[go: up one dir, main page]

CN117137817B - Residue removing composition, sensitive creatine facial cleanser and preparation method of sensitive creatine facial cleanser - Google Patents

Residue removing composition, sensitive creatine facial cleanser and preparation method of sensitive creatine facial cleanser

Info

Publication number
CN117137817B
CN117137817B CN202311080205.0A CN202311080205A CN117137817B CN 117137817 B CN117137817 B CN 117137817B CN 202311080205 A CN202311080205 A CN 202311080205A CN 117137817 B CN117137817 B CN 117137817B
Authority
CN
China
Prior art keywords
parts
component
raw materials
facial cleanser
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202311080205.0A
Other languages
Chinese (zh)
Other versions
CN117137817A (en
Inventor
朱敏
陈茂江
敬欢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Xuanmei Biotechnology Co ltd
Original Assignee
Shanghai Xuanmei Biotechnology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Xuanmei Biotechnology Co ltd filed Critical Shanghai Xuanmei Biotechnology Co ltd
Priority to CN202311080205.0A priority Critical patent/CN117137817B/en
Publication of CN117137817A publication Critical patent/CN117137817A/en
Application granted granted Critical
Publication of CN117137817B publication Critical patent/CN117137817B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/46Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing sulfur
    • A61K8/466Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing sulfur containing sulfonic acid derivatives; Salts
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/40Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing nitrogen
    • A61K8/42Amides
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/60Sugars; Derivatives thereof
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/60Sugars; Derivatives thereof
    • A61K8/602Glycosides, e.g. rutin
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/64Proteins; Peptides; Derivatives or degradation products thereof
    • A61K8/65Collagen; Gelatin; Keratin; Derivatives or degradation products thereof
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/72Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
    • A61K8/73Polysaccharides
    • A61K8/736Chitin; Chitosan; Derivatives thereof
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61QSPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00Preparations for care of the skin
    • A61Q19/005Preparations for sensitive skin
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61QSPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00Preparations for care of the skin
    • A61Q19/10Washing or bathing preparations
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K2800/00Properties of cosmetic compositions or active ingredients thereof or formulation aids used therein and process related aspects
    • A61K2800/40Chemical, physico-chemical or functional or structural properties of particular ingredients
    • A61K2800/59Mixtures
    • A61K2800/592Mixtures of compounds complementing their respective functions
    • A61K2800/5922At least two compounds being classified in the same subclass of A61K8/18

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Birds (AREA)
  • Epidemiology (AREA)
  • Dermatology (AREA)
  • Cosmetics (AREA)

Abstract

本申请涉及洗护用品技术领域,具体公开了一种去残留组合物、敏感肌氨基酸洗面奶及其制备方法。一种去残留组合物,包含单独存放的以下重量份的原料:月桂醇磺基琥珀酸酯二钠 15‑30份;癸基葡糖苷 1‑5份;糖脂 0.1‑1份。所述去残留组合物可用于洗护用品中,优选应用于洗面奶中。本申请的去残留组合物不仅拥有良好的抗硬水性能,易于过水,改善表面活性剂在皮肤表面的残留,还能够降低其所用应用体系的刺激性,进而在针对敏感肌人群时,整体具有优异的适用性。The present application relates to the technical field of toiletries, and specifically discloses a residue removal composition, a sensitive skin amino acid facial cleanser, and a preparation method thereof. A residue removal composition comprises the following raw materials in parts by weight stored separately: 15-30 parts of disodium lauryl sulfosuccinate; 1-5 parts of decyl glucoside; and 0.1-1 parts of glycolipid. The residue removal composition can be used in toiletries, preferably in facial cleansers. The residue removal composition of the present application not only has good hard water resistance, is easy to rinse with water, and improves the residue of surfactants on the skin surface, but also can reduce the irritation of the application system used, and thus has excellent overall applicability when targeting people with sensitive skin.

