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EP0218159A1 - Support en aluminium anodisé, procédé pour sa préparation et plaque d'impression lithographique contenant ledit support - Google Patents

Support en aluminium anodisé, procédé pour sa préparation et plaque d'impression lithographique contenant ledit support Download PDF

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Publication number
EP0218159A1
EP0218159A1 EP86113305A EP86113305A EP0218159A1 EP 0218159 A1 EP0218159 A1 EP 0218159A1 EP 86113305 A EP86113305 A EP 86113305A EP 86113305 A EP86113305 A EP 86113305A EP 0218159 A1 EP0218159 A1 EP 0218159A1
Authority
EP
European Patent Office
Prior art keywords
support
micrometers
aluminum
lithographic printing
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP86113305A
Other languages
German (de)
English (en)
Other versions
EP0218159B1 (fr
Inventor
Gary R. Miller
Richard E. Gilson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of EP0218159A1 publication Critical patent/EP0218159A1/fr
Application granted granted Critical
Publication of EP0218159B1 publication Critical patent/EP0218159B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
    • C25D11/08—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing inorganic acids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/03—Chemical or electrical pretreatment
    • B41N3/034—Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer

Definitions

  • This invention relates to a novel phosphoric acid anodized aluminum support for use in a lithographic printing plate, to a method for the preparation of such support, and to a lithographic printing plate comprising the support which exhibits improved abrasion resistance.
  • U.S. patent 3,511,661 discloses a lithographic printing plate comprising a phosporic acid anodized aluminum surface.
  • the aluminum surface stratum comprises a cellular pattern of aluminum oxide consisting of cells with porous openings about 20x10 9m - 75 ⁇ 10 -9 m in average diameter, thus providing a surface sufficiently porous to achieve good adhesion.
  • the surface stratum comprises about 10 to 200 mg/m 2 aluminum phosphate.
  • U. S. patent 4,229,266 relates to the use of a mixture of sulfuric acid and phosphoric acid in forming the anodic layer of a lithographic printing plate. According to this patent, only relatively thin layers are obtained when phosphoric acid alone is used as the electrolyte in the anodizing process, due to the strong redissolving capacity of phosphoric acid towards aluminum oxide, and this is said to result in inferior abrasion resistance for phosphoric acid anodized layers.
  • a lithographic printing plate having improved abrasion resistance and a support surface sufficiently porous to achieve adequate adhesion.
  • the invention provides an anodized aluminum support, for use in a lithographic printing plate, comprising an anodic surface stratum consisting essentially of oxides and phosphates of aluminum having an average thickness greater than 0.50 micrometers.
  • the anodic stratum is present in a coverage of greater than 600 milligrams per square meter of support and has a web-like surface structure characterized by the presence of a multiplicity of interlacing filaments having average widths within the range of from about 0.03 to about 0.15 micrometers.
  • the invention further provides a method of preparing such support by anodically oxidizing at least one surface of an aluminum plate in an aqueous electrolyte comprising phosphoric acid, characterized in that the electrolyte comprises from about 15 to 30% phosphoric acid by weight, and the anodic oxidation is carried out at an anodizing voltage of at least about 50 volts at an electrolyte temperature of from about 25°C to about 50°C and at an anodizing condition of at least 2.5 amp. min/dm .
  • a lithographic printing plate in accordance with the present invention comprises a radiation sensitive layer and the above-described anodized aluminum support.
  • the lithographic printing plate of this invention exhibits improved resistance to abrasion.
  • the support material comprises an aluminum or aluminum alloy plate.
  • Suitable aluminum alloys include alloys with zinc, silicon, chromium, copper, manganese, magnesium, chromium, zinc, lead, bismuth, nickel, iron or titanium which may contain negligible amounts of impurities.
  • the surface of the aluminum plate is preferably subjected to chemical cleaning such as degreasing with solvents or alkaline agents for the purpose of exposing a clean surface free of grease, )rust or dust which is usually present on the aluminum surface.
  • chemical cleaning such as degreasing with solvents or alkaline agents for the purpose of exposing a clean surface free of grease, )rust or dust which is usually present on the aluminum surface.
  • the surface is grained. Suitable graining methods include glass bead graining, ball graining, sand blasting, brush graining and electrolytic graining.
  • the support can be treated with an aluminum etching agent and a desmutting acid bath.
  • An anodized stratum is then formed on at least one surface of the aluminum plate.
  • An electric current is passed through the support immersed as a cathode in an electrolytic solution containing phosphoric acid.
  • the anodized surface stratum consists essentially of oxides and phosphates of aluminum and is present in a coverage of greater than 600 milligrams per square meter of support.
  • the average thickness of the surface stratum is greater than 0.50 micrometers. In a preferred embodiment of this invention, the surface stratum has an average thickness greater than 0.70 micrometers.
  • the oxides and phosphates of aluminum preferably are present in a coverage of greater than 800 milligrams per square meter of support.
  • the support of this invention has a web-like surface structure characterized by the presence of a multiplicity of interlacing filaments as depicted in Figure 3.
  • the interlacing filaments have average widths within the range of from about 0.03 to about 0.15 micrometers, more preferably within the range of from about 0.05 to about 0.12 micrometers. If the average widths of the interlacing filaments exceed about 0.15 micrometers, poor adhesion results between the surface of the support and the radiation sensitive layer. Lithographic printing plates prepared from supports containing interlacing filaments having average widths less than 0.03 micrometers exhibit good adhesion but poor sensitivity performance.
  • the above-described support of this invention is prepared in a process of anodically oxidizing at least one surface of an alumimum plate in an aqueous electrolyte comprising phosphoric acid.
  • the aqueous electrolyte comprises from about 15 to 30%, preferably 17-22% phosphoric acid by weight.
  • the anodic oxidation is carried out at an anodizing voltage of at least 50 volts, and preferably at an anodizing voltage of at least 70 volts.
  • An anodizing condition of at least 2.5 amp ⁇ min/dm is required to provide the above described anodized stratum.
  • the anodization preferably takes place at an anodizing condition greater than 3.0 amp ⁇ min/dm 2 .
  • a range of typical anodizing times is from about 15 seconds to 3 minutes.
  • the electrolyte temperature during anodization can range from about 25 0 C to about 50°C, however, the preferred electrolyte temperature range is from about 30°C to 40°C. Below 25°C, an extremely high voltage is required, and hot spots result. Above 50 C, the rate of dissolution of the anodized stratum is too great.
  • the above-described support can be coated, if desired, with a thin coating of a hydrophilic material.
  • the hydrophilic coating contributes to improving the water receptivity of the non-printing areas of the processed plate.
  • the hydrophilic coating is coated by known techniques in a subbing amount. It is particularly advantageous to use a water-soluble permanently hydrophilic material which can be coated from an aqueous dispersion.
  • a solution containing polyacrylamide is especially advantageous for this purpose, as are solutions containing carboxymethyl cellulose, polyvinylphosphonic acid, sodium silicate and combinations of these.
  • hydrophilic interlayers include polyvinylalcohol, copolymers of maleic anhydride with ethylene, vinyl acetate, styrene or vinyl methyl ether, polyacrylic acid, hydroxymethyl cellulose and polyvinyl pyrrolidone.
  • a particularly useful hydrophilic subbing composition is described in U.S. patent 3,860,426.
  • the lithographic printing plate of this invention comprises a radiation sensitive layer and the above-described support.
  • a radiation sensitive coating is placed directly on the support or, preferably, over one or more subbing layers.
  • Supports prepared in accordance with the teaching of this invention are sufficiently porous to achieve good adhesion.
  • Various radiation sensitive materials suitable for forming images for use in the lithographic printing process can be used. Almost any radiation sensitive layer is suitable which after exposure, if necessary followed by developing and/or fixing, provides an area in imagewise distribution which may be used for printing.
  • Radiation sensitive materials useful in this invention are well known in the art, and include silver halide emulsions, as described in Research Disclosure, publication 17643, paragraph XXV, Dec., 1978 and references noted therein; quinone diazides (polymeric and non-polymeric), as described in U.S. patent 4,141,733 (issued February 27, 1979 to Guild) and references noted therein; light sensitive polycarbonates, as described in U.S. patent 3,511,611 (issued May 12, 1970 to Rauner et al) and references noted therein; diazonium salts, diazo resins, cinnamal-malonic acids and functional equivalents thereof and others described in U.S.
  • Particularly useful radiation sensitive materials are photocrosslinkable polymers, such as polyesters, containing the photosensitive group as an integral part of the polymer backbone.
  • preferred photocrosslinkable polymers are polyesters prepared from one or more compounds represented by the following formulae: wherein R 2 is one or more alkyl of 1 to 6 carbon atoms, aryl of 6 to 12 carbon atoms, aralkyl of 7 to 20 carbon atoms, alkoxy of 1 to 6 carbon atoms, nitro, amino, acrylic, carboxyl, hydrogen or halo and is chosen to provide at least one condensation site; and R 3 is hydroxy, alkoxy of 1 to 6 carbon atoms, halo or oxy if the compound is an acid anhydride.
  • a preferred compound is p-phenylene diacrylic acid or a functional equivalent thereof.
  • R 3 is as defined above, and R 4 is alkylidene of 1 to 4 carbon atoms, aralkylidene of 7 to 16 carbon atoms, or a 5- to 6-membered heterocyclic ring.
  • Particularly useful compounds of formula (B) are cinnamylidenemalonic acid, 2-butenylidenemalonic acid, 3-pentenylidenemalonic acid, o-nitrocinnamylidenemalonic acid, naphthylallylidenemalonic acid, 2-furfurylideneethylidenemalonic acid and functional equivalents thereof.
  • R 3 is as defined above; and R 5 is hydrogen or methyl.
  • Particularly useful compounds of formula (C) are trans,trans-muconic acid, cis,trans-muconic acid, cis,cis-muconic acid, ⁇ , ⁇ '-cis,trans- dimethylmuconic acid, ⁇ , ⁇ '-cis,cis-dimethyl- muconic acid and functional equivalents thereof.
  • R 3 is as defined above; and Z represents the atoms necessary to form an unsaturated, bridged or unbridged carbocyclic nucleus of 6 or 7 carbon atoms. Such nucleus can be substituted or unsubstituted.
  • Particularly useful compounds of formula (D) are 4-cyclohexene-l,2-dicarboxylic acid, 5-norbornene-2,3-dicarboxylic acid, hexachloro-5[2:2:1]-bicycloheptene-2,3-dicarboxylic acid and functional equivalents thereof. These and other useful compounds are described in Canadian patent 824,096 (issued September 30, 1969 to Mench et al). R 3 is as defined above; and R 6 is hydrogen, alkyl of 1 to 12 carbon atoms, cycloalkyl of 5 to 12 carbon atoms or aryl of 6 to 12 carbon atoms.
  • R 6 can be substituted, where possible, with such substituents as do not interfere with the condensation reaction, such as halo, nitro, aryl, alkoxy, aryloxy, etc.
  • the carbonyl groups are attached to the cyclohexadiene nucleus meta or para to each other, and preferably para.
  • Particularly useful compounds of formula (E) are 1,3-cyclohexadiene-1,4-dicarboxylic acid, 1,3-cyclohexadiene-1,3-dicarboxylic acid. 1,5-cyclohexadiene-1,4-dicarboxylic acid and functional equivalents thereof. These and other useful compounds are described in Belgian patent 754,892 (issued October 15, 1970).
  • the radiation-sensitive coating can be prepared by dispersing the radiation sensitive composition or polymer in any suitable solvent or combination of solvents used in the art.
  • Suitable sensitizers include anthrones, such as 1-carbethoxy-2-keto-3-methyl-2-azabenzanthrone, benzanthrone; nitro sensitizers; triphenylmethanes; quinones; cyanine dye sensitizers; naphthone sensitizers such as 6-methoxybeta-2-furyl-2-acrylonaphthone; pyrylium or thiapyrylium salts, such as 2,6 bis(p-ethoxyphenyl)-4-(p-n-amyloxyphenyl)-thiapyrylium perchlorate and 1,3,5-triphenyl-pyrylium fluoroborate; furanone; 4-picoline-N-oxide; anthraquinones such as 2-chloroanthraquinone; thiazoles such as 2-benzoylcarbethoxymethylene- l-methyl
  • a number of other addenda can be present in the coating composition and ultimately form a part of the lithographic plate.
  • dyes or pigments may be included to obtain colored images to aid in recognition.
  • Other components which can be advantageously included in the coating composition are materials which serve to improve film formation, coating properties, adhesion of the coatings to the support, mechanical strength and stability.
  • the lithographic printing plate of the present invention can be exposed by conventional methods, for example through a transparency or a stencil, to an imagewise pattern of actinic radiation.
  • Suitable radiation sources include sources rich in visible radiation and sources rich in ultraviolet radiation.
  • Carbon arc lamps, mercury vapor lamps, fluorescent lamps, tungsten filament lamps, photoflood lamps, lasers and the like are useful herein.
  • the exposed lithographic printing plate can be developed using conventional developer and developing techniques.
  • the developer composition is applied to the surface of the plate for a period of time sufficient to remove the polymer from non-image areas of the plate.
  • gentle mechanical action aids in removing the polymer composition from these areas.
  • swabbing is a useful method of applying the developer composition to the plate.
  • the developer composition is typically used at room temperature but it can be employed at elevated temperatures up to about 32°C.
  • a second application can be applied, followed by either a single or double application of a desensitizing composition.
  • the plate is then dried.
  • a 12 mil (0.3 mm) aluminum plate Is Immersed in a caustic solution to remove oil and dirt from the surface.
  • the surface is grained with a brush and a slurry of abrasive media. Loose residue is removed by etching in a caustic solution followed by an acid desmutting bath.
  • the aluminum plate is then anodized in a phosphoric acid electrolyte under the conditions listed below.
  • the anodized plate was treated in a 3% solution of PQ-D sodium silicate sold by PQ Corporation.
  • the Si0 2 to Na 2 0 ratio was about 2:1.
  • the anodized plate was immersed in a bath having a temperature of 82°C for about 45 seconds.
  • the silicated anodized plate was rinsed, dried and coated with a polyacrylamide subbing layer as described in U.S. patent 3,860,426.
  • the plate was then coated with a radiation sensitive coating as described in U.S. Patent No. 3,030,208, a condensation of hydroxyethoxycyclohexane and p-phenylenediethoxy acrylate.
  • the physical properties of the anodized aluminum support are set forth in the following table.
  • the abrasion resistance of the non-image portion of each plate was measured as follows. A diamond stylus was dragged across the plate surface and the weight on the stylus increased until a continuous scratch could be seen across the oxide surface penetrating into the underlying aluminum. The abrasion resistance is thus reported as minimum grams required to produce a continuous scratch.
  • the anodic layers of examples 1-15 and comparative examples A-D all exhibited a web-like surface structure characterized by the presence of a multiplicity of interlacing filaments having average widths within the range of from about 0.03 to about 0.15 micrometers.
  • comparative examples A-D exhibited inferior abrasion resistance in comparison with examples 1-15, as a result of the fact that they were prepared under conditions outside the scope of the process of this invention and, in consequence thereof, did not exhibit the thickness and coverage of the novel anodized aluminum support materials of this invention.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
EP86113305A 1985-10-10 1986-09-26 Support en aluminium anodisé, procédé pour sa préparation et plaque d'impression lithographique contenant ledit support Expired - Lifetime EP0218159B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US786012 1985-10-10
US06/786,012 US4647346A (en) 1985-10-10 1985-10-10 Anodized aluminum support, method for the preparation thereof and lithographic printing plate containing same

Publications (2)

Publication Number Publication Date
EP0218159A1 true EP0218159A1 (fr) 1987-04-15
EP0218159B1 EP0218159B1 (fr) 1990-06-13

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EP86113305A Expired - Lifetime EP0218159B1 (fr) 1985-10-10 1986-09-26 Support en aluminium anodisé, procédé pour sa préparation et plaque d'impression lithographique contenant ledit support

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US (1) US4647346A (fr)
EP (1) EP0218159B1 (fr)
JP (1) JPH0767867B2 (fr)
DE (1) DE3671921D1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001053570A1 (fr) * 2000-01-17 2001-07-26 Jury Removich Zalygin Enrobage ceramique a couches minces et procede de fabrication associe, surface de frottement formee sur l'enrobage ceramique a couches minces et procede de realisation de cette derniere

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4865951A (en) * 1987-10-22 1989-09-12 Eastman Kodak Company Bilayered anodized aluminum support, method for the preparation thereof and lithographic printing plate containing same
JP2652804B2 (ja) * 1989-04-27 1997-09-10 富士写真フイルム株式会社 感光性平版印刷版
US5240590A (en) * 1989-07-19 1993-08-31 Seagate Technology, Inc. Process for forming a bearing surface for aluminum alloy
JPH0411259A (ja) * 1990-04-27 1992-01-16 Fuji Photo Film Co Ltd 湿し水不要感光性平版印刷版
US5269904A (en) * 1992-06-05 1993-12-14 Northrop Corporation Single tank de-oxidation and anodization process
DE69512321T2 (de) 1994-06-16 2000-05-11 Kodak Polychrome Graphics Llc, Norwalk Lithographische Druckplatten mit einer oleophilen bilderzeugenden Schicht
JP3522923B2 (ja) * 1995-10-23 2004-04-26 富士写真フイルム株式会社 ハロゲン化銀感光材料
US6014929A (en) * 1998-03-09 2000-01-18 Teng; Gary Ganghui Lithographic printing plates having a thin releasable interlayer overlying a rough substrate
ATE259005T1 (de) * 2001-10-11 2004-02-15 Franz Oberflaechentechnik Gmbh Erzeugung eines metallisch leitfähigen oberflächenbereichs auf oxidierten al-mg- legierungen
JP2004338186A (ja) * 2003-05-14 2004-12-02 Fuji Photo Film Co Ltd 平版印刷版用支持体および平版印刷版原版
JP4868020B2 (ja) * 2008-12-26 2012-02-01 株式会社デンソー アルミニウムの陽極酸化方法、および陽極酸化アルミニウム
US8869075B2 (en) 2012-12-18 2014-10-21 Globalfoundries Inc. Locally optimized coloring for cleaning lithographic hotspots

Citations (1)

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EP0161461A2 (fr) * 1984-04-13 1985-11-21 Hoechst Aktiengesellschaft Procédé d'oxydation anodique d'aluminium et son application comme matériau de support pour plaques d'impression offset

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JPS6072792A (ja) * 1983-09-29 1985-04-24 Fuji Photo Film Co Ltd 平版印刷版用支持体
JPS60101539A (ja) * 1983-11-08 1985-06-05 Fuji Photo Film Co Ltd 感光性平版印刷版
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EP0161461A2 (fr) * 1984-04-13 1985-11-21 Hoechst Aktiengesellschaft Procédé d'oxydation anodique d'aluminium et son application comme matériau de support pour plaques d'impression offset

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001053570A1 (fr) * 2000-01-17 2001-07-26 Jury Removich Zalygin Enrobage ceramique a couches minces et procede de fabrication associe, surface de frottement formee sur l'enrobage ceramique a couches minces et procede de realisation de cette derniere

Also Published As

Publication number Publication date
US4647346A (en) 1987-03-03
JPH0767867B2 (ja) 1995-07-26
EP0218159B1 (fr) 1990-06-13
DE3671921D1 (de) 1990-07-19
JPS6299198A (ja) 1987-05-08

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