CN106406615A - Manufacturing method of TDR touch screen - Google Patents

Abstract

The invention discloses a method for manufacturing a TDR touch screen, comprising: S1, providing a substrate; S2, depositing an ITO thin film on the surface of the substrate covered with an isolation layer; S3, coating a photoresist layer on the ITO thin film; S4, applying The TDR touch screen mask is placed on the ITO film coated with the photoresist layer, and the photoresist surface is irradiated with ultraviolet rays to partially expose the photoresist; among them, the TDR touch screen mask is provided with several parallel and independent distributions. Wire pattern; S5, remove the TDR touch screen mask, and use the developer to process the exposed photoresist surface; S6, use the etching solution to corrode all the ITO film outside the photoresist layer of the unexposed part; S7 1. Strip off all the photoresist on the corroded ITO film by using a stripping solution to form several parallel and independent ITO wires; S8. Cover the surface of the ITO wire with an insulating layer.

Description

TDR touch screen production method

technical field

The invention relates to the field of touch screens, in particular to a method for manufacturing a scanning touch screen based on Time Domain Reflectometry (TDR).

Background technique

Existing touch screens mainly include resistive touch screens, capacitive touch screens, and infrared touch screens.

Resistive touch screens are mainly used in low-end products, usually only have a single touch function. Capacitive touch screens are widely used in various electronic products, but there are problems such as complex manufacturing process and high cost when applied to super-large-sized products, so large-sized products usually use infrared touch screens. Infrared touch screens need to arrange infrared emitting tubes and infrared receiving tubes around the screen, resulting in large volume and thickness, and the accumulation of dust will cause abnormal touch sensing.

It can be seen that whether it is a resistive touch screen, a capacitive touch screen or an infrared touch screen, the manufacturing process is cumbersome due to its complex structure, and the complex structure leads to a large thickness of the entire touch screen, which cannot meet the needs of users for ultra-thin touch LCD screens. .

In addition, for touch LCD screens, whether resistive touch screens, capacitive touch screens or infrared touch screens are used, usually the resistive touch screens, capacitive touch screens or infrared touch screens are formed separately and then aligned and bonded to the LCD screen. In this way, not only the manufacturing process is cumbersome, but also the touch liquid crystal display formed by the touch screen and the liquid crystal screen has a relatively large thickness, which cannot meet the user's demand for an ultra-thin touch liquid crystal display.

Contents of the invention

The purpose of the present invention is to provide a method for manufacturing a TDR touch screen, which has a simple manufacturing process and can meet the needs of users for ultra-thin touch liquid crystal displays.

In order to achieve the above purpose,

The invention provides a method for manufacturing a TDR touch screen, comprising:

providing a substrate;

providing a wire layer, the wire layer is disposed on the substrate, and the wire layer includes a plurality of parallel wires distributed independently of each other;

An insulating layer is provided, and the insulating layer is disposed on the wire layer.

Compared with the prior art, the TDR touch screen manufacturing method provided by the present invention has a simple structure by forming a wire layer and an insulating layer on the substrate, can effectively reduce the thickness of the touch screen, has a simple manufacturing process, and has ultra-thin thickness and light weight The advantages can be applied to the touch control of large-size LCD screens and ultra-thin products.

Further, it also includes:

An isolation layer is provided, and the isolation layer is arranged between the substrate and the wire layer; wherein, the substrate is a PET film, and the isolation layer is a silicon dioxide layer.

Further, each of the wires is a transparent wire; or each of the wires is a straight wire.

Another aspect of the present invention provides a method for manufacturing a TDR touch screen, comprising steps:

S1. Providing a substrate and covering the substrate with an isolation layer;

S2. Depositing ITO: depositing an ITO film on the surface of the substrate covered with an isolation layer;

S3, coating photoresist: coating a photoresist layer on the ITO film;

S4. Exposure: Place the prefabricated TDR touch screen mask on the ITO film coated with the photoresist layer, and then use ultraviolet rays to irradiate the photoresist surface to partially expose the photoresist; wherein, the TDR There are several parallel and independently distributed wire patterns on the touch screen mask;

S5. Development: Remove the TDR touch screen mask from the ITO film, and use a developer to treat the exposed photoresist surface to dissolve the photoresist in the part irradiated by ultraviolet rays, and keep the unexposed part photoresist layer;

S6, etching: using etching solution to etch away all the ITO films outside the photoresist layer coverage of the unexposed part;

S7, film removal: use a film removal solution to peel off all the photoresist on the corroded ITO film, so that several parallel and independently distributed ITO wires are formed on the surface of the liquid crystal screen;

S8. Coating an insulating layer: covering the surface of the ITO wire with an insulating layer.

As an improvement of the above solution, the etching solution is an acid solution, the stripping solution is a high-concentration alkali solution; the insulating layer is a silicon dioxide film or a PET film.

Compared with the prior art, the TDR touch screen manufacturing method provided by the present invention forms a wire layer and an insulating layer on the substrate through a plurality of processes of depositing ITO, coating photoresist, exposing, developing, etching, removing the film and coating the insulating layer. layer, the manufacturing process is simple, can effectively reduce the thickness of the touch screen, and has the advantages of ultra-thin thickness and light weight, and can be applied to touch control of large-sized LCD screens and ultra-thin products.

The present invention also provides a method for manufacturing a TDR touch screen, comprising:

A wire layer is provided, the wire layer is formed on the liquid crystal screen, and the wire layer includes several parallel wires distributed independently of each other;

An insulating layer is provided, the insulating layer is formed on the wire layer.

Compared with the prior art, the TDR touch screen manufacturing method provided by the present invention is made by directly forming a wire layer and an insulating layer on the liquid crystal screen, and integrally formed with the liquid crystal screen, which can effectively reduce the thickness of the touch screen, and the manufacturing process is simple, and at the same time It has the advantages of ultra-thin thickness and light weight, and can be applied to touch control of large-size LCD screens and ultra-thin products.

Further, each of the wires is directly formed on the liquid crystal screen in the form of coating.

Further, each of the wires is a transparent wire; or each of the wires is a straight wire.

Another aspect of the present invention provides a method for manufacturing a TDR touch screen, comprising steps:

S1. Depositing ITO: directly depositing ITO film on the surface of the LCD screen;

S2. Coating photoresist: coating a photoresist layer on the ITO film;

S3. Exposure: Place the prefabricated TDR touch screen mask on the ITO film coated with the photoresist layer, and then use ultraviolet rays to irradiate the photoresist surface to partially expose the photoresist; wherein, the TDR There are several parallel and independently distributed wire patterns on the touch screen mask;

S4. Development: Remove the TDR touch screen mask from the ITO film, and use a developer to treat the exposed photoresist surface to dissolve the photoresist in the part irradiated by ultraviolet rays, and keep the unexposed part photoresist layer;

S5, etching: using etching solution to etch away all the ITO films outside the photoresist layer coverage of the unexposed part;

S6, film removal: use a film removal solution to peel off all the photoresist on the corroded ITO film, so that several parallel and independently distributed ITO wires are formed on the surface of the liquid crystal screen;

S7. Coating an insulating layer: covering the surface of the ITO wire with an insulating layer.

As an improvement of the above solution, the etching solution is an acid solution, the stripping solution is a high-concentration alkali solution; the insulating layer is a silicon dioxide film or a PET film.

Compared with the prior art, the manufacturing method of the TDR touch screen provided by the present invention directly forms the wiring layer and It is made of insulating layer and integrated with the LCD screen, which can effectively reduce the thickness of the touch screen. The manufacturing process is simple, and it has the advantages of ultra-thin thickness and light weight. It can be applied to touch control of large-size LCD screens and ultra-thin products. .

Description of drawings

FIG. 1 is a schematic structural diagram of a touch screen of a preferred embodiment of a TDR touch screen provided by the present invention.

Fig. 2a is a schematic cross-sectional structure diagram of a touch screen of a preferred embodiment of the TDR touch screen provided by the present invention.

Fig. 2b is a schematic diagram of the cross-sectional structure of the touch screen of another preferred embodiment of the TDR touch screen provided by the present invention.

Fig. 2c is a schematic diagram of a cross-sectional structure of a touch screen in another preferred embodiment of the TDR touch screen provided by the present invention.

Fig. 3 is a circuit connection block diagram of a preferred embodiment of the TDR touch screen provided by the present invention.

FIG. 4 is an equivalent model diagram of wire impedance of a preferred embodiment of the TDR touch screen provided by the present invention.

Fig. 5 is a schematic diagram of a touch object in contact with the touch screen in a preferred embodiment of the TDR touch screen provided by the present invention.

FIG. 6 is an impedance-time series curve diagram of a non-touch point of a wire provided on the touch screen in a preferred embodiment of the TDR touch screen provided by the present invention.

FIG. 7 is an impedance-timing curve diagram when a wire of a TDR touch screen provided by the present invention has a touch point 8A in a preferred embodiment of the touch screen.

FIG. 8 is an impedance-timing curve diagram of a preferred embodiment of the TDR touch screen provided by the present invention when the wires provided on the touch screen have a touch point 8B.

FIG. 9 is a graph showing a waveform of an injected signal provided at an input end of a wire of the touch screen according to a preferred embodiment of the TDR touch screen provided by the present invention.

FIG. 10 is a flow chart of a preferred embodiment of a method for manufacturing a TDR touch screen provided by the present invention.

FIG. 11 is a flowchart of a specific embodiment of a method for manufacturing a TDR touch screen provided by the present invention.

12a to 12h show corresponding process steps of the manufacturing method of the TDR touch screen in FIG. 11 .

Fig. 13 is a flow chart of a preferred embodiment of a manufacturing method of a TDR touch screen provided by the present invention.

