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WO2025221430A1 - Guide d'ondes non symétrique à haut rendement à faible décalage de couleur de transmission - Google Patents

Guide d'ondes non symétrique à haut rendement à faible décalage de couleur de transmission

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Publication number
WO2025221430A1
WO2025221430A1 PCT/US2025/021719 US2025021719W WO2025221430A1 WO 2025221430 A1 WO2025221430 A1 WO 2025221430A1 US 2025021719 W US2025021719 W US 2025021719W WO 2025221430 A1 WO2025221430 A1 WO 2025221430A1
Authority
WO
WIPO (PCT)
Prior art keywords
grating
waveguide
alternatively
layer
disposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/US2025/021719
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English (en)
Inventor
Yingnan Liu
Evan Wang
Samarth Bhargava
Kevin MESSER
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Applied Materials Inc
Original Assignee
Applied Materials Inc
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Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of WO2025221430A1 publication Critical patent/WO2025221430A1/fr
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02—Physical, chemical or physicochemical properties
    • B32B7/023—Optical properties
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/017—Head mounted
    • G02B27/0172—Head mounted characterised by optical features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/0101—Head-up displays characterised by optical features
    • G02B2027/0112—Head-up displays characterised by optical features comprising device for genereting colour display

Definitions

  • Embodiments of the present disclosure generally relate to waveguides of augmented reality displays. More specifically, embodiments described herein provide for waveguides with a transmission matching layer and a color shift layer.
  • Virtual reality is generally considered to be a computer generated simulated environment in which a user has an apparent physical presence.
  • a virtual reality experience can be generated in 3D and viewed with a head-mounted display (HMD), such as glasses or other wearable display devices that have near-eye display panels as lenses to display a virtual reality environment that replaces an actual environment.
  • HMD head-mounted display
  • Augmented reality enables an experience in which a user can still see through the display lenses of the glasses or other HMD device to view the surrounding environment, yet also see images of virtual objects that are generated for display and appear as part of the environment.
  • Augmented reality can include any type of input, such as audio and haptic inputs, as well as virtual images, graphics, and video that enhances or augments the environment that the user experiences.
  • audio and haptic inputs as well as virtual images, graphics, and video that enhances or augments the environment that the user experiences.
  • a waveguide in one embodiment, includes a waveguide substrate.
  • the waveguide further includes a transmission matching layer disposed on the waveguide substrate.
  • the waveguide further includes a first grating material disposed over the transmission matching layer, and a second grating material disposed over the first grating material.
  • the waveguide further includes a grating disposed in the second grating material and the first grating material such that grating structures of the grating include a first layer of the first grating material and a second layer of the second grating material.
  • the second grating material has a second refractive index that is greater than a first refractive index of the first grating material.
  • the waveguide further includes a color shift layer disposed over the grating.
  • a waveguide in another embodiments, includes a waveguide substrate.
  • the waveguide further includes a transmission matching layer disposed on a first surface opposing a second surface of the waveguide substrate.
  • the waveguide further includes a first grating material disposed over the transmission matching layer, and a second grating material disposed over the first grating material.
  • the waveguide further includes a grating disposed in the second grating material and the first grating material such that grating structures of the grating include a first layer of the first grating material and a second layer of the second grating material.
  • the second grating material have a second refractive index greater than a first refractive index of the first grating material.
  • the waveguide further includes a color shift layer disposed over the grating, and an antireflective layer disposed on the second surface.
  • a waveguide in yet another embodiment, includes a waveguide substrate.
  • the waveguide further includes a transmission matching layer disposed on the waveguide substrate.
  • the waveguide further includes a first grating material disposed over the transmission matching layer.
  • the waveguide further includes an incoupler grating disposed on the first grating material.
  • the incoupler grating includes a plurality of blazed device structures.
  • the waveguide further includes a pupil expansion grating disposed in the first grating material, and an outcoupler grating disposed in the first grating material.
  • the outcoupler grating includes a plurality of angled grating structures.
  • the waveguide further includes a color shift layer disposed over the incoupler grating, the pupil expansion grating, and the outcoupler grating.
