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JP2008235679A - Manufacturing method of encoder substrate - Google Patents

Manufacturing method of encoder substrate Download PDF

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Publication number
JP2008235679A
JP2008235679A JP2007074852A JP2007074852A JP2008235679A JP 2008235679 A JP2008235679 A JP 2008235679A JP 2007074852 A JP2007074852 A JP 2007074852A JP 2007074852 A JP2007074852 A JP 2007074852A JP 2008235679 A JP2008235679 A JP 2008235679A
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Prior art keywords
conductive layer
conductive
binder resin
resin
encoder
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Inventor
Hisashi Komatsu
寿 小松
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Alps Alpine Co Ltd
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Alps Electric Co Ltd
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Priority to JP2007074852A priority Critical patent/JP2008235679A/en
Priority to CNA2008100854618A priority patent/CN101271788A/en
Publication of JP2008235679A publication Critical patent/JP2008235679A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an encoder substrate where especially a plurality of conduction parts can highly precisely be formed at narrow pitches and surfaces of the conduction parts and a surface of an insulating substrate can be formed to be smooth. <P>SOLUTION: Conductive paste comprising carbon powder and binder resin is printed and a first conduction layer 21 is formed on a transfer plate 30. Conductive paste comprising silver powder and binder resin is printed and a second conduction layer 22 is formed on the first conduction layer 21. An outer shape of a conduction layer 23 formed of the first conduction layer 21 and the second conduction layer 22 is patterned by a laser. First conduction parts 24 are formed on an outer peripheral side of the conduction layer 23 by leaving intervals and second conduction parts 25 on an inner peripheral side by leaving the intervals. They are put in a metal mold and the insulating substrate formed of resin is injection-molded. The intervals between the conduction parts are buried with resin. The transfer plate 30 is peeled and the conduction layer 23 is transferred to an insulating substrate-side. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、複数の導電部を高精度に狭ピッチで形成できるとともに、前記導電部の表面と絶縁基板の表面とを平滑に形成できるエンコーダ基板の製造方法に関する。   The present invention relates to a method of manufacturing an encoder substrate that can form a plurality of conductive portions with high precision and a narrow pitch, and that can smoothly form the surface of the conductive portions and the surface of an insulating substrate.

下記特許文献1には、エンコーダ基板の製造方法が開示されている。
特許文献1に記載された発明では特許文献1の[0014]欄〜[0022]欄に記載されているように、まず、キャリアフィルム1にカーボンペーストの皮膜を印刷形成し、加熱してカーボン層2を形成した後、1次金型3内に前記キャリアフィルム1を配置して、導電性プラスチックブロック4を射出成形する。
Patent Document 1 listed below discloses a method for manufacturing an encoder board.
In the invention described in Patent Document 1, as described in [0014] column to [0022] column of Patent Document 1, first, a film of carbon paste is printed on the carrier film 1 and heated to form a carbon layer. After forming 2, the carrier film 1 is placed in the primary mold 3 and the conductive plastic block 4 is injection molded.

続いて、前記1次金型3から前記導電性プラスチックブロック4を取り出し、キャリアフィルム1を剥離する。このとき前記カーボン層2がパターン状に前記導電性プラスチックブロック4に転写され、導電ブロック5が形成される。   Subsequently, the conductive plastic block 4 is taken out from the primary mold 3 and the carrier film 1 is peeled off. At this time, the carbon layer 2 is transferred to the conductive plastic block 4 in a pattern, and a conductive block 5 is formed.

次に、前記導電ブロック5を2次金型6に入れて、絶縁性プラスチックを射出成形し、その後、前記2次金型6内から取り出すと、特許文献1の例えば図4に示すエンコーダ基板が完成する。
特許第2882549号の特許公報
Next, when the conductive block 5 is put into a secondary mold 6 and an insulating plastic is injection-molded, and then taken out from the secondary mold 6, the encoder substrate shown in FIG. Complete.
Japanese Patent No. 2882549

しかしながら、上記したエンコーダ基板の製造方法では、膜厚の厚い導電性プラスチックブロックの存在により、金型内での絶縁性樹脂の流れが悪く、導電パターン8のパターン間隔を狭くすると、前記パターン間隔内を前記絶縁樹脂にて適切に埋めることができなくなる。また、特許文献1の製造方法では、導電パターン8のパターン間隔を、1次金型3の内面形状にて制御しなければいけない。   However, in the above encoder substrate manufacturing method, due to the presence of the conductive plastic block having a large film thickness, the flow of insulating resin in the mold is poor. Cannot be properly filled with the insulating resin. Moreover, in the manufacturing method of patent document 1, the pattern interval of the conductive pattern 8 must be controlled by the inner surface shape of the primary mold 3.

さらに、特許文献1に記載された発明では、導電性プラスチックブロック4を射出形成した後、別の金型を用いて、絶縁性プラスチックを射出成形している。   Furthermore, in the invention described in Patent Document 1, after the conductive plastic block 4 is injection-formed, the insulating plastic is injection-molded using another mold.

この結果、特許文献1に記載された製造方法では、導電パターン8の狭ピッチ化が困難であり、また、導電パターン8の表面と絶縁性プラスチックの表面との間に段差が生じやすく、平滑な摺動面を形成できないといった問題があった。さらに別々の金型を用いて、導電性プラスチックブロック4と絶縁性プラスチックとを射出成形し、しかも金型形状も複雑であるため、製造方法が複雑となりコスト高となる問題もあった。   As a result, in the manufacturing method described in Patent Document 1, it is difficult to reduce the pitch of the conductive pattern 8, and a step is easily generated between the surface of the conductive pattern 8 and the surface of the insulating plastic. There was a problem that the sliding surface could not be formed. Furthermore, since the conductive plastic block 4 and the insulating plastic are injection-molded using different molds and the mold shape is complicated, there is a problem that the manufacturing method is complicated and the cost is increased.

そこで本発明は上記従来の課題を解決するためのものであり、特に、複数の導電部を高精度に狭ピッチで形成できるとともに、前記導電部の表面と絶縁基板の表面とを平滑に形成できるエンコーダ基板を提供することを目的としている。   Therefore, the present invention is for solving the above-described conventional problems, and in particular, a plurality of conductive portions can be formed with high precision and a narrow pitch, and the surface of the conductive portion and the surface of the insulating substrate can be formed smoothly. An object is to provide an encoder board.

本発明は、導電部と絶縁基板とが交互に表出する表面領域を備えるエンコーダ基板の製造方法において、
(a) 転写板上に、導電性粒子とバインダー樹脂とを有する導電ペーストを印刷して導電層を形成する工程、
(b) 前記導電層に、間隔をおいて複数の前記導電部が形成されるように、平面から見た前記導電層の外形をパターン加工する工程、
(c) 前記転写板上に形成した前記導電層を金型内に配置し、溶融した樹脂を前記金型内に流し込み、このとき、前記導電部間の間隔内を前記樹脂で埋める工程、
(d) 前記転写板を剥離して、前記導電層を前記樹脂からなる絶縁基板に転写する工程、
を有することを特徴とするものである。
The present invention provides a method for manufacturing an encoder board having a surface region in which conductive portions and insulating substrates are alternately exposed.
(A) a step of printing a conductive paste having conductive particles and a binder resin on the transfer plate to form a conductive layer;
(B) a step of patterning the outer shape of the conductive layer as viewed from above so that a plurality of the conductive portions are formed at intervals in the conductive layer;
(C) placing the conductive layer formed on the transfer plate in a mold, pouring molten resin into the mold, and filling the space between the conductive portions with the resin at this time;
(D) peeling the transfer plate and transferring the conductive layer to the insulating substrate made of the resin;
It is characterized by having.

本発明では、前記(a)工程で、導電層を転写板上に印刷形成しているため、前記導電層の膜厚を薄く形成でき、前記(c)工程で樹脂を前記導電部間の間隔内に適切に流し込むことが出来る。また、導電部を印刷形成後、(b)工程で、導電層の外形をパターン加工して、前記導電層に、間隔を空けた複数の前記導電部を形成している。さらに本発明では、(d)工程で、前記導電層を絶縁基板に転写している。   In the present invention, since the conductive layer is printed on the transfer plate in the step (a), the thickness of the conductive layer can be reduced, and in the step (c), the resin is spaced between the conductive portions. It can be poured into the inside properly. In addition, after the conductive portion is printed and formed, in the step (b), the outer shape of the conductive layer is patterned to form a plurality of the conductive portions at intervals in the conductive layer. Further, in the present invention, the conductive layer is transferred to the insulating substrate in the step (d).

以上の各工程を用いることで、本発明によれば、従来に比べて複数の前記導電部を高精度に狭ピッチで形成できるとともに、前記導電部の表面と絶縁基板の表面とを平滑に形成することが出来る。加えて、従来のように複雑な金型を必要とせず、簡単な製造方法にて安価に、導電部と絶縁基板とが交互に表出する表面領域を備えるエンコーダ基板を製造することが可能である。   By using each of the above steps, according to the present invention, a plurality of the conductive portions can be formed with a high precision and a narrow pitch, and the surface of the conductive portions and the surface of the insulating substrate can be formed smoothly. I can do it. In addition, it is possible to manufacture an encoder board having a surface area in which conductive portions and insulating substrates are alternately exposed at low cost by a simple manufacturing method without requiring a complicated mold as in the prior art. is there.

本発明では、前記(b)工程にて、前記導電層の外形をレーザ照射によりパターン加工することが好ましい。これにより、より高精度に、前記導電部を狭ピッチで形成できる。   In the present invention, it is preferable that the outer shape of the conductive layer is patterned by laser irradiation in the step (b). Thereby, the said electroconductive part can be formed with a narrow pitch with higher precision.

また本発明では、
前記(b)工程と、前記(c)工程の間に、
(e) 前記導電層を加熱して、バインダー樹脂を硬化させる工程、
を有することが好ましい。これにより、前記導電層の外形をパターン加工するときは、前記導電層を硬化していないため、前記パターン加工によって、前記導電層が前記転写板から剥がれたり破損する不具合を回避することができ、耐久性に優れ、信頼性の高いエンコーダ基板を製造できる。
In the present invention,
Between the step (b) and the step (c),
(E) heating the conductive layer to cure the binder resin;
It is preferable to have. Thereby, when patterning the outer shape of the conductive layer, because the conductive layer is not cured, the pattern processing can avoid the problem that the conductive layer is peeled off or damaged from the transfer plate, A highly reliable encoder board with excellent durability can be manufactured.

また本発明では、前記(a)工程で、カーボン粉と第1のバインダー樹脂とを有する第1の導電ペーストを前記転写板上に印刷して第1の導電層を形成し、
次に、銀粉と第2のバインダー樹脂とを有する第2の導電ペーストを前記第1の導電層上に印刷して第2の導電層を形成することが好ましい。これにより第1の導電層がエンコーダ基板の表面から露出するが、本発明の構成により耐環境性に優れるとともに、銀粉を含む第2の導電層を第1の導電層に重ねて形成することで、導通抵抗を低下させることが出来る。
In the present invention, in the step (a), a first conductive paste having carbon powder and a first binder resin is printed on the transfer plate to form a first conductive layer,
Next, it is preferable to print a second conductive paste having silver powder and a second binder resin on the first conductive layer to form a second conductive layer. As a result, the first conductive layer is exposed from the surface of the encoder substrate, but the structure of the present invention is excellent in environmental resistance, and the second conductive layer containing silver powder is formed to overlap the first conductive layer. The conduction resistance can be reduced.

本発明では、前記第1のバインダー樹脂と、前記第2のバインダー樹脂とに同種の熱硬化性樹脂を用いることが、前記第1の導電層と前記第2の導電層間の密着性を向上させることができ好適である。   In the present invention, using the same kind of thermosetting resin for the first binder resin and the second binder resin improves the adhesion between the first conductive layer and the second conductive layer. This is preferable.

また本発明では、前記第2の導電ペースト中に導電性粒子(銀粉)として、主成分の銀と、酸化ビスマス、あるいはカーボン、又は酸化ビスマス及びカーボンを有してなる複合粉を含むことが好ましい。   In the present invention, the second conductive paste preferably contains, as conductive particles (silver powder), silver as a main component and bismuth oxide, carbon, or a composite powder comprising bismuth oxide and carbon. .

上記複合粉からなる銀粉は、純度の高い銀粉に比べて、バインダー樹脂を硬化させるための加熱温度(焼成温度)で溶融しにくい(あるいは不溶である)。したがって前記溶融による発熱を適切に抑制でき、この結果、前記バインダー樹脂等の分解を抑制でき、前記第1の導電層と前記第2の導電層の密着性を向上させることが出来るとともに、前記導電層の膜強度を向上させることが出来る。   The silver powder composed of the composite powder is less likely to melt (or insoluble) at a heating temperature (baking temperature) for curing the binder resin, compared to silver powder having a high purity. Accordingly, heat generation due to melting can be appropriately suppressed, and as a result, decomposition of the binder resin and the like can be suppressed, adhesion between the first conductive layer and the second conductive layer can be improved, and the conductive property can be improved. The film strength of the layer can be improved.

本発明のエンコーダ基板の製造方法によれば、従来に比べて複数の導電部を高精度に狭ピッチで形成できるとともに、前記導電部の表面と絶縁基板の表面とを平滑に形成することが出来る。   According to the encoder substrate manufacturing method of the present invention, it is possible to form a plurality of conductive portions at a narrow pitch with high accuracy and a smooth surface between the conductive portion and the surface of the insulating substrate. .

図1ないし図6は、本実施形態のエンコーダ基板の製造方法を示す。図1(a)、図2(a)、図3(a)、及び図4ないし図6は、いずれも製造工程中における前記エンコーダ基板を図1(b)、図2(b)及び図3(b)に示すA−A線から膜厚方向に切断し矢印方向から見た断面形状で示している。図1(b)、図2(b)、及び図3(b)は夫々、図1(a)、図2(a)及び図3(a)の平面図である。   1 to 6 show a method for manufacturing an encoder board according to the present embodiment. 1 (a), 2 (a), 3 (a), and 4 to 6 all show the encoder substrate in the manufacturing process as shown in FIGS. 1 (b), 2 (b), and 3. The cross-sectional shape is cut in the film thickness direction from the line AA shown in (b) and viewed from the arrow direction. FIGS. 1B, 2B, and 3B are plan views of FIGS. 1A, 2A, and 3A, respectively.

図1に示す工程では、例えば黄銅板で形成された転写板30上に、第1の導電ペーストをスクリーン印刷して第1の導電層21を形成する。前記転写板30の表面は予め鏡面加工されている。前記転写板30は金属であることが好適である。前記転写板30を金属で形成することにより、前記第1の導電層21に比べて熱収縮率を小さくでき(金属で形成された転写板30は熱により膨張傾向にある)、最終工程で前記転写板30を剥離しやすい。   In the process shown in FIG. 1, a first conductive layer 21 is formed by screen printing a first conductive paste on a transfer plate 30 formed of, for example, a brass plate. The surface of the transfer plate 30 is mirror-finished in advance. The transfer plate 30 is preferably made of metal. By forming the transfer plate 30 with a metal, the thermal contraction rate can be reduced as compared with the first conductive layer 21 (the transfer plate 30 formed with a metal tends to expand due to heat). The transfer plate 30 is easy to peel off.

本実施形態では、第1の溶媒に、第1のバインダー樹脂を溶解させ、これに例えばカーボンブラックと、カーボンファイバー(平均粒径3〜30μmのカーボンファイバーの粉砕粉)を混合させたものを前記第1の導電ペーストとする。例えば、前記第1のバインダー樹脂は、30〜95体積%、カーボンブラック及びカーボンファイバーは合わせて5〜70体積%である(溶媒を除いた第1のバインダー樹脂、カーボンブラック、カーボンファイバーの合計が100体積%)。   In the present embodiment, the first binder resin is dissolved in the first solvent, and, for example, carbon black and carbon fiber (a pulverized powder of carbon fiber having an average particle diameter of 3 to 30 μm) mixed with the first binder resin. The first conductive paste is used. For example, the first binder resin is 30 to 95% by volume, and the total of carbon black and carbon fiber is 5 to 70% by volume (the total of the first binder resin, carbon black, and carbon fiber excluding the solvent is 100% by volume).

前記転写板30の表面に、前記第1の導電層21のパターン形状を製版するステンレス製のマスクを用い、前記転写板30の表面にペースト状の前記第1の導電層21を図1(b)のようにリング状にスクリーン印刷する。   A stainless steel mask for making the pattern shape of the first conductive layer 21 is used on the surface of the transfer plate 30, and the paste-like first conductive layer 21 is formed on the surface of the transfer plate 30 as shown in FIG. ) Screen print in a ring shape.

印刷後、乾燥炉を用いて、前記第1の導電層21を例えば100℃〜250℃で10分〜60分乾燥させ、前記第1の溶媒を蒸発させて除去する。   After printing, the first conductive layer 21 is dried, for example, at 100 to 250 ° C. for 10 to 60 minutes using a drying furnace, and the first solvent is evaporated and removed.

次に図2に示す工程では、前記第1の導電層21上に、ペースト状の第2の導電層22をスクリーン印刷にて図2(b)のようにリング状でパターン形成する。   Next, in the step shown in FIG. 2, a paste-like second conductive layer 22 is formed on the first conductive layer 21 in a ring shape as shown in FIG. 2B by screen printing.

