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EP1341947A2 - Substrat revetu, procede de reduction de l'emissivite de substrats et utilisation d'un tel substrat - Google Patents

Substrat revetu, procede de reduction de l'emissivite de substrats et utilisation d'un tel substrat

Info

Publication number
EP1341947A2
EP1341947A2 EP01986851A EP01986851A EP1341947A2 EP 1341947 A2 EP1341947 A2 EP 1341947A2 EP 01986851 A EP01986851 A EP 01986851A EP 01986851 A EP01986851 A EP 01986851A EP 1341947 A2 EP1341947 A2 EP 1341947A2
Authority
EP
European Patent Office
Prior art keywords
substrate
coated substrate
emissivity
layer system
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP01986851A
Other languages
German (de)
English (en)
Inventor
Bernd Szyszka
Andreas Bierhals
Udo Bringmann
Thomas Höing
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Publication of EP1341947A2 publication Critical patent/EP1341947A2/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C03C17/2453—Coating containing SnO2
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/211—SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/216—ZnO
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering

Definitions

  • the invention relates to a coated substrate with an optically transparent and electrically conductive layer system deposited on at least one surface of the substrate. And so, the present invention relates to a method for reducing the emissivity of substrates in the 'at least one surface of the substrate, an optically transparent and electrically conductive layer system is deposited find .. using the substrates in the thermal insulation in buildings or for the avoidance of condensation on substrates with high thermal emissivity and this includes in particular the condensation on vehicle glazing.
  • the condensation of moisture on vehicle glazing is a problem, especially in the cold season, which has so far not been satisfactory from a technical point of view. could be solved lend.
  • the condensation starts when the glass cools to temperatures below the dew point.
  • the materials used up to now in the automotive sector are promoting this cooling process.
  • the outside of the vehicle thus acts as a very efficient heat sink, so that the temperature drops rapidly at night.
  • the cooling of the vehicle can be reduced if the heat losses in the passenger compartment are reduced, ie the thermal emissivity is reduced.
  • the thermal emissivity ⁇ is directly linked to the electrical sheet resistance R Sh of the coating. From J. Szczyrbowfki et al. , "New Low Emissivity Coating Based on TwinMag TM Sputtert Ti0 2 and Si 3 N 4 Layers, Thin Solid Films" 351 (1999, 254), is the numerical relationship for highly conductive layers
  • a coated substrate with an optically transparent and electrically conductive layer system deposited on at least one surface of the substrate is now provided.
  • the coating is chosen such that the ratio of the emissivity of the coated substrate ( ⁇ ) to the emissivity of the uncoated substrate ( ⁇ ) o is less than 0.2.
  • Such coatings are preferably selected so that the ratio ⁇ to ⁇ 0 is less than 0.1.
  • this is preferably between 1 and 50 ⁇ for the coated substrates according to the invention.
  • Metallic oxides or mixed oxides with transparent and conductive properties have proven to be particularly advantageous.
  • Suitable metallic oxides or mixed oxides are those of tin or zinc, in metallic doped or undoped form.
  • Aluminum, antimony and / or indium is preferably used as the doping element.
  • the layer system is preferably deposited by means of reactive medium frequency magnetron sputtering.
  • reactive medium frequency magnetron sputtering is also possible which guarantee large-scale and inexpensive application.
  • Glass and / or a glass-containing material is preferably used as the substrate. It is also possible to coat plastics and / or plastic-containing materials.
  • the substrate can already, e.g. with a varnish, be surface-treated.
  • the coating is particularly preferably carried out on one
  • Vehicle body and / or a vehicle glazing ' as a substrate Vehicle body and / or a vehicle glazing ' as a substrate.
  • the substrate can preferably also be coated on two opposite surfaces. In relation to a motor vehicle, this means that both the body is coated from the outside and on the surface facing the passenger compartment.
  • a method for reducing the emissivity of substrates in which an optically transparent and electrically conductive layer system is deposited on at least one surface of the substrate.
  • the ratio of the emissivity ⁇ of the coated substrate to the emissivity ⁇ 0 of the uncoated substrate is reduced to less than 0.2 by the coating.
  • the ratio ⁇ to ⁇ 0 is particularly preferably reduced to less than 0.1.
  • coated substrates are preferably used for thermal insulation in buildings. Another possible application is to avoid condensation on substrates with high thermal emissivity. This particularly includes condensation on vehicle glazing.
  • Fig. 1 shows the schematic structure of an in-line sputtering system Leybold A700V
  • the sputtering system used contains double cathode sputter sources (Leybold TwinMag TM), which are based on two conventional Leybold PK 750 magnetron cathodes (target format 748 x 88 mm 2 ). Sputtering gas and reactive gas are added separately via independent gas distributors via conventional mass flow controllers (MKS).
  • MKS mass flow controllers
  • the discharge power of the generator can be set via a control computer, which also serves for data acquisition of the discharge parameters.
  • the target surface is only slightly covered by metal oxides, so that a high metal particle current density is emitted in the oxide mode compared to the oxidized target surface.
  • the sputtered metal reacts with the embedded oxygen on the substrate and on the chamber walls. This getter effect results in a low reactive gas partial pressure of P02 - 20 mPa in metallic mode.
  • the discharge power is increased when point A is reached. This prevents the process from tipping over in the oxide mode.
  • the process in the entire unstable area (transition mode) can be converted from the metallic mode to the oxide mode along the characteristic curve AB.
  • FIG. 3 shows the influence of the reactive gas partial pressure on the specific resistance and the Al concentration of the reactively sputtered ZnO: Al samples for different heater temperatures
  • FIG. 4 shows the corresponding thermal emissivity ⁇ of the layers as a function of the reactive gas partial pressure.
  • At Al concentrations around 2 - 2.5 at. % result at a heater temperature of 250 ° C highly conductive layers with a specific resistance of 340 ⁇ cm, corresponding to a thermal emissivity of 4%.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

