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AU2001292783A1 - Antireflective composition - Google Patents

Antireflective composition

Info

Publication number
AU2001292783A1
AU2001292783A1 AU2001292783A AU9278301A AU2001292783A1 AU 2001292783 A1 AU2001292783 A1 AU 2001292783A1 AU 2001292783 A AU2001292783 A AU 2001292783A AU 9278301 A AU9278301 A AU 9278301A AU 2001292783 A1 AU2001292783 A1 AU 2001292783A1
Authority
AU
Australia
Prior art keywords
antireflective composition
antireflective
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001292783A
Inventor
Manuel Docanto
Robert H. Gore
Anthony Zampini
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials International LLC
Original Assignee
Shipley Co LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co LLC filed Critical Shipley Co LLC
Publication of AU2001292783A1 publication Critical patent/AU2001292783A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/254—Polymeric or resinous material

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
AU2001292783A 2000-09-19 2001-09-19 Antireflective composition Abandoned AU2001292783A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US23351700P 2000-09-19 2000-09-19
US60233517 2000-09-19
US60/233,517 2000-09-19
PCT/US2001/029243 WO2002025374A2 (en) 2000-09-19 2001-09-19 Antireflective composition

Publications (1)

Publication Number Publication Date
AU2001292783A1 true AU2001292783A1 (en) 2002-04-02

Family

ID=22877568

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001292783A Abandoned AU2001292783A1 (en) 2000-09-19 2001-09-19 Antireflective composition

Country Status (9)

Country Link
US (1) US6503689B2 (en)
EP (1) EP1319197B1 (en)
JP (1) JP4772268B2 (en)
KR (1) KR100828313B1 (en)
CN (1) CN1316315C (en)
AU (1) AU2001292783A1 (en)
DE (1) DE60128818T2 (en)
TW (1) TWI281940B (en)
WO (1) WO2002025374A2 (en)

Families Citing this family (63)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5939236A (en) 1997-02-07 1999-08-17 Shipley Company, L.L.C. Antireflective coating compositions comprising photoacid generators
US20040161735A1 (en) * 1998-11-24 2004-08-19 The University Of Queensland Cryopreservation of oocytes and embryos and methods for producing animals involving the same
TW556047B (en) 2000-07-31 2003-10-01 Shipley Co Llc Coated substrate, method for forming photoresist relief image, and antireflective composition
TW588072B (en) 2000-10-10 2004-05-21 Shipley Co Llc Antireflective porogens
JP4117871B2 (en) * 2000-11-09 2008-07-16 東京応化工業株式会社 Anti-reflection film forming composition
US7132219B2 (en) * 2001-02-02 2006-11-07 Brewer Science Inc. Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
US6927266B2 (en) * 2001-02-22 2005-08-09 Nissan Chemical Industries, Ltd. Bottom anti-reflective coat forming composition for lithography
US6903175B2 (en) * 2001-03-26 2005-06-07 Shipley Company, L.L.C. Polymer synthesis and films therefrom
TW576859B (en) * 2001-05-11 2004-02-21 Shipley Co Llc Antireflective coating compositions
TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
US8012670B2 (en) 2002-04-11 2011-09-06 Rohm And Haas Electronic Materials Llc Photoresist systems
US6730454B2 (en) * 2002-04-16 2004-05-04 International Business Machines Corporation Antireflective SiO-containing compositions for hardmask layer
US6852474B2 (en) * 2002-04-30 2005-02-08 Brewer Science Inc. Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
KR100478982B1 (en) * 2002-05-02 2005-03-25 금호석유화학 주식회사 New acid generator and thin film composition containing the compound
EP1521797A4 (en) * 2002-07-11 2006-12-20 Ibm Antireflective silicon-containing compositions as hardmask layer
JP4487489B2 (en) * 2002-09-20 2010-06-23 三菱電機株式会社 Embedding material and manufacturing method of semiconductor integrated circuit using the embedding material
US20040067437A1 (en) * 2002-10-06 2004-04-08 Shipley Company, L.L.C. Coating compositions for use with an overcoated photoresist
US7501230B2 (en) * 2002-11-04 2009-03-10 Meagley Robert P Photoactive adhesion promoter
KR20040044368A (en) * 2002-11-20 2004-05-28 쉬플리 캄파니, 엘.엘.씨. Multilayer photoresist systems
EP1422565A3 (en) * 2002-11-20 2005-01-05 Shipley Company LLC Multilayer photoresist systems
US7238462B2 (en) * 2002-11-27 2007-07-03 Tokyo Ohka Kogyo Co., Ltd. Undercoating material for wiring, embedded material, and wiring formation method
GB2400245B (en) * 2003-04-01 2005-09-28 Power Gems Ltd Ignition system for a high-frequency high-intensity discharge lamp system
JP4105036B2 (en) * 2003-05-28 2008-06-18 信越化学工業株式会社 Resist underlayer film material and pattern forming method
US20040242759A1 (en) * 2003-05-30 2004-12-02 Bhave Mandar R. Bottom anti-reflective coating compositions comprising silicon containing polymers to improve adhesion towards photoresists
US6780736B1 (en) * 2003-06-20 2004-08-24 International Business Machines Corporation Method for image reversal of implant resist using a single photolithography exposure and structures formed thereby
US20050015611A1 (en) * 2003-06-30 2005-01-20 Poisner David I. Trusted peripheral mechanism
US7361447B2 (en) * 2003-07-30 2008-04-22 Hynix Semiconductor Inc. Photoresist polymer and photoresist composition containing the same
US20050074688A1 (en) * 2003-10-03 2005-04-07 Toukhy Medhat A. Bottom antireflective coatings
KR100697511B1 (en) 2003-10-21 2007-03-20 삼성전자주식회사 Photocurable semiconductor nanocrystals, compositions for semiconductor nanocrystal pattern formation, and pattern formation methods of semiconductor nanocrystals using the same
US7361455B2 (en) * 2004-03-31 2008-04-22 Intel Corporation Anti-reflective coatings
US20070207406A1 (en) * 2004-04-29 2007-09-06 Guerrero Douglas J Anti-reflective coatings using vinyl ether crosslinkers
US20050255410A1 (en) * 2004-04-29 2005-11-17 Guerrero Douglas J Anti-reflective coatings using vinyl ether crosslinkers
US7320855B2 (en) * 2004-11-03 2008-01-22 International Business Machines Corporation Silicon containing TARC/barrier layer
EP1691238A3 (en) 2005-02-05 2009-01-21 Rohm and Haas Electronic Materials, L.L.C. Coating compositions for use with an overcoated photoresist
TWI340296B (en) * 2005-03-20 2011-04-11 Rohm & Haas Elect Mat Coating compositions for use with an overcoated photoresist
US7326442B2 (en) * 2005-07-14 2008-02-05 International Business Machines Corporation Antireflective composition and process of making a lithographic structure
US20070015082A1 (en) * 2005-07-14 2007-01-18 International Business Machines Corporation Process of making a lithographic structure using antireflective materials
US8137895B2 (en) * 2005-08-09 2012-03-20 Taiwan Semiconductor Manufacturing Company, Ltd. Structure and method for improving photoresist pattern adhesion
US7544750B2 (en) * 2005-10-13 2009-06-09 International Business Machines Corporation Top antireflective coating composition with low refractive index at 193nm radiation wavelength
US7485573B2 (en) * 2006-02-17 2009-02-03 International Business Machines Corporation Process of making a semiconductor device using multiple antireflective materials
US20070231736A1 (en) * 2006-03-28 2007-10-04 Chen Kuang-Jung J Bottom antireflective coating composition and method for use thereof
US7563563B2 (en) * 2006-04-18 2009-07-21 International Business Machines Corporation Wet developable bottom antireflective coating composition and method for use thereof
US20070275330A1 (en) * 2006-05-25 2007-11-29 International Business Machines Corporation Bottom anti-reflective coating
US7816069B2 (en) * 2006-06-23 2010-10-19 International Business Machines Corporation Graded spin-on organic antireflective coating for photolithography
US7914974B2 (en) 2006-08-18 2011-03-29 Brewer Science Inc. Anti-reflective imaging layer for multiple patterning process
JP2008129080A (en) * 2006-11-16 2008-06-05 Az Electronic Materials Kk Composition for top antireflection film and pattern forming method using the same
US20120237730A1 (en) * 2006-12-14 2012-09-20 Metin Sitti Dry adhesives and methods for making dry adhesives
US8153346B2 (en) * 2007-02-23 2012-04-10 Fujifilm Electronic Materials, U.S.A., Inc. Thermally cured underlayer for lithographic application
JP4786636B2 (en) * 2007-12-26 2011-10-05 Ａｚエレクトロニックマテリアルズ株式会社 Antireflection film forming composition and pattern forming method using the same
KR101647158B1 (en) 2008-01-29 2016-08-09 브레우어 사이언스 인코포레이션 On-track process for patterning hardmask by multiple dark field exposures
KR20110096063A (en) 2008-12-10 2011-08-26 다우 코닝 코포레이션 Silsesquioxane Resin
WO2010068338A1 (en) * 2008-12-10 2010-06-17 Dow Corning Corporation Switchable antireflective coatings
JP5632387B2 (en) * 2008-12-10 2014-11-26 ダウ コーニング コーポレーションＤｏｗ Ｃｏｒｎｉｎｇ Ｃｏｒｐｏｒａｔｉｏｎ Wet-etchable anti-reflection coating
US9640396B2 (en) 2009-01-07 2017-05-02 Brewer Science Inc. Spin-on spacer materials for double- and triple-patterning lithography
KR20120101534A (en) * 2009-12-14 2012-09-13 닛산 가가쿠 고교 가부시키 가이샤 Composition for formation of resist underlayer film
KR101915138B1 (en) * 2010-10-21 2018-11-06 닛산 가가쿠 가부시키가이샤 Composition for forming overlaying film for resist for euv lithography
US9343324B2 (en) * 2011-07-07 2016-05-17 Nissan Chemical Industries, Ltd. Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin
JP5516557B2 (en) * 2011-12-06 2014-06-11 信越化学工業株式会社 Resist protective film material and pattern forming method
JP5846046B2 (en) * 2011-12-06 2016-01-20 信越化学工業株式会社 Resist protective film material and pattern forming method
JP2013254109A (en) * 2012-06-07 2013-12-19 Az Electronic Materials Mfg Co Ltd Overlay film forming composition and resist pattern formation method using same
US9761449B2 (en) 2013-12-30 2017-09-12 Taiwan Semiconductor Manufacturing Company, Ltd. Gap filling materials and methods
TWI592760B (en) * 2014-12-30 2017-07-21 羅門哈斯電子材料韓國有限公司 Coating compositions for use with an overcoated photoresist
KR102447682B1 (en) 2015-05-29 2022-09-27 삼성전자주식회사 Methods of forming coating layer, plasma treatment apparatus and methods of forming patterns

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57145101A (en) * 1980-12-30 1982-09-08 Nat Res Dev Polymerization
JPH07104601B2 (en) * 1987-04-06 1995-11-13 三菱製紙株式会社 Planographic printing material for back baking
JP2727137B2 (en) * 1991-03-19 1998-03-11 富士写真フイルム株式会社 Photosensitive transfer material and multicolor image forming method
JP3057579B2 (en) * 1991-03-20 2000-06-26 富士通株式会社 Exposure data creation method and apparatus
JPH07253674A (en) * 1994-03-14 1995-10-03 Shin Etsu Chem Co Ltd Anti-reflection film material
JPH07261401A (en) * 1994-03-23 1995-10-13 Japan Synthetic Rubber Co Ltd Printing plate material
JPH0943839A (en) * 1995-05-25 1997-02-14 Japan Synthetic Rubber Co Ltd Composition for forming antireflection film
US5939236A (en) * 1997-02-07 1999-08-17 Shipley Company, L.L.C. Antireflective coating compositions comprising photoacid generators
JP3719811B2 (en) * 1997-03-27 2005-11-24 ソマール株式会社 Antireflection film
JP3202649B2 (en) * 1997-04-17 2001-08-27 日本電気株式会社 Material for forming antireflection film and method for manufacturing semiconductor device using the same
US5919599A (en) 1997-09-30 1999-07-06 Brewer Science, Inc. Thermosetting anti-reflective coatings at deep ultraviolet
JP3965740B2 (en) * 1997-10-24 2007-08-29 旭硝子株式会社 Coating composition
US6190839B1 (en) 1998-01-15 2001-02-20 Shipley Company, L.L.C. High conformality antireflective coating compositions
US6287745B1 (en) 1998-02-18 2001-09-11 Dsm N.V. Photocurable liquid resin composition comprising an epoxy-branched alicyclic compound
US6166855A (en) * 1998-06-05 2000-12-26 Fuji Photo Film Co., Ltd. Anti-reflection film and display device having the same
JP3539215B2 (en) * 1998-06-22 2004-07-07 Ｊｓｒ株式会社 Electrode forming method and transfer film used therefor
JP2000081699A (en) * 1998-09-04 2000-03-21 Konica Corp Medical dry film
US20020102483A1 (en) * 1998-09-15 2002-08-01 Timothy Adams Antireflective coating compositions
JP3928278B2 (en) * 1998-11-16 2007-06-13 Ｊｓｒ株式会社 Anti-reflective film forming composition
US6316165B1 (en) * 1999-03-08 2001-11-13 Shipley Company, L.L.C. Planarizing antireflective coating compositions
JP3048569B1 (en) * 1999-03-08 2000-06-05 理化学研究所 Neutron beam control device and neutron energy measurement device
US6251521B1 (en) * 1999-08-09 2001-06-26 3M Innovative Properties Company Polymeric compositions

Also Published As

Publication number Publication date
TWI281940B (en) 2007-06-01
WO2002025374A3 (en) 2002-07-11
US20020076642A1 (en) 2002-06-20
KR20040004375A (en) 2004-01-13
CN1628269A (en) 2005-06-15
EP1319197B1 (en) 2007-06-06
JP2004511006A (en) 2004-04-08
WO2002025374A2 (en) 2002-03-28
DE60128818D1 (en) 2007-07-19
CN1316315C (en) 2007-05-16
US6503689B2 (en) 2003-01-07
KR100828313B1 (en) 2008-05-08
DE60128818T2 (en) 2008-02-07
JP4772268B2 (en) 2011-09-14
EP1319197A2 (en) 2003-06-18

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