第2の導電ペーストは、第2の溶媒中に、第2のバインダー樹脂及び、主成分の銀と、酸化ビスマス、あるいは、カーボン、又は酸化ビスマス及びカーボンとを有する複合粉等の銀を主成分とした導電性粒子(銀分)を混合したものであることが好適である。例えば、前記第2のバインダー樹脂は、50〜95体積%、導電性粒子は、5〜50体積%である(溶媒を除いた第2のバインダー樹脂、前記導電性粒子の合計が100体積%)。なお、本実施形態においては、導電性粒子(銀粉)として、主成分の銀と酸化ビスマス、及びカーボンを含んだ複合粉からなる銀粉を用いている。   The second conductive paste is mainly composed of a second binder resin, silver as a main component, and bismuth oxide, carbon, or a composite powder containing carbon, bismuth oxide and carbon, or the like in a second solvent. It is preferable that the conductive particles (silver content) are mixed. For example, the second binder resin is 50 to 95% by volume, and the conductive particles are 5 to 50% by volume (the second binder resin excluding the solvent and the total of the conductive particles is 100% by volume). . In the present embodiment, silver powder made of composite powder containing silver, bismuth oxide, and carbon as main components is used as the conductive particles (silver powder).

印刷後に、乾燥炉を用いて、スクリーン印刷したペースト状の第2の導電層22を例えば、100〜260℃で10〜60分間乾燥させて、前記第2の溶媒を蒸発させて除去する。
第1の導電層21及び第2の導電層22の乾燥を同時に行ってもよい。
After printing, using a drying furnace, the screen-printed paste-like second conductive layer 22 is dried, for example, at 100 to 260 ° C. for 10 to 60 minutes, and the second solvent is evaporated and removed.
You may dry the 1st conductive layer 21 and the 2nd conductive layer 22 simultaneously.

図2(b)に示すように、前記第2の導電層22の外径を、前記第1の導電層21の外径よりも小さく、前記第2の導電層22の内径を、前記第1の導電層21の内径よりも大きくして、リング状の前記第2の導電層22を、完全に、リング状の前記第1の導電層21上に重ねて形成する。   As shown in FIG. 2B, the outer diameter of the second conductive layer 22 is smaller than the outer diameter of the first conductive layer 21, and the inner diameter of the second conductive layer 22 is set to the first conductive layer 22. The ring-shaped second conductive layer 22 is completely formed on the ring-shaped first conductive layer 21 so as to be larger than the inner diameter of the conductive layer 21.

次に図3の工程では、平面から見た前記第1の導電層21及び第2の導電層22の外形を図3(b)に示すように、レーザ照射にてパターン加工する(トリミング)。レーザ照射により、前記第1の導電層21及び第2の導電層22を溶断する。前記レーザには半導体レーザやYAGレーザ等の固体レーザを使用できる。   Next, in the process of FIG. 3, the outer shapes of the first conductive layer 21 and the second conductive layer 22 as viewed from above are patterned by laser irradiation (trimming) as shown in FIG. The first conductive layer 21 and the second conductive layer 22 are fused by laser irradiation. As the laser, a solid-state laser such as a semiconductor laser or a YAG laser can be used.

図3(b)に示すように、前記第1の導電層21及び第2の導電層22から成る導電層23の外周側に、複数の第1の導電部24を円周方向に間隔を空けて形成し、前記導電層23の内周側に、複数の第2の導電部25を円周方向に間隔を空けて形成する。図3(b)では、前記導電層23の概ね半周に、前記第1の導電部24及び第2の導電部25を形成しているが、実際には、前記導電層23の全周に、前記第1の導電部24及び第2の導電部25を夫々間隔を空けて形成する。   As shown in FIG. 3B, a plurality of first conductive portions 24 are spaced apart in the circumferential direction on the outer peripheral side of the conductive layer 23 composed of the first conductive layer 21 and the second conductive layer 22. A plurality of second conductive portions 25 are formed on the inner peripheral side of the conductive layer 23 at intervals in the circumferential direction. In FIG. 3 (b), the first conductive portion 24 and the second conductive portion 25 are formed on the substantially half circumference of the conductive layer 23. In practice, however, the entire circumference of the conductive layer 23 is The first conductive portion 24 and the second conductive portion 25 are formed with a space therebetween.

次に、加熱炉において400℃程度の温度で1〜2時間加熱し、前記第1の導電層21に含まれる前記第1のバインダー樹脂及び、第2の導電層22に含まれる第2のバインダー樹脂を同時に熱硬化させる。これにより前記第1の導電層21は熱硬化したバインダー樹脂中にカーボン粉が分散した膜構造になり、前記第2の導電層22は熱硬化したバインダー樹脂中に複合粉が分散した膜構造になる。   Next, the first binder resin contained in the first conductive layer 21 and the second binder contained in the second conductive layer 22 are heated in a heating furnace at a temperature of about 400 ° C. for 1 to 2 hours. The resin is thermoset simultaneously. Accordingly, the first conductive layer 21 has a film structure in which carbon powder is dispersed in a thermoset binder resin, and the second conductive layer 22 has a film structure in which composite powder is dispersed in a thermoset binder resin. Become.

ここで第1の溶媒及び第2の溶媒には、酢酸カルビトール、メチルカルビトール、エチルカルビトール、ブチルカルビトール、モノグライム、ジグライム、メチルトリグライム等を使用できる。   Here, carbitol acetate, methyl carbitol, ethyl carbitol, butyl carbitol, monoglyme, diglyme, methyltriglyme and the like can be used as the first solvent and the second solvent.

また、前記第1のバインダー樹脂及び第2のバインダー樹脂には、ポリイミド樹脂、ビスマレイミド樹脂、エポキシ樹脂、フェノール樹脂、アクリル樹脂等の熱硬化性樹脂を選択できる。なお前記バインダー樹脂に、アセチレン末端ポリイソイミドオリゴマーを含むことがガラス転移温度(Tg)を高くでき耐熱性を向上させる上で好ましい。   The first binder resin and the second binder resin may be selected from thermosetting resins such as polyimide resin, bismaleimide resin, epoxy resin, phenol resin, and acrylic resin. The binder resin preferably contains an acetylene-terminated polyisoimide oligomer from the viewpoint of increasing the glass transition temperature (Tg) and improving the heat resistance.

