EP3558505A4 - Procédé permettant de déposer un matériau fonctionnel sur un substrat - Google Patents
Procédé permettant de déposer un matériau fonctionnel sur un substrat Download PDFInfo
- Publication number
- EP3558505A4 EP3558505A4 EP16924766.5A EP16924766A EP3558505A4 EP 3558505 A4 EP3558505 A4 EP 3558505A4 EP 16924766 A EP16924766 A EP 16924766A EP 3558505 A4 EP3558505 A4 EP 3558505A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- depositing
- substrate
- functional material
- functional
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000151 deposition Methods 0.000 title 1
- 239000000463 material Substances 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
- H05K3/207—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern using a prefabricated paste pattern, ink pattern or powder pattern
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/09654—Shape and layout details of conductors covering at least two types of conductors provided for in H05K2201/09218 - H05K2201/095
- H05K2201/09736—Varying thickness of a single conductor; Conductors in the same plane having different thicknesses
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/0113—Female die used for patterning or transferring, e.g. temporary substrate having recessed pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1275—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by other printing techniques, e.g. letterpress printing, intaglio printing, lithographic printing, offset printing
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Printing Plates And Materials Therefor (AREA)
- Printing Methods (AREA)
- Decoration By Transfer Pictures (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/US2016/068100 WO2018118052A1 (fr) | 2016-12-21 | 2016-12-21 | Procédé permettant de déposer un matériau fonctionnel sur un substrat |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP3558505A1 EP3558505A1 (fr) | 2019-10-30 |
| EP3558505A4 true EP3558505A4 (fr) | 2020-08-19 |
Family
ID=62627846
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP16924766.5A Pending EP3558505A4 (fr) | 2016-12-21 | 2016-12-21 | Procédé permettant de déposer un matériau fonctionnel sur un substrat |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP3558505A4 (fr) |
| JP (1) | JP6851649B2 (fr) |
| KR (1) | KR102239833B1 (fr) |
| CN (1) | CN110198780A (fr) |
| CA (1) | CA3047376A1 (fr) |
| WO (1) | WO2018118052A1 (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3889319A1 (fr) * | 2020-04-01 | 2021-10-06 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk Onderzoek TNO | Dépôt contrôlé d'un matériau fonctionnel sur une surface cible |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5326619A (en) * | 1993-10-28 | 1994-07-05 | Minnesota Mining And Manufacturing Company | Thermal transfer donor element comprising a substrate having a microstructured surface |
| US20090169809A1 (en) * | 2007-12-26 | 2009-07-02 | Semiconductor Energy Laboratory Co., Ltd. | Evaporation Donor Substrate, Method for Manufacturing the Same, and Method for Manufacturing Light-Emitting Device |
| WO2013129425A1 (fr) * | 2012-02-27 | 2013-09-06 | 東レ株式会社 | Substrat donneur de transfert et procédé de fabrication de dispositifs |
| US20150086705A1 (en) * | 2012-05-02 | 2015-03-26 | Nederlandse Organisatie Voor Toegepast- Natuurwetenschappelijk Onderzoek Tno | Donor sheet and method for light induced forward transfer manufacturing |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS516200A (en) * | 1974-07-05 | 1976-01-19 | Central Glass Co Ltd | Kaatsukadatsusuihonyoru chitansankarisenino seizohoho |
| CA1255142A (fr) * | 1985-03-11 | 1989-06-06 | Edward C. Fredericks | Methode et compose pour accroitre la definition des conducteurs dans les circuits microelectroniques |
| TW388083B (en) * | 1995-02-20 | 2000-04-21 | Hitachi Ltd | Resist pattern-forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed |
| GB9714531D0 (en) * | 1997-07-11 | 1997-09-17 | Trikon Equip Ltd | Forming a layer |
| JP4353452B2 (ja) * | 2000-03-30 | 2009-10-28 | オウレンタム イノベーションズ テクノロジエン ゲーエムベーハー | 印刷方法 |
| JP2004304097A (ja) * | 2003-04-01 | 2004-10-28 | Sharp Corp | パターン形成方法および半導体装置の製造方法 |
| KR100643684B1 (ko) * | 2005-11-04 | 2006-11-10 | 한국과학기술원 | 폴리머 또는 레지스트 패턴 및 이를 이용한 금속 박막패턴, 금속 패턴, 플라스틱 몰드 및 이들의 형성방법 |
| GB0620955D0 (en) * | 2006-10-20 | 2006-11-29 | Speakman Stuart P | Methods and apparatus for the manufacture of microstructures |