Description

Residue removing composition, sensitive creatine facial cleanser and preparation method of sensitive creatine facial cleanser
Technical Field
The application relates to the technical field of washing and caring products, in particular to a residue removing composition, sensitive creatine facial cleanser and a preparation method thereof.
Background
The washing and caring products comprise a cleaning product, a skin care product, a shampoo product, a hair care product and the like, the facial cleanser is a common washing and caring product, and the surfactant in the facial cleanser is a main active substance of the cleaning product, can remove dirt on the surface of facial skin, keep the skin fresh and comfortable, and is beneficial to keeping the normal physiological function of the skin, but the residue of the surfactant can also bring a certain irritation effect to the skin.
The facial cleanser can dissolve facial oil-soluble fat and redundant grease by virtue of oil phase matters and water-soluble sweat and dirt of the face by virtue of water phase matters, wherein a good product sold on the market is mainly the facial cleanser taking amino acid as a main body, has good moisturizing capability after application, and has no tight skin after washing, thus being favored by consumers. However, the skin is easy to remain on the surface of the skin after being applied and washed, can react with oxygen or deposited molecules in the air, and can generate various physicochemical and biochemical reactions when being exposed to sunlight or bacteria exist on the skin, so that a plurality of stimulating substances which can injure the skin are formed, and especially for people with sensitive muscles, the skin barrier function is easy to be damaged, and a series of skin problems are caused.
Therefore, there is a need to propose a solution to the above technical problems.
Disclosure of Invention
In order to reduce residues of the washing and protecting products after washing, so that the washing and protecting products can be more suitable for sensitive muscle groups, the application provides a residue removing composition, sensitive creatine facial cleanser and a preparation method thereof.
In a first aspect, the present application provides a residue removing composition, which adopts the following technical scheme:
A residue removing composition comprising the following separately stored raw materials in parts by weight:
15-30 parts of disodium lauryl sulfosuccinate;
1-5 parts of decyl glucoside;
0.1-1 part of glycolipid.
By adopting the technical scheme, the lauryl sulfosuccinate disodium is a milder surfactant and plays roles in foaming and cleaning, decyl glucoside has the characteristics of common nonionic and anionic surfactants, can reduce the irritation of other surfactants and has the effects of thickening and increasing moisture retention, the glycolipid is a water-soluble lipid substance which can improve skin barrier and has the effect of relieving irritation, and when the lauryl sulfosuccinate disodium, decyl glucoside and glycolipid are used as the residue removing composition according to the dosage range, the lauryl sulfosuccinate disodium, the decyl glucoside and the glycolipid can play roles in excellent compounding and synergism, so that the lauryl sulfosuccinate disodium and the decyl glucoside not only have good hard water resistance, are easy to pass water, improve the residues of the surfactants on the skin surface, but also can reduce the irritation of an application system used by the lauryl sulfosuccinate disodium and the decyl glucoside, and further have excellent applicability when aiming at sensitive muscles.
Preferably, the weight ratio of the disodium lauryl sulfosuccinate to the decyl glucoside to the glycolipid is 20:3:0.5.
By adopting the technical scheme, when the lauryl disodium sulfosuccinate, the decyl glucoside and the glycolipid with the weight ratio are used as the residue removing composition, the mutual matching effect is excellent, the irritation of the obtained product to the skin can be greatly reduced after the application, the residue of the product after the application and washing is also greatly reduced, and the applicability to sensitive muscle groups is excellent.
Preferably, trehalose and panthenol are also added into the raw materials of the residue removing composition, and the weight parts of the raw materials are as follows:
0.5-2 parts of trehalose;
0.5-1 part of panthenol.
By adopting the technical scheme, the trehalose has a strong moisturizing effect, can deeply clean residues such as facial dirt, grease, make-up and the like and stabilize skin states, the panthenol is a water-soluble and stable small molecular weight active ingredient, has an excellent moisturizing effect, can combine water with oil and keep the stability, and the trehalose and the panthenol are introduced into the residue removing composition and are matched with each other, so that the skin barrier effect of sensitive muscle groups can be improved, the stimulation of a surfactant in the washing and caring product can be reduced, and further the product obtained by applying the residue removing composition is more suitable for the sensitive muscle groups, is not easy to cause skin injury and is more stable.
Preferably, the feed comprises the following raw materials in parts by weight, which are stored separately:
20 parts of disodium lauryl sulfosuccinate;
3 parts of decyl glucoside;
0.5 parts of glycolipid;
Trehalose 1 part;
0.6 part of panthenol.
By adopting the technical scheme, when the raw materials with the weight parts are used as the residue removing composition, the mutual cooperation synergistic effect is excellent, so that the product obtained by application has lower residue and lower irritation, and shows excellent applicability to sensitive muscle groups.
In a second aspect, the application provides a sensitive creatine facial cleanser, which adopts the following technical scheme:
The sensitive creatine facial cleanser is prepared from the following raw materials in parts by weight:
5-15 parts of water;
10-20 parts of humectant;
0.03-0.08 part of chelating agent;