FIG. 14 is a flow chart of a specific embodiment of a method for manufacturing a TDR touch screen provided by the present invention.

15a to 15g show corresponding process steps of the manufacturing method of the TDR touch screen in FIG. 14 .

detailed description

The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

Referring to FIG. 1 to FIG. 2a, FIG. 1 and FIG. 2a are a schematic structural diagram and a cross-sectional view of a touch screen of a preferred embodiment of a TDR touch screen provided by the present invention. The TDR touch screen includes a wire layer 20 disposed on a substrate 10 and an insulating layer 3 disposed on the wire layer 20 . Wherein, the wire layer 20 includes several wires 2 that are parallel and independently distributed.

In another embodiment, as shown in FIG. 2 b , on the basis of FIG. 2 a , the TDR touch screen provided in FIG. 2 b further includes an isolation layer 11 disposed between the substrate 10 and the wire layer 20 . Wherein, the substrate 10 adopts a PET film, because the PET film is not resistant to strong alkali, so when the material of the substrate 10 uses a PET film, it is necessary to cover the surface of the PET film with an acid/alkali-resistant isolation layer 11 (such as : silicon dioxide).

In another embodiment, as shown in FIG. 2c, the TDR touch screen provided is directly formed on the wire layer 20 on the liquid crystal screen 10' and the insulating layer 3 formed on the wire layer 20. Wherein, the wire layer 20 includes several wires 2 that are parallel and independently distributed. As a preferred solution, the wire layer 20 is directly formed on the liquid crystal panel 10' in the form of coating. Each of the wires 2 is a transparent straight wire 2 , and the distance between each of the wires 2 and adjacent wires is equal. It can be seen that compared with the embodiment shown in Figure 2a or Figure 2b, the TDR touch screen shown in Figure 2c is made by directly forming a wire layer and an insulating layer on the liquid crystal screen, and is integrally formed with the liquid crystal screen, which can effectively reduce the touch screen It has the advantages of ultra-thin thickness and light weight, and can be applied to touch control of large-size LCD screens and ultra-thin products.

In the embodiment shown in FIG. 2 a , FIG. 2 b or FIG. 2 c , each of the wires 2 is a transparent straight wire 2 , and the distance between each of the wires 2 and adjacent wires is equal.

As shown in FIG. 1 , the wires 2 together constitute the touch area 1 of the TDR touch screen, that is, the wires 2 that are parallel and independent from each other are distributed on the entire touch area 1 . The TDR touch screen responds to corresponding touch events by sensing the position of the insulating layer on each wire 2 in the touch area 1 touched by the user. Specifically, each wire 2 is made of a transparent and conductive material, such as tin-doped indium oxide (IndiumTinOxide), referred to as ITO; the insulating layer 3 is made of a silicon dioxide film or a PET film.

It can be understood that the distance between two adjacent parallel wires 2 is set according to actual needs, the smaller the distance between two adjacent parallel wires 2 , the greater the amount of calculation, the higher the calculation accuracy, and the more accurate the touch. In the coordinate system constructed on the touch area 1, each wire 2 is set to correspond to a coordinate position in the first direction (for example, Y coordinate direction) of the touch area 1, and each said wire 2 is arranged along the touch area 1. The second direction (for example, the X coordinate direction) extends in parallel, so that by calculating the X coordinate of the position where the impedance changes on each wire, the corresponding touch position can be obtained.

In the following, with reference to FIG. 1 , and FIG. 3 to FIG. 9 , it will be described in detail, for example, the touch operation realized by using the TDR touch screen provided by the embodiment of the present invention.

Referring to FIG. 3 , FIG. 3 is a circuit connection block diagram of the touch screen in this embodiment. In conjunction with Fig. 1, wherein, the input end 21 of each wire 2 is respectively connected to the signal transmitter 4 and the reflected signal detector 5, and the signal transmitter 4 is responsible for transmitting the step signal 101 to the input end 21 of the wire 2, and the reflected signal detector 5 It is responsible for receiving the reflected signal 102 of the input end 21 of the line 2 .

The scan drive circuit 6 is connected to the signal transmitter 4 , and the scan drive circuit 6 drives the signal transmitter 4 to sequentially switch the wire 2 to emit a step signal 101 .

The output end 22 of each wire 2 is connected to one end of the load 7, and the other end of the load 7 is grounded. In addition, in actual implementation, based on the structural principle of the TDR touch screen provided by the present invention, the output end of each wire 2 can also be suspended without a load 7, and the above-mentioned improvements are also within the protection scope of the present invention. According to the TDR principle, in the TDR touch screen of this embodiment, when the output terminal 22 of each wire 2 is terminated with its characteristic impedance (connected to the load 7), there is no signal emission, and the output terminal 22 is not terminated (suspended) ) with a positive signal emission approximately equal in amplitude to the resulting pulse. In this embodiment, the load 7 connected to the output end 22 of each wire 2 has a resistance approximately equal to the characteristic impedance of each wire 2 .

