, etc. Method 8 In the compound (I), the compound represented by the formula (1-7):

1-4 以及 R中之-者為由-scvz1所表示之基團（其中以為 要經一個或多個#原子取代之低碳燒基、視需要娘一個: 多個i原子取代之低碳稀基、視需要經—個或多個㈣子 取代之低碳炔基、苯基、或芳香族雜環基）， 可經由使式（XII)表示之化合物： 318750 128 2008042501-4 and R are those represented by -scvz1 (wherein a low-carbon alkyl group to be substituted by one or more # atoms, as needed): a low-carbon thinner substituted with a plurality of i atoms a compound represented by the formula (XII), which may be a compound represented by the formula (XII): 318750 128 200804250, which may be substituted with one or more (four) sub-substituted lower alkynyl groups, phenyl groups or aromatic heterocyclic groups.

接文乳化反應而製造。 Q及p係如前文定義 以及 =常係於氧化劑存在下於溶。 m之溶劑之實例包㈣類諸如 酮4，方香族烴類諸如苯、甲苯、 i乙基 諸如己烧、纽等；_類諸脂肪族烴類 % #诺如乙醚、四氫呋 烷、U·二甲氧基乙烷、u_:乙氧基 ，：J: 如氯仿、氯苯、二氣苯等.浐斗 70、，*匕烴類諸 一 寺，腈類诸如乙腈等；有機酸諸如 乙酸等，·非質子性極性溶劑諸如 - -田喊… ，—甲基甲酿胺、N，N-It is manufactured by emulsification reaction. Q and p are as defined above and are often dissolved in the presence of an oxidizing agent. Examples of the solvent of m include (4) such as ketone 4, scented hydrocarbons such as benzene, toluene, iethyl such as hexanol, ruthenium, etc.; _ aliphatic hydrocarbons such as No. ether, tetrahydrofurane, U. dimethoxyethane, u_: ethoxy, : J: such as chloroform, chlorobenzene, dioxene, etc., hopper 70, * 匕 hydrocarbons, a temple, nitriles such as acetonitrile, etc.; organic acids Such as acetic acid, etc., aprotic polar solvents such as - - Tian shout ..., - methyl ammine, N, N-

一甲土酉遊月女、I -甲基-2_°比口各tr定酮、1 3 -田f L 等；水；及其混合物。 H甲㈣唾仙 &quot;反應中使用的氧化劑之實例包括間-氯過苯甲酸 氧化物類諸如過氧化氫等。 以1莫耳式（XII)表示之化合物為基準，氧化劑之用旦 比例通常為2至1 〇莫耳。 里 ^反應温度通常於-78°c至15(TC之範圍，反應時間通常 係於0· 1小時至100小時之範圍。 於反應完成後，式（1-7)表示之化合物可經由執行後處 理程序而分離，諸如經由將反應混合物倒入水中，以有機 溶劑萃取，及脫水及濃縮有機層而分離。分離的式（〗_7)表 318750 129 200804250 示之化合物可藉再結晶、管柱層析術等進一步純化。 方法9 化合物（I)中，式（1-8)表示之化合物：A scorpion, a female, I-methyl-2_°, a specific ketone, a 1,3-n-f, etc.; water; and a mixture thereof. Examples of the oxidizing agent used in the reaction include m-chloroperbenzoic acid oxides such as hydrogen peroxide and the like. Based on the compound represented by 1 mol (XII), the ratio of the oxidizing agent is usually 2 to 1 mol. The reaction temperature is usually in the range of -78 ° C to 15 (TC), and the reaction time is usually in the range of 0.1 hour to 100 hours. After the completion of the reaction, the compound represented by the formula (1-7) can be subjected to execution. Separation by treatment, such as by pouring the reaction mixture into water, extracting with an organic solvent, and dehydrating and concentrating the organic layer to separate. The separated formula (〗 _7) Table 318750 129 200804250 The compound can be recrystallized, column layer Further purification by precipitation, etc. Method 9 In the compound (I), the compound represented by the formula (1-8):

其中X、R2、R7、A、Q及m係如前文定義，以及 R1—5為視需要經一個或多個取代基取代之低碳烷基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之低碳環烷基， 視需要經一個或多個取代基取代之芳基低碳烷基， 視需要經一個或多個取代基取代之芳基， 視需要經一個或多個取代基取代之低碳烷氧基低碳烷基， 視需要經一個或多個取代基取代之芳氧基低碳烷基， 視需要經一個或多個取代基取代之低碳烷硫基低碳烷基， 視需要經一個或多個取代基取代之低碳烷基亞磺醯基低碳 烧基， 視需要經一個或多個取代基取代之低碳烷基磺醯基低碳烷 基， 視需要經一個或多個取代基取代之一-或二-(低碳烷基）胺 基低碳烷基， 視需要經一個或多個取代基取代之低碳烷氧基， 視需要經一個或多個取代基取代之芳氧基， 130 318750 200804250 視需要經-個或？個取代絲狀芳絲碳烧氧基 視需要經一個或多個取代基取代之胺基，或 視需要經一個或多個取代基取代之雜環基， 可經由使式（XIII)表示之化合物：Wherein X, R2, R7, A, Q and m are as defined above, and R1-5 is a lower alkyl group optionally substituted by one or more substituents, optionally substituted by one or more substituents as desired a carboxyalkenyl group, a lower alkynyl group substituted by one or more substituents, optionally a lower alkylcycloalkyl group substituted with one or more substituents, optionally substituted with one or more substituents. a lower alkyl group, optionally substituted with one or more substituents, optionally substituted with one or more substituents, a lower alkoxy lower alkyl group, optionally substituted with one or more substituents An aryloxy lower alkyl group, optionally substituted with one or more substituents, a lower alkylalkylthioalkylene group, optionally substituted with one or more substituents, a lower alkyl sulfinyl group a carbon-alkyl group, a lower alkyl sulfonyl lower alkyl group substituted with one or more substituents, optionally substituted with one or more substituents, one or a di-(lower alkyl)amine a lower alkoxy group, a lower alkoxy group substituted with one or more substituents as needed, optionally One or more substituents substituted with an aryloxy group, 130 318750 200804250 Depending on the need - or? a substituted filamentous aryl silk carbon alkoxy group may be a compound represented by the formula (XIII), if desired, an amine group substituted with one or more substituents, or a heterocyclic group substituted with one or more substituents as necessary :

其中R2、R7、A、瓜及R1·5係如前文定義， 與式（XIV)表示之化合物反應而製造： (T^L3 (XW) 其中=及Q係如前文定義，以及 2、函原子(氯原子、溴原子及碘原子)。 Μ通常係於鹼存在下於溶劑中進行。 反應使用之溶劑之實例包括 : 酉同等；芳香族烴類諸如苯、甲苯、^=丙_、甲基乙基 諸如己院、庚统f等；脂肪族經» 烷、1，2-二甲氧基乙统、二 四風咬喃、1，4-二噚 如氯仿、氯苯、二氣苯等；腈類：：乙：等；齒化烴•諸 性溶劑諸如N，N_二甲基甲酿胺：n，二腈等；非質子性核 及其混合物。，--甲基味唾杯二甲亞硬等，·水曱 反應中使用的鹼之實例 4 物諸如氫氧化納化 *孟屬或鹼土金屬氫氧化 ^化钟、氫氧化”；驗金屬或= 318750 131 200804250 金屬氫化物諸如氫化納、氫化卸、氫化_等；驗金屬或驗 土金屬碳酸鹽諸如碳酸鈉、碳酸鉀等；鹼金屬醇化物啫如 乙醇納、甲醇納等；有機鐘諸如正丁基鋰、二異丙基醯胺 鋰等；及有機鹼類諸如三乙基胺、吡啶、M_:吖雙環d 十一碳-7-細'等。 當反應劑於反應條件下為液態時，各反應劑可過量用 於反應。但通常’幻莫耳式（ΧΙΙΙ)表示之化合物為基準， 式（XIV)表示之化合物之用量比例為i至4莫耳，及鹼之用 量比例為1至4莫耳。 /反應溫度通常於_78ts 15(rc之範圍，反應時間通常 係於0· 1小時至200小時之範圍。 於反應完成後，式㈣表示之化合物可經由執行後處 2程序而分離，諸如經由將反應混合物倒入水中，以有機 :谷J竿取及脫水及》辰縮有機層而分離。分離的式（u)表 不之化合物可藉再結晶、管柱層析術等進一步純化。 方法10 化合物（I)中，式（1_9)所表示之化合物： Λ ㈣ i1·6 A2 (I^&gt; A2 其中R2、R7及Q係如前文定義， R1 6為視需要經一個或多個取代基取代之低碳烷基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 132 318750 200804250 視需要經一個或多個取代基取代之低碳環烷基， 視需要經一個或多個取代基取代之芳基低碳烷基， 視需要經一個或多個取代基取代之芳基， 視需要經一個或多個取代基取代之低碳烷氧基低碳烷基 視需要經一個或多個取代基取代之芳氧基低碳烷基， 視需要經一個或多個取代基取代之一_或二兴低碳烷基）胺 基低碳烧基， 視需要經一個或多個取代基取代之低碳烷氧基， 視需要經一個或多個取代基取代之芳氧基， 視需要經一個或多個取代基取代之芳基低碳烷氧基， 視需要經一個或多個取代基取代之胺基，或 視需要經一個或多個取代基取代之雜環基， ,A2為NR5R6表示之基團（其中以及R6係如前文定 義），以及 m為1至5之整數， 可經由使式（XV)表示之化合物：Wherein R2, R7, A, melon and R1·5 are as defined above, and are produced by reacting with a compound represented by formula (XIV): (T^L3 (XW) wherein = and Q are as defined above, and 2, a functional atom (chlorine atom, bromine atom and iodine atom). The hydrazine is usually carried out in a solvent in the presence of a base. Examples of the solvent used in the reaction include: hydrazine equivalent; aromatic hydrocarbons such as benzene, toluene, ^=propyl _, methyl Ethyl group such as hexanyl, Gengtong f, etc.; aliphatic by alkane, 1,2-dimethoxyethane, di-four wind-biting, 1,4-dioxyl such as chloroform, chlorobenzene, di-benzene, etc. Nitrile: B: Etc.; Toothed hydrocarbons • Solvents such as N,N-dimethylamine: n, dinitrile, etc.; aprotic nucleus and mixtures thereof.,--methyl scented cup Dimethyl sulfite, etc., examples of the base used in the hydrazine reaction, such as hydride hydride *monitor or alkaline earth metal oxyhydroxide, hydrogenation"; metal test or = 318750 131 200804250 metal hydride such as Sodium hydride, hydrogenation, hydrogenation, etc.; metal or soil test metal carbonates such as sodium carbonate, potassium carbonate, etc.; alkali metal alkoxides such as ethanol, A An alcoholic acid or the like; an organic clock such as n-butyllithium, lithium diisopropylguanidinium or the like; and an organic base such as triethylamine, pyridine, M_: anthracene bicyclo d-undec-7-fine', etc. When the agent is in a liquid state under the reaction conditions, each reactant may be used in excess for the reaction, but usually the compound represented by the formula (XIV) is used as a reference, and the compound represented by the formula (XIV) is used in an amount of from i to 4 mol. The ratio of the base to the base is 1 to 4 moles. The reaction temperature is usually in the range of _78ts 15 (rc, and the reaction time is usually in the range of 0.1 hour to 200 hours. After the reaction is completed, the formula (4) is expressed. The compound can be isolated via the post-execution 2 procedure, such as by pouring the reaction mixture into water, separating the organic layer by organic extraction and dehydration and the organic layer. The isolated compound of formula (u) can be borrowed. Further purification by recrystallization, column chromatography, etc. Method 10 In the compound (I), the compound represented by the formula (1-9): Λ (4) i1·6 A2 (I^&gt; A2 wherein R2, R7 and Q are as described above Definition, R1 6 is a lower alkyl group substituted by one or more substituents as needed, as needed a lower alkenyl group substituted with one or more substituents, preferably a lower alkynyl group substituted with one or more substituents, 132 318750 200804250, if desired, substituted with one or more substituents, a lower alkylcycloalkyl group, An aryl lower alkyl group substituted with one or more substituents, optionally an aryl group substituted with one or more substituents, optionally substituted with one or more substituents, a lower alkoxy alkane lower alkane The aryloxy lower alkyl group substituted with one or more substituents, optionally substituted with one or more substituents, one or more di-lower alkyl) amine based low carbon alkyl groups, as needed a lower alkoxy group substituted by one or more substituents, optionally an aryloxy group substituted with one or more substituents, optionally substituted with one or more substituents, an aryl lower alkoxy group, An amine group substituted with one or more substituents, or a heterocyclic group substituted with one or more substituents as required, A2 is a group represented by NR5R6 (wherein and R6 is as defined above), and m is An integer from 1 to 5, which can be represented by the formula (XV) :

其中 R1·6、R2、R7、 、Q及m係如前文定義，以及 L4為鹵原子（氯原子、溴原子及碘原子）， 與式（XVI)表示之化合物反應而製造： L &amp; ώ ]S SL· ( #τ (XVI) 其中A2係如前文定義。 318750 133 200804250 常係於驗存在下於溶劑中進行。 an等夭：谷劑之實例包括酮類諸如丙，、曱基乙美 酮#，方香族烴類諸如笨、 丫丞乙基 諸如己烧、庚燒等； &amp;-曱苯等；脂肪族烴類 α , 、貝居如乙趟、四氫吱响、1 4- - Γί口口 烷、1,2-二甲氧基乙烷、12_ ;夫南% 如氣仿、氯苯、一氣装耸’.味基乙烷等；鹵化烴類諸 —乳本寺，腈類諸如乙腈 性溶劑諸如N，N-二曱美ψ ^ ^ χ ' 、子性極 基挪咬酮、&quot;甲甲:^^ 及其混合物。二甲亞石風等；水； 反應：使用的驗之實例包括驗金屬或驗土金屬氯氧化 入化納、氫氧化鉀、氫氧化_等；驗金屬或驗土 二ft諸如氫化鈉、氫化鉀、氫化鈣等;鹼金屬或鹼 ^蜀石厌酸鹽諸如錢納、㈣鉀等；鹼金屬醇化 =納、甲醇納等’·有额諸如正丁基鐘、二異丙基酿胺 鋰寺，及有機驗類諸如三乙基胺、Wherein R1·6, R2, R7, Q and m are as defined above, and L4 is a halogen atom (chlorine atom, bromine atom and iodine atom) which is produced by reacting with a compound represented by the formula (XVI): L &amp; ]S SL· ( #τ (XVI) where A2 is as defined above. 318750 133 200804250 is usually carried out in a solvent in the presence of an experiment. An isometric: examples of cereals include ketones such as C, and mercapto Ketone #, Fangxiang hydrocarbons such as stupid, oxime ethyl such as hexane, heptane, etc.; &amp; - benzene, etc.; aliphatic hydrocarbons α, , Beiju, such as acetamidine, tetrahydroanthraquinone, 1 4 - - Γί口口, 1,2-dimethoxyethane, 12_; Funan% such as gas imitation, chlorobenzene, one gas-loaded '. styrene ethane, etc.; halogenated hydrocarbons - 乳本寺, nitrile Such as acetonitrile solvents such as N, N-dioxin ψ ^ ^ χ ', sub-radical ketones, &quot;甲甲:^^ and mixtures thereof. dimethyl sulphide; water; reaction: use Examples of the test include metal or soil metal chlorine oxidation into sodium, potassium hydroxide, hydroxide _, etc.; metal or soil test two ft such as sodium hydride, potassium hydride, calcium hydride, etc.; alkali metal Alkali 蜀 厌 厌 诸如 诸如 钱 钱 、 ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 Amine

十一碳-7-稀等。 J 當反應劑於反應條件下為液態時，各反應劑可過量用 於反應。但通常，以！莫耳式（χν)表示之化合物為基準， 式（謂)表示之化合物之用量比例為莫耳，及驗之用 量比例為1至4莫耳。 ，反應溫度通常於-78χ：至150V之範圍，反應時間通常 係於0· 1小時至200小時之範圍。 於反應完成後，式（1-9)表示之化合物可經由執行後處 理程序而分離，諸如經由將反應混合物倒入水中，以有^ 318750 134 200804250 溶劑萃取，及脫水及濃縮有機層而分離。分離的式（U)表 示之化合物可藉再結晶、管柱層析術等進一步純化。 式（XV)表示之化合物可藉由方法（9)、參考方法2或參 考方法3之方法或其修改方法製造。 接著將說明化合物（1)製造中所使用的中間化合 製法。 參考方法1 式（IX)表示之化合物可經由使式（χνιι)表示之化人 物： °Eleven carbon-7-thin. J When the reactants are in a liquid state under the reaction conditions, each of the reactants may be used in excess in the reaction. But usually, to! The compound represented by Moer's formula (χν) is used as a reference, and the ratio of the compound represented by the formula (say) is Mohr, and the ratio of use is 1 to 4 moles. The reaction temperature is usually in the range of -78 Torr: to 150 V, and the reaction time is usually in the range of from 0.1 hour to 200 hours. After completion of the reaction, the compound represented by the formula (1-9) can be isolated by performing a post-treatment procedure, such as by pouring the reaction mixture into water, extracting with a solvent of 318750 134 200804250, and dehydrating and concentrating the organic layer. The isolated compound of the formula (U) can be further purified by recrystallization, column chromatography or the like. The compound represented by the formula (XV) can be produced by the method (9), the reference method 2 or the method of the reference method 3 or a modification thereof. Next, the intermediate chemical synthesis method used in the production of the compound (1) will be explained. Reference Method 1 The compound represented by the formula (IX) can be expressed by the formula (χνιι): °

(XV m 其中Q及R1-2係如前文定義， 氯硫幾基化劑反應而(XV m wherein Q and R1-2 are as defined above, and the chlorothio grouping agent reacts

與三烷基氯矽烷、及氯羰基化劑或 造。 反應通常係於鹼存在下於溶劑中進行。 反溶劑之實例包括_諸如丙酮、甲基 =己ΓΓΓ諸如苯、甲苯、二甲苯等；脂肪族煙類 诸如己烷、庚烷等；醚義 烷、1，2_二曱氧基乙烷、i :气美四氫呋喃、α二’ 如氯仿、氯苯、二氯苯等，;二=乙燒等；化烴類諸 性溶劑諸如如乙猜等；非質子性極 基—酮、ΰ曱二胺^ 及其混合物。 “唑啉_、二甲亞砜等；水； 反應中使用的驗之實例包括驗金屬或驗土金屬氮氧化 318750 135 200804250 物諸如氫氧化鈉、氫氧化鉀、氫氧化鈣等；於 金屬氫化物諸如氫化鈉、氫化鉀、氫化鈣等或鹼土 土金屬碳酸鹽諸如碳咖、碳酸鉀等；驗金屬或驗 乙醇鈉、甲醇鈉等；有機鋰諸如 :啫如 ，及有機驗類諸如三乙基胺、二基i:二 十-碳-7-烯等。 丫又祁.4.0] 反應中使用之三絲氯料化合物之實例包括 氯矽烷及三乙基氯矽烷。 土 〃反應巾使狀氯㈣化狀實例包括錢、氯甲酸三 氯甲酯、及碳酸貳（三氯甲基）酯。 反應中使用之氯硫羰基化劑之實例包括硫光氣。 通常，以1莫耳式（XVII)表示之化合物為基準，三烷 基氯發炫之用量比例為！至4莫耳，氯幾基化劑或氯硫幾 基化角彳之用里比例為1至4莫耳’及驗之用量比例為1至 4莫耳。 反應溫度通常於_78。〇至150°C之範圍，反應時間通常 係於0· 1小時至200小時之範圍。 於反應完成後，式（IX)表示之化合物可經由執行後處 理程序而分離’諸如藉濃縮反應混合物本身而分離。所分 離之式（IX)表示之化合物可未經純化即用於次一步驟。 參考方法2 式（XIII)表示之化合物： HN^N&quot; i2 (XJE) 318750 136 200804250 其中R2、R7、A、m&amp;RM係如前文定義， 可經由使式（XVIII)表示之化合物：And trialkyl chlorodecane, and chlorocarbonylating agent or made. The reaction is usually carried out in a solvent in the presence of a base. Examples of the anti-solvent include, for example, acetone, methyl = hexane such as benzene, toluene, xylene, etc.; aliphatic tobaccos such as hexane, heptane, etc.; ether alkylene, 1,2-dimethoxyethane, i: qimei tetrahydrofuran, α2' such as chloroform, chlorobenzene, dichlorobenzene, etc.; 2 = Ethylene, etc.; hydrocarbons such as B., etc.; aprotic polar group - ketone, bismuth Amines ^ and mixtures thereof. "Zazoline _, dimethyl sulfoxide, etc.; water; examples of tests used in the reaction include metal or soil test metal nitridation 318750 135 200804250 substances such as sodium hydroxide, potassium hydroxide, calcium hydroxide, etc.; Such as sodium hydride, potassium hydride, calcium hydride or the like or alkaline earth metal carbonate such as carbon coffee, potassium carbonate, etc.; metal or sodium ethoxide, sodium methoxide, etc.; organic lithium such as: for example, and organic tests such as three Base amine, diyl i: icos-carbon-7-ene, etc. 丫和祁.4.0] Examples of the trifilament chlorine compound used in the reaction include chlorodecane and triethylchlorodecane. Examples of the chlorine (tetra) form include money, trichloromethyl chloroformate, and cesium carbonate (trichloromethyl) ester. Examples of the chlorothio carbonylating agent used in the reaction include sulphur phosgene. Usually, it is 1 molar ( The compound represented by XVII) is based on the ratio of trialkyl chloride to lightening! to 4 moles, and the ratio of chlorine to chlorinating agent or chlorosulfanyl keratin is 1 to 4 moles. The ratio is from 1 to 4 moles. The reaction temperature is usually in the range of _78. 〇 to 150 °C. The reaction time is usually in the range of from 0.1 hour to 200 hours. After completion of the reaction, the compound represented by the formula (IX) can be isolated by performing a post-treatment procedure, such as separation by concentration of the reaction mixture itself. The compound represented by IX) can be used in the next step without purification. Reference Method 2 Compound represented by the formula (XIII): HN^N&quot; i2 (XJE) 318750 136 200804250 wherein R2, R7, A, m&amp; As defined above, a compound represented by the formula (XVIII) can be used:

-(R7)阳 (X^II) 其中R2、R7、A及m係如前文定義， 與式（XIX)表示之化合物反應而製造： I^N-R1’5 (XIX) 其中R1 5係如前文定義。 反應通常係於鹼存在下於溶劑中進行。 反應使用之溶劑之實例包括嗣類諸如丙嗣、甲基乙基 =等；芳香族烴類諸如苯、曱苯、二f苯等；脂肪族煙類 :如己烧、庚烧等；鱗類諸如乙喊、四氫怜认二嘴 文元、1，2-二曱氧基乙烷、 ， 一乙虱基乙烷等；鹵化烴類諸 如氣仿、氣本、二氯装輩·味絲 ^寻，腈痛啫如乙腈等；非質子性極 哺如N，N-二甲基甲酿胺、⑽·二甲基乙酸胺、“甲 了酮、U_二甲基咪蝴、 及其混合物。 反應中使用的驗之實你丨白把孟人 物^包括驗金屬或驗土金屬氫氧化 全屬納、氫氧化鉀、氫氧化_等；驗金屬或驗土 諸如氯化納、氫化钾、氯化詞等；驗金屬或驗 土金屬碳酸鹽諸如碳酸鈉、 欢 r X, . m ^ 厌黾鉀寺，鹼金屬醇化物諸如 乙知納、甲醇納有⑽諸如正丁 _ 鋰等;及有機鹼類諸如三乙基 二、’ -兴丙基㈣ 十1 基H疋丫雙環[5.4.0] 318750 137 200804250 通蓽，以1莫耳式（XVHJ)表示之化合物為基準，式 (XIX)表示之化合物之用量比例為i至6莫耳，及鹼之用量 比例為1莫耳至過量。 /反應溫度通常於-听至15(rc之範圍，反應時間通常 係於0· 1小時至200小時之範圍。 乂於反應元成後，化合物（ΧΠΙ)可經由執行後處理程序而 分離，諸如經由將反應混合物倒入水中，以有機溶劑萃取， 及脫水及濃縮有機層而分離。分離的化合物（xm)可藉再結 晶、管柱層析術等進一步純化。所分離之化合物（χιιι)可 經純化即用於次一步驟。 參考方法3 式（XVIII)表示之化合物：-(R7)阳(X^II) wherein R2, R7, A and m are as defined above and are reacted with a compound represented by formula (XIX) to produce: I^N-R1'5 (XIX) wherein R1 5 is as Defined above. The reaction is usually carried out in a solvent in the presence of a base. Examples of the solvent to be used in the reaction include anthraquinones such as propylene, methyl ethyl group, etc.; aromatic hydrocarbons such as benzene, toluene, di-f-benzene, etc.; aliphatic tobaccos such as hexanol, gamma, etc.; Such as B shouting, tetrahydro peculiar sip, 1,2-dimethoxy ethane, monoethyl ethane, etc.; halogenated hydrocarbons such as gas, gas, dichloro prestige ^Search, nitrile pain such as acetonitrile, etc.; aprotic polar feeding such as N, N-dimethylmethanamine, (10) dimethylacetamide, "methyl ketone, U_ dimethyl amide, and Mixture. The test used in the reaction is to check the character of the monk, including the metal or soil test metal hydroxide, potassium hydroxide, hydroxide, etc.; metal or soil test such as sodium chloride, potassium hydride , chlorination words, etc.; metal or soil test metal carbonates such as sodium carbonate, Huan r X, . m ^ 黾 黾 potassium temple, alkali metal alkoxides such as sodium, sodium methoxide (10) such as n-butyl lithium; And an organic base such as triethyl bis, '- propyl (tetra) 1,4- 1 H 疋丫 bicyclo [5.4.0] 318750 137 200804250 荜, a compound expressed in 1 mol (XVHJ) The reference formula (XIX) represents a compound in an amount of from i to 6 mol, and the base is used in a ratio of from 1 mol to an excess. / The reaction temperature is usually in the range of - 15 (rc), and the reaction time is usually 0. 1 hour to 200 hours. After the reaction, the compound (ΧΠΙ) can be separated by performing a post-treatment procedure, such as by pouring the reaction mixture into water, extracting with an organic solvent, and dehydrating and concentrating the organic layer. The isolated compound (xm) can be further purified by recrystallization, column chromatography, etc. The isolated compound (χιιι) can be purified and used in the next step. Reference method 3 Compound represented by formula (XVIII) :

其中R2、R7、Α及m係如前文定義， 可經由使式（VIII)表示之化合物：Wherein R 2 , R 7 , Α and m are as defined above, and may be represented by a compound represented by formula (VIII):

其中A、R2、r7及m係如前文定義， 與氯羰基化劑反應而製造。 反應通常係於驗存在下於溶劑中進行。 、曱基乙基 脂肪族煙類 a反應使用之溶劑之實例包括酮類諸如丙酮 酮等；芳香族烴類諸如苯、甲苯、二 + 318750 138 200804250 諸如己烷、庚烷等；醚類嗜士 %々.者如乙醚、四 烷、1，2_二甲氧基乙烷、！，2_二 飞夭南1&gt;4—口专 如备/女 片&amp; 乳基乙垸等；鹵化烴類爷 如軋仿、虱苯、二氣苯等；赔 喊啫 性溶劑啫如N N - ψ其φ 〜=乙腈等；非質子性極 a 胺，二甲基乙醯胺、“甲 及其混合物。 ㈣、二f等；水； 反應中使用的驗之實你丨^j k &amp; 貝例包括鹼金屬或鹼土金屬氫氧化 物諸如氫氧化納、氫氧化麵、_ # 金屬氫化物諸如氫化納、氫化：：氫:：等鹼=或驗土 土金屬碳酸鹽諸如碳酸納、碳酸 丄屬知金屬或驗 ^ 厌0夂鲆寺，驗金屬醇化物諸如 乙醇納、甲醇納等，·有機鐘諸如正 妳及有機驗類諸如三乙基胺、_、l58‘雙== 十一碳-7,烯等。 μ· · .uj 〃反應中使用之氯幾基化劑之實例包括光氣、氯甲酸三 氣甲酯、及碳酸家（三氯甲基）酯。 通苇以1莫耳式（VI11)表示之化合物為基準，氯羰基 化劑之用量比例為1至4莫耳，及驗之用量比例為1至4 莫耳。 反應溫度通常於-78。(：至180。〇之範圍，反應時間通常 係於0.1小時至200小時之範圍。 於反應完成後，式（XVIII)表示之化合物可經由執行後 處理程序而分離，諸如藉濃縮反應混合物本身而分離。所 分離之式（XVIII)表示之化合物可未經純化即用於次一步 驟。 318750 139 (XV) 200804250 參考方法4 式（xv)表示之化合物Wherein A, R2, r7 and m are as defined above and are produced by reaction with a chlorocarbonylating agent. The reaction is usually carried out in a solvent in the presence of a test. Examples of the solvent used for the reaction of the mercaptoethyl aliphatic cigarette a include ketones such as ketone, etc.; aromatic hydrocarbons such as benzene, toluene, di + 318750 138 200804250 such as hexane, heptane, etc.; ethers %々. Such as ether, tetraoxane, 1,2-dimethoxyethane,! , 2_二飞夭南1&gt;4-port-specific preparation/female film &amp; milk-based acetamidine, etc.; halogenated hydrocarbons such as rolling imitation, benzene, dioxane, etc.; compensation for inert solvents such as NN - ψ φ ~ = acetonitrile, etc.; aprotic polar a amine, dimethyl acetamide, "A and its mixture. (4), two f, etc.; water; the use of the reaction in the test you 丨 ^ jk &amp; Examples of shells include alkali metal or alkaline earth metal hydroxides such as sodium hydroxide, hydroxide, _# metal hydrides such as sodium hydride, hydrogenation: hydrogen:: alkali, or soil test metal carbonates such as sodium carbonate, carbonic acid丄 知 know metal or test ^ 夂鲆 0夂鲆 temple, test metal alkoxide such as ethanol, methanol, etc., · organic clocks such as 妳 and organic tests such as triethylamine, _, l58 'double == eleven Carbon-7, alkene, etc. Examples of the chloro grouping agent used in the reaction include phosgene, trimethyl chloroformate, and trimethylol carbonate. The compound represented by Moer's formula (VI11) is used as a reference, and the proportion of the chlorocarbonylating agent is 1 to 4 moles, and the ratio of the amount used is 1 to 4 moles. Usually in the range of -78. (: to 180. 〇, the reaction time is usually in the range of 0.1 hour to 200 hours. After the reaction is completed, the compound represented by the formula (XVIII) can be separated by performing a post-treatment procedure, such as borrowing The reaction mixture is concentrated to isolate itself. The isolated compound of formula (XVIII) can be used in the next step without purification. 318750 139 (XV) 200804250 Reference Method 4 Compound represented by formula (xv)

其中^-、…、…、（^、以及瓜係如前文定義 可經由使式（XX)表示之化合物： (XX) HN 人 N^O&quot;&quot;(R7)m A1-6 A2 L4 其中R1-6、R2、R7、L &amp; m係如前文定義， 與式（XXI)表示之化合物反應而製造： Ο 人 _ 其中Q係如前文定義，以及 L3為*原子(氯原子、溴原子及碘原子)。 反應通常係於鹼存在下於溶劑中進行。 反應使用之溶劑之實例包 酉同等；芳香族烴類諸如苯、甲笑、lb㈣、曱基乙基 諸如己烷、庚烷笨. —曱苯等；脂肪族烴類 烷、二甲氧A乙：賴如乙喊、四㈣、二噚 土 乙义元、1 2 _ 7 如氯仿、氯苯、m .[减乙烧等；虐化烴類諸 性溶劑諸如n，n-二甲美㈣類諸如乙腈等；非質子性極 W相、Γ3 ' N，N•二甲基乙醯胺、1 -甲 及其混合物。…甲基°米唾啉，、二甲亞砜等；水； 318750 140 200804250 反應中使用的鹼之實例包括鹼金屬或鹼土金屬氫氧化 物諸如氳氧化納、氫氧化鉀、氫氧化料；驗金屬或驗土 金屬氫化物諸如氫化納、氫化鉀、氫化財；驗金屬 土金屬碳酸鹽諸如碳酸鈉、碳酸鉀等；鹼金屬醇化物諸如 乙醇鈉、曱醇鈉等；有機鋰諸如正丁基鋰、二異丙基醯胺 鋰等；及有機鹼類諸如二異丙基乙基胺、三乙基胺、吡啶^ 1，8-二吖雙環[5·4·0]十一碳-7-烯等。 當反應劑於反應條件下為液態時，各反應劑可過量用 於反應。但通常，以i莫耳式（χχ)表示之化合物為基準， 式（XXI)表不之化合物之用量比例為i至4莫耳，及鹼之用 量比例為1至4莫耳。 反應溫度通常於-78°c至150°C之範圍，反應時間通常 係於0· 1小時至200小時之範圍。 於反應完成後，式（XV)表示之化合物可經由執行後處 理程序而分離，諸如經由將反應混合物倒入水中，以有機 溶劑萃取，及脫水及濃縮有機層而分離。分離的式（xv)表 示之化合物可藉再結晶、管柱層析術等進一步純化。 參考方法5 式（XX)表示之化合物：Wherein ^-, ..., ..., (^, and melon are as defined above by the compound represented by the formula (XX): (XX) HN Person N^O&quot;&quot;(R7)m A1-6 A2 L4 wherein R1 -6, R2, R7, L &amp; m is as defined above, and is produced by reacting with a compound represented by formula (XXI): Ο human _ wherein Q is as defined above, and L3 is * atom (chlorine atom, bromine atom and Iodine atom) The reaction is usually carried out in a solvent in the presence of a base. Examples of the solvent used in the reaction are equivalent; aromatic hydrocarbons such as benzene, methylamine, lb(tetra), mercaptoethyl such as hexane, heptane are stupid. - Benzene, etc.; aliphatic hydrocarbons, dimethoxy A: Lai Ruyi, Si (4), Dioxin Yiyi, 1 2 _ 7 such as chloroform, chlorobenzene, m. Abusing hydrocarbon solvents such as n, n-dimethyl (4) such as acetonitrile; aprotic polar W phase, Γ 3 'N, N dimethyl acetamide, 1-methyl and their mixtures. Hydrazine, dimethyl sulfoxide, etc.; water; 318750 140 200804250 Examples of the base used in the reaction include alkali metal or alkaline earth metal hydroxides such as cerium oxide, hydrogen hydroxide Potassium, hydroxide; metal or soil metal hydride such as sodium hydride, potassium hydride, hydrogenation; metal oxides such as sodium carbonate, potassium carbonate, etc.; alkali metal alkoxides such as sodium ethoxide, sodium decoxide, etc. ; organic lithium such as n-butyl lithium, lithium diisopropyl guanamine, etc.; and organic bases such as diisopropylethylamine, triethylamine, pyridine^ 1,8-diguanidine bicyclo [5·4· 0] undec-7-ene, etc. When the reactant is in a liquid state under the reaction conditions, each reactant can be used in excess for the reaction, but usually, the compound represented by i-mole (χχ) is used as a reference. XXI) The amount of the compound is from i to 4 moles, and the ratio of the base is from 1 to 4 moles. The reaction temperature is usually in the range of -78 ° C to 150 ° C, and the reaction time is usually 0. The range of 1 hour to 200 hours. After completion of the reaction, the compound represented by the formula (XV) can be isolated by performing a post-treatment procedure, such as by pouring the reaction mixture into water, extracting with an organic solvent, and dehydrating and concentrating the organic layer. Separation. The isolated compound of formula (xv) can be recrystallized, tube Reference tomography etc. The method further purification formula (XX) The compound represented by:

其中R2、R7、L4、m及R1·6係如前文定義， 可經由使式（XXII)表示之化合物·· 318750 141 (XXII) 200804250Wherein R2, R7, L4, m and R1·6 are as defined above, and may be represented by the formula (XXII). 318750 141 (XXII) 200804250

ClCl

其中R、R、L4、及m係如前文定義， 與式（XXIII)表示之化合物反應而製造· H2N-R1'6 (XXIII) 其中R1·6係如前文定義。 反應通常係於鹼存在下於溶劑中進行。 反應使用之溶劑之實例包括g同類諸如丙嗣、甲基乙臭 酮等；芳香族烴類諸如苯、甲苯、二甲苯等；脂肪族㈣ 诸如己烷、庚烷等；醚類諸如乙醚、四氫呋喃、n噚 烷：1，2-二甲氧基乙烷、！，二乙氧基乙烷等；_化烴類諸 如氯仿II苯、一氯苯等；腈類諸如乙猜等；非質子性極 性溶劑諸如N，N二曱基甲醯胺、N，N-二甲基乙醯胺、i_甲 基2比嘻欠鋼、n二甲基咪峻琳酮、二甲亞職等；水· 及其混合物。 ’ 反應中使用的驗之實例包括鹼金屬或驗土金屬氯氧化 物諸如氫氧化納、氫氧化鉀、氫氧倾等；驗金屬或驗土 物諸如氫化鈉、氫化鉀、氫化鈣等；鹼金屬或鹼 酸鹽諸如碳㈣、碳酸料；驗金屬醇化物諸如 =納T知納等，有機鐘諸如正丁基鐘、二異丙基酸胺 鐘荨；及有機鹼類諸如三乙基胺、㈣、Μ_:σ丫雙環[5. 十一碳-7-歸等。 通系，以1莫耳式（χχη)表示之化合物為基準，式 (XXIII)表不之化合物之用量比例為工至6莫耳，及鹼之用 318750 142 200804250 量比例為1莫耳至6莫耳。 反應溫度通常於-78工至150。〇之範圍，反應時間通常 係於0.1小時至200小時之範圍。 於反應完成後，式（XX)表示之化合物可經由執行後處 理程序而分離，諸如經由將反應混合物倒入水中，以有機 溶劑萃取，及脫水及濃縮有機層而分離。分離的式（χχ)表 示之化合物可藉再結晶、管柱層析術等進一步純化。所^ 離之式（XX)表示之化合物可未經純化即用於次一 參考方法6 式（XXII)表示之化合物：Wherein R, R, L4, and m are as defined above, and are reacted with a compound represented by the formula (XXIII) to produce H2N-R1'6 (XXIII) wherein R1·6 is as defined above. The reaction is usually carried out in a solvent in the presence of a base. Examples of the solvent used in the reaction include g such as propionate, methyl ethyl ketone, etc.; aromatic hydrocarbons such as benzene, toluene, xylene, etc.; aliphatic (tetra) such as hexane, heptane, etc.; ethers such as diethyl ether, tetrahydrofuran , n decane: 1,2-dimethoxyethane,! , diethoxyethane, etc.; _ hydrocarbons such as chloroform II benzene, monochlorobenzene, etc.; nitriles such as B guess; aprotic polar solvents such as N, N dimethyl carbamide, N, N- Dimethyl acetamide, i_methyl 2 is less than steel, n-dimethyl imiline, dimethyl sub-solic, etc.; water · and mixtures thereof. 'Examples of tests used in the reaction include alkali metal or soil test metal oxychloride such as sodium hydroxide, potassium hydroxide, hydrogen oxygen, etc.; metal or soil test such as sodium hydride, potassium hydride, calcium hydride, etc.; Metal or alkali salt such as carbon (tetra), carbonic acid; metal alkoxide such as = nano T, etc., organic clock such as n-butyl clock, diisopropyl amide oxime; and organic bases such as triethylamine , (four), Μ _: σ 丫 double ring [5. eleven carbon-7-return. The system is based on a compound represented by 1 mol (χχη), the ratio of the compound represented by formula (XXIII) is 6 mol, and the base is 318750 142 200804250. The ratio is 1 mol to 6 Moor. The reaction temperature is usually from -78 to 150. The range of hydrazine, the reaction time is usually in the range of 0.1 hour to 200 hours. After completion of the reaction, the compound represented by the formula (XX) can be isolated by performing a post-treatment procedure, such as by pouring the reaction mixture into water, extracting with an organic solvent, and dehydrating and concentrating the organic layer. The isolated compound of the formula (χχ) can be further purified by recrystallization, column chromatography or the like. The compound represented by the formula (XX) can be used as the compound represented by the formula (XXII) in the next reference method:

其中R2、R7、L4及m係如前文定義， 可經由使式（XXIV)所表示之化合物：Wherein R 2 , R 7 , L 4 and m are as defined above, and the compound represented by the formula (XXIV) can be used:

(XXIV) 其中L·、R、R及m係如前文定義 與氯羰基化劑反應製造。 反應通常係於鹼存在下於溶劑中進行。 反應使用之溶劑之實例包括g同類T 酮等；芳香族烴類諸如苯、ψ笨、二#々、5同、甲基乙基 諸如己炫、庚烧等；醚類諸如乙鱗、I，等’’脂肪族烴類 ρ 四氣呋嗝、：U4-二曙 烷、i，2-一曱乳基乙烷、U-二乙氡 ，5 k專，鹵化煙類諸 318750 143 200804250(XXIV) wherein L·, R, R and m are produced by reacting with a chlorocarbonylating agent as defined above. The reaction is usually carried out in a solvent in the presence of a base. Examples of the solvent used in the reaction include g-like T ketone and the like; aromatic hydrocarbons such as benzene, hydrazine, ruthenium, ruthenium, methyl ethyl such as hexazone, heptane, etc.; ethers such as hexascale, I, Waiting for ''aliphatic hydrocarbons ρ tetrafurazan, U4-dioxane, i,2-anthracene lactylethane, U-diethyl hydrazine, 5 k special, halogenated tobacco 318750 143 200804250

及具混合物。 2本寻，腈類諸如乙腈等；非質子性極 基甲酿胺、N，N-二甲基乙醯胺、；U甲 —甲基味唾琳酮、二甲亞石風等；水；And with a mixture. 2 seeks, nitriles such as acetonitrile; aprotic polar amines, N,N-dimethylacetamide, U-methyl-salin, dimethyl sulphate, etc.; water;