0.5-1 part of thickener;
0.2-0.5 part of antioxidant;
15-30 parts of disodium lauryl sulfosuccinate;
5-10 parts of sodium methyl lauroyl taurate;
1-5 parts of sodium cocoyl glycinate;
0.1-0.5 part of pH regulator;
1-5 parts of decyl glucoside;
5-15 parts of sodium methyl cocoyl taurate;
1-5 parts of cocamidopropyl betaine;
1-5 parts of stabilizer;
0.5-2 parts of trehalose;
0.1-1 parts of glycolipid;
0.5-1 part of PCA sodium;
0.5-1 part of panthenol;
0.01-0.05 part of sodium hyaluronate;
proline 0.5-1 part;
0.5-1 part of hydroxyproline;
0.5-1 part of 1, 2-hexanediol;
0.05-0.2 part of octanoyl hydroxamic acid;
0.5-1 part of glycerol caprylate;
2-6 parts of 1, 3-propanediol;
0.05-0.2 parts of aromatic.
According to the technical scheme, in the facial cleanser, the disodium lauryl sulfosuccinate, the sodium methyl lauroyl taurate, the sodium cocoyl glycinate, the decyl glucoside, the sodium methyl cocoyl taurate and the cocamidopropyl betaine are matched to serve as the surfactant, so that a relatively excellent and stable cleaning effect can be exerted, the glycolipid, the sodium PCA, the panthenol, the sodium hyaluronate, the proline, the hydroxyproline and the 1, 2-hexanediol can help skin to keep moisture and humidity, and maintain the stability of skin barrier effect, wherein the residue removing composition is applied in the facial cleanser, so that the obtained facial cleanser has fewer surface active residues after being applied and washed, is difficult to generate relatively large irritation to skin of sensitive muscle groups, is more gentle and stable in application, and has relatively strong applicability.
Preferably, the raw materials of the sensitive creatine facial cleanser are also added with 2-5 parts by weight of regulating auxiliary agent, wherein the regulating auxiliary agent consists of oligomeric chitosan and gelatin, and the weight ratio of the oligomeric chitosan to the gelatin is 1 (1.6-2.4).
By adopting the technical scheme, the chitosan oligosaccharide has the effects of helping to gently clean skin, keeping moisture, resisting bacteria, resisting oxidation and the like, gelatin has a promoting effect on maintaining the stability of skin barrier effect, and when the chitosan oligosaccharide and gelatin are used as the regulating auxiliary agent according to a specific weight ratio, the regulating auxiliary agent can not only stably exert the self effect, but also correlate various surfactants in the facial cleanser, the surfactants are not easy to remain on the skin surface after washing, and various surfactants with less residues are not easy to further form stimulating substances under the effect of the regulating auxiliary agent, so that the low-residue and low-stimulation effect after the facial cleanser is applied are more excellent, and the facial cleanser is more applicable to sensitive muscle people.
Preferably, the weight ratio of the chitosan oligosaccharide to the gelatin is 1:2.
By adopting the technical scheme, the regulating auxiliary agent composed of the chitosan oligosaccharide and the gelatin in the weight ratio has excellent effect when being applied to the facial cleanser, can further reduce the residue of the surfactant, has lower irritation to the skin of sensitive muscle groups, and has higher quality.
In a third aspect, the application provides a preparation method of sensitive creatine facial cleanser, which adopts the following technical scheme:
A preparation method of sensitive creatine facial cleanser comprises the following steps:
(1) Preparing raw materials of a component A, a component B, a component C, a component D and a component E according to a proportion, wherein the component A comprises water, a humectant, a chelating agent, a thickening agent and an antioxidant, the component B comprises disodium laurylsulfosuccinate, sodium methyl lauroyl taurate, sodium cocoyl glycinate, a pH regulator, decyl glucoside and sodium methyl cocoyl taurate, the component C comprises cocamidopropyl betaine and a stabilizing agent, the component D comprises trehalose, glycolipid, sodium PCA, panthenol, sodium hyaluronate, proline, hydroxyproline and 1, 2-hexanediol, the component E comprises octanoic acid, glycerol caprylate, 1, 3-propanediol and an aromatic (2), the raw materials of the component A in the step (1) are mixed, heated to 80-85 ℃ for stirring, after the raw materials are dissolved and uniformly mixed, the raw materials are continuously stirred at a constant temperature of 15-30min, the temperature is reduced to 70-75 ℃, the raw materials of the component B are added, the raw materials are stirred and uniformly mixed, the raw materials of the component C are added when the raw materials are further stirred and uniformly mixed to 60-65 ℃, the raw materials are mixed uniformly, the raw materials of the raw materials are further cooled to 45-50 ℃ and the temperature is reduced, the raw materials of the raw materials are uniformly mixed until the raw materials of the raw materials are cooled to obtain the mixed until the raw materials are cooled and mixed until the raw materials are uniformly reaches the temperature reaches 38 ℃ and the temperature, and the temperature reaches the temperature of the final, and the raw materials are cooled and mixed.
By adopting the technical scheme, the preparation method is simple to operate, is convenient for large-scale process production, groups and mixes the raw materials, is convenient for quality control in the process, is favorable for obtaining the facial cleanser with excellent quality, and simultaneously adopts different temperature control when the raw materials of the components are added and mixed, is favorable for fully combining the raw materials of the components, is favorable for stably playing a role in a mixed system, and further has less residue and small stimulation, thus being more suitable for facial cleanser products of sensitive muscle groups.
In summary, the application has the following beneficial effects:
