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FR2959833B1 - Procede de nano-structure topographique et electrique d'un film mince de polymere electret et film mince de polymere electret obtenu - Google Patents

Procede de nano-structure topographique et electrique d'un film mince de polymere electret et film mince de polymere electret obtenu

Info

Publication number
FR2959833B1
FR2959833B1 FR1001967A FR1001967A FR2959833B1 FR 2959833 B1 FR2959833 B1 FR 2959833B1 FR 1001967 A FR1001967 A FR 1001967A FR 1001967 A FR1001967 A FR 1001967A FR 2959833 B1 FR2959833 B1 FR 2959833B1
Authority
FR
France
Prior art keywords
thin film
polymer thin
electronic polymer
topographic
electronic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1001967A
Other languages
English (en)
Other versions
FR2959833A1 (fr
Inventor
Laurence Ressier
Etienne Palleau
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INST NAT SCIENCES APPLIQ
Centre National de la Recherche Scientifique CNRS
Institut National des Sciences Appliquees de Toulouse INSA
Original Assignee
INST NAT SCIENCES APPLIQ
Centre National de la Recherche Scientifique CNRS
Institut National des Sciences Appliquees de Toulouse INSA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1001967A priority Critical patent/FR2959833B1/fr
Application filed by INST NAT SCIENCES APPLIQ, Centre National de la Recherche Scientifique CNRS, Institut National des Sciences Appliquees de Toulouse INSA filed Critical INST NAT SCIENCES APPLIQ
Priority to EP11723497A priority patent/EP2567291A1/fr
Priority to CN201180023039XA priority patent/CN102939564A/zh
Priority to PCT/FR2011/050934 priority patent/WO2011138540A1/fr
Priority to US13/696,354 priority patent/US20130106201A1/en
Priority to JP2013508542A priority patent/JP2013530066A/ja
Priority to KR1020127032039A priority patent/KR20130080798A/ko
Publication of FR2959833A1 publication Critical patent/FR2959833A1/fr
Application granted granted Critical
Publication of FR2959833B1 publication Critical patent/FR2959833B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C99/00—Subject matter not provided for in other groups of this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
FR1001967A 2010-05-07 2010-05-07 Procede de nano-structure topographique et electrique d'un film mince de polymere electret et film mince de polymere electret obtenu Active FR2959833B1 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FR1001967A FR2959833B1 (fr) 2010-05-07 2010-05-07 Procede de nano-structure topographique et electrique d'un film mince de polymere electret et film mince de polymere electret obtenu
CN201180023039XA CN102939564A (zh) 2010-05-07 2011-04-22 聚合物驻极体薄膜的拓扑和电纳米构造方法和所获得的聚合物驻极体薄膜
PCT/FR2011/050934 WO2011138540A1 (fr) 2010-05-07 2011-04-22 Procédé de nano-structuration topographique et électrique d'un film mince de polymère électret et film mince de polymère électret obtenu
US13/696,354 US20130106201A1 (en) 2010-05-07 2011-04-22 Method of topographical and electrical nanostructuration of a thin film of electret polymer and thin film of electret polymer obtained
EP11723497A EP2567291A1 (fr) 2010-05-07 2011-04-22 Procédé de nano-structuration topographique et électrique d'un film mince de polymère électret et film mince de polymère électret obtenu
JP2013508542A JP2013530066A (ja) 2010-05-07 2011-04-22 エレクトレットポリマー薄膜の地形的及び電気的ナノ構造化方法、及び得られるエレクトレットポリマー薄膜
KR1020127032039A KR20130080798A (ko) 2010-05-07 2011-04-22 일렉트릿 폴리머 박막의 형상학적 및 전기적 나노구조화 방법 및 수득되는 일렉트릿 폴리머 박막

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1001967A FR2959833B1 (fr) 2010-05-07 2010-05-07 Procede de nano-structure topographique et electrique d'un film mince de polymere electret et film mince de polymere electret obtenu

Publications (2)

Publication Number Publication Date
FR2959833A1 FR2959833A1 (fr) 2011-11-11
FR2959833B1 true FR2959833B1 (fr) 2015-06-12

Family

ID=42983488

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1001967A Active FR2959833B1 (fr) 2010-05-07 2010-05-07 Procede de nano-structure topographique et electrique d'un film mince de polymere electret et film mince de polymere electret obtenu

Country Status (7)

Country Link
US (1) US20130106201A1 (fr)
EP (1) EP2567291A1 (fr)
JP (1) JP2013530066A (fr)
KR (1) KR20130080798A (fr)
CN (1) CN102939564A (fr)
FR (1) FR2959833B1 (fr)
WO (1) WO2011138540A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013074115A (ja) * 2011-09-28 2013-04-22 Fujifilm Corp ナノインプリント装置およびナノインプリント方法、並びに、歪み付与デバイスおよび歪み付与方法
WO2017201602A1 (fr) * 2015-09-11 2017-11-30 Spectral Devices Inc. Procédés de production et de transfert de films minces à motifs à l'échelle de la tranche
CN120735308B (zh) * 2025-08-19 2025-11-18 杭州兆华电子股份有限公司 一种驻极体传声器的后极板覆膜装置及覆膜方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01113224A (ja) * 1987-10-27 1989-05-01 Canon Inc 熱可塑性樹脂フィルム又はシートのエンボス加工方法
JPH04211925A (ja) * 1990-03-12 1992-08-03 Mitsui Petrochem Ind Ltd エレクトレットの製造方法
US20040036201A1 (en) * 2000-07-18 2004-02-26 Princeton University Methods and apparatus of field-induced pressure imprint lithography
AU2001271799A1 (en) * 2000-06-30 2002-01-14 President And Fellows Of Harvard College Electric microcontact printing method and apparatus
US6949199B1 (en) * 2001-08-16 2005-09-27 Seagate Technology Llc Heat-transfer-stamp process for thermal imprint lithography
US7232771B2 (en) * 2003-11-04 2007-06-19 Regents Of The University Of Minnesota Method and apparatus for depositing charge and/or nanoparticles
CN100517584C (zh) * 2003-12-19 2009-07-22 北卡罗来纳大学查珀尔希尔分校 使用软或压印光刻法制备隔离的微米-和纳米-结构的方法
KR20120105062A (ko) * 2003-12-19 2012-09-24 더 유니버시티 오브 노쓰 캐롤라이나 엣 채플 힐 소프트 또는 임프린트 리소그래피를 이용하여 분리된 마이크로- 및 나노- 구조를 제작하는 방법
JP5570721B2 (ja) * 2005-06-17 2014-08-13 ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒル ナノ粒子の製造方法、システム、及び材料
KR101265321B1 (ko) * 2005-11-14 2013-05-20 엘지디스플레이 주식회사 스탬프 제조 방법, 그를 이용한 박막트랜지스터 및액정표시장치의 제조 방법
US20080110363A1 (en) * 2006-11-14 2008-05-15 National Chung Cheng University Physisorption-based microcontact printing process capable of controlling film thickness
EP2335258B1 (fr) * 2008-09-12 2012-05-09 Imec Structures d'électrets à motif et procédés de fabrication de structures d'électrets à motif

Also Published As

Publication number Publication date
US20130106201A1 (en) 2013-05-02
KR20130080798A (ko) 2013-07-15
FR2959833A1 (fr) 2011-11-11
EP2567291A1 (fr) 2013-03-13
JP2013530066A (ja) 2013-07-25
WO2011138540A1 (fr) 2011-11-10
CN102939564A (zh) 2013-02-20

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