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Publication number
JP2005352105A5
JP2005352105A5 JP2004172225A JP2004172225A JP2005352105A5 JP 2005352105 A5 JP2005352105 A5 JP 2005352105A5 JP 2004172225 A JP2004172225 A JP 2004172225A JP 2004172225 A JP2004172225 A JP 2004172225A JP 2005352105 A5 JP2005352105 A5 JP 2005352105A5
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JP
Japan
Prior art keywords
light
shielding pattern
substrate
light shielding
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004172225A
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Japanese (ja)
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JP2005352105A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2004172225A priority Critical patent/JP2005352105A/en
Priority claimed from JP2004172225A external-priority patent/JP2005352105A/en
Publication of JP2005352105A publication Critical patent/JP2005352105A/en
Publication of JP2005352105A5 publication Critical patent/JP2005352105A5/ja
Pending legal-status Critical Current

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Claims (13)

透明基板上に遮光パターンを有する遮光パターン付基板において、
前記遮光パターンは、上頂部と、上頂部以外の隔壁下部とを有し、
前記上頂部の撥インク性が前記隔壁下部の撥インク性より大きい、
ことを特徴とする遮光パターン付基板。 In a substrate with a light shielding pattern having a light shielding pattern on a transparent substrate,
The light-shielding pattern has an upper top portion and a partition wall lower portion other than the upper top portion,
The ink repellency at the top is greater than the ink repellency at the bottom of the partition;
A substrate with a light-shielding pattern . 透明基板上に遮光パターンを有する遮光パターン付基板において、
前記遮光パターンは、黒色遮光剤及び撥インク剤を含有し、かつ遮光機能及び撥インク機能の両方の機能を有する単層構造であり、
また、前記遮光パターンは、上頂部と、上頂部以外の隔壁下部とを有し、
前記上頂部の撥インク性が前記隔壁下部の撥インク性より大きいことを特徴とする遮光パターン付基板。 In a substrate with a light shielding pattern having a light shielding pattern on a transparent substrate,
The light shielding pattern contains a black light shielding agent and an ink repellent agent, and has a single layer structure having both a light shielding function and an ink repellent function,
Further, the light shielding pattern has an upper top portion and a partition wall lower portion other than the upper top portion,
A substrate with a light-shielding pattern, wherein the ink repellency at the top portion is greater than the ink repellency at the bottom of the partition wall . 前記上頂部に対する、５０ｍＮ／ｍ以下の表面張力の着色インクの接触角Ａと、前記隔壁下部に対する、５０ｍＮ／ｍ以下の表面張力の着色インクの接触角Ｂとの関係が、
Ａ＞２Ｂ
であることを特徴とする請求項１あるいは２に記載の遮光パターン付基板。 The relationship between the contact angle A of the colored ink having a surface tension of 50 mN / m or less with respect to the top portion and the contact angle B of the colored ink having a surface tension of 50 mN / m or less with respect to the lower part of the partition wall is as follows:
A> 2B
The substrate with a light-shielding pattern according to claim 1 or 2, wherein the substrate has a light-shielding pattern . 前記上頂部の膜厚Ｘと、前記遮光パターン全体の膜厚Ｙとの関係が、
Ｘ＜０．５Ｙ
であることを特徴とする請求項１乃至３のいずれかに記載の遮光パターン付基板。 The relationship between the film thickness X of the top portion and the film thickness Y of the entire light shielding pattern is as follows:
X <0.5Y
The substrate with a light-shielding pattern according to claim 1 , wherein the substrate has a light-shielding pattern . 前記上頂部内の撥インク剤の含有割合が、前記隔壁下部の撥インク剤の含有割合よりも多いことを特徴とする請求項１乃至４のいずれかに記載の遮光パターン付基板。 5. The substrate with a light-shielding pattern according to claim 1 , wherein a content ratio of the ink repellent agent in the upper top portion is higher than a content ratio of the ink repellent agent in the lower portion of the partition wall . 前記上頂部は撥インク性を有し、前記隔壁下部は撥インク性を有していないことを特徴とする請求項１乃至５のいずれかに記載の遮光パターン付基板。 6. The substrate with a light-shielding pattern according to claim 1, wherein the upper top portion has ink repellency, and the lower portion of the partition wall does not have ink repellency . 前記接触角Ａが、前記遮光パターンの表面で測定したものであり、前記接触角Ｂが、前記遮光パターンを３分の１の厚さに研磨した表面で測定したものであることを特徴とする請求項１乃至６のいずれかに記載の遮光パターン付基板。 The contact angle A is measured on the surface of the light shielding pattern, and the contact angle B is measured on the surface of the light shielding pattern polished to a thickness of 1/3. The board | substrate with a light-shielding pattern in any one of Claim 1 thru | or 6 . 前記遮光パターン間に着色パターンを有することを特徴とする請求項１乃至７のいずれかに記載の遮光パターン付基板。 The substrate with a light shielding pattern according to claim 1, wherein a colored pattern is provided between the light shielding patterns . 前記着色パターンがインクジェット法により形成されていることを特徴とする請求項８に記載の遮光パターン付基板。 The substrate with a light-shielding pattern according to claim 8, wherein the colored pattern is formed by an inkjet method . 前記着色パターンのΔＥａｂが１未満であることを特徴とする請求項８又は９に記載の遮光パターン付基板。The substrate with a light-shielding pattern according to claim 8 or 9, wherein ΔEab of the colored pattern is less than 1. 少なくとも黒色遮光剤、撥インク剤、および感光性樹脂および光開始剤を含有する遮光パターン用の材料を透明基板上に膜厚が略均一になるように塗布し、前記遮光パターン用の材料が塗布された基板を加熱することにより、前記撥インク剤が前記遮光パターン用の材料からなる塗布膜の基板とは反対側である表面側に偏在するようにし、その後、パターン露光、現像を行うことにより、前記遮光パターンを形成することを特徴とする遮光パターン付基板の製造方法。A material for a light shielding pattern containing at least a black light shielding agent, an ink repellent agent, and a photosensitive resin and a photoinitiator is applied on a transparent substrate so that the film thickness is substantially uniform, and the material for the light shielding pattern is applied. By heating the formed substrate, the ink repellent agent is unevenly distributed on the surface side opposite to the substrate of the coating film made of the material for the light shielding pattern, and then pattern exposure and development are performed. A method of manufacturing a substrate with a light shielding pattern, wherein the light shielding pattern is formed. 前記透明基板上に前記遮光パターンを設けた後に、遮光パターン間に着色パターンを設けることを特徴とする請求項１１に記載の遮光パターン付基板の製造方法。The method for producing a substrate with a light-shielding pattern according to claim 11, wherein after the light-shielding pattern is provided on the transparent substrate, a colored pattern is provided between the light-shielding patterns. 前記着色パターンをインクジェット法により設けることを特徴とする請求項１１または１２に記載の遮光パターン付基板の製造方法。The method for producing a substrate with a light-shielding pattern according to claim 11 or 12, wherein the colored pattern is provided by an inkjet method.
JP2004172225A 2004-06-10 2004-06-10 Color filter and manufacturing method thereof Pending JP2005352105A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004172225A JP2005352105A (en) 2004-06-10 2004-06-10 Color filter and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004172225A JP2005352105A (en) 2004-06-10 2004-06-10 Color filter and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JP2005352105A JP2005352105A (en) 2005-12-22
JP2005352105A5 true JP2005352105A5 (en) 2007-05-24

