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NL1009366C2 - Interferometer. - Google Patents

Interferometer. Download PDF

Info

Publication number
NL1009366C2
NL1009366C2 NL1009366A NL1009366A NL1009366C2 NL 1009366 C2 NL1009366 C2 NL 1009366C2 NL 1009366 A NL1009366 A NL 1009366A NL 1009366 A NL1009366 A NL 1009366A NL 1009366 C2 NL1009366 C2 NL 1009366C2
Authority
NL
Netherlands
Prior art keywords
frequency
plane
phase
light source
phase difference
Prior art date
Application number
NL1009366A
Other languages
English (en)
Dutch (nl)
Inventor
Renates Gerardus Klaver
Original Assignee
Stichting Tech Wetenschapp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stichting Tech Wetenschapp filed Critical Stichting Tech Wetenschapp
Priority to NL1009366A priority Critical patent/NL1009366C2/nl
Priority to DE69912608T priority patent/DE69912608T2/de
Priority to JP2000553769A priority patent/JP2002517743A/ja
Priority to AT99939801T priority patent/ATE253722T1/de
Priority to PCT/NL1999/000357 priority patent/WO1999064817A1/fr
Priority to US09/719,285 priority patent/US6577400B1/en
Priority to EP99939801A priority patent/EP1090268B1/fr
Priority to ES99939801T priority patent/ES2205867T3/es
Priority to AU42937/99A priority patent/AU4293799A/en
Application granted granted Critical
Publication of NL1009366C2 publication Critical patent/NL1009366C2/nl

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/255—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures for measuring radius of curvature
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02004—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using frequency scans
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/025—Testing optical properties by measuring geometrical properties or aberrations by determining the shape of the object to be tested
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Spectrometry And Color Measurement (AREA)
NL1009366A 1998-06-10 1998-06-10 Interferometer. NL1009366C2 (nl)

Priority Applications (9)

Application Number Priority Date Filing Date Title
NL1009366A NL1009366C2 (nl) 1998-06-10 1998-06-10 Interferometer.
DE69912608T DE69912608T2 (de) 1998-06-10 1999-06-09 Hochgenaues interferometer mit lichtleitern
JP2000553769A JP2002517743A (ja) 1998-06-10 1999-06-09 干渉計
AT99939801T ATE253722T1 (de) 1998-06-10 1999-06-09 Hochgenaues interferometer mit lichtleitern
PCT/NL1999/000357 WO1999064817A1 (fr) 1998-06-10 1999-06-09 Interferometre
US09/719,285 US6577400B1 (en) 1998-06-10 1999-06-09 Interferometer
EP99939801A EP1090268B1 (fr) 1998-06-10 1999-06-09 Interferometre de haute precision avec guides de lumiere
ES99939801T ES2205867T3 (es) 1998-06-10 1999-06-09 Interferometro de alta precision con conductores de luz.
AU42937/99A AU4293799A (en) 1998-06-10 1999-06-09 Interferometer

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL1009366 1998-06-10
NL1009366A NL1009366C2 (nl) 1998-06-10 1998-06-10 Interferometer.

Publications (1)

Publication Number Publication Date
NL1009366C2 true NL1009366C2 (nl) 1999-12-13

Family

ID=19767290

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1009366A NL1009366C2 (nl) 1998-06-10 1998-06-10 Interferometer.

Country Status (9)

Country Link
US (1) US6577400B1 (fr)
EP (1) EP1090268B1 (fr)
JP (1) JP2002517743A (fr)
AT (1) ATE253722T1 (fr)
AU (1) AU4293799A (fr)
DE (1) DE69912608T2 (fr)
ES (1) ES2205867T3 (fr)
NL (1) NL1009366C2 (fr)
WO (1) WO1999064817A1 (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1009366C2 (nl) 1998-06-10 1999-12-13 Stichting Tech Wetenschapp Interferometer.
FR2813391B1 (fr) * 2000-08-22 2002-11-29 Essilor Int Procede et appareil de mesure en transmission de la structure geometrique d'un composant optique
US6738511B1 (en) * 2000-10-04 2004-05-18 Veeco Instruments, Inc. Reduced noise sensitivity method and apparatus for converting an interferogram phase map to a surface profile map
US20080137098A1 (en) * 2002-01-25 2008-06-12 Mater Michael J Method of multiple wavelength interferometry
GB0317630D0 (en) * 2003-07-28 2003-08-27 Qinetiq Ltd Optical transmitter and receiver apparatus
JP2005051245A (ja) 2003-07-30 2005-02-24 Asml Netherlands Bv リソグラフィ装置
JP4732832B2 (ja) * 2005-08-17 2011-07-27 株式会社日立製作所 変位計測方法及びその装置、ステージ装置並びにプローブ顕微鏡
US20070133008A1 (en) * 2005-12-12 2007-06-14 Coherix, Inc. Optical fiber delivered reference beam for interferometric imaging
WO2008030580A2 (fr) * 2006-09-07 2008-03-13 4D Technology Corporation Mécanisme de décalage de fréquence synchrone dans un interféromètre de fizeau
DE102017203010A1 (de) * 2017-02-24 2018-08-30 Carl Zeiss Meditec Ag Verfahren und Anordnung zur hochauflösenden Topographie der Kornea eines Auges
US11467031B2 (en) * 2018-05-18 2022-10-11 The Regents Of The University Of Michigan Path fluctuation monitoring for frequency modulated interferometer
US11333487B2 (en) 2019-10-28 2022-05-17 Kla Corporation Common path mode fiber tip diffraction interferometer for wavefront measurement

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996017221A1 (fr) * 1994-11-28 1996-06-06 The Regents Of The University Of California Interferometre de diffraction a decalage de phase
DE19522262A1 (de) * 1995-06-20 1997-01-09 Zeiss Carl Jena Gmbh Heterodyn-Interferometer-Anordnung mit durchstimmbaren Lasern

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2516232B1 (fr) * 1981-11-09 1986-02-21 Thomson Csf Interferometre de type michelson a miroir photorefractif
FR2541767B1 (fr) * 1983-02-25 1986-11-21 Thomson Csf Hydrophone a fibre optique
US4594003A (en) * 1983-07-20 1986-06-10 Zygo Corporation Interferometric wavefront measurement
US4818071A (en) * 1985-03-26 1989-04-04 Andrew Corporation Fiber optic doppler anemometer
US5570182A (en) * 1994-05-27 1996-10-29 Regents Of The University Of California Method for detection of dental caries and periodontal disease using optical imaging
US6015969A (en) * 1996-09-16 2000-01-18 The Regents Of The University Of California Multiple-wavelength spectroscopic quantitation of light-absorbing species in scattering media
JP3501605B2 (ja) * 1996-12-27 2004-03-02 キヤノン株式会社 干渉計及び形状測定装置
US6181429B1 (en) * 1997-12-22 2001-01-30 Pirelli Cavi E Sistemi S.P.A. Interferometer for measurements of optical properties in bulk samples
US6201608B1 (en) * 1998-03-13 2001-03-13 Optical Biopsy Technologies, Inc. Method and apparatus for measuring optical reflectivity and imaging through a scattering medium
NL1009366C2 (nl) 1998-06-10 1999-12-13 Stichting Tech Wetenschapp Interferometer.

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996017221A1 (fr) * 1994-11-28 1996-06-06 The Regents Of The University Of California Interferometre de diffraction a decalage de phase
DE19522262A1 (de) * 1995-06-20 1997-01-09 Zeiss Carl Jena Gmbh Heterodyn-Interferometer-Anordnung mit durchstimmbaren Lasern

Also Published As

Publication number Publication date
JP2002517743A (ja) 2002-06-18
EP1090268B1 (fr) 2003-11-05
ATE253722T1 (de) 2003-11-15
US6577400B1 (en) 2003-06-10
WO1999064817A1 (fr) 1999-12-16
ES2205867T3 (es) 2004-05-01
DE69912608T2 (de) 2004-09-23
AU4293799A (en) 1999-12-30
EP1090268A1 (fr) 2001-04-11
DE69912608D1 (de) 2003-12-11

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VD1 Lapsed due to non-payment of the annual fee

Effective date: 20050101