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AU2000273568A1 - Improved anti-reflective coating compositions comprising polymerized aminoplasts - Google Patents

Improved anti-reflective coating compositions comprising polymerized aminoplasts

Info

Publication number
AU2000273568A1
AU2000273568A1 AU2000273568A AU7356800A AU2000273568A1 AU 2000273568 A1 AU2000273568 A1 AU 2000273568A1 AU 2000273568 A AU2000273568 A AU 2000273568A AU 7356800 A AU7356800 A AU 7356800A AU 2000273568 A1 AU2000273568 A1 AU 2000273568A1
Authority
AU
Australia
Prior art keywords
coating compositions
reflective coating
improved anti
aminoplasts
polymerized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2000273568A
Inventor
Runhui Huang
Rama Puligadda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Brewer Science Inc
Original Assignee
Brewer Science Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brewer Science Inc filed Critical Brewer Science Inc
Publication of AU2000273568A1 publication Critical patent/AU2000273568A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/20—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
    • C08L61/26—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds
    • C08L61/28—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds with melamine
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31859—Next to an aldehyde or ketone condensation product
    • Y10T428/31862—Melamine-aldehyde
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31942—Of aldehyde or ketone condensation product

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Paints Or Removers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AU2000273568A 2000-04-19 2000-09-06 Improved anti-reflective coating compositions comprising polymerized aminoplasts Abandoned AU2000273568A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09552236 2000-04-19
US09/552,236 US6323310B1 (en) 2000-04-19 2000-04-19 Anti-reflective coating compositions comprising polymerized aminoplasts
PCT/US2000/024595 WO2001081010A1 (en) 2000-04-19 2000-09-06 Improved anti-reflective coating compositions comprising polymerized aminoplasts

Publications (1)

Publication Number Publication Date
AU2000273568A1 true AU2000273568A1 (en) 2001-11-07

Family

ID=24204467

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2000273568A Abandoned AU2000273568A1 (en) 2000-04-19 2000-09-06 Improved anti-reflective coating compositions comprising polymerized aminoplasts

Country Status (8)

Country Link
US (7) US6323310B1 (en)
EP (1) EP1284829A4 (en)
JP (1) JP4886146B2 (en)
CN (1) CN1248787C (en)
AU (1) AU2000273568A1 (en)
MY (1) MY133726A (en)
TW (1) TWI247968B (en)
WO (1) WO2001081010A1 (en)