  • Figure 1 is a sectional, frontal view of a waveguide, according to at least one embodiment.
  • Figure 2 is a schematic cross-sectional view of a waveguide, according to at least one embodiment.
  • Figure 3 is a schematic cross-sectional view of a waveguide, according to at least one embodiment.
  • Figure 4 is a schematic cross-sectional view of an in-coupler grating, according to at least one embodiment.
  • Figure 5 is a schematic cross-sectional view of an intermediate coupler grating, according to at least one embodiment.
  • Figure 6 is a schematic cross-sectional view of an out-coupler grating, according to at least one embodiment.
  • Figure 7 is a frontal, sectional view of the out-coupler grating of a waveguide, according to at least one embodiment.
  • Figure 8 is a frontal, sectional view of the out-coupler grating of a waveguide, according to at least one embodiment.
  • Embodiments of the present disclosure generally relate to waveguide combiners of augmented reality displays. More specifically, embodiments described herein provide for waveguides with a transmission matching layer and a color shift layer.
  • the transmission layer is disposed below the gratings and the color shift layer is disposed above the gratings of the waveguide.
  • the diffraction efficiency of the gratings (e.g., high diffraction efficiency gratings) of a waveguide may cause the waveguide to emit light of various wavelengths when the augmented reality display is not in operation.
  • the transmission matching layer reduces and/or smooths the step transition of light with varying wavelengths which are being transmitted through the out-coupler.
  • the color shift layer changes the overall color by adjusting the relative transmission of varying wavelengths in the out-coupler.
  • FIG. 1 is a sectional, frontal view of a waveguide 100. It is to be understood that the waveguide 100 described herein is an exemplary waveguide and that other waveguides may be used with or modified to accomplish aspects of the present disclosure.
  • the waveguide 100 includes a plurality of grating structures 212.
  • the grating structures 212 may be disposed over the waveguide substrate 101 .
  • the grating structures 212 are nanostructures have a sub-micron critical dimension, e.g., a width less than 1 micrometer.
  • the waveguide 100 includes gratings 104 including at least an in-coupler grating 104a having grating structures 212a and an out-coupler grating 104c having grating structures 212c.
  • the waveguide 100 further includes an intermediate grating 104b having grating structures 212b of the plurality of grating structures 212.
  • the intermediate grating 104b corresponds to a pupil expansion grating (“pupil expander”) or a fold grating.
  • FIG. 2 is a schematic cross-sectional view of a waveguide 100.
  • the waveguide 100 of Figure 2 has a bi-layer configuration 200.
  • the waveguide 100 of the bi-layer configuration 200 includes the waveguide substrate 101 , a transmission matching layer 202 disposed over the waveguide substrate 101 , and a first color shift layer 210.
  • an anti-reflective (AR) coating 214 disposed over the waveguide substrate 101 on the side opposite the transmission matching layer 202.
  • the waveguide 100 further includes a first grating material 204 disposed over the transmission matching layer 202, and a second grating material 206 disposed over the first grating material 204.
  • the first color shift layer 210 is disposed over the second grating material 206.
  • the waveguide 100 further includes the in-coupler grating 104a having the grating structures 212a, the intermediate grating 104b having the grating structures 212b, and the out-coupler grating 104c having grating structures 212c.
  • the grating structures 212a of the in-coupler grating 104a are disposed in the first grating material 204 and the second grating material 206.
  • the grating structures 212a of the in-coupler grating 104a of the bi-layer configuration 200 include a first layer of the first grating material 204 and a second layer of the second grating material 206.
  • the grating structures 212b of the intermediate grating 104b and the grating structures 212c of the out-coupler grating 104c are disposed in the second grating material 206.
  • the transmission matching layer 202 has a thickness of about 10 nm to about 60 nm, such as about 20 nm to about 50 nm, such as about 30 nm to about 40 nm, alternatively about 10 nm to about 20 nm, alternatively about 20 nm to about 30 nm, alternatively about 40 nm to about 50 nm, alternatively about 50 nm to about 60 nm.