鋰等；及有機鹼類諸如三乙基胺、 止丁基鋰、二異丙基醯胺 &quot;比啶、1，8-二吖雙環[5.4.0] 十一碳-7-稀等。 ^反應中使用之氯羰基化劑之實例包括光氣、氯甲酸三 氯甲酯、及碳酸貳（三氯甲基）酯。 通苇，以1莫耳式（χχιν)表示之化合物為基準，氯羰 基化劑之用量比例為1至4莫耳，及鹼之用量比例為1至 4莫耳。 反應溫度通常於-78°C至180°C之範圍，反應時間通常 係於0· 1小時至200小時之範圍。 於反應完成後，式（XXII)表示之化合物可經由執行後 處理程序而分離，諸如經藉濃縮反應混合物本身而分離。 所分離之式（XXII)表示之化合物可未經純化即用於次一步 驟。 式（XXIV)表示之化合物例如可經由殺蟲劑科學期刊 (Journal of Pesticide Science)23(3)(1998 年）250-254 頁所 318750 144 200804250 述方法或其修改方法製造。 經由前述製法等所製造之化合物可進_步接受本身已 知的反應，諸如焼化、稀化、炊 * 、化&amp;化、醯胺化、硫化、 亞石頁&amp;化、石頁醯化、氧化、還 虱化遮原、鹵化、硝化等，以將化 合物之取代基轉成其它取代基。 經由前述方法1至1〇及參考方法 — 巧友1主6所得之化合物 可猎諸如再結晶、管柱層析術、高效液相層析術、中壓製 備性高效液相層析術、脫鹽樹脂管柱層析術、再沈澱等方 法分離及純化。 ' 、,_ ，合物⑴中’作為於其分子之取代基之酸性基團（諸如 經基草醯基等）可與無機鹼或有機鹼形成農業化學上可接 受之鹼鹽。作為於其分子之取代基之鹼性基團（諸如二烷基 胺基）可與無機酸或有機酸形成農業化學上可接受之酸加 成鹽。 化合物（I)之較佳鹽為作為其分子之取代基之鹼性基 團（諸如一烧基胺基等）與無機酸、有機酸等形成之農業化 學上可接受之酸加成鹽。 無機酸加成鹽之實例包括與氩氯酸、氫溴酸、氫埃酸、 硫酸、硝酸、填酸及過氯酸等所生成之鹽；以及有機酸加 成鹽之貫例包括與甲酸、乙酸、丙酸、草酸、丁二酸、苯 甲酸、對甲苯磺酸、甲磺酸及三氟乙酸所生成之鹽；以及 無機鹼鹽之實例包括與鹼金屬（鈉、鉀等）、鹼土金屬（詞等） 及氨所形成之鹽。有機驗鹽之實例包括與二甲基胺、三乙 基胺、Ν，Ν·二甲基苯胺、σ辰啡、。比u各ϋ定、派σ定、σ比σ定、2_ , 145 318750 200804250 本基乙基胺、节基脸、7+ 環[5·4·0]十一碳稀所生成之鹽。乙^、及丫雙 :σ物⑴之鹽可經由化合物⑴與酸或鹼 當化合物⑴之V為氫原子時，以經由解離 所製造的陰離子及金屬陽離子可形成農業化學上可接受之 鹽。此鹽之實例包括與驗金屬（納、卸等）或驗土又 :生成之鹽。或者，當化合物…為氯原子時=) 合物(I)及無機鹼或有機鹼可形成農業化學上可接 成鹽。此種鹽之實例包括與無機驗如氨等所生成之加J 鹽，以及與有機驗諸如二甲基胺、三乙基胺、ν,ν_二甲美 苯胺、哌啡、吡嘻啶、哌啶、吼啶、2_苯基乙基胺、心 二乙醇胺、及A，環[5.4.°]十-麵 本發明之用於控制及預防有害有機體之殺蟲劑可為化 合物（I)或其鹽本S，但通常^有需要時，其製法係經由予 加界面活性劑或其它製備闕助劑，製備呈乳液劑、溶液 J U乳液劑、可流動性調配物、油溶液劑、可濕性散劑、 水洛性散劑、溶膠配方、散劑、粒劑、細粒劑、種子塗覆 劑、次泡塗覆配方、煙霧劑、氣溶膠、錠劑、微囊劑、噴 霧配方、EW劑、軟膏劑、毒飼、膠囊劑、丸粒劑、薄膜 塗覆配方、塗刷配方、注射劑、洗髮精製劑等，其含有化 合物（I)或其鹽及惰性載劑，諸如固體載劑、液體載劑及氣 體載劑。 用於製備之液體載劑之實例包括水、醇類（曱醇、乙 318750 146 200804250 醇、正丙醇、異丙醇、乙二醇等）、酮類（例如丙酮、甲基 乙基酮、甲基異丁基酮、環己酮等）、醚類（例如四氫呋喃、 乙二醇一曱醚、二乙二醇一甲醚、丙二醇一甲醚等）、脂肪 方矢k顯（邊如煤油、燃料油、機油等）、芳香族煙類（例如甲 本、一甲苯、溶劑石腦油（solvent naphtha)、甲基萘等）、 鹵化烴類（例如二氣曱烷、氣仿、四氯化碳等）、酸醯胺類（例 如N，N-二曱基曱醯胺、N，N_二曱基乙醯胺、队曱基吡洛唆 酉同等）、酯類（例如乙酸乙酯、乙酸丁酯、脂肪酸甘油酯、丫_ 丁内酯等）、及腈類（例如乙腈、丙腈等）。 固體載劑之貫例包括植物粉末（例如大豆粉、於草粉、 小麥粉、木屑等）、礦物粉末（例如黏土類如高嶺土、膨潤 土、酸性黏土等；滑石類諸如滑石粉、壽山石粉等；矽石 類諸如矽藻土、雲母粉等）、礬土、硫磺粉末、活性碳、碳 酸两、硫酸銨、碳酸氫鈉、乳糖及尿素。 此外，軟膏劑基劑之實例包括聚乙二醇；果膠；高碳 脂肪酸之多元醇酯諸如一硬脂酸甘油酯等；纖維素衍生物 諸如甲基纖維素等；褐藻酸鈉；膨潤土；高碳醇；多元醇 諸如甘油等；礦脂（vaseline);白礦脂；液體石蠟；豬油； 各種植物油類；羊毛脂；脫水羊毛脂；硬化油；樹脂類及 此等與界面活性劑之混合物。 界面活性劑之實例包括非離子界面活性劑及陰離子界 面活性劑，諸如皂類、聚氧伸乙基烷基芳基醚類[例如紐金 (Neugen)(商品名）、e · A142 (商品名），第一工業製藥公 司（Dai-ichi Kogyo Seiyaku Co·，Ltd·)製造、諾納爾（Ν_1) 147 318750 200804250 (商品名），東邦化學工業公司（Toho Chemical Industries Co·， Ltd·)製造]、烷基硫酸鹽類[例如伊瑪（Emar) 10 (商品名）、 伊瑪40 (商品名），花王公司（Kao Corporation)製造]、烧基 苯磺酸鹽類[諸如尼歐金（Neogen)(商品名）、尼歐金T(商品 名）’弟一^工業製樂公司製造、尼歐沛瑞斯（Neoperex) ’化 王公司製造]、聚乙二醇醚類[例如納尼波（N〇nip〇l) 85 (商 品名）、納尼波1〇〇(商品名）、納尼波16〇(商品名），三洋 化成公司（Sanyo Chemical Industries，Ltd.)製造]、多元醇酯 類[例如吞恩（Tween) 20 (商品名）、吞恩8〇 (商品名），花王 公司製造]、烧基續酸基丁二酸鹽類[例如杉莫林（Sanmolin) OT20 (商品名），三洋化成公司製造]、垸基萘石黃酸鹽類[例 如紐卡金（Newcalgen) EX70 (商品名），竹本油脂公司 (Takemoto Oil &amp; Fat Co·，Ltd·)製造]、烯基續酸鹽類[例如 索波（Solpol) 5115 (商品名），東邦化成公司製造]等。 於本發明之殺蟲劑製劑中所含化合物⑴成其鹽之比 例相對於本發明之殺蟲劑總量通常為〇.1%至80重量％， 較佳為1至20重量％。特別是，當化合物用作為乳液劑、 溶液劑、可濕性散劑等時，用量比例通常以約1至80重量 %，較佳以約1至20重量％為宜。當用作為油溶液劑或散 劑時，通常以約0.1至50重量％，且較佳以約〇·ι至20重 量％為宜。當用於粒劑時，通常以約5至50重量％，較佳 以約1至20重量％為宜。 本發明之殺蟲劑可與其它殺蟲劑、殺蜗劑、殺線蟲劑、 殺真菌劑、除草劑、植物生長調節劑、協同增妹劑、誘引 148 318750 200804250 劑、驅逐劑、安全劑、色素、肥料等混合使用。 可經由與本發明之殺蟲劑混合使用之殺真菌劑、植物 生長調節劑及除草劑以及諸如殺蟲劑、殺蟎劑、及殺線蟲 劑等殺蟲劑之代表性實例顯示如下。 殺蟲劑之活性成分包括例如： (1)有機磷化合物 亞西費(acephate)、石粦化铭、布他賽弗斯（butathiofos)、 卡杜沙弗斯（cadusafos)、克洛瑞沙西弗斯（chlorethoxyfos)、 克洛芬文弗斯（chlorfenvinphos)、克洛派利弗斯 (chlorpyrifos)、克洛派利弗斯-曱基、賽亞諾弗斯（cyanophos) (CYAP)、代亞金諾（diazinon)、DCIP (二氯二異丙基醚）、 代克洛芬賽翁（dichlofenthion) (ECP)、代克洛瓦斯 (dichlorvos)(DDVP)、代美梭特（dimethoate)、代美西文弗 斯（dimethylvinphos)、第沙弗坦（disulfoton)、EPN、伊賽翁 (ethion)、伊索普洛弗斯（ethoprophos)、伊春弗斯 (etrimfos)、芬賽翁（fenthion) (MPP)、芬尼卓賽翁 (fenitrothion)(MEP)、弗斯賽寨（fosthiazate)、弗莫賽翁 (formothion)、填化氫、艾索芬弗斯（isofenphos)、艾索沙赛 翁（isoxathion)、馬拉刈（malathion)、美沙芬弗斯 (mesulfenfos)、美西達赛翁（methidathion) (DMTP)、美諾克 洛托弗斯（monocrotophos)、納雷德（naled) (BRP)、歐西德 普洛弗斯（oxydeprofos) (ESP)、巴拉刈（parathion)、弗沙隆 (phosalone)、弗斯美（phosmet) (PMP)、皮利米弗斯 (pirimiphos)-曱基、派利達芬賽翁（pyridafenthion)、奎納弗 149 318750 200804250 斯（quinalphos)、芬梭艾特（phenthoate) (PAP)、普洛芬諾弗 斯（profenofos)、普洛帕弗斯（propaphos)、普洛西歐弗斯 (prothiofos)、派拉克洛弗斯（pyraci〇rfos)、沙利赛翁 (salithion)、沙普洛弗斯（suiprofos)、特布皮利弗斯 (tebupirimfos)、特美弗斯（temephos)、四氯文弗斯 (tetrachlorvinphos)、特布弗斯（terbufos)、赛歐美通 (thiometon)、奇克洛風（trichlorphon) (DEP)、瓦米多赛翁 (vamidothion)等； (2) 胺基曱酸酯化合物 亞拉尼卡（alanycarb)、本第歐卡（bendiocarb)、本富拉 卡（benfuracab)、BPMC、卡巴利（carbaryl)、卡波富蘭 (carbofuran)、卡波沙凡（carbosulfan)、克洛伊梭卡 (cloethocarb)、伊西歐芬卡（ethiofencarb)、芬諾布卡 (fenobucarb)、芬諾賽歐卡（fenothiocarb)、芬諾西卡 (fenoxycarb)、富拉赛歐卡（furathiocarb)、艾索普洛卡 (isoprocarb) (MIPC)、美托卡（metolcarb)、美梭米爾 (methomyl)、美賽歐卡（methiocarb)、NAC、歐西米爾 (oxamyl)、皮利米卡（pirimicarb)、普洛波沙（propoxur) (PHC)、XMC、赛歐第卡（thiodicarb)、伊索卡（xylylcarb)， 等； (3) 合成擬除蟲菊酯（pyrethroid)化合物 亞克利納瑟林（acrinathrin)、亞利瑟林（allethrin)、本 富路瑟林（benfluthrin)、/5 -賽富路瑟林（cyfluthrin)、必芬 瑟林（bifenthrin)、賽克洛普瑟林（cycloprothrin)、賽富路瑟 150 318750 200804250 林（cyfluthrin)、赛哈洛瑟林（cyhal〇thrin)、賽波美瑟林 (cypermethrin)、德他美瑟林（deitainethrin)、伊斯芬瓦瑞特 (esfenvalerate)、伊沙芬普洛（eth〇fenprox)、芬普洛帕瑟林 (fenpropathrin)、芬瓦瑞特（fenvalerate)、富路賽瑟林内 (flucythrinate)、富路芬諾普洛（flufenoprox)、富路美瑟林 (flumethrin)、富路瓦林内（fiuvaiinate)、哈芬普洛 (halfenprox)、伊米普瑟林（imiprothrin)、波美瑟林 (permethrin)、晋拉雷瑟林（prallethrin)、除蟲菊素 (pyrethrins)、利斯美瑟林（resmethrin)、σ -赛波美瑟林、西 拉富路芬（silafluofen)、特富路瑟林（tefluthrin)、柴洛美瑟 林（tralomethrin)、川富路瑟林（1；〇11511111;111^11)、（£2)-(1RS，3RS ; lRS，3SR)-2,2-二曱基-3-丙-1-烯基環丙烧羧酸 2,3,5,6-四氟_4_(曱氧基曱基）苄基酯、（EZ)-(1RS，3RS ; lRS，3SR)-2,2_二甲基_3·丙-1-烯基環丙烷羧酸2,3,5,6-四氟 -4-曱基苄基酯、（1RS,3RS ; lRS，3SR)-2,2-二甲基-3_(2-甲 基-1-丙烯基）環丙烷羧酸2,3,5,6-四氟-4-(曱氧基曱基）苄基 酯等； (4) 内利斯毒素（nereistoxin)化合物 卡特普（cartap)、本沙特普（bensultap)、賽歐賽克蘭 (thiocyclam)、莫諾沙特普（monosultap)、必沙特普（bisultap) 等； (5) 新終驗酸類（neonicotinoid)化合物 伊米達克洛普利（imidacloprid)、尼坦派蘭 (nitenpyram)、亞西他米普利（acetamiprid)、赛美梭山 151 318750 200804250 (thiamethoxam)、赛克洛普利（thiacloprid)、第諾特富蘭 (dinotefuran)、克洛賽尼定（clothianidin)等； (6) 苯曱醯基脲化合物 克洛富路助隆（chlorfluazuron)、必斯奇富隆 (bistrifluron)、代芬西隆（diafenthiuron)、代富路本助隆 (diflubenzuron)、富路助隆（fluazuron)、富路賽克洛助隆 (flucycloxuron)、富路芬諾宿隆（flufenoxuron)、海沙富路 莫隆（hexaflumuron)、路芬紐倫（lufenuron)、諾瓦路隆 (novaluron)、諾維富路莫隆（noviflimiuron)、特富路本助隆 (teflubenzuron)、奇富路莫隆（triflumuron)等； (7) 苯基σ比唾化合物 亞西托普洛（acetoprole)、伊西普洛（ethiprole)、費普洛 尼（fipronil)、凡尼利普洛（vaniliprole)、派利普洛 (pyriprole)、派拉富路普洛(pyrafluprole)等； (8) Bt毒素 衍生自蘇雲金芽孢桿菌（Bacillus thuringiensis，Bt)之 可存活的芽胞及藉此產生的結晶性毒素，及其混合物； (9) 肼化合物 克洛馬芬諾奇（chromafenozide)、哈洛芬諾奇 (halofenozide)、美沙西芬諾奇（methoxyfenozide)、特布芬 諾奇（tebufenozide)等； (10) 有機氯化合物 亞奇（aldrin)、第爾奇（dieldrin)、第亞諾克洛兒 (dienochlor)、印朵沙凡（end〇sulfan)、美沙西克洛兒 152 318750 200804250 (methoxychlor)等； (11) 天然殺蟲劑 機油、菸鹼硫酸鹽等； (12) 其它殺蟲劑 亞弗美、;丁（avermectin)_B、溴丙酸酯（bromopropylate)、 布普洛芬金（buprofezin)、克洛芬納派（chlorphenapyr)、赛 洛美金（cyromazine)、D-D(l，3-二氯丙烯）、伊馬美汀 (emamectin)-苯甲酸鹽、芬納查昆（fenazaquin)、富路派拉 左弗斯（flupyrazofos)、海卓普林（hydroprene)、印多沙卡 (indoxacarb)、美托沙代亞中（metoxadiazone)、米爾貝黴素 (milbemycin)-A、派美左金（pymetrozine)、派利達利兒 (pyridalyl)、派利普洛西芬（pyriproxyfen)、史賓諾沙 (spinosad)、沙富路拉米（sulfluramid)、托芬派拉 (tolfenpyrad)、奇亞查美（triazamate)、富路本第亞麥 (flubendiamide)、SI-0009、賽富路美托芬（cyflumetofen)、 坤酸、本克洛賽（benclothiaz)、氰胺化鈣、多硫化鈣、氯丹 (chlordane)、DDT、DSP、富路芬内林（flufenerim)、富洛 尼卡米（flonicamid)、富路林芬（fiurimfen)、弗美他内 (formetanate)、米坦（metam)•銨、米坦鈉、甲基溴、尼第諾 提弗蘭（nidinotefuran)、油酸鉀、普洛奇芬布 (protdfenbute)、史派洛美西芬（spiromesifen)、硫、美他富 路米中（metaflumizone)、史派洛特拉梅（spir〇tetramat)、派 利富奎納佐（pyrifluquinazon)、氣安尼普洛 (chlorantraniliprole)、 153 318750 200804250 下式表示之化合物：Lithium and the like; and organic bases such as triethylamine, butyllithium, diisopropyldecylamine &quot;bipyridine, 1,8-dioxinbicyclo[5.4.0]undec-7-thracene. Examples of the chlorocarbonylating agent used in the reaction include phosgene, trichloromethyl chloroformate, and cesium carbonate (trichloromethyl) ester. The chlorocarbonylating agent is used in an amount of from 1 to 4 moles, and the base is used in an amount of from 1 to 4 moles, based on the compound represented by 1 molar (?ιν). The reaction temperature is usually in the range of -78 ° C to 180 ° C, and the reaction time is usually in the range of from 0.1 hour to 200 hours. After completion of the reaction, the compound represented by the formula (XXII) can be isolated by performing a post-treatment procedure, such as by concentrating the reaction mixture itself. The isolated compound of the formula (XXII) can be used in the next step without purification. The compound represented by the formula (XXIV) can be produced, for example, by the method described in Journal of Pesticide Science 23(3) (1998), pp. 250-254, 318750 144 200804250, or a modified method thereof. The compound produced by the above-mentioned production method or the like can be subjected to a reaction known per se, such as deuteration, thinning, 炊*, chemical & ampification, amide amination, vulcanization, shale &amp; crystallization, shale Oxidation, oxidation, deuteration, halogenation, nitration, etc., to convert the substituents of the compound into other substituents. The compounds obtained by the above methods 1 to 1 and the reference method - Qiaoyou 1 main 6 can be hung, such as recrystallization, column chromatography, high performance liquid chromatography, medium pressure preparative high performance liquid chromatography, desalting Separation and purification by resin column chromatography, reprecipitation and the like. ',, _, in the compound (1), an acidic group which is a substituent of its molecule (such as a sulfhydryl group, etc.) can form an agrochemically acceptable base salt with an inorganic base or an organic base. A basic group such as a dialkylamino group as a substituent of its molecule may form an agrochemically acceptable acid addition salt with an inorganic or organic acid. The preferred salt of the compound (I) is an agrochemically acceptable acid addition salt formed of a basic group (such as a monoalkylamino group) as a substituent of the molecule with an inorganic acid, an organic acid or the like. Examples of the inorganic acid addition salt include salts formed with argon chloric acid, hydrobromic acid, hydrous acid, sulfuric acid, nitric acid, acid and perchloric acid; and examples of organic acid addition salts include with formic acid, Salts formed from acetic acid, propionic acid, oxalic acid, succinic acid, benzoic acid, p-toluenesulfonic acid, methanesulfonic acid and trifluoroacetic acid; and examples of inorganic alkali salts include alkali metals (sodium, potassium, etc.), alkaline earth metals (words, etc.) and the salt formed by ammonia. Examples of the organic salt test include dimethylamine, triethylamine, hydrazine, dimethyl dimethyl aniline, and sulphur morphine. The salt formed by the ratio of y, sigma, σ, σ, 2, 145 318, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750, 750 The salt of the σ substance (1) may be an acid-acceptable salt via the compound (1) and the acid or base. When the compound (1) V is a hydrogen atom, an anion and a metal cation produced by dissociation may form an agrochemically acceptable salt. Examples of the salt include a metal (nano, unloading, etc.) or a soil test: a salt formed. Alternatively, when the compound ... is a chlorine atom, the compound (I) and the inorganic or organic base may form an agrochemically achievable salt. Examples of such salts include the addition of J salts with inorganic tests such as ammonia, and organic tests such as dimethylamine, triethylamine, ν, ν-dimethylanilide, piperazine, pyridoxine, Piperidine, acridine, 2-phenylethylamine, cardioethanolamine, and A, ring [5.4.°] 10-face The insecticide for controlling and preventing harmful organisms of the present invention may be a compound (I) Or a salt thereof S, but usually, when necessary, the preparation method is prepared by adding a surfactant or other preparation of an oxime adjuvant to prepare an emulsion preparation, a solution JU emulsion, a flowable formulation, an oil solution, and the like. Wet powder, water powder, sol formula, powder, granule, fine granule, seed coating, secondary foam coating formula, aerosol, aerosol, lozenge, microcapsule, spray formulation, EW agent , ointment, poisonous feeding, capsule, pellet, film coating formulation, brushing formulation, injection, shampoo preparation, etc., containing compound (I) or a salt thereof and an inert carrier such as a solid carrier, Liquid carrier and gaseous carrier. Examples of liquid carriers for preparation include water, alcohols (sterols, B 318750 146 200804250 alcohols, n-propanol, isopropanol, ethylene glycol, etc.), ketones (eg acetone, methyl ethyl ketone, Methyl isobutyl ketone, cyclohexanone, etc.), ethers (such as tetrahydrofuran, ethylene glycol monoterpene ether, diethylene glycol monomethyl ether, propylene glycol monomethyl ether, etc.), fat square k display (such as kerosene , fuel oil, engine oil, etc.), aromatic tobacco (such as abenz, monomethylbenzene, solvent naphtha, methyl naphthalene, etc.), halogenated hydrocarbons (such as dioxane, gas, tetrachloro Carbon, etc., acid amides (such as N,N-didecyl decylamine, N,N-didecyl acetamide, quinone piroxime equivalent), esters (such as ethyl acetate) , butyl acetate, fatty acid glycerides, 丫-butyrolactone, etc.), and nitriles (such as acetonitrile, propionitrile, etc.). Examples of solid carriers include plant powders (such as soy flour, grass flour, wheat flour, wood chips, etc.), mineral powders (such as clays such as kaolin, bentonite, acid clay, etc.; talc such as talc, Shoushan powder, etc.; Vermiculite such as diatomaceous earth, mica powder, etc., alumina, sulfur powder, activated carbon, carbonic acid, ammonium sulfate, sodium hydrogencarbonate, lactose and urea. Further, examples of the ointment base include polyethylene glycol; pectin; a polyhydric alcohol ester of a high carbon fatty acid such as glyceryl monostearate; a cellulose derivative such as methyl cellulose; a sodium alginate; bentonite; High alcohol; polyhydric alcohol such as glycerin, etc.; vaseline; white petrolatum; liquid paraffin; lard; various vegetable oils; lanolin; dehydrated lanolin; hardened oil; resin and these and surfactants mixture. Examples of the surfactant include nonionic surfactants and anionic surfactants such as soaps, polyoxyethylene ethyl aryl ethers [e.g., Neugen (trade name), e · A142 (trade name) ), manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd., manufactured by Nonar (Ν_1) 147 318750 200804250 (trade name), manufactured by Toho Chemical Industries Co., Ltd. ], alkyl sulfates [eg Emar 10 (trade name), Imam 40 (trade name), manufactured by Kao Corporation], alkyl benzene sulfonate [such as Niojin ( Neogen) (trade name), Niojin T (commodity name) 'Min Yi ^ Industrial Music Company, Neoperex (made by Huawang Company), Polyethylene glycol ethers [such as Nanibo ( N〇nip〇l) 85 (trade name), Nanibo 1〇〇 (trade name), Nanibo 16〇 (trade name), manufactured by Sanyo Chemical Industries, Ltd.], polyol ester Class [eg Tween 20 (trade name), Thun 8 (trade name), Kao Wang Manufacture], succinyl acid succinates [eg Sanmolin OT20 (trade name), manufactured by Sanyo Chemical Co., Ltd.], decyl naphthyl sulphate [eg Newcalgen EX70] (trade name), manufactured by Takemoto Oil &amp; Fat Co., Ltd., and alkenyl phthalate (for example, Solpol 5115 (trade name), manufactured by Toho Chemical Co., Ltd.). The ratio of the compound (1) to the salt contained in the insecticide preparation of the present invention is usually from 0.1% to 80% by weight, preferably from 1 to 20% by weight based on the total amount of the insecticide of the present invention. In particular, when the compound is used as an emulsion, a solution, a wettable powder or the like, the proportion is usually from about 1 to 80% by weight, preferably from about 1 to 20% by weight. When used as an oil solution or a powder, it is usually from about 0.1 to 50% by weight, and preferably from about ι to about 10% by weight. When used as a granule, it is usually from about 5 to 50% by weight, preferably from about 1 to 20% by weight. The insecticide of the invention can be combined with other insecticides, snails, nematicides, fungicides, herbicides, plant growth regulators, synergistic agents, inducement 148 318750 200804250 agents, repellents, safeners, Mixing pigments, fertilizers, etc. Representative examples of fungicides, plant growth regulators and herbicides, and insecticides such as insecticides, acaricides, and nematicides, which can be used in combination with the insecticide of the present invention, are shown below. The active ingredients of insecticides include, for example: (1) organophosphorus compounds acephate, sarcophagus, butathiofos, cadusafos, clorish sasi Chlorethoxyfos, chlorfenvinphos, chlorpyrifos, clophophos-thiol, cyanophos (CYAP), dai Diazinon, DCIP (dichlorodiisopropyl ether), dichlofenthion (ECP), dichlorvos (DDVP), dimethoate, generation Dimethylvinphos, disulfoton, EPN, ethion, ethoprophos, etrimfos, fenthion (MPP), fenitrothion (MEP), fosthiazate, formothion, hydrogen filling, isofenphos, isolathion (isoxathion), malathion, mesulfenfos, methidathion (DMTP), Minoclotto Monocrotophos, naled (BRP), oxydeprofos (ESP), parathion, phosalone, phosmet ( PMP), pirimiphos- thiol, pyridafenthion, quinaf 149 318750 200804250 quinalphos, phenthoate (PAP), propofolno Profenofos, propaphos, prothiofos, pyrac 〇rfos, salithion, suiprofos ), tebupirimfos, temephos, tetrachlorvinphos, terbufos, thiometon, trichlorphon (DEP), vamidothion, etc.; (2) alanine phthalate compounds alanycarb, bendiocarb, benfuracab, BPMC, Carbaryl, carbofuran, carbosulfan, cloethocarb, Western European ethiofencarb, fenobucarb, fenothiocarb, fenoxycarb, furathiocarb, isoprocarb (MIPC) , metolcarb, methomyl, metiocarb, NAC, oxamyl, pirimicarb, propoxur (PHC), XMC , thiodicarb, xylylcarb, etc.; (3) synthesis of pyrethroid compounds (acrinathrin), aristin (allethrin), Benfu Benfluthrin, /5 - cyfluthrin, bifenthrin, cycloprothrin, sylvester 150 318750 200804250 forest (cyfluthrin), race Cyhal〇thrin, cypermethrin, deitainethrin, esfenvalerate, eth〇fenprox, fen Fenpropathrin, fenvalerate, Fulu Sesele (flucythrinate), flufenoprox, flumethrin, fiuvaiinate, halfenprox, imiprothrin, Baume Permethrin, prallethrin, pyrethrins, resmethrin, σ-saipo messerlin, silafluofen, special Tefluthrin, trolomethrin, Chuanfu Lutherin (1; 〇11511111; 111^11), (£2)-(1RS, 3RS; lRS, 3SR)-2, 2-Dimercapto-3-prop-1-enylcyclopropanecarboxylic acid 2,3,5,6-tetrafluoro_4_(decyloxyindenyl)benzyl ester, (EZ)-(1RS, 3RS ; lRS, 3SR)-2,2_dimethyl_3·prop-1-enylcyclopropanecarboxylic acid 2,3,5,6-tetrafluoro-4-mercaptobenzyl ester, (1RS, 3RS; lRS,3SR)-2,2-dimethyl-3_(2-methyl-1-propenyl)cyclopropanecarboxylic acid 2,3,5,6-tetrafluoro-4-(decyloxydecyl)benzyl (4) Neristoxin compounds cartap, bensultap, thiocyclam, monosultap, Bissa Bisultap et al; (5) neonicotinoid compounds imidacloprid, nitenpyram, acetamiprid, simesum 151 318750 200804250 (thiamethoxam), thiacloprid, dinotefuran, clonidineidin, etc.; (6) phenylhydrazine urea compound (chlorfluazuron), bistrifluron, diafenthiuron, diflubenzuron, fluazuron, flucycloxuron, rich Flufenoxuron, hexaflumuron, lufenuron, novaluron, noviflimiuron, and Tefuluben (teflubenzuron), triflumuron, etc.; (7) phenyl σ than salivary compound acetoprole (acetoprole), ethipro (ethiprole), fipronil (fipronil), van Nielli Vali (viriliprole), pyriplor (pyriprole), parafolpur Pyraproprole et al; (8) Bt toxin derived from viable spores of Bacillus thuringiensis (Bt) and crystalline toxins produced thereby, and mixtures thereof; (9) indole compound clomafinol (chromafenozide), halofenozide, methoxyfenozide, tebufenozide, etc.; (10) organochlorine compound aldrin, dildrin (dieldrin) ), dienochlor, end〇sulfan, methacetin 152 318750 200804250 (methoxychlor), etc.; (11) natural insecticide motor oil, nicotine sulfate, etc.; (12) Other insecticides Aphrodite, avermectin _B, bromopropylate, buprofezin, chlorphenapyr, cyromazine , DD (l,3-dichloropropene), emamectin-benzoate, fenazaquin, flupyrazofos, hydroprene, Indoxcarb, Metoshadia (metoxadia) Zone), milbemycin-A, pymetrozine, pyridalyl, pyriproxyfen, spinosad, shafulu Sulmilamid, tolfenpyrad, triazamate, flubendiamide, SI-0009, cyflumetofen, kunnic acid, bens Benclothiaz, calcium cyanamide, calcium polysulfide, chlordane, DDT, DSP, flufenerim, flonicamid, fiurimfen ),metetanate,metam,ammonium,mitane,methyl bromide,nidinotefuran,potassium oleate,protdfenbute,history Piromesifen, sulphur, metaflumizone, spir〇tetramat, pyrifluquinazon, chlorantraniliprole ), 153 318750 200804250 Compounds of the formula:

R1表示曱基、氯原子、溴原子或氟原子， R2表示氟原子、氣原子、溴原子、C1-C4鹵烷基或 C1-C4 ifi烷氧基， R3表示氟原子、氯原子、或溴原子， R4表示氫原子；視需要經曱氧基 '一個或多個鹵原 子、氰基、曱硫基、甲基亞磺醯基或曱基磺醯基取代之 C1-C4院基；C3-C4烯基；C3-C4炔基；或C3-C5環烷基， R5表示氫原子或曱基， R6表示氫原子、氟原子或氯原子， R7表示氳原子、氟原子或氯原子等。 殺蜗劑之活性成分包括例如阿喜奎諾席 (acequinocyl)、阿米叉茲（amitraz)、班佐希麥（benzoximate)、 比菲納則（bifenazate)、玻摩波匹雷（bromopropylate)、奇諾 美席納（chinomethionat)、克洛班吉雷（chlorobenzilate)、 CPCBS (克洛芬松(chlorfenson))、可芬塔吉（clofentezine)、 希弗美托芬（cyflumetofen)、克爾桑（kelthane)(待科佛 (dicofol))、伊托薩佐（et〇xaz〇ie)、芬布塔汀氧化物 (fenbutatin oxide)、菲諾席卡（fenothi〇carb)、芬匹洛希麥 154 318750 200804250 (fenpyroximate)、弗克匹林（fluacrypyrim)、弗波喜芬 (fluproxyfen)、海喜塞佐（hexythiazox)、波帕蓋特（propargite) (BPPS)、波利内廷（polynactins)、匹瑞達班（pyridaben)、匹 瑞米迪芬（Pyrimidifen)、特布芬匹拉（tebufenpyrad)、特叉 迪封（tetradifon)、史皮迪克芬（spirodiclofen)、阿米朵弗美 (amidoflumet)等。 殺線蟲劑之活性成分包括例如DCIP、佛赛則 (fosthiazate)、勒伐米梭（levamisol)、異硫氰酸甲酯、莫嵐 投（morantel)酒石酸鹽等。 殺真菌劑之活性成分包括例如阿喜班佐樂曱基 (acibenzolar-S-methyl)、阿摩傍（amobam)、安波匹佛 (ampropylfos)、阿尼拉金（anilazine)、阿佐希徹賓 (azoxystrobin)、貝納拉喜（benalaxyl)、貝諾達尼（benodanil)、 貝諸米（benomyl)、班息瓦里卡（benthiavalicarb)、班息佐 (benthiazole)、貝索薩金（bethoxazin)、比特塔諾（bitertanol)、 布雷提希丁 _S (blasticidin-S)、波爾多混合物（Bordeaux mixture)、玻斯卡里（boscalid)、玻穆科納佐 (bromuconazole)、布席歐備（buthiobate)、次氯酸約、多硫化 |弓、卡布騰（captan)、卡班達佐（carbendazol)、卡玻欣 (carboxin)、卡玻帕米（carpropamid)、克班席宗 (chlobenthiazone)、克洛尼（chloroneb)、克洛皮林 (chloropicrin)、克洛洛尼（chlorothalonil) (TPN)、克洛席佛 (chlorthiophos)、桂皮醛、科吉拉康（clozylacon)、CNA (2,6-二氯-4-硝基苯胺）、氫氧化銅、硫酸銅、希佐法米 155 318750 200804250 (cyazofamid)、希弗菲納米（cyfluphenamid)、希莫薩尼 (cymoxanil)、希波科納佐（cyproconazole)、希波迪尼 (cyprodinil)、希波夫蘭（cyprofuram)、達佐美（dazomet)、 德貝卡（debacarb)、迪克夫尼（dichlofluanid)、D-D (1,3-二 氯丙烯）、符克希美（diclocymet)、待克美浸（diclomezine)、 待索芬卡（diethofencarb)、待菲諾納佐（difenoconazole)、迪 弗美托林（diflumetorim)、迪美弗佐（dimefluazole)、迪美席 瑞摩（dimethirimol)、迪美索摩夫（dimethomorph)、迪尼科 納佐 _M (diniconazole-M)、迪諾訊（dinocap)、艾迪芬佛 (edifenphos)、艾波喜納佐（epoxiconazole)、二甲基二硫基 胺基曱酸鎳、伊塔科納佐（etaconazole)、伊薩玻桑 (ethaboxam)、伊席里摩（ethirimol)、伊崔待佐（etridiazole)、 法莫薩東（famoxadone)、菲納米東（fenamidone)、菲納里摩 (fenarimol)、芬布科納佐（fenbuconazole)、芬達佐蘇蘭 (Fendazosulam)、芬海薩米（fenhexamid)、菲諾薩尼 (fenoxanil)、芬皮克尼（fenpiclonil)、芬波皮丁 (fenpropidin)、芬波皮摩夫（fenpropimorph)、芬提亞宗 (fentiazon)、芬亭（fentin)氫氧化物、菲林宗（ferimzone)、 弗亞吉南（fluazinam)、弗迪歐索尼（fludioxonil)、弗美托佛 (flumetover)、弗摩夫（flumorph)、弗歐洛米（fluoroimide)、 弗崔瑪佐（fluotrimazole)、弗薩車賓（fluoxastrobin)、弗昆 科納佐（fluquinconazole)、弗希拉佐（flusilazole)、弗薩法麥 (flusulfamide)、弗托拉尼（flutolanil)、弗崔阿佛 (flutriafol)、佛斯提-A1 (fosetyl-Al)、弗薩賴（fthalide)、弗 156 318750 200804250 貝里達佐（fuberidazole)、弗勒拉喜（furalaxyl)、弗勒美匹 (furametpyr)、佛卡巴尼（furcarbanil)、佛科納佐 (furconazole)-川貝、海薩科納佐（hexaconazole)、黑美薩佐 (hymexazol)、IBP、伊瑪紮里（imazalil)、伊米班科納佐 (imibenconazole)、伊米諾塔 丁-阿貝希雷（iminoctadine-albesilate)、伊米諾塔丁 -三乙酸鹽、艾多卡（iodocarb)、伊 普科納佐（ipconazole)、伊普洛迪昂（iprodione)、伊普瓦里 卡（iprovalicarb)、伊索波息蘭（iSOpr〇thiolane)、卡蘇加黴素 (kasugamycin)、克索辛（kresoxim)-曱基、曼科貝U (mancozeb)、瑪奈（maneb)、美帕尼匹林（mepanipyrim)、美 波尼（mepronil)、美塔拉喜（metalaxyl)、美塔拉喜-M、美坦 (metam)-納、美薩索佛卡（methasulfocarb)、甲基溴、美科 納佐（metconazole)、美斯弗洛桑（methfuroxam)、美托米諾 車賓（metominostrobin)、美徹菲能（metrafenone)、美索弗瓦 (metsulfovax)、米爾迪歐黴素（mildiomycin)、米爾耐 (milneb)、麥克布塔尼（myclobutanil)、麥克佐林 (myclozolin)、拿班（nabam)、歐薩車賓（orysastrobin)、歐 福瑞（ofurace)、歐薩迪喜（oxadixyl)、曙琳酸（oxolinic acid)、歐波科納佐（oxpoconazole)、歐喜卡玻辛 (oxycarboxin)、氧四環素（oxytetracycline)、沛弗拉佐 (pefurazoate)、潘科納佐（penconazole)、潘希庫隆 (pencycuron)、皮可喜車賓（picoxystrobin)、聚胺基甲酸酯、 波利歐辛（polyoxin)、石炭酸氫鉀、波貝納佐（probenazole)、 波克拉茲（prochloraz)、波喜米東（procymidone)、波帕摩卡 157 318750 200804250 (propamocarb)-鹽酸鹽、波匹科納佐（pr〇pic〇naz〇ie)、波皮 奈（Pr〇pinet〇、波查納吉（pr〇qUinazi(j)、波席歐卡 (prothiocarb)、波息科納佐（pr〇thi〇c〇nazole)、皮拉卡玻里 (pyracarbolid)、皮拉克車賓（pyraci〇str〇bin)、皮拉佐佛 (pyrazophos)、皮里布提卡（pyri|3Uticarb)、皮里菲諾 (pyrifenox)、皮里美薩尼（pyrimethanil)、皮洛葵隆 (pyroquilon)、奎諾希芬（qUin0Xyfen)、昆托金（quint〇zene) (PCNB)、席梨區欠潘（siithi〇pham)、希美科納佐 (simeconazole)、夕普科納佐（sipCOI1azole)、碳酸氫納、次 氯酸納、史拜洛薩明（spiroxamine)、（(E)-2-[2-(2,5_二甲基 苯氧基甲基）苯基]_2_甲氧基亞胺基-N-甲基乙醯胺）、鏈黴 素（streptomycin)、硫磺、特布康納佐（tebuconazole)、特克 塔蘭（tecloftalam)、特徹康納佐（tetraconazole)、赛班達佐 (thiabendazole)、賽迪尼（thiadinil)、息蘭（thiram) (TMTD)、 息弗匝密（thifluzamide)、息歐法奈（thiophanate)_曱基、托 克佛（tolclofos)-甲基、TPN、崔迪美芳（triadimefon)、崔迪 美諾（triadimenol)、崔佐賽（triazoxide)、崔拉米（triclamide)、 崔赛拉佐（tricyclazole)、崔迪摩夫(tridemorph)、崔弗米佐 (triflumizole)、崔洛喜車賓（trifloxystrobin)、崔佛林 (triforine)、崔提科納佐（triticonazole)、瓦里達黴素 (validamycin)、文克佐林（vinclozolin)、維尼科納佐 (viniconazole)、吉奈（zineb)、吉蘭（ziram)及佐薩米 (zoxamide) 〇 除草劑和植物生長調節劑之活性成分包括例如離層酸 158 318750 200804250 (abcisic acid)、阿希托克洛（acetochlor)、阿希弗偶芬 (acifluorfen)-納、阿拉克洛（alachlor)、阿洛喜丁 (alloxydim)、阿美辰（ametryn)、阿米卡巴宗 (amicarbazone)、阿米索弗隆（amidosulfuron)、胺基乙氧基 乙稀基甘胺酸、阿米皮拉里（aminopyralid)、AC94、377、 阿米波佛（amiprofos)-甲基、安希米多（ancymidol)、阿蘇蘭 (asulam)、阿徹金（atrazine)、阿維葛辛（aviglycine)、阿吉 索弗隆（azimsulfuron)、貝弗布塔米（beflubutamid)、班弗拉 林（benfluralin)、班弗瑞塞（benfuresate)、班索弗隆 (bensulfuron)-曱基、班蘇賴（bensulide)(SAP)、班塔宗 (bentazone)、班席歐卡（benthiocarb)、班則米佐 (benzamizole)、班吉芬迪宗（benzfendizone)、班佐百希隆 (benzobicyclon)、班佐菲納（benzofenap)、节基腺嗓呤、苄 基胺基嗓呤、拜爾拉佛（bialaphos)、拜菲諾士（bifenox)、 布拉喜諾萊（Brassinolide)、波瑪希（bromacil)、波摩布泰 (bromobutide)、布塔克洛（butachlor)、布塔菲納希 (butafenacil)、布塔米佛（butamifos)、布提雷（butylate)、卡 芬史綢（cafenstrole)、碳酸I弓、過氧化|弓、卡巴里（carbaryl)、 克美索希尼（chlomethoxynil)、克洛里達宗（chloridazon)、 克洛牧隆（chlorimuron)·乙基、克洛薩林（chlorphthalim)、 克洛波芳（chlorpropham)、克洛索弗隆（chlorsulfuron)、克 洛梭（chlorthal)·二曱基、克洛賽米（chlorthiamid)(DCBN)、 氣化膽驗、希尼東（cinidon)-乙基、辛美席林（cinmethylin)、 希諾索弗隆（cinosulfuron)、克雷索定（clethodim)、科美波 159 318750 200804250 (clomeprop)、科希佛奈（cl〇Xyfonac)-鈉、克洛美夸 (chlormequat)氯化物、4-CPA (4-氯苯氧基乙酸）、克里波 (cliprop)、科芬塞（clofencet)、庫米盧隆（cumyluron)、希亞 拿金（cyanazine)、赛拉尼萊（cydanilide)、賽洛索芳隆 (cyclosulfamron)、希哈洛佛（cyhalofop)-丁基、2,4·二氯笨 氧基乙酸鹽、待克洛波（dichlorprop)(2,4-DP)、代牧隆 (daimuron)、達拉旁（dalapon) (DPA)、待美席納米-P (dimethenamid_P)、達米諾吉（daminozide)、達佐美 (dazomet)、正癸醇、待康巴（dicamba)-納（MDB A)、待克貝 尼（dichlobenil) (DBN)、待弗菲尼康（diflufenican)、待苛古 雷（dikegulac)、待美皮沛雷（dimepiperate)、待美薩美純 (dimethametryn)、待美席納米（dimethenamid)、二力J (diquat)、待席歐皮（dithiopyr)、迪巫隆（diuron)、安朵梭 (endothal)、艾波克雷昂（epocholeone)、艾斯波卡 (esprocarb)、艾席封（ethephon)、艾席迪牧隆（ethidimuron)、 艾梭索弗隆（ethoxysulfuron)、艾席克則（ethychlozate)、艾 托班則尼（etobenzanid)、菲納里摩（fenarimol)、菲諾薩波 (fenoxaprop)_乙基、芬徹則麥（fentrazamide)、弗則索弗隆 (flazasulfuron)、弗拉蘇蘭（florasulam)、弗亞吉發（fluazifop)· 丁基、弗亞佐萊（fluazolate)、弗卡巴宗（flucarbazone)、弗菲 納賽（flufenacet)、弗芬皮爾（flufenpyr)、弗美徹林 (flumetralin)、弗米歐薩金（flumioxazin)、弗波帕奈 (flupropanate)•納、弗皮索弗隆（flupyrsulfuron)_ 曱基-納、弗 匹米多（flurprimidol)、弗席亞赛（fluthiacet)-曱基、佛蘭索 160 318750 200804250 弗隆（foramsulfuron)、佛克菲奴籠（forchlorfenuron)、佛美薩 芬（formesafen)、赤黴素（gibberellin)、古佛希奈 (glufosinate)、格佛塞（glyphosate)、哈洛索弗隆（halosulfuron) -曱基、黑薩吉農（hexazinone)、伊瑪雜莫（imazamox)、伊瑪 雜匹（imazapic)、伊瑪雜比（imazapyr)、伊瑪雜昆 (imazaquin)、伊瑪索弗隆（imazosulfuron)、伊納班斐 (inabenfide)、吲哚乙酸（IAA)、吲哚丁酸、伊多索弗隆 (iodosulfuron)、伊歐希尼（ioxynil)-辛酸鹽、伊梭隆 (isouron)、伊索薩克托（isoxachlortole)、伊索薩迪芬 (isoxadifen)、卡布提莱（karbutilate)、拉托芬（lactofen)、雷 納希（lenacil)、里奴隆（linuron)、LGC-42153、順丁 稀二酸 肼、美可波（mecoprop) (MCPP)、2-曱基-4-氯苯氧基乙酸鹽 類、MCPA·硫乙基、2-甲基-4-氯苯氧基丁酸乙酯、美菲納 賽（mefenacet)、美弗伊待（mefluidide)、美皮夸（mepiquat)、 美梭索弗隆（mesosulfuron)、美梭崔昂（mesotrione)、曱基 代牧隆（methyl daimuron)、美塔米佛（metamifop)、美托拉 克（metolachlor)、美崔布金(metribuzin)、美索弗隆 (metsulfuron)-曱基、莫里奈（molinate)、萘乙酸、1-萘乙醯 胺、拿波尼賴（naproanilide)、拿波帕麥（napropamide)、正 癸醇、尼可索弗隆（nicosulfuron)、正苯基鄰苯二甲醢胺酸、 歐班卡（orbencarb)、歐薩待宗（oxadiazon)、歐薩吉美芳 (oxaziclomefone)、歐辛（oxine)-硫酸鹽、帕克布車佐 (paclobutrazol)、巴拉刈（paraquat)、壬酸、潘迪美塞林 (pendimethalin)、沛諾蘇蘭（penoxsulam)、潘托薩宗 161 318750 200804250 (pentoxazone)、沛梭薩麥(pethoxamide)、芬美迪放 (phenmedipham)、皮克蘭（picloram)、皮可里納芬 (picolinafen)、胡椒基丁氧化物、皮沛洛佛（piperophos)、 培提拉克（pretilachlor)、皮米索弗隆（primisulfuron) -甲基、 波卡巴宗（procarbazone)、波迪亞明（prodiamine)、波弗亞 佐（profluazol)、波佛希定（profoxydim)、波黑薩迪昂 (prohexadione)-約、波海卓佳蒙（prohydrojasmon)、波美純 (prometryn)、波帕尼爾（propanil)、波希卡巴宗 (propoxycarbazone)、波皮雜麥（propyzamide)、皮拉克尼爾 (pyraclonil)、皮拉弗芬（pyraflufen)-乙基、皮拉佐萊 (pyrazolate)、皮拉佐索弗隆（pyrazosulfuron)-乙基、皮拉佐 希芬（pyrazoxyfen)、皮里班佐辛（pyribenzoxim)、皮里布提 卡（pyributicarb)、皮里達佛（pyridafol)、皮里代特 (pyridate)、皮里塔利（pyriftalid)、皮里米諾貝（pyriminobac)· 曱基、皮里席貝（pyrithiobac)、奎克瑞（quiclorac)、奎諾拉 明（quinoclamine)、奎雜洛佛（quizalofop)-乙基、閏索弗隆 (rimsulfuron)、赛梭希定（sethoxydim)、希度隆（siduron)、 希瑪金（simazine)、希美純（simetryn)、氯酸納、索佛索弗 隆（sulfosulfuron)、史威普（swep) (MCC)、特布留隆 (tebuthiuron)、特帕洛希定（tepraloxydim)、特巴希 (terbacil)、特布卡（terbucarb) (MBPMC)、若尼克洛 (thenylchlor)、赛雜弗隆（thiazafluron)、黎迪足隆 (thidiazuron)、黎芬索弗隆（thifensulfuron)-曱基、崔亞吉蘭 (triaziflam)、崔布佛（tribufos)、崔克皮（triclopyr)、崔迪芳 162 318750 200804250 (tridiphane)、崔佛索弗隆（trifloxysulfuron)、崔弗拉林 (trifluralin)、崔尼薩沛（trinexapac)-乙基、崔托索弗隆 (tritosulfuron)、優尼康納佐（uniconazole_P)及維莫雷 (vemolate) (PPTC) 〇 本發明之殺蟲劑亦可進一步與協同增效劑混合使用， 協同增效劑諸如胡椒基丁氧化物、賽塞美士（sesamex)、 N-(2-乙基己基）-8,9，l〇-三降冰片-5-烯-2,3-二羧醯亞胺 (MGK 264)、WARF-抗财藥劑及順丁婦二酸二乙酯；此外， 也可與安全劑混合使用，該等安全劑諸如貝諾薩克 (benoxacor)、解毒喹（cloquintocet-mexyl)、希美崔尼 (cyometrinil)、待穆隆（daimuron)、待克米（dichlormid)、芬 克拉佐（fenchlorazole)-乙基、芬克潤（fenclorim)、弗拉佐 (flurazole)、弗梭菲寧（fluxofenim)、夫里拉佐（furilazole)、 美芬皮（mefenpyr)-二乙基、MG191、萘曱酸酐及歐塞貝崔 尼（oxabetrinil) 〇 化合物（I)或其鹽對其具有活性之害蟲之實例包括節 肢動物諸如昆蟲害蟲、蟎害蟲等及線蟲害蟲。其特例列舉 如下： 半翅目··飛虱科（Delphacidae)諸如小褐飛虱 (Laodelphax striatellus)、褐稻飛虱（Nilaparvata lugens)、白 背稻飛iL(Sogatellafurcifera)等；浮塵子科 (Deltocephalidae)諸如偽黑尾浮塵子（Nephotettix cincticeps)、黑尾浮塵子（Nephotettixvirescens)等；虫牙科 (Aphididae)諸如棉財（Aphis gossypii)、綠桃輯（Myzus 163 318750 200804250 persicae)、甘藍虫牙（Brevicoryne brassicae)、馬鈐薯虫牙 (Macrosiphum euphorbiae)、毛地黃花虫牙（Aulacorthum solani)、橡稠李虫牙（Rhopalosiphum padi)、熱帶柑橘虫牙 (Toxoptera citricidus)等；椿象科（Pentatomidae)諸如綠椿象 (Nezara antennata)、豆椿象（Riptortus clavetus)、稻椿象 (Leptocorisa chinensis)、白點有刺椿象（Eysarcoris parvus) 及椿象（Halyomorpha mista)等；粉風科（Aleyrodidae)諸如綠 家粉風（Trialeurodes vaporariorum)、銀葉粉藏（Bemisia argentifolii)等；虫介科（Coccidae)諸如加州紅紛（Aonidiella aurantii)、聖荷西纷（Comstockaspisperniciosa)、柑橘北虫介 (Unaspis citri)、紅蝶虫介（Ceroplastes rubens)、棉墊虫介（Icerya purchasi)等；網椿科（Tingidae);木虱科（Psyllidae);等。 鱗翅目：模蛾科（Pyralidae)諸如稻桿填（Chilo suppressalis)、黃稻螟（Tryporyza incertulas)、稻螟 (Cnaphalocrocis medinalis)、棉螟(Notarcha derogata)、印 度粉螟（Plodia interpunctella)、東方玉米模（Ostrinia furnacalis)、甘藍網螟（Hellula undalis)、六月禾網模 (Pediasiateterrellus)等；夜蛾科（Noctuidae)諸如斜紋夜蛾 (Spodoptera litura)、甜菜夜蛾（Spodoptera exigua)、粟夜蛾 (Pseudaletia separata)、甘藍夜蛾（Mamestra brassicae)、球 菜夜蛾（八8『〇1^丨卩5丨1〇11)、根擬尺墣蟲（？111以&amp;1^81^丨8113)、 擬尺峻屬（Thoricoplusia spp.)、夜蛾屬（Heliothis spp·)及蕃 茄夜蛾屬（Helicoverpaspp·)屬等；粉蝶科（Pieridae)諸如紋 白蝶（Pierisrapae)等；捲葉蛾科（T〇rtricidae)諸如小捲葉屬 164 318750 200804250 (Adoxophyes spp.)、東方水果蛾（Grapholita molesta)、大豆 莢模（Leguminivora glycinivorella)、紅豆莢填 (Matsumuraeses azukivora)、夏果捲葉蛾（Adoxophyes orana fasciata)、小捲葉蛾屬（Adoxophyes sp·)、東方茶捲葉蛾 (Homona magnanima)、蘋果捲葉蛾（Archips fuscocupreanns)、及蘋果橐蛾（Cydiapomonella)等；潛葉細 蛾科（Gracillariidae)諸如茶捲葉蟲（Caloptilia theivora)、蘋 果潛葉蟲（Phyllonorycterringoneella)等；果蛀蛾科 (Carposinidae)諸如桃果蛀蛾（Carposinaniponensis)等；潛 葉蛾科（Lyonetiidae)諸如潛葉蛾屬（Lyonetiaspp·)等；毒蛾 科（Lymantriidae)諸如毒蛾屬（Lymantria spp·)及黃毒蛾屬 (Euproctisspp·)等；巢蛾科（Ypon〇meutidae)諸如菱背巢蛾 (Plutellaxylostella)等；麥蛾科（Gelechiidae)諸如桃色麥蛾 (Pectinophora gossypiella)、及馬鈐薯管蛾（Phthorimaea operculella)等；燈蛾科（Arctiidae)諸如美國白蛾 (Hyphantriacunea)等；穀蛾科（Tineidae)諸如製巢衣蛾 (1^如&amp;打&amp;113111。6115)、及網衣蛾（1^116〇1&amp;1^556111611&amp;);等。 纓翅目：薊馬科（Thripidae)諸如黃柑橘薊馬 (Frankliniella occidentals)、巴米薊馬（Thrips parmi)、黃茶 薊馬（Scirtothrips dorsalis)、洋蔥薊馬（Thrips tabaci)、花薊 馬（Frankliniellaintonsa)等。 雙翅目：家繩（Muscadomestica)、淡色庫蚊（Culex popiens pallens)、馬繩（Tabanus trigonus)、洋蔥蛆（Hylemya antiqua)、玉米粒姐（Hylemya platura)、中華癔蚊（Anopheles 165 318750 200804250 sinensis)、曰本稻葉潛蠅(Agromyza oryzae)、稻葉潛蠅 (Hydrelliagriseola)、稻桿蛆绳（Chlorops oryzae)、甜瓜繩 (Dacus cucurbitae)、地中海實绳（Ceratitis capitata)、豆葉 潛繩（Liriomyzatrifolii)等。 鞘翅目··二十八點瓢蟲（Epilachna vigintioctopunctata)、葫蘆葉曱（Aulacophora femoralis)、 條紋跳甲（Phyllotreta striolata)、稻葉曱（Oulema oryzae)、 稻象甲（Enchinocnemus squameus)、稻水象曱（Lissorhoptrus oryzophilus)、野棉象甲（Anthonomus grandis)、紅豆象甲 (Callosobruchus chinensis)、分脈象曱（Sphenophorus venatus)、日本曱（Popillia japonica)、亞銅麗金龜（Anomala cuprea)、玉米根蟲（Diabrotica spp.)、科羅拉多曱 (Leptinotarsa decemlineata)、石盍頭蟲（Agriotes spp·)、香菸 曱（Lasioderma serricorne)、皮蠹（Anthrenus verbasci)、赤 擬穀盜（Tribolium castaneum)、歐洲竹粉橐（Lyctus brunneus)、白點長角甲（Anoplophora malasiaca)、松脂甲 (Tomicus piniperda)等。 直翅目：亞洲飛虫皇（Locusta migratoria)、非洲螻姑 (Gryllotalpa africana)、稻虫皇（Oxya yezoensis)、曰本稻虫皇 (Oxya japonica)等 〇 膜翅目··甘藍葉蜂（Athalia rosae)、切葉蟻屬 Acromyrmex spp·)、火蟻屬（Solenopsis spp.)等。 線蟲：稻白頭線蟲（Aphelenchoidesbesseyi)、草莓芽 線蟲（Nothotylenchusacris)等。 166 318750 200804250 蜚蠊總科（Blattodea):德國蜚蠊（Blattella germanica)、 煙褐色蜚蠊（Periplaneta fuliginosa)、美國蜚蠊（Periplaneta (Blatta orientalis)等。 碑蜗目：葉蟎科（Tetranychidae)諸如兩點葉蜗 (Tetranychus urticae)、柑橘紅蜗（Panonychus citri)、小爪瞒 屬（Oligonychusspp·)等；癭蟎科（Eriophyidae)諸如桃色甜 橘鏽蜗（Aculopspelekassi)等；線蜗科（Tarsonemidae)諸如 寬瞒（Polyphagotarsonemuslatus)等；偽葉瞒科 (Tenuipalpidae);杜克葉蜗科（Tuckerellidae);硬碑科 (Ixodidae)諸如長角 jk 碑（Haemaphysalis longicornis)、褐黃 血蜱（Haemaphysalis flava)、台灣革皮（Dermacentor taiwanicus)、卵形硬蜱（Ixodes ovatus)、全溝硬蜱（Ixodes persulcatus)、微小牛蜱（Boophilus microplus)、血紅扇頭蜱 (Rhipicephalus sanguineus)等；疮蜗科（Acaridae)諸如霉蜗 (Tyrophagus putrescentiae)等；家塵蜗科（Epidermoptidae) 諸如美洲家刺皮蜗（Dermatophagoides farinae)、歐洲家刺 皮瞒（Dermatophagoidesptrenyssnus)等；肉食蜗科 (Cheyletidae)諸如普通肉食蜗（Cheyletus eruditus)、馬六曱 肉食蜗（Cheyletus malaccensis)及墨氏肉食瞒（Cheyletus moorei)等；及類寄生蟲瞒科（Dermanyssidae);等。 本發明之蟲害防治方法係經由將化合物（I)或其鹽直 接施用至害蟲或害蟲棲息地來進行。 於本發明之蟲害防治方法中，化合物（I)或其鹽可以其 167 318750 200804250 本身使用，料常係❹化合物 水性稀釋液。 ^之製劑或製劑之 本發明之害蟲棲息地之#例包 田、条園、果園、未耕種的井田、溫室二：：田、井 圃箱、幼苗生長介質、幼苗生長塾=田生長盤、苗 等。 欠耕辰場的水耕介質 至於施用方法例如為嘴灑處理 及水耕溶液處理。 表處理、種子處理 本發明之喷灑處理為_ ⑴或其鹽）處理植物表面或宝蟲;用活性成分(化合物 治效果之處理方法，具體而V 現出對害蟲的防 二tt為保護作物避免受害蟲損害之處= 去。亥方法係經由使用活性成分處理土壤 方 =液广讓活性成分由根部等滲透且轉位至二 内部，來保護作物避免諸如被害蟲^至作物之板株 土壤處理例如為栽種孔處理（栽種孔:言， 土壤摻混）、植物启邱幸 、麁栽種孔處理後之 摻混、植物底部灌溉二上植物底部噴灑、植物底部土壌 理）、栽種犁、、盖声，、、月種播種期後半之植物底部處 裁種列處理(=理（栽種㈣_、栽種犁溝土壤播混）、 種列噴麗）、i稽t、栽種列土壤推混、於生長期之栽 播種時之裁種η 之理（播種時之栽種列噴灑、 壌摻混）、其枱化、整體處理（整體喷灑、整體土 樹冠下或主、::鹿處理（生長期的葉部細粒喷灑、噴麗於 干°圍、土壌表面喷灑、土壤表面摻混、播種 318750 168 200804250 脈基部、植株間喷灑)、其它灌概處理(灌 灌規於植物二霍概、殺蟲劑溶液的注射處理、 ,_氐邛、殺蟲劑溶液的滴注灌溉、化學品灌親 田圃箱處理（苗圃箱嘻嚼 # /尤）、 盤嘖償、#圃单4 田箱灌溉）、苗圃盤處理（苗圃 ^既)、苗圃床處理(苗圃床喷灑、苗圃床 土壤摻混處_子==苗圃植株的浸沒）、種子床的 混）、其它處理播種前種子床的土壌摻 壤摻混入雨滴、栽種::二’;、犁田、表面土壌摻混、土 ::)t冑子處理為-種表現對抗害蟲之防治功效之乂 如受到害蟲進食等損宝H 刀直接處理欲保護避免諸 塗刷處理、沈浸處理：責;:;重子處， 理及丸粒塗覆處王里u &lt; 知用免理、薄膜塗覆處 到害蟲損害之處理方：種保護作物避免受 耕溶液等，俾便浐 二/…二由以活性成分處理水 諸如宝虫、隹入 灸透或轉位進入欲保護避免受到 4如告蛾進食等損害的作物植株内部；具 ，，又= 液處列舉::耕溶液摻混、水耕溶液混合等。“ 了片械X明之蟲害防治方法中，化合物（I)或i a之於用曰 可依據施用時間、施用位？飞一之靶用量 性成分（化合物⑼之用量 方法寻改變，’但通常活 佳為約5〇至侧克/公頃。:二、”3太至3000克/公頃，較 濕潤散劑等時，可以水稀釋使用：；=之殺赢劑為可 吏用讓活性成分之終濃度變 318750 169 200804250 成約0·1 ppm至1,000 ppm且較隹約l〇 ppm至500 ppm之 範圍。 後文將藉下列製造例、實例、製備例、試驗例等進一 步舉例說明本發明，但本發明炎非限於此等實例。 製造例、實例、及參考製造例之管桎層析術的洗提係 於猎TLC (薄層層析術）觀察下進行。於TLC觀察中，使用 默克公司（Merck &amp; Co·，Inc·)製造的凱思捷（kieselgel) 6OF254作為TLC平板；管柱層析術中用作為洗提溶劑之溶 劑係作為展開溶劑；紫外光檢測器係用以檢測。默克公司 製造的凱思捷60 (70至230篩號）係用作為管柱層析術之 石夕膠。至於中壓製備性高效液相層析術，使用亞瑪真 (Yamazen，Co·，Ltd·)製造的阿徹沛克（Ultrapack)(填充劑： 矽膠）。當使用混合溶劑作為展開溶劑時，括弧中的數值顯 示以體積計，溶劑之混合比。NMR光譜為質子NMR，且 使用 JEOL AL_400 (400 MHz)光譜儀及 Bruker AVANCE 400 (400 MHz)光譜儀使用四曱基石夕烧作為内標準加以測 定。全部δ值皆以ppm表示。除非另行陳述，否則測量溫 度為25°C，其餘則已指示其測量溫度。 此外’下列製造例及實例使用之縮寫具有下列意義：R1 represents a fluorenyl group, a chlorine atom, a bromine atom or a fluorine atom, and R2 represents a fluorine atom, a gas atom, a bromine atom, a C1-C4 haloalkyl group or a C1-C4 ifi alkoxy group, and R3 represents a fluorine atom, a chlorine atom, or a bromine group. Atom, R4 represents a hydrogen atom; optionally a C1-C4 substituent substituted by a hydroxy group 'one or more halogen atoms, a cyano group, a thiol group, a methylsulfinyl group or a decylsulfonyl group; C3- C4 alkenyl; C3-C4 alkynyl; or C3-C5 cycloalkyl, R5 represents a hydrogen atom or a fluorenyl group, R6 represents a hydrogen atom, a fluorine atom or a chlorine atom, and R7 represents a halogen atom, a fluorine atom or a chlorine atom. Active ingredients of the smoldering agent include, for example, acequinocyl, amitraz, benzoximate, bifenazate, bromopropylate, odd Benzomethionat, chlorobenzilate, CPCBS (chlorfenson), clofentezine, cyflumetofen, kelthane (to be dicofol), ettoxaz (et〇xaz〇ie), fenbutatin oxide, fenothi〇carb, fenpile mai 154 318750 200804250 (fenpyroximate), fluacrypyrim, fluproxyfen, hexythiazox, propargite (BPPS), polynactins, piridaban (pyridaben), Pyrimidifen, tebufenpyrad, tetradifon, spirodiclofen, amidoflumet, etc. The active ingredients of the nematicide include, for example, DCIP, fosthiazate, levamisol, methyl isothiocyanate, morantel tartrate, and the like. The active ingredients of the fungicide include, for example, acibenzolar-S-methyl, amobam, ampropylfos, anilazine, azorzebin ( Azoxystrobin), benalaxyl, benodanil, benomyl, benthiavalicarb, bethithiazole, bethoxazin, Bitertanol, blasticidin-S, Bordeaux mixture, boscalid, bromuconazole, buthiobate , hypochlorous acid, polysulfide|bow, captan, carbendazol, carboxin, carpropamid, chlobenthiazone, gram Chloroneb, chloropicrin, chlorothalonil (TPN), chlorthiophos, cinnamaldehyde, clozylacon, CNA (2,6- Dichloro-4-nitroaniline), copper hydroxide, copper sulfate, 希佐法米155 318750 200804250 (cyazofamid), cyfluphenamid, cymoxanil, cyproconazole, cyprodinil, cyprofuram, dazomet , debacarb, dichlofluanid, DD (1,3-dichloropropene), diclocymet, diclomezine, diethofencarb, phenophene Difanoconazole, diflumetorim, dimefluazole, dimethirimol, dimethomorph, diniconazo _M (diniconazole- M), dinocap, edifenphos, epoxiconazole, nickel dimethyldithiocarbamate, etaconazole, isabel Ethoboxam, ethirimol, etridiazole, famoxadone, fenamidone, fenarimol, fenbuconazo Fenbuconazole), Fendazosulam, fenhexamid ), fenoxanil, fenpiclonil, fenpropidin, fenpropimorph, fentiazon, fentin , Ferimzone, fluazinam, fludioxonil, flumetover, flumorph, fluoroimide, Frigmazzo Fluotrimazole), fluoxastrobin, fluquinconazole, flusilazole, flusulfamide, flutolanil, flutriafol, buddha斯提-A1 (fosetyl-Al), fthalide, 156 318750 200804250 fuberidazole, furalaxyl, furametpyr, furcarbanil ), furconazole - Chuanbei, hexaconazole, hymexazol, IBP, imazalil, imibenconazole, Iminotadin-abesilate, Imi Tatin-triacetate, iodocarb, ipconazole, iprodione, iprovalicarb, isopr thiolane ), kasugamycin, kresoxim-mercapto, mancozeb, maneb, mepanipyrim, mepronil, Metalaxyl, Metalaxi-M, metam-na, methasulfocarb, methyl bromide, metconazole, methfuroxam ), metominostrobin, metrafenone, metsulfovax, mildiomycin, milneb, myclobutanil , myclozolin, nabam, oresastrobin, ofurace, oxadixyl, oxolinic acid, oxpoconazole ), oxycarboxin, oxytetracycline, pefurazoate ), penconazole, pencycuron, picoxystrobin, polyurethane, polyoxin, potassium hydrogencarbonate, probenazole , prochloraz, procymidone, bopamoca 157 318750 200804250 (propamocarb)-hydrochloride, bopiconna (pr〇pic〇naz〇ie), popina (Pr 〇pinet〇, Pochanaji (pr〇qUinazi(j), prothiocarb, pr〇thi〇c〇nazole, pyracarbolid, Pirac Cheraci〇str〇bin, pyrazophos, pyri|3Uticarb, pyrifenox, pyrimethanil, Pilo Kwai Pyroquilon), quinovirin (qUin0Xyfen), quint〇zene (PCNB), siithi〇pham, simeconazole, sipCOI1azole , sodium bicarbonate, sodium hypochlorite, spiroxamine, ((E)-2-[2-(2,5-dimethylphenoxymethyl)phenyl]_2_ oxyimino-N-methylacetamide, streptomycin, sulfur, tebuconazole, tecloftalam, tetraconazole, Thiabendazole, thiadinil, thiram (TMTD), thifluzamide, thiophanate _ 曱 、, tolclofos - Methyl, TPN, triadimefon, triadimenol, triazoxide, trillamide, tricyclazole, tridemorph, triva Triflumizole, trifloxystrobin, triforine, triticonazole, validamycin, vinclozolin, viniconazole ), zineb, ziram and zoxamide active ingredients of herbicides and plant growth regulators including, for example, LY KOH 158 318750 200804250 (abcisic acid), acetochlor ), acifluorfen-a, Alachlor, alloxydim, ametryn, amicarbazone, amidosulfuron, aminoethoxyethylglycine, A Alphapyralid, AC94, 377, amiprofos-methyl, ancymidol, asulam, atrazine, avivensis ), azimsulfuron, beflubutamid, benfluralin, benfuresate, bensulfuron, sulki, bansurai (bensulide) (SAP), bantazone, benthiocarb, benzamizole, benzfendizone, benzobicyclon, banzo Benzofenap, adenine, benzylamine, bialaphos, bifenox, Brassinolide, bromacil , bromobutide, butachlor, butafenacil, butamim Butamifos), butadiate, cafenstrole, carbonic acid bow, peroxidation|bow, carbaryl, chlomethoxynil, chloridazon, Chlorimuron·ethyl, chlorphthalim, chlorpropham, chlorsulfuron, chlorthal, dimercapto, clossey Chlorthiamid (DCBN), gasified biliary test, cinidon-ethyl, cinmethylin, cinosulfuron, clethodim, comapo 159 318750 200804250 (clomeprop), cl〇Xyfonac-sodium, chlormequat chloride, 4-CPA (4-chlorophenoxyacetic acid), cliprop, cliprop Clofencet, cumyluron, cyanazine, cydanilide, cyclosulfamron, cyhalofop-butyl, 2 , 4 · dichloro-p-oxyacetate, dichlorprop (2,4-DP), daimuron, Dala Dalapon) (DPA), dimethenamid_P, daminozide, dazome, n-decyl alcohol, dicamba-nano (MDB A), to be kebei Dichlobenil (DBN), to diflufenican, to dikegulac, to dimepiperate, to dimethametryn, to dimethenamid, Diquat, dithiopyr, diuron, endothal, epocholeone, esprocarb, ethephon ), ethidimuron, ethoxysulfuron, ethychlozate, etobenzanid, fenarimol, fenoxaprop ) _ ethyl, fentrazamide, flazasulfuron, florasulam, fluazifop, butyl, fluazolate, flu Flucarbazone, flufenacet, flufenpyr, flumet Ralin), flumioxazin, flupropanate, flupyrsulfuron _ thiol-na, flurprimidol, fluthiacet )-曱基,弗兰索160 318750 200804250 Foramsulfuron, forchlorfenuron, formesafen, gibberellin, glufosinate, lattice Glyphosate, halosulfuron - thiol, hexazinone, imazamox, imazapic, imazapyr, Imazaquin, imazosulfuron, inabenefide, indole acetic acid (IAA), indolebutyric acid, iodosulfuron, Iošini ( Ioxynil)-octanoate, isouron, isoxachlortole, isoxadifen, karbutilate, lactofen, renache Lenacil), linuron, LGC-42153, bismuth succinate, mecoprop (MCP) P), 2-mercapto-4-chlorophenoxyacetate, MCPA·thioethyl, ethyl 2-methyl-4-chlorophenoxybutyrate, mefenacet, memphis Mefluidide, mepiquat, mesosulfuron, mesotrione, methyl daimuron, metamifo, meto Meolachlor, metribuzin, metsulfuron-mercapto, molinate, naphthaleneacetic acid, 1-naphthylamine, naproanilide, Napo Napropamide, n-decyl alcohol, nicosulfuron, n-phenylphthalic acid, orbencarb, oxadiazon, Osage Oxaziclomefone), oxine-sulfate, paclobutrazol, paraquat, tannic acid, pendimethalin, penoxsulam, pantosazon 161 318750 200804250 (pentoxazone), pethoxamide, phenmedipham, picloram, picecinafin (pic Olinafen), piperonyl butoxide, piperophos, pretilachlor, primisulfuron - methyl, procarbazone, prodiamine , profluazol, profoxydim, prohexadione-pro, prohydrojasmon, prometryn, propanil ), propoxycarbazone, propyzamide, pyraclonil, pyraflufen-ethyl, pyrazolate, pilazosov Pyrazosulfuron-ethyl, pyrazoxyfen, pyribenzoxim, pyributicarb, pyridafol, pyridate, Pyrifalid, pyrimiminobac, thiol, pyrithiobac, quicocrac, quinoclamine, quizalofop -ethyl, rimsulfuron, sethoxydim Siduron, simazine, simetryn, sodium chlorate, sulfosulfuron, swep (MCC), tebuthiuron, Tepalaloxydim, terbacil, terbucarb (MBPMC), thenylyl, thiazafluron, thidiazuron, 黎Thifensulfuron - 曱基, triaziflam, tribufos, triclopyr, 崔迪芳162 318750 200804250 (tridiphane), trifloxysulfuron, triva Trifluralin, trinexapac-ethyl, tritosulfuron, uniconazole_P, and vemolate (PPTC) 杀Insecticides of the present invention It can also be further mixed with synergists, synergists such as piperonyl butoxide, sesamex, N-(2-ethylhexyl)-8,9,l〇-three norborns -5-ene-2,3-dicarboxylimine imine (MGK 264), WARF-anti-drug and diethyl succinate; In addition, it can also be mixed with safeners such as benoxacor, cloquintocet-mexyl, cyometrinil, daimuron, dichlormid ), fenchlorazole-ethyl, fenclorim, flurazole, fluxofenim, furilazole, mefenpyr-di Examples of pests in which the MG, MG191, naphthoic anhydride, and oxabetrinil oxime compound (I) or a salt thereof are active include arthropods such as insect pests, mites, and nematode pests. The specific examples are as follows: Delphacidae such as Laodelphax striatellus, Nilaparvata lugens, Sogatella furcifera, etc.; Deltocephalidae Such as pseudo black tail floating dust (Nephotettix cincticeps), black tail floating dust (Nephotettixvirescens), etc.; Aphididae (Aphis gossypii), green peach (Myzus 163 318750 200804250 persicae), cabbage teeth (Brevicoryne brassicae), horse Macrosiphum euphorbiae, Aulacorthum solani, Rhopalosiphum padi, tropical citrus tooth (Toxoptera citricidus), etc.; Pentatomidae such as Nezara antennata, cardamom (Riptortus clavetus), Leptocorisa chinensis, Eysarcoris parvus and Halyomorpha mista; Aleyrodidae such as Trialeurodes vaporariorum, silver leaf powder ( Bemisia argentifolii), etc.; Coccidae such as California Red ( Aonidiella aurantii), Comstockaspisperniciosa, Unaspis citri, Ceroplastes rubens, Icerya purchasi, etc.; Tingidae; (Psyllidae); et al. Lepidoptera: Pyralidae such as Chilo suppressalis, Tryporyza incertulas, Cnaphalocrocis medinalis, Notarcha derogata, Plodia interpunctella, Oriental corn Ostrinia furnacalis, Hellula undalis, Pediasiateterrellus, etc.; Noctuidae such as Spodoptera litura, Spodoptera exigua, Spodoptera (Pseudaletia separata), Cabbage worm (Mamestra brassicae), Brassica californica (8:8 〇1^丨卩5丨1〇11), root locust mites (?111 to &amp;1^81^丨8113 ), the genus Thoricoplusia spp., Heliothis spp., and the genus Helicoverpaspp.; Pieridae, such as Pierisrapae; T〇rtricidae ) such as genus 164 318750 200804250 (Adoxophyes spp.), oriental fruit moth (Grapholita molesta), soybean pod (Leguminivora glycinivorella), red bean pod filling (Matsumuraeses azukivora), summer fruit roll Moth (Adoxophyes orana fasciata), Adoxophyes sp., Homona magnanima, Archips fuscocupreanns, Cydiapomonella, etc.; Gracillariidae such as tea Caloptilia theivora, Phyllonycterringoneella, etc.; Carposinidae such as Carposinaniponensis; Lyonetiidae such as Lyonetaspp· Lymantriidae such as Lymantria spp. and Euproctisspp.; Ypon〇meutidae such as Plutellaxylostella; Gelechiidae such as peach Pectinophora gossypiella, Phthorimaea operculella, etc.; Arctiidae such as Hyphantriacunea; Tineidae such as Nesting Moth (1^&amp;; playing &amp; 113111. 6115), and net coat moth (1 ^ 116 〇 1 &amp; 1 ^ 556111611 &amp;); and so on. Thysanoptera: Thripidae such as Frankliniella occidentals, Thrips parmi, Scirtothrips dorsalis, Thrips tabaci, flower hummer Frankliniellaintonsa) and so on. Diptera: Muscadomestica, Culex popiens pallens, Tabanus trigonus, Hylemya antiqua, Hylemya platura, Aedes 165 318750 200804250 sinensis ), Agromyza oryzae, Hydrelliagriseola, Chlorops oryzae, Dacus cucurbitae, Ceratitis capitata, Liriomyzatrifolii Wait. Coleoptera · Epilachna vigintioctopunctata, Aulacophora femoralis, Phyllotreta striolata, Oulema oryzae, Enchinocnemus squameus, rice water (Lissorhoptrus oryzophilus), Anthonomus grandis, Callosobruchus chinensis, Sphenophorus venatus, Popillia japonica, Anomala cuprea, corn rootworm Diabrotica spp.), Leptinotarsa decemlineata, Agriotes spp., Lasioderma serricorne, Anthrenus verbasci, Tribolium castaneum, European bamboo meal ( Lyctus brunneus), Anoplophora malasiaca, Tomicus piniperda, and the like. Orthoptera: Locusta migratoria, Gryllotalpa africana, Oxya yezoensis, Oxya japonica, etc. Aphididae (Athalia) Rosaae), Acromyrmex spp.), Solenopsis spp., and the like. Nematodes: Aphelenchoides besseyi, Nothotylenchusacris, etc. 166 318750 200804250 Blattodea: Blattella germanica, Periplaneta fuliginosa, Periplaneta (Blatta orientalis), etc. Stevia: Tetranychidae such as Tetranychus urticae, Panonychus citri, Oligonychusspp·, etc.; Eriophyidae such as Aculopspelekassi; Trasonemidae Such as Polyphagotarsonemuslatus, etc.; Tenuipalpidae; Tuckerellidae; Ixodidae such as Haemaphysalis longicornis, Haemaphysalis flava, Taiwan's Dermacentor taiwanicus, Ixodes ovatus, Ixodes persulcatus, Boophilus microplus, Rhipicephalus sanguineus, etc.; Acaridae Such as Tyrophagus putrescentiae; Epidermoptidae such as Dermatophagoides farina e) European Derbyphagoidesptrenyssnus, etc.; Cheyletidae such as Cheyletus eruditus, Cheyletus malaccensis and Cheyletus moorei; The pest control method of the present invention is carried out by directly applying the compound (I) or a salt thereof to a pest or a pest habitat. In the pest control method of the present invention, the compound (I) Or its salt can be used as its 167 318750 200804250 itself, which is a common aqueous solution of hydrazine compound. ^The preparation or preparation of the pest habitat of the present invention #例包田,条园, orchard, uncultivated minefield, greenhouse 2 ::Field, well box, seedling growth medium, seedling growth 塾 = field growth plate, seedlings, etc. Hydroponic medium that is not cultivated in the farm. As for the application method, for example, sprinkling treatment and hydroponic treatment. Table treatment, seed treatment The spray treatment of the present invention is _ (1) or a salt thereof for treating a plant surface or a worm; and the active ingredient (the treatment method of the compound treatment effect, specifically V is a protective crop against pests) Avoid pest damage = Go. The method is to treat the soil by using the active ingredient to treat the soil. The active ingredient is infiltrated by the roots and the like, and is transferred to the inside of the soil to protect the crop from soils such as pests to crops. The treatment is, for example, planting hole treatment (planting holes: saying, soil blending), plant Qiqiu Xing, blending after planting hole treatment, plant bottom irrigation, plant bottom spraying, plant bottom plowing, planting plow, Covering,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, In the growing period, when planting, the seeding is η (planting, planting, spraying, mixing), its integration, overall treatment (integral spraying, under the overall soil canopy or main, :: deer treatment (growth) Leaf detail Spraying, spraying on the dry circumference, spraying on the surface of the soil, mixing the soil surface, sowing 318750 168 200804250 pulse base, spraying between plants), other irrigation treatment (irrigation irrigation in the plant two Huo, insecticide Injection treatment of solution, _ 氐邛, drip irrigation of pesticide solution, chemical irrigation, 圃 圃 box treatment (Miao 圃 box chewing # / especially), 啧 啧, #圃单4 field box irrigation), nursery Plate treatment (Miaolu ^ both), nursery bed treatment (seedling bed spraying, seedling bed soil mixing _ sub == immersion of nursery plants), seed bed mixing), other treatment of soil bed before seeding Mixed with raindrops, planting:: two ';, ploughing, surface soil mixing, soil::) t 处理 处理 为 - - - - 种 种 表现 表现 表现 表现 表现 表现 表现 表现 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到 受到Avoid all brushing and immersion treatments: Responsible;:; Heavy bar, and the pellet coating area Wang Li u &lt; Know the use of the treatment, film coating to the pest damage treatment: plant protection crops to avoid ploughing Solution, etc., sputum 浐 two /... two by treating the water with active ingredients such as worms Moxibustion through the short-tailed or translocation into the interior of the crop plants to be protected from being reported as 4 moths feeding damage and the like; and with ,, :: = liquid at farming include solution blending, mixing, etc. hydroponic solution. "In the method of controlling insect pests of the tablet X Ming, the compound (I) or ia can be used according to the application time, the application position, the target dosage component of the fly (the compound (9) is used to change, 'but usually good It is about 5〇 to side g/ha.: 2, “3 to 3000g/ha, when it is moisturizing, etc., it can be diluted with water:;=The killing agent is used to make the final concentration of the active ingredient change. 318750 169 200804250 is about 0. 1 ppm to 1,000 ppm and is in the range of about 10 ppm to 500 ppm. Hereinafter, the present invention will be further exemplified by the following production examples, examples, preparation examples, test examples, and the like, but the present invention Not limited to these examples. The elution of tube chromatography by manufacturing examples, examples, and reference manufacturing examples was performed under the observation of hunting TLC (thin layer chromatography). In TLC observation, Merck was used (Merck) Kieselgel 6OF254 manufactured by & Co Co, Inc. is used as a TLC plate; solvent used as a solvent for elution in column chromatography is used as a developing solvent; UV detector is used for detection. Merck & Co. Made by Keith 60 (70 to 230 mesh) Used as a column chromatography for column chromatography. For medium-pressure preparative high-performance liquid chromatography, use Ultrapack (filler) manufactured by Yamazen, Co., Ltd. : Silicone). When using a mixed solvent as the developing solvent, the values in parentheses show the mixing ratio of the solvent by volume. The NMR spectrum is proton NMR, and JEOL AL_400 (400 MHz) spectrometer and Bruker AVANCE 400 (400 MHz) are used. The spectrometer was measured using an internal standard as the internal standard. All δ values are expressed in ppm. Unless otherwise stated, the measurement temperature is 25 ° C, and the rest has been instructed to measure the temperature. In addition, 'the following manufacturing examples and examples are used. Abbreviations have the following meanings:

Me :曱基，Et :乙基，Ph :笨基，pr-n (或n-pr) ·•正 丙基，Pr-i (或 i-Pr 或 :異丙基，pr_cyci〇 (或 CyCi〇-pr): 環丙基，Bu_n (或 η-Βιι):正 丁基，Bu-i (或 i-Bu):異 丁基， Bu-s (或 s-Bu) ·•第二丁基，Bu_t (或 t-]Bu):第三 丁基，s : 早释^ ’ br ·兔峰&quot;’ brs ·見早峰，d :雙峰，t :三峰，q :四 170 318750Me : mercapto, Et: ethyl, Ph: stupid, pr-n (or n-pr) · n-propyl, Pr-i (or i-Pr or: isopropyl, pr_cyci〇 (or CyCi〇) -pr): cyclopropyl, Bu_n (or η-Βιι): n-butyl, Bu-i (or i-Bu): isobutyl, Bu-s (or s-Bu) ·• second butyl, Bu_t (or t-]Bu): third butyl, s: early release ^ 'br · rabbit peak &quot;' brs · see early peak, d: doublet, t: three peaks, q: four 170 318750

)，m :多峰， Hz :赫茲，％ : 首先，將顯示化合物(I)之製造例及實 200804250), m : multimodal, Hz: Hertz, % : First, the manufacturing example of the compound (I) will be shown and the actual 200804250

重量％。此外， 首先，將I 實例1weight%. Also, first, I will be instance 1

-2-吼略咬酮之溶液， 循序添加至混合物，所得混合物於rc攪拌2小時。於反 應混合物内，於以冰冷卻下於至25t加入1〇毫升飽和 氯化銨水溶液與5毫升水之混合物，接著以1〇毫升乙酸乙 酯卒取3次。有機層以1〇毫升飽和氯化鈉水溶液洗滌3 次，以無水硫酸鎂脫水，及於減壓下濃縮。所得殘餘物藉 石夕膠管柱層析術純化（乙酸乙酯：氯仿：己烷=1 ·· 1 ·· 4)， 15克氫化鈉（含量；60重量％)，混合 毫升氯甲基甲基醚於1毫升曱基 及克氫化鈉（含量；6〇%)於 進一步藉中壓製備性高效液相層析術純化（乙酸乙酯：氯 仿··己烧=15 : 15 : 70)，獲得0.51克1，3-貳（甲氧基甲 基）_1-(2,6-二氟苯甲醯基）-3-[2-氟-4-(三氟甲硫基）苯基]脲 (後文稱作本化合物（1))。 本化合物（1)A solution of -2-oxime ketone was added sequentially to the mixture, and the resulting mixture was stirred at rc for 2 hours. A mixture of 1 ml of a saturated aqueous solution of ammonium chloride and 5 ml of water was added to the reaction mixture under ice-cooling, and then the mixture was stirred three times with 1 ml of ethyl acetate. The organic layer was washed three times with 1 mL of saturated aqueous sodium chloride, dried over anhydrous magnesium sulfate and evaporated. The obtained residue was purified by silica gel column chromatography (ethyl acetate: chloroform:hexane = 1··1·· 4), 15 g of sodium hydride (content; 60% by weight), and mixed with chloromethylmethyl The ether was purified by further preparative high performance liquid chromatography (ethyl acetate: chloroform··hexane = 15:15:70) in 1 ml of hydrazino and sodium hydride (content; 6 %). 0.51 g of 1,3-indolyl (methoxymethyl)_1-(2,6-difluorobenzhydryl)-3-[2-fluoro-4-(trifluoromethylsulfanyl)phenyl]urea This is hereinafter referred to as the present compound (1)). The compound (1)

171 318750 200804250 ^H-NMR (CDCl3)5[ppm]： 3.37 (3H, s), 3.54 (3H, s) 4 81 (4H? m) * 實例2至20 根據與實例1相同之方式，製造下列化合物。 一U_武（乙氧基甲基)小(¥二氟苯甲酿基)_3♦氣 -4-(二氟甲硫基）苯基]脲（後文稱作本化合物⑺）。 本化合物（2) 0 0 __yV ch2 ch2 ch3ch20 och2ch3171 318750 200804250 ^H-NMR (CDCl3) 5 [ppm]: 3.37 (3H, s), 3.54 (3H, s) 4 81 (4H?m) * Examples 2 to 20 The following were produced in the same manner as in Example 1. Compound. A U_wu (ethoxymethyl) small (¥ difluorobenzyl)_3♦ gas-4-(difluoromethylthio)phenyl]urea (hereinafter referred to as the present compound (7)). The present compound (2) 0 0 __yV ch2 ch2 ch3ch20 och2ch3

•SCFq W-NMR (CDC13)5[ppm]: i 1G(3H，t)，h brM-79(2H^4·84^^ 7·30_7·34(1Η，m)5 7·42-7·48(3Η，m) 家（甲氧基甲基）小(2_氯-6_氟苯甲驢基）_3_[2_氟 -4_(二氣甲硫基）苯基]脲（後文稱作本化合物⑶）。 本化合物（3)• SCFq W-NMR (CDC13) 5 [ppm]: i 1G (3H, t), h brM-79 (2H^4·84^^ 7·30_7·34(1Η,m)5 7·42-7· 48(3Η,m) Home (methoxymethyl) small (2_chloro-6-fluorobenzhydryl)_3_[2_fluoro-4_(dimethylthio)phenyl]urea (hereinafter referred to as This compound (3)). This compound (3)

SCF, lR~NMR (CDC13)S[ppm]: 3.34 (3H, brs), 3 56 (3H brs) 4.60-5.30 (4H，brm)，6.80_7 〇 . ( H,㈣， h、7h， .U(j(1H，br)，7.10-7.30 (2H， brm)，7·44-7·52 (3H，m) 1’3-寒（甲氧基甲基）_^(26_-患 I，6 一虱本甲醯基）_3-[2-氟 318750 172 200804250 -4-(三氟曱硫基）苯基]脲（後文稱作本化合物（4))。 本化合物（4)SCF, lR~NMR (CDC13)S[ppm]: 3.34 (3H, brs), 3 56 (3H brs) 4.60-5.30 (4H,brm),6.80_7 〇. ( H,(iv), h,7h, .U (j(1H,br),7.10-7.30 (2H, brm),7·44-7·52 (3H,m) 1'3-cold (methoxymethyl)_^(26_-I,6虱3-[2-Fluorum 318750 172 200804250 -4-(trifluorosulfonylthio)phenyl]urea (hereinafter referred to as the present compound (4)). This compound (4)

W-NMR (CDCl3)3[ppm]: 3·31(3Η, s)，3·57(3Η，s)，4·73(2Η br)，5·0-5·2(2Η，br)，7·24-7·27(3Η，br)，7·45-7·48(2Η，m) 7·60-7·64(1Η，m) 1，3-貳（曱硫基曱基）-1-(2,6-二氟苯曱醯基）_3_[2_氣 二氟甲硫基）苯基]脲（後文稱作本化合物（5乃。 本化合物（5)W-NMR (CDCl3) 3 [ppm]: 3·31 (3Η, s), 3·57 (3Η, s), 4·73 (2Η br), 5·0-5·2 (2Η, br), 7·24-7·27(3Η,br),7·45-7·48(2Η,m) 7·60-7·64(1Η,m) 1,3-贰(曱thiosulfonyl)- 1-(2,6-difluorophenylindenyl)_3_[2_aero-difluoromethylthio)phenyl]urea (hereinafter referred to as the present compound (5 is. This compound (5)

'H-NMR (CDCl3)6[ppm]: 2.15-2.,20 (3H? brs)9 2.23 (3H s) 4.50-5.10 (4H，brm)，6·85·6·99 (2H，m)，7·33-7·52 (4H，m) 1，3-貳（甲氧基甲基）-1-(2,6-二氟苯甲醯基）-3-(4_氯_2_ 氟苯基）脲（後文稱作本化合物（6))。 本化合物（6)'H-NMR (CDCl3) 6 [ppm]: 2.15-2., 20 (3H? brs)9 2.23 (3H s) 4.50-5.10 (4H,brm),6·85·6·99 (2H,m) ,7·33-7·52 (4H,m) 1,3-贰(methoxymethyl)-1-(2,6-difluorobenzhydryl)-3-(4_chloro_2_fluoro Phenyl)urea (hereinafter referred to as the present compound (6)). The present compound (6)

W-NMR (CDCl3)5[ppm]·· 3·37(3Η，s)，3·51(3Η, s)，4·8(2Η br)，5·1(2Η，br)，6·85-6·89(2Η，m)，7·12-7·20(2Η，m)， 318750 173 200804250 7.3 1-7.38(2H9 m) -氯苯 基）脲（後文稱作本化合物（7))。 本化合物（7)W-NMR (CDCl3) 5 [ppm]·· 3·37 (3Η, s), 3·51 (3Η, s), 4·8 (2Η br), 5·1 (2Η, br), 6.85 -6·89(2Η,m),7·12-7·20(2Η,m), 318750 173 200804250 7.3 1-7.38(2H9 m)-chlorophenyl)urea (hereinafter referred to as this compound (7) ). This compound(7)

H-NMR(CDCl3)S[ppm]: 3·35(3Η，s)，3·45(3 br)，5」（2H，br)，6.88-6.92(2H，m)，7.2l-7.23(2H 2Η 7·33-7·37(3Η，m). ，扭， i，3·貳（曱氧基甲基）_1-(2,6_二氟笨甲醯基）_3_(3 $ 一 氯二氟苯基）脲（後文稱作本化合物（8乃。 本化合物（8)H-NMR (CDCl3) S [ppm]: 3·35 (3Η, s), 3·45 (3 br), 5" (2H, br), 6.88-6.92 (2H, m), 7.2l-7.23 ( 2H 2Η 7·33-7·37(3Η,m). , Twist, i,3·贰(曱oxymethyl)_1-(2,6-difluoro-capto-methyl)_3_(3 $-chlorine Difluorophenyl)urea (hereinafter referred to as this compound (8 is. This compound (8)

s)，4·8(2Η， H-NMR (CDCl3)3[ppm]: 3.35(3H，s)5 3·53(3Η, s) 4 br)，5·1(2Η，br)5 6·89_6·92(2Η，br)，7·35-7·4ΐ〇τί ’ I3·貳（甲氧基曱基）-1-(2,6_二氟苯甲醯基）_3 ^ 4-三氟甲基苯氧基）_2-氟苯基]脲（後文稱作本 本化合物（9) )_3例2·氯 化合物（9))。 318750 174 200804250s),4·8(2Η, H-NMR (CDCl3)3[ppm]: 3.35(3H,s)5 3·53(3Η, s) 4 br),5·1(2Η,br)5 6· 89_6·92(2Η,br),7·35-7·4ΐ〇τί ' I3·贰(methoxyindolyl)-1-(2,6-difluorobenzhydryl)_3 ^ 4-trifluoro Methylphenoxy)_2-fluorophenyl]urea (hereinafter referred to as the present compound (9)) - 3 examples 2 · Chlorine compound (9)). 318750 174 200804250

br)，5.0(2H，br), 6.75·6·79(2Η，m)，6.8(2H，m)，7·08_71〇 (1H, m), 7.35-7.38(2H, m), 7.48-7.50(lH, m)? m) 1，3-貳（甲氧基曱基）-1-(2,6-二氟苯曱醯基）_3_[2_氟 -4-(l，l，2,2-四氟乙硫基）苯基]服（後文稱作本化合物（Μ))。 本化合物（10)Br), 5.0(2H,br), 6.75·6·79(2Η,m),6.8(2H,m),7·08_71〇(1H, m), 7.35-7.38(2H, m), 7.48-7.50 (lH, m)? m) 1,3-贰(methoxyindenyl)-1-(2,6-difluorophenylindenyl)_3_[2_fluoro-4-(l,l,2, 2-tetrafluoroethylthio)phenyl] (hereinafter referred to as the present compound (Μ)). Present Compound (10)

]H-NMR (CDCl3)5[ppm]: 3.37(3H5 s)? 3.54(3H5 s)9 4.82(2H br)? 5.0-5.3(2H9 br)? 5.65-5.92(lH? m)5 6.8-6.9(2H? m) 7.31_7·35(1Η，m)，7.43-7·48(3Η，m) 1，3_貳（甲氧基曱基）-1-(2,6-二氟苯曱醯基）_3_(2_氟_4_ 甲硫基苯基）脲（後文稱作本化合物（Π))。 本化合物（11)H-NMR (CDCl3) 5 [ppm]: 3.37 (3H5 s)? 3.54(3H5 s)9 4.82(2H br)? 5.0-5.3(2H9 br)? 5.65-5.92(lH?m)5 6.8-6.9 (2H?m) 7.31_7·35(1Η,m), 7.43-7.48(3Η,m) 1,3_贰(methoxyindolyl)-1-(2,6-difluorophenylhydrazine) Base)_3_(2_fluoro_4_methylthiophenyl)urea (hereinafter referred to as the present compound (Π)). Present Compound (11)

T WNMR (CDCl3)3[ppm]·· 2·48 (3H，s)5 3·38 (3H，s)，3 49 (3Η，s)，4·83 (2Η，s)，5·06 (2Η，s)，6·82_6·91 (2Η，m)， 318750 175 200804250 6·96·7·04 (2H，m), 7·19_7·39 (2H，m) 1，3-貳（f氧基甲基）_丨_(2'氯_6_氟苯甲醯基）_3_(2_氟 -4-甲硫基苯基）脲（後文稱作本化合物（12))。 本化合物（12)T WNMR (CDCl3) 3 [ppm]·· 2·48 (3H, s) 5 3·38 (3H, s), 3 49 (3Η, s), 4·83 (2Η, s), 5·06 ( 2Η,s),6·82_6·91 (2Η,m), 318750 175 200804250 6·96·7·04 (2H,m), 7·19_7·39 (2H,m) 1,3-贰(f oxygen Methyl)_丨_(2'chloro-6-fluorobenzhydryl)_3_(2-fluoro-4-methylthiophenyl)urea (hereinafter referred to as the present compound (12)). Present Compound (12)

々NMR (DMSO-d6，測量溫度：80oC)S[ppm]·· 2.50 (3Η 3.22 (3Η，s)，3·34 (3Η，s)，4·73 (2Η，s)，5·01 (2Η，s)，7·〇9· 7·14 (1Η，m)，7·17-7·36 (4Η，m)，7·44-7·53 (1Η，m) 1，3-貳（甲氧基〒基）·1_(2,6-二氟苯甲醯基）_3_(2_氟_4 乙硫基苯基）脲（後文稱作本化合物（丨3))。 本化合物（13)々NMR (DMSO-d6, measured temperature: 80oC) S[ppm]·· 2.50 (3Η 3.22 (3Η, s), 3·34 (3Η, s), 4·73 (2Η, s), 5·01 ( 2Η,s),7·〇9· 7·14 (1Η,m),7·17-7·36 (4Η,m),7·44-7·53 (1Η,m) 1,3-贰( Methoxycarbonyl)·1_(2,6-difluorobenzhydryl)_3_(2-fluoro-4-ethylthiophenyl)urea (hereinafter referred to as the present compound (丨3)). 13)

!H-NMR (CDCl3)5[ppm]: 1.33 (3H5 t? J = 7.4 Hz)5 2.95 (2H q, J - 7.4 Hz), 3·38 (3H，s)，3·50 (3H，br s)，4·83 (2H s) 5·06 (2H，br s)，6.79-6·92 (2H，m)，7·01-7·10 (2H，m)， 7.19-7.39 (2H? m) 1，3-貳（曱氧基甲基）-1-(2,6-二氟苯甲醯基）_3_[2_氟_4_ (1，1，2,2，2-五氟乙;ε荒基）苯基]脲（後文稱作本化合物（14))。 本化合物（14) 318750 176 200804250!H-NMR (CDCl3) 5 [ppm]: 1.33 (3H5 t? J = 7.4 Hz) 5 2.95 (2H q, J - 7.4 Hz), 3·38 (3H, s), 3·50 (3H, br s), 4·83 (2H s) 5·06 (2H, br s), 6.79-6·92 (2H, m), 7·01-7·10 (2H, m), 7.19-7.39 (2H? m) 1,3-贰(decyloxymethyl)-1-(2,6-difluorobenzhydryl)_3_[2_fluoro_4_ (1,1,2,2,2-pentafluoro) ; ε 基) phenyl] urea (hereinafter referred to as the present compound (14)). The present compound (14) 318750 176 200804250

!H-NMR (CDCl3)5[ppm]: 3.37 (3H, s)? 3.54 (3H? br s)5 4.82 (2H? s)9 5.13 (2H5 br s)? 6.76-6.91 (2H? m)? 7.28-7.38 (1H，m)，7.40-7.51 (3H，m) 1，3-寒（甲氧基甲基）-1-(2,6-二氟苯曱酿基）_3_ [2 _氟 -4-(l，l，2,2,3,3,3-七氟丙硫基）苯基]脲（後文稱作本化合物 (15)) 〇 本化合物（15)!H-NMR (CDCl3) 5 [ppm]: 3.37 (3H, s)? 3.54 (3H? br s)5 4.82 (2H? s)9 5.13 (2H5 br s)? 6.76-6.91 (2H? m)? 7.28-7.38 (1H,m), 7.40-7.51 (3H,m) 1,3-cold (methoxymethyl)-1-(2,6-difluorobenzoquinone)_3_ [2 _fluoro- 4-(l,l,2,2,3,3,3-heptafluoropropylthio)phenyl]urea (hereinafter referred to as the present compound (15)) guanidine compound (15)

!H-NMR (CDCl3)5[ppm]: 3.37 (3H? s)5 3.54 (3H9 br s)? 4·82 (2H，s)，5·13 (2H，br s)，6·74_6·90 (2H，m)，7.28-7.38 (1H，m)，7·41·7·52 (3H，m) 1，3·貳（曱氧基甲基）-1-(2-氯-6-氟苯甲醯基）-3-(2-氟 -4-乙硫基苯基）脲（後文稱作本化合物（μ))。 本化合物（16)!H-NMR (CDCl3) 5 [ppm]: 3.37 (3H? s)5 3.54 (3H9 br s)? 4·82 (2H, s), 5·13 (2H, br s), 6·74_6·90 (2H,m), 7.28-7.38 (1H,m),7·41·7·52 (3H,m) 1,3·贰(曱oxymethyl)-1-(2-chloro-6-fluoro Benzhydryl)-3-(2-fluoro-4-ethylthiophenyl)urea (hereinafter referred to as the present compound (μ)). Present Compound (16)

W-NMRPMSO-dh 測量溫度·· 80〇c)5[ppm]: 127(3H，t， J = 7·3 Hz)，3.01 (2H，q，J = 7.3 Ηζ)，3·23 (3H，s)，3.36 (3H, 177 318750 200804250 S)5 4·73 (2H，br S)，5·03 (2H，S)5 7·12 7 7·25 (2H，m), 7.27-7.34 (2H，m)5 7·43 ?17 (1H，m)，7·19_ U-貳（曱氧基甲基）-1-(2,心二 § #·51 (1H，m) ^本甲醯基）-3-[2-氟-4_ 作本化合物（17)) (1，1，2,2_四氟乙氧基）苯基]脈（後文稱 本化合物（17)W-NMRPMSO-dh Measured temperature ·············· s), 3.36 (3H, 177 318750 200804250 S) 5 4·73 (2H, br S), 5·03 (2H, S) 5 7·12 7 7·25 (2H, m), 7.27-7.34 (2H ,m)5 7·43 ?17 (1H,m),7·19_ U-贰(曱oxymethyl)-1-(2,心二§#·51 (1H,m) ^本甲醯基)-3-[2-Fluoro-4_ as the compound (17)) (1,1,2,2-tetrafluoroethoxy)phenyl] vein (hereinafter referred to as this compound (17)

iH-NMRpMSO-c^，測量溫度：8〇〇r、w q…TT )6【PPm]·· 3·23 (3Η，s)， •36(3H，S)，4.79(2H，s)，5.G4(2H，s)，67i(iH,tt，卜 ^3·1ΗΖΧ7·〇5·7·13(2Η-^·^ 7.32 (1Η, m), 7.41-7.48 (1Η, m), 7.49-7.58 (iH, m) …1，3-武（曱氧基曱基)_l-(2,6·二1苯f酿基;_3_(2_氣-4_ 二氟曱基苯基）脲（後文稱作本化合物（18))。 本化合物（18)iH-NMRpMSO-c^, measured temperature: 8〇〇r, wq...TT)6[PPm]··································· .G4(2H,s),67i(iH,tt,Bu^3·1ΗΖΧ7·〇5·7·13(2Η-^·^ 7.32 (1Η, m), 7.41-7.48 (1Η, m), 7.49- 7.58 (iH, m) ... 1,3- 曱 曱 曱 曱 ( ( 2 2 2 2 ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; 1,3- 1,3- 1,3- 1,3- 1,3- 1,3- 1,3- 1,3- 1,3- 1,3- 1,3- 1,3- 1,3- 1,3- 1,3- 1,3- 1,3- 1,3- 1,3- This is called the present compound (18)). This compound (18)

^-NMR (CDCl3)5[ppm]: 3.38(3H, s), 3.53(3H, s), 4.83(2H M，5.14(2H，br), 6.83-6.87(2H，m)，7.30-7.37(lH，m)， 7·41-7·43(2Η，m)，7·53(1Η，m) 1，3_貳（曱氧基曱基）-1-(2-氯-6-氟苯甲醯基）_3_[2_氟 4-(1，1，2,2_四氟乙硫基）苯基]脲（後文稱作本化合物（丨9)) 本化合物（19) 318750 178 200804250^-NMR (CDCl3) 5 [ppm]: 3.38 (3H, s), 3.53 (3H, s), 4.83 (2H M, 5.14 (2H, br), 6.83-6.87 (2H, m), 7.30-7.37 ( lH,m), 7·41-7·43(2Η,m),7·53(1Η,m) 1,3_贰(曱methoxymethyl)-1-(2-chloro-6-fluorobenzene Mercapto)_3_[2_fluoro-4-(1,1,2,2-tetrafluoroethylthio)phenyl]urea (hereinafter referred to as the present compound (丨9)) The present compound (19) 318750 178 200804250

WNMR (DMSO_d6，測量溫度：80γ)δ[ρρπι]: 3·23 (3H，s) 3·37 (3Η，s)，4·77 (2Η，br s)，5.09 (2Η，s)5 6·65 (1Η，tt，J = 52.5, 3.7 Hz), 7·21 (1H，t，J = 8.8 Hz)，7·32 (1H，d，J = 8.2WNMR (DMSO_d6, measured temperature: 80 γ) δ [ρρπι]: 3·23 (3H, s) 3·37 (3Η, s), 4·77 (2Η, br s), 5.09 (2Η, s) 5 6· 65 (1Η, tt, J = 52.5, 3.7 Hz), 7·21 (1H, t, J = 8.8 Hz), 7·32 (1H, d, J = 8.2

Hz)，7·45-7·52 (1H，m)，7.52-7.59 (2H，m)，7.60-7.65 (1H， m) ， 1，3-貳（曱氧基曱基）-1_(2,6-二氟苯曱醯基）-3-(4-三氟 曱氧基苯基）脲（後文稱作本化合物（2〇))。 本化合物（20)Hz), 7·45-7·52 (1H, m), 7.52-7.59 (2H, m), 7.60-7.65 (1H, m), 1,3-贰(曱methoxycarbonyl)-1_(2 , 6-difluorophenylhydrazino)-3-(4-trifluoromethoxyphenyl)urea (hereinafter referred to as the present compound (2〇)). Present Compound (20)

lH&quot;NMR (CDC13)5[ppm]: 3.33(3H, s), 3.48(3H, s), 4.85(2H br), 5.09(2H, br), 6.86-6.90(2H, m), 7.20-7.36(5H, m) ’ 實例21 1.00克l-(2,6-一氟苯甲醯基）_3_[2_氟_4_(三氟甲硫基） 苯基]-1-曱基脲及0.45毫升氣曱基曱基醚於1〇毫升丨_曱基 -2-吡咯啶酮之溶液經以冰冷卻，〇12克氫化鈉（含量； 重量％)於3°C添加至溶液，混合物於5t：攪拌i小時。反 應混合物内於2t：至25ΐ加入1〇毫升飽和氯化銨水溶液與 5毫升水之混合物，接著以1〇毫升乙酸乙酯萃取3次。有 機層以10毫升飽和氯化財溶液洗3 :欠，以無水硫酸鎮脫 318750 179 200804250 水，及於減壓下濃縮。所得殘餘物藉中璧製傷性高效液相 層析術純化（乙酸乙醋：氯仿：己烧=15: 15 : 7〇)，獲得 0.73克H2,6_二氟苯甲醒基）_3·[2|4_(三氣甲硫基）苯 基]-3-(甲氧基甲基)_：[_甲基服(後文稱作本化合物（川）。 本化合物（21)lH&quot;NMR (CDC13) 5 [ppm]: 3.33 (3H, s), 3.48 (3H, s), 4.85 (2H br), 5.09 (2H, br), 6.86-6.90 (2H, m), 7.20-7.36 (5H, m) 'Example 21 1.00 g of 1-(2,6-fluorobenzhydryl)_3_[2_fluoro_4_(trifluoromethylsulfanyl)phenyl]-1-mercaptourea and 0.45 ml The solution of the gas-based mercaptoether in 1 ml of hydrazine-hydrazino-2-pyrrolidone was ice-cooled, and 12 g of sodium hydride (content; wt%) was added to the solution at 3 ° C, and the mixture was at 5 t: Stir for 1 hour. A mixture of 1 ml of a saturated aqueous solution of ammonium chloride and 5 ml of water was added to the mixture from 2t to 25 s, and then extracted three times with 1 ml of ethyl acetate. The organic layer was washed with 10 ml of saturated chlorinated acid solution 3: owed, and hydrated with anhydrous sulfuric acid to remove 318750 179 200804250 water, and concentrated under reduced pressure. The obtained residue was purified by lignosing high performance liquid chromatography (acetic acid ethyl acetate: chloroform: hexane = 15:15: 7 〇) to obtain 0.73 g of H2,6-difluorobenzamide)_3· [2|4_(trimethylthio)phenyl]-3-(methoxymethyl)_:[_methyl service (hereinafter referred to as this compound (Chuan). This compound (21)

^H-NMRCCDCMafpp^^.lOOH, s), 3.52 (3H, brs), 5.12 (2H, br), 6.86-6.88 (2H, m), 7.30-7.49 (4H, m) 製造例1 ’ “ l.00克1-(2,6-二氟苯甲酿基）-H2-氟-4-(三氟曱硫基） 苯土]腺於1〇笔升1_甲基_2_吡咯啶酮之溶液經以冰冷卻， 0.U克氫化鈉（含量；60重量％)於3。〇添加至溶液，混合 物擾拌30分鐘。〇.50毫升2_(三甲基石夕烧基）乙氧基甲基氯 於1毫升1_曱基_2_°比略咬S同之溶液於4〇C逐滴添加至混合 物，所得混合物於授拌30^童。於反應混合物内於2 C至25 C加人1G宅升餘和氯化銨水溶液與5毫升水之混 合物，接著以10毫升乙酸乙酿萃取3次。有機層以1〇亳 ㈣=氯化納水溶液洗3次，以無水硫_脫水，及於減 左下/辰鈿。所得殘餘物藉矽氧凝膠管柱層析術純化（乙酸乙 醋：己m ’獲得L26克二氟苯甲醯基）_3_[2_ 氟-4_(二氟甲硫基）苯基]-1_[2_(三甲基矽烷基）乙氧基曱 脲。 180 318750 200804250^H-NMRCCDCMafpp^^.lOOH, s), 3.52 (3H, brs), 5.12 (2H, br), 6.86-6.88 (2H, m), 7.30-7.49 (4H, m) Manufacturing Example 1 ' l. 00 g of 1-(2,6-difluorobenzyl)-H2-fluoro-4-(trifluorosulfonylthio) benzoate] gland in 1 liter pen 1_methyl_2_pyrrolidone The solution was ice-cooled, 0. U g of sodium hydride (content; 60% by weight) was added to 3. The solution was added to the solution, and the mixture was stirred for 30 minutes. 50. 50 ml of 2_(trimethyl-stone) ethoxymethyl Chlorine is added to the mixture in 1 ml of 1_mercapto-2_° ratio slightly bite S and the solution is added dropwise to the mixture at 4 ° C, and the resulting mixture is mixed with 30 ° children. In the reaction mixture, 2 G to 25 C is added to 1 G The mixture of the house and the ammonium chloride aqueous solution and 5 ml of water is then extracted three times with 10 ml of acetic acid. The organic layer is washed three times with 1 〇亳 (tetra) = aqueous sodium chloride solution, with anhydrous sulfur _ dehydration, and Subtraction of the lower left / Chenxi. The obtained residue was purified by oxygen gel column chromatography (acetic acid ethyl acetate: hexanes to obtain L26 g of difluorobenzhydryl)_3_[2_fluoro-4_(difluoromethylthio) Phenyl]-1_[2_(trimethyldecyl)ethoxy ureia. 180 318750 200804250

(CH3)3i ^-NMR (CDCl3)5[ppm]: 0.03 (9H? s), 0.89-0.93 (2H m) 3.57-3.61 (2H，m)，5·28 (2H，s)5 7.00-7.05 (2H，m) 7.43-7.49 (3H，m)，8·35-8·39 (1H，m) 製造例2 1·02克l-(2,6_ 一氟本曱酿基）-3-[2-敦-4 _(三氟曱硫美） 苯基]-1-[2-(三甲基矽烷基）乙氧基甲基]脲於毫升丨_甲 基-2-吡咯啶酮之溶液經以冰冷卻，8〇毫克氫化鈉（含量； 60重量％)於3°C添加至溶液，混合物攪拌3〇分鐘，〇19 宅升氯甲基乙基醚於4°C逐滴添加至混合物，所得混合物 於5 C攪拌3小時。於反應混合物内，於2°c至25。〇加入 1〇毫升飽和氯化銨水溶液與5毫升水之混合物，接著以1〇 晕升乙酸乙酯萃取3次。有機層以1〇毫升飽和氣化鈉水溶 液洗3次，以無水硫酸鎂脫水，及於減壓下濃縮。所得殘 餘物藉矽膠管柱層析術純化（乙酸乙酯：己烷: 5)，及進 步藉中壓製備性高效液相層析術純化（乙酸乙酯：己烧 -15 · 85) ’獲得〇·4ΐ克i-(2,6-二氟苯甲醯基）_3_乙氧基曱 基3-[2-氟-4-(二氟甲硫基）苯基]4_[2_(三甲基石夕烧基）乙氧 基甲基]脲。(CH3)3i ^-NMR (CDCl3) 5 [ppm]: 0.03 (9H? s), 0.89-0.93 (2H m) 3.57-3.61 (2H, m), 5·28 (2H, s)5 7.00-7.05 (2H,m) 7.43-7.49 (3H,m),8·35-8·39 (1H,m) Production Example 2 1·02 g of l-(2,6_monofluorobenzyl)-3-[ 2-Dan-4 _(trifluorosulfonium thiol) phenyl]-1-[2-(trimethyldecyl)ethoxymethyl]urea in milliliters of hydrazine-methyl-2-pyrrolidone After cooling with ice, 8 mg of sodium hydride (content; 60% by weight) was added to the solution at 3 ° C, the mixture was stirred for 3 minutes, and 〇 19 liter of chloromethyl ethyl ether was added dropwise to the mixture at 4 ° C. The resulting mixture was stirred at 5 C for 3 hours. Within the reaction mixture, from 2 ° C to 25. A mixture of 1 ml of a saturated aqueous solution of ammonium chloride and 5 ml of water was added, followed by extraction 3 times with 1 liter of ethyl acetate. The organic layer was washed three times with 1 mL of a saturated aqueous sodium chloride solution, dried over anhydrous magnesium sulfate and evaporated. The residue was purified by column chromatography (ethyl acetate:hexane: 5), and purified by medium pressure preparative high performance liquid chromatography (ethyl acetate: hexane - 15 · 85) 〇·4ΐ克 i-(2,6-difluorobenzhydryl)_3_ethoxyindolyl 3-[2-fluoro-4-(difluoromethylthio)phenyl]4_[2_(trimethyl stone Ethyl alcohol) ethoxymethyl] urea.

181 318750 200804250 1 H-NMR (CDC13 )5[ppm]: 〇·〇3 (9H? s)5 〇.80-〇.9〇 (2H? m)9 1.20-1.40 (3H，m)，3.50-3.75 (2H，br)，3·75_3·95 (2H，br)， 4·80_5·00 (2H，br)，5·00_5·40 (2H，br)，6·80_7·〇〇 (2H，br)， 7·30-7·60 (4H，m) 實例22 於0·41克1-(2,6-二氟苯甲醯基）-3 -乙氧基甲基_3_[2-氟-4-(三氟曱硫基）苯基]-H2-(三曱基矽烷基）乙氧基曱基] 脲於10毫升四氫吱喃之溶液内加入2.2毫升四正丁基銨氟 化物（1 ·0M四氳吱鳴溶液），混合物回流加熱6小時。反應 混合物冷卻至室溫，添加至10毫升水，接著以毫升乙 酸乙酯萃取。有機層以1 〇毫升餘和氯化鈉水溶液洗蘇2 -人’以無水硫酸鎂脫水’及於減壓下濃縮。所得殘餘物夢 矽膠管柱層析術純化（乙酸乙酯：氯仿：己烷=1 : 1 : 4)， 獲得0.14克1-(2,6-二氟苯曱醯基）_3_(乙氧基曱基）_3_[2_氟 -4-(三氟甲硫基）苯基]脲（後文稱作本化合物（22))。 本化合物（22)181 318750 200804250 1 H-NMR (CDC13 ) 5 [ppm]: 〇·〇3 (9H? s)5 〇.80-〇.9〇(2H? m)9 1.20-1.40 (3H,m),3.50- 3.75 (2H, br), 3·75_3·95 (2H, br), 4·80_5·00 (2H, br), 5·00_5·40 (2H, br), 6·80_7·〇〇 (2H, br ), 7·30-7·60 (4H,m) Example 22 at 0·41 g of 1-(2,6-difluorobenzhydryl)-3-ethoxymethyl_3_[2-fluoro- 4-(Trifluorosulfonylthio)phenyl]-H2-(tridecylsulfanyl)ethoxyindolyl] Urea was added to a solution of 12 ml of tetrahydrofuran in 2.2 ml of tetra-n-butylammonium fluoride ( 1 · 0M four humming solution), the mixture was heated under reflux for 6 hours. The reaction mixture was cooled to room temperature, added to 10 ml of water and then extracted with ethyl acetate. The organic layer was washed with 1 mL of a solution of sodium chloride and aqueous sodium chloride, and then evaporated. The obtained residue was purified by a silica gel column chromatography (ethyl acetate: chloroform:hexane = 1 : 1 : 4) to obtain 0.14 g of 1-(2,6-difluorophenylhydrazyl) _3 _ ethoxy Indenyl)_3_[2-fluoro-4-(trifluoromethylsulfanyl)phenyl]urea (hereinafter referred to as the present compound (22)). Present Compound (22)

^1.23 (3H, m)，3·61-3·68 (2H， &lt;•95 (3H，m)，7·34-7·40 (2H， !H.NMR (CDCl3)5[ppm]: m)5 4·90-5·20 (2H，brs)，6·88&lt; m)5 7.48-7.51 (2H? m) 實例23至28 製造下列化合物。 根據與實例22相同之方式 318750 182 200804250 l-(2,6-一氟本甲酸基）-3-[2_貌-4-(三氟甲硫基）苯基] -3-(曱硫基甲基）腺（後文稱作本化合物（23))。 本化合物（23)^1.23 (3H, m), 3·61-3·68 (2H, &lt;•95 (3H,m),7·34-7·40 (2H, !H.NMR (CDCl3)5[ppm]: m) 5 4·90-5·20 (2H, brs), 6·88 &lt; m) 5 7.48-7.51 (2H?m) Examples 23 to 28 The following compounds were produced. In the same manner as in Example 22, 318750 182 200804250 l-(2,6-monofluorobenzoic acid)-3-[2_form-4-(trifluoromethylthio)phenyl]-3-(indolylthio) Methyl) gland (hereinafter referred to as this compound (23)). Present Compound (23)

1 sch3 ]Η-ΝΜΚ (DMSO-d6)δ[ρριη]: 2.04 (3Η? s)9 4.88 (2Η? s)5 7.10-7.14 (2Η，m)，7·47-7·54 (1Η，m), 7·60·7·78 (2Η，m)， 7.78-7.81 (1H，m)，10.95 (1H，brs) 1-(2,6-.一 本曱酿基）-3-(4-氯-2-氟苯基）-3-(甲氧基曱 基）脲（後文稱作本化合物（24))。 本化合物（24)1 sch3 ]Η-ΝΜΚ (DMSO-d6)δ[ρριη]: 2.04 (3Η? s)9 4.88 (2Η? s)5 7.10-7.14 (2Η,m),7·47-7·54 (1Η,m ), 7·60·7·78 (2Η,m), 7.78-7.81 (1H,m),10.95 (1H,brs) 1-(2,6-.a brewing base)-3-(4- Chloro-2-fluorophenyl)-3-(methoxyindenyl)urea (hereinafter referred to as the present compound (24)). The present compound (24)

JH-NMR (DMSO-d6)5[ppm]: 3.28(3H? s)? 4.97(2H? br)? 7.13-7.18(2H，m)，7·35-7·38(1Η，m)，7·43-7·60(3Η，m)， 10·83(1Η，br) l-(2,6-二氟苯曱醯基）-3-[2·氟-4-(2-氯-4-三氟曱基苯 氧基）苯基]-3-(曱氧基曱基）脲（後文稱作本化合物（25))。 本化合物（25) 318750 183 200804250JH-NMR (DMSO-d6) 5 [ppm]: 3.28 (3H? s)? 4.97 (2H? br)? 7.13-7.18 (2H, m), 7·35-7·38 (1Η, m), 7 ·43-7·60(3Η,m), 10·83(1Η,br) l-(2,6-difluorophenylindenyl)-3-[2·fluoro-4-(2-chloro-4) -Trifluorodecylphenoxy)phenyl]-3-(decyloxyindenyl)urea (hereinafter referred to as the present compound (25)). The present compound (25) 318750 183 200804250

W-NMR (DMSO-d6)3[ppm]: 3·30 (3H，s)，4.96 (2H，brs)， 6.98-7.01 (1H，m), 7·13-7·29 (4H，m)，7.43-7.54 (2H5 m)， 7.75-7.78 (1H，m)，8.06-8.07 (1H，m)，10.75 (1H，br) 1-(2,6-二氟苯曱醯基）-3-(4-氯苯基）-3-(曱氧基甲基）脲 (後文稱作本化合物（26))。 本化合物（26)W-NMR (DMSO-d6) 3 [ppm]: 3·30 (3H, s), 4.96 (2H, brs), 6.98-7.01 (1H, m), 7·13-7·29 (4H, m) , 7.43-7.54 (2H5 m), 7.75-7.78 (1H, m), 8.06-8.07 (1H, m), 10.75 (1H, br) 1-(2,6-difluorobenzoinyl)-3- (4-Chlorophenyl)-3-(decyloxymethyl)urea (hereinafter referred to as the present compound (26)). Present Compound (26)

!H-NMR (CDCl3)5[ppm]: 3.38(3H? s)? 4.95(2H, s)9 6.89- 6·94(2Η，m)，7·23·7·25(2Η，m)，7·35-7·37(1Η，m)，7·42· 7·44(2Η，m)，7.70 (1H，br) l-(2,6-二氟苯曱醯基）-3-[2-氟-4-(1，1，2,2,2-五氟乙硫 基）苯基]-3-(甲氧基甲基）脲（後文稱作本化合物（27))。 本化合物（27)!H-NMR (CDCl3) 5 [ppm]: 3.38 (3H? s)? 4.95 (2H, s)9 6.89- 6.94 (2Η, m), 7·23·7·25 (2Η, m), 7·35-7·37(1Η,m),7·42· 7·44(2Η,m), 7.70 (1H,br) l-(2,6-difluorobenzoinyl)-3-[ 2-fluoro-4-(1,1,2,2,2-pentafluoroethylthio)phenyl]-3-(methoxymethyl)urea (hereinafter referred to as the present compound (27)). Present Compound (27)

1H-NMR (DMSO-d6，測量溫度：80oC)5[ppm]: 3·31 (3H，s)， 5.01 (2H5 s)? 7.03-7.10 (2H5 m)? 7.43-7.52 (1H? m), 7.54- 318750 184 200804250 7.61 (2H，m), 7.64-7.69 (1H，m), low (1H，br s) l-(2,6-二氯苯甲醯基）_3_(乙氧基曱基）_3_(4_氯苯基）脲 (後文稱作本化合物（28))。 本化合物（28)1H-NMR (DMSO-d6, measured temperature: 80oC) 5 [ppm]: 3·31 (3H, s), 5.01 (2H5 s)? 7.03-7.10 (2H5 m)? 7.43-7.52 (1H? m), 7.54- 318750 184 200804250 7.61 (2H,m), 7.64-7.69 (1H,m), low (1H,br s) l-(2,6-Dichlorobenzhydryl)_3_(ethoxy fluorenyl) _3_(4_Chlorophenyl)urea (hereinafter referred to as the present compound (28)). Present Compound (28)

〇CH2CH3 C1 ^-NMR (CDCl3)5[ppm]: 1.17(3H5 J=7.0 Hz)? 3.58(2H? q J-7.0 Hz)，4.98(2H，s)，7·24-7·30(5Η，m)，7·43-7·45(2Η，m) 7·60_7·80 (1H，br) 製造例3 於20·0克2-氟_4-(三氟曱硫基）苯胺，9ΐ·〇克28%甲醇 納甲醇溶液及50毫升曱醇之混合物内加入4·〇克三聚曱搭 (含量；90重量。/◦)於1〇〇毫升曱醇之懸浮液，混合物於室 溫攪拌6小時。反應混合物倒入300毫升冰水中，將所得 混合物過濾，所得白色固體於減壓下乾燥，獲得21;1克 I氟-Ν_甲氧基曱基-4-(三氟曱硫基）苯胺。〇CH2CH3 C1 ^-NMR (CDCl3) 5 [ppm]: 1.17 (3H5 J=7.0 Hz)? 3.58 (2H? q J-7.0 Hz), 4.98 (2H, s), 7·24-7·30 (5Η , m), 7·43-7·45 (2Η, m) 7·60_7·80 (1H, br) Production Example 3 at 20·0 g of 2-fluoro-4-(4-trifluorosulfonyl)aniline, 9ΐ · Add a 4% gram of trimeric ruthenium (content; 90 wt. / ◦) to a mixture of 1 〇〇ml of sterol in a mixture of 28% methanol in methanol and 50 ml of sterol. The mixture is at room temperature. Stir for 6 hours. The reaction mixture was poured into 300 ml of ice water, and the obtained mixture was filtered, and the obtained white solid was dried under reduced pressure to give 21 g of 1 fluoro-indole-methoxy-methoxy-4-yl(trifluorosulfonyl)aniline.