次に図4に示す工程では、前記転写板30上に形成した導電層23を金型40内に配置する。そして、前記金型40のキャビティ43に溶融状態の例えばエポキシ樹脂を射出する。このとき、前記エポキシ樹脂は、前記第1の導電部24間の間隔26内や、前記第2の導電部25間の間隔内にも適切に流れて、前記間隔内を埋める。   Next, in the step shown in FIG. 4, the conductive layer 23 formed on the transfer plate 30 is placed in the mold 40. Then, molten epoxy resin, for example, is injected into the cavity 43 of the mold 40. At this time, the epoxy resin appropriately flows in the interval 26 between the first conductive portions 24 and also in the interval between the second conductive portions 25 to fill the interval.

金型40の温度は例えば160〜200℃であり、前記エポキシ樹脂が硬化して絶縁基板41が成形される。そして、前記転写板30が付いた絶縁基板41を金型40から取り出し、図5に示すように、転写板30を前記絶縁基板41から剥離し、前記導電層23を前記絶縁基板41に転写すると、エンコーダ基板42が完成する。   The temperature of the mold 40 is, for example, 160 to 200 ° C., and the epoxy resin is cured to form the insulating substrate 41. Then, the insulating substrate 41 with the transfer plate 30 is taken out from the mold 40, and the transfer plate 30 is peeled off from the insulating substrate 41 and the conductive layer 23 is transferred to the insulating substrate 41 as shown in FIG. The encoder board 42 is completed.

図7は完成したエンコーダ基板42の平面図である。ここで言うエンコーダ基板42の平面とは、図5で言う転写板30の剥離面を指す。   FIG. 7 is a plan view of the completed encoder board 42. The plane of the encoder substrate 42 here refers to the peeling surface of the transfer plate 30 as shown in FIG.

図7に示すように、前記エンコーダ基板42の表面には、前記導電層23の表面と、前記絶縁基板41の表面とが現れる。前記導電層23は、第1の導電層21が表面に現れ、第2の導電層22は表面に現れていない。図7に示すように、前記導電層23の表面には、リング状のコモン領域23aと、前記コモン領域23aの外周に沿って所定の間隔をあけて外方向に突出する複数のA相領域24aと、前記コモン領域23aの内周に沿って所定の間隔をあけて内方向に突出する複数のB相領域25aとが現れる。   As shown in FIG. 7, the surface of the conductive layer 23 and the surface of the insulating substrate 41 appear on the surface of the encoder substrate 42. In the conductive layer 23, the first conductive layer 21 appears on the surface, and the second conductive layer 22 does not appear on the surface. As shown in FIG. 7, on the surface of the conductive layer 23, a ring-shaped common region 23a and a plurality of A-phase regions 24a projecting outward at a predetermined interval along the outer periphery of the common region 23a. And a plurality of B-phase regions 25a projecting inward at predetermined intervals along the inner periphery of the common region 23a.

各A相領域24aは、各第1の導電部24の表面であり、各B相領域25aの表面は、各第2の導電部25の表面である。各A相領域24a間、及び各B相領域25a間には、前記絶縁基板41の表面が現れる。   Each A-phase region 24 a is the surface of each first conductive portion 24, and the surface of each B-phase region 25 a is the surface of each second conductive portion 25. The surface of the insulating substrate 41 appears between the A-phase regions 24a and between the B-phase regions 25a.

図8は、図7に示す導電層23の表面の一部を拡大した図である。図8に示すように、コモン領域23aを挟んで最も近くで対向するA相領域24aの幅寸法(周方向の寸法)の中心線Bと前記B相領域25aの幅寸法(周方向の寸法)の中心線Cは、ずれている。図8の実施形態では、前記A相領域24aの前記中心線Bにより仕切られた半分の領域と、前記B相領域25aの前記中心線Cにより仕切られた半分の領域とが前記コモン領域23aを介して互いに対向し、前記A相領域24aの残りの領域が、前記B相領域25a間の間隔(絶縁基板41)とコモン領域23aを挟んで対向した位置にあり、前記B相領域25aの残りの領域が、前記A相領域24a間の間隔(絶縁基板41)とコモン領域23aを挟んで対向した位置にある。   FIG. 8 is an enlarged view of a part of the surface of the conductive layer 23 shown in FIG. As shown in FIG. 8, the center line B of the width dimension (dimension in the circumferential direction) of the A-phase area 24a that is closest to each other across the common area 23a and the width dimension (dimension in the circumferential direction) of the B-phase area 25a. The center line C is shifted. In the embodiment of FIG. 8, the half region partitioned by the center line B of the A phase region 24a and the half region partitioned by the center line C of the B phase region 25a define the common region 23a. The remaining region of the A phase region 24a is located at a position facing the space between the B phase regions 25a (insulating substrate 41) and the common region 23a, and the remaining of the B phase region 25a. Is located at a position opposite to the space between the A-phase regions 24a (insulating substrate 41) across the common region 23a.

図示しないコモン摺動子は、リング状の前記コモン領域23a上を相対的に摺動する。また図示しない第1の摺動子は、A相領域24aと、A相領域24a間の絶縁基板41の表面とが円周方向(摺動方向)に沿って交互に表出する第1の表面領域(第1の摺動領域)上を相対的に摺動する。さらに図示しない第2の摺動子は、B相領域25aと、B相領域25a間の絶縁基板41の表面とが円周方向(摺動方向)に沿って交互に表出する第2の表面領域(第2の摺動領域)上を相対的に摺動する。   A common slider (not shown) relatively slides on the ring-shaped common region 23a. Further, the first slider (not shown) is a first surface in which the A-phase region 24a and the surface of the insulating substrate 41 between the A-phase regions 24a are alternately exposed along the circumferential direction (sliding direction). Relative sliding on the region (first sliding region). Further, the second slider (not shown) is a second surface in which the B-phase region 25a and the surface of the insulating substrate 41 between the B-phase regions 25a alternately appear along the circumferential direction (sliding direction). Relative sliding on the region (second sliding region).

