SU398700A1 - METHOD OF ELECTROLYTIC CHROMINATION - Google Patents
METHOD OF ELECTROLYTIC CHROMINATIONInfo
- Publication number
- SU398700A1 SU398700A1 SU1676630A SU1676630A SU398700A1 SU 398700 A1 SU398700 A1 SU 398700A1 SU 1676630 A SU1676630 A SU 1676630A SU 1676630 A SU1676630 A SU 1676630A SU 398700 A1 SU398700 A1 SU 398700A1
- Authority
- SU
- USSR - Soviet Union
- Prior art keywords
- electrolytic
- chromium
- direct current
- chromination
- density
- Prior art date
Links
- 238000000034 method Methods 0.000 title description 10
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 10
- 229910052804 chromium Inorganic materials 0.000 description 8
- 239000011651 chromium Substances 0.000 description 8
- 230000008021 deposition Effects 0.000 description 5
- 239000002245 particle Substances 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- -1 for example Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Description
1one
Известен способ электролитического хромировани на посто нном токе.The known method of electrolytic chromium plating on direct current.
Предложенный способ отличаетс от известного тем, что процесс осуществл ют с наложением на посто нный ток импульсного плотностью 100-500 а/дм и частотой следовани импульсов 1-20 в сек. Это интенсифицирует процесс хромировани , повыша выход по току и скорость осаждени хрома.The proposed method differs from the known one in that the process is carried out with imposing on the direct current a pulsed density of 100-500 a / dm and a pulse frequency of 1-20 per second. This intensifies the chrome plating process, increasing the current efficiency and the rate of chromium deposition.
По предложен ому способу при электрическом осаждении хромовых покрытий при плотности тока 20-120 а/дм на посто нный ток накладывают импульсный плотностью 100-500 а/дм2 и частотой следовани импульсов 1-20 в сек.According to the proposed method, during the electrical deposition of chromium coatings at a current density of 20-120 a / dm, a pulsed density of 100-500 a / dm2 and a pulse repetition rate of 1-20 per second are applied to a direct current.
Предложенный способ может быть использован при осаждении хромовых покрытий из электролита, содержащего порошок твердых частиц, например, карбидов бора, титана, кремни , дисульфида молибдена, или частиц полимеров, например, полиамида, полиэтилена , полистирола, винипласта, в количестве 10-400 г/л и при размере частиц 2-60 мкм.The proposed method can be used in the deposition of chromium coatings from an electrolyte containing powder of solid particles, for example, boron, titanium, silicon, molybdenum disulfide, or polymer particles, for example, polyamide, polyethylene, polystyrene, vinyl plastic, in the amount of 10-400 g / l and with a particle size of 2-60 microns.
При этом не только повышаетс выход хрома по току и скорость его осаждени , но и увеличиваетс количество частиц, включаемых в осадок, возраста с 2-10 до 20-30% по объему добавок.At the same time, not only does the current output of chromium and the rate of its deposition increase, but also the number of particles included in the sediment increases from 2-10 to 20-30% by volume of additives.
Так, например, процесс электролитического хромировани осуществл ют в электролите, содержащем, г/л:For example, the electrolytic chrome plating process is carried out in an electrolyte containing, g / l:
Хромовый ангидрид350-400Chromic anhydride 350-400
Серную кислоту1,5-2,0Sulfuric acid 1,5-2,0
Едкий натр40-60Caustic soda 40-60
Сахар1,0-2,0Sugar1,0-2,0
Лаурилсульфат натри Sodium lauryl sulfate
или «Прогресс 2-5or "Progress 2-5
с включением вышеперечисленных добавок при температуре 18-23°С и плотности посто нного тока 20-120 а/дм- с наложением на посто нный ток импульсного плотностью 100-500 а/дм2 и частотой следовани импульсов 1-20 в сек.with the inclusion of the above additives at a temperature of 18-23 ° C and a density of direct current of 20-120 a / dm with imposing a pulsed density of 100-500 a / dm2 on a direct current and a pulse repetition rate of 1-20 per second.
Выход хрома по току при этом возрастает до 49%, соответственно увеличиваетс скорость осаждени хрома с одновременным повышением твердости полученных покрытий.The current yield of chromium increases to 49%, respectively, the rate of chromium deposition increases while simultaneously increasing the hardness of the coatings obtained.
Предмет изобретени Subject invention
Способ электролитического хромировани на посто нном токе, отличающийс тем, что, с целью интенсификации процесса, на посто нный ток накладывают импульсный плотностью 100-500 а/дм- и частотой следовани импульсов i-20 в сек.A method of electrolytic chromium plating in direct current, characterized in that, in order to intensify the process, a pulsed density of 100-500 a / dm and a pulse frequency of i-20 per second is imposed on the direct current.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SU1676630A SU398700A1 (en) | 1971-06-28 | 1971-06-28 | METHOD OF ELECTROLYTIC CHROMINATION |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SU1676630A SU398700A1 (en) | 1971-06-28 | 1971-06-28 | METHOD OF ELECTROLYTIC CHROMINATION |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SU398700A1 true SU398700A1 (en) | 1973-09-27 |
Family
ID=20481381
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SU1676630A SU398700A1 (en) | 1971-06-28 | 1971-06-28 | METHOD OF ELECTROLYTIC CHROMINATION |
Country Status (1)
| Country | Link |
|---|---|
| SU (1) | SU398700A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MD714Z (en) * | 2013-04-01 | 2014-07-31 | Институт Прикладной Физики Академии Наук Молдовы | Process for chromium electroplating |
-
1971
- 1971-06-28 SU SU1676630A patent/SU398700A1/en active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MD714Z (en) * | 2013-04-01 | 2014-07-31 | Институт Прикладной Физики Академии Наук Молдовы | Process for chromium electroplating |
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