KR20180096659A - Flux cleaning composition - Google Patents

Abstract

R₄-O-(CH₂CH₂O)_n-H (II)
R₅-O-(CH₂CH₂O)_m-H (III)
R₆OCH₂-CH(OH)-CH₂OH (IV)Providing a detergent composition for flux that is suitable for cleaning flux residues. The present disclosure relates to a compound represented by the following formula (I), a compound represented by the following formula (II) (component B), a compound represented by the following formula (III) (Component D), aromatic alcohol (component E), and water (component F), and the ratio of the mass of component E to the total mass of component C and component D (component E / C + component D)) is not less than 0.18 and not more than 0.45.

R ₄ -O- (CH ₂ CH ₂ O) _n -H (II)
R ₅ -O- (CH ₂ CH ₂ O) _m -H (III)
R ₆ OCH ₂ -CH (OH) -CH ₂ OH (IV)

Description

Flux cleaning composition

The present disclosure relates to a detergent composition for flux, a method for cleaning flux residues, and a method for manufacturing electronic components.

In recent years, regarding the mounting of electronic components to a printed wiring board or a ceramic substrate, in terms of low power consumption, high-speed processing, and the like, components are miniaturized and the clearance to be cleaned is reduced in cleaning of the solder flux. In addition, lead-free solder is used in view of environmental safety, and rosin-based flux is used in conjunction with this.

Patent Document 1 discloses a metal part, an electronic part, a semiconductor part, and a liquid crystal display panel which contain an organic solvent, 5 to 30% by weight of a glyceryl ether having an alkyl group or an alkenyl group of 4 to 12 carbon atoms, and 5% Based detergent composition for a precision component.

Patent Document 2 discloses a nonionic surfactant composition comprising (A) glyceryl ether in an amount of 0.25 to 15.0 wt%, (B) 1.0 to 60.0 wt% of a nonionic surfactant having an HLB of 12.0 to 18.0, (C) 1.0 to 10.0 wt% (E) m (PO) nH wherein the nonionic surfactant of the component (B) is represented by the following formula: RX- (EO) m And the weight ratio (component (B) / component (A)) of the component (B) and the component (A) thereof is 4/1 to 8/1, the cleaning agent composition is uniform, the safety is high, Which is excellent in cleansing properties, repeated cleaning properties and rinsing properties of various kinds of contamination of the surface of a substrate, and has excellent anti-repellency at the time of cleaning and rinsing.

Patent Document 3 discloses a flux cleaning agent for a soldering electronic component made of benzyl alcohol.

Patent Document 4 discloses that when the content of the glycol compound is less than 1 wt%, the content of the benzyl alcohol is in the range of 70 to 99.9 wt% and the content of the amino alcohol is in the range of 0.1 to 30 wt% Wherein the content of the benzyl alcohol is in the range of 15 to 99 wt% and the content of the amino alcohol is in the range of 0.1 to 30 wt% when the content of the glycol compound is 1 to 40 wt% .

Patent Document 5 discloses that (A) 50 to 70% by weight of benzyl alcohol, (B) 20 to 40% by weight of a specific water-soluble glycol ether, (C) 1 to 20% by weight of a nonionic surfactant having an HLB of 12 to 18, (E) 5 to 20% by weight of water, (D) at least one member selected from the group consisting of alkanolamines, alkali salts, organic acids, antifoaming agents and thickening agents, By weight based on 100 parts by weight of the total amount of the cleaning composition.

Patent Document 6 discloses a detergent composition for a precision tool or a tooth tool for use in an assembly processing process containing glyceryl ether having a hydrocarbon group of 1 to 18 carbon atoms.

Patent Document 7 discloses an electronic component, a precision component or an assembly thereof containing a specific polyoxyalkylene dialkyl ether, a specific polyoxyalkylene monoalkyl ether and an amine compound and having a kinematic viscosity at 25 ° C of 5 mm 2 / s or less There is disclosed a detergent composition which can be suitably used for decontamination such as oil, oil, grease, liquid crystal, rosin-based flux and the like present on a solid surface of a toothbrush used in a processing process.

Japanese Patent Application Laid-Open No. 2004-2688 Japanese Patent Application Laid-Open No. 2010-155904 Japanese Unexamined Patent Publication No. 4-34000 International Publication No. 2005/021700 Japanese Laid-Open Patent Publication No. 2000-8080 Japanese Unexamined Patent Application Publication No. 6-346092 Japanese Patent Application Laid-Open No. 10-168488

In recent years, due to the miniaturization of the semiconductor package substrate, the gap between the solder bumps and the parts to be connected becomes narrow. Further, since the gap between the solder bump and the connected component is narrowed, the detergent composition disclosed in the patent document can not be said to have sufficient cleaning property for the flux residue.

Thus, the present disclosure provides a cleaning composition for flux, which is preferable for cleaning flux residues, a cleaning method using the composition, and a cleaning method for electronic components.

The present disclosure relates to a compound represented by the following formula (I) (component A), a compound represented by the following formula (II) (component B), a compound represented by the following formula (III) (Component E / (component C + component D)) containing the compound (component D), the aromatic alcohol (component E) and water (component F) and the mass of component E to the total mass of component C and component D, Is not less than 0.18 and not more than 0.45.

[Chemical Formula 1]

R ₁ is at least one member selected from the group consisting of a hydrogen atom, a methyl group, an ethyl group and an aminoethyl group, R ₂ is a hydrogen atom, a hydroxy group, a hydroxy group, a methyl group and an ethyl group, 1, and R ₃ is at least one member selected from the group consisting of a hydroxyethyl group and a hydroxypropyl group.

R ₄ -O- (CH ₂ CH ₂ O) _n -H (II)

In the formula (II), R ₄ represents a hydrocarbon group having 4 or more and 7 or less carbon atoms, and n is an integer of 1 to 5,

R ₅ -O- (CH ₂ CH ₂ O) _m -H (III)

In the formula (III), R ₅ represents a hydrocarbon group having 8 to 12 carbon atoms and m is an average addition number of moles of 4 or more and 8 or less.

R ₆ OCH ₂ -CH (OH) -CH ₂ OH (IV)

In the formula (IV), R ₆ represents a hydrocarbon group having 6 to 11 carbon atoms.

The present disclosure relates to a method of cleaning a flux residue having a process of cleaning a material to be cleaned with flux residue with a detergent composition related to the present disclosure.

The present disclosure relates to a process for mounting at least one component selected from a semiconductor chip, a chip-type capacitor, and a circuit board onto a circuit board by soldering using flux, and a process for mounting a solder bump for connecting the component, And a step of cleaning at least one selected from the circuit board on which the component is mounted and the circuit board on which the solder bump is formed by the cleaning method of the flux residue relating to this disclosure The present invention relates to a method of manufacturing an electronic component.

According to the present disclosure, it is possible to provide a detergent composition for flux which is excellent in cleaning property of flux residues.

This disclosure discloses a detergent composition comprising a specific amine (component A), a specific glycol ether (component B), a specific polyoxyethylene alkyl ether (component C), a specific glyceryl ether (component D) and an aromatic alcohol (component E) , The ratio of the mass of the component E to the total mass of the component C and the component D is defined so that the detergency of the flux residue is improved more than in the prior art.

That is, the present disclosure relates to a compound represented by formula (I) (component A), a compound represented by formula (II) (component B), a compound represented by formula (III) (Component D), aromatic alcohol (component E), and water (component F), and the ratio of the mass of component E to the total mass of component C and component D (component E / (component C + component D ) Of not less than 0.18 and not more than 0.45 (hereinafter, also referred to as " detergent composition relating to the present disclosure "). According to the present disclosure, a detergent composition for flux having excellent cleaning property of flux residue can be obtained. Further, according to the present disclosure, a detergent composition for flux can be obtained which is excellent in stability and rinsability with water and can suppress the influence of corrosion on the solder metal.

Although the details of the mechanism of action of the effect in the detergent composition related to the present disclosure are unclear, they are estimated as follows. That is, in the detergent composition according to the present disclosure, since the component C, the component D and the component E are contained in a specific mass ratio in the presence of the component A and the component B, the components C, D, And component E, which is high in solubility of the flux but hardly soluble in water, can be uniformly dispersed in the detergent composition, and as a result, cleaning property of the flux residue is improved. In addition, since the orientation as described above can be prevented, the amine component (component A), which is considered to be a cause of corrosion on the surface of the solder, can be prevented from contacting the solder more than necessary. Therefore, the surface of the solder bump is not affected by corrosion . However, the present disclosure is not limited to this mechanism.

In recent years, a high-performance flux (for example, a high-activity flux) capable of suppressing the generation of voids while maintaining printability, melting property, and cleaning property as the gap between the solder bump and the connected component narrows, , The detergent composition relating to the present disclosure can be preferably used also for the residue of such a high-performance flux.

In the present disclosure, the term " flux " refers to a rosin system containing a rosin or a rosin derivative used for soldering, which is used for removing an oxide which interferes with the connection of a metal such as an electrode or a wiring with a solder metal, Soluble flux not containing flux or rosin, and the term " soldering " in this disclosure includes reflow soldering and flow soldering. In the present disclosure, "solder flux" refers to a mixture of solder and flux. The term " flux residue " in the present disclosure refers to a flux-derived residue remaining on a substrate after the solder bumps are formed using flux and / or on a substrate after soldering using flux. For example, when another component (for example, a semiconductor chip, a chip capacitor, another circuit board, or the like) is stacked and mounted on a circuit board, a space (gap) is formed between the circuit board and the other component. The flux used for the mounting may remain in the gap as a flux residue after soldering by a reflow or the like. Refers to a detergent composition for cleaning flux residue after forming and / or soldering a solder bump using a flux or a solder flux. The term " detergent composition for flux " From the viewpoint of manifesting the remarkable effect of cleaning property by the detergent composition relating to the present disclosure, the solder is preferably a lead (Pb) -free solder.

[Component A]

Component A in the detergent composition according to the present disclosure is a compound represented by the following formula (I).

(2)

R ₁ is at least one member selected from the group consisting of a hydrogen atom, a methyl group, an ethyl group and an aminoethyl group, R ₂ is a hydrogen atom, a hydroxy group, a hydroxy group, a methyl group and an ethyl group, 1, and R ₃ is at least one member selected from the group consisting of a hydroxyethyl group and a hydroxypropyl group.

Component A includes, for example, at least one member selected from alkanolamines such as monoethanolamine and diethanolamine, and alkylated and aminoalkylated products thereof. Specific examples of the component A may include monoethanolamine, monoisopropanolamine, N-methylmonoethanolamine, N-methylmonoisopropanolamine, N-ethylmonoethanolamine, N-ethylmonoisopropanolamine , Diethanolamine, diisopropanolamine, N-dimethylmonoethanolamine, N-dimethylmonoisopropanolamine, N-methyldiethanolamine, N-methyldiisopropanolamine, N-diethylmonoethanolamine, N-ethyldiisopropanolamine, N- (β-aminoethyl) monoethanolamine, N- (β-aminoethyl) monoisopropanolamine, N- (β-aminoethyl) di At least one member selected from the group consisting of monoethanolamine, monoisopropanolamine, diethanolamine, N-methylmonoethanolamine, N-dimethylmonoethanolamine, N (dimethylamino) - ethyl mono More preferably at least one selected from ethanolamine and N- (? -Aminoethyl) monoethanolamine, and more preferably at least one selected from N-methylmonoethanolamine and N-dimethylmonoethanolamine.

The content of the component A in the detergent composition according to the present disclosure is preferably 0.2 mass% or more, more preferably 0.3 mass% or more, still more preferably 0.4 mass% or more, and 0.5 mass% or more By mass, more preferably not more than 8% by mass, further preferably not more than 5% by mass, even more preferably not more than 3% by mass, from the viewpoints of improvement in cleaning property and suppression of corrosion of solder metal, Or less.

[Component B]

Component B in the detergent composition related to the present disclosure is a compound represented by the following formula (II).

R ₄ -O- (CH ₂ CH ₂ O) _n -H (II)

In the formula (II), R ₄ represents a hydrocarbon group having 4 to 7 carbon atoms and is preferably a hydrocarbon group having 4 to 6 carbon atoms, more preferably an alkyl group having 4 to 6 carbon atoms Is more preferable. n is an integer of 1 to 4, preferably an integer of 1 or more and 5 or less, more preferably an integer of 1 or more and 4 or less, and more preferably an integer of 2 or more and 3 or less, from the viewpoints of improvement in cleaning property and improvement in stability. Further, n is preferably 1 or more, more preferably 2 or more, and is preferably 5 or less, more preferably 4 or less, and most preferably 3 or less from the viewpoints of improvement in cleaning property and improvement in stability.

