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KR960701236A - 필름 및 코우팅의 연소 화학적 증기 증착을 위한 방법 및 장치(method and apparatus for the combustion chemical vapor deposition of films and coatings) - Google Patents

필름 및 코우팅의 연소 화학적 증기 증착을 위한 방법 및 장치(method and apparatus for the combustion chemical vapor deposition of films and coatings) Download PDF

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KR960701236A
KR960701236A KR1019950704075A KR19950704075A KR960701236A KR 960701236 A KR960701236 A KR 960701236A KR 1019950704075 A KR1019950704075 A KR 1019950704075A KR 19950704075 A KR19950704075 A KR 19950704075A KR 960701236 A KR960701236 A KR 960701236A
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coating
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티이. 헌트 앤드류
케이. 코크란 조오
브렌트 카아터 윌리엄
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배리 로젠버어그
조오지아 테크 리서어치 코오포레이션
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
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    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
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Abstract

시약 및 부형제 용액을 함께 혼합하여 시약 혼합물을 형성하고, 시약 혼합물을 점화하여 불꽃을 발생시키거나, 시약이 적어도 부분적으로는 증기상으로 증기화되는 플라즈마 토오치를 통해 시약 혼합물을 유동시키고, 상기 시약의 증기상을 지지체에 접촉시켜, 지지체상에 바람직한 배향을 가지도록 조절될 수 있는 상기 시약의 코우팅의 (적어도 일부분은 증기상으로부터의) 증착을 초래함으로써 지지체로 코우팅을 적용하는 방법, 및 상기 방법을 수행하는 장치, 상기 도면은 지지체(22)를 내부 불꽃(18a) 내지 외부 불꽃(18b) 사이에 Smithell 분리기(30)의 환원 영역(32)내 위치시킬 수 있는 CCVD 장치의 개략도를 나타낸다.

Description

필름 및 코우팅의 연소 화학적 증기 증착을 위한 방법 및 장치(METHOD AND APPARATUS FOR THE COMBUSTION CHEMICAL VAPOR DEPOSITION OF FILMS AND COATINGS)
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 연소 화학 증기 증착 장치의 개략도.

Claims (43)

