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AU2001281381A1 - Bonded wafer optical mems process - Google Patents

Bonded wafer optical mems process

Info

Publication number
AU2001281381A1
AU2001281381A1 AU2001281381A AU8138101A AU2001281381A1 AU 2001281381 A1 AU2001281381 A1 AU 2001281381A1 AU 2001281381 A AU2001281381 A AU 2001281381A AU 8138101 A AU8138101 A AU 8138101A AU 2001281381 A1 AU2001281381 A1 AU 2001281381A1
Authority
AU
Australia
Prior art keywords
bonded wafer
mems process
optical mems
wafer optical
bonded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001281381A
Other languages
English (en)
Inventor
Timothy J. Brosnihan
Michael W. Judy
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Analog Devices Inc
Original Assignee
Analog Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Analog Devices Inc filed Critical Analog Devices Inc
Publication of AU2001281381A1 publication Critical patent/AU2001281381A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00134Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
    • B81C1/00142Bridges
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00222Integrating an electronic processing unit with a micromechanical structure
    • B81C1/00246Monolithic integration, i.e. micromechanical structure and electronic processing unit are integrated on the same substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00Specific applications of microelectromechanical systems
    • B81B2201/04Optical MEMS
    • B81B2201/042Micromirrors, not used as optical switches
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00Basic microelectromechanical structures
    • B81B2203/03Static structures
    • B81B2203/0323Grooves
    • B81B2203/033Trenches
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0102Surface micromachining
    • B81C2201/0105Sacrificial layer
    • B81C2201/0109Sacrificial layers not provided for in B81C2201/0107 - B81C2201/0108
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0128Processes for removing material
    • B81C2201/013Etching
    • B81C2201/0135Controlling etch progression
    • B81C2201/014Controlling etch progression by depositing an etch stop layer, e.g. silicon nitride, silicon oxide, metal

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Micromachines (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
AU2001281381A 2000-08-03 2001-08-03 Bonded wafer optical mems process Abandoned AU2001281381A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US22275100P 2000-08-03 2000-08-03
US60222751 2000-08-03
PCT/US2001/041523 WO2002012116A2 (fr) 2000-08-03 2001-08-03 Procede de fabrication de systemes microelectromecaniques optiques a plaquette liee

Publications (1)

Publication Number Publication Date
AU2001281381A1 true AU2001281381A1 (en) 2002-02-18

Family

ID=22833522

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001281381A Abandoned AU2001281381A1 (en) 2000-08-03 2001-08-03 Bonded wafer optical mems process

Country Status (3)

Country Link
US (1) US7083997B2 (fr)
AU (1) AU2001281381A1 (fr)
WO (1) WO2002012116A2 (fr)

