CN111304657B - Method for electrolytic recycling of alkaline etching waste liquid - Google Patents
Method for electrolytic recycling of alkaline etching waste liquid Download PDFInfo
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- CN111304657B CN111304657B CN202010088635.7A CN202010088635A CN111304657B CN 111304657 B CN111304657 B CN 111304657B CN 202010088635 A CN202010088635 A CN 202010088635A CN 111304657 B CN111304657 B CN 111304657B
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- 238000005530 etching Methods 0.000 title claims abstract description 174
- 239000007788 liquid Substances 0.000 title claims abstract description 117
- 239000002699 waste material Substances 0.000 title claims abstract description 70
- 238000000034 method Methods 0.000 title claims abstract description 51
- 238000004064 recycling Methods 0.000 title claims abstract description 6
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 100
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 71
- 239000010949 copper Substances 0.000 claims abstract description 71
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 63
- 229910052802 copper Inorganic materials 0.000 claims abstract description 63
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 50
- 239000000243 solution Substances 0.000 claims abstract description 39
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims abstract description 29
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 29
- 238000004519 manufacturing process Methods 0.000 claims abstract description 29
- 235000019270 ammonium chloride Nutrition 0.000 claims abstract description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000011259 mixed solution Substances 0.000 claims abstract description 6
- 239000002184 metal Substances 0.000 claims description 22
- 229910052751 metal Inorganic materials 0.000 claims description 22
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 15
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 13
- 229910001431 copper ion Inorganic materials 0.000 claims description 13
- 230000005484 gravity Effects 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 11
- 238000005260 corrosion Methods 0.000 claims description 10
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 9
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 9
- 239000003795 chemical substances by application Substances 0.000 claims description 9
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 claims description 8
- WTDHULULXKLSOZ-UHFFFAOYSA-N Hydroxylamine hydrochloride Chemical compound Cl.ON WTDHULULXKLSOZ-UHFFFAOYSA-N 0.000 claims description 8
- 239000001099 ammonium carbonate Substances 0.000 claims description 8
- 230000007797 corrosion Effects 0.000 claims description 7
- 230000033116 oxidation-reduction process Effects 0.000 claims description 7
- 239000013589 supplement Substances 0.000 claims description 7
- 239000000654 additive Substances 0.000 claims description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 6
- ZNBNBTIDJSKEAM-UHFFFAOYSA-N 4-[7-hydroxy-2-[5-[5-[6-hydroxy-6-(hydroxymethyl)-3,5-dimethyloxan-2-yl]-3-methyloxolan-2-yl]-5-methyloxolan-2-yl]-2,8-dimethyl-1,10-dioxaspiro[4.5]decan-9-yl]-2-methyl-3-propanoyloxypentanoic acid Chemical compound C1C(O)C(C)C(C(C)C(OC(=O)CC)C(C)C(O)=O)OC11OC(C)(C2OC(C)(CC2)C2C(CC(O2)C2C(CC(C)C(O)(CO)O2)C)C)CC1 ZNBNBTIDJSKEAM-UHFFFAOYSA-N 0.000 claims description 4
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 claims description 4
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 claims description 4
- 235000012538 ammonium bicarbonate Nutrition 0.000 claims description 4
- 235000012501 ammonium carbonate Nutrition 0.000 claims description 4
- 230000007423 decrease Effects 0.000 claims description 4
- 229910000378 hydroxylammonium sulfate Inorganic materials 0.000 claims description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 4
- 235000006408 oxalic acid Nutrition 0.000 claims description 4
- NWZSZGALRFJKBT-KNIFDHDWSA-N (2s)-2,6-diaminohexanoic acid;(2s)-2-hydroxybutanedioic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O.NCCCC[C@H](N)C(O)=O NWZSZGALRFJKBT-KNIFDHDWSA-N 0.000 claims description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical group OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 claims description 3
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine monohydrate Substances O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 claims description 3
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 2
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 claims description 2
- ZZZCUOFIHGPKAK-UHFFFAOYSA-N D-erythro-ascorbic acid Natural products OCC1OC(=O)C(O)=C1O ZZZCUOFIHGPKAK-UHFFFAOYSA-N 0.000 claims description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 claims description 2
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 claims description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 2
- 229930003268 Vitamin C Natural products 0.000 claims description 2
- 239000003513 alkali Substances 0.000 claims description 2
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 claims description 2
- 235000019253 formic acid Nutrition 0.000 claims description 2
- 239000008103 glucose Substances 0.000 claims description 2
- 235000001727 glucose Nutrition 0.000 claims description 2
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 claims description 2
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 claims description 2
- 239000011975 tartaric acid Substances 0.000 claims description 2
- 235000002906 tartaric acid Nutrition 0.000 claims description 2
- 235000019154 vitamin C Nutrition 0.000 claims description 2
- 239000011718 vitamin C Substances 0.000 claims description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-N sulfurothioic S-acid Chemical compound OS(O)(=O)=S DHCDFWKWKRSZHF-UHFFFAOYSA-N 0.000 claims 1
- 239000003792 electrolyte Substances 0.000 abstract description 24
- 230000000694 effects Effects 0.000 abstract description 13
- 238000001556 precipitation Methods 0.000 abstract description 5
- 230000001376 precipitating effect Effects 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 13
- 239000001301 oxygen Substances 0.000 description 13
- 229910052760 oxygen Inorganic materials 0.000 description 13
- 238000001514 detection method Methods 0.000 description 11
- ZURAKLKIKYCUJU-UHFFFAOYSA-N copper;azane Chemical compound N.[Cu+2] ZURAKLKIKYCUJU-UHFFFAOYSA-N 0.000 description 10
- -1 copper ammonium chloride Chemical compound 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 238000011084 recovery Methods 0.000 description 5
- 239000010802 sludge Substances 0.000 description 5
- 230000002378 acidificating effect Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 4
- 229910021645 metal ion Inorganic materials 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 230000008929 regeneration Effects 0.000 description 2
- 238000011069 regeneration method Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- DHCDFWKWKRSZHF-UHFFFAOYSA-L thiosulfate(2-) Chemical compound [O-]S([S-])(=O)=O DHCDFWKWKRSZHF-UHFFFAOYSA-L 0.000 description 2
- 239000012224 working solution Substances 0.000 description 2
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- XKMRRTOUMJRJIA-UHFFFAOYSA-N ammonia nh3 Chemical compound N.N XKMRRTOUMJRJIA-UHFFFAOYSA-N 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- BESJRHHIPGWPTC-UHFFFAOYSA-N azane;copper Chemical class N.[Cu] BESJRHHIPGWPTC-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 238000010668 complexation reaction Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- QKSIFUGZHOUETI-UHFFFAOYSA-N copper;azane Chemical compound N.N.N.N.[Cu+2] QKSIFUGZHOUETI-UHFFFAOYSA-N 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000003203 everyday effect Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000001755 vocal effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/46—Regeneration of etching compositions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
- C25C1/12—Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/06—Operating or servicing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- ing And Chemical Polishing (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Electrolytic Production Of Metals (AREA)
Abstract
Description
技术领域technical field
本发明属于蚀刻废液后处理技术领域,具体涉及一种碱性蚀刻废液电解回用的方法。The invention belongs to the technical field of post-treatment of etching waste liquid, and in particular relates to a method for electrolytic reuse of alkaline etching waste liquid.
背景技术Background technique
在现有的印刷线路板(PCB)制作过程中,蚀刻是重要的一步。蚀刻是指将覆铜箔基板上不需要的铜用蚀刻液以化学反应方式予以除去,使其形成所需要的电路图形。Etching is an important step in the existing printed circuit board (PCB) fabrication process. Etching refers to chemically removing unnecessary copper on the copper clad substrate with an etchant to form the desired circuit pattern.
目前线路板生产常用的蚀刻液有酸性氯化铜蚀刻液和碱性氯化铜铵蚀刻液(下面简称碱性蚀刻液)。碱性蚀刻液的主要成份为铜盐、氯化铵、氨水、水、可选的碳酸盐、及可选的添加剂;其中,碳酸盐通常采用碳酸铵以及碳酸氢铵。在实际的生产过程中,随着蚀刻的进行,碱性蚀刻液中的各成分会不断地被消耗。为了保持碱性蚀刻液的成分稳定,需要不断地添加蚀刻补充液和/或补投氨水,因而不可避免地导致蚀刻槽内的碱性蚀刻液不断增多而溢出槽外。所述的蚀刻补充液的主要成分为可选的添加剂,业界也称之为蚀刻子液。溢出蚀刻槽外的蚀刻液或已经使用过的蚀刻液一般都称之为蚀刻废液,所述碱性蚀刻废液的主要成分包括氯化铜铵、氯化亚铜铵、氯化铵、氨水,有的碱性蚀刻废液还会含有碳酸铵、碳酸氢铵、有机铵盐、有机胺等。At present, commonly used etching solutions for circuit board production include acidic copper chloride etching solution and alkaline copper ammonium chloride etching solution (hereinafter referred to as alkaline etching solution). The main components of the alkaline etching solution are copper salts, ammonium chloride, ammonia water, water, optional carbonates, and optional additives; among them, the carbonates are usually ammonium carbonate and ammonium bicarbonate. In the actual production process, as the etching progresses, the components in the alkaline etching solution will be continuously consumed. In order to keep the composition of the alkaline etching solution stable, it is necessary to continuously add etching replenishing liquid and/or supplementary ammonia water, which inevitably leads to the continuous increase of the alkaline etching solution in the etching tank and overflows out of the tank. The main components of the etching replenishing liquid are optional additives, which are also called etching sub-liquids in the industry. The etchant that overflows the etching tank or the etchant that has been used is generally called etching waste. The main components of the alkaline etching waste include cupric ammonium chloride, cuprous ammonium chloride, ammonium chloride, ammonia water , Some alkaline etching waste liquids also contain ammonium carbonate, ammonium bicarbonate, organic ammonium salts, organic amines, etc.
对于采用碱性蚀刻工序的线路板生产厂而言,该工序每日都会产生大量的含有高浓度铜离子的碱性蚀刻废液。目前业界除了将该废液外售给环保公司进行处理以外,也有部分厂商采用电解设备在工厂内对其进行电解取铜再生利用。现有技术中,碱性蚀刻废液的取铜再生利用方法主要包括有萃取电解结合法和直接电解法。其中,直接电解法的电化学反应式如下:For circuit board production plants that adopt an alkaline etching process, this process will produce a large amount of alkaline etching waste liquid containing high-concentration copper ions every day. At present, in addition to selling the waste liquid to environmental protection companies for treatment, some manufacturers also use electrolysis equipment to electrolyze it in the factory to extract copper for recycling. In the prior art, methods for extracting and reusing copper from alkaline etching waste liquid mainly include extraction electrolysis combining method and direct electrolysis method. Among them, the electrochemical reaction formula of the direct electrolysis method is as follows:
阳极:H2O–e-→2H++1/2O2 Anode: H 2 O–e - → 2H + +1/2O 2
阴极:Cu2++e-→Cu+ Cathode: Cu 2 ++e - → Cu +
Cu++e-→CuCu + +e - → Cu
而上述现有的直接电解工艺存在下述几个技术问题:And there are following several technical problems in above-mentioned existing direct electrolytic process:
第一,电解过程中阴极上电析出的固体金属铜会被电解液快速返蚀成铜离子回溶到电解液中,降低电析铜的收取效率,只有大概60~70%。这是由于:现有的直接电解工艺直接采用碱性蚀刻废液作为电解液,电解过程中随着铜氨络合物Cu(NH3)4Cl2和Cu(NH3)2Cl的络合结构被打破并转化成为金属铜、氯化铵和氨,电解液中氯化铵和氨的浓度越来越高,同时伴随着阳极上氧气的生成,导致溶液中的含氧量也逐渐增加。而蚀刻废液中的一价铜氨络合物可与溶于蚀刻废液中的氯化铵、氨以及氧气共同反应生成可与金属铜反应的二价铜氨络合物,对电解析出所得的金属铜进行返蚀。根据反应物浓度与反应速率成正比的原理,上述反应物的浓度越高,电解液中生成二价铜氨络合物的速度越快,对阴极上析出金属铜的返蚀效果越明显。所述二价铜氨络合物的再生以及返蚀铜的化学反应方程式如下:First, during the electrolysis process, the solid metal copper electro-deposited on the cathode will be quickly etched back by the electrolyte to form copper ions and dissolve back into the electrolyte, reducing the recovery efficiency of electro-deposited copper, which is only about 60-70%. This is because: the existing direct electrolysis process directly uses alkaline etching waste liquid as the electrolyte, and the copper ammonium complex Cu(NH 3 ) 4 Cl 2 and Cu(NH 3 ) 2 Cl are complexed during the electrolysis process. The structure is broken and transformed into metallic copper, ammonium chloride, and ammonia. The concentration of ammonium chloride and ammonia in the electrolyte is getting higher and higher, and at the same time, the oxygen content in the solution is gradually increasing with the generation of oxygen on the anode. The monovalent copper ammonium complex in the etching waste liquid can react with the ammonium chloride, ammonia and oxygen dissolved in the etching waste liquid to form a divalent copper ammonium complex that can react with metal copper, which is beneficial to electrolysis. The resulting metallic copper was etched back. According to the principle that the concentration of the reactant is proportional to the reaction rate, the higher the concentration of the above-mentioned reactant, the faster the formation of divalent copper ammonium complex in the electrolyte, and the more obvious the corrosion-back effect on the precipitation of metallic copper on the cathode. The regeneration of described divalent copper ammonium complex and the chemical reaction equation of back etching copper are as follows:
二价铜氨络合物再生反应:Regeneration reaction of divalent copper ammonium complex:
2Cu(NH3)2Cl+4NH4Cl+2NH3+1/2O2→2Cu(NH3)4Cl2+H2O2Cu(NH 3 ) 2 Cl+4NH 4 Cl+2NH 3 +1/2O 2 →2Cu(NH 3 ) 4 Cl 2 +H 2 O
返蚀反应:Cu+Cu(NH3)4Cl2→2Cu(NH3)2Cl;Etchback reaction: Cu+Cu(NH 3 ) 4 Cl 2 →2Cu(NH 3 ) 2 Cl;
总反应:Cu+2NH4Cl+2NH3+1/2O2→Cu(NH3)4Cl2+H2O。Total reaction: Cu+2NH 4 Cl+2NH 3 +1/2O 2 →Cu(NH 3 ) 4 Cl 2 +H 2 O.
第二,由于氨水本身容易挥发变为氨气逸出,而电解过程中电解液的铵离子受电场引力影响向阴极移动,导致铵离子在阴极附近聚集造成电解液局部氨浓度升高,再加上电解过程中电解液的温度较室温有所升高,更进一步促进氨的挥发消耗浪费原料。也因此,阳极附近的电解液容易出现氨水含量低的情况,致使阳极附近的电解液中没有足够的氨和铜离子进行络合反应,而难以形成可溶性的铜氨络合物,所以部分铜离子会以铜泥形式析出沉淀在电解槽底或者浆粘在阳极上,增大了电解池的电阻。在此情况下进行电解,会造成阴阳两极间所必需的电解电压增大,浪费电能。Second, because the ammonia water itself is easy to volatilize and become ammonia gas to escape, and the ammonium ions in the electrolyte move to the cathode under the influence of the electric field gravity during the electrolysis process, resulting in the accumulation of ammonium ions near the cathode and causing the local ammonia concentration of the electrolyte to increase. During the electrolysis process, the temperature of the electrolyte is higher than the room temperature, which further promotes the volatilization of ammonia and wastes raw materials. Therefore, the electrolyte near the anode is prone to low ammonia water content, so that there is not enough ammonia and copper ions in the electrolyte near the anode for complexation reaction, and it is difficult to form a soluble copper ammonium complex, so some copper ions It will precipitate in the form of copper sludge and settle on the bottom of the electrolytic cell or the slurry will stick to the anode, which increases the resistance of the electrolytic cell. In this case, electrolysis will cause the necessary electrolysis voltage between the cathode and anode to increase, wasting electric energy.
