JP5766163B2 - 不可逆的電気穿孔による組織アブレーション - Google Patents
不可逆的電気穿孔による組織アブレーション Download PDFInfo
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Description
本出願は、2003年12月24日に出願された米国特許仮出願第60/532,588号の恩典を主張するものであり、この出願は本明細書に参照として組み入れられる。
本発明は、組織の電気穿孔の分野および組織が不可逆的電気穿孔により破壊される治療の分野に関する。
良性または悪性腫瘍の治療のような、多くの医療処置において、周囲の望ましい組織に影響を及ぼすことなく、制御されかつ焦点化された方法で望ましくない組織をアブレーションすることができることは重要である。長年にわたり、切除手術の代替として望ましくない組織の特定区域を選択的に破壊するために、非常に多くの最小侵襲法(minimally invasive method)が開発されてきている。特定の利点および欠点を伴う様々な技術が存在し、これらは様々な適用について適応および禁忌である。例えば凍結外科は、望ましくない組織に挿入した、凍結剤で冷却したプローブとの接触時に組織が凍結される、低温最小侵襲技術である(Rubinsky, B., ed. Cryosurgery, Annu. Rev. Biomed. Eng., Vol.2. 157-187.)。凍結外科のような低温療法の影響を受けた領域は、画像化により容易に制御することができる。しかしこれらのプローブは大きく、使用が困難である。非選択的化学アブレーションとは、エタノールなどの化学物質が、望ましくない組織へ注射され、アブレーションを引き起こす技術である(Shiina, S., et al., Percutaneous ethanol injection therapy for hepatocellular carcinoma : results in 146 patients, AJR, 1993. 160:p.1023-8)。非選択的化学療法は、適用が容易である。しかし影響を受ける区域は、局所的血流および化学種の輸送のために、制御することができない。温度上昇も、組織アブレーションに使用することができる。集束超音波は、望ましくない組織上に集束した高強度の超音波ビームを使用して組織を加熱して凝固させる、高温非侵襲性技術である(Lynn, J.G., et al., A new method for the generation of use of focused ultrasound in experimental biology, J. Gen Physiol., 1942.26:p.179-93;Foster, R.S., et al., High-intensity focused ultrasound in the treatment of prostatic disease. Eur. Urol., 1993.23:p.44-7)。電流も、組織の加熱に通常使用される。高周波アブレーション(RF)とは、活性電極を望ましくない組織へ導入し、最大500kHzの高周波交流を使用して組織を加熱し凝固させる、高温最小侵襲技術である(Organ, L.W., Electrophysiological principles of radiofrequency lesion making, Appl. Neurophysiol., 1976.39:p.69-76)。RF加熱に加え、組織へ挿入した電極およびDCまたはAC電流による従来のジュール加熱法も一般的である(Erez, A., Shitzer, A.(Controlled destruction and temperature distribution in biological tissue subjected to monoactive electrocoagulation) J. Biomech. Eng., 1980:102(1):42-9)。組織内(interstitial)レーザー凝固とは、光ファイバーにより腫瘍へ送達された低出力レーザーを使用し、タンパク質変性の閾値を超える温度にまで腫瘍を徐々に加熱する、高温温熱技術である(Bown, S.G., Phototherapy of tumors. World. J. Surgery, 1983. 7:p.700-9)。高温温熱療法は、適用の容易さという利点を有する。その欠点は、血液循環は組織内に生じる温度野(temperature field)に対し強力な局所的作用を有するので、治療される区域の範囲が制御困難であることである。手術の器具(armamentarium)は、各々がそれら自体の利点および欠点ならびに特定の適用を有する、現存する多数の最小侵襲手術技術の利用可能性により増強されている。本明細書は、組織アブレーションのための別の最小侵襲外科技術である不可逆的電気穿孔を開示する。本発明者らは、この技術を説明し、数学的モデリングによりその実行可能性を評価し、インビボでの実験的研究による実行可能性を証明する。