'H-NMR (CDCl3)6[ppm]: 3.33 (3H? s)5 4.69-4.71 (2H5 m)? 5.10-5.25 (1H，br)，6·94-6·96 (1H，m)，7·26-7·32 (2H，m) 實例29 於！〇·〇克2-氟-Ν·甲氧基曱基-4-(三氟曱硫基）苯胺於 185 318750 200804250 50毫升乙醚之溶液内，於約，。c以約3 入7.17克2,6·二氣苯甲酿基異氰酸酯於7亳升乙B二之、， 液，溫度以2小時時間升高 开岵之洛 時以26毫升己烷洗滌，所得白 反應/心合物經過濾同 13.7克H2,6-二氟苯甲酿基氟末： 基Η_(甲氧基曱基）脲（後文稱作本化合物d瓜基）本 本化合物（29)'H-NMR (CDCl3) 6 [ppm]: 3.33 (3H? s)5 4.69-4.71 (2H5 m)? 5.10-5.25 (1H, br), 6·94-6·96 (1H, m), 7 ·26-7·32 (2H,m) Example 29 at! 〇·〇克 2-fluoro-Ν·methoxy methoxy-4-(trifluorosulfonylthio)aniline in a solution of 185 318750 200804250 50 ml of diethyl ether, about. c, about 7.17 g of 2,6·2 gas benzoyl isocyanate in 7 liters of B, and the solution was washed with 26 ml of hexane when the temperature was raised in 2 hours. The white reaction/heart compound was filtered with 13.7 g of H2,6-difluorobenzyl fluorofuran: hydrazinyl-(methoxyindenyl)urea (hereinafter referred to as the present compound d-melan), the present compound (29)

SCF: ^-NMR (DMS〇.d6)5[ppm]: 3.3〇 (3H5 s)5 5.02 (2H? s)5 7.11-7.15 (2H? m)5 7.51-7.64 (3H5 m)? 7.75-7.78 (1H9 m) 10·97 (1H，brs) ’ 實例30至41 根據與實例29相同之方式，製造下列化合物。 1-(2,6-二氯苯曱醯基氟-4-(三氟曱硫基）苯 基]-3-(曱乳基曱基）脈（後文稱作本化合物（3〇))。 本化合物（30)SCF: ^-NMR (DMS 〇.d6) 5 [ppm]: 3.3 〇(3H5 s)5 5.02 (2H? s)5 7.11-7.15 (2H? m)5 7.51-7.64 (3H5 m)? 7.75-7.78 (1H9 m) 10·97 (1H, brs) 'Examples 30 to 41 The following compounds were produced in the same manner as in Example 29. 1-(2,6-Dichlorophenylhydrazinofluoro-4-(trifluorosulfonylthio)phenyl]-3-(indolyl sulfhydryl) vein (hereinafter referred to as this compound (3〇)) This compound (30)

^-NMR (DMSO-d6)5[ppm]: 3.28(3H? s)? 5.02(2H9 s)? 7·34-7·42(3Η，m)，7·57-7·59(2Η，m)，7·71-7·74(1Η，m)， 10.98(1H，br) 318750 186 200804250 1-(2-氯-6-氟苯曱醯基）-3-[2_氟-4-(三氟曱硫基）苯基] -3-(曱氧基曱基）脲（後文稱作本化合物（31))。 本化合物（31)^-NMR (DMSO-d6) 5 [ppm]: 3.28 (3H? s)? 5.02 (2H9 s)? 7·34-7·42 (3Η, m), 7·57-7·59 (2Η, m ),7·71-7·74(1Η,m), 10.98(1H,br) 318750 186 200804250 1-(2-chloro-6-fluorophenylindenyl)-3-[2_fluoro-4-( Trifluorosulfonyl)phenyl]-3-(decyloxyindenyl)urea (hereinafter referred to as the present compound (31)). Present Compound (31)

W-NMR (DMSO-d6)3[ppm]: 3·29(3Η，s)，5·02(2Η，s)， 7·20·7·24(1Η，m)，7·28-7·30(1Η，m)，7·40_7·41(1Η，m)， 7·58-7·60(2Η，m)，7·73-7·75(1Η，m)，11·〇2(1Η，br) 1·(2,6_二氟苯曱醯基）_3-[2-氟-4-(1，1，2,2-四氟乙硫基) 苯基]-3-(曱氧基曱基）脲（後文稱作本化合物（32))。 本化合物（32)W-NMR (DMSO-d6) 3 [ppm]: 3·29 (3Η, s), 5·02 (2Η, s), 7·20·7·24 (1Η, m), 7·28-7· 30(1Η,m),7·40_7·41(1Η,m), 7·58-7.60(2Η,m),7·73-7·75(1Η,m),11·〇2(1Η ,br) 1·(2,6-difluorophenylindenyl)_3-[2-fluoro-4-(1,1,2,2-tetrafluoroethylthio)phenyl]-3-(oxime A sulfhydryl group (hereinafter referred to as the present compound (32)). Present Compound (32)

^-NMR (DMSO-d6)5[ppm]: 3.31 (3H? s)? 5.02 (2H, s)5 6.58-6.85 (1H，m)，7.10-7.15 (2H，m)，7·47-7·58 (3H，m)， 7.67 (1H，m)，10.91 (1H，brs) l-(2,6-二氟苯曱醯基）-3-(2-氟甲硫基苯基）_3_(曱氧 基曱基）脲（後文稱作本化合物（33))。 本化合物（33)^-NMR (DMSO-d6) 5 [ppm]: 3.31 (3H? s)? 5.02 (2H, s)5 6.58-6.85 (1H, m), 7.10-7.15 (2H, m), 7·47-7 · 58 (3H, m), 7.67 (1H, m), 10.91 (1H, brs) l-(2,6-difluorophenylindenyl)-3-(2-fluoromethylthiophenyl)_3_(曱 曱 )) urea (hereinafter referred to as the present compound (33)). Present Compound (33)

187 318750 200804250 iH_NMR (CDCl3)3[ppm]: 2·51 (3H，s)，3.42 (3H，s), 4·83 (1H， br s)，5.14 (1H，br s)，6·89-6·99 (2H，m)，7.04-7.14 (2H，m)， 7.18-7.29 (1H，m)，7·34-7·45 (1H，m)，7.58 (1H，br s) 1-(2-氯-6-氟苯甲酸基）-3-(2-氟-4-甲硫基苯基）_3_(甲 氧基甲基）脲(後文稱作本化合物（34))。 本化合物（34)187 318750 200804250 iH_NMR (CDCl3)3 [ppm]: 2·51 (3H, s), 3.42 (3H, s), 4·83 (1H, br s), 5.14 (1H, br s), 6·89- 6.99 (2H, m), 7.04-7.14 (2H, m), 7.18-7.29 (1H, m), 7·34-7·45 (1H, m), 7.58 (1H, br s) 1-( 2-Chloro-6-fluorobenzoic acid)-3-(2-fluoro-4-methylthiophenyl)_3_(methoxymethyl)urea (hereinafter referred to as the present compound (34)). Present Compound (34)

W-NMR (DMSO_d6，測量溫度·· 80〇C)3[ppm]: 2 5〇 (3H, s)， 3·29 (3H，s)，4.93 (2H，s)，7·10-7·14 (1H，m)，7.16-7.23 (2H, m)，7·26-7·33 (2H，m)，7·38-7·46 (1H，m)，10·38 (1H，s) l-(2,6-二氟苯曱醯基）_3_(2_氟_4_乙硫基苯基）_3_(甲氧 基曱基）脲（後文稱作本化合物（35))。 本化合物（35)W-NMR (DMSO_d6, measured temperature · · 80 〇 C) 3 [ppm]: 2 5 〇 (3H, s), 3·29 (3H, s), 4.93 (2H, s), 7·10-7· 14 (1H,m),7.16-7.23 (2H, m),7·26-7·33 (2H,m),7·38-7·46 (1H,m),10·38 (1H,s) L-(2,6-Difluorobenzoinyl)_3_(2_fluoro-4-ylthiophenyl)_3_(methoxyindenyl)urea (hereinafter referred to as the present compound (35)). Present Compound (35)

h-NMMDMSO-dh 測量溫度：80〇ρδ[ρριη]: ι·27(3Η，％ J = 7·2 Ηζ)，3·02 (2H，q，J = 7.2 Ηζ)，3·29 (3H，s)5 4·93 (2H, s)，7.04-7.11 (2H，m)5 7.13-7.17 (1H，m)，7.19-7.24 (1H，m)， 7·27-7·32 (1H，m)，7·43-7·52 (1H，m)，10.38 (1H，s) 1-(2-氯-6-氟苯甲醯基）_3_(2_氟-4-乙硫基苯基）-3-(甲 氧基曱基）脲（後文稱作本化合物（36))。 188 318750 200804250 本化合物（36)h-NMMDMSO-dh Measurement temperature: 80〇ρδ[ρριη]: ι·27(3Η,% J = 7·2 Ηζ), 3·02 (2H,q,J = 7.2 Ηζ), 3·29 (3H, s)5 4·93 (2H, s), 7.04-7.11 (2H, m)5 7.13-7.17 (1H,m), 7.19-7.24 (1H,m), 7·27-7·32 (1H,m ),7·43-7·52 (1H,m),10.38 (1H,s) 1-(2-chloro-6-fluorobenzhydryl)_3_(2-fluoro-4-ethylthiophenyl) -3-(methoxyindenyl)urea (hereinafter referred to as the present compound (36)). 188 318750 200804250 The present compound(36)

h-NMRpMSO-c^，測量溫度：80°C)3[ppm]: i 28(3H t J 二 7·4 Hz)，3·01 (2H，q，J = 7·4 Hz)，3·30 (3H，s)5 4·94 (2H， s)，7.12-7.23 (3H，m)，7·26-7·34 (2H，m)，7.37-7.45 (ih m) 10.39 (lH，s) ，， l-(2,6-二氟苯甲醯基）-3-[2-氟-4_(1，1，2,2，_四氟乙氧基) 苯基]-3-(曱氧基甲基）脲（後文稱作本化合物（3乃）。 本化合物（37)h-NMRpMSO-c^, measurement temperature: 80 ° C) 3 [ppm]: i 28 (3H t J 27.4 Hz), 3·01 (2H, q, J = 7·4 Hz), 3· 30 (3H, s) 5 4·94 (2H, s), 7.12-7.23 (3H, m), 7·26-7·34 (2H, m), 7.37-7.45 (ih m) 10.39 (lH, s ),, l-(2,6-difluorobenzhydryl)-3-[2-fluoro-4_(1,1,2,2,-tetrafluoroethoxy)phenyl]-3-(anthracene) Oxymethyl)urea (hereinafter referred to as this compound (3 is). This compound (37)

iH-NMR (DMSO-d6)3[ppm]: 3·27 (3H，s)，4·98 (2H，s)， 6.71-6.97 (1H? m)? 7.12-7.16 (2H? m)9 7.22-7.24 (1H? m)9 7·37_7·40 (1H，m)，7·50-7·54 (2H，m)，10·90 (1H，brs) 1 -(2,6-一氟笨甲酿基）·3_(2_氟_4_三氟甲基苯基）-3_(甲 氧基甲基）脲（後文稱作本化合物（38))。 本化合物（38)iH-NMR (DMSO-d6) 3 [ppm]: 3·27 (3H, s), 4·98 (2H, s), 6.71-6.97 (1H? m)? 7.12-7.16 (2H? m)9 7.22 -7.24 (1H? m)9 7·37_7·40 (1H,m),7·50-7·54 (2H,m),10·90 (1H,brs) 1 -(2,6-monofluoro (3) (2-Fluoro-4-pyridylphenyl)-3-(methoxymethyl)urea (hereinafter referred to as the present compound (38)). Present Compound (38)

'H-NMR (DMSO-d6)5[ppm]: 3.26 (3H? s)? 5.03 (2H? s)? 189 318750 200804250 7·11·7·15 (2H，m), 7·47-7·46 (1H，m)，7·51-7·52 (2H，m)， 7.81-7.84 (1H，m)，10.96 (1H，brs) 1-(2_氯-6_氟苯甲酿基）-3-[2-氟-4-(1，1，2,2，-四氟乙硫 基）苯基]-3-(甲氧基甲基）脲（後文稱作本化合物（39))。 本化合物（39)'H-NMR (DMSO-d6) 5 [ppm]: 3.26 (3H? s)? 5.03 (2H? s)? 189 318750 200804250 7·11·7·15 (2H,m), 7·47-7· 46 (1H,m),7·51-7·52 (2H,m), 7.81-7.84 (1H,m),10.96 (1H,brs) 1-(2_chloro-6-fluorobenzyl) -3-[2-Fluoro-4-(1,1,2,2,-tetrafluoroethylthio)phenyl]-3-(methoxymethyl)urea (hereinafter referred to as this compound (39) ). Present Compound (39)

W-NMR (DMSO-d6，測量溫度：80〇C)3[ppm]: 3.34 (3H，s) 5·03 (2H，s)，6·63 (1H，tt, J = 52.5, 3.8 Hz)，7.22 (1H，t，J = 8.7Hz)，7.31(m，d，J=8.0Hz)，7.41-7.48(m，m)，7.54-7·64 (3H，m)，10.67 (1H，br s) l-(2,6-二氟苯甲醯基）_3-[2-氟-4-(1，1，2,2,3,3,3-七氟丙 硫基）苯基]-3-(甲氧基曱基）脲（後文稱作本化合物（4〇))。 本化合物（40)W-NMR (DMSO-d6, measured temperature: 80 〇C) 3 [ppm]: 3.34 (3H, s) 5·03 (2H, s), 6·63 (1H, tt, J = 52.5, 3.8 Hz) , 7.22 (1H, t, J = 8.7 Hz), 7.31 (m, d, J = 8.0 Hz), 7.41-7.48 (m, m), 7.54-7·64 (3H, m), 10.67 (1H, br s) l-(2,6-difluorobenzhydryl)_3-[2-fluoro-4-(1,1,2,2,3,3,3-heptafluoropropylthio)phenyl]- 3-(methoxyindenyl)urea (hereinafter referred to as the present compound (4〇)). Present Compound (40)

H-NMR (DMSO-dg,測量溫度：80ο(ΙΙ)δ[ρρπι]:3·32(3Π s) 5·03 (2Η，s)5 7.03-7.12 (2Η，m)，7·45·7·54 (1Η，m)， 7·56·7·62 (2H，m)，7·65-7·71 (1H，m)，10.66 (1H，br s) 1-(2-氯-6_氟苯曱醯基）_3-[2-氟-4-(1，1，2,2,3,3,3-七氟 丙硫基）苯基]-3-(曱氧基曱基）脲（後文稱作本化合物（41))。 本化合物（41) 318750 190 200804250H-NMR (DMSO-dg, measurement temperature: 80 ο (ΙΙ) δ [ρρπι]: 3·32 (3Π s) 5·03 (2Η, s) 5 7.03-7.12 (2Η, m), 7·45·7 ·54 (1Η,m), 7·56·7·62 (2H,m),7·65-7·71 (1H,m),10.66 (1H,br s) 1-(2-chloro-6_ Fluorobenzoyl)_3-[2-fluoro-4-(1,1,2,2,3,3,3-heptafluoropropylthio)phenyl]-3-(decyloxyindenyl)urea (hereinafter referred to as the present compound (41)). The present compound (41) 318750 190 200804250

111，]\4尺（〇]^〇-(16，測量溫度：80。(^)3[?卩111]:3.31(3113) 5·01 (2H，s)，7·16·7·22 (1H，m)，7.27-7.31 (1H，m)，7·4〇_ ’ 7·47 (1H, m)，7·57-7·60 (2H，m)，7·65-7·70 (1H，m)，1〇·68 (1H，br s) 實例42 於1.〇克1-(2,6-二氟苯甲醯基）-3-[2-氟_4-(三氟甲石危爲） 苯基]-3-(甲氧基曱基）脲於i〇毫升氯仿之溶液内於以冰a 卻下加入0.61克偏-氯過苯甲酸（含量；65重量。/◦)，混合物 攪拌1小時，讓混合物於室溫放置24小時。於反應混合物 中加入10毫升氯仿，接著以20毫升飽和碳酸氫鈉水溶液 洗3次。有機層以無水硫酸鎂脫水，於減壓下濃縮。所得 殘餘物藉中壓製備性高效液相層析術純化（乙酸乙酯：己烧 =33:67)，獲得〇.49克1_(2,6-二氟苯甲醯基）-3_[2-氟_4-(三 氟曱基亞磺酸基）苯基]-3-(甲氧基甲基）脲（後文稱作本化 合物（42))。 本化合物（42)111,]\4 feet (〇)^〇-(16, measuring temperature: 80. (^)3[?卩111]: 3.31(3113) 5·01 (2H, s), 7·16·7·22 (1H,m), 7.27-7.31 (1H,m),7·4〇_ '7·47 (1H, m),7·57-7·60 (2H,m),7·65-7·70 (1H, m), 1〇·68 (1H, br s) Example 42 1. gram of 1-(2,6-difluorobenzhydryl)-3-[2-fluoro-4-(trifluoro)甲石危为) phenyl]-3-(methoxyindenyl)urea in a solution of i〇ml chloroform was added to 0.61 g of partial-chloroperbenzoic acid under ice a (content; 65 wt./◦ The mixture was stirred for 1 hour, and the mixture was allowed to stand at room temperature for 24 hours. 10 ml of chloroform was added to the reaction mixture, followed by washing three times with 20 ml of saturated aqueous sodium hydrogencarbonate. The residue was purified by medium pressure preparative high performance liquid chromatography (ethyl acetate: hexane = 33:67) to obtain y.49 g of 1_(2,6-difluorobenzhydryl)-3_ [2-Fluoro-4-(trifluoromethylsulfinylsulfinyl)phenyl]-3-(methoxymethyl)urea (hereinafter referred to as the present compound (42)). The present compound (42)

'H-NMR (CDCl3)5[ppm]: 3.47(3H? s)? 5.06(2H? br)? 6.92- 6·96(2Η5 m)，7·38-7·42(1Η，m)，7·60-7·62(2Η，m)，7·68- 191 318750 200804250 7·70(1Η，m)，8.20-8.40 (1H，br) 實例43至45 根據與實相同之方式，製造下㈣合物。 1 (2,6 一 氣苯甲 fe基)_3_[2_氟_4_(1 石黃酿基）苯基]冬（曱氧基甲基）服（後文 本化合物（43) 4 π σ物（43))'H-NMR (CDCl3) 5 [ppm]: 3.47 (3H? s)? 5.06 (2H? br)? 6.92- 6·96 (2Η5 m), 7·38-7·42 (1Η, m), 7 ·60-7·62(2Η,m),7·68- 191 318750 200804250 7·70(1Η,m), 8.20-8.40 (1H,br) Examples 43 to 45 According to the same way, manufacturing (4) Compound. 1 (2,6 one gas benzophenone fe))_3_[2_fluoro_4_(1 stellate) phenyl] winter (decyloxymethyl) service (post text compound (43) 4 π σ (43 ))

，s(o)cf2cf2h ^-NMRCDMSO-d,,^*-^ ： 80〇C)6[ppm]:3.35(3H, s): 5.07 (2H, s), 6.80 (1H, tdd, J = 51.2, 6.3, 4.1 Hz) 7 04- 7.12 (2H, m), 7.44-7.54 (1H, m), 7.70-7.80 (3H, m)^10.69 (1H，br s) 1，3-貳（甲氧基甲基）-1-(2,6-二氟苯甲醯基&gt;3_[2_氟 -4-(二氟曱基亞磺醯基）苯基]脲（後文稱作本化合物（44))。 本化合物（44),s(o)cf2cf2h ^-NMRCDMSO-d,,^*-^ : 80〇C)6[ppm]:3.35(3H, s): 5.07 (2H, s), 6.80 (1H, tdd, J = 51.2 , 6.3, 4.1 Hz) 7 04- 7.12 (2H, m), 7.44-7.54 (1H, m), 7.70-7.80 (3H, m)^10.69 (1H, br s) 1,3-贰 (methoxy) Methyl)-1-(2,6-difluorobenzhydryl)&gt;3_[2-fluoro-4-(difluorodecylsulfenyl)phenyl]urea (hereinafter referred to as the present compound (44) )). This compound (44)

h-NMR (CDCl3)3[PPm]·· 3·37(3Η，s)，3·57(3Η, s)，4·82(2Η， br)，5.17(br，2Η)，6·83(2Η，m)，7·31-7·34(1Η，ιη)，7·53(1Η， m)，7·67(2Η，m) 1，3-貳（曱氧基曱基）-142,6-二氟苯曱醯基）-3-[2_氟_4-(1，1，2,2 -四氣乙基亞石黃驢基）本基]脈（後文稱作本化合物 192 318750 200804250 (45))。 本化合物（45)h-NMR (CDCl3)3[PPm]··3·37(3Η, s), 3·57(3Η, s), 4·82(2Η, br), 5.17(br,2Η),6·83( 2Η,m),7·31-7·34(1Η,ιη),7·53(1Η, m),7·67(2Η,m) 1,3-贰(曱methoxycarbonyl)-142, 6-difluorophenylhydrazino)-3-[2_fluoro_4-(1,1,2,2-tetrakiethylethyl sulfoxide) base group (hereinafter referred to as this compound 192) 318750 200804250 (45)). Present Compound (45)

1 H-NMR (DMSO-d6，測量溫度：8〇〇c)5[pPm]: 3.24 (3H，s)， 3.36 (3H，s)，4·81 (2H，s)，5·1〇 (2H，s), 6·85 (1H，tdd，J = 51·2, 6.4, 4·0 Hz)，7·04-7·13 (2H，m)5 7.49-7.59 (1H，m), 7·66-7·73 (2H，m)，7·77 (1H，d，J = 9·4 Hz) 實例4 6 1·〇克l-(2,6_一氟苯曱醯基）_3_[2-氟-4_(三氟i甲硫基） 笨基]-3-(曱氧基曱基）脲於15毫升氯仿之溶液以冰冷卻， 將1·51克偏-氯過苯曱酸（含量；65重量％)添加至溶液，混 合物攪拌1小時，讓其於室溫放置48小時。於反應混合物 加入15笔升氣仿，所得混合物以3〇毫升飽和碟酸氫鈉水 、谷液洗3人有機層以無水硫酸鎂脫水，於減壓下濃縮。1 H-NMR (DMSO-d6, measured temperature: 8 〇〇 c) 5 [pPm]: 3.24 (3H, s), 3.36 (3H, s), 4·81 (2H, s), 5·1〇 ( 2H, s), 6·85 (1H, tdd, J = 51·2, 6.4, 4·0 Hz), 7·04-7·13 (2H, m) 5 7.49-7.59 (1H, m), 7 · 66-7·73 (2H, m), 7·77 (1H, d, J = 9·4 Hz) Example 4 6 1·〇克 l-(2,6-fluorobenzino)_3_[ 2-Fluoro-4_(trifluoroimethylthio)phenyl]-3-(decyloxyindenyl)urea in 15 ml of chloroform was cooled in ice to give 1.51 g of chloro-perbenzoic acid ( The content; 65% by weight) was added to the solution, and the mixture was stirred for 1 hour, and allowed to stand at room temperature for 48 hours. To the reaction mixture, 15 liters of liters of the mixture were added, and the mixture was washed with 3 ml of saturated aqueous sodium hydrogen sulfate and EtOAc.

(乙酸乙 -—鼠苯曱酿基）-3-[2- 基甲基）脲（後文稱作 本化合物（46)(ethyl acetate--murine benzoate)-3-[2-ylmethyl)urea (hereinafter referred to as this compound (46)

318750 193 200804250 ]H-NMR (CDCl3)6[ppm]: 3.47(3H? s)9 5.08(2H, br)? 6.92-6.96(2H5 m)9 7.38-7.42(lH, m)5 7.64-7.68(lH5 m)? 7.83-7.89(2H，m)，8·65(1Η，br) 實例47至49 根據與實例46相同之方式，製造下列化合物。 1-(2,6_二氟苯甲醯基）-3-[2-氟_4-(1，1，2,2-四氟乙基石黃 酿基）苯基]-3-(曱氧基曱基）脲（後文稱作本化合物（47))。 本化合物（47)318750 193 200804250 ]H-NMR (CDCl3)6 [ppm]: 3.47 (3H?s)9 5.08(2H, br)? 6.92-6.96(2H5 m)9 7.38-7.42(lH, m)5 7.64-7.68( lH5 m)? 7.83-7.89 (2H, m), 8.65 (1 Η, br) Examples 47 to 49 The following compounds were produced in the same manner as in Example 46. 1-(2,6-difluorobenzhydryl)-3-[2-fluoro-4-(1,1,2,2-tetrafluoroethyl fluorenyl)phenyl]-3-(oxime A sulfhydryl group (hereinafter referred to as the present compound (47)). Present Compound (47)

W-NMR (DMSO-d6，測量溫度：80°C)3[ppm]: 3·33 (3H, s)， 5·09 (2H，s)，7·03 (1H，tt，J = 50.5, 5·3 Ηζ)，7·05-7·13 (2H， m)，7.45-7.54 (1H，m)，7.84-7.89 (1H，m)，7·92-7·99 (2H， m)，10.85 (1H，br s) 1，3-貳（曱氧基曱基）-1-(2,6-二氟苯曱醯基）-3_[2_氟-4-(三氟甲基續酿基）苯基]脲（後文稱作本化合物（48))。 本化合物（48)W-NMR (DMSO-d6, measured temperature: 80 ° C) 3 [ppm]: 3·33 (3H, s), 5·09 (2H, s), 7·03 (1H, tt, J = 50.5, 5·3 Ηζ),7·05-7·13 (2H, m), 7.45-7.54 (1H, m), 7.84-7.89 (1H, m), 7.92-7·99 (2H, m), 10.85 (1H, br s) 1,3-贰(decyloxy)-1-(2,6-difluorophenylindenyl)-3_[2_fluoro-4-(trifluoromethyl) Phenyl)urea (hereinafter referred to as the present compound (48)). Present Compound (48)

!H-NMR (CDCl3)5[ppm]: 3.38(3H5 s)5 3.57(3H? s)? 4.82(2H5 br)，5.20(2H，br)，6·84(2Η，m)，7·31-7·37(1Η，m)，7·75-7·77 (1H，m)，7·82-7·84(2Η，m) 318750 194 200804250 1，3_貳（甲氧基甲基）小(2,6_二氟苯甲醯基）_3_[2_就_4 (1，1，2,2_四氟乙基;g黃酿基）苯基]脈（後文稱作本化合物 (49))。 本化合物（49)!H-NMR (CDCl3) 5 [ppm]: 3.38 (3H5 s) 5 3.57 (3H? s)? 4.82 (2H5 br), 5.20 (2H, br), 6.84 (2Η, m), 7.31 -7·37(1Η,m),7·75-7·77 (1H,m),7·82-7·84(2Η,m) 318750 194 200804250 1,3_贰(methoxymethyl) Small (2,6-difluorobenzhydryl)_3_[2___4 (1,1,2,2_tetrafluoroethyl; g-bristyl)phenyl] vein (hereinafter referred to as this compound) (49)). Present Compound (49)

iH-NMMDMSO-dh 測量溫度：80〇〇δ[ρριη]·· 3·24 (3H，s) 3·38 (3Η，s)，4·82 (2Η，s)，5·14 (2Η，s)，6·90·7·22 (3Η，m)， 7·50·7·59 (1Η，m)，7·79-7·86 (1Η，m)，7·91-7·96 (1Η，m)， 7.97-8.02 (1H，m) ’ 製造例4 3.00克2,6-一氟卞醯胺’3.6耄升36%福馬林水溶液及〇 ι〇 克碳酸鉀之混合物於室温攪拌13小時。反應混合物添加至 1 〇耄升水’所得混合物攪拌3 0分鐘，過濾，所得固體以 40毫升水洗滌。所得固體於減壓下以五氧化二磷乾燥，獲 得2.05克2,5-二氟羥基曱基苄醯胺。iH-NMMDMSO-dh Measurement temperature: 80〇〇δ[ρριη]·· 3·24 (3H,s) 3·38 (3Η, s), 4·82 (2Η, s), 5·14 (2Η, s ),6·90·7·22 (3Η,m), 7·50·7·59 (1Η,m),7·79-7·86 (1Η,m),7·91-7·96 (1Η , m), 7.97-8.02 (1H, m) 'Production Example 4 3.00 g of 2,6-fluoroindoline '3.6 liters 36% of a mixture of fumarin aqueous solution and 〇ι〇克 potassium carbonate was stirred at room temperature for 13 hours. . The reaction mixture was added to 1 liter of water. The mixture was stirred for 30 minutes, filtered, and the obtained solid was washed with 40 ml of water. The obtained solid was dried under reduced pressure with phosphorus pentoxide to obtain 2.05 g of 2,5-difluorohydroxybenzyl benzalamine.

^-NMR (DMSO-d6)5[ppm]: 4.63-4.66 (2H? m)5 5.87-5 91^-NMR (DMSO-d6) 5 [ppm]: 4.63-4.66 (2H?m)5 5.87-5 91

(1H，m)，7·13-7·17 (2H，m)，7·48-7·52 (1H，m)，9·25 (1H brm) 製造例5 於10·0克2,6-二氟-N-羥基甲基苄醯胺於1〇〇毫升甲 318750 195 200804250 醇之溶液内加入10毫升35%鹽酸，混合物於室溫擾掉6 小日守。反應此合物於減壓下派纟彳§ ’所得殘餘物溶解於2 〇 〇 耄升氯仿，以1 〇〇耄升水洗蘇。有機層以無水硫酸鎂脫水， 於減壓下濃縮，獲得10.71克2,6-二氟-N-甲氧基甲基节醯 胺0(1H,m),7·13-7·17 (2H,m),7·48-7·52 (1H,m),9·25 (1H brm) Production Example 5 at 10·0 g 2,6 -Difluoro-N-hydroxymethylbenzylamine was added to 10 ml of 35% hydrochloric acid in 1 ml of a solution of 318750 195 200804250 alcohol, and the mixture was disturbed at room temperature for 6 hours. The resulting residue was dissolved in 2 〇 耄 氯 chloroform under reduced pressure and washed with 1 liter of water. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure to give 10.71 g of 2,6-difluoro-N- methoxymethyl oximeamine.

^-NMR (CDCl3)5[ppm]: 3.44 (3H? s)? 4.90 (2H5 d9 J=8.0^-NMR (CDCl3) 5 [ppm]: 3.44 (3H?s)? 4.90 (2H5 d9 J=8.0

Hz)，6.51 (1H，br)，6.94-7.00 (2H，m)，7.36-7.44 (1H，m) 實例1-(1) 於1.00克2,6-一氟甲氧基曱基苄酿胺及〇·64毫升 氯二曱基石夕烧於10宅升氣仿之溶液内，於室溫逐滴加入 0.70毫升三乙基胺於5·〇毫升氯仿之溶液，混合物於4〇〇c 攪拌4 0分叙。然後’ 1 · 5 0克碳酸武（三氣甲基）酯於1 〇毫 升氯仿之溶液逐滴加至其中，混合物於室溫授拌3 〇分鐘。 反應混合物於減壓下濃縮’所得殘餘物溶解於1 〇毫升氯 仿。於以冰冷卻下溶液逐滴添加至〇·63克1氟曱氧基 甲基-4-(二氟曱硫基）本胺及1.4¾升三乙基胺於W毫升氯 仿之溶液，混合物於50°C攪拌1小時，及讓其於室溫放置 6曰。反應混合物以20毫升水洗滌。有機層以無水硫酸鎂 脫水，及於減壓下濃縮。所得殘餘物藉矽膠管柱層析術純 化（乙酸乙酯：己烷=1 : 5)，進一步藉中壓製備性高效液相 層析術純化（乙酸乙酯·氯仿··己烧=15 : 15 : 70)，獲得 318750 196 200804250 0.18克本化合物（1)。 實例1-(2) 於L00克3佩二氟苯甲酿基）]必氣 基）苯基]-1-⑽基甲基德於10毫们定嗣 冷卻下於3。。— 里，。 〇。所得混合物於同溫授拌30分鐘，混合物 水’及於減Μ下濃縮。所得殘餘物藉中壓製傷性高效液相 層析術純化（乙酸乙酯：己烷=17: 83)，獲得〇 21克本化 於2C逐滴添加至G.2G克氯甲基曱基ϋ於1毫升！甲基_2· 対咬酮之溶液，混合物於以冰冷卻下攪拌3小時。於反 應混合物於2t至25t加人1G毫升飽和氯化録水溶液與5 毫升水之混合物，接著以丨〇毫升乙酸乙g旨萃取3次。有機 層以10毫升飽和氯化納水溶液洗3次，以無水硫酸鎮脫 合物⑴。 實例50 於1.01克1-(2,6-二氟苯甲醯基）_3-(4-三氟曱硫基苯基) 脲於10·0耄升1 _曱基比嘻咬酮之溶液内，於以冰冷卻 下加入0·67毫升氯甲基曱基醚，接著於3°C至5°C加入266 笔克氫化納（含量；55重量％於油）。所得混合物於以冰冷 部下攪拌4小時。於反應混合物内，於以冰冷卻下加入1〇 宅升飽和氯化銨水溶液與5毫升水之混合物，接著以1〇 毫升乙酸乙酯萃取3次。有機層經合併，以飽和氯化鈉水 溶液洗3次，以無水硫酸鎂脫水，及於減壓下濃縮。所得 殘餘物藉矽膠管柱層析術純化（乙酸乙酯··氯仿··己烷=1 : 197 318750 200804250 1 ·· 4)，進一步藉中壓製備性高效液相層析術純化（乙酸乙 酯：己烷=30: 70)，獲得0.13克1，3-貳（曱氧基曱基μ#， 二氟苯甲醯基）-3_ (4-三氟甲硫基）苯基脲（後文稱作本化合 物（50)) 〇 本化合物（50)Hz), 6.51 (1H, br), 6.94-7.00 (2H, m), 7.36-7.44 (1H, m) Example 1-(1) at 1.00 g of 2,6-fluorofluoromethoxybenzyl benzylamine 〇····································································· 0 sub-narrative. Then, 1 to 50 g of a carbonated (trimethylmethyl) ester was added dropwise to a solution of 1 Torr of chloroform, and the mixture was stirred at room temperature for 3 minutes. The reaction mixture was concentrated under reduced pressure. The obtained residue was dissolved in 1 ml of chloroform. Adding to the solution of 〇·63 g of 1 fluoromethoxymethyl-4-(difluorosulfonylthio)amine and 1.43⁄4 liter of triethylamine in W ml of chloroform with ice-cooling solution, the mixture is Stir at 50 ° C for 1 hour and let it sit at room temperature for 6 Torr. The reaction mixture was washed with 20 ml of water. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The residue was purified by column chromatography (ethyl acetate:hexane = 1 : 5) and purified by medium-pressure preparative high-performance liquid chromatography (ethyl acetate chloroform······ 15 : 70), obtained 318750 196 200804250 0.18 g of the present compound (1). Example 1-(2) at L00 g 3 pe-difluorobenzoyl)]]-) phenyl]-1-(10)-methyl-methyl at 10 m. . — inside,. Hey. The resulting mixture was stirred at the same temperature for 30 minutes, and the mixture was watered and concentrated under reduced enthalpy. The obtained residue was purified by compression-resistance high performance liquid chromatography (ethyl acetate:hexane = 17: 83) to obtain 〇21 g of the present product and added dropwise to 2 g of G.2G chloromethylindenyl hydrazine at 2C. In 1 ml! A solution of methyl-2·throne was stirred and the mixture was stirred for 3 hours under ice cooling. A mixture of 1 G ml of a saturated aqueous chloride solution and 5 ml of water was added to the reaction mixture at 2 to 25 t, followed by extraction 3 times with 丨〇 ml of acetic acid. The organic layer was washed 3 times with 10 ml of a saturated aqueous solution of sodium chloride, and then anhydrous (1). Example 50 in 1.01 g of 1-(2,6-difluorobenzhydryl)-3-(4-trifluorosulfonylphenyl)urea in a solution of 10·0 liter of 1 曱 曱 嘻 嘻 嘻 酮To 0.67 ml of chloromethyl decyl ether was added under ice cooling, followed by the addition of 266 grams of hydrogenated sodium (content; 55 wt% to oil) at 3 °C to 5 °C. The resulting mixture was stirred under ice cooling for 4 hours. To the reaction mixture, a mixture of 1 liter of aqueous saturated ammonium chloride solution and 5 ml of water was added under ice-cooling, and then extracted three times with 1 ml of ethyl acetate. The organic layer was combined, washed with a saturated aqueous sodium chloride solution, and then evaporated, The obtained residue was purified by column chromatography (ethyl acetate················· Ester: hexane = 30: 70), 0.13 g of 1,3-fluorene (fluorenyl fluorenyl μ#, difluorobenzhydryl)-3_(4-trifluoromethylthio)phenylurea was obtained. This compound is called this compound (50)) 〇 compound (50)

iH_NMR(CDCl3)3(ppm): 3.35(3H，brs)，3.48(3H，brs)，4.88 (2H，brs)，5.11(2H，brs)，6.85'6.89(2H，m)，7.32-7.40(3H，m) 7.64-7.66(2H，m) 實例51 於1·01克l-(2,6-二氟苯甲醯基）-3-[2_氯-4-(三氟甲硫 基）本基]脲於1 〇·〇宅升1_甲基吼嘻咬酮之溶液内，於以 冰冷卻下加入〇·61毫升氯甲基甲基醚，接著於3。〇至5 力入243 i克虱化納（含1，55重量％於油）。所得混合物 於以冰冷部下攪拌4小時。於反應混合物内，於以冰冷卻 下加入1 0毫升飽和氯化銨水溶液與5毫升水之混合物，接 著以1〇毫升乙酸乙酯萃取3次。有機層經合併，以飽和氯 化鈉水，谷液洗3次，以無水硫酸鎂脫水，及於減壓下濃縮。 所侍殘餘物藉矽膠管柱層析術純化（乙酸乙酯··氯仿··己烷 1 1 · 4) ’進一步藉中壓製備性高效液相層析術純化（乙 酸乙醋··己烧=15 ·· 85)，獲得〇·53克1，3-氛（甲氧基甲 土) (2’6 一氟笨甲醯基氯-4-三氟甲硫基）苯基脲 318750 198 200804250 (後文稱作本化合物（51))。 本化合物（51)iH_NMR(CDCl3)3 (ppm): 3.35 (3H, brs), 3.48 (3H, brs), 4.88 (2H, brs), 5.11 (2H, brs), 6.85 '6.89 (2H, m), 7.32-7.40 ( 3H,m) 7.64-7.66(2H,m) Example 51 in 1·01 g of l-(2,6-difluorobenzhydryl)-3-[2-chloro-4-(trifluoromethylthio) The base urea was added to a solution of 1 吼嘻 methyl ketone in 1 〇·〇宅, and 〇·61 ml of chloromethyl methyl ether was added under ice cooling, followed by 3. 〇 to 5 force into 243 i grams of sodium (including 1,55 wt% oil). The resulting mixture was stirred under ice cooling for 4 hours. A mixture of 10 ml of a saturated aqueous ammonium chloride solution and 5 ml of water was added to the mixture, and the mixture was extracted three times with 1 ml of ethyl acetate. The organic layers were combined, washed with saturated aqueous sodium chloride and brine, and then evaporated. Purification of the residue by gel column chromatography (ethyl acetate··chloroform··hexane 1 1 · 4) 'further purified by medium pressure preparative high performance liquid chromatography (acetic acid ethyl acetate · burned) =15 ·· 85), obtained 〇·53 g 1,3-atmosphere (methoxy methoxylate) (2'6-fluoro carbamimidyl chloro-4-trifluoromethylthio) phenylurea 318750 198 200804250 (hereinafter referred to as the present compound (51)). Present Compound (51)

h-NMRpMSH，測量溫度：80〇〇δ(ρΡπι): 3.05(3H，brs)， 3.23(3H，brs)，4.79(2H，brs)5 5.06(2H，brs)，7.04-7.09(2H，m)， 7·50-7·52(2Η，ιη) 7.69-7.71(lH，m)，7.90(lH，m) 實例52 於1·〇1克3-[4-(3•氯-5_三氟甲基-2-吡啶基硫基）-2-氟 本基]-1-(2,6-二氟苯曱酸基）脲於1〇.〇毫升1_曱基_2_吼口各 啶酮之溶液内，於以冰冷卻下加入〇·5毫升氣曱基曱基 醚，然後於2 C至8°C加入198毫克氫化鈉（含量；55重量 %於油）。所得混合物於以冰卻下攪拌4小時。反應混合物 内於以冰冷卻下加入10毫升飽和氯化銨水溶液及5毫升水 之混合物，接著以10毫升乙酸乙酯萃取3次。有機層經合 併，以飽和氯化納水溶液洗3次，以無水硫酸鎂脫水，及 於減壓下濃縮。所得殘餘物藉矽膠管柱層析術純化（乙酸乙 醋：氯仿：己烧=1 : 1 : 4)，獲得〇.78克1&gt;3_戴（甲氧基甲 基）-3-[4♦氯-5-三氟甲基_2_σ比咬基硫基）_2_氣苯基]小 (2,6-—氟苯甲酿基）脲（後文稱作本化合物（52))。 本化合物（52) 318750 199 200804250h-NMRpMSH, measured temperature: 80 〇〇 δ (ρΡπι): 3.05 (3H, brs), 3.23 (3H, brs), 4.79 (2H, brs) 5 5.06 (2H, brs), 7.04-7.09 (2H, m ), 7·50-7·52(2Η,ιη) 7.69-7.71(lH,m), 7.90(lH,m) Example 52 in 1·〇1g 3-[4-(3•氯-5_三Fluoromethyl-2-pyridylthio)-2-fluorobenzyl]-1-(2,6-difluorobenzoyl)urea in 1〇.〇ml1_曱基_2_吼口In a solution of ketone, 5 ml of gas decyl decyl ether was added under ice cooling, and then 198 mg of sodium hydride (content; 55 wt% in oil) was added at 2 C to 8 °C. The resulting mixture was stirred under ice for 4 hours. A mixture of 10 ml of a saturated aqueous ammonium chloride solution and 5 ml of water was added under ice-cooling, and then extracted three times with 10 ml of ethyl acetate. The organic layer was combined, washed three times with a saturated aqueous solution of sodium chloride, dried over anhydrous magnesium sulfate and evaporated. The residue obtained was purified by column chromatography (acetic acid ethyl acetate: chloroform: hexane = 1 : 1 : 4) to obtain 78.78 g of 1&gt;3_dai (methoxymethyl)-3-[4 ♦ Chloro-5-trifluoromethyl-2_σ ratio thiolthio)_2_gas phenyl] small (2,6-fluorobenzyl)urea (hereinafter referred to as the present compound (52)). The present compound (52) 318750 199 200804250

1H-NMR(CDCl3)5(ppm): 3.39(3H?brs)5 3.55(3H?brs)? 4.86 (2H，brs)，5.15(2H，brs)，6.86(2H，m)，7.33-7.45(4H，m)7.79- 7.80(lH，m), 8.31(lH，m) 實例53 於1·〇1克3-[3,5-二氣-4-(3•氣-5-三氟甲基_2-吡啶基氧 基）本基]-1-(2,6-二氟苯曱酿基）脈於1〇〇毫升1_曱基_2-17比 嘻。疋酮之〉谷液内，於以冰冷卻下加入〇 · 4 6毫升氯曱基曱基 醚，接著於2°C至8°C加入185毫克氫化鈉（含量；55重量 0/〇於油）。所得混合物於以冰冷卻下攪拌3小時。於反應混 合物内，於以冰冷卻下加入10毫升飽和氯化銨水溶液與5 毫升水之混合物，接著以10毫升乙酸乙酯萃取3次。有機 層經合併，以飽和氣化鈉水溶液洗3次，以無水硫酸鎂脫 水，及於減壓下濃縮。所得殘餘物藉矽膠管柱層析術純化 (乙酸乙酯：氯仿：己烷=1 :〗：4)，進一步藉中壓製備性 高效液相層析術純化（乙酸乙酯：己烷=15 : 85)，獲得〇 17 克1，3-貳（甲氧基曱基）_3_[3,5_二氯_4_(3_氯_5_三氟甲基_2_ 吼啶基氧基）苯基]-1_(2,6·二氟苯甲醯基）脲（後文稱作本化 合物（53))。 本化合物（53) 318750 200 2008042501H-NMR (CDCl3) 5 (ppm): 3.39 (3H?brs) 5 3.55 (3H?brs)? 4.86 (2H, brs), 5.15 (2H, brs), 6.86 (2H, m), 7.33-7.45 ( 4H,m)7.79- 7.80(lH,m), 8.31(lH,m) Example 53 in 1·〇1 g 3-[3,5-diox-4-(3•gas-5-trifluoromethyl) _2-Pyridyloxy)benzyl]-1-(2,6-difluorobenzoquinone) was pulsed at 1 〇〇 1 曱 _2 2-17. In the ketone liquid, add 4·6 6 ml of chlorodecyl decyl ether under ice cooling, and then add 185 mg of sodium hydride at a temperature of 2 ° C to 8 ° C (content; 55 wt% / 〇 oil) ). The resulting mixture was stirred for 3 hours under ice cooling. A mixture of 10 ml of a saturated aqueous ammonium chloride solution and 5 ml of water was added to the reaction mixture, and the mixture was extracted three times with 10 ml of ethyl acetate. The organic layer was combined, washed with a saturated aqueous solution of sodium sulfate, and then evaporated. The obtained residue was purified by column chromatography (ethyl acetate: chloroform:hexane = 1:1: 4), and purified by medium pressure preparative high performance liquid chromatography (ethyl acetate:hexane = 15) : 85), obtained 〇17 g of 1,3-贰(methoxyindenyl)_3_[3,5-dichloro_4_(3_chloro-5-trifluoromethyl_2_acridinyloxy)benzene Base]-1_(2,6·difluorobenzhydryl)urea (hereinafter referred to as the present compound (53)). The present compound (53) 318750 200 200804250

1H-NMR(CDCl3)5(ppm): 3.37(3H9brs)5 3.50(3H?brs)? 5.〇〇 (2H，brs)，5.11(2H，brs)，6·93-6·97(2Η，ιη)，7·37-7·44(3Η，ιη) 8.04(lH，s)，8.19(lH，s) 實例54 於1·〇1克1-(2,6-二氟苯曱醯基）_弘[2_曱基气三氟甲 硫基）苯基]脲於10.0毫升丨_曱基-2_吡咯啶酮之溶液内，於 以冰冷卻下加入〇·64毫升氯甲基甲基醚，接著於2。〇至u C加入256毫克氫化鈉（含量；55重量％於油）。所得混合 物於以冰冷卻下攪拌4小時。於反應混合物内，於以冰^ 卻下加入10毫升飽和氯化銨水溶液與5毫升水之混合物， 接著以10毫升乙酸乙酯萃取3次。有機層經合併，以飽和 氯化鈉水溶液洗3次，以無水硫酸鎂脫水，及於減壓下濃 縮。所得殘餘物藉矽膠管柱層析術純化（乙酸乙酯：氯仿： 己烷1 · 1 · 4)，進一步藉中壓製備性高效液相層析術純化 (乙酸乙酯：己烧=15: 85)，獲得〇·〇7克1，3-寒（曱氧基曱 基）-1_(2,6-二氟苯甲醯基）_3_[2_曱基_4_(三氟甲硫基）苯基] 脲（後文稱作本化合物（54))。 本化合物（54)1H-NMR (CDCl3) 5 (ppm): 3.37 (3H9brs) 5 3.50 (3H?brs)? 5.〇〇(2H,brs), 5.11(2H,brs),6·93-6·97(2Η, Imη),7·37-7·44(3Η,ιη) 8.04(lH,s),8.19(lH,s) Example 54 in 1·〇1g 1-(2,6-difluorobenzoinyl) _Hong [2_曱-based gas trifluoromethylthio) phenyl] urea in 10.0 ml of 丨 曱 曱 -2 - pyrrolidone solution, under ice cooling, add 〇 · 64 ml of chloromethyl methyl Ether, followed by 2. 〇 to u C was added 256 mg of sodium hydride (content; 55 wt% in oil). The resulting mixture was stirred under ice cooling for 4 hours. A mixture of 10 ml of a saturated aqueous ammonium chloride solution and 5 ml of water was added to the mixture, and then extracted three times with 10 ml of ethyl acetate. The organic layer was combined, washed with a saturated aqueous solution of sodium chloride, and dried over anhydrous magnesium sulfate. The residue was purified by column chromatography (ethyl acetate: chloroform: hexane 1·1·4) and purified by medium pressure preparative high performance liquid chromatography (ethyl acetate: hexane = 15: 85), obtained 〇·〇7 g 1,3-cold (nonyloxyindenyl)-1_(2,6-difluorobenzhydryl)_3_[2_mercapto_4_(trifluoromethylthio) Phenyl]urea (hereinafter referred to as the present compound (54)). Present Compound (54)

318750 201 200804250 1H.NMR(CDCl3)5(ppm): 2.28(3H5brs)? 3.33(3H?brs)5 3.47 (3H，brs)，4.76(2H，brs)，5.37(2H，brs)，6.87(2H，m)，7·32(2Η, m)，7.48(lH,s)，7.56(lH,m) ’ 實例55 於1·〇1克1-(2,6·二氟苯曱醯基）冬[2,3-二甲基_4_(三 氟甲硫基）苯基]脲於1〇·〇毫升甲基吡咯啶酮之溶液 内，於以冰冷卻下加入〇·62毫升氯曱基甲基醚，接著於2 。匚至4°C加入247毫克氫化鈉（含量；55重量％於油）。所得 混合物於以冰冷卻下攪拌4小時。於反應混合物内，於以 冰冷部下加入1 〇毫升飽和氯化銨水溶液與5毫升水之混合 物，接著以10耄升乙酸乙酯萃取3次。有機層經合併，以 飽和氯化鈉水溶液洗3次，以無水硫酸鎂脫水，及於減壓 下濃縮。所得殘餘物藉矽膠管柱層析術純化（乙酸乙酯：氯 仿：己烷=1 : 1 : 4)，進一步藉中壓製備性高效液相層析術 純化（乙酸乙酯：己烷=15 : 85)，獲得〇·66克1，3_貳（曱氧 基曱基）-1-(2，6-二氟苯甲酸基）_3_[2,5-二甲基-4-(三氟曱硫 基）苯基]脲（後文稱作本化合物（55))。 本化合物（55)318750 201 200804250 1H.NMR(CDCl3)5(ppm): 2.28(3H5brs)? 3.33(3H?brs)5 3.47 (3H,brs),4.76(2H,brs),5.37(2H,brs),6.87(2H , m), 7·32 (2Η, m), 7.48 (lH, s), 7.56 (lH, m) ' Example 55 in 1·〇1 g of 1-(2,6·difluorobenzoinyl) winter [2,3-Dimethyl_4_(trifluoromethylthio)phenyl]urea in a solution of 1 〇·ml ml of methylpyrrolidone, and added 〇·62 ml of chloroformyl group under ice cooling Base ether, followed by 2 . 247 mg of sodium hydride (content; 55 wt% in oil) was added at 4 °C. The resulting mixture was stirred under ice cooling for 4 hours. To the reaction mixture, a mixture of 1 ml of a saturated aqueous solution of ammonium chloride and 5 ml of water was added under ice-cooled portion, and then extracted three times with 10 liters of ethyl acetate. The organic layer was combined, washed with a saturated aqueous The residue was purified by column chromatography (ethyl acetate: chloroform:hexane = 1 : 1 : 4) and purified by medium pressure preparative high performance liquid chromatography (ethyl acetate:hexane = 15 : 85), obtained 〇·66 g 1,3_贰(曱methoxycarbonyl)-1-(2,6-difluorobenzoic acid)_3_[2,5-dimethyl-4-(trifluoro) Indolethio)phenyl]urea (hereinafter referred to as the present compound (55)). Present Compound (55)

1H-NMR(CDCl3)5(ppm): 2.21(3H?brs)? 2.53(3H?brs)5 3.32 (3H，brs)，3.46(3H，brs), 4.74(2H5brs)，5.38(2H，brs)，6·86(2Η， m)，7.17(lH，m)，7.33(lH，m), 7.56(lH，m) 202 318750 200804250 實例56 於1·〇1克1-(2,6-二氟苯甲醯基）_3_[2_氟_4_(第三丁氧 幾基）苯基]腺於10·0毫升丨_甲基_2_吡咯啶_之溶液内，於 以冰冷卻下加入〇·64毫升氯甲基甲基醚，接著於2艺至U C加入254毫克氫化鈉（含量；55重量％於油）。所得混合 物於以冰冷卻下攪拌3小時。於反應混合物内，於以料 郃下加入10毫升飽和氯化銨水溶液與5毫升水之混合物， 接著以10笔升乙酸乙酯卒取3次。有機層經合併，以餘和 氯化鈉水溶液洗3次，以無水硫酸鎂脫水，及於減壓下濃 縮。所得殘餘物藉矽膠管柱層析術純化（乙酸乙酯：氯仿： 己烷=1 ·· 1 : 4)，進一步藉中壓製備性高效液相層析術純化 (乙酸乙酯··己烷=15 : 85)，獲得〇·70克白色固體。此固 體經再結晶獲得0.46克1，3-貳（曱氧基甲基二氟苯 甲醯基）_3-[2-氟-4-(第三丁氧羰基）苯基]脲（後文稱作本化 合物（56))。 本化合物（56)1H-NMR (CDCl3) 5 (ppm): 2.21 (3H?brs)? 2.53 (3H?brs)5 3.32 (3H, brs), 3.46 (3H, brs), 4.74 (2H5brs), 5.38 (2H, brs) ,6·86(2Η, m), 7.17(lH,m),7.33(lH,m), 7.56(lH,m) 202 318750 200804250 Example 56 in 1·〇1 g 1-(2,6-difluoro Benzopyridinyl)_3_[2_fluoro_4_(t-butoxy-oxy)phenyl] gland in 10·0 ml of 丨_methyl_2_pyrrolidine_ solution, added under ice cooling • 64 ml of chloromethyl methyl ether, followed by 254 mg of sodium hydride (content; 55 wt% in oil) from 2 to UC. The resulting mixture was stirred for 3 hours under ice cooling. To the reaction mixture, a mixture of 10 ml of a saturated aqueous solution of ammonium chloride and 5 ml of water was added to the mixture, and then the mixture was taken 3 times with 10 liters of ethyl acetate. The organic layers were combined, washed three times with aqueous sodium chloride solution, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was purified by column chromatography (ethyl acetate: chloroform:hexane = 1··1: 4) and purified by medium pressure preparative high performance liquid chromatography (ethyl acetate·hexane) =15 : 85), obtained a 70 g white solid. This solid was recrystallized to obtain 0.46 g of 1,3-indolyl (decyloxymethyldifluorobenzhydryl)-3-[2-fluoro-4-(t-butoxycarbonyl)phenyl]urea (hereinafter referred to as As the present compound (56)). Present Compound (56)

1H-NMR(CDCl3)5(ppm): 1.59(9H?s), 3.39(3H?s)5 3.49(3H5 s)，4.86(2H，brs)，5.12(2H，brs)，6·83·6·88(2Η，πι)，7.31-7.39 (2H，m)，7.73-7.78(2H，m) 實例57 於1.01克1-(3-氯啦啶-2-基羰基）_3_[2_氟-4-(三氟曱硫 203 318750 200804250 於以冰冷卻下㈣3小時。於反應混合物内，於以冰冷卻 :和入^毫升飽和氯化銨水溶液與5毫升水之混合物，接 著以10毛升乙^乙g旨卒取3次。有機層經合併，以飽和氯 基）苯基]脲於10.0毫升甲基_2_料以同之溶液内，於以 冰冷卻下加人0.64毫升氯甲基甲基趟，接著於至穴 加入254毫克氫化納（含量；55重量％於油）。所得混合物 化納水〜夜洗I，以無水硫酸鎂脫水，及於減壓下濃縮。 所得殘餘物藉矽膠管柱層析術純化（乙腈：氯仿2〇)， 進-步藉中壓製備性高效液相層析術純化（乙酸乙醋：己烧 =2(^: 80)，獲得〇.73克u_€(f氧基甲基）小(3_氯吼咬_2_ 物（57))。 本化合物（57) 基幾基)-3-[2·氟-4-(三氟甲硫基）苯基]脲（後文稱作本化合1H-NMR (CDCl3) 5 (ppm): 1.59 (9H?s), 3.39 (3H?s)5 3.49 (3H5 s), 4.86 (2H, brs), 5.12 (2H, brs), 6·83·6 88(2Η,πι),7.31-7.39 (2H,m),7.73-7.78(2H,m) Example 57 in 1.01 g of 1-(3-chloro-bromo-2-ylcarbonyl)_3_[2_fluoro- 4-(trifluorosulfonium sulphide 203 318750 200804250 under ice cooling (iv) for 3 hours. In the reaction mixture, cooled in ice: and a mixture of saturated aqueous ammonium chloride solution and 5 ml of water, followed by 10 g of B ^ 乙 旨 旨 旨 。 。 。 。 。 。 。 。 。 。 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机 有机Methyl hydrazine was added to 254 mg of sodium hydride (content; 55 wt% oil). The resulting mixture was diluted with water and dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was purified by hydrazine column chromatography (acetonitrile: chloroform 2 〇), and purified by medium-pressure preparative high performance liquid chromatography (acetic acid ethyl acetate: hexane = 2 (^: 80). 73.73 g u_€(foxymethyl) is small (3_chloropurine _2_ (57)). The present compound (57) benzyl)-3-[2·fluoro-4-(trifluoro) Methylthio)phenyl]urea (hereinafter referred to as this compound)

1H-NMR(CDCl3)6(ppm): 3.39(6H,s), 4.93(2H,brs), 5.08(2H, brs), 7.30-7.33(lH,m), 7.44-7.49(2H,m), 7.76-7.79(2H,m), 8·39-8·40(1Η，πι) ’ ’ 實例58 於1·〇1克1_(3,5-二氯。比啶-4_基羰基）_3-[2_氟_4_(三氟 甲硫基）苯基]脲於1〇·〇亳升基_2_吡咯啶酮之溶液内， 於以冰冷卻下加入〇·59毫升氯甲基甲基醚，接著於21至 6°C加入234毫克氳化鈉（含量；55重量％於油）。所得混合 318750 204 200804250 物於以冰冷卻下攪拌3小時。於反應混合物内，於以冰冷 部下加入10宅升飽和氯化銨水溶液與5毫升水之混合物， 接著以10毫升乙酸乙酯萃取3次。有機層經合併，以飽和 氯化鈉水溶液洗3次，以無水硫酸鎂脫水，及於減壓下濃 鈿。所知殘餘物藉矽膠管柱層析術純化（乙酸乙酯：氯仿·· 己烷二1 ·· 1 : 4)，進一步藉中壓製備性高效液相層析術純化 (乙酸乙酯·己烷=15 : 85)，獲得〇·ΐ2克込^貳（甲氧基甲 基）-1-(3,5-二氣吡啶-4-基羰基）_3_[2-氟-4气三氟曱硫基）苯 基]脲（後文稱作本化合物（58))。 本化合物（58)1H-NMR (CDCl3) 6 (ppm): 3.39 (6H, s), 4.93 (2H, brs), 5.08 (2H, brs), 7.30-7.33 (lH, m), 7.44-7.49 (2H, m), 7.76-7.79(2H,m), 8·39-8·40(1Η,πι) ' ' Example 58 in 1·〇1g 1_(3,5-dichloro.pyridin-4-ylcarbonyl)_3- [2_Fluoro_4_(trifluoromethylthio)phenyl]urea in a solution of 1〇·〇亳L base 2_pyrrolidone, and added 〇·59 ml of chloromethylmethyl group under ice cooling Ether, followed by addition of 234 mg of sodium hydride (content; 55 wt% to oil) at 21 to 6 °C. The resulting mixture was stirred for 3 hours under ice cooling with 318750 204 200804250. To the reaction mixture, a mixture of 10 liters of a saturated aqueous ammonium chloride solution and 5 ml of water was added under ice cooling, and then extracted three times with 10 ml of ethyl acetate. The organic layer was combined, washed three times with saturated aqueous sodium chloride, dried over anhydrous magnesium sulfate and evaporated. The residue was purified by column chromatography (ethyl acetate: chloroform··hexane hexane 1··1: 4), and further purified by medium-pressure preparative high performance liquid chromatography (ethyl acetate) Alkane = 15 : 85), obtained 〇 · ΐ 2 g 込 ^ 贰 (methoxymethyl)-1-(3,5-di-pyridin-4-ylcarbonyl)_3_[2-fluoro-4-trifluorofluorene Thio)phenyl]urea (hereinafter referred to as the present compound (58)). Present Compound (58)

