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AU2003263592A1 - Method of manufacturing a solar cell - Google Patents

Method of manufacturing a solar cell

Info

Publication number
AU2003263592A1
AU2003263592A1 AU2003263592A AU2003263592A AU2003263592A1 AU 2003263592 A1 AU2003263592 A1 AU 2003263592A1 AU 2003263592 A AU2003263592 A AU 2003263592A AU 2003263592 A AU2003263592 A AU 2003263592A AU 2003263592 A1 AU2003263592 A1 AU 2003263592A1
Authority
AU
Australia
Prior art keywords
manufacturing
solar cell
solar
cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003263592A
Other versions
AU2003263592A8 (en
Inventor
Makiko Emoto
Naoki Ishikawa
Takahiro Mishima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of AU2003263592A8 publication Critical patent/AU2003263592A8/en
Publication of AU2003263592A1 publication Critical patent/AU2003263592A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/70Surface textures, e.g. pyramid structures
    • H10F77/703Surface textures, e.g. pyramid structures of the semiconductor bodies, e.g. textured active layers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photovoltaic Devices (AREA)
AU2003263592A 2002-09-06 2003-09-02 Method of manufacturing a solar cell Abandoned AU2003263592A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-261888 2002-09-06
JP2002261888A JP2004103736A (en) 2002-09-06 2002-09-06 Solar cell manufacturing method
PCT/JP2003/011203 WO2004023567A2 (en) 2002-09-06 2003-09-02 Method of manufacturing a solar cell

Publications (2)

Publication Number Publication Date
AU2003263592A8 AU2003263592A8 (en) 2004-03-29
AU2003263592A1 true AU2003263592A1 (en) 2004-03-29

Family

ID=31973143

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003263592A Abandoned AU2003263592A1 (en) 2002-09-06 2003-09-02 Method of manufacturing a solar cell

Country Status (3)

Country Link
JP (1) JP2004103736A (en)
AU (1) AU2003263592A1 (en)
WO (1) WO2004023567A2 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI267897B (en) * 2005-11-10 2006-12-01 Tatung Co Substrate with anti-reflection layer and its manufacturing method
KR100964153B1 (en) * 2006-11-22 2010-06-17 엘지전자 주식회사 Method for manufacturing solar cell and solar cell manufactured thereby
JP2009070933A (en) * 2007-09-12 2009-04-02 Oji Paper Co Ltd Surface fine concavo-convex structure forming substrate having single particle film etching mask, method for producing the same, and surface fine concavo-convex structure
KR100971658B1 (en) 2008-01-03 2010-07-22 엘지전자 주식회사 Texturing Methods of Silicon Solar Cells
DE112009000924T9 (en) * 2008-04-17 2012-05-16 Mitsubishi Electric Corp. A surface roughening method for a substrate and a method of manufacturing a photovoltaic device
TWI443162B (en) * 2008-09-05 2014-07-01 Lg Chemical Ltd Glue and method of preparing solar cell using same
KR101160115B1 (en) * 2009-05-29 2012-06-26 주식회사 효성 A fabricating method of buried contact solar cell
US8992786B2 (en) * 2010-04-30 2015-03-31 Corning Incorporated Anti-glare surface and method of making
FR2960562B1 (en) * 2010-05-31 2012-05-25 Saint Gobain Cristaux Et Detecteurs MONOCRYSTAL TEXTURE
WO2012024676A2 (en) 2010-08-20 2012-02-23 First Solar, Inc. Anti-reflective photovoltaic module
US8658454B2 (en) * 2010-09-20 2014-02-25 Sunpower Corporation Method of fabricating a solar cell
DE102010044132A1 (en) * 2010-11-18 2012-05-24 Schott Ag Method for applying structure in surface of silicon wafer, involves applying mask base material to surface of solar cell, coating selected pattern with plunger, and contacting liquid etching medium with etching mask
DE102011084346A1 (en) 2011-10-12 2013-04-18 Schott Solar Ag Process for treating silicon wafers, treatment liquid and silicon wafers
CN102496660A (en) * 2011-12-30 2012-06-13 常州亿晶光电科技有限公司 Acid-base combined monocrystalline silicon solar cell texturing method
JP5864276B2 (en) * 2012-01-11 2016-02-17 和椿科技股▲フン▼有限公司 Manufacturing method of nano microstructure
CN103762259B (en) * 2014-01-21 2016-05-04 南通大学 A kind of corrugated solar cell silicon chip of lenticular lens type and manufacturing process thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4407695A (en) * 1981-12-31 1983-10-04 Exxon Research And Engineering Co. Natural lithographic fabrication of microstructures over large areas
JPS61108176A (en) * 1984-11-01 1986-05-26 Fuji Electric Co Ltd Roughening method
JPH0383339A (en) * 1989-08-28 1991-04-09 Sumitomo Electric Ind Ltd Crystalline silicon surface texture formation method
US6091021A (en) * 1996-11-01 2000-07-18 Sandia Corporation Silicon cells made by self-aligned selective-emitter plasma-etchback process
JP2000196118A (en) * 1998-12-24 2000-07-14 Sanyo Electric Co Ltd Manufacture of solar battery

Also Published As

Publication number Publication date
AU2003263592A8 (en) 2004-03-29
WO2004023567A3 (en) 2005-01-13
WO2004023567A2 (en) 2004-03-18
JP2004103736A (en) 2004-04-02

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase