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WO2025225643A1 - Resin particles, metal-coated particles, and resin material - Google Patents

Resin particles, metal-coated particles, and resin material

Info

Publication number
WO2025225643A1
WO2025225643A1 PCT/JP2025/015697 JP2025015697W WO2025225643A1 WO 2025225643 A1 WO2025225643 A1 WO 2025225643A1 JP 2025015697 W JP2025015697 W JP 2025015697W WO 2025225643 A1 WO2025225643 A1 WO 2025225643A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin particles
particles
resin
metal
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/JP2025/015697
Other languages
French (fr)
Japanese (ja)
Inventor
理 杉本
豪 湯川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Publication of WO2025225643A1 publication Critical patent/WO2025225643A1/en
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/34Monomers containing two or more unsaturated aliphatic radicals
    • C08F212/36Divinylbenzene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/20Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00Use of pretreated ingredients
    • C08K9/02Ingredients treated with inorganic substances
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R11/00Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts
    • H01R11/01Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts characterised by the form or arrangement of the conductive interconnection between the connecting locations

Definitions

  • the present invention relates to resin particles containing a polymer of a polymerizable component.
  • the present invention also relates to metal-coated particles and resin materials using the resin particles.
  • Conductive materials such as conductive pastes and conductive films are widely known. In recent years, development has been underway to use these conductive materials in the mounting of semiconductor chips and other devices. From the perspective of increasing the amount of current and reliability in thermal cycles, conductive materials sometimes contain conductive particles such as solder particles dispersed in a binder resin.
  • connection structures are used to obtain a variety of connection structures.
  • connections that use the above-mentioned conductive materials include connections between flexible printed circuit boards and glass substrates (FOG (Film on Glass)), connections between semiconductor chips and flexible printed circuit boards (COF (Chip on Film)), connections between semiconductor chips and glass substrates (COG (Chip on Glass)), and connections between flexible printed circuit boards and glass epoxy substrates (FOB (Film on Board)).
  • FOG Flexible printed circuit boards and glass substrates
  • COF Chip on Film
  • COG Chip on Glass
  • FOB Flexible printed circuit boards and glass epoxy substrates
  • spacers are used as gap control materials to maintain a uniform and constant distance (gap) between the two substrates (components to be connected). It is preferable that the spacers have properties that do not damage the substrates, and that the spacers are not destroyed during mounting.
  • Resin particles may be used as the spacers, or metal-coated particles that comprise resin particles and a metal coating layer that covers the resin particles.
  • Patent Document 1 listed below discloses resin particles having a 5% weight loss temperature of 350°C or higher, a 10% K value at 25°C of 100 N/mm2 or higher and 2500 N/ mm2 or lower, and a 30% K value at 25°C of 100 N/mm2 or higher and 1500 N/mm2 or lower.
  • connection portion connecting two connection target components is repeatedly heated and cooled (exposed to thermal cycling conditions).
  • thermal cycling causes the resin in the resin particles to thermally decompose, resulting in the generation of outgassing.
  • connection portion of the connection structure When a large amount of outgassing occurs, voids can form in the connection portion of the connection structure, or cracks or peeling can occur between the resin particles and the metal coating layer in metal-coated particles, reducing the electrical conductivity reliability of the connection structure. In other words, it is difficult for conventional resin particles to effectively control the gap between substrates when exposed to a high-temperature environment and to improve the electrical conductivity reliability of the connection structure after thermal cycling.
  • This specification discloses the following resin particles, use of resin particles in solder paste, metal-coated particles, and resin materials.
  • Resin particles containing a polymer of a polymerizable component wherein the polymerizable component contains divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups, and the resin particles have a compressive modulus of 1000 N/ mm2 or more when compressed 20% at 200°C.
  • Resin particles according to Item 1 wherein the total content of the divinylbenzene and the (meth)acrylate compound having four or more (meth)acryloyl groups is 80% by weight or more, based on 100% by weight of the polymerizable component.
  • Resin particles according to Item 1 or 2 wherein the weight ratio of the content of the divinylbenzene in the polymerizable component to the content of the (meth)acrylate compound having four or more (meth)acryloyl groups in the polymerizable component is 0.40 or more and 1.70 or less.
  • Item 4 Resin particles according to any one of items 1 to 3, wherein the amount of outgassing when the resin particles are heated at 250°C for 10 minutes is 1000 ppm or less.
  • Resin particles according to Item 6 wherein the resin particles are used to obtain metal-coated particles having a metal coating layer formed on the surface thereof, or the resin particles have a particle diameter of 20 ⁇ m or more and 100 ⁇ m or less.
  • Item 8 The resin particles described in any one of Items 1 to 5 are used to obtain metal-coated particles having a metal coating layer formed on the surface of the resin particles.
  • Item 9 Resin particles according to Item 5, wherein the particle diameter of the resin particles is 5 ⁇ m or more and 100 ⁇ m or less.
  • Item 10 Resin particles according to Item 9, wherein the particle diameter of the resin particles is 20 ⁇ m or more and 100 ⁇ m or less.
  • Item 11 Metal-coated particles comprising the resin particles described in any one of Items 1 to 10 and a metal coating layer disposed on the surface of the resin particles.
  • Item 12 The metal-coated particles described in Item 11, wherein the thickness of the metal coating layer is 0.2 ⁇ m or more.
  • a resin material comprising the resin particles described in any one of Items 1 to 10 and a binder resin, or a resin material comprising the resin particles, metal-coated particles having a metal coating layer disposed on the surface of the resin particles, and a binder resin, wherein the resin particles or the metal-coated particles are dispersed in the binder resin.
  • Item 14 The resin material according to Item 13, wherein the resin material is a solder paste containing solder particles.
  • Item 15 Use of the resin particles described in any one of items 1 to 10, or the resin particles and metal-coated particles disposed on the surfaces of the resin particles, in a solder paste containing solder particles and a binder resin.
  • the resin particles according to the present invention are resin particles containing a polymer of a polymerizable component.
  • the polymerizable component contains divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups.
  • the compressive modulus of the resin particles when compressed 20% at 200°C is 1000 N/mm2 or more. Because the resin particles according to the present invention have the above configuration, the gap controllability of the connection structure when exposed to a high-temperature environment can be improved.
  • FIG. 1 is a cross-sectional view schematically showing a resin particle according to a first embodiment of the present invention.
  • FIG. 2 is a cross-sectional view schematically showing a metal-coated particle using a resin particle according to the first embodiment of the present invention.
  • FIG. 3 is a cross-sectional view showing an example of a connection structure obtained using the resin particles according to the first embodiment of the present invention.
  • FIG. 4 is a cross-sectional view showing an example of a connection structure obtained using metal-coated particles using resin particles according to the first embodiment of the present invention.
  • the resin particles according to the present invention are resin particles containing a polymer of a polymerizable component.
  • the polymerizable component contains divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups.
  • the compressive modulus of the resin particles when compressed 20% at 200°C is 1000 N/mm2 or more.
  • the compressive modulus of the resin particles cannot be sufficiently increased when exposed to a high-temperature environment (e.g., 200°C), which poses the problem of not being able to improve the gap controllability of the resin particles.
  • the resin particles according to the present invention have the above-mentioned configuration, which allows for improved gap control of the connection structure when exposed to a high-temperature environment.
  • the resin particles allow for highly accurate control of the gap on or between the connection target components.
  • connection portion connecting two components to be connected is repeatedly heated and cooled (exposed to thermal cycling conditions).
  • the thermal cycling causes the resin in the resin particles to thermally decompose, resulting in the generation of outgassing.
  • voids can form in the connection portion of the connection structure, or cracks or peeling can occur between the resin particles and the metal coating layer in metal-coated particles, reducing the electrical conductivity reliability of the connection structure.
  • the resin particles according to the present invention have the above-mentioned configuration, and therefore can be used in applications where electrical conductivity reliability is required.
  • the resin particles according to the present invention have the above-mentioned configuration, and therefore can improve the electrical conductivity reliability of connection structures after thermal cycling.
  • the resin particles according to the present invention can also be used in applications where electrical conductivity reliability is not required.
  • FIG. 1 is a cross-sectional view schematically showing a resin particle according to a first embodiment of the present invention.
  • the resin particles 1 contain a polymer of a polymerizable component.
  • the polymerizable component contains divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups.
  • the resin particles 1 have a compressive modulus of 1000 N/ mm2 or more when compressed 20% at 200°C.
  • the compressive modulus of elasticity when the resin particles are compressed 20% at 200 ° C (20% K value of the resin particles at 200 ° C) is 1000 N / mm 2 or more.
  • the 20% K value of the resin particles at 200 ° C is preferably 1200 N / mm 2 or more, more preferably 1300 N / mm 2 or more, even more preferably 1500 N / mm 2 or more, particularly preferably 1750 N / mm 2 or more, and most preferably 2000 N / mm 2 or more, and preferably 20000 N / mm 2 or less, more preferably 10000 N / mm 2 or less, and even more preferably 5000 N / mm 2 or less.
  • the 20% K value of the resin particles at 200 ° C is the above lower limit or more, the gap controllability of the connection structure when exposed to a high temperature environment can be further improved.
  • the 20% K value of the resin particles at 200 ° C is the above upper limit or less, the breakage of the resin particles when exposed to a high temperature environment can be further prevented.
  • the compressive modulus of the resin particles when compressed 20% at 25 ° C (20% K value of the resin particles at 25 ° C) is preferably 1000 N/mm 2 or more, more preferably 1500 N/mm 2 or more, even more preferably 2000 N/mm 2 or more, and preferably 20,000 N/mm 2 or less, more preferably 10,000 N/mm 2 or less, and even more preferably 6,000 N/mm 2 or less.
  • the 20% K value of the resin particles at 25 ° C is the above lower limit or more, the gap controllability of the connection structure when exposed to a high temperature environment can be further improved.
  • the 20% K value of the resin particles at 25 ° C is the above upper limit or less, the resin particles can better follow the connection target member (substrate, etc.), and the gap controllability can be further improved.
  • the ratio of the compressive modulus when the resin particles are compressed 20% at 25°C to the compressive modulus when the resin particles are compressed 20% at 200°C is defined as (20% K value of resin particles at 25°C/20% K value of resin particles at 200°C).
  • This ratio (20% K value of resin particles at 25°C/20% K value of resin particles at 200°C) is preferably 0.7 or more, more preferably 0.9 or more, even more preferably 1.0 or more, and is preferably 3.0 or less, more preferably 2.5 or less, even more preferably 2.0 or less, and particularly preferably 1.5 or less.
  • the gap controllability of the connection structure when exposed to a high-temperature environment can be further improved.
  • the 20% K value of the above resin particles at 25°C and 200°C can be measured as follows.
  • micro-compression testing machine resin particles are compressed with the smooth end face of a cylindrical indenter (diameter 50 ⁇ m, made of diamond) at 25°C or 200°C under conditions where a maximum test load of 90 mN is applied for 30 seconds.
  • the load value (N) and compression displacement (mm) at this time are measured. From the obtained measured values, the compressive modulus can be calculated using the following formula.
  • micro-compression testing machines that can be used include the Fischerscope H-100 manufactured by Fischer and the ENT-5 manufactured by Elionix.
  • Methods for adjusting the 20% K values of the resin particles at 25°C and 200°C, and the ratio (20% K value of resin particles at 25°C/20% K value of resin particles at 200°C) within preferred ranges include using a preferred polymerizable component as described below, adjusting the molecular weight of the polymerizable component, using a preferred crosslinking agent as described below, adjusting the polymerization temperature and polymerization time, applying pressure during polymerization, adjusting the porosity (specific surface area) of the resin particles, and washing away unreacted polymerizable components (monomers).
  • the compression recovery rate of the resin particles at 25°C is preferably 20% or more, more preferably 25% or more, even more preferably 30% or more, and is preferably 95% or less, more preferably 90% or less, even more preferably 85% or less.
  • the compression recovery rate of the resin particles at 25°C may be 70% or less, 60% or less, or 55% or less.
  • the compression recovery rate can be measured as follows.
  • Resin particles are scattered on a sample stage.
  • a load reversed load value
  • a smooth cylindrical indenter 100 ⁇ m diameter, made of diamond
  • the load is then released to the origin load value (0.40 mN).
  • the load-compression displacement during this period is measured, and the compression recovery rate can be calculated using the formula below.
  • the loading rate is 0.33 mN/sec.
  • micro-compression testing machines that can be used include the Fischerscope H-100 manufactured by Fischer and the ENT-5 manufactured by Elionix.
  • Compression recovery rate (%) (L2/L1) x 100
  • L1 Compression displacement from the load value for origin when applying a load to the reverse load value.
  • L2 Unloading displacement from the reverse load value when releasing the load to the load value for origin.
  • (meth)acrylic means either or both of “acrylic” and “methacrylic”
  • (meth)acrylate means either or both of “acrylate” and “methacrylate.”
  • the above-mentioned resin particles are resin particles formed from resin.
  • resin materials for the resin particles include polyolefin resins such as polyethylene, polypropylene, polystyrene, polyvinyl chloride, polyvinylidene chloride, polyisobutylene, and polybutadiene; acrylic resins such as polymethyl (meth)acrylate and polyisobornyl (meth)acrylate; polyalkylene terephthalate, polycarbonate, polyamide, phenol-formaldehyde resin, melamine-formaldehyde resin, benzoguanamine-formaldehyde resin, urea-formaldehyde resin, phenolic resin, melamine resin, benzoguanamine resin, urea resin, epoxy resin, unsaturated polyester resin, saturated polyester resin, polysulfone, polyphenylene oxide, polyacetal, polyimide, polyamide-imide, polyether ether ketone, polyether sulfone, and polymers obtained by
  • the resin particles contain a polymer of a polymerizable component.
  • the polymerizable component preferably contains a polymerizable monomer having the ethylenically unsaturated group.
  • examples of the polymerizable monomer having the ethylenically unsaturated group include non-crosslinkable monomers and crosslinkable monomers.
  • non-crosslinkable monomers include styrene-based monomers such as styrene and ⁇ -methylstyrene; carboxyl group-containing monomers such as (meth)acrylic acid, maleic acid, and maleic anhydride; methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, lauryl (meth)acrylate, cetyl (meth)acrylate, stearyl (meth)acrylate, cyclohexyl (meth)acrylate, and isobornyl (meth)acrylate.
  • styrene-based monomers such as styrene and ⁇ -methylstyrene
  • carboxyl group-containing monomers such as (meth)acrylic acid, maleic acid, and maleic anhydride
  • suitable monomers include alkyl (meth)acrylate compounds such as methyl (meth)acrylate; oxygen-containing (meth)acrylate compounds such as 2-hydroxyethyl (meth)acrylate, glycerol (meth)acrylate, polyoxyethylene (meth)acrylate, and glycidyl (meth)acrylate; nitrile-containing monomers such as (meth)acrylonitrile; and halogen-containing monomers such as trifluoromethyl (meth)acrylate, pentafluoroethyl (meth)acrylate, vinyl chloride, vinyl fluoride, and chlorostyrene.
  • alkyl (meth)acrylate compounds such as methyl (meth)acrylate
  • oxygen-containing (meth)acrylate compounds such as 2-hydroxyethyl (meth)acrylate, glycerol (meth)acrylate, polyoxyethylene (meth)acrylate, and glycidyl (meth)acrylate
  • nitrile-containing monomers
  • crosslinkable monomers include tetramethylolmethane tetra(meth)acrylate, tetramethylolmethane tri(meth)acrylate, tetramethylolmethane di(meth)acrylate, trimethylolpropane tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, dipentaerythritol penta(meth)acrylate, glycerol tri(meth)acrylate, glycerol di(meth)acrylate, (poly)ethylene glycol di(meth)acrylate, (poly)propane tri ...
  • Examples include polyfunctional (meth)acrylate compounds such as propylene glycol di(meth)acrylate, (poly)tetramethylene glycol di(meth)acrylate, and 1,4-butanediol di(meth)acrylate; and silane-containing monomers such as triallyl (iso)cyanurate, triallyl trimellitate, divinylbenzene, diallyl phthalate, diallyl acrylamide, diallyl ether, ⁇ -(meth)acryloxypropyltrimethoxysilane, trimethoxysilylstyrene, and vinyltrimethoxysilane.
  • silane-containing monomers such as triallyl (iso)cyanurate, triallyl trimellitate, divinylbenzene, diallyl phthalate, diallyl acrylamide, diallyl ether, ⁇ -(meth)acryloxypropyltrimethoxysilane, trimethoxysilylstyrene, and vinyltrimeth
  • the polymerizable component includes divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups.
  • the polymer of the polymerizable component may include a copolymer of divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups, or may include a homopolymer of divinylbenzene and a homopolymer of a (meth)acrylate compound having four or more (meth)acryloyl groups.
  • the polymer of the polymerizable component include a copolymer of divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups.
  • the (meth)acrylate compound having four or more (meth)acryloyl groups may have four, five or more, or six or more (meth)acryloyl groups.
  • the (meth)acrylate compound having four or more (meth)acryloyl groups may have 20 or fewer, 10 or fewer, 8 or fewer, or 6 or fewer (meth)acryloyl groups.
  • the range of the number of (meth)acryloyl groups in the (meth)acrylate compound having four or more (meth)acryloyl groups can be set by appropriately selecting the above lower limit and upper limit.
  • the above (meth)acrylate compound having four or more (meth)acryloyl groups may be used alone, or two or more types may be used in combination.
  • the (meth)acrylate compound having four or more (meth)acryloyl groups has four to six (meth)acryloyl groups. From the viewpoint of more effectively achieving the effects of the present invention, it is preferable that the (meth)acrylate compound having four or more (meth)acryloyl groups is a tetrafunctional (meth)acrylate compound, a pentafunctional (meth)acrylate compound, or a hexafunctional (meth)acrylate compound.
  • the (meth)acrylate compound having four or more (meth)acryloyl groups may include a tetrafunctional (meth)acrylate compound, a pentafunctional (meth)acrylate compound, or a hexafunctional (meth)acrylate compound.
  • Examples of the (meth)acrylate compounds having four (meth)acryloyl groups include pentaerythritol tetra(meth)acrylate, pentaerythritol alkoxytetra(meth)acrylate, alkoxylated pentaerythritol tetra(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, and tetramethylolmethane tetra(meth)acrylate.
  • Examples of the (meth)acrylate compound having five (meth)acryloyl groups include dipentaerythritol hydroxypenta(meth)acrylate and alkoxylated dipentaerythritol hydroxypenta(meth)acrylate.
  • Examples of the (meth)acrylate compound having six (meth)acryloyl groups include dipentaerythritol hexa(meth)acrylate (dipentaerythritol hexaacrylate, etc.) and alkoxylated dipentaerythritol hexa(meth)acrylate (alkoxylated dipentaerythritol hexaacrylate, etc.).
  • the (meth)acrylate compound having four or more (meth)acryloyl groups preferably includes a (meth)acrylate compound having four (meth)acryloyl groups, and more preferably includes pentaerythritol tetra(meth)acrylate.
  • the polymerizable component preferably includes divinylbenzene and a (meth)acrylate compound having four (meth)acryloyl groups, and more preferably includes divinylbenzene and pentaerythritol tetra(meth)acrylate.
  • the polymer (resin particles) of the polymerizable component preferably includes a copolymer of divinylbenzene and a (meth)acrylate compound having four (meth)acryloyl groups, and more preferably includes a copolymer of divinylbenzene and pentaerythritol tetra(meth)acrylate.
  • the above polymerizable component may or may not contain polymerizable components other than divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups (hereinafter sometimes referred to as "other polymerizable components").
  • the other polymerizable components include the above-mentioned polymerizable monomers having an ethylenically unsaturated group. Only one type of the other polymerizable components may be used, or two or more types may be used in combination.
  • crosslinking agent When using the above-mentioned crosslinkable monomers to obtain resin particles, a crosslinking agent can be used.
  • the crosslinking agent include (poly)ethylene glycol di(meth)acrylate, (poly)propylene glycol di(meth)acrylate, (poly)tetramethylene glycol di(meth)acrylate, and 1,4-butanediol di(meth)acrylate.
  • the above-mentioned crosslinking agents may be used alone or in combination of two or more.
  • the polymerizable component contains a crosslinking agent.
  • the polymerizable component (the crosslinking agent) contain (poly)propylene glycol di(meth)acrylate, (poly)tetramethylene glycol di(meth)acrylate, or 1,4-butanediol di(meth)acrylate.
  • the polymerizable component be (poly)propylene glycol di(meth)acrylate, (poly)tetramethylene glycol di(meth)acrylate, or 1,4-butanediol di(meth)acrylate.
  • the resin particles can be obtained by polymerizing the polymerizable monomer having the ethylenically unsaturated group using a known method. Examples of such methods include suspension polymerization in the presence of a radical polymerization initiator, and polymerization using non-crosslinked seed particles to swell the monomer together with a radical polymerization initiator.
  • the viscosity of the polymerizable component mixture (before polymerization) is preferably 50 mPa ⁇ s or more, more preferably 100 mPa ⁇ s or more, even more preferably 500 mPa ⁇ s or more, particularly preferably 1000 mPa ⁇ s or more, and most preferably 1200 mPa ⁇ s or more, and is preferably 7000 mPa ⁇ s or less, more preferably 5000 mPa ⁇ s or less, and even more preferably 4000 mPa ⁇ s or less.
  • the viscosity of the polymerizable component mixture (before polymerization) is above the above lower limit, the particle size of the resin particles can be easily controlled.
  • the viscosity of the polymerizable component mixture (before polymerization) is below the above upper limit, the molecular weight of the resulting polymer of the polymerizable component can be increased, and the 20% K value of the resin particles at 25°C and 200°C can be easily adjusted within a preferred range, further improving the gap controllability of the connection structure when exposed to a high-temperature environment.
  • the polymerizable component mixture (before polymerization) contains the polymerizable compound used in the resin particles in the weight ratio used in the resin particles.
  • the viscosity of the mixture of polymerizable components is measured, for example, using an E-type viscometer at 25°C and 5 rpm.
  • E-type viscometers include the "VISCOMETER TV-22" manufactured by Toki Sangyo Co., Ltd.
  • the particle diameter of the resin particles is preferably 0.1 ⁇ m or more, more preferably 1 ⁇ m or more, even more preferably 1.5 ⁇ m or more, even more preferably 2 ⁇ m or more, even more preferably 5 ⁇ m or more, particularly preferably 10 ⁇ m or more, and most preferably 20 ⁇ m or more, and is preferably 300 ⁇ m or less, more preferably 100 ⁇ m or less, even more preferably 70 ⁇ m or less, particularly preferably 50 ⁇ m or less, and most preferably 30 ⁇ m or less.
  • the particle diameter of the resin particles is above the above lower limit, they are less likely to agglomerate when a metal coating layer is formed on the surface of the resin particles by electroless plating, making it difficult for agglomerated metal-coated particles to form. If the particle diameter of the resin particles is below the above upper limit, the gap controllability of the connection structure when exposed to a high-temperature environment can be further improved.
  • the particle diameter of the resin particles be 5 ⁇ m or more. This effect is even more effectively achieved, so the particle diameter of the resin particles is more preferably 10 ⁇ m or more, and even more preferably 20 ⁇ m or more. Furthermore, when the resin material is a solder paste, this effect is even more effectively achieved.
  • the particle diameter of the resin particles is preferably 5 ⁇ m or more and 100 ⁇ m or less, more preferably 10 ⁇ m or more and 100 ⁇ m or less, and even more preferably 20 ⁇ m or more and 100 ⁇ m or less. Furthermore, from the perspective of significantly improving the conductivity reliability of the connection structure after thermal cycling, it is preferable that the particle diameter of the resin particles be 10 ⁇ m or more.
  • the inventors have discovered that in order to achieve the effects of the present invention more effectively, it is important to 1) use a specific polymerizable component, 2) control the compressive modulus of the resin particles within a specific range, and 3) control the particle size of the resin particles within a specific range, that is, to combine these three requirements.
  • the particle size of the resin particles mentioned above refers to the diameter if the resin particles are spherical, and if the resin particles are other than spherical, refers to the diameter when assumed to be a perfect sphere with a volume equivalent to that of the resin particles.
  • the particle diameter of the resin particles is preferably an average particle diameter, and more preferably a number-average particle diameter. Furthermore, when the lower and upper limits of the number-average particle diameter of the resin particles satisfy the preferred lower and upper limits of the particle diameter of the resin particles, the effect is even more pronounced.
  • the particle diameter of the resin particles can be determined, for example, by observing 50 random resin particles with an electron microscope or optical microscope and calculating the average particle diameter of each resin particle, or by performing laser diffraction particle size distribution measurement. When observed with an electron microscope or optical microscope, the particle diameter of each resin particle is determined as the particle diameter in equivalent circle diameter. When observed with an electron microscope or optical microscope, the average particle diameter in equivalent circle diameter of 50 random resin particles is approximately equal to the average particle diameter in equivalent sphere diameter. When observed with a laser diffraction particle size distribution measurement, the particle diameter of each resin particle is determined as the particle diameter in equivalent sphere diameter. The particle diameter of the resin particles is preferably calculated using laser diffraction particle size distribution measurement.
  • the resin particles do not contain resin particles having a particle diameter of 1.5 times or more the average particle diameter, or contain 1000 ppm or less of resin particles having a particle diameter of 1.5 times or more the average particle diameter.
  • the content of resin particles having a particle diameter of 1.5 times or more the average particle diameter is preferably 1000 ppm or less, more preferably 100 ppm or less, even more preferably 10 ppm or less, and particularly preferably 0.1 ppm or less. This range includes 0 ppm. From the perspective of controlling the gap on or between connection target components with even greater precision, it is most preferable that the content of resin particles having a particle diameter of 1.5 times or more the average particle diameter is 0 ppm (not contained).
  • the content (ppm) of resin particles having a particle size 1.5 times or more the average particle size can be measured as follows: Resin particles are filtered through a filter with a pore size 1.5 times the average particle size, the resin particles remaining on the filter are observed under an optical microscope, and the resin particles having a particle size 1.5 times or more the average particle size are counted. The number of counted resin particles is divided by the total number of resin particles filtered to calculate the content (ppm) of resin particles having a particle size 1.5 times or more the average particle size.
  • the CV value (coefficient of variation) of the particle diameter of the resin particles is preferably 10% or less, and more preferably 8.0% or less.
  • the CV value of the particle diameter of the resin particles may be 0% or more, or 1.0% or more.
  • the range of the CV value of the particle diameter of the resin particles can be set by appropriately selecting the lower limit and upper limit.
  • the CV value (coefficient of variation) of the particle diameter of the above resin particles can be measured as follows.
  • the aspect ratio of the resin particles is preferably 1.5 or less, more preferably 1.3 or less.
  • the aspect ratio of the resin particles may be 1.0 or more, or may be 1.1 or more.
  • the aspect ratio represents the major axis/minor axis ratio.
  • the aspect ratio is preferably determined by observing 10 random resin particles with an electron microscope or optical microscope, defining the maximum and minimum diameters as the major axis and minor axis, respectively, and calculating the average major axis/minor axis ratio of each spherical resin particle.
  • the range of the aspect ratio of the resin particles can be set by appropriately selecting the lower limit and upper limit.
  • the amount of outgassing when the resin particles are heated at 250°C for 10 minutes is preferably 2000 ppm or less, more preferably 1000 ppm or less, even more preferably 800 ppm or less, particularly preferably 500 ppm or less, and most preferably 300 ppm or less. This range includes 0 ppm. Most preferably, the amount of outgassing when the resin particles are heated at 250°C for 10 minutes is 0 ppm (no outgassing).
  • the amount of outgassing when the resin particles are heated at 250°C for 10 minutes is below the above upper limit, it is possible to prevent voids from forming at the connection portion of the connection structure due to thermal cycling, and cracks or peeling from occurring between the resin particles and the metal coating layer of metal-coated particles, thereby improving the conductivity reliability of the connection structure after thermal cycling.
  • the amount of outgassing when the resin particles are heated at 250°C for 10 minutes may be 0 ppm or more, 5 ppm or more, or 10 ppm or more.
  • the range of the amount of outgassing when the resin particles are heated at 250°C for 10 minutes can be set by appropriately selecting the above lower limit and upper limit.
  • the amount of outgassing when the above resin particles are heated at 250°C for 10 minutes can be measured, for example, as follows.
  • Two samples are prepared: 5 mg of the resin particles and a known weight of toluene (toluene solution of known concentration).
  • 5 mg of the resin particles are heated at 250°C for 10 minutes while passing helium gas at a flow rate of 20 mL/min, and the generated component (A) is adsorbed and collected in a glass tube filled with an adsorbent.
  • the glass tube in which component (A) is collected is heated at 350°C for 40 minutes, and the components desorbed from the adsorbent are directly introduced into a gas chromatograph mass spectrometer and analyzed.
  • the known weight of toluene is heated at 250°C for 10 minutes, and the generated component (B) is adsorbed and collected in a glass tube filled with an adsorbent.
  • helium gas is passed through the glass tube in which component (B) is collected, the glass tube in which component (B) is collected is heated at 350°C for 40 minutes, and the components desorbed from the adsorbent are directly introduced into a gas chromatograph mass spectrometer and analyzed.
  • the peak area values of each component detected when the resin particles are used are compared with the peak area values detected when the known weight of toluene is used, and the amount of outgassing when the resin particles are heated at 250°C for 10 minutes is calculated.
  • the above known weight of toluene may be 5 mg of toluene.
  • the amount of outgassing when the above resin particles are heated at 250°C for 10 minutes is measured as follows.
  • a sample (5 mg of resin particles or a known weight of toluene) is sealed in a sample tube and heated at 250°C for 10 minutes while helium gas is passed through the sample tube at a flow rate of 20 mL/min.
  • the components volatilized by heating are adsorbed and collected in a glass tube filled with a collector (e.g., TENAX-TA). While helium gas is passed through the glass tube in which the volatilized components have been collected, the glass tube is heated at 350°C for 40 minutes.
  • the components desorbed from the adsorbent by heating are introduced directly into a gas chromatograph mass spectrometer (hereinafter referred to as GC/MS) and analyzed (ATD-GC/MS). Examples of equipment and analytical conditions used for the above measurements are as follows:
  • the sum of the peak area values of each component detected when using the above resin particles is compared with the peak area value detected when using a toluene solution of known concentration (known weight of toluene, for example, "VOCs Mixed Standard Stock Solution III” manufactured by Kanto Chemical Co., Inc.).
  • concentration of volatile components outgassing
  • the amount of outgassing (ppm) when resin particles are heated at 250°C for 10 minutes is calculated using the following formula.
  • Outgassing amount (ppm) [(sum of peak areas of volatile components from resin particles) / (toluene peak area) x toluene concentration in toluene solution ( ⁇ g/g) x measured amount of toluene solution (g)] / resin particle weight
  • Methods for adjusting the amount of outgassing within a preferred range when the resin particles are heated at 250°C for 10 minutes include using the preferred polymerizable component described above, adjusting the molecular weight of the polymerizable component, using the preferred crosslinking agent described above, adjusting the polymerization temperature and polymerization time, applying pressure during polymerization, and washing away unreacted polymerizable components (monomers).
  • the use of the resin particles is not particularly limited.
  • the resin particles are suitable for a variety of applications.
  • the resin particles are preferably used as spacers.
  • the resin particles are preferably resin particles for spacers.
  • the resin particles may be used as spacers in resin materials. Examples of the spacers include spacers for liquid crystal display elements, gap control spacers, and stress relief spacers.
  • the gap control spacers can be used for gap control of stacked chips to ensure standoff height and flatness, and for gap control of optical components to ensure smoothness of glass surfaces and thickness of adhesive layers.
  • the stress relief spacers can be used for stress relief of sensor chips and the like, and for stress relief of adhesive layers bonding two adherends.
  • the resin particles are preferably used as spacers for liquid crystal display elements, and are preferably used in a peripheral sealant for liquid crystal display elements.
  • the resin particles preferably function as spacers. Because the resin particles have good compressive deformation characteristics, when the resin particles are used as spacers and placed between substrates, the resin particles are efficiently placed between the substrates. Furthermore, the resin particles can prevent scratches on liquid crystal display element components, etc., so display defects are less likely to occur in liquid crystal display elements using the liquid crystal display element spacers.
  • the resin particles are also suitable for use as inorganic fillers, toner additives, shock absorbers, or vibration absorbers.
  • the resin particles can be used as a substitute for rubber or springs.
  • the resin particles may also be used to obtain the metal-coated particles described below.
  • the content of the polymer of the polymerizable component in 100% by weight of the resin particles is preferably 80% by weight or more, more preferably 85% by weight or more, even more preferably 90% by weight or more, and particularly preferably 95% by weight or more.
  • the content of the polymer of the polymerizable component is equal to or greater than the above lower limit, the 20% K value of the resin particles at 25°C and 200°C can be easily adjusted within a preferred range, further improving the gap controllability of the connection structure when exposed to a high-temperature environment.
  • the content of the polymer of the polymerizable component in 100% by weight of the resin particles may be equal to or less than 100% by weight (total amount).
  • the range of the content of the polymer of the polymerizable component in 100% by weight of the resin particles can be set by appropriately selecting the above lower limit and upper limit.
  • the content of the divinylbenzene is preferably 20% by weight or more, more preferably 25% by weight or more, even more preferably 30% by weight or more, particularly preferably 40% by weight or more, and most preferably 45% by weight or more, and is preferably 80% by weight or less, more preferably 75% by weight or less, even more preferably 70% by weight or less, particularly preferably 65% by weight or less, and most preferably 60% by weight or less.
  • the content of the divinylbenzene is above the above lower limit and below the above upper limit, the effects of the present invention can be more effectively exerted, and the conductivity reliability of the connection structure after thermal cycling can be further improved.
  • the content of the divinylbenzene is above the above lower limit, the heat resistance of the resin particles can be improved.
  • the content of the divinylbenzene is below the above upper limit, the amount of remaining unreacted polymerizable component (monomer) can be reduced.
  • the content of the (meth)acrylate compound having four or more (meth)acryloyl groups in 100% by weight of the polymerizable component is preferably 20% by weight or more, more preferably 25% by weight or more, even more preferably 30% by weight or more, even more preferably 35% by weight or more, particularly preferably 40% by weight or more, and most preferably 45% by weight or more, and is preferably 80% by weight or less, more preferably 75% by weight or less, even more preferably 70% by weight or less, even more preferably 65% by weight or less, even more preferably 60% by weight or less, particularly preferably 55% by weight or less, and most preferably 50% by weight or less.
  • the effects of the present invention can be more effectively exerted, and the conductivity reliability of the connection structure after thermal cycling can be further improved.
  • the content of the (meth)acrylate compound having four or more (meth)acryloyl groups is above the above lower limit, the degree of crosslinking of the resin particles can be increased.
  • the content of the (meth)acrylate compound having four or more (meth)acryloyl groups is equal to or less than the above upper limit, the heat resistance of the resin particles can be improved.
  • the total content of the divinylbenzene and the (meth)acrylate compound having four or more (meth)acryloyl groups is preferably 80% by weight or more, more preferably 85% by weight or more, even more preferably 90% by weight or more, and particularly preferably 95% by weight or more.
  • the total content of the divinylbenzene and the (meth)acrylate compound having four or more (meth)acryloyl groups is equal to or greater than the above lower limit, the effects of the present invention can be more effectively achieved.
  • the total content of the divinylbenzene and the (meth)acrylate compound having four or more (meth)acryloyl groups may be 100% by weight or less (total amount), or may be less than 100% by weight.
  • the range of the total content of the divinylbenzene and the (meth)acrylate compound having four or more (meth)acryloyl groups per 100% by weight of the polymerizable component can be set by appropriately selecting the lower limit and upper limit.
  • the weight ratio of the content of the divinylbenzene in the polymerizable component to the content of the (meth)acrylate compound having four or more (meth)acryloyl groups in the polymerizable component is defined as the weight ratio (content of divinylbenzene/content of (meth)acrylate compound having four or more (meth)acryloyl groups).
  • the weight ratio (content of divinylbenzene/content of (meth)acrylate compound having four or more (meth)acryloyl groups) is preferably 0.30 or more, more preferably 0.40 or more, even more preferably 0.50 or more, even more preferably 0.60 or more, particularly preferably 0.70 or more, and most preferably 0.80 or more, and is preferably 10.00 or less, more preferably 5.00 or less, even more preferably 4.00 or less, even more preferably 3.00 or less, particularly preferably 2.00 or less, and most preferably 1.50 or less.
  • the weight ratio (divinylbenzene content/(meth)acrylate compound content having four or more (meth)acryloyl groups) is equal to or greater than the lower limit and equal to or less than the upper limit, the effects of the present invention can be more effectively achieved.
  • the weight ratio (divinylbenzene content/(meth)acrylate compound content having four or more (meth)acryloyl groups) is equal to or greater than the lower limit, the heat resistance of the resin particles can be improved.
  • the weight ratio (divinylbenzene content/(meth)acrylate compound content having four or more (meth)acryloyl groups) is equal to or less than the upper limit, the degree of crosslinking of the resin particles can be increased, and the amount of remaining unreacted polymerizable component (monomer) can be reduced.
  • the metal-coated particles according to the present invention comprise the resin particles described above and a metal coating layer disposed on the surface of the resin particles. Because the metal-coated particles according to the present invention have the above-described configuration, when used as spacers, the metal-coated particles can improve the gap controllability of a connection structure when exposed to a high-temperature environment and can also improve the conduction reliability of the connection structure after thermal cycling.
  • the resin particles are preferably used to form a metal coating layer on their surfaces to obtain metal-coated particles having the metal coating layer, or the resin particles have a particle diameter of 5 ⁇ m or more and 100 ⁇ m or less.
  • the resin material using the resin particles or metal-coated particles is cured, the occurrence of cracks in the cured product can be suppressed.
  • the gap controllability of the connection structure can be significantly improved.
  • the conductivity reliability of the connection structure after thermal cycling can be significantly improved.
  • the resin particles are more preferably used to form a metal coating layer on their surfaces to obtain metal-coated particles having the metal coating layer, or the resin particles have a particle diameter of 10 ⁇ m or more and 100 ⁇ m or less.
  • the resin particles are more preferably used to form a metal coating layer on their surfaces to obtain metal-coated particles having the metal coating layer, or the resin particles have a particle diameter of 20 ⁇ m or more and 100 ⁇ m or less.
  • the resin particles are preferably used to obtain metal-coated particles having the metal coating layer by forming a metal coating layer on the surface (use of the resin particles to obtain metal-coated particles having the metal coating layer by forming a metal coating layer on the surface).
  • the resin material using the metal-coated particles is cured, the occurrence of cracks in the cured product can be suppressed, and when a connection structure using the resin material is exposed to a high-temperature environment, the gap controllability of the connection structure can be significantly improved. Furthermore, the conductivity reliability of the connection structure after thermal cycling can be significantly improved.
  • Figure 2 is a cross-sectional view schematically showing metal-coated particles using resin particles according to the first embodiment of the present invention.
  • the metal-coated particle 11 shown in Figure 2 has a resin particle 1 and a metal coating layer 2 disposed on the surface of the resin particle 1.
  • the metal coating layer 2 coats the surface of the resin particle 1.
  • the metal-coated particle 11 is a coated particle in which the surface of the resin particle 1 is coated with the metal coating layer 2.
  • the compressive modulus of elasticity when the metal-coated particles are compressed 20% at 200°C (20% K value of the metal-coated particles at 200°C) is preferably 1000 N/mm2 or more , more preferably 1500 N/mm2 or more , and even more preferably 2000 N/mm2 or more , and is preferably 20,000 N/mm2 or less , more preferably 10,000 N/mm2 or less , and even more preferably 6,000 N/mm2 or less.
  • the 20% K value of the metal-coated particles at 200°C is the above-mentioned lower limit or more, the gap controllability of the connection structure when exposed to a high-temperature environment can be further improved.
  • the 20% K value of the metal-coated particles at 200°C is the above-mentioned upper limit or less, destruction of the metal-coated particles in the connection structure when exposed to a high-temperature environment can be further prevented.
  • the compressive modulus of the metal-coated particles when compressed 20% at 25°C (20% K value of the metal-coated particles at 25°C) is preferably 1500 N/mm2 or more , more preferably 2000 N/mm2 or more , even more preferably 2500 N/ mm2 or more, and preferably 20000 N/mm2 or less , more preferably 15000 N/mm2 or less , and even more preferably 8000 N/mm2 or less.
  • the 20% K value of the metal-coated particles at 25°C is the above-mentioned lower limit or more, the gap controllability of the connection structure when exposed to a high-temperature environment can be further improved.
  • the 20% K value of the metal-coated particles at 25°C is the above-mentioned upper limit or less, the metal-coated particles can better follow the connection target members (substrates, etc.), and the gap controllability can be further improved.
  • the ratio of the compressive modulus when the metal-coated particle is compressed 20% at 25°C to the compressive modulus when the metal-coated particle is compressed 20% at 200°C is defined as the ratio (20% K value of metal-coated particle at 25°C/20% K value of metal-coated particle at 200°C).
  • This ratio (20% K value of metal-coated particle at 25°C/20% K value of metal-coated particle at 200°C) is preferably 0.7 or more, more preferably 0.9 or more, even more preferably 1.0 or more, and is preferably 3.0 or less, more preferably 2.5 or less, and even more preferably 2.0 or less.
  • the gap controllability of the connection structure when exposed to a high-temperature environment can be further improved.
  • the 20% K values of the above metal-coated particles at 25°C and 200°C can be measured as follows.
  • the metal-coated particles are compressed with the smooth end face of a cylindrical indenter (diameter 50 ⁇ m, made of diamond) at 25°C or 100°C under conditions where a maximum test load of 90 mN is applied for 30 seconds.
  • the load value (N) and compression displacement (mm) at this time are measured. From the obtained measured values, the compressive modulus can be calculated using the following formula.
  • micro-compression testing machines that can be used include the Fischerscope H-100 manufactured by Fischer and the ENT-5 manufactured by Elionix.
  • the compression recovery rate of the metal-coated particles at 25°C is preferably 20% or more, more preferably 25% or more, and even more preferably 30% or more, and is preferably 95% or less, more preferably 90% or less, and even more preferably 85% or less.
  • the compression recovery rate can be measured as follows.
  • Metal-coated particles are scattered on a sample stage.
  • a load (reversed load value) is applied to each scattered metal-coated particle at 25°C with the smooth end face of a cylindrical (diameter 100 ⁇ m, made of diamond) in the direction of the center of the metal-coated particle until the metal-coated particle is compressed by 40%.
  • the load is then released to the origin load value (0.40 mN).
  • the load-compression displacement during this period is measured, and the compression recovery rate can be calculated using the formula below.
  • the loading rate is 0.33 mN/sec.
  • Examples of micro-compression testing machines that can be used include the Fischerscope H-100 manufactured by Fischer and the ENT-5 manufactured by Elionix.
  • Compression recovery rate (%) (L2/L1) x 100
  • L1 Compression displacement from the load value for origin when applying a load to the reverse load value.
  • L2 Unloading displacement from the reverse load value when releasing the load to the load value for origin.
  • the particle diameter of the metal-coated particles is preferably 0.5 ⁇ m or more, more preferably 1.0 ⁇ m or more, even more preferably 2 ⁇ m or more, even more preferably 5 ⁇ m or more, particularly preferably 10 ⁇ m or more, and most preferably 20 ⁇ m or more, and is preferably 300 ⁇ m or less, more preferably 100 ⁇ m or less, even more preferably 70 ⁇ m or less, particularly preferably 50 ⁇ m or less, and most preferably 30 ⁇ m or less.
  • the particle diameter of the metal-coated particles is above the above lower limit or below the above upper limit, agglomerated metal-coated particles are less likely to form when the metal coating layer is formed, the gap between the substrates (connection target components) does not become too large, and the metal coating layer is less likely to peel off from the surface of the resin particles.
  • the particle diameter of the metal-coated particles is preferably 5 ⁇ m or greater, since this can suppress the occurrence of cracks in the cured product, particularly when a resin material using the metal-coated particles is cured, and can significantly improve the gap controllability of the connection structure when the connection structure using the resin material is exposed to a high-temperature environment. These effects are even more effectively achieved, so the particle diameter of the metal-coated particles is more preferably 10 ⁇ m or greater, and even more preferably 20 ⁇ m or greater. Furthermore, when the resin material is a solder paste, these effects are even more effectively achieved.
  • the particle diameter of the metal-coated particles is preferably 5 ⁇ m or greater but 100 ⁇ m or less, more preferably 10 ⁇ m or greater but 100 ⁇ m or less, and even more preferably 20 ⁇ m or greater but 100 ⁇ m or less. Furthermore, from the perspective of significantly improving the conductivity reliability of the connection structure after thermal cycling, the particle diameter of the metal-coated particles is preferably 10 ⁇ m or greater.
  • the inventors have discovered that, in order to achieve the effects of the present invention more effectively, it is important to 1) use a specific polymerizable component for the resin particles, 2) control the compressive modulus of the resin particles in the metal-coated particles within a specific range, and 3) control the particle size of the metal-coated particles within a specific range; in other words, it is important to combine these three requirements.
  • the particle size of the above-mentioned metal-coated particles refers to the diameter if the metal-coated particles are spherical, and if the metal-coated particles are in a shape other than spherical, refers to the diameter when assumed to be a perfect sphere with a volume equivalent to that of the particles.
  • the particle diameter of the metal-coated particles is preferably an average particle diameter, and more preferably a number-average particle diameter. Furthermore, the effect is even more pronounced when the lower and upper limits of the number-average particle diameter of the metal-coated particles satisfy the preferred lower and upper limits of the particle diameter of the metal-coated particles.
  • the particle diameter of the metal-coated particles can be determined, for example, by observing 50 random metal-coated particles with an electron microscope or optical microscope and calculating the average particle diameter of each metal-coated particle, or by performing laser diffraction particle size distribution measurement. When observed with an electron microscope or optical microscope, the particle diameter of each metal-coated particle is determined as the particle diameter in equivalent circle diameter.
  • the average particle diameter in equivalent circle diameter of 50 random metal-coated particles is approximately equal to the average particle diameter in equivalent sphere diameter.
  • the particle diameter of each metal-coated particle is determined as the particle diameter in equivalent sphere diameter.
  • the particle diameter of the metal-coated particles is preferably calculated using laser diffraction particle size distribution measurement.
  • the metal used to form the metal coating layer is not particularly limited.
  • the metal include gold, silver, palladium, copper, platinum, zinc, iron, tin, lead, aluminum, cobalt, indium, nickel, chromium, titanium, antimony, bismuth, thallium, germanium, cadmium, silicon, tungsten, molybdenum, and alloys thereof.
  • Other examples of the metal include tin-doped indium oxide (ITO) and solder. From the perspective of further improving the reliability of connections between electrodes, the metal is preferably a tin-containing alloy, nickel, palladium, copper, or gold, and more preferably nickel or palladium.
  • the metal coating layer may be formed from a single layer.
  • the metal coating layer may also be formed from multiple layers. That is, the metal coating layer may have a laminated structure of two or more layers.
  • the outermost layer is preferably a gold layer, a nickel layer, a palladium layer, a copper layer, or an alloy layer containing tin and silver, and more preferably a gold layer.
  • the connection reliability between electrodes can be further improved.
  • the outermost layer is a gold layer
  • corrosion resistance can be further improved.
  • the method for forming the metal coating layer on the surface of the resin particles is not particularly limited.
  • methods for forming the metal coating layer include electroless plating, electroplating, physical vapor deposition, and coating the surface of the resin particles with a metal powder or a paste containing a metal powder and a binder. From the perspective of forming the metal coating layer more easily, electroless plating is preferred.
  • physical vapor deposition methods include vacuum deposition, ion plating, and ion sputtering.
  • the thickness of the metal coating layer is preferably 0.005 ⁇ m or more, more preferably 0.01 ⁇ m or more, even more preferably 0.05 ⁇ m or more, even more preferably 0.1 ⁇ m or more, particularly preferably 0.15 ⁇ m or more, and most preferably 0.2 ⁇ m or more, and is preferably 10 ⁇ m or less, more preferably 1 ⁇ m or less, and even more preferably 0.3 ⁇ m or less.
  • the thickness of the metal coating layer refers to the thickness of the entire metal coating layer if the metal coating layer is multi-layered. When the thickness of the metal coating layer is above the above lower limit and below the above upper limit, the metal-coated particles do not become too hard and can sufficiently deform between substrates (connection target components). In particular, when the thickness of the metal coating layer is 0.2 ⁇ m or more, the effects of the present invention can be more effectively exerted, and the conductivity reliability of the connection structure after thermal cycling can be further improved.
  • the thickness of the outermost metal coating layer is preferably 0.001 ⁇ m or more, more preferably 0.01 ⁇ m or more, and preferably 0.5 ⁇ m or less, more preferably 0.1 ⁇ m or less.
  • the thickness of the outermost metal coating layer is equal to or greater than the above-mentioned lower limit and equal to or less than the above-mentioned upper limit, the coating by the outermost metal coating layer becomes uniform, corrosion resistance becomes sufficiently high, and the connection reliability between electrodes can be further improved.
  • the outermost layer is a gold layer, the thinner the gold layer, the lower the cost.
  • the thickness of the metal coating layer can be measured by observing the cross section of the metal-coated particle using, for example, a transmission electron microscope (TEM). It is preferable to calculate the thickness of the metal coating layer by averaging the thickness of five arbitrary metal coating layers, and it is more preferable to calculate the average thickness of the entire metal coating layer as the thickness of the metal coating layer of one metal-coated particle. It is preferable to determine the thickness of the metal coating layer by calculating the average thickness of the metal coating layer for 50 arbitrary metal-coated particles. It is preferable that the thickness of the metal coating layer is an average thickness.
  • TEM transmission electron microscope
  • the resin material according to the present invention is a resin material containing the resin particles described above and a binder resin, or a resin material containing metal-coated particles having the resin particles and a metal coating layer disposed on the surface of the resin particles, and a binder resin.
  • the resin particles or the metal-coated particles are dispersed in the binder resin. Because the resin material according to the present invention has the above configuration, it is possible to improve the gap controllability of the connection structure when exposed to a high-temperature environment and to improve the conduction reliability of the connection structure after thermal cycling.
  • the resin material preferably further contains conductive particles.
  • the resin material preferably further contains conductive particles different from the metal-coated particles.
  • the conductive particles are different from the resin particles.
  • the resin material is preferably a conductive material further containing conductive particles.
  • the resin material is preferably a conductive material.
  • the resin material is suitably used for electrical connection between electrodes.
  • the resin material is preferably a circuit connection material.
  • the resin material can be used as a conductive paste, a conductive film, etc.
  • the resin material according to the present invention is a conductive film, a film not containing conductive particles may be laminated on a conductive film containing conductive particles.
  • the conductive paste is preferably an isotropic conductive paste.
  • the conductive film is preferably an isotropic conductive film.
  • the resin particles are preferably used together with conductive particles, more preferably together with solder particles.
  • the metal-coated particles are preferably used together with conductive particles, more preferably together with solder particles.
  • the resin material preferably contains the resin particles or the metal-coated particles and the conductive particles, more preferably the resin particles or the metal-coated particles and the solder particles.
  • the metal-coated particles are preferably different from the solder particles and preferably do not contain solder.
  • the present specification also discloses the following invention: Use of the above-mentioned resin particles, or the above-mentioned resin particles and metal-coated particles disposed on the surfaces of the above-mentioned resin particles, in a solder paste containing solder particles and a binder resin.
  • the content of the resin particles or metal-coated particles in 100% by weight of the resin material (solder paste) is preferably 0.1% by weight or more, more preferably 1% by weight or more, even more preferably 2% by weight or more, particularly preferably 5% by weight or more, and most preferably 10% by weight or more, and is preferably 80% by weight or less, more preferably 60% by weight or less, and even more preferably 50% by weight or less.
  • the content of the resin particles or metal-coated particles is above the above lower limit and below the above upper limit, the effects of the present invention can be more effectively exerted, and the conductivity reliability of the connection structure after thermal cycling can be further improved.
  • the conductive particles may be solder particles or metal particles.
  • the metal particles may be metal powder.
  • the conductive particles may include a base particle and a conductive portion disposed on the surface of the base particle.
  • the conductive particles are preferably solder particles.
  • the resin material preferably further contains solder particles.
  • the resin material is preferably a solder paste containing solder particles. The solder paste contains the above-mentioned components of the resin material.
  • the solder particles are formed of solder at both their center and outer surface.
  • the solder particles are particles in which both their center and outer surface are solder.
  • the solder is preferably a metal (low-melting-point metal) with a melting point of 450°C or less.
  • the solder particles are preferably metal particles (low-melting-point metal particles) with a melting point of 450°C or less.
  • the low-melting-point metal particles are particles containing a low-melting-point metal.
  • the low-melting-point metal refers to a metal with a melting point of 450°C or less.
  • the melting point of the low-melting-point metal is preferably 300°C or less, more preferably 220°C or less, and even more preferably 190°C or less.
  • the melting point of the solder particles is preferably 100°C or higher, more preferably 105°C or higher, and preferably 250°C or lower, more preferably 245°C or lower.
  • the melting point of the solder particles is above the above lower limit and below the above upper limit, the cohesion of the solder during conductive connection can be more effectively improved.
  • the melting point of the solder particles is above the above lower limit and below the above upper limit, when electrodes are electrically connected using a resin material (conductive material), the conductivity reliability can be more effectively improved and the insulation reliability can be more effectively improved.
  • the melting point range of the solder particles can be set by appropriately selecting the above lower limit and upper limit.
  • the melting point of the solder particles can be determined by differential scanning calorimetry (DSC).
  • DSC differential scanning calorimetry
  • Examples of differential scanning calorimetry (DSC) devices include the EXSTAR DSC7020 manufactured by SII Corporation.
  • the solder particles preferably contain tin.
  • the tin content of 100% by weight of the metal contained in the solder particles is preferably 30% by weight or more, more preferably 40% by weight or more, even more preferably 70% by weight or more, and particularly preferably 90% by weight or more.
  • the tin content of 100% by weight of the metal contained in the solder particles may be equal to or less than 100% by weight.
  • the range of the tin content of 100% by weight of the metal contained in the solder particles can be set by appropriately selecting the above lower limit and upper limit.
  • the tin content can be measured using a high-frequency inductively coupled plasma optical emission spectrometer ("ICP-AES” manufactured by Horiba, Ltd.) or an X-ray fluorescence spectrometer ("EDX-800HS” manufactured by Shimadzu Corporation).
  • ICP-AES high-frequency inductively coupled plasma optical emission spectrometer
  • EDX-800HS X-ray fluorescence spectrometer
  • the solder melts and bonds to the electrodes, and the solder portion provides electrical conductivity between the electrodes.
  • the solder portion and electrode are more likely to make surface contact rather than point contact, which reduces connection resistance.
  • the use of the above solder particles increases the bonding strength between the solder portion and electrode, making it even less likely for the solder portion and electrode to peel off, thereby more effectively improving electrical continuity and connection reliability.
  • the low-melting point metal constituting the solder particles is not particularly limited.
  • the low-melting point metal is preferably tin or an alloy containing tin. Examples of such alloys include tin-silver alloys, tin-copper alloys, tin-silver-copper alloys, tin-bismuth alloys, tin-zinc alloys, and tin-indium alloys. Because of their excellent wettability with electrodes, the low-melting point metal is preferably tin, tin-silver alloys, tin-silver-copper alloys, tin-bismuth alloys, or tin-indium alloys. It is more preferable that the low-melting point metal be a tin-bismuth alloy or a tin-indium alloy.
  • the solder particles are preferably filler metal with a liquidus temperature of 450°C or less, based on JIS Z3001: Welding Terminology.
  • Examples of the composition of the solder particles include metal compositions containing zinc, gold, silver, lead, copper, tin, bismuth, indium, etc.
  • the solder particles preferably do not contain lead, and preferably contain tin and indium, or tin and bismuth.
  • the solder particles may contain metals such as nickel, copper, antimony, aluminum, zinc, iron, gold, titanium, phosphorus, germanium, tellurium, cobalt, bismuth, manganese, chromium, molybdenum, and palladium. Furthermore, from the perspective of even more effectively increasing the bond strength between the solder portion and the electrode, the solder particles preferably contain nickel, copper, antimony, aluminum, or zinc.
  • the content of these metals in the solder particles to increase the bond strength is preferably 0.0001% by weight or more, and preferably 1% by weight or less, based on 100% by weight of the metals contained in the solder particles.
  • the average particle diameter of the solder particles is preferably 0.01 ⁇ m or more, more preferably 0.03 ⁇ m or more. If the average particle diameter of the solder particles is equal to or greater than the above-mentioned lower limit, the solder can be arranged on the electrode more efficiently.
  • the average particle diameter of the solder particles may be 10 ⁇ m or less, 5 ⁇ m or less, or 3 ⁇ m or less.
  • the range of the average particle diameter of the solder particles can be set by appropriately selecting the above-mentioned lower limit and upper limit.
  • the average particle diameter of the solder particles is the number average particle diameter.
  • the average particle diameter of the solder particles can be determined, for example, by observing 50 random solder particles with an electron microscope or optical microscope and calculating the average particle diameter of each solder particle, or by performing laser diffraction particle size distribution measurement. When observed with an electron microscope or optical microscope, the particle diameter of each solder particle is determined as the particle diameter in equivalent circle diameter. When observed with an electron microscope or optical microscope, the average particle diameter of 50 random solder particles in equivalent circle diameter is approximately equal to the average particle diameter in equivalent sphere diameter. When using laser diffraction particle size distribution measurement, the particle diameter of each solder particle is determined as the particle diameter in equivalent sphere diameter.
  • the average particle diameter of the solder particles is preferably calculated using laser diffraction particle size distribution measurement.
  • the coefficient of variation (CV value) of the particle diameter of the solder particles is preferably 40% or less, and more preferably 30% or less. When the coefficient of variation of the particle diameter of the solder particles is equal to or less than the above upper limit, the solder can be arranged on the electrode more efficiently.
  • the coefficient of variation (CV value) of the particle diameter of the solder particles may be 0% or more, 1% or more, 5% or more, or 10% or more. However, the CV value of the particle diameter of the solder particles may be less than 5%.
  • the range of the coefficient of variation of the particle diameter of the solder particles can be set by appropriately selecting the above lower limit and upper limit.
  • CV value The above coefficient of variation (CV value) can be measured as follows:
  • CV value (%) ( ⁇ /Dn) ⁇ 100 ⁇ : Standard deviation of solder particle diameter Dn: Average value of solder particle diameter
  • the shape of the solder particles is not particularly limited.
  • the solder particles may be spherical, or may be flat or have other shapes than spherical.
  • the content of the solder particles in 100% by weight of the resin material (solder paste) is preferably 1% by weight or more, more preferably 2% by weight or more, even more preferably 10% by weight or more, particularly preferably 20% by weight or more, and most preferably 30% by weight or more, and is preferably 80% by weight or less, more preferably 60% by weight or less, and even more preferably 50% by weight or less.
  • the content of the solder particles is above the above lower limit and below the above upper limit, solder can be more efficiently arranged on the electrodes, making it easier to arrange a large amount of solder between the electrodes, and the conductivity reliability of the connection structure after thermal cycling can be more effectively improved. From the perspective of more effectively improving conductivity reliability, a higher content of the solder particles is preferable.
  • the binder resin is not particularly limited. Known insulating resins can be used as the binder resin.
  • the binder resin preferably contains a thermoplastic component (thermoplastic compound) or a curable component, and more preferably contains a curable component.
  • the curable component include a photocurable component and a thermosetting component.
  • the photocurable component preferably contains a photocurable compound and a photopolymerization initiator.
  • the thermosetting component preferably contains a thermosetting compound and a thermosetting agent.
  • the binder resin include vinyl resins, thermoplastic resins, curable resins, thermoplastic block copolymers, and elastomers. Only one type of binder resin can be used, or two or more types can be used in combination.
  • Examples of the vinyl resin include vinyl acetate resin, acrylic resin, and styrene resin.
  • examples of the thermoplastic resin include polyolefin resin, ethylene-vinyl acetate copolymer, and polyamide resin.
  • examples of the curable resin include epoxy resin, urethane resin, polyimide resin, and unsaturated polyester resin.
  • the curable resin may be a room temperature curable resin, a thermosetting resin, a photocurable resin, or a moisture curable resin.
  • the curable resin may be used in combination with a curing agent.
  • thermoplastic block copolymer examples include styrene-butadiene-styrene block copolymer, styrene-isoprene-styrene block copolymer, hydrogenated styrene-butadiene-styrene block copolymer, and hydrogenated styrene-isoprene-styrene block copolymer.
  • the elastomer include styrene-butadiene copolymer rubber and acrylonitrile-styrene block copolymer rubber.
  • the resin material may also contain various additives such as fillers, extenders, softeners, plasticizers, polymerization catalysts, curing catalysts, colorants, antioxidants, heat stabilizers, light stabilizers, UV absorbers, lubricants, antistatic agents, and flame retardants.
  • additives such as fillers, extenders, softeners, plasticizers, polymerization catalysts, curing catalysts, colorants, antioxidants, heat stabilizers, light stabilizers, UV absorbers, lubricants, antistatic agents, and flame retardants.
  • the resin particles or metal-coated particles can be dispersed in the binder resin by any conventionally known dispersion method.
  • methods for dispersing the resin particles or metal-coated particles in the binder resin include the following: A method in which the resin particles or metal-coated particles are added to the binder resin and then kneaded and dispersed using a planetary mixer or the like; A method in which the resin particles or metal-coated particles are uniformly dispersed in water or an organic solvent using a homogenizer or the like, then added to the binder resin, and then kneaded and dispersed using a planetary mixer or the like; A method in which the binder resin is diluted with water or an organic solvent, and then the resin particles or metal-coated particles are added, and then kneaded and dispersed using a planetary mixer or the like.
  • the viscosity ( ⁇ 25) of the resin material at 25°C is preferably 30 Pa ⁇ s or more, more preferably 50 Pa ⁇ s or more, and preferably 400 Pa ⁇ s or less, more preferably 300 Pa ⁇ s or less.
  • the viscosity ( ⁇ 25) can be adjusted appropriately by changing the types and amounts of the blended components.
  • the viscosity ( ⁇ 25) is measured, for example, using an E-type viscometer at 25°C and 10 rpm.
  • E-type viscometers include the "VISCOMETER TV-22" manufactured by Toki Sangyo Co., Ltd.
  • the content of the binder resin is preferably 10% by weight or more, more preferably 30% by weight or more, even more preferably 50% by weight or more, and particularly preferably 70% by weight or more, and is preferably 99.99% by weight or less, even more preferably 99.9% by weight or less, even more preferably 99% by weight or less, even more preferably 98% by weight or less, even more preferably 90% by weight or less, even more preferably 80% by weight or less, particularly preferably 70% by weight or less, and most preferably 65% by weight or less.
  • the effects of the present invention can be more effectively exerted, and the conductivity reliability of the connection structure after thermal cycling can be further improved. Furthermore, when the content of the binder resin is above the above lower limit and below the above upper limit, conductive particles or metal-coated particles are efficiently arranged between the electrodes, and the connection reliability of the connection target components connected by the resin material is further improved.
  • connection structure can be obtained by connecting connection target members using the resin particles described above.
  • connection structure using the resin particles includes a first connection target member, a second connection target member, and a connection portion connecting the first connection target member and the second connection target member.
  • the connection portion contains the resin particles or the metal-coated particles.
  • the connection portion is formed from the resin particles or the metal-coated particles, or from a composition containing the resin particles.
  • connection structure can be obtained by connecting components to be connected using a conductive material containing the above-mentioned resin particles or metal-coated particles, a binder resin, and conductive particles.
  • connection structure has the above configuration, which improves the gap controllability of the connection structure when exposed to a high-temperature environment and also improves the conductivity reliability after thermal cycling.
  • connection structure using the resin particles or the metal-coated particles comprises a first connection target member having a first electrode on its surface, a second connection target member having a second electrode on its surface, and a connection portion connecting the first connection target member and the second connection target member.
  • the connection portion contains the resin particles.
  • the connection portion is preferably formed from a resin material (conductive material) containing the resin particles or the metal-coated particles, conductive particles, and a binder resin.
  • the conductive particles are preferably solder particles.
  • the resin material is preferably a solder paste containing solder particles.
  • connection portion is formed from a resin material (conductive material) containing the resin particles or the metal-coated particles, conductive particles, and a binder resin, in the connection structure, it is preferable that the first electrode and the second electrode are electrically connected by the conductive particles. If the connection portion is formed from a resin material (solder paste) containing the resin particles or the metal-coated particles, solder particles, and a binder resin, it is more preferable that the first electrode and the second electrode in the connection structure are electrically connected by a solder portion.
  • solder paste containing the resin particles or the metal-coated particles, solder particles, and a binder resin
  • connection portion of the above-mentioned connection structure be formed from a resin material (conductive material) containing the above-mentioned metal-coated particles, conductive particles, and a binder resin. From the viewpoint of further improving the conductivity reliability after thermal cycling and increasing the dispersibility of each component in the conductive material, it is even more preferable that the connection portion of the above-mentioned connection structure be formed from a resin material (solder paste) containing the above-mentioned metal-coated particles, solder particles, and a binder resin.
  • Figure 3 is a cross-sectional view showing an example of a connection structure obtained using resin particles according to the first embodiment of the present invention.
  • connection structure 41 shown in Figure 3 comprises a first member to be connected 42, a second member to be connected 43, and a connection portion 44 connecting the first member to be connected 42 and the second member to be connected 43.
  • the connection portion 44 is formed from a resin material (solder paste) containing resin particles 1, solder particles, and a binder resin.
  • the resin particles 1 are used as spacers. The resin particles 1 control the distance between the first member to be connected 42 and the second member to be connected 43.
  • Figure 4 is a cross-sectional view showing an example of a connection structure obtained using metal-coated particles made from resin particles according to the first embodiment of the present invention.
  • connection structure 51 shown in Figure 4 comprises a first member to be connected 42, a second member to be connected 43, and a connection portion 44 connecting the first member to be connected 42 and the second member to be connected 43.
  • the connection portion 44 is formed from a resin material (solder paste) containing metal-coated particles 11, solder particles, and a binder resin.
  • the metal-coated particles 11 are used as spacers. The metal-coated particles 11 control the distance between the first member to be connected 42 and the second member to be connected 43.
  • connection portion 44 includes a solder portion 3 formed by joining together multiple solder particles, and a resin portion 4 formed from a binder resin. If the binder resin contains a curable component, the resin portion is preferably a cured portion of the binder resin.
  • the first connection target member 42 has a plurality of first electrodes 42a on its surface (top surface).
  • the second connection target member 43 has a plurality of second electrodes 43a on its surface (bottom surface).
  • the first electrodes 42a and second electrodes 43a are electrically connected by solder portions 3. Therefore, the first connection target member 42 and the second connection target member 43 are electrically connected by solder portions 3.
  • no solder is present in a region (resin portion 4) other than the solder portions 3 gathered between the first electrode 42a and the second electrode 43a.
  • no solder is present apart from the solder portions 3. Note that a small amount of solder may be present in a region (resin portion 4) other than the solder portions 3 gathered between the first electrode 42a and the second electrode 43a.
  • connection structures 41 and 51 multiple solder particles gather between the first electrode 42a and the second electrode 43a. After the multiple solder particles melt, the molten solder particles wet and spread over the surface of the electrodes before solidifying, forming solder portion 3. This increases the connection area between solder portion 3 and the first electrode 42a, and between solder portion 3 and the second electrode 43a. In other words, the use of solder particles increases the contact area between solder portion 3 and the first electrode 42a, and between solder portion 3 and the second electrode 43a, compared to when conductive particles whose outer surface is made of a metal such as nickel, gold, or copper are used. This increases the conductivity and connection reliability of connection structures 41 and 51 after thermal cycling.
  • the method for manufacturing the connection structure is not particularly limited.
  • One example of a method for manufacturing a connection structure is to place the resin material (conductive material) between a first member to be connected and a second member to be connected, obtain a laminate, and then heat and pressurize the laminate.
  • the pressure applied during the pressurization is preferably 40 MPa or more, more preferably 60 MPa or more, and preferably 90 MPa or less, more preferably 70 MPa or less.
  • the conductive material is a solder paste containing solder particles
  • the connection structure may be manufactured without pressurizing the laminate.
  • the temperature during the heating is preferably 80°C or more, more preferably 100°C or more, and preferably 250°C or less, more preferably 190°C or less.
  • the first and second connection target members are not particularly limited. Specific examples of the first and second connection target members include electronic components such as semiconductor chips, semiconductor packages, LED chips, LED packages, capacitors, and diodes, as well as electronic components such as resin films, printed circuit boards, flexible printed circuit boards, flexible flat cables, rigid-flexible boards, glass epoxy boards, and glass boards. It is preferable that the first and second connection target members are electronic components.
  • the resin material is preferably a conductive material for connecting electronic components.
  • the resin material is preferably a conductive paste material, and is preferably applied in paste form onto the components to be connected.
  • connection target member is preferably a flexible substrate, or a connection target member in which electrodes are arranged on the surface of a resin film.
  • the connection target member is preferably a flexible substrate, and is preferably a connection target member in which electrodes are arranged on the surface of a resin film.
  • the flexible substrate is a flexible printed circuit board or the like, the flexible substrate generally has electrodes on its surface.
  • the electrodes provided on the connection target members include metal electrodes such as gold electrodes, nickel electrodes, tin electrodes, aluminum electrodes, copper electrodes, molybdenum electrodes, silver electrodes, SUS electrodes, and tungsten electrodes.
  • the electrodes are preferably gold electrodes, nickel electrodes, tin electrodes, silver electrodes, or copper electrodes.
  • the connection target members are glass substrates, the electrodes are preferably aluminum electrodes, copper electrodes, molybdenum electrodes, or tungsten electrodes.
  • the electrodes are aluminum electrodes, they may be formed solely from aluminum, or may be electrodes in which an aluminum layer is laminated on the surface of a metal oxide layer. Examples of materials for the metal oxide layer include indium oxide doped with a trivalent metal element and zinc oxide doped with a trivalent metal element. Examples of the trivalent metal elements include Sn, Al, and Ga.
  • the resin particles can also be suitably used as spacers for liquid crystal display elements.
  • the gap can be effectively controlled, preventing damage to the substrate.
  • the first connection target member may be a first liquid crystal display element member.
  • the second connection target member may be a second liquid crystal display element member.
  • the connection portion may be a sealing portion that seals the outer peripheries of the first liquid crystal display element member and the second liquid crystal display element member when the first liquid crystal display element member and the second liquid crystal display element member are facing each other.
  • the resin particles can also be used in a peripheral sealant for liquid crystal display elements.
  • the liquid crystal display element comprises a first liquid crystal display element member and a second liquid crystal display element member.
  • the liquid crystal display element further comprises a seal portion sealing the periphery of the first liquid crystal display element member and the second liquid crystal display element member while the first liquid crystal display element member and the second liquid crystal display element member are facing each other, and liquid crystal disposed inside the seal portion between the first liquid crystal display element member and the second liquid crystal display element member.
  • the liquid crystal dropping method is applied, and the seal portion is formed by thermally curing a sealant for the liquid crystal dropping method.
  • Example 1 (1) Preparation of Resin Particles 20 parts by weight of pentaerythritol tetraacrylate (20% by weight of 100% by weight of polymerizable components) was added to 80 parts by weight of divinylbenzene (80% by weight of 100% by weight of polymerizable components) and stirred to obtain a monomer solution. Next, 1 part by weight of a polymerization initiator (benzoyl peroxide) was added to the resulting monomer solution and stirred until homogeneous, obtaining a monomer mixture. 200 parts by weight of a 1.0 wt% aqueous solution of polyvinyl alcohol with a molecular weight of approximately 2000 dissolved in pure water was placed in a reactor.
  • a polymerization initiator benzoyl peroxide
  • the resulting monomer mixture was then added and stirred until the monomer droplets reached the desired particle size.
  • the mixture was then heated at 90°C for 9 hours to polymerize the monomer droplets, yielding particles.
  • the resulting particles were washed three times with hot water and acetone, and then classified to recover the resin particles.
  • nickel plating solution (1) (pH 8.5) containing 0.14 mol/L of nickel sulfate, 0.46 mol/L of dimethylamine borane, and 0.2 mol/L of sodium citrate was prepared.
  • nickel plating solution (1) was added dropwise at a rate of 30 mL/min for 10 minutes.
  • the solution was added dropwise at a rate of 10 mL/min for 40 minutes, and then at a rate of 4 mL/min for 80 minutes, thereby controlling the amount of boron incorporated into the plating film and performing electroless nickel-boron alloy plating.
  • the resulting dispersion was then filtered to remove the particles, which were then washed with water and dried to obtain metal-coated particles in which a metal coating layer (nickel layer) was disposed on the surface of the resin particles.
  • connection Structure An LGA substrate and a semiconductor chip with a pad size of 0.5 mm x 0.5 mm were prepared.
  • the semiconductor chip was stacked on the solder paste layer with the electrodes facing each other. After that, reflow was performed at 160°C to harden the solder paste layer, obtaining connection structures A and B. Note that no pressure was applied during reflow.
  • Examples 2 to 12, 14 and Comparative Examples 2 to 4 Resin particles, metal-coated particles, resin materials A and B, and connection structures A and B were produced in the same manner as in Example 1, except that the type and content (wt%) of the polymerizable component, the average particle size and CV value of the particle size of the resin particles, and the type and thickness of the metal coating layer were set as shown in Tables 1 to 4. The average particle size and CV value of the particle size of the resin particles were adjusted by classification.
  • Example 13 Preparation of Resin Particles Resin particles were prepared in the same manner as in Example 1, except that the type and content (wt %) of the polymerizable component were changed as shown in Table 3.
  • Particles A were obtained in which a first metal coating layer (nickel layer, thickness 100 nm) was disposed on the surface of a resin particle.
  • Formation of the second metallization layer Ten parts by weight of the resulting particles A were dispersed in 500 parts by weight of ion-exchanged water using an ultrasonicator to obtain suspension B.
  • a reducing solution A containing 5 g/L of sodium borohydride (adjusted to pH 10.0 with sodium hydroxide) was prepared.
  • the tin plating solution (1) was gradually added to the resulting suspension B while stirring at 55°C, and then electroless tin plating was performed by reducing it with reducing solution A to form a second metal coating layer.
  • Metal-coated particles were obtained in which a second metal coating layer (tin layer, 100 nm thick) was disposed on the surface of the first metal coating layer.
  • Resin materials A and B and connection structures A and B were produced in the same manner as in Example 1, except that the resulting metal-coated particles were used.
  • the obtained monomer mixture was added thereto and stirred until the monomer droplets reached the specified particle size. Next, the mixture was heated at 90°C for 9 hours to polymerize the monomer droplets, obtaining porous resin particles.
  • Metal-coated particles, resin materials A and B, and connection structures A and B were prepared in the same manner as in Example 1, except that the obtained resin particles were used.
  • Viscosity of Polymerizable Component Mixture The viscosity of the polymerizable component mixture (before polymerization) was measured using an E-type viscometer ("VISCOMETER TV-22" manufactured by Toki Sangyo Co., Ltd.) at 25°C and 5 rpm.
  • connection structure A obtained using the resin particles was heated to 250°C in an oven and left at that temperature for 1 hour.
  • the connection structure A was observed with a scanning electron microscope (SEM) to measure the minimum and maximum thicknesses of the connection portion (cured conductive paste layer).
  • SEM scanning electron microscope
  • The maximum thickness is less than 1.1 times the minimum thickness.
  • The maximum thickness is 1.1 times or more and less than 1.3 times the minimum thickness.
  • The maximum thickness is 1.3 times or more and less than 1.5 times the minimum thickness.
  • The maximum thickness is 1.5 times or more the minimum thickness.
  • connection structure B obtained using metal-coated particles was heated to 250°C in an oven and left at that temperature for 1 hour.
  • the connection structure B was observed with a scanning electron microscope (SEM) to measure the minimum and maximum thicknesses of the connection (cured conductive paste layer).
  • SEM scanning electron microscope
  • The maximum thickness is less than 1.1 times the minimum thickness.
  • The maximum thickness is 1.1 times or more and less than 1.3 times the minimum thickness.
  • The maximum thickness is 1.3 times or more and less than 1.5 times the minimum thickness.
  • The maximum thickness is 1.5 times or more the minimum thickness.
  • connection structure A obtained using resin particles, in which 1000 cycles were repeated, with one cycle consisting of heating from -20°C to 100°C and cooling to -20°C.
  • the conductivity reliability (resin particles) after the thermal cycling was evaluated according to the following criteria.
  • Connection resistance A is 5 m ⁇ or less.
  • Connection resistance A is greater than 5 m ⁇ and less than 7 m ⁇ .
  • Connection resistance A is greater than 7 m ⁇ and less than 10 m ⁇ .
  • Connection resistance A exceeds 10 m ⁇ , or a connection failure has occurred.
  • connection structure B obtained using metal-coated particles, in which 1,000 cycles were repeated, with one cycle consisting of heating from -20°C to 100°C and cooling to -20°C.
  • the conductivity reliability (metal-coated particles) after the thermal cycling was evaluated according to the following criteria.
  • Connection resistance B is 5 m ⁇ or less ⁇ : Connection resistance B is more than 5 m ⁇ and less than 7 m ⁇ ⁇ : Connection resistance B is more than 7 m ⁇ and less than 10 m ⁇ ⁇ : Connection resistance B is more than 10 m ⁇ , or a connection failure has occurred
  • Table 5 shows the results of Examples 6 (particle diameter 1 ⁇ m), 7 (particle diameter 5 ⁇ m), 8 (particle diameter 10 ⁇ m), 3 (particle diameter 30 ⁇ m), and 9 (particle diameter 50 ⁇ m), in which only the particle diameter of the resin particles was changed.
  • the gap controllability of the connection structure when exposed to a high-temperature environment can be further improved compared to when the particle diameter of the resin particles is less than 20 ⁇ m.
  • the results shown in Table 5 above show that when 1) a specific polymerizable component is used, and 2) the compressive modulus of the resin particles is within a specific range, and 3C) the particle diameter of the resin particles is 10 ⁇ m or greater, the conductivity reliability of the connection structure after thermal cycling can be significantly improved compared to when the particle diameter of the resin particles is less than 10 ⁇ m.