Component B includes, for example, ethylene glycol monoalkyl ethers, diethylene glycol monoalkyl ethers, triethylene glycol monoalkyl ethers, tetraethylene glycol monoalkyl ethers, pentaethylene glycol monoalkyl ethers having a hydrocarbon group of 4 to 7 carbon atoms Ether, ethylene glycol monophenyl ether, diethylene glycol monophenyl ether, triethylene glycol monophenyl ether, tetraethylene glycol monophenyl ether, pentaethylene glycol monophenyl ether, ethylene glycol monobenzyl ether, diethylene glycol monobenzyl ether, tri Ethylene glycol monobenzyl ether, tetraethylene glycol monobenzyl ether, and pentaethylene glycol monobenzyl ether. From the viewpoints of improving the cleaning property, lowering the viscosity of the detergent composition and improving stability, the component B is preferably at least one selected from the group consisting of ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, monoethylene glycol monohexyl ether, At least one member selected from monohexyl ether, ethylene glycol monophenyl ether, diethylene glycol monophenyl ether, ethylene glycol monobenzyl ether and diethylene glycol monobenzyl ether is preferable and ethylene glycol monobutyl ether, diethylene glycol monobutyl ether , Triethylene glycol monobutyl ether, monoethylene glycol monohexyl ether, and diethylene glycol monohexyl ether, and more preferably at least one kind selected from diethylene glycol monobutyl ether, triethylene glycol monobutyl ether and diethylene glycol monohexyl From ether Selecting at least one member and more preferably, it is more preferably in view of the rinsing, diethylene glycol monobutyl ether.

The content of the component B in the detergent composition according to the present disclosure is preferably 10% by mass or more, more preferably 12% by mass or more, from the viewpoints of improvement in cleaning property, improvement in rinsing property, More preferably 15 mass% or more, and still more preferably 20 mass% or more. The content of the component B is more preferably 25 mass% or more from the viewpoint of lowering the viscosity of the detergent composition. The content of the component B is preferably 45% by mass or less, more preferably 40% by mass or less, still more preferably 35% by mass or less from the viewpoints of improvement in cleaning property, lowering of the viscosity of the detergent composition and improvement in stability.

[Component C]

Component C in the detergent composition according to the present disclosure is a compound represented by the following formula (III).

R ₅ -O- (CH ₂ CH ₂ O) _m -H (III)

In the formula (III), R ₅ represents a hydrocarbon group of 8 to 12 carbon atoms, preferably a hydrocarbon group of 8 to 10 carbon atoms, more preferably an alkyl group of 8 to 10 carbon atoms More preferable. m represents an average addition mole number and is a number of 4 or more and 8 or less. The number of moles is preferably 5 or more and 7 or less, more preferably 5 or more and 6 or less, from the viewpoints of improvement of cleaning property and improvement of stability. Further, m is preferably 4 or more, more preferably 5 or more, and is preferably 8 or less, more preferably 7 or less, and even more preferably 6 or less, from the viewpoints of improvement in cleaning property and improvement in stability.

The component C is, for example, a polyoxyethylene alkyl ether, a polyoxyethylene alkyl ether having a hydrocarbon group having 8 or more carbon atoms and having an average addition mol number (m) of ethylene oxide of 4 or more and 8 or less, And polyoxyethylene alkyl phenyl ether. From the viewpoint of improvement in cleaning property, polyoxyethylene alkyl ether is preferable. The number of carbon atoms of the hydrocarbon group of R ₅ is preferably 10 or less from the viewpoints of improvement in cleaning property, lowering of the viscosity of the detergent composition and improvement in stability. Specific examples of the component C include, for example, polyoxyethylene 2-ethylhexyl ether, polyoxyethylene octyl ether, polyoxyethylene nonyl ether, polyoxyethylene decyl ether, polyoxyethylene 2-propylheptyl ether, Ethylene 4-methylpropyl hexyl ether, polyoxyethylene 5-methylpropyl hexyl ether, and polyoxyethylene dodecyl ether. From the viewpoint of lowering viscosity and improving stability of the detergent composition, polyoxyethylene Ethylene 2-ethylhexyl ether is preferred.

The content of the component C in the detergent composition according to the present disclosure is preferably 10% by mass or more, more preferably 15% by mass or more from the viewpoints of improvement in cleaning property, improvement in rinsability, lowering of viscosity of the detergent composition, More preferably not less than 20% by mass, more preferably not more than 50% by mass, more preferably not more than 40% by mass, even more preferably not more than 30% by mass, from the viewpoints of improvement in rinsability, desirable.

[Component D]

Component D in the detergent composition related to the present disclosure is a compound represented by the following formula (IV). According to the present disclosure, by using the component D, there is an advantage that excellent cleaning property is obtained for the flux residue.

R ₆ OCH ₂ -CH (OH) -CH ₂ OH (IV)

In the formula (IV), R ₆ represents a hydrocarbon group having 6 or more and 11 or less carbon atoms, preferably a hydrocarbon group of 8 to 10 carbon atoms, more preferably an alkyl group of 8 to 10 carbon atoms More preferable.

As the component D, an alkyl glyceryl ether is preferable as the glyceryl ether having a hydrocarbon group having 6 or more and 11 or less carbon atoms and represented by the formula (IV). From the viewpoints of improvement in cleaning property and improvement in stability, R ₆ is preferably an alkyl group or an alkenyl group having a linear or branched chain having 6 to 11 carbon atoms, more preferably an alkyl group having 6 to 10 carbon atoms, An alkyl group is more preferred. As R ₆ , there may be mentioned, for example, an aryl group having 6 to 11 carbon atoms such as an n-hexyl group, an isohexyl group, an n-heptyl group, an n-octyl group, a 2-ethylhexyl group, Alkyl group. From the viewpoint of improving the cleaning property and improving the stability, at least one selected from a 2-ethylhexyl group and an n-decyl group is preferable, and a 2-ethylhexyl group is more preferable. Specific examples of the component D include at least an ester compound selected from hexyl glyceryl ether, octyl glyceryl ether, 2-ethylhexyl glyceryl ether, nonyl glyceryl ether, decyl glyceryl ether, and undecyl glyceryl ether One can be mentioned.

The content of the component D in the detergent composition according to the present disclosure is preferably 0.5% by mass or more, more preferably 1% by mass or more, further preferably 1.5% by mass or more from the viewpoints of improvement in cleaning property, improvement in rinsability, More preferably not less than 2% by mass, and from the same viewpoint, it is preferably not more than 15% by mass, more preferably not more than 13% by mass, further preferably not more than 10% by mass, even more preferably not more than 7% .

[Component E]

The detergent composition according to the present disclosure contains an aromatic alcohol (component E) from the viewpoint of improvement in cleaning property.

As the component E, a compound having an aromatic ring and a hydroxyl group can be used, and from the viewpoint of improvement in cleaning property, the number of carbon atoms of the aromatic alcohol of the component E is preferably 7 or more, more preferably 10 or less, Specific examples of the component E include at least one member selected from benzyl alcohol, phenethyl alcohol, 4-methylbenzyl alcohol, 4-ethylbenzyl alcohol, 2-phenyl-1-propanol, From the viewpoint of improvement in cleaning property, at least one species selected from benzyl alcohol, phenethyl alcohol and 4-ethylbenzyl alcohol is preferable, and benzyl alcohol is more preferable.