第三,电解过后的电解液返回碱性蚀刻生产线上使用会影响蚀刻质量:由于现有的直接电解法为了适应大规模生产而通常采用大电流进行电解取铜,而阴极上析出的金属铜返蚀较严重的情况会导致电解析出的铜面非常不平整,加剧了尖峰电流效应,使得电流不稳定,进而导致析结出的金属铜层粗糙松散容易脱落。Third, the return of the electrolyte after electrolysis to the alkaline etching production line will affect the etching quality: because the existing direct electrolysis method usually uses a large current to electrolyze copper in order to adapt to large-scale production, and the metal copper deposited on the cathode returns In the case of severe corrosion, the electrolytic copper surface will be very uneven, which will intensify the peak current effect and make the current unstable, which will lead to the rough and loose metal copper layer deposited and easy to fall off.
第四,现有技术为解决析结出的金属铜层粗糙松散容易脱落的问题,是在电解过程中向电解液加入平整剂以使电解阴极上电析出更为光洁的铜皮或铜板。平整剂的作用原理是利用其能阻滞溶液中金属离子放电的特性,在被堵表面与溶液界面上形成吸附层,从而提高阴极极化作用,使得金属离子得以在电流密度较低的地方沉积,因此工件表面凹处可以整平。然而电解过后的电解液因此含有平整剂,由于在蚀刻的过程中平整剂会对蚀刻工作液中的金属离子有吸附作用,阻碍蚀刻反应的进行,所以会导致蚀刻速度变慢;因此,若返回碱性蚀刻生产线上使用会导致蚀刻速度变慢,影响蚀刻生产质量。Fourth, in the prior art, in order to solve the problem that the precipitated metal copper layer is rough, loose and easy to fall off, a leveling agent is added to the electrolyte during the electrolysis process to electrolytically deposit a smoother copper skin or copper plate on the electrolysis cathode. The action principle of the leveling agent is to use its ability to block the discharge of metal ions in the solution to form an adsorption layer on the interface between the blocked surface and the solution, thereby improving the cathodic polarization and allowing metal ions to deposit at places with lower current densities. , so the concave surface of the workpiece can be leveled. However, the electrolytic solution after electrolysis contains a leveling agent. During the etching process, the leveling agent will adsorb the metal ions in the etching working solution and hinder the etching reaction, so the etching speed will be slowed down; therefore, if returning The use of alkaline etching production line will cause the etching speed to slow down and affect the quality of etching production.
所以,现有的碱性蚀刻废液直接电解法的应用目前仍难以普及推广,也没有企业采用直接电解法来再生所述的碱性蚀刻液。Therefore, the application of the existing direct electrolysis method of alkaline etching waste liquid is still difficult to popularize and promote, and no enterprise adopts the direct electrolysis method to regenerate the alkaline etching liquid.
发明内容Contents of the invention
本发明的目的在于提供一种碱性蚀刻废液电解回用的方法,该方法能提高电解析出铜的效率,且废液经电解回用后可以配制成能保持理想的蚀刻效果的再生碱性蚀刻子液。The purpose of the present invention is to provide a method for electrolytic reuse of alkaline etching waste liquid, which can improve the efficiency of electrolytically separating copper, and the waste liquid can be prepared into regenerated alkali that can maintain an ideal etching effect after electrolytic reuse Sexual etching sub-liquid.
本发明的目的通过如下技术方案来实现:The purpose of the present invention is achieved through the following technical solutions:
一种碱性蚀刻废液电解回用的方法,包括使用由电解槽、电解电源、电解阳极和电解阴极组成的电解池,所述的电解槽通过分隔物分隔为阳极区和阴极区,包括以下步骤:A method for electrolytic reuse of alkaline etching waste liquid, comprising using an electrolytic cell composed of an electrolytic cell, an electrolytic power supply, an electrolytic anode and an electrolytic cathode, wherein the electrolytic cell is divided into an anode area and a cathode area by a separator, including the following step:
(1)将碱性蚀刻废液/或碱性蚀刻废液与还原剂的混合液作为阳极电解液,加入所述的阳极区中;将碱性蚀刻废液与还原剂的混合液作为阴极电解液,加入所述的阴极区中;(1) The mixed solution of alkaline etching waste liquid/or alkaline etching waste liquid and reducing agent is used as anolyte, and added in the anode area; the mixed solution of alkaline etching waste liquid and reducing agent is used as catholyte Liquid, added in the cathode area;
(2)启动所述的电解电源进行电解作业,在所述的电解阴极上析出金属铜;(2) Start the electrolysis power supply to carry out the electrolysis operation, and deposit metallic copper on the electrolysis cathode;
(3)按照具体的碱性蚀刻工艺,向步骤(2)电解作业过后的阳极液和/或阴极液中加入氯化铵、氨、水和其他碱性蚀刻液所含成分中的一种或多种,配制成可重新利用于碱性蚀刻生产线上的再生碱性蚀刻子液;(3) According to the specific alkaline etching process, add one or more of ammonium chloride, ammonia, water and other alkaline etching solutions to the anolyte and/or catholyte after the electrolytic operation in step (2) Various, formulated as a regenerated alkaline etching sub-liquid that can be reused in the alkaline etching production line;
所述的碱性蚀刻废液为铜离子浓度为20~200g/L、pH值为7~10.3的碱性蚀刻废液。The alkaline etching waste liquid is an alkaline etching waste liquid with a copper ion concentration of 20-200 g/L and a pH value of 7-10.3.
所述的阳极电解液经电解作业而在阳极区形成的液体即为阳极液,所述的阴极电解液经电解作业而在阴极区形成的液体即为阴极液。即所述的阳极液和阴极液分别为阳极电解液和阴极电解液在电解过程中成分发生了化学反应变化后形成的电解液。The liquid formed in the anode area through the electrolysis of the anolyte is the anolyte, and the liquid formed in the cathode area through the electrolysis of the catholyte is the catholyte. That is to say, the anolyte and catholyte are the electrolytic solutions formed after the components of the anolyte and catholyte undergo chemical reaction changes during the electrolysis process.
经发明人实验发现,采用还原剂与碱性蚀刻废液混合配制电解液,所述的还原剂可与氧化剂(氧气)发生氧化还原反应,从而有效地将电解液中的氧气消耗掉。随着氧气浓度的减小,电解液中的二价铜氨络合物的生成速度也随之降低,进而减少阴极上析出金属铜被溶蚀的情况,达到提高金属铜的回收率的目的。The inventors have found through experiments that the reducing agent is mixed with the alkaline etching waste solution to prepare the electrolyte, and the reducing agent can undergo a redox reaction with the oxidizing agent (oxygen), thereby effectively consuming the oxygen in the electrolyte. As the oxygen concentration decreases, the formation rate of divalent copper ammonium complex in the electrolyte also decreases, thereby reducing the corrosion of metal copper precipitated on the cathode, and achieving the purpose of improving the recovery rate of metal copper.
所述阴极电解液中还原剂的质量百分比含量为0.01~15%,优选为0.01~13%,更优选为1~13%;若所述的阳极电解液为碱性蚀刻废液与还原剂的混合液时,其中还原剂的质量百分比同样为0.01~15%,优选为0.01~13%,更优选为1~13%。The mass percent content of the reducing agent in the catholyte is 0.01 to 15%, preferably 0.01 to 13%, more preferably 1 to 13%; if the anolyte is a mixture of alkaline etching waste liquid and reducing agent In the mixed solution, the mass percentage of the reducing agent is also 0.01-15%, preferably 0.01-13%, more preferably 1-13%.
经过多次反复试验证明,在电解槽阴极区的阴极电解液中还原剂的含量为0.01~15%时能较好地改善减轻所述电解阴极上电解析出的金属铜被返蚀的情况;同时,当电解槽阳极区的阳极电解液中含有还原剂时,其含量不宜大于15%:当所述阴极电解液的还原剂含量小于0.01%时,减轻阴极上电析金属铜被返蚀的效果不明显;而当所述阳极电解液和/或阴极电解液的还原剂含量大于15%时,电解完成后的阳极液和/或阴极液通常还剩余有较多的还原剂,配制成再生碱性蚀刻子液并回用到碱性蚀刻生产线上时会降低碱性蚀刻工作液的生产蚀刻速度。It has been proved through repeated experiments that when the content of the reducing agent in the catholyte in the cathode area of the electrolytic cell is 0.01 to 15%, it can better improve and alleviate the situation that the metal copper electrolytically separated on the electrolytic cathode is corroded back; Simultaneously, when the anolyte in the anode area of the electrolytic cell contains a reducing agent, its content should not be greater than 15%: when the reducing agent content of the catholyte is less than 0.01%, the electrolytic metal copper on the cathode is less likely to be corroded back The effect is not obvious; and when the reducing agent content of the anolyte and/or catholyte is greater than 15%, the anolyte and/or catholyte after electrolysis usually still have more reducing agent, which is formulated to regenerate When the alkaline etching sub-liquid is reused on the alkaline etching production line, the production etching rate of the alkaline etching working solution will be reduced.