Families Citing this family (111)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7550794B2 (en) * 2002-09-20 2009-06-23 Idc, Llc Micromechanical systems device comprising a displaceable electrode and a charge-trapping layer
US7297471B1 (en) 2003-04-15 2007-11-20 Idc, Llc Method for manufacturing an array of interferometric modulators
US6969635B2 (en) 2000-12-07 2005-11-29 Reflectivity, Inc. Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates
US7307775B2 (en) * 2000-12-07 2007-12-11 Texas Instruments Incorporated Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates
US6995034B2 (en) 2000-12-07 2006-02-07 Reflectivity, Inc Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates
US6794119B2 (en) 2002-02-12 2004-09-21 Iridigm Display Corporation Method for fabricating a structure for a microelectromechanical systems (MEMS) device
WO2003068669A1 (fr) * 2002-02-14 2003-08-21 Silex Microsystems Ab Microstructure bequillable et procede de fabrication associe au moyen de liaison de plaquettes
US6861341B2 (en) 2002-02-22 2005-03-01 Xerox Corporation Systems and methods for integration of heterogeneous circuit devices
US7203393B2 (en) * 2002-03-08 2007-04-10 Movaz Networks, Inc. MEMS micro mirrors driven by electrodes fabricated on another substrate
US6912336B2 (en) * 2002-03-15 2005-06-28 Nippon Telegraph And Telephone Corporation Optical switch device
US20050227428A1 (en) * 2002-03-20 2005-10-13 Mihai Ionescu A Process for manufacturing mems
US6992810B2 (en) * 2002-06-19 2006-01-31 Miradia Inc. High fill ratio reflective spatial light modulator with hidden hinge
DE10235371A1 (de) * 2002-08-02 2004-02-12 Robert Bosch Gmbh Verfahren zur Herstellung einer mikromechanischen Vorrichtung, insbesondere einer mikromechanischen Schwingspiegelvorrichtung
US7781850B2 (en) 2002-09-20 2010-08-24 Qualcomm Mems Technologies, Inc. Controlling electromechanical behavior of structures within a microelectromechanical systems device
US7405860B2 (en) 2002-11-26 2008-07-29 Texas Instruments Incorporated Spatial light modulators with light blocking/absorbing areas
US20040104444A1 (en) * 2002-12-03 2004-06-03 Wachtmann Bruce K MEMS device with alternative electrical connections
US7906359B2 (en) * 2002-12-03 2011-03-15 Analog Devices, Inc. Method of forming a surface micromachined MEMS device
US7122872B2 (en) * 2003-05-20 2006-10-17 Lucent Technologies Inc. Control of stress in metal films by controlling the atmosphere during film deposition
US6933004B2 (en) * 2003-05-20 2005-08-23 Lucent Technologies Inc. Control of stress in metal films by controlling the temperature during film deposition
US20040232535A1 (en) * 2003-05-22 2004-11-25 Terry Tarn Microelectromechanical device packages with integral heaters
TW570896B (en) 2003-05-26 2004-01-11 Prime View Int Co Ltd A method for fabricating an interference display cell
WO2004109363A1 (fr) * 2003-06-02 2004-12-16 Miradia Inc. Modulateur spatial de lumiere reflectif a taux de remplissage eleve comprenant une charniere dissimulee
US6964894B2 (en) * 2003-06-23 2005-11-15 Analog Devices, Inc. Apparatus and method of forming a device layer
US7221495B2 (en) 2003-06-24 2007-05-22 Idc Llc Thin film precursor stack for MEMS manufacturing
FR2857002B1 (fr) * 2003-07-04 2005-10-21 Commissariat Energie Atomique Procede de desolidarisation d'une couche utile et composant obtenu par ce procede
DE60320391D1 (de) * 2003-07-04 2008-05-29 St Microelectronics Srl Herstellungsverfahren für eine Halbleitervorrichtung mit einem hängenden Mikrosystem und entsprechende Vorrichtung
US20050054133A1 (en) * 2003-09-08 2005-03-10 Felton Lawrence E. Wafer level capped sensor
US7275424B2 (en) * 2003-09-08 2007-10-02 Analog Devices, Inc. Wafer level capped sensor
TW593126B (en) * 2003-09-30 2004-06-21 Prime View Int Co Ltd A structure of a micro electro mechanical system and manufacturing the same
US6914709B2 (en) * 2003-10-02 2005-07-05 Hewlett-Packard Development Company, L.P. MEMS device and method of forming MEMS device
US20050093134A1 (en) * 2003-10-30 2005-05-05 Terry Tarn Device packages with low stress assembly process
JP2005262686A (ja) * 2004-03-18 2005-09-29 Ricoh Co Ltd アクチュエータ、液滴吐出ヘッド、インクカートリッジ、インクジェット記録装置、マイクロポンプ、光変調デバイス、基板
JP4386002B2 (ja) * 2004-07-06 2009-12-16 株式会社デンソー 半導体力学量センサの製造方法
US7183215B2 (en) * 2004-07-21 2007-02-27 Hewlett-Packard Development Company, L.P. Etching with electrostatically attracted ions
KR101354520B1 (ko) 2004-07-29 2014-01-21 퀄컴 엠이엠에스 테크놀로지스, 인크. 간섭 변조기의 미소기전 동작을 위한 시스템 및 방법
US7429334B2 (en) 2004-09-27 2008-09-30 Idc, Llc Methods of fabricating interferometric modulators by selectively removing a material
US20060066932A1 (en) * 2004-09-27 2006-03-30 Clarence Chui Method of selective etching using etch stop layer
US7492502B2 (en) 2004-09-27 2009-02-17 Idc, Llc Method of fabricating a free-standing microstructure
DE102005001104B3 (de) * 2005-01-08 2006-02-09 X-Fab Semiconductor Foundries Ag Verfahren und Anordnung zur elektrischen Bestimmung der Verbindungsqualität gebondeter Scheibenverbindungen
DE102005002304B4 (de) * 2005-01-17 2011-08-18 Austriamicrosystems Ag Mikroelektromechanischer Sensor und Verfahren zu dessen Herstellung
TW200628877A (en) 2005-02-04 2006-08-16 Prime View Int Co Ltd Method of manufacturing optical interference type color display
US7508063B2 (en) 2005-04-05 2009-03-24 Texas Instruments Incorporated Low cost hermetically sealed package
US7408250B2 (en) * 2005-04-05 2008-08-05 Texas Instruments Incorporated Micromirror array device with compliant adhesive
US7337671B2 (en) 2005-06-03 2008-03-04 Georgia Tech Research Corp. Capacitive microaccelerometers and fabrication methods
EP2495212A3 (fr) 2005-07-22 2012-10-31 QUALCOMM MEMS Technologies, Inc. Dispositifs MEMS comportant des structures de support et procédés de fabrication associés
WO2007013939A1 (fr) 2005-07-22 2007-02-01 Qualcomm Incorporated Structure de support pour dispositif a systemes microelectromecaniques et procedes correspondants
CN101228092A (zh) 2005-07-22 2008-07-23 高通股份有限公司 用于mems装置的支撑结构及其方法
US8043950B2 (en) * 2005-10-26 2011-10-25 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
US7630114B2 (en) 2005-10-28 2009-12-08 Idc, Llc Diffusion barrier layer for MEMS devices
US7795061B2 (en) 2005-12-29 2010-09-14 Qualcomm Mems Technologies, Inc. Method of creating MEMS device cavities by a non-etching process
US7382515B2 (en) 2006-01-18 2008-06-03 Qualcomm Mems Technologies, Inc. Silicon-rich silicon nitrides as etch stops in MEMS manufacture
US20070170528A1 (en) 2006-01-20 2007-07-26 Aaron Partridge Wafer encapsulated microelectromechanical structure and method of manufacturing same
US7547568B2 (en) * 2006-02-22 2009-06-16 Qualcomm Mems Technologies, Inc. Electrical conditioning of MEMS device and insulating layer thereof
DE102006008584A1 (de) * 2006-02-24 2007-09-06 Atmel Germany Gmbh Fertigungsprozess für integrierte Piezo-Bauelemente
US7450295B2 (en) 2006-03-02 2008-11-11 Qualcomm Mems Technologies, Inc. Methods for producing MEMS with protective coatings using multi-component sacrificial layers
WO2007114912A2 (fr) * 2006-03-30 2007-10-11 Wayne State University Micro-pompe à diaphragme et clapet anti-retour
US7623287B2 (en) 2006-04-19 2009-11-24 Qualcomm Mems Technologies, Inc. Non-planar surface structures and process for microelectromechanical systems
US7527996B2 (en) 2006-04-19 2009-05-05 Qualcomm Mems Technologies, Inc. Non-planar surface structures and process for microelectromechanical systems
US7578189B1 (en) 2006-05-10 2009-08-25 Qualtre, Inc. Three-axis accelerometers
US7767484B2 (en) * 2006-05-31 2010-08-03 Georgia Tech Research Corporation Method for sealing and backside releasing of microelectromechanical systems
US7321457B2 (en) 2006-06-01 2008-01-22 Qualcomm Incorporated Process and structure for fabrication of MEMS device having isolated edge posts
JP4327183B2 (ja) * 2006-07-31 2009-09-09 株式会社日立製作所 内燃機関の高圧燃料ポンプ制御装置
US7763546B2 (en) 2006-08-02 2010-07-27 Qualcomm Mems Technologies, Inc. Methods for reducing surface charges during the manufacture of microelectromechanical systems devices
US7851876B2 (en) * 2006-10-20 2010-12-14 Hewlett-Packard Development Company, L.P. Micro electro mechanical system
US7706042B2 (en) * 2006-12-20 2010-04-27 Qualcomm Mems Technologies, Inc. MEMS device and interconnects for same
US7535621B2 (en) 2006-12-27 2009-05-19 Qualcomm Mems Technologies, Inc. Aluminum fluoride films for microelectromechanical system applications
US7733552B2 (en) 2007-03-21 2010-06-08 Qualcomm Mems Technologies, Inc MEMS cavity-coating layers and methods
US7719752B2 (en) 2007-05-11 2010-05-18 Qualcomm Mems Technologies, Inc. MEMS structures, methods of fabricating MEMS components on separate substrates and assembly of same
US7569488B2 (en) 2007-06-22 2009-08-04 Qualcomm Mems Technologies, Inc. Methods of making a MEMS device by monitoring a process parameter
FR2923475B1 (fr) * 2007-11-09 2009-12-18 Commissariat Energie Atomique Procede de realisation d'un dispositif a membrane suspendue
US7851239B2 (en) * 2008-06-05 2010-12-14 Qualcomm Mems Technologies, Inc. Low temperature amorphous silicon sacrificial layer for controlled adhesion in MEMS devices
WO2010111601A2 (fr) * 2009-03-26 2010-09-30 Semprius, Inc. Procédés de formation de dispositifs à circuits imprimés imprimables et dispositifs formés de la sorte
US7864403B2 (en) 2009-03-27 2011-01-04 Qualcomm Mems Technologies, Inc. Post-release adjustment of interferometric modulator reflectivity
TWI388038B (zh) * 2009-07-23 2013-03-01 Ind Tech Res Inst 感測元件結構與製造方法
CN101962165A (zh) * 2010-09-10 2011-02-02 上海集成电路研发中心有限公司 微电子机械系统微桥结构及其制造方法
CN103221331B (zh) 2010-09-18 2016-02-03 快捷半导体公司 用于微机电系统的密封封装
US9278845B2 (en) 2010-09-18 2016-03-08 Fairchild Semiconductor Corporation MEMS multi-axis gyroscope Z-axis electrode structure
WO2012037492A2 (fr) 2010-09-18 2012-03-22 Janusz Bryzek Boîtier de microsystème électromécanique à puces multiples
US9455354B2 (en) 2010-09-18 2016-09-27 Fairchild Semiconductor Corporation Micromachined 3-axis accelerometer with a single proof-mass
DE112011103124B4 (de) 2010-09-18 2025-10-30 Fairchild Semiconductor Corporation Biegelager zum Verringern von Quadratur für mitschwingende mikromechanische Vorrichtungen
EP2616771B8 (fr) 2010-09-18 2018-12-19 Fairchild Semiconductor Corporation Capteur inertiel monolithique 6 axes micro-usiné
EP2619536B1 (fr) 2010-09-20 2016-11-02 Fairchild Semiconductor Corporation Capteur de pression micro-électromécanique comprenant un condensateur de référence
EP2619130A4 (fr) * 2010-09-20 2014-12-10 Fairchild Semiconductor Interconnexion verticale à capacité parallèle réduite
US8624349B1 (en) 2010-10-11 2014-01-07 Maxim Integrated Products, Inc. Simultaneous isolation trench and handle wafer contact formation
US8368152B2 (en) * 2011-04-18 2013-02-05 Taiwan Semiconductor Manufacturing Company, Ltd. MEMS device etch stop
US8659816B2 (en) 2011-04-25 2014-02-25 Qualcomm Mems Technologies, Inc. Mechanical layer and methods of making the same
FR2977884B1 (fr) * 2011-07-12 2016-01-29 Commissariat Energie Atomique Procede de realisation d'une structure a membrane suspendue et a electrode enterree
FR2977885A1 (fr) 2011-07-12 2013-01-18 Commissariat Energie Atomique Procede de realisation d'une structure a electrode enterree par report direct et structure ainsi obtenue
US9062972B2 (en) 2012-01-31 2015-06-23 Fairchild Semiconductor Corporation MEMS multi-axis accelerometer electrode structure
US8978475B2 (en) 2012-02-01 2015-03-17 Fairchild Semiconductor Corporation MEMS proof mass with split z-axis portions
US9488693B2 (en) 2012-04-04 2016-11-08 Fairchild Semiconductor Corporation Self test of MEMS accelerometer with ASICS integrated capacitors
EP2648334B1 (fr) 2012-04-05 2020-06-10 Fairchild Semiconductor Corporation Amplificateur de charge frontal de dispositif MEMS
EP2647955B8 (fr) 2012-04-05 2018-12-19 Fairchild Semiconductor Corporation Annulation du déphasage de quadrature de dispositif MEMS
US9069006B2 (en) 2012-04-05 2015-06-30 Fairchild Semiconductor Corporation Self test of MEMS gyroscope with ASICs integrated capacitors
EP2647952B1 (fr) 2012-04-05 2017-11-15 Fairchild Semiconductor Corporation Boucle de commande de gain automatique de dispositif MEMS pour entraînement d'amplitude mécanique
US9094027B2 (en) 2012-04-12 2015-07-28 Fairchild Semiconductor Corporation Micro-electro-mechanical-system (MEMS) driver
US9625272B2 (en) 2012-04-12 2017-04-18 Fairchild Semiconductor Corporation MEMS quadrature cancellation and signal demodulation
DE102013014881B4 (de) 2012-09-12 2023-05-04 Fairchild Semiconductor Corporation Verbesserte Silizium-Durchkontaktierung mit einer Füllung aus mehreren Materialien
US9450066B2 (en) * 2012-10-12 2016-09-20 Texas State University Vertically movable gate field effect transistor (VMGFET) on a silicon-on-insulator (SOI) wafer and method of forming a VMGFET
US9768271B2 (en) 2013-02-22 2017-09-19 Micron Technology, Inc. Methods, devices, and systems related to forming semiconductor power devices with a handle substrate
CN104058363B (zh) * 2013-03-22 2016-01-20 上海丽恒光微电子科技有限公司 基于mems透射光阀的显示装置及其形成方法
CN103350983B (zh) * 2013-07-01 2015-07-15 广东合微集成电路技术有限公司 一种集成晶圆级真空封装的mems器件及其制造方法
US9656859B2 (en) * 2015-04-16 2017-05-23 The United States Of America, As Represented By The Secretary Of The Navy Method for fabricating suspended MEMS structures
US10192850B1 (en) 2016-09-19 2019-01-29 Sitime Corporation Bonding process with inhibited oxide formation
US10800649B2 (en) 2016-11-28 2020-10-13 Analog Devices International Unlimited Company Planar processing of suspended microelectromechanical systems (MEMS) devices
US10843920B2 (en) 2019-03-08 2020-11-24 Analog Devices International Unlimited Company Suspended microelectromechanical system (MEMS) devices
CN114148986B (zh) * 2021-11-08 2025-02-07 歌尔微电子股份有限公司 微机电系统传感器、其制造方法及电子设备
US20230294980A1 (en) * 2022-03-18 2023-09-21 Vanguard International Semiconductor Corporation Micro-electro-mechanical system (mems) devices and fabrication methods thereof
WO2023184517A1 (fr) * 2022-04-02 2023-10-05 Huawei Technologies Co.,Ltd. Dispositif mems pour lithographie sans masque euv
CN116088165A (zh) * 2022-11-21 2023-05-09 北京理工大学 二维静电扫描微镜及其制作方法
DE102023209211A1 (de) * 2023-09-21 2025-03-27 Robert Bosch Gesellschaft mit beschränkter Haftung Verfahren zur Herstellung einer mikroelektromechanischen Bauteilstruktur, mikroelektromechanische Bauteilstruktur, mikroelektromechanische Vorrichtung und mikroelektromechanischer Lautsprecher