The content of the component E in the detergent composition according to the present disclosure is preferably from a high content in view of improving the cleaning property, but is preferably 1% by mass or more, more preferably 2% by mass or more, , More preferably not less than 3 mass%, further preferably not less than 3 mass%, further preferably not less than 5 mass%, and still more preferably not more than 25 mass%, more preferably not more than 20 mass% By mass or less.

[Weight ratio of component E to components C and D]

In the present disclosure, the ratio of the mass of the component E to the total mass of the component C and the component D (component E / (component C + component D)) is 0.18 or more in terms of improvement in cleansing property, improvement in rinsability, Is preferably 0.2 or more, more preferably 0.25 or more, and is preferably 0.45 or less, more preferably 0.4 or less, and still more preferably 0.35 or less.

[Weight ratio of component C to component D]

The ratio of the mass of the component C to the mass of the component D (component C / component D) is preferably 5 or more, more preferably 6 or more, further preferably 7 or more from the viewpoints of improving the rinsability and improving the stability, From the same viewpoint, it is preferably 10 or less, more preferably 9.5 or less, and further preferably 9 or less.

[Component F]

Component F in the detergent composition related to this disclosure is water. As the water, ion exchange water, RO water, distilled water, pure water, ultrapure water and the like can be used. The content of the component F in the detergent composition according to the present disclosure is preferably 10% by mass or more, more preferably 15% by mass or more, further preferably 20% by mass or more from the viewpoints of improvement in cleaning property and improvement in stability, , From the same viewpoint, it is preferably 60 mass% or less, more preferably 50 mass% or less, still more preferably 40 mass% or less, still more preferably 30 mass% or less.

[Other components of the detergent composition]

The detergent composition according to the present disclosure may contain other components as required. The content of other components in the detergent composition according to the present disclosure is preferably 0 mass% or more and 2.0 mass% or less, more preferably 0 mass% or more and 1.5 mass% or less, still more preferably 0 mass% or more and 1.3 mass% or less , And more preferably 0 mass% or more and 1.0 mass% or less.

Other components in the detergent composition related to the present disclosure include, for example, hydrocarbons having 10 to 18 carbon atoms (component G) from the standpoint of suppressing foaming. As the component G, from the same viewpoint, there may be mentioned, for example, at least one member selected from dodecene and tetradecene. The content of the component G in the detergent composition according to the present disclosure is preferably 0.5% by mass or more, more preferably 0.8% by mass or more, and preferably 1.5% by mass or less, and 1.3% , And more preferably 1.0 mass% or less.

The detergent composition according to the present disclosure may contain, if necessary, a surfactant such as hydroxyethylaminoacetic acid, hydroxyethyliminocaproic acid, ethylenediaminetetraacetic acid, etc., which is usually used in a detergent, A preservative, a rust inhibitor, a bactericide, an antibacterial agent, a silicone antifoaming agent, an antioxidant, an ester such as coconut fatty acid methyl ester or a benzoic acid ester, or an alcohol, may suitably be contained.

[Method for producing detergent composition]

The detergent composition according to the present disclosure can be prepared by blending the components A to F and other components as required in a known manner. Accordingly, the present disclosure is directed to a method of making a detergent composition comprising the step of blending at least the components A-F. In the present disclosure, " blending " includes mixing components A to F and other components, if necessary, simultaneously or in any order. In the method of manufacturing the detergent composition according to the present disclosure, the blending amount of each component may be the same as the content of each component in the detergent composition related to the present disclosure described above. In the present disclosure, the "content of each component in the detergent composition" refers to the content of each component at the time of cleaning, that is, at the time of using the detergent composition for cleaning. The detergent composition according to the present disclosure is prepared and stored as a concentrated liquid from the viewpoint of addition work, storage and transportation, and water (component (A)) is added so that the components A to E become the above- F).

[PH of detergent composition]

The pH of the detergent composition according to the present disclosure is preferably pH 8 or higher and pH 14 or lower in order to improve the cleaning power against the flux residue. The pH may be adjusted, if necessary, by adding an inorganic acid such as nitric acid or sulfuric acid, an organic acid such as an oxycarboxylic acid, a polycarboxylic acid, an aminopolycarboxylic acid or an amino acid, and a metal salt or an ammonium salt thereof, ammonia, sodium hydroxide, Can be adjusted by appropriately adding a basic substance other than the component A in a desired amount.

[Purified water]

The detergent composition according to the present disclosure can be used in one or more embodiments to clean an object to be cleaned having a flux residue. The detergent composition according to the present disclosure may be used in one or more embodiments to remove flux. Examples of the object to be cleaned having a flux residue include an object to be cleaned having reflowed solder. Specific examples of the object to be cleaned include, for example, an electronic part and a manufacturing intermediate thereof, and specifically, a soldering electronic part and a manufacturing intermediate thereof can be enumerated. More specifically, An electronic component to which the soldered electronic component and its manufacturing intermediate, a component to which the component is connected via solder and its manufacturing intermediate, an electronic component including the flux residue, and a manufacturing intermediate thereof, An electronic component including a flux residue in a gap between connected components, and an intermediate for manufacturing the electronic component. The manufacturing intermediate is an intermediate product in a manufacturing process of an electronic component including a semiconductor package or a semiconductor device. The intermediate product is at least one selected from a semiconductor chip, a chip type capacitor, and a circuit board by soldering using flux, for example. A circuit board on which one component is mounted, and / or a circuit board on which a solder bump for solder connection of the component is formed. The clearance in the object to be cleaned is, for example, a space formed between a circuit board and a component (semiconductor chip, chip capacitor, circuit board, etc.) mounted by soldering to the circuit board, Distance) is, for example, a space of 5 to 500 μm, 10 to 250 μm, or 20 to 100 μm. The width and the depth of the gap depend on the size and the interval of the electrodes (land) on the parts to be mounted or the circuit board.