  • the transmission matching layer 202 has a refractive index (Rl) of about 2.2 to about 2.7, such as about 2.3 to about 2.6, such as about 2.4 to about 2.5, alternatively about 2.2 to about 2.3, alternatively about 2.3 to about 2.4, alternatively about 2.5 to about 2.6, alternatively about 2.6 to about 2.7.
  • Rl refractive index
  • the transmission matching layer reduces and/or smooths the step transition of light with varying wavelengths which are being transmitted through the out-coupler.
  • the waveguide substrate 101 has a substrate refractive index of about 2.0 to about 2.6, such as about 2.1 to about 2.5, such as about 2.2 to about 2.4, alternatively about 2.0 to about 2.1 , alternatively about 2.1 to about 2.2, alternatively about 2.2 to about 2.3, alternatively about 2.3 to about 2.4, alternatively about 2.4 to about 2.5, alternatively about 2.5 to about 2.6.
  • the waveguide substrate 101 may be formed from any suitable material, provided that the waveguide substrate 101 can adequately transmit light in a selected wavelength or wavelength range and can serve as an adequate support for the waveguide 100 described herein.
  • Substrate selection may include substrates of any suitable material, including amorphous dielectrics, non- amorphous dielectrics, crystalline dielectrics, silicon oxide, polymers, and combinations thereof.
  • the waveguide substrate 101 includes glass, quartz, sapphire (AI2O3), silicon carbide (SiC), lithium niobate (LiNbOs), indium tin oxide (ITO), or combinations thereof.
  • the waveguide substrate 101 includes high-refractive- index glass.
  • the high Rl glass includes greater than 2 percent by weight of lanthanide (Ln), titanium (Ti), tantalum (Ta), or combination thereof.
  • the transmission matching layer 202 has a Rl of about 2.2 to about 2.7, such as about 2.3 to about 2.6, such as about 2.4 to about 2.5, alternatively about 2.2 to about 2.3, alternatively about 2.3 to about 2.4, alternatively about 2.5 to about 2.6, alternatively about 2.6 to about 2.7.
  • the transmission matching layer 202 may include one or more of silicon oxycarbide (SiOC), titanium dioxide (TiC>2), silicon dioxide (SiC ), vanadium (IV) oxide (VOx), aluminum oxide (AI2O3), aluminum-doped zinc oxide (AZO), indium tin oxide (ITO), tin dioxide (SnO2), zinc oxide (ZnO), tantalum pentoxide (Ta2Os), silicon nitride (SislS ), zirconium dioxide (ZrO2), niobium oxide (Nb20s), cadmium stannate (Cd2SnO4), titanium silicon oxide (TiSiOx) or silicon carbon-nitride (SiCN) containing materials.
  • SiOC silicon oxycarbide
  • TiC>2 titanium dioxide
  • SiC silicon dioxide
  • SiC vanadium (IV) oxide
  • VOx aluminum oxide
  • AI2O3 aluminum oxide
  • AZO aluminum-doped zinc oxide
  • the first grating material 204 has a first Rl of about 2.0 to about 2.5, such as about 2.1 to about 2.4, such as about 2.2 to about 2.3, alternatively about 2.0 to about 2.1 , alternatively about 2.1 to about 2.2, alternatively about 2.3 to about 2.4, alternatively about 2.4 to about 2.5.
  • the second grating material 206 has a second Rl of about 2.0 to about 2.5, such as about 2.1 to about 2.4, such as about 2.2 to about 2.3, alternatively about 2.0 to about 2.1 , alternatively about 2.1 to about 2.2, alternatively about 2.3 to about 2.4, alternatively about 2.4 to about 2.5.
  • the second Rl of the second grating material 206 is greater than or the same as the first Rl of the first grating material 204 in the bi-layer configuration 200.
  • the difference between the first Rl of the first grating material 204 and the second Rl of the second grating material 206 is about 0.1 to about 0.5, such as about 0.2 to about 0.4, such as about 0.25 to about 0.35, alternatively about 0.1 to about 0.2, alternatively about 0.2 to about 0.25, alternatively about 0.35 to about 0.4, alternatively about 0.4 to about 0.5.
  • the first grating material 204 and the second grating material 206 may independently include one or more of SiOC, TiO2, S iC>2, VOx, AI2O3, AZO, ITO, SnO2, ZnO, Ta2Os, SisN4, ZrO2, Nb2Os, Cd2SnO4, TiSiOx, or SiCN containing materials.
  • the transmission matching layer 202 and at least one of the first grating material 204 and/or the second grating material 206 are the same, resulting in the same Rl values.
  • the transmission matching layer 202 and at least one of the first grating material 204 or the second grating material 206 are different, resulting in differing Rl values.
  • each of the transmission matching layer 202, the first grating material 204, and the second grating material 206 each include a different material composition.
  • the first color shift layer 210 of the waveguide 100 with the bi-layer configuration 200 is at least partially disposed over at least one of the second grating material 206, the one or more grating structures 212a of the in-coupler grating 104a, the one or more grating structures 212b of the intermediate grating 104b, or the one or more grating structures 212c of the out-coupler grating.
  • the first color shift layer 210 of the waveguide is substantially disposed over each of the second grating material 206 of the waveguide 100 with the bi-layer configuration 200, the one or more grating structures 212a of the in-coupler grating 104a, the one or more grating structures 212b of the intermediate grating 104b, and the one or more grating structures 212c of the out-coupler grating.
  • the first color shift layer 210 is substantially disposed over a surface of the waveguide 100 with the bi-layer configuration 200.
  • the first color shift layer 210 in this embodiment, has a thickness is disposed over the surface of the in-coupler grating 104a, the surface of the intermediate grating 104b, and the surface of the out- coupler grating 104c. That is to say that in such instances, the first color shift layer 210 may have a variable thickness depending on the location and corresponding topology of the surface of the waveguide 100 with the bi-layer configuration, wherein the first color shift layer 210 is disposed.
  • the first color shift layer 210 has an Rl of about 1.3 to about 1.8, such as about 1 .4 to about 1 .7, such as about 1 .5 to about 1 .6, alternatively about 1 .3 to about 1 .4, alternatively about 1 .4 to about 1 .5, alternatively about 1 .6 to about 1 .7, alternatively about 1 .7 to about 1 .8.
  • the first color shift layer 210 includes, but is not limited to, photoresist material, SiC>2, Si3N4 or combinations thereof. Without being bound by theory, the color shift changes the overall color by adjusting the relative transmission of varying wavelengths in the out-coupler.
  • FIG. 3 is a schematic cross-sectional view of a waveguide 100 with a blazed configuration 300.
  • the waveguide 100 with the blazed configuration 300 includes a waveguide substrate 101 , a transmission matching layer 202 disposed over the waveguide substrate 101 , and an AR coating 214 disposed over the waveguide substrate 101 on the side opposite the transmission matching layer 202.
  • the waveguide 100 with the blazed configuration further includes a first grating material 204 disposed over the transmission matching layer 202.
  • the waveguide 100 with the blazed configuration 300 further includes a first color shift layer 210 disposed over the first grating material 204.
  • the transmission matching layer 202 can include can include a thickness of about 10 nm to about 60 nm, such as about 20 nm to about 50 nm, such as about 30 nm to about 40 nm, alternatively about 10 nm to about 20 nm, alternatively about 20 nm to about 30 nm, alternatively about 40 nm to about 50 nm, alternatively about 50 nm to about 60 nm.
  • the first grating material 204 can include can include a thickness of about 50 nm to about 300 nm, such as about 100 nm to about 250 nm, such as about 150 nm to about 200 nm, alternatively about 50 nm to about to about 100 nm, alternatively about 100 nm to about 150 nm, alternatively about 200 nm to about 250 nm, alternatively about 250 nm to about 300 nm.
  • the waveguide 100 with the blazed configuration 300 further includes an in-coupler grating 104a having a plurality of grating structures 212a, an intermediate grating 104b having a plurality of grating structures 212b, and an out- coupler grating 104c with a plurality of grating structures 212c.
  • the grating structures 212a of the in-coupler grating 104a may be disposed over the first grating material 204.
  • the grating structures 212b of the intermediate grating 104b and/or the grating structures 212c of the out-coupler grating 104c may be disposed in the first grating material 204.
  • the first color shift layer 210 is substantially disposed over a surface of the waveguide 100 with the blazed configuration such that a layer of uniform thickness is disposed over the plurality of grating structures 212a of the in-coupler grating 104a, the plurality of grating structures 212b of the intermediate grating 104b, and the plurality of grating structures 212c of the out-coupler grating 104c.
  • the surface of the first color shift layer 210 is not planar.
  • the first color shift layer 210 comprises a uniform thickness perpendicular to the surface of which it is disposed of about 0 nm to about 200 nm, such as about 10 nm to about 150 nm, such as about 50 nm to about 100 nm, alternatively about 10 nm to about 50 nm, alternatively about 50 nm to about 75 nm, alternatively about 75 nm to about 100 nm, alternatively about 100 nm to about 150 nm, alternatively about 150 nm to about 200 nm.
  • the first color shift layer 210 is non-uniformly disposed on the surface of the waveguide 100 with the blazed configuration 300 such that the surface of the first color shift layer 210 is smooth and/or planar. That is to say that in such instances, the first color shift layer 210 may have a variable thickness depending on the location and corresponding topology of the surface of the waveguide 100 with the blazed configuration 300 wherein the first color shift layer 210 is disposed.
  • At least one of the grating structures 212a of the in-coupler grating 104a may be slanted with a flat bottom. In another embodiment, which can be combined with other embodiments described herein, at least one of the grating structures 212a of the in-coupler grating 104a may be slanted with a tilted bottom. In another embodiment, which can be combined with other embodiments described herein, at least one of the grating structures 212a of the in-coupler grating 104a may be blazed. The blazed structures can include sidewalls that are slanted relative to the top surface of the first grating material 204.
  • Figure 4 is a schematic, cross-sectional view of an in-coupler grating 104a having a plurality grating structures 212a.
  • the plurality of grating structures 212a of the in-coupler grating 104a are blazed structures 402, wherein each of the blazed structures 402 includes a blazed surface 404, a sidewall 406, a depth 422, and a linewidth 424.
  • the each of the blazed structures 402 independently include a blazed surface 404 having a trim width 410 that is defined as the length of the blazed surface 404.
  • the trim width 410 is less than half of the total width of the blazed structures 402, e.g., less than 50%.
  • the top width 412 is defined by the total width of the top surface. The top width 412 is greater than 50% of the width of the blazed structure 402.
  • the blazed surface 404 has a blaze angle y.
  • the blaze angle y is the angle between the blazed surface 404 and the surface parallel p of the first grating material 204.
  • the depth 422 corresponds to the height of the sidewall 406 and the linewidth 424 corresponds to the distances between sidewalls 406 of adjacent blazed structures 402.
  • the blaze angle y of two or more blazed structures 402 can be different.
  • the blaze angle y of two or more blazed structures 402 can be the same.
  • the depth 422 of two or more blazed structures 402 can be different.
  • the depth 422 of two or more blazed structures 402 can be the same.
  • the linewidth 424 of two or more blazed structures 402 can be different.
  • the linewidths 424 of one or more blazed structures 402 can be the same.
  • each of the grating structures 212a of the in-coupler grating 104a are blazed structures 402 independently including a depth 422, a linewidth 424, and a blaze angle y.
  • the plurality of grating structures 212a of the in-coupler grating 104a independently include a depth 422 of about 50 nm to about 100 nm, such as about 60 nm to about 90 nm, such as about 70 nm to about 80 nm, alternatively about 50 nm to about 60 nm, alternatively about 60 nm to about 70 nm, alternatively about 80 nm to about 90 nm, alternatively about 90 nm to about 100 nm.