所述的还原剂为能与水溶液中的氧气进行反应从而消耗氧气的还原性物质,包括但不限于亚硫酸盐、硫代硫酸盐、硫酸羟胺、盐酸羟胺、水合肼、草酸和草酸盐、甲酸和甲酸盐、柠檬酸和柠檬酸盐、葡萄糖、维生素C、酒石酸、亚磷酸盐和次亚磷酸盐中的一种或多种,当上述多种还原剂之间混合时互相之间没有比例限制。The reducing agent is a reducing substance that can react with oxygen in an aqueous solution to consume oxygen, including but not limited to sulfite, thiosulfate, hydroxylamine sulfate, hydroxylamine hydrochloride, hydrazine hydrate, oxalic acid and oxalate, One or more of formic acid and formate, citric acid and citrate, glucose, vitamin C, tartaric acid, phosphite and hypophosphite, when the above-mentioned reducing agents are mixed, there is no mutual Scale limit.
优选地,所述的还原剂为亚硫酸盐、硫代硫酸盐、硫酸羟胺、盐酸羟胺、水合肼、草酸和草酸盐中的一种或多种,当上述多种还原剂之间混合时互相之间没有比例限制。Preferably, the reducing agent is one or more of sulfite, thiosulfate, hydroxylamine sulfate, hydroxylamine hydrochloride, hydrazine hydrate, oxalic acid and oxalate, when the above-mentioned reducing agents are mixed There is no ratio limit to each other.
更优选地,所述的还原剂为酸性还原剂,以通过络合消耗电解液中的游离氨来减少氨气从电解液中挥发逸出,所述的酸性还原剂包括盐酸羟胺、硫酸羟胺、草酸中的至少一种,当上述多种还原剂之间混合时互相之间没有比例限制。More preferably, the reducing agent is an acidic reducing agent to reduce the volatilization of ammonia from the electrolyte by complexing and consuming free ammonia in the electrolyte. The acidic reducing agent includes hydroxylamine hydrochloride, hydroxylamine sulfate, At least one of the oxalic acid, when the above-mentioned multiple reducing agents are mixed, there is no ratio limitation among them.
此外,由于采用本发明的方法后,电解阴极上金属铜被返蚀的情况减少,使得所析出的金属铜层结构更为致密,故尖峰电流效应小,因而无需在电解过程中添加平整剂。因此,将经过电解处理后配制的再生碱性蚀刻子液返回到碱性蚀刻生产线上使用时不会对蚀刻速度和质量造成影响。再加上本发明采用所述的分隔物将所述电解槽分隔为阳极区和阴极区,能进一步减少甚至避免电解阳极上产生的氧气靠近电解阴极,使得在所述电解阴极附近生成二价铜氨络合物的情况大大减少,从而减轻对所述电解阴极上电解析出的金属铜的返蚀。In addition, after adopting the method of the present invention, the metal copper on the electrolytic cathode is less etched back, making the precipitated metal copper layer structure more compact, so the peak current effect is small, so there is no need to add a leveling agent during the electrolysis process. Therefore, when the regenerated alkaline etching sub-liquid prepared after the electrolytic treatment is returned to the alkaline etching production line for use, the etching speed and quality will not be affected. In addition, the present invention uses the separator to divide the electrolytic cell into an anode area and a cathode area, which can further reduce or even prevent the oxygen generated on the electrolysis anode from being close to the electrolysis cathode, so that divalent copper is generated near the electrolysis cathode The occurrence of ammonia complexes is greatly reduced, thereby alleviating the corrosion back to the electrolytically separated metallic copper on the electrolytic cathode.
本发明所述的分隔物可以采用滤布、陶瓷滤板、PE滤板、电解隔膜等能够有效防止所述电解阳极上生成的氧气靠近电解阴极但允许部分/或全部离子在两极间迁移的材料,从而将所述的电解槽分隔成阳极区和阴极区。The separator of the present invention can use materials such as filter cloth, ceramic filter plate, PE filter plate, electrolytic diaphragm, etc. that can effectively prevent the oxygen generated on the electrolytic anode from approaching the electrolytic cathode but allow some/or all ions to migrate between the two electrodes , thereby separating the electrolytic cell into an anode area and a cathode area.
根据生产设备参数以及蚀刻要求的不同,碱性蚀刻液各成分的设计配比也有所不同。此外,即使经过电解作业后,所述再生碱性蚀刻子液仍可能含有部分铜离子,但在配制成再生碱性蚀刻子液并回用于生产线上时,并不会对蚀刻作业产生负面影响。因此,步骤(3)中所述再生碱性蚀刻子液中除了铜离子以外的其他成分及其浓度,均按照一般的蚀刻子液的氨氮、氯离子等成分及其浓度进行调整即可。According to different production equipment parameters and etching requirements, the design ratio of the components of the alkaline etching solution is also different. In addition, even after the electrolysis operation, the regenerated alkaline etching sub-liquid may still contain some copper ions, but when it is formulated into a regenerated alkaline etching sub-liquid and reused on the production line, it will not have a negative impact on the etching operation . Therefore, the other components and their concentrations in the regenerated alkaline etching sub-liquid except copper ions in step (3) can be adjusted according to the components and concentrations of ammonia nitrogen and chloride ions in general etching sub-liquids.
优选地,所述的电解槽采用密封式电解槽,并对气体进行抽排,从而将所述电解阳极上生成的氧气及时排出电解槽外,以减少溶解于阳极液中的氧气含量。Preferably, the electrolytic cell adopts a sealed electrolytic cell, and the gas is pumped, so that the oxygen generated on the electrolytic anode is discharged out of the electrolytic cell in time, so as to reduce the oxygen content dissolved in the anolyte.
在本发明进行电解作业的过程中,可以向所述的阳极区中补充所述的阳极电解液和/或碱性蚀刻废液和/或还原剂和/或所述的阴极液,并向所述的阴极区中补充所述的阴极电解液和/或碱性蚀刻废液和/或还原剂,即直接补充所述的阴极电解液或将所述阴极电解液中的各成分进行分别的补充,从而稳定阳极电解液和/或阴极电解液的成分并保持较高的电解效率。In the process of carrying out electrolysis operation in the present invention, can supplement described anolyte and/or alkaline etching waste liquid and/or reducing agent and/or described catholyte in described anode zone, and Replenish the catholyte and/or alkaline etching waste solution and/or reducing agent in the cathode area, that is, directly replenish the catholyte or supplement the components in the catholyte separately , thereby stabilizing the composition of the anolyte and/or catholyte and maintaining high electrolysis efficiency.
当采用向所述阳极区补充阳极电解液和/或碱性蚀刻废液和/或还原剂,和/或向所述阴极区补充阴极电解液和/或碱性蚀刻废液和/或还原剂时,可在电解过程中根据时间设定和/或所述的阳极液和/或所述的阴极液的氧化还原电位、pH值、比重值、比色值、液位的实时参数,通过人工或者自动投料控制器来进行添加,以使阳极区和阴极区中的铜离子浓度和氨浓度得以稳定,或将其控制在预设的工艺参数值上,以减少所述电解阴极上析出的铜金属被返蚀和污染的情况发生。此外,电解过程中向所述的阳极区补充含有碱性蚀刻废液的阳极电解液,还能提升阳极电解液中的氨含量,以防止阳极液中有铜泥沉淀析出。When adopting to supplement anolyte and/or alkaline etching waste solution and/or reducing agent to described anode zone, and/or supplement catholyte and/or alkaline etching waste solution and/or reducing agent to described cathode zone During electrolysis, it can be set according to the time and/or the real-time parameters of redox potential, pH value, specific gravity value, colorimetric value and liquid level of the anolyte and/or the catholyte, through artificial Or the automatic feeding controller is added, so that the concentration of copper ions and the concentration of ammonia in the anode area and the cathode area are stabilized, or it is controlled on the preset process parameter value, to reduce the copper precipitated on the electrolytic cathode Metals are etched back and contaminated. In addition, during the electrolysis process, the anolyte containing alkaline etching waste liquid is added to the anode area, and the ammonia content in the anolyte can also be increased to prevent the precipitation of copper sludge in the anolyte.