It can be understood that in this embodiment, the input end 21 of each wire 2 can be separately connected (exclusively) to a signal transmitter 4 and a reflected signal detector 5, and each signal transmitter 4 is connected to the scanning drive circuit 6. Each signal transmitter 4 is sequentially driven and controlled by the scanning driving circuit 6 to emit a step signal 101 to the corresponding connected wire 2 , and each reflected signal detector 5 receives the reflected signal 102 of the corresponding connected wire.

In addition, in order to reduce the cost of equipment, the input end 21 of each wire 2 in this embodiment can also be connected (commonly) to a signal transmitter 4 and a reflected signal detector 5, and the scanning drive circuit 6 drives and controls this signal emission. The detector 4 sequentially switches to transmit a step signal 101 to the conductor 2, and the reflection signal detector 5 sequentially receives the reflection signal 102 of the corresponding conductor.

Refer to Fig. 4, Fig. 4 is the impedance equivalent model diagram of each conductor 2, each actual conductor 2 can be expressed as a cascaded transmission line of each equivalent network, which can be equivalent to distributed resistance R, distributed inductance L A combination of T-shaped networks composed of lumped elements such as distributed conductance G and distributed capacitance C. For a wire 2 without loss, the values of distributed resistance R and distributed conductance G are both zero.

Here we take a T-shaped network as an example to illustrate: the relationship between characteristic impedance Z and distributed resistance R, distributed inductance L, distributed conductance G and distributed capacitance C is expressed as the following two formulas:

Formula 1:

Formula 2:

Among them, U is the voltage applied to both ends of the wire, and I is the current passing through the wire. The characteristic impedance can be derived from the above two formulas For a lossless wire: characteristic impedance

Referring to FIG. 5 , FIG. 5 is a schematic diagram of a touch object in contact with the touch screen. When the touch object touches, the touch object is in contact with the surface of the insulating layer 3, the touch object acts as a conductor, and a capacitance is formed between the conductor and the insulation layer 3, so that the distributed capacitance C of the wire 2 changes, and at this time the wire 2 is at the touch point 8 produces an impedance change. The change in impedance causes a portion of the signal to be reflected back to the input end of the wire, the portion of the signal here being referred to as the reflected signal 102 .

Here, the impedance of the wire 2 with no load at the output terminal 22 is taken as an example for illustration: as shown in Figure 6, Figure 7 and Figure 8, Figure 6, Figure 7 and Figure 8 are respectively the impedance of any wire 2 with no touch point and with touch point Impedance-timing curves in three cases of 8A and touch point 8B. Wherein, in FIG. 6 , the curve 111 is the impedance curve of the input terminal 21 , the curve 112 is the impedance curve of the wire 2 , and the curve 113 is the impedance curve of the output terminal 22 suspended. For the contact point 8A and contact point 8B at different positions of the same wire 2, the curve 114 in FIG. 7 is the impedance change curve caused by the touch point 8A, and the curve 115 in FIG. 8 is the impedance change curve caused by the touch point 8B. . Different touch positions on the same wire 2 lead to different time points on the impedance characteristic curve causing impedance changes.

During specific implementation, the input terminal 21 of a plurality of parallel wires 2 is completed the input of the step signal 101 by the signal transmitter 4 and the reception of the reflected signal 102 by the reflected signal detector 5 in turn, and the switching of the wires 2 is completed by the scanning drive circuit 6 .

Next, with reference to FIG. 1 and FIG. 9 , the working principle and working process of how to use the TDR touch screen of this embodiment to realize the touch operation will be described in detail. Referring to FIG. 1 , the first direction and the second direction of the TDR touch screen used in this embodiment are perpendicular to each other; wherein, the first direction is set as the Y-axis direction, and the second direction is set as the X-axis direction.

(1) First, preset the position of each wire 2 in the Y-axis direction, and the preset positions of each wire 2 in sequence from left to right are Y, Y+1, Y+2...Y+n , and each wire 2 extends parallel to the X-axis direction.

(2) The signal transmitter 4 is driven by the scanning driving circuit 6 to transmit the step signal 101 row by row along the Y-axis direction to the input end 21 of each wire 2 according to a preset cycle. At the same time, the reflection signal 102 corresponding to the input end 21 of each wire 2 is sequentially received by the reflection signal detector 5 .

Referring to FIG. 9 , FIG. 9 is a waveform graph of the injected signal at the input end 21 of the wire 2 , the injected signal includes a transmitted signal 101 and a reflected signal 102 , and the curve represents the relationship between voltage amplitude and timing. It can be known from FIG. 9 that the voltage amplitude of the reflected signal is related to the load impedance of the wire 2 .

Specifically, the reflection signal detector 5 determines whether the received reflection signal 102 is the reflection signal 102 generated by the impedance change caused by the normal touch of the touch object through the following steps:

First, the reflection coefficient ρ of the reflection signal 102 received by the reflection signal detector 5 from the conductor 2 is calculated by the following formula (b):

Wherein, V _i is the amplitude of the step signal 101 transmitted from the signal transmitter 4 to the wire 2 , and V _r is the amplitude of the reflected signal 102 received by the reflected signal detector 5 from the wire 2 .

Next, the load impedance Z _L of the reflected signal 102 is calculated by the following formula (a):

Among them, Z ₀ is the characteristic impedance of wire 2.

Comparing the calculated load impedance Z _L with the characteristic impedance Z ₀ , when the difference between the load impedance Z _L and the characteristic impedance Z ₀ is greater than the preset value, it is determined that the difference between the reflected signal 102 and the preset reference signal is greater than preset threshold. This step is to determine that the reflected signal 102 is the reflected signal 102 produced by the impedance change caused by the normal touch of the touch object. , it is necessary to locate the next touch point 8 according to the reflected signal 102 . Specifically include:

Obtain the time delay T from the signal transmitter 4 transmitting the step signal 101 to the input end 21 of the wire 2 where the reflected signal 102 is generated to receiving the transmitted signal 102, and calculate the touch point according to the following distance calculation formula (c) The position of 8 in the X-axis direction of the wire 2:

Among them, D is the position of the touch point in the X-axis direction, e _r is the dielectric constant, and C is the speed of light transmission.

The obtained position D is converted into an X coordinate, and combined with the Y coordinate in the Y axis direction of the wire 2 where the reflected signal 102 is located, the position coordinate point (X, Y) of the touch point 8 is determined. The system can make a corresponding touch response according to the position of the touch point 8 .

During specific implementation, under the driving control of the scanning drive circuit 6, the signal transmitter 4 transmits the step signal 101 to the input end 21 of each wire 2 row by row, and the input end 21 of the corresponding wire 2 is detected by the reflected signal detector 5 at the same time The reflected signal 102.

When the touch object is touched on the touch screen, the impedance of the wire 2 at this point of the touch point 8 changes; the reflection signal detector 5 receives the reflection signal 102 caused by the touch point 8; by calculating the load impedance Z _L of the reflection signal 102 , when the difference between the load impedance Z _L and the preset characteristic impedance Z ₀ exceeds the preset value, the position calculation of the touch point 8 is performed; the step signal 101 is input through the wire 2 where the reflection signal 102 is located until the reflection signal is detected The time delay T of 102 calculates the X coordinate, combines the position of the wire 2 to determine the Y coordinate, and obtains the position of the touch point 8 from the coordinate point (X, Y), thereby realizing the touch function of the entire touch screen,

In this embodiment, the scanning mode adopted by the touch screen is: the scanning driving circuit 6 drives the signal transmitter 4 to transmit the step signal 102 to the input end 21 of each wire 2 row by row along the Y-axis direction.

In addition, on the premise of not departing from the principle of the present invention, in the specific implementation process, the scanning drive circuit 6 in the touch screen provided by the present invention drives the signal transmitter 4 to sequentially transmit the step signal 101 to the input of each wire 2 Terminal 21 can also be realized by the following scanning methods:

First drive the signal transmitter 4 through the scanning drive circuit 6 to transmit the step signal 101 line by line along the Y-axis direction of the touch screen to the input end 21 of each wire 2 located in an odd row; then drive the signal transmitter 4 through the scanning drive circuit 6 along the The Y-axis direction of the touch screen transmits a step signal 101 row by row to the input terminal 21 of each wire 2 located in an even row.

It can be seen that the TDR touch screen of this embodiment has a simple structure, can effectively reduce the thickness of the touch screen, has a simple manufacturing process, and has the advantages of ultra-thin thickness and light weight, and can be applied to touch control of large-sized LCD screens and ultra-thin products. ; Especially the TDR touch screen that directly forms a wire layer on the LCD screen in the form of coating can make the thickness of the touch screen below 1um. In addition, the TDR touch screen provided by the present invention can detect multiple impedance change points in the same time frequency band to realize the functions of multi-touch and scanning the shape of the touch object.

Referring to FIG. 10, this embodiment provides a method for manufacturing a TDR touch screen, the method includes steps S101-S1023:

S101. Provide a substrate;

S102. Provide a wire layer, the wire layer is disposed on the substrate, and the wire layer includes several parallel wires distributed independently of each other;

S103. Provide an insulating layer, the insulating layer is disposed on the wire layer.

In step S101, the substrate 10 is made of a PET film. Since the PET film is not resistant to strong alkali, when the material of the substrate 10 uses a PET film, in this embodiment, it is preferable to cover the surface of the PET film with acid-resistant/ Alkali isolation layer 11 (for example: silicon dioxide).

In step S102 , the wire layer is made of a transparent and conductive material, such as tin-doped indium oxide (IndiumTinOxide), referred to as ITO. Each of the wires is a transparent straight wire, and the distance between each of the wires and adjacent wires is equal.

In step S103, the insulating layer is made of a silicon dioxide film or a PET film.

Next, with reference to Fig. 11, Fig. 12a-12g, Fig. 11 introduces in detail the detailed manufacturing process of a TDR touch screen manufacturing method in this embodiment, including steps S1-S7:

S1. Providing a substrate and covering the substrate with an isolation layer;

During specific implementation, the substrate 10 adopts a PET film. Since the PET film is not resistant to strong alkali, when the material of the substrate 10 uses a PET film, the present embodiment preferably also covers the surface of the PET film that can withstand acid/alkali. The isolation layer 11 (for example: silicon dioxide), as shown in FIG. 12a.

S2. Depositing ITO: depositing an ITO film on the surface of the substrate covered with an isolation layer;

During specific implementation, a layer of ITO film 20' (tin-doped indium oxide) is deposited on the substrate 10 covered with the isolation layer, and its thickness may be about 1um, as shown in Fig. 12b.

S3, coating photoresist: coating a photoresist layer on the ITO film;

During specific implementation, it is necessary to uniformly coat a layer of photoresist 70 on the surface of the ITO film 20', as shown in Figure 12c.

S4, exposure: place the TDR touch screen mask plate that makes in advance on the described ITO film that coats photoresist layer, then use ultraviolet (UV) to irradiate photoresist surface to carry out partial exposure to photoresist; Wherein, The TDR touch screen mask is provided with several parallel and independently distributed wire patterns;

Wherein, the TDR touch screen mask 80 is shown in Figure 12d, the TDR touch screen mask 80 needs to be prefabricated, and the wire pattern on the TDR touch screen mask 80 is designed according to the shape of the final formed wire layer, that is, the TDR touch screen mask The template 80 is provided with several parallel and independently distributed wire patterns.

The TDR touch screen mask plate 80 that is provided with several parallel and independently distributed wire patterns is placed on the ITO film 20' coated with the photoresist layer 70, so that when the ITO film 20' is irradiated with ultraviolet rays (UV) The part of the photoresist layer 70 covered by the wire pattern on the TDR touch screen mask board 80 will not be exposed, while the part of the photoresist layer 70 not covered by the wire pattern on the TDR touch screen mask board 80 will be exposed.

S5. Development: Remove the TDR touch screen mask from the ITO film, and use a developer to treat the exposed photoresist surface to dissolve the photoresist in the part irradiated by ultraviolet rays, and keep the unexposed part photoresist layer;

During specific implementation, after the exposure is completed (making the exposed part of the photoresist layer become photoresist soluble), after the TDR touch screen mask 80 is removed from the ITO film 20', the exposed light is processed with a developer solution. The surface of the resist, that is, the part of the photoresist that is exposed to ultraviolet radiation is dissolved away, thereby retaining the photoresist layer 70a of the unexposed part, and the shape of the photoresist layer 70a of the unexposed part and the TDR touch screen mask The wire pattern of the template is consistent, as shown in Figure 12e.

S6, etching: using etching solution to etch away all the ITO films outside the photoresist layer coverage of the unexposed part;

During specific implementation, acid solution can be utilized as etching solution to etch, because the shape of the photoresist layer 70a of the unexposed part is consistent with the conductor pattern of the TDR touch screen mask plate, so the photoresist layer 70a of the unexposed part is not exposed The part of the ITO film covered by the layer 70a will be exposed, and the exposed part of the ITO film will be etched away with a suitable acid solution, as shown in FIG. 12f.

S7, film removal: use a film removal solution to peel off all the photoresist on the corroded ITO film, so that several parallel and independently distributed ITO wires are formed on the substrate surface;

After etching, the photoresist on the etched ITO film is only slightly etched by the acid solution, and most of the photoresist will remain. At this time, a high-concentration alkali solution (such as NaOH solution) can be used as a stripping solution , peel off all the remaining photoresist on the etched ITO film, so that several parallel and independent ITO wires 20 are formed on the surface of the substrate 10, as shown in FIG. 12g.

S8. Coating an insulating layer: covering the surface of the ITO wire with an insulating layer.

After the photolithography process is completed, the surface of the ITO wire 20 is covered with a silicon dioxide film or a PET film 3, as shown in FIG. 12h, and thus the entire manufacturing process of the TDR touch screen manufacturing method is completed.

It can be seen that the TDR touch screen manufacturing method of this embodiment forms a wire layer and an insulating layer on the substrate through multiple processes of depositing ITO, coating photoresist, exposing, developing, etching, removing the film, and coating the insulating layer, and the manufacturing process is simple. , can effectively reduce the thickness of the touch screen, and has the advantages of ultra-thin thickness and light weight, and can be applied to touch control of large-sized LCD screens and ultra-thin products.

