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WO2025226944A1 - Guides d'ondes à réseau en relief de surface à indices de réfraction adaptés élevés - Google Patents

Guides d'ondes à réseau en relief de surface à indices de réfraction adaptés élevés

Info

Publication number
WO2025226944A1
WO2025226944A1 PCT/US2025/026198 US2025026198W WO2025226944A1 WO 2025226944 A1 WO2025226944 A1 WO 2025226944A1 US 2025026198 W US2025026198 W US 2025026198W WO 2025226944 A1 WO2025226944 A1 WO 2025226944A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
refractive index
wavelength
resist
article
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/US2025/026198
Other languages
English (en)
Inventor
Frank Y. Xu
Yunzi Li
Marlon Edward Menezes
Matthew Loren SNEDAKER
Qizhen Xue
Julie Ilana FRISH
Vikramjit Singh
Ryan Jason ONG
Chinmay KHANDEKAR
Liyi HSU
Robert D. Tekolste
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Magic Leap Inc
Original Assignee
Magic Leap Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Magic Leap Inc filed Critical Magic Leap Inc
Publication of WO2025226944A1 publication Critical patent/WO2025226944A1/fr
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T19/00—Manipulating 3D models or images for computer graphics
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V20/00—Scenes; Scene-specific elements
    • G06V20/20—Scenes; Scene-specific elements in augmented reality scenes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/0101—Head-up displays characterised by optical features
    • G02B2027/0118—Head-up displays characterised by optical features comprising devices for improving the contrast of the display / brillance control visibility
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/017—Head mounted
    • G02B27/0172—Head mounted characterised by optical features

Definitions

  • Optical devices for augmented reality (AR) and mixed reality (MR) can include waveguides for guiding light from a projection system to an eye of a user.
  • the structure and characteristics of the components of the waveguide, e.g., a substrate and diffractive features disposed on the substrate, partially determine the quality of images seen by the user.
  • This disclosure describes articles including a substrate with surface relief gratings, with the materials of the substrate and surface relief gratings having matched, high indices of refraction, e.g., greater than 1.6 and matching within 0.05.
  • High refractive index materials are widely used as the substrate material for surface-relief based diffractive waveguides in AR and/or MR systems. The use of a high index substrate helps support a wide field of view of the virtual image, which couples into the waveguide(s) and exit the waveguide(s) toward a user's eye.
  • surface relief diffractive features are typically composed of pure organic materials with a lower refractive index than the substrate (e.g., a refractive index of 1.6 or less).
  • this refractive index mismatch can lead to undesirable optical artifacts and limit the image brightness and overall uniformity, including the user-to-world ratio of image brightness.
  • index matching the substrate and gratings disposed on surfaces of the substrate prevents optical loss at the boundary between the substrate and gratings disposed on the surface of the substrate.
  • ink-jettable precursor solutions that form resists with high indices of refraction are used, but these typically include nanoparticles with higher indices of refraction suspended in a solution of material that will form a resist with a lower index of refraction. These nanoparticles tend to agglomerate, which leads to nonuniformities in the index of refraction of the resist and cause increased optical loss. This increased optical loss can negatively impact image quality by reducing contrast.
  • monolithic casting techniques e.g., the substrate and surface relief gratings are formed of the same material, tend to be limited by the index of a plastic forming the substrate, e.g., the upper range of the substrate is capped.
  • the present disclosure provides ink-jettable precursor solutions for resists having a high index of refraction, e.g., 1.6, 1.7, or greater.
  • the precursor solutions can be dispensed onto and imprinted on the substrate to form surface relief gratings having an index of refraction selected to match the index of refraction of the substrate.
  • optical devices including the described article can convey simultaneously high-contrast and large-FOV images to a user.
  • the characteristics, e.g., viscosity and composition, of the precursor solutions can enable ultrasmall precursor solution drop volumes, e.g., 1.5 pL or less per drop, and ultra-thin residual layer thickness (RLT), e.g., 30 nm or less.
  • RLT ultra-thin residual layer thickness
  • Implementations include an article including: a substrate composed of a first material having a first refractive index at an operative wavelength in the visible spectrum; and a layer of a second material on a surface of the substrate, the layer defining two or more surface relief gratings, the second material having a second refractive index at the operative wavelength.
  • the first and second materials can be different.
  • a residual layer thickness (RLT) of the layer between the adjacent surface relief gratings of the two or more surface relief gratings is 30 nm or less.
  • the first refractive index can be 1.7 or greater.
  • a difference between the first refractive index and the second refractive index at the operative wavelength is 0.1 or less.
  • Implementations also include a method including: operating an inkjet printer to dispense drops of a precursor solution having a first refractive index when cured onto a substrate having a second refractive index; and applying an imprint template to the precursor solution that has been dispensed onto the substrate.
  • the precursor solutions can Attorney Docket No.: 40589-0291WO1 / ML-1313WO be substantially solvent free during operation of the inkjet printer; a volume of the drops of the precursor solution can be 1.5 pL or less; the first refractive index can be 1.7 or greater at a target wavelength; and a difference between the first refractive index and the second refractive index at the target wavelength can be 0.1 or less.
  • the second material is substantially free of nanoparticles.
  • the two or more surface relief gratings are configured to in-couple light into the substrate and out-couple the light out of the substrate. The outcoupled light can form an image having a 50% modulation transfer function of at least 0.3 at 8 cycles per degree.
  • the second material has a haze of 0.5% or less measured according to American Society for Testing Materials (ASTM) D1003.
  • ASTM American Society for Testing Materials
  • the second material includes sulfur containing acrylate monomers.
  • the second material includes inorganic nanoparticles with a nonzero concentration of 1% or less by weight.
  • the inorganic nanoparticles include TiO2, ZrO2, or both.
  • the residual layer thickness (RLT) of the second material in at least one portion of the substrate is in a range of 0 nm to 30 nm.
  • the operative wavelength is a first operative wavelength corresponding to a blue wavelength
  • the refractive index of the second material is greater than the refractive index of the substrate at a second operative wavelength corresponding to a green wavelength
  • the refractive index of the second material is greater than the refractive index of the substrate at a third operative wavelength corresponding to a red wavelength.
  • the operative wavelength is a first operative wavelength corresponding to a red wavelength
  • the refractive index of the second material is greater than the refractive index of the substrate at a second operative wavelength corresponding to a green wavelength
  • the refractive index of the second material is greater than the refractive index of the substrate at a third operative wavelength corresponding to a blue wavelength.
  • the operative wavelength is a first operative wavelength corresponding to a green wavelength
  • the refractive index of the second Attorney Docket No.: 40589-0291WO1 / ML-1313WO material is greater than the refractive index of the substrate at a second operative wavelength corresponding to a blue wavelength
  • the refractive index of the second material is less than the refractive index of the substrate at a third operative wavelength corresponding to a red wavelength.
  • the article further includes an additional layer conformally contacting the layer of the second material.
  • the additional layer can have a refractive index greater than the refractive index of the substrate and the refractive index of the second material at the operative wavelength and less than the refractive index of the substrate and the refractive index of the second material at a different wavelength.
  • the layer conformally contacting the layer of the second material includes diffractive nanostructures.
  • a thickness of the substrate and a residual layer thickness of the second material vary along a dimension of the substrate.
  • a height of the residual layer thickness of the second material from a surface of the substrate is graded.
  • the layer of the second material defines a diffraction grating, and individual nanostructures of the diffraction grating have a sawtooth, slanted, multistep, or blaze type shape.
  • a viscosity of the precursor solution is 25 cP or less at room temperature.
  • the second material is an organic material.
  • wherein the second material is a hybrid material.
  • the method further includes: determining a setting and a duration to cure the precursor solution on the substrate based on a desired refractive index profile; and curing the precursor solution on the substrate according to the determined setting and the determined duration, thereby forming a cured resist.
  • operating the inkjet printer to dispense the drops of the resist material includes pulsing the inkjet printer using a pull-push-pull waveform.
  • FIG.1 depicts an example of a waveguide including a substrate and a layer resist having high, matched refractive indices.
  • FIG.2A depicts a plot of the dispersion for the refractive indices of the substrate and the layer of resist of the waveguide of FIG.1.
  • FIG.2B depicts a schematic of different wavelengths of light traveling through the waveguide of FIG.1.
  • FIG.3A depicts a plot of the dispersion for the refractive indices of the substrate and the layer of resist for another example of a waveguide.
  • FIG.3B depicts a schematic of different wavelengths of light traveling through the waveguide of FIG.3A.
  • FIGS.4A and 4B depict plots of the dispersion for the refractive indices of the substrate and the layer of resist for other examples of waveguides.
  • FIG.5A depicts an example of a waveguide including a substrate and two layers of resist.
  • FIG.5B depicts a plot of the dispersion for the refractive indices of the substrate and the two layers of resist of the waveguide FIG.5A.
  • FIG.5C depicts a schematic of different wavelengths of light traveling through the waveguide of FIG.5A.
  • FIG.5D depicts an example of a waveguide having stacked diffraction gratings.
  • FIGS.6A, 6B, 6C, 6D, and 6E depict examples of substrates and layers of resist having total thickness and local thickness variations.
  • FIGS.7A, 7B, and 7C depict examples of shapes of components of diffraction gratings disposed on a surface of a substrate.
  • FIG.8 depicts a system for dispensing fluid on a substrate and imprinting the dispensed fluid on the substrate.
  • FIG.9 depicts a flowchart for an example of a method of operating the system of FIG.8.
  • FIGS.10A and 10B depict schematics that demonstrate etching a surface relief grating on a substrate.
  • FIG.11 shows a scanning electron microscope (SEM), cross-sectional image of a waveguide including a layer of resist disposed on substrate.
  • FIGS.12A and 12B depict images of a pattern produced using a nanoparticle- free resist and a nanoparticle-laden resist, respectively.
  • FIG.13 depicts an image with high sharpness produced using the structures and techniques described herein. [0047] In the drawings, like reference numbers denote like elements.
  • Implementations described herein provide a planar waveguide with surface relief structures suitable for use in augmented reality (AR) and/or mixed reality (MR) systems, and/or other suitable optical applications.
  • the techniques described herein employ dispensed precursor solutions for forming resists having a high refractive index that closely match the index of the substrate (at least one wavelength), thus reducing optical artifacts in the manufactured optical device.
  • a high refractive index generally refers to a refractive index (n) (e.g., of the imprinted polymer resist) that is greater than 1.6, such as 1.7 or more.
  • a high refractive index refers to n between 1.6 and 1.9.
  • a waveguide 100 includes a substrate 102 and a layer of resist 104, e.g. a cured resist formed by processing a precursor solution.
  • the material composition of substrate 102 and resist 104 are different.
  • the substrate 102 may be composed of any material having optical properties suitable for waveguiding light, such as an inorganic glass, a polymer, or a crystal, such as sapphire.
  • the substrate material has a high refractive index at an operative wavelength of the waveguide.
  • the resist 104 can be processed to have a variety of physical characteristics, e.g., an index of refraction that closely matches that of the substrate 102 for certain wavelengths.
  • a difference between the refractive indices of the substrate 102 and the resist 104 can be 0.1 or less, 0.08 or less, 0.05 or less, 0.04 or less, e.g., 0.03 or less, 0.02 or less, 0.01 or less, 0.008 or less, 0.005 or less, 0.003 or less, 0.002 or less, 0.001 or less, e.g., between 0.0005 and 0.04.
  • RLT residual layer thickness
  • there is a RLT 110 between elements of the grating 108, e.g., nanostructures 112 and 114, can be 30 nm or less, e.g., 20 nm or less.
  • the evanescent wave in the resist 104 travels along interface 116 before being reabsorbed by the substrate 102, so there is effectively no RLT.
  • the nanostructures of the grating 108 can form a variety of surface relief gratings, e.g., input coupling grating (ICG) 106 and grating 108.
  • ICG input coupling grating
  • grating 108 can be any of an orthogonal pupil expander (OPE), exit pupil expander (EPE), or combined pupil expander (CPE).
  • OPE orthogonal pupil expander
  • EPE exit pupil expander
  • CPE combined pupil expander
  • the grating 108 is configured to out-couple light from the substrate 102 toward an eye of the user.
  • the substrate 102 and the resist 104 are different materials, although the indices of refraction can match for a target wavelength, the indices of refraction will not generally match over the entire visible spectrum, e.g., the dispersion curves for each of the substrate 102 and the resist 104 are different.
  • the waveguide 100 is “pseudo-monolithic,” as there is no difference in certain optical properties of the substrate 102 and the resist 104 at a target wavelength, but there are differences for other wavelengths. Accordingly, the material composition of each of the substrate 102 and resist 104 can be selected based on the intended functionality of the article, e.g., guiding certain wavelengths of light in a head-mounted display.
  • FIGS.2A and 2B depict an example where the substrate 102 and the resist 104 are composed of the same material.
  • the dispersion curves e.g., index of refraction versus wavelength, 202 and 204 are the same.
  • the indices of refraction are the same for each of the red, green, and blue light 206, 208, and 210, there is no reflection at the interface 116 of the resist 104 and the substrate 102 for light that is in-coupled by ICG 106 that propagates through the waveguide 100.
  • red light rays are represented by solid lines
  • green light rays are represented by dashed lines
  • blue light rays are represented by dotted lines.
  • red light and/or wavelengths can refer to radiation having a wavelength in the range of 620-750 nm, e.g., 620, 625, 630, 645, 640, 645, 650, 655, 660, 665, 670, 675, 680, 685, 690, 695, 700, 705, 710, 715, 720, 725, 730, 735, 740, 745, or 750.
  • Green light and/or wavelengths can refer to radiation having a wavelength in the range of 475-570 nm, e.g., 475, 480, 485, 490, 495, 500, 505, 510, 515, 520, 525, 530, 535, 540, 545, 550, 555, 560, 565, or 570.
  • Blue light and/or wavelengths can refer to radiation having a wavelength in the range of 450-495 nm, e.g., 455, 460, 465, 470, 475, 480, 485, 490, or 495.
  • red, green, and blue light 206, 208, and 210 appear to be traveling roughly in parallel to each other throughout the waveguide 100 in FIG.2B
  • Attorney Docket No.: 40589-0291WO1 / ML-1313WO the angle of reflection as these light rays totally internally reflect through the waveguide 100 are slightly different as the three indices of the substrate 102 and resist 104 at the three red, green, and blue wavelengths are different. Accordingly, the angles of reflection, e.g., as determined by the Fresnel equations, will be slightly different at the upper surface of the resist 104 and the lower surface of the substrate 102.
  • FIG.2A can also apply to examples where the substrate 102 and the resist 104 are composed of different materials, but the dispersion curves 202 and 204 are merely slightly displaced from each other in the vertical direction, e.g., along the index of refraction. In other words, the dispersion curves 202 and 204 have the same shape but are offset by some small index of refraction, e.g., 0.01 or less.
  • FIGS.3A, 3B, 4A, and 4B depict examples where the substrate 102 and resist 104 are composed of different materials, and the respective dispersion curves have different shapes.
  • the dispersion curve 302 (solid line) for the substrate 102 generally overlaps, e.g., at least intersects, the dispersion curve 304 (dashed line) for the resist 104 for a first wavelength range, e.g., corresponding to blue light.
  • the dispersion curve 304 for the resist is lower than the dispersion curve 302 for the substrate.
  • the ICG 106 in-couples red, green, and blue light 306, 308, and 310, respectively, into the waveguide.
  • each of the red, green, and blue light 306, 308, and 310 is 0° relative to the normal of the interface 116, so there is no deflection per Snell’s Law when the red, green, and blue light 306, 308, and 310 first encounter interface 116 between the substrate 102 and the resist 104.
  • blue light 310 passes between the substrate 102 and the resist 104 with substantially no optical loss and no reflection at the interface 116.
  • red light 306 and green light 308 will partially reflect and partially transmit at the interface 116 when traveling toward the substrate 102.
  • the ICG 106 is configured such that the angles of reflection for the red and green light 306 and 308, respectively, are Attorney Docket No.: 40589-0291WO1 / ML-1313WO incident upon the interface 116 at an angle that will not result in total internal reflection within the resist 104.
  • each of FIGS.4A and 4B has a differently shaped dispersion curve for the resist 104.
  • the dispersion curve 402 (solid line) of the substrate is generally lower than the dispersion curve 404 of the resist (dashed line), but most closely matched for red wavelengths of light.
  • the light will propagate as if there is no optical difference between the substrate 102 and the resist, and there will be some portions of reflected light for other wavelengths, e.g., green and blue wavelengths.
  • dispersion curve 406 (dashed line) for the resist 104 intersects dispersion curve 408 for and the substrate 102.
  • the intersection occurs in a wavelength range corresponding to green light. Accordingly, as described above for the first and second examples, a green wavelength will propagate through the waveguide 100 as if there is no optical difference between the substrate 102 and the resist 104.
  • Other wavelengths e.g., red and blue wavelengths, on the other hand, will partially reflect and partially transmit at the interface 116 between the substrate 102 and the resist 104.
  • the indices matching for a certain wavelength and indices mismatching for other wavelength ranges can be beneficial.
  • the RLT can either be ultra-thin, e.g., 50 nm or less, or thick, e.g., like a conformal coating, as will be described with reference to FIGS.5A-5D.
  • the resist 104 is optically transparent.
  • optically transparent generally refers to the physical property of allowing light to pass through a material without being scattered or absorbed.
  • the dispersion of the refractive index for transparent media follows the empirical Sellmeier equation.
  • Dispersion curves defined by the Sellmeier equation are typically monotonic, having negative slope and a concave up shape. Accordingly, generally, the dispersion curves of the substrate 102 and the resist 104 will either intersect once or not at all.
  • the composition of the resist and the processing of the resist 104 e.g., temperature and duration of curing, can control at which wavelength the dispersion curves of the resist 104 and the substrate 102 intersect within the visible Attorney Docket No.: 40589-0291WO1 / ML-1313WO spectrum, e.g., 380-700 nm.
  • the composition of the precursor solution, a temperature while curing, a duration of curing, or a combination thereof can be selected such that the dispersion curves of the resist 104 and the substrate 102 intersect at a blue wavelength (e.g., 450-495 nm), a green wavelength (e.g., 495-570 nm), or a red wavelength (e.g., 620-750 nm).
  • a blue wavelength e.g., 450-495 nm
  • a green wavelength e.g., 495-570 nm
  • a red wavelength e.g., 620-750 nm
  • the refractive indices match within a range, e.g., ⁇ 0.01, ⁇ 0.05, ⁇ 0.1.
  • the exact range surrounding the particular wavelength can vary depending on the slope of the dispersion curve of each of the resist 104 and substrate 102.
  • the exact wavelength at which the dispersion curves intersect can be selected based on the wavelengths of light used in a head mounted display for displaying AR or MR content.
  • more details regarding implementing and designing the waveguides disclosed herein can be found in Patent Treaty Cooperation Application No. US2023/084633, which is hereby incorporated by reference for these details.
  • Another way of characterizing the dispersion of transparent materials is with an Abbe number where , , and are the refractive indices of a material at wavelengths of Fraunhofer’s C, d, and F spectral lines, e.g., at 656.3 nm, 587.56 nm, and 486.1 nm, respectively.
  • an example of a pair of Abbe numbers is about 21 for resist having an index of refraction between 1.7 and 1.8 and 29.5 for a glass substrate 102 having an index of refraction of 1.72.
  • the composition and factors of curing can be selected such that the Abbe numbers of the resist 104 and the substrate 102 are similar, e.g., the same value within 1 or less, 0.5 or less, 0.1 or less, etc.
  • the index mismatch for the green and red wavelengths can be mitigated by having an ultrathin or thick RLT.
  • the wavelength with index mismatch will travel a further distance.
  • light with the index mismatch traveling is further distance can be beneficial for target wavelength.
  • a waveguide 500 includes a substrate 102, a layer of resist 104, and another layer of resist 105, e.g., a cured resin being a different than the material of resist 104.
  • the dispersion curve 502 (solid line) of the substrate 102 is nearly the same as the dispersion curve 504 (dashed line) of the resist 104, e.g., slightly offset below the dispersion curve 504.
  • the dispersion curve 506 (dashed and dotted line) of the resist 105 is generally lower than both of the dispersion curves 502 and 504, except at the two points where the dispersion curve 506 intersects the dispersion curves 502 and 504, the two points corresponding to blue wavelengths.
  • a blue target wavelength corresponds to the point where the dispersion curve 502 for the substrate 102 and the dispersion curve 504 for the resist 104 intersect.
  • the dispersion curves 502 and 504 are quite similar, e.g., within 0.005, for the entire visible spectrum, only small portions, e.g., 0.02% or less, of the red and green light reflect at the interface 116 between the substrate 102 and the resist 104. Although not illustrated for simplicity in FIG.5C, a fraction of red and green light will also reflect at the interface 120 between the resist 104 and the resist 105. [0071] Since the refractive indices of the substrate 102 and the resist 104 are exactly matched for the blue light, there is no reflection of blue light at the interface 116 between the substrate 102 and the resist 104.
  • the stride distance e.g., the distance traveled along the direction of light propagation after a round of reflection
  • the stride distance is on average greater than that of the red and green light.
  • half of the stride distances e.g., the stride distance divided by two, for the different colors of light are labeled in FIG.5C.
  • Each of the red, green, and blue light have paths with a stride distance of 2d1, e.g., paths that include reflections on interface 120 and the lower surface of the substrate 102.
  • the red and the green light also have paths with a shorter stride distance of 2d2, e.g., paths that include reflections on interface 116 and the lower surface of the substrate 102.
  • Only the blue light has a path with a longer stride distance of 2d3, e.g., a path that includes reflections on the upper surface of resist 105 and the lower Attorney Docket No.: 40589-0291WO1 / ML-1313WO surface of the substrate 102.
  • the additional layer of resist can include patterns different from those of the resist 104.
  • another waveguide 501 is composed of the same materials as waveguide 500.
  • the layer of resist 105 includes a surface relief grating rather than having a planar upper surface.
  • the surface relief grating 122 has a different pitch, trench depth, refractive index, and width compared to the grating 108.
  • the resist is formed from a UV curable resin that allows for further cross-linking of other UV curable resins to be patterned over the resist to enable varied optical architectures, e.g., a reduced index grating over a resist layer having an index between 1.7 to 1.8.
  • varied optical architectures e.g., a reduced index grating over a resist layer having an index between 1.7 to 1.8.
  • Using multiple layers of cured resins can provide stacked diffractive features, which can provide varied refractive indices and thus varied diffraction efficiencies.
  • there can be one or more additional coatings e.g., layers having higher or lower refractive indices compared to the resist layer with 1.7 ⁇ n ⁇ 1.8.
  • the one or more additional coatings can increase transparency from a world side and prevent reflection toward a user side of the waveguide. Increasing transparency and reducing reflection can improve key performance indicators related to efficiency and uniformity by reducing the appearance of optical artifacts originating from diffraction gratings of the waveguide.
  • both sides of the substrate can be patterned with the disclosed gratings, e.g., ICGs, OPEs, EPEs, and CPEs, formed by the resist layer. Additionally, using the disclosed methods of imprinting the precursor solution to form the resist can be faster when patterning and aligning the diffractive patterns of both sides of the substrate.
  • the substrate has an undesirable shape prior to forming the resist layer onto the surface of the substrate.
  • the substrate 102 can have various shapes, e.g., graded on one or both surfaces or curved on one or both surfaces. Imprinting a layer of resist with varying height can account for deviation from the desired total thickness variation (TTV) and Attorney Docket No.: 40589-0291WO1 / ML-1313WO local thickness variation (LTV).
  • TTV refers to the difference between the maximum and minimum values of the thickness of a substrate in a series of point measurements across a dimension of a substrate.
  • the TTV refers to an approximation assessed by ignoring contributions of pattern features, e.g., nanostructures, to the thickness.
  • substrate 602a has a TTV
  • the thickness of the substrate monotonically increases from one side to the other, e.g., like a trapezoid.
  • an increasing TTV is desired, so the resist layer 604a on top of the substrate 602a has a constant RLT.
  • the TTV increasing in the opposite direction as the height of the nano features 606 of the grating formed by the resist layer 604a increases, the height of the nano features 606 remains constants, even though the trench depth between the nano features 606 varies.
  • a substrate 602b has a similar TTV as that of substrate 602a.