当采用电解过程中向所述的阳极区补充阴极液时,可在所述的阴极区设置溢流口,且所述溢流口不低于所述阳极区中的预设液位,从而使得向所述阴极区补充阴极电解液和/或碱性蚀刻废液和/或还原剂时,若所述阴极区的实际液位超过预设液位,则超过预设液位的部分会通过所述的溢流口从所述的阴极区溢流至阳极区中,从而实现自动将阴极液添加至所述的阳极区中。When the catholyte is replenished to the anode area in the electrolysis process, an overflow port can be set in the cathode area, and the overflow port is not lower than the preset liquid level in the anode area, so that When replenishing catholyte and/or alkaline etching waste liquid and/or reducing agent to the cathode area, if the actual liquid level of the cathode area exceeds the preset liquid level, the part exceeding the preset liquid level will pass through the The overflow port overflows from the cathode area to the anode area, thereby automatically adding catholyte to the anode area.
优选地,所述的溢流口设置高于所述阳极区中的液面高度。尤其是当所述的分隔物允许阳离子通过时,所述的阳极液中的铵离子受电场力影响会向所述的电解阴极迁移;同时所述阴极液中的铜氨络合物通过电化学反应将铜离子还原为金属铜并释放出铵离子,从而导致其氨含量较所述的阳极液中更高,将富含氨的阴极液加入到所述的阳极区中,既能补充所述阳极液中的铵离子含量,从而避免所述的电解阳极上出现铜泥析结,又能使所述阳极液和阴极液互相之间压力达到平衡。Preferably, the overflow port is set higher than the liquid level in the anode region. Especially when the separator allows cations to pass through, the ammonium ions in the anolyte will migrate to the electrolytic cathode under the influence of the electric field force; at the same time, the copper ammonium complex in the catholyte is electrochemically The reaction reduces copper ions to metallic copper and releases ammonium ions, resulting in a higher ammonia content than in the anolyte. Adding ammonia-rich catholyte to the anode zone can supplement the The content of ammonium ions in the anolyte can avoid copper sludge precipitation on the electrolytic anode, and the pressure between the anolyte and catholyte can be balanced.
还可将所述的阳极区和阴极区通过带有可控泵浦的管道进行连接,根据预设时间和/或所述阳极液的比重值、pH值、氧化还原电位等一个或多个参数,通过自动投料控制器来控制将所述的阴极液加投到所述的阳极区中。The anode area and the cathode area can also be connected through a pipeline with a controllable pump, according to one or more parameters such as the preset time and/or the specific gravity value, pH value, and oxidation-reduction potential of the anolyte , the catholyte is fed into the anode area under the control of an automatic feeding controller.
优选地,当所述的分隔物允许阳离子通过时,所述的电解电源采用双脉冲式电源。电解过程中,所述阳极液中的铵离子会随电场引力穿过所述分隔物进入所述的阴极区,容易造成所述阳极区中出现因缺氨而析出铜泥的现象。而采用双脉冲式电源能够在反极相时将所述阴极区中的铵离子反向引回至阳极区中,从而有效避免所述电解阳极上因缺少氨而导致有铜泥析出和电解阴极上析出的金属铜因阴极液中有大量氨而被快速返蚀的问题。Preferably, when the separator allows positive ions to pass through, the electrolysis power supply adopts a double-pulse power supply. During the electrolysis process, the ammonium ions in the anolyte will pass through the separator and enter the cathode area with the attraction of the electric field, which will easily cause copper sludge to precipitate in the anode area due to lack of ammonia. However, the use of double-pulse power supply can reversely lead the ammonium ions in the cathode region back to the anode region when the polarity is reversed, thereby effectively avoiding the precipitation of copper sludge and the electrolysis cathode on the electrolysis anode due to the lack of ammonia. The metal copper precipitated on the surface is quickly corroded due to a large amount of ammonia in the catholyte.
优选地,保持所述阴极区中的液位高于所述阳极区中的液位,从而实现所述阳极区、阴极区之间溶液的比重平衡。由于电解槽被分隔为阳极区和阴极区,若所述的分隔物能允许阳离子通过,则电解过程中受电场引力影响,阳极区中的铵离子会不断地通过分隔物进入阴极区,从而导致所述阳极液与阴极液的比重差越来越大,进而使得所述的分隔物因两边溶液的比重差造成的压力差过大而导致形变损坏。保持所述阴极区中的液位高于所述阳极区中的液位,能有效平衡所述分隔物两边所受的压力,减轻分隔物变形损坏和所述阳极区和阴极区之间的液体渗透。Preferably, the liquid level in the cathode region is kept higher than the liquid level in the anode region, so as to realize the specific gravity balance of the solution between the anode region and the cathode region. Since the electrolytic cell is divided into an anode area and a cathode area, if the separator can allow cations to pass through, the ammonium ions in the anode area will continuously enter the cathode area through the separator under the influence of the electric field attraction during the electrolysis process, resulting in The specific gravity difference between the anolyte and the catholyte is increasing, which in turn causes the separator to be deformed and damaged due to the excessive pressure difference caused by the specific gravity difference between the solutions on both sides. Keeping the liquid level in the cathode region higher than the liquid level in the anode region can effectively balance the pressure on both sides of the separator, reduce the deformation and damage of the separator and the liquid between the anode region and the cathode region penetration.
所述的步骤(2)进行完毕后,可先进行固液分离,然后再进行步骤(3)。After the step (2) is completed, solid-liquid separation can be carried out first, and then step (3) can be carried out.
本发明可以进一步作以下改进:在所述步骤(2)进行电解作业前和/或电解过程中通过人工和/或自动化设备向阳极区中加投氨源,所述的氨源为液氨和/或氨水和/或碳酸铵和/或碳酸氢铵。如此能有效地保证所述阳极液中含有足够的氨能与铜离子发生络合,形成可溶性的铜氨络合物,避免所述的电解阳极上粘结由如碱式氯化铜、氢氧化铜和氯化铜铵等组成的铜泥结块,而影响电解效率。优选地,在电解作业前和/或电解过程中加投氨源的量,使所述阳极区中的阳极电解液和/或阳极液的pH值不低于6。The present invention can be further improved as follows: add an ammonia source to the anode area by manual and/or automated equipment before the electrolysis operation and/or during the electrolysis process in the step (2), and the ammonia source is liquid ammonia and /or ammonia and/or ammonium carbonate and/or ammonium bicarbonate. This can effectively ensure that the anolyte contains enough ammonia to complex with copper ions to form a soluble copper-ammonia complex, so as to avoid bonding on the electrolytic anode by such as basic copper chloride, hydroxide Copper slime composed of copper and cupric ammonium chloride agglomerates, which affects the electrolysis efficiency. Preferably, the amount of the ammonia source is added before and/or during the electrolysis, so that the pH value of the anolyte and/or the anolyte in the anode zone is not lower than 6.
与现有技术相比,本发明具有以下有益效果:Compared with the prior art, the present invention has the following beneficial effects:
1.本发明相比于现有技术中采用直接电解法对碱性蚀刻废液进行回收处理的工艺方法相比,能降低所述废液在电解过程中阴极区二价铜氨络合物的生成速度,通过控制电解液中对金属铜具有反蚀效果的氧气和二价铜氨络合物的浓度,达到明显提高金属铜电解析出回收效率的效果,所述回收率均能达到90%或以上;1. The present invention is compared with the processing method that adopts direct electrolysis method to recycle alkaline etching waste liquid in the prior art, can reduce described waste liquid in the electrolysis process the divalent cupric ammonium complex of cathodic region Generation speed, by controlling the concentration of oxygen and divalent copper ammonia complexes in the electrolyte that have anti-corrosion effects on metal copper, the effect of significantly improving the recovery efficiency of metal copper electrolysis can be achieved, and the recovery rate can reach 90%. or above;
2.本发明对电解析出的铜的反蚀较小,故无需在电解液中加入平整剂就可以获得致密的铜层,使得所述废液经本发明电解过后生成的阳极液和/或者阴极液可以配制成能保持理想的蚀刻效果的再生碱性蚀刻液,回用于碱性蚀刻生产线上,从而解决了现有技术因为平整剂的缓蚀效果而影响再生蚀刻子液的蚀刻质量,导致无法再生碱性蚀刻液的问题,实现碱性蚀刻废液的高效回收再利用,同时,也大大减少了碱性蚀刻废液排放造成的对环境的污染;2. The present invention has less anti-corrosion to electrolytically separated copper, so a dense copper layer can be obtained without adding a leveling agent in the electrolyte, so that the anolyte and/or anolyte generated after the waste liquid is electrolyzed by the present invention The catholyte can be formulated into a regenerated alkaline etchant that can maintain an ideal etching effect, and can be reused in an alkaline etch production line, thus solving the problem of affecting the etching quality of the regenerated etchant in the prior art due to the corrosion inhibition effect of the leveler. It leads to the problem that the alkaline etching solution cannot be regenerated, realizes the efficient recycling and reuse of the alkaline etching waste solution, and at the same time greatly reduces the pollution to the environment caused by the discharge of the alkaline etching waste solution;
3.当本发明采用酸性还原剂时,能减少氨气的逸出量,改善氨的污染,改善生产环境;若所述的分隔物允许阳离子通过,且在电解作业过程中向所述的阳极区补充阴极液时,同样能减少氨气的逸出;3. When the present invention adopts an acidic reductant, it can reduce the escape of ammonia, improve the pollution of ammonia, and improve the production environment; When replenishing the catholyte in the area, it can also reduce the escape of ammonia gas;
4.本发明采用向阳极电解液中补充碱性蚀刻废液和/或氨源和/或阴极液时,或者采用双脉冲式电源时,均能有效抑制阳极区中析出铜泥的现象,达到降低电解能耗的效果;4. When the present invention adopts to replenish alkaline etching waste liquid and/or ammonia source and/or catholyte in the anolyte, or when adopting double-pulse power supply, all can effectively restrain the phenomenon that copper slime is separated out in the anode area, reach The effect of reducing the energy consumption of electrolysis;
5.本发明对电解析出的铜的反蚀较小,因此,在无需使用平整剂的情况下,电解阴极上析出的铜层也相比于现有技术析出的铜层而言更为致密,一方面使得铜面暴露在空气中的表面积越小,越便于保存和运输;5. The present invention has less anti-corrosion to electrolytic copper, therefore, without using a leveler, the copper layer deposited on the electrolytic cathode is denser than the copper layer deposited in the prior art , on the one hand, the smaller the surface area of the copper surface exposed to the air, the easier it is to store and transport;
具体实施方式Detailed ways
以下通过具体实施方式对本发明作进一步的说明。The present invention will be further described below through specific embodiments.
本发明所述的实施例中,所使用的氨水优选为市售的浓度为20%或25%氨水溶液,所使用的液氨选用市售规格40L的带减压阀瓶装液氨产品;使用的蚀刻生产线优选为科杰PCB设备厂生产的蚀刻生产线,在进行蚀刻作业时,蚀刻缸的温度设定为49℃,蚀刻机的蚀刻液喷嘴压力设定为1kg/cm2;除上述列举的之外,本领域技术人员根据常规选择,也可以选择其它具有与本发明列举的上述产品具有相似性能的产品,均可以实现本发明的目的。In the embodiments of the present invention, the ammonia water used is preferably a commercially available concentration of 20% or 25% ammonia solution, and the liquid ammonia used is selected from the commercially available specification 40L bottled liquid ammonia product with a pressure relief valve; The etching production line is preferably the etching production line produced by Kejie PCB Equipment Factory. During the etching operation, the temperature of the etching cylinder is set to 49°C, and the pressure of the etching liquid nozzle of the etching machine is set to 1kg/cm 2 ; except for the ones listed above In addition, those skilled in the art can also choose other products with similar properties to the above-mentioned products listed in the present invention according to conventional selection, all of which can achieve the purpose of the present invention.
所提及的检测铜离子浓度为本领域所公知的技术。The mentioned detection of copper ion concentration is a technique well known in the art.
所述的碱性蚀刻废液的主要成分均为氨水、氯化铵和铜氨络合物。The main components of the alkaline etching waste liquid are ammonia water, ammonium chloride and copper ammonium complexes.
蚀刻效果的测试:取大小为500×300mm×1.5mm的纯铜蚀刻速率测试板放入蚀刻缸中进行喷淋腐蚀,以测试蚀刻速率;使用大小为620×540mm、铜厚为1oz、显影线宽线距为50.8μm的双面线路板进行喷淋腐蚀,以测试蚀刻因子和电解循环回收再生工艺系统的稳定性。使用本行业所公知的方法(《印刷电路技术》,李学明,工业和信息化部电子行业职业技能鉴定指导中心,第五版,p387-389;《金属腐蚀理论及应用》,魏宝明,化工工业出版社,p5-7;《浅谈蚀刻因子的计算方法》,田玲等,印刷电路信息2007No.12,p55-56)计算蚀刻速率、蚀刻因子K与电解电流效率。 Etching effect test : Take a pure copper etching rate test plate with a size of 500×300mm×1.5mm and put it into an etching cylinder for spray corrosion to test the etching rate; use a size of 620×540mm, a copper thickness of 1oz, and a developing line The double-sided circuit board with a wide line spacing of 50.8 μm was spray-etched to test the etching factor and the stability of the electrolytic recycling process system. Use methods known in this industry ("Printed Circuit Technology", Li Xueming, Ministry of Industry and Information Technology, Electronic Industry Vocational Skills Appraisal and Guidance Center, Fifth Edition, p387-389; "Metal Corrosion Theory and Application", Wei Baoming, Chemical Industry Publishing Society, p5-7; "On the Calculation Method of Etching Factor", Tian Ling et al., Printed Circuit Information 2007No.12, p55-56) to calculate the etching rate, etching factor K and electrolytic current efficiency.
实施例1Example 1
(1)使用由电解槽、电解电源、电解阳极和电解阴极组成的电解池,用陶瓷滤板和滤布的叠合将电解槽分隔为阳极区和阴极区;(1) Use an electrolytic cell composed of an electrolytic cell, an electrolytic power supply, an electrolytic anode and an electrolytic cathode, and separate the electrolytic cell into an anode area and a cathode area by superimposing a ceramic filter plate and a filter cloth;
根据下表-1的成分和配比配制阳极电解液和阴极电解液,并将阳极电解液和阴极电解液分别加入到阳极区和阴极区当中;Prepare the anolyte and catholyte according to the composition and ratio of the following table-1, and add the anolyte and catholyte to the anode area and the cathode area respectively;
(2)启动所述的电解电源进行电解作业,在所述的电解阴极上析出金属铜;(2) Start the electrolysis power supply to carry out the electrolysis operation, and deposit metallic copper on the electrolysis cathode;
(3)电解作业经过2h后,将阳极液、阴极液混合,并按重量比加入5%的水,然后使用液氨调至pH=11,从而形成再生碱性蚀刻子液,并循环使用于蚀刻生产线上。(3) After 2 hours of electrolysis, mix the anolyte and catholyte, add 5% water by weight, and then use liquid ammonia to adjust the pH to 11 to form a regenerated alkaline etching sub-liquid, which is recycled for use in Etching production line.