Referring to FIG. 13, this embodiment provides a method for manufacturing a TDR touch screen, the method includes steps S131-S132:

S131. Provide a wire layer, the wire layer is formed on the liquid crystal screen, and the wire layer includes several parallel wires distributed independently of each other;

S132. Provide an insulating layer, where the insulating layer is formed on the wire layer.

In step S131, the wire layer is directly formed on the liquid crystal panel in the form of coating. The wire layer is made of a transparent and conductive material, such as tin-doped indium oxide (IndiumTinOxide), referred to as ITO. Each of the wires is a transparent straight wire, and the distance between each of the wires and adjacent wires is equal.

In step S132, the insulating layer is made of a silicon dioxide film or a PET film.

Next, with reference to Figure 14, Figures 15a-15g, Figure 14 introduces in detail the detailed manufacturing process of a TDR touch screen manufacturing method in this embodiment, including steps S141-S147:

S141, depositing ITO: directly depositing an ITO film on the surface of the liquid crystal screen;

During specific implementation, a layer of ITO film 20' (tin-doped indium oxide) is directly deposited on the glass substrate of the liquid crystal panel 10, and its thickness can be 1um or less, as shown in Figure 15a.

S142, coating photoresist: coating a photoresist layer on the ITO film;

During specific implementation, it is necessary to uniformly coat a layer of photoresist 70 on the surface of the ITO film 20', as shown in Figure 15b.

S143. Exposure: place a prefabricated TDR touch screen mask on the ITO film coated with a photoresist layer, and then use ultraviolet (UV) to irradiate the photoresist surface to partially expose the photoresist; wherein, The TDR touch screen mask is provided with several parallel and independently distributed wire patterns;

Wherein, the TDR touch screen mask 80 is shown in Figure 15c, the TDR touch screen mask 80 needs to be prefabricated, and the wire pattern on the TDR touch screen mask 80 is designed according to the shape of the final formed wire layer, that is, the TDR touch screen mask The template 80 is provided with several parallel and independently distributed wire patterns.

The TDR touch screen mask plate 80 that is provided with several parallel and independently distributed wire patterns is placed on the ITO film 20' coated with the photoresist layer 70, so that when the ITO film 20' is irradiated with ultraviolet rays (UV) The part of the photoresist layer 70 covered by the wire pattern on the TDR touch screen mask board 80 will not be exposed, while the part of the photoresist layer 70 not covered by the wire pattern on the TDR touch screen mask board 80 will be exposed.

S144. Development: remove the TDR touch screen mask from the ITO film, and use a developer to treat the exposed photoresist surface to dissolve the photoresist in the part irradiated by ultraviolet rays, and keep the unexposed part photoresist layer;

During specific implementation, after the exposure is completed (making the exposed part of the photoresist layer become photoresist soluble), after the TDR touch screen mask 80 is removed from the ITO film 20', the exposed light is processed with a developer solution. The surface of the resist, that is, the part of the photoresist that is exposed to ultraviolet radiation is dissolved away, thereby retaining the photoresist layer 70a of the unexposed part, and the shape of the photoresist layer 70a of the unexposed part and the TDR touch screen mask The wire pattern of the template is consistent, as shown in Figure 15d.

S145. Etching: using an etching solution to etch away all the ITO films outside the photoresist layer coverage of the unexposed part;

During specific implementation, acid solution can be utilized as etching solution to etch, because the shape of the photoresist layer 70a of the unexposed part is consistent with the conductor pattern of the TDR touch screen mask plate, so the photoresist layer 70a of the unexposed part is not exposed The part of the ITO film covered by the layer 70a will be exposed, and the exposed part of the ITO film will be etched away with a suitable acid solution, as shown in FIG. 15e.

S146, removing the film: using a film removing solution to peel off all the photoresist on the corroded ITO film, so that a number of parallel and independently distributed ITO wires are formed on the surface of the liquid crystal screen;

After etching, the photoresist on the etched ITO film is only slightly etched by the acid solution, and most of the photoresist will remain. At this time, a high-concentration alkali solution (such as NaOH solution) can be used as a stripping solution , peel off all the remaining photoresist on the etched ITO film, so that several parallel and independent ITO wires 20 are formed on the surface of the liquid crystal panel 10, as shown in FIG. 15f.

S147. Coating an insulating layer: covering the surface of the ITO wire with an insulating layer.

After the photolithography process is completed, the silicon dioxide film or PET film 3 is covered on the surface of the ITO wire 20 , as shown in FIG. 15 g , so far the entire manufacturing process of the TDR touch screen manufacturing method is completed.

It can be seen that the TDR touch screen manufacturing method of this embodiment is made by directly forming a wire layer and an insulating layer on the liquid crystal screen through multiple processes of depositing ITO, coating photoresist, exposing, developing, etching, removing the film, and coating an insulating layer. , integrated with the LCD screen, can effectively reduce the thickness of the touch screen, the manufacturing process is simple, and has the advantages of ultra-thin thickness and light weight, and can be applied to touch control of large-size LCD screens and ultra-thin products.