本発明の方法、治療および装置の説明の前に、本発明は、説明された特定の態様に限定されず、よって当然変動し得ることが理解されなければならない。本発明の範囲は、添付された特許請求の範囲によってのみ限定されるので、本明細書において使用される用語は、特定の態様のみを説明する目的であり、限定を意図しないことも理解されなければならない。
用語「可逆的電気穿孔」は、細胞を横切る電気パルスの印加を介した細胞膜の透過化を包含する。「可逆的電気穿孔」において、細胞膜の透過化は、パルスの印加後に途絶え、この細胞膜透過性は正常に戻る。細胞は「可逆的電気穿孔」を生き延びる。これは、化学物質、DNA、または他の材料を細胞へ導入する手段として使用される。
本発明は、望ましくない組織を破壊(アブレーション)する方法およびシステムを提供する。これは、望ましくない組織の近傍への電気穿孔電極の挿入(提示(bringing))、および組織との良好な電気的接触、および望ましくない組織の全領域にわたり細胞の不可逆的電気穿孔を引き起こす電気パルスの印加を伴う。膜が不可逆的に透過性とされた細胞は、本来の位置に残存され(除去されず)、そのため次第に体の免疫系により除去される。細胞死は、望ましくない区域における不可逆的電気穿孔の電気的パラメータの誘導によりもたらされる。
ここに提供された数学モデルは、不可逆的組織アブレーションが、損傷温熱作用を誘導することなく、組織の実質的容積に影響し得ることを示している。この目的のために、本発明は、ラプラス式を使用し、典型的電気穿孔パルス時の組織内の電位分布を計算し、ならびに改変されたPennes(生体伝熱)方程式(Pennes, H.H., Analysis of tissue and arterial blood flow temperatures in the resting forearm. J of Appl. Physiology., 1948. 1:p.93-122)を用い、生じる温度分布を計算する。検証されている生体伝熱式にはいくつかの形が存在することに注目することは重要である(Carney, C.K., Mathematical models of bioheat transfer, in Bioengineering heat transfer, Y.I. Choi, Editor. 1992, Academic Press, Inc: Boston. p.19-152;Eto, T.K. and B. Rubinsky, Bioheat transfer, in Introduction to bioengineering, S.A. Berger, W. Goldsmith, and E.R. Lewis, Editors. 1996, Oxford Press)。Pennes方程式は議論の余地があるが、それにもかかわらずこれは血流および代謝のような、様々な生物学的熱移動パラメータの概算を提供することができるので、一般に使用されている。本試験において改変されたPennes方程式は、追加の熱源として組織内のジュール加熱項(term)を含む。
∇・(σ∇φ)=0 (1)
φ=V0 (2)
φ=0 (3)
p=σ│∇φ│2 (5)
T(x, y, z, 0)=37 (7)
図2および3では、2個の針型電気穿孔構成における、アブレーションされた区域に対する電極サイズおよび間隔の作用を試験した。これらの図を得る上で、本発明者らは、熱伝達方程式における血流および代謝の作用を無視したが、このことによりアブレーション区域の概算の上限が決まるだろう。図2は、直径0.5、1および1.5mmの電気穿孔電極サイズ、ならびに電極間距離10mmで不可逆的電気穿孔された区域の範囲を比較する。電極サイズの強力な作用は明らかである。より小さい電極に関して、不可逆的に電気穿孔された区域は連続しないのに対し、1.5mm電極に関して、可能性のある組織アブレーションの区域は、約15mm x 10mmの寸法の楕円形であることが認められる。括弧内に、本発明者らは、プローブ温度がこれらの3種の構成で50℃に到達する電気穿孔電圧を示した。その範囲は、0.5mmプローブの857Vから1.5mmプローブの1575Vまでであることが認められる。これは、組織電気穿孔パルスの代表的範囲内である。図3は、電極間の間隔の作用を評価する。試験した範囲において、アブレーションされた傷の連続する楕円形の小さい寸法は、同じであり続けるが、他方でより大きい寸法は、電極間の距離に対応するように見えることが認められる。
本実施例は、電気穿孔パルスと温熱作用の間の相関関係を出すために開発された。分析されるシステムは、電気穿孔電圧勾配V(V/cm)に曝された組織の極微小の対照容積である。全体の電気的エネルギーは、熱として散逸され、このシステムからの熱伝達は存在しない。計算は、パルス印加時の経時的温度上昇を出し、かつその結果は、ある温度に到達するまでにある電気穿孔パルスをどれだけの長さで与えることができるかについての、安全な下限である。その相関関係を説明するために、σの電気伝導度(Ω-cm)を伴う組織を通じ散逸する電位勾配(局所的電界)V(V/cm)熱の散逸から発生したジュール熱と、密度ρ(g/cc)および比熱c(J/gK)を伴う組織でできた対照容積の温度の上昇の間で、対照容積についてエネルギーバランスをとった。この計算は、単位時間(t)当たりの温度の上昇(T)について、電圧勾配ならびに肝臓の温度的および電気的特性の関数として、下記式を生じる。