实施例2Example 2
(1)使用由密封电解槽、电解电源、电解阳极和电解阴极组成的电解池,用PE滤板将电解槽分隔为阳极区和阴极区;(1) Use an electrolytic cell consisting of a sealed electrolytic cell, an electrolytic power supply, an electrolytic anode and an electrolytic cathode, and use a PE filter plate to separate the electrolytic cell into an anode area and a cathode area;
根据下表-1的成分和配比配制阳极电解液和阴极电解液,并将阳极电解液和阴极电解液分别加入到阳极区和阴极区当中;Prepare the anolyte and catholyte according to the composition and ratio of the following table-1, and add the anolyte and catholyte to the anode area and the cathode area respectively;
(2)启动所述的电解电源进行电解作业,同时对电解槽内产生的气体进行抽排,在所述的电解阴极上析出金属铜,并每隔半小时通过人工分别向阳极区和阴极区补充体积为预设液位5%的阳极电解液和阴极电解液;(2) Start the electrolysis power supply to carry out the electrolysis operation, and at the same time, the gas generated in the electrolytic cell is pumped out, and metal copper is deposited on the electrolysis cathode, and is manually transferred to the anode area and the cathode area every half an hour. Supplementary volume of anolyte and catholyte with a volume of 5% of the preset liquid level;
(3)电解作业经过2h后,将阳极液、阴极液混合并进行固液分离,然后使用液氨调至pH=11,从而形成再生碱性蚀刻子液,并循环使用于蚀刻生产线上。(3) After 2 hours of electrolysis, the anolyte and catholyte were mixed for solid-liquid separation, and then adjusted to pH = 11 with liquid ammonia to form a regenerated alkaline etching sub-liquid, which was recycled for use in the etching production line.
实施例3Example 3
(1)使用由密封电解槽、电解电源、电解阳极和电解阴极组成的电解池,用阴离子膜将电解槽分隔为阳极区和阴极区;(1) Use an electrolytic cell consisting of a sealed electrolytic cell, an electrolytic power supply, an electrolytic anode and an electrolytic cathode, and use an anion membrane to separate the electrolytic cell into an anode area and a cathode area;
根据下表-1的成分和配比配制阳极电解液和阴极电解液,并将阳极电解液和阴极电解液分别加入到阳极区和阴极区当中;Prepare the anolyte and catholyte according to the composition and ratio of the following table-1, and add the anolyte and catholyte to the anode area and the cathode area respectively;
(2)启动所述的电解电源进行电解作业,同时对电解槽内产生的气体进行抽排,在所述的电解阴极上析出金属铜,并根据阳极区中阳极液的实时pH值由自动检测投控机向阳极区中补充碱性蚀刻废液,根据阳极液的实时氧化还原电位由自动检测投控机向阳极区中加投还原剂,根据阴极液的实时比色值由自动检测投控机向阴极区补充碱性蚀刻液,再根据阴极液的实时氧化还原电位由自动检测投控机向阴极区中加入还原剂,从阳极区溢出的阳极液直接回用到蚀刻生产线上;(2) Start the electrolysis power supply to carry out the electrolysis operation, and at the same time, the gas generated in the electrolytic cell is pumped out, and metallic copper is precipitated on the electrolysis cathode, and is automatically detected according to the real-time pH value of the anolyte in the anode area The input and control machine replenishes alkaline etching waste liquid to the anode area, and the automatic detection input and control machine adds reducing agent to the anode area according to the real-time oxidation-reduction potential of the anolyte, and the automatic detection input and control is based on the real-time colorimetric value of the catholyte. The machine supplies alkaline etching solution to the cathode area, and then adds reducing agent to the cathode area by the automatic detection and control machine according to the real-time oxidation-reduction potential of the catholyte, and the anolyte overflowing from the anode area is directly reused on the etching production line;
(3)电解作业经过2h后,对阴极液使用液氨调至pH=11.5,从而形成再生碱性蚀刻子液,并循环使用于蚀刻生产线上。(3) After 2 hours of electrolysis, use liquid ammonia to adjust the catholyte to pH=11.5, thereby forming a regenerated alkaline etching sub-liquid, which is recycled for use in the etching production line.
实施例4Example 4
(1)使用由密封电解槽、电解电源、电解阳极和电解阴极组成的电解池,用滤布将电解槽分隔为阳极区和阴极区,并通过带有可控泵浦的管道将阳极区和阴极区进行连接;(1) Use an electrolytic cell consisting of a sealed electrolytic cell, an electrolytic power supply, an electrolytic anode, and an electrolytic cathode. The electrolytic cell is divided into an anode area and a cathode area by a filter cloth, and the anode area and the cathode area are separated by a pipeline with a controllable pump. The cathode area is connected;
根据下表-1的成分和配比配制阳极电解液和阴极电解液,并将阳极电解液和阴极电解液分别加入到阳极区和阴极区当中,本实施例所述的碱性蚀刻废液中还包含有蚀刻添加剂;Prepare the anolyte and the catholyte according to the composition and proportioning of the following table-1, and add the anolyte and the catholyte to the anode area and the cathode area respectively, in the alkaline etching waste liquid described in this embodiment Also contains etching additives;
(2)将阳极电解液的pH值调节至6,启动所述的电解电源进行电解作业,同时对电解槽内产生的气体进行抽排,在所述的电解阴极上析出金属铜,并根据阳极区中阳极液的实时比重值由自动检测投控机向阳极区中补充阴极液,并根据阳极液的实时氧化还原电位由自动检测投控机向阳极区补充还原剂,再根据阴极液的实时比重值由自动检测投控机向阴极区中补充阴极电解液;(2) adjust the pH value of the anolyte to 6, start the electrolysis power supply to carry out the electrolysis operation, simultaneously the gas produced in the electrolysis cell is exhausted, and metal copper is precipitated on the electrolysis cathode, and according to the anode The real-time specific gravity value of the anolyte in the zone is replenished with catholyte to the anode zone by the automatic detection input control machine, and the reducing agent is supplied to the anode zone by the automatic detection input control machine according to the real-time oxidation-reduction potential of the anolyte, and then according to the real-time The specific gravity value is replenished with catholyte in the cathode area by the automatic detection and control machine;
(3)电解作业经过2h后,将溢出阳极区的阳极液与蚀刻子液添加剂混合至pH=10.5,从而形成再生碱性蚀刻子液,并循环使用于蚀刻生产线上。(3) After 2 hours of electrolysis, the anolyte overflowing from the anode area is mixed with the etching sub-liquid additive to pH = 10.5, thereby forming a regenerated alkaline etching sub-liquid, which is recycled for use in the etching production line.
实施例5Example 5
(1)使用由电解槽、双脉冲式电解电源、电解阳极和电解阴极组成的电解池,用阳离子膜将电解槽分隔为阳极区和阴极区,电解槽顶部设有密封盖板,上设有气体抽排系统和入料口,阳极区和阴极区各设有搅拌装置、溢流口和氧化还原电位及pH检测装置,并通过带有可控泵浦的管道将阳极区和阴极区进行连接;(1) Use an electrolytic cell composed of an electrolytic cell, a double-pulse electrolytic power supply, an electrolytic anode and an electrolytic cathode, and use a cationic membrane to separate the electrolytic cell into an anode area and a cathode area. The gas extraction system and material inlet, the anode area and the cathode area are equipped with stirring devices, overflow ports, redox potential and pH detection devices, and the anode area and the cathode area are connected by pipelines with controllable pumps ;
根据下表-1的成分和配比配制阳极电解液和阴极电解液,并将阳极电解液和阴极电解液分别加入到阳极区和阴极区当中;Prepare the anolyte and catholyte according to the composition and ratio of the following table-1, and add the anolyte and catholyte to the anode area and the cathode area respectively;
(2)保持阴极区中的液位高于阳极区的液位,启动所述的电解电源进行电解作业,同时对电解槽内产生的气体进行抽排,电解电源每正向通电5分钟后反向通电1分钟,在所述的电解阴极上析出金属铜,并根据阴极区中阳极液的实时比重值由自动检测投控机向阳极区中补充碱性蚀刻废液,并根据阴极液的实时氧化还原电位由自动检测投控机向阴极区补充还原剂,并使高出预设液位的部分阴极液溢流至阳极区中;(2) Keep the liquid level in the cathode area higher than the liquid level in the anode area, start the electrolysis power supply to carry out the electrolysis operation, and simultaneously pump out the gas generated in the electrolysis cell, and reverse the electrolysis power supply every 5 minutes after forward energization. To energize for 1 minute, metal copper is precipitated on the electrolytic cathode, and according to the real-time specific gravity value of the anolyte in the cathode area, the alkaline etching waste liquid is replenished in the anode area by the automatic detection and control machine, and according to the real-time specific gravity value of the catholyte Oxidation-reduction potential is automatically detected and controlled to replenish the reducing agent to the cathode area, and the part of the catholyte that is higher than the preset liquid level overflows into the anode area;
(3)电解作业经过2h后,将阳极区溢出的阳极液与阴极区中的阴极液混合,然后使用液氨调至pH=11.5,从而形成再生碱性蚀刻子液,并循环使用于蚀刻生产线上。(3) After 2 hours of electrolysis, the anolyte overflowing from the anode area is mixed with the catholyte in the cathode area, and then adjusted to pH = 11.5 with liquid ammonia to form a regenerated alkaline etching sub-liquid, which is recycled in the etching production line superior.
