AU2003263592A1 - Method of manufacturing a solar cell - Google Patents
Method of manufacturing a solar cellInfo
- Publication number
- AU2003263592A1 AU2003263592A1 AU2003263592A AU2003263592A AU2003263592A1 AU 2003263592 A1 AU2003263592 A1 AU 2003263592A1 AU 2003263592 A AU2003263592 A AU 2003263592A AU 2003263592 A AU2003263592 A AU 2003263592A AU 2003263592 A1 AU2003263592 A1 AU 2003263592A1
- Authority
- AU
- Australia
- Prior art keywords
- manufacturing
- solar cell
- solar
- cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
- H10F77/703—Surface textures, e.g. pyramid structures of the semiconductor bodies, e.g. textured active layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002-261888 | 2002-09-06 | ||
| JP2002261888A JP2004103736A (ja) | 2002-09-06 | 2002-09-06 | 太陽電池の製造方法 |
| PCT/JP2003/011203 WO2004023567A2 (fr) | 2002-09-06 | 2003-09-02 | Procede de fabrication de photopiles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| AU2003263592A8 AU2003263592A8 (en) | 2004-03-29 |
| AU2003263592A1 true AU2003263592A1 (en) | 2004-03-29 |
Family
ID=31973143
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2003263592A Abandoned AU2003263592A1 (en) | 2002-09-06 | 2003-09-02 | Method of manufacturing a solar cell |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2004103736A (fr) |
| AU (1) | AU2003263592A1 (fr) |
| WO (1) | WO2004023567A2 (fr) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI267897B (en) * | 2005-11-10 | 2006-12-01 | Tatung Co | Substrate with anti-reflection layer and its manufacturing method |
| KR100964153B1 (ko) * | 2006-11-22 | 2010-06-17 | 엘지전자 주식회사 | 태양전지의 제조방법 및 그에 의해 제조되는 태양전지 |
| JP2009070933A (ja) * | 2007-09-12 | 2009-04-02 | Oji Paper Co Ltd | 単粒子膜エッチングマスクを有する表面微細凹凸構造体形成用基板とその製法及び表面微細凹凸構造体 |
| KR100971658B1 (ko) | 2008-01-03 | 2010-07-22 | 엘지전자 주식회사 | 실리콘 태양전지의 텍스처링 방법 |
| DE112009000924T9 (de) * | 2008-04-17 | 2012-05-16 | Mitsubishi Electric Corp. | Oberflächenaufrauungsverfahren für ein Substrat und Herstellungsverfahren für eine Fotovoltaische Vorrichtung |
| TWI443162B (zh) * | 2008-09-05 | 2014-07-01 | Lg Chemical Ltd | 膠以及使用其製備太陽能電池之方法 |
| KR101160115B1 (ko) * | 2009-05-29 | 2012-06-26 | 주식회사 효성 | 함몰전극형 태양전지의 제조방법 |
| US8992786B2 (en) * | 2010-04-30 | 2015-03-31 | Corning Incorporated | Anti-glare surface and method of making |
| FR2960562B1 (fr) * | 2010-05-31 | 2012-05-25 | Saint Gobain Cristaux Et Detecteurs | Monocristal texture |
| WO2012024676A2 (fr) | 2010-08-20 | 2012-02-23 | First Solar, Inc. | Module photovoltaïque anti-réfléchissant |
| US8658454B2 (en) * | 2010-09-20 | 2014-02-25 | Sunpower Corporation | Method of fabricating a solar cell |
| DE102010044132A1 (de) * | 2010-11-18 | 2012-05-24 | Schott Ag | Solarzelle mit einer homogenen Lichteinfangstruktur und Verfahren zur Herstellung derselben |
| DE102011084346A1 (de) | 2011-10-12 | 2013-04-18 | Schott Solar Ag | Verfahren zur Behandlung von Siliziumwafern, Behandlungsflüssigkeit und Siliziumwafer |
| CN102496660A (zh) * | 2011-12-30 | 2012-06-13 | 常州亿晶光电科技有限公司 | 一种酸碱结合的单晶硅太阳能电池制绒方法 |
| JP5864276B2 (ja) * | 2012-01-11 | 2016-02-17 | 和椿科技股▲フン▼有限公司 | ナノ微細構造の製造方法 |
| CN103762259B (zh) * | 2014-01-21 | 2016-05-04 | 南通大学 | 一种凸透镜型波纹式太阳能电池硅基片及其制造工艺 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4407695A (en) * | 1981-12-31 | 1983-10-04 | Exxon Research And Engineering Co. | Natural lithographic fabrication of microstructures over large areas |
| JPS61108176A (ja) * | 1984-11-01 | 1986-05-26 | Fuji Electric Co Ltd | 粗面化方法 |
| JPH0383339A (ja) * | 1989-08-28 | 1991-04-09 | Sumitomo Electric Ind Ltd | 結晶シリコン表面テクスチヤー形成方法 |
| US6091021A (en) * | 1996-11-01 | 2000-07-18 | Sandia Corporation | Silicon cells made by self-aligned selective-emitter plasma-etchback process |
| JP2000196118A (ja) * | 1998-12-24 | 2000-07-14 | Sanyo Electric Co Ltd | 太陽電池の製造方法 |
-
2002
- 2002-09-06 JP JP2002261888A patent/JP2004103736A/ja active Pending
-
2003
- 2003-09-02 WO PCT/JP2003/011203 patent/WO2004023567A2/fr not_active Ceased
- 2003-09-02 AU AU2003263592A patent/AU2003263592A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| AU2003263592A8 (en) | 2004-03-29 |
| WO2004023567A3 (fr) | 2005-01-13 |
| WO2004023567A2 (fr) | 2004-03-18 |
| JP2004103736A (ja) | 2004-04-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |