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AU2001288228A1 - Multiple-source arrays for confocal and near-field microscopy - Google Patents

Multiple-source arrays for confocal and near-field microscopy

Info

Publication number
AU2001288228A1
AU2001288228A1 AU2001288228A AU8822801A AU2001288228A1 AU 2001288228 A1 AU2001288228 A1 AU 2001288228A1 AU 2001288228 A AU2001288228 A AU 2001288228A AU 8822801 A AU8822801 A AU 8822801A AU 2001288228 A1 AU2001288228 A1 AU 2001288228A1
Authority
AU
Australia
Prior art keywords
confocal
source arrays
field microscopy
microscopy
arrays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001288228A
Inventor
Kyle B. Ferrio
Henry Allen Hill
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zetetic Institute
Original Assignee
Zetetic Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zetetic Institute filed Critical Zetetic Institute
Publication of AU2001288228A1 publication Critical patent/AU2001288228A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/18SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
    • G01Q60/22Probes, their manufacture, or their related instrumentation, e.g. holders
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00Methods or apparatus for measurement or analysis of nanostructures
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/0004Microscopes specially adapted for specific applications
    • G02B21/002Scanning microscopes
    • G02B21/0024Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0032Optical details of illumination, e.g. light-sources, pinholes, beam splitters, slits, fibers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Biophysics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microscoopes, Condenser (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
AU2001288228A 2000-07-27 2001-07-27 Multiple-source arrays for confocal and near-field microscopy Abandoned AU2001288228A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US22101900P 2000-07-27 2000-07-27
US60/221,019 2000-07-27
PCT/US2001/023746 WO2002010830A2 (en) 2000-07-27 2001-07-27 Multiple-source arrays for confocal and near-field microscopy

Publications (1)

Publication Number Publication Date
AU2001288228A1 true AU2001288228A1 (en) 2002-02-13

Family

ID=22826000

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001288228A Abandoned AU2001288228A1 (en) 2000-07-27 2001-07-27 Multiple-source arrays for confocal and near-field microscopy

Country Status (5)

Country Link
US (1) US20020074493A1 (en)
EP (1) EP1303780A2 (en)
JP (1) JP2004505257A (en)
AU (1) AU2001288228A1 (en)
WO (1) WO2002010830A2 (en)

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JP2006522339A (en) * 2003-04-01 2006-09-28 ゼテテック インスティテュート Apparatus and method for simultaneous measurement of orthogonally polarized beam fields scattered / reflected or transmitted by interferometric objects
JP2006522371A (en) 2003-04-01 2006-09-28 ゼテテック インスティテュート Method for constructing a catadioptric optical lens system
EP1608933A4 (en) * 2003-04-03 2007-03-21 Zetetic Inst APPARATUS AND METHOD FOR MEASURING FIELDS OF BACK-UP AND FRONT-DIFFUSING BEAMS / REFLECTED BY INTERFEROMETRY OBJECT
WO2005008214A2 (en) * 2003-07-07 2005-01-27 Zetetic Institute Apparatus and method for ellipsometric measurements with high spatial resolution
WO2005008334A2 (en) 2003-07-07 2005-01-27 Zetetic Institute Apparatus and method for high speed scan for detection and measurement of properties of sub-wavelength defects and artifacts in semiconductor and mask metrology
WO2005026810A2 (en) * 2003-09-10 2005-03-24 Zetetic Institute Catoptric and catadioptric imaging systems with adaptive catoptric surfaces
WO2005031397A2 (en) * 2003-09-26 2005-04-07 Zetetic Institute Catoptric and catadioptric imaging systems with pellicle and aperture-array beam-splitters and non-adaptive and adaptive catoptric surfaces
JP4347009B2 (en) * 2003-09-26 2009-10-21 キヤノン株式会社 Near-field light generation method, near-field exposure mask, near-field exposure method, near-field exposure apparatus, near-field light head
WO2005033747A2 (en) * 2003-10-01 2005-04-14 Zetetic Institute Method and apparatus for enhanced resolution of high spatial frequency components of images using standing wave beams in non-interferometric and interferometric microscopy
TW200538703A (en) 2004-05-06 2005-12-01 Zetetic Inst Apparatus and methods for measurement of critical dimensions of features and detection of defects in UV, VUV, and EUV lithography masks
TW200538704A (en) * 2004-05-21 2005-12-01 Zetetic Inst Apparatus and methods for overlay, alignment mark, and critical dimension metrologies based on optical interferometry
US7161680B2 (en) * 2004-08-16 2007-01-09 Zetetic Institute Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry
WO2006023612A2 (en) * 2004-08-19 2006-03-02 Zetetic Institute Sub-nanometer overlay, critical dimension, and lithography tool projection optic metrology systems based on measurement of exposure induced changes in photoresist on wafers
WO2006034065A2 (en) * 2004-09-20 2006-03-30 Zetetic Institute Catoptric imaging systems comprising pellicle and/or aperture-array beam-splitters and non-adaptive and /or adaptive catoptric surfaces
US8143601B2 (en) 2007-08-14 2012-03-27 Massachusetts Institute Of Technology Nanoscale imaging via absorption modulation
WO2016146411A1 (en) * 2015-03-19 2016-09-22 Koninklijke Philips N.V. Illumination in digital pathology scanning

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Also Published As

Publication number Publication date
WO2002010830A2 (en) 2002-02-07
JP2004505257A (en) 2004-02-19
US20020074493A1 (en) 2002-06-20
EP1303780A2 (en) 2003-04-23
WO2002010830A3 (en) 2003-02-13

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