第1の摺動子が、A相領域24a上を相対的に摺動すると、第1の摺動子とコモン摺動子とが電気的に接続され、オン(ON)信号が出力される。一方、前記第1の摺動子が前記絶縁基板41上を相対的に摺動すると前記第1の摺動子とコモン摺動子が電気的に切断され、オフ(OFF)信号が出力される。そして、このオン信号とオフ信号が交互に繰り返され、A相パルス信号(V)が出力される。 When the first slider slides relatively on the A-phase region 24a, the first slider and the common slider are electrically connected, and an ON (ON) signal is output. On the other hand, when the first slider slides relatively on the insulating substrate 41, the first slider and the common slider are electrically disconnected, and an OFF signal is output. . Then, the ON signal and the OFF signal are alternately repeated, and an A-phase pulse signal (V A ) is output.

また、前記第2の摺動子が前記B相領域25a上を相対的に摺動すると、前記第2の摺動子とコモン摺動子とが電気的に接続され、オン(ON)信号が出力され、一方、前記第2の摺動子が前記絶縁基板41上を相対的に摺動すると前記第2の摺動子とコモン摺動子が電気的に切断され、オフ(OFF)信号が出力される。そして、このオン信号とオフ信号が交互に繰り返され、B相パルス信号(V)が出力される。 When the second slider slides relatively on the B-phase region 25a, the second slider and the common slider are electrically connected, and an ON (ON) signal is generated. On the other hand, when the second slider slides relatively on the insulating substrate 41, the second slider and the common slider are electrically disconnected, and an OFF signal is generated. Is output. Then, the ON signal and the OFF signal are alternately repeated, and a B-phase pulse signal (V B ) is output.

A相領域24aとB相領域25aとが図8のようにずれて配置されているので、A相のパルスと、B相のパルスはタイミング(位相)が90度(1パルスの1/4分)ずれて出力される。各パルスの出力を測定することで回転状態(回転方向と回転量)を検知できるようになっている。   Since the A-phase region 24a and the B-phase region 25a are shifted as shown in FIG. 8, the timing (phase) of the A-phase pulse and the B-phase pulse is 90 degrees (1/4 of one pulse). ) Output is shifted. By measuring the output of each pulse, the rotation state (rotation direction and rotation amount) can be detected.

本実施形態では、エンコーダ基板42が回転側で、摺動子が固定される形態でもよいし、あるいは、摺動子が回転側で、前記エンコーダ基板42が固定されている形態であってもどちらでもよい。   In this embodiment, the encoder substrate 42 may be on the rotation side and the slider may be fixed, or the slider may be on the rotation side and the encoder substrate 42 may be fixed. But you can.

本実施形態のエンコーダ基板42の製造方法の特徴的部分について説明する。
本実施形態では、図1及び図2の工程で、転写板30上に第1の導電層21及び第2の導電層22をスクリーン印刷で形成している。この結果、前記第1の導電層21と前記第2の導電層22から成る導電層23の膜厚を薄く形成できる。
The characteristic part of the manufacturing method of the encoder substrate 42 of the present embodiment will be described.
In the present embodiment, the first conductive layer 21 and the second conductive layer 22 are formed on the transfer plate 30 by screen printing in the steps of FIGS. As a result, the conductive layer 23 composed of the first conductive layer 21 and the second conductive layer 22 can be formed thin.

本実施形態では図3の工程で、前記導電層23の外形をパターン加工して複数の第1の導電部24及び第2の導電部25を形成するが、前記導電層23の膜厚は薄いため、適切にトリミングでき、前記第1の導電部24及び第2の導電部25を夫々狭ピッチにて高精度に形成できる。   In this embodiment, in the step of FIG. 3, the outer shape of the conductive layer 23 is patterned to form a plurality of first conductive portions 24 and second conductive portions 25, but the thickness of the conductive layer 23 is thin. Therefore, trimming can be performed appropriately, and the first conductive portion 24 and the second conductive portion 25 can be formed with high accuracy at a narrow pitch.

本実施形態では、図3の工程で、レーザ、電子ビーム、エッチング等によって前記導電層23の外形をパターン加工することが可能であるが、特にレーザで前記導電層23の外形をパターン加工することが、前記第1の導電部24及び第2の導電部25を夫々狭ピッチにてより高精度に形成でき好適である。本実施形態では、前記第1の導電部24間及び第2の導電部25間の間隔を50μm程度で形成でき、1回転で200〜400パルス程度の信号を出力することが出来るエンコーダ基板42を製造できる。   In the present embodiment, the outer shape of the conductive layer 23 can be patterned by a laser, electron beam, etching, or the like in the step of FIG. 3, but the outer shape of the conductive layer 23 is particularly patterned by a laser. However, it is preferable that the first conductive portion 24 and the second conductive portion 25 can be formed with high accuracy at a narrow pitch. In the present embodiment, the encoder substrate 42 capable of forming a gap between the first conductive portions 24 and the second conductive portions 25 at about 50 μm and outputting a signal of about 200 to 400 pulses per rotation. Can be manufactured.

また、前記導電層23の膜厚が薄いので、狭ピッチ化によっても、図4の絶縁基板41の成形工程で、前記第1の導電部24の間隔26内及び前記第2の導電部25の間隔内を夫々、樹脂にて適切に埋めることができる。加えて、本実施形態では、転写板30にて、導電層23を絶縁基板41側に転写するため、図7に示す導電層23の表面と前記絶縁基板41の表面との間に段差等が生じにくく平滑性に優れたエンコーダ基板を製造することが出来る。   Further, since the thickness of the conductive layer 23 is thin, even when the pitch is narrowed, the insulating substrate 41 shown in FIG. 4 can be formed in the interval 26 of the first conductive portion 24 and the second conductive portion 25 in the molding process. Each of the intervals can be appropriately filled with resin. In addition, in this embodiment, since the conductive layer 23 is transferred to the insulating substrate 41 side by the transfer plate 30, there is a step between the surface of the conductive layer 23 and the surface of the insulating substrate 41 shown in FIG. It is possible to manufacture an encoder substrate that is less likely to occur and has excellent smoothness.

本実施形態では、絶縁基板41を射出成形するための金型40を用いるが前記金型40の形状は特に複雑ではなく、また射出成形も一回で済み、製造コストを従来に比べて低減できる。   In this embodiment, a mold 40 for injection molding the insulating substrate 41 is used. However, the shape of the mold 40 is not particularly complicated, and only one injection molding is required, so that the manufacturing cost can be reduced as compared with the conventional one. .

