FR3001160B1 - Procede d'obtention d'un substrat muni d'un revetement - Google Patents
Procede d'obtention d'un substrat muni d'un revetementInfo
- Publication number
- FR3001160B1 FR3001160B1 FR1350453A FR1350453A FR3001160B1 FR 3001160 B1 FR3001160 B1 FR 3001160B1 FR 1350453 A FR1350453 A FR 1350453A FR 1350453 A FR1350453 A FR 1350453A FR 3001160 B1 FR3001160 B1 FR 3001160B1
- Authority
- FR
- France
- Prior art keywords
- coating
- obtaining
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
- C23C14/5813—Thermal treatment using lasers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Chemical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Manufacturing & Machinery (AREA)
Priority Applications (12)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1350453A FR3001160B1 (fr) | 2013-01-18 | 2013-01-18 | Procede d'obtention d'un substrat muni d'un revetement |
| BR112015015827A BR112015015827A2 (pt) | 2013-01-18 | 2014-01-17 | processo de obtenção de um substrato munido de um revestimento |
| EA201591347A EA201591347A1 (ru) | 2013-01-18 | 2014-01-17 | Способ получения подложки, снабженной покрытием |
| CN201480005046.0A CN104903489A (zh) | 2013-01-18 | 2014-01-17 | 用于获得提供有涂层的基材的方法 |
| EP14705823.4A EP2946027A1 (fr) | 2013-01-18 | 2014-01-17 | Procede d'obtention d'un substrat muni d'un revêtement |
| MX2015009065A MX2015009065A (es) | 2013-01-18 | 2014-01-17 | Proceso para obtener un sustrato equipado con un revestimiento. |
| US14/761,749 US20160010212A1 (en) | 2013-01-18 | 2014-01-17 | Process for obtaining a substrate equipped with a coating |
| CA2896742A CA2896742A1 (fr) | 2013-01-18 | 2014-01-17 | Procede d'obtention d'un substrat muni d'un revetement |
| KR1020157021894A KR20150108383A (ko) | 2013-01-18 | 2014-01-17 | 코팅이 구비된 기판을 얻는 방법 |
| PCT/FR2014/050090 WO2014111664A1 (fr) | 2013-01-18 | 2014-01-17 | Procede d'obtention d'un substrat muni d'un revêtement |
| JP2015553149A JP6640561B2 (ja) | 2013-01-18 | 2014-01-17 | コーティングを備えた基材を得る方法 |
| JP2018232599A JP2019089698A (ja) | 2013-01-18 | 2018-12-12 | コーティングを備えた基材を得る方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1350453A FR3001160B1 (fr) | 2013-01-18 | 2013-01-18 | Procede d'obtention d'un substrat muni d'un revetement |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR3001160A1 FR3001160A1 (fr) | 2014-07-25 |
| FR3001160B1 true FR3001160B1 (fr) | 2016-05-27 |
Family
ID=48289293
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR1350453A Expired - Fee Related FR3001160B1 (fr) | 2013-01-18 | 2013-01-18 | Procede d'obtention d'un substrat muni d'un revetement |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US20160010212A1 (fr) |
| EP (1) | EP2946027A1 (fr) |
| JP (2) | JP6640561B2 (fr) |
| KR (1) | KR20150108383A (fr) |
| CN (1) | CN104903489A (fr) |
| BR (1) | BR112015015827A2 (fr) |
| CA (1) | CA2896742A1 (fr) |
| EA (1) | EA201591347A1 (fr) |
| FR (1) | FR3001160B1 (fr) |
| MX (1) | MX2015009065A (fr) |
| WO (1) | WO2014111664A1 (fr) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB201419244D0 (en) * | 2014-10-29 | 2014-12-10 | Kings Metal Fiber Technologies | Use of alumina-chromium alloy in heat treatment |
| FR3040319B1 (fr) * | 2015-08-25 | 2017-11-24 | Saint Gobain | Appareil laser modulaire |
| FR3048244B1 (fr) * | 2016-02-26 | 2018-03-16 | Saint-Gobain Glass France | Procede de gravure selective d'une couche ou d'un empilement de couches sur substrat verrier |
| DE102016223242B4 (de) * | 2016-11-24 | 2025-04-24 | Robert Bosch Gmbh | Verfahren, Vorrichtung und Steuereinheit zum metallischen Beschichten einer Oberfläche eines Bauteils aus einem Dielektrikum |
| KR102006060B1 (ko) * | 2017-02-14 | 2019-09-25 | 주식회사 코윈디에스티 | 로이유리 열처리 방법 및 시스템 |
| FR3070387A1 (fr) * | 2017-08-30 | 2019-03-01 | Saint-Gobain Glass France | Dispositif de traitement thermique ameliore |
| TWI776067B (zh) | 2018-06-29 | 2022-09-01 | 美商維托平面玻璃有限責任公司 | 可燒除保護性塗層 |
| KR102061424B1 (ko) * | 2018-07-27 | 2019-12-31 | 주식회사 코윈디에스티 | 로이 유리 어닐링 장치 |
| US10822270B2 (en) | 2018-08-01 | 2020-11-03 | Guardian Glass, LLC | Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same |
| JP7162297B2 (ja) * | 2018-08-08 | 2022-10-28 | キレスト株式会社 | カーボン基材上に金属酸化物が固定化された複合体の製造方法 |
| GB201902032D0 (en) * | 2019-02-14 | 2019-04-03 | Pilkington Group Ltd | Apparatus and process for determining the distance between a glass substrate and a coater |
