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AU2001281085A1 - Photosensitive resin composition for flexographic printing plates - Google Patents

Photosensitive resin composition for flexographic printing plates

Info

Publication number
AU2001281085A1
AU2001281085A1 AU2001281085A AU8108501A AU2001281085A1 AU 2001281085 A1 AU2001281085 A1 AU 2001281085A1 AU 2001281085 A AU2001281085 A AU 2001281085A AU 8108501 A AU8108501 A AU 8108501A AU 2001281085 A1 AU2001281085 A1 AU 2001281085A1
Authority
AU
Australia
Prior art keywords
resin composition
photosensitive resin
flexographic printing
printing plates
flexographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001281085A
Other languages
English (en)
Inventor
Douglas Leach
Annabel Younghi Lee
Rosemarie Palmer-Sungail
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Inc
Original Assignee
MacDermid Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MacDermid Inc filed Critical MacDermid Inc
Publication of AU2001281085A1 publication Critical patent/AU2001281085A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
AU2001281085A 2000-08-30 2001-08-02 Photosensitive resin composition for flexographic printing plates Abandoned AU2001281085A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US65174600A 2000-08-30 2000-08-30
US09651746 2000-08-30
PCT/US2001/024547 WO2002019035A1 (fr) 2000-08-30 2001-08-02 Composition de resine photosensible destinee a des plaques flexographiques

Publications (1)

Publication Number Publication Date
AU2001281085A1 true AU2001281085A1 (en) 2002-03-13

Family

ID=24614063

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001281085A Abandoned AU2001281085A1 (en) 2000-08-30 2001-08-02 Photosensitive resin composition for flexographic printing plates

Country Status (5)

Country Link
EP (1) EP1323004A4 (fr)
JP (1) JP2004514159A (fr)
AU (1) AU2001281085A1 (fr)
TW (1) TW588216B (fr)
WO (1) WO2002019035A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2420889A1 (fr) * 2009-04-14 2012-02-22 Sumitomo Bakelite Co., Ltd. Composition de résine photosensible, film adhésif et dispositif de réception de lumière
JP2011093308A (ja) 2009-09-30 2011-05-12 Fujifilm Corp レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版とその製造方法、及び、レリーフ印刷版とその製版方法
CN108780274B (zh) * 2016-03-16 2021-07-13 东洋纺株式会社 可水显影的柔性印刷用感光性树脂组合物、及由该组合物得到的柔性印刷用感光性树脂原版
EP3665232A4 (fr) 2017-08-10 2021-04-07 Sun Chemical Corporation Compositions durcissables par uv comprenant des photo-initiateurs à base d'oxyde d'acylphosphine
ES2917376T3 (es) * 2017-09-05 2022-07-08 Toyo Boseki Composición de resina fotosensible revelable en agua para uso en impresión flexográfica, placa original de resina fotosensible para uso en impresión flexográfica que se produce a partir de la composición y su uso mediante impresión flexográfica con tinta UV o barniz UV
US11359102B2 (en) 2018-03-27 2022-06-14 Sun Chemical Corporation UV-curable compositions comprising cleavage type photoinitiators

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2235927B (en) * 1989-09-14 1992-10-21 Asahi Chemical Ind A sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same
JP3060656B2 (ja) * 1990-11-26 2000-07-10 セイコーエプソン株式会社 液晶表示素子
US5939205A (en) * 1996-04-16 1999-08-17 Toyo Boseki Kabushiki Kaisha Gas barrier resin film
KR100566042B1 (ko) * 1997-10-07 2006-05-25 간사이 페인트 가부시키가이샤 포지티브형전착포토레지스트조성물및패턴의제조방법
ES2284452T3 (es) * 1999-01-14 2007-11-16 Macdermid Incorporated Composicion de resina fotosensible para placas de impresion flexografica.

Also Published As

Publication number Publication date
JP2004514159A (ja) 2004-05-13
EP1323004A1 (fr) 2003-07-02
TW588216B (en) 2004-05-21
WO2002019035A1 (fr) 2002-03-07
EP1323004A4 (fr) 2005-06-08

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