本実施形態では、図3に示す導電層23の外形パターン加工の工程の後、前記導電層23を加熱処理して、前記導電層23に含まれるバインダー樹脂を硬化させることが好適である。これにより、前記導電層23の外形をパターン加工するときは、前記導電層23を硬化していないため、外形パターン加工によって、前記導電層23が前記転写板30から剥がれたり破損する不具合を回避することができ、耐久性に優れ、信頼性の高いエンコーダ基板42を製造できる。   In the present embodiment, it is preferable to heat-treat the conductive layer 23 after the step of processing the outer shape pattern of the conductive layer 23 shown in FIG. 3 to cure the binder resin contained in the conductive layer 23. Thus, when patterning the outer shape of the conductive layer 23, the conductive layer 23 is not cured, so that the problem that the conductive layer 23 is peeled off or damaged by the outer shape pattern processing is avoided. Thus, the encoder substrate 42 having excellent durability and high reliability can be manufactured.

また本実施形態では、例えば導電層23を一層構造で形成してもよいが、第1の導電層21と第2の導電層22の積層構造で形成することが好ましい。このとき、第1の導電層21にカーボン粉を添加し、第2の導電層22に銀粉を添加する。カーボン粉を含む前記第1の導電層21だけでは導通抵抗が高くなるが銀粉を含む前記第2の導電層22を重ねて設けることで導通抵抗を低下させることが出来る。しかも銀粉を含む第2の導電層22はエンコーダ基板42の表面に露出せず、カーボン粉を含む第1の導電層21が露出するため、耐環境性に優れている。   In this embodiment, for example, the conductive layer 23 may be formed in a single layer structure, but it is preferable to form the conductive layer 23 in a stacked structure of the first conductive layer 21 and the second conductive layer 22. At this time, carbon powder is added to the first conductive layer 21, and silver powder is added to the second conductive layer 22. Only the first conductive layer 21 containing carbon powder increases the conduction resistance, but the conduction resistance can be lowered by providing the second conductive layer 22 containing silver powder in an overlapping manner. Moreover, the second conductive layer 22 containing silver powder is not exposed on the surface of the encoder substrate 42, and the first conductive layer 21 containing carbon powder is exposed, so that the environment resistance is excellent.

また、前記第1の導電層21に含まれる第1のバインダー樹脂と、前記第2の導電層22に含まれる第2のバインダー樹脂は、同種の熱硬化性樹脂であることが好ましい。前記第1のバインダー樹脂及び第2のバインダー樹脂の硬化温度を同じかあるいは近い温度にでき、前記第1のバインダー樹脂及び第2のバインダー樹脂を同じ加熱工程で熱硬化できる。また第1のバインダー樹脂と第2のバインダー樹脂を同種にすることで、前記第1の導電層21及び第2の導電層22間の密着性を向上させることが出来る。ここで「同種」とは、同じ樹脂のみならず、前記樹脂の誘導体も含む。   The first binder resin contained in the first conductive layer 21 and the second binder resin contained in the second conductive layer 22 are preferably the same type of thermosetting resin. The curing temperature of the first binder resin and the second binder resin can be the same or close to each other, and the first binder resin and the second binder resin can be thermally cured in the same heating step. Moreover, the adhesiveness between the said 1st conductive layer 21 and the 2nd conductive layer 22 can be improved by making 1st binder resin and 2nd binder resin the same kind. Here, the “same kind” includes not only the same resin but also a derivative of the resin.

また本実施形態において、第2の導電ペースト中の導電性粒子としての銀粉は、純粋な銀粉に限られるものではない。すなわち銀を主成分とするものであれば、混合粉や複合粉であってもよい。   In the present embodiment, the silver powder as the conductive particles in the second conductive paste is not limited to pure silver powder. That is, a mixed powder or a composite powder may be used as long as the main component is silver.

この場合において、前記第2の導電ペースト中に導電性粒子(銀粉)として、主成分の銀と、酸化ビスマス、あるいはカーボン、又は酸化ビスマス及びカーボンを有してなる複合粉で構成される銀粉を用いることが好ましい。ここで「複合粉」とは、単に、銀粉と酸化ビスマス粉を混ぜたような「混合粉」や複数の金属が溶け合った「合金」とは異なり、粒子1個を取り出したときに、その粒に、銀と酸化ビスマス、あるいは銀とカーボン、又は、銀、酸化ビスマス及びカーボンを含んだものである。   In this case, silver powder composed of silver as a main component and bismuth oxide, carbon, or composite powder containing bismuth oxide and carbon as conductive particles (silver powder) in the second conductive paste. It is preferable to use it. Here, “composite powder” is different from “mixed powder” in which silver powder and bismuth oxide powder are simply mixed or “alloy” in which a plurality of metals are melted together. In addition, silver and bismuth oxide, silver and carbon, or silver, bismuth oxide and carbon are included.

上記複合粉からなる銀粉は、純度の高い銀粉に比べて、バインダー樹脂を硬化させるための加熱温度(焼成温度)で溶融しにくい(あるいは不溶である)。したがって前記溶融による発熱を適切に抑制でき、この結果、前記バインダー樹脂等の分解を抑制でき、前記第1の導電層と前記第2の導電層の密着性を向上させることが出来るとともに、前記導電層の膜強度を向上させることが出来る。   The silver powder composed of the composite powder is less likely to melt (or insoluble) at a heating temperature (baking temperature) for curing the binder resin, compared to silver powder having a high purity. Accordingly, heat generation due to melting can be appropriately suppressed, and as a result, decomposition of the binder resin and the like can be suppressed, adhesion between the first conductive layer and the second conductive layer can be improved, and the conductive property can be improved. The film strength of the layer can be improved.