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Abstract

Provided are resin particles capable of enhancing gap controllability of a connection structure when exposed to a high temperature environment. The resin particles according to present invention contain a polymer of polymerizable components. The polymerizable components include divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups. The resin particles have a compression elastic modulus of 1000 N mm2 or more when compressed by 20% at 200°C.

Description

樹脂粒子、金属被覆粒子及び樹脂材料Resin particles, metal-coated particles, and resin materials

 本発明は、重合性成分の重合体を含む樹脂粒子に関する。また、本発明は、上記樹脂粒子を用いた金属被覆粒子及び樹脂材料に関する。 The present invention relates to resin particles containing a polymer of a polymerizable component. The present invention also relates to metal-coated particles and resin materials using the resin particles.

 導電ペースト及び導電フィルム等の導電材料が広く知られている。近年、該導電材料を半導体チップ等の実装に用いる開発が進められている。電流量の増加の観点及び冷熱サイクル等での信頼性の観点から、導電材料において、バインダー樹脂中にはんだ粒子等の導電性粒子が分散されることがある。 Conductive materials such as conductive pastes and conductive films are widely known. In recent years, development has been underway to use these conductive materials in the mounting of semiconductor chips and other devices. From the perspective of increasing the amount of current and reliability in thermal cycles, conductive materials sometimes contain conductive particles such as solder particles dispersed in a binder resin.

 上記導電材料は、各種の接続構造体を得るために用いられている。上記導電材料を用いる接続としては、例えば、フレキシブルプリント基板とガラス基板との接続(FOG(Film on Glass))、半導体チップとフレキシブルプリント基板との接続(COF(Chip on Film))、半導体チップとガラス基板との接続(COG(Chip on Glass))、並びにフレキシブルプリント基板とガラスエポキシ基板との接続(FOB(Film on Board))等が挙げられる。 The above-mentioned conductive materials are used to obtain a variety of connection structures. Examples of connections that use the above-mentioned conductive materials include connections between flexible printed circuit boards and glass substrates (FOG (Film on Glass)), connections between semiconductor chips and flexible printed circuit boards (COF (Chip on Film)), connections between semiconductor chips and glass substrates (COG (Chip on Glass)), and connections between flexible printed circuit boards and glass epoxy substrates (FOB (Film on Board)).

 このような接続構造体において、2つの基板(接続対象部材)の間隔(ギャップ)を均一かつ一定に保つために、ギャップ制御材としてスペーサが用いられている。該スペーサは、基板を損傷させない性質を有することが好ましく、また、該スペーサは、実装時に破壊されないことが好ましい。該スペーサとして、樹脂粒子が用いられたり、樹脂粒子と該樹脂粒子を被覆する金属被覆層とを備える金属被覆粒子が用いられたりすることがある。 In such connection structures, spacers are used as gap control materials to maintain a uniform and constant distance (gap) between the two substrates (components to be connected). It is preferable that the spacers have properties that do not damage the substrates, and that the spacers are not destroyed during mounting. Resin particles may be used as the spacers, or metal-coated particles that comprise resin particles and a metal coating layer that covers the resin particles.

 上記樹脂粒子の一例として、下記の特許文献1には、5%重量減少温度が350℃以上であり、25℃における10%K値が100N/mm以上2500N/mm以下であり、かつ、25℃における30%K値が100N/mm以上1500N/mm以下である樹脂粒子が開示されている。 As an example of the resin particles, Patent Document 1 listed below discloses resin particles having a 5% weight loss temperature of 350°C or higher, a 10% K value at 25°C of 100 N/mm2 or higher and 2500 N/ mm2 or lower, and a 30% K value at 25°C of 100 N/mm2 or higher and 1500 N/mm2 or lower.

WO2021/193911A1WO2021/193911A1

 従来の樹脂粒子をスペーサとして用いた場合には、該樹脂粒子が高温環境下(例えば、200℃)にさらされたときに、樹脂粒子の圧縮弾性率を十分に高めることができず、樹脂粒子によるギャップ制御性を高めることができないという課題がある。また、電子部品等の接続構造体においては、2つの接続対象部材を接続している接続部が繰り返し加熱及び冷却される(冷熱サイクル条件にさらされる)ところ、従来の樹脂粒子では、冷熱サイクルにより、樹脂粒子中の樹脂が熱分解して、アウトガスが発生してしまうという課題がある。アウトガスが大量に発生した場合には、接続構造体の接続部にボイドが生じたり、金属被覆粒子において樹脂粒子と金属被覆層との間にクラックや剥離が生じたりして、接続構造体の導通信頼性が低下することがある。すなわち、従来の樹脂粒子では、高温環境下にさらされた場合に基板間のギャップを良好に制御し、かつ、冷熱サイクル後の接続構造体の導通信頼性を高めることは、困難である。 When conventional resin particles are used as spacers, there is an issue that when the resin particles are exposed to a high-temperature environment (e.g., 200°C), the compressive modulus of the resin particles cannot be sufficiently increased, and the gap controllability of the resin particles cannot be improved. Furthermore, in connection structures such as electronic components, the connection portion connecting two connection target components is repeatedly heated and cooled (exposed to thermal cycling conditions). With conventional resin particles, the thermal cycling causes the resin in the resin particles to thermally decompose, resulting in the generation of outgassing. When a large amount of outgassing occurs, voids can form in the connection portion of the connection structure, or cracks or peeling can occur between the resin particles and the metal coating layer in metal-coated particles, reducing the electrical conductivity reliability of the connection structure. In other words, it is difficult for conventional resin particles to effectively control the gap between substrates when exposed to a high-temperature environment and to improve the electrical conductivity reliability of the connection structure after thermal cycling.

 本発明の目的は、高温環境下にさらされたときの接続構造体のギャップ制御性を高めることができる樹脂粒子及び該樹脂粒子のはんだペーストへの使用を提供することである。また、本発明の目的は、上記樹脂粒子を用いた金属被覆粒子及び樹脂材料を提供することである。 An object of the present invention is to provide resin particles that can improve the gap controllability of connection structures when exposed to high-temperature environments, and the use of such resin particles in solder paste. Another object of the present invention is to provide metal-coated particles and resin materials that use the resin particles.

 本明細書において、以下の樹脂粒子、樹脂粒子のはんだペーストへの使用、金属被覆粒子及び樹脂材料を開示する。 This specification discloses the following resin particles, use of resin particles in solder paste, metal-coated particles, and resin materials.

 項1.重合性成分の重合体を含む樹脂粒子であり、前記重合性成分が、ジビニルベンゼンと、(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物とを含み、前記樹脂粒子を200℃で20%圧縮したときの圧縮弾性率が、1000N/mm以上である、樹脂粒子。 Item 1. Resin particles containing a polymer of a polymerizable component, wherein the polymerizable component contains divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups, and the resin particles have a compressive modulus of 1000 N/ mm2 or more when compressed 20% at 200°C.

 項2.前記重合性成分100重量%中、前記ジビニルベンゼンと前記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物との合計の含有量が、80重量%以上である、項1に記載の樹脂粒子。 Item 2. Resin particles according to Item 1, wherein the total content of the divinylbenzene and the (meth)acrylate compound having four or more (meth)acryloyl groups is 80% by weight or more, based on 100% by weight of the polymerizable component.

 項3.前記重合性成分中の前記ジビニルベンゼンの含有量の、前記重合性成分中の前記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物の含有量に対する重量比が、0.40以上1.70以下である、項1又は2に記載の樹脂粒子。 Item 3. Resin particles according to Item 1 or 2, wherein the weight ratio of the content of the divinylbenzene in the polymerizable component to the content of the (meth)acrylate compound having four or more (meth)acryloyl groups in the polymerizable component is 0.40 or more and 1.70 or less.

 項4.前記樹脂粒子を250℃で10分加熱したときのアウトガス量が、1000ppm以下である、項1~3のいずれか1項に記載の樹脂粒子。 Item 4. Resin particles according to any one of items 1 to 3, wherein the amount of outgassing when the resin particles are heated at 250°C for 10 minutes is 1000 ppm or less.

 項5.前記樹脂粒子の粒子径が、1μm以上100μm以下である、項1~4のいずれか1項に記載の樹脂粒子。 Item 5. Resin particles according to any one of items 1 to 4, wherein the particle diameter of the resin particles is 1 μm or more and 100 μm or less.

 項6.前記樹脂粒子は、表面上に金属被覆層が形成されることで、前記金属被覆層を備える金属被覆粒子を得るために用いられるか、又は、前記樹脂粒子は、5μm以上100μm以下の粒子径を有する、項1~5のいずれか1項に記載の樹脂粒子。 Item 6. Resin particles according to any one of Items 1 to 5, wherein the resin particles are used to obtain metal-coated particles having a metal coating layer formed on the surface thereof, or the resin particles have a particle diameter of 5 μm or more and 100 μm or less.

 項7.前記樹脂粒子は、表面上に金属被覆層が形成されることで、前記金属被覆層を備える金属被覆粒子を得るために用いられるか、又は、前記樹脂粒子は、20μm以上100μm以下の粒子径を有する、項6に記載の樹脂粒子。 Item 7. Resin particles according to Item 6, wherein the resin particles are used to obtain metal-coated particles having a metal coating layer formed on the surface thereof, or the resin particles have a particle diameter of 20 μm or more and 100 μm or less.

 項8.前記樹脂粒子は、表面上に金属被覆層が形成されることで、前記金属被覆層を備える金属被覆粒子を得るために用いられる、項1~5のいずれか1項に記載の樹脂粒子。 Item 8. The resin particles described in any one of Items 1 to 5 are used to obtain metal-coated particles having a metal coating layer formed on the surface of the resin particles.

 項9.前記樹脂粒子の粒子径が5μm以上100μm以下である、項5に記載の樹脂粒子。 Item 9. Resin particles according to Item 5, wherein the particle diameter of the resin particles is 5 μm or more and 100 μm or less.

 項10.前記樹脂粒子の粒子径が20μm以上100μm以下である、項9に記載の樹脂粒子。 Item 10. Resin particles according to Item 9, wherein the particle diameter of the resin particles is 20 μm or more and 100 μm or less.

 項11.項1~10のいずれか1項に記載の樹脂粒子と、前記樹脂粒子の表面上に配置された金属被覆層とを備える、金属被覆粒子。 Item 11. Metal-coated particles comprising the resin particles described in any one of Items 1 to 10 and a metal coating layer disposed on the surface of the resin particles.

 項12.前記金属被覆層の厚みが、0.2μm以上である、項11に記載の金属被覆粒子。 Item 12. The metal-coated particles described in Item 11, wherein the thickness of the metal coating layer is 0.2 μm or more.

 項13.項1~10のいずれか1項に記載の樹脂粒子と、バインダー樹脂とを含む樹脂材料であるか、又は、前記樹脂粒子と前記樹脂粒子の表面上に配置された金属被覆層とを備える金属被覆粒子と、バインダー樹脂とを含む樹脂材料であり、前記樹脂粒子又は前記金属被覆粒子が前記バインダー樹脂中に分散されている、樹脂材料。 Item 13. A resin material comprising the resin particles described in any one of Items 1 to 10 and a binder resin, or a resin material comprising the resin particles, metal-coated particles having a metal coating layer disposed on the surface of the resin particles, and a binder resin, wherein the resin particles or the metal-coated particles are dispersed in the binder resin.

 項14.前記樹脂材料が、はんだ粒子を含むはんだペーストである、項13に記載の樹脂材料。 Item 14. The resin material according to Item 13, wherein the resin material is a solder paste containing solder particles.

 項15.項1~10のいずれか1項に記載の樹脂粒子の、又は、前記樹脂粒子と前記樹脂粒子の表面上に配置された金属被覆粒子の、はんだ粒子とバインダー樹脂とを含むはんだペーストへの使用。 Item 15. Use of the resin particles described in any one of items 1 to 10, or the resin particles and metal-coated particles disposed on the surfaces of the resin particles, in a solder paste containing solder particles and a binder resin.

 本発明に係る樹脂粒子は、重合性成分の重合体を含む樹脂粒子である。本発明に係る樹脂粒子では、上記重合性成分が、ジビニルベンゼンと、(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物とを含む。本発明に係る樹脂粒子では、上記樹脂粒子を200℃で20%圧縮したときの圧縮弾性率が、1000N/mm以上である。本発明に係る樹脂粒子では、上記の構成が備えられているので、高温環境下にさらされたときの接続構造体のギャップ制御性を高めることができる。 The resin particles according to the present invention are resin particles containing a polymer of a polymerizable component. In the resin particles according to the present invention, the polymerizable component contains divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups. In the resin particles according to the present invention, the compressive modulus of the resin particles when compressed 20% at 200°C is 1000 N/mm2 or more. Because the resin particles according to the present invention have the above configuration, the gap controllability of the connection structure when exposed to a high-temperature environment can be improved.

図1は、本発明の第1の実施形態に係る樹脂粒子を模式的に示す断面図である。FIG. 1 is a cross-sectional view schematically showing a resin particle according to a first embodiment of the present invention. 図2は、本発明の第1の実施形態に係る樹脂粒子を用いた金属被覆粒子を模式的に示す断面図である。FIG. 2 is a cross-sectional view schematically showing a metal-coated particle using a resin particle according to the first embodiment of the present invention. 図3は、本発明の第1の実施形態に係る樹脂粒子を用いて得られる接続構造体の一例を示す断面図である。FIG. 3 is a cross-sectional view showing an example of a connection structure obtained using the resin particles according to the first embodiment of the present invention. 図4は、本発明の第1の実施形態に係る樹脂粒子を用いた金属被覆粒子を用いて得られる接続構造体の一例を示す断面図である。FIG. 4 is a cross-sectional view showing an example of a connection structure obtained using metal-coated particles using resin particles according to the first embodiment of the present invention.

 以下、本発明の詳細を説明する。 The details of the present invention are explained below.

 (樹脂粒子)
 本発明に係る樹脂粒子は、重合性成分の重合体を含む樹脂粒子である。本発明に係る樹脂粒子では、上記重合性成分が、ジビニルベンゼンと、(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物とを含む。本発明に係る樹脂粒子では、上記樹脂粒子を200℃で20%圧縮したときの圧縮弾性率が、1000N/mm以上である。
(Resin particles)
The resin particles according to the present invention are resin particles containing a polymer of a polymerizable component. In the resin particles according to the present invention, the polymerizable component contains divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups. In the resin particles according to the present invention, the compressive modulus of the resin particles when compressed 20% at 200°C is 1000 N/mm2 or more.

 従来の樹脂粒子をスペーサとして用いた場合には、該樹脂粒子が高温環境下(例えば、200℃)にさらされたときに、樹脂粒子の圧縮弾性率を十分に高めることができず、樹脂粒子によるギャップ制御性を高めることができないという課題がある。 When conventional resin particles are used as spacers, the compressive modulus of the resin particles cannot be sufficiently increased when exposed to a high-temperature environment (e.g., 200°C), which poses the problem of not being able to improve the gap controllability of the resin particles.

 本発明に係る樹脂粒子では、上記の構成が備えられているので、高温環境下にさらされたときの接続構造体のギャップ制御性を高めることができる。上記接続構造体では、接続対象部材上又は接続対象部材間のギャップを、上記樹脂粒子により高精度に制御することができる。 The resin particles according to the present invention have the above-mentioned configuration, which allows for improved gap control of the connection structure when exposed to a high-temperature environment. In the connection structure, the resin particles allow for highly accurate control of the gap on or between the connection target components.

 また、電子部品等の接続構造体においては、2つの接続対象部材を接続している接続部が繰り返し加熱及び冷却される(冷熱サイクル条件にさらされる)ところ、従来の樹脂粒子では、冷熱サイクルにより、樹脂粒子中の樹脂が熱分解して、アウトガスが発生してしまうという課題がある。アウトガスが大量に発生した場合には、接続構造体の接続部にボイドが生じたり、金属被覆粒子において樹脂粒子と金属被覆層との間にクラックや剥離が生じたりして、接続構造体の導通信頼性が低下することがある。すなわち、従来の樹脂粒子では、高温環境下にさらされた場合に基板間のギャップを良好に制御し、かつ、冷熱サイクル後の接続構造体の導通信頼性を高めることは、困難である。 Furthermore, in connection structures for electronic components and the like, the connection portion connecting two components to be connected is repeatedly heated and cooled (exposed to thermal cycling conditions). With conventional resin particles, the thermal cycling causes the resin in the resin particles to thermally decompose, resulting in the generation of outgassing. When a large amount of outgassing occurs, voids can form in the connection portion of the connection structure, or cracks or peeling can occur between the resin particles and the metal coating layer in metal-coated particles, reducing the electrical conductivity reliability of the connection structure. In other words, with conventional resin particles, it is difficult to effectively control the gap between substrates when exposed to a high-temperature environment and to improve the electrical conductivity reliability of the connection structure after thermal cycling.

 本発明に係る樹脂粒子では、上記の構成が備えられているので、樹脂粒子を、導通信頼性が求められる用途に用いることができる。本発明に係る樹脂粒子では、上記の構成が備えられているので、冷熱サイクル後の接続構造体の導通信頼性を高めることができる。但し、本発明に係る樹脂粒子は、導通信頼性が求められない用途にも、用いることができる。 The resin particles according to the present invention have the above-mentioned configuration, and therefore can be used in applications where electrical conductivity reliability is required. The resin particles according to the present invention have the above-mentioned configuration, and therefore can improve the electrical conductivity reliability of connection structures after thermal cycling. However, the resin particles according to the present invention can also be used in applications where electrical conductivity reliability is not required.

 以下、図面を参照しつつ、本発明を具体的に説明する。 The present invention will now be described in detail with reference to the drawings.

 図1は、本発明の第1の実施形態に係る樹脂粒子を模式的に示す断面図である。 FIG. 1 is a cross-sectional view schematically showing a resin particle according to a first embodiment of the present invention.

 樹脂粒子1は、重合性成分の重合体を含む。樹脂粒子1では、上記重合性成分が、ジビニルベンゼンと、(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物とを含む。樹脂粒子1では、樹脂粒子1を200℃で20%圧縮したときの圧縮弾性率が、1000N/mm以上である。 The resin particles 1 contain a polymer of a polymerizable component. In the resin particles 1, the polymerizable component contains divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups. The resin particles 1 have a compressive modulus of 1000 N/ mm2 or more when compressed 20% at 200°C.

 上記樹脂粒子を200℃で20%圧縮したときの圧縮弾性率(樹脂粒子の200℃での20%K値)は、1000N/mm以上である。上記樹脂粒子の200℃での20%K値は、好ましくは1200N/mm以上、より好ましくは1300N/mm以上、さらに好ましくは1500N/mm以上、特に好ましくは1750N/mm以上、最も好ましくは2000N/mm以上であり、好ましくは20000N/mm以下、より好ましくは10000N/mm以下、さらに好ましくは5000N/mm以下である。上記樹脂粒子の200℃での20%K値が上記下限以上であると、高温環境下にさらされたときの接続構造体のギャップ制御性をより一層高めることができる。上記樹脂粒子の200℃での20%K値が上記上限以下であると、高温環境下にさらされたときの樹脂粒子の破壊をより一層防ぐことができる。 The compressive modulus of elasticity when the resin particles are compressed 20% at 200 ° C (20% K value of the resin particles at 200 ° C) is 1000 N / mm 2 or more. The 20% K value of the resin particles at 200 ° C is preferably 1200 N / mm 2 or more, more preferably 1300 N / mm 2 or more, even more preferably 1500 N / mm 2 or more, particularly preferably 1750 N / mm 2 or more, and most preferably 2000 N / mm 2 or more, and preferably 20000 N / mm 2 or less, more preferably 10000 N / mm 2 or less, and even more preferably 5000 N / mm 2 or less. When the 20% K value of the resin particles at 200 ° C is the above lower limit or more, the gap controllability of the connection structure when exposed to a high temperature environment can be further improved. When the 20% K value of the resin particles at 200 ° C is the above upper limit or less, the breakage of the resin particles when exposed to a high temperature environment can be further prevented.

 上記樹脂粒子を25℃で20%圧縮したときの圧縮弾性率(樹脂粒子の25℃での20%K値)は、好ましくは1000N/mm以上、より好ましくは1500N/mm以上、さらに好ましくは2000N/mm以上であり、好ましくは20000N/mm以下、より好ましくは10000N/mm以下、さらに好ましくは6000N/mm以下である。上記樹脂粒子の25℃での20%K値が上記下限以上であると、高温環境下にさらされたときの接続構造体のギャップ制御性をより一層高めることができる。上記樹脂粒子の25℃での20%K値が上記上限以下であると、樹脂粒子が接続対象部材(基板等)により一層良好に追従することができ、ギャップ制御性をより一層高めることができる。 The compressive modulus of the resin particles when compressed 20% at 25 ° C (20% K value of the resin particles at 25 ° C) is preferably 1000 N/mm 2 or more, more preferably 1500 N/mm 2 or more, even more preferably 2000 N/mm 2 or more, and preferably 20,000 N/mm 2 or less, more preferably 10,000 N/mm 2 or less, and even more preferably 6,000 N/mm 2 or less. When the 20% K value of the resin particles at 25 ° C is the above lower limit or more, the gap controllability of the connection structure when exposed to a high temperature environment can be further improved. When the 20% K value of the resin particles at 25 ° C is the above upper limit or less, the resin particles can better follow the connection target member (substrate, etc.), and the gap controllability can be further improved.

 上記樹脂粒子を25℃で20%圧縮したときの圧縮弾性率の、上記樹脂粒子を200℃で20%圧縮したときの圧縮弾性率に対する比を、比(樹脂粒子の25℃での20%K値/樹脂粒子の200℃での20%K値)とする。上記比(樹脂粒子の25℃での20%K値/樹脂粒子の200℃での20%K値)は、好ましくは0.7以上、より好ましくは0.9以上、さらに好ましくは1.0以上であり、好ましくは3.0以下、より好ましくは2.5以下、さらに好ましくは2.0以下、特に好ましくは1.5以下である。上記比(樹脂粒子の25℃での20%K値/樹脂粒子の200℃での20%K値)が上記下限以上及び上記上限以下であると、高温環境下にさらされたときの接続構造体のギャップ制御性をより一層高めることができる。 The ratio of the compressive modulus when the resin particles are compressed 20% at 25°C to the compressive modulus when the resin particles are compressed 20% at 200°C is defined as (20% K value of resin particles at 25°C/20% K value of resin particles at 200°C). This ratio (20% K value of resin particles at 25°C/20% K value of resin particles at 200°C) is preferably 0.7 or more, more preferably 0.9 or more, even more preferably 1.0 or more, and is preferably 3.0 or less, more preferably 2.5 or less, even more preferably 2.0 or less, and particularly preferably 1.5 or less. When the ratio (20% K value of resin particles at 25°C/20% K value of resin particles at 200°C) is equal to or greater than the above lower limit and equal to or less than the above upper limit, the gap controllability of the connection structure when exposed to a high-temperature environment can be further improved.

 上記樹脂粒子の25℃及び200℃での20%K値は、以下のようにして測定できる。 The 20% K value of the above resin particles at 25°C and 200°C can be measured as follows.

 微小圧縮試験機を用いて、円柱(直径50μm、ダイヤモンド製)の平滑圧子端面で、25℃又は200℃、最大試験荷重90mNを30秒かけて負荷する条件下で樹脂粒子を圧縮する。このときの荷重値(N)及び圧縮変位(mm)を測定する。得られた測定値から、上記圧縮弾性率を下記式により求めることができる。上記微小圧縮試験機として、例えば、フィッシャー社製「フィッシャースコープH-100」、及びエリオニクス社製「ENT-5」等が用いられる。 Using a micro-compression testing machine, resin particles are compressed with the smooth end face of a cylindrical indenter (diameter 50 μm, made of diamond) at 25°C or 200°C under conditions where a maximum test load of 90 mN is applied for 30 seconds. The load value (N) and compression displacement (mm) at this time are measured. From the obtained measured values, the compressive modulus can be calculated using the following formula. Examples of micro-compression testing machines that can be used include the Fischerscope H-100 manufactured by Fischer and the ENT-5 manufactured by Elionix.