实施例6Example 6
(1)使用由密封电解槽、电解电源、电解阳极和电解阴极组成的电解池,用滤布将电解槽分隔为阳极区和阴极区,并通过带有可控泵浦的管道将阳极区和阴极区进行连接;(1) Use an electrolytic cell consisting of a sealed electrolytic cell, an electrolytic power supply, an electrolytic anode, and an electrolytic cathode. The electrolytic cell is divided into an anode area and a cathode area by a filter cloth, and the anode area and the cathode area are separated by a pipeline with a controllable pump. The cathode area is connected;
根据下表-1的成分和配比配制阳极电解液和阴极电解液,并将阳极电解液和阴极电解液分别加入到阳极区和阴极区当中;Prepare the anolyte and catholyte according to the composition and ratio of the following table-1, and add the anolyte and catholyte to the anode area and the cathode area respectively;
(2)保持阴极区中的液位高于阳极区的液位,启动所述的电解电源进行电解作业,同时对电解槽内产生的气体进行抽排,电解电源每正向通电5分钟后反向通电1分钟,在所述的电解阴极上析出金属铜,并根据阳极区中阳极液的实时pH值和氧化还原电位和定时设定由自动检测投控机向阳极区中补充阴极液,并根据阴极液的实时氧化还原电位由自动检测投控机向阴极区补充阴极电解液;(2) Keep the liquid level in the cathode area higher than the liquid level in the anode area, start the electrolysis power supply to carry out the electrolysis operation, and simultaneously pump out the gas generated in the electrolysis cell, and reverse the electrolysis power supply every 5 minutes after forward energization. After energizing for 1 minute, metal copper is precipitated on the electrolytic cathode, and according to the real-time pH value, redox potential and timing setting of the anolyte in the anode area, the catholyte is replenished in the anode area by the automatic detection and control machine, and According to the real-time oxidation-reduction potential of the catholyte, the catholyte is replenished to the cathode area by the automatic detection and control machine;
(3)电解作业经过2h后,将阳极区溢出的阳极液与阴极区中的阴极液混合,并按重量比加入1%的氯酸钠、5%的水,然后使用液氨调至pH=11.5,从而形成再生碱性蚀刻子液,并循环使用于蚀刻生产线上。(3) after the electrolysis operation is through 2h, the anolyte that the anode area overflows is mixed with the catholyte in the cathode area, and adds 1% sodium chlorate, the water of 5% by weight, then uses liquid ammonia to adjust to pH= 11.5, so as to form a regenerated alkaline etching sub-liquid, which is recycled for use in the etching production line.
对比例1Comparative example 1
(1)使用由电解槽、电解电源、电解阳极和电解阴极组成的电解池;(1) Use an electrolytic cell consisting of an electrolytic cell, an electrolytic power supply, an electrolytic anode and an electrolytic cathode;
根据下表-1的成分和配比配制电解液并加入到电解槽中,按1mol/L加入硫脲作为平整剂;Prepare the electrolyte according to the ingredients and proportions in Table-1 below and add it to the electrolytic cell, and add thiourea as a leveling agent at 1mol/L;
(2)启动所述的电解电源进行电解作业,在所述的电解阴极上析出金属铜;(2) Start the electrolysis power supply to carry out the electrolysis operation, and deposit metallic copper on the electrolysis cathode;
(3)电解作业经过2h后,将电解后的溶液按重量比加入5%的水,然后使用液氨调至pH=11,从而形成再生碱性蚀刻子液,并循环使用于蚀刻生产线上。(3) After 2 hours of electrolysis, add 5% water to the electrolyzed solution by weight, and then use liquid ammonia to adjust the pH to 11, thereby forming a regenerated alkaline etching sub-liquid, which is recycled for use in the etching production line.
对比例2Comparative example 2
(1)使用由电解槽、电解电源、电解阳极和电解阴极组成的电解池;(1) Use an electrolytic cell consisting of an electrolytic cell, an electrolytic power supply, an electrolytic anode and an electrolytic cathode;
根据下表-1的成分和配比配制电解液并加入到电解槽中,按1mol/L加入硫脲作为平整剂;Prepare the electrolyte according to the ingredients and proportions in Table-1 below and add it to the electrolytic cell, and add thiourea as a leveling agent at 1mol/L;
(2)启动所述的电解电源进行电解作业,在所述的电解阴极上析出金属铜;(2) Start the electrolysis power supply to carry out the electrolysis operation, and deposit metallic copper on the electrolysis cathode;
(3)电解作业经过2h后向电解后的溶液加入子液添加剂调节至pH=10.5,从而形成再生碱性蚀刻子液,并循环使用于蚀刻生产线上。(3) After 2 hours of electrolysis, add sub-liquid additives to the electrolyzed solution to adjust the pH to 10.5, thereby forming a regenerated alkaline etching sub-liquid, which is recycled for use in the etching production line.
表-1Table 1
备注:表-1中“不使用再生碱性蚀刻子液时的蚀刻速度/或蚀刻因子”应理解为没有使用再生碱性蚀刻子液,而是原碱性蚀刻液单独工作时蚀刻速度/或蚀刻因子。Remarks: "Etching speed/or etching factor when no regenerated alkaline etchant is used" in Table-1 should be understood as not using regenerated alkaline etchant, but the etching speed/or when the original alkaline etchant works alone etch factor.
蚀刻速度和蚀刻质量除了受蚀刻液本身的性能影响以外,也会随着蚀刻液的温度、蚀刻设备的喷淋压力等因素变动。因此,需要将回收方法以外的所有试验条件保持一致才能得出结果进行比较。The etching speed and etching quality are not only affected by the performance of the etching solution itself, but also vary with the temperature of the etching solution, the spray pressure of the etching equipment and other factors. Therefore, all experimental conditions other than the recovery method need to be kept the same in order for the results to be compared.
由表-1中的结果可知,对比例1和对比例2均为现有的将碱性蚀刻废液进行直接电解的方案,其电析铜电流效率仅为60%和64%,而且将电解后的溶液配制为再生碱性蚀刻子液重复使用时蚀刻速度分别下跌47.5%和43.3%,同时蚀刻质量也有所降低。而实施例1~6的电析铜电流效率比现有技术提升至少53.3%,而且将电解后的溶液配制为再生碱性蚀刻子液重复使用时对蚀刻速度和蚀刻质量没有明显不良影响。As can be seen from the results in Table-1, Comparative Example 1 and Comparative Example 2 are existing schemes of direct electrolysis of alkaline etching waste liquid, and their electrolytic copper current efficiencies are only 60% and 64%. After the solution is prepared as a regenerated alkaline etching sub-solution, the etching speed drops by 47.5% and 43.3%, respectively, and the etching quality also decreases. However, the electrolytic copper current efficiency of Examples 1-6 is at least 53.3% higher than that of the prior art, and the solution after electrolysis is prepared as a regenerated alkaline etching sub-solution for repeated use, which has no obvious adverse effects on the etching speed and etching quality.
需要指出的是,上述实施例仅是对本发明的进一步说明,而不是限制,本领域技术人员在与本发明技术方案的相当的含义和范围内的任何调整或改变,都应认为是包括在本发明的保护范围内。It should be pointed out that the above-mentioned embodiment is only a further description of the present invention, rather than a limitation, and any adjustment or change within the equivalent meaning and scope of the technical solution of the present invention by those skilled in the art should be considered as being included in the present invention. within the scope of protection of the invention.
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