[go: up one dir, main page]

IL266966A - Process and manufacture of low-dimensional materials supporting both self-thermalization and self-localization - Google Patents

Process and manufacture of low-dimensional materials supporting both self-thermalization and self-localization

Info

Publication number
IL266966A
IL266966A IL266966A IL26696619A IL266966A IL 266966 A IL266966 A IL 266966A IL 266966 A IL266966 A IL 266966A IL 26696619 A IL26696619 A IL 26696619A IL 266966 A IL266966 A IL 266966A
Authority
IL
Israel
Prior art keywords
self
thermalization
localization
manufacture
low
Prior art date
Application number
IL266966A
Other languages
Hebrew (he)
Other versions
IL266966B1 (en
IL266966B2 (en
Original Assignee
Seminuclear Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/US2016/063933 external-priority patent/WO2018101905A1/en
Application filed by Seminuclear Inc filed Critical Seminuclear Inc
Publication of IL266966A publication Critical patent/IL266966A/en
Publication of IL266966B1 publication Critical patent/IL266966B1/en
Publication of IL266966B2 publication Critical patent/IL266966B2/en

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N99/00Subject matter not provided for in other groups of this subclass
    • H10N99/05Devices based on quantum mechanical effects, e.g. quantum interference devices or metal single-electron transistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/82Heterojunctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N10/00Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
    • H10N10/80Constructional details
    • H10N10/85Thermoelectric active materials
    • H10N10/851Thermoelectric active materials comprising inorganic compositions
    • H10N10/855Thermoelectric active materials comprising inorganic compositions comprising compounds containing boron, carbon, oxygen or nitrogen
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N10/00Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
    • H10N10/80Constructional details
    • H10N10/85Thermoelectric active materials
    • H10N10/851Thermoelectric active materials comprising inorganic compositions
    • H10N10/8556Thermoelectric active materials comprising inorganic compositions comprising compounds containing germanium or silicon
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Silicon Compounds (AREA)
  • Particle Accelerators (AREA)
  • Recrystallisation Techniques (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Photovoltaic Devices (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
IL266966A 2016-11-29 2017-11-30 Method and production of low-dimensional materials that support self-thermization and self-localization IL266966B2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
PCT/US2016/063933 WO2018101905A1 (en) 2016-11-29 2016-11-29 Composition and method for making picocrystalline artificial borane atoms
US201762471815P 2017-03-15 2017-03-15
US201762591848P 2017-11-29 2017-11-29
PCT/US2017/064020 WO2018164746A2 (en) 2016-11-29 2017-11-30 Process and manufacture of low-dimensional materials supporting both self-thermalization and self-localization

Publications (3)

Publication Number Publication Date
IL266966A true IL266966A (en) 2019-07-31
IL266966B1 IL266966B1 (en) 2023-11-01
IL266966B2 IL266966B2 (en) 2024-03-01

Family

ID=68407930

Family Applications (1)

Application Number Title Priority Date Filing Date
IL266966A IL266966B2 (en) 2016-11-29 2017-11-30 Method and production of low-dimensional materials that support self-thermization and self-localization

Country Status (7)

Country Link
EP (1) EP3549155A4 (en)
JP (1) JP7250340B2 (en)
KR (1) KR102373619B1 (en)
CN (1) CN110431652B (en)
CA (1) CA3045318A1 (en)
IL (1) IL266966B2 (en)
WO (1) WO2018164746A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11220747B2 (en) * 2018-10-29 2022-01-11 Applied Materials, Inc. Complementary pattern station designs
CN111470577A (en) * 2020-04-15 2020-07-31 苏州正奥水生态技术研究有限公司 Sewage treatment photon carrier and preparation method and use method thereof
CN115903279B (en) * 2022-10-12 2023-10-03 北京大学 A method and application of spectral emissivity control based on isotope engineering

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3432539A (en) * 1965-06-30 1969-03-11 Du Pont Icosahedral dodecahydrododecaborane derivatives and their preparation
US4818625A (en) * 1985-06-24 1989-04-04 Lockheed Missiles & Space Company, Inc. Boron-silicon-hydrogen alloy films
US5872368A (en) * 1995-11-30 1999-02-16 The United States Of America As Represented By The Secretary Of The Navy Method of controlling a super conductor
US6025611A (en) * 1996-09-20 2000-02-15 The Board Of Regents Of The University Of Nebraska Boron-carbide and boron rich rhobohedral based transistors and tunnel diodes
US6479919B1 (en) * 2001-04-09 2002-11-12 Terrence L. Aselage Beta cell device using icosahedral boride compounds
JP2004123720A (en) * 2002-09-11 2004-04-22 Sony Corp Molecular element, molecular organization, rectifying element, rectifying method, sensor element, switching element, circuit element, logic circuit element, arithmetic element and information processing element
KR100683401B1 (en) * 2005-08-11 2007-02-15 동부일렉트로닉스 주식회사 Semiconductor Device Using Epilayer and Manufacturing Method Thereof
US7795735B2 (en) * 2007-03-21 2010-09-14 Taiwan Semiconductor Manufacturing Co., Ltd. Methods for forming single dies with multi-layer interconnect structures and structures formed therefrom
US7915643B2 (en) * 2007-09-17 2011-03-29 Transphorm Inc. Enhancement mode gallium nitride power devices
US8779462B2 (en) * 2008-05-19 2014-07-15 Infineon Technologies Ag High-ohmic semiconductor substrate and a method of manufacturing the same
WO2010144421A2 (en) * 2009-06-10 2010-12-16 Thinsilicon Corporation Photovoltaic modules and methods of manufacturing photovoltaic modules having multiple semiconductor layer stacks
US8344337B2 (en) * 2010-04-21 2013-01-01 Axcelis Technologies, Inc. Silaborane implantation processes
KR101396432B1 (en) * 2012-08-02 2014-05-21 경희대학교 산학협력단 Semiconductor device and method for fabricating the same
JP6544807B2 (en) * 2014-06-03 2019-07-17 株式会社日本製鋼所 Method of manufacturing semiconductor having gettering layer, method of manufacturing semiconductor device, and semiconductor device
US9972489B2 (en) * 2015-05-28 2018-05-15 SemiNuclear, Inc. Composition and method for making picocrystalline artificial borane atoms
US20160351286A1 (en) * 2015-05-28 2016-12-01 SemiNuclear, Inc. Composition and method for making picocrystalline artificial carbon atoms

Also Published As

Publication number Publication date
EP3549155A4 (en) 2020-09-30
CA3045318A1 (en) 2018-09-13
WO2018164746A2 (en) 2018-09-13
WO2018164746A3 (en) 2018-12-06
KR102373619B1 (en) 2022-03-15
IL266966B1 (en) 2023-11-01
CN110431652B (en) 2023-12-29
IL266966B2 (en) 2024-03-01
JP2020515057A (en) 2020-05-21
CN110431652A (en) 2019-11-08
KR20190126765A (en) 2019-11-12
EP3549155A2 (en) 2019-10-09
JP7250340B2 (en) 2023-04-03

Similar Documents

Publication Publication Date Title
IL287140A (en) Process for the preparation of pegylated drug-linkers and intermediates thereof
SG11201700367YA (en) Process for the production of cementitious material
SI3239378T1 (en) Device and method for the manufacture of material from continuous filaments
PL3221264T3 (en) Process and apparatus for manufacture of calcined compounds for the production of calcined products
IL290742A (en) Graphene and the production of graphene
HUE059279T2 (en) Process for the production of alkenols and use thereof for the production of 1,3-butadiene
ZA202003590B (en) Process for the preparation of opicapone and intermediates thereof
SI3630738T1 (en) Process for the production of ozanimod
ZA201902125B (en) Process for the production of 2-alkylalkanol
PL3112023T3 (en) Adsorption material and method of fabricating the same
PL3199516T3 (en) Process for the preparation of metaraminol
IL266966A (en) Process and manufacture of low-dimensional materials supporting both self-thermalization and self-localization
PT3354669T (en) Solid surface product and process for manufacturing thereof
HRP20190403T1 (en) Process for the preparation of lacosamide
PL3247651T3 (en) Container comprising treatment means and method for the production of same
PT3374074T (en) Apparatus and process for the production of formaldehyde
PT3015424T (en) Plant for the production of monochloramine and process thereof
GB201709604D0 (en) Tea solid composition and process of making the same
ZA201608823B (en) Processes for the preparation of azd5363 and novel intermediate used therein
HUP1400543A2 (en) Intermediate and process for the preparation of apixaban
ZA201808387B (en) Improved process for the preparation of carbamates
IL253077A0 (en) Process and intermediates for the preparation of perampanel
IL237572A0 (en) Process and intermediates for the preparation of dasatinib
ZA201805294B (en) Catalyst and process for the production of para¿xylene
GB201404364D0 (en) Construction material and method of manufacturing the same