FR3118175B1 - METHOD FOR INSPECTING THE SURFACE OF AN OBJECT - Google Patents
METHOD FOR INSPECTING THE SURFACE OF AN OBJECT Download PDFInfo
- Publication number
- FR3118175B1 FR3118175B1 FR2013633A FR2013633A FR3118175B1 FR 3118175 B1 FR3118175 B1 FR 3118175B1 FR 2013633 A FR2013633 A FR 2013633A FR 2013633 A FR2013633 A FR 2013633A FR 3118175 B1 FR3118175 B1 FR 3118175B1
- Authority
- FR
- France
- Prior art keywords
- chromatic
- intercepting
- depth
- image sensor
- onto
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
- G01B2210/50—Using chromatic effects to achieve wavelength-dependent depth resolution
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8845—Multiple wavelengths of illumination or detection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
- G01N2021/95661—Inspecting patterns on the surface of objects for PCB's for leads, e.g. position, curvature
- G01N2021/95669—Inspecting patterns on the surface of objects for PCB's for leads, e.g. position, curvature for solder coating, coverage
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
L’invention concerne un procédé mettant en œuvre un dispositif d’inspection (1) d’une surface (S) d’un objet. Le dispositif comprend une source de lumière polychromatique (20) pour projeter un faisceau d’inspection sur la surface (S); un masque confocal (6a, 6b) interceptant le faisceau d’inspection et un faisceau réfléchi par la surface, présentant une pluralité d’ouvertures de filtrage chromatique; un système chromatique (3) étalant spatialement la focalisation du faisceau d’inspection selon des plans de focalisation le long d’un axe optique (AO) dans une profondeur de champ, interceptant le faisceau réfléchi pour le projeter sur un plan de détection (P) conjugué des plans de focalisation; un support mobile (4) pour positionner la surface (S) dans la profondeur de champ; un capteur d’image à intégration temporisée (5) synchronisé au déplacement de la surface, le capteur d’image (5) comprenant une matrice de photodétecteurs disposée dans le plan de détection (P), les ouvertures de filtrage chromatique du masque confocal éclairant une partie des photodétecteurs. Fig . 1The invention relates to a method using a device (1) for inspecting a surface (S) of an object. The device comprises a polychromatic light source (20) for projecting an inspection beam onto the surface (S); a confocal mask (6a, 6b) intercepting the inspection beam and a beam reflected by the surface, having a plurality of chromatic filtering apertures; a chromatic system (3) spatially spreading the focus of the inspection beam according to focusing planes along an optical axis (AO) in a depth of field, intercepting the reflected beam to project it onto a detection plane (P) conjugate of the focusing planes; a movable support (4) for positioning the surface (S) in the depth of field; a time-integrated image sensor (5) synchronized to the movement of the surface, the image sensor (5) comprising a matrix of photodetectors arranged in the detection plane (P), the chromatic filtering apertures of the confocal mask illuminating a part of the photodetectors. Fig. 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR2013633A FR3118175B1 (en) | 2020-12-18 | 2020-12-18 | METHOD FOR INSPECTING THE SURFACE OF AN OBJECT |
| PCT/FR2021/052091 WO2022129721A1 (en) | 2020-12-18 | 2021-11-25 | Method for inspecting a surface of an object |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR2013633A FR3118175B1 (en) | 2020-12-18 | 2020-12-18 | METHOD FOR INSPECTING THE SURFACE OF AN OBJECT |
| FR2013633 | 2020-12-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR3118175A1 FR3118175A1 (en) | 2022-06-24 |
| FR3118175B1 true FR3118175B1 (en) | 2025-05-30 |
Family
ID=74871572
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR2013633A Active FR3118175B1 (en) | 2020-12-18 | 2020-12-18 | METHOD FOR INSPECTING THE SURFACE OF AN OBJECT |
Country Status (2)
| Country | Link |
|---|---|
| FR (1) | FR3118175B1 (en) |
| WO (1) | WO2022129721A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025008656A1 (en) * | 2023-07-06 | 2025-01-09 | Unity Semiconductor | Device for inspecting substrates |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19713362A1 (en) * | 1997-03-29 | 1998-10-01 | Zeiss Carl Jena Gmbh | Confocal microscopic arrangement |
| GB0802478D0 (en) | 2008-02-11 | 2008-03-19 | Cmosis Nv | Tiem delay integration in imaging device |
| FR2942533B1 (en) | 2009-02-25 | 2011-06-24 | Altatech Semiconductor | DEVICE AND METHOD FOR INSPECTING SEMICONDUCTOR WAFERS |
| TWI434022B (en) * | 2011-11-29 | 2014-04-11 | Univ Nat Taipei Technology | Chromatic confocal microscope system and signal process method of the same |
| US10591279B2 (en) * | 2014-12-09 | 2020-03-17 | Asentys Sas | Integrated optical device for contactless measurement of altitudes and thicknesses |
| EP3222964B1 (en) | 2016-03-25 | 2020-01-15 | Fogale Nanotech | Chromatic confocal device and method for 2d/3d inspection of an object such as a wafer |
| EP3222965B1 (en) * | 2016-03-25 | 2020-01-15 | Fogale Nanotech | Chromatic confocal device and method for 2d/3d inspection of an object such as a wafer with variable spatial resolution |
| US10317344B2 (en) * | 2016-09-07 | 2019-06-11 | Kla-Tencor Corporation | Speed enhancement of chromatic confocal metrology |
| EP3431918B1 (en) * | 2017-07-20 | 2021-03-31 | Fogale Nanotech | Multichannel confocal sensor and related method for inspecting a sample |
-
2020
- 2020-12-18 FR FR2013633A patent/FR3118175B1/en active Active
-
2021
- 2021-11-25 WO PCT/FR2021/052091 patent/WO2022129721A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| FR3118175A1 (en) | 2022-06-24 |
| WO2022129721A1 (en) | 2022-06-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PLFP | Fee payment |
Year of fee payment: 2 |
|
| PLSC | Publication of the preliminary search report |
Effective date: 20220624 |
|
| PLFP | Fee payment |
Year of fee payment: 3 |
|
| PLFP | Fee payment |
Year of fee payment: 4 |
|
| PLFP | Fee payment |
Year of fee payment: 5 |