W-NMRpMSO-d6，測量溫度·· 8〇γ)δ(ρρηι): 3 24(3H，brs), 3.38(3H，brs)，4.67(2H，brs)，5.11(2H，brs)，7,62(2H，m)，7·72 (lH，m)，8.64(2H，s) 實例59 於1·〇1克l-(2,6_二氟苯甲醯基）_3_(4_二氟曱硫基-2_ 氟苯基）脲於1〇·〇毫升甲基_2_吡咯啶酮之溶液内，於以 冰冷郃下加入〇·67毫升氯曱基曱基醚，接著於至8。〇 加入266毛克氫化鈉（含置，55重量％於油）。所得混合物 於以冰冷卻下攪拌3小時。於反應混合物内，於以冰冷卻 下加入10毫升飽和氯化銨水溶液與5毫升水之混合物，接 著以10毫升乙酸乙酯萃取3次。有機層經合併，以飽和氯 318750 205 200804250 化納水溶液洗3次’以無水硫酸鎮脫水，及於減壓下濃縮。 所得殘餘物藉矽膠管柱層析術純化（乙酸乙酯··氯仿··己烧 =1 : 1 : 4)，進一步藉中壓製備性高效液相層析術純化（乙 酸乙酯：己烷=15 : 85)，獲得〇·39克1,3-貳（甲氧基甲 基）-1-(2,6-二氟苯曱醯基）_3-(4-二氟甲硫基_2-氟苯基）脲 (後文稱作本化合物（59))。 本化合物（59)W-NMRpMSO-d6, measured temperature · · 8 〇 γ) δ (ρρηι): 3 24 (3H, brs), 3.38 (3H, brs), 4.67 (2H, brs), 5.11 (2H, brs), 7, 62(2H,m),7·72 (lH,m),8.64(2H,s) Example 59 in 1·〇1 g l-(2,6-difluorobenzhydryl)_3_(4_difluoro To a solution of 1 〇·〇 ml of methyl-2-pyrrolidinone, 曱·67 ml of chlorodecyl decyl ether was added under ice-cooled mash, followed by up to 8. 〇 Add 266 g of sodium hydride (containing 55 wt% to oil). The resulting mixture was stirred for 3 hours under ice cooling. A mixture of 10 ml of a saturated aqueous ammonium chloride solution and 5 ml of water was added to the mixture, and the mixture was extracted three times with 10 ml of ethyl acetate. The organic layers were combined and washed with a saturated aqueous solution of chlorobenzene 318 750 205 200804250, and then dried over anhydrous sulphuric acid and concentrated under reduced pressure. The residue was purified by column chromatography (ethyl acetate······················ =15 : 85), obtained 〇·39 g of 1,3-贰(methoxymethyl)-1-(2,6-difluorobenzoinyl)_3-(4-difluoromethylthiol_2 -Fluorophenyl)urea (hereinafter referred to as the present compound (59)). Present Compound (59)

H-NMR(CDC13 )5(ppm): 3.38(3H?brs)? 3.53(3H5brs), 4.82 (2H，brs)，5.11(2H，brs)，6.69-6.97(lH，m)，6.85(2H，m)，7·30_ 7.41(4H，m) 實例60 於1·〇1克1-(2-氣-6-氟苯甲醯基）-3_(4_二氟甲硫基-2-氟苯基）脲於10.0毫升1-甲基-2_吡咯啶酮之容液内，於以 冰/ ♦部下加入〇 · 6 4晕升氯甲基甲基醚，接著於1。〇至$。〇 加入255毫克氫化鈉（含量；55重量％於油）。所得混合物 於以冰冷卻下攪拌3小時。於反應混合物内，於以冰冷卻 下加入10毫升飽和氯化銨水溶液與5毫升水之混合物，接 著以10毫升乙酸乙酯萃取3次。有機層經合併，以飽和氯 化鈉水溶液洗3次，以無水硫酸鎂脫水，及於減壓下濃縮。 所付殘餘物藉矽膠管柱層析術純化（乙酸乙酯：氯仿：己烷 =1: 1 : 4)，進一步藉中壓製備性高效液相層析術純化（乙 318750 206 200804250 酸乙酯：己烷=15 : 85)，獲得〇·38克1，3·貳（曱氧基甲 基）-1-(2-氯-6-氟苯曱醯基）-3-(4-二氟甲硫基-2-氟苯基）脲 (後文稱作本化合物（60))。 本化合物（60)H-NMR (CDC13) 5 (ppm): 3.38 (3H?brs)? 3.53 (3H5brs), 4.82 (2H, brs), 5.11 (2H, brs), 6.69-6.97 (lH, m), 6.85 (2H, m), 7·30_ 7.41(4H,m) Example 60 in 1·〇1 g 1-(2-Ga-6-fluorobenzhydryl)-3_(4-difluoromethylthio-2-fluorobenzene The urea was added to a solution of 10.0 ml of 1-methyl-2-pyrrolidinone, and 〇·6 4 halo chloromethyl methyl ether was added under ice/ ♦, followed by 1. 〇 to $. 〇 Add 255 mg of sodium hydride (content; 55 wt% to oil). The resulting mixture was stirred for 3 hours under ice cooling. A mixture of 10 ml of a saturated aqueous ammonium chloride solution and 5 ml of water was added to the mixture, and the mixture was extracted three times with 10 ml of ethyl acetate. The organic layer was combined, washed with a saturated aqueous The residue was purified by column chromatography (ethyl acetate: chloroform:hexane = 1: 1: 4), and purified by medium-pressure preparative high performance liquid chromatography (B 318750 206 200804250 ethyl acetate) :hexane = 15 : 85), obtained 〇·38 g 1,3·贰(decyloxymethyl)-1-(2-chloro-6-fluorophenylindenyl)-3-(4-difluoro Methylthio-2-fluorophenyl)urea (hereinafter referred to as the present compound (60)). The present compound (60)

W-NMRpMSO-dh 測量溫度：80oC)5(ppm): 3.03(3H,brs)， 3.22(3H，brs)，4.74(2H，brs)，5.06(2H，brs), 7.22(lH，m)，7·33 (lH，m)，7.44-7.55(4H，m)，7.37-7.65(lH，m) 實例61 於 0·38 克 l-(2,6-二氟苯曱醯基）-3-[2-氟-4-(l，l，2,3,3, 3-六It丙硫基）苯基]脲於4·0毫升1 -曱基-2-。比咯咬_之溶 液内，於2°C於以冰冷卻下加入〇·2〇毫升氯甲基曱基醚及 80毫克氫化鈉（含量；55重量％於油）。所得混合物於以冰 冷卻下攪拌4小時。於反應混合物内，於以冰冷卻下加入 4耄升飽和氯化銨水溶液與2毫升水之混合物，接著以4 毫升乙酸乙酯萃取3次。有機層經合併，以飽和氯化鈉水 溶液洗3次’以無水硫酸鎂脫水，及於減壓下濃縮。所得 殘餘物藉矽膠管柱層析術純化（乙酸乙酯：氯仿：己烷=1 : 1 : 4)，獲得〇·28克1，3-貳（曱氧基甲基）_1-(2,6_二氟苯曱 醯基）-3-[2-氟-4-(1，1，2,3,3,3-六氟丙硫基）苯基]脲（後文稱 作本化合物（61》。 本化合物（61) 318750 207 200804250W-NMRpMSO-dh Measured temperature: 80oC) 5 (ppm): 3.03 (3H, brs), 3.22 (3H, brs), 4.74 (2H, brs), 5.06 (2H, brs), 7.22 (lH, m), 7.33 (lH, m), 7.44-7.55 (4H, m), 7.37-7.65 (lH, m) Example 61 at 0. 38 g of l-(2,6-difluorobenzoinyl)-3- [2-Fluoro-4-(l,l,2,3,3,3-hexa-propylthio)phenyl]urea in 4·0 ml of 1-mercapto-2-. In the solution of the bite, 〇 2 2 ml of chloromethyl decyl ether and 80 mg of sodium hydride (content; 55 wt% in oil) were added at 2 ° C under ice cooling. The resulting mixture was stirred under ice cooling for 4 hours. A mixture of 4 ml of a saturated aqueous ammonium chloride solution and 2 ml of water was added to the mixture, and then extracted three times with 4 ml of ethyl acetate. The organic layers were combined, washed with a saturated aqueous solution of sodium chloride (3), and then evaporated. The obtained residue was purified by column chromatography (ethyl acetate: chloroform:hexane = 1:1: 4) to afford y·········· 6-difluorophenylindenyl)-3-[2-fluoro-4-(1,1,2,3,3,3-hexafluoropropylthio)phenyl]urea (hereinafter referred to as the present compound ( 61. This compound (61) 318750 207 200804250

iH-NMR(CDCl3)5(ppm): 3.37(3H，s)，3.55(3H，brs)，4.7-4.9 (3H,m)，5.14(2H，brs)，6.83(2H，m), 7.32-7.36(lH，m), 7.42-7.49(3H，m) 實例62 於777毫克1-(2-氣-6-敦苯曱酿基）-3-[2-氟- (l，i 2 2 3 3,3-七氣丙硫基）苯基]腺於7毫升1，3-二曱基味唾琳酮之溶 液内，以冰冷卻下加入367毫克氯甲基曱基醚，然後將ι66 毫克氫化鈉（含量；55重量％於油）加至其中。所得混合物 於5 C攪拌2小時。於反應混合物内加入1 〇毫升飽和氯化 銨水溶液及10毫升乙酸乙酯，混合物攪拌3〇分鐘，接著 加入5 0宅升乙酸乙酯，使混合物分層。有機層循序以水及 飽和氣化鈉水溶液洗滌，以無水硫酸鎂脫水，及於減壓下 濃縮。所得殘餘物藉中壓製備性高效液相層析術純化（乙酸 乙酯··己烷=20 : 80)，獲得300毫克1，3-貳（甲氧基甲 基）氯-6-氟苯甲醯基氟_4-(1，1，2,2,3,3,3_七氟 丙硫基）苯基]脲（後文稱作本化合物（62))。 本化合物（62)iH-NMR (CDCl3) 5 (ppm): 3.37 (3H, s), 3.55 (3H, brs), 4.7-4.9 (3H, m), 5.14 (2H, brs), 6.83 (2H, m), 7.32- 7.36(lH,m), 7.42-7.49(3H,m) Example 62 in 777 mg of 1-(2-gas-6-dendrolyl)-3-[2-fluoro-(l,i 2 2 3 3,3-heptafluoropropyl)phenyl]gland in 7 ml of 1,3-dithiol salinone solution, add 367 mg of chloromethyl decyl ether under ice cooling, then add ι 66 mg Sodium hydride (content; 55 wt% in oil) was added thereto. The resulting mixture was stirred at 5 C for 2 hours. To the reaction mixture were added 1 ml of a saturated aqueous solution of ammonium chloride and 10 ml of ethyl acetate, and the mixture was stirred for 3 hrs, and then 50 liter of ethyl acetate was added to separate the mixture. The organic layer was washed with water and a saturated aqueous solution of sodium chloride, dried over anhydrous magnesium sulfate and evaporated. The obtained residue was purified by medium pressure preparative high performance liquid chromatography (ethyl acetate·hexane = 20:80) to obtain 300 mg of 1,3-yttrium(methoxymethyl)chloro-6-fluorobenzene. Methanyl fluoride_4-(1,1,2,2,3,3,3-heptafluoropropylthio)phenyl]urea (hereinafter referred to as the present compound (62)). Present Compound (62)

&quot; scf2cf2cf3 ch3 ch3 iH-NMR (DMSO-d6，測量溫度·· 80°C)3(ppm)·· 3·21 (3H，s)， 208 318750 200804250 3·36 (3H，s)5 4·76 (2H，s)，5·09 (2H5 s)，7·19 (1H，t5 J = 8.8 Hz)，7·32 (1H，d，J = 8.2 Hz)，7.45-7.52 (1H，m)，7.55-7.63 (2H，m)，7.68-7.74 (1H，m) 實例63 於600毫克i-(2,6-二氟苯甲醯基）-3-[2_氟-(2,2,2_三氟 乙硫基）苯基]脲於15毫升1,3-二甲基·2-味唾咬酮之溶液 内，以冰冷卻下加入355毫克氯甲基曱基醚，然後將147 毫克氫化鈉（含量；55重量％於油）加至其中。所得混合物 於4°C攪拌2小時。於反應混合物内加入1〇毫升飽和氯化 銨水溶液及10毫升乙酸乙酯，混合物攪拌3〇分鐘。所得 混合物内加入50毫升乙酸乙酯，使混合物分層。有機層循 序以水及飽和氣化納水溶液洗蘇，以無水硫酸鎮脫水，及 於減壓下濃縮。所得殘餘物藉中壓製備性高效液相層析術 純化（乙酸乙酯：己烷=25 : 75)，獲得551亳克1，3-戴（甲丁 氧基曱基）·1-(2,6·二氟苯甲醯基）_3_[2_氟_4_(2,2,2_三氟乙 硫基）苯基]脲（後文稱作本化合物（63))。 本化合物（63)&quot; scf2cf2cf3 ch3 ch3 iH-NMR (DMSO-d6, measured temperature · 80 °C) 3 (ppm) · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · · 76 (2H, s), 5·09 (2H5 s), 7·19 (1H, t5 J = 8.8 Hz), 7·32 (1H, d, J = 8.2 Hz), 7.45-7.52 (1H, m) , 7.55-7.63 (2H, m), 7.68-7.74 (1H, m) Example 63 in 600 mg of i-(2,6-difluorobenzhydryl)-3-[2_fluoro-(2,2, 2_Trifluoroethylthio)phenyl]urea in a solution of 15 ml of 1,3-dimethyl-2-meridone, 355 mg of chloromethyl decyl ether was added under ice cooling, and then 147 Sodium hydride (content; 55 wt% in oil) was added thereto. The resulting mixture was stirred at 4 ° C for 2 hours. 1 ml of a saturated aqueous solution of ammonium chloride and 10 ml of ethyl acetate were added to the reaction mixture, and the mixture was stirred for 3 min. 50 ml of ethyl acetate was added to the resulting mixture to separate the mixture. The organic layer was washed with water and a saturated aqueous solution of sodium chloride, dehydrated with anhydrous sulfuric acid, and concentrated under reduced pressure. The obtained residue was purified by medium pressure preparative high performance liquid chromatography (ethyl acetate:hexane = 25:75) to obtain 551 g of 1,3-di(methylbutoxycarbonyl)·1-(2) , 6·difluorobenzhydryl)_3_[2_fluoro_4_(2,2,2-trifluoroethylthio)phenyl]urea (hereinafter referred to as the present compound (63)). Present Compound (63)

ch3 ch3 W-NMR (DMSO-d，測量溫唐：80〇rWr^_、.，μ /οττCh3 ch3 W-NMR (DMSO-d, measuring Wentang: 80〇rWr^_,.,μ /οττ

(2H? m) 318750 209 200804250 實例64 於800毫克3-[2-氯-4_(二氟甲硫基）苯基]_1-(2，心二氟 苯甲醯基）脲於15亳升1，3-二甲基-2_咪唑啶酮之溶液内， 加入1.1克氯甲基甲基醚，及然後將3〇〇毫克氫化鈉（含 量；60重量％於油）加至其中。所得混合物於室溫攪拌工 小牯。於反應混合物内加入8〇毫升乙酸乙酯，所得混合物 循序以水及飽和氯化鈉水溶液洗滌，以無水硫酸鎂脫水， 及於減壓下濃縮。所得殘餘物藉中壓製備性高效液相層析 術純化（乙酸乙酯··己烷=15 ·· 85)，獲得52〇毫克U-貳（甲 氧基甲基）-3-[2-氯-4-(二氣甲硫基）苯基]+ (2，卜二氟苯甲 醯基）脲（後文稱作本化合物（64))。 本化合物（64)(2H? m) 318750 209 200804250 Example 64 at 800 mg of 3-[2-chloro-4_(difluoromethylthio)phenyl]_1-(2,xindifluorobenzhydryl)urea at 15 liters 1 To the solution of 3-dimethyl-2-imidazolidinone, 1.1 g of chloromethyl methyl ether was added, and then 3 mg of sodium hydride (content; 60% by weight in oil) was added thereto. The resulting mixture was stirred at room temperature. 8 ml of ethyl acetate was added to the reaction mixture, and the mixture was washed with water and saturated aqueous sodium chloride, dried over anhydrous magnesium sulfate and evaporated. The obtained residue was purified by medium pressure preparative high performance liquid chromatography (ethyl acetate··hexane = 15 ··85) to obtain 52 mg of U-贰(methoxymethyl)-3-[2- Chloro-4-(dimethylmethylthio)phenyl]+(2,bdifluorobenzhydryl)urea (hereinafter referred to as the present compound (64)). Present Compound (64)

schf2 !H-NMR (DMSO-d6, 80°C)6(ppm)； 3.24 (3H, s) 3.37 (3H，s)，4.81 (2H，s)，5.04 (2H, s)，7.〇8 (2H，t，j = 8 5Schf2 !H-NMR (DMSO-d6, 80 ° C) 6 (ppm); 3.24 (3H, s) 3.37 (3H, s), 4.81 (2H, s), 5.04 (2H, s), 7. 〇8 (2H,t,j = 8 5

Hz), 7.43 (1H? d9 J = 8.5 Hz) 7 47-7 5» ίου \ nHz), 7.43 (1H? d9 J = 8.5 Hz) 7 47-7 5» ίου \ n

/·4/_/·58 (2H，m)，7·50 (1H t? J = 56.0 Hz)9 7.76 (1H5 d? J = 1.9 Hz) ， 實例65 0.32克2,6-二氟苯甲醒基異氰酸酯於〇 4毫升乙鍵之 溶液，於以冰冷卻下添加至G.41克_氧^基· 甲硫基）_2_氟苯胺於1.6毫升乙·、、六 毛开乙醚之/谷液，混合物於室溫 拌2小時。反應混合物於減壓下灌 口i卜/辰細，所得殘餘物藉中壓 3】8750 210 200804250 製備性高效液相層析術純化，獲得0·40克l-(2,6-二氟苯曱 酉&amp;基）-3-[2·氟-4-(一鼠甲硫基）苯基]_3-(曱氧基甲基）脈（後 文稱作本化合物（65))。 本化合物（65)/·4/_/·58 (2H,m),7·50 (1H t? J = 56.0 Hz)9 7.76 (1H5 d? J = 1.9 Hz), Example 65 0.32 g 2,6-difluorobenzene A solution of ketone isocyanate in 4 ml of ethyl ketone was added to G.41 g of oxalyl·methylthio)_2-fluoroaniline in 1.6 ml of ethyl bromide. The mixture was stirred at room temperature for 2 hours. The reaction mixture was poured under reduced pressure, and the residue obtained was purified by preparative high performance liquid chromatography using medium pressure 3: 8750 210 200804250 to obtain 0. 40 g of l-(2,6-difluorobenzene).曱酉 &amp; base)-3-[2·fluoro-4-(monomethylmethylthio)phenyl]_3-(indolylmethyl) vein (hereinafter referred to as the present compound (65)). Present Compound (65)

1 H-NMR(DMSO-d6，測量溫度：80°C)3(ppm): 3.31(3H，s)， 4.99(2H，s)，7·06-7·15(2Η，ιη)，7.37-7.65(lH，m)，7.42-7.53 (4H，m)，10.56(lH，brs) 實例66 於1·12克2 -氟-4-(2，2，2-三氟乙硫基）苯胺於i〇亳升曱 醇之溶液内，加入324毫克三聚甲醛及4.80克曱氧化納（28 重量％甲醇溶液），混合物於室溫攪拌7小時。反應混合物 内加入50毫升水，混合物以第三丁基曱基醚萃取3次。有 機層以飽和氯化鈉水溶液洗蘇，以無水硫酸鎮脫水，及於 減壓下濃縮’獲得1.39克2 -氟-N_曱氧基甲基_4_(2,2,2-三 氟乙硫基）苯胺。此苯胺化合物溶解於10毫升第三丁基甲 基鍵，於溶液内缓慢加入910毫克2,6-二氟苯曱酸基異氮 酸酯於3.0毫升第三丁基曱基醚之溶液，所得混合物於室 溫攪拌30分鐘。此反應混合物於減壓下濃縮。所得殘餘物 藉中壓製備性高效液相層析術純化（乙酸乙酯：己烧=25 : 75)，獲得 1·1〇 克 1-(2,6·二氟苯曱醯基）_3_[2·氟-4-(2,2,2_ 二氟乙硫基）苯基]-3-(曱氧基曱基）脲（後文稱作本化合物 318750 211 200804250 (66)) ° 本化合物（66)1 H-NMR (DMSO-d6, measured temperature: 80 ° C) 3 (ppm): 3.31 (3H, s), 4.99 (2H, s), 7·06-7·15 (2Η, ιη), 7.37- 7.65 (lH, m), 7.42-7.53 (4H, m), 10.56 (lH, brs) Example 66 in 1·12 g of 2-fluoro-4-(2,2,2-trifluoroethylthio)aniline To the solution of decyl sterol, 324 mg of trioxane and 4.80 g of ruthenium oxide (28 wt% methanol solution) were added, and the mixture was stirred at room temperature for 7 hours. 50 ml of water was added to the reaction mixture, and the mixture was extracted three times with a third butyl decyl ether. The organic layer was washed with saturated aqueous sodium chloride solution, dehydrated with anhydrous sulfuric acid, and concentrated under reduced pressure to yield 1.39 g of 2-fluoro-N-decyloxymethyl-4_(2,2,2-trifluoroethyl Thio)aniline. The aniline compound was dissolved in 10 ml of a third butyl methyl bond, and a solution of 910 mg of 2,6-difluorobenzoyl isocyanate in 3.0 ml of t-butyl decyl ether was slowly added to the solution, and the resulting mixture was Stir at room temperature for 30 minutes. The reaction mixture was concentrated under reduced pressure. The obtained residue was purified by medium pressure preparative high performance liquid chromatography (ethyl acetate: hexane = 25:75) to obtain 1·1 g of 1-(2,6·difluorobenzoinyl)_3_[ 2. Fluoro-4-(2,2,2-difluoroethylthio)phenyl]-3-(decyloxyindenyl)urea (hereinafter referred to as the present compound 318750 211 200804250 (66)) ° The present compound ( 66)

ch3 ^-NMRPMSO-I，測量溫度：80〇c)s(ppm): 3·3〇 (3H，s)， 4·02 (2H，q，J = 10·2 Hz)，4·96 (2H，s)，7.07 (2H，t，J = 8·1Ch3 ^-NMRPMSO-I, measurement temperature: 80 〇 c) s (ppm): 3·3 〇 (3H, s), 4·02 (2H, q, J = 10·2 Hz), 4·96 (2H ,s),7.07 (2H,t,J = 8·1

Hz)9 7.30-7.40 (2H? m)5 7.42-7.54 (2H? m)? 10.45 (1H? br s) 實例67 ’ 於1·8克2-氟-4-(1，i，2,3,353-六氟丙硫基）苯胺於1()毫 升甲醇之溶液内，加入400毫克三聚甲醛及5·92克甲氧化 鈉（28重量％曱醇溶液），混合物於室溫攪拌6小時。反應 混合物内加入50毫升水，接著以第三丁基曱基醚萃取3 次。有機層以飽和氯化鈉水溶液洗滌，以無水硫酸鎂脫水， 及於減壓下濃縮，獲得1.98克2-氟曱氧基曱基_4_(1，1， 2,3,3,3-六氟丙硫基）苯胺。於3〇〇毫克2-氟_：^_曱氧基曱基 _4-(1，1，2,3,3,3-六氟丙硫基）苯胺於5毫升第三丁基甲基鱗 之溶液内緩緩加入163毫克2,6-二氟苯甲醯基異氰酸酯於 1 · 〇耄升第二丁基甲基醚之溶液，混合物於室溫擾拌3 〇分 鐘。此反應混合物於減壓下濃縮。所得殘餘物藉中壓製備 性而效液相層析術純化（乙酸乙酯：己烧=25 : 75)，芦得 290 晕克 1-(2,6·二氟苯甲醯基）-3-[2-氟-4_(1，1，2,3,3,3-六氟 丙硫基）苯基]-3-(甲氧基甲基）脲（後文稱作本化合物（67))。 本化合物（67) 318750 212 200804250Hz)9 7.30-7.40 (2H? m)5 7.42-7.54 (2H?m)? 10.45 (1H? br s) Example 67 ' at 1.88 2-fluoro-4-(1,i,2,3,353 - Hexafluoropropylthio)aniline in 1 (1 ml) of methanol, 400 mg of trioxane and 5.92 g of sodium methoxide (28 wt% decyl alcohol solution) were added, and the mixture was stirred at room temperature for 6 hours. 50 ml of water was added to the reaction mixture, followed by extraction three times with a third butyl decyl ether. The organic layer was washed with a saturated aqueous solution of sodium chloride, dried over anhydrous magnesium sulfate, and evaporated under reduced pressure to obtain 1.98 g of 2-fluoro methoxy hydrazyl _4_(1,1, 2,3,3,3- Fluoropropylthio)aniline. a solution of 3 mg of 2-fluoro-:^-nonyloxyindenyl 4-(1,1,2,3,3,3-hexafluoropropylthio)aniline in 5 ml of tert-butylmethyl scale A solution of 163 mg of 2,6-difluorobenzhydryl isocyanate in 1 · liter of the second butyl methyl ether was slowly added, and the mixture was stirred at room temperature for 3 Torr. The reaction mixture was concentrated under reduced pressure. The obtained residue was purified by medium pressure preparative liquid chromatography (ethyl acetate: hexane = 25:75), hexane chrome 1-(2,6-difluorobenzhydryl)-3 -[2-Fluoro-4_(1,1,2,3,3,3-hexafluoropropylthio)phenyl]-3-(methoxymethyl)urea (hereinafter referred to as this compound (67) ). The present compound (67) 318750 212 200804250

tNMR (DMSO-d6,測量溫度·· 80〇c)s(ppm): 3·32 (3h，s) 5.02 (2H，s)，6·01-6·24 (1H，m)，7·07 (2H，t，J = 8.1 Hz)， 7·43_7·63 (4H，m)，10.60 (1H，br s) 製造例6 於580耄克2-氟-4-(三氟曱硫基）乙酸苯胺於5毫升 1，3-二甲基-2-咪唑啶酮之溶液内，加入382毫克溴乙基曱 基醚’然後加入120毫克氫化鈉（含量；55重量％於油）， 混合物於室溫攪拌1小時。於反應混合物内加入5()毫升乙 酸乙酯，循序以水及飽和氯化鈉水溶液洗滌。有機層以無 硫酸鎂脫水，於減壓下濃縮，獲得632毫克氟甲 氧基乙基）·‘（三氟曱硫基）乙醯苯胺。 2-氟-N-(2-甲氧基乙基）-4-(三氟曱硫基）乙醯苯胺 jiXrSCF3 ^-NMR (CDCl3)5(ppm): 1.88 (3H? s)? 3.27 (3H? s)? 3.39-3.52 (1H? m)5 3.56-3.76 (2H? m)9 3.95-4.09 (1H5 m)? 7.38-7·44 (1H，m)，7·46_7·53 (2H，m) 製造例7 於632毫克2-氟-N-(2-曱氧基乙基）-4-(三氟曱硫基）乙 醯苯胺於15毫升甲醇之溶液内加入5毫升35%鹽酸，混 213 318750 200804250 合物回流加熱6小時。讓反應混合物冷卻至室溫，2N氯氧 化鈉水溶液添加至其中來調整至pH 1〇，接著以第三丁基 甲基十取3〔人。有機層以無水硫酸鎂脫水，於減麼下濃 縮。所得殘餘物藉中壓製備性高效液相層析術純化（乙酸乙 酯：己烷=10 : 90)，獲得492毫克2_氟_队(2_甲氧基乙 基）-4-(三氟曱硫基）苯胺。 2-氟-N-(2_甲氧基乙基）-4-(三氟甲硫基）苯胺 k^^scf3 °\ή3 ]H-NMR (CDCl3)5(ppm): 3.35 (2H? q? J = 5.3 Hz)? 3.40 (3H，s)，3·63 (2H，t，J = 5·3 Hz)，4·56 (1H，br), 6·67 (1H，t， J = 8.7 Hz)5 7.21-7.33 (2H? m) 實例68 330毫克2,6-二氟苯甲醯基異氰酸酯於j ·〇毫升乙酸乙 酯之溶液於室溫添加至485毫克2-氟-Ν-(2-甲氧基乙基）-4-(二氟甲硫基）苯胺之溶液，混合物於室溫擾拌2小時。反 應混合物循序以水及飽和氯化鈉水溶液洗滌，以無水硫酸 鎂脫水，及於減壓下濃縮。所得殘餘物藉中壓製備性高效 液相層析術純化（乙酸乙酯：己烷=34 : 66)，獲得560毫克 1-(2,6-二氟苯甲醯基）-3-[2-氟_4-(三氟曱硫基）苯基]_3_(甲 氧基乙基）脲（後文稱作本化合物（68))。 本化合物（68) 318750 214 200804250 F Ο O FvY^Y&quot;SCF3 〇、CH3 W-NMR (DMSO-d6，測量溫度：8〇〇c)5(ppm): 316 (3h，^ 3·47 (2H，t，J = 5·6 Hz)，3.80 (2H，t，J = 5.6 Hz)，7.0im (2H? m), 7.42-7.51 (1H? m)5 7.51-7.59 (2H? m)? 7.60-7.68 (1H，m)，10.49 (1H，br s) 製造例8 於5.0克2-氟-4-(三氟甲硫基）乙醯苯胺於3〇毫升n 二曱基-2·咪唑啶酮之溶液内加入5 〇克2_(2_溴乙氧基）四 氫-2H-哌喃，然後加入980毫克氫化鈉（含量；55重量％於 油），所得混合物於7 0。(：攪拌3小時。於反應混合物内加' 入100毫升水，接著以乙酸乙酯萃取2次。有機層循序以 水及飽和氯化鈉水溶液洗滌，以無水硫酸鎂脫水，及於減 壓下濃縮。所得殘餘物藉矽膠管柱層析術純化（乙酸乙酯： 己烷=1 : 2) ’獲得6.09克2-氟-N-[2-(2,氫-2£[-哌喃基氧 基）乙基]-4·(三氟甲硫基）乙酿苯胺。 2-氟-N-[2-(2-四氫-2H-哌喃基氧基）乙基]-4_(三氟甲硫基） 乙醯苯胺 ji^rSCF3 ^-NMR (CDCl3)5(ppm): 1.27-1.76 (6H? m), 1.89 (3H, s)? 318750 215 200804250 3.39-4.19 (6H，m)，4·43·4·60 (1H，m)，7·38-7·54 (3H，m) 製造例9 ’ 於820毫克2-氟-N-[2-(2-四氫_2H-哌喃基氧基）乙 基]-4-(二氟甲硫基）乙醯苯胺於1〇毫升甲醇之溶液加入$ 毫升35%鹽酸，所得混合物回流加熱丨小時。讓反應混合 物冷卻至室溫，加入30毫升2N氫氧化鈉水溶液來調整二 pH 10,接著以第三丁基曱基醚萃取3次。有機層以無水硫 酸鎂脫水，於減壓下濃縮，獲得535毫克N气2_羥基乙基 氟-4-(三氟甲硫基）苯胺。 N-(2_，基乙基）-2-氟-4-(三氟甲硫基）苯胺tNMR (DMSO-d6, measured temperature · 80 〇 c) s (ppm): 3·32 (3h, s) 5.02 (2H, s), 6·01-6·24 (1H, m), 7·07 (2H, t, J = 8.1 Hz), 7·43_7·63 (4H, m), 10.60 (1H, br s) Production Example 6 at 580 g of 2-fluoro-4-(trifluorosulfonylthio)acetic acid In a solution of 5 ml of 1,3-dimethyl-2-imidazolidinone, add 382 mg of bromoethylmercaptoether' and then add 120 mg of sodium hydride (content; 55 wt% to oil). Stir for 1 hour. 5 (1 ml) of ethyl acetate was added to the reaction mixture, followed by washing with water and a saturated aqueous solution of sodium chloride. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure to yield 632 mg of fluoromethoxyethyl) &lt;(trifluorosulfonyl) ethanilide. 2-fluoro-N-(2-methoxyethyl)-4-(trifluorosulfonylthio)acetanilide jiXrSCF3 ^-NMR (CDCl3) 5 (ppm): 1.88 (3H?s)? 3.27 (3H ? s)? 3.39-3.52 (1H? m)5 3.56-3.76 (2H? m)9 3.95-4.09 (1H5 m)? 7.38-7·44 (1H,m),7·46_7·53 (2H,m Preparation Example 7 Into a solution of 632 mg of 2-fluoro-N-(2-decyloxyethyl)-4-(trifluorosulfonylthio)acetanilide in 15 ml of methanol, 5 ml of 35% hydrochloric acid was added and mixed. 213 318750 200804250 The mixture was heated under reflux for 6 hours. The reaction mixture was allowed to cool to room temperature, and a 2N aqueous sodium chloride solution was added thereto to adjust to pH 1 〇, followed by 3 butyl methyl ketone. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The residue obtained was purified by medium pressure preparative high performance liquid chromatography (ethyl acetate:hexane = 10:90) to give 492 mg of 2-fluoro- (2-methoxyethyl)-4- Fluorosulfonyl) aniline. 2-Fluoro-N-(2-methoxyethyl)-4-(trifluoromethylthio)aniline k^^scf3 °\ή3 ]H-NMR (CDCl3) 5 (ppm): 3.35 (2H? q ? J = 5.3 Hz)? 3.40 (3H, s), 3·63 (2H, t, J = 5·3 Hz), 4·56 (1H, br), 6·67 (1H, t, J = 8.7 Hz)5 7.21-7.33 (2H?m) Example 68 330 mg of 2,6-difluorobenzyl isocyanate in j·〇 ml of ethyl acetate was added to 485 mg of 2-fluoro-indole- at room temperature. A solution of 2-methoxyethyl)-4-(difluoromethylthio)aniline was stirred at room temperature for 2 hours. The reaction mixture was washed with water and a saturated aqueous solution of sodium chloride, dried over anhydrous magnesium sulfate, and evaporated. The obtained residue was purified by preparative high-performance liquid chromatography (ethyl acetate:hexane = 34: 66) to obtain 560 mg of 1-(2,6-difluorobenzhydryl)-3-[2 -Fluoro-4-(trifluorosulfonylthio)phenyl]_3_(methoxyethyl)urea (hereinafter referred to as the present compound (68)). The present compound (68) 318750 214 200804250 F Ο O FvY^Y&quot;SCF3 〇, CH3 W-NMR (DMSO-d6, measuring temperature: 8〇〇c) 5 (ppm): 316 (3h, ^ 3·47 (2H) ,t,J = 5·6 Hz), 3.80 (2H,t,J = 5.6 Hz), 7.0im (2H? m), 7.42-7.51 (1H? m)5 7.51-7.59 (2H? m)? 7.60 -7.68 (1H, m), 10.49 (1H, br s). Production Example 8 in 5.0 g of 2-fluoro-4-(trifluoromethylthio)acetanilide in 3 ml of n-diyl-2-imidazole To the solution of the ketone was added 5 g of 2-(2-bromoethoxy)tetrahydro-2H-pyran, then 980 mg of sodium hydride (content; 55 wt% in oil) was added, and the resulting mixture was at 70. After 3 hours, 100 ml of water was added to the reaction mixture, followed by extraction with ethyl acetate. The organic layer was washed sequentially with water and saturated aqueous sodium chloride, dried over anhydrous magnesium sulfate and evaporated. The residue was purified by column chromatography (ethyl acetate:hexane = 1 : 2) to afford 6.09 g of 2-fluoro-N-[2-(2, hydrogen-2][-pyranyloxy) Ethyl]-4·(trifluoromethylthio)ethyl aniline. 2-fluoro-N-[2-(2-tetrahydro-2H-piperanyloxy)ethyl]-4_(trifluoromethane base Ethyl aniline ji^rSCF3 ^-NMR (CDCl3) 5 (ppm): 1.27-1.76 (6H? m), 1.89 (3H, s)? 318750 215 200804250 3.39-4.19 (6H,m),4·43·4 · 60 (1H, m), 7·38-7·54 (3H, m) Production Example 9 ' at 820 mg of 2-fluoro-N-[2-(2-tetrahydro-2H-pyranyloxy) Ethyl]-4-(difluoromethylthio)acetanilide was added to 1 ml of methanol in 1 ml of 35% hydrochloric acid, and the mixture was heated under reflux for a few hours. The reaction mixture was allowed to cool to room temperature and 30 ml of 2N hydrogen was added. An aqueous solution of sodium oxide was added to adjust the pH to 10, followed by extraction with tributyl decyl ether three times. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure to give 535 mg of N gas of 2-hydroxyethylfluoro-4- (Trifluoromethylthio)aniline N-(2_,ylethyl)-2-fluoro-4-(trifluoromethylthio)aniline

}H-NMR (CDCl3)5(ppm): 1.64 (1H5 t5 J = 4.8 q，J = 4·8 Hz)，3·89 (2H，q，J = 4.8 Hz)，4.47-4 m)，6·70 (1H，t，J = 8·7 Hz)，7·21-7·36 (2H，m) t，J = 4·8 Hz), 3.38 (2H， 製造例10 (2H? q, J-4.8 Hz)? 4.47-4.67 (ih5 br8·7 Hz)，7·21-7·36 (2H，m)}H-NMR (CDCl3) 5 (ppm): 1.64 (1H5 t5 J = 4.8 q, J = 4·8 Hz), 3·89 (2H, q, J = 4.8 Hz), 4.47-4 m), 6 ·70 (1H, t, J = 8·7 Hz), 7·21-7·36 (2H, m) t, J = 4·8 Hz), 3.38 (2H, Manufacturing Example 10 (2H? q, J -4.8 Hz)? 4.47-4.67 (ih5 br8·7 Hz), 7·21-7·36 (2H, m)

373毫克2,6-二氟苯甲醯*田@，一一-酯之溶液於室溫添加至52〇 -4-(三氟甲硫基）苯胺於7毫升乙酸乙醋之溶液 壓製備性咼效液相層析術純化（乙酸乙酯： 66)，獲4 460 t克l(2,6_二氣苯甲酿基^ 甲硫基）策某1 - 3 - 贫，\ „ 物攪拌1小時。反應混合物於減壓下濃縮。所 中壓製備性高效漭如® “ ^ _____ _ 硫基）苯基]-3-(2-羥基乙基）脲。 318750 216 200804250 l-(2,6-一氟苯甲醯基）_3乂2_氟_4_(三獻甲硫基）苯基]_3 羥基乙基）脲373 mg of 2,6-difluorobenzhydrazide* Tian @, one-ester solution was added to a solution of 52 〇-4-(trifluoromethylthio)aniline in 7 ml of ethyl acetate at room temperature. Purified by liquid chromatography (ethyl acetate: 66), obtained 4 460 t g (2,6_two gas benzoyl ^ methylthio) strategy 1 - 3 - lean, \ „ stirring The reaction mixture is concentrated under reduced pressure. The medium pressure is preparatively efficient such as &quot;^ _____ _ thio)phenyl]-3-(2-hydroxyethyl)urea. 318750 216 200804250 l-(2,6-fluorobenzhydryl)_3乂2_fluoro_4_(trimethylthio)phenyl]_3 hydroxyethyl)urea

OH Η細NMR (CDCl3)S(ppm)·· 1·64 (1H，br s)，3·66-4·〇6 (4H， m)，6·92 (2Η，t，J = 8·6 Ηζ)，7·32-7·59 (5Η，m) 實例69 於284毫克ΐ-(2,6-二氟笨曱醯基）_3_[2_氟_4_(三氟甲 硫基）苯基]_3♦經基乙基）腺於5毫升乙酸乙酯之溶液内 加入98晕克三乙基胺，然後加入兄毫克乙醯氯，所得混 合物於室溫攪拌2小時。此反應混合物通過矽藻土（Ceiite) 過濾，濾液於減壓下濃縮。所得殘餘物藉中壓製備性高效 液相層析術純化（乙酸乙酯：己烧5 : 75)，獲得50毫克 1_乙ί&amp;基-3-(2-乙醯氧基乙基）_}_(2,6-二氟苯甲醯基）_3_[2_ 氟-4-(二氟甲硫基）苯基]脲（後文稱作本化合物（69))。 本化合物（69) F 〇 0 fN^y^scf3OH Η fine NMR (CDCl3) S (ppm)·· 1·64 (1H, br s), 3·66-4·〇6 (4H, m), 6.92 (2Η, t, J = 8·6 Ηζ), 7·32-7·59 (5Η, m) Example 69 in 284 mg of ΐ-(2,6-difluoro cumyl)_3_[2_fluoro_4_(trifluoromethylthio)phenyl To a solution of 5 g of ethyl acetate in 5 ml of ethyl acetate was added 98 gram of triethylamine, followed by the addition of the brothers acetonitrile, and the mixture was stirred at room temperature for 2 hr. The reaction mixture was filtered through celite (EtOAc). The residue obtained was purified by medium pressure preparative high performance liquid chromatography (ethyl acetate: hexane 5:75) to give 50 mg of 1-ethyl-amp; }_(2,6-Difluorobenzhydryl)_3_[2_fluoro-4-(difluoromethylthio)phenyl]urea (hereinafter referred to as the present compound (69)). The present compound (69) F 〇 0 fN^y^scf3

^F?° S CH3 〇、C〇CH3 ]H-NMR (CDCl3)6(ppm): 1.97 (3H5 s)? 2.37 (3H? s)? 3.96- 4.53(4H，m)，6.69-6.87 (2H，m)，7.25-7.36 (lH，m)，7.37-7.49 (2H，m)，7.51-7.59 (1H，m) 318750 217 200804250 實例70 於300毫克i-(2,6-二氟苯甲醯基）_3-[2_氟_4-(三氟甲 硫基）苯基&gt;1-甲基脲於4毫升丨，夂二曱基_2_咪唑啶酮之溶 液内於〇 C加入115耄克苄基氯甲基醚，然後將3 5毫克 ^化鈉（含量；55重量％於油）加至其中。所得混合物於室 溫攪拌1小時。於反應混合物内加入1〇毫升飽和氯化銨水 溶液，混合物攪拌30分鐘，接著加入5〇毫升乙酸乙酯， 混合物分離成多層。有機層循序以水及飽和氯化鈉水溶液 洗滌，以無水硫酸鎂脫水，及於減壓下濃縮。所得殘餘物 藉中壓製備性高效液相層析術純化（乙酸乙酯：己烧=丨5 : 85)，獲得206毫克3-苄氧基甲基-i-o二氟苯曱醯基）_3_ [2-氟-4-(二氟曱硫基）苯基]_ι_曱基脲（後文稱作本化合物 (70)) 〇 本化合物（70)^F?° S CH3 〇, C〇CH3 ]H-NMR (CDCl3) 6 (ppm): 1.97 (3H5 s)? 2.37 (3H? s)? 3.96- 4.53 (4H, m), 6.69-6.87 (2H , m), 7.25-7.36 (lH, m), 7.37-7.49 (2H, m), 7.51-7.59 (1H, m) 318750 217 200804250 Example 70 in 300 mg of i-(2,6-difluorobenzamide) )3-[2_Fluoro-4-(trifluoromethylthio)phenyl>1-methylurea is added to 〇C in a solution of 4 ml of hydrazine, hydrazinyl-2-imidazolidinone The benzyl chloromethyl ether was then added to 35 mg of sodium hydride (content; 55 wt% in oil). The resulting mixture was stirred at room temperature for 1 hour. To the reaction mixture was added 1 ml of a saturated aqueous solution of ammonium chloride, and the mixture was stirred for 30 minutes, then 5 ml of ethyl acetate was added, and the mixture was separated into layers. The organic layer was washed with water and a saturated aqueous solution of sodium chloride, dried over anhydrous magnesium sulfate and evaporated. The residue obtained was purified by medium pressure preparative high performance liquid chromatography (ethyl acetate:hexane = 丨5: 85) to obtain 206 mg of 3-benzyloxymethyl-iodifluorophenylhydrazinyl)_3_ [ 2-fluoro-4-(difluorosulfonylthio)phenyl]_ι_carbyl urea (hereinafter referred to as the present compound (70)) guanidine compound (70)

^-NMR (CDCl3)5(ppm): 3.11 (3H5 s)? 4.76 (2H5 br s)? 5.23 (2H，br s)，6·78-6·93 (2H，m)，7.21-7.54 (9H，m) 實例71 於1.5克1-(2,6-二氟苯曱醯基）_3_[2_氟-4-(三氟曱硫基） 本基]-1-曱基腺於7毫升1，3-二曱基- 2-0米嗤咬嗣之溶液 内，於0°C加入758毫克2_氯乙基曱基醚，然後將189亳 218 318750 200804250 f氫化鈉（含量；55重量％於油）加至其中。所得混合物於 室溫攪拌1小時。於反應混合物内加入1〇毫升飽和氯化銨 水溶液及20毫升乙酸乙酯，混合物攪拌3〇分鐘。混合物 通過矽藻土過濾。濾液循序以水及飽和氯化鈉水溶液洗 滌，以無水硫酸鎂脫水，及於減壓下濃縮。所得殘餘物藉 中壓製備性咼效液相層析術純化（乙酸乙酯：己院=25 : 75) ’獲得882毫克3 — (2_氯乙氧基甲基H_(2,6_二氟苯甲醯 基）-3-[2_氟_4-(三氟甲硫基）苯基卜卜曱基脲（後文稱作本化 合物（71))。 本化合物（71)^-NMR (CDCl3) 5 (ppm): 3.11 (3H5 s)? 4.76 (2H5 br s)? 5.23 (2H, br s), 6·78-6·93 (2H, m), 7.21-7.54 (9H , m) Example 71 in 1.5 g of 1-(2,6-difluorobenzoinyl)_3_[2-fluoro-4-(trifluorosulfonylthio)-yl]-1-indenyl gland in 7 ml 1 , 3-dimercapto- 2-0 m 嗤 嗣 solution, add 758 mg of 2-chloroethyl decyl ether at 0 ° C, then 189 亳 218 318750 200804250 f sodium hydride (content; 55 wt% Oil) is added to it. The resulting mixture was stirred at room temperature for 1 hour. 1 ml of a saturated aqueous solution of ammonium chloride and 20 ml of ethyl acetate were added to the mixture, and the mixture was stirred for 3 min. The mixture was filtered through diatomaceous earth. The filtrate was washed with water and a saturated aqueous solution of sodium chloride, dried over anhydrous magnesium sulfate and evaporated. The residue obtained was purified by medium pressure preparative enthalpy liquid chromatography (ethyl acetate: hexane=25:75) ' Obtained 882 mg 3 - (2_chloroethoxymethyl H-(2,6_2) Fluorobenzhydryl)-3-[2-fluoro-4-(trifluoromethylsulfanyl)phenyl bromide urea (hereinafter referred to as the present compound (71)). This compound (71)

W-NMR^MSO-l，測量溫度：80°C)S(pPm): 3.05 (3H，s)， 3.68 (2H, t, J = 5.4 Hz), 3.84 (2H, t, J = 5.4 Hz), 5.18 (2H, ? s), 7.03-7.14 (2H, m), 7.46-7.61 (3H, m), 7.66-7.74 (1H, m). 製造例11 於5·〇9克2-氟-N-(2-羥基乙基）-4-(三氟甲硫基）苯胺内 加入30宅升3,4_二氫-2H-派喃，於以冰冷卻下將5〇〇毫克 對曱本石κ酸π比咬鑌一水合物加至其中。所得混合物於室溫 攪拌1小時。於反應混合物加入1〇〇毫升第三丁基甲基醚， 所得混合物循序以水及飽和氯化鈉水溶液洗滌。有機層以 318750 219 200804250W-NMR^MSO-l, measured temperature: 80 °C) S(pPm): 3.05 (3H, s), 3.68 (2H, t, J = 5.4 Hz), 3.84 (2H, t, J = 5.4 Hz) , 5.18 (2H, ? s), 7.03-7.14 (2H, m), 7.46-7.61 (3H, m), 7.66-7.74 (1H, m). Production Example 11 at 5·〇9 g 2-fluoro-N -(2-Hydroxyethyl)-4-(trifluoromethylthio)aniline was added to 30 liters of 3,4-dihydro-2H-pyran, and 5 〇〇mg of 曱本石 under ice cooling κ acid π is added to the bite monohydrate. The resulting mixture was stirred at room temperature for 1 hour. 1 ml of a third butyl methyl ether was added to the reaction mixture, and the resulting mixture was washed with water and a saturated aqueous solution of sodium chloride. Organic layer with 318750 219 200804250

氟-4-(三氟曱硫基）苯基]_3_[2_(2_四氫_2Η_哌喃基氧基）乙 基]脲。 無水硫酸鎂脫水，及於減壓下濃縮，獲得6.77克2_氟 善邮-四氫·2Η_旅喃基氧基）乙基]_4_(三氟甲硫基): 胺。此苯胺化合物溶解於4〇毫升乙酸乙酯，於溶液内緩慢 1-(2,6-二氟苯甲醯基）_3_[2_氟_4_(三氟甲硫基）苯基]_3_[2 (2_四氫-2Η_哌喃基氧基）乙基]脲Fluoro-4-(trifluorosulfonylthio)phenyl]_3_[2_(2_tetrahydro-2-indole-piperanyloxy)ethyl]urea. Dehydration with anhydrous magnesium sulfate and concentration under reduced pressure afforded 6.77 g of 2 - fluoro ssssssssssssssssssssssssssssssssssssss The aniline compound was dissolved in 4 ml of ethyl acetate, and the solution was slowly 1-(2,6-difluorobenzhydryl)_3_[2_fluoro_4_(trifluoromethylthio)phenyl]_3_[2 (2_tetrahydro-2Η-piperanyloxy)ethyl]urea

°〇 /H-NMR (CDCl3)5(ppm): 1.42-1.91 (6H5 br m)? 3.48-3.65 (2H，br m)，3.76-4.06 (4H，br m)，4.59-4.76 (1H，br m)， 6.91 (2H5 t5 J = 8.3 Hz)? 7.29-7.54 (5H? m) 製造例12 於4·0克l-(2,6-二氟苯曱醯基氟-4-(三氟甲硫基) 苯基]_3-[2_(2-四氫_211_旅喃基氧基）乙基]脲於45毫升i，3- 二曱基-2-咪唑啶酮之溶液内加入2.17克曱基碘，然後於 以冰冷卻下加入330毫克氫化鈉（含量；55重量％於油）。 所得混合物於室溫攪拌1小時。於反應混合物内加入3〇 毫升飽和氯化銨水溶液及30毫升乙酸乙酯，混合物攪拌 220 318750 200804250 30分鐘，將150毫升乙酸乙酯加至其中，使混合物分層 有機層循序以水及飽和氯化鈉水溶液洗滌，以無水硫酸^ ^ 脫水及於減壓下濃縮。所得殘餘物藉中壓製備性高效液才' 層析術純化（乙酸乙酯··己烧=25:75)，獲得367克1_(2 6 二氟苯曱醯基）_3-[2-氟-4-(三氟曱硫基）苯基]_3_[2_[2_四 &lt;气 •2H-哌喃基氧基]乙基]-1-甲基脲。 足 1-(2,6-二氟苯曱醯基）-3-[2-敗-4_(三氟甲硫基）苯基] [2_四氫_2H-哌喃基氧基]乙基]_1·甲基脲°〇/H-NMR (CDCl3) 5 (ppm): 1.42-1.91 (6H5 br m)? 3.48-3.65 (2H, br m), 3.76-4.06 (4H, br m), 4.59-4.76 (1H, br m), 6.91 (2H5 t5 J = 8.3 Hz)? 7.29-7.54 (5H? m) Production Example 12 at 4·0 g of l-(2,6-difluorobenzoquinonefluoro-4-(trifluoromethyl) Thio)phenyl]_3-[2_(2-tetrahydro-211_branyloxy)ethyl]urea was added to a solution of 45 ml of i,3-didecyl-2-imidazolidinone. Hydryl iodide, then 330 mg of sodium hydride (content; 55 wt% in oil) was added under ice cooling. The resulting mixture was stirred at room temperature for 1 hour. 3 ml of a saturated aqueous solution of ammonium chloride and 30 ml were added to the mixture. Ethyl acetate, the mixture was stirred at 220 318750 200804250 for 30 minutes, 150 ml of ethyl acetate was added thereto, and the mixture was separated and washed with water and saturated aqueous sodium chloride, and then dried over anhydrous Concentration. The obtained residue was purified by chromatography (ethyl acetate····································· -fluoro-4-(trifluorosulfonylthio)phenyl]_3_[2_[2_tetra&lt;qi•2H- Butyloxy]ethyl]-1-methylurea. Foot 1-(2,6-difluorobenzoinyl)-3-[2-aza-4-(trifluoromethylthio)phenyl] [ 2_tetrahydro-2H-piperanyloxy]ethyl]_1·methylurea

^-NMR (DMSO-d6，測量溫度：80°〇δ(ρρπι) 1·30-1·58 (6H m)，3·00 (3Η，s)，3·31-3·40 (1Η，m)，3·49-3·65 (2Η，m)， 3.72-3.97 (3H，m)，4·41-4·47 (1H，m)，7·08 (2H，t，J = 8·3 Hz)，7·42 (1H, t，卜 8·2 Hz)，7·48·7·58 (2H，m)，7·66 (1H， dd，J = 1〇·ι，ι·9 Hz) 製造例13 於3.67克l-(2,6-二氟苯曱醯基）-3-[2_氟-4-(三氟甲硫 基）苯基]-3-[2-[2-四氫-2H-哌喃基氧基]乙基]-^曱基脲於 40毫升甲醇之溶液内加入3〇毫升2 n鹽酸，所得混合物 於至溫攪拌30分鐘。於此反應混合物内加入飽和碳酸氫鈉 水溶液來中和之，接著以乙酸乙酯萃取三次。有機層以飽 和氯化鈉水溶液洗滌，以無水硫酸鎂脫水及於減壓下濃 所传反餘物猎中壓製備性南效液相層析術純化（乙酸乙 318750 221 200804250 S曰· 一己烷= 34··66)，進一步藉高效液相層析術純化，獲得 _毛克1 (2’6_一氟苯τ酿基）|[2_氣_4_(三氣甲硫基）苯 基&gt;3-(2-羥基乙基基脲。 1·(2,6·一氟苯甲酿基)_3_[2_氟_4_(三氟甲硫基）苯基]^必 羥基乙基）-1-甲基脲^-NMR (DMSO-d6, measured temperature: 80 ° 〇 δ (ρρπι) 1·30-1·58 (6H m), 3·00 (3Η, s), 3·31-3·40 (1Η, m ),3·49-3·65 (2Η,m), 3.72-3.97 (3H,m),4·41-4·47 (1H,m),7·08 (2H,t,J = 8·3 Hz),7·42 (1H, t, Bu 8·2 Hz), 7·48·7·58 (2H,m),7·66 (1H, dd,J = 1〇·ι,ι·9 Hz Production Example 13 1.67 g of 1-(2,6-difluorophenylindenyl)-3-[2-fluoro-4-(trifluoromethylsulfanyl)phenyl]-3-[2-[2- To a solution of tetrahydro-2H-piperanyloxy]ethyl]-hydrazinocarbazide in 40 ml of methanol was added 3 ml of 2 n hydrochloric acid, and the mixture was stirred at room temperature for 30 min. The mixture was neutralized with an aqueous solution of sodium hydrogencarbonate, and then extracted three times with ethyl acetate. The organic layer was washed with a saturated aqueous solution of sodium chloride, dried over anhydrous magnesium sulfate and concentrated under reduced pressure. Purification by liquid chromatography (acetic acid B 318750 221 200804250 S曰·1 hexane = 34··66), further purified by high performance liquid chromatography to obtain _毛克1 (2'6_-fluorobenzene τ )|[2_气_4_(tri-methylthio)phenyl> 3-(2-hydroxyethyl urea. 1·(2,6·monofluorobenzyl)_3_[2_fluoro_4_(trifluoromethylthio)phenyl]^hydroxyethyl)- 1-methylurea

OH H-NMR(DMSO_d6，測量溫度：8〇〇c)s(ppm): 3 〇1 (3H，s) 3·53 (2H，q，J = 5·7 Ηζ)，3·72 (2H，t，J = 5·7 Ηζ)，4·52 (1H， t，J = 5·7 Hz)，7.07 (2H，t，J = 8·4 Hz)，7·43 (1H，t，J = 8·4 Hz)，7·48-7·57 (2H，m)，7·65 (1H，dd，J = 1〇·〇, 2·0 Hz) 實例72 於400笔克i_(2,6-一氟苯甲醯基）-3-[2-氟-4-(三氟甲 硫基）苯基]-3-(2-羥基乙基）_〗_甲基脲於5毫升乙酸乙酯之 /谷液内加入107耄克二乙基胺，然後加入69毫克乙酿氯。 所得混合物於室溫攪拌30分鐘。於此反應混合物内加入 2〇宅升弟二丁基曱基醚及1 〇毫升己烧，混合物經石夕藻土 過濾。濾液於減壓下濃縮。所得殘餘物藉中壓製備性高效 液相層析術純化（乙酸乙酯··己烷=34:66)，獲得18〇毫克 3_(2-乙醯氧基乙基）4-(2,6-二氟苯甲醯基）_3_[2_氟-4_(三 氟甲硫基）苯基]-1-甲基脲（後文稱作本化合物（72))。 本化合物（72) 318750 222 200804250OH H-NMR (DMSO_d6, measured temperature: 8 〇〇 c) s (ppm): 3 〇1 (3H, s) 3·53 (2H, q, J = 5·7 Ηζ), 3·72 (2H, t, J = 5·7 Ηζ), 4·52 (1H, t, J = 5·7 Hz), 7.07 (2H, t, J = 8·4 Hz), 7·43 (1H, t, J = 8·4 Hz), 7·48-7·57 (2H, m), 7·65 (1H, dd, J = 1〇·〇, 2·0 Hz) Example 72 in 400 gram i_(2,6 -monofluorobenzhydryl)-3-[2-fluoro-4-(trifluoromethylsulfanyl)phenyl]-3-(2-hydroxyethyl)-]methylurea in 5 ml of ethyl acetate Add 107 g of diethylamine to the solution/yield, and then add 69 mg of B-brewed chlorine. The resulting mixture was stirred at room temperature for 30 minutes. To the reaction mixture, 2 〇 升 二 dibutyl decyl ether and 1 〇 ml of hexane were added, and the mixture was filtered through Shixia. The filtrate was concentrated under reduced pressure. The obtained residue was purified by medium pressure preparative high performance liquid chromatography (ethyl acetate·hexane = 34:66) to obtain 18 mg of 3-(2-ethyloxyethyl) 4-(2,6) -Difluorobenzhydryl)_3_[2-fluoro-4-((trifluoromethylthio)phenyl]-1-methylurea (hereinafter referred to as the present compound (72)). The present compound (72) 318750 222 200804250