L'invention concerne un substrat revêtu sur au moins une surface duquel est déposée une couche sous forme d'un système optiquement transparent et électroconducteur. L'invention concerne également un procédé de réduction de l'émissivité de substrats, selon lequel un système sous forme de couche optiquement transparent et électroconducteur est déposé sur au moins une surface du substrat. Des substrats selon l'invention peuvent être utilisés pour la réalisation d'isolations thermiques dans des bâtiments ou pour éviter la condensation sur des substrats présentant une capacité d'émission thermique élevée, en particulier pour empêcher la condensation sur des vitrages de véhicules automobiles.
EP01986851A 2000-12-06 2001-12-06 Substrat revetu, procede de reduction de l'emissivite de substrats et utilisation d'un tel substrat Withdrawn EP1341947A2 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10060681 2000-12-06
DE10060681 2000-12-06
PCT/EP2001/014304 WO2002046490A2 (fr) 2000-12-06 2001-12-06 Substrat revetu, procede de reduction de l'emissivite de substrats et utilisation d'un tel substrat

Publications (1)

Publication Number Publication Date
EP1341947A2 true EP1341947A2 (fr) 2003-09-10

Family

ID=7666034

Family Applications (1)

Application Number Title Priority Date Filing Date
EP01986851A Withdrawn EP1341947A2 (fr) 2000-12-06 2001-12-06 Substrat revetu, procede de reduction de l'emissivite de substrats et utilisation d'un tel substrat

Country Status (3)

Country Link
EP (1) EP1341947A2 (fr)
AU (1) AU2002238412A1 (fr)
WO (1) WO2002046490A2 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004003760B4 (de) * 2004-01-23 2014-05-22 Forschungszentrum Jülich GmbH Verfahren zur Herstellung einer leitfähigen und transparenten Zinkoxidschicht und Verwendung derselben in einer Dünnschichtsolarzelle

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4835061A (en) * 1984-11-09 1989-05-30 Konishiroku Photo Industry Co., Ltd. Conductive laminate
US4769291A (en) * 1987-02-02 1988-09-06 The Boc Group, Inc. Transparent coatings by reactive sputtering
DE19624838A1 (de) * 1996-06-21 1998-01-08 Schueller Glasbeschichtung Gmb Wärmedämmende Anti-Reflex-Beschichtung und Verfahren zu deren Herstellung
DE19643550A1 (de) * 1996-10-24 1998-05-14 Leybold Systems Gmbh Lichttransparentes, Wärmestrahlung reflektierendes Schichtensystem
SE9603928L (sv) * 1996-10-28 1998-04-27 Gunder Karlsson Transparent termos

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO0246490A3 *

Also Published As

Publication number Publication date
WO2002046490A3 (fr) 2003-02-13
AU2002238412A1 (en) 2002-06-18
WO2002046490A2 (fr) 2002-06-13

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Inventor name: HOEING, THOMAS

Inventor name: BRINGMANN, UDO

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Inventor name: SZYSZKA, BERND

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