本実施形態のエンコーダ基板の製造方法を示す工程図であり、(a)は、前記エンコーダ基板を図1(b)に示すA−A線から膜厚方向に切断し矢印方向から見た断面図、(b)は図1(a)の平面図、It is process drawing which shows the manufacturing method of the encoder board | substrate of this embodiment, (a) is sectional drawing which cut | disconnected the said encoder board | substrate in the film thickness direction from the AA line shown in FIG.1 (b), and was seen from the arrow direction. , (B) is a plan view of FIG. 図1の次に行われる工程図であり、(a)は、前記エンコーダ基板を図2(b)に示すA−A線から膜厚方向に切断し矢印方向から見た断面図、(b)は図2(a)の平面図、It is process drawing performed after FIG. 1, (a) is sectional drawing which cut | disconnected the said encoder board | substrate in the film thickness direction from the AA line shown in FIG.2 (b), and was seen from the arrow direction, (b). Is a plan view of FIG. 図2の次に行われる工程図であり、(a)は、前記エンコーダ基板を図3(b)に示すA−A線から膜厚方向に切断し矢印方向から見た断面図、(b)は図3(a)の平面図、FIG. 3 is a process diagram performed next to FIG. 2, in which (a) is a cross-sectional view of the encoder substrate taken along the line AA shown in FIG. Is a plan view of FIG. 図3の次に行われる工程図であり、転写板上の導電層を金型内に配置した状態を示す断面図、FIG. 4 is a process diagram performed subsequent to FIG. 3, and is a cross-sectional view showing a state in which a conductive layer on a transfer plate is arranged in a mold; 図4の次に行われる工程図であり、転写板を剥離する工程を示す断面図、FIG. 5 is a process diagram performed next to FIG. 完成したエンコーダ基板の断面図、Cross section of the completed encoder board, 完成したエンコーダ基板の平面図、Plan view of the completed encoder board, 図7の一部分の導電層の表面を拡大した部分拡大図、The elements on larger scale which expanded the surface of the one part conductive layer of FIG.

符号の説明Explanation of symbols

21 第1の導電層
22 第2の導電層
23 導電層
23a コモン領域
24 第1の導電部
24a A相領域
25 第2の導電部
25a B相領域
26 (第1の導電部間の)間隔
30 転写板
40 金型
41 絶縁基板
42 エンコーダ基板
43 キャビティ
21 first conductive layer 22 second conductive layer 23 conductive layer 23a common region 24 first conductive portion 24a A phase region 25 second conductive portion 25a B phase region 26 (between first conductive portions) interval 30 Transfer plate 40 Mold 41 Insulating substrate 42 Encoder substrate 43 Cavity

Claims (6)

導電部と絶縁基板とが交互に表出する表面領域を備えるエンコーダ基板の製造方法において、
(a) 転写板上に、導電性粒子とバインダー樹脂とを有する導電ペーストを印刷して導電層を形成する工程、
(b) 前記導電層に、間隔をおいて複数の前記導電部が形成されるように、平面から見た前記導電層の外形をパターン加工する工程、
(c) 前記転写板上に形成した前記導電層を金型内に配置し、溶融した樹脂を前記金型内に流し込み、このとき、前記導電部間の間隔内を前記樹脂で埋める工程、
(d) 前記転写板を剥離して、前記導電層を前記樹脂からなる絶縁基板に転写する工程、
を有することを特徴とするエンコーダ基板の製造方法。
In a method for manufacturing an encoder board having a surface region in which conductive portions and insulating substrates are alternately exposed,
(A) a step of printing a conductive paste having conductive particles and a binder resin on the transfer plate to form a conductive layer;
(B) a step of patterning the outer shape of the conductive layer as viewed from above so that a plurality of the conductive portions are formed at intervals in the conductive layer;
(C) placing the conductive layer formed on the transfer plate in a mold, pouring molten resin into the mold, and filling the space between the conductive portions with the resin at this time;
(D) peeling the transfer plate and transferring the conductive layer to the insulating substrate made of the resin;
A method of manufacturing an encoder board, comprising:
前記(b)工程にて、前記導電層の外形をレーザ照射によりパターン加工する請求項1記載のエンコーダ基板の製造方法。   The method for manufacturing an encoder substrate according to claim 1, wherein in the step (b), the outer shape of the conductive layer is patterned by laser irradiation. 前記(b)工程と、前記(c)工程の間に、
(e) 前記導電層を加熱して、バインダー樹脂を硬化させる工程、
を有する請求項1又は2に記載のエンコーダ基板の製造方法。
Between the step (b) and the step (c),
(E) heating the conductive layer to cure the binder resin;
The manufacturing method of the encoder board | substrate of Claim 1 or 2 which has these.
前記(a)工程で、カーボン粉と第1のバインダー樹脂とを有する第1の導電ペーストを前記転写板上に印刷して第1の導電層を形成し、
次に、銀粉と第2のバインダー樹脂とを有する第2の導電ペーストを前記第1の導電層上に印刷して第2の導電層を形成する請求項1ないし3のいずれかに記載のエンコーダ基板の製造方法。
In the step (a), a first conductive paste having carbon powder and a first binder resin is printed on the transfer plate to form a first conductive layer,
The encoder according to any one of claims 1 to 3, wherein a second conductive layer is formed by printing a second conductive paste having silver powder and a second binder resin on the first conductive layer. A method for manufacturing a substrate.
前記第1のバインダー樹脂と、前記第2のバインダー樹脂とに同種の熱硬化性樹脂を用いる請求項4記載のエンコーダ基板の製造方法。   The encoder substrate manufacturing method according to claim 4, wherein the same kind of thermosetting resin is used for the first binder resin and the second binder resin. 前記第2の導電ペースト中に導電性粒子として、主成分の銀と、酸化ビスマス、あるいはカーボン、又は酸化ビスマス及びカーボンを有してなる複合粉を含む請求項4又は5に記載のエンコーダ基板の製造方法。   The encoder substrate according to claim 4 or 5, wherein the second conductive paste includes, as conductive particles, silver as a main component and bismuth oxide, carbon, or a composite powder comprising bismuth oxide and carbon. Production method.
JP2007074852A 2007-03-22 2007-03-22 Manufacturing method of encoder substrate Withdrawn JP2008235679A (en)

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