  • the plurality of grating structures 212a of the incoupler grating 104a independently include a linewidth 424 of about 300 nm to about 500 nm, such as about 350 nm to about 450 nm, such as about 375 nm to about 425 nm, alternatively about 300 nm to about 350 nm, alternatively about 350 nm to about 375 nm, alternatively about 375 nm to about 400 nm, alternatively about 400 nm to about 425 nm, alternatively about 425 nm to about 450 nm, alternatively about 450 nm to about 500 nm.
  • the plurality of grating structures 212a of the in-coupler grating 104a independently include a blaze angle y of about 25° to about 45°, such as about 30° to about 40°, such as about 32.5° to about 37.5°, alternatively about 25° to about 30°, alternatively about 30° to about 32.5°, alternatively about 32.5° to about 35°, alternatively about 35° to about 37.5°, alternatively about 37.5° to about 40°, alternatively about 40° to about 45°.
  • the plurality of grating structures 212a of the in-coupler grating 104a independently include an Rl of about 1 .5 to about 2.6, such as about 1 .7 to about 2.4, such as about 1 .9 to about 2.2, such as about 2.0 to about 2.1 , alternatively about 1 .5 to about 1 .7, alternatively about 1 .7 to about 1 .9, alternatively about 1 .9 to about 2.0, alternatively about 2.1 to about 2.2, alternatively about 2.2 to about 2.4, alternatively about 2.4 to about 2.6.
  • each of the grating structures 212a of the in-coupler grating 104a independently include any suitable material, such as SiOC, TiO2, SiC>2, VOx, AI2O3, AZO, ITO, SnO2, ZnO, Ta20s, Si3N4, ZrO2, Nb2Os, Cd2SnO4, TiSiOx, or SiCN containing materials.
  • suitable material such as SiOC, TiO2, SiC>2, VOx, AI2O3, AZO, ITO, SnO2, ZnO, Ta20s, Si3N4, ZrO2, Nb2Os, Cd2SnO4, TiSiOx, or SiCN containing materials.
  • FIG. 5 is a schematic, cross-sectional view of a plurality of grating structures 212b of the intermediate grating 104b.
  • the intermediate grating 104b can include a plurality of grating structures 212b disposed in the first grating material 204.
  • the plurality of grating structures 212b includes one or more grating structures 502 having a depth 504 and a width 506.
  • the intermediate grating 104b can include a plurality of grating structures 212b disposed in the first grating material 204.
  • the grating structures 212b of the intermediate grating 104b can each independently include a binary structure having a depth 504 and a width 506.
  • the plurality of grating structures 212b of the intermediate grating 104b independently include a depth 504 of about 10 nm to about 100 nm, such as about 25 nm to about 75 nm, such as about 40 nm to about 60 nm, alternatively about 10 nm to about 25 nm, alternatively about 25 nm to about 40 nm, alternatively about 60 nm to about 74 nm, alternatively about 75 nm to about 100 nm.
  • the plurality of grating structures 212b of the intermediate grating 104b independently include a width 506 of about 50 nm to about 300 nm, such as about 100 nm to about 250 nm, such as about 150 nm to about 200 nm, alternatively about 50 nm to about to about 100 nm, alternatively about 100 nm to about 150 nm, alternatively about 200 nm to about 250 nm, alternatively about 250 nm to about 300 nm.
  • the plurality of grating structures 212b of the intermediate grating 104b independently include a Rl of about 1 .5 to about 2.6, such as about 1 .7 to about 2.4, such as about 1.9 to about 2.2, such as about 2.0 to about 2.1 , alternatively about 1.5 to about 1.7, alternatively about 1.7 to about 1.9, alternatively about 1.9 to about 2.0, alternatively about 2.1 to about 2.2, alternatively about 2.2 to about 2.4, alternatively about 2.4 to about 2.6.
  • each of the grating structures 212b of the intermediate grating 104b independently include, but are not limited to, SiOC, TiO2, SiO2, VOx, AI2O3, AZO, ITO, SnO2, ZnO, Ta20s, SisN4, ZrO2, Nb2Os, Cd2SnO4, TiSiOx, or SiCN containing materials.
  • FIG. 6 s a schematic, cross-sectional view of the out-coupler grating 104c.
  • the out-coupler grating 104c includes a plurality of grating structures 212c disposed in the first grating material 204.
  • the grating structures 212c of the embodiments of FIG. 6 are a slanted grating structure 602.
  • the slanted grating structure 602 includes a depth 604 which corresponds to the height of the of the structure, a top width 606a which corresponds to the width of the top of the structure, and a structure width 606b which corresponds to the total width of the structure along the horizontal axis.
  • the slanted grating structure 602 includes a slant angle o, which can be defined as the angle between the perpendicular axis 608 relative to the first grating material 204 and the exterior surface of the slanted grating structure 602.
  • the plurality of grating structures 212c of the out-coupler grating 104c can each independently include a slanted grating structure 602 having a depth 604, top width 606a, and a slant angle o.
  • the plurality of grating structures 214c of the out-coupler grating 104c independently include a depth 604 of about 50 nm to about 300 nm, such as about 100 nm to about 250 nm, such as about 150 nm to about 200 nm, alternatively about 50 nm to about to about 100 nm, alternatively about 100 nm to about 150 nm, alternatively about 200 nm to about 250 nm, alternatively about 250 nm to about 300 nm.
  • the plurality of grating structures 212c of the out-coupler grating 104c independently include a top width 606a of about 50 nm to about 300 nm, such as about 100 nm to about 250 nm, such as about 150 nm to about 200 nm, alternatively about 50 nm to about to about 100 nm, alternatively about 100 nm to about 150 nm, alternatively about 200 nm to about 250 nm, alternatively about 250 nm to about 300 nm.
  • the plurality of grating structures 212c of the out-coupler grating 104c independently include a slant angle o of about 25° to about 45°, such as about 30° to about 40°, such as about 32.5° to about 37.5°, alternatively about 25° to about 30°, alternatively about 30° to about 32.5°, alternatively about 32.5° to about 35°, alternatively about 35° to about 37.5°, alternatively about 37.5° to about 40°, alternatively about 40° to about 45°.
  • the plurality of grating structures 212c of the out-coupler 104c independently include a Rl of about 1 .5 to about 2.6, such as about 1 .7 to about 2.4, such as about 1 .9 to about 2.2, such as about 2.0 to about 2.1 , alternatively about 1 .5 to about 1 .7, alternatively about 1 .7 to about 1 .9, alternatively about 1 .9 to about 2.0, alternatively about 2.1 to about 2.2, alternatively about 2.2 to about 2.4, alternatively about 2.4 to about 2.6.
  • each of the grating structures 212c of the out-coupler grating 104c independently include any suitable material, such as SiOC, TiO2, SiC>2, VOx, AI2O3, AZO, ITO, SnO2, ZnO, Ta2Os, SisN4, ZrO2, Nb20s, Cd2SnO4, TiSiOx, or SiCN containing materials.
  • suitable material such as SiOC, TiO2, SiC>2, VOx, AI2O3, AZO, ITO, SnO2, ZnO, Ta2Os, SisN4, ZrO2, Nb20s, Cd2SnO4, TiSiOx, or SiCN containing materials.
  • the plurality of grating structures 212c of the out-coupler grating 104c can each independently include a blazed grating structure.
  • plurality of grating structures 212c of the out-coupler grating 104c include a blazed grating structure that is similar to and/or identical to the blazed grating structure plurality grating structures 212a of the an in-coupler grating 104a, as depicted in Figure 4.
  • Figure 7 is a frontal, sectional view of the out-coupler grating 104c of a waveguide 100.
  • the out-coupler grating 104c of Figure 7 does not have the transmission matching layer 202 or a first color shift layer 210.
  • the waveguide 100 can cause a transmission color shift 702 to be produced from the out-coupler grating 104c of waveguide 100.
  • the diffraction efficiency of the plurality of grating structures 212c of out-coupler grating 104c may cause the waveguide 100 to transmit light of various wavelengths with different transmission coefficients when the augmented reality display is not in operation, i.e. , displaying an image.
  • the waveguide 100 with the bi-layer configuration 200 and the blazed configuration 300 include at least the transmission matching layer 202 and first color shift layer 210.
  • the transmission matching layer reduces and/or smooths the step transition of light with varying wavelengths which are being transmitted through the out-coupler.
  • the color shift layer changes the overall color by adjusting the relative transmission of varying wavelengths in out-coupler.
  • Figure 8 is a frontal, sectional view of the out-coupler grating 104c of a waveguide 100 having a transmission matching layer 202 and a first color shift layer 210.
  • the out-coupler grating 104c includes a plurality of grating structures 212c.
  • the waveguide 100 further includes a transmission matching layer 202 and a first color shift layer 210. Including both the transmission matching layer 202 and the first color shift layer 210 reduces and/or mitigates the transmission color shift 702 which can be produced from wearing the augmented reality display.
  • Waveguide configurations that reduce and/or eliminate transmission color shift during use within an optical device.
  • Waveguide configurations disclosed herein incorporate a waveguide substrate, a transmission matching layer disposed over the waveguide substrate, and an AR coating disposed over a surface of the waveguide substrate opposite the transmission matching layer.
  • Waveguides of the present disclosure further include one or more grating materials disposed over the transmission matching layer, and one or more color shift layers disposed over the grating materials.
  • waveguides of the present disclosure include an in-coupler grating, an intermediate grating, and an out- coupler grating that can be disposed on or in the grating materials.
  • Waveguides of the present disclosure offer a unique route to addressing issues commonly associated with color shift transmission.

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  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)

Abstract

Des modes de réalisation de la présente invention concernent un guide d'ondes. Le guide d'ondes comprend en outre une couche d'adaptation de transmission disposée sur le substrat de guide d'ondes. Le guide d'ondes comprend en outre un premier matériau de réseau disposé sur la couche d'adaptation de transmission, et un second matériau de réseau disposé sur le premier matériau de réseau. Le guide d'ondes comprend en outre un réseau disposé dans le second matériau de réseau et le premier matériau de réseau de telle sorte que des structures de réseau du réseau comprennent une première couche du premier matériau de réseau et une seconde couche du second matériau de réseau. Le second matériau de réseau a un second indice de réfraction qui est supérieur à un premier indice de réfraction du premier matériau de réseau. Le guide d'ondes comprend en outre une couche de décalage de couleur disposée sur le réseau.
PCT/US2025/021719 2024-04-15 2025-03-27 Guide d'ondes non symétrique à haut rendement à faible décalage de couleur de transmission Pending WO2025221430A1 (fr)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010044290A (ja) * 2008-08-18 2010-02-25 Oki Electric Ind Co Ltd 光導波路径拡大回路、その製造方法、及び光導波路型装置
US20140185142A1 (en) * 2013-01-02 2014-07-03 Google Inc. Optical combiner for near-eye display
US20210072437A1 (en) * 2019-09-11 2021-03-11 Magic Leap, Inc. Display device with diffraction grating having reduced polarization sensitivity
US20210199971A1 (en) * 2019-12-26 2021-07-01 Facebook Technologies, Llc Gradient refractive index grating for display leakage reduction
CN117666138A (zh) * 2022-09-08 2024-03-08 华为技术有限公司 光波导结构及其制作方法、光学组件和近眼显示设备

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010044290A (ja) * 2008-08-18 2010-02-25 Oki Electric Ind Co Ltd 光導波路径拡大回路、その製造方法、及び光導波路型装置
US20140185142A1 (en) * 2013-01-02 2014-07-03 Google Inc. Optical combiner for near-eye display
US20210072437A1 (en) * 2019-09-11 2021-03-11 Magic Leap, Inc. Display device with diffraction grating having reduced polarization sensitivity
US20210199971A1 (en) * 2019-12-26 2021-07-01 Facebook Technologies, Llc Gradient refractive index grating for display leakage reduction
CN117666138A (zh) * 2022-09-08 2024-03-08 华为技术有限公司 光波导结构及其制作方法、光学组件和近眼显示设备

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