[Cleaning method of flux residues]

The present disclosure relates to a method of cleaning a flux residue (hereinafter also referred to as a cleaning method related to this disclosure), comprising contacting the object to be cleaned having flux residue with a detergent composition according to the present disclosure. The cleaning method according to the present disclosure has, in one or more embodiments, a step of cleaning the object to be cleaned with the flux residue with the detergent composition according to the present disclosure. The method of contacting the cleaning agent composition of the present disclosure with the object to be cleaned or the method of cleaning the object to be cleaned with the cleaning agent composition of the present disclosure includes, for example, a method of contacting the cleaning agent composition in the bath of the ultrasonic cleaning apparatus, And a method of spraying and contacting with a spray (shower method). The detergent composition according to the present disclosure can be used for cleaning without dilution. The cleaning method of the present disclosure preferably includes a step of bringing the object to be cleaned into contact with the cleaning agent composition, followed by rinsing with water and drying. With the cleaning method of the present disclosure, the flux residue remaining in the gaps of the soldered parts can be efficiently cleaned. The solder is preferably a lead (Pb) -free solder from the viewpoint of manifesting the cleansing property by the cleaning method of the present disclosure and the remarkable effect of permeability to narrow gaps. From the same viewpoint, the cleaning method related to the present disclosure is disclosed in International Patent Publication Nos. 2006/025224, 6-75796, 2014-144473, 2004-230426, It is preferable to use it for electronic parts connected by solder using the flux described in JP-A-2013-188761 and JP-A-2013-173184. It is preferred that the cleaning method of the present disclosure is irradiated with ultrasound when contacting the cleaner composition and the object to be cleaned in connection with the present disclosure in view of the ability of the detergent composition related to the present disclosure to exhibit the cleaning power, desirable. The frequency and the oscillation output of the ultrasonic wave are preferably 26 to 72 kHz, 80 to 1500 W, more preferably 36 to 72 kHz, and 80 to 1500 W, from the same viewpoint.

[Manufacturing method of electronic parts]

The method for manufacturing an electronic part of the present disclosure is a method for mounting at least one component selected from a semiconductor chip, a chip type capacitor, and a circuit board on a circuit board by soldering using flux in one or a plurality of embodiments And a step of forming solder bumps on the circuit board for connecting the parts and the like, and at least one step selected from a circuit board on which the components are mounted and a circuit board on which the solder bumps are formed And a step of cleaning by the cleaning method of the present disclosure. The soldering using the flux is performed, for example, by a lead-free solder, and may be a reflow method or a flow method. The electronic component includes a semiconductor package in which a semiconductor chip is not mounted, a semiconductor package in which a semiconductor chip is mounted, and a semiconductor device. The method of manufacturing an electronic component of the present disclosure is characterized in that the cleaning by the cleaning method of the present disclosure reduces the amount of flux residue remaining in the gaps of the soldered parts and the periphery of the solder bumps, It is possible to manufacture electronic parts with high reliability. Further, by performing the cleaning by the cleaning method of the present disclosure, the cleaning of the flux residue remaining in the gaps of the soldered parts and the like is facilitated, so that the cleaning time can be shortened and the manufacturing efficiency of the electronic parts can be improved.

[Kit]

The present disclosure relates to a kit for use in a cleaning method and / or a method of manufacturing an electronic component in accordance with the present disclosure, wherein at least one of the components A to F constituting the detergent composition according to the present disclosure is a component And is kept unmixed with the kit.

In the kits related to the present disclosure, for example, a solution (first solution) containing the component A and a solution (second solution) containing the components B to F are stored in a state in which they are not mixed with each other , And a kit (two-component detergent composition) in which these are mixed at the time of use. After the first liquid and the second liquid are mixed, they may be diluted with water (component F) if necessary. The first solution and the second solution may contain optional components, respectively, if necessary. Examples of the optional components include a thickening agent, a dispersant, a rust inhibitor, a basic substance, a surfactant, a polymer compound, a solubilizing agent, an antioxidant, an antiseptic, a defoaming agent and an antibacterial agent.

The present disclosure also relates to the following detergent compositions, cleaning methods, and manufacturing methods.

<1> A compound represented by the following formula (I) (component A), a compound represented by the following formula (II) (component B), a compound represented by the following formula (III) (Component D), an aromatic alcohol (component E), and water (component F)

(Component E / (component C + component D)) of the mass of component E to the total mass of component C and component D is 0.18 or more and 0.45 or less.

(3)

R ₁ is at least one member selected from the group consisting of a hydrogen atom, a methyl group, an ethyl group and an aminoethyl group, R ₂ is a hydrogen atom, a hydroxy group, a hydroxy group, a methyl group and an ethyl group, 1, and R ₃ is at least one member selected from the group consisting of a hydroxyethyl group and a hydroxypropyl group.

R ₄ -O- (CH ₂ CH ₂ O) _n -H (II)

In the formula (II), R ₄ represents a hydrocarbon group having 4 or more and 7 or less carbon atoms, and n is an integer of 1 to 5,

R ₅ -O- (CH ₂ CH ₂ O) _m -H (III)

In the formula (III), R ₅ represents a hydrocarbon group having 8 to 12 carbon atoms and m is an average addition number of moles of 4 or more and 8 or less.

R ₆ OCH ₂ -CH (OH) -CH ₂ OH (IV)

In the formula (IV), R ₆ represents a hydrocarbon group having 6 to 11 carbon atoms.

&Lt; 2 &gt; The component A is preferably a monoethanolamine, monoisopropanolamine, N-methylmonoethanolamine, N-methylmonoisopropanolamine, N- , N-dimethyl monoethanolamine, N-dimethyl mono isopropanol amine, N-methyl diethanol amine, N-methyl diisopropanol amine, N-diethyl monoethanol amine, N-diethyl monoisopropanol amine, Amine, N-ethyldiisopropanolamine, N- (? -Aminoethyl) monoethanolamine, N- (? -Aminoethyl) monoisopropanolamine, N- Aminoethyl) diisopropanolamine, and at least one member selected from the group consisting of monoethanolamine, monoisopropanolamine, diethanolamine, N-methylmonoethanolamine, N-dimethylmonoethanolamine, N- (? -amino ), More preferably at least one member selected from monoethanolamine and, N- methyl-ethanolamine and mono-N- dimethyl ethanol amine, at least one member selected from the more preferred, the detergent composition for the flux according to <1>.

<3> The content of the component A is preferably 0.2 mass% or more, more preferably 0.3 mass% or more, further preferably 0.4 mass% or more, and still more preferably 0.5 mass% The cleaning composition for flux according to &lt; 1 &gt;

<4> The content of the component A is preferably 10 mass% or less, more preferably 8 mass% or less, further preferably 5 mass% or less, still more preferably 3 mass% &Lt; &gt;

<5> In the formula (II), R ₄ is preferably a hydrocarbon group having 4 to 6 carbon atoms, more preferably an alkyl group having 4 to 6 carbon atoms, and more preferably a flux represented by any one of <1> to <4> / RTI &gt;

<6> The detergent composition for flux according to any one of <1> to <5>, wherein n in the formula (II) is preferably 1 or more and 4 or less, and more preferably 2 or more and 3 or less.

Component B is preferably selected from the group consisting of ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, monoethylene glycol monohexyl ether, diethylene glycol monohexyl ether, ethylene glycol monophenyl ether, diethylene glycol At least one member selected from monophenyl ether, ethylene glycol monobenzyl ether and diethylene glycol monobenzyl ether is preferable, and at least one member selected from ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, monoethylene glycol monohexyl Ether and diethylene glycol monohexyl ether, and more preferably at least one kind selected from diethylene glycol monobutyl ether, triethylene glycol monobutyl ether and diethylene glycol monohexyl ether. To &lt; 6 &gt; The detergent composition for flux according to one of claims 1 to 3.

The content of the component B is preferably 10 mass% or more, more preferably 12 mass% or more, further preferably 15 mass% or more, further preferably 20 mass% or more, and more preferably 25 mass% The cleaning composition for flux according to any one of &lt; 1 &gt; to &lt; 7 &gt;

<9> The flux cleaning composition according to any one of <1> to <8>, wherein the content of the component B is preferably 45 mass% or less, more preferably 40 mass% or less, and still more preferably 35 mass% .

<10> In the formula (III), R ₅ represents a hydrocarbon group of 8 to 12 carbon atoms, preferably a hydrocarbon group of 8 to 10 carbon atoms, more preferably an alkyl group of 8 to 10 carbon atoms, 9] The cleaning composition for flux according to any one of [1] to [9].

<11> In the flux cleaning composition according to any one of <1> to <10>, m is preferably from 5 to 7, and more preferably from 5 to 6.

<12> The detergent composition for flux according to any one of <1> to <11>, wherein the number of carbon atoms of the hydrocarbon group of R _{5 in} the formula (III) is preferably 10 or less.

Component C is preferably selected from the group consisting of polyoxyethylene 2-ethylhexyl ether, polyoxyethylene octyl ether, polyoxyethylene nonyl ether, polyoxyethylene decyl ether, polyoxyethylene 2-propylheptyl ether, polyoxyethylene 4-methylpropyl The detergent composition for flux according to any one of <1> to <12>, wherein the detergent composition is at least one selected from hexyl ether, polyoxyethylene 5-methylpropyl hexyl ether, and polyoxyethylene dodecyl ether.

<14> The flux cleaning composition according to any one of <1> to <13>, wherein the content of the component C is preferably 10% by mass or more, more preferably 15% by mass or more, and still more preferably 20% .

<15> The flux cleaning composition according to any one of <1> to <14>, wherein the content of the component C is preferably 50 mass% or less, more preferably 40 mass% or less, and still more preferably 30 mass% .

In the formula (IV), R ₆ is preferably a hydrocarbon group having a carbon number of 8 or more and 10 or less, and more preferably an alkyl group having a carbon number of 8 or more and 10 or less, for a flux according to any one of <1> to < Detergent composition.

In the formula (IV), R ₆ is preferably an alkyl group or an alkenyl group having a linear or branched chain having 6 to 11 carbon atoms, more preferably an alkyl group having 6 to 10 carbon atoms, an alkyl group having 8 carbon atoms The cleaning composition for flux according to any one of &lt; 1 &gt; to &lt; 16 &gt;

Component D is at least one selected from hexyl glyceryl ether, octyl glyceryl ether, 2-ethylhexyl glyceryl ether, nonyl glyceryl ether, decyl glyceryl ether and undecyl glyceryl ether. The cleaning composition for flux according to any one of &lt; 1 &gt; to &lt; 17 &gt;.

<19> The content of the component D is preferably 0.5% by mass or more, more preferably 1% by mass or more, further preferably 1.5% by mass or more, and still more preferably 2% by mass or more, &Lt; &gt;

<20> The content of the component D is preferably 15 mass% or less, more preferably 13 mass% or less, further preferably 10 mass% or less, further preferably 7 mass% or less, &Lt; &gt;

<21> The detergent composition for flux according to any one of <1> to <20>, wherein the carbon number of the aromatic alcohol of the component E is preferably 7 or more, more preferably 10 or less,

Component E is at least one member selected from benzyl alcohol, phenethyl alcohol, 4-methylbenzyl alcohol, 4-ethylbenzyl alcohol, 2-phenyl-1-propanol, The detergent composition for a flux according to any one of <1> to <21>, wherein at least one species selected from benzyl alcohol, phenethyl alcohol and 4-ethylbenzyl alcohol is preferable, and benzyl alcohol is more preferable.

<23> The content of the component E is preferably 1% by mass or more, more preferably 2% by mass or more, still more preferably 3% by mass or more, and still more preferably 5% &Lt; &gt;

<24> The flux cleaning composition according to any one of <1> to <23>, wherein the content of the component E is preferably 25 mass% or less, more preferably 20 mass% or less, and still more preferably 15 mass% .

The ratio of the mass of the component E to the total mass of the component C and the component D (component E / (component C + component D)) is preferably 0.2 or more, more preferably 0.25 or more, &Lt; &gt;

The ratio of the mass of the component E to the total mass of the component C and the component D (component E / (component C + component D)) is preferably 0.4 or less, more preferably 0.35 or less, &Lt; &gt;

The ratio of the mass of the component C to the mass of the component D (component C / component D) is preferably not less than 5, more preferably not less than 6, and further preferably not less than 7, The detergent composition for flux according to any one of the preceding claims.

The ratio of the mass of component C to the mass of component D (component C / component D) is preferably 10 or less, more preferably 9.5 or less, still more preferably 9 or less, The detergent composition for flux according to any one of the preceding claims.

<29> The flux cleaning composition according to any one of <1> to <28>, wherein the content of the component F is preferably 10% by mass or more, more preferably 15% by mass or more, and still more preferably 20% .

<30> The content of the component F is preferably 60% by mass or less, more preferably 50% by mass or less, still more preferably 40% by mass or less, still more preferably 30% &Lt; &gt;

The detergent composition according to the present disclosure is the flux cleaning agent according to any one of <1> to <30>, further comprising a hydrocarbon (component G) having or not having an unsaturated bond of 10 to 18 carbon atoms Composition.

<32> The cleaning composition for flux according to any one of <1> to <31>, wherein the component G is at least one selected from dodecene and tetradecene.

<33> The cleaning composition for flux according to any one of <1> to <32>, wherein the content of the component G is preferably 0.5% by mass or more, more preferably 0.8% by mass or more.

The content of the component G is preferably 1.5% by mass or less, more preferably 1.3% by mass or less, and still more preferably 1.0% by mass or less. Composition.

<35> The cleaning composition for flux according to any one of <1> to <34>, wherein the pH is 8 or more and 14 or less.

