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AU2001270998A1 - Cathodes for cathodic deposition of getter alloys and a process for the manufacture thereof - Google Patents

Cathodes for cathodic deposition of getter alloys and a process for the manufacture thereof

Info

Publication number
AU2001270998A1
AU2001270998A1 AU2001270998A AU7099801A AU2001270998A1 AU 2001270998 A1 AU2001270998 A1 AU 2001270998A1 AU 2001270998 A AU2001270998 A AU 2001270998A AU 7099801 A AU7099801 A AU 7099801A AU 2001270998 A1 AU2001270998 A1 AU 2001270998A1
Authority
AU
Australia
Prior art keywords
cathodes
manufacture
cathodic deposition
getter alloys
getter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001270998A
Other languages
English (en)
Inventor
Claudio Boffito
Alessandro Gallitognotta
Luca Toia
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SAES Getters SpA
Original Assignee
SAES Getters SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SAES Getters SpA filed Critical SAES Getters SpA
Publication of AU2001270998A1 publication Critical patent/AU2001270998A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/09—Mixtures of metallic powders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
    • H01J7/183—Composition or manufacture of getters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
AU2001270998A 2000-06-28 2001-06-26 Cathodes for cathodic deposition of getter alloys and a process for the manufacture thereof Abandoned AU2001270998A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
ITMI200A001453 2000-06-28
IT2000MI001453A IT1318061B1 (it) 2000-06-28 2000-06-28 Catodi per deposizione catodica di leghe getter e processo per la loro produzione.
PCT/IT2001/000332 WO2002000959A1 (fr) 2000-06-28 2001-06-26 Cathodes destinees au depot cathodique d'alliages de getter et procede de fabrication de ces cathodes

Publications (1)

Publication Number Publication Date
AU2001270998A1 true AU2001270998A1 (en) 2002-01-08

Family

ID=11445361

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001270998A Abandoned AU2001270998A1 (en) 2000-06-28 2001-06-26 Cathodes for cathodic deposition of getter alloys and a process for the manufacture thereof

Country Status (3)

Country Link
AU (1) AU2001270998A1 (fr)
IT (1) IT1318061B1 (fr)
WO (1) WO2002000959A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6833058B1 (en) 2000-10-24 2004-12-21 Honeywell International Inc. Titanium-based and zirconium-based mixed materials and sputtering targets
JP4024151B2 (ja) * 2001-05-01 2007-12-19 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 放電ランプ
ITMI20012389A1 (it) * 2001-11-12 2003-05-12 Getters Spa Catodo cavo con getter integrato per lampade a scarica e metodi per la sua realizzazione
GB2523583C (en) * 2014-02-28 2019-12-25 Castings Tech International Limited Forming a composite component
CN113136504B (zh) * 2021-04-24 2022-07-19 杨阳 吸气合金及其应用、吸气靶材及吸气薄膜
CN115185169B (zh) * 2022-09-07 2025-02-21 上海晶维材料科技有限公司 一种用于空间氢原子钟上具有抗粉化能力的吸附泵
US12281896B2 (en) * 2022-09-15 2025-04-22 Honeywell International Inc. Stabilized evaporable getter for increased handleability

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB723306A (en) * 1949-03-17 1955-02-09 American Electro Metal Corp Method of manufacturing a titanium-rich alloy body
TW287117B (fr) * 1994-12-02 1996-10-01 Getters Spa
US6673400B1 (en) * 1996-10-15 2004-01-06 Texas Instruments Incorporated Hydrogen gettering system

Also Published As

Publication number Publication date
ITMI20001453A1 (it) 2001-12-28
IT1318061B1 (it) 2003-07-21
ITMI20001453A0 (it) 2000-06-28
WO2002000959A1 (fr) 2002-01-03

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