1. The lauryl sulfosuccinate disodium, the decyl glucoside and the glycolipid are used as the residue removing composition according to a specific dosage range, so that the lauryl sulfosuccinate disodium, the decyl glucoside and the glycolipid can play an excellent role in compounding and synergism, not only have good hard water resistance, are easy to pass water, improve the residue of the surfactant on the skin surface, but also can reduce the irritation of an application system used by the surfactant, and further have excellent applicability in the whole aiming at sensitive muscle groups;
2. According to the application, trehalose and panthenol are introduced into the residue removing composition, and the trehalose and panthenol are matched, so that the stimulation of a surfactant in the washing and caring product can be synergistically reduced, the stability of the skin barrier effect can be maintained, and further the product obtained by applying the residue removing composition is more suitable for sensitive muscle groups, is not easy to cause skin injury and is more stable;
3. when the residue removing composition is applied to a facial cleanser product, a plurality of surfactants in the facial cleanser are not easy to remain on the skin surface after washing and are not easy to further form irritant substances by adding the regulating auxiliary agent consisting of the chitosan oligosaccharide and the gelatin in a specific weight ratio range, so that the residue removing composition can be more excellent in low residue and low irritation after the facial cleanser is applied and is more suitable for sensitive myogenic people.
Detailed Description
The present application will be described in further detail with reference to examples.
The raw materials used in the preparation examples and examples of the present application are all commercially available except for the specific descriptions:
glycolipids were purchased from the Decrown Biodaily chemical grade biological glycolipids, product number SLMP 3150;
The chitosan oligomer is purchased from Chongqing Tianrun biological products Co., ltd., CAS number 9012-76-4;
gelatin was purchased from Wuhan Ji chemical Co., ltd., CAS number 9000-70-8.
Examples
Examples 1 to 3
A residue removing composition comprising separately stored raw materials of each component and their corresponding weights are shown in Table 1.
Table 1 raw materials for each component in examples 1 to 3 and parts by weight (parts/kg)
Example 4
A residue-removing composition was different from example 1 in that the total weight parts of the residue-removing composition was unchanged, and the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside, and glycolipid was 20:3:0.5.
Example 5
A residue-removing composition was different from example 1 in that the total weight parts of the residue-removing composition was unchanged, and the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside, and glycolipid was 21:3:0.5.
Example 6
A residue-removing composition was different from example 1 in that the total weight parts of the residue-removing composition was not changed, and the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside, and glycolipid was 19:3:0.5.
Example 7
A residue-removing composition was different from example 1 in that the total weight parts of the residue-removing composition was unchanged, and the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside, and glycolipid was 20:2.9:0.5.
Example 8
A residue-removing composition was different from example 1 in that the total weight parts of the residue-removing composition was unchanged, and the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside, and glycolipid was 20:3.1:0.5.
Example 9
A residue-removing composition was different from example 1 in that the total weight parts of the residue-removing composition was unchanged, and the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside, and glycolipid was 20:3:0.4.
Example 10
A residue-removing composition was different from example 1 in that the total weight parts of the residue-removing composition was unchanged, and the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside, and glycolipid was 20:3:0.6.
Examples 11 to 15
A residue-removing composition was different from example 1 in that trehalose and panthenol were further added to the raw materials, which contained the raw materials of the respective components separately stored and their respective weights were as shown in Table 2.
Table 2 raw materials for each component in examples 11 to 15 and parts by weight (parts/kg)
Example 16
A residue-removing composition was different from example 12 in that trehalose was not contained in the raw materials.
Example 17
A residue-removing composition was different from example 12 in that the raw material did not contain panthenol.
Example 18
The sensitive creatine facial cleanser comprises the following raw materials in percentage by weight as shown in Table 3 and is prepared by the following steps:
(1) Preparing raw materials of a component A, a component B, a component C, a component D and a component E according to a proportion, wherein the component A comprises water, a humectant, a chelating agent, a thickening agent and an antioxidant, the component B comprises disodium lauryl sulfosuccinate, sodium methyl lauroyl taurate, sodium cocoyl glycinate, a pH regulator, decyl glucoside and sodium methyl cocoyl taurate, the component C comprises cocamidopropyl betaine and a stabilizing agent, the component D comprises trehalose, glycolipid, sodium PCA, panthenol, sodium hyaluronate, proline, hydroxyproline and 1, 2-hexanediol, the component E comprises octanoyl hydroxamic acid, glycerol octanoate, 1, 3-propanediol and an aromatic
(2) Mixing the component A raw materials in the step (1), heating to 80-85 ℃ for stirring, keeping the temperature for 15-30min after the components are dissolved and mixed uniformly, continuously stirring in the process, then cooling to 70-75 ℃, adding the component B raw materials, stirring and mixing uniformly, cooling to 60-65 ℃, adding the component C raw materials, stirring and mixing uniformly, cooling to 45-50 ℃, adding the component D raw materials, stirring and mixing uniformly, cooling to 38-42 ℃, adding the component E raw materials, stirring and mixing uniformly, and finally discharging to obtain the sensitive creatine facial cleanser.