Family

ID=35586651

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004172225A Pending JP2005352105A (en) 2004-06-10 2004-06-10 Color filter and manufacturing method thereof

Country Status (1)

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JP (1) JP2005352105A (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070065571A1 (en) * 2005-09-19 2007-03-22 Applied Materials. Inc. Method and apparatus for manufacturing a pixel matrix of a color filter for a flat panel display
TWI277520B (en) * 2006-04-07 2007-04-01 Icf Technology Co Ltd Thin film pattern layer structure and method of manufacturing the same
US7768598B2 (en) 2007-03-06 2010-08-03 Toppan Printing Co., Ltd. Substrate having pattern, color filter, liquid crystal display and method of manufacturing color filter
JP5061683B2 (en) * 2007-03-27 2012-10-31 凸版印刷株式会社 Ink jet color filter manufacturing method and ink jet color filter
JP2008257096A (en) * 2007-04-09 2008-10-23 Toppan Printing Co Ltd Color filter and manufacturing method thereof
US7897306B2 (en) 2007-08-24 2011-03-01 Toppan Printing Co., Ltd. Substrate provided with bank and substrate provided with color pattern
US7599024B2 (en) 2007-08-24 2009-10-06 Toppan Printing Co., Ltd. Substrate provided with bank and substrate provided with color pattern
US8120731B2 (en) 2007-09-11 2012-02-21 Toppan Printing Co., Ltd. Color filter
US8349392B2 (en) 2007-10-09 2013-01-08 Toppan Printing Co., Ltd. Printed material and manufacturing method thereof
GB2462845B (en) * 2008-08-21 2011-07-27 Cambridge Display Tech Ltd Organic electronic devices and methods of making the same using solution processing techniques
JP5771931B2 (en) * 2010-09-29 2015-09-02 大日本印刷株式会社 Color filter, liquid crystal display device using the same, and method of manufacturing color filter
JP2012247643A (en) * 2011-05-27 2012-12-13 Dainippon Printing Co Ltd Black matrix substrate, color filter, and liquid crystal display device
KR20220065925A (en) 2020-11-13 2022-05-23 삼성디스플레이 주식회사 Display panel and electronic device
CN113241360B (en) * 2021-05-17 2023-09-05 武汉华星光电半导体显示技术有限公司 OLED display panel and preparation method thereof

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3430564B2 (en) * 1993-07-23 2003-07-28 東レ株式会社 Color filter
JPH0749416A (en) * 1993-08-05 1995-02-21 Toray Ind Inc Manufacture of color filter
WO2001007941A1 (en) * 1999-07-28 2001-02-01 Matsushita Electric Industrial Co., Ltd. Method for manufacturing color filter, color filter, and liquid crystal device
JP4138200B2 (en) * 1999-10-04 2008-08-20 大日本印刷株式会社 Photocatalyst-containing composition, wettability changing film, and method for producing wettability changing resin composition
JP4019596B2 (en) * 2000-03-24 2007-12-12 コニカミノルタホールディングス株式会社 Color filter manufacturing method, color filter, image display device, and image input device
JP2002341128A (en) * 2001-05-15 2002-11-27 Toray Ind Inc Method for manufacturing color filter and liquid crystal display element
JP2004029390A (en) * 2002-06-26 2004-01-29 Matsushita Electric Ind Co Ltd Liquid filling method and liquid crystal display element

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