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5216490A (en) 1988-01-13 1993-06-01 Charles Stark Draper Laboratory, Inc. Bridge electrodes for microelectromechanical devices
US5343064A (en) * 1988-03-18 1994-08-30 Spangler Leland J Fully integrated single-crystal silicon-on-insulator process, sensors and circuits
US5479042A (en) * 1993-02-01 1995-12-26 Brooktree Corporation Micromachined relay and method of forming the relay
US6044705A (en) 1993-10-18 2000-04-04 Xros, Inc. Micromachined members coupled for relative rotation by torsion bars
US5725729A (en) * 1994-09-26 1998-03-10 The Charles Stark Draper Laboratory, Inc. Process for micromechanical fabrication
US6021675A (en) * 1995-06-07 2000-02-08 Ssi Technologies, Inc. Resonating structure and method for forming the resonating structure
US5882532A (en) * 1996-05-31 1999-03-16 Hewlett-Packard Company Fabrication of single-crystal silicon structures using sacrificial-layer wafer bonding
US5914801A (en) * 1996-09-27 1999-06-22 Mcnc Microelectromechanical devices including rotating plates and related methods
US6121552A (en) * 1997-06-13 2000-09-19 The Regents Of The University Of Caliofornia Microfabricated high aspect ratio device with an electrical isolation trench
DE19847455A1 (de) 1998-10-15 2000-04-27 Bosch Gmbh Robert Verfahren zur Bearbeitung von Silizium mittels Ätzprozessen
US6433401B1 (en) * 1999-04-06 2002-08-13 Analog Devices Imi, Inc. Microfabricated structures with trench-isolation using bonded-substrates and cavities

Also Published As

Publication number Publication date
WO2002012116A2 (fr) 2002-02-14
US20020117728A1 (en) 2002-08-29
US7083997B2 (en) 2006-08-01
WO2002012116A3 (fr) 2002-04-04

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