 20%K値(N/mm)=(3/21/2)・F・S-3/2・R-1/2
 F:樹脂粒子が20%圧縮変形したときの荷重値(N)
 S:樹脂粒子が20%圧縮変形したときの圧縮変位(mm)
 R:樹脂粒子の半径(mm)
20% K value (N/mm 2 ) = (3/2 1/2 )·F·S - 3/2 ·R - 1/2
F: Load value (N) when resin particles are compressed and deformed by 20%
S: Compression displacement (mm) when resin particles are compressed and deformed by 20%
R: Radius of resin particle (mm)

 上記樹脂粒子の25℃及び200℃での20%K値、及び上記比(樹脂粒子の25℃での20%K値/樹脂粒子の200℃での20%K値)を好ましい範囲に調整する方法としては、後述する好ましい重合性成分を用いる方法、重合性成分の分子量を調整する方法、後述する好ましい架橋剤を用いる方法、重合温度及び重合時間等を調整する方法、重合時に加圧する方法、樹脂粒子の多孔度(比表面積)を調整する方法、及び未反応の重合性成分(モノマー)を洗浄する方法等が挙げられる。 Methods for adjusting the 20% K values of the resin particles at 25°C and 200°C, and the ratio (20% K value of resin particles at 25°C/20% K value of resin particles at 200°C) within preferred ranges include using a preferred polymerizable component as described below, adjusting the molecular weight of the polymerizable component, using a preferred crosslinking agent as described below, adjusting the polymerization temperature and polymerization time, applying pressure during polymerization, adjusting the porosity (specific surface area) of the resin particles, and washing away unreacted polymerizable components (monomers).

 本発明の効果をより一層良好にする観点からは、上記樹脂粒子の25℃での圧縮回復率は、好ましくは20%以上、より好ましくは25%以上、さらに好ましくは30%以上であり、好ましくは95%以下、より好ましくは90%以下、さらに好ましくは85%以下である。上記樹脂粒子の25℃での圧縮回復率は、70%以下であってもよく、60%以下であってもよく、55%以下であってもよい。 From the perspective of further improving the effects of the present invention, the compression recovery rate of the resin particles at 25°C is preferably 20% or more, more preferably 25% or more, even more preferably 30% or more, and is preferably 95% or less, more preferably 90% or less, even more preferably 85% or less. The compression recovery rate of the resin particles at 25°C may be 70% or less, 60% or less, or 55% or less.

 上記圧縮回復率は、以下のようにして測定できる。 The compression recovery rate can be measured as follows.

 試料台上に樹脂粒子を散布する。散布された樹脂粒子1個について、微小圧縮試験機を用いて、円柱(直径100μm、ダイヤモンド製)の平滑圧子端面で、25℃で、樹脂粒子の中心方向に、樹脂粒子が40%圧縮変形するまで負荷(反転荷重値)を与える。その後、原点用荷重値(0.40mN)まで除荷を行う。この間の荷重-圧縮変位を測定し、下記式から圧縮回復率を求めることができる。なお、負荷速度は0.33mN/秒とする。上記微小圧縮試験機として、例えば、フィッシャー社製「フィッシャースコープH-100」、及びエリオニクス社製「ENT-5」等が用いられる。 Resin particles are scattered on a sample stage. Using a micro-compression testing machine, a load (reversed load value) is applied to each scattered resin particle at 25°C with the end face of a smooth cylindrical indenter (100 μm diameter, made of diamond) in the direction of the center of the resin particle until the resin particle is compressed and deformed by 40%. The load is then released to the origin load value (0.40 mN). The load-compression displacement during this period is measured, and the compression recovery rate can be calculated using the formula below. The loading rate is 0.33 mN/sec. Examples of micro-compression testing machines that can be used include the Fischerscope H-100 manufactured by Fischer and the ENT-5 manufactured by Elionix.

 圧縮回復率(%)=(L2/L1)×100
 L1:負荷を与えるときの原点用荷重値から反転荷重値に至るまでの圧縮変位
 L2:負荷を解放するときの反転荷重値から原点用荷重値に至るまでの除荷変位
Compression recovery rate (%) = (L2/L1) x 100
L1: Compression displacement from the load value for origin when applying a load to the reverse load value. L2: Unloading displacement from the reverse load value when releasing the load to the load value for origin.

 以下、樹脂粒子の他の詳細について説明する。なお、以下の説明において、「(メタ)アクリル」は「アクリル」と「メタクリル」との一方又は双方を意味し、「(メタ)アクリレート」は「アクリレート」と「メタクリレート」との一方又は双方を意味する。 Other details about the resin particles are explained below. In the following explanation, "(meth)acrylic" means either or both of "acrylic" and "methacrylic," and "(meth)acrylate" means either or both of "acrylate" and "methacrylate."

 上記樹脂粒子は、樹脂により形成された樹脂粒子である。 The above-mentioned resin particles are resin particles formed from resin.

 上記樹脂粒子の材料である樹脂として、種々の有機物が好適に用いられる。上記樹脂粒子の材料である樹脂としては、ポリエチレン、ポリプロピレン、ポリスチレン、ポリ塩化ビニル、ポリ塩化ビニリデン、ポリイソブチレン、ポリブタジエン等のポリオレフィン樹脂;ポリメチル(メタ)クリレート、及びポリイソボルニル(メタ)アクリレート等のアクリル樹脂;ポリアルキレンテレフタレート、ポリカーボネート、ポリアミド、フェノールホルムアルデヒド樹脂、メラミンホルムアルデヒド樹脂、ベンゾグアナミンホルムアルデヒド樹脂、尿素ホルムアルデヒド樹脂、フェノール樹脂、メラミン樹脂、ベンゾグアナミン樹脂、尿素樹脂、エポキシ樹脂、不飽和ポリエステル樹脂、飽和ポリエステル樹脂、ポリスルホン、ポリフェニレンオキサイド、ポリアセタール、ポリイミド、ポリアミドイミド、ポリエーテルエーテルケトン、ポリエーテルスルホン、及び、エチレン性不飽和基を有する種々の重合性単量体を1種もしくは2種以上重合させて得られる重合体等が挙げられる。樹脂粒子の硬度を好適な範囲に容易に制御できるので、上記樹脂粒子を形成するための樹脂は、エチレン性不飽和基を複数有する重合性単量体を1種又は2種以上重合させて得られる重合体であることが好ましい。 Various organic materials are suitable for use as the resin material for the resin particles. Examples of resin materials for the resin particles include polyolefin resins such as polyethylene, polypropylene, polystyrene, polyvinyl chloride, polyvinylidene chloride, polyisobutylene, and polybutadiene; acrylic resins such as polymethyl (meth)acrylate and polyisobornyl (meth)acrylate; polyalkylene terephthalate, polycarbonate, polyamide, phenol-formaldehyde resin, melamine-formaldehyde resin, benzoguanamine-formaldehyde resin, urea-formaldehyde resin, phenolic resin, melamine resin, benzoguanamine resin, urea resin, epoxy resin, unsaturated polyester resin, saturated polyester resin, polysulfone, polyphenylene oxide, polyacetal, polyimide, polyamide-imide, polyether ether ketone, polyether sulfone, and polymers obtained by polymerizing one or more of various polymerizable monomers having ethylenically unsaturated groups. Since the hardness of the resin particles can be easily controlled within a suitable range, the resin used to form the resin particles is preferably a polymer obtained by polymerizing one or more polymerizable monomers having multiple ethylenically unsaturated groups.

 上記樹脂粒子は、重合性成分の重合体を含む。上記重合性成分は、上記エチレン性不飽和基を有する重合性単量体を含むことが好ましい。上記エチレン性不飽和基を有する重合性単量体としては、非架橋性の単量体と架橋性の単量体とが挙げられる。 The resin particles contain a polymer of a polymerizable component. The polymerizable component preferably contains a polymerizable monomer having the ethylenically unsaturated group. Examples of the polymerizable monomer having the ethylenically unsaturated group include non-crosslinkable monomers and crosslinkable monomers.

 上記非架橋性の単量体としては、スチレン、α-メチルスチレン等のスチレン系単量体;(メタ)アクリル酸、マレイン酸、無水マレイン酸等のカルボキシル基含有単量体;メチル(メタ)アクリレート、エチル(メタ)アクリレート、プロピル(メタ)アクリレート、ブチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、ラウリル(メタ)アクリレート、セチル(メタ)アクリレート、ステアリル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、イソボルニル(メタ)アクリレート等のアルキル(メタ)アクリレート化合物;2-ヒドロキシエチル(メタ)アクリレート、グリセロール(メタ)アクリレート、ポリオキシエチレン(メタ)アクリレート、グリシジル(メタ)アクリレート等の酸素原子含有(メタ)アクリレート化合物;(メタ)アクリロニトリル等のニトリル含有単量体;トリフルオロメチル(メタ)アクリレート、ペンタフルオロエチル(メタ)アクリレート、塩化ビニル、フッ化ビニル、クロルスチレン等のハロゲン含有単量体等が挙げられる。 The above-mentioned non-crosslinkable monomers include styrene-based monomers such as styrene and α-methylstyrene; carboxyl group-containing monomers such as (meth)acrylic acid, maleic acid, and maleic anhydride; methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, lauryl (meth)acrylate, cetyl (meth)acrylate, stearyl (meth)acrylate, cyclohexyl (meth)acrylate, and isobornyl (meth)acrylate. Examples of suitable monomers include alkyl (meth)acrylate compounds such as methyl (meth)acrylate; oxygen-containing (meth)acrylate compounds such as 2-hydroxyethyl (meth)acrylate, glycerol (meth)acrylate, polyoxyethylene (meth)acrylate, and glycidyl (meth)acrylate; nitrile-containing monomers such as (meth)acrylonitrile; and halogen-containing monomers such as trifluoromethyl (meth)acrylate, pentafluoroethyl (meth)acrylate, vinyl chloride, vinyl fluoride, and chlorostyrene.

 上記架橋性の単量体としては、テトラメチロールメタンテトラ(メタ)アクリレート、テトラメチロールメタントリ(メタ)アクリレート、テトラメチロールメタンジ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、グリセロールトリ(メタ)アクリレート、グリセロールジ(メタ)アクリレート、(ポリ)エチレングリコールジ(メタ)アクリレート、(ポリ)プロピレングリコールジ(メタ)アクリレート、(ポリ)テトラメチレングリコールジ(メタ)アクリレート、1,4-ブタンジオールジ(メタ)アクリレート等の多官能(メタ)アクリレート化合物;トリアリル(イソ)シアヌレート、トリアリルトリメリテート、ジビニルベンゼン、ジアリルフタレート、ジアリルアクリルアミド、ジアリルエーテル、γ-(メタ)アクリロキシプロピルトリメトキシシラン、トリメトキシシリルスチレン、ビニルトリメトキシシラン等のシラン含有単量体等が挙げられる。 The above-mentioned crosslinkable monomers include tetramethylolmethane tetra(meth)acrylate, tetramethylolmethane tri(meth)acrylate, tetramethylolmethane di(meth)acrylate, trimethylolpropane tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, dipentaerythritol penta(meth)acrylate, glycerol tri(meth)acrylate, glycerol di(meth)acrylate, (poly)ethylene glycol di(meth)acrylate, (poly)propane tri ... Examples include polyfunctional (meth)acrylate compounds such as propylene glycol di(meth)acrylate, (poly)tetramethylene glycol di(meth)acrylate, and 1,4-butanediol di(meth)acrylate; and silane-containing monomers such as triallyl (iso)cyanurate, triallyl trimellitate, divinylbenzene, diallyl phthalate, diallyl acrylamide, diallyl ether, γ-(meth)acryloxypropyltrimethoxysilane, trimethoxysilylstyrene, and vinyltrimethoxysilane.

 上記重合性成分は、ジビニルベンゼンと、(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物とを含む。上記重合性成分の重合体は、ジビニルベンゼンと(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物との共重合体を含んでいてもよく、ジビニルベンゼンの単独重合体と(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物の単独重合体とを含んでいてもよい。本発明の効果をより一層効果的に発揮する観点からは、上記重合性成分の重合体は、ジビニルベンゼンと(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物との共重合体を含むことが好ましい。 The polymerizable component includes divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups. The polymer of the polymerizable component may include a copolymer of divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups, or may include a homopolymer of divinylbenzene and a homopolymer of a (meth)acrylate compound having four or more (meth)acryloyl groups. From the perspective of more effectively achieving the effects of the present invention, it is preferable that the polymer of the polymerizable component include a copolymer of divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups.

 上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物は、(メタ)アクリロイル基を4個有していてもよく、5個以上有していてもよく、6個以上有していてもよい。上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物は、(メタ)アクリロイル基を20個以下有していてもよく、10個以下有していてもよく、8個以下有していてもよく、6個以下有していてもよい。上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物における(メタ)アクリロイル基の数の範囲は、上記下限値及び上記上限値を適宜選択して設定することができる。上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物は、1種のみが用いられてもよく、2種以上が併用されてもよい。 The (meth)acrylate compound having four or more (meth)acryloyl groups may have four, five or more, or six or more (meth)acryloyl groups. The (meth)acrylate compound having four or more (meth)acryloyl groups may have 20 or fewer, 10 or fewer, 8 or fewer, or 6 or fewer (meth)acryloyl groups. The range of the number of (meth)acryloyl groups in the (meth)acrylate compound having four or more (meth)acryloyl groups can be set by appropriately selecting the above lower limit and upper limit. The above (meth)acrylate compound having four or more (meth)acryloyl groups may be used alone, or two or more types may be used in combination.

 本発明の効果をより一層効果的に発揮する観点からは、上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物は、(メタ)アクリロイル基を4個以上6個以下有することが特に好ましい。本発明の効果をより一層効果的に発揮する観点からは、上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物は、4官能(メタ)アクリレート化合物、5官能(メタ)アクリレート化合物、又は6官能(メタ)アクリレート化合物であることが好ましい。上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物は、4官能(メタ)アクリレート化合物を含んでいてもよく、5官能(メタ)アクリレート化合物を含んでいてもよく、6官能(メタ)アクリレート化合物を含んでいてもよい。 From the viewpoint of more effectively achieving the effects of the present invention, it is particularly preferable that the (meth)acrylate compound having four or more (meth)acryloyl groups has four to six (meth)acryloyl groups. From the viewpoint of more effectively achieving the effects of the present invention, it is preferable that the (meth)acrylate compound having four or more (meth)acryloyl groups is a tetrafunctional (meth)acrylate compound, a pentafunctional (meth)acrylate compound, or a hexafunctional (meth)acrylate compound. The (meth)acrylate compound having four or more (meth)acryloyl groups may include a tetrafunctional (meth)acrylate compound, a pentafunctional (meth)acrylate compound, or a hexafunctional (meth)acrylate compound.

 上記(メタ)アクリロイル基を4個有する(メタ)アクリレート化合物(4官能(メタ)アクリレート化合物)としては、ペンタエリスリトールテトラ(メタ)アクリレート、ペンタエリスリトールアルコキシテトラ(メタ)アクリレート、アルコキシ化ペンタエリスリトールテトラ(メタ)アクリレート、ジトリメチロールプロパンテトラ(メタ)アクリレート、及びテトラメチロールメタンテトラ(メタ)アクリレート等が挙げられる。 Examples of the (meth)acrylate compounds having four (meth)acryloyl groups (tetrafunctional (meth)acrylate compounds) include pentaerythritol tetra(meth)acrylate, pentaerythritol alkoxytetra(meth)acrylate, alkoxylated pentaerythritol tetra(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, and tetramethylolmethane tetra(meth)acrylate.

 上記(メタ)アクリロイル基を5個有する(メタ)アクリレート化合物としては、ジペンタエリスリトールヒドロキシペンタ(メタ)アクリレート、及びアルコキシ化ジペンタエリスリトールヒドロキシペンタ(メタ)アクリレート等が挙げられる。 Examples of the (meth)acrylate compound having five (meth)acryloyl groups include dipentaerythritol hydroxypenta(meth)acrylate and alkoxylated dipentaerythritol hydroxypenta(meth)acrylate.

 上記(メタ)アクリロイル基を6個有する(メタ)アクリレート化合物としては、ジペンタエリスリトールヘキサ(メタ)アクリレート(ジペンタエリスリトールヘキサアクリレート等)、及びアルコキシ化ジペンタエリスリトールヘキサ(メタ)アクリレート(アルコキシ化ジペンタエリスリトールヘキサアクリレート等)等が挙げられる。 Examples of the (meth)acrylate compound having six (meth)acryloyl groups include dipentaerythritol hexa(meth)acrylate (dipentaerythritol hexaacrylate, etc.) and alkoxylated dipentaerythritol hexa(meth)acrylate (alkoxylated dipentaerythritol hexaacrylate, etc.).

 本発明の効果をより一層効果的に発揮する観点からは、上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物は、(メタ)アクリロイル基を4個有する(メタ)アクリレート化合物を含むことが好ましく、ペンタエリスリトールテトラ(メタ)アクリレートを含むことがより好ましい。本発明の効果をより一層効果的に発揮する観点からは、上記重合性成分は、ジビニルベンゼンと、(メタ)アクリロイル基を4個有する(メタ)アクリレート化合物とを含むことが好ましく、ジビニルベンゼンと、ペンタエリスリトールテトラ(メタ)アクリレートとを含むことがより好ましい。本発明の効果をより一層効果的に発揮する観点からは、上記重合性成分の重合体(樹脂粒子)は、ジビニルベンゼンと、(メタ)アクリロイル基を4個有する(メタ)アクリレート化合物との共重合体を含むことが好ましく、ジビニルベンゼンと、ペンタエリスリトールテトラ(メタ)アクリレートとの共重合体を含むことがより好ましい。 From the viewpoint of more effectively achieving the effects of the present invention, the (meth)acrylate compound having four or more (meth)acryloyl groups preferably includes a (meth)acrylate compound having four (meth)acryloyl groups, and more preferably includes pentaerythritol tetra(meth)acrylate. From the viewpoint of more effectively achieving the effects of the present invention, the polymerizable component preferably includes divinylbenzene and a (meth)acrylate compound having four (meth)acryloyl groups, and more preferably includes divinylbenzene and pentaerythritol tetra(meth)acrylate. From the viewpoint of more effectively achieving the effects of the present invention, the polymer (resin particles) of the polymerizable component preferably includes a copolymer of divinylbenzene and a (meth)acrylate compound having four (meth)acryloyl groups, and more preferably includes a copolymer of divinylbenzene and pentaerythritol tetra(meth)acrylate.

 上記重合性成分は、ジビニルベンゼンと、(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物以外の重合性成分(以下、「他の重合性成分」と記載することがある)を含んでいてもよく、含んでいなくてもよい。 The above polymerizable component may or may not contain polymerizable components other than divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups (hereinafter sometimes referred to as "other polymerizable components").

 上記他の重合性成分としては、上述したエチレン性不飽和基を有する重合性単量体等が挙げられる。上記他の重合性成分は、1種のみが用いられてもよく、2種以上が併用されてもよい。 The other polymerizable components include the above-mentioned polymerizable monomers having an ethylenically unsaturated group. Only one type of the other polymerizable components may be used, or two or more types may be used in combination.

 上記架橋性の単量体を用いて樹脂粒子を得る場合に、架橋剤を用いることができる。上記架橋剤としては、(ポリ)エチレングリコールジ(メタ)アクリレート、(ポリ)プロピレングリコールジ(メタ)アクリレート、(ポリ)テトラメチレングリコールジ(メタ)アクリレート、及び1,4-ブタンジオールジ(メタ)アクリレート等が挙げられる。上記架橋剤は、1種のみが用いられてもよく、2種以上が併用されてもよい。 When using the above-mentioned crosslinkable monomers to obtain resin particles, a crosslinking agent can be used. Examples of the crosslinking agent include (poly)ethylene glycol di(meth)acrylate, (poly)propylene glycol di(meth)acrylate, (poly)tetramethylene glycol di(meth)acrylate, and 1,4-butanediol di(meth)acrylate. The above-mentioned crosslinking agents may be used alone or in combination of two or more.

 本発明の効果をより一層効果的に発揮する観点からは、上記重合性成分は、架橋剤を含むことが好ましい。本発明の効果をより一層効果的に発揮する観点からは、上記重合性成分(上記架橋剤)は、(ポリ)プロピレングリコールジ(メタ)アクリレート、(ポリ)テトラメチレングリコールジ(メタ)アクリレート、又は1,4-ブタンジオールジ(メタ)アクリレートを含むことが好ましい。本発明の効果をより一層効果的に発揮する観点からは、上記重合性成分(上記架橋剤)は、(ポリ)プロピレングリコールジ(メタ)アクリレート、(ポリ)テトラメチレングリコールジ(メタ)アクリレート、又は1,4-ブタンジオールジ(メタ)アクリレートであることが好ましい。 From the viewpoint of more effectively achieving the effects of the present invention, it is preferable that the polymerizable component contain a crosslinking agent. From the viewpoint of more effectively achieving the effects of the present invention, it is preferable that the polymerizable component (the crosslinking agent) contain (poly)propylene glycol di(meth)acrylate, (poly)tetramethylene glycol di(meth)acrylate, or 1,4-butanediol di(meth)acrylate. From the viewpoint of more effectively achieving the effects of the present invention, it is preferable that the polymerizable component (the crosslinking agent) be (poly)propylene glycol di(meth)acrylate, (poly)tetramethylene glycol di(meth)acrylate, or 1,4-butanediol di(meth)acrylate.

 上記エチレン性不飽和基を有する重合性単量体を、公知の方法により重合させることで、上記樹脂粒子を得ることができる。この方法としては、例えば、ラジカル重合開始剤の存在下で懸濁重合する方法、並びに非架橋の種粒子を用いてラジカル重合開始剤とともに単量体を膨潤させて重合する方法等が挙げられる。 The resin particles can be obtained by polymerizing the polymerizable monomer having the ethylenically unsaturated group using a known method. Examples of such methods include suspension polymerization in the presence of a radical polymerization initiator, and polymerization using non-crosslinked seed particles to swell the monomer together with a radical polymerization initiator.

 上記重合性成分の混合物(重合前)の粘度は、好ましくは50mPa・s以上、より好ましくは100mPa・s以上、さらに好ましくは500mPa・s以上、特に好ましくは1000mPa・s以上、最も好ましくは1200mPa・s以上であり、好ましくは7000mPa・s以下、より好ましくは5000mPa・s以下、さらに好ましくは4000mPa・s以下である。上記重合性成分の混合物(重合前)の粘度が上記下限以上であると、樹脂粒子の粒子径を容易に制御することができる。上記重合性成分の混合物(重合前)の粘度が上記上限以下であると、得られる重合性成分の重合体の分子量を高め、樹脂粒子の25℃及び200℃での20%K値を好ましい範囲に容易に調整することができ、高温環境下にさらされたときの接続構造体のギャップ制御性をより一層高めることができる。上記重合性成分の混合物(重合前)は、樹脂粒子に用いる重合性化合物を、樹脂粒子に用いる重量比で含む。 The viscosity of the polymerizable component mixture (before polymerization) is preferably 50 mPa·s or more, more preferably 100 mPa·s or more, even more preferably 500 mPa·s or more, particularly preferably 1000 mPa·s or more, and most preferably 1200 mPa·s or more, and is preferably 7000 mPa·s or less, more preferably 5000 mPa·s or less, and even more preferably 4000 mPa·s or less. When the viscosity of the polymerizable component mixture (before polymerization) is above the above lower limit, the particle size of the resin particles can be easily controlled. When the viscosity of the polymerizable component mixture (before polymerization) is below the above upper limit, the molecular weight of the resulting polymer of the polymerizable component can be increased, and the 20% K value of the resin particles at 25°C and 200°C can be easily adjusted within a preferred range, further improving the gap controllability of the connection structure when exposed to a high-temperature environment. The polymerizable component mixture (before polymerization) contains the polymerizable compound used in the resin particles in the weight ratio used in the resin particles.

 上記重合性成分の混合物(重合前)の粘度は、例えば、E型粘度計を用いて、25℃及び5rpmの条件で測定される。上記E型粘度計としては、東機産業社製「VISCOMETER TV-22」等が挙げられる。 The viscosity of the mixture of polymerizable components (before polymerization) is measured, for example, using an E-type viscometer at 25°C and 5 rpm. Examples of E-type viscometers include the "VISCOMETER TV-22" manufactured by Toki Sangyo Co., Ltd.

 上記樹脂粒子の粒子径は、好ましくは0.1μm以上、より好ましくは1μm以上、より一層好ましくは1.5μm以上、さらに好ましくは2μm以上、さらに一層好ましくは5μm以上、特に好ましくは10μm以上、最も好ましくは20μm以上であり、好ましくは300μm以下、より好ましくは100μm以下、さらに好ましくは70μm以下、特に好ましくは50μm以下、最も好ましくは30μm以下である。上記樹脂粒子の粒子径が上記下限以上であると、樹脂粒子の表面に金属被覆層を無電解めっきにより形成する際に凝集し難くなり、凝集した金属被覆粒子が形成されにくくなる。上記樹脂粒子の粒子径が上記上限以下であると、高温環境下にさらされたときの接続構造体のギャップ制御性をより一層高めることができる。 The particle diameter of the resin particles is preferably 0.1 μm or more, more preferably 1 μm or more, even more preferably 1.5 μm or more, even more preferably 2 μm or more, even more preferably 5 μm or more, particularly preferably 10 μm or more, and most preferably 20 μm or more, and is preferably 300 μm or less, more preferably 100 μm or less, even more preferably 70 μm or less, particularly preferably 50 μm or less, and most preferably 30 μm or less. If the particle diameter of the resin particles is above the above lower limit, they are less likely to agglomerate when a metal coating layer is formed on the surface of the resin particles by electroless plating, making it difficult for agglomerated metal-coated particles to form. If the particle diameter of the resin particles is below the above upper limit, the gap controllability of the connection structure when exposed to a high-temperature environment can be further improved.

 特に樹脂粒子が用いられた樹脂材料が硬化されたときに、硬化物におけるクラックの発生を抑制することができ、樹脂材料が用いられた接続構造体が高温環境下にさらされたときに、接続構造体におけるギャップ制御性をかなり高めることができるので、上記樹脂粒子の粒子径は、5μm以上であることが好ましい。この効果がより一層効果的に発揮されるので、上記樹脂粒子の粒子径は、10μm以上であることがより好ましく、20μm以上であることがさらに好ましい。また、上記樹脂材料がはんだペーストである場合に、この効果がさらに一層効果的に発揮される。上記樹脂粒子の粒子径は、5μm以上100μm以下であることが好ましく、10μm以上100μm以下であることがより好ましく、20μm以上100μm以下であることがさらに好ましい。さらに、冷熱サイクル後の接続構造体の導通信頼性をかなり高める観点からは、上記樹脂粒子の粒子径は、10μm以上であることが好ましい。 In particular, when a resin material containing resin particles is cured, the occurrence of cracks in the cured product can be suppressed, and when a connection structure containing the resin material is exposed to a high-temperature environment, the gap controllability of the connection structure can be significantly improved. Therefore, it is preferable that the particle diameter of the resin particles be 5 μm or more. This effect is even more effectively achieved, so the particle diameter of the resin particles is more preferably 10 μm or more, and even more preferably 20 μm or more. Furthermore, when the resin material is a solder paste, this effect is even more effectively achieved. The particle diameter of the resin particles is preferably 5 μm or more and 100 μm or less, more preferably 10 μm or more and 100 μm or less, and even more preferably 20 μm or more and 100 μm or less. Furthermore, from the perspective of significantly improving the conductivity reliability of the connection structure after thermal cycling, it is preferable that the particle diameter of the resin particles be 10 μm or more.

 本発明者らは、本発明の効果をより一層効果的に発揮するために、1)特定の重合性成分を用いること、2)樹脂粒子の圧縮弾性率を特定の範囲に制御すること、及び3)樹脂粒子の粒子径を特定の範囲に制御することが重要であること、すなわちこれらの3つの要件を組み合わせることが重要であることを見出した。 The inventors have discovered that in order to achieve the effects of the present invention more effectively, it is important to 1) use a specific polymerizable component, 2) control the compressive modulus of the resin particles within a specific range, and 3) control the particle size of the resin particles within a specific range, that is, to combine these three requirements.

 上記樹脂粒子の粒子径は、樹脂粒子が真球状である場合には直径を意味し、樹脂粒子が真球状以外の形状である場合には、その体積相当の真球と仮定した際の直径を意味する。 The particle size of the resin particles mentioned above refers to the diameter if the resin particles are spherical, and if the resin particles are other than spherical, refers to the diameter when assumed to be a perfect sphere with a volume equivalent to that of the resin particles.

 上記樹脂粒子の粒子径は、平均粒子径であることが好ましく、数平均粒子径であることがより好ましい。また、上記樹脂粒子の数平均粒子径の下限及び上限が、上記樹脂粒子の粒子径の好適な下限及び上限を満たすことで、効果がより一層効果的に発揮される。樹脂粒子の粒子径は、例えば、任意の樹脂粒子50個を電子顕微鏡又は光学顕微鏡にて観察し、各樹脂粒子の粒子径の平均値を算出することや、レーザー回折式粒度分布測定を行うことにより求められる。電子顕微鏡又は光学顕微鏡での観察では、1個当たりの樹脂粒子の粒子径は、円相当径での粒子径として求められる。電子顕微鏡又は光学顕微鏡での観察において、任意の50個の樹脂粒子の円相当径での平均粒子径は、球相当径での平均粒子径とほぼ等しくなる。レーザー回折式粒度分布測定では、1個当たりの樹脂粒子の粒子径は、球相当径での粒子径として求められる。上記樹脂粒子の粒子径は、レーザー回折式粒度分布測定により算出することが好ましい。 The particle diameter of the resin particles is preferably an average particle diameter, and more preferably a number-average particle diameter. Furthermore, when the lower and upper limits of the number-average particle diameter of the resin particles satisfy the preferred lower and upper limits of the particle diameter of the resin particles, the effect is even more pronounced. The particle diameter of the resin particles can be determined, for example, by observing 50 random resin particles with an electron microscope or optical microscope and calculating the average particle diameter of each resin particle, or by performing laser diffraction particle size distribution measurement. When observed with an electron microscope or optical microscope, the particle diameter of each resin particle is determined as the particle diameter in equivalent circle diameter. When observed with an electron microscope or optical microscope, the average particle diameter in equivalent circle diameter of 50 random resin particles is approximately equal to the average particle diameter in equivalent sphere diameter. When observed with a laser diffraction particle size distribution measurement, the particle diameter of each resin particle is determined as the particle diameter in equivalent sphere diameter. The particle diameter of the resin particles is preferably calculated using laser diffraction particle size distribution measurement.

 接続対象部材上又は接続対象部材間のギャップをより一層高精度に制御する観点からは、上記樹脂粒子は、平均粒子径の1.5倍以上の粒子径を有する樹脂粒子を含まないか、又は、平均粒子径の1.5倍以上の粒子径を有する樹脂粒子を1000ppm以下で含むことが好ましい。接続対象部材上又は接続対象部材間のギャップをより一層高精度に制御する観点からは、平均粒子径の1.5倍以上の粒子径を有する樹脂粒子の含有量は、1000ppm以下であることが好ましく、100ppm以下であることがより好ましく、10ppm以下であることがさらに好ましく、0.1ppm以下であることが特に好ましい。この範囲には、0ppmが含まれる。接続対象部材上又は接続対象部材間のギャップをより一層高精度に制御する観点からは、平均粒子径の1.5倍以上の粒子径を有する樹脂粒子の含有量は、0ppm(未含有)であることが最も好ましい。 From the perspective of controlling the gap on or between connection target components with even greater precision, it is preferable that the resin particles do not contain resin particles having a particle diameter of 1.5 times or more the average particle diameter, or contain 1000 ppm or less of resin particles having a particle diameter of 1.5 times or more the average particle diameter. From the perspective of controlling the gap on or between connection target components with even greater precision, the content of resin particles having a particle diameter of 1.5 times or more the average particle diameter is preferably 1000 ppm or less, more preferably 100 ppm or less, even more preferably 10 ppm or less, and particularly preferably 0.1 ppm or less. This range includes 0 ppm. From the perspective of controlling the gap on or between connection target components with even greater precision, it is most preferable that the content of resin particles having a particle diameter of 1.5 times or more the average particle diameter is 0 ppm (not contained).

 平均粒子径の1.5倍以上の粒子径を有する樹脂粒子の含有量(ppm)は、以下のようにして測定できる。平均粒子径の1.5倍の孔径のフィルターで樹脂粒子をろ過し、フィルター上に残った樹脂粒子を光学顕微鏡により観察し、平均粒子径の1.5倍以上の樹脂粒子をカウントする。カウントした樹脂粒子の個数をろ過した樹脂粒子の全個数で除すことで、平均粒子径の1.5倍以上の粒子径を有する樹脂粒子の含有量(ppm)を算出する。 The content (ppm) of resin particles having a particle size 1.5 times or more the average particle size can be measured as follows: Resin particles are filtered through a filter with a pore size 1.5 times the average particle size, the resin particles remaining on the filter are observed under an optical microscope, and the resin particles having a particle size 1.5 times or more the average particle size are counted. The number of counted resin particles is divided by the total number of resin particles filtered to calculate the content (ppm) of resin particles having a particle size 1.5 times or more the average particle size.

 接続対象部材上又は接続対象部材間のギャップをより一層高精度に制御する観点からは、上記樹脂粒子の粒子径のCV値(変動係数)は、好ましくは10%以下、より好ましくは8.0%以下である。上記樹脂粒子の粒子径のCV値の下限は、特に限定されない。上記樹脂粒子の粒子径のCV値は、0%以上であってもよく、1.0%以上であってもよい。上記樹脂粒子の粒子径のCV値の範囲は、上記下限値及び上記上限値を適宜選択して設定することができる。 From the perspective of controlling the gap on or between connection target components with even greater precision, the CV value (coefficient of variation) of the particle diameter of the resin particles is preferably 10% or less, and more preferably 8.0% or less. There is no particular limitation on the lower limit of the CV value of the particle diameter of the resin particles. The CV value of the particle diameter of the resin particles may be 0% or more, or 1.0% or more. The range of the CV value of the particle diameter of the resin particles can be set by appropriately selecting the lower limit and upper limit.