| US10996165B1 (en) * | 2020-03-19 | 2021-05-04 | The Boeing Company | Apparatus and method for measuring UV coating effectiveness |
| WO2021239516A1 (fr) * | 2020-05-26 | 2021-12-02 | Saint-Gobain Glass France | Procédé d'estimation d'une fonction de qualité d'un substrat transparent revêtu en monocouche ou en multicouche |
| CN113321516A (zh) * | 2021-07-22 | 2021-08-31 | 清大赛思迪新材料科技(北京)有限公司 | 一种陶瓷涂料的微波烧结法 |
| US20230241718A1 (en) * | 2022-01-31 | 2023-08-03 | Lawrence Livermore National Security, Llc | System and method for transformative interface/surface painting (trip) for arbitrary 3d surface/interface structures |
| CN114702252B (zh) * | 2022-04-29 | 2024-06-25 | 上海耀皮玻璃集团股份有限公司 | 一种含有晶态银层的低辐射镀膜夹层玻璃及其制备方法和用途 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61176012A (ja) * | 1985-01-31 | 1986-08-07 | 日立コンデンサ株式会社 | 透明電極の製造方法 |
| JPS63454A (ja) * | 1986-06-20 | 1988-01-05 | Konica Corp | 透明導電性フイルムの製造方法 |
| JPH0643176Y2 (ja) * | 1989-09-04 | 1994-11-09 | トヨタ自動車株式会社 | インライン式成膜装置 |
| JPH03184216A (ja) * | 1989-12-12 | 1991-08-12 | Fujitsu Ltd | 透明導電膜の形成方法 |
| JPH0414705A (ja) * | 1990-05-07 | 1992-01-20 | Toyobo Co Ltd | 透明導電膜およびその製造方法 |
| JPH0417212A (ja) * | 1990-05-10 | 1992-01-22 | Toyobo Co Ltd | 透明導電膜とその製法 |
| FR2683086B1 (fr) * | 1991-10-29 | 1997-01-03 | Alsthom Cge Alcatel | Procede de fabrication d'un conducteur souple supraconducteur a haute temperature critique. |
| JP3712435B2 (ja) * | 1995-02-16 | 2005-11-02 | 株式会社シンクロン | 真空蒸着装置 |
| FR2911130B1 (fr) * | 2007-01-05 | 2009-11-27 | Saint Gobain | Procede de depot de couche mince et produit obtenu |
| EP2130234B1 (fr) * | 2007-02-27 | 2014-10-29 | Carl Zeiss Laser Optics GmbH | Installation de revêtement en continu et procédé de production de films minces cristallins |
| DE102007009924A1 (de) * | 2007-02-27 | 2008-08-28 | Carl Zeiss Laser Optics Gmbh | Durchlaufbeschichtungsanlage, Verfahren zur Herstellung kristalliner Dünnschichten und Solarzellen sowie Solarzelle |
| US7741131B2 (en) * | 2007-05-25 | 2010-06-22 | Electro Scientific Industries, Inc. | Laser processing of light reflective multilayer target structure |
| JP5046890B2 (ja) * | 2007-11-29 | 2012-10-10 | 株式会社コベルコ科研 | Ag系スパッタリングターゲット |
| FR2929938B1 (fr) * | 2008-04-11 | 2010-05-07 | Saint Gobain | Procede de depot de couche mince. |
| US8198123B2 (en) * | 2008-04-15 | 2012-06-12 | Global Solar Energy, Inc. | Apparatus and methods for manufacturing thin-film solar cells |
| FR2946335B1 (fr) * | 2009-06-05 | 2011-09-02 | Saint Gobain | Procede de depot de couche mince et produit obtenu. |
| JP2012011402A (ja) * | 2010-06-30 | 2012-01-19 | Sharp Corp | ワークの加工方法、ワークの加工用光照射装置およびそれに用いるプログラム |
| JP5122670B2 (ja) * | 2010-11-05 | 2013-01-16 | 日東電工株式会社 | 透明導電性フィルムの製造方法 |
-
2013
- 2013-01-18 FR FR1350453A patent/FR3001160B1/fr not_active Expired - Fee Related
-
2014
- 2014-01-17 WO PCT/FR2014/050090 patent/WO2014111664A1/fr not_active Ceased
- 2014-01-17 MX MX2015009065A patent/MX2015009065A/es unknown
- 2014-01-17 BR BR112015015827A patent/BR112015015827A2/pt not_active Application Discontinuation
- 2014-01-17 CN CN201480005046.0A patent/CN104903489A/zh active Pending
- 2014-01-17 KR KR1020157021894A patent/KR20150108383A/ko not_active Ceased
- 2014-01-17 CA CA2896742A patent/CA2896742A1/fr not_active Abandoned
- 2014-01-17 US US14/761,749 patent/US20160010212A1/en not_active Abandoned
- 2014-01-17 EP EP14705823.4A patent/EP2946027A1/fr not_active Withdrawn
- 2014-01-17 JP JP2015553149A patent/JP6640561B2/ja not_active Expired - Fee Related
- 2014-01-17 EA EA201591347A patent/EA201591347A1/ru unknown
-
2018
- 2018-12-12 JP JP2018232599A patent/JP2019089698A/ja not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| KR20150108383A (ko) | 2015-09-25 |
| WO2014111664A1 (fr) | 2014-07-24 |
| FR3001160A1 (fr) | 2014-07-25 |
| CA2896742A1 (fr) | 2014-07-24 |
| JP2019089698A (ja) | 2019-06-13 |
| MX2015009065A (es) | 2015-09-23 |
| US20160010212A1 (en) | 2016-01-14 |
| JP2016510297A (ja) | 2016-04-07 |
| EA201591347A1 (ru) | 2015-12-30 |
| CN104903489A (zh) | 2015-09-09 |
| JP6640561B2 (ja) | 2020-02-05 |
| BR112015015827A2 (pt) | 2017-07-11 |
| EP2946027A1 (fr) | 2015-11-25 |
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