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MX2007015660A - Metodos para producir depositos de aleaciones y controlar la nanoestructura de los mismos usando electro deposicion pulsatil de corriente negativa, y articulos que incorporan esos depositos. - Google Patents

Metodos para producir depositos de aleaciones y controlar la nanoestructura de los mismos usando electro deposicion pulsatil de corriente negativa, y articulos que incorporan esos depositos.

Info

Publication number
MX2007015660A
MX2007015660A MX2007015660A MX2007015660A MX2007015660A MX 2007015660 A MX2007015660 A MX 2007015660A MX 2007015660 A MX2007015660 A MX 2007015660A MX 2007015660 A MX2007015660 A MX 2007015660A MX 2007015660 A MX2007015660 A MX 2007015660A
Authority
MX
Mexico
Prior art keywords
grain size
deposits
current
deposit
polarity
Prior art date
Application number
MX2007015660A
Other languages
English (en)
Inventor
Andrew J Detor
Christopher A Schuh
Original Assignee
Massachusetts Inst Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Massachusetts Inst Technology filed Critical Massachusetts Inst Technology
Publication of MX2007015660A publication Critical patent/MX2007015660A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

Se usa corriente bipolar (inversion de impulsos), con porciones de corriente positivas y negativas para electrodepositar un deposito de tamano de grano nanocristalino. El tamano del grano puede ser controlado con precision en aleaciones. El deposito exhibe calidad macroscopica superior, siendo relativamente libre de cuarteadora y hueco. Los parametros de densidad de corriente, duracion de las porciones de impulso, y composicion del bano son determinados con referencia a relaciones constitutivas que muestran el tamano de grano como funcion de la composicion de deposito, y la composicion de deposito como funcion de la Relacion de Polaridad. Los parametros pueden utilizarse para seleccionar un tamano de grano especifico. Los recubrimientos pueden estar en capas, teniendo cada una un tamano de grano promedio, el cual puede variar de capa a capa y tambien en una region en una forma gradual.
MX2007015660A 2005-06-07 2006-05-23 Metodos para producir depositos de aleaciones y controlar la nanoestructura de los mismos usando electro deposicion pulsatil de corriente negativa, y articulos que incorporan esos depositos. MX2007015660A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/147,146 US7425255B2 (en) 2005-06-07 2005-06-07 Method for producing alloy deposits and controlling the nanostructure thereof using negative current pulsing electro-deposition
PCT/US2006/019830 WO2007046870A2 (en) 2005-06-07 2006-05-23 Method for producing alloy deposits and controlling the nanostructure thereof using negative current pulsing electro-deposition, and articles incorporating such deposits

Publications (1)

Publication Number Publication Date
MX2007015660A true MX2007015660A (es) 2008-04-29

Family

ID=37493067

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2007015660A MX2007015660A (es) 2005-06-07 2006-05-23 Metodos para producir depositos de aleaciones y controlar la nanoestructura de los mismos usando electro deposicion pulsatil de corriente negativa, y articulos que incorporan esos depositos.

Country Status (8)

Country Link
US (5) US7425255B2 (es)
EP (1) EP1899505B1 (es)
JP (1) JP5134534B2 (es)
KR (1) KR101283883B1 (es)
CN (1) CN101238243B (es)
CA (1) CA2609481C (es)
MX (1) MX2007015660A (es)
WO (1) WO2007046870A2 (es)

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Also Published As

Publication number Publication date
US20090057159A1 (en) 2009-03-05
EP1899505A4 (en) 2009-12-30
EP1899505B1 (en) 2017-12-20
CN101238243A (zh) 2008-08-06
US7425255B2 (en) 2008-09-16
KR101283883B1 (ko) 2013-07-08
KR20080015820A (ko) 2008-02-20
US20140242409A1 (en) 2014-08-28
US20190145016A1 (en) 2019-05-16
US8728630B2 (en) 2014-05-20
WO2007046870A2 (en) 2007-04-26
US20090130479A1 (en) 2009-05-21
US20060272949A1 (en) 2006-12-07
CN101238243B (zh) 2015-11-25
WO2007046870A3 (en) 2007-10-11
JP2008542552A (ja) 2008-11-27
US10179954B2 (en) 2019-01-15
US8906216B2 (en) 2014-12-09
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