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ATE401364T1 - Organisches silicatpolymer und dieses umfassender isolierfilm - Google Patents

Organisches silicatpolymer und dieses umfassender isolierfilm

Info

Publication number
ATE401364T1
ATE401364T1 AT03713057T AT03713057T ATE401364T1 AT E401364 T1 ATE401364 T1 AT E401364T1 AT 03713057 T AT03713057 T AT 03713057T AT 03713057 T AT03713057 T AT 03713057T AT E401364 T1 ATE401364 T1 AT E401364T1
Authority
AT
Austria
Prior art keywords
mixture
silane
silicate polymer
organic silicate
insulating film
Prior art date
Application number
AT03713057T
Other languages
English (en)
Inventor
Jung-Won Kang
Min-Jin Ko
Dong-Seok Shin
Gwi-Gwon Kang
Myung-Sun Moon
Hae-Young Nam
Bum-Gyu Choi
Young-Duk Kim
Byung-Ro Kim
Won-Jong Kwon
Sang-Min Park
Original Assignee
Lg Chemical Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR10-2002-0021140A external-priority patent/KR100508900B1/ko
Priority claimed from KR10-2002-0021141A external-priority patent/KR100508901B1/ko
Application filed by Lg Chemical Ltd filed Critical Lg Chemical Ltd
Application granted granted Critical
Publication of ATE401364T1 publication Critical patent/ATE401364T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293—Organic, e.g. plastic
    • H01L23/296—Organo-silicon compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Formation Of Insulating Films (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Laminated Bodies (AREA)
AT03713057T 2002-04-18 2003-03-28 Organisches silicatpolymer und dieses umfassender isolierfilm ATE401364T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2002-0021140A KR100508900B1 (ko) 2002-04-18 2002-04-18 유기실리케이트 중합체 및 이를 함유하는 절연막
KR10-2002-0021141A KR100508901B1 (ko) 2002-04-18 2002-04-18 유기실리케이트 중합체 및 이를 함유하는 절연막

Publications (1)

Publication Number Publication Date
ATE401364T1 true ATE401364T1 (de) 2008-08-15

Family

ID=29738503

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03713057T ATE401364T1 (de) 2002-04-18 2003-03-28 Organisches silicatpolymer und dieses umfassender isolierfilm

Country Status (9)

Country Link
US (1) US7834119B2 (de)
EP (1) EP1495066B1 (de)
JP (1) JP4142643B2 (de)
CN (1) CN100381483C (de)
AT (1) ATE401364T1 (de)
AU (1) AU2003218816A1 (de)
DE (1) DE60322202D1 (de)
TW (1) TWI328017B (de)
WO (1) WO2003104305A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100645682B1 (ko) * 2003-04-17 2006-11-13 주식회사 엘지화학 유기실록산 수지 및 이를 이용한 절연막
JP4465233B2 (ja) * 2003-06-30 2010-05-19 三星電子株式会社 多官能性環状シロキサン化合物、この化合物から製造されたシロキサン系重合体及びこの重合体を用いた絶縁膜の製造方法
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
EP1746123A4 (de) * 2004-05-11 2012-03-21 Jsr Corp Verfahren zur bildung eines films aus organischem siliciumoxid, film aus organischem siliciumoxid, verdrahtungsstruktur, halbleitervorrichtung und zusammensetzung für die filmbildung
JP5110239B2 (ja) * 2004-05-11 2012-12-26 Ｊｓｒ株式会社 有機シリカ系膜の形成方法、膜形成用組成物
JP5110238B2 (ja) 2004-05-11 2012-12-26 Ｊｓｒ株式会社 絶縁膜形成用組成物およびその製造方法、ならびにシリカ系絶縁膜およびその形成方法
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
JP5814209B2 (ja) * 2012-10-24 2015-11-17 信越化学工業株式会社 コーティング剤組成物、該組成物を含む表面処理剤及び該表面処理剤で表面処理された物品
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
JP6875063B2 (ja) * 2015-10-16 2021-05-19 信越化学工業株式会社 ヒドロシリル基含有有機ケイ素樹脂の製造方法
US11091506B2 (en) 2017-08-16 2021-08-17 Asahi Kasei Kabushiki Kaisha Silanol composition, cured product, adhesive, and method for curing silanol composition
JP6844506B2 (ja) * 2017-11-15 2021-03-17 信越化学工業株式会社 ポリシロキサンおよびその製造方法
JP6931324B2 (ja) * 2017-12-18 2021-09-01 旭化成株式会社 硬化物
JP7201430B2 (ja) * 2018-12-28 2023-01-10 旭化成株式会社 紫外線発光装置用硬化性組成物、紫外線発光装置用部品、及び紫外線発光装置
JP7144331B2 (ja) * 2019-01-17 2022-09-29 旭化成株式会社 シラノール組成物、硬化物、接着剤、複合膜、及び硬化方法
TWI742534B (zh) 2019-02-20 2021-10-11 日商旭化成股份有限公司 硬化物、硬化物改質體及硬化方法
JP7377765B2 (ja) * 2020-05-21 2023-11-10 信越化学工業株式会社 オルガノポリシロキサン、およびそれを含有する組成物
US20230279030A1 (en) * 2020-07-24 2023-09-07 Versum Materials Us, Llc Cyclosiloxanes and films made therewith