In the operation, the mixing and heating temperature of the component A raw material is preferably 80 ℃, the stirring speed is 15r/min, the stirring time is 10min, the constant temperature is 20min, the temperature is preferably reduced to 70 ℃, the component B raw material is added, the stirring speed is 15r/min, the stirring time is 10min, the temperature is preferably reduced to 60 ℃, the stirring speed is 15r/min, the stirring time is 5min, the temperature is preferably reduced to 50 ℃, the stirring speed is 15r/min, the stirring time is 10min, the temperature is preferably reduced to 40 ℃, the stirring speed is 15r/min, the stirring time is 10min, the residue removing composition is composed of disodium lauryl sulfosuccinate, decyl glucoside and glycolipid, the humectant is glycerin, the chelating agent is disodium EDTA, the antioxidant is p-hydroxyacetophenone, the pH regulator is citric acid, the stabilizer is sodium chloride, and the aromatic agent is citronellol.
Examples 19 to 20
A sensitive creatine facial cleanser is different from example 18 in that the raw materials of each component and the corresponding parts by weight are shown in Table 3.
Table 3 raw materials for each component in examples 18 to 20 and parts by weight (parts/kg)
Example 21
A sensitive creatine facial cleanser is different from the facial cleanser in the embodiment 18 in that 3.5 parts by weight of regulating auxiliary agent is added into the raw materials, the regulating auxiliary agent consists of chitosan oligosaccharide and gelatin according to the weight ratio of 1:2, and the regulating auxiliary agent is added with the raw materials of component C.
Example 22
A sensitive creatine facial cleanser differs from example 21 in that the conditioning aid is added in 2 parts by weight.
Example 23
A sensitive creatine facial cleanser differs from example 21 in that the conditioning aid is added in 5 parts by weight.
Example 24
A sensitive creatine facial cleanser is different from example 21 in that the conditioning aid consists of oligomeric chitosan and gelatin in a weight ratio of 1:1.6.
Example 25
A sensitive creatine facial cleanser is different from example 21 in that the conditioning aid consists of oligomeric chitosan and gelatin in a weight ratio of 1:2.4.
Example 26
A sensitive creatine facial cleanser is different from example 21 in that the conditioning aid consists of oligomeric chitosan and gelatin in a weight ratio of 1:1.5.
Example 27
A sensitive creatine facial cleanser is different from example 21 in that the conditioning aid consists of oligomeric chitosan and gelatin in a weight ratio of 1:2.5.
Example 28
A sensitive creatine facial cleanser differs from example 21 in that the material does not contain oligomeric chitosan.
Example 29
A sensitive creatine facial cleanser differs from that of example 21 in that the material does not contain gelatin.
Comparative example
Comparative examples 1 to 6
A residue removing composition comprising separately stored raw materials of each component and their respective weights are shown in Table 4.
Table 4 comparative examples 1 to 6 were prepared from the raw materials of the respective components in parts by weight (parts/kg)
Comparative example 7
A sensitive creatine facial cleanser differs from example 18 in that the disodium lauryl sulfosuccinate equivalent mass is replaced by water.
Comparative example 8
A sensitive creatine facial cleanser differs from example 18 in that the mass of decyl glucoside is replaced by water.
Comparative example 9
A sensitive creatine facial cleanser differs from example 18 in that the glycolipid equivalent mass is replaced by water.
Comparative example 10
A sensitive creatine facial cleanser differs from example 18 in that the mass of disodium lauryl sulfosuccinate, decyl glucoside, etc. is replaced by water.
Comparative example 11
A sensitive creatine facial cleanser differs from example 18 in that the mass of glycolipid, decyl glucoside, etc. is replaced with water.
Comparative example 12
A sensitive creatine facial cleanser differs from example 18 in that the mass of disodium lauryl sulfosuccinate, glycolipid, etc. is replaced by water.
Comparative example 13
A sensitive creatine facial cleanser differs from example 18 in that the equivalent mass of the residue removing composition is replaced by water.
Performance test
Test samples disodium laurylsulfosuccinate, decyl glucoside and glycolipid of the residue-removing composition of examples 1 to 10 were applied to the sensitive creatine facial cleanser of example 18, and the sensitive creatine facial cleanser prepared by the same method was used as test samples 1 to 10;
The disodium lauryl sulfosuccinate, decyl glucoside and glycolipid in the embodiment 18 are replaced by the corresponding parts by weight of the raw materials in the embodiments 11-17, and the chitosan oligosaccharide and gelatin in the corresponding parts by weight are additionally added, so that the prepared sensitive creatine facial cleanser is used as a test sample 11-17;
The sensitive creatine facial cleanser obtained in examples 18-29 was used as test samples 18-29;
the disodium lauryl sulfosuccinate, decyl glucoside and glycolipid of the residue-removing composition of comparative examples 1 to 6 were applied to the sensitive creatine facial cleanser of example 18, and the sensitive creatine facial cleanser prepared in the same manner was used as control samples 1 to 6, and the sensitive creatine facial cleanser of comparative examples 7 to 13 was used as control samples 7 to 13.
The test method comprises the steps of (1) testing residual quantity, taking artificial skin, wetting the artificial skin with water to be 20cm long and wide, coating 2g of sensitive creatine facial cleanser, rubbing for 2min, washing with water for three times to obtain test artificial skin, circularly washing the test artificial skin with 60ml of distilled water, grinding the surface of the artificial skin with a glass rod in the washing process for five minutes to obtain a test solution, measuring the surfactant content in the test solution by using a Saimo UltiMateTM series 3000 liquid chromatograph Corona Veo (RS) electrospray detector, and testing the test samples 1-29 and the control samples 1-13 by adopting the test method.
