Classifications

• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05G—X-RAY TECHNIQUE
  • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
  • H05G2/001—Production of X-ray radiation generated from plasma
  • H05G2/002—Supply of the plasma generating material
  • H05G2/0023—Constructional details of the ejection system
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05G—X-RAY TECHNIQUE
  • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
  • H05G2/001—Production of X-ray radiation generated from plasma
  • H05G2/002—Supply of the plasma generating material
  • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/70—Microphotolithographic exposure; Apparatus therefor
  • G03F7/70008—Production of exposure light, i.e. light sources
  • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
  • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
  • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
  • H01L21/0274—Photolithographic processes
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05G—X-RAY TECHNIQUE
  • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
  • H05G2/001—Production of X-ray radiation generated from plasma
  • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05G—X-RAY TECHNIQUE
  • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
  • H05G2/001—Production of X-ray radiation generated from plasma
  • H05G2/009—Auxiliary arrangements not involved in the plasma generation

Landscapes

• Physics & Mathematics (AREA)
• Engineering & Computer Science (AREA)
• Plasma & Fusion (AREA)
• Optics & Photonics (AREA)
• General Physics & Mathematics (AREA)
• Manufacturing & Machinery (AREA)
• Condensed Matter Physics & Semiconductors (AREA)
• Computer Hardware Design (AREA)
• Microelectronics & Electronic Packaging (AREA)
• Power Engineering (AREA)
• Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
• X-Ray Techniques (AREA)
• Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Applications Claiming Priority (1)

Publications (1)

Family

ID=40427194

Family Applications (1)

Country Status (8)

Families Citing this family (16)

Family Cites Families (13)

• 2008
  • 2008-12-03 NL NL1036272A patent/NL1036272A1/nl active Search and Examination
  • 2008-12-16 TW TW097148944A patent/TWI414213B/zh not_active IP Right Cessation
  • 2008-12-19 JP JP2010539335A patent/JP2011508377A/ja not_active Ceased
  • 2008-12-19 WO PCT/NL2008/050820 patent/WO2009078722A1/en not_active Ceased
  • 2008-12-19 US US12/809,427 patent/US8416391B2/en not_active Expired - Fee Related
  • 2008-12-19 EP EP08863152A patent/EP2220915B1/en not_active Not-in-force
  • 2008-12-19 CN CN200880124729.2A patent/CN101911839B/zh not_active Expired - Fee Related
  • 2008-12-19 KR KR1020107016125A patent/KR20100102170A/ko not_active Ceased

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