A method for cleaning a flux residue having a flux residue with a detergent composition according to any one of <1> to <35>.

<37> The method for cleaning a flux residue according to <36>, wherein the object to be cleaned is an intermediate for manufacturing soldered electronic parts.

A step of mounting at least one component selected from a semiconductor chip, a chip type capacitor, and a circuit board onto a circuit board by soldering using flux; and a step of mounting a solder bump for connecting the component or the like on the circuit board And at least one selected from a circuit board on which the component is mounted and a circuit board on which the solder bump is formed is subjected to a cleaning method of the flux residue described in And cleaning the electronic component.

<39> Use of the detergent composition according to any one of <1> to <35> for the production of electronic parts.

<40> A kit, wherein at least one component of the components A to F constituting the detergent composition according to any one of <1> to <35> is stored in a state in which it is not mixed with other components.

<41> Use of the detergent composition according to any one of <1> to <35> for removing flux.

Example

Hereinafter, the present disclosure will be described in detail by way of examples, but the present disclosure is not limited to these examples at all.

1. Preparation of detergent composition (Examples 1 to 4, Comparative Examples 1 to 13)

The components were mixed in a 100 ml glass beaker so as to have the composition shown in Table 1 below and mixed under the following conditions to prepare the detergent compositions of Examples 1 to 4 and Comparative Examples 1 to 13. The numerical values of the respective components in Table 1 indicate the content (% by mass) in the detergent composition prepared, unless otherwise noted.

· Liquid temperature: 25 ℃

· Stirrer: magnetic stirrer (50 mm rotor)

· Number of revolutions: 300 rpm

· Stirring time: 10 minutes

The following are used as components of the detergent composition.

N-Methylethanolamine (Component A) (Aminoalcohol MMA, manufactured by Nippon Emulsifier Co., Ltd.)

· Triethanolamine (non-component A) (manufactured by Nippon Kogyo Co., Ltd.)

Diethylene glycol monobutyl ether (Component B) (butyl diglycol, manufactured by Nippon Sanso Co., Ltd.)

Diethylene glycol monohexyl ether (Component B) (hexyldiglycol manufactured by Nippon Emulsifier Co., Ltd.)

Ethylene glycol monoisopropyl ether (non-component B) (isopropyl glycol, manufactured by Nippon Oil &amp;

Diethylene glycol monoisopropyl ether (non-component B) (isopropyldiglycol, manufactured by Nippon Emulsifier Co., Ltd.)

Polyoxyethylene 2-ethylhexyl ether (component C) (BLOWONN EH-6, manufactured by Aoki Kasei Kogyo Co., Ltd., ethylene oxide average addition number of moles 6)

Benzyl alcohol (Component E) (LANXESS Co., Ltd.)

· 1-Dodecene (Component G) (Linieraren 12 manufactured by Idemitsu Kosan Co., Ltd.)

Water (Component F) (pure water of 1 μS / cm or less manufactured by G-10DSTSET manufactured by ORGANO Co., Ltd.)

2-Ethylhexylglyceryl ether (Component D) (prepared by the following process)

130 g of 2-ethylhexanol and 2.84 g of boron trifluoride ether complex are cooled to 0 DEG C with stirring. While maintaining the temperature at 0 占 폚, 138.8 g of epichlorohydrin was added dropwise for 1 hour. After completion of the dropwise addition, surplus alcohol is distilled off at 100 DEG C under reduced pressure (13 to 26 Pa). The reaction mixture was cooled to 50 캜, and 125 g of 48% sodium hydroxide aqueous solution was added dropwise for 1 hour while maintaining the temperature at 50 캜. After stirring for 3 hours, 200 ml of water was added and the mixture was layered. After removing the aqueous layer, it is further washed twice with 100 ml of water to obtain 208 g of crude 2-ethylhexyl glycidyl ether. 208 g of the crude 2-ethylhexyl glycidyl ether, 104.8 g of water, 5.82 g of lauric acid and 18.5 g of potassium hydroxide were placed in an autoclave and stirred at 140 DEG C for 5 hours. After dehydration at 100 占 폚, 9.7 g of lauric acid and 2.72 g of potassium hydroxide were added and the mixture was reacted at 160 占 폚 for 15 hours and then subjected to vacuum distillation (53 to 67 Pa, 120 to 123 占 폚) under reduced pressure (6.67 kPa) To give 110.2 g of 2-ethylhexyl glyceryl ether.

2. Evaluation of detergent composition

The detergent compositions of the prepared examples 1 to 4 and comparative examples 1 to 13 were tested and evaluated for cleaning property, stability, rinsability, and influence on solder metal.

[Cleaning test]

A cleaning test was performed to clean the test substrate under the following conditions.

<Test substrate>

On a copper wiring printed substrate (10 mm x 15 mm), the following flux is applied using a screen plate. Thereafter, 10 micro-balls (M705? 0.3 mm, manufactured by Senju Metal Industries Co., Ltd.) are mounted, and a test substrate is manufactured by reflowing at 250 占 폚 in a nitrogen atmosphere.

[Composition of flux]

, 10 mass% of completely hydrogenated rosin (Foral AX-E manufactured by Eastman Chemical Co., Ltd.), 10 mass% of terpineol (manufactured by Nippon Terpene Chemical Co., Ltd.), 25 mass% of acid-denatured hypochromic rosin (Fine Crystal KE-604 manufactured by Arakawa Chemical Co., 10% by mass of terpineol C), 30% by mass of hexyldiglycol (manufactured by Nippon Emulsion Co., Ltd.), dibromobutene diol (trans-2,3-dibromo-2-butene- , 2.5 mass% of dimer acid (UNIDYME14 manufactured by Arizona Chemical Co., Ltd.), 2.5 mass% of glutaric acid (manufactured by Tokyo Chemical Industry Co., Ltd.), 4 mass% of hardened castor oil (manufactured by Hokoku Corporation) 2 mass% of hexamethylene hydroxystearic acid amide (Sripax ZHH, manufactured by Nippon Hoso K.K.), 2 mass% of palmitic acid dextrin (Leopearl TL2, manufactured by Chiba Seisakusho Co., Ltd.), 2 g of hindered phenol antioxidant Irganox 245) 2 mass%

[Manufacturing Method of Flux]

After the solvent terpineol and hexyldiglycol were mixed, the other components were added and dissolved to obtain a flux of the above composition.