!H-NMR (CDCl3)5(ppm): 1.84 (3H? s)? 3.06 (3H? s)? 3.87-4.11 (2H，br m), 4·24-4·41 (2H，br m)，6.78-6.98 (2H，br m)， 7.21-7.70 (4H，m) 製造例14 於1·〇〇克2-氟-N-甲氧基甲基-4-(三氟曱硫基）苯胺於 10毫升曱苯之溶液内加入0 · 5 5毫升三乙基胺。於混合物 内於1°C至8°C逐滴加入1.20克碳酸貳（三氣曱基）酯於5毫 升曱苯之溶液。所得混合物攪拌1小時。反應混合物於減 壓下濃縮，加入20毫升飽和碳酸氫鈉水溶液及20毫升氯 仿’使混合物分層。有機層以無水硫酸镁脫水及於減壓下 濃縮。所得殘餘物溶解於20毫升乙腈，加入2·00毫升33% 曱基胺-乙醇溶液。所得混合物於室溫攪拌2〇分鐘。反應 混合物於減壓下濃縮。於殘餘物内加入2〇毫升水及2〇毫 氯仿’使混合物分層。有機層以無水硫酸鎂脫水及於減壓 下濃縮獲得殘餘物，殘餘物藉矽膠層析術純化（乙酸乙酯·· 己烧=1:1) ’獲得0·38克1-[2-氟-4-(三氟曱硫基）苯基]-1-曱氧基曱基-2-甲基脲。 1-[2-氣-4-(二敦甲硫基）笨基]甲氧基曱基_2_曱基脲 223 318750 200804250 Η 义 XTSCF3 k〇 F Ivle 1H-NMR(CDCl3)5(ppm): 2.82(3H?m)? 3.42(3H9s)9 4.76(1H? br)，4.99(2H，s)5 7.36-7.40(lH，m)，7·48-7·50(2Η，ιη) 實例21-(1) 於〇·38克l-[2-氟-4-(三氣曱硫基）苯基]-1-曱氧基甲基 -3-曱基脲於3.0毫升吡啶之溶液内加入017毫升2,6-二氟 苯曱酸氯。所得混合物於室溫攪拌5日。反應混合物添加 至10毫升水及10毫升乙酸乙酯，使混合物分層。有機層 循序以10毫升7%鹽酸、1〇毫升水、及1〇毫升飽和氯化 納水溶液洗務’以無水硫酸鎂脫水及於減壓下濃縮。所得 殘餘物接受矽膠層析術純化（乙酸乙酯：氯仿：己烷= 1:1:句，獲得0.18克1_(2,6_二氟苯甲醯基）_3-[2-氟-4·(三氟 曱硫基）苯基]-3-(曱氧基曱基）_^甲基脲（本化合物（21)。 製造例15 於3·0克2-氟甲氧基曱基_4_(三氟甲硫基）苯胺於 30宅升甲苯之溶液内加入18毫升三乙基胺，然後將157 克石厌酸貳（二氯甲基）酯添加至其中。此反應混合物於5〇〇c 攪拌3小時，溫度返回室溫。於此反應混合物内加入2·8 毫升三乙基胺，然後加入h8克烯丙基胺，混合物於室溫 攪拌16小日守。於此反應混合物内加入80毫升乙酸乙酯， 此合物循序以水、飽和碳酸氳鈉水溶液、及飽和氯化鈉水 /合液洗滌。有機層以無水硫酸鎂脫水及於減壓下濃縮。所 224 318750 200804250 得殘餘物！I中壓製備性高錄相層析術純化（己院：乙酸乙 酉旨= 75:25)，獲得L74克3_烯丙基小[2_氣·4_(三氟甲硫基） 苯基]-1-曱氧基甲基脲。 3_稀丙基-1-[2|4_(三氟甲硫基）笨基]小甲氧基曱基脲!H-NMR (CDCl3) 5 (ppm): 1.84 (3H? s)? 3.06 (3H? s)? 3.87-4.11 (2H, br m), 4·24-4·41 (2H, br m), 6.78-6.98 (2H, br m), 7.21-7.70 (4H, m) Manufactured in 14 gram of 2-fluoro-N-methoxymethyl-4-(trifluorosulfonylthio)aniline To a solution of 10 ml of toluene was added 0.55 ml of triethylamine. A solution of 1.20 g of lanthanum carbonate (trimethyl decyl) ester in 5 ml of toluene was added dropwise from 1 ° C to 8 ° C in the mixture. The resulting mixture was stirred for 1 hour. The reaction mixture was concentrated under reduced pressure. EtOAc (EtOAc) The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The residue obtained was dissolved in 20 ml of acetonitrile, and 2,00 ml of a 33% mercaptoamine-ethanol solution was added. The resulting mixture was stirred at room temperature for 2 minutes. The reaction mixture was concentrated under reduced pressure. The mixture was layered by adding 2 ml of water and 2 ml of chloroform to the residue. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure to give the residue, and the residue was purified by chromatography (ethyl acetate·············· 4-(Trifluorosulfonyl)phenyl]-1-decyloxyindenyl-2-methylurea. 1-[2-Ga-4-(di-methylthio)phenyl]methoxyindolyl-2-ylurea 223 318750 200804250 X XTSCF3 k〇F Ivle 1H-NMR (CDCl3) 5 (ppm) : 2.82(3H?m)? 3.42(3H9s)9 4.76(1H? br), 4.99(2H,s)5 7.36-7.40(lH,m),7·48-7·50(2Η,ιη) Example 21 -(1) 〇·38 g of l-[2-fluoro-4-(trimethylsulfonylthio)phenyl]-1-decyloxymethyl-3-mercaptourea was added to a solution of 3.0 ml of pyridine 017 ml of 2,6-difluorobenzoic acid chloride. The resulting mixture was stirred at room temperature for 5 days. The reaction mixture was added to 10 ml of water and 10 ml of ethyl acetate. The organic layer was washed successively with 10 ml of 5% hydrochloric acid, 1 ml of water, and 1 ml of a saturated aqueous solution of sodium chloride. The obtained residue was purified by silica gel chromatography (ethyl acetate: chloroform:hexane = 1:1: s, to afford 0.18 g of 1-(2,6-difluorobenzhydryl)_3-[2-fluoro-4. (Trifluorosulfonylthio)phenyl]-3-(decyloxyindenyl)-methylurea (present compound (21). Production Example 15 in 3.00 g of 2-fluoromethoxyindolyl_4_ (Trifluoromethylthio)aniline In a solution of 30 liters of toluene, 18 ml of triethylamine was added, and then 157 g of lanthanum dichloride (dichloromethyl) ester was added thereto. The reaction mixture was at 5 Torr. c Stir for 3 hours, return the temperature to room temperature. Add 2·8 ml of triethylamine to the reaction mixture, then add h8 g of allylamine, and stir the mixture at room temperature for 16 hours. Add this reaction mixture. After washing with 80 ml of ethyl acetate, the mixture was washed with water, saturated aqueous sodium hydrogen carbonate and saturated aqueous sodium chloride. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. 224 318750 200804250 I! Medium pressure preparative high-resolution tomography purification (Xinyuan: Acetate = 75:25), obtaining L74 grams of 3_allyl small [2_gas·4_(trifluoromethylthio)benzene ] -1-oxy-methylurea 3_ Yue thin n-propyl -1- [2 |. 4_ (trifluoromethylthio) Ben-yl] urea small methoxy Yue

'H-NMR (CDCl3)5(ppm): 3.43 (3H? s)5 3.88 (2H? tt? J = 5.6, 1·6 Hz)，4·83-4·92 (1H，br m)5 5·〇1 (2H，s)，5·07-5·18 (2H， m)，5·79_5·90 (1H，m)，7·39 (1H，t，卜 8·〇 hz)，7.47-7.53 (2H，m) 實例73 於1·55克3-烯丙基-1-[2-氟-4-(三氟甲硫基）苯基] 甲氧基曱基脲及2.0毫升二異丙基乙基胺於2〇毫升甲苯之 溶液内，加入1.61克2,6·二氟苯甲醯氯，所得混合物於加 熱回流下攪拌3小時。此反應混合物冷卻至室溫，加入8〇 笔升第二丁基甲基醚，此反應混合物循序以水、飽和碳酸 氫鈉水溶液、及飽和氯化鈉水溶液洗滌。有機層以無水硫 酸鎂脫水，及於減壓下濃縮。所得殘餘物藉中壓製備性高 效液相層析術純化（己烷··乙酸乙酯=9〇: i 〇)，獲得丨·3 8克 1-烯丙基-1-(2,6-二氟苯甲醯基）_3_[2-氟-4-(三氟甲硫基）苯 基&gt;3-甲氧基甲基脲（後文稱作本化合物（73))。 本化合物（73) 225 318750 200804250'H-NMR (CDCl3) 5 (ppm): 3.43 (3H? s)5 3.88 (2H? tt? J = 5.6, 1·6 Hz), 4·83-4·92 (1H, br m)5 5 ·〇1 (2H, s), 5·07-5·18 (2H, m), 5·79_5·90 (1H, m), 7·39 (1H, t, Bu 8·〇hz), 7.47- 7.53 (2H,m) Example 73 at 1.55 g of 3-allyl-1-[2-fluoro-4-(trifluoromethylsulfanyl)phenyl]methoxyguanylurea and 2.0 ml of diisopropyl To a solution of 2 ml of toluene, 1.61 g of 2,6·difluorobenzamide chloride was added, and the resulting mixture was stirred under heating and reflux for 3 hours. The reaction mixture was cooled to room temperature, and 8 liters of a second butyl methyl ether was added. The reaction mixture was washed sequentially with water, a saturated aqueous sodium hydrogen carbonate solution and a saturated aqueous sodium chloride solution. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was purified by medium pressure preparative high performance liquid chromatography (hexane·ethyl acetate = 9 〇: i 〇) to obtain 丨·8 8 g of 1-allyl-1-(2,6- Difluorobenzhydryl)_3_[2-fluoro-4-(trifluoromethylthio)phenyl&gt; 3-methoxymethylurea (hereinafter referred to as the present compound (73)). The present compound (73) 225 318750 200804250

h-NMR (DMSO-d6,測量溫度：80°C)3(ppm): 3·33 (3H，s)， 4.09 (2H, d5 J = 5.6 Hz)? 4.95-5.10 (4H? m)? 5.71-5.84 (1H? m)，7.08(2H，t，J = 8.9Hz)，7.44(lH，t，J=8.1Hz)，7.49-7.59 (2H，m)，7.69 (1H，d，J = 9.9 Hz) 製造例16 於3.0克2-氟-N-曱氧基曱基-4-(三氟甲硫基）苯胺於 30毫升曱苯之溶液内加入1·8毫升三乙基胺，然後將1.57 克碳酸貳（三氯曱基）酯添加至其中。此反應混合物於50°C 攪拌3小時，溫度返回室溫。於此反應混合物内加入2.8 毫升三乙基胺，然後加入780毫克炔丙基胺，混合物於室 溫攪拌16小時。於此反應混合物内加入80毫升乙酸乙酯， 混合物循序以水、飽和碳酸氳鈉水溶液、及飽和氯化鈉水 溶液洗滌。有機層以無水硫酸鎂脫水及於減壓下濃縮。所 得殘餘物藉中壓製備性高效液相層析術純化（己烷：乙酸乙 酯= 75:25)，獲得1·80克1_[2·氟-4-(三氟甲硫基）苯基]小 曱氧基甲基-3-快丙基脈。 1-[2-氟-4-(三氟曱硫基）苯基]-1-甲氧基甲基-3-炔丙基脲h-NMR (DMSO-d6, measured temperature: 80 ° C) 3 (ppm): 3·33 (3H, s), 4.09 (2H, d5 J = 5.6 Hz)? 4.95-5.10 (4H? m)? 5.71 -5.84 (1H? m), 7.08 (2H, t, J = 8.9 Hz), 7.44 (lH, t, J = 8.1 Hz), 7.49-7.59 (2H, m), 7.69 (1H, d, J = 9.9) Hz) Preparation Example 16 Into a solution of 3.0 g of 2-fluoro-N-decyloxyindenyl-4-(trifluoromethylthio)aniline in 30 ml of toluene, add 1.8 mL of triethylamine, and then 1.57 grams of lanthanum carbonate (trichlorodecyl) ester was added thereto. The reaction mixture was stirred at 50 ° C for 3 hours and the temperature was returned to room temperature. To the reaction mixture was added 2.8 ml of triethylamine, then 780 mg of propargylamine was added, and the mixture was stirred at room temperature for 16 hours. 80 ml of ethyl acetate was added to the reaction mixture, and the mixture was washed successively with water, a saturated aqueous solution of sodium carbonate and saturated aqueous sodium chloride. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was purified by medium pressure preparative high performance liquid chromatography (hexane: ethyl acetate = 75:25) to obtain 1·80 g of 1_[2·fluoro-4-(trifluoromethylthio)phenyl ] Small oxime methyl-3- propyl propyl. 1-[2-fluoro-4-(trifluorosulfonylthio)phenyl]-1-methoxymethyl-3-propargylurea

'H-NMR (CDCl3)5(ppm): 2.22 (1H5 t? J - 2.7 Hz)5 3.43 (3H5 226 318750 200804250 s)，4·04 (1H，d，J = 2.7 Hz)，4·05 (1H, d，J = 2·7 Ηζ)，4·94_ 5·09 (1H，br)，5·00 (2H，s)，7.38 (1H5 t，J = 8·0 Hz)， 7.46-7.55 (2H? m) 實例74'H-NMR (CDCl3) 5 (ppm): 2.22 (1H5 t? J - 2.7 Hz) 5 3.43 (3H5 226 318750 200804250 s), 4·04 (1H, d, J = 2.7 Hz), 4·05 ( 1H, d, J = 2·7 Ηζ), 4·94_ 5·09 (1H, br), 5·00 (2H, s), 7.38 (1H5 t, J = 8·0 Hz), 7.46-7.55 ( 2H? m) Example 74

於1.50克l-[2-氟-4-(三氟曱硫基）苯基甲氧基甲基 -3-炔丙基脲及2.0毫升二異丙基乙基胺於20毫升曱苯之 溶液内，加入1.57克2,6-二氟苯甲醯氯，所得混合物於加 熱回流下擾拌3小時。此反應混合物冷卻至室溫，加入⑽ 晕升第二丁基甲基醚’此反應混合物循序以水、飽和碳酸 氫鈉水溶液、及飽和氯化納水溶液洗滌。有機層以無水硫 酸鎂脫水，及於減壓下濃縮。所得殘餘物藉中壓製備性高 效液相層析術純化（己烷：乙酸乙酯二9〇 · 1 〇)，獲得631 A 克1_(2,6_二氟苯甲醯基）-3-[2_氟_4_(三氟曱硫基）苯基]I 曱氧基甲基-1-炔丙基脲（後文稱作本化合物（74))。 本化合物（74)1.50 g of 1-[2-fluoro-4-(trifluorosulfonylthio)phenylmethoxymethyl-3-propargylurea and 2.0 ml of diisopropylethylamine in 20 ml of toluene Inside, 1.57 g of 2,6-difluorobenzhydrazin chloride was added, and the resulting mixture was stirred under reflux with heating for 3 hours. The reaction mixture was cooled to room temperature, and (10) was added to the second butyl methyl ether. The reaction mixture was washed sequentially with water, saturated aqueous sodium hydrogen carbonate, and saturated aqueous sodium chloride. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was purified by medium pressure preparative high performance liquid chromatography (hexane: ethyl acetate 2 〇·1 〇) to obtain 631 A g of 1_(2,6-difluorobenzhydryl)-3- [2_Fluoro_4_(trifluorosulfonylthio)phenyl]I-methoxymethyl-1-propargylurea (hereinafter referred to as the present compound (74)). Present Compound (74)

H-NMR(DMSO_d6，測量溫 =2.4 Ηζ)，3·33 (3H，s)，4·32 (2H，d，J ” s)，7·10 (2H，t，J = 8.5 Hz)，7.45 (1H，t j 7·61 (2H，m)，7·66 (1H，dd5 J = 1〇山 j 9 製造例17H-NMR (DMSO_d6, measured temperature = 2.4 Ηζ), 3·33 (3H, s), 4·32 (2H, d, J s), 7·10 (2H, t, J = 8.5 Hz), 7.45 (1H, tj 7.61 (2H, m), 7.66 (1H, dd5 J = 1〇山j 9 Manufacturing Example 17

C)s(ppm): 3.08 (1H5 t? J 2.4 Hz)? 5.04 (2H? I t，J = 8.2 Hz)，7.51-，1 ·9 Hz) -曱氧基曱基-4-(三氟 於20毫升甲苯溶解2.0克2-氟+ 318750 227 200804250 曱硫基）苯胺之溶液内加入1·2毫升三乙基胺，然後將1·〇5 克碳酸貳（三氯甲基）酯添加至其中。此反應混合物於5〇°C 攪拌3小時，溫度返回室溫。於此反應混合物内加入i .9 毫升三乙基胺，然後加入1.3克2_苯氧基乙基胺，混合物 於室溫攪拌16小時。於此反應混合物内加入8〇毫升乙酸 乙酯，混合物循序以水、飽和碳酸氳鈉水溶液、及飽和氯 化鈉水溶液洗滌。有機層以無水硫酸鎂脫水及於減壓下濃 縮。所得殘餘物藉中壓製備性高效液相層析術純化（己烷： 乙酸乙酯= 75:25)，獲得1.30克1-[2-氟-4-(三氟甲硫基） 苯基]-1-甲氧基曱基-3-(2 _苯氧基乙基）脲。 1-[2-氟·4-(三氟甲硫基）苯基]-1-甲氧基甲基_3-(2-苯氧基 乙基）脲C)s (ppm): 3.08 (1H5 t? J 2.4 Hz)? 5.04 (2H? I t, J = 8.2 Hz), 7.51, 1 · 9 Hz) - decyloxy-4-yl (trifluoro) Add 1 2 ml of triethylamine to a solution of 2.0 g of 2-fluoro + 318750 227 200804250 thiol) aniline in 20 ml of toluene, and then add 1·〇5 g of lanthanum carbonate (trichloromethyl) ester to among them. The reaction mixture was stirred at 5 ° C for 3 hours and the temperature returned to room temperature. To the reaction mixture was added i. 9 ml of triethylamine, then 1.3 g of 2-phenoxyethylamine was added, and the mixture was stirred at room temperature for 16 hours. 8 ml of ethyl acetate was added to the reaction mixture, and the mixture was washed successively with water, a saturated aqueous solution of sodium carbonate and aqueous saturated sodium chloride. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The residue was purified by medium pressure preparative high performance liquid chromatography (hexane: ethyl acetate = 75:25) to give 1.30 g of 1-[2-fluoro-4-(trifluoromethylthio)phenyl] 1-methoxymercapto-3-(2-phenoxyethyl)urea. 1-[2-Fluoro-4-(trifluoromethylthio)phenyl]-1-methoxymethyl-3-(2-phenoxyethyl)urea

!H-NMR (CDCl3)5(ppm): 3.40 (3H, s), 3.64 (2H? q? J = 5.2!H-NMR (CDCl3) 5 (ppm): 3.40 (3H, s), 3.64 (2H? q? J = 5.2

Hz)，4·05 (2H，t，J = 5·2 Hz)，4·99 (2H，s)，5·24-5·33 (1H， br m)，6.82 (2H，d，J = 7·7 Hz)，6·97 (1H，t，J = 7.4 Hz)， 7·25-7·31 (2H，m)，7·35 (1H，t，J = 8·1 Hz)，7.43-7.50 (2H， m) 實例75 於l.io克1-[2-氟-4-(三氟甲硫基）苯基]-1-曱氧基甲基 -3-(2-苯氧基乙基）脲及lel毫升二異丙基乙基胺於2〇毫升 曱苯之溶液内’加入928毫克2,6-二說苯甲酿氯，所得混 228 318750 200804250 合物於加熱回流下攪拌3小時。此反應混合物冷卻至室 溫，加入80毫升第三丁基甲基醚，此反應混合物循序以 水、飽和碳酸氫鈉水溶液、及飽和氯化鈉溶液水洗蘇。有 機層以無水硫酸鎂脫水，及於減壓下濃縮。所得殘餘物藉 中塵製備性高效液相層析術純化（己烧：乙酸乙_ = 90:10)，獲得786毫克二氟苯甲醯基）-3-[2ϋ(三 氟甲硫基）苯基]-3 -甲氧基甲基-1-(2-苯氧基乙基）脲（後文 稱作本化合物（75))。 本化合物（75)Hz), 4·05 (2H, t, J = 5·2 Hz), 4·99 (2H, s), 5·24-5·33 (1H, br m), 6.82 (2H, d, J = 7·7 Hz), 6.97 (1H, t, J = 7.4 Hz), 7·25-7·31 (2H, m), 7·35 (1H, t, J = 8·1 Hz), 7.43 -7.50 (2H, m) Example 75 in l.io g 1-[2-fluoro-4-(trifluoromethylthio)phenyl]-1-decyloxymethyl-3-(2-phenoxy) Ethyl)urea and lel ml of diisopropylethylamine in a solution of 2 ml of decene benzene were added to 928 mg of 2,6-di benzoyl chloride, and the resulting mixture of 228 318750 200804250 was stirred under heating and reflux. 3 hours. The reaction mixture was cooled to room temperature, and 80 ml of a third butyl methyl ether was added. The reaction mixture was washed with water, a saturated aqueous sodium hydrogen carbonate solution and a saturated sodium chloride solution. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was purified by preparative high performance liquid chromatography with medium dust (hexane: acetic acid B = = 90:10) to obtain 786 mg of difluorobenzhydryl)-3-[2ϋ(trifluoromethylthio). Phenyl]-3-methoxymethyl-1-(2-phenoxyethyl)urea (hereinafter referred to as the present compound (75)). This compound(75)

W-NMR (DMSO-d6，測量溫度：8〇0〇δ(ρρπι): 3·31 (3H，s)， 3.90 (2H5 t5 J = 5.4 Hz)5 4.18 (2H5 t? J = 5.4 Hz)? 5.05 (2H? s)，6·83 (2H，d，J = 8·4 Hz)，6·93 (1H，t，J = 7·4 Hz)，7·08 (2H, t5 J = 8·5 Hz)，7·25 (2H，dd5 J = 8·4, 7·4 Hz)，7·45 (1H， t，J = 8·1 Hz)，7.49-7.57 (2H，m)，7·64 (1H，dd，J = 1〇·〇, 1.8 Hz) 製造例18 於ό·0克2-氟-N-甲氧基曱基_4_(三氟甲硫基）苯胺於 60毫升曱苯之溶液内加入3·6毫升三乙基胺，然後將3.14 克碳酸貳（三氯曱基）酯添加至其中。此反應混合物於5〇。〇 擾拌3小時，溫度返回室溫 。於此反應混合物内加入5.6 耄升二乙基胺，然後加入2.5 8克2-曱硫基乙基胺，混合物 229 318750 200804250 於室溫攪拌16小時。於此反應混合物内加入150毫升乙酸 乙酯，混合物循序以水、飽和破酸氫鋼水溶液、及飽和氯 化鈉水溶液洗滌。有機層以無水硫酸鎂脫水及於減壓下濃 縮。所得殘餘物藉中壓製備性高效液相層析術純化（己烷： 乙酸乙酯= 75:25)，獲得3.70克1-[2-氟-4-(三氟甲硫基） 苯基&gt;1-甲氧基甲基-3-(2-曱硫基乙基）脲。 1-[2-氟-4-(三氟曱硫基）苯基]-1-曱氧基甲基-3-(2-曱硫基 乙基）脲W-NMR (DMSO-d6, measured temperature: 8 〇 0 〇 δ (ρρπι): 3·31 (3H, s), 3.90 (2H5 t5 J = 5.4 Hz) 5 4.18 (2H5 t? J = 5.4 Hz)? 5.05 (2H? s), 6·83 (2H, d, J = 8·4 Hz), 6.93 (1H, t, J = 7·4 Hz), 7·08 (2H, t5 J = 8· 5 Hz), 7·25 (2H, dd5 J = 8·4, 7·4 Hz), 7·45 (1H, t, J = 8·1 Hz), 7.49-7.57 (2H, m), 7· 64 (1H, dd, J = 1 〇·〇, 1.8 Hz) Production Example 18 ό·0 g of 2-fluoro-N-methoxyindenyl_4_(trifluoromethylthio)aniline in 60 ml of toluene To the solution was added 3·6 ml of triethylamine, and then 3.14 g of lanthanum trichloride (trichlorodecyl) ester was added thereto. The reaction mixture was stirred at 5 Torr for 3 hours, and the temperature was returned to room temperature. 5.6 liters of diethylamine was added to the reaction mixture, then 2.58 g of 2-decylthioethylamine was added, and the mixture was stirred at room temperature for 16 hours at room temperature 229 318750 200804250. 150 ml of ethyl acetate was added to the reaction mixture. The organic layer was washed with anhydrous magnesium sulfate aqueous solution and a saturated aqueous solution of sodium chloride. Purification by medium pressure preparative high performance liquid chromatography (hexane: ethyl acetate = 75:25) afforded 3.70 g of 1-[2-fluoro-4-(trifluoromethylthio)phenyl &lt; -Methoxymethyl-3-(2-indolylethyl)urea 1-[2-Fluoro-4-(trifluorosulfonylthio)phenyl]-1-decyloxymethyl-3- (2-indolethioethyl)urea

SMe h-NMR (CDCl3)3(ppm): 2·07 (3H，s)，2·64 (2H，t，J = 6·3 Hz)，3.42 (3H，s)，3·44 (2H，q，J = 6·3 Hz)，5.00 (2H，s)， 5·19-5·29 (1H，br m), 7·40 (1H，t，J = 7.8 Hz)，7·47-7·53 (2H，m) 實例76 於3.45克1_[2-貌_4_(三氟甲硫基）苯基]小甲氧基曱基 -3-(2-甲硫基乙基）脲及4〇毫升二異丙基乙基胺於5〇毫升 曱苯之溶液内’加入3.27克2,6_二氟苯甲醯氯，所得混合 物^加熱&gt; 回流下攪拌3小時。此反應混合物冷卻至室溫， 80笔升弟三丁基甲基峻加至其中，此匕反應混合物循序以 水;飽和碳酸氫財溶液、及飽和氯化鈉水溶液洗條。有 機層以播水硫酸鎂脫水，及於減廢下濃縮。所得殘餘物藉 中麼製備性高效液相層析術純化（己炫：乙酸乙醋=90: 318750 230 200804250 10) ’獲得3.37克l-(2,6-二氟苯曱醯基）_3_[2_氟(三氟曱 硫基）苯基]-3-甲氧基甲基-1-(2-甲硫基乙基）脲（後文稱= 本化合物（76))。 本化合物（76)SMe h-NMR (CDCl3) 3 (ppm): 2·07 (3H, s), 2·64 (2H, t, J = 6·3 Hz), 3.42 (3H, s), 3·44 (2H, q, J = 6·3 Hz), 5.00 (2H, s), 5·19-5·29 (1H, br m), 7·40 (1H, t, J = 7.8 Hz), 7·47-7 · 53 (2H, m) Example 76 at 3.45 g of 1_[2-morphic_4_(trifluoromethylthio)phenyl] methoxymethoxyindol-3-(2-methylthioethyl)urea and 4 〇ml of diisopropylethylamine was added to 3.25 g of 2,6-difluorobenzhydryl chloride in a solution of 5 ml of decylbenzene, and the resulting mixture was heated and stirred under reflux for 3 hours. The reaction mixture was cooled to room temperature, and 80 liters of tributylmethyl was added thereto, and the hydrazine reaction mixture was sequentially washed with water; a saturated aqueous solution of hydrogen carbonate and a saturated aqueous solution of sodium chloride. The organic layer was dehydrated with soda sulphate and concentrated under reduced waste. The obtained residue was purified by preparative high performance liquid chromatography (Hybrid: acetic acid ethyl acetate = 90: 318750 230 200804250 10) ' Obtained 3.37 g of l-(2,6-difluorobenzoinyl)_3_[ 2-fluoro(trifluorosulfonylthio)phenyl]-3-methoxymethyl-1-(2-methylthioethyl)urea (hereinafter referred to as the present compound (76)). Present Compound (76)

SMe W-NMRpMSCM 測量溫度：8〇〇〇δ(ρριη): 1·92(3Η s) 2.68 (2Η，t，J = 7·6 Ηζ)，3·32 (3Η，s)5 3·68 (2Η，t，J = 7 ό Ηζ)，5·02 (2Η，s)，7·11 (2Η，t，J = 8.5 Ηζ)，7·41 (1Η t J = 8·2 Ηζ)，7.51-7.61 (2Η，m), 7.69 (1Η，dd，J = 1〇·〇，ι 8 Hz) 實例77及78 2·84克l-(2,6-二氟苯曱醯基）-3-[2-氟-4-(三氟甲硫基） 本基]-3 -甲氧基曱基-1-(2-甲硫基乙基）脲於5〇毫升氯仿之 溶液以冰冷卻至5°C，將2.06克偏氯過苯甲酸（65重量〇/〇) 添加至其中，混合物於室溫攪拌1小時。此反應混合物循 序以水、飽和碳酸氫納水溶液及飽和氯化鈉水溶液洗滌。 有機層以無水硫酸鎂脫水，及於減壓下濃縮。所得殘餘物 藉中壓製備性高效液相層析術純化（己烧：乙酸乙酯〇 ·· 50) ’獲得1·47克1-(2,6-二氟苯甲醯基）-3-[2-氟-4-(三氟曱 硫基）苯基]甲氧基甲基-1-(2-曱基亞磺醯基乙基）脲（後 文稱作本化合物（77))及1·40克1-(2,6-二氟苯甲醯基）_3-[2- 氣三氟甲硫基）苯基]-3-甲氧基甲基_1-(2-曱基磺醯基乙 基）脲（後文稱作本化合物（78))。 231 318750 200804250 本化合物（77)SMe W-NMRpMSCM Measurement temperature: 8 〇〇〇 δ (ρριη): 1.92 (3Η s) 2.68 (2Η, t, J = 7·6 Ηζ), 3·32 (3Η, s) 5 3·68 ( 2Η,t,J = 7 ό Ηζ),5·02 (2Η,s),7·11 (2Η,t,J = 8.5 Ηζ), 7·41 (1Η t J = 8·2 Ηζ), 7.51 7.61 (2Η,m), 7.69 (1Η, dd, J = 1〇·〇, ι 8 Hz) Examples 77 and 78 2·84 g of l-(2,6-difluorobenzoinyl)-3-[ 2-Fluoro-4-(trifluoromethylthio)benyl]-3-methoxyindol-1-(2-methylthioethyl)urea in 5 mL of chloroform solution was cooled to 5 ° with ice C, 2.06 g of chloroperbenzoic acid (65 wt./〇) was added thereto, and the mixture was stirred at room temperature for 1 hour. This reaction mixture was washed with water, a saturated aqueous solution of sodium hydrogencarbonate and a saturated aqueous solution of sodium chloride. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was purified by medium pressure preparative high performance liquid chromatography (hexane: ethyl acetate 〇·· 50) to obtain 1.47 g of 1-(2,6-difluorobenzhydryl)-3- [2-Fluoro-4-(trifluorosulfonylthio)phenyl]methoxymethyl-1-(2-mercaptosulfinylethyl)urea (hereinafter referred to as the present compound (77)) and 1·40 g of 1-(2,6-difluorobenzhydryl)_3-[2-trifluoromethylthio)phenyl]-3-methoxymethyl-1-(2-mercaptosulfonate) Mercaptoethyl)urea (hereinafter referred to as the present compound (78)). 231 318750 200804250 The compound (77)

W-NMR (DMSO_d6，測量溫度：8〇〇〇δ(ρρηι): 2.54 (3H，s)， 2.86-2.95 (lH，m)，3.〇6-3.14(lH，m)，3.31(3H，s)，3.88-4·00 (2H，m)，5·01 (2H，s)，7·11 (2H，t，J = 8·5 Ηζ)，7·37 (1H，t，J - 8·2 Hz)，7.52-7.62 (2H，m)，7·69 (1H，dd，J 二 10.1, 1.9 Hz) 本化合物（78)W-NMR (DMSO_d6, measured temperature: 8 〇〇〇 δ (ρρηι): 2.54 (3H, s), 2.86-2.95 (lH, m), 3. 〇6-3.14 (lH, m), 3.31 (3H, s), 3.88-4·00 (2H, m), 5·01 (2H, s), 7·11 (2H, t, J = 8·5 Ηζ), 7·37 (1H, t, J - 8 · 2 Hz), 7.52-7.62 (2H, m), 7·69 (1H, dd, J 20.1, 1.9 Hz) This compound (78)

lH-NMR(DMS〇-d6，測量溫度：80oC)3(ppm)·· 3·〇〇 (3H，s)， 3·30 (3H，s)，3·43 (2H，t，卜 7·6 Hz)，4.00 (2H, t，卜 7·6 Hz)，5·00 (2H，s)，7·12 (2H，t，卜 8·5 Hz)，7·32 (1H，t，j $ 8.2 Hz)，7.52-7.63 (2H，m)，7·69 (1H，dd，J = ΐ〇·ι，1·9 Hz) 製造例19 ’ 於3.0克2-氟-N_甲氧基甲基_4_(三氟甲硫基）苯胺於 30,升甲苯之溶液内加人h8毫升三乙基胺，然後將157 克碳酸貳（三氯甲基）酯添加至其中。此反應混合物於5〇。〇 攪拌3小日守，溫度返回室溫。於此反應混合物内加入2 · 8 毫升二乙基胺’然後加入1·24克n，N-二曱基伸乙基二胺， 混合物於室溫攪拌16小時。於此反應混合物内加入80毫 232 318750 200804250 升乙酸乙酯，混合物循序以水、飽和碳酸氫鈉水溶液、及 飽和氟化納水溶液洗務。有機層以無水硫酸鎂脫水及於減 壓下濃縮。所得殘餘物藉中壓製備性高效液相層析術純化 (乙酸乙酯：甲醇= 90:10)，獲得1.89克3-(2-二甲基胺基 乙基）-1-[2-氟-4-(三氟甲硫基）苯基]-1-曱氧基曱基脲。 二甲基胺基乙基）-1-[2-氟-4-(三氣甲硫基）苯基]-；[-曱 氧基甲基腺lH-NMR (DMS〇-d6, measured temperature: 80oC) 3 (ppm)········································ 6 Hz), 4.00 (2H, t, Bu 7·6 Hz), 5·00 (2H, s), 7·12 (2H, t, Bu 8·5 Hz), 7·32 (1H, t, j $ 8.2 Hz), 7.52-7.63 (2H, m), 7·69 (1H, dd, J = ΐ〇·ι, 1·9 Hz) Manufacturing Example 19 ' at 3.0 g of 2-fluoro-N-methoxy Methyl 4-(-trifluoromethylthio)aniline was added to a solution of 30 liters of toluene to give h8 ml of triethylamine, and then 157 g of lanthanum trichloride (trichloromethyl) ester was added thereto. This reaction mixture was at 5 Torr.搅拌 Stir for 3 hours and return to room temperature. To the reaction mixture was added 2·8 ml of diethylamine' and then 1.24 g of n,N-didecylethylidene was added, and the mixture was stirred at room temperature for 16 hours. To the reaction mixture was added 80 ml of 232 318750 200804250 liters of ethyl acetate, and the mixture was washed successively with water, a saturated aqueous sodium hydrogen carbonate solution and a saturated aqueous solution of sodium fluoride. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was purified by preparative high-performance liquid chromatography (ethyl acetate:methanol = 90:10) to yield 1.89 g of 3-(2-dimethylaminoethyl)-1-[2-fluoro 4-(Trifluoromethylthio)phenyl]-1-decyloxyguanidinourea. Dimethylaminoethyl)-1-[2-fluoro-4-(trimethylmethylthio)phenyl]-;[-曱oxymethyl gland

^-NMR (CDCl3)6(ppm): 2.13 (6H? s)? 2.35 (2H? t5 J = 6.1^-NMR (CDCl3) 6 (ppm): 2.13 (6H? s)? 2.35 (2H? t5 J = 6.1

Hz)，3·29 (2H，td，J = 6.1，5·0 Hz)，3·42 (3H，s)，5·01 (2H， s)，5·29-5·42 (1H，br m)，7·40 (1H，t，J = 8·0 Hz)，7·49 (2H， d? J = 8.0 Hz) 實例79 於1·67克3-(2-二甲基胺基乙基）-1-[2-氟-4-(三氟甲硫 基）苯基]-1-曱氧基甲基脈及2.0毫升二異丙基乙基胺於2〇 毫升曱苯之溶液内，加入1.60克2,6-二氟笨甲醯氯。所得 混合物於加熱回流下攪拌3小時。於此反應混合物冷卻至 室溫後，加入80毫升第三丁基曱基醚，此反應混合物循序 以水、飽和碳酸氫納水溶液、及飽和氯化納水溶液洗條。 有機層以無水硫酸鎮脫水’及於減壓下濃縮。所得殘餘物 藉中壓製備性高效液相層析術純化（乙酸乙酯），獲得1.8 j 克1-(2-二甲基胺基乙基）-1_(2,6-二氟苯甲隨基）-3-[2·氟 233 318750 200804250 -4-(三氟甲硫基）苯基]-3-甲氧基甲基脲（後文稱作本化合物 (79)) 〇 本化合物（79)Hz), 3·29 (2H, td, J = 6.1, 5·0 Hz), 3·42 (3H, s), 5·01 (2H, s), 5·29-5·42 (1H, br m), 7·40 (1H, t, J = 8·0 Hz), 7·49 (2H, d? J = 8.0 Hz) Example 79 at 1.67 g of 3-(2-dimethylamino) 1-[2-fluoro-4-(trifluoromethylsulfanyl)phenyl]-1-indolyloxymethyl and 2.0 ml of diisopropylethylamine in 2 ml of benzene , adding 1.60 g of 2,6-difluoro carbamide. The resulting mixture was stirred under heating and reflux for 3 hours. After the reaction mixture was cooled to room temperature, 80 ml of t-butyldecyl ether was added, and the reaction mixture was washed with water, a saturated aqueous solution of sodium hydrogencarbonate and a saturated aqueous solution of sodium chloride. The organic layer was dehydrated with anhydrous sulfuric acid and concentrated under reduced pressure. The residue obtained was purified by medium pressure preparative high performance liquid chromatography (ethyl acetate) to obtain 1.8 g of 1-(2-dimethylaminoethyl)-1_(2,6-difluorobenzoate Base)-3-[2·Fluorum 233 318750 200804250 -4-(Trifluoromethylthio)phenyl]-3-methoxymethylurea (hereinafter referred to as the present compound (79)) guanidine compound (79) )

W-NMR (DMSO-d6，測量溫度：80〇C)5(ppm): 2·05 (6H，s), 2.47 (2H? t9 J - 6.8 Hz)? 3.32 (3H5 s)9 3.55 (2H5 t? J = 6.8W-NMR (DMSO-d6, measured temperature: 80 〇C) 5 (ppm): 2·05 (6H, s), 2.47 (2H? t9 J - 6.8 Hz)? 3.32 (3H5 s)9 3.55 (2H5 t ? J = 6.8

Hz)，5.02 (2H, s)，7·09 (2H，t, J = 8.5 Hz)，7·46-7·58 (3H， m)，7·67 (1H，dd，J = 1〇·1，1·9 Hz) 製造例20 於3·0克2-氟-N-曱氧基曱基-4-(三氟甲硫基）苯胺於30 毫升甲苯之溶液内加入1.8毫升三乙基胺，然後將ι·57克 碳酸貳（三氯甲基）酯添加至其中。此混合物於室溫攪拌3 小時。於此混合物内加入2.7毫升三乙基胺，然後加入0.77 克1 -丙基胺，混合物於室溫攪拌1小時。此反應混合物循 序以50毫升水及50毫升飽和氯化鈉水溶液洗滌，以無水 硫酸鎂脫水及於減壓下濃縮。所得殘餘物進行矽膠層析術 純化（乙酸乙酯：己烷=1:2至1:1)，獲得2.05克1-[2-敦 -4-(三氟甲硫基）苯基;μι_甲氧基曱基_3_丙基脲。Hz), 5.02 (2H, s), 7·09 (2H, t, J = 8.5 Hz), 7·46-7·58 (3H, m), 7·67 (1H, dd, J = 1〇· 1,1·9 Hz) Production Example 20 To a solution of 3.00 2-fluoro-N-decyloxyindenyl-4-(trifluoromethylthio)aniline in 30 ml of toluene was added 1.8 ml of triethyl. The amine was then added to 157. g of lanthanum carbonate (trichloromethyl) ester. This mixture was stirred at room temperature for 3 hours. To the mixture was added 2.7 ml of triethylamine, then 0.77 g of 1-propylamine was added, and the mixture was stirred at room temperature for 1 hour. The reaction mixture was washed with 50 ml of water and 50 ml of saturated aqueous sodium chloride, dried over anhydrous magnesium sulfate and evaporated. The residue obtained was purified by silica gel chromatography (ethyl acetate:hexane = 1:2 to 1:1) to afford, Methoxymethyl _3- propyl urea.

Me 1-[2-氟-4-(三氟甲硫基）苯基]— ；[_甲氧基甲基-3_丙基脲 scf3 234 318750 200804250 ]H-NMR (CDCl3)5(ppm): 0.87-0.94 (3H? m), 1.48-1.57 (2H9 m)，3·18-3·23 (2H，m)，3·42 (3H，s)，4·81(1Η，br)，4·99 (2H， s)，7.36-7.40 (1H，m), 7.48_7·50 (2H，m) 實例80 於1·〇〇克1-[2-氟-4-(三氟曱硫基）苯基]小甲氧基曱基 -3 -丙基脈及0.61笔升一異丙基乙基胺於1〇毫升甲苯之溶 液内，加入0.41毫升2,6_二氟苯曱醯氯，所得混合物於加 熱回流下擾拌8小時。此反應混合物冷卻至室溫，以j 〇 毫升水洗滌。有機層以無水硫酸鎂脫水，及於減壓下濃縮。 所得殘餘物進行石夕膠層析術純化（乙酸乙酯：己烧=丨：5)， 獲得〇·42克1-(2,6-二氟苯甲醯基）_弘[2-氟-4_(三氟甲硫基） 苯基]-3-甲氧基甲基-1_丙基脲（後文稱作本化合物（8〇))。 本化合物（80)Me 1-[2-fluoro-4-(trifluoromethylthio)phenyl]-; [_methoxymethyl-3-propylurea scf3 234 318750 200804250]H-NMR (CDCl3) 5 (ppm) : 0.87-0.94 (3H? m), 1.48-1.57 (2H9 m), 3·18-3·23 (2H, m), 3·42 (3H, s), 4·81 (1Η, br), 4 ·99 (2H, s), 7.36-7.40 (1H,m), 7.48_7·50 (2H,m) Example 80 in 1·〇〇克 1-[2-Fluoro-4-(trifluorosulfonylthio) Phenyl] small methoxyindolyl-3-propyl propyl and 0.61 liters of monoisopropylethylamine in 1 ml of toluene were added to 0.41 ml of 2,6-difluorobenzoquinone chloride. The mixture was stirred under reflux for 8 hours. The reaction mixture was cooled to room temperature and washed with water (1 mL). The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was purified by chromatography (ethyl acetate: hexane = 丨: 5) to obtain 〇·42 g of 1-(2,6-difluorobenzhydryl)_hong [2-fluoro- 4-(Trifluoromethylthio)phenyl]-3-methoxymethyl-1_propylurea (hereinafter referred to as the present compound (8〇)). The compound (80)

^-NMRPMSO-A，測量溫度：8〇〇c)5(ppm): 〇 76_〇 8〇 (3H，m)，1·56-1·60 (2H，m)，3.31 (3H，s)，3·41_3 45 (2H，叫 5.01 (2H? s)? 7.08-7.12 (2H? m)? 7.42-7.44 (1H? m) 7 54 7.58 (2H，m)，7.68-7.71 (1H，m) 製造例21 於3·0克2-氟-N_甲氧基曱基_4_(三氟甲硫基）苯胺於 30毫升曱苯之溶液内加入1.8毫升三乙基胺， 克碳酸氣（二氣曱基）S旨添加至其中。此及庫、、Η 二乙基胺，然後將157 。此反應混合物於5 〇。〇 318750 235 200804250 於此反應混合物内加入2.8 毫升苄基胺，混合物於室溫 授拌3小時，溫度回到室溫。 宅升二乙基胺’然後加入1 4 攪拌1小牯。此反應混合物循序以5〇毫升水及5〇毫升飽 和氯化納水,谷液洗務。有機層以無水硫酸鎂脫水及於減壓 下痕鈿。所得殘餘物進行矽膠層析術純化（乙酸乙酯：己烷 =1:2) ’獲得2.00克3_苄基+ [2_氟_4_(三氟曱硫基）苯 基]-1-曱氧基曱基脲。 3-苄基-l-[2-氟-4-(三氟曱硫基）苯基卜卜曱氧基曱基脲^-NMRPMSO-A, measured temperature: 8〇〇c) 5 (ppm): 〇76_〇8〇(3H,m),1·56-1·60 (2H,m),3.31 (3H,s) ,3·41_3 45 (2H, called 5.01 (2H? s)? 7.08-7.12 (2H? m)? 7.42-7.44 (1H? m) 7 54 7.58 (2H,m), 7.68-7.71 (1H,m) Production Example 21 Into a solution of 3.0 g of 2-fluoro-N-methoxyindenyl_4-(trifluoromethylthio)aniline in 30 ml of toluene, 1.8 ml of triethylamine, gram of carbonic acid gas (two曱 ) ) 。 。 。 。 。 。 。 。 。 。 。 。 Η 157 157 157 157 157 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 The mixture was stirred at room temperature for 3 hours, and the temperature was returned to room temperature. The house was diluted with diethylamine' and then added to 1 4 and stirred for 1 hour. The reaction mixture was sequentially washed with 5 ml of water and 5 ml of saturated sodium chloride chloride. The organic layer was dried over anhydrous magnesium sulfate and dried under reduced pressure. The obtained residue was purified by silica gel chromatography (ethyl acetate:hexane = 1:2) to obtain 2.00 g of 3 benzyl. _Fluoro_4_(trifluorosulfonyl)phenyl]-1-decyloxyguanyl urea. 3-benzyl-l-[2-fluoro-4 -(trifluorosulfonylthio)phenyl bromoxyoxycarbazide

^-NMR (CDCl3)5(ppm): 3.43 (3H5 s)5 4.38-4.46 (2H9 m)? 5·03 (2H，s)，5·15 (1H，br)，7.26-7.49 (8H，m) 實例81 於2·00克3-苄基-l-[2_氟-4-(三氟甲硫基）苯基]_1_甲 氧基甲基脲及1.8毫升二異丙基乙基胺於2〇毫升曱苯之溶 液内，加入1.3毫升2,6_二氟苯曱醯氯，所得混合物於加 熱回流下攪拌3小時。於冷卻至室溫後，反應混合物以2〇 毫升水洗滌。有機層以無水硫酸鎂脫水，及於減壓下濃縮。 所得殘餘物進行矽膠層析術純化（乙酸乙酯··己烷=丨：5)， 獲得0.57克1-苄基-i_(2,6-二氟苯曱醯基）-3-[2-氟-4-(三氟 曱硫基）苯基&gt;3-甲氧基曱基脲（後文稱作本化合物（81)；)。 本化合物（81) 318750 236 200804250^-NMR (CDCl3) 5 (ppm): 3.43 (3H5 s)5 4.38-4.46 (2H9 m)? 5·03 (2H, s), 5·15 (1H, br), 7.26-7.49 (8H, m Example 81 at 2·00 g of 3-benzyl-l-[2-fluoro-4-(trifluoromethylsulfanyl)phenyl]_1-methoxymethylurea and 1.8 ml of diisopropylethylamine To a solution of 2 ml of benzene, 1.3 ml of 2,6-difluorobenzoquinone chloride was added, and the resulting mixture was stirred under reflux with heating for 3 hr. After cooling to room temperature, the reaction mixture was washed with 2 mL of water. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was purified by silica gel chromatography (ethyl acetate··hexane = hexane: 5) to obtain 0.57 g of 1-benzyl-i-(2,6-difluorobenzoinyl)-3-[2- Fluoro-4-(trifluorosulfonylthio)phenyl&gt; 3-methoxyguanidinourea (hereinafter referred to as the present compound (81);). The present compound (81) 318750 236 200804250

4.72 (2H, s), 5.02 (2H, s), 6.99-7.03 (2H, m), 7.20-7.31 (6H, m)? 7.47-7.53 (2H? m)? 7.65-7.67 (1H? m) 實例82 於1·〇1克H2,6_二默苯曱醯基）_3_[2,5_二氟(三氟 甲硫基）苯基]脲於10·0毫升1-曱基_2_吡咯啶酮之溶液内， 於2C於以冰冷卻下，加入0·61毫升氯曱基甲基醚及243 毫克氫化鈉（含量55重量％於油），所得混合物於以冰冷卻 下攪拌4小時。於反應混合物内於以冰冷卻下，加入1〇 毫升飽和氯化銨水溶液與5毫升水之混合物，接著以1〇 毫升乙酸乙酯萃取三次。有機層經合併，以飽和氯化鈉水 溶液洗三次’以無水硫酸鎂脫水及於減壓下濃縮。所得殘 餘物藉石夕膠管柱層析術純化（乙酸乙酯··氯仿：己烧= 1:1:4)，獲得 〇·93 克 1-(2,6-二氟苯曱醯基）-3-[2,5_二氟 -4-(三氟甲硫基）苯基]貳（曱氧基曱基）脲（後文稱作本 化合物（82))。 本化合物（82)4.72 (2H, s), 5.02 (2H, s), 6.99-7.03 (2H, m), 7.20-7.31 (6H, m)? 7.47-7.53 (2H? m)? 7.65-7.67 (1H? m) Example 82 11·〇1g H2,6_dimerinoyl)_3_[2,5-difluoro(trifluoromethylthio)phenyl]urea in 10·0 ml 1-mercapto-2-pyrrole In a solution of the ketone, 0.16 ml of chloromethyl methyl ether and 243 mg of sodium hydride (content: 55% by weight in oil) were added at 2 C under ice cooling, and the mixture was stirred under ice cooling for 4 hr. A mixture of 1 ml of a saturated aqueous solution of ammonium chloride and 5 ml of water was added to the mixture, and the mixture was extracted three times with 1 ml of ethyl acetate. The organic layers were combined and washed with a saturated aqueous solution of sodium chloride. The obtained residue was purified by silica gel column chromatography (ethyl acetate·· chloroform: hexane = 1:1: 4) to obtain 〇·93 g of 1-(2,6-difluorobenzoinyl)- 3-[2,5-Difluoro-4-(trifluoromethylthio)phenyl]indole (nonyloxyindenyl)urea (hereinafter referred to as the present compound (82)). Present Compound (82)

1H-NMR(CDCl3)5(ppm): 3.37(3H?s)? 3.54(3H?s)? 4.83(2H5 237 318750 200804250 brs)，5.14(2H，brS)，6·84-6·88(2Η，ηι)5 7.29-7.39(2H，m)， 7.45-7.49(lH?m) ? 實例83 於1·01克1_(2,6-二氟苯曱醯基）-3-[2,6-二氟_4_(三氟 曱硫基）苯基]脲於1〇·〇毫升1_甲基_2_吡咯啶酮之溶液内， 於2 C於以冰冷卻下，加入〇·61毫升氯甲基甲基醚及243 毫克氳化鈉（含量55重量％於油），所得混合物於以冰冷卻 下攪拌4小時。於反應混合物内於以冰冷卻下，加入1〇 毫升飽和氯化銨水溶液與5毫升水之混合物，接著以1〇 毫升乙酸乙酯萃取三次。有機層經合併，以飽和氯化鈉水 溶液洗三次，以無水硫酸鎂脫水及於減壓下濃縮。所得殘 餘物藉矽膠管柱層析術純化（乙酸乙酯：氯仿：己烷= 1:1:4)，獲得〇·59克1-(2,6-二氟苯甲醯基二氟 -4-(二氟曱硫基）苯基]_1，3-武（甲氧基甲基）脲（後文稱作本 化合物（83))。 本化合物（83)1H-NMR (CDCl3) 5 (ppm): 3.37 (3H?s)? 3.54 (3H?s)? 4.83 (2H5 237 318750 200804250 brs), 5.14 (2H, brS), 6·84-6·88 (2Η) , ηι)5 7.29-7.39(2H,m), 7.45-7.49(lH?m) ? Example 83 at 1·01 g of 1_(2,6-difluorobenzoinyl)-3-[2,6- Difluoro_4_(trifluorosulfonylthio)phenyl]urea in a solution of 1〇·〇 ml of 1-methyl-2-pyrrolidinone, added with 〇·61 ml of chlorine at 2 C under ice cooling Methyl methyl ether and 243 mg of sodium hydride (content 55% by weight in oil) were stirred for 4 hours under ice cooling. A mixture of 1 ml of a saturated aqueous solution of ammonium chloride and 5 ml of water was added to the mixture, and the mixture was extracted three times with 1 ml of ethyl acetate. The organic layer was combined, washed with a saturated aqueous solution of sodium chloride, and dried over anhydrous magnesium sulfate. The residue was purified by column chromatography (ethyl acetate: chloroform:hexane = 1:1: 4) to give y················ -(difluorosulfonylthio)phenyl]-1,3-tris(methoxymethyl)urea (hereinafter referred to as the present compound (83)). The present compound (83)

1H-NMR(CDCl3)5(ppm): 3.40(3H?brs)? 3.48(3H?brs)? 4.85 (2H，brs)，5.19(2H，brs)，6.83-6.87(2H，m)，7.29-7.35(3H，m) 實例84 於3.01克l-(2,6-二氟苯曱醯基）-3-[2-氟-4-(2_丙烯硫 基）苯基]脲於30毫升1 -甲基-2-σ比洛σ定酮之溶液内，於2。〇 238 318750 200804250 於以冰冷卻下，加入2· 1毫升氯曱基甲基醚及8丨9毫克气 化鈉（含量55重量％於油），所得混合物於以冰冷卻下攪拌 4小時。於反應混合物内於以冰冷卻下，加入3 〇毫升飽和 氯化銨水溶液與15毫升水之混合物，接著以3〇毫升乙酸 乙酯萃取。有機層經合併，以飽和氯化鈉水溶液洗三次， 以廉水Ail 鎮脫水及於減壓下濃縮。所得殘餘物藉妙膠管 柱層析術純化（乙酸乙酯：氯仿：己烷=1 :丨：4)，進一步藉中 S衣備性同效液相層析術純化（乙酸乙g旨：己烧=15: 8 5)， 獲知2.32克1-(2,6-一氟苯曱酸基）-3-[2-氟-4-(2-丙稀硫基) 苯基]-1,3-貳（甲氧基曱基）脲（後文稱作本化合物（84))。 本化合物（84)1H-NMR (CDCl3) 5 (ppm): 3.40 (3H?brs)? 3.48 (3H?brs)? 4.85 (2H, brs), 5.19 (2H, brs), 6.83-6.87 (2H, m), 7.29- 7.35(3H,m) Example 84 in 3.01 g of 1-(2,6-difluorophenylindolyl)-3-[2-fluoro-4-(2-propenylthio)phenyl]urea in 30 ml 1 -Methyl-2-σ-pyrrozine in a solution of 2. 238 238 318750 200804250 Under ice cooling, 2. 1 ml of chloromethyl methyl ether and 8 丨 9 mg of sodium hydride (content: 55% by weight in oil) were added, and the resulting mixture was stirred under ice cooling for 4 hours. A mixture of 3 ml of a saturated aqueous solution of ammonium chloride and 15 ml of water was added to the mixture, and the mixture was evaporated. The organic layers were combined, washed three times with a saturated aqueous solution of sodium chloride, and then evaporated and evaporated. The obtained residue was purified by column chromatography (ethyl acetate: chloroform:hexane = 1: 丨: 4), and further purified by S-purified liquid chromatography. =15: 8 5), 2.32 g of 1-(2,6-monofluorobenzoic acid)-3-[2-fluoro-4-(2-propylthio)phenyl]-1,3 - hydrazine (methoxy fluorenyl) urea (hereinafter referred to as the present compound (84)). Present Compound (84)