(2) 84 Sensitive muscle testers 18-50 years old are selected, and the patients who do not participate in clinical trial of medicines or evaluation of efficacy of other cosmetics in 2 months are excluded from pregnant women or lactating women, the patients with allergic or highly sensitive risks to cosmetics and the patients with acute inflammation, immunodeficiency or other skin diseases at the tested parts. One group of 2 persons, divided into 42 groups, were tested as follows using test samples 1-29 and control samples 1-13, respectively:
The skin surface is usually in a weak acid state, the pH range is usually between 4.5 and 6.5, firstly, an ASCH ASP-02 skin pH value tester is used for testing the skin pH value of tested people, the ASCH ASP-02 skin pH value tester is recorded as an initial pH value, the skin pH value is ensured to be in a normal pH range, then, sensitive creatine facial cleanser is used for 1.5g each time in the morning and evening, the skin pH value test is carried out for five days, the tested pH value is obtained, the skin pH value change rate (%) is calculated, wherein the skin pH value change rate (%) = (test pH value-initial pH value)/initial pH value takes an absolute value, and the larger the change rate indicates that the skin is more stimulated.
TABLE 5 test results for test samples 1-29 and control samples 1-13
It can be seen from the combination of examples 1 to 3 and comparative examples 1 to 6 and Table 5 that when 15 to 30 parts of disodium lauryl sulfosuccinate, 1 to 5 parts of decyl glucoside and 0.1 to 1 part of glycolipid are taken, the obtained residue-removing composition shows lower irritation to sensitive muscle groups and has less residue of the surfactant after application. When the amount of any one of the raw materials exceeds the above range, the residual amount (mg) of the surfactant measured by the experiment is increased, the rate (%) of change of the pH value of the skin is increased, and the overall quality is remarkably reduced.
As can be seen from the combination of examples 1, 4 and 5 to 10 and the combination of Table 5, the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside and glycolipid is 20:3:0.5, the obtained residue removing composition has the most excellent effect after application, the obtained facial cleanser has the advantages that the residual amount (mg) of the surfactant and the change rate (%) of the pH value of the skin are both intersected, and when the proportion of one of the raw materials is changed, the application effect of the residue removing composition is obviously reduced no matter the proportion is increased or reduced.
As can be seen from the combination of examples 1, 11-15 and table 5, the inclusion of trehalose and panthenol in the residue-removing composition, which was cited, enabled the resulting facial cleanser to exhibit lower surfactant residue and lower irritation when used against sensitive muscle groups, wherein the resulting residue-removing composition was most excellent in facial cleanser application when 20 parts of disodium lauryl sulfosuccinate, 3 parts of decyl glucoside, 0.5 part of glycolipid, 1 part of trehalose and 0.6 part of panthenol were taken. By combining examples 16-17 and Table 5, it can be seen that the excellent synergistic effect of the combination of trehalose and panthenol can be achieved, and the effect of the combination of trehalose and panthenol is far less than that of the combination of trehalose and panthenol on the promotion of low residue and low stimulation.
As can be seen from the combination of the examples 18 and the comparative examples 7 to 13 and the combination of the table 5, the disodium lauryl sulfosuccinate, the decyl glucoside and the glycolipid can play an excellent role in the combination synergy, if the residual composition is not used in the facial cleanser, the residual amount (mg) of the surfactant and the change rate (%) of the pH value of the skin are high, and the corresponding lifting effect can be uniformly brought about by using one of the surfactant and the residual composition, and the simple superposition of the effects is also brought about by using any two of the surfactant and the residual composition, when three of the surfactant and the residual composition are used for combination, the positive lifting effect can be brought about on the residual amount (mg) of the surfactant and the change rate (%) of the pH value of the skin, and the positive lifting effect is far higher than the sum of the lifting effects brought about by using the three raw materials singly, so that the overall application effect is outstanding.
It can be seen from the combination of examples 18 and examples 21 to 25 and Table 5 that when the residue-removing composition is applied to a facial cleanser product, the surfactant residue and skin irritation of the facial cleanser application can be further reduced by adding a conditioning aid consisting of (1.6-2.4) by weight of chitosan oligosaccharide and gelatin, wherein the effect is excellent when the weight ratio of chitosan oligosaccharide to gelatin is 1:2. As can be seen from the combination of examples 26 to 29 and Table 5, when the weight ratio of the chitosan oligosaccharide to the gelatin is outside the above range, the low residue and the low irritation of the facial cleanser are greatly lost, and when either one of the chitosan oligosaccharide and the gelatin is added alone, the low residue and the low irritation are improved, and the improvement effect is far less excellent than that caused by compounding the two.
The present embodiment is only for explanation of the present application and is not to be construed as limiting the present application, and modifications to the present embodiment, which may not creatively contribute to the present application as required by those skilled in the art after reading the present specification, are all protected by patent laws within the scope of claims of the present application.