<Cleaning Method>

The cleaning was carried out in the following order. First, the cleaning tank, the first rinse tank, and the second rinse tank are prepared under the following conditions. The cleaning bath was obtained by adding 50 g of each detergent composition to a 50 ml glass beaker in which a 50 mm rotor was put, warming it to 60 캜 while stirring it at a rotation speed of 100 rpm in a warm bath. The first rinse bath and the second rinse bath were prepared by preparing two 100 ml glass beakers each having one 50 mm rotor, adding 100 g of pure water to each, adding the mixture to a warm bath, stirring at a rotation speed of 100 rpm, &Lt; / RTI &gt;

Next, the test substrate is held by a tweezers, inserted into the cleaning bath, and immersed for 3 minutes while stirring at a rotation speed of 100 rpm. Next, the test substrate is held in a tweezers, inserted into the first rinsing tank, and immersed for 3 minutes while stirring at a rotation speed of 100 rpm. Further, the test substrate is held in a tweezers, inserted into a second rinsing tank, and immersed for 3 minutes while stirring at a rotation speed of 100 rpm. Finally, the test substrate is purged with nitrogen and dried.

&Lt; Evaluation of cleaning property &

After the cleaning, the test substrate was observed with an optical microscope VHX-2000 (manufactured by KYENS Corporation), and the presence or absence of flux residue remained around the solder bumps was visually observed and the cleaning property was evaluated according to the following criteria. The results are shown in Table 1 below.

[Evaluation standard]

A: No cleaning residue

B: 1 cleaning residue

C: 2 or more cleaning residues

<Evaluation of stability>

After the detergent composition was prepared, the state of the liquid (phase separation state) after standing at 25 캜 for 5 minutes was visually observed, and the stability was evaluated by the following evaluation criteria. The results are shown in Table 1.

[Evaluation standard]

○ (A): Transparent

(B): cloudiness

× (C): separation

&Lt; Evaluation of rinsability &

The evaluation of the rinsability was carried out in the following order. The evaluation results are shown in Table 1.

(1) A cleaning tank and a test substrate used for evaluating the rinsability were prepared in the same manner as the cleaning tank and the test substrate used for evaluation of the cleaning property, and a test substrate (hereinafter referred to as substrate) was immersed in the cleaning tank for 10 minutes .

(2) Subsequently, the substrate was slowly pulled up for 20 seconds, 500 g of pure water was added to a 500 ml glass beaker, and the substrate was immersed for 2 minutes in a first rinse bath heated to 40 캜.

(3) Slowly raise the substrate from the first rinse tank for 20 seconds, add 500 g of pure water to a 500 mL glass beaker, and immerse in a second rinse bath heated to 40 DEG C for 2 minutes.

(4) The substrate was slowly pulled up from the second rinse tank for 20 seconds, and 500 g of pure water was added to a 500 ml glass beaker. The substrate was immersed in an extraction tank heated to 40 캜, and ultrasonic waves (38 kHz, 400 W) The minute substrate is treated and the components of the cleaning composition adhered to the surface of the substrate are extracted.

(5) Next, the organic substance concentration of the water in the first and second rinsing baths and the water extracted in the extraction bath is measured by the total organic carbon system (TOC), and the concentration of the organic substance in the first rinsing tank The oil removal rate is calculated.

Oil removal rate (%) in the first rinse tank

= (Weight of organic matter in the first rinsing tank) / (weight of organic matter in the first rinsing tank

+ Weight of organic matter in the second rinse tank + weight of organic matter in the extraction tank) x 100

&Lt; Evaluation of influence on solder metal &

The solder metal on the test substrate after the evaluation of the cleaning property was visually observed with an optical microscope VHX-2000 (manufactured by KYOSEN Co., Ltd.) and a table microscope Miniscope TM3030 (manufactured by Hitachi High Technologies Corporation), and solder metal To assess the impact on the environment. The evaluation results are shown in Table 1.

[Evaluation standard]

○ (A): No effect on solder metal

× (B): Affects solder metal by corrosion and the like

As shown in Table 1, the detergent compositions of Examples 1 to 4 are superior in cleaning property, stability and rinsing property to those of Comparative Examples 1 to 3 and 6 to 13 which do not contain at least one of the components A to E And the influence on the solder metal was suppressed. Further, the detergent compositions of Examples 1 to 4 were superior in cleaning property, stability, and rinsability to the detergent compositions of Comparative Examples 4 to 5, in which the component E / (component C + component D) was not 0.18 to 0.45.

Industrial availability

By using this disclosure, cleaning of flux residues can be satisfactorily performed. For example, it is possible to shorten the cleaning process of flux residues in an electronic component manufacturing process and improve the performance and reliability of manufactured electronic components , The productivity of the semiconductor device can be improved.

Claims (7)

(Component A) represented by the following formula (I), a compound represented by the following formula (II) (component B), a compound represented by the following formula (III) ), An aromatic alcohol (component E), and water (component F)
(Component E / (component C + component D)) of the mass of component E to the total mass of component C and component D is 0.18 or more and 0.45 or less.
[Chemical Formula 1]

R ₁ is at least one member selected from the group consisting of a hydrogen atom, a methyl group, an ethyl group and an aminoethyl group, R ₂ is a hydrogen atom, a hydroxy group, a hydroxy group, a methyl group and an ethyl group, 1, and R ₃ is at least one member selected from the group consisting of a hydroxyethyl group and a hydroxypropyl group.
R ₄ -O- (CH ₂ CH ₂ O) _n -H (II)
In the formula (II), R ₄ represents a hydrocarbon group having 4 or more and 7 or less carbon atoms, and n is an integer of 1 to 5,
R ₅ -O- (CH ₂ CH ₂ O) _m -H (III)
In the formula (III), R ₅ represents a hydrocarbon group having 8 to 12 carbon atoms and m is an average addition number of moles of 4 or more and 8 or less.
R ₆ OCH ₂ -CH (OH) -CH ₂ OH (IV)
In the formula (IV), R ₆ represents a hydrocarbon group having 6 to 11 carbon atoms. The method according to claim 1,
Wherein component E is a benzyl alcohol. A method for cleaning a flux residue, comprising the step of cleaning a substance to be cleaned having a flux residue with the flux cleaning composition according to claim 1 or 2. The method of claim 3,
Wherein the object to be cleaned is a manufacturing intermediate of the soldering electronic component. A step of mounting at least one component selected from a semiconductor chip, a chip type capacitor and a circuit board on a circuit board by soldering using a flux, and a step of forming a solder bump on the circuit board for connecting the components and the like And at least one selected from the circuit board on which the component is mounted and the circuit board on which the solder bump is formed is cleaned by the cleaning method of the flux residue according to claim 3 or 4 And a step of forming the electronic component. Use of the cleaning composition for flux according to any one of claims 1 to 3 in the production of electronic components. Use of the detergent composition for flux according to claim 1 or 2 for removing flux.