Another embodiment of the present invention discloses a touch liquid crystal display, comprising: a liquid crystal screen, a wire layer formed on the liquid crystal screen, and an insulating layer formed on the wire layer, and the wire layer includes several The wires are parallel and independently distributed, and the wire layer is directly formed on the liquid crystal screen in the form of coating. The touch liquid crystal display provided by the present invention can effectively reduce the thickness of the touch screen by directly forming a wire layer and an insulating layer on the liquid crystal screen to integrally form the touch screen and the liquid crystal screen, thereby reducing the thickness of the touch liquid crystal display, and the manufacturing process is simple , and has the advantages of ultra-thin thickness and light weight, and can be applied to touch control of large-size LCD screens and ultra-thin products.

The above description is a preferred embodiment of the present invention. It should be pointed out that for those of ordinary skill in the art, without departing from the principle of the present invention, some improvements and deformations can also be made, and these improvements and deformations are also considered Be the protection scope of the present invention.

Claims (10)

1. A method for making a TDR touch screen, comprising: providing a substrate; providing a wire layer, the wire layer is disposed on the substrate, and the wire layer includes a plurality of parallel wires distributed independently of each other; An insulating layer is provided, and the insulating layer is disposed on the wire layer. 2. TDR touch screen manufacturing method according to claim 1, is characterized in that, also comprises: An isolation layer is provided, and the isolation layer is arranged between the substrate and the wire layer; wherein, the substrate is a PET film, and the isolation layer is a silicon dioxide layer. 3. The manufacturing method of TDR touch screen according to claim 1, characterized in that, each said wire is a transparent wire; or Each of the wires is a straight wire. 4. A TDR touch screen manufacturing method is characterized in that, comprising steps: S1. Providing a substrate and covering the substrate with an isolation layer; S2. Depositing ITO: depositing an ITO film on the surface of the substrate covered with an isolation layer; S3, coating photoresist: coating a photoresist layer on the ITO film; S4. Exposure: Place the prefabricated TDR touch screen mask on the ITO film coated with the photoresist layer, and then use ultraviolet rays to irradiate the photoresist surface to partially expose the photoresist; wherein, the TDR There are several parallel and independently distributed wire patterns on the touch screen mask; S5. Development: Remove the TDR touch screen mask from the ITO film, and use a developer to treat the exposed photoresist surface to dissolve the photoresist in the part irradiated by ultraviolet rays, and keep the unexposed part photoresist layer; S6, etching: using etching solution to etch away all the ITO films outside the photoresist layer coverage of the unexposed part; S7, film removal: use a film removal solution to peel off all the photoresist on the corroded ITO film, so that several parallel and independently distributed ITO wires are formed on the substrate surface; S8. Coating an insulating layer: covering the surface of the ITO wire with an insulating layer. 5. TDR touch-screen manufacture method according to claim 4, is characterized in that, described etching solution is acid solution, and described stripper solution is the lye of high concentration; Described insulating layer is silicon dioxide film or PET film . 6. A method for manufacturing a TDR touch screen, comprising: A wire layer is provided, the wire layer is formed on the liquid crystal screen, and the wire layer includes several parallel wires distributed independently of each other; An insulating layer is provided, the insulating layer is formed on the wire layer. 7. The manufacturing method of the TDR touch screen according to claim 6, characterized in that, the wire layer is directly formed on the liquid crystal screen in the form of coating. 8. The manufacturing method of the TDR touch screen according to claim 6, wherein each said wire is a transparent wire; or Each of the wires is a straight wire. 9. A method for manufacturing a TDR touch screen, comprising the steps of: S1. Depositing ITO: directly depositing ITO film on the surface of the LCD screen; S2. Coating photoresist: coating a photoresist layer on the ITO film; S3. Exposure: Place the prefabricated TDR touch screen mask on the ITO film coated with the photoresist layer, and then use ultraviolet rays to irradiate the photoresist surface to partially expose the photoresist; wherein, the TDR There are several parallel and independently distributed wire patterns on the touch screen mask; S4. Development: Remove the TDR touch screen mask from the ITO film, and use a developer to treat the exposed photoresist surface to dissolve the photoresist in the part irradiated by ultraviolet rays, and keep the unexposed part photoresist layer; S5, etching: using etching solution to etch away all the ITO films outside the photoresist layer coverage of the unexposed part; S6, film removal: use a film removal solution to peel off all the photoresist on the corroded ITO film, so that several parallel and independently distributed ITO wires are formed on the surface of the liquid crystal screen; S7. Coating an insulating layer: covering the surface of the ITO wire with an insulating layer. 10. The TDR touch screen manufacturing method according to claim 9, wherein the etching solution is an acid solution, and the stripping solution is a high-concentration lye; the insulating layer is a silicon dioxide film or a PET film .