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB632955A (en) 1946-03-21 1949-12-05 British Thomson Houston Co Ltd Improvements in and relating to polysiloxanes
GB627800A (en) 1946-07-08 1949-08-16 Dow Chemical Co Improvements in or relating to the manufacture of new organofluoro-siloxane products
GB746193A (en) 1952-11-06 1956-03-14 Metallgesellschaft Ag Method of producing organo-silicon polymers
CA1204527A (en) * 1982-08-13 1986-05-13 Theodore F. Retajczyk, Jr. Polymeric films for electronic circuits
US4618665A (en) * 1986-01-13 1986-10-21 Dow Corning Corporation Process to prepare 2-phenylpropyl containing polydiorganosiloxanes
JP3268818B2 (ja) 1992-04-23 2002-03-25 住友ベークライト株式会社 半導体封止用組成物
US5548053A (en) * 1992-05-15 1996-08-20 Wacker-Chemie Gmbh Process for the preparation of organopolysiloxane resin
JP3427412B2 (ja) 1993-02-25 2003-07-14 富士通株式会社 弗素化ポリシロキサン類およびその製造方法
US5656555A (en) 1995-02-17 1997-08-12 Texas Instruments Incorporated Modified hydrogen silsesquioxane spin-on glass
WO2000012640A1 (fr) * 1998-09-01 2000-03-09 Catalysts & Chemicals Industries Co., Ltd. Fluide de revetement pour preparer un film de revetement a base de silice a faible permittivite et substrat avec film de revetement a faible permittivite
JP2000309753A (ja) 1999-04-27 2000-11-07 Jsr Corp 膜形成用組成物および絶縁膜形成用材料
US6696538B2 (en) 1999-07-27 2004-02-24 Lg Chemical Ltd. Semiconductor interlayer dielectric material and a semiconductor device using the same
KR100382702B1 (ko) * 2000-09-18 2003-05-09 주식회사 엘지화학 유기실리케이트 중합체의 제조방법
CA2463584C (en) * 2001-10-16 2011-06-21 The University Of Akron Poly(cyclosiloxane) composition and synthesis

Also Published As

Publication number Publication date
CN1646605A (zh) 2005-07-27
US20070088144A1 (en) 2007-04-19
US7834119B2 (en) 2010-11-16
WO2003104305A1 (en) 2003-12-18
EP1495066A1 (de) 2005-01-12
AU2003218816A1 (en) 2003-12-22
EP1495066B1 (de) 2008-07-16
TWI328017B (en) 2010-08-01
DE60322202D1 (de) 2008-08-28
JP4142643B2 (ja) 2008-09-03
CN100381483C (zh) 2008-04-16
TW200401795A (en) 2004-02-01
JP2005523377A (ja) 2005-08-04

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