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ES2565021T3 - Composición de resina fotosensible, placa de impresión flexográfica y procedimiento para producir una placa de impresión flexográfica - Google Patents

Composición de resina fotosensible, placa de impresión flexográfica y procedimiento para producir una placa de impresión flexográfica Download PDF

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Publication number
ES2565021T3
ES2565021T3 ES08765717.7T ES08765717T ES2565021T3 ES 2565021 T3 ES2565021 T3 ES 2565021T3 ES 08765717 T ES08765717 T ES 08765717T ES 2565021 T3 ES2565021 T3 ES 2565021T3
Authority
ES
Spain
Prior art keywords
mass
parts
printing plate
flexographic printing
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
ES08765717.7T
Other languages
English (en)
Inventor
Masahiro Yoshida
Shusaku Tabata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Original Assignee
Asahi Kasei E Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei E Materials Corp filed Critical Asahi Kasei E Materials Corp
Application granted granted Critical
Publication of ES2565021T3 publication Critical patent/ES2565021T3/es
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/16—Curved printing plates, especially cylinders
    • B41N1/22—Curved printing plates, especially cylinders made of other substances
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

Composición de resina fotosensible, que comprende: 100 partes en masa de un prepolímero de poliuretano que tiene un grupo etilénicamente insaturado y que tiene una proporción de segmentos de polietileno comprendida entre el 5% y el 25% en masa; de 10 partes a 150 partes en masa de un componente etilénicamente insaturado, con respecto a 100 partes en masa del prepolímero de poliuretano; y de 0,01 a 10 partes en masa de un iniciador de fotopolimerización, con respecto a 100 partes en masa del prepolímero de poliuretano, en la que dicho componente etilénicamente insaturado comprende de 0,1 a 10 partes en masa de uno o más compuestos etilénicamente insaturados polifuncionales, que tienen 6 o más grupos (met)acriloílo en una molécula de los mismos, con respecto a 100 partes en masa de dicho prepolímero de poliuretano.

Description

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Claims (1)

  1. imagen1
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ES08765717.7T 2007-06-18 2008-06-18 Composición de resina fotosensible, placa de impresión flexográfica y procedimiento para producir una placa de impresión flexográfica Active ES2565021T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007159741 2007-06-18
JP2007159741 2007-06-18
PCT/JP2008/061150 WO2008156115A1 (ja) 2007-06-18 2008-06-18 感光性樹脂組成物、フレキソ印刷版、及びフレキソ印刷版の製造方法

Publications (1)

Publication Number Publication Date
ES2565021T3 true ES2565021T3 (es) 2016-03-30

Family

ID=40156274

Family Applications (1)

Application Number Title Priority Date Filing Date
ES08765717.7T Active ES2565021T3 (es) 2007-06-18 2008-06-18 Composición de resina fotosensible, placa de impresión flexográfica y procedimiento para producir una placa de impresión flexográfica

Country Status (8)

Country Link
US (1) US8501391B2 (es)
EP (1) EP2161618B1 (es)
JP (1) JP5164982B2 (es)
KR (1) KR20090122343A (es)
CN (1) CN101627339A (es)
AU (1) AU2008264520A1 (es)
ES (1) ES2565021T3 (es)
WO (1) WO2008156115A1 (es)

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JP5420290B2 (ja) * 2009-03-27 2014-02-19 旭化成イーマテリアルズ株式会社 感光性樹脂組成物、フレキソ印刷版、及びフレキソ印刷版の製造方法
JP5383288B2 (ja) * 2009-03-31 2014-01-08 富士フイルム株式会社 感光性組成物、感光性樹脂転写フイルム、樹脂パターン及び樹脂パターンの製造方法、並びに液晶表示装置用基板及び液晶表示装置
US9835942B2 (en) * 2010-12-14 2017-12-05 Kaneka Corporation Photosensitive resin composition and use thereof
JP5996197B2 (ja) * 2012-01-27 2016-09-21 旭化成株式会社 フレキソ印刷版用液状感光性樹脂組成物
JP5862881B2 (ja) * 2012-03-26 2016-02-16 Jnc株式会社 光硬化性組成物
US9709888B2 (en) 2012-03-30 2017-07-18 Toyobo Co., Ltd. Photosensitive resin composition for CTP flexographic printing original plate and printing original plate prepared therefrom
WO2014061539A1 (ja) * 2012-10-17 2014-04-24 第一工業製薬株式会社 ウレタンアクリレート及びこれを含有する反応性組成物
CN107003604B (zh) * 2014-10-15 2020-08-11 奇美实业股份有限公司 感光性树脂组成物、彩色滤光片的制造方法、彩色滤光片以及液晶显示装置
CN104311783B (zh) * 2014-11-11 2017-01-11 合肥思敬齐化工材料有限责任公司 一种不饱和超支化聚氨酯预聚物及制备方法与应用
KR102286107B1 (ko) * 2015-04-08 2021-08-04 아사히 가세이 가부시키가이샤 감광성 수지 조성물
US10732507B2 (en) 2015-10-26 2020-08-04 Esko-Graphics Imaging Gmbh Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof
JP2017185737A (ja) * 2016-04-07 2017-10-12 住友ゴム工業株式会社 フレキソ印刷版とその製造方法、および液晶表示素子の製造方法
US10702044B2 (en) * 2016-06-30 2020-07-07 L'oreal Reversible thermochromic/photochromic cosmetic activator
JP2018131609A (ja) * 2017-02-13 2018-08-23 三洋化成工業株式会社 ポリウレタンウレア樹脂組成物用耐光性向上剤
JP6757755B2 (ja) * 2017-02-21 2020-09-23 三洋化成工業株式会社 活性エネルギー線硬化型樹脂組成物
TWI740023B (zh) * 2017-04-04 2021-09-21 日商旭化成股份有限公司 柔版印刷版用感光性樹脂組合物、柔版印刷原版、柔版印刷版及共聚物
TWI737908B (zh) * 2017-04-13 2021-09-01 日商荒川化學工業股份有限公司 胺基甲酸酯（甲基）丙烯酸酯、活性能量射線硬化性樹脂組成物、硬化物及薄膜
CN111372787B (zh) * 2017-12-26 2021-12-21 住友理工株式会社 柔性印刷版原版
CN109143798A (zh) * 2018-08-09 2019-01-04 苏州纳勒电子科技有限公司 一种稳定性佳且易于清洗的显影液
KR102749148B1 (ko) * 2021-02-26 2025-01-02 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 표시장치
CN116082584A (zh) * 2023-01-16 2023-05-09 武汉瑞普赛技术有限公司 一种低析出型柔性印刷版感光树脂及其应用
CN116589884B (zh) * 2023-04-17 2024-07-02 中钞油墨有限公司 一种力致变色油墨及其制备方法与应用
CN120406048B (zh) * 2025-04-27 2025-10-21 江西力征材料有限公司 一种水性感光干膜及其制备方法

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Also Published As

Publication number Publication date
JPWO2008156115A1 (ja) 2010-08-26
US8501391B2 (en) 2013-08-06
EP2161618B1 (en) 2016-03-09
US20100189960A1 (en) 2010-07-29
EP2161618A1 (en) 2010-03-10
EP2161618A4 (en) 2012-09-19
KR20090122343A (ko) 2009-11-27
CN101627339A (zh) 2010-01-13
WO2008156115A1 (ja) 2008-12-24
AU2008264520A1 (en) 2008-12-24
JP5164982B2 (ja) 2013-03-21

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