Claims (3)

1.一种敏感肌氨基酸洗面奶,其特征在于:由包含以下重量份的原料制成:1. A sensitive skin amino acid facial cleanser, characterized by being made from the following raw materials in parts by weight: 水 5-15份;5-15 parts water; 保湿剂 10-20份;Moisturizer 10-20 parts; 螯合剂 0.03-0.08份;Chelating agent 0.03-0.08 parts; 增稠剂 0.5-1份;Thickener 0.5-1 part; 抗氧化剂 0.2-0.5份;Antioxidant 0.2-0.5 parts; 月桂醇磺基琥珀酸酯二钠 15-30份;15-30 parts of disodium lauryl sulfosuccinate; 甲基月桂酰基牛磺酸钠 5-10份;5-10 parts of sodium methyl lauroyl taurate; 椰油酰甘氨酸钠 1-5份;Sodium cocoyl glycinate 1-5 parts; pH调节剂 0.1-0.5份;pH regulator 0.1-0.5 parts; 癸基葡糖苷 1-5份;1-5 parts of decyl glucoside; 甲基椰油酰基牛磺酸钠 5-15份;5-15 parts of sodium methyl cocoyl taurate; 椰油酰胺丙基甜菜碱 1-5份;Cocamidopropyl betaine 1-5 parts; 稳定剂 1-5份;Stabilizer 1-5 parts; 海藻糖 0.5-2份;Trehalose 0.5-2 parts; 糖脂 0.1-1份;Glycolipid 0.1-1 part; PCA 钠 0.5-1份;Sodium PCA 0.5-1 part; 泛醇 0.5-1份;Panthenol 0.5-1 part; 透明质酸钠 0.01-0.05份;Sodium hyaluronate 0.01-0.05 parts; 脯氨酸 0.5-1份;Proline 0.5-1 part; 羟脯氨酸 0.5-1份;Hydroxyproline 0.5-1 part; 1,2-己二醇 0.5-1份;1,2-hexanediol 0.5-1 part; 辛酰羟肟酸 0.05-0.2份;0.05-0.2 parts of octanoylhydroxamic acid; 甘油辛酸酯 0.5-1份;Glyceryl Caprylate 0.5-1 part; 1,3-丙二醇 2-6份;1,3-propylene glycol 2-6 parts; 芳香剂 0.05-0.2份;Aromatherapy agent 0.05-0.2 parts; 调节助剂 2-5份;Regulating agent 2-5 parts; 所述调节助剂由低聚壳聚糖和明胶组成,且低聚壳聚糖和明胶的重量比为1:(1.6-2.4);The regulating auxiliary agent is composed of oligomolecular chitosan and gelatin, and the weight ratio of oligomolecular chitosan to gelatin is 1:(1.6-2.4); 所述稳定剂为氯化钠。The stabilizer is sodium chloride. 2.根据权利要求1所述的敏感肌氨基酸洗面奶,其特征在于:所述低聚壳聚糖和明胶的重量比为1:2。2. The amino acid facial cleanser for sensitive skin according to claim 1, wherein the weight ratio of the oligochitosan to gelatin is 1:2. 3.权利要求1所述的敏感肌氨基酸洗面奶的制备方法,其特征在于:包括以下步骤:3. The method for preparing the amino acid facial cleanser for sensitive skin according to claim 1, characterized in that it comprises the following steps: (1)按配比准备A组分、B组分、C组分、D组分、E组分和调节助剂的原料,A组分包括水、保湿剂、螯合剂、增稠剂和抗氧化剂;B组分包括月桂醇磺基琥珀酸酯二钠、甲基月桂酰基牛磺酸钠、椰油酰甘氨酸钠、pH调节剂、癸基葡糖苷和甲基椰油酰基牛磺酸钠;C组分包括椰油酰胺丙基甜菜碱和稳定剂;D组分包括海藻糖、糖脂、PCA 钠、泛醇、透明质酸钠、脯氨酸、羟脯氨酸和1,2-己二醇;E组分包括辛酰羟肟酸、甘油辛酸酯、1,3-丙二醇和芳香剂;(1) Prepare the raw materials of component A, component B, component C, component D, component E and conditioning aid according to the proportions, component A includes water, moisturizer, chelating agent, thickener and antioxidant; component B includes disodium lauryl sulfosuccinate, sodium methyl lauroyl taurate, sodium cocoyl glycinate, pH regulator, decyl glucoside and sodium methyl cocoyl taurate; component C includes cocamidopropyl betaine and stabilizer; component D includes trehalose, glycolipid, sodium PCA, panthenol, sodium hyaluronate, proline, hydroxyproline and 1,2-hexanediol; component E includes caprylhydroxamic acid, glyceryl caprylate, 1,3-propylene glycol and fragrance; (2)将步骤(1)中的A组分原料混合,加热至80-85℃进行搅拌,溶解混合均匀后,恒温15-30min,过程中不断进行搅拌;然后降温至70-75℃时加入B组分原料,搅拌混合均匀;再降温至60-65℃时加入C组分原料,搅拌混合均匀,调节助剂与 C 组分原料一同添加使用;再降温至45-50℃时加入D组分原料,搅拌混合均匀;再降温至38-42℃时加入E组分原料,搅拌混合均匀;最后出料,即可得到敏感肌氨基酸洗面奶。(2) Mix the raw materials of component A in step (1), heat to 80-85℃ and stir, dissolve and mix evenly, keep the temperature constant for 15-30min, and stir continuously during the process; then cool to 70-75℃ and add the raw materials of component B, stir and mix evenly; cool to 60-65℃ and add the raw materials of component C, stir and mix evenly, and add the regulating agent together with the raw materials of component C; cool to 45-50℃ and add the raw materials of component D, stir and mix evenly; cool to 38-42℃ and add the raw materials of component E, stir and mix evenly; finally, discharge the material to obtain the amino acid cleanser for sensitive skin.
CN202311080205.0A 2023-08-25 2023-08-25 Residue removing composition, sensitive creatine facial cleanser and preparation method of sensitive creatine facial cleanser Active CN117137817B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202311080205.0A CN117137817B (en) 2023-08-25 2023-08-25 Residue removing composition, sensitive creatine facial cleanser and preparation method of sensitive creatine facial cleanser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202311080205.0A CN117137817B (en) 2023-08-25 2023-08-25 Residue removing composition, sensitive creatine facial cleanser and preparation method of sensitive creatine facial cleanser