 上記樹脂粒子の粒子径のCV値(変動係数)は、以下のようにして測定できる。 The CV value (coefficient of variation) of the particle diameter of the above resin particles can be measured as follows.

 樹脂粒子の粒子径のCV値(%)=(ρ/Dn)×100
 ρ:樹脂粒子の粒子径の標準偏差
 Dn:樹脂粒子の粒子径の平均値
CV value (%) of particle diameter of resin particles = (ρ/Dn) × 100
ρ: Standard deviation of particle diameter of resin particles Dn: Average particle diameter of resin particles

 接続対象部材上又は接続対象部材間のギャップをより一層高精度に制御する観点からは、上記樹脂粒子のアスペクト比は、好ましくは1.5以下、より好ましくは1.3以下である。上記樹脂粒子のアスペクト比の下限は、特に限定されない。上記樹脂粒子のアスペクト比は、1.0以上であってもよく、1.1以上であってもよい。上記アスペクト比は、長径/短径を示す。上記アスペクト比は、任意の樹脂粒子10個を、電子顕微鏡又は光学顕微鏡により観察し、最大径と最小径をそれぞれ長径、短径とし、各球状の上記樹脂粒子の長径/短径の平均値を算出することにより求めることが好ましい。上記樹脂粒子のアスペクト比の範囲は、上記下限値及び上記上限値を適宜選択して設定することができる。 From the perspective of controlling the gap on or between connection target components with even greater precision, the aspect ratio of the resin particles is preferably 1.5 or less, more preferably 1.3 or less. There is no particular lower limit to the aspect ratio of the resin particles. The aspect ratio of the resin particles may be 1.0 or more, or may be 1.1 or more. The aspect ratio represents the major axis/minor axis ratio. The aspect ratio is preferably determined by observing 10 random resin particles with an electron microscope or optical microscope, defining the maximum and minimum diameters as the major axis and minor axis, respectively, and calculating the average major axis/minor axis ratio of each spherical resin particle. The range of the aspect ratio of the resin particles can be set by appropriately selecting the lower limit and upper limit.

 上記樹脂粒子を250℃で10分加熱したときのアウトガス量は、好ましくは2000ppm以下、より好ましくは1000ppm以下、さらに好ましくは800ppm以下、特に好ましくは500ppm以下、最も好ましくは300ppm以下である。この範囲には、0ppmが含まれる。上記樹脂粒子を250℃で10分加熱したときのアウトガス量は、0ppm(アウトガスが未発生)であることが最も好ましい。上記樹脂粒子を250℃で10分加熱したときのアウトガス量が上記上限以下であると、冷熱サイクルにより、接続構造体の接続部にボイドが生じたり、金属被覆粒子において樹脂粒子と金属被覆層との間にクラックや剥離が生じたりすることを抑制することができ、冷熱サイクル後の接続構造体の導通信頼性を高めることができる。上記樹脂粒子を250℃で10分加熱したときのアウトガス量の下限は、特に限定されない。上記樹脂粒子を250℃で10分加熱したときのアウトガス量は、0ppm以上であってもよく、5ppm以上であってもよく、10ppm以上であってもよい。上記樹脂粒子を250℃で10分加熱したときのアウトガス量の範囲は、上記下限値及び上記上限値を適宜選択して設定することができる。 The amount of outgassing when the resin particles are heated at 250°C for 10 minutes is preferably 2000 ppm or less, more preferably 1000 ppm or less, even more preferably 800 ppm or less, particularly preferably 500 ppm or less, and most preferably 300 ppm or less. This range includes 0 ppm. Most preferably, the amount of outgassing when the resin particles are heated at 250°C for 10 minutes is 0 ppm (no outgassing). If the amount of outgassing when the resin particles are heated at 250°C for 10 minutes is below the above upper limit, it is possible to prevent voids from forming at the connection portion of the connection structure due to thermal cycling, and cracks or peeling from occurring between the resin particles and the metal coating layer of metal-coated particles, thereby improving the conductivity reliability of the connection structure after thermal cycling. There is no particular lower limit on the amount of outgassing when the resin particles are heated at 250°C for 10 minutes. The amount of outgassing when the resin particles are heated at 250°C for 10 minutes may be 0 ppm or more, 5 ppm or more, or 10 ppm or more. The range of the amount of outgassing when the resin particles are heated at 250°C for 10 minutes can be set by appropriately selecting the above lower limit and upper limit.

 上記樹脂粒子を250℃で10分加熱したときのアウトガス量は、例えば、以下のようにして測定できる。 The amount of outgassing when the above resin particles are heated at 250°C for 10 minutes can be measured, for example, as follows.

 試料として、上記樹脂粒子5mgと、既知重量のトルエン(既知濃度のトルエン溶液)との2つの試料を用意する。加熱脱着装置を用いて、ヘリウムガスを20mL/分の流量で通気させながら、上記樹脂粒子5mgを250℃及び10分間の加熱条件で加熱して、発生した成分(A)を吸着剤が充填されたガラス管に吸着捕集する。上記成分(A)が捕集された上記ガラス管内にヘリウムガスを通気させながら、上記成分(A)が捕集された上記ガラス管を350℃及び40分間の加熱条件で加熱して、吸着剤から脱離した成分をガスクロマトグラフ質量分析計に直接導入し、分析する。加熱脱着装置を用いて、ヘリウムガスを20mL/分の流量で通気させながら、上記既知重量のトルエンを250℃及び10分間の加熱条件で加熱して、発生した成分(B)を吸着剤が充填されたガラス管に吸着捕集する。上記成分(B)が捕集された上記ガラス管内にヘリウムガスを通気させながら、上記成分(B)が捕集された上記ガラス管を350℃及び40分間の加熱条件で加熱して、吸着剤から脱離した成分をガスクロマトグラフ質量分析計に直接導入し、分析する。上記樹脂粒子を用いたときに検出された各成分のピーク面積値と、上記既知重量のトルエンを用いたときに検出されたピーク面積値とを比較して、樹脂粒子を250℃で10分加熱したときのアウトガス量を算出する。 Two samples are prepared: 5 mg of the resin particles and a known weight of toluene (toluene solution of known concentration). Using a thermal desorption device, 5 mg of the resin particles are heated at 250°C for 10 minutes while passing helium gas at a flow rate of 20 mL/min, and the generated component (A) is adsorbed and collected in a glass tube filled with an adsorbent. While passing helium gas through the glass tube in which component (A) is collected, the glass tube in which component (A) is collected is heated at 350°C for 40 minutes, and the components desorbed from the adsorbent are directly introduced into a gas chromatograph mass spectrometer and analyzed. Using a thermal desorption device, while passing helium gas at a flow rate of 20 mL/min, the known weight of toluene is heated at 250°C for 10 minutes, and the generated component (B) is adsorbed and collected in a glass tube filled with an adsorbent. While helium gas is passed through the glass tube in which component (B) is collected, the glass tube in which component (B) is collected is heated at 350°C for 40 minutes, and the components desorbed from the adsorbent are directly introduced into a gas chromatograph mass spectrometer and analyzed. The peak area values of each component detected when the resin particles are used are compared with the peak area values detected when the known weight of toluene is used, and the amount of outgassing when the resin particles are heated at 250°C for 10 minutes is calculated.

 上記既知重量のトルエンは、トルエン5mgであってもよい。 The above known weight of toluene may be 5 mg of toluene.

 上記樹脂粒子を250℃で10分加熱したときのアウトガス量は、より詳細には以下のようにして測定される。 More specifically, the amount of outgassing when the above resin particles are heated at 250°C for 10 minutes is measured as follows.

 試料(樹脂粒子5mg又は既知重量のトルエン)をサンプル管に封入し、サンプル管内にヘリウムガスを20mL/分の流量で通気させながら、250℃及び10分間の加熱条件で加熱する。加熱により揮発した成分を、捕集剤(例えば、TENAX-TA)が充填されたガラス管に吸着捕集する。上記揮発した成分が捕集された上記ガラス管内にヘリウムガスを通気させながら、該ガラス管を350℃及び40分間の加熱条件で加熱する。加熱によって吸着剤から脱離した成分をガスクロマトグラフ質量分析計(以下、GC/MS)に直接導入し、分析する(ATD-GC/MS)。上記の測定に用いられる装置の例及び分析条件は、下記の通りである。 A sample (5 mg of resin particles or a known weight of toluene) is sealed in a sample tube and heated at 250°C for 10 minutes while helium gas is passed through the sample tube at a flow rate of 20 mL/min. The components volatilized by heating are adsorbed and collected in a glass tube filled with a collector (e.g., TENAX-TA). While helium gas is passed through the glass tube in which the volatilized components have been collected, the glass tube is heated at 350°C for 40 minutes. The components desorbed from the adsorbent by heating are introduced directly into a gas chromatograph mass spectrometer (hereinafter referred to as GC/MS) and analyzed (ATD-GC/MS). Examples of equipment and analytical conditions used for the above measurements are as follows:

 [ATD-GC/MS]
 加熱脱着装置:PerkinElmer社製「TurboMatrix350」
 GC:アジレント・テクノロジー社製「7890A」
 MS:日本電子社製「JMS-Q1000GCQ」
 カラム:SUPELCO社製「EQUITY-1 60m×0.25mmI.D.×0.25μm」
[ATD-GC/MS]
Thermal desorption device: PerkinElmer "TurboMatrix 350"
GC: Agilent Technologies "7890A"
MS: "JMS-Q1000GCQ" manufactured by JEOL Ltd.
Column: SUPELCO "EQUITY-1 60 m x 0.25 mm ID x 0.25 μm"

 <加熱脱着装置の条件>
 サンプル管の加熱温度:250℃
 加熱時間:10分間
 ヘリウムガスの流量:20mL/分
 コールドトラップ温度:4℃
 捕集管(ガラス管)からの脱離温度と時間:350℃及び40分
 スプリット:入口;25mL/分、出口;25mL/分
<Conditions for thermal desorption equipment>
Sample tube heating temperature: 250°C
Heating time: 10 minutes Helium gas flow rate: 20 mL/min Cold trap temperature: 4°C
Desorption temperature and time from collection tube (glass tube): 350°C and 40 minutes Split: inlet; 25 mL/min, outlet; 25 mL/min

 <GC/MS条件>
 キャリアガス:ヘリウム、コンタクトフロー
 カラム流量:1.5mL
 スプリット比:1:30
 オーブン初期温度:40℃
 ホールド時間:4分
 昇温レート:10℃/分
 最終温度:300℃
 ホールド時間:10分
 MS:EIモード、70eV、トランスファーライン;250℃、イオン源;230℃
<GC/MS conditions>
Carrier gas: Helium, contact flow Column flow rate: 1.5 mL
Split ratio: 1:30
Initial oven temperature: 40°C
Hold time: 4 minutes Heating rate: 10°C/minute Final temperature: 300°C
Hold time: 10 minutes MS: EI mode, 70 eV, transfer line: 250°C, ion source: 230°C

 上記樹脂粒子を用いたときに検出された各成分のピーク面積値の総和と、既知濃度のトルエン溶液(既知重量のトルエン、例えば、関東化学社製「VOCs混合標準原液III」)を用いたときに検出されたピーク面積値とを比較する。これにより、樹脂粒子からの揮発成分(アウトガス)濃度を、トルエン換算として算出する。本発明において、樹脂粒子を250℃で10分加熱したときのアウトガス量(ppm)は、以下の式で算出される。 The sum of the peak area values of each component detected when using the above resin particles is compared with the peak area value detected when using a toluene solution of known concentration (known weight of toluene, for example, "VOCs Mixed Standard Stock Solution III" manufactured by Kanto Chemical Co., Inc.). This allows the concentration of volatile components (outgassing) from the resin particles to be calculated in toluene terms. In the present invention, the amount of outgassing (ppm) when resin particles are heated at 250°C for 10 minutes is calculated using the following formula.

 アウトガス量(ppm)=[(樹脂粒子からの揮発成分のピーク面積値の総和)/(トルエンのピーク面積値)×トルエン溶液中のトルエンの濃度(μg/g)×測定したトルエン溶液の量(g)]/樹脂粒子の重量 Outgassing amount (ppm) = [(sum of peak areas of volatile components from resin particles) / (toluene peak area) x toluene concentration in toluene solution (μg/g) x measured amount of toluene solution (g)] / resin particle weight

 上記樹脂粒子を250℃で10分加熱したときのアウトガス量を好ましい範囲に調整する方法としては、上述した好ましい重合性成分を用いる方法、重合性成分の分子量を調整する方法、上述した好ましい架橋剤を用いる方法、重合温度及び重合時間等を調整する方法、重合時に加圧する方法、及び未反応の重合性成分(モノマー)を洗浄する方法等が挙げられる。 Methods for adjusting the amount of outgassing within a preferred range when the resin particles are heated at 250°C for 10 minutes include using the preferred polymerizable component described above, adjusting the molecular weight of the polymerizable component, using the preferred crosslinking agent described above, adjusting the polymerization temperature and polymerization time, applying pressure during polymerization, and washing away unreacted polymerizable components (monomers).

 上記樹脂粒子の用途は、特に限定されない。上記樹脂粒子は、様々な用途に好適に用いられる。上記樹脂粒子は、スペーサとして用いられることが好ましい。上記樹脂粒子は、スペーサ用樹脂粒子であることが好ましい。上記樹脂粒子は、樹脂材料におけるスペーサとして用いられてもよい。上記スペーサとしては、液晶表示素子用スペーサ、ギャップ制御用スペーサ、及び応力緩和用スペーサ等が挙げられる。上記ギャップ制御用スペーサは、スタンドオフ高さ及び平坦性を確保するための積層チップのギャップ制御、並びに、ガラス面の平滑性及び接着剤層の厚みを確保するための光学部品のギャップ制御等に用いることができる。上記応力緩和用スペーサは、センサチップ等の応力緩和、及び2つの被着体を接着している接着層の応力緩和等に用いることができる。 The use of the resin particles is not particularly limited. The resin particles are suitable for a variety of applications. The resin particles are preferably used as spacers. The resin particles are preferably resin particles for spacers. The resin particles may be used as spacers in resin materials. Examples of the spacers include spacers for liquid crystal display elements, gap control spacers, and stress relief spacers. The gap control spacers can be used for gap control of stacked chips to ensure standoff height and flatness, and for gap control of optical components to ensure smoothness of glass surfaces and thickness of adhesive layers. The stress relief spacers can be used for stress relief of sensor chips and the like, and for stress relief of adhesive layers bonding two adherends.

 上記樹脂粒子は、液晶表示素子用スペーサとして用いられることが好ましく、液晶表示素子用周辺シール剤に用いられることが好ましい。上記液晶表示素子用周辺シール剤において、上記樹脂粒子は、スペーサとして機能することが好ましい。上記樹脂粒子は、良好な圧縮変形特性を有するので、上記樹脂粒子をスペーサとして用いて基板間に配置する場合に、上記樹脂粒子が、基板間に効率的に配置される。さらに、上記樹脂粒子では、液晶表示素子用部材等の傷付きを抑えることができるので、上記液晶表示素子用スペーサを用いた液晶表示素子において、表示不良が生じ難くなる。 The resin particles are preferably used as spacers for liquid crystal display elements, and are preferably used in a peripheral sealant for liquid crystal display elements. In the peripheral sealant for liquid crystal display elements, the resin particles preferably function as spacers. Because the resin particles have good compressive deformation characteristics, when the resin particles are used as spacers and placed between substrates, the resin particles are efficiently placed between the substrates. Furthermore, the resin particles can prevent scratches on liquid crystal display element components, etc., so display defects are less likely to occur in liquid crystal display elements using the liquid crystal display element spacers.

 さらに、上記樹脂粒子は、無機充填材、トナーの添加剤、衝撃吸収剤又は振動吸収剤としても好適に用いられる。例えば、ゴム又はバネ等の代替品として、上記樹脂粒子を用いることができる。また、上記樹脂粒子は、後述する金属被覆粒子を得るために用いられてもよい。 Furthermore, the resin particles are also suitable for use as inorganic fillers, toner additives, shock absorbers, or vibration absorbers. For example, the resin particles can be used as a substitute for rubber or springs. The resin particles may also be used to obtain the metal-coated particles described below.

 上記樹脂粒子100重量%中、上記重合性成分の重合体の含有量は、好ましくは80重量%以上、より好ましくは85重量%以上、さらに好ましくは90重量%以上、特に好ましくは95重量%以上である。上記重合性成分の重合体の含有量が上記下限以上であると、樹脂粒子の25℃及び200℃での20%K値を好ましい範囲に容易に調整することができ、高温環境下にさらされたときの接続構造体のギャップ制御性をより一層高めることができる。上記樹脂粒子100重量%中、上記重合性成分の重合体の含有量の上限は、特に限定されない。上記樹脂粒子100重量%中、上記重合性成分の重合体の含有量は、100重量%(全量)以下であってもよく、100重量%未満であってもよい。上記樹脂粒子100重量%中、上記重合性成分の重合体の含有量の範囲は、上記下限値及び上記上限値を適宜選択して設定することができる。 The content of the polymer of the polymerizable component in 100% by weight of the resin particles is preferably 80% by weight or more, more preferably 85% by weight or more, even more preferably 90% by weight or more, and particularly preferably 95% by weight or more. When the content of the polymer of the polymerizable component is equal to or greater than the above lower limit, the 20% K value of the resin particles at 25°C and 200°C can be easily adjusted within a preferred range, further improving the gap controllability of the connection structure when exposed to a high-temperature environment. There is no particular upper limit to the content of the polymer of the polymerizable component in 100% by weight of the resin particles. The content of the polymer of the polymerizable component in 100% by weight of the resin particles may be equal to or less than 100% by weight (total amount). The range of the content of the polymer of the polymerizable component in 100% by weight of the resin particles can be set by appropriately selecting the above lower limit and upper limit.

 上記重合性成分100重量%中、上記ジビニルベンゼンの含有量は、好ましくは20重量%以上、より好ましくは25重量%以上、さらに好ましくは30重量%以上、特に好ましくは40重量%以上、最も好ましくは45重量%以上であり、好ましくは80重量%以下、より好ましくは75重量%以下、さらに好ましくは70重量%以下、特に好ましくは65重量%以下、最も好ましくは60重量%以下である。上記ジビニルベンゼンの含有量が上記下限以上及び上記上限以下であると、本発明の効果をより一層効果的に発揮することができ、また冷熱サイクル後の接続構造体の導通信頼性をより一層高めることができる。上記ジビニルベンゼンの含有量が上記下限以上であると、樹脂粒子の耐熱性を高めることができる。上記ジビニルベンゼンの含有量が上記上限以下であると、未反応の重合性成分(モノマー)の残存量を減少させることができる。 With respect to 100% by weight of the polymerizable component, the content of the divinylbenzene is preferably 20% by weight or more, more preferably 25% by weight or more, even more preferably 30% by weight or more, particularly preferably 40% by weight or more, and most preferably 45% by weight or more, and is preferably 80% by weight or less, more preferably 75% by weight or less, even more preferably 70% by weight or less, particularly preferably 65% by weight or less, and most preferably 60% by weight or less. When the content of the divinylbenzene is above the above lower limit and below the above upper limit, the effects of the present invention can be more effectively exerted, and the conductivity reliability of the connection structure after thermal cycling can be further improved. When the content of the divinylbenzene is above the above lower limit, the heat resistance of the resin particles can be improved. When the content of the divinylbenzene is below the above upper limit, the amount of remaining unreacted polymerizable component (monomer) can be reduced.

 上記重合性成分100重量%中、上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物の含有量は、好ましくは20重量%以上、より好ましくは25重量%以上、より一層好ましくは30重量%以上、さらに好ましくは35重量%以上、特に好ましくは40重量%以上、最も好ましくは45重量%以上であり、好ましくは80重量%以下、より好ましくは75重量%以下、より一層好ましくは70重量%以下、さらに好ましくは65重量%以下、さらに一層好ましくは60重量%以下、特に好ましくは55重量%以下、最も好ましくは50重量%以下である。上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物の含有量が上記下限以上及び上記上限以下であると、本発明の効果をより一層効果的に発揮することができ、また冷熱サイクル後の接続構造体の導通信頼性をより一層高めることができる。上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物の含有量が上記下限以上であると、樹脂粒子の架橋度を高めることができる。上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物の含有量が上記上限以下であると、樹脂粒子の耐熱性を高めることができる。 The content of the (meth)acrylate compound having four or more (meth)acryloyl groups in 100% by weight of the polymerizable component is preferably 20% by weight or more, more preferably 25% by weight or more, even more preferably 30% by weight or more, even more preferably 35% by weight or more, particularly preferably 40% by weight or more, and most preferably 45% by weight or more, and is preferably 80% by weight or less, more preferably 75% by weight or less, even more preferably 70% by weight or less, even more preferably 65% by weight or less, even more preferably 60% by weight or less, particularly preferably 55% by weight or less, and most preferably 50% by weight or less. When the content of the (meth)acrylate compound having four or more (meth)acryloyl groups is above the above lower limit and below the above upper limit, the effects of the present invention can be more effectively exerted, and the conductivity reliability of the connection structure after thermal cycling can be further improved. When the content of the (meth)acrylate compound having four or more (meth)acryloyl groups is above the above lower limit, the degree of crosslinking of the resin particles can be increased. When the content of the (meth)acrylate compound having four or more (meth)acryloyl groups is equal to or less than the above upper limit, the heat resistance of the resin particles can be improved.

 上記重合性成分100重量%中、上記ジビニルベンゼンと上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物との合計の含有量は、好ましくは80重量%以上、より好ましくは85重量%以上、さらに好ましくは90重量%以上、特に好ましくは95重量%以上である。上記ジビニルベンゼンと上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物との合計の含有量が上記下限以上であると、本発明の効果をより一層効果的に発揮することができる。上記ジビニルベンゼンと上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物との合計の含有量の上限は、特に限定されない。上記重合性成分100重量%中、上記ジビニルベンゼンと上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物との合計の含有量は、100重量%(全量)以下であってもよく、100重量%未満であってもよい。上記重合性成分100重量%中、上記ジビニルベンゼンと上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物との合計の含有量の範囲は、上記下限値及び上記上限値を適宜選択して設定することができる。 With respect to 100% by weight of the polymerizable component, the total content of the divinylbenzene and the (meth)acrylate compound having four or more (meth)acryloyl groups is preferably 80% by weight or more, more preferably 85% by weight or more, even more preferably 90% by weight or more, and particularly preferably 95% by weight or more. When the total content of the divinylbenzene and the (meth)acrylate compound having four or more (meth)acryloyl groups is equal to or greater than the above lower limit, the effects of the present invention can be more effectively achieved. There is no particular upper limit to the total content of the divinylbenzene and the (meth)acrylate compound having four or more (meth)acryloyl groups. With respect to 100% by weight of the polymerizable component, the total content of the divinylbenzene and the (meth)acrylate compound having four or more (meth)acryloyl groups may be 100% by weight or less (total amount), or may be less than 100% by weight. The range of the total content of the divinylbenzene and the (meth)acrylate compound having four or more (meth)acryloyl groups per 100% by weight of the polymerizable component can be set by appropriately selecting the lower limit and upper limit.

 上記重合性成分中の上記ジビニルベンゼンの含有量の、上記重合性成分中の上記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物の含有量に対する重量比を、重量比(ジビニルベンゼンの含有量/(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物の含有量)とする。上記重量比(ジビニルベンゼンの含有量/(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物の含有量)は、好ましくは0.30以上、より好ましくは0.40以上、より一層好ましくは0.50以上、さらに好ましくは0.60以上、特に好ましくは0.70以上、最も好ましくは0.80以上であり、好ましくは10.00以下、より好ましくは5.00以下、より一層好ましくは4.00以下、さらに好ましくは3.00以下、特に好ましくは2.00以下、最も好ましくは1.50以下である。上記重量比(ジビニルベンゼンの含有量/(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物の含有量)が上記下限以上及び上記上限以下であると、本発明の効果をより一層効果的に発揮することができる。上記重量比(ジビニルベンゼンの含有量/(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物の含有量)が上記下限以上であると、樹脂粒子の耐熱性を高めることができる。上記重量比(ジビニルベンゼンの含有量/(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物の含有量)が上記上限以下であると、樹脂粒子の架橋度を高め、未反応の重合性成分(モノマー)の残存量を減少させることができる。 The weight ratio of the content of the divinylbenzene in the polymerizable component to the content of the (meth)acrylate compound having four or more (meth)acryloyl groups in the polymerizable component is defined as the weight ratio (content of divinylbenzene/content of (meth)acrylate compound having four or more (meth)acryloyl groups). The weight ratio (content of divinylbenzene/content of (meth)acrylate compound having four or more (meth)acryloyl groups) is preferably 0.30 or more, more preferably 0.40 or more, even more preferably 0.50 or more, even more preferably 0.60 or more, particularly preferably 0.70 or more, and most preferably 0.80 or more, and is preferably 10.00 or less, more preferably 5.00 or less, even more preferably 4.00 or less, even more preferably 3.00 or less, particularly preferably 2.00 or less, and most preferably 1.50 or less. When the weight ratio (divinylbenzene content/(meth)acrylate compound content having four or more (meth)acryloyl groups) is equal to or greater than the lower limit and equal to or less than the upper limit, the effects of the present invention can be more effectively achieved. When the weight ratio (divinylbenzene content/(meth)acrylate compound content having four or more (meth)acryloyl groups) is equal to or greater than the lower limit, the heat resistance of the resin particles can be improved. When the weight ratio (divinylbenzene content/(meth)acrylate compound content having four or more (meth)acryloyl groups) is equal to or less than the upper limit, the degree of crosslinking of the resin particles can be increased, and the amount of remaining unreacted polymerizable component (monomer) can be reduced.

 (金属被覆粒子)
 本発明に係る金属被覆粒子は、上述した樹脂粒子と、上記樹脂粒子の表面上に配置された金属被覆層とを備える。本発明に係る金属被覆粒子では、上記の構成が備えられているので、金属被覆粒子がスペーサとして用いられた場合に、高温環境下にさらされたときの接続構造体のギャップ制御性を高めることができ、かつ、冷熱サイクル後の接続構造体の導通信頼性を高めることができる。
(metal coated particles)
The metal-coated particles according to the present invention comprise the resin particles described above and a metal coating layer disposed on the surface of the resin particles. Because the metal-coated particles according to the present invention have the above-described configuration, when used as spacers, the metal-coated particles can improve the gap controllability of a connection structure when exposed to a high-temperature environment and can also improve the conduction reliability of the connection structure after thermal cycling.

 特に、上記樹脂粒子は、表面上に金属被覆層が形成されることで、上記金属被覆層を備える金属被覆粒子を得るために用いられるか、又は、上記樹脂粒子は、5μm以上100μm以下の粒子径を有することが好ましい。この場合には、樹脂粒子又は金属被覆粒子が用いられた樹脂材料が硬化されたときに、硬化物におけるクラックの発生を抑制することができ、樹脂材料が用いられた接続構造体が高温環境下にさらされたときに、接続構造体におけるギャップ制御性をかなり高めることができる。さらに、冷熱サイクル後の接続構造体の導通信頼性をかなり高めることができる。これらの効果がより一層効果的に発揮されるので、上記樹脂粒子は、表面上に金属被覆層が形成されることで、上記金属被覆層を備える金属被覆粒子を得るために用いられるか、又は、上記樹脂粒子は、10μm以上100μm以下の粒子径を有することがより好ましい。これらの効果がさらに一層効果的に発揮されるので、上記樹脂粒子は、表面上に金属被覆層が形成されることで、上記金属被覆層を備える金属被覆粒子を得るために用いられるか、又は、上記樹脂粒子は、20μm以上100μm以下の粒子径を有することがさらに好ましい。 In particular, the resin particles are preferably used to form a metal coating layer on their surfaces to obtain metal-coated particles having the metal coating layer, or the resin particles have a particle diameter of 5 μm or more and 100 μm or less. In this case, when a resin material using the resin particles or metal-coated particles is cured, the occurrence of cracks in the cured product can be suppressed. Furthermore, when a connection structure using the resin material is exposed to a high-temperature environment, the gap controllability of the connection structure can be significantly improved. Furthermore, the conductivity reliability of the connection structure after thermal cycling can be significantly improved. To achieve these effects even more effectively, the resin particles are more preferably used to form a metal coating layer on their surfaces to obtain metal-coated particles having the metal coating layer, or the resin particles have a particle diameter of 10 μm or more and 100 μm or less. To achieve these effects even more effectively, the resin particles are more preferably used to form a metal coating layer on their surfaces to obtain metal-coated particles having the metal coating layer, or the resin particles have a particle diameter of 20 μm or more and 100 μm or less.

 特に、上記樹脂粒子は、表面上に金属被覆層が形成されることで、上記金属被覆層を備える金属被覆粒子を得るために用いられることが好ましい(表面上に金属被覆層が形成されることで、上記金属被覆層を備える金属被覆粒子を得るための上記樹脂粒子の使用)。この場合には、金属被覆粒子が用いられた樹脂材料が硬化されたときに、硬化物におけるクラックの発生を抑制することができ、樹脂材料が用いられた接続構造体が高温環境下にさらされたときに、接続構造体におけるギャップ制御性をかなり高めることができる。さらに、冷熱サイクル後の接続構造体の導通信頼性をかなり高めることができる。 In particular, the resin particles are preferably used to obtain metal-coated particles having the metal coating layer by forming a metal coating layer on the surface (use of the resin particles to obtain metal-coated particles having the metal coating layer by forming a metal coating layer on the surface). In this case, when the resin material using the metal-coated particles is cured, the occurrence of cracks in the cured product can be suppressed, and when a connection structure using the resin material is exposed to a high-temperature environment, the gap controllability of the connection structure can be significantly improved. Furthermore, the conductivity reliability of the connection structure after thermal cycling can be significantly improved.

 図2は、本発明の第1の実施形態に係る樹脂粒子を用いた金属被覆粒子を模式的に示す断面図である。 Figure 2 is a cross-sectional view schematically showing metal-coated particles using resin particles according to the first embodiment of the present invention.

 図2に示す金属被覆粒子11は、樹脂粒子1と、樹脂粒子1の表面上に配置された金属被覆層2とを有する。金属被覆層2は、樹脂粒子1の表面を被覆している。金属被覆粒子11は、樹脂粒子1の表面が金属被覆層2により被覆された被覆粒子である。 The metal-coated particle 11 shown in Figure 2 has a resin particle 1 and a metal coating layer 2 disposed on the surface of the resin particle 1. The metal coating layer 2 coats the surface of the resin particle 1. The metal-coated particle 11 is a coated particle in which the surface of the resin particle 1 is coated with the metal coating layer 2.

 上記金属被覆粒子を200℃で20%圧縮したときの圧縮弾性率(金属被覆粒子の200℃での20%K値)は、好ましくは1000N/mm以上、より好ましくは1500N/mm以上、さらに好ましくは2000N/mm以上であり、好ましくは20000N/mm以下、より好ましくは10000N/mm以下、さらに好ましくは6000N/mm以下である。上記金属被覆粒子の200℃での20%K値が上記下限以上であると、高温環境下にさらされたときの接続構造体のギャップ制御性をより一層高めることができる。上記金属被覆粒子の200℃での20%K値が上記上限以下であると、高温環境下にさらされたときの接続構造体の金属被覆粒子の破壊をより一層防ぐことができる。 The compressive modulus of elasticity when the metal-coated particles are compressed 20% at 200°C (20% K value of the metal-coated particles at 200°C) is preferably 1000 N/mm2 or more , more preferably 1500 N/mm2 or more , and even more preferably 2000 N/mm2 or more , and is preferably 20,000 N/mm2 or less , more preferably 10,000 N/mm2 or less , and even more preferably 6,000 N/mm2 or less. When the 20% K value of the metal-coated particles at 200°C is the above-mentioned lower limit or more, the gap controllability of the connection structure when exposed to a high-temperature environment can be further improved. When the 20% K value of the metal-coated particles at 200°C is the above-mentioned upper limit or less, destruction of the metal-coated particles in the connection structure when exposed to a high-temperature environment can be further prevented.

 上記金属被覆粒子を25℃で20%圧縮したときの圧縮弾性率(金属被覆粒子の25℃での20%K値)は、好ましくは1500N/mm以上、より好ましくは2000N/mm以上、さらに好ましくは2500N/mm以上であり、好ましくは20000N/mm以下、より好ましくは15000N/mm以下、さらに好ましくは8000N/mm以下である。上記金属被覆粒子の25℃での20%K値が上記下限以上であると、高温環境下にさらされたときの接続構造体のギャップ制御性をより一層高めることができる。上記金属被覆粒子の25℃での20%K値が上記上限以下であると、上記金属被覆粒子が接続対象部材(基板等)により一層良好に追従することができ、ギャップ制御性をより一層高めることができる。 The compressive modulus of the metal-coated particles when compressed 20% at 25°C (20% K value of the metal-coated particles at 25°C) is preferably 1500 N/mm2 or more , more preferably 2000 N/mm2 or more , even more preferably 2500 N/ mm2 or more, and preferably 20000 N/mm2 or less , more preferably 15000 N/mm2 or less , and even more preferably 8000 N/mm2 or less. When the 20% K value of the metal-coated particles at 25°C is the above-mentioned lower limit or more, the gap controllability of the connection structure when exposed to a high-temperature environment can be further improved. When the 20% K value of the metal-coated particles at 25°C is the above-mentioned upper limit or less, the metal-coated particles can better follow the connection target members (substrates, etc.), and the gap controllability can be further improved.

 上記金属被覆粒子を25℃で20%圧縮したときの圧縮弾性率の、上記金属被覆粒子を200℃で20%圧縮したときの圧縮弾性率に対する比を、比(金属被覆粒子の25℃での20%K値/金属被覆粒子の200℃での20%K値)とする。上記比(金属被覆粒子の25℃での20%K値/金属被覆粒子の200℃での20%K値)は、好ましくは0.7以上、より好ましくは0.9以上、さらに好ましくは1.0以上であり、好ましくは3.0以下、より好ましくは2.5以下、さらに好ましくは2.0以下である。上記比(金属被覆粒子の25℃での20%K値/金属被覆粒子の200℃での20%K値)が上記下限以上及び上記上限以下であると、高温環境下にさらされたときの接続構造体のギャップ制御性をより一層高めることができる。 The ratio of the compressive modulus when the metal-coated particle is compressed 20% at 25°C to the compressive modulus when the metal-coated particle is compressed 20% at 200°C is defined as the ratio (20% K value of metal-coated particle at 25°C/20% K value of metal-coated particle at 200°C). This ratio (20% K value of metal-coated particle at 25°C/20% K value of metal-coated particle at 200°C) is preferably 0.7 or more, more preferably 0.9 or more, even more preferably 1.0 or more, and is preferably 3.0 or less, more preferably 2.5 or less, and even more preferably 2.0 or less. When the ratio (20% K value of metal-coated particle at 25°C/20% K value of metal-coated particle at 200°C) is equal to or greater than the above lower limit and equal to or less than the above upper limit, the gap controllability of the connection structure when exposed to a high-temperature environment can be further improved.

 上記金属被覆粒子の25℃及び200℃での20%K値は、以下のようにして測定できる。 The 20% K values of the above metal-coated particles at 25°C and 200°C can be measured as follows.

 微小圧縮試験機を用いて、円柱(直径50μm、ダイヤモンド製)の平滑圧子端面で、25℃又は100℃、最大試験荷重90mNを30秒かけて負荷する条件下で金属被覆粒子を圧縮する。このときの荷重値(N)及び圧縮変位(mm)を測定する。得られた測定値から、上記圧縮弾性率を下記式により求めることができる。上記微小圧縮試験機として、例えば、フィッシャー社製「フィッシャースコープH-100」、及びエリオニクス社製「ENT-5」等が用いられる。 Using a micro-compression testing machine, the metal-coated particles are compressed with the smooth end face of a cylindrical indenter (diameter 50 μm, made of diamond) at 25°C or 100°C under conditions where a maximum test load of 90 mN is applied for 30 seconds. The load value (N) and compression displacement (mm) at this time are measured. From the obtained measured values, the compressive modulus can be calculated using the following formula. Examples of micro-compression testing machines that can be used include the Fischerscope H-100 manufactured by Fischer and the ENT-5 manufactured by Elionix.

 20%K値(N/mm)=(3/21/2)・F・S-3/2・R-1/2
 F:金属被覆粒子が20%圧縮変形したときの荷重値(N)
 S:金属被覆粒子が20%圧縮変形したときの圧縮変位(mm)
 R:金属被覆粒子の半径(mm)
20% K value (N/mm 2 ) = (3/2 1/2 )·F·S - 3/2 ·R - 1/2
F: Load value (N) when the metal-coated particle is compressed and deformed by 20%
S: Compression displacement (mm) when the metal-coated particle is compressed and deformed by 20%
R: radius of metal-coated particle (mm)

 本発明の効果をより一層良好にする観点からは、上記金属被覆粒子の25℃での圧縮回復率は、好ましくは20%以上、より好ましくは25%以上、さらに好ましくは30%以上であり、好ましくは95%以下、より好ましくは90%以下、さらに好ましくは85%以下である。 In order to further improve the effects of the present invention, the compression recovery rate of the metal-coated particles at 25°C is preferably 20% or more, more preferably 25% or more, and even more preferably 30% or more, and is preferably 95% or less, more preferably 90% or less, and even more preferably 85% or less.

 上記圧縮回復率は、以下のようにして測定できる。 The compression recovery rate can be measured as follows.

 試料台上に金属被覆粒子を散布する。散布された金属被覆粒子1個について、微小圧縮試験機を用いて、円柱(直径100μm、ダイヤモンド製)の平滑圧子端面で、25℃で、金属被覆粒子の中心方向に、金属被覆粒子が40%圧縮変形するまで負荷(反転荷重値)を与える。その後、原点用荷重値(0.40mN)まで除荷を行う。この間の荷重-圧縮変位を測定し、下記式から圧縮回復率を求めることができる。なお、負荷速度は0.33mN/秒とする。上記微小圧縮試験機として、例えば、フィッシャー社製「フィッシャースコープH-100」、及びエリオニクス社製「ENT-5」等が用いられる。 Metal-coated particles are scattered on a sample stage. Using a micro-compression testing machine, a load (reversed load value) is applied to each scattered metal-coated particle at 25°C with the smooth end face of a cylindrical (diameter 100 μm, made of diamond) in the direction of the center of the metal-coated particle until the metal-coated particle is compressed by 40%. The load is then released to the origin load value (0.40 mN). The load-compression displacement during this period is measured, and the compression recovery rate can be calculated using the formula below. The loading rate is 0.33 mN/sec. Examples of micro-compression testing machines that can be used include the Fischerscope H-100 manufactured by Fischer and the ENT-5 manufactured by Elionix.

 圧縮回復率(%)=(L2/L1)×100
 L1:負荷を与えるときの原点用荷重値から反転荷重値に至るまでの圧縮変位
 L2:負荷を解放するときの反転荷重値から原点用荷重値に至るまでの除荷変位
Compression recovery rate (%) = (L2/L1) x 100
L1: Compression displacement from the load value for origin when applying a load to the reverse load value. L2: Unloading displacement from the reverse load value when releasing the load to the load value for origin.

 上記金属被覆粒子の粒子径は、好ましくは0.5μm以上、より好ましくは1.0μm以上、より一層好ましくは2μm以上、さらに好ましくは5μm以上、特に好ましくは10μm以上、最も好ましくは20μm以上であり、好ましくは300μm以下、より好ましくは100μm以下、さらに好ましくは70μm以下、特に好ましくは50μm以下、最も好ましくは30μm以下である。金属被覆粒子の粒子径が上記下限以上及び上記上限以下であると、金属被覆層を形成する際に凝集した金属被覆粒子が形成されにくくなり、基板(接続対象部材)間の間隔が大きくなりすぎず、かつ金属被覆層が樹脂粒子の表面から剥離し難くなる。 The particle diameter of the metal-coated particles is preferably 0.5 μm or more, more preferably 1.0 μm or more, even more preferably 2 μm or more, even more preferably 5 μm or more, particularly preferably 10 μm or more, and most preferably 20 μm or more, and is preferably 300 μm or less, more preferably 100 μm or less, even more preferably 70 μm or less, particularly preferably 50 μm or less, and most preferably 30 μm or less. If the particle diameter of the metal-coated particles is above the above lower limit or below the above upper limit, agglomerated metal-coated particles are less likely to form when the metal coating layer is formed, the gap between the substrates (connection target components) does not become too large, and the metal coating layer is less likely to peel off from the surface of the resin particles.

 特に金属被覆粒子が用いられた樹脂材料が硬化されたときに、硬化物におけるクラックの発生を抑制することができ、樹脂材料が用いられた接続構造体が高温環境下にさらされたときに、接続構造体におけるギャップ制御性をかなり高めることができるので、上記金属被覆粒子の粒子径は、5μm以上であることが好ましい。これらの効果がより一層効果的に発揮されるので、上記金属被覆粒子の粒子径は、10μm以上であることがより好ましく、20μm以上であることがさらに好ましい。また、上記樹脂材料がはんだペーストである場合に、これらの効果がさらに一層効果的に発揮される。上記金属被覆粒子の粒子径は、5μm以上100μm以下であることが好ましく、10μm以上100μm以下であることがより好ましく、20μm以上100μm以下であることがさらに好ましい。さらに、冷熱サイクル後の接続構造体の導通信頼性をかなり高める観点からは、上記金属被覆粒子の粒子径は、10μm以上であることが好ましい。 The particle diameter of the metal-coated particles is preferably 5 μm or greater, since this can suppress the occurrence of cracks in the cured product, particularly when a resin material using the metal-coated particles is cured, and can significantly improve the gap controllability of the connection structure when the connection structure using the resin material is exposed to a high-temperature environment. These effects are even more effectively achieved, so the particle diameter of the metal-coated particles is more preferably 10 μm or greater, and even more preferably 20 μm or greater. Furthermore, when the resin material is a solder paste, these effects are even more effectively achieved. The particle diameter of the metal-coated particles is preferably 5 μm or greater but 100 μm or less, more preferably 10 μm or greater but 100 μm or less, and even more preferably 20 μm or greater but 100 μm or less. Furthermore, from the perspective of significantly improving the conductivity reliability of the connection structure after thermal cycling, the particle diameter of the metal-coated particles is preferably 10 μm or greater.

 本発明者らは、本発明の効果をより一層効果的に発揮するために、1)樹脂粒子について特定の重合性成分を用いること、2)金属被覆粒子中の樹脂粒子の圧縮弾性率を特定の範囲に制御すること、及び3)金属被覆粒子の粒子径を特定の範囲に制御することが重要であること、すなわちこれらの3つの要件を組み合わせることが重要であることを見出した。 The inventors have discovered that, in order to achieve the effects of the present invention more effectively, it is important to 1) use a specific polymerizable component for the resin particles, 2) control the compressive modulus of the resin particles in the metal-coated particles within a specific range, and 3) control the particle size of the metal-coated particles within a specific range; in other words, it is important to combine these three requirements.

 上記金属被覆粒子の粒子径は、金属被覆粒子が真球状である場合には直径を意味し、金属被覆粒子が真球状以外の形状である場合には、その体積相当の真球と仮定した際の直径を意味する。 The particle size of the above-mentioned metal-coated particles refers to the diameter if the metal-coated particles are spherical, and if the metal-coated particles are in a shape other than spherical, refers to the diameter when assumed to be a perfect sphere with a volume equivalent to that of the particles.

 上記金属被覆粒子の粒子径は、平均粒子径であることが好ましく、数平均粒子径であることがより好ましい。また、上記金属被覆粒子の数平均粒子径の下限及び上限が、上記金属被覆粒子の粒子径の好適な下限及び上限を満たすことで、効果がより一層効果的に発揮される。金属被覆粒子の粒子径は、例えば、任意の金属被覆粒子50個を電子顕微鏡又は光学顕微鏡にて観察し、各金属被覆粒子の粒子径の平均値を算出することや、レーザー回折式粒度分布測定を行うことにより求められる。電子顕微鏡又は光学顕微鏡での観察では、1個当たりの金属被覆粒子の粒子径は、円相当径での粒子径として求められる。電子顕微鏡又は光学顕微鏡での観察において、任意の50個の金属被覆粒子の円相当径での平均粒子径は、球相当径での平均粒子径とほぼ等しくなる。レーザー回折式粒度分布測定では、1個当たりの金属被覆粒子の粒子径は、球相当径での粒子径として求められる。上記金属被覆粒子の粒子径は、レーザー回折式粒度分布測定により算出することが好ましい。 The particle diameter of the metal-coated particles is preferably an average particle diameter, and more preferably a number-average particle diameter. Furthermore, the effect is even more pronounced when the lower and upper limits of the number-average particle diameter of the metal-coated particles satisfy the preferred lower and upper limits of the particle diameter of the metal-coated particles. The particle diameter of the metal-coated particles can be determined, for example, by observing 50 random metal-coated particles with an electron microscope or optical microscope and calculating the average particle diameter of each metal-coated particle, or by performing laser diffraction particle size distribution measurement. When observed with an electron microscope or optical microscope, the particle diameter of each metal-coated particle is determined as the particle diameter in equivalent circle diameter. When observed with an electron microscope or optical microscope, the average particle diameter in equivalent circle diameter of 50 random metal-coated particles is approximately equal to the average particle diameter in equivalent sphere diameter. When observed with a laser diffraction particle size distribution measurement, the particle diameter of each metal-coated particle is determined as the particle diameter in equivalent sphere diameter. The particle diameter of the metal-coated particles is preferably calculated using laser diffraction particle size distribution measurement.

 上記金属被覆層を形成するための金属は、特に限定されない。上記金属としては、金、銀、パラジウム、銅、白金、亜鉛、鉄、錫、鉛、アルミニウム、コバルト、インジウム、ニッケル、クロム、チタン、アンチモン、ビスマス、タリウム、ゲルマニウム、カドミウム、ケイ素、タングステン、モリブデン及びこれらの合金等が挙げられる。また、上記金属としては、錫ドープ酸化インジウム(ITO)及びはんだ等が挙げられる。電極間の接続信頼性をより一層高める観点からは、上記金属は、錫を含む合金、ニッケル、パラジウム、銅又は金であることが好ましく、ニッケル又はパラジウムであることが好ましい。 The metal used to form the metal coating layer is not particularly limited. Examples of the metal include gold, silver, palladium, copper, platinum, zinc, iron, tin, lead, aluminum, cobalt, indium, nickel, chromium, titanium, antimony, bismuth, thallium, germanium, cadmium, silicon, tungsten, molybdenum, and alloys thereof. Other examples of the metal include tin-doped indium oxide (ITO) and solder. From the perspective of further improving the reliability of connections between electrodes, the metal is preferably a tin-containing alloy, nickel, palladium, copper, or gold, and more preferably nickel or palladium.

 金属被覆粒子11のように、上記金属被覆層は、1つの層により形成されていてもよい。上記金属被覆層は、複数の層により形成されていてもよい。すなわち、上記金属被覆層は、2層以上の積層構造を有していてもよい。金属被覆層が複数の層により形成されている場合には、最外層は、金層、ニッケル層、パラジウム層、銅層又は錫と銀とを含む合金層であることが好ましく、金層であることがより好ましい。最外層がこれらの好ましい金属被覆層である場合には、電極間の接続信頼性をより一層高めることができる。また、最外層が金層である場合には、耐腐食性をより一層高めることができる。 Like metal-coated particle 11, the metal coating layer may be formed from a single layer. The metal coating layer may also be formed from multiple layers. That is, the metal coating layer may have a laminated structure of two or more layers. When the metal coating layer is formed from multiple layers, the outermost layer is preferably a gold layer, a nickel layer, a palladium layer, a copper layer, or an alloy layer containing tin and silver, and more preferably a gold layer. When the outermost layer is one of these preferred metal coating layers, the connection reliability between electrodes can be further improved. Furthermore, when the outermost layer is a gold layer, corrosion resistance can be further improved.

 上記樹脂粒子の表面上に金属被覆層を形成する方法は、特に限定されない。上記金属被覆層を形成する方法としては、無電解めっきによる方法、電気めっきによる方法、物理的蒸着による方法、並びに金属粉末もしくは金属粉末とバインダーとを含むペーストを樹脂粒子の表面にコーティングする方法等が挙げられる。金属被覆層をより一層容易に形成する観点からは、上記金属被覆層を形成する方法は、無電解めっきによる方法が好ましい。上記物理的蒸着による方法としては、真空蒸着、イオンプレーティング及びイオンスパッタリング等の方法が挙げられる。 The method for forming the metal coating layer on the surface of the resin particles is not particularly limited. Examples of methods for forming the metal coating layer include electroless plating, electroplating, physical vapor deposition, and coating the surface of the resin particles with a metal powder or a paste containing a metal powder and a binder. From the perspective of forming the metal coating layer more easily, electroless plating is preferred. Examples of physical vapor deposition methods include vacuum deposition, ion plating, and ion sputtering.

 上記金属被覆層の厚みは、好ましくは0.005μm以上、より好ましくは0.01μm以上、より一層好ましくは0.05μm以上、さらに好ましくは0.1μm以上、特に好ましくは0.15μm以上、最も好ましくは0.2μm以上であり、好ましくは10μm以下、より好ましくは1μm以下、さらに好ましくは0.3μm以下である。上記金属被覆層の厚みは、金属被覆層が多層である場合には金属被覆層全体の厚みである。上記金属被覆層の厚みが上記下限以上及び上記上限以下であると、金属被覆粒子が硬くなりすぎずに、基板(接続対象部材)間で金属被覆粒子が十分に変形する。特に、上記金属被覆層の厚みが0.2μm以上である場合に、本発明の効果をより一層効果的に発揮することができ、また冷熱サイクル後の接続構造体の導通信頼性をより一層高めることができる。 The thickness of the metal coating layer is preferably 0.005 μm or more, more preferably 0.01 μm or more, even more preferably 0.05 μm or more, even more preferably 0.1 μm or more, particularly preferably 0.15 μm or more, and most preferably 0.2 μm or more, and is preferably 10 μm or less, more preferably 1 μm or less, and even more preferably 0.3 μm or less. The thickness of the metal coating layer refers to the thickness of the entire metal coating layer if the metal coating layer is multi-layered. When the thickness of the metal coating layer is above the above lower limit and below the above upper limit, the metal-coated particles do not become too hard and can sufficiently deform between substrates (connection target components). In particular, when the thickness of the metal coating layer is 0.2 μm or more, the effects of the present invention can be more effectively exerted, and the conductivity reliability of the connection structure after thermal cycling can be further improved.

 上記金属被覆層が複数の層により形成されている場合に、最外層の金属被覆層の厚みは、好ましくは0.001μm以上、より好ましくは0.01μm以上であり、好ましくは0.5μm以下、より好ましくは0.1μm以下である。上記最外層の金属被覆層の厚みが上記下限以上及び上記上限以下であると、最外層の金属被覆層による被覆が均一になり、耐腐食性が十分に高くなり、かつ電極間の接続信頼性をより一層高めることができる。また、上記最外層が金層である場合に、金層の厚みが薄いほど、コストが低くなる。 When the metal coating layer is formed from multiple layers, the thickness of the outermost metal coating layer is preferably 0.001 μm or more, more preferably 0.01 μm or more, and preferably 0.5 μm or less, more preferably 0.1 μm or less. When the thickness of the outermost metal coating layer is equal to or greater than the above-mentioned lower limit and equal to or less than the above-mentioned upper limit, the coating by the outermost metal coating layer becomes uniform, corrosion resistance becomes sufficiently high, and the connection reliability between electrodes can be further improved. Furthermore, when the outermost layer is a gold layer, the thinner the gold layer, the lower the cost.

 上記金属被覆層の厚みは、例えば透過型電子顕微鏡(TEM)を用いて、金属被覆粒子の断面を観察することにより測定できる。上記金属被覆層の厚みについては、任意の金属被覆層の厚み5箇所の平均値を1個の金属被覆粒子の金属被覆層の厚みとして算出することが好ましく、金属被覆層全体の厚みの平均値を1個の金属被覆粒子の金属被覆層の厚みとして算出することがより好ましい。上記金属被覆層の厚みは、任意の金属被覆粒子50個について、各金属被覆粒子の金属被覆層の厚みの平均値を算出することにより求めることが好ましい。上記金属被覆層の厚みは、平均厚みであることが好ましい。 The thickness of the metal coating layer can be measured by observing the cross section of the metal-coated particle using, for example, a transmission electron microscope (TEM). It is preferable to calculate the thickness of the metal coating layer by averaging the thickness of five arbitrary metal coating layers, and it is more preferable to calculate the average thickness of the entire metal coating layer as the thickness of the metal coating layer of one metal-coated particle. It is preferable to determine the thickness of the metal coating layer by calculating the average thickness of the metal coating layer for 50 arbitrary metal-coated particles. It is preferable that the thickness of the metal coating layer is an average thickness.

 (樹脂材料)
 本発明に係る樹脂材料は、上述した樹脂粒子と、バインダー樹脂とを含む樹脂材料であるか、又は、上記樹脂粒子と上記樹脂粒子の表面上に配置された金属被覆層とを備える金属被覆粒子と、バインダー樹脂とを含む樹脂材料である。本発明に係る樹脂材料では、上記樹脂粒子又は上記金属被覆粒子は、上記バインダー樹脂中に分散されている。本発明に係る樹脂材料では、上記の構成が備えられているので、高温環境下にさらされたときの接続構造体のギャップ制御性を高めることができ、かつ、冷熱サイクル後の接続構造体の導通信頼性を高めることができる。
(Resin material)
The resin material according to the present invention is a resin material containing the resin particles described above and a binder resin, or a resin material containing metal-coated particles having the resin particles and a metal coating layer disposed on the surface of the resin particles, and a binder resin. In the resin material according to the present invention, the resin particles or the metal-coated particles are dispersed in the binder resin. Because the resin material according to the present invention has the above configuration, it is possible to improve the gap controllability of the connection structure when exposed to a high-temperature environment and to improve the conduction reliability of the connection structure after thermal cycling.

 上記樹脂材料は、導電性粒子をさらに含むことが好ましい。上記樹脂材料は、上記金属被覆粒子とは異なる導電性粒子をさらに含むことが好ましい。上記導電性粒子は、上記樹脂粒子とは異なる。上記樹脂材料は、導電性粒子をさらに含む導電材料であることが好ましい。上記樹脂材料は、導電材料であることが好ましい。上記樹脂材料が導電材料である場合に、上記樹脂材料は、電極間の電気的な接続に好適に用いられる。上記樹脂材料は、回路接続材料であることが好ましい。上記樹脂材料が導電性粒子をさらに含む場合に、上記樹脂材料は、導電ペースト及び導電フィルム等として使用され得る。本発明に係る樹脂材料が、導電フィルムである場合には、導電性粒子を含む導電フィルムに、導電性粒子を含まないフィルムが積層されていてもよい。上記導電ペーストは等方性導電ペーストであることが好ましい。上記導電フィルムは等方性導電フィルムであることが好ましい。 The resin material preferably further contains conductive particles. The resin material preferably further contains conductive particles different from the metal-coated particles. The conductive particles are different from the resin particles. The resin material is preferably a conductive material further containing conductive particles. The resin material is preferably a conductive material. When the resin material is a conductive material, the resin material is suitably used for electrical connection between electrodes. The resin material is preferably a circuit connection material. When the resin material further contains conductive particles, the resin material can be used as a conductive paste, a conductive film, etc. When the resin material according to the present invention is a conductive film, a film not containing conductive particles may be laminated on a conductive film containing conductive particles. The conductive paste is preferably an isotropic conductive paste. The conductive film is preferably an isotropic conductive film.

 上記樹脂粒子は、導電性粒子とともに用いられることが好ましく、はんだ粒子とともに用いられることがより好ましい。上記金属被覆粒子は、導電性粒子とともに用いられることが好ましく、はんだ粒子とともに用いられることがより好ましい。上記樹脂材料は、上記樹脂粒子又は上記金属被覆粒子と上記導電性粒子とを含むことが好ましく、上記樹脂粒子又は上記金属被覆粒子と上記はんだ粒子とを含むことがより好ましい。上記金属被覆粒子は、はんだ粒子と異なることが好ましく、はんだを含まないことが好ましい。上記樹脂粒子又は上記金属被覆粒子とは別に、上記導電性粒子(はんだ粒子等)を用いることで、本発明の効果をより一層効果的に発揮することができ、また冷熱サイクル後の接続構造体の導通信頼性をより一層高めることができる。 The resin particles are preferably used together with conductive particles, more preferably together with solder particles. The metal-coated particles are preferably used together with conductive particles, more preferably together with solder particles. The resin material preferably contains the resin particles or the metal-coated particles and the conductive particles, more preferably the resin particles or the metal-coated particles and the solder particles. The metal-coated particles are preferably different from the solder particles and preferably do not contain solder. By using the conductive particles (solder particles, etc.) in addition to the resin particles or the metal-coated particles, the effects of the present invention can be more effectively exerted and the conductivity reliability of the connection structure after thermal cycling can be further improved.

 また、本明細書において、以下の発明も開示する。上記樹脂粒子の、又は、上記樹脂粒子と上記樹脂粒子の表面上に配置された金属被覆粒子の、はんだ粒子とバインダー樹脂とを含むはんだペーストへの使用。 The present specification also discloses the following invention: Use of the above-mentioned resin particles, or the above-mentioned resin particles and metal-coated particles disposed on the surfaces of the above-mentioned resin particles, in a solder paste containing solder particles and a binder resin.

 上記樹脂材料(はんだペースト)100重量%中、上記樹脂粒子又は上記金属被覆粒子の含有量は、好ましくは0.1重量%以上、より好ましくは1重量%以上、さらに好ましくは2重量%以上、特に好ましくは5重量%以上、最も好ましくは10重量%以上であり、好ましくは80重量%以下、より好ましくは60重量%以下、さらに好ましくは50重量%以下である。上記樹脂粒子又は上記金属被覆粒子の含有量が上記下限以上及び上記上限以下であると、本発明の効果をより一層効果的に発揮することができ、また冷熱サイクル後の接続構造体の導通信頼性をより一層高めることができる。 The content of the resin particles or metal-coated particles in 100% by weight of the resin material (solder paste) is preferably 0.1% by weight or more, more preferably 1% by weight or more, even more preferably 2% by weight or more, particularly preferably 5% by weight or more, and most preferably 10% by weight or more, and is preferably 80% by weight or less, more preferably 60% by weight or less, and even more preferably 50% by weight or less. When the content of the resin particles or metal-coated particles is above the above lower limit and below the above upper limit, the effects of the present invention can be more effectively exerted, and the conductivity reliability of the connection structure after thermal cycling can be further improved.

 上記導電性粒子は、はんだ粒子であってもよく、金属粒子であってもよい。上記金属粒子は、金属粉であってもよい。上記導電性粒子は、基材粒子と、上記基材粒子の表面上に配置された導電部とを備えていてもよい。冷熱サイクル後の接続構造体の導通信頼性をより一層高める観点からは、上記導電性粒子は、はんだ粒子であることが好ましい。冷熱サイクル後の接続構造体の導通信頼性をより一層高める観点からは、上記樹脂材料は、はんだ粒子をさらに含むことが好ましい。冷熱サイクル後の接続構造体の導通信頼性をより一層高める観点からは、上記樹脂材料は、はんだ粒子を含むはんだペーストであることが好ましい。上記はんだペーストは、上記樹脂材料中の上述した成分を含む。 The conductive particles may be solder particles or metal particles. The metal particles may be metal powder. The conductive particles may include a base particle and a conductive portion disposed on the surface of the base particle. From the perspective of further improving the conductivity reliability of the connection structure after thermal cycling, the conductive particles are preferably solder particles. From the perspective of further improving the conductivity reliability of the connection structure after thermal cycling, the resin material preferably further contains solder particles. From the perspective of further improving the conductivity reliability of the connection structure after thermal cycling, the resin material is preferably a solder paste containing solder particles. The solder paste contains the above-mentioned components of the resin material.

 上記はんだ粒子は、中心部分及び外表面のいずれもがはんだにより形成されている。上記はんだ粒子は、中心部分及び外表面のいずれもがはんだである粒子である。 The solder particles are formed of solder at both their center and outer surface. The solder particles are particles in which both their center and outer surface are solder.

 上記はんだは、融点が450℃以下である金属(低融点金属)であることが好ましい。上記はんだ粒子は、融点が450℃以下である金属粒子(低融点金属粒子)であることが好ましい。上記低融点金属粒子は、低融点金属を含む粒子である。該低融点金属とは、融点が450℃以下の金属を示す。低融点金属の融点は好ましくは300℃以下、より好ましくは220℃以下、さらに好ましくは190℃以下である。 The solder is preferably a metal (low-melting-point metal) with a melting point of 450°C or less. The solder particles are preferably metal particles (low-melting-point metal particles) with a melting point of 450°C or less. The low-melting-point metal particles are particles containing a low-melting-point metal. The low-melting-point metal refers to a metal with a melting point of 450°C or less. The melting point of the low-melting-point metal is preferably 300°C or less, more preferably 220°C or less, and even more preferably 190°C or less.

 上記はんだ粒子の融点は、好ましくは100℃以上、より好ましくは105℃以上であり、好ましくは250℃以下、より好ましくは245℃以下である。上記はんだ粒子の融点が、上記下限以上及び上記上限以下であると、導電接続時のはんだの凝集性をより一層効果的に高めることができる。上記はんだ粒子の融点が、上記下限以上及び上記上限以下であると、樹脂材料(導電材料)を用いて電極間を電気的に接続した場合に、導通信頼性をより一層効果的に高めることができ、かつ、絶縁信頼性をより一層効果的に高めることができる。上記はんだ粒子の融点の範囲は、上記下限値及び上記上限値を適宜選択して設定することができる。 The melting point of the solder particles is preferably 100°C or higher, more preferably 105°C or higher, and preferably 250°C or lower, more preferably 245°C or lower. When the melting point of the solder particles is above the above lower limit and below the above upper limit, the cohesion of the solder during conductive connection can be more effectively improved. When the melting point of the solder particles is above the above lower limit and below the above upper limit, when electrodes are electrically connected using a resin material (conductive material), the conductivity reliability can be more effectively improved and the insulation reliability can be more effectively improved. The melting point range of the solder particles can be set by appropriately selecting the above lower limit and upper limit.

 上記はんだ粒子の融点は、示差走査熱量測定(DSC)により求めることができる。示差走査熱量測定(DSC)装置としては、SII社製「EXSTAR DSC7020」等が挙げられる。 The melting point of the solder particles can be determined by differential scanning calorimetry (DSC). Examples of differential scanning calorimetry (DSC) devices include the EXSTAR DSC7020 manufactured by SII Corporation.

 また、上記はんだ粒子は、錫を含むことが好ましい。上記はんだ粒子に含まれる金属100重量%中、錫の含有量は、好ましくは30重量%以上、より好ましくは40重量%以上、さらに好ましくは70重量%以上、特に好ましくは90重量%以上である。上記はんだ粒子における錫の含有量が、上記下限以上であると、はんだ部と電極との接続信頼性をより一層効果的に高めることができる。上記はんだ粒子に含まれる金属100重量%中、錫の含有量は、100重量%以下であってもよく、100重量%未満であってもよい。上記はんだ粒子に含まれる金属100重量%中、錫の含有量の範囲は、上記下限値及び上記上限値を適宜選択して設定することができる。 Furthermore, the solder particles preferably contain tin. The tin content of 100% by weight of the metal contained in the solder particles is preferably 30% by weight or more, more preferably 40% by weight or more, even more preferably 70% by weight or more, and particularly preferably 90% by weight or more. When the tin content in the solder particles is equal to or greater than the above lower limit, the connection reliability between the solder portion and the electrode can be more effectively improved. The tin content of 100% by weight of the metal contained in the solder particles may be equal to or less than 100% by weight. The range of the tin content of 100% by weight of the metal contained in the solder particles can be set by appropriately selecting the above lower limit and upper limit.

 なお、上記錫の含有量は、高周波誘導結合プラズマ発光分光分析装置(堀場製作所社製「ICP-AES」)、又は蛍光X線分析装置(島津製作所社製「EDX-800HS」)等を用いて測定することができる。 The tin content can be measured using a high-frequency inductively coupled plasma optical emission spectrometer ("ICP-AES" manufactured by Horiba, Ltd.) or an X-ray fluorescence spectrometer ("EDX-800HS" manufactured by Shimadzu Corporation).

 上記はんだ粒子を用いることで、はんだが溶融して電極に接合し、はんだ部が電極間を導通させる。例えば、はんだ部と電極とが点接触ではなく面接触しやすいため、接続抵抗が低くなる。また、上記はんだ粒子の使用により、はんだ部と電極との接合強度が高くなる結果、はんだ部と電極との剥離がより一層生じ難くなり、導通信頼性及び接続信頼性をより一層効果的に高めることができる。 By using the above solder particles, the solder melts and bonds to the electrodes, and the solder portion provides electrical conductivity between the electrodes. For example, the solder portion and electrode are more likely to make surface contact rather than point contact, which reduces connection resistance. Furthermore, the use of the above solder particles increases the bonding strength between the solder portion and electrode, making it even less likely for the solder portion and electrode to peel off, thereby more effectively improving electrical continuity and connection reliability.

 上記はんだ粒子を構成する低融点金属は、特に限定されない。該低融点金属は、錫、又は錫を含む合金であることが好ましい。該合金は、錫-銀合金、錫-銅合金、錫-銀-銅合金、錫-ビスマス合金、錫-亜鉛合金、及び錫-インジウム合金等が挙げられる。電極に対する濡れ性に優れることから、上記低融点金属は、錫、錫-銀合金、錫-銀-銅合金、錫-ビスマス合金、又は錫-インジウム合金であることが好ましい。上記低融点金属は、錫-ビスマス合金、又は錫-インジウム合金であることがより好ましい。 The low-melting point metal constituting the solder particles is not particularly limited. The low-melting point metal is preferably tin or an alloy containing tin. Examples of such alloys include tin-silver alloys, tin-copper alloys, tin-silver-copper alloys, tin-bismuth alloys, tin-zinc alloys, and tin-indium alloys. Because of their excellent wettability with electrodes, the low-melting point metal is preferably tin, tin-silver alloys, tin-silver-copper alloys, tin-bismuth alloys, or tin-indium alloys. It is more preferable that the low-melting point metal be a tin-bismuth alloy or a tin-indium alloy.

 上記はんだ粒子は、JIS Z3001:溶接用語に基づき、液相線が450℃以下である溶加材であることが好ましい。上記はんだ粒子の組成としては、例えば亜鉛、金、銀、鉛、銅、錫、ビスマス、インジウム等を含む金属組成が挙げられる。上記はんだ粒子は、鉛を含まないことが好ましく、錫とインジウムとを含むか、又は錫とビスマスとを含むことが好ましい。 The solder particles are preferably filler metal with a liquidus temperature of 450°C or less, based on JIS Z3001: Welding Terminology. Examples of the composition of the solder particles include metal compositions containing zinc, gold, silver, lead, copper, tin, bismuth, indium, etc. The solder particles preferably do not contain lead, and preferably contain tin and indium, or tin and bismuth.

 はんだ部と電極との接合強度をより一層効果的に高めるために、上記はんだ粒子は、ニッケル、銅、アンチモン、アルミニウム、亜鉛、鉄、金、チタン、リン、ゲルマニウム、テルル、コバルト、ビスマス、マンガン、クロム、モリブデン、及びパラジウム等の金属を含んでいてもよい。また、はんだ部と電極との接合強度をさらに一層高める観点からは、上記はんだ粒子は、ニッケル、銅、アンチモン、アルミニウム又は亜鉛を含むことが好ましい。はんだ部と電極との接合強度をより一層効果的に高める観点からは、接合強度を高めるためのこれらの金属の含有量は、はんだ粒子に含まれる金属100重量%中、好ましくは0.0001重量%以上であり、好ましくは1重量%以下である。 In order to more effectively increase the bond strength between the solder portion and the electrode, the solder particles may contain metals such as nickel, copper, antimony, aluminum, zinc, iron, gold, titanium, phosphorus, germanium, tellurium, cobalt, bismuth, manganese, chromium, molybdenum, and palladium. Furthermore, from the perspective of even more effectively increasing the bond strength between the solder portion and the electrode, the solder particles preferably contain nickel, copper, antimony, aluminum, or zinc. In order to even more effectively increase the bond strength between the solder portion and the electrode, the content of these metals in the solder particles to increase the bond strength is preferably 0.0001% by weight or more, and preferably 1% by weight or less, based on 100% by weight of the metals contained in the solder particles.

 上記はんだ粒子の平均粒子径は、好ましくは0.01μm以上、より好ましくは0.03μm以上である。上記はんだ粒子の平均粒子径が、上記下限以上であると、電極上にはんだをより一層効率的に配置することができる。上記はんだ粒子の平均粒子径は、10μm以下であってもよく、5μm以下であってもよく、3μm以下であってもよい。上記はんだ粒子の平均粒子径の範囲は、上記下限値及び上記上限値を適宜選択して設定することができる。 The average particle diameter of the solder particles is preferably 0.01 μm or more, more preferably 0.03 μm or more. If the average particle diameter of the solder particles is equal to or greater than the above-mentioned lower limit, the solder can be arranged on the electrode more efficiently. The average particle diameter of the solder particles may be 10 μm or less, 5 μm or less, or 3 μm or less. The range of the average particle diameter of the solder particles can be set by appropriately selecting the above-mentioned lower limit and upper limit.

 上記はんだ粒子の平均粒子径は、数平均粒子径である。上記はんだ粒子の平均粒子径は、例えば、任意のはんだ粒子50個を電子顕微鏡又は光学顕微鏡にて観察し、各はんだ粒子の粒子径の平均値を算出することや、レーザー回折式粒度分布測定を行うことにより求められる。電子顕微鏡又は光学顕微鏡での観察では、1個当たりのはんだ粒子の粒子径は、円相当径での粒子径として求められる。電子顕微鏡又は光学顕微鏡での観察において、任意の50個のはんだ粒子の円相当径での平均粒子径は、球相当径での平均粒子径とほぼ等しくなる。レーザー回折式粒度分布測定では、1個当たりのはんだ粒子の粒子径は、球相当径での粒子径として求められる。上記はんだ粒子の平均粒子径は、レーザー回折式粒度分布測定により算出することが好ましい。 The average particle diameter of the solder particles is the number average particle diameter. The average particle diameter of the solder particles can be determined, for example, by observing 50 random solder particles with an electron microscope or optical microscope and calculating the average particle diameter of each solder particle, or by performing laser diffraction particle size distribution measurement. When observed with an electron microscope or optical microscope, the particle diameter of each solder particle is determined as the particle diameter in equivalent circle diameter. When observed with an electron microscope or optical microscope, the average particle diameter of 50 random solder particles in equivalent circle diameter is approximately equal to the average particle diameter in equivalent sphere diameter. When using laser diffraction particle size distribution measurement, the particle diameter of each solder particle is determined as the particle diameter in equivalent sphere diameter. The average particle diameter of the solder particles is preferably calculated using laser diffraction particle size distribution measurement.

 上記はんだ粒子の粒子径の変動係数(CV値)は、好ましくは40%以下、より好ましくは30%以下である。上記はんだ粒子の粒子径の変動係数が、上記上限以下であると、電極上にはんだをより一層効率的に配置することができる。上記はんだ粒子の粒子径の変動係数(CV値)は、0%以上であってもよく、1%以上であってもよく、5%以上であってもよく、10%以上であってもよい。但し、上記はんだ粒子の粒子径のCV値は、5%未満であってもよい。上記はんだ粒子の粒子径の変動係数の範囲は、上記下限値及び上記上限値を適宜選択して設定することができる。 The coefficient of variation (CV value) of the particle diameter of the solder particles is preferably 40% or less, and more preferably 30% or less. When the coefficient of variation of the particle diameter of the solder particles is equal to or less than the above upper limit, the solder can be arranged on the electrode more efficiently. The coefficient of variation (CV value) of the particle diameter of the solder particles may be 0% or more, 1% or more, 5% or more, or 10% or more. However, the CV value of the particle diameter of the solder particles may be less than 5%. The range of the coefficient of variation of the particle diameter of the solder particles can be set by appropriately selecting the above lower limit and upper limit.

 上記変動係数(CV値)は、以下のようにして測定できる。 The above coefficient of variation (CV value) can be measured as follows:

 CV値(%)=(ρ/Dn)×100
 ρ:はんだ粒子の粒子径の標準偏差
 Dn:はんだ粒子の粒子径の平均値
CV value (%) = (ρ/Dn) × 100
ρ: Standard deviation of solder particle diameter Dn: Average value of solder particle diameter

 上記はんだ粒子の形状は特に限定されない。上記はんだ粒子の形状は、球状であってもよく、扁平状等の球形状以外の形状であってもよい。 The shape of the solder particles is not particularly limited. The solder particles may be spherical, or may be flat or have other shapes than spherical.

 上記樹脂材料(はんだペースト)100重量%中、上記はんだ粒子の含有量は、好ましくは1重量%以上、より好ましくは2重量%以上、さらに好ましくは10重量%以上、特に好ましくは20重量%以上、最も好ましくは30重量%以上であり、好ましくは80重量%以下、より好ましくは60重量%以下、さらに好ましくは50重量%以下である。上記はんだ粒子の含有量が、上記下限以上及び上記上限以下であると、電極上にはんだをより一層効率的に配置することができ、電極間にはんだを多く配置することが容易であり、冷熱サイクル後の接続構造体の導通信頼性をより一層効果的に高めることができる。導通信頼性をより一層効果的に高める観点からは、上記はんだ粒子の含有量は多い方が好ましい。 The content of the solder particles in 100% by weight of the resin material (solder paste) is preferably 1% by weight or more, more preferably 2% by weight or more, even more preferably 10% by weight or more, particularly preferably 20% by weight or more, and most preferably 30% by weight or more, and is preferably 80% by weight or less, more preferably 60% by weight or less, and even more preferably 50% by weight or less. When the content of the solder particles is above the above lower limit and below the above upper limit, solder can be more efficiently arranged on the electrodes, making it easier to arrange a large amount of solder between the electrodes, and the conductivity reliability of the connection structure after thermal cycling can be more effectively improved. From the perspective of more effectively improving conductivity reliability, a higher content of the solder particles is preferable.

 上記バインダー樹脂は、特に限定されない。上記バインダー樹脂として、公知の絶縁性の樹脂が用いられる。上記バインダー樹脂は、熱可塑性成分(熱可塑性化合物)又は硬化性成分を含むことが好ましく、硬化性成分を含むことがより好ましい。上記硬化性成分としては、光硬化性成分及び熱硬化性成分が挙げられる。上記光硬化性成分は、光硬化性化合物及び光重合開始剤を含むことが好ましい。上記熱硬化性成分は、熱硬化性化合物及び熱硬化剤を含むことが好ましい。上記バインダー樹脂としては、例えば、ビニル樹脂、熱可塑性樹脂、硬化性樹脂、熱可塑性ブロック共重合体及びエラストマー等が挙げられる。上記バインダー樹脂は、1種のみが用いられてもよく、2種以上が併用されてもよい。 The binder resin is not particularly limited. Known insulating resins can be used as the binder resin. The binder resin preferably contains a thermoplastic component (thermoplastic compound) or a curable component, and more preferably contains a curable component. Examples of the curable component include a photocurable component and a thermosetting component. The photocurable component preferably contains a photocurable compound and a photopolymerization initiator. The thermosetting component preferably contains a thermosetting compound and a thermosetting agent. Examples of the binder resin include vinyl resins, thermoplastic resins, curable resins, thermoplastic block copolymers, and elastomers. Only one type of binder resin can be used, or two or more types can be used in combination.

 上記ビニル樹脂としては、例えば、酢酸ビニル樹脂、アクリル樹脂及びスチレン樹脂等が挙げられる。上記熱可塑性樹脂としては、例えば、ポリオレフィン樹脂、エチレン-酢酸ビニル共重合体及びポリアミド樹脂等が挙げられる。上記硬化性樹脂としては、例えば、エポキシ樹脂、ウレタン樹脂、ポリイミド樹脂及び不飽和ポリエステル樹脂等が挙げられる。なお、上記硬化性樹脂は、常温硬化型樹脂、熱硬化型樹脂、光硬化型樹脂又は湿気硬化型樹脂であってもよい。上記硬化性樹脂は、硬化剤と併用されてもよい。上記熱可塑性ブロック共重合体としては、例えば、スチレン-ブタジエン-スチレンブロック共重合体、スチレン-イソプレン-スチレンブロック共重合体、スチレン-ブタジエン-スチレンブロック共重合体の水素添加物、及びスチレン-イソプレン-スチレンブロック共重合体の水素添加物等が挙げられる。上記エラストマーとしては、例えば、スチレン-ブタジエン共重合ゴム、及びアクリロニトリル-スチレンブロック共重合ゴム等が挙げられる。 Examples of the vinyl resin include vinyl acetate resin, acrylic resin, and styrene resin. Examples of the thermoplastic resin include polyolefin resin, ethylene-vinyl acetate copolymer, and polyamide resin. Examples of the curable resin include epoxy resin, urethane resin, polyimide resin, and unsaturated polyester resin. The curable resin may be a room temperature curable resin, a thermosetting resin, a photocurable resin, or a moisture curable resin. The curable resin may be used in combination with a curing agent. Examples of the thermoplastic block copolymer include styrene-butadiene-styrene block copolymer, styrene-isoprene-styrene block copolymer, hydrogenated styrene-butadiene-styrene block copolymer, and hydrogenated styrene-isoprene-styrene block copolymer. Examples of the elastomer include styrene-butadiene copolymer rubber and acrylonitrile-styrene block copolymer rubber.

 上記樹脂材料は、上記樹脂粒子又は上記金属被覆粒子、及び上記バインダー樹脂の他に、例えば、充填剤、増量剤、軟化剤、可塑剤、重合触媒、硬化触媒、着色剤、酸化防止剤、熱安定剤、光安定剤、紫外線吸収剤、滑剤、帯電防止剤及び難燃剤等の各種添加剤を含んでいてもよい。 In addition to the resin particles or metal-coated particles and the binder resin, the resin material may also contain various additives such as fillers, extenders, softeners, plasticizers, polymerization catalysts, curing catalysts, colorants, antioxidants, heat stabilizers, light stabilizers, UV absorbers, lubricants, antistatic agents, and flame retardants.

 上記バインダー樹脂中に上記樹脂粒子又は上記金属被覆粒子を分散させる方法は、従来公知の分散方法を用いることができる。上記バインダー樹脂中に上記樹脂粒子又は上記金属被覆粒子を分散させる方法としては、例えば、以下の方法等が挙げられる。上記バインダー樹脂中に上記樹脂粒子又は上記金属被覆粒子を添加した後、プラネタリーミキサー等で混練して分散させる方法。上記樹脂粒子又は上記金属被覆粒子を水又は有機溶剤中にホモジナイザー等を用いて均一に分散させた後、上記バインダー樹脂中に添加し、プラネタリーミキサー等で混練して分散させる方法。上記バインダー樹脂を水又は有機溶剤等で希釈した後、上記樹脂粒子又は上記金属被覆粒子を添加し、プラネタリーミキサー等で混練して分散させる方法。 The resin particles or metal-coated particles can be dispersed in the binder resin by any conventionally known dispersion method. Examples of methods for dispersing the resin particles or metal-coated particles in the binder resin include the following: A method in which the resin particles or metal-coated particles are added to the binder resin and then kneaded and dispersed using a planetary mixer or the like; A method in which the resin particles or metal-coated particles are uniformly dispersed in water or an organic solvent using a homogenizer or the like, then added to the binder resin, and then kneaded and dispersed using a planetary mixer or the like; A method in which the binder resin is diluted with water or an organic solvent, and then the resin particles or metal-coated particles are added, and then kneaded and dispersed using a planetary mixer or the like.

 上記樹脂材料の25℃での粘度(η25)は、好ましくは30Pa・s以上、より好ましくは50Pa・s以上であり、好ましくは400Pa・s以下、より好ましくは300Pa・s以下である。上記樹脂材料の25℃での粘度が上記下限以上及び上記上限以下であると、電極間の接続信頼性をより一層効果的に高めることができる。上記粘度(η25)は、配合成分の種類及び配合量により適宜調整することができる。 The viscosity (η25) of the resin material at 25°C is preferably 30 Pa·s or more, more preferably 50 Pa·s or more, and preferably 400 Pa·s or less, more preferably 300 Pa·s or less. When the viscosity of the resin material at 25°C is above the above lower limit and below the above upper limit, the connection reliability between electrodes can be more effectively improved. The viscosity (η25) can be adjusted appropriately by changing the types and amounts of the blended components.

 上記粘度(η25)は、例えば、E型粘度計を用いて、25℃及び10rpmの条件で測定される。上記E型粘度計としては、東機産業社製「VISCOMETER TV-22」等が挙げられる。 The viscosity (η25) is measured, for example, using an E-type viscometer at 25°C and 10 rpm. Examples of E-type viscometers include the "VISCOMETER TV-22" manufactured by Toki Sangyo Co., Ltd.

 上記樹脂材料100重量%中、上記バインダー樹脂の含有量は、好ましくは10重量%以上、より好ましくは30重量%以上、さらに好ましくは50重量%以上、特に好ましくは70重量%以上であり、好ましくは99.99重量%以下、より一層好ましくは99.9重量%以下、より一層好ましくは99重量%以下、より一層好ましくは98重量%以下、さらに好ましくは90重量%以下、さらに一層好ましくは80重量%以下、特に好ましくは70重量%以下、最も好ましくは65重量%以下である。上記バインダー樹脂の含有量が上記下限以上及び上記上限以下であると、本発明の効果をより一層効果的に発揮することができ、また冷熱サイクル後の接続構造体の導通信頼性をより一層高めることができる。また、上記バインダー樹脂の含有量が上記下限以上及び上記上限以下であると、電極間に導電性粒子又は金属被覆粒子が効率的に配置され、樹脂材料により接続された接続対象部材の接続信頼性がより一層高くなる。 The content of the binder resin, based on 100% by weight of the resin material, is preferably 10% by weight or more, more preferably 30% by weight or more, even more preferably 50% by weight or more, and particularly preferably 70% by weight or more, and is preferably 99.99% by weight or less, even more preferably 99.9% by weight or less, even more preferably 99% by weight or less, even more preferably 98% by weight or less, even more preferably 90% by weight or less, even more preferably 80% by weight or less, particularly preferably 70% by weight or less, and most preferably 65% by weight or less. When the content of the binder resin is above the above lower limit and below the above upper limit, the effects of the present invention can be more effectively exerted, and the conductivity reliability of the connection structure after thermal cycling can be further improved. Furthermore, when the content of the binder resin is above the above lower limit and below the above upper limit, conductive particles or metal-coated particles are efficiently arranged between the electrodes, and the connection reliability of the connection target components connected by the resin material is further improved.

 (接続構造体)
 上述した樹脂粒子を用いて、接続対象部材を接続することにより、接続構造体を得ることができる。
(Connection structure)
A connection structure can be obtained by connecting connection target members using the resin particles described above.

 上記樹脂粒子を用いた上記接続構造体は、第1の接続対象部材と、第2の接続対象部材と、上記第1の接続対象部材と上記第2の接続対象部材とを接続している接続部とを備える。上記接続構造体では、上記接続部が、上記樹脂粒子又は上記金属被覆粒子を含む。上記接続構造体では、上記接続部が、上記樹脂粒子又は上記金属被覆粒子により形成されているか、又は上記樹脂粒子を含む組成物により形成されていることが好ましい。 The connection structure using the resin particles includes a first connection target member, a second connection target member, and a connection portion connecting the first connection target member and the second connection target member. In the connection structure, the connection portion contains the resin particles or the metal-coated particles. In the connection structure, it is preferable that the connection portion is formed from the resin particles or the metal-coated particles, or from a composition containing the resin particles.

 また、上述した樹脂粒子又は金属被覆粒子と、バインダー樹脂と、導電性粒子とを含む導電材料を用いて、接続対象部材を接続することにより、接続構造体を得ることができる。 Furthermore, a connection structure can be obtained by connecting components to be connected using a conductive material containing the above-mentioned resin particles or metal-coated particles, a binder resin, and conductive particles.

 上記接続構造体では、上記の構成が備えられているので、高温環境下にさらされたときの接続構造体のギャップ制御性を高めることができ、かつ、冷熱サイクル後の導通信頼性を高めることができる。 The connection structure has the above configuration, which improves the gap controllability of the connection structure when exposed to a high-temperature environment and also improves the conductivity reliability after thermal cycling.

 上記樹脂粒子又は上記金属被覆粒子を用いた上記接続構造体は、第1の電極を表面に有する第1の接続対象部材と、第2の電極を表面に有する第2の接続対象部材と、上記第1の接続対象部材と上記第2の接続対象部材とを接続している接続部とを備える。上記接続構造体では、上記接続部が、上記樹脂粒子を含む。上記接続構造体では、上記接続部が、上記樹脂粒子又は上記金属被覆粒子と導電性粒子とバインダー樹脂とを含む樹脂材料(導電材料)により形成されていることが好ましい。上記導電性粒子は、はんだ粒子であることが好ましい。上記樹脂材料は、はんだ粒子を含むはんだペーストであることが好ましい。上記接続部が、上記樹脂粒子又は上記金属被覆粒子と導電性粒子とバインダー樹脂とを含む樹脂材料(導電材料)により形成されている場合には、上記接続構造体では、上記第1の電極と上記第2の電極とが上記導電性粒子により電気的に接続されていることが好ましい。上記接続部が、上記樹脂粒子又は上記金属被覆粒子とはんだ粒子とバインダー樹脂とを含む樹脂材料(はんだペースト)により形成されている場合には、上記接続構造体では、上記第1の電極と上記第2の電極とがはんだ部により電気的に接続されていることがより好ましい。 The connection structure using the resin particles or the metal-coated particles comprises a first connection target member having a first electrode on its surface, a second connection target member having a second electrode on its surface, and a connection portion connecting the first connection target member and the second connection target member. In the connection structure, the connection portion contains the resin particles. In the connection structure, the connection portion is preferably formed from a resin material (conductive material) containing the resin particles or the metal-coated particles, conductive particles, and a binder resin. The conductive particles are preferably solder particles. The resin material is preferably a solder paste containing solder particles. When the connection portion is formed from a resin material (conductive material) containing the resin particles or the metal-coated particles, conductive particles, and a binder resin, in the connection structure, it is preferable that the first electrode and the second electrode are electrically connected by the conductive particles. If the connection portion is formed from a resin material (solder paste) containing the resin particles or the metal-coated particles, solder particles, and a binder resin, it is more preferable that the first electrode and the second electrode in the connection structure are electrically connected by a solder portion.

 冷熱サイクル後の導通信頼性をより一層高め、導電材料における各成分の分散性を高める観点からは、上記接続構造体では、上記接続部が、上記金属被覆粒子と導電性粒子とバインダー樹脂とを含む樹脂材料(導電材料)により形成されていることがより好ましい。冷熱サイクル後の導通信頼性をより一層高め、導電材料における各成分の分散性を高める観点からは、上記接続構造体では、上記接続部が、上記金属被覆粒子とはんだ粒子とバインダー樹脂とを含む樹脂材料(はんだペースト)により形成されていることがさらに好ましい。 From the viewpoint of further improving the conductivity reliability after thermal cycling and increasing the dispersibility of each component in the conductive material, it is more preferable that the connection portion of the above-mentioned connection structure be formed from a resin material (conductive material) containing the above-mentioned metal-coated particles, conductive particles, and a binder resin. From the viewpoint of further improving the conductivity reliability after thermal cycling and increasing the dispersibility of each component in the conductive material, it is even more preferable that the connection portion of the above-mentioned connection structure be formed from a resin material (solder paste) containing the above-mentioned metal-coated particles, solder particles, and a binder resin.

 図3は、本発明の第1の実施形態に係る樹脂粒子を用いて得られる接続構造体の一例を示す断面図である。 Figure 3 is a cross-sectional view showing an example of a connection structure obtained using resin particles according to the first embodiment of the present invention.

 図3に示す接続構造体41は、第1の接続対象部材42と、第2の接続対象部材43と、第1の接続対象部材42と第2の接続対象部材43とを接続している接続部44とを備える。接続部44は、樹脂粒子1とはんだ粒子とバインダー樹脂とを含む樹脂材料(はんだペースト)により形成されている。樹脂粒子1は、スペーサとして用いられている。樹脂粒子1により、第1の接続対象部材42と、第2の接続対象部材43との間隔が制御されている。 The connection structure 41 shown in Figure 3 comprises a first member to be connected 42, a second member to be connected 43, and a connection portion 44 connecting the first member to be connected 42 and the second member to be connected 43. The connection portion 44 is formed from a resin material (solder paste) containing resin particles 1, solder particles, and a binder resin. The resin particles 1 are used as spacers. The resin particles 1 control the distance between the first member to be connected 42 and the second member to be connected 43.

 図4は、本発明の第1の実施形態に係る樹脂粒子を用いた金属被覆粒子を用いて得られる接続構造体の一例を示す断面図である。 Figure 4 is a cross-sectional view showing an example of a connection structure obtained using metal-coated particles made from resin particles according to the first embodiment of the present invention.

 図4に示す接続構造体51は、第1の接続対象部材42と、第2の接続対象部材43と、第1の接続対象部材42と第2の接続対象部材43とを接続している接続部44とを備える。接続部44は、金属被覆粒子11とはんだ粒子とバインダー樹脂とを含む樹脂材料(はんだペースト)により形成されている。金属被覆粒子11は、スペーサとして用いられている。金属被覆粒子11により、第1の接続対象部材42と、第2の接続対象部材43との間隔が制御されている。 The connection structure 51 shown in Figure 4 comprises a first member to be connected 42, a second member to be connected 43, and a connection portion 44 connecting the first member to be connected 42 and the second member to be connected 43. The connection portion 44 is formed from a resin material (solder paste) containing metal-coated particles 11, solder particles, and a binder resin. The metal-coated particles 11 are used as spacers. The metal-coated particles 11 control the distance between the first member to be connected 42 and the second member to be connected 43.

 接続構造体41,51では、接続部44は、複数のはんだ粒子が集まり互いに接合したはんだ部3と、バインダー樹脂により形成された樹脂部4とを有する。上記バインダー樹脂が硬化性成分を含む場合に、上記樹脂部は、上記バインダー樹脂の硬化物部であることが好ましい。 In the connection structures 41 and 51, the connection portion 44 includes a solder portion 3 formed by joining together multiple solder particles, and a resin portion 4 formed from a binder resin. If the binder resin contains a curable component, the resin portion is preferably a cured portion of the binder resin.

 第1の接続対象部材42は表面(上面)に、複数の第1の電極42aを有する。第2の接続対象部材43は表面(下面)に、複数の第2の電極43aを有する。第1の電極42aと第2の電極43aとが、はんだ部3により電気的に接続されている。従って、第1の接続対象部材42と第2の接続対象部材43とが、はんだ部3により電気的に接続されている。なお、接続部44において、第1の電極42aと第2の電極43aとの間に集まったはんだ部3とは異なる領域(樹脂部4部分)では、はんだは存在しない。はんだ部3とは異なる領域(樹脂部4部分)では、はんだ部3と離れたはんだは存在しない。なお、少量であれば、第1の電極42aと第2の電極43aとの間に集まったはんだ部3とは異なる領域(樹脂部4部分)に、はんだが存在していてもよい。 The first connection target member 42 has a plurality of first electrodes 42a on its surface (top surface). The second connection target member 43 has a plurality of second electrodes 43a on its surface (bottom surface). The first electrodes 42a and second electrodes 43a are electrically connected by solder portions 3. Therefore, the first connection target member 42 and the second connection target member 43 are electrically connected by solder portions 3. In the connection portion 44, no solder is present in a region (resin portion 4) other than the solder portions 3 gathered between the first electrode 42a and the second electrode 43a. In a region (resin portion 4) other than the solder portions 3, no solder is present apart from the solder portions 3. Note that a small amount of solder may be present in a region (resin portion 4) other than the solder portions 3 gathered between the first electrode 42a and the second electrode 43a.

 図3,4に示すように、接続構造体41,51では、第1の電極42aと第2の電極43aとの間に、複数のはんだ粒子が集まり、複数のはんだ粒子が溶融した後、はんだ粒子の溶融物が電極の表面を濡れ拡がった後に固化して、はんだ部3が形成されている。このため、はんだ部3と第1の電極42a、並びにはんだ部3と第2の電極43aとの接続面積が大きくなる。すなわち、はんだ粒子を用いることにより、導電部の外表面部分がニッケル、金又は銅等の金属である導電性粒子を用いた場合と比較して、はんだ部3と第1の電極42a、並びにはんだ部3と第2の電極43aとの接触面積が大きくなる。このため、接続構造体41,51の冷熱サイクル後の導通信頼性及び接続信頼性が高くなる。 As shown in Figures 3 and 4, in connection structures 41 and 51, multiple solder particles gather between the first electrode 42a and the second electrode 43a. After the multiple solder particles melt, the molten solder particles wet and spread over the surface of the electrodes before solidifying, forming solder portion 3. This increases the connection area between solder portion 3 and the first electrode 42a, and between solder portion 3 and the second electrode 43a. In other words, the use of solder particles increases the contact area between solder portion 3 and the first electrode 42a, and between solder portion 3 and the second electrode 43a, compared to when conductive particles whose outer surface is made of a metal such as nickel, gold, or copper are used. This increases the conductivity and connection reliability of connection structures 41 and 51 after thermal cycling.

 上記接続構造体の製造方法は、特に限定されない。接続構造体の製造方法の一例としては、第1の接続対象部材と第2の接続対象部材との間に上記樹脂材料(導電材料)を配置し、積層体を得た後、該積層体を加熱及び加圧する方法等が挙げられる。上記加圧時の圧力は、好ましくは40MPa以上、より好ましくは60MPa以上であり、好ましくは90MPa以下、より好ましくは70MPa以下である。なお、上記導電材料がはんだ粒子を含むはんだペーストである場合に、接続構造体は、上記積層体を加圧せずに製造されてもよい。上記加熱時の温度は、好ましくは80℃以上、より好ましくは100℃以上であり、好ましくは250℃以下、より好ましくは190℃以下である。 The method for manufacturing the connection structure is not particularly limited. One example of a method for manufacturing a connection structure is to place the resin material (conductive material) between a first member to be connected and a second member to be connected, obtain a laminate, and then heat and pressurize the laminate. The pressure applied during the pressurization is preferably 40 MPa or more, more preferably 60 MPa or more, and preferably 90 MPa or less, more preferably 70 MPa or less. Note that if the conductive material is a solder paste containing solder particles, the connection structure may be manufactured without pressurizing the laminate. The temperature during the heating is preferably 80°C or more, more preferably 100°C or more, and preferably 250°C or less, more preferably 190°C or less.

 上記第1の接続対象部材及び上記第2の接続対象部材は、特に限定されない。上記第1の接続対象部材及び上記第2の接続対象部材としては、具体的には、半導体チップ、半導体パッケージ、LEDチップ、LEDパッケージ、コンデンサ及びダイオード等の電子部品、並びに樹脂フィルム、プリント基板、フレキシブルプリント基板、フレキシブルフラットケーブル、リジッドフレキシブル基板、ガラスエポキシ基板及びガラス基板等の回路基板等の電子部品等が挙げられる。上記第1の接続対象部材及び上記第2の接続対象部材は、電子部品であることが好ましい。 The first and second connection target members are not particularly limited. Specific examples of the first and second connection target members include electronic components such as semiconductor chips, semiconductor packages, LED chips, LED packages, capacitors, and diodes, as well as electronic components such as resin films, printed circuit boards, flexible printed circuit boards, flexible flat cables, rigid-flexible boards, glass epoxy boards, and glass boards. It is preferable that the first and second connection target members are electronic components.

 上記樹脂材料は、電子部品を接続するための導電材料であることが好ましい。上記樹脂材料はペースト状の導電材料であり、ペースト状の状態で接続対象部材上に塗工されることが好ましい。 The resin material is preferably a conductive material for connecting electronic components. The resin material is preferably a conductive paste material, and is preferably applied in paste form onto the components to be connected.

 上記樹脂粒子、上記樹脂材料及び上記回路接続材料は、タッチパネルにも好適に用いられる。従って、上記接続対象部材は、フレキシブル基板であるか、又は樹脂フィルムの表面上に電極が配置された接続対象部材であることも好ましい。上記接続対象部材は、フレキシブル基板であることが好ましく、樹脂フィルムの表面上に電極が配置された接続対象部材であることが好ましい。上記フレキシブル基板がフレキシブルプリント基板等である場合に、フレキシブル基板は一般に電極を表面に有する。 The above-mentioned resin particles, resin material, and circuit connecting material are also suitable for use in touch panels. Therefore, the connection target member is preferably a flexible substrate, or a connection target member in which electrodes are arranged on the surface of a resin film. The connection target member is preferably a flexible substrate, and is preferably a connection target member in which electrodes are arranged on the surface of a resin film. When the flexible substrate is a flexible printed circuit board or the like, the flexible substrate generally has electrodes on its surface.

 上記接続対象部材に設けられている電極としては、金電極、ニッケル電極、錫電極、アルミニウム電極、銅電極、モリブデン電極、銀電極、SUS電極、及びタングステン電極等の金属電極が挙げられる。上記接続対象部材がフレキシブルプリント基板である場合には、上記電極は金電極、ニッケル電極、錫電極、銀電極又は銅電極であることが好ましい。上記接続対象部材がガラス基板である場合には、上記電極はアルミニウム電極、銅電極、モリブデン電極又はタングステン電極であることが好ましい。なお、上記電極がアルミニウム電極である場合には、アルミニウムのみで形成された電極であってもよく、金属酸化物層の表面にアルミニウム層が積層された電極であってもよい。上記金属酸化物層の材料としては、3価の金属元素がドープされた酸化インジウム及び3価の金属元素がドープされた酸化亜鉛等が挙げられる。上記3価の金属元素としては、Sn、Al及びGa等が挙げられる。 The electrodes provided on the connection target members include metal electrodes such as gold electrodes, nickel electrodes, tin electrodes, aluminum electrodes, copper electrodes, molybdenum electrodes, silver electrodes, SUS electrodes, and tungsten electrodes. When the connection target members are flexible printed circuit boards, the electrodes are preferably gold electrodes, nickel electrodes, tin electrodes, silver electrodes, or copper electrodes. When the connection target members are glass substrates, the electrodes are preferably aluminum electrodes, copper electrodes, molybdenum electrodes, or tungsten electrodes. When the electrodes are aluminum electrodes, they may be formed solely from aluminum, or may be electrodes in which an aluminum layer is laminated on the surface of a metal oxide layer. Examples of materials for the metal oxide layer include indium oxide doped with a trivalent metal element and zinc oxide doped with a trivalent metal element. Examples of the trivalent metal elements include Sn, Al, and Ga.

 また、上記樹脂粒子は、液晶表示素子用スペーサとして好適に用いることができる。上記樹脂粒子が液晶表示素子用スペーサとして用いられた場合は、ギャップを効果的に制御し、基板が損傷することを防止することができる。上記第1の接続対象部材は、第1の液晶表示素子用部材であってもよい。上記第2の接続対象部材は、第2の液晶表示素子用部材であってもよい。上記接続部は、上記第1の液晶表示素子用部材と上記第2の液晶表示素子用部材とが対向した状態で、上記第1の液晶表示素子用部材と上記第2の液晶表示素子用部材との外周をシールしているシール部であってもよい。 The resin particles can also be suitably used as spacers for liquid crystal display elements. When the resin particles are used as spacers for liquid crystal display elements, the gap can be effectively controlled, preventing damage to the substrate. The first connection target member may be a first liquid crystal display element member. The second connection target member may be a second liquid crystal display element member. The connection portion may be a sealing portion that seals the outer peripheries of the first liquid crystal display element member and the second liquid crystal display element member when the first liquid crystal display element member and the second liquid crystal display element member are facing each other.

 上記樹脂粒子は、液晶表示素子用周辺シール剤に用いることもできる。液晶表示素子は、第1の液晶表示素子用部材と、第2の液晶表示素子用部材とを備える。液晶表示素子は、上記第1の液晶表示素子用部材と上記第2の液晶表示素子用部材とが対向した状態で、上記第1の液晶表示素子用部材と上記第2の液晶表示素子用部材との外周をシールしているシール部と、上記シール部の内側で、上記第1の液晶表示素子用部材と上記第2の液晶表示素子用部材との間に配置されている液晶とをさらに備える。この液晶表示素子では、液晶滴下工法が適用され、かつ上記シール部が、液晶滴下工法用シール剤を熱硬化させることにより形成されている。 The resin particles can also be used in a peripheral sealant for liquid crystal display elements. The liquid crystal display element comprises a first liquid crystal display element member and a second liquid crystal display element member. The liquid crystal display element further comprises a seal portion sealing the periphery of the first liquid crystal display element member and the second liquid crystal display element member while the first liquid crystal display element member and the second liquid crystal display element member are facing each other, and liquid crystal disposed inside the seal portion between the first liquid crystal display element member and the second liquid crystal display element member. In this liquid crystal display element, the liquid crystal dropping method is applied, and the seal portion is formed by thermally curing a sealant for the liquid crystal dropping method.

 以下、実施例及び比較例を挙げて、本発明を具体的に説明する。本発明は、以下の実施例のみに限定されない。 The present invention will be specifically explained below using examples and comparative examples. The present invention is not limited to the following examples.

 以下の材料を用意した。 The following materials were prepared:

 (重合性成分)
 ジビニルベンゼン(NSスチレンモノマー社製「DVB960」)
 スチレン(NSスチレンモノマー社製「スチレンモノマー」)
 メチルメタクリレート(三菱ケミカル社製「アクリエステルM」、(メタ)アクリロイル基1個)
 エチレングリコールジメタクリレート(三菱ケミカル社製「アクリエステルED」、(メタ)アクリロイル基2個)
 トリメチロールプロパントリメタクリレート(東京化成工業社製、(メタ)アクリロイル基3個)
 ペンタエリスリトールテトラアクリレート(新中村化学工業社製「A-TMMT」、(メタ)アクリロイル基4個)
 ジペンタエリスリトールポリアクリレート(新中村化学工業社製「A-DPH」、(メタ)アクリロイル基5~6個)
(Polymerizable component)
Divinylbenzene (NS Styrene Monomer "DVB960")
Styrene (NS Styrene Monomer "Styrene Monomer")
Methyl methacrylate ("Acryester M" manufactured by Mitsubishi Chemical Corporation, one (meth)acryloyl group)
Ethylene glycol dimethacrylate ("Acryester ED" manufactured by Mitsubishi Chemical Corporation, two (meth)acryloyl groups)
Trimethylolpropane trimethacrylate (Tokyo Chemical Industry Co., Ltd., three (meth)acryloyl groups)
Pentaerythritol tetraacrylate ("A-TMMT" manufactured by Shin-Nakamura Chemical Co., Ltd., four (meth)acryloyl groups)
Dipentaerythritol polyacrylate ("A-DPH" manufactured by Shin-Nakamura Chemical Co., Ltd., 5 to 6 (meth)acryloyl groups)

 (他の成分(溶媒))
 トルエン(富士フイルム和光純薬社製)
(Other components (solvents))
Toluene (Fujifilm Wako Pure Chemical Industries, Ltd.)

 (重合開始剤)
 過酸化ベンゾイル(東京化成工業社製「BPO」)
(Polymerization initiator)
Benzoyl peroxide (Tokyo Chemical Industry Co., Ltd. "BPO")

 (実施例1)
 (1)樹脂粒子の作製
 ジビニルベンゼン80重量部(重合性成分100重量%中、80重量%)に、ペンタエリスリトールテトラアクリレート20重量部(重合性成分100重量%中、20重量%)を加えて撹拌し、モノマー液を得た。次いで、得られたモノマー液に、重合開始剤(過酸化ベンゾイル)1重量部を加えて均一になるまで撹拌して、モノマー混合液を得た。分子量約2000のポリビニルアルコールを純水に溶解させた1.0重量%水溶液200重量部を、反応釜に入れた。この中に、得られたモノマー混合液を入れ、モノマーの液滴が所定の粒子径になるまで、撹拌した。次に、90℃で9時間加熱し、モノマーの液滴の重合反応を行って、粒子を得た。得られた粒子を熱水及びアセトンのそれぞれにて3回洗浄した後、分級操作を行って樹脂粒子を回収した。
Example 1
(1) Preparation of Resin Particles 20 parts by weight of pentaerythritol tetraacrylate (20% by weight of 100% by weight of polymerizable components) was added to 80 parts by weight of divinylbenzene (80% by weight of 100% by weight of polymerizable components) and stirred to obtain a monomer solution. Next, 1 part by weight of a polymerization initiator (benzoyl peroxide) was added to the resulting monomer solution and stirred until homogeneous, obtaining a monomer mixture. 200 parts by weight of a 1.0 wt% aqueous solution of polyvinyl alcohol with a molecular weight of approximately 2000 dissolved in pure water was placed in a reactor. The resulting monomer mixture was then added and stirred until the monomer droplets reached the desired particle size. The mixture was then heated at 90°C for 9 hours to polymerize the monomer droplets, yielding particles. The resulting particles were washed three times with hot water and acetone, and then classified to recover the resin particles.

 (2)金属被覆粒子の作製
 パラジウム触媒液を5重量%含むアルカリ溶液100重量部に、上記樹脂粒子10重量部を、超音波分散器を用いて分散させた後、溶液をろ過することにより、樹脂粒子を取り出した。次いで、樹脂粒子をジメチルアミンボラン1重量%溶液100重量部に添加し、樹脂粒子の表面を活性化させた。表面が活性化された樹脂粒子を十分に水洗した後、蒸留水500重量部に加え、分散させることにより、分散液Aを得た。
(2) Preparation of Metal-Coated Particles 10 parts by weight of the resin particles were dispersed in 100 parts by weight of an alkaline solution containing 5% by weight of a palladium catalyst solution using an ultrasonic disperser, and the solution was filtered to extract the resin particles. The resin particles were then added to 100 parts by weight of a 1% by weight solution of dimethylamine borane to activate the surfaces of the resin particles. The surface-activated resin particles were thoroughly washed with water, and then added to 500 parts by weight of distilled water and dispersed to obtain Dispersion A.

 また、ニッケルめっき液として、硫酸ニッケル0.14mol/L、ジメチルアミンボラン0.46mol/L及びクエン酸ナトリウム0.2mol/Lを含むニッケルめっき液(1)(pH8.5)を用意した。 Furthermore, nickel plating solution (1) (pH 8.5) containing 0.14 mol/L of nickel sulfate, 0.46 mol/L of dimethylamine borane, and 0.2 mol/L of sodium citrate was prepared.

 樹脂粒子10重量部を含む上記分散液Aを70℃にて撹拌しながら、ニッケルめっき液(1)を滴下速度30mL/分の条件で10分間滴下した。続いて、滴下速度10mL/分の条件で40分間滴下し、その後、滴下速度4mL/分の条件で80分間滴下することで、めっき膜中に取り込まれるボロンの含有量を制御しながら、無電解ニッケル-ボロン合金めっきを行った。その後、得られた分散液をろ過することにより、粒子を取り出し、水洗し、乾燥させて、樹脂粒子の表面上に、金属被覆層(ニッケル層)が配置された金属被覆粒子を得た。 While stirring the above dispersion A containing 10 parts by weight of resin particles at 70°C, nickel plating solution (1) was added dropwise at a rate of 30 mL/min for 10 minutes. Next, the solution was added dropwise at a rate of 10 mL/min for 40 minutes, and then at a rate of 4 mL/min for 80 minutes, thereby controlling the amount of boron incorporated into the plating film and performing electroless nickel-boron alloy plating. The resulting dispersion was then filtered to remove the particles, which were then washed with water and dried to obtain metal-coated particles in which a metal coating layer (nickel layer) was disposed on the surface of the resin particles.

 (3)樹脂材料の作製
 以下の材料を混合して、混合物を得た。樹脂粒子20重量部。はんだ粒子(千住金属工業社製「Sn-Bi系はんだ合金」)21重量部。ビスフェノールA型フェノキシ樹脂25重量部。フルオレン型エポキシ樹脂4重量部。フェノールノボラック型エポキシ樹脂30重量部。SI-60L(三新化学工業社製)。得られた混合物を3分間脱泡及び撹拌することで、樹脂粒子を含む樹脂材料(導電ペースト、はんだペースト)Aを得た。また、樹脂粒子を金属被覆粒子に変更したこと以外は、樹脂材料Aと同様にして、金属被覆粒子を含む樹脂材料(導電ペースト、はんだペースト)Bを得た。
(3) Preparation of Resin Material The following materials were mixed to obtain a mixture: 20 parts by weight of resin particles; 21 parts by weight of solder particles ("Sn-Bi solder alloy" manufactured by Senju Metal Industry Co., Ltd.); 25 parts by weight of bisphenol A phenoxy resin; 4 parts by weight of fluorene epoxy resin; 30 parts by weight of phenol novolac epoxy resin; SI-60L (manufactured by Sanshin Chemical Industry Co., Ltd.). The obtained mixture was degassed and stirred for 3 minutes to obtain a resin material A (conductive paste, solder paste) containing resin particles. Furthermore, a resin material B (conductive paste, solder paste) containing metal-coated particles was obtained in the same manner as resin material A, except that the resin particles were changed to metal-coated particles.

 (4)接続構造体の作製
 パッドサイズが0.5mm×0.5mmであるLGA基板と半導体チップを用意した。上記LGA基板上に、得られた樹脂材料(導電ペースト、はんだペースト)A,Bをそれぞれスクリーン印刷し、はんだペースト層を形成した。次に、はんだペースト層上に上記半導体チップを、電極同士が対向するように積層した。その後、160℃でリフローを行い、はんだペースト層を硬化させて、接続構造体A,Bを得た。なお、リフローにおいて、加圧は行わなかった。
(4) Preparation of Connection Structure An LGA substrate and a semiconductor chip with a pad size of 0.5 mm x 0.5 mm were prepared. The obtained resin materials (conductive paste, solder paste) A and B were screen-printed on the LGA substrate to form a solder paste layer. Next, the semiconductor chip was stacked on the solder paste layer with the electrodes facing each other. After that, reflow was performed at 160°C to harden the solder paste layer, obtaining connection structures A and B. Note that no pressure was applied during reflow.

 (実施例2~12,14及び比較例2~4)
 重合性成分の種類及び含有量(重量%)、樹脂粒子の平均粒子径及び粒子径のCV値、並びに金属被覆層の種類及び厚みを表1~4に示すように設定したこと以外は、実施例1と同様にして、樹脂粒子、金属被覆粒子、樹脂材料A,B及び接続構造体A,Bを作製した。なお、樹脂粒子の平均粒子径及び粒子径のCV値に関しては、分級によって調整した。
(Examples 2 to 12, 14 and Comparative Examples 2 to 4)
Resin particles, metal-coated particles, resin materials A and B, and connection structures A and B were produced in the same manner as in Example 1, except that the type and content (wt%) of the polymerizable component, the average particle size and CV value of the particle size of the resin particles, and the type and thickness of the metal coating layer were set as shown in Tables 1 to 4. The average particle size and CV value of the particle size of the resin particles were adjusted by classification.

 (実施例13)
 (1)樹脂粒子の作製
 重合性成分の種類及び含有量(重量%)を表3に示すように変更したこと以外は、実施例1と同様にして、樹脂粒子を作製した。
Example 13
(1) Preparation of Resin Particles Resin particles were prepared in the same manner as in Example 1, except that the type and content (wt %) of the polymerizable component were changed as shown in Table 3.

 (2)金属被覆粒子の作製
 第1の金属被覆層の形成:
 樹脂粒子の表面上に、第1の金属被覆層(ニッケル層、厚み100nm)が配置された粒子Aを得た。
(2) Preparation of Metal-Coated Particles Formation of First Metal-Coated Layer:
Particles A were obtained in which a first metal coating layer (nickel layer, thickness 100 nm) was disposed on the surface of a resin particle.

 第2の金属被覆層の形成:
 得られた粒子A10重量部を、超音波処理機により、イオン交換水500重量部に分散させて、懸濁液Bを得た。硫酸錫15g/L、エチレンジアミン四酢酸70g/L、グルコン酸ナトリウム30g/L、及びホスフィン酸1.5g/Lを含む錫めっき液(1)(水酸化ナトリウムにてpH8.5に調整)を用意した。また、水素化ホウ素ナトリウム5g/Lを含む還元液A(水酸化ナトリウムにてpH10.0に調整)を用意した。
Formation of the second metallization layer:
Ten parts by weight of the resulting particles A were dispersed in 500 parts by weight of ion-exchanged water using an ultrasonicator to obtain suspension B. A tin plating solution (1) containing 15 g/L of tin sulfate, 70 g/L of ethylenediaminetetraacetic acid, 30 g/L of sodium gluconate, and 1.5 g/L of phosphinic acid (adjusted to pH 8.5 with sodium hydroxide) was prepared. Furthermore, a reducing solution A containing 5 g/L of sodium borohydride (adjusted to pH 10.0 with sodium hydroxide) was prepared.

 得られた懸濁液Bを55℃で撹拌しながら、上記錫めっき液(1)を懸濁液Bに徐々に添加した後、還元液Aにより還元させることで無電解錫めっきを行い、第2の金属被覆層を形成した。上記第1の金属被覆層の表面上に第2の金属被覆層(錫層、厚み100nm)が配置された金属被覆粒子を得た。得られた金属被覆粒子を用いたこと以外は、実施例1と同様にして、樹脂材料A,B及び接続構造体A,Bを作製した。 The tin plating solution (1) was gradually added to the resulting suspension B while stirring at 55°C, and then electroless tin plating was performed by reducing it with reducing solution A to form a second metal coating layer. Metal-coated particles were obtained in which a second metal coating layer (tin layer, 100 nm thick) was disposed on the surface of the first metal coating layer. Resin materials A and B and connection structures A and B were produced in the same manner as in Example 1, except that the resulting metal-coated particles were used.

 (比較例1)
 ジビニルベンゼン44.95重量部(重合性成分100重量%中、50重量%)に、ペンタエリスリトールテトラアクリレート44.95重量部(重合性成分100重量%中、50重量%)を加えて撹拌し、モノマー液を得た。次いで、得られたモノマー液に、溶媒(トルエン)10.1重量部を加えて均一になるまで撹拌して、モノマー混合液を得た。分子量約2000のポリビニルアルコールが純水に溶解された1.0重量%水溶液200重量部を、反応釜に入れた。この中に、得られたモノマー混合液を入れ、モノマーの液滴が所定の粒子径になるまで、撹拌した。次に、90℃で9時間加熱し、モノマーの液滴の重合反応を行って、多孔質の樹脂粒子を得た。得られた樹脂粒子を用いたこと以外は、実施例1と同様にして、金属被覆粒子、樹脂材料A,B及び接続構造体A,Bを作製した。
(Comparative Example 1)
44.95 parts by weight of pentaerythritol tetraacrylate (50% by weight of 100% by weight of the polymerizable component) was added to 44.95 parts by weight of divinylbenzene (50% by weight of 100% by weight of the polymerizable component) and stirred to obtain a monomer liquid. Next, 10.1 parts by weight of a solvent (toluene) was added to the obtained monomer liquid and stirred until homogeneous, obtaining a monomer mixture. 200 parts by weight of a 1.0 wt% aqueous solution of polyvinyl alcohol with a molecular weight of approximately 2000 dissolved in pure water was placed in a reaction vessel. The obtained monomer mixture was added thereto and stirred until the monomer droplets reached the specified particle size. Next, the mixture was heated at 90°C for 9 hours to polymerize the monomer droplets, obtaining porous resin particles. Metal-coated particles, resin materials A and B, and connection structures A and B were prepared in the same manner as in Example 1, except that the obtained resin particles were used.

 (評価)
 (1)重合性成分の混合物の粘度
 重合性成分の混合物(重合前)の粘度を、E型粘度計(東機産業社製「VISCOMETER TV-22」)を用いて、25℃及び5rpmの条件で測定した。
(evaluation)
(1) Viscosity of Polymerizable Component Mixture The viscosity of the polymerizable component mixture (before polymerization) was measured using an E-type viscometer ("VISCOMETER TV-22" manufactured by Toki Sangyo Co., Ltd.) at 25°C and 5 rpm.

 (2)樹脂粒子の25℃及び200℃での20%K値
 得られた樹脂粒子の25℃及び200℃での20%K値を、上述した方法により、微小圧縮試験機(エリオニクス社製「ENT-5」)を用いて測定した。また、比(25℃での20%K値/200℃での20%K値)を計算した。
(2) 20% K Values of Resin Particles at 25°C and 200°C The 20% K values of the obtained resin particles at 25°C and 200°C were measured using a microcompression tester ("ENT-5" manufactured by Elionix Co., Ltd.) by the method described above. The ratio (20% K value at 25°C/20% K value at 200°C) was also calculated.

 (3)樹脂粒子を250℃で10分加熱したときのアウトガス量
 得られた樹脂粒子について、上述した方法で、樹脂粒子を250℃で10分加熱したときのアウトガス量を測定した。
(3) Amount of Outgassed Resin Particles When Heated at 250° C. for 10 Minutes The amount of outgassed resin particles when heated at 250° C. for 10 minutes was measured for the obtained resin particles by the method described above.

 (4)ギャップ制御性(樹脂粒子)
 樹脂粒子を用いて得られた接続構造体Aについて、オーブン内で250℃まで加熱し、温度を保持したまま1時間放置した。走査型電子顕微鏡(SEM)で観察し、接続部(導電ペースト層の硬化物)の最小厚み及び最大厚みを測定した。ギャップ制御性(樹脂粒子)を、以下の基準で判定した。
(4) Gap controllability (resin particles)
The connection structure A obtained using the resin particles was heated to 250°C in an oven and left at that temperature for 1 hour. The connection structure A was observed with a scanning electron microscope (SEM) to measure the minimum and maximum thicknesses of the connection portion (cured conductive paste layer). The gap controllability (resin particles) was evaluated according to the following criteria.

 [ギャップ制御性(樹脂粒子)の判定基準]
 ○○○:最大厚みが最小厚みの1.1倍未満
 ○○:最大厚みが最小厚みの1.1倍以上1.3倍未満
 ○:最大厚みが最小厚みの1.3倍以上1.5倍未満
 ×:最大厚みが最小厚みの1.5倍以上
[Gap controllability (resin particles) evaluation criteria]
○○○: The maximum thickness is less than 1.1 times the minimum thickness. ○○: The maximum thickness is 1.1 times or more and less than 1.3 times the minimum thickness. ○: The maximum thickness is 1.3 times or more and less than 1.5 times the minimum thickness. ×: The maximum thickness is 1.5 times or more the minimum thickness.

 (5)ギャップ制御性(金属被覆粒子)
 金属被覆粒子を用いて得られた接続構造体Bについて、オーブン内で250℃まで加熱し、温度を保持したまま1時間放置した。走査型電子顕微鏡(SEM)で観察し、接続部(導電ペースト層の硬化物)の最小厚み及び最大厚みを測定した。ギャップ制御性(金属被覆粒子)を、以下の基準で判定した。
(5) Gap controllability (metal-coated particles)
Connection structure B obtained using metal-coated particles was heated to 250°C in an oven and left at that temperature for 1 hour. The connection structure B was observed with a scanning electron microscope (SEM) to measure the minimum and maximum thicknesses of the connection (cured conductive paste layer). The gap controllability (metal-coated particles) was evaluated according to the following criteria.

 [ギャップ制御性(金属被覆粒子)の判定基準]
 ○○○:最大厚みが最小厚みの1.1倍未満
 ○○:最大厚みが最小厚みの1.1倍以上1.3倍未満
 ○:最大厚みが最小厚みの1.3倍以上1.5倍未満
 ×:最大厚みが最小厚みの1.5倍以上
[Gap controllability (metal-coated particles) evaluation criteria]
○○○: The maximum thickness is less than 1.1 times the minimum thickness. ○○: The maximum thickness is 1.1 times or more and less than 1.3 times the minimum thickness. ○: The maximum thickness is 1.3 times or more and less than 1.5 times the minimum thickness. ×: The maximum thickness is 1.5 times or more the minimum thickness.

 (6)冷熱サイクル後の導通信頼性(樹脂粒子)
 樹脂粒子を用いて得られた接続構造体Aについて、-20℃から100℃に加熱し、-20℃に冷却する過程を1サイクルとして、1000サイクル繰り返す冷熱サイクル試験を実施した。冷熱サイクル後の接続構造体Aについて、上下の電極間の1接続箇所当たりの接続抵抗Aを、4端子法により測定した。なお、電圧=電流×抵抗の関係から、一定の電流を流した時の電圧を測定することにより接続抵抗を求めることができる。冷熱サイクル後の導通信頼性(樹脂粒子)を、下記の基準で判定した。
(6) Conduction reliability after thermal cycling (resin particles)
A thermal cycling test was carried out on connection structure A obtained using resin particles, in which 1000 cycles were repeated, with one cycle consisting of heating from -20°C to 100°C and cooling to -20°C. For connection structure A after the thermal cycling, the connection resistance A per connection point between the upper and lower electrodes was measured using a four-terminal method. Note that, based on the relationship voltage = current × resistance, the connection resistance can be determined by measuring the voltage when a constant current is passed. The conductivity reliability (resin particles) after the thermal cycling was evaluated according to the following criteria.

 [冷熱サイクル後の導通信頼性(樹脂粒子)の判定基準]
 ○○○:接続抵抗Aが5mΩ以下
 ○○:接続抵抗Aが5mΩを超え、7mΩ以下
 ○:接続抵抗Aが7mΩを超え、10mΩ以下
 ×:接続抵抗Aが10mΩを超える、又は接続不良が生じている
[Criteria for Conduction Reliability (Resin Particles) after Thermal Cycles]
○○○: Connection resistance A is 5 mΩ or less. ○○: Connection resistance A is greater than 5 mΩ and less than 7 mΩ. ○: Connection resistance A is greater than 7 mΩ and less than 10 mΩ. ×: Connection resistance A exceeds 10 mΩ, or a connection failure has occurred.

 (7)冷熱サイクル後の導通信頼性(金属被覆粒子)
 金属被覆粒子を用いて得られた接続構造体Bについて、-20℃から100℃に加熱し、-20℃に冷却する過程を1サイクルとして、1000サイクル繰り返す冷熱サイクル試験を実施した。冷熱サイクル後の接続構造体Bについて、上下の電極間の1接続箇所当たりの接続抵抗Bを、4端子法により測定した。なお、電圧=電流×抵抗の関係から、一定の電流を流した時の電圧を測定することにより接続抵抗を求めることができる。冷熱サイクル後の導通信頼性(金属被覆粒子)を、下記の基準で判定した。
(7) Conduction reliability after thermal cycling (metal-coated particles)
A thermal cycling test was carried out on connection structure B obtained using metal-coated particles, in which 1,000 cycles were repeated, with one cycle consisting of heating from -20°C to 100°C and cooling to -20°C. For connection structure B after the thermal cycling, the connection resistance B per connection point between the upper and lower electrodes was measured using a four-terminal method. Note that, based on the relationship voltage = current × resistance, the connection resistance can be determined by measuring the voltage when a constant current is passed. The conductivity reliability (metal-coated particles) after the thermal cycling was evaluated according to the following criteria.

 [冷熱サイクル後の導通信頼性(金属被覆粒子)の判定基準]
 ○○○:接続抵抗Bが5mΩ以下
 ○○:接続抵抗Bが5mΩを超え、7mΩ以下
 ○:接続抵抗Bが7mΩを超え、10mΩ以下
 ×:接続抵抗Bが10mΩを超える、又は接続不良が生じている
[Criteria for Conduction Reliability (Metal-Coated Particles) after Thermal Cycles]
○○○: Connection resistance B is 5 mΩ or less ○○: Connection resistance B is more than 5 mΩ and less than 7 mΩ ○: Connection resistance B is more than 7 mΩ and less than 10 mΩ ×: Connection resistance B is more than 10 mΩ, or a connection failure has occurred

 樹脂粒子及び金属被覆粒子の構成及び結果を、以下の表1~4に示す。 The composition and results of the resin particles and metal-coated particles are shown in Tables 1 to 4 below.

 また、樹脂粒子の粒子径のみを変えた実施例6(粒子径1μm)、実施例7(粒子径5μm)、実施例8(粒子径10μm),実施例3(粒子径30μm)、及び実施例9(粒子径50μm)を以下の表5に示す。 In addition, Table 5 below shows the results of Examples 6 (particle diameter 1 μm), 7 (particle diameter 5 μm), 8 (particle diameter 10 μm), 3 (particle diameter 30 μm), and 9 (particle diameter 50 μm), in which only the particle diameter of the resin particles was changed.

 上記表5に示す結果から、1)特定の重合性成分が用いられ、かつ2)樹脂粒子の圧縮弾性率が特定の範囲にあることに加えて、3A)上記樹脂粒子の粒子径が5μm以上あれば、上記樹脂粒子の粒子径が5μm未満である場合と比べて、高温環境下にさらされたときの接続構造体のギャップ制御性をより一層高めることができることがわかる。さらに、1)特定の重合性成分が用いられ、かつ2)樹脂粒子の圧縮弾性率が特定の範囲にあることに加えて、3B)上記樹脂粒子の粒子径が20μm以上であれば、上記樹脂粒子の粒子径が20μm未満である場合と比べて、高温環境下にさらされたときの接続構造体のギャップ制御性をさらに一層高めることができることがわかる。 The results shown in Table 5 above show that when 1) a specific polymerizable component is used, and 2) the compressive modulus of the resin particles is within a specific range, and 3A) the particle diameter of the resin particles is 5 μm or more, the gap controllability of the connection structure when exposed to a high-temperature environment can be further improved compared to when the particle diameter of the resin particles is less than 5 μm. Furthermore, when 1) a specific polymerizable component is used, and 2) the compressive modulus of the resin particles is within a specific range, and 3B) the particle diameter of the resin particles is 20 μm or more, the gap controllability of the connection structure when exposed to a high-temperature environment can be further improved compared to when the particle diameter of the resin particles is less than 20 μm.

 なお、実施例7(粒子径5μm)と実施例8(粒子径10μm)とのギャップ制御性(樹脂粒子)の結果はいずれも「〇〇」であるが、ギャップ制御性(樹脂粒子)の評価における最大厚み/最小厚みの値は、実施例8が実施例7よりも小さく、実施例8は実施例7よりものギャップ制御性(樹脂粒子)に優れていた。また、実施例7(粒子径5μm)と実施例8(粒子径10μm)とのギャップ制御性(金属被覆粒子)の結果はいずれも「〇〇」であるが、ギャップ制御性(金属被覆粒子)の評価における最大厚み/最小厚みの値は、実施例8が実施例7よりも小さく、実施例8は実施例7よりものギャップ制御性(金属被覆粒子)に優れていた。 The gap controllability (resin particles) results for Example 7 (particle diameter 5 μm) and Example 8 (particle diameter 10 μm) were both marked "〇〇", but the maximum thickness/minimum thickness values in the gap controllability (resin particles) evaluation were smaller for Example 8 than for Example 7, meaning that Example 8 had better gap controllability (resin particles) than Example 7. The gap controllability (metal-coated particles) results for Example 7 (particle diameter 5 μm) and Example 8 (particle diameter 10 μm) were both marked "〇〇", but the maximum thickness/minimum thickness values in the gap controllability (metal-coated particles) evaluation were smaller for Example 8 than for Example 7, meaning that Example 8 had better gap controllability (metal-coated particles) than Example 7.

 さらに、上記表5に示す結果から、1)特定の重合性成分が用いられ、かつ2)樹脂粒子の圧縮弾性率が特定の範囲にあることに加えて、3C)上記樹脂粒子の粒子径が10μm以上あれば、上記樹脂粒子の粒子径が10μm未満である場合と比べて、冷熱サイクル後の接続構造体の導通信頼性をかなり高めることができることがわかる。 Furthermore, the results shown in Table 5 above show that when 1) a specific polymerizable component is used, and 2) the compressive modulus of the resin particles is within a specific range, and 3C) the particle diameter of the resin particles is 10 μm or greater, the conductivity reliability of the connection structure after thermal cycling can be significantly improved compared to when the particle diameter of the resin particles is less than 10 μm.

 1…樹脂粒子
 2…金属被覆層
 3…はんだ部
 4…樹脂部
 11…金属被覆粒子
 41,51…接続構造体
 42…第1の接続対象部材
 42a…第1の電極
 43…第2の接続対象部材
 43a…第2の電極
 44…接続部
REFERENCE SIGNS LIST 1 resin particle 2 metal coating layer 3 solder portion 4 resin portion 11 metal coating particle 41, 51 connection structure 42 first connection target member 42a first electrode 43 second connection target member 43a second electrode 44 connection portion

Claims (15)

 重合性成分の重合体を含む樹脂粒子であり、
 前記重合性成分が、ジビニルベンゼンと、(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物とを含み、
 前記樹脂粒子を200℃で20%圧縮したときの圧縮弾性率が、1000N/mm以上である、樹脂粒子。
Resin particles containing a polymer of a polymerizable component,
the polymerizable component contains divinylbenzene and a (meth)acrylate compound having four or more (meth)acryloyl groups,
The resin particles have a compressive modulus of 1000 N/mm 2 or more when compressed by 20% at 200°C.
 前記重合性成分100重量%中、前記ジビニルベンゼンと前記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物との合計の含有量が、80重量%以上である、請求項1に記載の樹脂粒子。 Resin particles according to claim 1, wherein the total content of the divinylbenzene and the (meth)acrylate compound having four or more (meth)acryloyl groups is 80% by weight or more, based on 100% by weight of the polymerizable component.  前記重合性成分中の前記ジビニルベンゼンの含有量の、前記重合性成分中の前記(メタ)アクリロイル基を4個以上有する(メタ)アクリレート化合物の含有量に対する重量比が、0.40以上1.70以下である、請求項1又は2に記載の樹脂粒子。 Resin particles according to claim 1 or 2, wherein the weight ratio of the content of the divinylbenzene in the polymerizable component to the content of the (meth)acrylate compound having four or more (meth)acryloyl groups in the polymerizable component is 0.40 or more and 1.70 or less.  前記樹脂粒子を250℃で10分加熱したときのアウトガス量が、1000ppm以下である、請求項1~3のいずれか1項に記載の樹脂粒子。 Resin particles according to any one of claims 1 to 3, wherein the amount of outgassing when the resin particles are heated at 250°C for 10 minutes is 1000 ppm or less.  前記樹脂粒子の粒子径が、1μm以上100μm以下である、請求項1~4のいずれか1項に記載の樹脂粒子。 Resin particles according to any one of claims 1 to 4, wherein the particle diameter of the resin particles is 1 μm or more and 100 μm or less.  前記樹脂粒子は、表面上に金属被覆層が形成されることで、前記金属被覆層を備える金属被覆粒子を得るために用いられるか、又は、前記樹脂粒子は、5μm以上100μm以下の粒子径を有する、請求項1~5のいずれか1項に記載の樹脂粒子。 Resin particles according to any one of claims 1 to 5, wherein the resin particles are used to obtain metal-coated particles having a metal coating layer formed on the surface thereof, or the resin particles have a particle diameter of 5 μm or more and 100 μm or less.  前記樹脂粒子は、表面上に金属被覆層が形成されることで、前記金属被覆層を備える金属被覆粒子を得るために用いられるか、又は、前記樹脂粒子は、20μm以上100μm以下の粒子径を有する、請求項6に記載の樹脂粒子。 The resin particles described in claim 6 are used to obtain metal-coated particles having a metal coating layer formed on the surface of the resin particles, or the resin particles have a particle diameter of 20 μm or more and 100 μm or less.  前記樹脂粒子は、表面上に金属被覆層が形成されることで、前記金属被覆層を備える金属被覆粒子を得るために用いられる、請求項1~5のいずれか1項に記載の樹脂粒子。 The resin particles described in any one of claims 1 to 5 are used to obtain metal-coated particles having a metal coating layer formed on the surface of the resin particles.  前記樹脂粒子の粒子径が5μm以上100μm以下である、請求項5に記載の樹脂粒子。 The resin particles described in claim 5, wherein the particle diameter of the resin particles is 5 μm or more and 100 μm or less. 前記樹脂粒子の粒子径が20μm以上100μm以下である、請求項9に記載の樹脂粒子。 Resin particles according to claim 9, wherein the particle diameter of the resin particles is 20 μm or more and 100 μm or less.  請求項1~10のいずれか1項に記載の樹脂粒子と、前記樹脂粒子の表面上に配置された金属被覆層とを備える、金属被覆粒子。 Metal-coated particles comprising the resin particles described in any one of claims 1 to 10 and a metal coating layer disposed on the surface of the resin particles.  前記金属被覆層の厚みが、0.2μm以上である、請求項11に記載の金属被覆粒子。 The metal-coated particle described in claim 11, wherein the thickness of the metal coating layer is 0.2 μm or more.  請求項1~10のいずれか1項に記載の樹脂粒子と、バインダー樹脂とを含む樹脂材料であるか、又は、前記樹脂粒子と前記樹脂粒子の表面上に配置された金属被覆層とを備える金属被覆粒子と、バインダー樹脂とを含む樹脂材料であり、
 前記樹脂粒子又は前記金属被覆粒子が前記バインダー樹脂中に分散されている、樹脂材料。
A resin material comprising the resin particles according to any one of claims 1 to 10 and a binder resin, or a resin material comprising the resin particles, metal-coated particles having a metal coating layer disposed on the surface of the resin particles, and a binder resin,
The resin material comprises the resin particles or the metal-coated particles dispersed in the binder resin.
 前記樹脂材料が、はんだ粒子を含むはんだペーストである、請求項13に記載の樹脂材料。 The resin material according to claim 13, wherein the resin material is a solder paste containing solder particles.  請求項1~10のいずれか1項に記載の樹脂粒子の、又は、前記樹脂粒子と前記樹脂粒子の表面上に配置された金属被覆粒子の、
はんだ粒子とバインダー樹脂とを含むはんだペーストへの使用。
The resin particles according to any one of claims 1 to 10, or the resin particles and metal-coated particles arranged on the surfaces of the resin particles,
Use in a solder paste containing solder particles and a binder resin.
PCT/JP2025/015697 2024-04-23 2025-04-23 Resin particles, metal-coated particles, and resin material Pending WO2025225643A1 (en)

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JP2014096362A (en) * 2012-10-09 2014-05-22 Sekisui Chem Co Ltd Conductive fine particle, anisotropic conductive material and conductive connection structure
JP2015079717A (en) * 2013-10-18 2015-04-23 日立化成株式会社 Film-state circuit connection material and connection structure using the same
JP2016031936A (en) * 2014-07-25 2016-03-07 積水化学工業株式会社 Conductive fine particle, anisotropy conductive material, and conductive connection structure
WO2022239776A1 (en) * 2021-05-12 2022-11-17 積水化学工業株式会社 Conductive particles, conductive material, and connection structure

Patent Citations (5)

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Publication number Priority date Publication date Assignee Title
US20070295943A1 (en) * 2005-02-22 2007-12-27 Cheil Industries Inc. Polymer Particles and Conductive Particles Having Enhanced Conducting Properties, and Anisotropic Conductive Packaging Materials Containing the Same
JP2014096362A (en) * 2012-10-09 2014-05-22 Sekisui Chem Co Ltd Conductive fine particle, anisotropic conductive material and conductive connection structure
JP2015079717A (en) * 2013-10-18 2015-04-23 日立化成株式会社 Film-state circuit connection material and connection structure using the same
JP2016031936A (en) * 2014-07-25 2016-03-07 積水化学工業株式会社 Conductive fine particle, anisotropy conductive material, and conductive connection structure
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