MY142629A - Method of producing a glass substrate for a magnetic recording medium and method of producing a magnetic recording medium - Google Patents
Method of producing a glass substrate for a magnetic recording medium and method of producing a magnetic recording mediumInfo
- Publication number
- MY142629A MY142629A MYPI20023627A MYPI20023627A MY142629A MY 142629 A MY142629 A MY 142629A MY PI20023627 A MYPI20023627 A MY PI20023627A MY PI20023627 A MYPI20023627 A MY PI20023627A MY 142629 A MY142629 A MY 142629A
- Authority
- MY
- Malaysia
- Prior art keywords
- producing
- recording medium
- magnetic recording
- glass substrate
- abrasive
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
IN A METHOD OF PRODUCING A GLASS SUBSTRATE FOR A MAGNETIC RECORDING MEDIUM, INCLUDING THE STEPS OF GRINDING A PRINCIPAL SURFACE OF THE GLASS SUBSTRATE OF A DISK-SHAPE AND POLISHING, AFTER THE GRINDING STEP, THE PRINCIPAL SURFACE OF THE GLASS SUBSTRATE BY AN ABRASIVE LIQUID INCLUDING ABRASIVE GRAINS, THE ABRASIVE LIQUID INCLUDES COLLOIDAL SILICA ABRASIVE GRAINS AS THE ABRASIVE GRAINS AND FURTHER INCLUDES AN ALKALI SO THAT A PH VALUE OF THE ABRASIVE LIQUID IS ADJUSTED TO BE GREATER THAN 10.2 AND NOT GREATER THAN 12.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001301232 | 2001-09-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY142629A true MY142629A (en) | 2010-12-15 |
Family
ID=19121677
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI20023627A MY142629A (en) | 2001-09-28 | 2002-09-27 | Method of producing a glass substrate for a magnetic recording medium and method of producing a magnetic recording medium |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20030077982A1 (en) |
| MY (1) | MY142629A (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004303280A (en) * | 2003-03-28 | 2004-10-28 | Hoya Corp | Method for manufacturing glass substrate for information recording medium |
| JP4836731B2 (en) * | 2006-07-18 | 2011-12-14 | 旭硝子株式会社 | Manufacturing method of glass substrate for magnetic disk |
| JP5060755B2 (en) * | 2006-09-29 | 2012-10-31 | Sumco Techxiv株式会社 | Semiconductor wafer rough polishing method and semiconductor wafer polishing apparatus |
| JP2009035461A (en) * | 2007-08-03 | 2009-02-19 | Asahi Glass Co Ltd | Manufacturing method of glass substrate for magnetic disk |
| KR101564922B1 (en) * | 2008-05-09 | 2015-11-03 | 삼성디스플레이 주식회사 | Method of treating soda-lime glass substrate and methode of manufacturing display substrate using the same |
| JP5631604B2 (en) * | 2009-02-19 | 2014-11-26 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | Manufacturing method of magnetic disk |
| US8206789B2 (en) | 2009-11-03 | 2012-06-26 | Wd Media, Inc. | Glass substrates and methods of annealing the same |
| US8316668B1 (en) | 2010-09-23 | 2012-11-27 | Wd Media, Inc. | Composite magnetic recording medium |
| US8834962B2 (en) | 2011-06-03 | 2014-09-16 | WD Media, LLC | Methods for improving the strength of glass substrates |
| US8893527B1 (en) | 2011-07-21 | 2014-11-25 | WD Media, LLC | Single surface annealing of glass disks |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4549374A (en) * | 1982-08-12 | 1985-10-29 | International Business Machines Corporation | Method for polishing semiconductor wafers with montmorillonite slurry |
| US5078801A (en) * | 1990-08-14 | 1992-01-07 | Intel Corporation | Post-polish cleaning of oxidized substrates by reverse colloidation |
| GB2334205B (en) * | 1998-02-12 | 2001-11-28 | Shinetsu Handotai Kk | Polishing method for semiconductor wafer and polishing pad used therein |
| JP2972830B1 (en) * | 1998-08-31 | 1999-11-08 | 株式会社三井金属プレシジョン | Method of manufacturing glass substrate for magnetic recording medium |
| JP3701126B2 (en) * | 1998-09-01 | 2005-09-28 | 株式会社荏原製作所 | Substrate cleaning method and polishing apparatus |
| US6322425B1 (en) * | 1999-07-30 | 2001-11-27 | Corning Incorporated | Colloidal polishing of fused silica |
| US6726534B1 (en) * | 2001-03-01 | 2004-04-27 | Cabot Microelectronics Corporation | Preequilibrium polishing method and system |
-
2002
- 2002-09-26 US US10/254,874 patent/US20030077982A1/en not_active Abandoned
- 2002-09-27 MY MYPI20023627A patent/MY142629A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| US20030077982A1 (en) | 2003-04-24 |
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