| CN101246914A (zh) * | 2007-02-14 | 2008-08-20 | 北京行者多媒体科技有限公司 | 薄膜太阳能电池的背反射层 |
| US9120245B1 (en) * | 2007-05-09 | 2015-09-01 | The United States Of America As Represented By The Secretary Of The Air Force | Methods for fabrication of parts from bulk low-cost interface-defined nanolaminated materials |
| US20110070462A1 (en) * | 2008-05-16 | 2011-03-24 | Showa Denko K.K. | Pattern forming method |
| JP5137917B2 (ja) * | 2009-08-07 | 2013-02-06 | 株式会社半導体エネルギー研究所 | 成膜用基板、成膜方法及び発光素子の作製方法 |
| JP2011103362A (ja) * | 2009-11-10 | 2011-05-26 | Toshiba Corp | パターン形成方法 |
| JP2012094500A (ja) * | 2010-09-30 | 2012-05-17 | Toray Ind Inc | 転写用ドナー基板およびこれを用いたデバイスの製造方法 |
| JP5971938B2 (ja) * | 2011-12-19 | 2016-08-17 | キヤノン株式会社 | 硬化物の製造方法およびパターン形成方法 |
| JP6305058B2 (ja) * | 2013-03-05 | 2018-04-04 | キヤノン株式会社 | 感光性ガス発生剤、光硬化性組成物 |
| KR20150017602A (ko) * | 2013-08-07 | 2015-02-17 | 삼성디스플레이 주식회사 | 표시 장치 및 이의 제조 방법 |
| JP6619335B2 (ja) * | 2013-10-14 | 2019-12-11 | オルボテック リミテッド | 複数組成材料構造体のlift印刷 |
| EP3268505B1 (fr) * | 2015-03-11 | 2022-05-04 | Exogenesis Corporation | Procédé pour traitement par faisceau neutre basé sur une technologie de faisceau ionique d'agrégats de gaz |
| CN106116180A (zh) * | 2016-06-15 | 2016-11-16 | 上海交通大学 | 一种在拉锥光纤上沉积二维材料的方法 |
-
2016
- 2016-12-21 WO PCT/US2016/068100 patent/WO2018118052A1/fr not_active Ceased
- 2016-12-21 CA CA3047376A patent/CA3047376A1/fr active Pending
- 2016-12-21 JP JP2019506104A patent/JP6851649B2/ja active Active
- 2016-12-21 CN CN201680092046.8A patent/CN110198780A/zh active Pending
- 2016-12-21 KR KR1020197021330A patent/KR102239833B1/ko active Active
- 2016-12-21 EP EP16924766.5A patent/EP3558505A4/fr active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5326619A (en) * | 1993-10-28 | 1994-07-05 | Minnesota Mining And Manufacturing Company | Thermal transfer donor element comprising a substrate having a microstructured surface |
| US20090169809A1 (en) * | 2007-12-26 | 2009-07-02 | Semiconductor Energy Laboratory Co., Ltd. | Evaporation Donor Substrate, Method for Manufacturing the Same, and Method for Manufacturing Light-Emitting Device |
| WO2013129425A1 (fr) * | 2012-02-27 | 2013-09-06 | 東レ株式会社 | Substrat donneur de transfert et procédé de fabrication de dispositifs |
| US20150086705A1 (en) * | 2012-05-02 | 2015-03-26 | Nederlandse Organisatie Voor Toegepast- Natuurwetenschappelijk Onderzoek Tno | Donor sheet and method for light induced forward transfer manufacturing |
Non-Patent Citations (1)
| Title |
|---|
| See also references of WO2018118052A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110198780A (zh) | 2019-09-03 |
| JP2020514094A (ja) | 2020-05-21 |
| CA3047376A1 (fr) | 2018-06-28 |
| WO2018118052A1 (fr) | 2018-06-28 |
| KR102239833B1 (ko) | 2021-04-13 |
| EP3558505A1 (fr) | 2019-10-30 |
| JP6851649B2 (ja) | 2021-03-31 |
| KR20190099483A (ko) | 2019-08-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
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| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
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| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
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| 17P | Request for examination filed |
Effective date: 20190620 |
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| AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
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| AX | Request for extension of the european patent |
Extension state: BA ME |
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| DAV | Request for validation of the european patent (deleted) | ||
| DAX | Request for extension of the european patent (deleted) | ||
| A4 | Supplementary search report drawn up and despatched |
Effective date: 20200716 |
|
| RIC1 | Information provided on ipc code assigned before grant |
Ipc: B29C 35/04 20060101ALI20200710BHEP Ipc: C08J 7/18 20060101ALI20200710BHEP Ipc: B01J 19/08 20060101ALI20200710BHEP Ipc: B29D 7/00 20060101ALI20200710BHEP Ipc: B01J 7/00 20060101AFI20200710BHEP Ipc: H01L 21/31 20060101ALI20200710BHEP Ipc: H05K 3/20 20060101ALI20200710BHEP Ipc: B82Y 40/00 20110101ALI20200710BHEP |
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| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: EXAMINATION IS IN PROGRESS |
|
| 17Q | First examination report despatched |
Effective date: 20240613 |
|
| 17Q | First examination report despatched |
Effective date: 20240626 |