  1. 하기 단계로 구성되는 화학적 증기 증착을 사용하여 지지체에 코우팅을 적용하는 방법: (a) 코우팅될 하나 이상의 표면을 갖는 지지체를 제공하는 단계; (b) 시약 및 부형제 용액을 선택하고 상기 시약 및 상기 부형재 용액을 함께 혼합하여 시약 혼합물을 형성하는 단계; (c) 연소 수단을 제공하는 단계; (d) 상기 시약 혼합물을 상기 연소 수단에 혼입시키고, 상기 시약 혼합물을 연소시켜 불꽃을 발생시키고 적어도 상기 시약의 일부를 증기상으로 증기화시키는 단계; 및 (e) 상기 시약의 상기 증기상을 상기 지지체와 접촉시켜 상기 지지체상에 코우팅의 상기 증기상의 증착을 초래하는 단계.
  2. 제1항에 있어서, 산화제를 상기 연소 수단에 공급하여 상기 시약 혼합물의 연소를 돕는 방법.
  3. 제2항에 있어서, 상기 코우팅이 결정형 무기 필름인 방법.
  4. 제2항에 있어서, 상기 시약 혼합물이 액체 용액이고, 상기 코우팅이 비-결정형 무기 필름인 방법.
  5. 제2항에 있어서, 상기 시약 혼합물이 가연성인 방법.
  6. 제3항에 있어서, 가연송 연료를 상기 연소 수단에 공급하여 상기 시약 혼합물의 상기 연소에 연료를 공급하는 방법.
  7. 제4항에 있어서, 가연성 연료를 상기 경소 수단에 공급하여 상기 시약 혼합물의 상기 연소에 연료를 공급하는 방법.
  8. 제3항에 있어서, 상기 부형제 용액이 유기 용매인 방법.
  9. 제4항에 있어서, 상기 부형제 용액이 유기 용매인 방법.
  10. 제3항에 있어서, 상기 시약이 기체상, 증기상 또는 액상이며, 상기 부형제 용액이 기체상, 증기상 또는 액상인 방법.
  11. 제4항에 있어서, 상기 시약이 기체상, 증기상 또는 액상이며, 상기 부형제 용액이 기체상, 증기상 또는 액상인 방법.
  12. 제10항에 있어서, 상기 시약 혼합물이 액체 용액이며, 상기 증기상이 본질적으로 상기 시약의 증기로 구성되는 방법.
  13. 제12항에 있어서, 상기 코우팅이 증착되고 스프레이 열분해 증착된 상기 시약의 필름으로 구성되는 방법.
  14. 제13항에 있어서, 상기 코우팅이 본질적으로 스프레이 열분해 증착된 상기 시약의 필름으로 구성되는 방법.
  15. 제8항에 있어서, 상기 시약 혼합물이 상기 시약의 고체 입자로 구성된 액체 용액이며, 상기 증기는 상기 시약의 증기 및 상기 시약의 고체 입자로 구성되는 방법.
  16. 제12항에 있어서, 상기 코오팅이 본질적으로 상기 시약으로 구성된 비균질하게 핵생성된 필름인 방법.
  17. 제15항에 있어서, 상기 코우팅이 상기 시약의 고체 입자 및 상기 시약으로 구성된 필름인 방법.
  18. 제17항에 있어서, 상기 코우팅이 약 50부피% 미만의 상기 고체로 구성되는 방법.
  19. 제8항에 있어서, 상기 코우팅이 두께가 약 1000 미크론 미만인 방법.
  20. 제19항에 있어서, 상기 코우팅이 상기 두께가 약 100 미크론 미만인 방법.
  21. 제1항에 있어서, 상기 지지체가 거의 상기 시약 혼합물의 연소로 발생된 연소열로 가열되는 방법.
  22. 제1항에 있어서, 상기 지지체가 거의 이차 열원으로 가열되는 방법.
  23. 제8항에 있어서, 상기 코우팅이 산화되는 고온 환경에서 안정한 방법.
  24. 제8항에 있어서, 상기 코우팅이 산화하는 고온 환경에서 안정하지 않은 방법.
  25. 제23항에 있어서, 시악 시약이 금속유기 화합물로 구성된 군으로부터 선택되는 방법.
  26. 제24항에 있어서, 부가의 반응물을 상기 연소 수단의 상기 불꽃 바로 위에 공급하는 방법.
  27. 제8항에 있어서, 상기 시약 혼합물이 부가로 상기 코우팅과 함께 상기 지지체 상에 부착된 비-반응성 입자로 구성되는 방법.
  28. 제27항에 있어서, 상기 비-반응성 입자가 상기 지지체에 부딪힐 때 용융되는 방법.
  29. 제1항에 있어서, 상기 불꽃이 약 300℃내지 2800℃사이의 온도를 가지며, 상기 지지체가 약 100℃ 내지 2200℃사이의 표면 온도를 가지며, 상기 증착이 약 10 torr 내지 10,000 torr 사이의 압력에서 발생하는 방법.
  30. 제29항에 있어서, 상기 코우팅이 약 0.1㎛/hr-1000㎛/hr 사이의 증착 속도로 상기 지지체 상에 증착되는 방법.
  31. 제30항에 있어서, 상기 지지체가 약 400℃내지 1300℃사이의 표면 온도를 가지는 방법.