Publications (2)

Publication Number Publication Date
CN117137817A CN117137817A (en) 2023-12-01
CN117137817B true CN117137817B (en) 2025-09-09

Family

ID=88901906

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202311080205.0A Active CN117137817B (en) 2023-08-25 2023-08-25 Residue removing composition, sensitive creatine facial cleanser and preparation method of sensitive creatine facial cleanser

Country Status (1)

Country Link
CN (1) CN117137817B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3160564A1 (en) * 2024-03-28 2025-10-03 L'oreal Cosmetic composition comprising a glycolipid, a hydroxyacetophenone and a particular anionic surfactant
FR3160562A1 (en) * 2024-03-28 2025-10-03 L'oreal Cosmetic composition comprising a glycolipid, a hydroxyacetophenone, an anionic surfactant, a specific amphoteric surfactant and an associative polymer, with a particular weight ratio between the glycolipid and the hydroxyacetophenone
WO2025222366A1 (en) * 2024-04-23 2025-10-30 L'oreal Composition for cleansing and/or removing makeups from keratin materials
WO2025222373A1 (en) * 2024-04-23 2025-10-30 L'oreal Composition for cleansing and/or removing makeups from keratin materials

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110074991A (en) * 2019-05-28 2019-08-02 南靖珠曼生物科技有限公司 A kind of amino acid facial cleanser and processing technology
CN114917136A (en) * 2022-06-20 2022-08-19 水羊化妆品制造有限公司 Low-residue cleansing composition and preparation method thereof

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4499880B2 (en) * 2000-07-05 2010-07-07 日本発條株式会社 Boots band
US20020189022A1 (en) * 2001-06-05 2002-12-19 Chang Wen Chung Method for the treatment of textiles after washing
WO2015023773A2 (en) * 2013-08-14 2015-02-19 University Of Tennessee Research Foundation Tooth remineralization compositions and methods
CN109316369B (en) * 2018-09-19 2021-09-03 德国欧悦安股份有限公司 Face cleaning mousse and preparation method thereof
CN110327280A (en) * 2019-08-07 2019-10-15 广西达庆生物科技有限公司 A kind of medical hair care conditioning liquid and preparation method thereof
CN115645304A (en) * 2021-12-31 2023-01-31 深圳市护家科技有限公司 Mild amino acid facial cleanser and preparation method thereof
CN116179612A (en) * 2022-12-13 2023-05-30 浙江中淬生物科技有限公司 Method for efficiently catalyzing and synthesizing active VD3 through multienzyme coupling

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110074991A (en) * 2019-05-28 2019-08-02 南靖珠曼生物科技有限公司 A kind of amino acid facial cleanser and processing technology
CN114917136A (en) * 2022-06-20 2022-08-19 水羊化妆品制造有限公司 Low-residue cleansing composition and preparation method thereof

Also Published As

Publication number Publication date
CN117137817A (en) 2023-12-01

Similar Documents

Publication Publication Date Title
CN117137817B (en) Residue removing composition, sensitive creatine facial cleanser and preparation method of sensitive creatine facial cleanser
CN111012730B (en) Composition for regulating scalp microecology
CN107296771A (en) A kind of desquamation compositions and extra quality multiple-effect are without silicone oil shampoo
CN109846773A (en) A kind of scalp composition and its preparation method and application can inhibit alopecia seborrheica
CN108125870B (en) Scalp nourishing composition, preparation method and application thereof, and scalp nourishing shampoo
CN107468563A (en) A kind of anti-dandruff silk quality lubrication is without silicone oil shampoo
KR101383217B1 (en) Composition for preventing hair loss and promoting hair growth
CN113332160A (en) Cosmetic composition for conditioning peritrichotic skin
JP2016169188A (en) Skin external preparation
KR20200073970A (en) Soothing cream and manufacturing method for the same
US20180092832A1 (en) Organic Hair Formulation and Treatmen
CN113559016A (en) A soothing anti-itch amino acid shampoo for dry scalp
US20050152993A1 (en) Composition for and method of treatment for skin ailments
CN104287982B (en) Dandruff removal composition for adjusting oil balance of scalp
CN110917058A (en) Cosmetic agent for relieving skin irritation and preparation method thereof
JPH03112912A (en) Cosmetic composition
JPS59216812A (en) Hair restoring agent
CN105232374A (en) Efficient moderate moist type cleansing cream
JP2003104886A (en) Skin external preparation composition
CN108524343B (en) Composition for nourishing scalp and caring hair, and preparation method and application thereof
CN117731581B (en) Compositions for scalp care and hair loss prevention, their applications, and shampoo products and their preparation methods.
CN112294674A (en) Pure plant deep cleaning amino acid face cleaning mousse
CN110840766A (en) Whitening and moisturizing amino acid facial cleanser and preparation method thereof
KR100242858B1 (en) Hair shampoo composition for the treatment of itching or dandruff
JP7222483B2 (en) Method for preparing cycad extract

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant