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RU2003200C1 - Process of production of diamond and diamond-like films out of gaseous phase - Google Patents

Process of production of diamond and diamond-like films out of gaseous phase

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Publication number
RU2003200C1
RU2003200C1 SU5007516A RU2003200C1 RU 2003200 C1 RU2003200 C1 RU 2003200C1 SU 5007516 A SU5007516 A SU 5007516A RU 2003200 C1 RU2003200 C1 RU 2003200C1
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RU
Russia
Prior art keywords
diamond
substrate
film
production
gaseous phase
Prior art date
Application number
Other languages
Russian (ru)
Inventor
Павел Павлович Кулик
Евгени Николаевна Зорина
Владимир Владимирович Иванов
Андерсен Гей Джон
Original Assignee
Инженерный центр "Плазмодинамика"
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by Инженерный центр "Плазмодинамика" filed Critical Инженерный центр "Плазмодинамика"
Priority to SU5007516 priority Critical patent/RU2003200C1/en
Application granted granted Critical
Publication of RU2003200C1 publication Critical patent/RU2003200C1/en

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Description

через плазменный поток со скоростью 0,10- 10 м/мин (в зависимости от материала подложки ). Количество прохождений подложки через зону реакции выбираетс  равным или большим единице.through a plasma stream at a speed of 0.10-10 m / min (depending on the substrate material). The number of passes of the substrate through the reaction zone is selected to be equal to or greater than one.

Пример. Подложку из кремни  устанавливают на перемещающемс  столике, расположенном на определенном рассто нии от плазмотронов. Газова  смесь метана с водородом, формируема  путем смешени  газов, поступающих из баллонов, с помощью устройства ввода подаетс  в плазменный поток, образованный четырьм  сход щимис  стру ми инертного газа, в место их сли ни . Подвижный столик, на котором установлена подложка, может быть снабжен системой охлаждени . При пересечении подложкой плазменного потока на ее поверхности осаждаетс  поликристаллическа  алмазна  или аморфна  алмазоподоб- на  пленка - в зависимости от процентного содержани  метана в водороде.Example. The silicon substrate is mounted on a moving table located at a certain distance from the plasma torches. The gas mixture of methane with hydrogen, formed by mixing the gases from the cylinders, is fed into the plasma stream, formed by four converging jets of inert gas, using the input device to the place where they merge. The movable table on which the substrate is mounted may be provided with a cooling system. When the substrate crosses the plasma stream, a polycrystalline diamond or amorphous diamond-like film is deposited on its surface, depending on the percentage of methane in hydrogen.

Установлено, что при содержании 1-2% метана в водороде на подложке наблюдаетс  рост алмазоподобной пленки гидрогени- зированного углерода, а при содержании 5-10% метана в водороде растет поликри0It was found that at a content of 1-2% methane in hydrogen on the substrate, a diamond-like film of hydrogenated carbon grows, while at a content of 5-10% methane in hydrogen, polycry

сталлическа  алмазна  пленка. Скорость роста в обоих случа х составл ет 1 мкм/с. При этом наблюдаетс  высока  адгези  пленки к подложке.steel diamond film. The growth rate in both cases is 1 µm / s. In this case, a high adhesion of the film to the substrate is observed.

В качестве подложки могут быть использованы различные материалы: металлы, включа  алюминий, сталь, титан и молибден; полупроводниковые материалы типа кремни  и германи ; диэлектрики, такие как двуокись кремни , различные стекла, нитрид титана, оксид алюмини ; различные полимеры, включа  полиэтилен, полиуретан , кремний- или фторорганические полимеры и другие материалы.Various materials can be used as the substrate: metals, including aluminum, steel, titanium and molybdenum; semiconductor materials such as silicon and germanium; dielectrics such as silicon dioxide, various glasses, titanium nitride, alumina; various polymers, including polyethylene, polyurethane, organosilicon or fluorine polymers and other materials.

Дл  оптических окон могут быть использованы временные подложки из меди, золота и т.д.For optical windows, temporary substrates of copper, gold, etc. may be used.

По сравнению с известными данный способ позвол ет при высокой адгезии зна- 0 чительно (приблизительно на два пор дка) увеличить производительность процесса.Compared with the known methods, this method allows for high adhesion to significantly (approximately two orders of magnitude) increase the productivity of the process.

(56) J.Appl. Phys. 1991. v.68. № 11. р.5941- 5943.(56) J. Appl. Phys. 1991.v.68. No. 11. p. 5941-5943.

5 J.Appl. Phys. 1990, v.68, № 12, p.6187- 6190.5 J. Appl. Phys. 1990, v. 68, No. 12, p. 6187-6190.

55

Claims (1)

Формула изобретени The claims СПОСОБ ПОЛУЧЕНИЯ АЛМАЗНЫХ И АЛМАЗОПОДОБНЫХ ПЛЕНОК ИЗ ГАЗОВОЙ ФАЗЫ, включающий формирование зоны реакции потоком плазмы, подачу в нее смеси углеводородов с водородом и осаждение на подложку пленки, отличающийс  тем, что, с целью увеличени  скороMETHOD FOR PRODUCING DIAMOND AND DIAMOND-LIKE FILMS FROM A GAS PHASE, comprising forming a reaction zone by a plasma stream, feeding a mixture of hydrocarbons with hydrogen into it and depositing a film on a substrate, characterized in that, in order to increase soon сти роста пленок, формируют поток плазмы по меньшей мере трем  осесим- метрично расположенными сход щимис  стру ми низкотемпературной плазмы атмосферного давлени , при этом осаждение пленки провод т при прохождении подложки через зону реакции не менее одного раза.In the process of film growth, a plasma flow is formed by at least three axisymmetrically located converging jets of low-temperature atmospheric-pressure plasma, wherein the film is deposited when the substrate passes through the reaction zone at least once.
SU5007516 1991-11-01 1991-11-01 Process of production of diamond and diamond-like films out of gaseous phase RU2003200C1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SU5007516 RU2003200C1 (en) 1991-11-01 1991-11-01 Process of production of diamond and diamond-like films out of gaseous phase

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU5007516 RU2003200C1 (en) 1991-11-01 1991-11-01 Process of production of diamond and diamond-like films out of gaseous phase

Publications (1)

Publication Number Publication Date
RU2003200C1 true RU2003200C1 (en) 1993-11-15

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Application Number Title Priority Date Filing Date
SU5007516 RU2003200C1 (en) 1991-11-01 1991-11-01 Process of production of diamond and diamond-like films out of gaseous phase

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RU (1) RU2003200C1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9506143B2 (en) 2009-09-11 2016-11-29 Imott Inc. Protective film and method for producing same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9506143B2 (en) 2009-09-11 2016-11-29 Imott Inc. Protective film and method for producing same

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