H-NMR(CDCl3)3(ppm): 3.38(3H，s)，3.49(3H，s)，3·55-3·58 (2H，m)，4.82(2H，brs)，4.9-5.3(2H，brs)，5.08-5.24(2H，m)， 5.82-5.92(lH，m)，6.84-6.88(2H，m)，7.05_7.10(2H，m)，7.24 (lH，m)，7.31-7.36(lH，m) 實例85 於〇·62克l-(2,6-二氟苯曱醯基）_3_[2_氟_4-(2_丙烯硫 基）笨基]-1，3-貳（曱氧基甲基）脲於6·〇毫升氯仿之溶液 内，於以冰冷卻下加入0.36克偏氯過苯曱酸（65重量％)， 混合物於室溫攪拌0.5小時。於反應混合物内加入6毫升 氯仿，以15毫升飽和碳酸氫鈉水溶液洗三次。有機層以無 318750 239 200804250 所得殘餘物藉中壓製備性 水硫酸鎂脫水，於減壓下濃縮。 高效液相層析術純化（乙酸乙酯：己烷=5〇:5〇)，獲得〇·39 克1-(2,6-一氟苯甲醯基）-3-[2-氟-4-(2-丙烯基亞磺醯基）苯 基]-1，3-C (曱氧基曱基）脲（後文稱作本化合物（g^))。 本化合物（85)H-NMR (CDCl3) 3 (ppm): 3.38 (3H, s), 3.49 (3H, s), 3·55-3·58 (2H, m), 4.82 (2H, brs), 4.9-5.3 (2H) , brs), 5.08-5.24 (2H, m), 5.82-5.92 (lH, m), 6.84-6.88 (2H, m), 7.05_7.10 (2H, m), 7.24 (lH, m), 7.31 7.36(lH,m) Example 85 〇·62 g l-(2,6-difluorophenylindenyl)_3_[2_fluoro_4-(2-propylthio)phenyl]-1,3- To a solution of 6·ml of chloroform, 0.36 g of chloroperbenzoic acid (65% by weight) was added under ice cooling, and the mixture was stirred at room temperature for 0.5 hr. 6 ml of chloroform was added to the reaction mixture, and the mixture was washed three times with 15 ml of saturated aqueous sodium hydrogen carbonate. The organic layer was dried over MgSO.sub.3, EtOAc. Purification by high performance liquid chromatography (ethyl acetate:hexane = 5 〇: 5 〇) to obtain 〇·39 g of 1-(2,6-fluorobenzhydryl)-3-[2-fluoro-4 -(2-Propylsulfinyl)phenyl]-1,3-C(decyloxyindenyl)urea (hereinafter referred to as the present compound (g^)). Present Compound (85)

1H-NMR(CDCl3)6(ppm): 3.38(3H9s)? 3.47-3.60(5H?m)? 4.83(2H，brs)，4.9-5.4(2H，brs), 5.23-5.37(2H，m)，5·60_5·67 (lH，m)，6.84(2H，m)，7.29-7.36(2H，m)，7.49_7.56(2H，m) 實例86 於1.30克l-(2,6-二氟苯甲醯基）_3_[2-氟-4-(2_丙烯硫 基）苯基]-1，3-貳（曱氧基甲基）脲於26.0毫升氯仿之溶液 内，於以冰冷卻下加入1.67克偏氯過苯曱酸（65重量％)， 混合物於室溫攪拌2小時。於反應混合物内加入26毫升氯 仿，以50毫升飽和碳酸氫鈉水溶液洗三次。有機層以無水 石瓜酉义鎮脫水，於減Μ下浪縮。所得殘餘物藉中壓製備性高 效液相層析術純化（乙酸乙酯：己烷=50:50)，獲得ι·〇9克 1-(2,6-一氟苯曱醯基）-3-[2-氟-4-(2-丙稀基石黃驢基）苯基卜 1，3-貳（甲氧基甲基）脲（後文稱作本化合物（86))。 本化合物（86) 318750 240 2008042501H-NMR (CDCl3) 6 (ppm): 3.38 (3H9s)? 3.47-3.60 (5H?m)? 4.83 (2H, brs), 4.9-5.4 (2H, brs), 5.23-5.37 (2H, m), 5·60_5·67 (lH, m), 6.84 (2H, m), 7.29-7.36 (2H, m), 7.49_7.56 (2H, m) Example 86 at 1.30 g of l-(2,6-difluoro Benzomethane)_3_[2-fluoro-4-(2-propenylthio)phenyl]-1,3-indole (decyloxymethyl)urea in 26.0 ml of chloroform, under ice cooling 1.67 g of chloroperbenzoic acid (65% by weight) was added, and the mixture was stirred at room temperature for 2 hours. 26 ml of chloroform was added to the reaction mixture, and the mixture was washed three times with 50 ml of saturated aqueous sodium hydrogen carbonate. The organic layer is dehydrated in the waterless water, and the water is dehydrated under reduced mites. The obtained residue was purified by medium pressure preparative high performance liquid chromatography (ethyl acetate:hexane = 50:50) to obtain 9 g of 1-(2,6-fluorofluorophenyl)-3. -[2-Fluoro-4-(2-propyl sulphate)phenyl 1,3-anthracene (methoxymethyl)urea (hereinafter referred to as the present compound (86)). The present compound (86) 318750 240 200804250

S〇2CH2CH=CH2 1H-NMR(CDCl3)5(ppm): 3.38(3H5s)? 3.53(3H?s)9 3.80-3.82 (2H，m)，4.83(2H，brs)，5.0-5.3(2H，brs)，5.17-5.36(2H，m)， 5·72-5·82(1Η，πι)，6.84-6.87(2H，m)，7.31-7.38(lH，m)，7·6Κ 7.68(3H，m) 實例87 於3·01克l-(2,6-二氟苯甲醯基）_3-[2_氟_4-(2-丙炔硫 基）本基]脲於3 0耄升1 -曱基-2-η比略咬酮之溶液内，於2。匚 於以冰冷卻下，加入2·1毫升氯甲基曱基醚及866毫克氫 氧化鈉，所得混合物於以冰冷卻下攪拌3小時，及於室溫 攪拌19小時。於反應混合物内於以冰冷卻下，加入3〇亳 升飽和氯化銨水溶液與15毫升水之混合物，接著以3〇毫 升乙酸乙酯萃取三次。有機層經合併，以飽和氯化鈉水溶 液洗三次，以無水硫酸鎂脫水及於減壓下濃縮。所得殘餘 物藉矽膠管柱層析術純化（乙酸乙酯：氯仿··己烷=1:4:4)，' 進一步藉中壓製備性高效液相層析術純化（乙酸乙酯：氯 仿：己烷叫5:15:70)，獲得0.05克叩，^氟苯甲酿 基）-3-[2-氟_4·(2-丙炔硫基）苯基卜丨，3_貳（甲氧 (後文稱作本化合物（87))。 乳土甲基）腺 本化合物（87) 318750 241 200804250S〇2CH2CH=CH2 1H-NMR (CDCl3) 5 (ppm): 3.38 (3H5s)? 3.53 (3H?s)9 3.80-3.82 (2H, m), 4.83 (2H, brs), 5.0-5.3 (2H, Brs), 5.17-5.36(2H,m), 5·72-5·82(1Η,πι), 6.84-6.87(2H,m),7.31-7.38(lH,m),7·6Κ 7.68(3H, m) Example 87 at 3·01 g of l-(2,6-difluorobenzhydryl)_3-[2_fluoro-4-(2-propynylthio)benzyl]urea at 30 liters 1 - in the solution of thiol-2-n than acetophenone, at 2. 2 Under ice cooling, 2.1 ml of chloromethyl decyl ether and 866 mg of sodium hydroxide were added, and the mixture was stirred under ice cooling for 3 hr and at room temperature for 19 hr. A mixture of 3 liters of a saturated aqueous ammonium chloride solution and 15 ml of water was added to the reaction mixture under ice-cooling, and then extracted three times with 3 liters of ethyl acetate. The organic layer was combined, washed with a saturated aqueous The residue was purified by column chromatography (ethyl acetate: chloroform·hexane = 1:1: 4), and then purified by medium pressure preparative high performance liquid chromatography (ethyl acetate: chloroform: Hexane is called 5:15:70), and 0.05 g of hydrazine, fluorobenzamide)-3-[2-fluoro-4·(2-propynylthio)phenylindole, 3_贰 (A) is obtained. Oxygen (hereinafter referred to as this compound (87)). Milk methyl) glandular compound (87) 318750 241 200804250

1H-NMR(CDCl3)5(ppm): 2.25(lH?m)? 3.38(3H9brs)? 3.5〇 (3H，brs)，3.61(2H，m)，4.83(2H，brs)，5.07(2H，brs)，6·85鐘 6.87(2H，m)，7.17-7.35(4H，m) 實例88 於1·01克l-[4-(3,3-二氯-2-丙稀基硫基）-2-氟苯基]_3_ (2,6-—鼠本甲酿基）腺於10.00毫升曱基-2-°比洛σ定酮之 溶液内，於1°C於以冰冷卻下，加入〇·58毫升氯甲基曱基 醚及240耄克氫氧化銅，所得混合物於以冰冷卻下擾拌4 小時，及於室溫攪拌19小時。於反應混合物内於以冰冷卻 下，加入10毫升飽和氯化銨水溶液與5毫升水之混合物， 接著以10毫升乙酸乙酯萃取三次。有機層經合併，以飽和 氯化鈉水溶液洗三次，以無水硫酸鎂脫水及於減壓下濃 縮。所得殘餘物藉石夕膠管柱、層析術純化（乙酸乙酯··氯仿： 己烧=1 土4)，獲得〇·15克1-[4-(3,3-二氯_2_丙烯基硫 基）-2-氟苯基]-3-(2,6-二氟苯甲醯基&gt;ι，3-貳（甲氧基曱基） 脲（後文稱作本化合物（88))。 本化合物（88)1H-NMR (CDCl3) 5 (ppm): 2.25 (lH?m)? 3.38 (3H9brs)? 3.5〇 (3H, brs), 3.61 (2H, m), 4.83 (2H, brs), 5.07 (2H, brs) ), 6.85 6.87 (2H, m), 7.17-7.35 (4H, m) Example 88 in 1.11 g of l-[4-(3,3-dichloro-2-propylthio)- 2-fluorophenyl]_3_ (2,6--murine-branched) gland in a solution of 10.00 ml of decyl-2-pyrrolidine, added to 〇 at 1 ° C under ice cooling 58 ml of chloromethyl decyl ether and 240 g of copper hydroxide were added, and the resulting mixture was stirred for 4 hours under ice cooling and at room temperature for 19 hours. To the reaction mixture was added dropwise a mixture of 10 ml of aq. The organic layer was combined, washed three times with saturated aqueous sodium chloride, dried over anhydrous magnesium sulfate and evaporated. The obtained residue was purified by chromatography on silica gel column chromatography (ethyl acetate···················· Thiothio)-2-fluorophenyl]-3-(2,6-difluorobenzhydryl)&gt;3-, fluorene (methoxy methoxy) urea (hereinafter referred to as this compound (88) ). This compound (88)

1H-NMR(CDCl3)5(ppm): 3.38(3H5s)? 3.51 (3H?brs)5 3.65- 242 318750 200804250 3.67(2H，m)，4.83(2H，brs)，5.08(2H，brs)，5.94-5.98 (lH，m)， 6.84_6.89(2H，m)，7.08-7.14(2H，m), 7.30-7.37 (2H，m) 實例89 於1·〇1克3-[2_氯_4-(五氟乙硫基）苯基]二氟苯 曱酿基）脲於1〇·〇毫升1-曱基-2-吡咯啶酮之溶液内，於2。〇 於以冰冷卻下，加入〇·59毫升氯甲基甲基醚及235毫克氫 化鈉，所得混合物於以冰冷卻下攪拌3小時。於反應混合 物内於以冰冷卻下’加入1 〇毫升飽和氯化銨水溶液與5 晕升水之混合物，接著以10毫升乙酸乙酯萃取三次。有機 層經合併’以飽和氣化納水溶液洗三次，以無水硫酸鎂脫 水及於減壓下濃縮。所得殘餘物藉矽膠管柱層析術純化（乙 酸乙酯：氣仿：己烷=1士4)，獲得〇·85克氯-4_(五 氟乙硫基）苯基]-3-(2,6-二氣苯曱驗基）_1，3-戴（曱氧基曱基） 脲（後文稱作本化合物（89))。 本化合物（89)1H-NMR (CDCl3) 5 (ppm): 3.38 (3H5s)? 3.51 (3H?brs)5 3.65- 242 318750 200804250 3.67 (2H, m), 4.83 (2H, brs), 5.08 (2H, brs), 5.94 -5.98 (lH,m), 6.84_6.89(2H,m),7.08-7.14(2H,m), 7.30-7.37 (2H,m) Example 89 in 1·〇1 g 3-[2_氯_ 4-(pentafluoroethylthio)phenyl]difluorophenylhydrazine)urea in a solution of 1 〇·〇 ml 1-mercapto-2-pyrrolidone, at 2. 〇 59 ml of chloromethyl methyl ether and 235 mg of sodium hydrogenate were added under ice cooling, and the mixture was stirred for 3 hours under ice cooling. A mixture of 1 ml of a saturated aqueous solution of ammonium chloride and 5 of swell of water was added to the reaction mixture under ice-cooling, followed by extraction three times with 10 ml of ethyl acetate. The organic layer was combined and washed three times with a saturated aqueous solution of sodium sulfate. The obtained residue was purified by column chromatography (ethyl acetate:methanol:hexane =j. , 6-dihydrobenzoquinone) 1,3-1,3-(indolyl)urea (hereinafter referred to as the present compound (89)). Present Compound (89)

1H-NMR(CDCl3)5(ppm): 3.38(3H?brs)5 3.60(3H?brs)? 4.79 (2H，brs)，5.49(2H，brs)，6.82(2H，brs)，7.30_7.34(lH，m)， 7.52-7.55(2H，m)，7.78(lH，m) 實例90 於1.01克1_(2,6-二氟苯曱酸基）_3_[2-氟-4_(1，1，2-三氟 -2-三氟曱氧基乙硫基）苯基]脲於ι〇·〇毫升ι曱基_2_吼口各 318750 243 200804250 啶酮之溶液内，於2°C於以冰冷卻下，加入〇·5ΐ毫升氯甲 基甲基醚及203毫克氫化鈉，所得混合物於以冰冷卻下授 拌3小時。於反應混合物内於以冰冷卻下，加入1 〇毫升韵 和氣化銨水溶液與5毫升水之混合物，接著以1〇毫升乙酸 乙酯萃取三次。有機層經合併，以飽和氯化鈉水溶液洗三 次，以無水硫酸鎂脫水及於減壓下濃縮。所得殘餘物藉石夕 膠管柱層析術純化（乙酸乙酯··氣仿：己烷=1:1:4)，獲得 0.87克二氟苯曱醯基）-3_[2-氟_4_(1，1，2_三氟_2_三氟 曱氧基乙硫基）苯基]-1，3-貳（甲氧基甲基）脲（後文稱作本化 合物（90))。 本化合物（90)1H-NMR (CDCl3) 5 (ppm): 3.38 (3H?brs) 5 3.60 (3H?brs)? 4.79 (2H, brs), 5.49 (2H, brs), 6.82 (2H, brs), 7.30_7.34 (lH,m), 7.52-7.55(2H,m),7.78(lH,m) Example 90 in 1.01 g of 1_(2,6-difluorobenzoic acid)_3_[2-fluoro-4_(1,1 , 2-trifluoro-2-trifluoromethoxyethylthio)phenyl]urea in ι〇·〇 ml ι曱基_2_吼口 each 318750 243 200804250 ketone solution, at 2 ° C Under ice cooling, 〇·5 ml of chloromethyl methyl ether and 203 mg of sodium hydride were added, and the resulting mixture was stirred for 3 hours under ice cooling. To the reaction mixture was added ice-cooled, and a mixture of 1 ml of a mixture and an aqueous solution of ammonium sulfate and 5 ml of water was added, followed by extraction three times with 1 ml of ethyl acetate. The organic layer was combined, washed with a saturated aqueous The obtained residue was purified by silica gel column chromatography (ethyl acetate·methanol:hexane =1:1:4) to obtain 0.87 g of difluorophenylhydrazino)-3_[2-fluoro_4_( 1,1,2-trifluoro-2-trifluoromethoxyethylthio)phenyl]-1,3-indole (methoxymethyl)urea (hereinafter referred to as the present compound (90)). Present Compound (90)

H-NMR(CDCl3)5(ppm): 3.37(3H?brs)? 3.54(3H?brs)9 4.82 7.40(lH，m)，7·42-7·47(3Η，ιη) 實例91 (2H，brs)，5.13(2H，brs)，5·75_5·90(1Η，πι)，6.84(2H，m)，7·3〇H-NMR (CDCl3) 5 (ppm): 3.37 (3H?brs)? 3.54 (3H?brs)9 4.82 7.40 (lH,m),7·42-7·47(3Η,ιη) Example 91 (2H, Brs), 5.13 (2H, brs), 5·75_5·90 (1Η, πι), 6.84 (2H, m), 7·3〇

^ w，尸叮侍混合物於以冰冷卻下攪 拌4小時。於反應混合物内於以冰冷卻下，加入1〇毫升^ 和氯化銨水溶液與5毫升水之混合物， 1() = 拌4小時。於反應混合物內热 ίρ下，加入10毫升飽 ’接者以1 〇毫升乙酸 318750 244 200804250 乙酯萃取三次。有機層經合併，以飽和氯化鈉水溶液洗三 次，以無水硫酸鎂脫水及於減壓下濃縮。所得殘餘物藉石夕 膠管柱層析術純化（乙酸乙酯：氯仿：己烷=丨··丨：4)，進一 步藉中壓製備性咼效液相層析術純化（乙酸乙酯··己烧= 15·85) ’獲付0.28克1-[3-氯-4-( 1，1，2·三敦-2-三氟曱氧基 乙基）本基]-3-(2,6-二氟苯甲醯基）-1，3-戴（甲氧基甲基）脲 (後文稱作本化合物（91))。 本化合物（91)^ w, the corpse mixture was stirred for 4 hours under ice cooling. To the reaction mixture was added ice-cooled, and a mixture of 1 mL of a solution of ammonium chloride and 5 ml of water was added, and 1 () = 4 hours. Under the heat of the reaction mixture, 10 ml of a saturator was added and extracted three times with 1 liter of ethyl acetate 318750 244 200804250. The organic layer was combined, washed with a saturated aqueous The obtained residue was purified by silica gel column chromatography (ethyl acetate: chloroform:hexane = 丨··丨: 4), and further purified by medium pressure preparative liquid chromatography (ethyl acetate···烧烧 = 15·85) 'Added 0.28 g of 1-[3-chloro-4-(1,1,2·Santun-2-trifluoromethoxyethyl) benzyl]-3-(2, 6-Difluorobenzhydryl)-1,3-d (methoxymethyl)urea (hereinafter referred to as the present compound (91)). Present Compound (91)

H_NMR(CDCl3)3(ppm): 3.34(3H，brs)，3.49(3H，brs)，4.92 (2H，brs)，5.09(2H，brs)，5·93_6·08(1Η，πι)5 6·88-6·92(2Η，πι)， 7.23,7.25(lH，m)，7.32_7.42(3H，m) 實例92 於1·〇1克3-(2,6_二氟苯曱醯基）441氟-4兴三氟甲硫 基）苯基]-1-甲氧基甲基脲於1〇·〇毫升^甲基_2•吼咯啶酮 之溶液内，於2°c，加入109毫克氳化鈉（含量55重量❹/〇於 油）’混合物攪拌30分鐘，於1。〇加入〇· 19毫升乙醯氯， 所得混合物於室溫攪拌4小時。反應混合物倒入丨〇毫升冰 水中’接著以20耄升乙酸乙酯萃取三次。有機層經合併， 以飽和氯化鈉水溶液洗三次，以無水硫酸鎂脫水及於減壓 下濃縮。所得殘餘物藉矽膠管柱層析術純化（乙酸乙酯：氯 仿：己烧=1:1:4)，進一步藉中壓製備性高效液相層析術純 245 318750 200804250 化（乙酸乙酯：己烷=15:85)，獲得0.56克1-乙醯基-1-(2,6-二氟苯曱醯基）-3-[2-氟-4-(三氟曱硫基）苯基]-3-曱氧基曱 基脲（後文稱作本化合物（92))。 本化合物（92)H_NMR(CDCl3)3 (ppm): 3.34 (3H, brs), 3.49 (3H, brs), 4.92 (2H, brs), 5.09 (2H, brs), 5·93_6·08 (1Η, πι) 5 6· 88-6·92(2Η,πι), 7.23,7.25(lH,m),7.32_7.42(3H,m) Example 92 in 1·〇1 g 3-(2,6-difluorobenzoinyl) ) 441 fluoro-4 dimethyl trifluoromethyl) phenyl]-1-methoxymethyl urea in 1 〇 · 〇 ml ^ methyl _2 oxazolidinone solution, added at 2 ° C A mixture of 109 mg sodium hydride (content 55 ❹ / 〇 oil) was stirred for 30 minutes at 1. 〇·19 ml of acetamidine chloride was added, and the resulting mixture was stirred at room temperature for 4 hours. The reaction mixture was poured into 丨〇 ml of ice water' and then extracted three times with 20 liters of ethyl acetate. The organic layer was combined, washed with a saturated aqueous The residue obtained was purified by column chromatography (ethyl acetate: chloroform: hexane = 1:1: 4), and further purified by medium pressure preparative high performance liquid chromatography 245 318750 200804250 (ethyl acetate: Hexane = 15:85), 0.56 g of 1-ethylinden-1-(2,6-difluorophenylindolyl)-3-[2-fluoro-4-(trifluorosulfonylthio)phenyl ]-3-decyloxyguanidinourea (hereinafter referred to as the present compound (92)). Present Compound (92)

W-NMRpMSO-c^，測量溫度：80°C)3(ppm):2.32(3H，s), 3.41(3H?s), 5.13(2H?brs)? 7.04-7.08(2H9m)5 7.52-7.62(3H? m)5 7.77-7.80(lH9m) 製造例22 於3·30克N-(3-氯丙基）-2-氟-4-(三氟曱硫基）乙醯苯胺 於15毫升N，N-二曱基曱醯胺之溶液内’加入6.〇克硫基 甲氧化鈉（15%水溶液），混合物於室溫攪拌隔夜。於此反應 混合物内加人100毫升乙酸乙s| ’循序以水及飽和氯化納 水溶液洗滌。有機層以無水硫酸鎂脫水及於減壓下濃縮， 獲得2.83克2·氟·Ν_(3·曱硫基丙基）_4_(三氟曱硫基）乙酸苯 胺0 2-氟-Ν-(3-曱硫基丙基）-4-(三氟甲硫基）乙酿苯胺 广八人W-NMRpMSO-c^, measured temperature: 80 ° C) 3 (ppm): 2.32 (3H, s), 3.41 (3H?s), 5.13 (2H?brs)? 7.04-7.08 (2H9m) 5 7.52-7.62 (3H?m)5 7.77-7.80 (lH9m) Production Example 22 in 3·30 g of N-(3-chloropropyl)-2-fluoro-4-(trifluorosulfonylthio)acetanilide in 15 ml of N The solution of N-dimercaptoamine was added to 6. gram of sodium thiomethoxide (15% in water), and the mixture was stirred at room temperature overnight. To the reaction mixture, 100 ml of ethyl acetate s | was sequentially washed with water and a saturated aqueous solution of sodium chloride. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure to yield 2. </RTI> </RTI> </RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> -曱thiopropyl)-4-(trifluoromethylthio)ethyl aniline

H3C NH3C N

、SMe ，s)， 318750 246 200804250 2·50 (2H，t，J = 6·9 Hz)，3.62-3.93 (2H，br)，7·31 (1H，t，J = 8.1 Hz), 7.49-7.56 (2H? m) 製造例23 於2·83克2-氟-N-(3-甲硫基丙基）_4_(三氟甲硫基）乙醯 笨胺於15笔升甲醇之溶液内，加入5毫升濃鹽酸，所得混 合物於回流加熱下攪拌3小時。反應混合物溫度回復室溫 後，飽和氫氧鈉水溶液加至其中來調整至pH 9。此溶液以 第二丁基曱基醚萃取。有機層以飽和氯化鈉水溶液洗滌， 以無水硫酸鎂脫水及於減壓下濃縮。所得殘餘物藉中壓製 備性高效液相層析術純化（己烷··乙酸乙酯=9〇:1〇)，獲得 1·〇3克2-氟-N-(3-曱硫基丙基）-4-(三氟曱硫基）苯胺。 2-氟-N-(3-曱硫基丙基）-4-(三氟甲硫基）苯胺, SMe, s), 318750 246 200804250 2·50 (2H, t, J = 6·9 Hz), 3.62-3.93 (2H, br), 7·31 (1H, t, J = 8.1 Hz), 7.49- 7.56 (2H?m) Production Example 23 in a solution of 2.83 g of 2-fluoro-N-(3-methylthiopropyl)_4_(trifluoromethylsulfanyl)acetamide in 15 liters of methanol, 5 ml of concentrated hydrochloric acid was added, and the resulting mixture was stirred under reflux for 3 hours. After the temperature of the reaction mixture returned to room temperature, a saturated aqueous sodium hydroxide solution was added thereto to adjust to pH 9. This solution was extracted with a second butyl decyl ether. The organic layer was washed with a saturated aqueous The obtained residue was purified by medium pressure preparative high performance liquid chromatography (hexane·ethyl acetate=9〇:1〇) to obtain 1·〇3 g of 2-fluoro-N-(3-indolethiopropyl Base)-4-(trifluorosulfonylthio)aniline. 2-fluoro-N-(3-indolylpropyl)-4-(trifluoromethylthio)aniline

]H-NMR (CDCl3)5(ppm): 1.91-2.00 (2H, m)? 2.13 (3H? s)5 2.62 (2H，t，J = 6.8 Hz)，3·33 (2H，t，J = 6.8 Hz)，4·32 (1H， br)5 6.69 (1H，t，J = 8.7 Hz)，7·22-7·27 (1H，m)，7.29 (1H，d， J = 8.7 Hz) 實例93 於1·〇2克2-氟-N-(3-甲硫基丙基）-4-(三氟甲硫基）苯胺 於15¾升第三丁基曱基趟之溶液内，加入640毫克2,4-二氟苯甲醯基異氰酸酯，所得混合物於室溫攪拌1 5分鐘。 247 318750 200804250 此反應混合物於減壓下濃縮。所得固體以己烷洗 於 壓下乾燥，獲得L53克3-(2,6-二氣苯甲醯基）_H2_氟_4;(三 氟曱硫基）苯基]-1-(3_曱硫基丙基）脲（後文稱作本化合物 (93))。 口 本化合物（93)H-NMR (CDCl3) 5 (ppm): 1.91-2.00 (2H, m)? 2.13 (3H? s)5 2.62 (2H, t, J = 6.8 Hz), 3·33 (2H, t, J = 6.8 Hz), 4·32 (1H, br)5 6.69 (1H, t, J = 8.7 Hz), 7·22-7·27 (1H, m), 7.29 (1H, d, J = 8.7 Hz) 93 in 1·〇2 g of 2-fluoro-N-(3-methylthiopropyl)-4-(trifluoromethylthio)aniline in a solution of 153⁄4 liters of tert-butyl fluorenyl hydrazine, add 640 mg 2,4-Difluorobenzimidyl isocyanate, and the resulting mixture was stirred at room temperature for 15 minutes. 247 318750 200804250 This reaction mixture was concentrated under reduced pressure. The obtained solid was washed with hexane under reduced pressure to obtain L53 g of 3-(2,6-dioxabenzylidene)-H2_fluoro-4; (trifluorosulfonylthio)phenyl]-1-(3_ Indylthiopropyl)urea (hereinafter referred to as the present compound (93)). Oral compound (93)

VSMeVSMe

^-NMR (CDCl3)5(ppm): 1.84 (2H? t5 J = 7.2 Hz)? 2.04 (3H? s)，2·49 (2H，t，J 一 7·2 Hz)，3·76 (2H，t，J = 7·2 Hz)，6·94 (2H，t，J = 8·3 Hz)，7·35-7·44 (2H，m)，7·53_7·60 (2H，m)， 7·62 (1H，br) 實例94 於1.42克3-(2,6_二氟苯曱醯基氟_4_(三氟曱硫 基）本基]-l-(3_甲硫基丙基）脲於毫升j，％二甲基_2_味嗤 啶酮之溶液内加入0.37毫升碘曱烷，然後加入141毫克氫 化鈉（60%於油），所得混合物於室溫攪拌2小時。於此反應 混合物内加水，接著以乙酸乙酯萃取。有機層以飽和氯化 納水；谷液洗務，以無水硫酸鎂脫水及於減壓下濃縮。所得 殘餘物藉中壓製備性咼效液相層析術純化（己烧··乙酸乙酯 =75:25)，狻得190耄克l-(2,6-二氟苯甲醯基氟 -4-(二氟甲硫基）苯基]-1-甲基_3气3_甲硫基丙基）脲（後文稱 作本化合物（94))。 318750 248 200804250 本化合物（94)^-NMR (CDCl3) 5 (ppm): 1.84 (2H? t5 J = 7.2 Hz)? 2.04 (3H? s), 2·49 (2H, t, J-77.2 Hz), 3·76 (2H ,t,J = 7·2 Hz),6·94 (2H,t,J = 8·3 Hz), 7·35-7·44 (2H,m),7·53_7·60 (2H,m) , 7·62 (1H, br) Example 94 in 1.42 g of 3-(2,6-difluorobenzoinylfluoro-4-yl-(trifluorosulfonylthio)-yl]-l-(3-methylthiopropane To the solution of ML, % dimethyl-2-furanone, 0.37 ml of iodonane was added, then 141 mg of sodium hydride (60% in oil) was added, and the mixture was stirred at room temperature for 2 hours. Water was added to the reaction mixture, followed by extraction with ethyl acetate. The organic layer was washed with saturated aqueous sodium chloride, and then evaporated to dryness eluted with anhydrous magnesium sulfate and concentrated under reduced pressure. Purification by liquid chromatography (hexane = ethyl acetate = 75:25), 190 g of l-(2,6-difluorobenzimidylfluoro-4-(difluoromethylthio)benzene ]]-1-methyl-3-carbon 3_methylthiopropyl)urea (hereinafter referred to as the present compound (94)). 318750 248 200804250 The present compound (94)

H-NMR(DMSO-d6，測置溫度·· 80°C)3(ppm): 1 71-1 82H-NMR (DMSO-d6, measured temperature · · 80 ° C) 3 (ppm): 1 71-1 82

(2H，m)，1·98 (3H，s)，2·46 (2H，t，J = 7·2 Hz)，3.04 (3H s) 3·75 (2H，t，J = 7.2 Hz)，7·〇8 (2H，t，J = 8.6 Hz)，7·4〇 (1H t，J = 8·3 Hz)，7·48-7·60 (2H, m)，7.70 (1H，dd5 J = lo.i 1.9 Hz) 實例95及96 於1·99克l-(2,6_二氟苯甲醯基）-3]2_氟_4_(三氟曱硫 基）苯基]-1-曱基-3-(3-甲硫基丙基）脲於氯仿之溶液内，於 以冰冷卻下加入1.49克偏氯過苯甲酸，混合物擾拌3〇分 鐘。於此反應混合物内加入第三丁基曱基醚，循序以飽和 碳酸氫鈉水溶液及飽和氯化鈉水溶液洗滌。有機層以無水 硫酸鎂脫水及於減壓下濃縮。所得殘餘物藉中壓製備性高 效液相層析術純化（乙酸乙酯），獲得612毫克1β(2 6_二氟 苯曱醯基）-3-[2-氟-4-(三氟曱硫基）苯基]_丨_曱基_3_[3_(曱 基亞hi&amp;基）丙基]脲（後文稱作本化合物（95))及I·】〗克 1_(2,6-二氟苯甲醯基氟-4-(三氟曱硫基）苯基]曱 基_3-[3-(甲基磺醯基）丙基]脲（後文稱作本化合物（96))。 本化合物（95) 318750 249 200804250(2H,m),1·98 (3H,s),2·46 (2H,t,J = 7·2 Hz), 3.04 (3H s) 3·75 (2H,t,J = 7.2 Hz), 7·〇8 (2H, t, J = 8.6 Hz), 7·4〇 (1H t, J = 8·3 Hz), 7·48-7·60 (2H, m), 7.70 (1H, dd5 J = lo.i 1.9 Hz) Examples 95 and 96 at 1.99 g of l-(2,6-difluorobenzhydryl)-3]2_fluoro_4_(trifluorosulfonyl)phenyl]-1 - Mercapto-3-(3-methylthiopropyl)urea in chloroform solution, 1.49 g of chloroperbenzoic acid was added under ice cooling, and the mixture was stirred for 3 minutes. To the reaction mixture was added tert-butyl mercapto ether, which was washed successively with a saturated aqueous sodium hydrogencarbonate solution and a saturated aqueous solution of sodium chloride. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was purified by preparative high performance liquid chromatography (ethyl acetate) to give 612 mg of 1β(2 6-difluorophenylhydrazino)-3-[2-fluoro-4-(trifluorofluorene). Thio)phenyl]_丨_曱yl_3_[3_(曱基亚hi&amp; yl)propyl]urea (hereinafter referred to as the present compound (95)) and I·] gram 1_(2,6- Difluorobenzimidylfluoro-4-(trifluorosulfonylthio)phenyl]indolyl_3-[3-(methylsulfonyl)propyl]urea (hereinafter referred to as the present compound (96)) The compound (95) 318750 249 200804250

^-NMRQMSO-db 測量溫度·· 80oC)S(ppm): 1·82-1·93 (2Η，m)，2·07 (3Η，s)，2·63 (1Η，dt，J = 14·5, 6·6 Ηζ)5 2·77 (1H，dt，J = 14.5, 6·6 Hz)，2.99 (3H，s)，3·75-3·84 (2H，m) 7·08 (2H，t，J = 8·5 Hz)，7·43 (1H，t，J = 8·3 Hz)，7·48々·6〇 (2H, m)，7·71 (1H，dd，J = 10.1，1.9 Hz) 本化合物（96)^-NMRQMSO-db Measurement Temperature··80oC)S(ppm): 1·82-1·93 (2Η,m), 2·07 (3Η,s), 2·63 (1Η, dt, J = 14· 5, 6·6 Ηζ)5 2·77 (1H, dt, J = 14.5, 6·6 Hz), 2.99 (3H, s), 3·75-3·84 (2H, m) 7·08 (2H ,t,J = 8·5 Hz),7·43 (1H,t,J = 8·3 Hz), 7·48々·6〇(2H, m), 7·71 (1H, dd, J = 10.1,1.9 Hz) This compound (96)

W-NMRPMSO·、，測量溫度：80°C)S(ppm): 1·89-2·00 (2H，m), 2·91 (3H，s)，2·99 (3H，s)，3·13 (2H，t，J = 7.6 Hz) 3.80 (2H? t5 J - 7.6 Hz)? 7.08 (2H? t? J = 8.3 Hz)? 7.44 (iH ? t，J = 8.2 Hz)，7.48-7.60 (2H，m)，7·72 (1H，dd，J = 1〇山 1.8 Hz) 製造例24 於4.62克N-(3-氯丙基）-2-氣-4-(三氟甲硫基）笨胺於 3〇毫升曱苯之溶液内，加入2.24毫升三乙基胺，然後分 成數份加入2.14克碳酸貳（三氯曱基）酯，混合物於室溫授 拌1小時。於此反應混合物内加入3毫升甲基胺（40%甲醇 250 318750 200804250 溶液）’混合物於室溫攪拌丨小時。於此反應混合物内加入 乙酸乙醋’循序以水及飽和氯化鈉水溶液洗滌。有機層以 無水硫酸鎂脫水及於減壓下濃縮，獲得5.52克1-(3-氯丙 基）-1-[2-氟-4-(三氟曱硫基）苯基]_弘曱基脲。 1-(3-氯丙基）-1_[2_氟4兴三氟曱硫基）苯基]_3_曱基脲W-NMRPMSO·, measured temperature: 80 ° C) S (ppm): 1·89-2·00 (2H, m), 2·91 (3H, s), 2·99 (3H, s), 3 · 13 (2H, t, J = 7.6 Hz) 3.80 (2H? t5 J - 7.6 Hz)? 7.08 (2H? t? J = 8.3 Hz)? 7.44 (iH ? t, J = 8.2 Hz), 7.48-7.60 (2H,m),7·72 (1H,dd,J = 1〇山1.8 Hz) Production Example 24 at 4.62 g of N-(3-chloropropyl)-2- gas-4-(trifluoromethylthio) To a solution of 3 ml of benzene in benzene, 2.24 ml of triethylamine was added, and then 2.14 g of lanthanum (trichlorodecyl) carbonate was added in portions, and the mixture was stirred at room temperature for 1 hour. To the reaction mixture was added 3 ml of a methylamine (40% methanol 250 318750 200804250 solution) mixture which was stirred at room temperature for a few hours. To the reaction mixture, ethyl acetate was added in order to wash with water and a saturated aqueous solution of sodium chloride. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure to give ethyldiaminediamine. Urea. 1-(3-chloropropyl)-1_[2-fluorotetracyclinethio)phenyl]_3_decylurea

XfTYSf3 ，人N人7XfTYSf3, person N people 7

ch3 L ^-NMR (CDCl3)3(ppm)·· 2·00·2·07 (2H，m)，2·77 (3H，d，J =4·6 Hz)，3·59 (2H，t，J = 6·8 Hz)，3·79 (2H，t，J = 6·8 Hz)， 4.16 (1H，d，J = 4·6 Hz)，7·35 (1H，t，J = 8.2 Hz), 7·48·7·56’ (2H，m) 製造例25 於5.52克1-(3-氣丙基心（三氟曱硫基）笨 基]_3·曱基脲於30毫升曱苯之溶液内，加入3·36毫升二異 丙基乙基胺及3·40克2,6_二氟苯甲醯氯，所得混合物於加 熱回流下擾拌3小時。於此反應混合物溫度回復室溫後， 將乙酸乙酯加入其中，所得混合物循序以水、飽和碳酸氫 鈉水溶液及飽和氯化鈉水溶液洗滌。有機層以無水硫酸鎂 脫水及於減壓下濃縮。所得殘餘物藉中壓製備性高效液相 層析術純化（己烧：乙酸乙g旨=75:25)，獲得7.05克1 _(3 氯丙基）-3-(2,6-二氟苯甲醯基）442-氟_4_(三氟曱硫基）笨 基]-3 -曱基脈。 318750 251 200804250 1-(3-氯丙基）-3-(2,6-二氟苯甲醯基）442-氟三氟甲硫 基）苯基]-3_甲基脲Ch3 L ^-NMR (CDCl3) 3 (ppm)·· 2·00·2·07 (2H, m), 2·77 (3H, d, J = 4·6 Hz), 3·59 (2H, t , J = 6·8 Hz), 3·79 (2H, t, J = 6·8 Hz), 4.16 (1H, d, J = 4·6 Hz), 7·35 (1H, t, J = 8.2 Hz), 7·48·7·56' (2H,m) Production Example 25 in 5.52 g of 1-(3-a. propyl propyl (trifluorosulfonylthio) phenyl] _3· hydrazinocarb in 30 ml 曱To the solution of benzene, 3.36 ml of diisopropylethylamine and 3·40 g of 2,6-difluorobenzamide chloride were added, and the resulting mixture was stirred under reflux for 3 hours. The temperature of the reaction mixture was recovered. Ethyl acetate was added thereto at room temperature, and the mixture was washed with water, saturated aqueous sodium hydrogen sulfate and saturated aqueous sodium chloride. Purification by preparative high performance liquid chromatography (hexane: acetic acid g = 75:25) to obtain 7.05 g of 1 _(3 chloropropyl)-3-(2,6-difluorobenzhydryl) 442 -Fluoryl_4_(trifluorosulfonylthio)phenyl]-3-indenyl. 318750 251 200804250 1-(3-Chloropropyl)-3-(2,6-difluorobenzhydryl)442- Fluorotrifluoromethylthio) Phenyl]-3_methylurea

W-NMR^DMSO-dg，測量溫度·· 80°〇δ(ρρηι): ΐ·93-2·02 (2Η，m)，2·99 (3Η，s)，3·63 (2Η，t5 J = 6.9 Ηζ)，3·79 (2Η，t, J = 6·9 Ηζ)，7·08 (2Η，t，J = 8·4 Ηζ)，7.42 (1Η，t，J = 8.0 Ηζ)，7·48-7·59 (2Η，m)，7·71 (1Η，dd，卜 1〇·0, 2·0 Hz) 實例97 於500耄克1-(3-氯丙基）-3_(2,6-二氟苯甲酿基 氟-4-(三氟曱硫基）苯基]-3-甲基脲於2毫升N，N-二曱基曱 酸胺之溶液内加入270毫克嗎嚇，514毫克峨化_及428 毫克碳酸鉀，所得混合物於60°C攪拌6小時。於此反應混 合物内加入乙酸乙g旨’循序以水及飽和氣化納水溶液洗 滌。有機層以無水硫酸鎂脫水及於減壓下濃縮。所得殘餘 物藉中壓製備性高效液相層析術純化（乙酸乙酯），獲得509 毫克1-(2,6-二氟苯曱醯基）-3-[2-氟-4-(三氟曱硫基）苯基] -1_甲基-3-(3-：^_嗎|基丙基）脲（後文稱作本化合物（97))。 本化合物（97) 252 318750 200804250W-NMR^DMSO-dg, measured temperature··80°〇δ(ρρηι): ΐ·93-2·02 (2Η, m), 2·99 (3Η, s), 3·63 (2Η, t5 J = 6.9 Ηζ), 3·79 (2Η, t, J = 6·9 Ηζ), 7·08 (2Η, t, J = 8·4 Ηζ), 7.42 (1Η, t, J = 8.0 Ηζ), 7 · 48-7·59 (2Η, m), 7·71 (1Η, dd, Bu 1〇·0, 2·0 Hz) Example 97 at 500 μg 1-(3-chloropropyl)-3_(2 ,6-difluorobenzylfluoro-4-(trifluorosulfonylthio)phenyl]-3-methylurea was added to a solution of 2 ml of N,N-didecyl decanoic acid amine to add 270 mg. 514 mg of deuterated _ and 428 mg of potassium carbonate, and the resulting mixture was stirred at 60 ° C for 6 hours. Ethyl acetate was added to the reaction mixture, and the mixture was washed with water and a saturated aqueous solution of sodium sulfate. Dehydration and concentration under reduced pressure. The obtained residue was purified by preparative high-performance liquid chromatography (ethyl acetate) to give 509 mg of 1-(2,6-difluorophenylhydrazinyl)-3-[ 2-Fluoro-4-(trifluorosulfonylthio)phenyl]-1-methyl-3-(3-:^-?-propyl)urea (hereinafter referred to as the present compound (97)). Compound (97) 252 318750 200804250

H-NMR (DMSO-d 測量溫度：80°C)3(ppm): 1.60-1.71 (2H, m)? 2.19-2.29 (6H? m)5 2.99 (3H? s)? 3.49 (4H? t? J =H-NMR (DMSO-d measurement temperature: 80 ° C) 3 (ppm): 1.60-1.71 (2H, m)? 2.19-2.29 (6H? m) 5 2.99 (3H? s)? 3.49 (4H? t? J =

4·7 Hz)，3·71 (2H，t，J = 7 2 Hz)5 7 08 (2H，t，卜 8 5 Hz)， 7.40 (1H，t，J = 8·2 Hz)，7·48-7·58 (2H，m)，7.69 (1H，dd，J =10.1, 1.9 Hz) 實例98 於500毫克1兴氯丙基）_3_(2,6_二氟苯曱醯基）-1·[2-貌-4-(二氟f硫基）苯基]_3_甲基脲於2毫升队1二曱基曱 醯胺之溶液内加入1毫升二曱基胺（5〇%水溶液）及33〇毫克 碳酸鉀，所得混合物於6(rc攪拌2小時。於此反應混合物 内加入乙酸乙酯，循序以水及飽和氯化納水溶液洗滌。有 機層以無水硫酸鎂脫水及於減壓下濃縮。所得殘餘物藉中 壓製備性高效液相層析術純化（乙酸乙酯），獲得丨76毫克 1-(2,6-一氟本甲酿基）-3-(3-二甲基胺基丙基）_3_[2_敦_4 (三氟甲硫基）苯基]-1-曱基脲（後文稱作本化合物（98))。 本化合物（98)4·7 Hz), 3·71 (2H, t, J = 7 2 Hz) 5 7 08 (2H, t, b 8 5 Hz), 7.40 (1H, t, J = 8·2 Hz), 7· 48-7·58 (2H, m), 7.69 (1H, dd, J = 10.1, 1.9 Hz) Example 98 in 500 mg of 1 chloropropyl)_3_(2,6-difluorobenzoinyl)-1 [2-form-4-(difluorof-thio)phenyl]_3_methylurea was added to 1 ml of a solution of 1 dimethyl decylamine in 1 ml of dimethylamine (5 % aqueous solution). And 33 mg of potassium carbonate, the mixture was stirred at 6 rc for 2 hours. Ethyl acetate was added to the reaction mixture, which was washed with water and saturated aqueous sodium chloride. The organic layer was dried over anhydrous magnesium sulfate and evaporated. Concentration. The obtained residue was purified by preparative high-performance liquid chromatography (ethyl acetate) to obtain 丨76 mg of 1-(2,6-fluorobenzyl)-3-(3-dimethyl Aminopropyl)_3_[2_敦_4(trifluoromethylthio)phenyl]-1-indenyl urea (hereinafter referred to as the present compound (98)). This compound (98)

318750 253 200804250 h-NMRCDMSO-A，測量溫度：80〇C)3(Ppm): 155-1 67 (2H，m)，2.04 (6H，s)，2.18 (2H，t，J = 7.1 Hz)，2 99 (3H s) 3.68 (2H，t，J = 7.1 Hz)，7.08 (2H，t，J = 8·3 Hz)，7.38 (1H t，J = 8·2 Hz)，7·47-7·58 (2H，m)，7·69 (1H，dd，J = ΐ〇·2， 2.0 Hz) 5 然後將顯示製備例。所有「份數」皆為以重量計。 製備例1 各10份本化合物（1)至（98)溶解於35份二甲苯與35 份N，N-二甲基甲醯胺之混合物，14份聚氧伸乙基苯乙烯 基本基及6份十一烧基苯續酸J弓添加至其中。所得混合 物經徹底攪拌獲得10%乳液劑。 / 口 製備例2 於4份月桂基硫酸鈉、2份木質磺酸鈣、2〇份合成含 水氧化矽精細粉末及54矽藻土之混合物内加入各份本 a物（1)至（98)，混合物經徹底攪拌來獲得2〇%可濕性散 劑。 …、 製備例3 於各2份本化合物（1)至（98)内，加入丨份合成含水氧 化矽精細粉末、2份木質磺酸鈣、30份膨潤土及65份高嶺 合物經徹底攪拌。然後於所得混合物内加入適量水， 混合物進一步經攪拌，以造粒機造粒，及強制風乾，猂得 顆粒劑。 、 製備例4 ;適星丙酮溶解各1份本化合物（1)至（98)，於溶液内 254 318750 200804250 加入5份合成含水氧化矽精細粉末，0.3份PAP及93.7份 夫巴沙米（fubasami)黏土，混合物經徹底攪拌，接著藉蒸發 去除丙酮，獲得1%散劑。 製備例5 各10份本化合物（1)至（98)，35份含50份聚氡伸乙基 烧基鍵硫酸錢鹽之白碳及5 5份水之混合物藉濕磨法精細 研磨，獲得10%可流動性調配物。 製備例6 各0.1份本化合物（1)至（98)溶解於5份二曱苯及5份 三氣乙烷，溶液與89·9份脫臭煤油混合，獲得0.1%油劑。 製備例7 各10毫克本化合物（1)至（98)溶解於0.5毫升丙酮。溶 液與5克固體動物飼料粉（養育及育種固體飼料粉CE-2， 曰本CLEA公司製造）均勻混合’然後藉蒸發去除丙酮而乾 燥，獲得毒餌。 然後，下列試驗例顯示本發明係有效於控制害蟲。 試驗例1-a 各10份本化合物（1)至（6)、（8)至（11)、（16)至（25)、 (27)、（29)至（34)、（37)至（53)、（56)、（58)、（59)、（61)至（73)、 (75)、（76)、（78)、（80)、（87)、（89)至（92)、（95)、（96)、（97) 及（98); 35份含50份聚氧伸乙基烷基醚硫酸銨鹽之白碳及 55份水經混合，藉濕磨法精細研磨獲得10%可流動性調配 物。所得可流動性調配物以水稀釋，使得活性成分濃度變 成500 ppm以製備試驗用喷霧溶液。 255 318750 200804250 甘藍菜栽種於聚乙烯杯内，生長至發育出第三真葉或 第四真葉。如前述製備之試驗用喷霧溶液以20毫升/杯之 比率喷灑於甘藍菜上。 於喷灑於甘藍菜上的殺蟲劑溶液乾燥後，去除根部， 將甘藍菜連同5隻菱背巢蛾之二齡幼蟲一起置於100毫升 容量的聚乙烯杯内，於25°C儲存。5日後，計算死亡的菱 背巢蛾數目，害蟲死亡率係以下式計算： 害蟲死亡率（％)=(死亡害蟲數目/試驗害蟲數目）xl00 結果，於使用本化合物（1)至（6)、（8)至（11)、（16)至 (25)、（27)、（29)至（34)、（37)至（53)、（56)、（58)、（59)、（61) 至（73)、（75)、（76)、（78)、（80)、（87)、（89)至（92)、（95)、 (96)、（97)及（98)之試驗喷霧溶液處理區，顯現100%控制 數值。 試驗例1 - b 各 30 毫克本化合物（13)、（14)、（15)、（35)、（36)、（54)、 (55)、（74)、（81)、（82)及（83)溶解於 0.1 毫升二曱苯與 N，N-二甲基甲醯胺之混合物（混合體積比；二曱苯：N，N-二曱基 甲醯胺= 1:1)，又加入0.1毫升二甲苯與索波（Solpol) 3005X(東邦化學工業公司（Toho Chemical Industry Co.， Ltd.)製造）之混合物（混合體積比；二曱苯：索波3005X = 1:9)，混合物以離子交換水稀釋，使得活性成分濃度變成 預定濃度，以製備試驗化合物試驗用之殺蟲劑溶液。於第 四葉期的甘藍菜（Brassicae oleracea)上喷灑20毫升殺蟲劑 溶液。於殺蟲劑溶液乾燥後，連同10隻菱背巢蛾之三齡幼 256 318750 200804250 蟲一起置於容量為400毫升之聚乙烯杯内，於25t：儲存。 5曰後’計算死亡的菱背巢蛾數目，害蟲死亡率係以下式 計算： 害蟲死亡率（％)=(死亡害蟲數目/試驗害蟲數目）xl00 結果，本化合物（13)**、（14)**、（15)**、（35)**、（36)、 (54)、（55)*、（74)、（81)、（82)及（83)分別顯現 80%或更高 的害蟲死亡率。 * :試驗濃度12.5 ppm :試驗濃度50 ppm 其它化合物之試驗濃度為200 ppm。 試驗例2 各 2.5 毫克本化合物（1)至（4)、（8)、（1〇)、（11)、（13)、 (14)、（15)、（17)、（21)、（22)、（27)、（29)至（33)、（35)、（38)、 (41)、（42)、（43)、（44)、（45)、（46)、（48)、（49)及（72)溶 解於0·25毫升索爾根（Solgen) TW-20(第一工業製藥公司製 造）與丙酮之混合物（混合體積比；索爾根TW-20 :丙酮= 1:19)。此混合物以離子交換水稀釋，使得活性成分濃度變 成預定濃度，以製備試驗化合物之試驗用殺蟲劑溶液。於 第四葉期的甘藍菜根部以自來水洗滌去除土壤，然後浸泡 於試驗用殺蟲劑溶液内。根部浸泡5日後，取出根部，葉 和莖置於杯（體積180毫升）内。於杯内放出1〇隻菱背巢蛾 之二齡幼蟲，杯於24°C存放。5日後，計算死亡害蟲數目， 害蟲死亡率以下式計算： 害蟲死亡率（％)=(死亡害蟲數目/試驗害蟲數目）xl〇〇 257 318750 200804250 結果，本化合物（1)至（4)、（8)、（10)、（11)、（13)**、 (14)**、（15)**、（17)*、（21)、（22)、（27)**、（29)至（33)、 (35)、（38)、（41)、（42)**、（43)**、（44)、（45)**、（46)、 (48)、（49)**及（72)各自顯現1〇〇%害蟲死亡率。 * :試驗濃度1 ppm :試驗濃度5 ppm 其它化合物之試驗濃度為25 ppm。 試驗例3 各 10 份本化合物（1)至（15)、（17)至（28)、（30)至（32)、 (34)、（35)、（37)至（53)、（56)至（68)、（70)、（71)、（73)、（74)、 (76)、（80)至（84)、（85)、（87)至（92)及（95)，35 份含 50 份 聚氧伸乙基烷基醚硫酸銨鹽之白碳及55份水經混合，藉濕 磨法精細研磨以獲得調配物。所得調配物以水稀釋，使得 活性成分濃度變成500 ppm以製備試驗用殺蟲劑溶液。於 直徑5.5厘米之聚乙烯杯底部放置直徑5.5厘米之濾紙， 於其上鋪設殷舍塔（Insecta) LF(日本農工公司（Nippon Agriculture Industries，Co·，Ltd·))切成厚 6 毫米之長條然後 對半切者’於其中加入2毫升前述試驗用殺蟲劑溶液。於 風乾後，釋放5隻斜紋葉蛾之四齡幼蟲於杯中，將杯加蓋， 然後杯子存放於25°C。6日後計算死亡的害蟲數目，害蟲 死亡率係以下式計算： 告蟲死亡率（^)=(死亡害蟲數目/試驗害蟲數目）xl〇〇 結果，本化合物（1)至（15)、（17)至（28)、（30)至（32)、 (34)、（35)、（37)至（53)、（56)至（68)、（70)、（71)、（73)、（74)、 258 318750 200804250 (76)、（80)至（85)、（87)至（92)及（95)，各自顯現80%或更高 之告蟲死亡率。 試驗例4 各 10 份本化合物（1)、（2)、（3)、（4)、（10)、（14)、（15)、 (17)、（18)、（19)、（20)、（21)、（22)、（27)、（29)、（30)、（31)、 (32)、（37)、（39)、（40)、（41)至（50)、（51)、（53)、（61)、（62)、 (69)、（70)、（71)、（76)、（80)、（81)、（89)、（90)及(92)， 35份含50份聚氧伸乙基烷基醚硫酸銨鹽之白碳及55份水 經混合’藉濕磨法精細研磨以獲得調配物。所得調配物以 水稀釋，使得活性成分濃度變成預定濃度以製備試驗用喷 務/谷液。小黃瓜栽種於聚乙稀杯中，生長至發育第一真葉 為止。如前述製備的試驗用喷霧溶液以2〇毫升/杯之用量 比率喷壤料黃瓜上。於噴肢小黃瓜上的殺蟲劑溶液乾 燥後，切下第一真葉，然後置於聚乙烯杯（直徑·· ιι〇毫米） 中=含水濾紙（直徑：70毫米）上。於小黃瓜葉上釋放3〇 隻：柑橘薊馬幼蟲，將聚乙烯杯加蓋。喷灑7曰後，計算 小黃瓜葉上存活的害蟲數目，由下式算出控制數值. 控制數值i -(Cb X Tai)/(Cai χ Tb)} χ! 〇〇 其中各符號具有下列意義：318750 253 200804250 h-NMRCDMSO-A, measured temperature: 80 〇C) 3 (Ppm): 155-1 67 (2H, m), 2.04 (6H, s), 2.18 (2H, t, J = 7.1 Hz), 2 99 (3H s) 3.68 (2H, t, J = 7.1 Hz), 7.08 (2H, t, J = 8·3 Hz), 7.38 (1H t, J = 8·2 Hz), 7·47-7 · 58 (2H, m), 7·69 (1H, dd, J = ΐ〇·2, 2.0 Hz) 5 The preparation example will then be shown. All "parts" are by weight. Preparation Example 1 10 parts of the present compound (1) to (98) were dissolved in a mixture of 35 parts of xylene and 35 parts of N,N-dimethylformamide, 14 parts of polyoxyethylidene base and 6 The eleven-burning benzoic acid J-bow was added thereto. The resulting mixture was thoroughly stirred to obtain a 10% emulsion. / mouth preparation example 2 is added to each of the contents (1) to (98) in a mixture of 4 parts of sodium lauryl sulfate, 2 parts of calcium lignin sulfonate, 2 parts of synthetic aqueous cerium oxide fine powder and 54 diatomaceous earth. The mixture was thoroughly stirred to obtain 2% wettable powder. Preparation Example 3 In each of the two parts of the present compound (1) to (98), a hydrazine synthetic aqueous cerium oxide fine powder, 2 parts of calcium lignin sulfonate, 30 parts of bentonite, and 65 parts of kaolin were thoroughly stirred. Then, an appropriate amount of water was added to the resulting mixture, and the mixture was further stirred, granulated by a granulator, and forced to air dry to obtain granules. Preparation Example 4; Dissolve 1 part of the present compound (1) to (98) in a solution of acetone, add 5 parts of synthetic aqueous cerium oxide fine powder, 0.3 parts of PAP and 93.7 parts of fubasami in solution 254 318750 200804250 Clay, the mixture was thoroughly stirred, and then acetone was removed by evaporation to obtain a 1% powder. Preparation Example 5 Each of 10 parts of the present compound (1) to (98), 35 parts of a mixture containing 50 parts of polyethyl fluorene ethyl acesulfate sulphuric acid salt and 5 5 parts of water was finely ground by wet grinding. 10% flowability formulation. Preparation Example 6 Each of 0.1 parts of the present compound (1) to (98) was dissolved in 5 parts of diphenylbenzene and 5 parts of tri-ethane, and the solution was mixed with 89·9 parts of deodorized kerosene to obtain a 0.1% oil. Preparation Example 7 10 mg of each of the present compounds (1) to (98) was dissolved in 0.5 ml of acetone. The solution was uniformly mixed with 5 g of solid animal feed powder (nurturing and breeding solid feed powder CE-2, manufactured by CL本 CLEA), and then dried by evaporation to remove the acetone to obtain a poison bait. Then, the following test examples show that the present invention is effective for controlling pests. Test Example 1-a Each of 10 parts of the present compounds (1) to (6), (8) to (11), (16) to (25), (27), (29) to (34), (37) to (53), (56), (58), (59), (61) to (73), (75), (76), (78), (80), (87), (89) to (92) ), (95), (96), (97) and (98); 35 parts of white carbon containing 50 parts of polyoxyethylene ethyl ether sulfate ammonium salt and 55 parts of water are mixed and finely ground by wet grinding A 10% flowability formulation was obtained. The resulting flowable formulation was diluted with water so that the active ingredient concentration became 500 ppm to prepare a test spray solution. 255 318750 200804250 Cabbage is grown in a polyethylene cup and grown to develop a third true leaf or a fourth true leaf. The test spray solution prepared as described above was sprayed on cabbage cabbage at a ratio of 20 ml/cup. After the insecticide solution sprayed on the cabbage was dried, the roots were removed, and the cabbage was placed in a 100 ml-capacity polyethylene cup together with the second instar larvae of the rhododendron, and stored at 25 °C. After 5 days, the number of dead diamondback moths was calculated, and the pest mortality rate was calculated as follows: Pest mortality rate (%) = (number of dead pests / number of test pests) xl00 Results, using the compounds (1) to (6) , (8) to (11), (16) to (25), (27), (29) to (34), (37) to (53), (56), (58), (59), 61) to (73), (75), (76), (78), (80), (87), (89) to (92), (95), (96), (97) and (98) The test spray solution treatment zone showed a 100% control value. Test Example 1 - b 30 mg of each of the compounds (13), (14), (15), (35), (36), (54), (55), (74), (81), (82) and (83) dissolved in 0.1 ml of a mixture of diphenylbenzene and N,N-dimethylformamide (mixed volume ratio; diphenylbenzene: N,N-dimercaptocarbamide = 1:1), added a mixture of 0.1 ml of xylene and Solpol 3005X (manufactured by Toho Chemical Industry Co., Ltd.) (mixed volume ratio; diphenylbenzene: Sopo 3005X = 1:9), the mixture The ion-exchanged water is diluted so that the concentration of the active ingredient becomes a predetermined concentration to prepare a pesticide solution for testing the test compound. Spray 20 ml of the pesticide solution on the Brassicae oleracea in the fourth leaf stage. After the insecticide solution was dried, it was placed in a 400 ml polyethylene cup together with 10 third-instar 256 318750 200804250 insects of the rhododendron moth, and stored at 25t: After 5曰' calculation of the number of dead diamondback moths, the pest mortality rate is calculated as follows: pest mortality (%) = (number of dead pests / number of test pests) xl00 result, the present compound (13)**, (14 )**, (15)**, (35)**, (36), (54), (55)*, (74), (81), (82), and (83) respectively appear 80% or more High pest mortality. * : Test concentration 12.5 ppm: Test concentration 50 ppm The test concentration of other compounds is 200 ppm. Test Example 2 Each 2.5 mg of the present compound (1) to (4), (8), (1〇), (11), (13), (14), (15), (17), (21), 22), (27), (29) to (33), (35), (38), (41), (42), (43), (44), (45), (46), (48) , (49) and (72) dissolved in 0. 25 ml Solgen TW-20 (manufactured by First Industrial Pharmaceutical Co., Ltd.) and acetone mixture (mixing volume ratio; Solgen TW-20: acetone = 1 :19). This mixture was diluted with ion-exchanged water so that the concentration of the active ingredient became a predetermined concentration to prepare a test insecticide solution of the test compound. The roots of the cabbage in the fourth leaf stage are washed with tap water to remove the soil, and then immersed in the test insecticide solution. After 5 days of root soaking, the roots were removed and the leaves and stems were placed in a cup (180 ml volume). A second instar larva of the rhododendron moth was released in the cup, and the cup was stored at 24 °C. After 5 days, the number of dead pests was calculated, and the pest mortality rate was calculated by the following formula: Pest mortality rate (%) = (number of dead pests / number of test pests) xl 〇〇 257 318750 200804250 As a result, the present compounds (1) to (4), 8), (10), (11), (13) **, (14) **, (15) **, (17) *, (21), (22), (27) **, (29 ) to (33), (35), (38), (41), (42) **, (43) **, (44), (45) **, (46), (48), (49 ** and (72) each showed 1% mortality rate. * : Test concentration 1 ppm: Test concentration 5 ppm The test concentration of other compounds is 25 ppm. Test Example 3 10 parts of the present compounds (1) to (15), (17) to (28), (30) to (32), (34), (35), (37) to (53), (56) ) to (68), (70), (71), (73), (74), (76), (80) to (84), (85), (87) to (92), and (95), 35 parts of white carbon containing 50 parts of polyoxyethylene ethyl ether sulfate ammonium salt and 55 parts of water were mixed and finely ground by wet grinding to obtain a formulation. The resulting formulation was diluted with water so that the active ingredient concentration became 500 ppm to prepare a test insecticide solution. A 5.5 cm diameter filter paper was placed at the bottom of a 5.5 cm diameter polyethylene cup, and an Insecta LF (Nippon Agriculture Industries, Co., Ltd.) was placed thereon to be cut to a thickness of 6 mm. The strip was then subjected to 2 ml of the aforementioned test insecticide solution to the half cut. After air drying, release the 4th instar larvae of the five moths in the cup, cover the cup, and store the cup at 25 °C. The number of dead pests was calculated after 6 days, and the pest mortality rate was calculated by the following formula: Falzing mortality (^) = (number of dead pests / number of test pests) x l 〇〇 results, the present compounds (1) to (15), (17 ) to (28), (30) to (32), (34), (35), (37) to (53), (56) to (68), (70), (71), (73), (74), 258 318750 200804250 (76), (80) to (85), (87) to (92) and (95) each exhibiting a mortality rate of 80% or higher. Test Example 4 10 parts of the present compound (1), (2), (3), (4), (10), (14), (15), (17), (18), (19), (20) ), (21), (22), (27), (29), (30), (31), (32), (37), (39), (40), (41) to (50), (51), (53), (61), (62), (69), (70), (71), (76), (80), (81), (89), (90), and (92) 35 parts of white carbon containing 50 parts of polyoxyethylene ethyl ether sulfate ammonium salt and 55 parts of water were mixed and finely ground by wet milling to obtain a formulation. The resulting formulation was diluted with water so that the concentration of the active ingredient became a predetermined concentration to prepare a test spray/trough solution. The cucumber is planted in a polyethylene cup and grown until the first true leaf is developed. The test spray solution prepared as described above was sprayed on the cucumber in a ratio of 2 ml/cup. After the insecticide solution on the sprayed cucumber was dried, the first true leaf was cut out and placed in a polyethylene cup (diameter · ιι〇 mm) = aqueous filter paper (diameter: 70 mm). Release 3 小 on the leaves of the cucumber. Only: Citrus pupa larvae, cover the polyethylene cup. After spraying 7曰, calculate the number of pests living on the leaves of the cucumber, and calculate the control value by the following formula. Control value i -(Cb X Tai)/(Cai χ Tb)} χ! 〇〇 Each symbol has the following meaning:

Cb •處理前於未處理區之害蟲數目 Cai :觀察時於未處理區之害蟲數目 Tb :處理前於處理區之害蟲數目 :觀察時於處理區之害蟲數目。 結果 ，於使用本化合物（1)、 318750 259 200804250 (15)、（17)*、（18)*、（19)*、p〇)*、（21)、（22)、（27)、（29)、 (30)、（31)、（32)、（37)*、（39)*、（40)*、（41)至（50)、（51)*、 (53)、（61)、（62)、（69)、（70)、（71)、（76)、（80)、（81)、（89)、 (90)及（92)之各試驗喷霧溶液，於處理區顯現loo%控制數 值。 * :試驗濃度12.5 ppm 其它本化合物之試驗濃度為50 ppm。 試驗例5 本化合物（28) rW0&quot; ch2och2ch3 比較化合物（農業及食品化學期干](journal 0f Agricultural and Food Chemistry)(1973 年）21 卷（第 3 期）348-354 頁所述 化合物）Cb • Number of pests in the untreated area before treatment Cai: Number of pests in the untreated area at the time of observation Tb: Number of pests in the treated area before treatment: Number of pests in the treated area at the time of observation. As a result, the present compounds (1), 318750 259 200804250 (15), (17)*, (18)*, (19)*, p〇)*, (21), (22), (27), 29), (30), (31), (32), (37)*, (39)*, (40)*, (41) to (50), (51)*, (53), (61) , test spray solutions of (62), (69), (70), (71), (76), (80), (81), (89), (90) and (92) in the treatment zone The loo% control value is displayed. * : Test concentration 12.5 ppm Other test concentrations of this compound are 50 ppm. Test Example 5 This compound (28) rW0&quot; ch2och2ch3 Comparative Compound (Journal 0f Agricultural and Food Chemistry) (1973), Volume 21 (No. 3), pp. 348-354, Compound)

各40毫克本化合物（28)及比較化合物溶解於〇·ι毫升 二曱苯與Ν，Ν-二曱基曱醯胺之混合物（混合體積比；二曱 本· Ν，Ν-.一曱基甲月女一 L1)’於其中又加入0.1毫升之二 甲苯與索波3005X (註冊商標，東邦化學工業公司製造）之 混合物（混合體積比；二甲苯：索波3〇〇5X= 1:9)。各混合 物以離子交換水稀釋至12.5 ppm以製備試驗化合物之試 260 318750 200804250 驗用殺蟲劑溶液。對第五葉期的甘藍菜（Bras sic ae o ler ace a) 以20毫升/杯之用量比率喷灑殺蟲劑溶液。於殺蟲劑溶液 乾燥後，甘藍菜連同10隻斜紋夜蛾之四齡幼蟲一起放置於 容量400毫升的聚乙烯杯内，存放於25°C。5日後，計算 死亡的害蟲數目，害蟲死亡率係以下式計算： 害蟲死亡率（％)=(死亡害蟲數目/試驗害蟲數目）χ100 結果，本化合物（28)顯現100%害蟲死亡率。另一方 面，比較化合物具有0%害蟲死亡率。 試驗例6 本化合物（28)Each 40 mg of the present compound (28) and the comparative compound are dissolved in a mixture of 〇·1 ml of diphenylbenzene and hydrazine-fluorenyl-nonyl decylamine (mixed volume ratio; bismuth Ν, Ν-. A month's female L1)' is a mixture of 0.1 ml of xylene and Sopo 3005X (registered trademark, manufactured by Toho Chemical Industry Co., Ltd.) (mixing volume ratio; xylene: sobo 3〇〇5X = 1:9) ). Each mixture was diluted to 12.5 ppm with ion-exchanged water to prepare a test compound. 260 318750 200804250 The test insecticide solution. The insecticide solution was sprayed at a ratio of 20 ml/cup to the cabbage of the fifth leaf stage (Bras sic ae o ler ace a). After the insecticide solution was dried, the cabbage was placed in a 400 ml polyethylene cup together with 10 fourth instar larvae of Spodoptera litura and stored at 25 °C. After 5 days, the number of dead pests was counted, and the pest mortality rate was calculated by the following formula: Pest mortality rate (%) = (number of dead pests / number of test pests) χ 100 As a result, the present compound (28) showed 100% pest mortality. On the other hand, the comparative compounds have a 0% pest mortality rate. Test Example 6 This compound (28)

比較化合物（農業及食品化學期刊（1973年）21卷（第3 期）348-354頁所述化合物）Comparative Compounds (Compounds of the Journal of Agriculture and Food Chemistry (1973), Vol. 21 (No. 3), pp. 348-354)

各5毫克本化合物（28)及比較化合物溶解於0.5毫升 索爾根TW-20(第一工業製藥公司製造）與丙酮之混合液（混 合體積比；索爾根TW-20 ··丙酮=1:19)，以離子交換水稀 釋成3毫升來製備試驗化合物之試驗用殺蟲劑溶液。殺蟲 劑溶液灌注於甘藍菜小苗之根部土壤表面，該甘藍菜小苗 已於植物細胞小苗生長盤内生長至第2.5葉期。處理5日 261 318750 200804250 後，去除根部，莖葉部連同10隻斜紋夜蛾之二齡 — 放置於聚乙烯杯（容量180毫升）内，於24。〇存放·蛾起 计异死亡害蟲數目，害蟲死亡率以下式計算： ·後 害蟲死亡率（％)=(死亡害蟲數目/試驗害蟲數目）侧 結果，本化合物（28)顯現1〇〇〇/。害蟲死亡率。另一 面’比較化合物具有〇%害蟲死亡率。 試驗例7 本化合物（7)5 mg of the compound (28) and the comparative compound were dissolved in a mixture of 0.5 ml of Solgen TW-20 (manufactured by Daiichi Kogyo Co., Ltd.) and acetone (mixed volume ratio; Solgen TW-20 ··acetone=1) :19) A test insecticide solution of the test compound was prepared by diluting to 3 ml with ion-exchanged water. The insecticide solution is infused into the soil surface of the root of the cabbage seedling, and the cabbage seedling has been grown in the growth stage of the plant cell seedling to the 2.5th leaf stage. After treatment on the 5th day 261 318750 200804250, remove the roots, stems and leaves together with the second age of 10 Spodoptera litura - placed in a polyethylene cup (capacity 180 ml), at 24. 〇 · · 蛾 蛾 蛾 蛾 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , 害 害 害 害 害 害 害 害 害 害 害 害 害 害 害. Pest mortality rate. On the other hand, the comparative compound has a 害% pest mortality rate. Test Example 7 This compound (7)

本化合物（26；)The present compound (26;)

比較化合物（US 3933908所述化合物）Comparative compound (compound described in US 3933908)

f 2·5笔克本化合物（7)及（26)及比較化合物溶解於 =•25毫升索爾根Tw_2()(第一工業製藥公司製造）與丙酉同之 此，液内（混合體積比；索爾根twjo :丙酮=1:19)，且 、離子又換水稀釋成預定濃度（5 ppm)，以製備試驗化合物 之試驗用殺蟲劑溶液。於第四真葉期的甘藍菜根部以自來 2 = 1去除土壤，然後根部浸泡於試驗用殺蟲劑溶液。根 又心5日後，去除根部，葉和莖置於杯子内（容量18〇亳 318750 262 200804250 升）。於杯中釋放i 〇隻斜紋夜蛾之二齡幼蟲，杯子存放於 24°C。5曰後，計算死亡的害蟲數目，害蟲死亡率係以下 式計算： 害蟲死亡率（％)=(死亡害蟲數目/試驗害蟲數目）χ100 結果，本化合物（7)及（26)顯現100%害蟲死亡率。另一 方面，比較化合物具有0%害蟲死亡率。 試驗例8 本化合物（1)f 2·5 peng of the compound (7) and (26) and the comparative compound dissolved in =•25 ml of Solgen Tw_2 () (manufactured by First Industrial Pharmaceutical Co., Ltd.) and the same as in the case of in-liquid (mixed volume) Ratio; Solgen twjo: acetone = 1:19), and the ions were diluted with water to a predetermined concentration (5 ppm) to prepare a test insecticide solution for the test compound. The roots of the cabbage in the fourth true leaf stage were removed from the roots 2 = 1 and the roots were immersed in the test insecticide solution. After 5 days, the roots were removed and the leaves and stems were placed in a cup (capacity 18 〇亳 318750 262 200804250 liters). The second instar larvae of the genus Spodoptera litura were released in the cup and the cup was stored at 24 °C. After 5曰, the number of dead pests was calculated, and the pest mortality rate was calculated as follows: Pest mortality rate (%) = (number of dead pests / number of test pests) χ 100 As a result, the present compounds (7) and (26) showed 100% pests. mortality rate. On the other hand, the comparative compounds have a 0% pest mortality rate. Test Example 8 This compound (1)

本化合物（8)The present compound (8)

本化合物（17)The present compound (17)

本化合物（29)Present Compound (29)

本化合物（37)Present Compound (37)

比較化合物A(JP 57-126460Α所述化合物） 263 318750 200804250Comparative Compound A (JP 57-126460Α) 263 318750 200804250

比較化合物B(US 2005-0159599 A1所述化合物）Comparative Compound B (compound described in US 2005-0159599 A1)

比較化合物C(EP277748所述化合物）Comparative Compound C (compound described in EP277748)

各2.5毫克本化合物（1)、（8)、（17)、（29)及（37)及比較 化合物A、B及C溶解於0·25毫升索爾根TW-20(第一工 業製藥公司製造）與丙酮之混合液内（混合體積比；索爾根 TW-20:丙酮= 1:19)，且以離子交換水稀釋成預定濃度（25 Ppm)，以製備試驗化合物之試驗用殺蟲劑溶液。於第四真 葉期的甘藍菜根部以自來水洗務去除土壤，然後根部浸泡 於試驗用殺蟲劑溶液。根部浸泡5日後，去除根部，葉和 莖置於杯子内（容量180毫升）。於杯中釋放1〇隻菱背巢域 之二齡幼蟲’杯子存放於24°C。5日後，計算死亡的宝蟲 數目，害蟲死亡率係以下式計算： 害蟲死亡率（％)=(死亡害蟲數目/試驗害蟲數目）χΐ〇〇 結果，本化合物（1)、（8)、（17)、（29)及（37)分別顯現 100%害蟲死亡率。另一方面，比較化合物Α具右虫、 /、β σ蟲死亡 318750 264 200804250 率5%，比較化合物B及C具有害蟲死亡率0%。 試驗例9 直徑33毫米的濾紙（1026號，東洋濾紙公司（Toyo Filter Paper，Co·，Ltd.)製造）使用滴量管以10毫克/毫升本 化合物（1)或（29)之丙酮溶液（1毫升）處理，於室溫乾燥。隨 後，所得濾紙稱作濾紙辦。 4%瓊脂糖倒入直徑9厘米之塑膠培養瓜内，獲得約5 毫米厚度，於室溫靜置固化。於固化後的瓊脂製作直徑35 毫米之圓孔（後文稱作孔）。每孔内放置一個濾紙餌。然後 於前述培養皿内釋放20隻台灣家白蟻（Coptotermes formosanus)工蟻，將培養jni加蓋，以封口膜（parafilm)密 封。於暗處儲存6週後將培養孤開啟。觀察培養ϋϋ中的存 活及死亡台灣家白蟻數目來計算控制率。結果，本化合物 (1)及（29)顯現100%控制率。 (產業利用性） 本發明之苯曱醯脲化合物具有對抗蟲害之絕佳防治功 效0 265 3187502.5 mg of each of the compounds (1), (8), (17), (29) and (37) and comparative compounds A, B and C dissolved in 0. 25 ml of Solgen TW-20 (First Industrial Pharmaceutical Company) Manufactured in a mixture with acetone (mixed volume ratio; Solgen TW-20: acetone = 1:19), and diluted to a predetermined concentration (25 Ppm) with ion-exchanged water to prepare a test compound for insecticidal use Solution solution. The roots of the cabbage in the fourth true leaf stage were washed with tap water to remove the soil, and then the roots were immersed in the test insecticide solution. After 5 days of root soaking, the roots were removed and the leaves and stems were placed in a cup (180 ml capacity). One cup of the second instar larvae released in the cup was stored at 24 °C. After 5 days, the number of dead worms was calculated, and the pest mortality rate was calculated as follows: Pest mortality rate (%) = (number of dead pests / number of test pests) χΐ〇〇 Result, the present compound (1), (8), 17), (29) and (37) respectively showed 100% pest mortality. On the other hand, the comparative compound had the right worm, /, β σ worm death 318750 264 200804250 rate 5%, and the comparison compounds B and C had a pest mortality rate of 0%. Test Example 9 A filter paper having a diameter of 33 mm (manufactured by Toyo Filter Paper Co., Ltd.) was used as a 10 mg/ml acetone solution of the present compound (1) or (29) using a dropping tube ( 1 ml) was treated and dried at room temperature. The resulting filter paper is then referred to as a filter paper. 4% agarose was poured into a plastic cultured melon having a diameter of 9 cm to obtain a thickness of about 5 mm, and allowed to stand at room temperature for solidification. A round hole (hereinafter referred to as a hole) having a diameter of 35 mm was formed on the solidified agar. Place a filter paper bait in each hole. Then, 20 domestic termites (Coptotermes formosanus) were released from the culture dish, and the culture jni was capped and sealed with a parafilm. The culture was opened in the dark for 6 weeks. The control rate was calculated by observing the survival of the sputum and the number of dead termites in Taiwan. As a result, the present compounds (1) and (29) exhibited a 100% control rate. (Industrial Applicability) The benzoquinone compound of the present invention has an excellent control effect against insect pests 0 265 318750

Claims (1)

200804250 十、申請專利範圍： 1. 一種由下式（I)表示之苯曱醯脲化合物或其鹽：200804250 X. Patent application scope: 1. A benzoquinone compound represented by the following formula (I) or a salt thereof: 式中， X及Y各自獨立地表示氧原子或硫原子， R1表示氫原子， 曱醯基， 氰基， 視需要經一個或多個取代基取代之低碳烷基磺醯基， 視需要經一個或多個取代基取代之芳基磺醯基， 視需要經一個或多個取代基取代之低碳烷基羰基硫基， 視需要經一個或多個取代基取代之低碳烷氧基羰基硫 基， 視需要經一個或多個取代基取代之芳氧基羰基硫基， 視需要經一個或多個取代基取代之一-或二-(低碳烷基） 胺基續酸基’ 視需要經一個或多個取代基取代之一-或二-芳基胺基磺 酷基， 視需要經一個或多個取代基取代之低碳烷基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之低碳環烷基， 266 318750 200804250 視需要經一個或多個取代基取代之芳基低碳烷基， 視需要經一個或多個取代基取代之芳基， 視需要經一個或多個取代基取代之低碳烷氧基低碳烷 基， 視需要經一個或多個取代基取代之芳氧基低碳烷基， 視需要經一個或多個取代基取代之低碳烷硫基低碳烷 基， 視需要經一個或多個取代基取代之低碳烷基亞磺醯基 低碳烧基， 視需要經一個或多個取代基取代之低碳烷基磺醯基低 碳烷基， 視需要經一個或多個取代基取代之一-或二-(低碳烷基） 胺基低碳烷基， 視需要經一個或多個取代基取代之低碳烷醯基， 視需要經一個或多個取代基取代之低碳烷氧羰基， 視需要經一個或多個取代基取代之芳氧羰基， 視需要經一個或多個取代基取代之芳基低碳烷氧羰基， 視需要經一個或多個取代基取代之胺基曱醯基， 視需要經一個或多個取代基取代之胺硫曱醯基， 視需要經一個或多個取代基取代之低碳烷氧基草醯基， 視需要經一個或多個取代基取代之芳基低碳烷氧基草 醢基， 視需要經一個或多個取代基取代之芳氧基草醯基， 視需要經一個或多個取代基取代之胺基草醯基， 267 318750 200804250 視需要經一個或多個取代基取代之低碳烷氧基， 視需要經一個或多個取代基取代之芳氧基， 視需要經一個或多個取代基取代之芳基低碳烷氧基， 視需要經一個或多個取代基取代之胺基，或 視需要經一個或多個取代基取代之雜環基， R2表示視需要經一個或多個鹵原子取代之低石炭伸 烧基， A表示· (1) OR3表示之基團 (其中R3表示視需要經一個或多個取代基取代之C1-C3 烧基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳块基， 視需要經一個或多個取代基取代之低碳烷醯基， 視需要經一個或多個取代基取代之芳基，或 視需要經一個或多個取代基取代之芳基低碳烷基）， (2) S(0)nR4表示之基團 (其中R4表示視需要經一個或多個取代基取代之C卜C3 燒基’ 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之芳基，或 視需要經一個或多個取代基取代之芳基低碳烷基，及 η表示0、1或2之整數），或 268 318750 200804250 (3) NR5R6表示之基團 (其中R5及R6各自獨立地表示 視需要經-個或多個取代基取代之ci_c3烧基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經-個或多個取代基取代之低碳块基， 視需要經一個或多個取代基取代之芳基， 視需要經-個或多個取代基取代之芳基低碳院基， 與Rm端共同結合來與氮原子共同形成視需 -。另個氮^子、氧原子或硫原子作為環組成原子 之3員至7員含氮雜環）， R表不鹵原子， 确基， 乱基， 視需要經-個或多個齒原子取代之芳基低碳烧氧基， 視需要經一個或多個齒原子取代之低碳烧酿基， 視需要經一個或多個_原子取代之低碳烧氧幾基， 視需要經一個或多個原子取代之芳基， 視需要經-個或多㈣原子取代之芳基低魏氧幾基， 視需要經一個或多個自原子取代之芳基胺基曱醯基， 視需要經一個或多個低碳烷基取代之胺基曱醯基， 視需要經一個或多個低碳烷基取代之胺硫甲醯基， 視需要經一個或多個低碳烷基取代之胺基， 視需要經一個或多個鹵原子取代之低碳烷基， 視需要經一個或多個鹵原子取代之低碳烷氧基， 318750 269 200804250 視需要經一個或多個鹵原子取代之低碳烷氧基低碳烷 氧基， 視需要經一個或多個it原子取代之低碳烯氧基， 視需要經一個或多個i原子取代之低碳炔氧基， 視需要經一個或多個原子取代之低碳烷醯基胺基， 視需要經一個或多個原子取代之低碳烧硫基， 視需要經一個或多個鹵原子取代之低碳烯硫基， 視需要經一個或多個鹵原子取代之低碳炔硫基， 視需要經一個或多個i原子取代之低碳烷基亞磺醯基， 視需要經一個或多個鹵原子取代之低碳烯基亞磺醯基， 視需要經一個或多個鹵原子取代之低碳炔基亞磺醯基， 視需要經一個或多個齒原子取代之低碳烷基磺醯基， 視需要經一個或多個原子取代之低碳烯基磺醯基， 視需要經一個或多個鹵原子取代之低碳炔基磺醯基， 視需要可經以一個或多個自原子取代之低碳烷氧基低 喊烧硫基，或 -G-E表示之基團 (其中G表示氧原子、硫原子、s〇或s〇2，以及 E表示芳基或雜環基，且該芳基或該雜芳基可經一 個或多個選自於下列基團所組成之組群之取代基取 代.（1)鹵原子，（2)視需要經一個或多個鹵原子取代之 ，碳烧基，（3)視需要經_個或多個自原子取代之低碳烧 氧基，（4)視需要經一個或多個_原子取代之低碳烷硫 基’（5)視需要經—個或多㈣原子取代之低碳烧基亞石黃 318750 270 200804250 醯基，（6)視需要經一個或多個ii原子取代之低碳烷基磺 醯基，（7)氰基，及（8)硝基），以及 Q表示視需要给一個或多個取代基取代之芳基，或 視需要經一個或多個取代基取代之雜環基， m表示1至5之整數（限制條件為當m為2至5之 整數時，各個R7可相同或相異）。 2 ·如申請專利範圍第1項之苯曱酿脲化合物， 其中R7為鹵原子， 視需要經一個或多個鹵原子取代之低碳烷氧羰基， 視需要經一個或多個鹵原子取代之低碳燒基， 視需要經一個或多個虐原子取代之低碳烷氧基，， 視需要經一個或多個鹵原子取代之低碳烷氧基低碳烷 氧基， 視需要經一個或多個A原子取代之低碳烷氧基低碳烷 硫基’ 視需要經一個或多個_原子取代之低碳稀氧基， 視需要經一個或多個齒原子取代之低碳炔氧基， 視需要經一個或多個i原子取代之低碳烷硫基， 視需要經一個或多個鹵原子取代之低碳烯硫基， 視需要經一個或多個鹵原子取代之低碳炔硫基， 視需要經一個或多個幽原子取代之低碳烷基亞磺醯基， 視需要經一個或多個i原子取代之低碳烯基亞磺醯基， 視需要經一個或多個鹵原子取代之低碳炔基亞磺醯基， 視需要經一個或多個齒原子取代之低碳烷基磺醯基， 318750 271 200804250 視需要經一個或多個齒原子取代之低碳烯基磺醯基， 視需要經一個或多個鹵原子取代之低碳炔基磺醯基，或 -G-E表示之基團 (其中G為氧原子、硫原子、s〇或s〇2，以及 E表不芳基或雜環基，且該芳基或該雜芳基可經一 個或多個選自於下列基團所組成之組群之取代基取 代··（1)鹵原子，（2)視需要經一個或多個鹵原子取代之 低石反院基’（3)視需要經一個或多個鹵原子取代之低石炭烧 氧基’（4)視需要經一個或多個函原子取代之低碳烧硫 基，（5)視需要經一個或多個鹵原子取代之低碳烷基亞磺 醯基，（6)視需要經一個或多個齒原子取代之低碳烷基石黃 醯基，（7)氰基，及（8)硝基）。 3·如申請專利範圍第1項之苯曱醯脲化合物， 其中R1為氫原子， 視需要經一個或多個取代基取代之低碳烷基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之芳基低碳烷基， 視需要經一個或多個取代基取代之低碳烷氧基低碳烷 基， 視需要經一個或多個取代基取代之芳氧基低碳烷基， 視需要經一個或多個取代基取代之低碳烷醯基， 視需要經一個或多個取代基取代之低碳烷硫基低碳烷 基， 272 318750 200804250 視需要經-個或多個取代基取代之低碳烧基亞賴基 低碳烧基， 視需要經一個或多個取代基取代之低碳烷基磺醯基低 碳烧基’或 視需要經一個或多個取代基取代之一_或二_(低碳烷基） 胺基低碳：ί：完基。 4·如申4專利圍第1至3項中任—項之苯甲酸脲化合 物，其中R2為視需要經一個或多個鹵原子取代之ei_C4 伸烷基。 5.如申請專利範圍第丨項之苯甲醯脲化合物，其中X及γ 為氧原子，及 A為OR3表示之基團 (其中R3為視需要經一個或多個取代基取代之C1_C3烷 基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之低碳烷醯基，或 視需要經一個或多個取代基取代之芳基低碳烷基）。 6·如申請專利範圍第1至5項中任一項之苯曱醯脲化合 物’其中A為OR3表示之基團 (其中R3為視需要經一個或多個取代基取代之C1-C3烷 基， 視需要經一個或多個取代基取代之低碳烷醯基，或 視需要經一個或多個取代基取代之芳基低碳烧基）。 273 318750 200804250 7·如申請專利範圍第1項之苯甲醯脲化合物，其中χ及γ 為氧原子，及 Α為S(0)nR4表示之基團 (其中R4為視需要經一個或多個取代基取代之C1-C3烧 基， 視需要經一個或多個取代基取代之低礙烯基， 視需要經一個或多個取代基取代之低碳炔基，或 視需要經一個或多個取代基取代之芳基，及 η為〇至2之整數）。 8.如申請專利範圍第1項之苯曱醯脲化合物，其中χ及γ 為氧原子，及 Α為NR5R6表示之基團 (其中R5及R6各自獨立地為 視需要經一個或多個取代基取代之C1-C3烷基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之芳基，或 R5與R6於其末端共同結合來與氮原子共同形成視需要 具有另一個氮原子、氧原子或硫原子作為環組成原子之 3員至7員含氮雜環）。 9·如申请專利範圍第1至8項中任一項之苯甲醯脲化合 物其中Q為視需要經一個或多個選自下列所組成之組 群之取代基取代之苯基：（1)鹵原子，（2)視需要經一個 或多個鹵原子取代之低碳烷基，及（3)視需要經一個或多 274 318750 200804250 個鹵原子取代之低碳烷氧基，或 視需懸-個或多個選自下列所組成之組群之取代基 取代之芳香知單環雜環基：⑴函原子，（2)視需要經一 個或多個鹵原子取代之低碳烧基，及（3)視需要經一個或 多個鹵原子取代之低碳烷氧基。 1〇·如申凊專利範圍第1項之苯甲醯脲化合物，其中Q為經 個或夕個鹵原子取代之苯基，或經一個或多個鹵原子 取代之著香族單環雜環基。 11 ·如申凊專利範圍第1項之苯甲醯脲化合物，其中X及Y 為氧原子，及 R為氫原子， 視需要經一個或多個取代基取代之低碳烷基， 視需要經一個或多個取代基取代之低碳烯基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之芳基低碳烧基， 視需要經一個或多個取代基取代之低碳烷氧基低碳烷 基， 視需要經一個或多個取代基取代之芳氧基低碳烷基， 視需要經一個或多個取代基取代之低碳烷硫基低碳烷 基， 視需要經一個或多個取代基取代之低碳烷基亞磺醯基 低碳烷基， 視需要經一個或多個取代基取代之低碳烷基磺醯基低 碳烧基， 275 318750 200804250 視需要經一個或多個取代基取代之一_或二_(低碳烷基） 胺基低碳烧基，或 視需要經一個或多個取代基取代之低碳烷醯基， R為亞甲基、伸乙基或三亞甲基， A表示： (1) OR3表示之基團 (其中R3為視需要經一個或多個取代基取代之C卜c3烷 基， 視需要經一個或多個取代基取代之低碳燒酿基，或 視需要經—個或多個取代基取代之芳基低碳燒基）， (2) S(0)nR4表示之基團 (其中R4為視需要經一個或多個取代基取代之^烷 基，及 η為0至2之整數），或 (3) NR5R6表示之基團 (其中R及R6各自獨立地為視需要經一個 基取代之C1-C3烷基，或 戈 R及R6於其末端共同結合來與氮原子共同形成視 需要具ί另—個氮料、氧料或硫原子作為環組成原 子之3員至7員含氮雜環）， r7為鹵原子， 視需要經-個或多㈣原子取代之低碳炫氧幾基， 視需要經-個或多個由原子取代之低碳烧基， 視而要、、’：個或多個齒原子取代之低碳烧氧基， 318750 276 200804250 視需要經一個或多個南原子取代之低碳烷氧基低碳烷 氧基， 視需要經一個或多個||原子取代之低碳烷硫基， 視需要經一個或多個卣原子取代之低碳烯硫基， 視需要經一個或多個豳原子取代之低碳炔硫基， 視需要經一個或多個卣原子取代之低碳烷基亞磺醯基， 視需要經一個或多個鹵原子取代之低碳烯基亞磺醯基， 視需要經一個或多個齒原子取代之低碳烷基磺醯基， 視需要經一個或多個鹵原子取代之低碳烯基磺醯基， 視需要經一個或多個齒原子取代之低碳烷氧基低碳烷 硫基’或 -G-E表示之基團 (其中G為氧原子或硫原子，以及 E為視需要經-個或多個選自下列基團所組成之組群之 取代基取代之芳基或雜環基··（1)鹵原子，及（2)視需要 經一個或多個A原子取代之低碳烷基）， Q為2,6·二氟苯基、2-氯_6-氟苯基、2,6-二氯苯基、 3-氯吡啶-2-基、或3,5-二氯吡啶_4_基，及 m為1至4之整數（限制條件為當㈤為2至4之整 數時，各個R7可相同或相異）。 I2·如申凊專利範圍第1項之苯甲醯脲化合物，其中X及γ 為氧原子， R1為氫原子， 視需要經一個或多個取代基取代之低碳烷基， 318750 277 200804250 視需要經一個或多傭取代基取代之低碳浠基， 視需要經一個或多個取代基取代之低碳炔基， 視需要經一個或多個取代基取代之低碳烷氧基低碳烷 基， 視需要經一個或多個取代基取代之芳氧基低碳烷基， 視需要經一個或多個取代基取代之低碳烷硫基低碳烷 基， 視需要經一個或多個取代基取代之低碳烷基磺醯基低 碳烷基，或 視需要經一個或多個取代基取代之低碳烷醯基， R2為亞曱基、伸乙基或三亞曱基， A表不· (1) OR3表示之基團 (其中R3為視需要經一個或多個取代基取代之C1-C3烧 基， 視需要經一個或多個取代基取代之低碳烷醯基，或 視需要經一個或多個取代基取代之芳基低碳烷基）， (2) S(〇)nR4表示之基團 (其中R4為視需要經一個或多個取代基取代之C1_C3烧 基，及 η為〇至2之整數），或 (3) NR5R6表示之基團 (其中R5及R6各自獨立地為視需要經一個或多個取代 基取代之C1-C3烷基，或 278 318750 200804250 同形成視 環組成原 R及R6於其末端共同結合來與氮原子共 需要具有另—個氮原子、氧原子或硫原子作為 子之3員至7員含氮雜環）， R7為鹵原子， 視需要經一個或多個齒原子取代之低碳烷氧羰基， 視需要經—個或多個_原子取代之低碳燒基， 視需要經-個或多㈣原子取代之低碳烧氧基， 視需要經—㈣多個4原子取代之低碳烧氧基低碳烧 視需要經一個或多個鹵原子取代之低碳烷硫基， 視需要經一個或多個齒原子取代之低碳烯硫基， 視需要經一個或多個鹵原子取代之低碳炔硫基， 視需要經一個或多個_原子取代之低碳烷基亞磺醢基， 視需要經一個或多個齒原子取代之低碳烯基亞磺醯基， 視需要經一個或多個^原子取代之低碳烷基磺醯基， 視需要經一個或多個4原子取代之低碳烷氧基低碳烷 疏基，或 -G-E表示之基團 (其中G為氧原子或硫原子，以及 E為芳基或雜環基，且該芳基或雜環基可經一個或 夕個選自下列基團所組成之組群之取代基取代··（1)鹵原 子及（2)視需要經一個或多個鹵原子取代之低碳烧基）， Q為2,6-一鼠苯基、2 -氯-6-象苯基、2，6-二氯苯基、 3'氯&quot;比啶-2-基、或3,5-二氯吡啶-4-基，及 279 318750 200804250 數時 K 了相同或相異）。 13 · —種蟲害控制添丨 —其二為=專利範圍第1項之苯甲酿 14·種如中請專利範圍第1項之苯甲㈣化合物或其鹽 之用途，係用於蟲害防治。 ^ 15· 一種蟲害或植物寄生蟲害之防治方法，包含施用有效量 之如申請專利範圍第1項之苯曱醯脲化合物或其鹽至害 蛛或告蟲樓息地。 318750 280 200804250 七、指定代表圖：本案無圖式 (一） 本案指定代表圖為：第（）圖。 (二） 本代表圖之元件符號簡單說明： 八、本案若有化學式時，請揭示最能顯示發明特徵的化學式：Wherein X and Y each independently represent an oxygen atom or a sulfur atom, and R1 represents a hydrogen atom, a fluorenyl group, a cyano group, or a lower alkyl sulfonyl group substituted by one or more substituents, if necessary, An arylsulfonyl group substituted with one or more substituents, optionally a lower alkylcarbonylthio group substituted with one or more substituents, optionally a lower alkoxycarbonyl group substituted with one or more substituents a thiol group, optionally substituted with one or more substituents, an aryloxycarbonylthio group, optionally substituted with one or more substituents, one or a di-(lower alkyl)amino group, an acid group Substituting one or more substituents for a one- or di-arylaminosulfonyl group, optionally a lower alkyl group substituted with one or more substituents, optionally substituted with one or more substituents Lower alkenyl, a lower alkynyl substituted by one or more substituents, optionally substituted with one or more substituents, 266 318750 200804250 optionally via one or more substituents Substituted aryl lower alkyl, as needed Or a plurality of substituent-substituted aryl groups, optionally a lower alkoxy lower alkyl group substituted with one or more substituents, optionally substituted with one or more substituents, an aryloxy lower alkyl group, a lower alkylalkylsulfonyl lower alkyl group substituted with one or more substituents, optionally substituted with one or more substituents, a lower alkyl sulfinyl lower carbon group, optionally via one or a plurality of substituent-substituted lower alkylsulfonyl-lower alkyl groups, optionally substituted with one or more substituents, one or a di-(lower alkyl)amino-based lower alkyl group, optionally a lower alkyl alkane group substituted with one or more substituents, optionally a lower alkoxycarbonyl group substituted with one or more substituents, optionally an aryloxycarbonyl group substituted with one or more substituents, optionally Or an aryl lower alkoxycarbonyl group substituted with a plurality of substituents, optionally substituted with one or more substituents, an amine thiol group substituted with one or more substituents, if desired Lower alkoxylated sulfhydryl groups requiring one or more substituents An aryl lower alkoxy oxalidyl group substituted with one or more substituents, optionally substituted with one or more substituents, optionally substituted with one or more substituents, optionally substituted with one or more substituents Substituted aminyl sulfhydryl, 267 318750 200804250 a lower alkoxy group substituted by one or more substituents, optionally an aryloxy group substituted with one or more substituents, optionally one or more a substituent-substituted aryl lower alkoxy group, optionally substituted with one or more substituents, or optionally substituted with one or more substituents, R2 represents one or more a low-carbon charcoal-terminated base substituted by a halogen atom, A represents (1) a group represented by OR3 (wherein R3 represents a C1-C3 alkyl group substituted as needed by one or more substituents, optionally via one or more a substituted lower alkenyl group, a lower carbon block optionally substituted with one or more substituents, optionally a lower alkyl alkano group substituted with one or more substituents, optionally substituted by one or more Substituted aryl group, or as needed One or more substituent-substituted aryl lower alkyl groups), (2) a group represented by S(0)nR4 (wherein R4 represents a C-C3 alkyl group substituted by one or more substituents as needed) A lower alkenyl group substituted with one or more substituents, a lower alkynyl group substituted with one or more substituents, optionally an aryl group substituted with one or more substituents, or optionally Or a plurality of substituent-substituted aryl lower alkyl groups, and η represents an integer of 0, 1 or 2), or 268 318750 200804250 (3) a group represented by NR5R6 (wherein R5 and R6 each independently represent an optional a ci_c3 alkyl group substituted with one or more substituents, optionally a lower carbyl group substituted with one or more substituents, optionally a lower carbon block substituted with one or more substituents, optionally An aryl group substituted with a plurality of substituents, optionally substituted with one or more substituents, is bonded to the Rm terminal to form an optional atom with the nitrogen atom. Another nitrogen, oxygen or sulfur atom acts as a ring-constituting atom from 3 to 7 members of the nitrogen-containing heterocyclic ring), R represents a halogen atom, an exact group, a chaotic group, and is optionally substituted with one or more tooth atoms. An aryl-based, low-carbon alkoxy group, a low-carbon calcining base substituted with one or more tooth atoms, optionally substituted with one or more _ atoms, and optionally one or more An atom-substituted aryl group, optionally substituted with one or more (tetra) atoms, an aryl-low-oxyl group, optionally substituted with one or more arylamino thiol groups from the atom, optionally via one or a plurality of lower alkyl substituted amine fluorenyl groups, optionally substituted with one or more lower alkylaminothiomethyl groups, optionally substituted with one or more lower alkyl groups, a lower alkyl group which is substituted with one or more halogen atoms, optionally substituted with one or more halogen atoms, 318750 269 200804250, preferably a lower alkoxy group substituted by one or more halogen atoms a lower alkoxy group, a low carbon substituted by one or more it atoms as needed Alkenyloxy, a lower alkynyloxy group optionally substituted by one or more i atoms, optionally substituted with one or more atoms, a lower alkyl alkinoamine group, optionally substituted by one or more atoms a carbon-sulfuryl group, a lower alkenethio group substituted by one or more halogen atoms, if desired, a lower alkynylthio group substituted by one or more halogen atoms, optionally substituted by one or more i atoms a lower alkyl sulfinyl group, a lower alkylene sulfinyl group substituted with one or more halogen atoms, if desired, a lower alkynyl sulfinyl group substituted by one or more halogen atoms, a lower alkyl sulfonyl group substituted with one or more tooth atoms, a lower aryl sulfonyl group substituted with one or more atoms, optionally substituted with one or more halogen atoms A sulfonyl group, optionally substituted with a lower alkoxy group substituted with one or more self-atoms, or a group represented by -GE (wherein G represents an oxygen atom, a sulfur atom, s〇 or s 〇2, and E represents an aryl or heterocyclic group, and the aryl group or the heteroaryl group can be Substituting one or more substituents selected from the group consisting of: (1) a halogen atom, (2) optionally substituted by one or more halogen atoms, a carbon alkyl group, and (3) as needed a low-carbon alkoxy group substituted by one or more self-atoms, (4) a lower alkylthio group substituted by one or more _ atoms as needed (5) is optionally substituted with one or more (four) atoms Low carbon alkyl yttrium 318750 270 200804250 sulfhydryl, (6) a lower alkyl sulfonyl group substituted with one or more ii atoms, (7) a cyano group, and (8) a nitro group, Q represents an aryl group optionally substituted with one or more substituents, or a heterocyclic group substituted with one or more substituents as necessary, and m represents an integer of 1 to 5 (limited to when m is 2 to 5) When integers, each R7 can be the same or different). 2. A benzoquinone-forming urea compound according to claim 1, wherein R7 is a halogen atom, optionally substituted with one or more halogen atoms, a lower alkoxycarbonyl group, optionally substituted by one or more halogen atoms. a low-carbon alkyl group, a lower alkoxy group substituted by one or more abusive atoms, if desired, a lower alkoxy a lower alkoxy group substituted with one or more halogen atoms, optionally via one or a lower alkoxy a lower alkylthio group substituted by a plurality of A atoms, optionally a lower alkoxy group substituted by one or more _ atoms, optionally substituted with one or more tooth atoms a lower alkylenethio group substituted by one or more i atoms, optionally a lower olefin thio group substituted by one or more halogen atoms, optionally substituted with one or more halogen atoms. a lower alkyl sulfinyl group substituted with one or more quiescent atoms, optionally substituted with one or more i atoms, or a lower alkyl sulfinyl group, optionally with one or more halogens. Atom-substituted lower alkynyl sulfinyl group, optionally as needed a lower alkyl sulfonyl group substituted by a plurality of tooth atoms, 318750 271 200804250 a lower carbene sulfonyl group substituted with one or more tooth atoms, optionally substituted with one or more halogen atoms An alkynylsulfonyl group, or a group represented by -GE (wherein G is an oxygen atom, a sulfur atom, s〇 or s〇2, and E represents an aryl group or a heterocyclic group, and the aryl group or the heteroaryl group) Substituted by one or more substituents selected from the group consisting of: (1) a halogen atom, (2) a low-stone anti-hospital group substituted with one or more halogen atoms as needed ( 3) a low-carbon alkoxy group which is substituted by one or more halogen atoms as needed, '(4) a low-carbon sulfur-burning group which is optionally substituted by one or more functional atoms, (5) one or more halogens as needed An atom-substituted lower alkyl sulfinyl group, (6) a lower alkyl sulfonium group substituted with one or more tooth atoms, (7) a cyano group, and (8) a nitro group. 3. A benzoquinone compound according to claim 1 wherein R1 is a hydrogen atom, optionally substituted by one or more substituents, and optionally substituted by one or more substituents. a carbene group, a lower alkynyl group optionally substituted with one or more substituents, optionally an aryl lower alkyl group substituted with one or more substituents, optionally substituted with one or more substituents a carboxy lower alkyl group, optionally substituted with one or more substituents, an aryloxy lower alkyl group, optionally substituted with one or more substituents, a lower alkyl alkano group, optionally a lower alkyl alkoxy lower alkyl substituted by a plurality of substituents, 272 318750 200804250 a low carbon alkyl arylene based low carbon alkyl group substituted with one or more substituents, optionally one or more Substituent substituted lower alkyl sulfonyl carbene lower carbon' or, if desired, substituted by one or more substituents - or di-(lower alkyl) amine-based low carbon: ί: complete. 4. The urea compound of benzoic acid according to any one of items 1 to 3 of claim 4, wherein R2 is an ei_C4 alkyl group substituted by one or more halogen atoms as needed. 5. The benzamidine compound according to the scope of the patent application, wherein X and γ are oxygen atoms, and A is a group represented by OR3 (wherein R3 is a C1_C3 alkyl group optionally substituted by one or more substituents) a lower alkenyl group substituted with one or more substituents, optionally a lower alkynyl group substituted with one or more substituents, optionally a lower alkyl alkano group substituted with one or more substituents, Or an aryl lower alkyl group substituted with one or more substituents as needed. 6. The benzoquinone compound of any one of claims 1 to 5 wherein A is a group represented by OR3 (wherein R3 is a C1-C3 alkyl group optionally substituted with one or more substituents) , a lower alkyl alkane group substituted with one or more substituents, or an aryl lower carbon group substituted with one or more substituents as needed). 273 318750 200804250 7. The benzamidine compound according to claim 1, wherein χ and γ are oxygen atoms, and Α is a group represented by S(0)nR4 (wherein R4 is one or more as needed) Substituent substituted C1-C3 alkyl, optionally substituted alkenyl substituted by one or more substituents, optionally substituted by one or more substituents, or optionally one or more a substituent-substituted aryl group, and η is an integer from 〇 to 2). 8. The benzoquinone compound according to claim 1, wherein hydrazine and γ are oxygen atoms, and hydrazine is a group represented by NR5R6 (wherein R5 and R6 are each independently one or more substituents as needed) a substituted C1-C3 alkyl group, preferably a lower alkenyl group substituted with one or more substituents, optionally a lower alkynyl group substituted with one or more substituents, optionally substituted with one or more substituents The aryl group, or R5 and R6, are bonded together at their ends to form, together with the nitrogen atom, a 3 to 7 membered nitrogen-containing heterocyclic ring having another nitrogen atom, an oxygen atom or a sulfur atom as a ring constituent atom. 9. The benzalkonium compound according to any one of claims 1 to 8 wherein Q is a phenyl group optionally substituted with one or more substituents selected from the group consisting of: (1) a halogen atom, (2) a lower alkyl group substituted by one or more halogen atoms, and (3) a lower alkoxy group substituted by one or more 274 318750 200804250 halogen atoms, or as needed An aromatic monocyclic heterocyclic group substituted with one or more substituents selected from the group consisting of: (1) a functional atom, (2) a low carbon alkyl group substituted with one or more halogen atoms, and (3) A lower alkoxy group substituted by one or more halogen atoms as needed. The benzoic acid urethane compound of claim 1, wherein Q is a phenyl group substituted by one or a halogen atom, or an aromatic monocyclic heterocyclic ring substituted by one or more halogen atoms base. 11 · The benzalkonium compound of claim 1, wherein X and Y are oxygen atoms, and R is a hydrogen atom, optionally substituted with one or more substituents, if desired, a lower alkenyl group substituted by one or more substituents, optionally a lower alkynyl group substituted with one or more substituents, optionally an aryl lower carbon group substituted with one or more substituents, optionally a lower alkoxy alkoxy lower alkyl substituted by one or more substituents, optionally substituted with one or more substituents, an aryloxy lower alkyl group, optionally substituted with one or more substituents An alkylthio lower alkyl group, optionally substituted with one or more substituents, a lower alkyl sulfinyl lower alkyl group, optionally substituted with one or more substituents, a lower alkyl sulfonyl group Low carbon alkyl, 275 318750 200804250 Substituting one or more substituents for one or more substituents, or a lower of one or more substituents, if desired, by one or more substituents. Carboalkyl fluorenyl, R is methylene, ethyl or trimethylene, A represents : (1) a group represented by OR3 (wherein R3 is a C-c3 alkyl group optionally substituted by one or more substituents, optionally substituted with one or more substituents, or as needed An aryl lower alkyl group substituted with one or more substituents, (2) a group represented by S(0)nR4 (wherein R4 is an alkyl group substituted by one or more substituents as necessary, and η is an integer of 0 to 2), or (3) a group represented by NR5R6 (wherein R and R6 are each independently a C1-C3 alkyl group optionally substituted by a group, or a combination of R and R6 at the terminal thereof To form a nitrogen atom together with a nitrogen atom, or a nitrogen, oxygen or sulfur atom as a ring-constituting atom, 3 to 7 nitrogen-containing heterocycles, and r7 is a halogen atom, optionally as long as one or more (4) Atom-substituted low-carbon oxy-oxyl group, optionally substituted with one or more low-carbon alkyl groups substituted by an atom, depending on the low-carbon alkoxy group substituted by one or more tooth atoms, 318750 276 200804250 A lower alkoxy alkoxy alkoxy group substituted by one or more South atoms, as desired, via one or more || a sub-substituted lower alkylthio group, a lower alkenethio group substituted by one or more deuterium atoms, optionally a lower alkynylthio group substituted with one or more deuterium atoms, optionally one or more a lower alkyl sulfinyl group substituted by a halogen atom, a lower alkylene sulfinyl group substituted with one or more halogen atoms, if desired, a lower alkyl sulfonium sulfonate substituted with one or more tooth atoms, if desired a group derived from a lower alkoxysulfonyl group substituted with one or more halogen atoms, optionally substituted with one or more tooth atoms, a lower alkoxy a lower alkylthio group or a -GE (wherein G is an oxygen atom or a sulfur atom, and E is an aryl group or a heterocyclic group substituted with a substituent of one or more groups selected from the group consisting of: (1) a halogen atom, And (2) a lower alkyl group substituted by one or more A atoms, Q is 2,6.difluorophenyl, 2-chloro-6-fluorophenyl, 2,6-dichlorophenyl , 3-chloropyridin-2-yl, or 3,5-dichloropyridine_4_yl, and m is an integer from 1 to 4 (with the proviso that when (f) is an integer from 2 to 4, each R7 may be the same Different). I2. The benzamidine compound of claim 1, wherein X and γ are oxygen atoms, R1 is a hydrogen atom, and a lower alkyl group substituted by one or more substituents, 318750 277 200804250 A lower alkoxy group substituted with one or more servative substituents, a lower alkynyl group substituted with one or more substituents, optionally substituted with one or more substituents, a lower alkoxy alkane lower alkane An aryloxy lower alkyl group optionally substituted with one or more substituents, optionally substituted with one or more substituents, a lower alkylalkylthio lower alkyl group, optionally substituted by one or more a substituted lower alkyl sulfonyl lower alkyl group, or a lower alkane fluorenyl group substituted with one or more substituents, if desired, R 2 is a fluorenylene group, an extended ethyl group or a triadenylene group, and A represents · (1) a group represented by OR3 (wherein R3 is a C1-C3 alkyl group optionally substituted by one or more substituents, optionally a lower alkyl alkane group substituted with one or more substituents, or as needed An aryl lower alkyl substituted by one or more substituents, (2) S(〇)n a group represented by R4 (wherein R4 is a C1_C3 alkyl group optionally substituted by one or more substituents, and η is an integer of 〇 to 2), or (3) a group represented by NR5R6 (wherein R5 and R6 are each independently Is a C1-C3 alkyl group substituted by one or more substituents as needed, or 278 318750 200804250 forms a visual ring. The original R and R6 are bonded together at their ends to form a nitrogen atom together with the nitrogen atom. An oxygen atom or a sulfur atom is a member of a nitrogen-containing heterocyclic ring of 3 to 7 members, and R7 is a halogen atom, and a lower alkoxycarbonyl group substituted by one or more tooth atoms, if necessary, one or more _ Atom-substituted low-carbon alkyl group, if desired, substituted by one or more (four) atoms, a lower-carbon alkoxy group, if necessary, by (d) a plurality of 4-atom-substituted low-carbon alkoxylated low-carbon burn-throughs, one or more a lower alkanethio group substituted by a halogen atom, a lower alkenethio group substituted by one or more tooth atoms, if desired, a lower alkynylthio group substituted by one or more halogen atoms, optionally via one or a plurality of _ atoms substituted lower alkyl sulfinyl groups, as needed a lower alkylene sulfinyl group substituted by one or more tooth atoms, a lower alkyl sulfonyl group substituted by one or more atoms, if desired, a lower alkane substituted by one or more 4 atoms An oxy lower alkyl alkane group, or a group represented by -GE (wherein G is an oxygen atom or a sulfur atom, and E is an aryl group or a heterocyclic group, and the aryl group or heterocyclic group may be selected one by one or the other Substituents substituted from the group consisting of: (1) a halogen atom and (2) a low-carbon alkyl group substituted with one or more halogen atoms as required), Q is 2,6-a porcine benzene Base, 2-chloro-6-like phenyl, 2,6-dichlorophenyl, 3' chloro&quot; pyridine-2-yl, or 3,5-dichloropyridin-4-yl, and 279 318750 200804250 When the time K is the same or different). 13 · - Insect control of insect pests - The second is = Benzene brewing in the first paragraph of the patent range 14. The use of the benzene (4) compound or its salt in the first paragraph of the patent scope is for pest control. A method for controlling pests or plant parasites, comprising administering an effective amount of a benzoquinone compound or a salt thereof as claimed in claim 1 to a spider or a worm. 318750 280 200804250 VII. Designated representative map: There is no schema in this case (1) The representative representative figure of this case is: (). (2) A brief description of the symbol of the representative figure: 8. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: 4 3187504 318750
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CN110526863A (en) * 2019-08-29 2019-12-03 贵州大学 The acylthioureas and acyl group carbamide derivative of a kind of trifluoromethyl pyridine and its application

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JP5158327B2 (en) * 2007-07-06 2013-03-06 住友化学株式会社 4- (Trichloromethylthio) aniline and method for producing the same, and method for producing 4- (trifluoromethylthio) aniline
CN104430546B (en) * 2014-12-09 2017-04-19 陈干忠 High-yield disease-resistant and mothproof composite preparation for rubber trees as well as preparation method and application thereof
DE102016013066A1 (en) 2016-11-03 2018-05-03 Merck Patent Gmbh fluorosurfactants

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CN110526863A (en) * 2019-08-29 2019-12-03 贵州大学 The acylthioureas and acyl group carbamide derivative of a kind of trifluoromethyl pyridine and its application
CN110526863B (en) * 2019-08-29 2022-05-03 贵州大学 A kind of acylthiourea or acylurea derivatives containing trifluoromethylpyridine and application thereof

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