  32. 제4항에 있어서, 상기 코우팅이 두께가 약 1밀리미터 미만인 방법.
  33. 제32항에 있어서, 상기 불꽃이 약 300℃ 내지 2800℃ 사이의 온도를 가지며, 상기 지지체가 약 100℃내지 1500℃ 사이의 표면 온도를 가지며, 상기 증착이 약 10 tor 내지 10,000 torr 사이의 압력에서 발생하는 방법.
  34. 제33항에 있어서, 상기 코우팅이 약 0.1㎛/hr-1000㎛/hr 사이의 증착 속도로 상기 지지체 상에 증착되는 방법.
  35. 제34항에 있어서, 상기 지지체가 약 400 내지 1300℃사이의 표면 온도를 가지는 방법.
  36. 하기 단계로 구성되는 화학적 증기 증착을 사용하여 지지체에 코우팅을 적용하는 방법: (a) 코우팅될 하나 이상의 표면을 갖는 지지체를 제공하는 단계; (b) 시약 및 부형제 용액을 선택하고 상기 시약 및 상기 부형제 용액을 함께 혼합하여 시약 혼합물을 형성하는 단계; (c) 플라즈마 생산 수단을 제공하는 단계; (d) 상기 시약 혼합물을 상기 플라즈마 생산 수단에 혼입시킴으로써 적어도 상기 시약의 일부를 플라즈마 증기상으로 증기화시키는 단계; 및 (e) 상기 시약의 상기 플라즈마 증기상을 상기 지지체와 접촉시켜 상기 지지체 상에 코우팅의 상기 플라즈마 증기상의 증착을 초래하는 단계.
  37. 제36항에 있어서, 상기 시약이 기체상, 증기상 또는 액상이며, 상기 부형제 용액이 기체상, 증기상 또는 액상인 방법.
  38. 제37항에 있어서, 상기 시약 혼합물이 액체 용액이며, 상기 플라즈마 증기상이 본질적으로 상기 시약의 증기로 구성되는 방법.
  39. 제38항에 있어서, 상기 플라즈마 증기상이 약 800℃ 내지 3500℃ 사이의 온도를 가지는 방법.
  40. 불꽃을 사용하는 주변 조건하에 연소 화학적 증기 증착을 사용하여 지지체에 코우팅을 적용하는 장치로서 하기로 구성되는 장치; (a) 연소 수단; (b) 상기 연소수단에 시약 혼합물을 공급하는 공급 수단; (c) 상기 시약 혼합물을 점화시키는 점화 수단; (d) 지지체를 사익 연소 수단에 아주 인접하게 지지시킴으로써 상기 지지체가 상기 시약 혼합물을 점화시켜 초래되는 연소 생산물이 통과하는 영역내에 지지되는 지지 수단.
  41. 제40항에 있어서, 부가로 상기 연소 수단에 산화제를 공급하는 수단으로 구성되는 장치.
  42. 불꽃을 사용하는 주변 조건하에 연소 화학적 증기 증착과 함께 사용하기 위한 지지체에 무기 산화물 코우팅을 적용하는 장치로서, 가연성 시약 혼합물을 보유하는 보유 수단, 상기 보유 수단으로부터 상기 시약 혼합물을 방출시키는 출구 수단, 상기 출구 수단을 통해 상기 보유 수단으로부터 상기 시약 혼합물을 추진시키는 추진수단, 및 상기 시약 혼합물을 점화시키는 점화 수단으로 구성되는 장치.
  43. 제42항에 있어서, 상기 장치가 한 사람이 손에 잡고 사용할 수 있는 크기 및 구조인 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019950704075A 1993-03-24 1994-03-24 필름및코우팅의연소화학적증기증착을위한방법 Expired - Lifetime KR100323216B1 (ko)

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JP3519406B2 (ja) 2004-04-12
EP0689618A4 (en) 1998-01-21
WO1994021841A1 (en) 1994-09-29
CA2158568C (en) 2001-12-04
DE69432175D1 (de) 2003-04-03
EP0689618B1 (en) 2003-02-26
JPH08511062A (ja) 1996-11-19
CA2158568A1 (en) 1994-09-29
US5652021A (en) 1997-07-29
AU6415294A (en) 1994-10-11
US5863604A (en) 1999-01-26
DE69432175T2 (de) 2004-03-04
KR100323216B1 (ko) 2002-07-03
ES2193156T3 (es) 2003-11-01
ATE233327T1 (de) 2003-03-15
EP0689618A1 (en) 1996-01-03

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