  • the desired TTV of the waveguide is for constant thickness with a graded upper surface of the resist layer.
  • a resist layer 604b has a graded profile to counteract that of the substrate 602a, e.g., the thickness of the substrate 602b increases at the same rate the thickness of the resist layer 604b decreases (going from left to right), so the total thickness of the waveguide is constant.
  • a substrate 602c has a similar TTV as that of substrates 602a and 602b.
  • the desired TTV it is for increasing TTV paired with a level upper surface of the RLT. Accordingly, the thickness of a resist layer 604c decreases at the rate the upper surface of the substrate 602c rises.
  • the thickness of a substrate 602d varies, and the desired TTV of the waveguide is zero, e.g., uniform height. Accordingly, the thickness of the RLT of the resist layer 604d varies such that the sum of the RLT and the thickness of the substrate 602d is constant.
  • the desired TTV can correspond to constant thickness of the waveguide, but with a concave up profile.
  • the substrate 602d can already have this sort of TTV, and the resist layer 604d can be formed to have a similar profile, e.g., constant RLT thickness, with a concave up profile.
  • substrate surfaces are nonplanar, e.g., curved, before imprinting, such as when the Attorney Docket No.: 40589-0291WO1 / ML-1313WO substrate provides a small radius of curvature to provide virtual image depth of focus to a user in an eyepiece.
  • the shape and quality of the substrate prior to imprinting can vary.
  • the resist layer can be adapted to accommodate substrates from the following sources: a) commercial supplied plastic rolls/sheets/disks/wafers (b) internally molded blank plastic/polymer disk/wafer, or (c) inorganic glass wafer compositions.
  • the substrate can be polished, annealed, and cured to provide a desired size and shape before forming the surface relief gratings.
  • a wafer including multiple sections corresponding to individual substrates can be domed-shaped, such that the height of the upper surface of each substrate is graded and the height of the lower surface of each substrate is constant.
  • the shape of the nano features of the diffraction gratings formed by the resist layer can vary.
  • nano features shapes include sawtooth nano features 710, trapezoidal nano features 720, and blazed nano features 730.
  • generally slanted or multistep nano features can also be used.
  • the shape of the nano features can provide more uniform diffraction efficiency over wide ranges of input angles covering the field of view. Additionally, the shape of the nano features can increase the in-coupling efficiency of light along the nonnormal angles of incidence. [0086] Now a system for forming the disclosed waveguides will be described.
  • FIG.8 is a system diagram illustrating an example of a system 800 for dispensing fluid (e.g., high refractive index nanoimprint resist) onto a substrate, and imprinting the dispensed fluid to create a pattern on the substrate.
  • the system 800 can include a substrate 802 supported by a stage 804.
  • the stage 804 may be configured to support the substrate 802 and stabilize the substrate 802 during fluid dispensing, imprinting, curing, etching, and/or other manufacturing operations.
  • a fluid dispenser 806 is configured to dispense drops (or droplets) of a fluid 820, such as a precursor solution for the resist, onto the substrate 802.
  • the fluid dispenser 806 may also be described as one or more printheads.
  • the fluid 820 is held in a reservoir 808, which is connected to the fluid dispenser 806 by one or more channels (e.g., tubes, conduits, etc.) of suitable type, material, and dimension.
  • a fluid pump 810 operates to circulate the fluid 820 between the reservoir 808 and the fluid Attorney Docket No.: 40589-0291WO1 / ML-1313WO dispenser 806.
  • a meniscus pump 812 operates to extract droplets of the fluid 820 from the reservoir 808, from which the fluid 820 flows to the fluid dispenser 806.
  • the meniscus pump 812 can be configured to control the drop volume and the drop velocity.
  • a fluid control 814 is communicatively coupled to the pumps 810 and 812 and sends signals to pumps 810 and 812 to control their operation and maintain continuous circulating flow of the fluid 820 within the system. As discussed herein, the continuous circulating flow of the fluid 820 enables reliable dispensation of the high refractive index, high viscosity fluid in droplets that are smaller in size compared to traditional techniques.
  • the system 800 can include one or more pressure sensors 816 that measure the pressure of the fluid 820 as it circulates within the system.
  • a control module 818 is communicatively coupled to the fluid control 814 and the fluid dispenser 806 to control their operations. In some implementations, the control module 818 is a computing device that includes at least one processor and memory.
  • the memory can store a computer program that includes instructions which, when executed by the at least one processor, cause the processor(s) to perform operations to control the fluid control 814, the fluid dispenser 806, and/or other components of the system.
  • the control module 818 may be any suitable type of computing device, such as a personal computer, and may communicate with other computing devices to receive instructions, provide data, etc.
  • the system 800 includes a mechanism (not shown) that moves the stage 804 and the substrate 802 along a stage travel direction 822 between multiple phases of a process to manufacture the optical device. This mechanism may also be controlled by the control module 818.
  • the stage 804 (and substrate 802) can be moved from a first position at which the fluid 820 is dispensed onto the substrate 802 during a first phase of a manufacturing process, to a second position.
  • the substrate 802 is imprinted during a second phase using an imprint template 824 that forms the fluid 820 into a desired pattern to create the optical device.
  • the imprint template 824 can be operated by an imprint mechanism 826 that is controllable by the control module 818.
  • the fluid 820 may also be cured using light (e.g., UV light), heat, and or a combination of light and heat.
  • the system can be configured such that the dispensing, imprinting, and/or curing of the fluid 820 are performed at a same position of the stage 804.
  • the implementations described herein provide for a system and process that is a modification of traditional J-FIL techniques, and that addresses problems of the Attorney Docket No.: 40589-0291WO1 / ML-1313WO traditional J-FIL technique.
  • Implementations employ smaller (e.g., 6 pL or less, 3 pL or less, or 1.5 pL or less) drops of a precursor solution that will form a high-index resist with higher resolution to both improve local flatness and further reduce step height changes in RLT within a zone of similar nanofeatures (also described as features, structures, or nanostructures), as well as across transitions between two or more feature zones in the imprinted pattern.
  • implementations employ smaller drops of high-index precursor solution to improve both local surface flatness (RLT) and reduce the magnitude of RLT step changes at boundaries and/or zone transition regions.
  • the technique described herein employs a combination of the following: 1) high refractive index (e.g., 1.6 or more, 1.7 or more) fluids with rheological properties compatible with the controlled volume dispensing process; 2) fluid recirculation to maintain reliable jetting in the printheads of the fluid dispenser 806 (e.g., printhead) dispensing the precursor solution; and 3) a multi-nozzle fluid dispenser 806 that is capable of generating sub-2 pL drops of precursor solution and delivering them with sufficient precision to the substrate to provide nanoimprint optics with minimal defects.
  • high refractive index e.g., 1.6 or more, 1.7 or more
  • fluid dispenser 806 e.g., printhead
  • a material typically should have a viscosity in a range of 5-25 centiPoise (cP) and a surface tension in a range of 20-40 milliNewton (mN) per meter (m).
  • cP centiPoise
  • mN milliNewton
  • heating is used to lower the viscosity of a more viscous material to a jettable range of viscosity.
  • heating poses risks of both oxidation and gelation and is generally undesirable in a reactive material designed to be UV-cured.
  • Implementations therefore employ high refractive index resists, which provide a higher refractive index than competing commercial materials while having rheological properties that allow inkjet-type dispensing at room temperature. More examples of precursor solutions with desirable viscosities can be found in Table 2 of U.S. Patent No.8637587B2. [0094] Cured resists formed by precursor solutions including organic (meth)acrylate monomers and oligomers typically have a refractive index of approximately 1.5 at a 532nm wavelength. The weight percentage of the monomers with respect to the oligomers can be 25 wt% or less, 10 wt% or less, 5 wt% or less., such that the precursor solution is not too viscous for printing.
  • the precursor solution can include a number of different types of monomers, e.g., 1, 2, 3, 4, 5, or more, that combine to form polymers.
  • Sulfur atoms and aromatic groups which both have higher polarizability (e.g., having a dipole moment of at least 1.5) , can be incorporated into these acrylate components to boost the refractive index of the cured resist, e.g., to form sulfur- containing difunctional (meth)acrylate monomers, sulfur-containing hydrophobic acrylate monomers, 2-phenyl-2-(phenylthio)ethyl acrylate, or 4,4’- bis[(acryloyloxyethylthio)diphenyl]sulfide.
  • Suitable for forming a resist having an even higher index e.g., greater than 1.5
  • monomers suitable for forming a resist having an even higher index can replace these acrylate components to even further boost the refractive index. This effect is limited due to the fluid viscosity restriction of 25 cP or less for the inkjet process, and by the refractive index upper limit of the sulfur containing molecules. This approach yields jettable and imprintable resists with a refractive index as high as 1.72 at 532 nm wavelengths of light.
  • Crosslinked acrylate polymers are made with a combination of mono- and multi-functional acrylate monomer and oligomers.
  • Acrylate polymers belong to the family of vinyl polymers.
  • Acrylate polymers are the esters, salts, and conjugate bases of the acrylic acid and its derivatives.
  • acrylate monomers and oligomers examples are methyl acrylate, ethyl acrylate, 2-ethylhexyl acrylate, butyl acrylate, trimethylolpropane triacrylate (TMPTA), 1,6-hexanediol diacrylate, and neopentyl glycol diacrylate.
  • TMPTA trimethylolpropane triacrylate
  • the versatility of the resulting polymers is based at least in part on the array of alkyl or aryl (R) groups present.
  • Acrylate monomers are used to form acrylate polymers. Most commonly, these polymers are copolymers, being derived from two monomers.
  • An acrylate polymer (also known as acrylic or polyacrylate) is any of a group of polymers prepared from acrylate monomers. These plastics are noted for their transparency, resistance to breakage, and elasticity.
  • Acrylates are industrially prepared by treating acrylic acid with the corresponding alcohol in presence of a catalyst. The reaction with lower alcohols (methanol, ethanol) takes place at 100–120 °C with acidic heterogeneous catalysts (cation exchanger). The reaction of higher alcohols (n-butanol, 2-ethylhexanol) is catalyzed with sulfuric acid in homogeneous phase.
  • Avoiding solvents can be beneficial, as although solvents can reduce the viscosity of the precursor solution, solvents can over time degrade the reliability of the jetting printhead by introducing evaporation control challenges, e.g., since a solvent dispersed throughout the precursor solution can evaporate at different rates.
  • using a higher viscosity precursor solution can lead to unwanted effects when jetting drops of low volumes, e.g., 1.5 pL or less, at relatively high speeds, e.g., greater than 4 m/s, such as satellites and/or misting.
  • the waveform used to jet the precursor solution drops can be varied.
  • a pull–push–pull waveform coupled with the frequency of the pull pulses can be selected to quickly cut the tail of a jetting thread after draw formation, thus enabling small drops without satellites and/or misting.
  • Piezoelectric printheads incorporate a transducer composed of a piezoelectric material attached to a jetting nozzle, which is electrically connected to a signal generator. When a voltage is applied, the piezoelectric material changes shape and/or size, thus reducing or increasing a cross section of the cavity. This change in the cross section generates a pressure wave in the resist fluid, forcing a droplet of ink from the nozzle.
  • the form of the third segment of pull- push-pull voltage and dwell sequence can reduce the drop satellite and increase the drop placement accuracy.
  • incorporating sulfur containing components and higher index monomers can extend the shelf life of the precursor solution.
  • the shelf life of the disclosed precursor solution having a refractive index between 1.7 and 1.8 once cured can be six months or more, e.g., 12 months.
  • the acrylates do not contain sulfur.
  • the disclosed precursor solution and cured resist are substantially free of nanoparticles, e.g., the ratio of the volume of nanoparticles compared to the overall volume of the precursor solution can be 1% or less.
  • a certain degree of contrast reduction can be tolerated, e.g., a contrast reduction of 63%
  • a small amount e.g., 20%, 10%, 5%, or less of Attorney Docket No.: 40589-0291WO1 / ML-1313WO inorganic nanoparticles having a high index can be suspended in the precursor solution.
  • the precursor solution to the resist can be a polymer-based resin with incorporated nanoparticles (NPs) of a higher index material.
  • NPs nanoparticles
  • Incorporation of NPs may increase the overall refractive index of the material, which provides advantages in more closely matching the refractive index of the substrate as described herein.