肝臓の電気抵抗−8.33Ω-m
肝臓の比熱−J/g K
肝臓の密度−1g/cc
本実験の目的は、不可逆的電気穿孔パルスの非温熱様式において実質的組織アブレーションを生じる能力を証明することであった。この目的のために、本発明者らは、承認された動物の使用および飼育のプロトコールの下で、スプラーグ-ドーリーラットオス(250g〜350g)の肝臓について実験を行った。ネムブタールナトリウム溶液(50mg/mlペントバルビタール)の注射により動物に麻酔をかけた後、肝臓を、正中切開により露出し、直径10mmのAg/AgClの2個の円柱状電極(In Vivo Metric, Healdsburg, CA)の間に一葉をクランプ止めした。これらの電極は、平行な平坦面を有し;これらは同心であり、これらの電極間の肝臓は圧縮され、その結果この葉は、4mm離れた。電極と肝臓の概略は、図9に示している。肝臓は、40ミリ秒の単独の電気穿孔パルスに曝した。1個の電極を、400Vに設定し、他方を接地した。残余の肝臓は、いかなる媒体とも接触せず、その結果電気的に絶縁されていると考えられる。電気穿孔後、このラットを、管理麻酔下で3時間維持した。放血後、肝臓を、圧力をかけ生理食塩水を大量に流し、ホルムアルデヒドの灌流により固定した。この肝臓を、電気穿孔された領域の中心を通り切断し、組織像により分析した。図10および11は、肝臓の外観を示している。組織像は、暗色の区域は、組織壊死の領域に相当することを決定した。電気穿孔された肝臓の電界および温度分布は、40ミリ秒間、電圧400Vを1個の電極に施し、他方は接地した、実施例1の式を用いて計算した。肝臓は、同心の円柱状電極を伴う、厚さ4mmの無限スラブ(slab)としてモデル化された(図9参照)。これらの結果は、図12に示した。図12は、一定の電圧勾配(V/cm)の線および一定温度の線を示している。電気穿孔された組織の大部分において、温度はパルス直後に約42℃であることは明らかである。最高温度は、円柱状電極の端の近傍に生じ、そこでは約50℃である。図13は、図11および12を一緒にすることにより得た。組織学的測定値に計算された結果を重ねることは、暗色(壊死)区域の境界は、約300V/cmの電気穿孔パラメータに対応することを明らかにしている。これらの結果は、不可逆的電気穿孔は、電気化学療法におけるような追加の化学物質を必要とせず、かつ温熱作用を伴わずに、実質的組織壊死を誘導することができることを明示している。
Claims (7)
- 第一の電気穿孔電極、
使用時に第一の電気穿孔電極と共に標的組織細胞を含む標的組織領域を画定し、第一の電気穿孔電極と共に作動するように調整された位置に配置される、第二の電気穿孔電極、
第一と第二の電気穿孔電極の間を流れる電流を発生させるように適合された電圧発生手段であって、該電流を、実質的にすべての標的組織細胞に対して不可逆的電気穿孔を行うのに十分であり、かつ、標的組織領域内の標的組織細胞の温度を42℃よりも高くするのに十分である、所定の長さおよび電圧の複数の電気パルスとして発生させる、電圧発生手段、
を含む、非温熱不可逆的電気穿孔によって組織の細胞をアブレーションするためのシステム。 - 第一の電気穿孔電極、
使用時に第一の電気穿孔電極と共に標的組織細胞を含む標的組織領域を画定し、第一の電気穿孔電極と共に作動するように調整された位置に配置される、第二の電気穿孔電極、
第一と第二の電気穿孔電極の間を流れる電流を発生させるように適合された電圧発生手段であって、該電流を、標的組織細胞に対して不可逆的電気穿孔を行うのに十分であり、かつ、標的組織領域内の標的細胞が42℃よりも高い温度に上げられるように少なくとも標的組織領域の第一の選択された部分の温度を上昇させるのに十分である所定の長さおよび電圧の複数の電気パルスとして発生させる、電圧発生手段、
を含む、熱的損傷および不可逆的電気穿孔の組合せによって組織の細胞をアブレーションするためのシステム。 - 電圧発生手段が、それぞれ5マイクロ秒〜110マイクロ秒のパルス長をもつ電気パルスを発生するように適合されている、請求項1または2記載のシステム。
- アブレーションする組織の不可逆的電気穿孔の発生を検出するように適合された検出手段をさらに含む、請求項1または2記載のシステム。
- アブレーションする組織の電気的インピーダンスをモニターし、不可逆的電気穿孔の発生を検出するように適合されたモニタリング手段をさらに含む、請求項4記載のシステム。
- 電気的インピーダンス断層撮影に基づきアブレーションする組織の不可逆的電気穿孔の発生を検出するように適合された、検出手段をさらに含む、請求項1または2記載のシステム。
- 電圧発生手段が、標的組織細胞の電気的抵抗を連続的に検出し;かつ、
パルスの長さまたは電圧を調節して標的組織細胞の不可逆的電気穿孔を達成するように
適合されている、請求項1または2記載のシステム。
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