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AU2001266920A1 - Multiphoton absorption method using patterned light - Google Patents

Multiphoton absorption method using patterned light

Info

Publication number
AU2001266920A1
AU2001266920A1 AU2001266920A AU6692001A AU2001266920A1 AU 2001266920 A1 AU2001266920 A1 AU 2001266920A1 AU 2001266920 A AU2001266920 A AU 2001266920A AU 6692001 A AU6692001 A AU 6692001A AU 2001266920 A1 AU2001266920 A1 AU 2001266920A1
Authority
AU
Australia
Prior art keywords
absorption method
patterned light
multiphoton absorption
multiphoton
patterned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001266920A
Inventor
Todd A. Ballen
Robert J. De Voe
Robert D. Demaster
Patrick R. Fleming
Catherine A. Leatherdale
Nicholas A. Stacey
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of AU2001266920A1 publication Critical patent/AU2001266920A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G03H2001/048—Parallel printer, i.e. a fringe pattern is reproduced
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G03H2001/0484—Arranged to produce three-dimensional fringe pattern

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Holo Graphy (AREA)
  • Microscoopes, Condenser (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Micromachines (AREA)
AU2001266920A 2000-06-15 2001-06-14 Multiphoton absorption method using patterned light Abandoned AU2001266920A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US21167500P 2000-06-15 2000-06-15
US60211675 2000-06-15
PCT/US2001/019126 WO2001096962A2 (en) 2000-06-15 2001-06-14 Multiphoton absorption method using patterned light

Publications (1)

Publication Number Publication Date
AU2001266920A1 true AU2001266920A1 (en) 2001-12-24

Family

ID=22787897

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001266920A Abandoned AU2001266920A1 (en) 2000-06-15 2001-06-14 Multiphoton absorption method using patterned light

Country Status (5)

Country Link
EP (1) EP1292863A2 (en)
JP (1) JP2004503832A (en)
KR (1) KR100795762B1 (en)
AU (1) AU2001266920A1 (en)
WO (1) WO2001096962A2 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7005229B2 (en) 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
US7381516B2 (en) 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US7265161B2 (en) 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7232650B2 (en) 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
US7006747B2 (en) 2003-01-17 2006-02-28 3M Innovative Properties Company Optical devices incorporating photo reactive polymers
US20050124712A1 (en) * 2003-12-05 2005-06-09 3M Innovative Properties Company Process for producing photonic crystals
US7583444B1 (en) 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
US7941013B2 (en) 2006-05-18 2011-05-10 3M Innovative Properties Company Process for making light guides with extraction structures and light guides produced thereby
CN103257379B (en) * 2007-11-27 2015-08-05 3M创新有限公司 Form the master mold with the sheet material of suspension composograph
CN107329280A (en) 2008-09-25 2017-11-07 纽约市哥伦比亚大学托管会 Device, the apparatus and method of light stimulus and structure imaging are provided
WO2012145282A2 (en) * 2011-04-22 2012-10-26 3M Innovative Properties Company Enhanced multi-photon imaging resolution method
TWI612331B (en) * 2016-12-09 2018-01-21 國立交通大學 Device for modulating light intensity
US12092850B2 (en) 2018-04-17 2024-09-17 Meta Platforms Technologies, Llc Patterned anisotropic films and optical elements therewith
US11561507B2 (en) * 2018-04-17 2023-01-24 Meta Platforms Technologies, Llc Methods for three-dimensional arrangement of anisotropic molecules, patterned anisotropic films, and optical elements therewith

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3758186A (en) * 1966-11-30 1973-09-11 Battelle Development Corp Method of copying holograms
JPS6297791A (en) * 1985-10-25 1987-05-07 Nec Corp Laser marking device
JP3096775B2 (en) * 1990-07-18 2000-10-10 ソニー・プレシジョン・テクノロジー株式会社 Joint hologram scale and its manufacturing apparatus
US5225918A (en) * 1990-07-18 1993-07-06 Sony Magnescale, Inc. Hologram scale, apparatus for making hologram scale, moving member having hologram scale assembled hologram scale and apparatus for making assembled hologram scale
US5422753A (en) * 1993-12-23 1995-06-06 Xerox Corporation Binary diffraction optical element for controlling scanning beam intensity in a raster output scanning (ROS) optical system
JPH104059A (en) * 1996-06-14 1998-01-06 Nikon Corp Exposure apparatus and exposure method
JPH104060A (en) * 1996-06-14 1998-01-06 Nikon Corp Exposure apparatus and exposure method
US5847812A (en) * 1996-06-14 1998-12-08 Nikon Corporation Projection exposure system and method
FR2751785A1 (en) * 1996-07-29 1998-01-30 Commissariat Energie Atomique METHOD AND DEVICE FOR FORMING PATTERNS IN A PHOTOSENSITIVE RESIN LAYER BY CONTINUOUS LASER INSOLATION, APPLICATION TO THE MANUFACTURE OF EMISSIVE MICROPOINT CATHODE ELECTRON SOURCES AND FLAT SCREENS
JP2917936B2 (en) * 1996-11-08 1999-07-12 日本電気株式会社 Pattern forming method using reflection hologram
DE19653413C2 (en) * 1996-12-22 2002-02-07 Stefan Hell Scanning microscope, in which a sample is simultaneously optically excited in several sample points

Also Published As

Publication number Publication date
EP1292863A2 (en) 2003-03-19
KR20030076237A (en) 2003-09-26
WO2001096962A2 (en) 2001-12-20
WO2001096962A3 (en) 2002-04-18
KR100795762B1 (en) 2008-01-21
JP2004503832A (en) 2004-02-05

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