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WO2025222865A1 - Capteur d'écoulement de micro-tube et procédé de mesure de micro-écoulement - Google Patents

Capteur d'écoulement de micro-tube et procédé de mesure de micro-écoulement

Info

Publication number
WO2025222865A1
WO2025222865A1 PCT/CN2024/137820 CN2024137820W WO2025222865A1 WO 2025222865 A1 WO2025222865 A1 WO 2025222865A1 CN 2024137820 W CN2024137820 W CN 2024137820W WO 2025222865 A1 WO2025222865 A1 WO 2025222865A1
Authority
WO
WIPO (PCT)
Prior art keywords
cantilever beam
microfluidic channel
sets
resistive
flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/CN2024/137820
Other languages
English (en)
Chinese (zh)
Inventor
张宾
陈新准
程元红
朱瑞
陈善任
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangzhou Aosong Electronics Co Ltd
Original Assignee
Guangzhou Aosong Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangzhou Aosong Electronics Co Ltd filed Critical Guangzhou Aosong Electronics Co Ltd
Publication of WO2025222865A1 publication Critical patent/WO2025222865A1/fr
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/68—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using thermal effects
    • G01F1/684—Structural arrangements; Mounting of elements, e.g. in relation to fluid flow
    • G01F1/688—Structural arrangements; Mounting of elements, e.g. in relation to fluid flow using a particular type of heating, cooling or sensing element
    • G01F1/69—Structural arrangements; Mounting of elements, e.g. in relation to fluid flow using a particular type of heating, cooling or sensing element of resistive type
    • G01F1/692—Thin-film arrangements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/68—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using thermal effects
    • G01F1/696—Circuits therefor, e.g. constant-current flow meters
    • G01F1/698—Feedback or rebalancing circuits, e.g. self heated constant temperature flowmeters
    • G01F1/699—Feedback or rebalancing circuits, e.g. self heated constant temperature flowmeters by control of a separate heating or cooling element

Definitions

  • This invention belongs to the field of intelligent sensing technology, specifically relating to microtube flow sensors and microflow detection methods.
  • a flow sensor is a device used to measure the flow rate or velocity of a fluid (such as a gas or liquid) through a pipe or channel. These sensors are commonly used in various industrial applications, such as process control, environmental monitoring, and chemical analysis.
  • micro-flow detection such as CN102445246A
  • the flow sensor chip has a sensor sensitive area, which is equipped with a micro-heat source and a temperature sensor.
  • the cap has a fluid flow channel, and the sensor sensitive area is located inside the fluid flow channel of the cap.
  • the cap-type structure lacks the structural stability of a one-piece molding, and the fluid channel and the flow sensor chip are separate. In use, the sensor chip is placed directly at the fluid movement position to achieve flow sensing. When the gas flow rate is low and the flow is weak, the airflow is difficult to pass through the encapsulation shell and contact the chip, resulting in defects in the measurement accuracy and low sensitivity of traditional flow detection modules.
  • the present invention provides a microtube flow sensor and a microflow detection method to solve the problems of the lack of integral molding structural stability, measurement accuracy defects, and low sensitivity of the cap-type structure of the existing flow sensor.
  • microtube flow sensor comprising:
  • a resistive film substrate wherein microfluidic channels are provided on the resistive film substrate
  • a flow detection module is disposed on the resistive film base and located on the extension path of the microfluidic channel and is used to detect the fluid flow rate in the microfluidic channel.
  • the microfluidic channel is recessed at the end of the resistive membrane base, forming a cantilever beam at the end of the resistive membrane base, and the flow detection module is embedded in the cantilever beam.
  • the resistive film base includes a first connector and a second connector.
  • the first connector and the second connector have a first groove and a second groove respectively formed on their opposite end faces.
  • the first groove and the second groove communicate to form the microfluidic channel.
  • the cantilever beam is formed at the end of the first connector or the second connector facing away from the microfluidic channel.
  • both the first connector and the second connector are fabricated from silicon wafers and are bonded together using MEMS technology.
  • the resistive film base includes two sets of support platforms, which are respectively disposed at both ends of the cantilever beam.
  • the microfluidic channel is formed between the two sets of support platforms.
  • the overall cross-section of the cantilever beam and the two sets of support platforms is arranged in a U-shape.
  • the thickness of the two sets of support platforms is greater than that of the cantilever beam.
  • a receiving groove is formed between the two sets of support platforms.
  • the microfluidic channel is laid on the groove wall of the receiving groove. Both ends of the microfluidic channel extend to the outside of the receiving groove. The microfluidic channel is tightly fitted to the cantilever beam.
  • the resistive film base further includes a limiting seat that covers the two sets of support platforms, with the end of the limiting seat extending into the receiving groove and limiting the microfluidic channel within the receiving groove.
  • the resistive film base is made of alloy ceramic and has a rectangular cross-section.
  • the resistive film base is integrally formed by pressing or injection molding.
  • the microfluidic channel is formed inside the resistive film base, and both ends of the microfluidic channel are connected to the outside of the resistive film base.
  • the cross-section of the microfluidic channel is shaped like a geometric shape.
  • the middle section of the microfluidic channel is close to the top of the resistive film base.
  • the end of the resistive film base near the middle section of the microfluidic channel forms a cantilever beam.
  • the flow detection module is located at the top of the resistive film base.
  • the flow detection module includes a thermistor film and a heating unit.
  • the thermistor film and the heating unit are sequentially and spaced apart along the length of the cantilever beam at the end of the cantilever beam away from the microfluidic channel.
  • the thermistor film is electrically connected to a control system and provides real-time feedback of its resistance value to the control system.
  • the heating unit is used to heat the thermistor film.
  • the number of thermistor films is two sets, with the two sets of thermistor films spaced apart on both sides of the heating unit.
  • the resistive film base further includes a heat-insulating cover, which is arranged in a U-shape.
  • the two ends of the heat-insulating cover are connected to the two ends of the cantilever beam, and the middle position of the heat-insulating cover is suspended above the cantilever beam.
  • An isolation cavity for accommodating the thermistor film and the heating unit is formed between the heat-insulating cover and the cantilever beam.
  • micro-flow detection method which includes the following steps:
  • the fluid to be tested moves along the microfluidic channel, and the fluid conducts heat with the cantilever beam of the resistive film base, so that the heat of the cantilever beam is transferred along a preset path.
  • the heating rates of the two sets of thermistor films deviate, and the resistance parameters fed back to the control system by the two sets of thermistor films have a resistance difference.
  • the control system calculates the fluid flow parameters in the current microfluidic channel by measuring the resistance difference.
  • the fluid to be measured does not directly contact the flow detection module. Instead, it contacts the cantilever beam through the microfluidic channel.
  • the fluid to be measured flowing inside the microfluidic channel transfers heat from the cantilever beam, interfering with the original heat flow direction of the flow detection module on the cantilever beam.
  • higher measurement accuracy can be achieved.
  • the cantilever beam is heated by the operation of the heating film. Under no-flow (static) conditions, the temperature distribution around the heating film is symmetrical, forming a symmetrical temperature field, and the resistance value of the thermistor remains stable. When there is fluid flow in the microfluidic channel, the fluid transfers heat from the cantilever beam, and the resistance value of the thermistor set adjacent to the heating film changes. The temperature change is obtained by the change in resistance value, thereby realizing the measurement of fluid flow rate.
  • the thermal films placed on both sides of the heating film are very sensitive to temperature changes and can detect the temperature difference of the cantilever beam caused by fluid flow. By measuring the temperature difference of the cantilever beam, the flow velocity or flow rate of the fluid can be deduced; thus solving the problem of low sensitivity of microtube flow sensor when the gas flow velocity is low and the flow rate is weak.
  • Figure 1 shows a schematic diagram of the microtube flow sensor of the present invention
  • Figure 2 shows a schematic diagram of the structure of the first connecting seat of the present invention
  • Figure 3 shows a schematic diagram of the structure of the second connecting seat of the present invention
  • Figure 4 shows a schematic diagram of the microfluidic channel structure of the present invention
  • Figure 5 shows a schematic diagram of the structure of a microtube flow sensor according to another embodiment of the present invention.
  • Figure 6 shows a schematic diagram of the internal structure of the microtube flow sensor of the present invention
  • Figure 7 shows a cross-sectional view of the microtube flow sensor of the present invention
  • Figure 8 shows a schematic diagram of the structure of a microtube flow sensor according to another embodiment of the present invention.
  • Figure 9 shows a three-dimensional structural schematic diagram of the microtube flow sensor of the present invention.
  • Figure 10 shows a cross-sectional view of the microtube flow sensor of the present invention
  • FIG 11 shows a schematic diagram of the heating unit of the present invention
  • Figure 12 shows a schematic diagram of the flow detection module according to another embodiment of the present invention.
  • the icons in the attached figures are shown in the image: 10-Resistor film base; 11-Microfluidic channel; 12-Cantilever beam; 13-Support platform; 14-Limiting seat; 15-Insulated cover; 101-First connecting seat; 102-Second connecting seat; 103-First groove; 104-Second groove; 20-Flow detection module; 21-Thermistor film; 22-Heating unit; 221-Substrate; 222-Heating coil.
  • the embodiments of the present invention involve directional indications (such as up, down, left, right, front, back, etc.), the directional indications are only used to explain the relative positional relationship and movement of the components in a specific posture. If the specific posture changes, the directional indications will also change accordingly.
  • one embodiment of the present invention provides a microtube flow sensor, comprising:
  • a flow detection module 20 is disposed on the resistive film base 10.
  • the flow detection module 20 is located on the extension path of the microfluidic channel 11 and is used to detect the fluid flow rate in the microfluidic channel 11.
  • the microfluidic channel 11 is recessed at the end of the resistive film base 10, so that the end of the resistive film base 10 is formed with a cantilever beam 12, and the flow detection module 20 is embedded in the cantilever beam 12.
  • the flow detection module 20 is embedded in the cantilever beam 12.
  • the fluid to be measured does not directly contact the flow detection module 20, but rather comes into contact with the cantilever beam 12 through the microfluidic channel 11.
  • the fluid to be measured flowing in the microfluidic channel 11 transfers heat from the cantilever beam 12, interfering with the original heat flow direction on the cantilever beam 12. Then, the temperature change is obtained by detecting the change in the resistance value of the thermistor in the flow detection module 20 on the cantilever beam 12, thereby achieving higher measurement accuracy.
  • the resistive film base 10 includes a first connecting seat 101 and a second connecting seat 102.
  • the first connecting seat 101 and the second connecting seat 102 have a first groove 103 and a second groove 104 respectively formed on their opposite end faces.
  • the first groove 103 and the second groove 104 communicate to form the microfluidic channel 11.
  • the cantilever beam 12 is formed at the end of the first connecting seat 101 or the second connecting seat 102 facing away from the microfluidic channel 11.
  • the first connecting seat 101 with the first groove 103 and the second connecting seat 102 with the second groove 104 are covered and connected to form a microfluidic channel 11 by connecting the first groove 103 and the second groove 104.
  • the forming scheme of the microfluidic channel 11 in this solution is simple, and the first groove 103 and the second groove 104 can be flexibly designed according to different application scenarios.
  • the first groove 103 and the second groove 104 can be formed into a " ⁇ " shaped structure to form a " ⁇ " shaped microfluidic channel 11. This facilitates the setting of a flow detection module 20 on the cantilever beam 12 at the top position of the microfluidic channel 11, so that the fluid to be measured can fully contact the cantilever beam 12, thereby achieving better measurement accuracy.
  • both the first connector 101 and the second connector 102 are formed from silicon wafers and are bonded together using MEMS technology.
  • Bonding is a technique that combines two homogeneous or heterogeneous semiconductor materials with clean, atomically flat surfaces through surface cleaning and activation treatment, and then directly combines them under certain conditions.
  • the bonding is achieved by van der Waals forces, molecular forces, or even atomic forces.
  • the first connector 101 and the second connector 102 are bonded together using MEMS technology to ensure the mechanical stability, sealing performance, and functional requirements of the resistive film substrate 10 and the microfluidic channel 11.
  • the resistive film base 10 includes two sets of support platforms 13, which are respectively disposed at both ends of the cantilever beam 12.
  • the microfluidic channel 11 is formed between the two sets of support platforms 13.
  • the overall cross-section of the cantilever beam 12 and the two sets of support platforms 13 is arranged in a U-shape.
  • the thickness of the two sets of support platforms 13 is greater than that of the cantilever beam 12.
  • a receiving groove is formed between the two sets of support platforms 13.
  • the microfluidic channel 11 is laid on the groove wall of the receiving groove. Both ends of the microfluidic channel 11 extend to the outside of the receiving groove.
  • the microfluidic channel 11 is tightly fitted with the cantilever beam 12.
  • the cantilever beam 12 and the two sets of support platforms 13 are arranged in a U-shape.
  • a receiving groove is formed between the two sets of support platforms 13.
  • the microfluidic pipe 11 is laid on the wall of the receiving groove.
  • the two sets of support platforms 13 are used to make the microfluidic pipe 11 fit tightly with the cantilever beam 12.
  • the resistive film base 10 further includes a limiting seat 14, which covers the two sets of support platforms 13.
  • the end of the limiting seat 14 extends into the receiving groove and limits the microfluidic channel 11 within the receiving groove.
  • the limiting seat 14 is used to cooperate with the U-shaped structure formed by the cantilever beam 12 and the two sets of support platforms 13.
  • the end of the limiting seat 14 extends into the receiving groove and limits the microfluidic pipe 11 in the receiving groove, ensuring that the pipe wall of the microfluidic pipe 11 is fully in contact with the cantilever beam 12, thereby achieving better measurement accuracy.
  • the resistive film base 10 is made of alloy ceramic and has a rectangular cross-section.
  • the resistive film base 10 is integrally formed by pressing or injection molding.
  • the microfluidic channel 11 is formed inside the resistive film base 10, and both ends of the microfluidic channel 11 are connected to the outside of the resistive film base 10.
  • the cross-section of the microfluidic channel 11 is of a geometric shape.
  • the middle section of the microfluidic channel 11 is close to the top of the resistive film base 10.
  • the end of the resistive film base 10 near the middle section of the microfluidic channel forms the cantilever beam 12.
  • the flow detection module 20 is disposed at the top of the resistive film base 10.
  • the flow detection module 20 includes a thermistor film 21 and a heating unit 22.
  • the thermistor film 21 and the heating unit 22 are sequentially and spaced apart along the length of the cantilever beam 12 at the end of the cantilever beam 12 away from the microfluidic channel 11.
  • the thermistor film 21 is electrically connected to a control system and provides real-time feedback of its resistance value to the control system.
  • the heating unit 22 is used to heat the thermistor film 21.
  • the cantilever beam 12 is heated by the operation of the heating unit 22.
  • the temperature distribution around the heating unit 22 is symmetrical, forming a symmetrical temperature field, and the resistance value of the thermistor film 21 remains stable.
  • the fluid transfers the heat from the cantilever beam 12, and the resistance value of the thermistor film 21 adjacent to the heating unit 22 changes.
  • the temperature change is obtained by the change in resistance value, thereby realizing the measurement of fluid flow rate.
  • the number of thermistor films 21 is two sets, and the two sets of thermistor films 21 are spaced apart on both sides of the heating unit 22.
  • the resistive film base 10 further includes a heat-insulating cover 15.
  • the heat-insulating cover 15 is arranged in a U-shape.
  • the two ends of the heat-insulating cover 15 are connected to the two ends of the cantilever beam 12.
  • the middle position of the heat-insulating cover 15 is suspended above the cantilever beam 12.
  • An isolation cavity for accommodating the thermistor film 21 and the heating unit 22 is formed between the heat-insulating cover 15 and the cantilever beam 12.
  • the insulating cavity formed between the heat-insulating cover 15 and the cantilever beam 12 effectively isolates heat, preventing the thermal influence of the external environment from interfering with the thermistor film 21 and the heating unit 22, ensuring that they can operate normally within a certain temperature range. This improves the stability and reliability of the equipment, ensuring that it operates within the expected temperature range.
  • the heat-insulating cover 15 provides an additional protective layer, preventing external dust, moisture, and other impurities from adhering to the thermistor film 21 and the heating unit 22, thereby protecting them from damage or contamination.
  • One embodiment also discloses a micro-flow detection method, comprising the following steps:
  • the heating unit works, and heat is conducted to the thermistor film through the cantilever beam of the resistive film base, so that the two sets of thermistor films are heated synchronously.
  • the fluid to be tested moves along the microfluidic channel, and the fluid conducts heat with the cantilever beam of the resistive film base, so that the heat of the cantilever beam is transferred along the preset path.
  • the control system calculates the fluid flow parameters in the current microfluidic channel by measuring the resistance difference.
  • the heating unit operates, and heat is conducted to the thermistor membranes through the cantilever beam of the resistive membrane base, causing the two sets of thermistor membranes to heat up synchronously.
  • the fluid to be detected moves along the microfluidic channel
  • heat conduction occurs between the fluid and the cantilever beam of the resistive membrane base, causing the heat of the cantilever beam to transfer along a preset path, interfering with the original heat flow direction of the flow detection module on the cantilever beam.
  • This causes a deviation in the heating rate of the two sets of thermistor membranes, resulting in a resistance difference in the resistance parameters fed back to the control system.
  • the control system calculates the fluid flow parameters in the current microfluidic channel based on the resistance difference, achieving higher measurement accuracy.
  • the thermal conduction between the heat source and the substrate can affect the measurement accuracy.
  • the convective heat transfer between the heat source and the cantilever beam 12 can become the dominant part of the heat conduction process.
  • the flow detection module 20 includes a thermistor film 21 and a heating unit 22, wherein the thermistor film 21 and the heating unit 22 are sequentially and spaced apart along the length direction of the cantilever beam 12 at the end of the cantilever beam 12 away from the microfluidic channel 11.
  • the thermistor film 21 is in two sets, and the two sets of thermistor films 21 are spaced apart on both sides of the heating unit 22.
  • the heating unit 22 includes a substrate 221 and a heating coil 222.
  • the substrate 221 has a through hole, and the heating coil 222 is embedded inside the through hole and fits against the edge of the through hole.
  • the heating coil 222 is encapsulated inside the substrate 221 to allow the heat of the heating coil 222 to be uniformly conducted through the substrate 221, thereby enabling the heating unit 22 to obtain good temperature uniformity, reducing heat conduction loss, which is beneficial to forming a symmetrically distributed temperature field on the cantilever beam 12, and effectively reducing the overall power consumption of the device.
  • the heating coil 222 can be arranged in a spiral or bent shape to increase the contact area between the heating coil 222 and the substrate 221.
  • the substrate 221 can be made of a metal material with good thermal conductivity, such as copper alloy, aluminum alloy or nickel-plated alloy material, to enable the heating unit to obtain good temperature uniformity.
  • the temperature compensation capability of a single heat source is poor.
  • the flow detection module 20 of a single heat source is greatly affected, and errors are easily made in the flow detection of the fluid.
  • the flow detection module 20 includes a thermistor film 21 and a heating unit 22, wherein the thermistor film 21 and the heating unit 22 are sequentially and spaced apart along the length direction of the cantilever beam 12 at the end of the cantilever beam 12 away from the microfluidic channel 11.
  • the thermistor film 21 is in two sets, and the two sets of thermistor films 21 are spaced apart on both sides of the heating unit 22.
  • the heating unit 22 includes two heat sources arranged parallel to each other on the cantilever beam 12.
  • One set of thermistor films 21 is arranged on the left side of the heating unit 22, and the other set of thermistor films 21 is arranged on the right side of the heating unit 22.
  • both the upstream and downstream heat sources have the function of temperature sensing and have excellent response time.
  • the dual heat sources have good temperature compensation capability for changes in ambient temperature, which is suitable for working conditions with unstable temperature and can effectively improve measurement accuracy.
  • the heating unit 22 can be configured to include two or more heat sources to improve temperature compensation capability and is suitable for working conditions with unstable temperature.

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  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • General Physics & Mathematics (AREA)
  • Measuring Volume Flow (AREA)

Abstract

La présente invention appartient au domaine technique de la détection intelligente, et concerne spécifiquement un capteur d'écoulement de micro-tube et un procédé de mesure de micro-écoulement. Le capteur d'écoulement de micro-tube comprend : une base de film résistif pourvue d'un canal de micro-écoulement ; et un module de mesure d'écoulement disposé sur la base de film résistif. Le module de mesure d'écoulement est situé sur un trajet d'extension du canal de micro-écoulement et utilisé pour mesurer l'écoulement d'un fluide dans le canal de micro-écoulement. Le canal de micro-écoulement est en retrait au niveau d'une partie d'extrémité de la base de film résistif, de telle sorte qu'une poutre en porte-à-faux est formée au niveau de la partie d'extrémité de la base de film résistif, le module de mesure d'écoulement étant intégré dans la poutre en porte-à-faux. Dans la présente invention, le canal de micro-écoulement est intégré dans la base de film résistif, et le fluide à mesurer n'est pas en contact direct avec le module de mesure d'écoulement. Au lieu de cela, tandis que le canal de micro-écoulement est en contact avec la poutre en porte-à-faux, ledit fluide s'écoulant dans le canal de micro-écoulement transfère la chaleur de la poutre en porte-à-faux, puis le module de mesure de d'écoulement mesure la différence de température de la poutre en porte-à-faux, ce qui permet d'obtenir une précision de mesure plus élevée.
PCT/CN2024/137820 2024-04-22 2024-12-09 Capteur d'écoulement de micro-tube et procédé de mesure de micro-écoulement Pending WO2025222865A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202410486334.8A CN118443108A (zh) 2024-04-22 2024-04-22 微管流量传感器及微流量检测方法
CN202410486334.8 2024-04-22

Publications (1)

Publication Number Publication Date
WO2025222865A1 true WO2025222865A1 (fr) 2025-10-30

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PCT/CN2024/137820 Pending WO2025222865A1 (fr) 2024-04-22 2024-12-09 Capteur d'écoulement de micro-tube et procédé de mesure de micro-écoulement

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Country Link
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WO (1) WO2025222865A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118443108A (zh) * 2024-04-22 2024-08-06 广州奥松电子股份有限公司 微管流量传感器及微流量检测方法

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US20040025585A1 (en) * 2002-05-10 2004-02-12 Koji Seki Flow sensor and method of manufacturing the same
US20170038235A1 (en) * 2015-08-03 2017-02-09 Memsic, Inc. Mems flow sensor
CN116659599A (zh) * 2023-07-24 2023-08-29 无锡芯感智半导体有限公司 一种基于soi衬底的mems气体流量芯片制备方法
US11802784B1 (en) * 2023-05-03 2023-10-31 King Faisal University Single heater MEMS-CMOS based flow sensor
CN118443108A (zh) * 2024-04-22 2024-08-06 广州奥松电子股份有限公司 微管流量传感器及微流量检测方法

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TW370678B (en) * 1997-10-16 1999-09-21 Ind Tech Res Inst Integrated micro-type pressure-resist flow control module
GB2558895B (en) * 2017-01-17 2019-10-09 Cambridge Entpr Ltd A thermal fluid flow sensor
US11965762B2 (en) * 2019-10-21 2024-04-23 Flusso Limited Flow sensor
CN115773795A (zh) * 2022-11-24 2023-03-10 广州奥松电子股份有限公司 一种测量气体流量和voc浓度的传感器及其制作方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040025585A1 (en) * 2002-05-10 2004-02-12 Koji Seki Flow sensor and method of manufacturing the same
US20170038235A1 (en) * 2015-08-03 2017-02-09 Memsic, Inc. Mems flow sensor
US11802784B1 (en) * 2023-05-03 2023-10-31 King Faisal University Single heater MEMS-CMOS based flow sensor
CN116659599A (zh) * 2023-07-24 2023-08-29 无锡芯感智半导体有限公司 一种基于soi衬底的mems气体流量芯片制备方法
CN118443108A (zh) * 2024-04-22 2024-08-06 广州奥松电子股份有限公司 微管流量传感器及微流量检测方法

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