  • incorporation of NPs may also cause Rayleigh scattering of light in the cured resist. Accordingly, the choice of using a precursor solution that includes NPs, or that omits NPs, may be based on a balancing of considerations, e.g., higher index vs. more scattering.
  • a cured resist with refractive index 1.6 or 1.7, and without NPs may provide optimal performance that provides for a higher index (e.g., closer to that of the substrate) while avoiding the scattering that would be caused by the presence of NPs.
  • the inorganic NPs can be ZrO2 and TiO2. Pure ZrO2 and TiO2 crystals can reach 2.2 and 2.4-2.6 index at 532 nm, respectively.
  • the particle size is smaller than 10 nm to avoid excessive Rayleigh scattering.
  • ZrO2 NPs Due to its high specific surface area, high polarity, and incompatibility with the cross-linked polymer matrix, ZrO2 NPs have a tendency to agglomerate in the polymer matrix.
  • Surface modification of NPs can be used to overcome this problem.
  • the hydrophilic surface of ZrO 2 is modified to be compatible with organics, thus enabling the NPs to be uniformly mixed with the polymer.
  • Such modification can be done with silane and carboxylic acid containing capping agents.
  • One end of the capping agent is bonded to ZrO 2 surface; the other end of capping agent either contains a functional group that can participate in acrylate crosslinking or a non-functional organic moiety.
  • Examples of surface modified sub-10nm ZrO 2 NPs are those supplied by Pixelligent TechnologiesTM and Cerion Advanced MaterialsTM. These functionalized NPs are typically sold uniformly suspended in solvent as uniform blends, which can be combined with other base materials to yield precursor solutions for resists with jettable viscosity and increased refractive index.
  • NIL nanoimprint lithography
  • this problem Attorney Docket No.: 40589-0291WO1 / ML-1313WO becomes more severe. Accordingly, the implementations described herein provide systems and methods that include continuous circulation of the precursor solution. Continuous flow of the fluid through the channels in system 800 sweeps bubbles away from the narrow channels and maintains a steady supply of fluid. [00108] In some implementations, this approach is compatible with the incorporation of precursor solutions for resists containing higher vapor pressure solvents, such as high- index inorganic NPs dispersed in solvent. Without recirculation, solvent evaporation at the faceplate of the fluid dispenser 806 could cause a buildup in viscosity and nozzle failure.
  • FIG.9 is a flowchart illustrating an example process 900 for fabrication of an optical device, according to the implementations described herein.
  • system 800 can perform the process 900.
  • the process 900 includes operating an inkjet printer to dispense drops of a precursor solution of a resist material having a first refractive index when cured onto a substrate having a second refractive index (910).
  • the inkjet printer can be the fluid dispenser 806 from system 800, and the precursor solution can be fluid 820.
  • the precursor solution resist material can become any of the resists described herein, e.g., resist 104
  • the substrate can be any of the substrates described herein, e.g., substrate 102.
  • the first and second refractive indices can be different.
  • the refractive index of the substrate can be 1.7 or greater at an operative wavelength
  • the refractive index of the resist, e.g., the precursor solution after being processed can be in a range between 1.65 and 1.75.
  • the drops can be relatively small, e.g., 1.5 pL or less.
  • the viscosity of the precursor solution can be 25 cP or less, e.g., 20 cP or less.
  • the precursor solution is substantially solvent free. In other words, the precursor solution includes 1% or less by weight of a solvent.
  • the precursor solution material can be a homogenous, organic polymer.
  • the precursor solution can be an isotropic material.
  • the precursor solution is a hybrid material, e.g., a solution containing both organic and inorganic components. In some cases, the hybrid material is a sol-gel material, e.g., a material formed usinga sol-gel process.
  • the process 900 includes applying an imprint template to the precursor solution that has been dispensed onto the substrate (920).
  • the precursor solution can be formed into various diffractive features, e.g., ICGs, OPEs, EPEs, and CPEs.
  • applying the imprint template to the precursor solution can result in forming a surface relief grating having relatively thin RLT between nanostructures of the surface relief grating, e.g., 30 nm or less.
  • the process 900 further includes curing the precursor solution on the substrate according to a determined setting, e.g., exposing the precursor solution to a temperature or intensity and frequency of radiation, and the determined duration such that the precursor solution becomes a resist.
  • Curing can refer to applying heat and/or radiation, e.g., ultraviolet (UV) radiation, to the precursor solution while the imprint template is in contact with the resist material.
  • UV radiation e.g., ultraviolet
  • curing the precursor solution to form the resist material can include multiple sub steps, each with respective temperatures and durations.
  • the curing can include a first sub step can include UV curing, e.g., applying radiation at between 365-405 nm, for a first time, on the order of seconds, minutes, hours, or day, and then a second sub step of exposing the precursor solution contacting the imprint template to a temperature of -50 C to 175 C.
  • the sub steps are not limited to this one example. For example, there can be three or more steps with different settings for temperature, radiation wavelength and strength, and duration.
  • the temperature and duration of curing and/or baking the precursor solution affects the refractive index profile, e.g., generally increases or decreases the refractive index based on wavelength, changes the slope of the dispersion curve, where the dispersion curves of the substrate and cured resist intersect, and so on. Accordingly, the temperature and duration can be selected based on the desired refractive index profile. For example, the temperature and duration can be selected such that the resulting surface relief gratings composed on the cured resist material are both greater than 1.7 for the entire or at least part of the visible spectrum, e.g., 400 nm – 750 nm.
  • the temperature and duration can be selected such that the dispersion curves of the cured resist material and the substrate intersect at 630 nm, and that the refractive index of the cured resist is greater than the refractive index of the substrate for wavelengths greater than 630 nm and less than the refractive index of the substrate for wavelengths less than 630 nm, or vice versa.
  • the process 900 includes plasma etching instead of applying an imprint template.
  • step 910 can correspond to dispensing precursor solution and curing the dispensed precursor solution to form a first layer 1004 of resist on a substrate 1002.
  • the first layer 1004 can have a constant thickness.
  • the first layer 1004 can have an index between 1.7 and 2.1.
  • another step of dispensing a second layer 1006 with the shape of the desired final Attorney Docket No.: 40589-0291WO1 / ML-1313WO diffractive features follows step 910.
  • the second layer 1006 can have an index of 1.8 or lower.
  • the second layer 1006 can be etched under plasma, argon, or oxygen, e.g., gases and low-pressure or atmospheric pressure conditions, such that the second layer 1006 is completely removed and first layer 1004 has the shape of the desired diffractive features.
  • the etching can result in a graded profile of the RLT of the first layer 1004.
  • Etching rather than imprinting the diffractive features on the substrate can be preferable when the index of the final diffractive features is high, e.g., between 1.7 and 2.1, and imprinting is consequently difficult.
  • Performing process 900 can provide an article such as that pictured in FIG.11. Scanning electron microscope (SEM) cross-section 1100 shows an imprinted surface relief grating having and RLT of approximately 25 nm. In other implementations, the RLT can be as low as 20 nm, with variations as little as 2 nm across a 20 mm span.
  • the cured resist is nanoparticle free and has a refractive index between 1.7 and 1.74.
  • the substrate is glass having a refractive index of 1.72.
  • using the disclosed structures and techniques can result in improved image quality when the waveguide is used in an eyepiece for image display.
  • FIG.12A shows an image 1200a of the pattern displayed by a first eyepiece including a waveguide with a nanoparticle-free, high-index resist layer
  • FIG. 12B shows an image 1200b of the same pattern displayed by the second eyepiece that is substantially the same as the first eyepiece, except that the resist layer includes nanoparticles.
  • image 1200a has 70% higher contrast.
  • the black in the image 1200a is darker than the black in the image 1200b. Accordingly, in image display applications, the image quality can be improved by using nanoparticle-free resists that have a high refractive index that matches that of the substrate.
  • using the disclosed types of resists e.g., having a high index of refraction and little to no nanoparticles, can result in a resist layer having relatively low scattering and/or haze.
  • the haze of the resist layer can be 0.5% or less measured according to American Society for Testing Materials (ASTM) D1003.
  • haze being this low makes it difficult to distinguish between haze caused by true scattering within a material and noise in the measurement, which tends to be about 0.1%.
  • light scattering and optical loss can be characterized based on haze Attorney Docket No.: 40589-0291WO1 / ML-1313WO measurements, such as international test standards for haze (e.g., ASTM D1003 and BS EN ISO 13468).
  • Conventional hazemeters can be used, e.g., a BYK-Gardner haze meter (such as the Haze-Gard Plus instrument) that measures how much light is totally transmitted through a material, the amount of light transmitted undisturbed (e.g., within 0.5 deg.), how much is deflected more than 2.5 deg., and clarity (amount within 2.5 deg.), which can be considered a measure for narrow7angle scattering.
  • Other equipment can also be used to characterize light scattering for purposes of empirically optimizing scattering patterns. For example, equipment that measures light diffusion by measuring light in an annular ring around 2.5 deg. Can be used (e.g., equipment from Hornell described in standard EN 167).
  • using a nanoparticle free resist can result in an improved modulation transfer function (MTF) compared to a nanoparticle laden resist.
  • MTF modulation transfer function
  • a nanoparticle free resist can have a 50% MTF of 0.35 or greater, and a nanoparticle laden resist can have a 50% MTF of 0.3 or less.
  • the nanoparticle free resist can have a 50% MTF of at least 0.3.
  • image 1300 depicts a gamma corrected picture of two $100 bills, imaged using 532 nm light.
  • the features of the $100 bills are sharp since there is little to no optical scattering loss as a result of avoiding the use of nanoparticles in the resist layer.
  • images can depict text that is clearly legible at 100% zoom.

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Abstract

Selon l'invention, un article comprend : un substrat composé d'un premier matériau ayant un premier indice de réfraction à une longueur d'onde fonctionnelle dans le spectre visible ; et une couche d'un second matériau sur une surface du substrat, la couche définissant au moins deux réseaux en relief de surface, le second matériau ayant un second indice de réfraction à la longueur d'onde fonctionnelle. Le second matériau peut être un matériau organique ou un matériau hybride ; les premier et second matériaux peuvent être différents ; une épaisseur de couche résiduelle de la couche entre des réseaux en relief de surface adjacents des au moins deux réseaux en relief de surface peut être inférieure ou égale à 30 nm ; le premier indice de réfraction peut être supérieur ou égal à 1,7 ; et une différence entre le premier indice de réfraction et le second indice de réfraction à la longueur d'onde fonctionnelle peut être inférieure ou égale à 0,1.
PCT/US2025/026198 2024-04-24 2025-04-24 Guides d'ondes à réseau en relief de surface à indices de réfraction adaptés élevés Pending WO2025226944A1 (fr)

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Citations (5)

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Publication number Priority date Publication date Assignee Title
US20190114484A1 (en) * 2017-10-13 2019-04-18 Corning Incorporated Waveguide-based optical systems and methods for augmented reality systems
US20220128817A1 (en) * 2019-03-12 2022-04-28 Magic Leap, Inc. Waveguides with high index materials and methods of fabrication thereof
US20230213692A1 (en) * 2019-09-11 2023-07-06 Magic Leap, Inc. Display device with diffraction grating having reduced polarization sensitivity
WO2023141583A2 (fr) * 2022-01-20 2023-07-27 Magic Leap, Inc. Guides d'ondes à relief de surface avec réserve à indice de réfraction élevé
US20230266594A1 (en) * 2020-09-08 2023-08-24 Sony Group Corporation Devices, systems, and methods for diffraction gratings

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190114484A1 (en) * 2017-10-13 2019-04-18 Corning Incorporated Waveguide-based optical systems and methods for augmented reality systems
US20220128817A1 (en) * 2019-03-12 2022-04-28 Magic Leap, Inc. Waveguides with high index materials and methods of fabrication thereof
US20230213692A1 (en) * 2019-09-11 2023-07-06 Magic Leap, Inc. Display device with diffraction grating having reduced polarization sensitivity
US20230266594A1 (en) * 2020-09-08 2023-08-24 Sony Group Corporation Devices, systems, and methods for diffraction gratings
WO2023141583A2 (fr) * 2022-01-20 2023-07-27 Magic Leap, Inc. Guides d'ondes à relief de surface avec réserve à indice de réfraction élevé

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