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TW576859B (en) 2001-05-11 2004-02-21 Shipley Co Llc Antireflective coating compositions
US6893684B2 (en) * 2001-06-05 2005-05-17 Brewer Science Inc. Anti-reflective coating compositions for use with low k dielectric materials
TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
US7070914B2 (en) * 2002-01-09 2006-07-04 Az Electronic Materials Usa Corp. Process for producing an image using a first minimum bottom antireflective coating composition
US20030215736A1 (en) * 2002-01-09 2003-11-20 Oberlander Joseph E. Negative-working photoimageable bottom antireflective coating
US8012670B2 (en) 2002-04-11 2011-09-06 Rohm And Haas Electronic Materials Llc Photoresist systems
US20040067437A1 (en) * 2002-10-06 2004-04-08 Shipley Company, L.L.C. Coating compositions for use with an overcoated photoresist
DE60330798D1 (en) * 2002-10-09 2010-02-11 Nissan Chemical Ind Ltd COMPOSITION FOR FORMING AN ANTIREFLEXIBLE LITHOGRAPHIC LAYER
US7038328B2 (en) * 2002-10-15 2006-05-02 Brewer Science Inc. Anti-reflective compositions comprising triazine compounds
JP2004177952A (en) * 2002-11-20 2004-06-24 Rohm & Haas Electronic Materials Llc Multi-layer photoresist system
JP2004206082A (en) * 2002-11-20 2004-07-22 Rohm & Haas Electronic Materials Llc Multi-layer photoresist system
US7018779B2 (en) * 2003-01-07 2006-03-28 International Business Machines Corporation Apparatus and method to improve resist line roughness in semiconductor wafer processing
US7291293B2 (en) * 2003-02-28 2007-11-06 Northwestern University Vapor deposited electro-optic films self-assembled through hydrogen bonding
US8124676B2 (en) * 2003-03-14 2012-02-28 Eastman Chemical Company Basecoat coating compositions comprising low molecular weight cellulose mixed esters
US8461234B2 (en) * 2003-03-14 2013-06-11 Eastman Chemical Company Refinish coating compositions comprising low molecular weight cellulose mixed esters
US7893138B2 (en) * 2003-03-14 2011-02-22 Eastman Chemical Company Low molecular weight carboxyalkylcellulose esters and their use as low viscosity binders and modifiers in coating compositions
US8039531B2 (en) * 2003-03-14 2011-10-18 Eastman Chemical Company Low molecular weight cellulose mixed esters and their use as low viscosity binders and modifiers in coating compositions
US20050074688A1 (en) * 2003-10-03 2005-04-07 Toukhy Medhat A. Bottom antireflective coatings
CN100585496C (en) * 2004-10-12 2010-01-27 日产化学工业株式会社 Composition for forming antireflection film for lithography containing sulfur atom
JP4697467B2 (en) * 2004-11-01 2011-06-08 日産化学工業株式会社 Lithographic underlayer film forming composition containing cyclodextrin compound
US8137895B2 (en) * 2005-08-09 2012-03-20 Taiwan Semiconductor Manufacturing Company, Ltd. Structure and method for improving photoresist pattern adhesion
US20080085953A1 (en) * 2006-06-05 2008-04-10 Deepanjan Bhattacharya Coating compositions comprising low molecular weight cellulose mixed esters and their use to improve anti-sag, leveling, and 20 degree gloss
US20070282038A1 (en) * 2006-06-05 2007-12-06 Deepanjan Bhattacharya Methods for improving the anti-sag, leveling, and gloss of coating compositions comprising low molecular weight cellulose mixed esters
US8481247B2 (en) * 2006-08-28 2013-07-09 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition containing liquid additive
US20090042133A1 (en) * 2007-08-10 2009-02-12 Zhong Xiang Antireflective Coating Composition
CN101884015B (en) 2007-12-13 2013-04-24 日产化学工业株式会社 Composition for forming resist underlayer film and method for forming resist pattern
US8329387B2 (en) 2008-07-08 2012-12-11 Az Electronic Materials Usa Corp. Antireflective coating compositions
US8221965B2 (en) * 2008-07-08 2012-07-17 Az Electronic Materials Usa Corp. Antireflective coating compositions
US20100092894A1 (en) * 2008-10-14 2010-04-15 Weihong Liu Bottom Antireflective Coating Compositions
EP2355162A4 (en) 2008-10-31 2012-08-22 Nissan Chemical Ind Ltd COMPOSITIONS FOR MANUFACTURING WAVELENGTH CONVERSION MEMBERS FOR PV MODULES, WAVELENGTH CONVERSION MEMBRANES FOR PV MODULES AND PV MODULES
JP5459520B2 (en) 2009-06-23 2014-04-02 日産化学工業株式会社 Thermosetting film forming composition having photo-alignment property
WO2011010635A1 (en) * 2009-07-21 2011-01-27 日産化学工業株式会社 Composition forming heat cured film having photo alignment property
US8507192B2 (en) * 2010-02-18 2013-08-13 Az Electronic Materials Usa Corp. Antireflective compositions and methods of using same
US9102847B2 (en) 2010-04-08 2015-08-11 Nissan Chemical Industries, Ltd. Composition for forming thermoset film having photo-alignment properties
US9243110B2 (en) * 2010-11-01 2016-01-26 Nissan Chemical Industries, Ltd. Triazine ring-containing polymer and film-forming composition containing same
KR102002280B1 (en) 2011-09-07 2019-10-01 마이크로켐 코포레이션 Epoxy formulations and processes for fabrication of relief patterns on low surface energy substrates
WO2013054784A1 (en) 2011-10-11 2013-04-18 日産化学工業株式会社 Cured film formation composition, orientation material, and phase difference material
WO2013122979A1 (en) 2012-02-15 2013-08-22 Chirhoclin, Inc. Methods for treating pain associated with chronic pancreatitis
US11635688B2 (en) 2012-03-08 2023-04-25 Kayaku Advanced Materials, Inc. Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates
US11406718B2 (en) 2012-05-29 2022-08-09 Chirhoclin, Inc. Methods of detecting pancreobiliary ductal leaks
KR102641678B1 (en) * 2016-02-09 2024-02-28 닛산 가가쿠 가부시키가이샤 Triazine ring-containing polymer and composition containing the same
US11744878B2 (en) 2020-08-19 2023-09-05 Chirhoclin, Inc. Methods for treatment of COVID-19 syndrome

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Also Published As

Publication number Publication date
US6323310B1 (en) 2001-11-27
JP4886146B2 (en) 2012-02-29
CN1452521A (en) 2003-10-29
US20020007038A1 (en) 2002-01-17
MY133726A (en) 2007-11-30
JP2003531252A (en) 2003-10-21
EP1284829A1 (en) 2003-02-26
US20020061408A1 (en) 2002-05-23
US6524708B2 (en) 2003-02-25
US6432611B1 (en) 2002-08-13
US6512084B2 (en) 2003-01-28
US6403152B1 (en) 2002-06-11
US20020161175A1 (en) 2002-10-31
US6399686B1 (en) 2002-06-04
CN1248787C (en) 2006-04-05
EP1284829A4 (en) 2003-07-02
TWI247968B (en) 2006-01-21
WO2001081010A1 (en) 2001-11-01

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